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TWI772771B - Electrolytic polishing apparatus - Google Patents

Electrolytic polishing apparatus Download PDF

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Publication number
TWI772771B
TWI772771B TW109111084A TW109111084A TWI772771B TW I772771 B TWI772771 B TW I772771B TW 109111084 A TW109111084 A TW 109111084A TW 109111084 A TW109111084 A TW 109111084A TW I772771 B TWI772771 B TW I772771B
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electrolytic
negative electrode
electrolytic polishing
plate
negative
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TW109111084A
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Chinese (zh)
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TW202026468A (en
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黃在祥
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南韓商韓國丸井股份有限公司
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    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25FPROCESSES FOR THE ELECTROLYTIC REMOVAL OF MATERIALS FROM OBJECTS; APPARATUS THEREFOR
    • C25F7/00Constructional parts, or assemblies thereof, of cells for electrolytic removal of material from objects; Servicing or operating
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23HWORKING OF METAL BY THE ACTION OF A HIGH CONCENTRATION OF ELECTRIC CURRENT ON A WORKPIECE USING AN ELECTRODE WHICH TAKES THE PLACE OF A TOOL; SUCH WORKING COMBINED WITH OTHER FORMS OF WORKING OF METAL
    • B23H5/00Combined machining
    • B23H5/06Electrochemical machining combined with mechanical working, e.g. grinding or honing
    • B23H5/08Electrolytic grinding
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25FPROCESSES FOR THE ELECTROLYTIC REMOVAL OF MATERIALS FROM OBJECTS; APPARATUS THEREFOR
    • C25F3/00Electrolytic etching or polishing
    • C25F3/16Polishing

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Mechanical Engineering (AREA)
  • Electrical Discharge Machining, Electrochemical Machining, And Combined Machining (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
  • Electrolytic Production Of Metals (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)

Abstract

An apparatus for electrolytic polishing according to an embodiment may include an electrolytic cell in which a receiving space configured to receive an electrolytic polishing target having a plurality of bolt holes and an electrolytic solution is provided, a plurality of cathode-mounting fixtures each having a fastening blot mounted on a polishing portion formed on one surface of the electrolytic polishing target through the plurality of bolt holes, a cathode plate mounted on the polishing portion of the electrolytic polishing target, a clamp installed on the cathode-mounting fixture and fixing the cathode plate, and a rectifier electrically connected to each of the electrolytic polishing target and the cathode plate and applying a positive pole (+) to the electrolytic polishing target and applying a negative pole (-) to the cathode plate. wherein the cathode plate is a modularized lattice-shaped cathode plate comprising a plurality of first cathode grids and a plurality of second cathode grids coupled to the plurality first cathode grids, the modularized lattice-shaped cathode plate comprises a plurality of mounting spaces corresponding to the plurality of bolt holes of the electrolytic polishing target, and the modularized lattice-shaped cathode plate is mounted on the polishing portion of the electrolytic polishing target by the cathode-mounting fixtures through the plurality of mounting space.

Description

電解研磨裝置Electrolytic grinding device

本發明的一實施例涉及電解研磨裝置。更詳細而言,本發明的一實施例涉及一種用於向正極和負極接入電流,以電解液為媒介,在金屬的表面引起電解而進行研磨的電解研磨裝置。One embodiment of the present invention relates to an electrolytic polishing apparatus. More specifically, an embodiment of the present invention relates to an electrolytic polishing apparatus for applying electric current to a positive electrode and a negative electrode, and using an electrolyte solution as a medium to induce electrolysis on the surface of a metal for grinding.

電解研磨(Electrolytic Polishing)是一種以溶解於電解液的金屬為正極(Anode),將在電解液中不溶性的金屬用作負極(Cathode),向正極和負極接入電壓,從而以所述電解液為媒介,在金屬的表面引起電解而進行研磨的方法。Electrolytic Polishing is a method of using the metal dissolved in the electrolyte as the positive electrode (Anode), using the metal insoluble in the electrolyte as the negative electrode (Cathode), and applying voltage to the positive electrode and the negative electrode, so as to use the electrolyte solution. A method of grinding by causing electrolysis on the surface of a metal by means of a medium.

為了利用這種電解研磨來研磨金屬,在電解池中填充電解液,將要研磨的金屬安裝為正極,將不溶於電解液的金屬安裝為負極後,向正極和負極接入直流電。In order to grind metals by this electrolytic grinding, an electrolytic cell is filled with an electrolyte, the metal to be ground is installed as a positive electrode, and a metal insoluble in the electrolyte is installed as a negative electrode, and then a direct current is applied to the positive electrode and the negative electrode.

另一方面,進行電解研磨後,大量含有從正極溶解的金屬離子的高粘度液體層包圍正極。在金屬離子飽和的液體層中,金屬不再溶解,形成高正極電位,因而與氧活躍地結合而形成氧化物表膜。On the other hand, after electropolishing, a high-viscosity liquid layer containing a large amount of metal ions dissolved from the positive electrode surrounds the positive electrode. In the liquid layer saturated with metal ions, the metal is no longer dissolved, forming a high positive electrode potential, and thus actively combines with oxygen to form an oxide film.

此時,溶解的金屬離子主要積累於金屬表面的凹陷部分,在凹陷部分,金屬離子的移動和擴散少,電氣通過不暢,因而金屬不溶解。At this time, the dissolved metal ions are mainly accumulated in the concave parts of the metal surface. In the concave parts, the movement and diffusion of the metal ions are small, and the electric passage is not smooth, so that the metal does not dissolve.

相反,在金屬表面的凸出部分,金屬離子層形成的薄,因而電流集中,容易地使金屬表面溶解,整體上使金屬的表面更平滑。On the contrary, in the protruding portion of the metal surface, the metal ion layer is formed thin, so that the current is concentrated, the metal surface is easily dissolved, and the metal surface is made smoother as a whole.

