TWI742275B - Water-based metal surface treatment agent, metal material with substrate treatment layer and manufacturing method thereof - Google Patents
Water-based metal surface treatment agent, metal material with substrate treatment layer and manufacturing method thereof Download PDFInfo
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- TWI742275B TWI742275B TW107115656A TW107115656A TWI742275B TW I742275 B TWI742275 B TW I742275B TW 107115656 A TW107115656 A TW 107115656A TW 107115656 A TW107115656 A TW 107115656A TW I742275 B TWI742275 B TW I742275B
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- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 title claims abstract description 94
- 229910052751 metal Inorganic materials 0.000 title claims abstract description 65
- 239000002184 metal Substances 0.000 title claims abstract description 65
- 239000012756 surface treatment agent Substances 0.000 title claims abstract description 59
- 239000007769 metal material Substances 0.000 title claims abstract description 46
- 238000004519 manufacturing process Methods 0.000 title claims description 55
- 239000000758 substrate Substances 0.000 title claims description 22
- 229920002803 thermoplastic polyurethane Polymers 0.000 claims abstract description 57
- 150000001875 compounds Chemical class 0.000 claims abstract description 45
- 238000000576 coating method Methods 0.000 claims abstract description 44
- 239000011248 coating agent Substances 0.000 claims abstract description 38
- 229910052731 fluorine Inorganic materials 0.000 claims abstract description 12
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 claims abstract description 11
- 239000011737 fluorine Substances 0.000 claims abstract description 11
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims abstract description 9
- 229910052719 titanium Inorganic materials 0.000 claims abstract description 9
- 239000010936 titanium Substances 0.000 claims abstract description 9
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 claims abstract description 8
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims abstract description 8
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 claims abstract description 8
- 229910052796 boron Inorganic materials 0.000 claims abstract description 8
- 229910052710 silicon Inorganic materials 0.000 claims abstract description 8
- 239000010703 silicon Substances 0.000 claims abstract description 8
- 229910052726 zirconium Inorganic materials 0.000 claims abstract description 8
- -1 tertiary amine compound Chemical class 0.000 claims description 67
- 150000002009 diols Chemical class 0.000 claims description 64
- 229920005862 polyol Polymers 0.000 claims description 61
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 60
- 150000003077 polyols Chemical class 0.000 claims description 57
- 229920005989 resin Polymers 0.000 claims description 48
- 239000011347 resin Substances 0.000 claims description 48
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims description 44
- 239000005056 polyisocyanate Substances 0.000 claims description 41
- 229920001228 polyisocyanate Polymers 0.000 claims description 41
- 125000002947 alkylene group Chemical group 0.000 claims description 36
- 239000002253 acid Substances 0.000 claims description 31
- 125000000217 alkyl group Chemical group 0.000 claims description 29
- 239000003795 chemical substances by application Substances 0.000 claims description 29
- 150000003839 salts Chemical class 0.000 claims description 24
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 23
- 239000000377 silicon dioxide Substances 0.000 claims description 22
- 238000000034 method Methods 0.000 claims description 18
- 239000012948 isocyanate Substances 0.000 claims description 14
- 230000015572 biosynthetic process Effects 0.000 claims description 12
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 claims description 10
- 150000002513 isocyanates Chemical class 0.000 claims description 10
- 125000004103 aminoalkyl group Chemical group 0.000 claims description 9
- 239000003822 epoxy resin Substances 0.000 claims description 9
- 125000002768 hydroxyalkyl group Chemical group 0.000 claims description 9
- 229920000647 polyepoxide Polymers 0.000 claims description 9
- 239000003431 cross linking reagent Substances 0.000 claims description 8
- 150000002736 metal compounds Chemical class 0.000 claims description 8
- 150000003377 silicon compounds Chemical class 0.000 claims description 8
- 239000003973 paint Substances 0.000 claims description 7
- 239000004925 Acrylic resin Substances 0.000 claims description 6
- ORILYTVJVMAKLC-UHFFFAOYSA-N adamantane Chemical group C1C(C2)CC3CC1CC2C3 ORILYTVJVMAKLC-UHFFFAOYSA-N 0.000 claims description 6
- 239000005011 phenolic resin Substances 0.000 claims description 6
- 229920001225 polyester resin Polymers 0.000 claims description 6
- 239000004645 polyester resin Substances 0.000 claims description 6
- 229920000178 Acrylic resin Polymers 0.000 claims description 5
- 239000006087 Silane Coupling Agent Substances 0.000 claims description 5
- 229910052782 aluminium Inorganic materials 0.000 claims description 5
- 229920005672 polyolefin resin Polymers 0.000 claims description 5
- 229910052720 vanadium Inorganic materials 0.000 claims description 5
- 150000001718 carbodiimides Chemical class 0.000 claims description 4
- 229910052804 chromium Inorganic materials 0.000 claims description 4
- 229910052759 nickel Inorganic materials 0.000 claims description 4
- YOYLLRBMGQRFTN-SMCOLXIQSA-N norbuprenorphine Chemical compound C([C@@H](NCC1)[C@]23CC[C@]4([C@H](C3)C(C)(O)C(C)(C)C)OC)C3=CC=C(O)C5=C3[C@@]21[C@H]4O5 YOYLLRBMGQRFTN-SMCOLXIQSA-N 0.000 claims description 4
- 229920006122 polyamide resin Polymers 0.000 claims description 4
- 229920002050 silicone resin Polymers 0.000 claims description 4
- 229910052718 tin Inorganic materials 0.000 claims description 4
- IMSODMZESSGVBE-UHFFFAOYSA-N 2-Oxazoline Chemical compound C1CN=CO1 IMSODMZESSGVBE-UHFFFAOYSA-N 0.000 claims description 3
- 229910052748 manganese Inorganic materials 0.000 claims description 3
- 229910052750 molybdenum Inorganic materials 0.000 claims description 3
- DXIGZHYPWYIZLM-UHFFFAOYSA-J tetrafluorozirconium;dihydrofluoride Chemical compound F.F.F[Zr](F)(F)F DXIGZHYPWYIZLM-UHFFFAOYSA-J 0.000 claims description 3
- 229910052721 tungsten Inorganic materials 0.000 claims description 3
- 229910052725 zinc Inorganic materials 0.000 claims description 3
- NOWKCMXCCJGMRR-UHFFFAOYSA-N Aziridine Chemical compound C1CN1 NOWKCMXCCJGMRR-UHFFFAOYSA-N 0.000 claims description 2
- 229910052789 astatine Inorganic materials 0.000 claims description 2
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 claims 2
