TWI758170B - Powder atomic layer deposition device with vibration unit - Google Patents

Abstract

The invention provides a powder atomic layer deposition device with vibration unit, which includes a vacuum chamber, a shaft sealing device, a driving unit and a vibration unit. The driving unit is connected to the back wall of the vacuum chamber through the shaft sealing device, and drives the vacuum chamber to rotate. The shaft sealing device includes an outer tube body and an inner tube body, wherein the inner tube body is arranged in the accommodating space of the outer tube body. At least one air extraction line and at least one air intake line are located in the inner tube. The air extraction line is used to extract gas in a reaction space of the vacuum chamber, and the air intake line is used to transport a precursor to the reaction space. The vibration unit is adjacent to the back wall or side wall of the vacuum chamber and is used to knock the back wall or side wall of the vacuum chamber to prevent the powders in the reaction space from sticking to the inner surface of the vacuum chamber.

Description

Vibrating Powder Atomic Layer Deposition Device

The invention relates to a vibrating powder atomic layer deposition device, comprising a vibrating device adjacent to the rear wall or side wall of the vacuum chamber, and used for knocking the rear wall or side wall of the vacuum chamber to avoid the powder in the vacuum chamber from being stained sticky.

Nanoparticles are generally defined as particles smaller than 100 nanometers in at least one dimension that are physically and chemically distinct from macroscopic substances. In general, the physical properties of macroscopic substances are independent of their size, but this is not the case for nanoparticles, which have potential applications in fields such as biomedicine, optics, and electronics.

Quantum Dot (Quantum Dot) is a semiconductor nanoparticle. The currently studied semiconductor materials are II-VI materials, such as ZnS, CdS, CdSe, etc., among which CdSe is the most attention. The size of quantum dots is usually between 2 and 50 nanometers. When the quantum dots are irradiated with ultraviolet light, the electrons in the quantum dots absorb energy and transition from the valence band to the conduction band. Excited electrons release energy by emitting light as they travel from the conduction band back to the valence band.

The energy gap of quantum dots is related to the size. The larger the size of the quantum dot, the smaller the energy gap, and it will emit light with a longer wavelength after irradiation. The smaller the size of the quantum dot, the larger the energy gap, and the wavelength will be emitted after irradiation. shorter light. For example, quantum dots of 5 to 6 nanometers will emit orange or red light, while quantum dots of 2 to 3 nanometers will emit blue or green light, of course, the light color depends on the material composition of the quantum dots.

Light emitting diodes (LEDs) using quantum dots can produce light close to a continuous spectrum, and at the same time have high color rendering properties, which is beneficial to improve the luminous quality of light emitting diodes. In addition, the wavelength of the emitted light can be adjusted by changing the size of the quantum dots, making the quantum dots become the focus of the development of the new generation of light-emitting devices and displays.

Although quantum dots have the above-mentioned advantages and characteristics, they are prone to agglomeration in the process of application or manufacture. In addition, quantum dots have high surface activity and easily react with air and water vapor, thereby shortening the life of quantum dots.

Specifically, when quantum dots are used as sealants for light-emitting diodes, agglomeration effects may occur, which reduce the optical properties of quantum dots. In addition, after the quantum dots are made into the sealant of the light-emitting diodes, the external oxygen or moisture may still pass through the sealant and contact the surface of the quantum dots, resulting in oxidation of the quantum dots and affecting the quantum dots and light-emitting diodes. performance or service life. Surface defects and dangling bonds of quantum dots may also cause nonradiative recombination, which also affects the luminous efficiency of quantum dots.

At present, the industry mainly uses atomic layer deposition (ALD) to form a nanometer-thick film on the surface of the quantum dot, or to form a multi-layer film on the surface of the quantum dot to form a quantum well structure.

Atomic layer deposition can form a thin film with uniform thickness on the substrate, and can effectively control the thickness of the thin film. It is also suitable for three-dimensional quantum dots in theory. When the quantum dots are placed on the carrier plate, there will be contact points between adjacent quantum dots, so that the precursor of atomic layer deposition cannot contact these contact points, and it is impossible to form uniform thickness on the surface of all nanoparticles. film.