其中,這種電解研磨通過電解研磨裝置而實施,以往技術的電解研磨裝置已在專利文獻1中公開,參照圖式,對其具體說明如下。Among them, such electrolytic polishing is carried out by an electrolytic polishing apparatus, and a conventional electrolytic polishing apparatus is disclosed in Patent Document 1, and will be specifically described below with reference to the drawings.

圖1是整體上顯示以往技術的電解研磨裝置的立體圖。即,如圖1所示,以往技術的電解研磨裝置在容納有電解液112的電解池110的內部安裝包括腔室、槽、配管等的電解研磨物件102。然後,在電解研磨物件102的電解研磨部104加裝多個負極放置固定架120後,再將負極板130放置於多個負極放置固定架120之間的狀態下,利用C型夾140固定,形成四邊形負極基本框架。FIG. 1 is a perspective view showing a conventional electrolytic polishing apparatus as a whole. That is, as shown in FIG. 1 , in the electrolytic polishing apparatus of the related art, an electrolytic polishing article 102 including a chamber, a tank, piping, and the like is installed in an electrolytic cell 110 containing an electrolytic solution 112 . Then, after adding a plurality of negative electrode placement fixing frames 120 to the electrolytic polishing part 104 of the electrolytic polishing object 102, the negative electrode plate 130 is placed between the plurality of negative electrode placing fixing frames 120, and is fixed by the C-type clip 140, A quadrilateral negative electrode basic frame is formed.

另外,在負極基本框架之間,按既定間隔配置負極板130,用C型夾140組裝。如此在電解研磨物件102的電解研磨部104完成負極。In addition, the negative electrode plates 130 are arranged at predetermined intervals between the negative electrode basic frames, and are assembled with the C-type clips 140 . In this way, the negative electrode is completed in the electrolytic polishing part 104 of the electrolytic polishing object 102 .

而且,在電解研磨物件102的剩餘面也相同地構成,且面與面之間使用負極板130和C型夾140形成構造,進行堅固固定。In addition, the remaining surfaces of the electrolytic polishing object 102 are also constructed in the same manner, and the negative plates 130 and the C-type clips 140 are used to form a structure between the surfaces, so as to be firmly fixed.

因此,以往技術的電解研磨裝置可以通過負極放置固定架120和C型夾140,在電解研磨物件102的電解研磨部104,按均一的間隔安裝多個負極板130,可以在整個內外面容易地研磨比較大的加工物。Therefore, in the electrolytic polishing apparatus of the prior art, a plurality of negative electrode plates 130 can be installed at uniform intervals on the electrolytic polishing part 104 of the electrolytic polishing object 102 through the negative electrode placement fixing frame 120 and the C-type clip 140, and the entire inner and outer surfaces can be easily installed. Grind relatively large workpieces.

但是,以往技術的電解研磨裝置如前所述,需利用在電解研磨物件102的電解研磨部104安裝負極放置固定架120、通過C型夾140來個別地安裝負極板130的方法進行,因而存在電解研磨所需的負極板130安裝時間耗時長的問題。However, as described above, the electrolytic polishing apparatus of the prior art requires the method of attaching the negative electrode mounting bracket 120 to the electrolytic polishing part 104 of the electrolytic polishing object 102 and individually attaching the negative electrode plate 130 through the C-clamp 140 . The installation time of the negative plate 130 required for electrolytic grinding takes a long time.

現有技術文獻:專利文獻_大韓民國註冊專利公報第10-1183218號。Prior Art Documents: Patent Documents_Korea Registered Patent Publication No. 10-1183218.

要解決的技術問題technical problem to be solved

實施例的目的在於提供一種電解研磨裝置,按電解研磨物件的規格,預先製作負極板並實現模組化,從而使得能夠容易地安裝電解研磨物件的電解研磨所需的負極板。The purpose of the embodiments is to provide an electrolytic grinding device, which pre-fabricates negative plates according to the specifications of the electrolytic grinding objects and realizes modularization, so that the negative plates required for the electrolytic grinding of the electrolytic grinding objects can be easily installed.

解決問題的手段means of solving problems

為了解決課題,實施例的電解研磨裝置可以包括:電解池(Electrolytic Cell),其在內部配備有容納電解研磨物件和電解液的容納空間,電解研磨物件具有複數個螺栓孔;複數個負極放置固定架,各包含一連結螺栓,經由螺栓孔將負極放置固定架加裝於在電解研磨物件的一面形成的電解研磨部;負極板,其加裝於電解研磨物件的電解研磨部;C型夾(C-type Clamp),其安裝於負極放置固定架,固定負極板;及整流器,其分別電氣連接於電解研磨物件和負極板,向電解研磨物件接入正極(+),向負極板接入負極(-)。In order to solve the problem, the electrolytic polishing device of the embodiment may include: an electrolytic cell (Electrolytic Cell), which is internally equipped with a accommodating space for accommodating an electrolytic polishing object and an electrolyte, and the electrolytic polishing object has a plurality of bolt holes; a plurality of negative electrodes are placed and fixed Each frame includes a connecting bolt, and the negative electrode placement fixing frame is attached to the electrolytic grinding part formed on one side of the electrolytic grinding object through the bolt hole; the negative electrode plate is added to the electrolytic grinding part of the electrolytic grinding object; C-clamp ( C-type Clamp), which is installed on the negative electrode placement holder to fix the negative electrode plate; and a rectifier, which is electrically connected to the electrolytic grinding object and the negative electrode plate respectively, and connects the positive electrode (+) to the electrolytic grinding object and the negative electrode to the negative electrode plate. (-).