- 229910052742 iron Inorganic materials 0.000 claims 1
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 claims 1
- 239000000126 substance Substances 0.000 abstract description 25
- 238000012545 processing Methods 0.000 abstract description 16
- 238000005260 corrosion Methods 0.000 abstract description 12
- 230000007797 corrosion Effects 0.000 abstract description 10
- 238000004381 surface treatment Methods 0.000 abstract description 8
- JOYRKODLDBILNP-UHFFFAOYSA-N Ethyl urethane Chemical compound CCOC(N)=O JOYRKODLDBILNP-UHFFFAOYSA-N 0.000 description 49
- 239000010410 layer Substances 0.000 description 40
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 33
- 125000004433 nitrogen atom Chemical group N* 0.000 description 29
- 239000002585 base Substances 0.000 description 26
- 229910052757 nitrogen Inorganic materials 0.000 description 26
- 150000003512 tertiary amines Chemical class 0.000 description 21
- MTHSVFCYNBDYFN-UHFFFAOYSA-N diethylene glycol Chemical compound OCCOCCO MTHSVFCYNBDYFN-UHFFFAOYSA-N 0.000 description 20
- 239000000049 pigment Substances 0.000 description 19
- 229910000831 Steel Inorganic materials 0.000 description 17
- 239000010959 steel Substances 0.000 description 17
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 16
- 238000001035 drying Methods 0.000 description 16
- 238000012360 testing method Methods 0.000 description 16
- DNIAPMSPPWPWGF-UHFFFAOYSA-N Propylene glycol Chemical compound CC(O)CO DNIAPMSPPWPWGF-UHFFFAOYSA-N 0.000 description 15
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 14
- 238000011156 evaluation Methods 0.000 description 14
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 13
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 13
- 229920000768 polyamine Polymers 0.000 description 12
- 239000002904 solvent Substances 0.000 description 12
- 238000006243 chemical reaction Methods 0.000 description 11
- NLYAJNPCOHFWQQ-UHFFFAOYSA-N kaolin Chemical compound O.O.O=[Al]O[Si](=O)O[Si](=O)O[Al]=O NLYAJNPCOHFWQQ-UHFFFAOYSA-N 0.000 description 11
- 238000003786 synthesis reaction Methods 0.000 description 11
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 10
- WNLRTRBMVRJNCN-UHFFFAOYSA-N adipic acid Chemical compound OC(=O)CCCCC(O)=O WNLRTRBMVRJNCN-UHFFFAOYSA-N 0.000 description 10
- IQPQWNKOIGAROB-UHFFFAOYSA-N isocyanate group Chemical group [N-]=C=O IQPQWNKOIGAROB-UHFFFAOYSA-N 0.000 description 10
- BDAGIHXWWSANSR-UHFFFAOYSA-N methanoic acid Natural products OC=O BDAGIHXWWSANSR-UHFFFAOYSA-N 0.000 description 10
- 238000002156 mixing Methods 0.000 description 10
- 239000003960 organic solvent Chemical class 0.000 description 10
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 9
- KKEYFWRCBNTPAC-UHFFFAOYSA-N Terephthalic acid Chemical compound OC(=O)C1=CC=C(C(O)=O)C=C1 KKEYFWRCBNTPAC-UHFFFAOYSA-N 0.000 description 8
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 8
- QSWDMMVNRMROPK-UHFFFAOYSA-K chromium(3+) trichloride Chemical compound [Cl-].[Cl-].[Cl-].[Cr+3] QSWDMMVNRMROPK-UHFFFAOYSA-K 0.000 description 8
- 150000002148 esters Chemical class 0.000 description 8
- WGCNASOHLSPBMP-UHFFFAOYSA-N hydroxyacetaldehyde Natural products OCC=O WGCNASOHLSPBMP-UHFFFAOYSA-N 0.000 description 8
- QQVIHTHCMHWDBS-UHFFFAOYSA-N isophthalic acid Chemical compound OC(=O)C1=CC=CC(C(O)=O)=C1 QQVIHTHCMHWDBS-UHFFFAOYSA-N 0.000 description 8
- XNGIFLGASWRNHJ-UHFFFAOYSA-N phthalic acid Chemical compound OC(=O)C1=CC=CC=C1C(O)=O XNGIFLGASWRNHJ-UHFFFAOYSA-N 0.000 description 8
- 239000000243 solution Substances 0.000 description 8
- PEDCQBHIVMGVHV-UHFFFAOYSA-N Glycerine Chemical compound OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 description 7
- 150000001412 amines Chemical class 0.000 description 7
- 238000004040 coloring Methods 0.000 description 7
- VAYGXNSJCAHWJZ-UHFFFAOYSA-N dimethyl sulfate Chemical compound COS(=O)(=O)OC VAYGXNSJCAHWJZ-UHFFFAOYSA-N 0.000 description 7
- JEIPFZHSYJVQDO-UHFFFAOYSA-N iron(III) oxide Inorganic materials O=[Fe]O[Fe]=O JEIPFZHSYJVQDO-UHFFFAOYSA-N 0.000 description 7
- 239000000463 material Substances 0.000 description 7
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 7
- 150000007519 polyprotic acids Polymers 0.000 description 7
- 239000007787 solid Substances 0.000 description 7
- FTBATIJJKIIOTP-UHFFFAOYSA-K trifluorochromium Chemical compound F[Cr](F)F FTBATIJJKIIOTP-UHFFFAOYSA-K 0.000 description 7
- 238000005406 washing Methods 0.000 description 7
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 6
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 6
- OAKJQQAXSVQMHS-UHFFFAOYSA-N Hydrazine Chemical compound NN OAKJQQAXSVQMHS-UHFFFAOYSA-N 0.000 description 6
- OFOBLEOULBTSOW-UHFFFAOYSA-N Malonic acid Chemical compound OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 6
- AFVFQIVMOAPDHO-UHFFFAOYSA-N Methanesulfonic acid Chemical compound CS(O)(=O)=O AFVFQIVMOAPDHO-UHFFFAOYSA-N 0.000 description 6
- ALQSHHUCVQOPAS-UHFFFAOYSA-N Pentane-1,5-diol Chemical compound OCCCCCO ALQSHHUCVQOPAS-UHFFFAOYSA-N 0.000 description 6
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 6
- ZJCCRDAZUWHFQH-UHFFFAOYSA-N Trimethylolpropane Chemical compound CCC(CO)(CO)CO ZJCCRDAZUWHFQH-UHFFFAOYSA-N 0.000 description 6
- 239000003513 alkali Substances 0.000 description 6
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 6
- 125000003118 aryl group Chemical group 0.000 description 6
- XXMIOPMDWAUFGU-UHFFFAOYSA-N hexane-1,6-diol Chemical compound OCCCCCCO XXMIOPMDWAUFGU-UHFFFAOYSA-N 0.000 description 6
- 229920001223 polyethylene glycol Polymers 0.000 description 6
- CXMXRPHRNRROMY-UHFFFAOYSA-N sebacic acid Chemical compound OC(=O)CCCCCCCCC(O)=O CXMXRPHRNRROMY-UHFFFAOYSA-N 0.000 description 6
- OSWFIVFLDKOXQC-UHFFFAOYSA-N 4-(3-methoxyphenyl)aniline Chemical compound COC1=CC=CC(C=2C=CC(N)=CC=2)=C1 OSWFIVFLDKOXQC-UHFFFAOYSA-N 0.000 description 5
- VNGLVZLEUDIDQH-UHFFFAOYSA-N 4-[2-(4-hydroxyphenyl)propan-2-yl]phenol;2-methyloxirane Chemical compound CC1CO1.C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 VNGLVZLEUDIDQH-UHFFFAOYSA-N 0.000 description 5
- QGZKDVFQNNGYKY-UHFFFAOYSA-O Ammonium Chemical compound [NH4+] QGZKDVFQNNGYKY-UHFFFAOYSA-O 0.000 description 5
- 239000004970 Chain extender Substances 0.000 description 5
- XDTMQSROBMDMFD-UHFFFAOYSA-N Cyclohexane Chemical compound C1CCCCC1 XDTMQSROBMDMFD-UHFFFAOYSA-N 0.000 description 5
- 239000005057 Hexamethylene diisocyanate Substances 0.000 description 5
- 239000002202 Polyethylene glycol Substances 0.000 description 5
- 239000004721 Polyphenylene oxide Substances 0.000 description 5
- 150000007513 acids Chemical class 0.000 description 5
- 239000001361 adipic acid Substances 0.000 description 5
- 235000011037 adipic acid Nutrition 0.000 description 5