In order to solve the above-mentioned problems faced by the prior art, the present invention proposes a vibrating powder atomic layer deposition device, which mainly includes a vibrating device on the rear wall or side wall of the vacuum chamber, and knocks the rear wall or side wall of the vacuum chamber through the vibrating device. , so that the inner surface of the vacuum chamber vibrates, so as to shake off the powder adhering to the inner surface of the vacuum chamber during the deposition process.

An object of the present invention is to provide a vibrating powder atomic layer deposition device, which mainly includes a driving unit, a shaft sealing device, a vacuum chamber and a vibrating device, wherein the driving unit is connected to a rear part of the vacuum chamber through the shaft sealing device wall. The vibrating device is adjacent to the rear wall of the vacuum chamber, wherein the vibrating device is used for knocking the rear wall or the side wall of the vacuum chamber to make the vacuum chamber vibrate, so as to remove the powder adhering to the inner surface of the vacuum chamber.

Generally speaking, in the process of atomic layer deposition of powder, it may not be possible to form a uniform film on the surface of the powder adhered to the vacuum chamber, thereby affecting the yield, life and performance of the powder. Therefore, the present invention proposes to knock the rear wall or side wall of the vacuum chamber through a vibrating device, so as to prevent powder from sticking to the inner surface of the vacuum chamber.

In order to achieve the above object, the present invention provides a vibrating powder atomic layer deposition device, comprising: a vacuum chamber, including a front wall, a rear wall and a side wall, the front wall faces the rear wall, and the front wall is connected through the side wall The rear wall, wherein a reaction space is formed between the front wall, the rear wall and the side wall, and the reaction space is used for accommodating a plurality of powders; a shaft sealing device is connected to the rear wall of the vacuum cavity, and includes an outer tube body and an inner tube The outer tube body has an accommodating space for accommodating the inner tube body; a driving unit is connected to the shaft sealing device, and drives the vacuum cavity to rotate through the shaft sealing device; at least one air suction line is located in the inner tube body, The reaction space of the vacuum chamber is fluidly connected and used to extract a gas in the reaction space; at least one intake line is located in the inner tube and is fluidly connected to the vacuum chamber. The reaction space is used to deliver a precursor gas to the reaction space; and a vibration device is adjacent to the rear wall or side wall of the vacuum chamber and used to knock the rear wall or side wall of the vacuum chamber.

The vibrating powder atomic layer deposition device, wherein the vibrating device comprises a motor and a knocking part, the motor is connected to the knocking part, and drives the knocking part to knock the rear wall or side wall of the vacuum chamber.

In the vibration type powder atomic layer deposition device, the vibration device includes a buffer part connected to the knocking part, and the knocking part knocks the rear wall or the side wall of the vacuum chamber through the buffer part.

The vibrating powder atomic layer deposition device, wherein the gas inlet pipeline includes at least one non-reactive gas delivery pipeline and at least one reactive gas delivery pipeline, and the non-reactive gas delivery pipeline is used to deliver a non-reactive gas to the reaction space for blowing The powder in the reaction space is moved, and the reaction gas delivery line is used to deliver the precursor gas to the reaction space.

In the vibration-type powder atomic layer deposition device, the non-reactive gas conveying line includes an extension line, and the extension line is located in the reaction space and extends toward the front wall of the vacuum chamber.

The vibration type powder atomic layer deposition device includes a filter unit located at one end of the inner tube body connected to the reaction space, the suction line is fluidly connected to the reaction space through the filter unit, and the extension line passes through the filter unit.

In the vibration type powder atomic layer deposition device, the extension pipeline includes at least one air outlet facing the front wall or side wall of the vacuum chamber.

In the vibration type powder atomic layer deposition device, the inner tube body extends from the accommodating space of the outer tube body to the reaction space of the vacuum chamber, and a protruding tube portion is formed in the reaction space.