負極板為模組化的晶格形負極板,其包括複數個第一負極格子板和耦合至複數個第一負極格子板的複數個第二負極格子板。模組化的晶格形負極板還包含複數個放置空間,放置空間對應於螺栓孔。模組化的晶格形負極板藉由將負極放置固定架通過放置空間,安裝於電解研磨物件的電解研磨部上。The negative plate is a modular lattice-shaped negative plate, which includes a plurality of first negative grid plates and a plurality of second negative grid plates coupled to the plurality of first negative grid plates. The modular lattice-shaped negative plate further includes a plurality of placement spaces, and the placement spaces correspond to the bolt holes. The modular lattice-shaped negative plate is installed on the electrolytic grinding part of the electrolytic grinding object by placing the negative electrode fixing frame through the holding space.

在一實施例中,電解研磨物件的該電解研磨部以多邊形或圓筒形形成,模組化的晶格形負極板的規格對應於電解研磨物件的電解研磨部的規格。In one embodiment, the electrolytic polishing portion of the electrolytic polishing object is formed in a polygonal or cylindrical shape, and the size of the modular lattice-shaped negative plate corresponds to the size of the electrolytic polishing portion of the electrolytic polishing object.

在一實施例中,模組化的晶格形負極板可以包括:第一負極格子板,其沿豎直方向排列配置於電解研磨部;及第二負極格子板,其沿水平方向配置於電解研磨物件的電解研磨部,沿著第一負極格子板的交叉方向,在形成放置空間的同時排列,組裝成格子形。In one embodiment, the modular lattice-shaped negative electrode plate may include: a first negative electrode grid plate, which is arranged in the electrolytic grinding part in a vertical direction; and a second negative electrode grid plate, which is arranged in a horizontal direction in the electrolytic grinding part. The electrolytic grinding parts of the grinding object are arranged along the intersecting direction of the first negative electrode grid plates while forming the placement space, and are assembled into a grid shape.

就實施例的電解研磨裝置而言,第一負極格子板和第二負極格子板可以以具有「一」字、「┓」字或「口」字橫截面的直線形或圓形形成。As far as the electrolytic polishing apparatus of the embodiment is concerned, the first negative grid plate and the second negative grid grid may be formed in a straight or circular shape with a cross-section of "一", "┓" or "口".

就實施例的電解研磨裝置而言,第一負極格子板和第二負極格子板可以用鉚釘(Rivet)結合並實現一體化。As far as the electrolytic polishing apparatus of the embodiment is concerned, the first negative electrode grid plate and the second negative electrode grid plate may be combined with rivets and integrated.

另外,就實施例的電解研磨裝置而言,第一負極格子板可以沿水平方向排列,沿第一負極格子板的交叉方向,第二負極格子板形成放置空間的同時排列。In addition, with regard to the electrolytic polishing apparatus of the embodiment, the first negative grid plates may be arranged in the horizontal direction, and the second negative grid plates may be arranged along the intersecting direction of the first negative grid plates while forming the placement space.

另外,就實施例的電解研磨裝置而言,電解研磨物件可以以多邊形或圓筒形形成,在內部和外部分別形成有電解研磨部。In addition, in the electrolytic polishing apparatus of the embodiment, the electrolytic polishing object may be formed in a polygonal or cylindrical shape, and an electrolytic polishing portion may be formed inside and outside, respectively.

另外,就實施例的電解研磨裝置而言,在電解研磨物件的內部和外部的電解研磨部分別配置的負極板可以相互電氣連接。In addition, in the electrolytic polishing apparatus of the embodiment, the negative electrode plates respectively arranged in the electrolytic polishing parts inside and outside the electrolytic polishing object may be electrically connected to each other.

另外,就實施例的電解研磨裝置而言,負極放置固定架可以包括四邊形狀的板、連接於板的一側面的連結螺栓、螺合連結於連結螺栓的固定螺母。In addition, in the electrolytic polishing apparatus of the embodiment, the negative electrode mounting bracket may include a square plate, a connecting bolt connected to one side surface of the plate, and a fixing nut screwed and connected to the connecting bolt.

另外,就實施例的電解研磨裝置而言,負極放置固定架可以包括絕緣板,絕緣板分別附著於四邊形狀的板的兩面,由橡膠、聚氨酯、PVC或膠木(Bakelite)中某一者構成。In addition, with regard to the electrolytic polishing device of the embodiment, the negative electrode placement fixing frame may include insulating plates, which are respectively attached to both sides of the quadrangular plate, and are made of rubber, polyurethane, PVC, or bakelite (Bakelite). .

通過以下基於圖式的用於實施發明的具體內容,這種解決手段將更加明確。This solution will be made clearer through the following specific content for implementing the invention based on the drawings.

在此之前需要解釋的是,本說明書及申請專利範圍中使用的詞語不得解釋為通常的詞典上的意義,發明人為了以最佳方法說明其自身的發明,可以適當地定義術語的概念,立足於這一原則,只應解釋為與本發明的技術思想相符的意義和概念。Before that, it should be explained that the words used in this specification and the scope of the patent application should not be interpreted as the meanings in the usual dictionary. Based on this principle, it should only be interpreted as meanings and concepts consistent with the technical idea of the present invention.

發明的效果effect of invention

根據實施例,按照以多邊形或圓筒形形成的電解研磨物件的規格,預先製作負極板,能夠縮短電解研磨物件的電解研磨所需的負極的安裝時間,從而具有可以容易地實施電解研磨的技術效果。According to the embodiment, the negative electrode plate is prefabricated according to the specifications of the electrolytic polishing object formed in a polygonal or cylindrical shape, and the installation time of the negative electrode required for the electrolytic polishing of the electrolytic polishing object can be shortened, so that the electrolytic polishing can be easily carried out. Effect.