- 125000003277 amino group Chemical group 0.000 description 5
- 125000004432 carbon atom Chemical group C* 0.000 description 5
- 229910021563 chromium fluoride Inorganic materials 0.000 description 5
- 235000019253 formic acid Nutrition 0.000 description 5
- UQSXHKLRYXJYBZ-UHFFFAOYSA-N iron oxide Inorganic materials [Fe]=O UQSXHKLRYXJYBZ-UHFFFAOYSA-N 0.000 description 5
- CRVGTESFCCXCTH-UHFFFAOYSA-N methyl diethanolamine Chemical compound OCCN(C)CCO CRVGTESFCCXCTH-UHFFFAOYSA-N 0.000 description 5
- SLCVBVWXLSEKPL-UHFFFAOYSA-N neopentyl glycol Chemical compound OCC(C)(C)CO SLCVBVWXLSEKPL-UHFFFAOYSA-N 0.000 description 5
- PXHVJJICTQNCMI-UHFFFAOYSA-N nickel Substances [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 5
- 239000004417 polycarbonate Substances 0.000 description 5
- 229920000515 polycarbonate Polymers 0.000 description 5
- 229920005906 polyester polyol Polymers 0.000 description 5
- 229920000570 polyether Polymers 0.000 description 5
- 239000011734 sodium Substances 0.000 description 5
- 238000005507 spraying Methods 0.000 description 5
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 4
- FERIUCNNQQJTOY-UHFFFAOYSA-N Butyric acid Chemical compound CCCC(O)=O FERIUCNNQQJTOY-UHFFFAOYSA-N 0.000 description 4
- 229920000298 Cellophane Polymers 0.000 description 4
- PIICEJLVQHRZGT-UHFFFAOYSA-N Ethylenediamine Chemical compound NCCN PIICEJLVQHRZGT-UHFFFAOYSA-N 0.000 description 4
- VZCYOOQTPOCHFL-OWOJBTEDSA-N Fumaric acid Chemical compound OC(=O)\C=C\C(O)=O VZCYOOQTPOCHFL-OWOJBTEDSA-N 0.000 description 4
- 229910001335 Galvanized steel Inorganic materials 0.000 description 4
- GLUUGHFHXGJENI-UHFFFAOYSA-N Piperazine Chemical compound C1CNCCN1 GLUUGHFHXGJENI-UHFFFAOYSA-N 0.000 description 4
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 4
- 235000011054 acetic acid Nutrition 0.000 description 4
- GZUXJHMPEANEGY-UHFFFAOYSA-N bromomethane Chemical compound BrC GZUXJHMPEANEGY-UHFFFAOYSA-N 0.000 description 4
- WERYXYBDKMZEQL-UHFFFAOYSA-N butane-1,4-diol Chemical compound OCCCCO WERYXYBDKMZEQL-UHFFFAOYSA-N 0.000 description 4
- 239000000539 dimer Substances 0.000 description 4
- XBDQKXXYIPTUBI-UHFFFAOYSA-N dimethylselenoniopropionate Natural products CCC(O)=O XBDQKXXYIPTUBI-UHFFFAOYSA-N 0.000 description 4
- 239000000839 emulsion Substances 0.000 description 4
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 4
- 125000000524 functional group Chemical group 0.000 description 4
- 239000008397 galvanized steel Substances 0.000 description 4
- 238000010438 heat treatment Methods 0.000 description 4
- RRAMGCGOFNQTLD-UHFFFAOYSA-N hexamethylene diisocyanate Chemical compound O=C=NCCCCCCN=C=O RRAMGCGOFNQTLD-UHFFFAOYSA-N 0.000 description 4
- 239000001257 hydrogen Substances 0.000 description 4
- 229910052739 hydrogen Inorganic materials 0.000 description 4
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 4
- JVTAAEKCZFNVCJ-UHFFFAOYSA-N lactic acid Chemical compound CC(O)C(O)=O JVTAAEKCZFNVCJ-UHFFFAOYSA-N 0.000 description 4
- 150000007524 organic acids Chemical class 0.000 description 4
- 235000005985 organic acids Nutrition 0.000 description 4
- 229920000728 polyester Polymers 0.000 description 4
- UAYWVJHJZHQCIE-UHFFFAOYSA-L zinc iodide Chemical compound I[Zn]I UAYWVJHJZHQCIE-UHFFFAOYSA-L 0.000 description 4
- WPSWDCBWMRJJED-UHFFFAOYSA-N 4-[2-(4-hydroxyphenyl)propan-2-yl]phenol;oxirane Chemical compound C1CO1.C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 WPSWDCBWMRJJED-UHFFFAOYSA-N 0.000 description 3
- WEVYAHXRMPXWCK-UHFFFAOYSA-N Acetonitrile Chemical compound CC#N WEVYAHXRMPXWCK-UHFFFAOYSA-N 0.000 description 3
- 229910002012 Aerosil® Inorganic materials 0.000 description 3
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 3
- KXDHJXZQYSOELW-UHFFFAOYSA-M Carbamate Chemical compound NC([O-])=O KXDHJXZQYSOELW-UHFFFAOYSA-M 0.000 description 3
- KXDHJXZQYSOELW-UHFFFAOYSA-N Carbamic acid Chemical compound NC(O)=O KXDHJXZQYSOELW-UHFFFAOYSA-N 0.000 description 3
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 3
- 229910021555 Chromium Chloride Inorganic materials 0.000 description 3
- QMMFVYPAHWMCMS-UHFFFAOYSA-N Dimethyl sulfide Chemical compound CSC QMMFVYPAHWMCMS-UHFFFAOYSA-N 0.000 description 3
- BRLQWZUYTZBJKN-UHFFFAOYSA-N Epichlorohydrin Chemical compound ClCC1CO1 BRLQWZUYTZBJKN-UHFFFAOYSA-N 0.000 description 3
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- CWYNVVGOOAEACU-UHFFFAOYSA-N Fe2+ Chemical compound [Fe+2] CWYNVVGOOAEACU-UHFFFAOYSA-N 0.000 description 3
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 3
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 3
- 229910019142 PO4 Inorganic materials 0.000 description 3
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 3
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 3
- KDYFGRWQOYBRFD-UHFFFAOYSA-N Succinic acid Natural products OC(=O)CCC(O)=O KDYFGRWQOYBRFD-UHFFFAOYSA-N 0.000 description 3
- UWHCKJMYHZGTIT-UHFFFAOYSA-N Tetraethylene glycol, Natural products OCCOCCOCCOCCO UWHCKJMYHZGTIT-UHFFFAOYSA-N 0.000 description 3
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 3
- WGLPBDUCMAPZCE-UHFFFAOYSA-N Trioxochromium Chemical compound O=[Cr](=O)=O WGLPBDUCMAPZCE-UHFFFAOYSA-N 0.000 description 3
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 3
- 239000000654 additive Substances 0.000 description 3
- 125000001931 aliphatic group Chemical group 0.000 description 3
- 150000001336 alkenes Chemical group 0.000 description 3
- 239000007864 aqueous solution Substances 0.000 description 3
- 239000003125 aqueous solvent Substances 0.000 description 3
- KDYFGRWQOYBRFD-NUQCWPJISA-N butanedioic acid Chemical compound O[14C](=O)CC[14C](O)=O KDYFGRWQOYBRFD-NUQCWPJISA-N 0.000 description 3
- 125000002091 cationic group Chemical group 0.000 description 3
- 239000011651 chromium Substances 0.000 description 3
- 229910000423 chromium oxide Inorganic materials 0.000 description 3
- GVPFVAHMJGGAJG-UHFFFAOYSA-L cobalt dichloride Chemical compound [Cl-].[Cl-].[Co+2] GVPFVAHMJGGAJG-UHFFFAOYSA-L 0.000 description 3
- 230000000052 comparative effect Effects 0.000 description 3
- 238000005238 degreasing Methods 0.000 description 3
- 239000013527 degreasing agent Substances 0.000 description 3
- 238000005237 degreasing agent Methods 0.000 description 3
- GYZLOYUZLJXAJU-UHFFFAOYSA-N diglycidyl ether Chemical class C1OC1COCC1CO1 GYZLOYUZLJXAJU-UHFFFAOYSA-N 0.000 description 3
- IJKVHSBPTUYDLN-UHFFFAOYSA-N dihydroxy(oxo)silane Chemical compound O[Si](O)=O IJKVHSBPTUYDLN-UHFFFAOYSA-N 0.000 description 3
- 238000005886 esterification reaction Methods 0.000 description 3
- 235000011187 glycerol Nutrition 0.000 description 3
- NIMLQBUJDJZYEJ-UHFFFAOYSA-N isophorone diisocyanate Chemical compound CC1(C)CC(N=C=O)CC(C)(CN=C=O)C1 NIMLQBUJDJZYEJ-UHFFFAOYSA-N 0.000 description 3