The vibration type powder atomic layer deposition device includes a heating unit adjacent to the side wall of the vacuum chamber, and used for heating the powder in the vacuum chamber.

In the vibration-type powder atomic layer deposition device, the air inlet pipeline is used for delivering a non-reactive gas to the reaction space, and blowing the powder in the reaction space with the non-reactive gas.

10: Vibration powder atomic layer deposition device

11: Vacuum chamber

111: Front Wall

113: Back Wall

115: Sidewall

117: Cover

119: cavity

12: Reaction Space

121: Powder

13: Shaft seal device

130: protruding pipe

131: outer tube body

132: accommodating space

133: inner tube body

134: Connect Space

139: Filter unit

14: Vibration device

141: Motor

143: Percussion Department

145: Buffer

15: Drive unit

16: Heating device

171: Exhaust line

172: Extension Line

1721: Air outlet

173: Intake line

175: Non-reactive gas delivery line

177: Heater

179: Temperature Sensing Unit

191: Bearing Department

193: First Support Frame

195: Second support frame

1 is a schematic perspective view of an embodiment of the vibratory powder atomic layer deposition apparatus of the present invention.

2 is a schematic cross-sectional view of an embodiment of the vibratory powder atomic layer deposition apparatus of the present invention.

3 is a schematic cross-sectional view of an embodiment of the shaft sealing device of the vibratory powder atomic layer deposition apparatus of the present invention.

4 is a schematic cross-sectional view of another embodiment of the vibratory powder atomic layer deposition apparatus of the present invention.

5 is a schematic cross-sectional view of another embodiment of the vibratory powder atomic layer deposition apparatus of the present invention.

Please refer to FIG. 1 , FIG. 2 and FIG. 3 , which are a schematic three-dimensional view, a schematic cross-sectional view of an embodiment of a vibratory powder atomic layer deposition apparatus and a cross-sectional schematic view of an embodiment of a shaft sealing device of the vibratory powder atomic layer deposition apparatus, respectively. As shown in the figure, the vibratory powder atomic layer deposition apparatus 10 mainly includes a vacuum chamber 11 , a shaft sealing device 13 , a driving unit 15 and a vibrating device 14 , wherein the driving unit 15 is connected to the vacuum chamber 11 through the shaft sealing device 13 . , and drive the vacuum chamber 11 to rotate.

The vacuum chamber 11 includes a front wall 111 , a rear wall 113 and a side wall 115 , wherein the front wall 111 faces the rear wall 113 , and the side wall 115 is located between the front wall 111 and the rear wall 113 and connects the front wall 111 and the rear wall 113 to form a reaction space 12 between the front wall 111 , the rear wall 113 and the side wall 115 .

The reaction space 12 is used to accommodate a plurality of powders 121, wherein the powders 121 can be quantum dots (Quantum Dot), such as II-VI semiconductor materials such as ZnS, CdS, CdSe, and the film formed on the quantum dots can be Dioxide trioxide Aluminum (Al2O3). In an embodiment of the present invention, the vacuum chamber 11 may include a cover plate 117 and a cavity 119 , wherein the cover plate 117 is used to cover and connect the cavity 119 to form the reaction space 12 therebetween. The cover plate 117 can be the front wall 111 of the vacuum chamber 11 , and the chamber 119 is formed by the rear wall 113 and the side wall 115 of the vacuum chamber 11 .

The shaft sealing device 13 is connected to the rear wall 113 of the vacuum chamber 11 , and includes an outer tube body 131 and an inner tube body 133 , wherein the outer tube body 131 has an accommodating space 132 , and the inner tube body 133 has a connecting space 134, for example, the outer tube body 131 and the inner tube body 133 may be hollow cylindrical bodies. The accommodating space 132 of the outer tube body 131 is used for accommodating the inner tube body 133 , wherein the outer tube body 131 and the inner tube body 133 are coaxially arranged. The shaft seal device 13 may be a common shaft seal or a magnetic fluid shaft seal, and is mainly used to isolate the reaction space 12 of the vacuum chamber 11 from the external space, so as to maintain the vacuum of the reaction space 12 .