通過與圖式相關的以下具體內容和一個實施例,實施例的獨特觀點、特定的技術特徵將更加明確。需要注意的是,在本說明書中,在對各圖的構成要素賦予圖式標記方面,對於相同的構成要素,即使顯示於不同圖式上,也盡可能使之具有相同標記。The unique viewpoint and specific technical features of the embodiment will be more clarified through the following specific content related to the drawings and an embodiment. It should be noted that, in this specification, when drawing reference numerals are given to the constituent elements of each drawing, the same constituent elements are given the same reference numerals as much as possible even if they are shown in different drawings.

在說明實施例的構成要素方面,可以使用第一、第二、A、B、(a)、(b)等術語。這種術語只用於將該構成要素與其他構成要素相區別,相應構成要素的本質或次序或順序等不由該術語所限定。當記載某種構成要素「連接」、「結合」或「接續」於另一構成要素時,應理解為該構成要素可以直接連接或接續於其另一構成要素,但也可以在各構成要素之間還「連接」、「結合」或「接續」有又一構成要素。In describing the constituent elements of the embodiment, terms such as first, second, A, B, (a), (b), etc. may be used. This term is only used to distinguish the constituent element from other constituent elements, and the nature or order or sequence of the corresponding constituent element is not limited by the term. When it is stated that a certain constituent element is "connected", "combined" or "continuous" with another constituent element, it should be understood that the constituent element may be directly connected or connected with its other constituent element, but it may also be used between the constituent elements. There is another element of "connection", "joint" or "connection" between them.

下面根據圖式,按如下具體說明實施例。The embodiments are described in detail as follows based on the drawings.

如圖2~6所示,實施例的電解研磨裝置1包括填充有電解液的電解池20(參照圖6)、負極放置固定架30、C型夾50、整流器60以及格子形負極板40。As shown in FIGS. 2 to 6 , the electrolytic polishing apparatus 1 of the embodiment includes an electrolytic cell 20 (refer to FIG. 6 ) filled with an electrolyte solution, a negative electrode placement holder 30 , a C-clamp 50 , a rectifier 60 and a lattice negative electrode plate 40 .

如果參照圖6,電解池20在內部配備有容納空間21,在容納空間21填充電解液。電解研磨物件10容納於容納空間21,浸於電解液,如圖2所示,在一面形成有用於電解研磨的電解研磨部11。Referring to FIG. 6 , the electrolytic cell 20 is provided with an accommodating space 21 inside, and the accommodating space 21 is filled with an electrolytic solution. The electrolytic polishing object 10 is accommodated in the accommodating space 21, immersed in an electrolyte, and as shown in FIG. 2, an electrolytic polishing portion 11 for electrolytic polishing is formed on one surface thereof.

例如,電解研磨物件10可以是多邊形的腔室(Chamber)或圓筒形的槽(Tank)。不過,這只是一個示例,並非必須將電解研磨物件10限定於此。For example, the electrolytic grinding object 10 may be a polygonal chamber (Chamber) or a cylindrical tank (Tank). However, this is just an example, and the electrolytic abrasive article 10 is not necessarily limited to this.

另外,電解研磨部11可以在電解研磨物件10的外部或內部形成,也可以在電解研磨物件10的內部及外部全部形成。In addition, the electrolytic polishing part 11 may be formed outside or inside the electrolytic polishing object 10 , or may be formed entirely inside and outside the electrolytic polishing object 10 .

這種電解研磨物件10在容納於電解池20之前,可以在形成於內外部的電解研磨部11加裝負極放置固定架30。即,在電解研磨部11加裝負極放置固定架30,在負極放置固定架30安裝夾具50,例如C型夾50,使得格子形負極板40被固定。Before the electrolytic polishing object 10 is accommodated in the electrolytic cell 20 , a negative electrode placing holder 30 may be added to the electrolytic polishing portion 11 formed inside and outside. That is, the negative electrode placement fixing frame 30 is installed on the electrolytic polishing part 11 , and a jig 50 , such as a C-type clip 50 , is installed on the negative electrode placing fixing frame 30 , so that the grid-shaped negative electrode plate 40 is fixed.

如果參照圖3,負極放置固定架30例如包括以不銹鋼材料製造的四邊形狀的板材31,在板材31的一側面可以連接棒形狀的連結螺栓32而構成。負極放置固定架30可以通過連結螺栓32而加裝於電解研磨物件10的電解研磨部11後,利用固定螺母33進行螺合連結並固定。Referring to FIG. 3 , the negative electrode mounting bracket 30 includes, for example, a rectangular plate 31 made of stainless steel, and a rod-shaped connecting bolt 32 can be connected to one side of the plate 31 . The negative electrode placement fixing frame 30 can be attached to the electrolytic polishing part 11 of the electrolytic polishing object 10 through the connecting bolts 32 , and then screwed and fixed by the fixing nuts 33 .

另外,負極放置固定架30可以在板材31的兩面附著由橡膠、聚氨酯、PVC或膠木(Bakelite)中某一者構成的絕緣板34而進行絕緣。In addition, the negative electrode mounting bracket 30 may be insulated by attaching insulating plates 34 made of rubber, urethane, PVC, or bakelite to both surfaces of the plate 31 .

這種負極放置固定架30安裝於電解研磨物件10的電解研磨部11的圖中上下及左右,與C型夾50一同固定格子形負極板40,從而使得在電解研磨過程中,格子形負極板40不從電解研磨物件10分離。The negative electrode placement fixing frame 30 is installed on the top, bottom and left and right of the electrolytic grinding part 11 of the electrolytic grinding object 10, and together with the C-type clip 50, the grid-shaped negative electrode plate 40 is fixed, so that during the electrolytic grinding process, the grid-shaped negative electrode plate 40 is not separated from the electrolytic abrasive article 10 .