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 3
- 229940071125 manganese acetate Drugs 0.000 description 3
- 229940099596 manganese sulfate Drugs 0.000 description 3
- 239000011702 manganese sulphate Substances 0.000 description 3
- 235000007079 manganese sulphate Nutrition 0.000 description 3
- UOGMEBQRZBEZQT-UHFFFAOYSA-L manganese(2+);diacetate Chemical compound [Mn+2].CC([O-])=O.CC([O-])=O UOGMEBQRZBEZQT-UHFFFAOYSA-L 0.000 description 3
- SQQMAOCOWKFBNP-UHFFFAOYSA-L manganese(II) sulfate Chemical compound [Mn+2].[O-]S([O-])(=O)=O SQQMAOCOWKFBNP-UHFFFAOYSA-L 0.000 description 3
- 229940098779 methanesulfonic acid Drugs 0.000 description 3
- 229910052758 niobium Inorganic materials 0.000 description 3
- 239000010955 niobium Substances 0.000 description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N nitrogen Substances N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 3
- AOLPZAHRYHXPLR-UHFFFAOYSA-I pentafluoroniobium Chemical compound F[Nb](F)(F)(F)F AOLPZAHRYHXPLR-UHFFFAOYSA-I 0.000 description 3
- 235000021317 phosphate Nutrition 0.000 description 3
- 229920000642 polymer Polymers 0.000 description 3
- 229920001451 polypropylene glycol Polymers 0.000 description 3
- 238000005245 sintering Methods 0.000 description 3
- 125000001424 substituent group Chemical group 0.000 description 3
- 239000011135 tin Substances 0.000 description 3
- 150000004072 triols Chemical class 0.000 description 3
- WYTZZXDRDKSJID-UHFFFAOYSA-N (3-aminopropyl)triethoxysilane Chemical compound CCO[Si](OCC)(OCC)CCCN WYTZZXDRDKSJID-UHFFFAOYSA-N 0.000 description 2
- BJEPYKJPYRNKOW-REOHCLBHSA-N (S)-malic acid Chemical compound OC(=O)[C@@H](O)CC(O)=O BJEPYKJPYRNKOW-REOHCLBHSA-N 0.000 description 2
- FSJSYDFBTIVUFD-SUKNRPLKSA-N (z)-4-hydroxypent-3-en-2-one;oxovanadium Chemical compound [V]=O.C\C(O)=C\C(C)=O.C\C(O)=C\C(C)=O FSJSYDFBTIVUFD-SUKNRPLKSA-N 0.000 description 2
- PCHXZXKMYCGVFA-UHFFFAOYSA-N 1,3-diazetidine-2,4-dione Chemical group O=C1NC(=O)N1 PCHXZXKMYCGVFA-UHFFFAOYSA-N 0.000 description 2
- ALVZNPYWJMLXKV-UHFFFAOYSA-N 1,9-Nonanediol Chemical compound OCCCCCCCCCO ALVZNPYWJMLXKV-UHFFFAOYSA-N 0.000 description 2
- VXNZUUAINFGPBY-UHFFFAOYSA-N 1-Butene Chemical compound CCC=C VXNZUUAINFGPBY-UHFFFAOYSA-N 0.000 description 2
- VILCJCGEZXAXTO-UHFFFAOYSA-N 2,2,2-tetramine Chemical compound NCCNCCNCCN VILCJCGEZXAXTO-UHFFFAOYSA-N 0.000 description 2
- HZAXFHJVJLSVMW-UHFFFAOYSA-N 2-Aminoethan-1-ol Chemical compound NCCO HZAXFHJVJLSVMW-UHFFFAOYSA-N 0.000 description 2
- QWGRWMMWNDWRQN-UHFFFAOYSA-N 2-methylpropane-1,3-diol Chemical compound OCC(C)CO QWGRWMMWNDWRQN-UHFFFAOYSA-N 0.000 description 2
- RNLHGQLZWXBQNY-UHFFFAOYSA-N 3-(aminomethyl)-3,5,5-trimethylcyclohexan-1-amine Chemical compound CC1(C)CC(N)CC(C)(CN)C1 RNLHGQLZWXBQNY-UHFFFAOYSA-N 0.000 description 2
- IKYAJDOSWUATPI-UHFFFAOYSA-N 3-[dimethoxy(methyl)silyl]propane-1-thiol Chemical compound CO[Si](C)(OC)CCCS IKYAJDOSWUATPI-UHFFFAOYSA-N 0.000 description 2
- KNTKCYKJRSMRMZ-UHFFFAOYSA-N 3-chloropropyl-dimethoxy-methylsilane Chemical compound CO[Si](C)(OC)CCCCl KNTKCYKJRSMRMZ-UHFFFAOYSA-N 0.000 description 2
- NLXLAEXVIDQMFP-UHFFFAOYSA-N Ammonia chloride Chemical compound [NH4+].[Cl-] NLXLAEXVIDQMFP-UHFFFAOYSA-N 0.000 description 2
- 229930185605 Bisphenol Natural products 0.000 description 2
- SOGAXMICEFXMKE-UHFFFAOYSA-N Butylmethacrylate Chemical compound CCCCOC(=O)C(C)=C SOGAXMICEFXMKE-UHFFFAOYSA-N 0.000 description 2
- VTYYLEPIZMXCLO-UHFFFAOYSA-L Calcium carbonate Chemical compound [Ca+2].[O-]C([O-])=O VTYYLEPIZMXCLO-UHFFFAOYSA-L 0.000 description 2
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 2
- FEWJPZIEWOKRBE-JCYAYHJZSA-N Dextrotartaric acid Chemical compound OC(=O)[C@H](O)[C@@H](O)C(O)=O FEWJPZIEWOKRBE-JCYAYHJZSA-N 0.000 description 2
- OIFBSDVPJOWBCH-UHFFFAOYSA-N Diethyl carbonate Chemical compound CCOC(=O)OCC OIFBSDVPJOWBCH-UHFFFAOYSA-N 0.000 description 2
- ROSDSFDQCJNGOL-UHFFFAOYSA-N Dimethylamine Chemical compound CNC ROSDSFDQCJNGOL-UHFFFAOYSA-N 0.000 description 2
- 239000004593 Epoxy Substances 0.000 description 2
- 239000005058 Isophorone diisocyanate Substances 0.000 description 2
- CSNNHWWHGAXBCP-UHFFFAOYSA-L Magnesium sulfate Chemical compound [Mg+2].[O-][S+2]([O-])([O-])[O-] CSNNHWWHGAXBCP-UHFFFAOYSA-L 0.000 description 2
- 229910021569 Manganese fluoride Inorganic materials 0.000 description 2
- BAPJBEWLBFYGME-UHFFFAOYSA-N Methyl acrylate Chemical compound COC(=O)C=C BAPJBEWLBFYGME-UHFFFAOYSA-N 0.000 description 2
- VVQNEPGJFQJSBK-UHFFFAOYSA-N Methyl methacrylate Chemical compound COC(=O)C(C)=C VVQNEPGJFQJSBK-UHFFFAOYSA-N 0.000 description 2
- KWYHDKDOAIKMQN-UHFFFAOYSA-N N,N,N',N'-tetramethylethylenediamine Chemical compound CN(C)CCN(C)C KWYHDKDOAIKMQN-UHFFFAOYSA-N 0.000 description 2
- ATHHXGZTWNVVOU-UHFFFAOYSA-N N-methylformamide Chemical compound CNC=O ATHHXGZTWNVVOU-UHFFFAOYSA-N 0.000 description 2
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 2
- 229920003171 Poly (ethylene oxide) Polymers 0.000 description 2
- FEWJPZIEWOKRBE-UHFFFAOYSA-N Tartaric acid Natural products [H+].[H+].[O-]C(=O)C(O)C(O)C([O-])=O FEWJPZIEWOKRBE-UHFFFAOYSA-N 0.000 description 2
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 2
- XSTXAVWGXDQKEL-UHFFFAOYSA-N Trichloroethylene Chemical compound ClC=C(Cl)Cl XSTXAVWGXDQKEL-UHFFFAOYSA-N 0.000 description 2
- 239000007983 Tris buffer Substances 0.000 description 2
- XHCLAFWTIXFWPH-UHFFFAOYSA-N [O-2].[O-2].[O-2].[O-2].[O-2].[V+5].[V+5] Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[V+5].[V+5] XHCLAFWTIXFWPH-UHFFFAOYSA-N 0.000 description 2
- QUEDYRXQWSDKKG-UHFFFAOYSA-M [O-2].[O-2].[V+5].[OH-] Chemical compound [O-2].[O-2].[V+5].[OH-] QUEDYRXQWSDKKG-UHFFFAOYSA-M 0.000 description 2
- HPLXJFZCZSBAAH-UHFFFAOYSA-N [V+3].CC(C)[O-].CC(C)[O-].CC(C)[O-] Chemical compound [V+3].CC(C)[O-].CC(C)[O-].CC(C)[O-] HPLXJFZCZSBAAH-UHFFFAOYSA-N 0.000 description 2
- DMTKBDZGHYGKFA-UHFFFAOYSA-N [V].CC(=O)C.CC(=O)C Chemical compound [V].CC(=O)C.CC(=O)C DMTKBDZGHYGKFA-UHFFFAOYSA-N 0.000 description 2
- MOLCWHCSXCKHAP-UHFFFAOYSA-N adamantane-1,3-diol Chemical compound C1C(C2)CC3CC1(O)CC2(O)C3 MOLCWHCSXCKHAP-UHFFFAOYSA-N 0.000 description 2
- 150000001298 alcohols Chemical class 0.000 description 2
- 125000002723 alicyclic group Chemical group 0.000 description 2
- 125000005370 alkoxysilyl group Chemical group 0.000 description 2
- BJEPYKJPYRNKOW-UHFFFAOYSA-N alpha-hydroxysuccinic acid Natural products OC(=O)C(O)CC(O)=O BJEPYKJPYRNKOW-UHFFFAOYSA-N 0.000 description 2
- WNROFYMDJYEPJX-UHFFFAOYSA-K aluminium hydroxide Chemical compound [OH-].[OH-].[OH-].[Al+3] WNROFYMDJYEPJX-UHFFFAOYSA-K 0.000 description 2
- ILRRQNADMUWWFW-UHFFFAOYSA-K aluminium phosphate Chemical compound O1[Al]2OP1(=O)O2 ILRRQNADMUWWFW-UHFFFAOYSA-K 0.000 description 2