The driving unit 15 is connected to one end of the shaft sealing device 13 , and the other end of the shaft sealing device 13 is connected to the rear wall 113 of the vacuum chamber 11 . The driving unit 15 drives the vacuum chamber 11 to rotate through the shaft sealing device 13 . In addition, the driving unit 15 is not connected to the inner tube body 133 , so when the driving unit 15 drives the outer tube body 131 and the vacuum chamber 11 to rotate, the inner tube body 133 will not rotate along with it.

The driving unit 15 can drive the outer tube body 131 and the vacuum chamber 11 to continuously rotate in the same direction, for example, clockwise or counterclockwise. In different embodiments, the driving unit 15 can drive the outer tube 131 and the vacuum chamber 11 to rotate clockwise by a specific angle, and then rotate counterclockwise by a specific angle, for example, the specific angle can be 360 degrees. When the vacuum chamber 11 rotates, the powder 121 in the reaction space 12 is stirred, so that the powder 121 is heated evenly and contacted with the precursor or the non-reactive gas.

The connecting space 134 of the inner pipe body 133 may be provided with at least one air extraction line 171, at least one air intake line 173, at least one non-reactive gas delivery line 175, a heater 177 and/or a temperature sensing unit 179, as shown in the figure 2 and Figure 3.

The pumping line 171 is fluidly connected to the reaction space 12 of the vacuum chamber 11, and is used for pumping out the gas in the reaction space 12, so that the reaction space 12 is in a vacuum state, so that the atomic layer deposition process can be performed. Specifically, the pumping line 171 can be connected to a pump, and the gas in the reaction space 12 can be pumped out through the pump.

The gas inlet line 173 is fluidly connected to the reaction space 12 of the vacuum chamber 11, and is used for delivering a precursor and/or a non-reactive gas to the reaction space 12, wherein the non-reactive gas can be an inert gas such as nitrogen or argon. In practical applications, the gas inlet line 173 may transport a carrier gas and the precursor into the reaction space 12 together. In addition, the gas inlet line 173 can also transport the non-reactive gas into the reaction space 12 , and the gas is pumped through the gas extraction line 171 to remove the precursor in the reaction space 12 . In an embodiment of the present invention, the inlet line 173 can be connected to a plurality of branch lines, and different precursors are sequentially transported into the reaction space 12 through each branch line.

The inlet line 173 can increase the flow rate of the non-reactive gas delivered to the reaction space 12 , and blow the powder 121 in the reaction space 12 through the non-reactive gas, so that the powder 121 is driven by the non-reactive gas and diffuses into the reaction space 12 . various regions.

In an embodiment of the present invention, the gas inlet line 173 may include at least one non-reactive gas delivery line 175 and at least one reactive gas delivery line. The non-reactive gas delivery line 175 is fluidly connected to the reaction space 12 of the vacuum chamber 11 and used to deliver a non-reactive gas to the reaction space 12 . The non-reactive gas is used to blow the powder 121 in the reaction space 12 , and cooperates with the driving unit 15 to drive the vacuum chamber 11 to rotate, which can effectively and uniformly stir the powder 121 in the reaction space 12 and deposit thickness on the surface of each powder 121 uniform film. The reaction gas delivery line is fluidly connected to the reaction space 12 and used to deliver the precursor to the reaction space 12 .

The vacuum chamber 11 is driven to rotate by the drive unit 15 through the shaft sealing device 13 , and the non-reactive gas is delivered to the reaction space 12 through the air inlet line 173 , although the powder 121 in the reaction space 12 can be stirred. However, in practical application, a certain amount of powder 121 still sticks to the inner surface of the vacuum chamber 11 , so that the precursor delivered to the reaction space 12 cannot contact the powder 121 stuck on the vacuum chamber 11 , and thus cannot A thin film of uniform thickness is formed on the surfaces of all the powders 121 .