另一方面,如果參照圖2,實施例的格子形負極板40可以包括第一負極格子板41和第二負極格子板42,第一負極格子板41和第二負極格子板42利用例如包括銅、鋁、不銹鋼等的導電性優秀的材料,以細長的條狀(Strip)形態形成。On the other hand, if referring to FIG. 2 , the grid-shaped negative electrode plate 40 of the embodiment may include a first negative electrode grid plate 41 and a second negative electrode grid plate 42 using, for example, copper , aluminum, stainless steel and other materials with excellent electrical conductivity are formed in the form of long and thin strips.

第一負極格子板41可以根據電解研磨物件10的形狀,以具有「一」字「┓」字或「口」字橫截面的直線形或圓形形成。第一負極格子板41可以沿豎直方向排列並配置於電解研磨部11。The first negative grid plate 41 can be formed in a straight line or a circle with a cross section of the character “一”, “┓” or “mouth” according to the shape of the electrolytic polishing object 10 . The first negative grid plates 41 may be arranged in the vertical direction and disposed in the electrolytic polishing part 11 .

第二負極格子板42為了沿水平方向配置於電解研磨物件10的電解研磨部11,可以沿著第一負極格子板41的交叉方向,按直線形或圓形排列配置並組裝。The second negative grid plates 42 can be arranged and assembled in a linear or circular arrangement along the intersecting direction of the first negative grid plates 41 in order to be horizontally arranged on the electrolytic polishing portion 11 of the electrolytic polishing object 10 .

例如,第一、二負極格子板41、42通過包括鉚釘(Rivet)、螺栓(Bolt)或焊接等的組裝手段相互組裝而實現一體化,從而可以實現模組化。不過,在以下的實施例中,說明通過鉚釘43結合而實現一體化的情形,但並非限定於此。For example, the first and second negative electrode grid plates 41 and 42 are assembled with each other by assembling means including rivets, bolts, or welding to realize integration, thereby realizing modularization. However, in the following embodiments, the case where integration is achieved by joining with the rivets 43 will be described, but the present invention is not limited to this.

另外,當第一負極格子板41沿豎直方向排列時,第二負極格子板42沿與之交叉的水平方向形成放置空間44並排列,通過鉚釘43結合而實現一體化。In addition, when the first negative grid plates 41 are arranged in the vertical direction, the second negative grid plates 42 are arranged along the horizontal direction intersecting with the placement spaces 44 and are combined by rivets 43 to achieve integration.

即,按照與電解研磨物件10的電解研磨部11實質上一致的規格,利用對第一、二負極格子板41、42進行鉚釘43結合而實現一體化的方法,可以預先製作格子形負極板40並實現模組化。That is, the grid-shaped negative electrode plate 40 can be pre-fabricated by a method of combining the first and second negative electrode grid plates 41 and 42 with rivets 43 according to the specifications substantially consistent with the electrolytic polishing portion 11 of the electrolytic polishing object 10 . And achieve modularization.

另外,在加裝於電解研磨部11的負極放置固定架30,在利用放置空間44而與電解研磨部11設置既定間隔放置的狀態下,可以將C型夾50安裝於負極放置固定架30進行固定。In addition, in the state where the negative electrode placement holder 30 attached to the electrolytic polishing unit 11 is placed at a predetermined distance from the electrolytic polishing unit 11 by using the placement space 44 , the C-clamp 50 can be attached to the negative electrode placement holder 30 to carry out fixed.

其中,放置空間44的間隔可以根據電解研磨物件10的大小或種類或電解研磨部11的位置等而縮窄或加寬形成。Wherein, the interval of the placement space 44 may be narrowed or widened according to the size or type of the electrolytic polishing object 10 or the position of the electrolytic polishing part 11 .

C型夾50例如可以由耐酸性優秀的不銹鋼材料形成。C型夾50通過位於圖中上下的固定部51,安裝於負極放置固定架30,由此可以在電解研磨部11容易地固定格子形負極板40。The C-clamp 50 may be formed of, for example, a stainless steel material excellent in acid resistance. The C-clamps 50 are attached to the negative electrode mounting bracket 30 through the fixing portions 51 located at the top and bottom in the figure, so that the grid-shaped negative electrode plate 40 can be easily fixed to the electrolytic polishing portion 11 .

如圖2所示,實施例的電解研磨物件10以多邊形形成,電解研磨部11可以位於這種多邊形電解研磨物件10a的內部及外部。As shown in FIG. 2 , the electrolytic polishing object 10 of the embodiment is formed in a polygonal shape, and the electrolytic polishing part 11 may be located inside and outside the polygonal electrolytic polishing object 10a.

根據實施例,將利用鉚釘43結合直線形的第一、二負極格子板41、42而實現模組化的格子形負極板40,首先配置於電解研磨物件10的內部,然後在電解研磨物件10的外部配置格子形負極板40,可以以這種方法準備電解研磨。According to the embodiment, the grid-shaped negative plate 40 , which is modularized by combining the linear first and second negative grid plates 41 and 42 with the rivets 43 , is firstly arranged inside the electrolytic polishing object 10 , and then the electrolytic polishing object 10 is placed in the electrolytic polishing object 10 . The grid-shaped negative plate 40 is arranged on the outside of the , and can be prepared for electrolytic grinding in this way.