- FJMNNXLGOUYVHO-UHFFFAOYSA-N aluminum zinc Chemical compound [Al].[Zn] FJMNNXLGOUYVHO-UHFFFAOYSA-N 0.000 description 2
- 229910021529 ammonia Inorganic materials 0.000 description 2
- XGGLLRJQCZROSE-UHFFFAOYSA-K ammonium iron(iii) sulfate Chemical compound [NH4+].[Fe+3].[O-]S([O-])(=O)=O.[O-]S([O-])(=O)=O XGGLLRJQCZROSE-UHFFFAOYSA-K 0.000 description 2
- APUPEJJSWDHEBO-UHFFFAOYSA-P ammonium molybdate Chemical compound [NH4+].[NH4+].[O-][Mo]([O-])(=O)=O APUPEJJSWDHEBO-UHFFFAOYSA-P 0.000 description 2
- 239000011609 ammonium molybdate Substances 0.000 description 2
- 235000018660 ammonium molybdate Nutrition 0.000 description 2
- 229940010552 ammonium molybdate Drugs 0.000 description 2
- JFCQEDHGNNZCLN-UHFFFAOYSA-N anhydrous glutaric acid Natural products OC(=O)CCCC(O)=O JFCQEDHGNNZCLN-UHFFFAOYSA-N 0.000 description 2
- UNTBPXHCXVWYOI-UHFFFAOYSA-O azanium;oxido(dioxo)vanadium Chemical compound [NH4+].[O-][V](=O)=O UNTBPXHCXVWYOI-UHFFFAOYSA-O 0.000 description 2
- TZCXTZWJZNENPQ-UHFFFAOYSA-L barium sulfate Chemical compound [Ba+2].[O-]S([O-])(=O)=O TZCXTZWJZNENPQ-UHFFFAOYSA-L 0.000 description 2
- KCXMKQUNVWSEMD-UHFFFAOYSA-N benzyl chloride Chemical compound ClCC1=CC=CC=C1 KCXMKQUNVWSEMD-UHFFFAOYSA-N 0.000 description 2
- 229940073608 benzyl chloride Drugs 0.000 description 2
- PXKLMJQFEQBVLD-UHFFFAOYSA-N bisphenol F Chemical compound C1=CC(O)=CC=C1CC1=CC=C(O)C=C1 PXKLMJQFEQBVLD-UHFFFAOYSA-N 0.000 description 2
- SXDBWCPKPHAZSM-UHFFFAOYSA-N bromic acid Chemical compound OBr(=O)=O SXDBWCPKPHAZSM-UHFFFAOYSA-N 0.000 description 2
- 239000004202 carbamide Substances 0.000 description 2
- 150000004649 carbonic acid derivatives Chemical class 0.000 description 2
- 150000001735 carboxylic acids Chemical class 0.000 description 2
- 238000010538 cationic polymerization reaction Methods 0.000 description 2
- HSJPMRKMPBAUAU-UHFFFAOYSA-N cerium(3+);trinitrate Chemical compound [Ce+3].[O-][N+]([O-])=O.[O-][N+]([O-])=O.[O-][N+]([O-])=O HSJPMRKMPBAUAU-UHFFFAOYSA-N 0.000 description 2
- IJOOHPMOJXWVHK-UHFFFAOYSA-N chlorotrimethylsilane Chemical compound C[Si](C)(C)Cl IJOOHPMOJXWVHK-UHFFFAOYSA-N 0.000 description 2
- ZCDOYSPFYFSLEW-UHFFFAOYSA-N chromate(2-) Chemical compound [O-][Cr]([O-])(=O)=O ZCDOYSPFYFSLEW-UHFFFAOYSA-N 0.000 description 2
- PHFQLYPOURZARY-UHFFFAOYSA-N chromium trinitrate Chemical compound [Cr+3].[O-][N+]([O-])=O.[O-][N+]([O-])=O.[O-][N+]([O-])=O PHFQLYPOURZARY-UHFFFAOYSA-N 0.000 description 2
- VQWFNAGFNGABOH-UHFFFAOYSA-K chromium(iii) hydroxide Chemical compound [OH-].[OH-].[OH-].[Cr+3] VQWFNAGFNGABOH-UHFFFAOYSA-K 0.000 description 2
- 230000003750 conditioning effect Effects 0.000 description 2
- FOTKYAAJKYLFFN-UHFFFAOYSA-N decane-1,10-diol Chemical compound OCCCCCCCCCCO FOTKYAAJKYLFFN-UHFFFAOYSA-N 0.000 description 2
- PPQREHKVAOVYBT-UHFFFAOYSA-H dialuminum;tricarbonate Chemical compound [Al+3].[Al+3].[O-]C([O-])=O.[O-]C([O-])=O.[O-]C([O-])=O PPQREHKVAOVYBT-UHFFFAOYSA-H 0.000 description 2
- BYLOHCRAPOSXLY-UHFFFAOYSA-N dichloro(diethyl)silane Chemical compound CC[Si](Cl)(Cl)CC BYLOHCRAPOSXLY-UHFFFAOYSA-N 0.000 description 2
- KORSJDCBLAPZEQ-UHFFFAOYSA-N dicyclohexylmethane-4,4'-diisocyanate Chemical compound C1CC(N=C=O)CCC1CC1CCC(N=C=O)CC1 KORSJDCBLAPZEQ-UHFFFAOYSA-N 0.000 description 2
- DENRZWYUOJLTMF-UHFFFAOYSA-N diethyl sulfate Chemical compound CCOS(=O)(=O)OCC DENRZWYUOJLTMF-UHFFFAOYSA-N 0.000 description 2
- 229940008406 diethyl sulfate Drugs 0.000 description 2
- CTNMMTCXUUFYAP-UHFFFAOYSA-L difluoromanganese Chemical compound F[Mn]F CTNMMTCXUUFYAP-UHFFFAOYSA-L 0.000 description 2
- LIKFHECYJZWXFJ-UHFFFAOYSA-N dimethyldichlorosilane Chemical compound C[Si](C)(Cl)Cl LIKFHECYJZWXFJ-UHFFFAOYSA-N 0.000 description 2
- YYLGKUPAFFKGRQ-UHFFFAOYSA-N dimethyldiethoxysilane Chemical compound CCO[Si](C)(C)OCC YYLGKUPAFFKGRQ-UHFFFAOYSA-N 0.000 description 2
- 238000007598 dipping method Methods 0.000 description 2
- SZXQTJUDPRGNJN-UHFFFAOYSA-N dipropylene glycol Chemical compound OCCCOCCCO SZXQTJUDPRGNJN-UHFFFAOYSA-N 0.000 description 2
- GNTDGMZSJNCJKK-UHFFFAOYSA-N divanadium pentaoxide Chemical compound O=[V](=O)O[V](=O)=O GNTDGMZSJNCJKK-UHFFFAOYSA-N 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000003995 emulsifying agent Substances 0.000 description 2
- 230000032050 esterification Effects 0.000 description 2
- FWDBOZPQNFPOLF-UHFFFAOYSA-N ethenyl(triethoxy)silane Chemical compound CCO[Si](OCC)(OCC)C=C FWDBOZPQNFPOLF-UHFFFAOYSA-N 0.000 description 2
- SUPCQIBBMFXVTL-UHFFFAOYSA-N ethyl 2-methylprop-2-enoate Chemical compound CCOC(=O)C(C)=C SUPCQIBBMFXVTL-UHFFFAOYSA-N 0.000 description 2
- 239000001530 fumaric acid Substances 0.000 description 2
- 229910021485 fumed silica Inorganic materials 0.000 description 2
- ANSXAPJVJOKRDJ-UHFFFAOYSA-N furo[3,4-f][2]benzofuran-1,3,5,7-tetrone Chemical compound C1=C2C(=O)OC(=O)C2=CC2=C1C(=O)OC2=O ANSXAPJVJOKRDJ-UHFFFAOYSA-N 0.000 description 2
- 238000005227 gel permeation chromatography Methods 0.000 description 2
- SXCBDZAEHILGLM-UHFFFAOYSA-N heptane-1,7-diol Chemical compound OCCCCCCCO SXCBDZAEHILGLM-UHFFFAOYSA-N 0.000 description 2
- FFUAGWLWBBFQJT-UHFFFAOYSA-N hexamethyldisilazane Chemical compound C[Si](C)(C)N[Si](C)(C)C FFUAGWLWBBFQJT-UHFFFAOYSA-N 0.000 description 2
- NAQMVNRVTILPCV-UHFFFAOYSA-N hexane-1,6-diamine Chemical compound NCCCCCCN NAQMVNRVTILPCV-UHFFFAOYSA-N 0.000 description 2
- FUZZWVXGSFPDMH-UHFFFAOYSA-N hexanoic acid Chemical compound CCCCCC(O)=O FUZZWVXGSFPDMH-UHFFFAOYSA-N 0.000 description 2
- AMWRITDGCCNYAT-UHFFFAOYSA-L hydroxy(oxo)manganese;manganese Chemical compound [Mn].O[Mn]=O.O[Mn]=O AMWRITDGCCNYAT-UHFFFAOYSA-L 0.000 description 2
- 238000007654 immersion Methods 0.000 description 2
- INQOMBQAUSQDDS-UHFFFAOYSA-N iodomethane Chemical compound IC INQOMBQAUSQDDS-UHFFFAOYSA-N 0.000 description 2
- 229910000398 iron phosphate Inorganic materials 0.000 description 2
- RBTARNINKXHZNM-UHFFFAOYSA-K iron trichloride Chemical compound Cl[Fe](Cl)Cl RBTARNINKXHZNM-UHFFFAOYSA-K 0.000 description 2
- WBJZTOZJJYAKHQ-UHFFFAOYSA-K iron(3+) phosphate Chemical compound [Fe+3].[O-]P([O-])([O-])=O WBJZTOZJJYAKHQ-UHFFFAOYSA-K 0.000 description 2
- 239000004310 lactic acid Substances 0.000 description 2
- 235000014655 lactic acid Nutrition 0.000 description 2
- RLSSMJSEOOYNOY-UHFFFAOYSA-N m-cresol Chemical compound CC1=CC=CC(O)=C1 RLSSMJSEOOYNOY-UHFFFAOYSA-N 0.000 description 2
- YIXJRHPUWRPCBB-UHFFFAOYSA-N magnesium nitrate Chemical compound [Mg+2].[O-][N+]([O-])=O.[O-][N+]([O-])=O YIXJRHPUWRPCBB-UHFFFAOYSA-N 0.000 description 2
- 239000000395 magnesium oxide Substances 0.000 description 2
- CPLXHLVBOLITMK-UHFFFAOYSA-N magnesium oxide Inorganic materials [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 description 2