In order to solve the above problems and the problems faced by the prior art, the present invention proposes to dispose a vibration device 14 on the side of the rear wall 113 or the side wall 115 of the vacuum chamber 11 , wherein the vibration device 14 is connected to the rear wall 113 or the side wall 115 of the vacuum chamber 11 . adjacent to each other and used to knock the rear wall 113 or the side wall 115 of the vacuum chamber 11 .

When the vibration device 14 strikes the rear wall 113 or the side wall 115 of the vacuum chamber 11 , the vacuum chamber 11 will vibrate, so that the adhered powder 121 leaves the inner surface of the vacuum chamber 11 and is scattered on the vacuum chamber 11 . in the reaction space 12 .

Specifically, through the arrangement of the driving unit 15 , the air intake line 173 and the vibration device 14 , the problem of the powder 121 sticking to the vacuum chamber 11 can be effectively solved, and it is beneficial to form a uniform thickness on the surface of most of the powder 121 . film.

In an embodiment of the present invention, the vibration device 14 includes a motor 141 and a knocking part 143 , wherein the motor 141 is connected to and drives the knocking part 143 to knock on the rear wall 113 or the side wall 115 of the vacuum chamber 11 . In addition, a buffer portion 145 may be provided on the knocking portion 143 , wherein the knocking portion 143 knocks the rear wall 113 or the side wall 115 of the vacuum chamber 11 through the buffer portion 145 to prevent the vacuum chamber from being caused by the knocking of the vacuum chamber 11 . For damage to the body 11 and/or the vibration device 14, for example, the buffer portion 145 may be a rubber pad.

In an embodiment of the present invention, as shown in FIG. 2 , the vibration device 14 is adjacent to the side wall 115 of the vacuum chamber 11 and used to knock the side wall 115 of the vacuum chamber 11 . In different embodiments, as shown in FIG. 4 , the vibration device 14 is adjacent to the rear wall 113 of the vacuum chamber 11 and used to knock the rear wall 113 of the vacuum chamber 111 .

The vibrating device 14 of the present invention is adjacent to the side wall 115 or the rear wall 113 of the vacuum chamber 11 , and does not interfere with the moving line of disassembling or installing the vacuum chamber 11 and/or the cover plate 117 , and is beneficial to simplify the vibrating powder atom. Design and configuration of layer deposition apparatus 10 .

The air inlet line 173 and the non-reactive gas delivery line 175 of the vibratory powder atomic layer deposition apparatus 10 are both used to deliver the non-reactive gas to the reaction space 12 , wherein the flow rate of the non-reactive gas delivered by the gas inlet line 173 is small, mainly used for In order to remove the precursor in the reaction space 12 , the flow rate of the non-reactive gas conveyed by the non-reactive gas delivery line 175 is relatively large, and is mainly used to blow the powder 121 in the reaction space 12 .

Specifically, the time points at which the gas inlet line 173 and the non-reactive gas delivery line 175 deliver the non-reactive gas to the reaction space 12 are different, so the non-reactive gas may not be provided in practical applications Line 175 is delivered, and the flow of non-reactive gas delivered by inlet line 173 at different time points is adjusted. When the precursor in the reaction space 12 is to be removed, the flow rate of the non-reactive gas delivered to the reaction space 12 by the gas inlet line 173 can be reduced, and when the powder 121 in the reaction space 12 is to be blown, the gas flow rate of the gas inlet pipe 173 can be increased. Flow rate of non-reactive gas to reaction space 12 .

When the driving unit 15 of the present invention drives the outer tube body 131 and the vacuum chamber 11 to rotate, the inner tube body 133 and its internal air extraction line 171 , air intake line 173 and/or non-reactive gas delivery line 175 will not rotate along with it. , which is beneficial to improve the stability of the non-reactive gas and/or the precursor delivered to the reaction space 12 by the gas inlet line 173 and/or the non-reactive gas delivery line 175 .

The heater 177 is used for heating the connecting space 134 and the inner pipe body 133, and heating the gas extraction line 171, the gas inlet line 173 and/or the non-reactive gas delivery line 175 in the inner pipe body 133, so as to improve the The temperature of the gas in the gas line 173 and/or the non-reactive gas delivery line 175. The temperature sensing unit 179 is used to measure the temperature of the heater 177 or the connection space 134 to know the working state of the heater 177 .