例如,就在多邊形電解研磨物件10a的外部配置格子形負極板40的方法而言,首先,將按與電解研磨部11實質上一致的規格預先製作的格子形負極板40,利用放置空間44安放於負極放置固定架30後,將C型夾50安裝於負極放置固定架30,完成負極板基本框架40a。For example, in the method of arranging the grid-shaped negative electrode plate 40 on the outside of the polygonal electrolytic polishing object 10 a, first, the grid-shaped negative electrode plate 40 prefabricated in the specification substantially identical to that of the electrolytic polishing unit 11 is placed in the placement space 44 . After the negative electrode placement fixing frame 30 is installed, the C-type clip 50 is installed on the negative electrode placing fixing frame 30 to complete the negative electrode plate basic frame 40a.

格子形負極板40是與電解研磨部11對應的形狀或面積即可,並非必須限定為一致的規格。The grid-shaped negative electrode plate 40 may have a shape or area corresponding to the electrolytic polishing portion 11 , and is not necessarily limited to a uniform specification.

其中,如果未準備規格與電解研磨部11實質上一致的格子形負極板40,則在現場將兩個以上格子形負極板40通過C型夾50結合而組合在一起,從而完成負極板基本框架40a。然後,針對剩餘電解研磨部11也利用相同的方法安裝格子形負極板40,完成負極板最終框架(圖6的40b)。Wherein, if the grid-shaped negative electrode plate 40 whose specification is substantially the same as that of the electrolytic polishing unit 11 is not prepared, two or more grid-shaped negative electrode plates 40 are combined on site by means of the C-type clip 50 to complete the basic frame of the negative electrode plate. 40a. Then, the grid-shaped negative electrode plate 40 is attached to the remaining electrolytic polishing part 11 by the same method, and the final frame of the negative electrode plate is completed ( 40 b in FIG. 6 ).

另一方面,如果參照圖1和圖6,在電解研磨物件10的內部和外部分別配置的負極板基本框架40a相互電氣連接,可以使得容易地通過整流器60而接入負極。因此,無論在哪個負極板基本框架40a接入負極(-),均可容易地實現電解研磨。On the other hand, referring to FIGS. 1 and 6 , the negative plate basic frames 40a disposed inside and outside the electrolytic polishing object 10 are electrically connected to each other, so that the negative electrode can be easily connected to the negative electrode through the rectifier 60 . Therefore, no matter where the negative electrode plate basic frame 40a is connected to the negative electrode (-), electrolytic polishing can be easily realized.

下面,如圖4和圖5所示,實施例的電解研磨物件10b以圓筒形形成,在這種圓筒形電解研磨物件10b的外部可以形成有電解研磨部11。Next, as shown in FIGS. 4 and 5 , the electrolytic polishing object 10b of the embodiment is formed in a cylindrical shape, and an electrolytic polishing portion 11 may be formed on the outside of the cylindrical electrolytic polishing object 10b.

此時,根據實施例,將在直線形的第一負極格子板41上利用鉚釘43結合圓形的第二負極格子板42而實現模組化的格子形負極板40,放置於在電解研磨物件10外部安裝的負極放置固定架後,將C型夾安裝於負極放置固定架,完成負極板最終框架40b。At this time, according to the embodiment, the grid-shaped negative electrode plate 40, which is modularized by using the rivets 43 and the circular second negative electrode grid plate 42 on the linear first negative electrode grid plate 41, is placed on the electrolytic grinding object. 10 After the externally installed negative electrode placement fixture, install the C-clamp on the negative electrode placement fixture to complete the final frame 40b of the negative electrode plate.

其中,為了這種格子形負極板40容易固定,不僅是前述的負極放置固定架及C型夾,例如還可以在圓筒形電解研磨物件10b的上部,安裝圓形框架或四邊框架或多邊框架形狀的輔助固定架45並運用。Among them, in order to easily fix the grid-shaped negative electrode plate 40, not only the negative electrode mounting bracket and the C-type clip described above, for example, a circular frame, a quadrilateral frame or a polygonal frame can also be installed on the upper part of the cylindrical electrolytic polishing object 10b. The auxiliary fixing frame 45 of the shape is used.

另外,輔助固定架45和格子形負極板40可以相互電氣連接,可以通過輔助固定架45,在圓筒形電解研磨物件10b的內部安裝格子形負極板40。In addition, the auxiliary fixing frame 45 and the grid-shaped negative electrode plate 40 can be electrically connected to each other, and the grid-shaped negative electrode plate 40 can be mounted inside the cylindrical electrolytic polishing object 10b through the auxiliary fixing frame 45 .

然後,如圖6所示,實施例的電解研磨裝置1在使安裝有負極板最終框架40b的電解研磨物件10容納於填充有電解液的電解池20的容納空間21的狀態下,通過電線等而與整流器60電氣連接,從而進行電解研磨。Then, as shown in FIG. 6 , in the electrolytic polishing apparatus 1 of the embodiment, the electrolytic polishing object 10 with the negative electrode plate final frame 40 b mounted thereon is accommodated in the accommodation space 21 of the electrolytic cell 20 filled with the electrolyte solution, and the electric wire or the like is passed through the electric wire or the like. And it is electrically connected to the rectifier 60, and electrolytic polishing is performed.

其中,當電解研磨物件10為大型時,由於本身重量及格子形負極板40的安裝,重量相當大,因此,例如在利用起重機等提升的狀態下,容納於電解池20的容納空間21。Among them, when the electrolytic polishing object 10 is large, it is quite heavy due to its own weight and the installation of the grid-shaped negative plate 40 , so it is accommodated in the accommodating space 21 of the electrolytic cell 20 in the state of being lifted by a crane, for example.