- AXZKOIWUVFPNLO-UHFFFAOYSA-N magnesium;oxygen(2-) Chemical compound [O-2].[Mg+2] AXZKOIWUVFPNLO-UHFFFAOYSA-N 0.000 description 2
- FPYJFEHAWHCUMM-UHFFFAOYSA-N maleic anhydride Chemical compound O=C1OC(=O)C=C1 FPYJFEHAWHCUMM-UHFFFAOYSA-N 0.000 description 2
- 239000001630 malic acid Substances 0.000 description 2
- 235000011090 malic acid Nutrition 0.000 description 2
- 239000011572 manganese Substances 0.000 description 2
- 150000002739 metals Chemical class 0.000 description 2
- 229940102396 methyl bromide Drugs 0.000 description 2
- BFXIKLCIZHOAAZ-UHFFFAOYSA-N methyltrimethoxysilane Chemical compound CO[Si](C)(OC)OC BFXIKLCIZHOAAZ-UHFFFAOYSA-N 0.000 description 2
- 150000007522 mineralic acids Chemical class 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- VLAPMBHFAWRUQP-UHFFFAOYSA-L molybdic acid Chemical compound O[Mo](O)(=O)=O VLAPMBHFAWRUQP-UHFFFAOYSA-L 0.000 description 2
- PHQOGHDTIVQXHL-UHFFFAOYSA-N n'-(3-trimethoxysilylpropyl)ethane-1,2-diamine Chemical compound CO[Si](OC)(OC)CCCNCCN PHQOGHDTIVQXHL-UHFFFAOYSA-N 0.000 description 2
- 229910000484 niobium oxide Inorganic materials 0.000 description 2
- URLJKFSTXLNXLG-UHFFFAOYSA-N niobium(5+);oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[Nb+5].[Nb+5] URLJKFSTXLNXLG-UHFFFAOYSA-N 0.000 description 2
- 229910017604 nitric acid Inorganic materials 0.000 description 2
- 229920003986 novolac Polymers 0.000 description 2
- QWVGKYWNOKOFNN-UHFFFAOYSA-N o-cresol Chemical compound CC1=CC=CC=C1O QWVGKYWNOKOFNN-UHFFFAOYSA-N 0.000 description 2
- 239000003921 oil Substances 0.000 description 2
- IWDCLRJOBJJRNH-UHFFFAOYSA-N p-cresol Chemical compound CC1=CC=C(O)C=C1 IWDCLRJOBJJRNH-UHFFFAOYSA-N 0.000 description 2
- YHBDIEWMOMLKOO-UHFFFAOYSA-I pentachloroniobium Chemical compound Cl[Nb](Cl)(Cl)(Cl)Cl YHBDIEWMOMLKOO-UHFFFAOYSA-I 0.000 description 2
- WXZMFSXDPGVJKK-UHFFFAOYSA-N pentaerythritol Chemical compound OCC(CO)(CO)CO WXZMFSXDPGVJKK-UHFFFAOYSA-N 0.000 description 2
- NFVUDQKTAWONMJ-UHFFFAOYSA-I pentafluorovanadium Chemical compound [F-].[F-].[F-].[F-].[F-].[V+5] NFVUDQKTAWONMJ-UHFFFAOYSA-I 0.000 description 2
- UWJJYHHHVWZFEP-UHFFFAOYSA-N pentane-1,1-diol Chemical compound CCCCC(O)O UWJJYHHHVWZFEP-UHFFFAOYSA-N 0.000 description 2
- 239000010452 phosphate Substances 0.000 description 2
- WLJVNTCWHIRURA-UHFFFAOYSA-N pimelic acid Chemical compound OC(=O)CCCCCC(O)=O WLJVNTCWHIRURA-UHFFFAOYSA-N 0.000 description 2
- 229920001748 polybutylene Polymers 0.000 description 2
- 238000006116 polymerization reaction Methods 0.000 description 2
- 229920002635 polyurethane Polymers 0.000 description 2
- 239000004814 polyurethane Substances 0.000 description 2
- 238000002360 preparation method Methods 0.000 description 2
- BAOGIWGDRNSXGA-UHFFFAOYSA-N propan-2-one;zinc Chemical compound [Zn].CC(C)=O BAOGIWGDRNSXGA-UHFFFAOYSA-N 0.000 description 2
- 125000004368 propenyl group Chemical group C(=CC)* 0.000 description 2
- 235000019260 propionic acid Nutrition 0.000 description 2
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 2
- AOHJOMMDDJHIJH-UHFFFAOYSA-N propylenediamine Chemical compound CC(N)CN AOHJOMMDDJHIJH-UHFFFAOYSA-N 0.000 description 2
- 238000005956 quaternization reaction Methods 0.000 description 2
- IUVKMZGDUIUOCP-BTNSXGMBSA-N quinbolone Chemical compound O([C@H]1CC[C@H]2[C@H]3[C@@H]([C@]4(C=CC(=O)C=C4CC3)C)CC[C@@]21C)C1=CCCC1 IUVKMZGDUIUOCP-BTNSXGMBSA-N 0.000 description 2
- 238000010526 radical polymerization reaction Methods 0.000 description 2
- GHMLBKRAJCXXBS-UHFFFAOYSA-N resorcinol Chemical compound OC1=CC=CC(O)=C1 GHMLBKRAJCXXBS-UHFFFAOYSA-N 0.000 description 2
- 150000004756 silanes Chemical class 0.000 description 2
- RMAQACBXLXPBSY-UHFFFAOYSA-N silicic acid Chemical compound O[Si](O)(O)O RMAQACBXLXPBSY-UHFFFAOYSA-N 0.000 description 2
- 235000012239 silicon dioxide Nutrition 0.000 description 2
- CMZUMMUJMWNLFH-UHFFFAOYSA-N sodium metavanadate Chemical compound [Na+].[O-][V](=O)=O CMZUMMUJMWNLFH-UHFFFAOYSA-N 0.000 description 2
- 239000011684 sodium molybdate Substances 0.000 description 2
- 235000015393 sodium molybdate Nutrition 0.000 description 2
- TVXXNOYZHKPKGW-UHFFFAOYSA-N sodium molybdate (anhydrous) Chemical compound [Na+].[Na+].[O-][Mo]([O-])(=O)=O TVXXNOYZHKPKGW-UHFFFAOYSA-N 0.000 description 2
- 230000008961 swelling Effects 0.000 description 2
- 239000011975 tartaric acid Substances 0.000 description 2
- 235000002906 tartaric acid Nutrition 0.000 description 2
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 description 2
- 229910001887 tin oxide Inorganic materials 0.000 description 2
- FAKFSJNVVCGEEI-UHFFFAOYSA-J tin(4+);disulfate Chemical compound [Sn+4].[O-]S([O-])(=O)=O.[O-]S([O-])(=O)=O FAKFSJNVVCGEEI-UHFFFAOYSA-J 0.000 description 2
- CVNKFOIOZXAFBO-UHFFFAOYSA-J tin(4+);tetrahydroxide Chemical compound [OH-].[OH-].[OH-].[OH-].[Sn+4] CVNKFOIOZXAFBO-UHFFFAOYSA-J 0.000 description 2
- HPGGPRDJHPYFRM-UHFFFAOYSA-J tin(iv) chloride Chemical compound Cl[Sn](Cl)(Cl)Cl HPGGPRDJHPYFRM-UHFFFAOYSA-J 0.000 description 2
- YUOWTJMRMWQJDA-UHFFFAOYSA-J tin(iv) fluoride Chemical compound [F-].[F-].[F-].[F-].[Sn+4] YUOWTJMRMWQJDA-UHFFFAOYSA-J 0.000 description 2
- KJAMZCVTJDTESW-UHFFFAOYSA-N tiracizine Chemical compound C1CC2=CC=CC=C2N(C(=O)CN(C)C)C2=CC(NC(=O)OCC)=CC=C21 KJAMZCVTJDTESW-UHFFFAOYSA-N 0.000 description 2
- 238000004448 titration Methods 0.000 description 2
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 2
- ZIBGPFATKBEMQZ-UHFFFAOYSA-N triethylene glycol Chemical compound OCCOCCOCCO ZIBGPFATKBEMQZ-UHFFFAOYSA-N 0.000 description 2
- ITMCEJHCFYSIIV-UHFFFAOYSA-N triflic acid Chemical compound OS(=O)(=O)C(F)(F)F ITMCEJHCFYSIIV-UHFFFAOYSA-N 0.000 description 2
- 125000002023 trifluoromethyl group Chemical group FC(F)(F)* 0.000 description 2
- ARCGXLSVLAOJQL-UHFFFAOYSA-N trimellitic acid Chemical compound OC(=O)C1=CC=C(C(O)=O)C(C(O)=O)=C1 ARCGXLSVLAOJQL-UHFFFAOYSA-N 0.000 description 2
- SRPWOOOHEPICQU-UHFFFAOYSA-N trimellitic anhydride Chemical compound OC(=O)C1=CC=C2C(=O)OC(=O)C2=C1 SRPWOOOHEPICQU-UHFFFAOYSA-N 0.000 description 2
- 239000013638 trimer Substances 0.000 description 2
- HQYALQRYBUJWDH-UHFFFAOYSA-N trimethoxy(propyl)silane Chemical compound CCC[Si](OC)(OC)OC HQYALQRYBUJWDH-UHFFFAOYSA-N 0.000 description 2
- 238000005292 vacuum distillation Methods 0.000 description 2
- LEONUFNNVUYDNQ-UHFFFAOYSA-N vanadium atom Chemical compound [V] LEONUFNNVUYDNQ-UHFFFAOYSA-N 0.000 description 2
- 229910001935 vanadium oxide Inorganic materials 0.000 description 2
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 2
- 229920002554 vinyl polymer Polymers 0.000 description 2
- 239000011701 zinc Substances 0.000 description 2
- JIAARYAFYJHUJI-UHFFFAOYSA-L zinc dichloride Chemical compound [Cl-].[Cl-].[Zn+2] JIAARYAFYJHUJI-UHFFFAOYSA-L 0.000 description 2