A filter unit 139 may be provided at one end of the inner tube body 133 connected to the reaction space 12 , wherein the suction line 171 , the gas inlet line 173 and/or the non-reaction gas delivery line 175 in the inner tube body 133 are fluidly connected to the vacuum chamber through the filter unit 139 The reaction space 12 of the body 11 .

The gas extraction line 171 is connected to the reaction space 12 through the filter unit 139 , which can prevent the powder 121 in the reaction space 12 from being extracted together when the gas extraction line 171 extracts the gas in the reaction space 12 , thereby reducing the loss of the powder 121 .

In an embodiment of the present invention, as shown in FIG. 4 , the inlet line 173 and/or the non-reactive gas delivery line 175 can extend from the connection space 134 of the inner tube body 133 of the shaft sealing device 13 to the reaction space of the vacuum chamber 11 12, wherein the inlet line 173 and/or non-reacting gas extending to the reaction space 12 Body delivery line 175 may be defined as an extension line 172 . The extension line 172 may pass through the filter unit 139 and extend to the reaction space 12 . In addition, a heating device 16 can be disposed inside, outside or around the vacuum chamber 11 , wherein the heating device 16 is adjacent to or in contact with the side wall 115 of the vacuum chamber 11 and used to heat the vacuum chamber 11 and the reaction space 12 .

In an embodiment of the present invention, the inlet line 173 , the non-reactive gas delivery line 175 and/or the extension line 172 located in the reaction space 12 extend toward the direction of the front wall 111 of the vacuum chamber 11 . In different embodiments, the inlet line 173 , the non-reactive gas delivery line 175 and/or the extension line 172 in the reaction space 12 can also be bent toward the side wall 115 and/or the rear wall 113 of the vacuum chamber 11 and extend. In addition, the extension line 172 may include at least one air outlet 1721 , wherein the air outlet 1721 faces the front wall 111 and/or the side wall 115 of the vacuum chamber.

In another embodiment of the present invention, the extension line 172 can continuously deliver the non-reactive gas to the reaction space 12, and the flow rate of the non-reactive gas can be adjusted. Specifically, the modes for outputting the non-reactive gas from the extension line 172 may include an agitation mode and a general mode. In the agitation mode, the flow rate of the non-reactive gas output from the extension line 172 is relatively large, and the output non-reactive gas can stir the interior of the reaction space 12 . of powder 121. In the normal mode, the flow rate of the non-reactive gas output from the extension line 172 is small, and may not be able to agitate the powder 121 in the reaction space 12 , but in the normal mode, the non-reactive gas output from the extension line 172 will form a positive pressure at the outlet 1721 of the extension line 172 , so as to prevent the powder 121 from entering the extension line 172 from the air outlet 1721 .

In an embodiment of the present invention, the vibratory powder atomic layer deposition apparatus 10 may include a bearing portion 191 for bearing the driving unit 15 , the vacuum chamber 11 , the shaft sealing device 13 and/or the vibration device 14 . For example, the bearing portion 191 is connected to the driving unit 15 , the vacuum chamber 11 is connected to the bearing portion 191 through at least one first support frame 193 , and the vibration device 14 is connected to the bearing portion 191 through at least one second support frame 195 .

In an embodiment of the present invention, as shown in FIG. 5 , the inner tube body 133 of the shaft sealing device 13 can extend from the accommodating space 132 of the outer tube body 131 to the reaction space 12 of the vacuum chamber 11 , so that the inner tube body 133 is at A protruding pipe portion 130 is formed in the reaction space 12 .

The above description is only a preferred embodiment of the present invention, and is not intended to limit the scope of the present invention. Modifications should be included within the scope of the patent application of the present invention.