然後,如果通過整流器60,向電解研磨物件10接入正極(+),向負極板最終框架40b接入負極(-),則以電解液為媒介發生電解,對電解研磨物件10的電解研磨部11進行電解研磨。Then, if the positive electrode (+) is connected to the electrolytic polishing object 10 through the rectifier 60, and the negative electrode (-) is connected to the final frame 40b of the negative electrode plate, electrolysis occurs with the electrolyte as a medium, and the electrolytic polishing part of the electrolytic polishing object 10 is electrolyzed. 11 Perform electrolytic grinding.

因此,根據實施例,通過利用與電解研磨物件10規格對應地預先製作的格子形負極板而完成的負極板最終框架40b,實現電解研磨物件10的電解研磨,從而可以有效縮短進行電解研磨所需的負極的安裝時間,因此,可以縮短整體的電解研磨工序的時間。Therefore, according to the embodiment, the electrolytic polishing of the electrolytic polishing object 10 is realized by using the final frame 40b of the negative electrode plate completed by using the grid-shaped negative electrode plates prefabricated corresponding to the specifications of the electrolytic polishing object 10, thereby effectively shortening the time required for the electrolytic polishing. The installation time of the negative electrode, therefore, the time of the overall electrolytic polishing process can be shortened.

以上通過實施例進行了詳細說明,但這是用於具體說明申請發明的,實施例的電解研磨裝置不限定於此。而且,以上記載的「包括」「構成」或「具有」等術語,只要沒有特別反對的記載,則意味著可以包含相應構成要素,因而並非排除其他構成要素,應解釋為可以還包括其他構成要素。As mentioned above, although an Example demonstrates in detail, this is for demonstrating the invention of an application specifically, and the electrolytic polishing apparatus of an Example is not limited to this. In addition, the terms such as "include", "constitute" or "have" described above, as long as there is no special objection, mean that the corresponding constituent elements can be included, and thus do not exclude other constituent elements, and should be interpreted as including other constituent elements. .

實施例並非用於限定而是用於說明申請發明的技術思想,並非申請發明的技術思想的範圍由這種實施例所限定。The embodiments are not intended to limit but describe the technical idea of the claimed invention, and the scope of the technical idea of the claimed invention is not limited by such embodiments.

1:電解研磨裝置 10:電解研磨物件 102:電解研磨物件 104:電解研磨部 10a:多邊形電解研磨物件 10b:圓筒形電解研磨物件 11:電解研磨部 110:電解池 112:電解液 120:負極放置固定架 130:負極板 140:C型夾 20:電解池 21:容納空間 30:負極放置固定架 31:板材 32:連結螺栓 33:固定螺母 34:絕緣板 40:負極板 40a:負極板基本框架 40b:負極板最終框架 41:第一負極格子板 42:第二負極格子板 43:鉚釘 44:放置空間 45:輔助固定架 50:C型夾 51:固定部 60:整流器1: Electrolytic grinding device 10: Electrolytic grinding objects 102: Electrolytic grinding objects 104: Electrolytic grinding department 10a: Polygonal electropolished objects 10b: Cylindrical electrolytic abrasive objects 11: Electrolytic grinding department 110: Electrolytic cell 112: Electrolyte 120: negative pole placement holder 130: negative plate 140: C-clamp 20: Electrolytic cell 21: accommodating space 30: Negative electrode placement holder 31: Plate 32: connecting bolts 33: fixing nut 34: Insulation board 40: negative plate 40a: Negative plate basic frame 40b: Negative Plate Final Frame 41: The first negative grid plate 42: Second negative grid plate 43: Rivets 44: Placement space 45: Auxiliary Fixture 50: C-clamp 51: Fixed part 60: Rectifier

[圖1]是整體顯示以往技術的電解研磨裝置的立體圖。 [圖2]是顯示實施例的電解研磨裝置的立體圖。 [圖3]是顯示實施例的負極放置固定架的立體圖。 [圖4]是顯示實施例的電解研磨裝置的安裝狀態的立體圖。 [圖5]是顯示實施例的電解研磨裝置的立體圖。 [圖6]是顯示實施例的電解研磨裝置的立體圖。1 is a perspective view showing an electrolytic polishing apparatus of the related art as a whole. [ Fig. 2] Fig. 2 is a perspective view showing an electrolytic polishing apparatus according to an example. [ Fig. 3] Fig. 3 is a perspective view showing a negative electrode placement fixture of the embodiment. 4] It is a perspective view which shows the installation state of the electrolytic polishing apparatus of an Example. [ Fig. 5] Fig. 5 is a perspective view showing an electrolytic polishing apparatus according to an example. [ Fig. 6] Fig. 6 is a perspective view showing an electrolytic polishing apparatus according to an example.

1:電解研磨裝置 1: Electrolytic grinding device

10:電解研磨物件 10: Electrolytic grinding objects

10a:多邊形電解研磨物件 10a: Polygonal electropolished objects

11:電解研磨部 11: Electrolytic grinding department

30:負極放置固定架 30: Negative electrode placement holder

40:負極板 40: negative plate

40a:負極板基本框架 40a: Negative plate basic frame

41:第一負極格子板 41: The first negative grid plate

42:第二負極格子板 42: Second negative grid plate

43:鉚釘 43: Rivets

44:放置空間 44: Placement space

50:C型夾 50: C-clamp

51:固定部 51: Fixed part

Claims (9)