- 239000011787 zinc oxide Substances 0.000 description 2
- MFXMOUUKFMDYLM-UHFFFAOYSA-L zinc;dihydrogen phosphate Chemical compound [Zn+2].OP(O)([O-])=O.OP(O)([O-])=O MFXMOUUKFMDYLM-UHFFFAOYSA-L 0.000 description 2
- DIGDEPKXCWMYBK-UHFFFAOYSA-N (2-aminoethylamino)methanol Chemical compound NCCNCO DIGDEPKXCWMYBK-UHFFFAOYSA-N 0.000 description 1
- BJZYYSAMLOBSDY-QMMMGPOBSA-N (2s)-2-butoxybutan-1-ol Chemical compound CCCCO[C@@H](CC)CO BJZYYSAMLOBSDY-QMMMGPOBSA-N 0.000 description 1
- BNGXYYYYKUGPPF-UHFFFAOYSA-M (3-methylphenyl)methyl-triphenylphosphanium;chloride Chemical compound [Cl-].CC1=CC=CC(C[P+](C=2C=CC=CC=2)(C=2C=CC=CC=2)C=2C=CC=CC=2)=C1 BNGXYYYYKUGPPF-UHFFFAOYSA-M 0.000 description 1
- WOJSMJIXPQLESQ-UHFFFAOYSA-N 1,1,3,5-tetramethylcyclohexane Chemical compound CC1CC(C)CC(C)(C)C1 WOJSMJIXPQLESQ-UHFFFAOYSA-N 0.000 description 1
- XEFUJGURFLOFAN-UHFFFAOYSA-N 1,3-dichloro-5-isocyanatobenzene Chemical compound ClC1=CC(Cl)=CC(N=C=O)=C1 XEFUJGURFLOFAN-UHFFFAOYSA-N 0.000 description 1
- VGHSXKTVMPXHNG-UHFFFAOYSA-N 1,3-diisocyanatobenzene Chemical compound O=C=NC1=CC=CC(N=C=O)=C1 VGHSXKTVMPXHNG-UHFFFAOYSA-N 0.000 description 1
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 1
- ROHUXHMNZLHBSF-UHFFFAOYSA-N 1,4-bis(isocyanatomethyl)cyclohexane Chemical compound O=C=NCC1CCC(CN=C=O)CC1 ROHUXHMNZLHBSF-UHFFFAOYSA-N 0.000 description 1
- ALQLPWJFHRMHIU-UHFFFAOYSA-N 1,4-diisocyanatobenzene Chemical compound O=C=NC1=CC=C(N=C=O)C=C1 ALQLPWJFHRMHIU-UHFFFAOYSA-N 0.000 description 1
- SBJCUZQNHOLYMD-UHFFFAOYSA-N 1,5-Naphthalene diisocyanate Chemical compound C1=CC=C2C(N=C=O)=CC=CC2=C1N=C=O SBJCUZQNHOLYMD-UHFFFAOYSA-N 0.000 description 1
- QGLRLXLDMZCFBP-UHFFFAOYSA-N 1,6-diisocyanato-2,4,4-trimethylhexane Chemical compound O=C=NCC(C)CC(C)(C)CCN=C=O QGLRLXLDMZCFBP-UHFFFAOYSA-N 0.000 description 1
- ZFPGARUNNKGOBB-UHFFFAOYSA-N 1-Ethyl-2-pyrrolidinone Chemical compound CCN1CCCC1=O ZFPGARUNNKGOBB-UHFFFAOYSA-N 0.000 description 1
- QLOKJRIVRGCVIM-UHFFFAOYSA-N 1-[(4-methylsulfanylphenyl)methyl]piperazine Chemical compound C1=CC(SC)=CC=C1CN1CCNCC1 QLOKJRIVRGCVIM-UHFFFAOYSA-N 0.000 description 1
- ZFECCYLNALETDE-UHFFFAOYSA-N 1-[bis(2-hydroxyethyl)amino]propan-2-ol Chemical compound CC(O)CN(CCO)CCO ZFECCYLNALETDE-UHFFFAOYSA-N 0.000 description 1
- RTBFRGCFXZNCOE-UHFFFAOYSA-N 1-methylsulfonylpiperidin-4-one Chemical compound CS(=O)(=O)N1CCC(=O)CC1 RTBFRGCFXZNCOE-UHFFFAOYSA-N 0.000 description 1
- PTBDIHRZYDMNKB-UHFFFAOYSA-N 2,2-Bis(hydroxymethyl)propionic acid Chemical compound OCC(C)(CO)C(O)=O PTBDIHRZYDMNKB-UHFFFAOYSA-N 0.000 description 1
- NSMWYRLQHIXVAP-UHFFFAOYSA-N 2,5-dimethylpiperazine Chemical compound CC1CNC(C)CN1 NSMWYRLQHIXVAP-UHFFFAOYSA-N 0.000 description 1
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 1
- SZSSMFVYZRQGIM-UHFFFAOYSA-N 2-(hydroxymethyl)-2-propylpropane-1,3-diol Chemical compound CCCC(CO)(CO)CO SZSSMFVYZRQGIM-UHFFFAOYSA-N 0.000 description 1
- GOXQRTZXKQZDDN-UHFFFAOYSA-N 2-Ethylhexyl acrylate Chemical compound CCCCC(CC)COC(=O)C=C GOXQRTZXKQZDDN-UHFFFAOYSA-N 0.000 description 1
- FKJVYOFPTRGCSP-UHFFFAOYSA-N 2-[3-aminopropyl(2-hydroxyethyl)amino]ethanol Chemical compound NCCCN(CCO)CCO FKJVYOFPTRGCSP-UHFFFAOYSA-N 0.000 description 1
- PAJMKGZZBBTTOY-UHFFFAOYSA-N 2-[[2-hydroxy-1-(3-hydroxyoctyl)-2,3,3a,4,9,9a-hexahydro-1h-cyclopenta[g]naphthalen-5-yl]oxy]acetic acid Chemical compound C1=CC=C(OCC(O)=O)C2=C1CC1C(CCC(O)CCCCC)C(O)CC1C2 PAJMKGZZBBTTOY-UHFFFAOYSA-N 0.000 description 1
- TXBCBTDQIULDIA-UHFFFAOYSA-N 2-[[3-hydroxy-2,2-bis(hydroxymethyl)propoxy]methyl]-2-(hydroxymethyl)propane-1,3-diol Chemical compound OCC(CO)(CO)COCC(CO)(CO)CO TXBCBTDQIULDIA-UHFFFAOYSA-N 0.000 description 1
- KKMOSYLWYLMHAL-UHFFFAOYSA-N 2-bromo-6-nitroaniline Chemical compound NC1=C(Br)C=CC=C1[N+]([O-])=O KKMOSYLWYLMHAL-UHFFFAOYSA-N 0.000 description 1
- POAOYUHQDCAZBD-UHFFFAOYSA-N 2-butoxyethanol Chemical compound CCCCOCCO POAOYUHQDCAZBD-UHFFFAOYSA-N 0.000 description 1
- ZNQVEEAIQZEUHB-UHFFFAOYSA-N 2-ethoxyethanol Chemical compound CCOCCO ZNQVEEAIQZEUHB-UHFFFAOYSA-N 0.000 description 1
- WROUWQQRXUBECT-UHFFFAOYSA-N 2-ethylacrylic acid Chemical compound CCC(=C)C(O)=O WROUWQQRXUBECT-UHFFFAOYSA-N 0.000 description 1
- WDQMWEYDKDCEHT-UHFFFAOYSA-N 2-ethylhexyl 2-methylprop-2-enoate Chemical compound CCCCC(CC)COC(=O)C(C)=C WDQMWEYDKDCEHT-UHFFFAOYSA-N 0.000 description 1
- OMIGHNLMNHATMP-UHFFFAOYSA-N 2-hydroxyethyl prop-2-enoate Chemical compound OCCOC(=O)C=C OMIGHNLMNHATMP-UHFFFAOYSA-N 0.000 description 1
- ZTMADXFOCUXMJE-UHFFFAOYSA-N 2-methylbenzene-1,3-diol Chemical compound CC1=C(O)C=CC=C1O ZTMADXFOCUXMJE-UHFFFAOYSA-N 0.000 description 1
- QOFLTGDAZLWRMJ-UHFFFAOYSA-N 2-methylpropane-1,1-diol Chemical compound CC(C)C(O)O QOFLTGDAZLWRMJ-UHFFFAOYSA-N 0.000 description 1
- RUMACXVDVNRZJZ-UHFFFAOYSA-N 2-methylpropyl 2-methylprop-2-enoate Chemical compound CC(C)COC(=O)C(C)=C RUMACXVDVNRZJZ-UHFFFAOYSA-N 0.000 description 1
- CFVWNXQPGQOHRJ-UHFFFAOYSA-N 2-methylpropyl prop-2-enoate Chemical compound CC(C)COC(=O)C=C CFVWNXQPGQOHRJ-UHFFFAOYSA-N 0.000 description 1
- LJSUIIHXGIFTAO-UHFFFAOYSA-N 3-(3-aminopropylamino)propan-1-ol Chemical compound NCCCNCCCO LJSUIIHXGIFTAO-UHFFFAOYSA-N 0.000 description 1
- MBNRBJNIYVXSQV-UHFFFAOYSA-N 3-[diethoxy(methyl)silyl]propane-1-thiol Chemical compound CCO[Si](C)(OCC)CCCS MBNRBJNIYVXSQV-UHFFFAOYSA-N 0.000 description 1
- DOYKFSOCSXVQAN-UHFFFAOYSA-N 3-[diethoxy(methyl)silyl]propyl 2-methylprop-2-enoate Chemical compound CCO[Si](C)(OCC)CCCOC(=O)C(C)=C DOYKFSOCSXVQAN-UHFFFAOYSA-N 0.000 description 1
- YLPZIQXAPFXTSN-UHFFFAOYSA-M 3-[diethoxy(methyl)silyl]propyl-dimethyl-octadecylazanium;chloride Chemical compound [Cl-].CCCCCCCCCCCCCCCCCC[N+](C)(C)CCC[Si](C)(OCC)OCC YLPZIQXAPFXTSN-UHFFFAOYSA-M 0.000 description 1
- LZMNXXQIQIHFGC-UHFFFAOYSA-N 3-[dimethoxy(methyl)silyl]propyl 2-methylprop-2-enoate Chemical compound CO[Si](C)(OC)CCCOC(=O)C(C)=C LZMNXXQIQIHFGC-UHFFFAOYSA-N 0.000 description 1
- MHTNZWXLVMAGMO-UHFFFAOYSA-M 3-[dimethoxy(methyl)silyl]propyl-dimethyl-octadecylazanium;chloride Chemical compound [Cl-].CCCCCCCCCCCCCCCCCC[N+](C)(C)CCC[Si](C)(OC)OC MHTNZWXLVMAGMO-UHFFFAOYSA-M 0.000 description 1
- JYLNVJYYQQXNEK-UHFFFAOYSA-N 3-amino-2-(4-chlorophenyl)-1-propanesulfonic acid Chemical compound OS(=O)(=O)CC(CN)C1=CC=C(Cl)C=C1 JYLNVJYYQQXNEK-UHFFFAOYSA-N 0.000 description 1
- KSCAZPYHLGGNPZ-UHFFFAOYSA-N 3-chloropropyl(triethoxy)silane Chemical compound CCO[Si](OCC)(OCC)CCCCl KSCAZPYHLGGNPZ-UHFFFAOYSA-N 0.000 description 1
- OXYZDRAJMHGSMW-UHFFFAOYSA-N 3-chloropropyl(trimethoxy)silane Chemical compound CO[Si](OC)(OC)CCCCl OXYZDRAJMHGSMW-UHFFFAOYSA-N 0.000 description 1
- KEZMLECYELSZDC-UHFFFAOYSA-N 3-chloropropyl-diethoxy-methylsilane Chemical compound CCO[Si](C)(OCC)CCCCl KEZMLECYELSZDC-UHFFFAOYSA-N 0.000 description 1