10: Vibration powder atomic layer deposition device

11: Vacuum chamber

14: Vibration device

15: Drive unit

16: Heating device

191: Bearing Department

193: First Support Frame

195: Second support frame

Claims (8)

A vibrating powder atomic layer deposition device, comprising: a vacuum chamber, comprising a front wall, a rear wall and a side wall, the front wall faces the rear wall, and the front wall is connected to the rear wall through the side wall, wherein A reaction space is formed between the front wall, the rear wall and the side wall, and the reaction space is used for accommodating a plurality of powders; a shaft sealing device is connected to the rear wall of the vacuum chamber, and includes an outer tube body and an inner tube body, wherein the outer tube body has an accommodating space for accommodating the inner tube body; a driving unit is connected to the shaft sealing device, and drives the vacuum cavity to rotate through the shaft sealing device; at least one air extraction pipeline, located in the inner tube body, fluidly connected to the reaction space of the vacuum chamber, and used to extract a gas in the reaction space; at least one intake line, located in the inner tube body, fluidly connected to the reaction space of the vacuum chamber , and is used to deliver a precursor gas to the reaction space, wherein the inlet line includes at least one non-reactive gas delivery pipeline and at least one reactive gas delivery pipeline, and the non-reactive gas delivery pipeline is used to deliver a non-reactive gas to the The reaction space is used to blow the powder in the reaction space, and the reaction gas delivery line is used to deliver the precursor gas to the reaction space, wherein the non-reaction gas delivery line includes an extension line, and the extension line is located in the reaction space. in the reaction space and extending toward the direction of the front wall of the vacuum chamber; and a vibration device, adjacent to the rear wall or the side wall of the vacuum chamber, and used to knock the rear wall of the vacuum chamber or the side wall. The vibrating powder atomic layer deposition device as claimed in claim 1, wherein the vibrating device comprises a motor and a knocking portion, the motor is connected to the knocking portion, and drives the knocking portion to knock the portion of the vacuum chamber. the rear wall or the side wall. The vibrating powder atomic layer deposition device according to claim 2, wherein the vibrating device comprises a buffer portion connected to the knocking portion, and the knocking portion knocks the rear wall or the side wall of the vacuum chamber via the buffer portion . The vibrating powder atomic layer deposition apparatus as claimed in claim 1, comprising a filter unit located at one end of the inner pipe body connected to the reaction space, the suction line fluidly connected to the reaction space through the filter unit, and the extension line passing through through the filter unit. The vibratory powder atomic layer deposition apparatus according to claim 1, wherein the extension pipeline includes at least one air outlet facing the direction of the front wall or the side wall of the vacuum chamber. The vibratory powder atomic layer deposition apparatus as claimed in claim 1, comprising a heating unit adjacent to the side wall of the vacuum chamber for heating the powder in the vacuum chamber. The vibratory powder atomic layer deposition apparatus as claimed in claim 1, wherein the gas inlet line is used for delivering a non-reactive gas to the reaction space, and blowing the powder in the reaction space with the non-reactive gas. A vibrating powder atomic layer deposition device, comprising: a vacuum chamber, comprising a front wall, a rear wall and a side wall, the front wall faces the rear wall, and the front wall is connected to the rear wall through the side wall, wherein A reaction space is formed between the front wall, the rear wall and the side wall, and the reaction space is used for accommodating a plurality of powders; a shaft sealing device is connected to the rear wall of the vacuum chamber, and includes an outer tube body and an inner tube body, wherein the outer tube body has an accommodating space for accommodating the inner tube body, wherein the inner tube body extends from the accommodating space of the outer tube body to the reaction space of the vacuum chamber, and in the A protruding pipe portion is formed in the reaction space; a driving unit is connected to the shaft sealing device, and drives the vacuum cavity to rotate through the shaft sealing device; At least one suction line, located in the inner tube, is fluidly connected to the reaction space of the vacuum chamber, and used to extract a gas in the reaction space; at least one intake line is located in the inner tube and fluidly connected to the vacuum The reaction space of the cavity is used to deliver a precursor gas to the reaction space; and a vibration device is adjacent to the rear wall or the side wall of the vacuum cavity and used to knock the vacuum cavity. the rear wall or the side wall.

Images