一種電解研磨裝置,包括:一電解池,其在內部配備有容納一電解研磨物件和一電解液的一容納空間,該電解研磨物件具有複數個螺栓孔;複數個負極放置固定架,各包含一連結螺栓,經由該些螺栓孔將該些負極放置固定架加裝於在該電解研磨物件的一面形成的一電解研磨部;一負極板,其加裝於該電解研磨物件的該電解研磨部;一夾具,其安裝於該負極放置固定架,固定該負極板;及一整流器,其分別電氣連接於該電解研磨物件和該負極板,向該電解研磨物件接入正極(+),向該負極板接入負極(-);其中,該負極板為一模組化的晶格形負極板,其包括複數個第一負極格子板和耦合至該些第一負極格子板的複數個第二負極格子板;其中,該模組化的晶格形負極板還包含複數個放置空間,該些放置空間對應於該些螺栓孔;其中,該模組化的晶格形負極板藉由將該些負極放置固定架通過該些放置空間,安裝於該電解研磨物件的該電解研磨部上;及其中,該電解研磨物件在內部和外部分別形成有該電解研磨部。 An electrolytic grinding device, comprising: an electrolytic cell, which is internally equipped with an accommodating space for accommodating an electrolytic grinding object and an electrolyte, the electrolytic grinding object has a plurality of bolt holes; Connecting bolts, through the bolt holes, the negative electrode placement fixing brackets are attached to an electrolytic grinding part formed on one side of the electrolytic grinding object; a negative electrode plate is added to the electrolytic grinding part of the electrolytic grinding object; A clamp, which is installed on the negative electrode placement fixing frame to fix the negative electrode plate; and a rectifier, which is electrically connected to the electrolytic grinding object and the negative electrode plate respectively, and connects the positive electrode (+) to the electrolytic grinding object, and connects the negative electrode to the electrolytic grinding object. The plate is connected to the negative electrode (-); wherein, the negative electrode plate is a modular lattice-shaped negative electrode plate, which includes a plurality of first negative electrode lattice plates and a plurality of second negative electrodes coupled to the first negative electrode lattice plates Lattice plate; wherein, the modular lattice-shaped negative plate further includes a plurality of placement spaces, and these placement spaces correspond to the bolt holes; wherein, the modular lattice-shaped negative plate is formed by placing these The negative electrode placement fixing frame is installed on the electrolytic polishing part of the electrolytic polishing object through the placement spaces; and the electrolytic polishing object is respectively formed with the electrolytic polishing part inside and outside. 如請求項1所述的電解研磨裝置,其中該電解研磨物件的該電解研磨部以多邊形或圓筒形形成;該模組化的晶格形負極板的規格對應於該電解研磨物件的該電解研磨部的規格。 The electrolytic polishing device as claimed in claim 1, wherein the electrolytic polishing portion of the electrolytic polishing object is formed in a polygonal or cylindrical shape; the specification of the modular lattice-shaped negative plate corresponds to the electrolytic polishing portion of the electrolytic polishing object Specifications of the grinding section. 如請求項2所述的電解研磨裝置,其中該模組化的晶格形負極板中: 該些第一負極格子板沿豎直方向排列配置於該電解研磨部;及該些第二負極格子板沿水平方向配置於該電解研磨物件的該電解研磨部,沿著與該些第一負極格子板的交叉方向,在形成該放置空間的同時排列,與該些第一負極格子板組裝成一格子形。 The electrolytic grinding device as claimed in claim 2, wherein in the modular lattice-shaped negative plate: The first negative grid plates are arranged in a vertical direction on the electrolytic grinding part; and the second negative grid plates are arranged on the electrolytic grinding part of the electrolytic grinding object in a horizontal direction, along with the first negative electrodes The cross directions of the grid plates are arranged while forming the placement space, and are assembled into a grid shape with the first negative electrode grid plates. 如請求項1所述的電解研磨裝置,其中該電解研磨物件以圓筒形形成,在該圓筒形電解研磨物件的外部包括該電解研磨部,該模組化的晶格形負極板是包括直線形的複數第一負極格子板及結合於該些第一負極格子板的圓形的複數第二負極格子板。 The electrolytic grinding device of claim 1, wherein the electrolytic grinding object is formed in a cylindrical shape, the electrolytic grinding part is included outside the cylindrical electrolytic grinding object, and the modular lattice-shaped negative plate includes A plurality of linear first negative grid plates and a plurality of circular second negative grid plates combined with the first negative grid plates. 如請求項4所述的電解研磨裝置,其中在該圓筒形電解研磨物件的上部安裝有圓形框架、四邊框架或多邊框架形狀的一輔助固定架。 The electrolytic grinding device according to claim 4, wherein an auxiliary fixing frame in the shape of a circular frame, a quadrilateral frame or a polygonal frame is installed on the upper part of the cylindrical electrolytic grinding object. 如請求項4所述的電解研磨裝置,其中該些第一負極格子板與該些第二負極格子板以直線形或圓形形成。 The electrolytic polishing device of claim 4, wherein the first negative grid plates and the second negative grid plates are formed in a straight line or a circle. 如請求項6所述的電解研磨裝置,其中該些第一負極格子板和該些第二負極格子板利用鉚釘(Rivet)、螺栓(Bolt)或焊接中某一種結合並實現模組化。 The electrolytic polishing device according to claim 6, wherein the first negative electrode grid plates and the second negative electrode grid plates are combined by any one of rivets, bolts, or welding to realize modularization. 如請求項1所述的電解研磨裝置,其中在該電解研磨物件的內部和外部的該等電解研磨部分別配置的該等負極板相互電氣連接。 The electrolytic polishing apparatus according to claim 1, wherein the negative electrode plates respectively arranged in the electrolytic polishing parts inside and outside the electrolytic polishing object are electrically connected to each other. 如請求項1所述的電解研磨裝置,其中該負極放置固定架附著有:一板材;及一絕緣板,其在所述板材的兩面,由橡膠、聚氨酯、PVC或膠木(Bakelite)中某一者構成。 The electrolytic grinding device according to claim 1, wherein the negative electrode placement fixing frame is attached with: a plate; and an insulating plate, which is made of rubber, polyurethane, PVC or bakelite on both sides of the plate. one constitutes.
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