- YHFGMFYKZBWPRW-UHFFFAOYSA-N 3-methylpentane-1,1-diol Chemical compound CCC(C)CC(O)O YHFGMFYKZBWPRW-UHFFFAOYSA-N 0.000 description 1
- SXFJDZNJHVPHPH-UHFFFAOYSA-N 3-methylpentane-1,5-diol Chemical compound OCCC(C)CCO SXFJDZNJHVPHPH-UHFFFAOYSA-N 0.000 description 1
- 125000005917 3-methylpentyl group Chemical group 0.000 description 1
- DCQBZYNUSLHVJC-UHFFFAOYSA-N 3-triethoxysilylpropane-1-thiol Chemical compound CCO[Si](OCC)(OCC)CCCS DCQBZYNUSLHVJC-UHFFFAOYSA-N 0.000 description 1
- SJECZPVISLOESU-UHFFFAOYSA-N 3-trimethoxysilylpropan-1-amine Chemical compound CO[Si](OC)(OC)CCCN SJECZPVISLOESU-UHFFFAOYSA-N 0.000 description 1
- UUEWCQRISZBELL-UHFFFAOYSA-N 3-trimethoxysilylpropane-1-thiol Chemical compound CO[Si](OC)(OC)CCCS UUEWCQRISZBELL-UHFFFAOYSA-N 0.000 description 1
- XDLMVUHYZWKMMD-UHFFFAOYSA-N 3-trimethoxysilylpropyl 2-methylprop-2-enoate Chemical compound CO[Si](OC)(OC)CCCOC(=O)C(C)=C XDLMVUHYZWKMMD-UHFFFAOYSA-N 0.000 description 1
- UPMLOUAZCHDJJD-UHFFFAOYSA-N 4,4'-Diphenylmethane Diisocyanate Chemical compound C1=CC(N=C=O)=CC=C1CC1=CC=C(N=C=O)C=C1 UPMLOUAZCHDJJD-UHFFFAOYSA-N 0.000 description 1
- VPWNQTHUCYMVMZ-UHFFFAOYSA-N 4,4'-sulfonyldiphenol Chemical compound C1=CC(O)=CC=C1S(=O)(=O)C1=CC=C(O)C=C1 VPWNQTHUCYMVMZ-UHFFFAOYSA-N 0.000 description 1
- HDPBBNNDDQOWPJ-UHFFFAOYSA-N 4-[1,2,2-tris(4-hydroxyphenyl)ethyl]phenol Chemical compound C1=CC(O)=CC=C1C(C=1C=CC(O)=CC=1)C(C=1C=CC(O)=CC=1)C1=CC=C(O)C=C1 HDPBBNNDDQOWPJ-UHFFFAOYSA-N 0.000 description 1
- CNPURSDMOWDNOQ-UHFFFAOYSA-N 4-methoxy-7h-pyrrolo[2,3-d]pyrimidin-2-amine Chemical compound COC1=NC(N)=NC2=C1C=CN2 CNPURSDMOWDNOQ-UHFFFAOYSA-N 0.000 description 1
- NQSLZEHVGKWKAY-UHFFFAOYSA-N 6-methylheptyl 2-methylprop-2-enoate Chemical compound CC(C)CCCCCOC(=O)C(C)=C NQSLZEHVGKWKAY-UHFFFAOYSA-N 0.000 description 1
- DXPPIEDUBFUSEZ-UHFFFAOYSA-N 6-methylheptyl prop-2-enoate Chemical compound CC(C)CCCCCOC(=O)C=C DXPPIEDUBFUSEZ-UHFFFAOYSA-N 0.000 description 1
- ZCYVEMRRCGMTRW-UHFFFAOYSA-N 7553-56-2 Chemical group [I] ZCYVEMRRCGMTRW-UHFFFAOYSA-N 0.000 description 1
- NLHHRLWOUZZQLW-UHFFFAOYSA-N Acrylonitrile Chemical compound C=CC#N NLHHRLWOUZZQLW-UHFFFAOYSA-N 0.000 description 1
- 229910002014 Aerosil® 130 Inorganic materials 0.000 description 1
- 229910002016 Aerosil® 200 Inorganic materials 0.000 description 1
- 229910002018 Aerosil® 300 Inorganic materials 0.000 description 1
- 229910002019 Aerosil® 380 Inorganic materials 0.000 description 1
- 229910002021 Aerosil® TT 600 Inorganic materials 0.000 description 1
- 239000005995 Aluminium silicate Substances 0.000 description 1
- LSNNMFCWUKXFEE-UHFFFAOYSA-M Bisulfite Chemical compound OS([O-])=O LSNNMFCWUKXFEE-UHFFFAOYSA-M 0.000 description 1
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical group [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 1
- DKPFZGUDAPQIHT-UHFFFAOYSA-N Butyl acetate Natural products CCCCOC(C)=O DKPFZGUDAPQIHT-UHFFFAOYSA-N 0.000 description 1
- RCLKPQYGIWSKIC-UHFFFAOYSA-N C(C)O[SiH3].C(C(=C)C)(=O)OCCC[Si](OC)(OC)OC Chemical compound C(C)O[SiH3].C(C(=C)C)(=O)OCCC[Si](OC)(OC)OC RCLKPQYGIWSKIC-UHFFFAOYSA-N 0.000 description 1
- DWCVSSSTDMMBSJ-UHFFFAOYSA-N C[SiH](OC)OC.C=C Chemical compound C[SiH](OC)OC.C=C DWCVSSSTDMMBSJ-UHFFFAOYSA-N 0.000 description 1
- REEFSLKDEDEWAO-UHFFFAOYSA-N Chloraniformethan Chemical compound ClC1=CC=C(NC(NC=O)C(Cl)(Cl)Cl)C=C1Cl REEFSLKDEDEWAO-UHFFFAOYSA-N 0.000 description 1
- 239000005046 Chlorosilane Substances 0.000 description 1
- 229910021559 Chromium(II) bromide Inorganic materials 0.000 description 1
- 229910021560 Chromium(III) bromide Inorganic materials 0.000 description 1
- 229910021503 Cobalt(II) hydroxide Inorganic materials 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- FBPFZTCFMRRESA-FSIIMWSLSA-N D-Glucitol Natural products OC[C@H](O)[C@H](O)[C@@H](O)[C@H](O)CO FBPFZTCFMRRESA-FSIIMWSLSA-N 0.000 description 1
- FBPFZTCFMRRESA-JGWLITMVSA-N D-glucitol Chemical compound OC[C@H](O)[C@@H](O)[C@H](O)[C@H](O)CO FBPFZTCFMRRESA-JGWLITMVSA-N 0.000 description 1
- RPNUMPOLZDHAAY-UHFFFAOYSA-N Diethylenetriamine Chemical compound NCCNCCN RPNUMPOLZDHAAY-UHFFFAOYSA-N 0.000 description 1
- SNRUBQQJIBEYMU-UHFFFAOYSA-N Dodecane Natural products CCCCCCCCCCCC SNRUBQQJIBEYMU-UHFFFAOYSA-N 0.000 description 1
- JIGUQPWFLRLWPJ-UHFFFAOYSA-N Ethyl acrylate Chemical compound CCOC(=O)C=C JIGUQPWFLRLWPJ-UHFFFAOYSA-N 0.000 description 1
- KMTRUDSVKNLOMY-UHFFFAOYSA-N Ethylene carbonate Chemical compound O=C1OCCO1 KMTRUDSVKNLOMY-UHFFFAOYSA-N 0.000 description 1
- IAYPIBMASNFSPL-UHFFFAOYSA-N Ethylene oxide Chemical compound C1CO1 IAYPIBMASNFSPL-UHFFFAOYSA-N 0.000 description 1
- 239000004606 Fillers/Extenders Substances 0.000 description 1
- WOBHKFSMXKNTIM-UHFFFAOYSA-N Hydroxyethyl methacrylate Chemical compound CC(=C)C(=O)OCCO WOBHKFSMXKNTIM-UHFFFAOYSA-N 0.000 description 1
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 1
- 229910021578 Iron(III) chloride Inorganic materials 0.000 description 1
- 229910000576 Laminated steel Inorganic materials 0.000 description 1
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 1
- 229920000877 Melamine resin Polymers 0.000 description 1
- CERQOIWHTDAKMF-UHFFFAOYSA-M Methacrylate Chemical compound CC(=C)C([O-])=O CERQOIWHTDAKMF-UHFFFAOYSA-M 0.000 description 1
- NTIZESTWPVYFNL-UHFFFAOYSA-N Methyl isobutyl ketone Chemical compound CC(C)CC(C)=O NTIZESTWPVYFNL-UHFFFAOYSA-N 0.000 description 1
- UIHCLUNTQKBZGK-UHFFFAOYSA-N Methyl isobutyl ketone Natural products CCC(C)C(C)=O UIHCLUNTQKBZGK-UHFFFAOYSA-N 0.000 description 1
- 229910000861 Mg alloy Inorganic materials 0.000 description 1
- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 description 1
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 1
- AKNUHUCEWALCOI-UHFFFAOYSA-N N-ethyldiethanolamine Chemical compound OCCN(CC)CCO AKNUHUCEWALCOI-UHFFFAOYSA-N 0.000 description 1
- VIACXVYXPNMDSU-UHFFFAOYSA-L N.[Al+3].[O-]S([O-])(=O)=O Chemical compound N.[Al+3].[O-]S([O-])(=O)=O VIACXVYXPNMDSU-UHFFFAOYSA-L 0.000 description 1
- QORUGOXNWQUALA-UHFFFAOYSA-N N=C=O.N=C=O.N=C=O.C1=CC=C(C(C2=CC=CC=C2)C2=CC=CC=C2)C=C1 Chemical compound N=C=O.N=C=O.N=C=O.C1=CC=C(C(C2=CC=CC=C2)C2=CC=CC=C2)C=C1 QORUGOXNWQUALA-UHFFFAOYSA-N 0.000 description 1
- CKGFCYUVBCMUTN-UHFFFAOYSA-N NN.NN.C(CCC(=O)O)(=O)O Chemical compound NN.NN.C(CCC(=O)O)(=O)O CKGFCYUVBCMUTN-UHFFFAOYSA-N 0.000 description 1
- 229910021586 Nickel(II) chloride Inorganic materials 0.000 description 1
- 229920001665 Poly-4-vinylphenol Polymers 0.000 description 1
- 239000004793 Polystyrene Substances 0.000 description 1
- GOOHAUXETOMSMM-UHFFFAOYSA-N Propylene oxide Chemical compound CC1CO1 GOOHAUXETOMSMM-UHFFFAOYSA-N 0.000 description 1
- RSBNPUNXBGVNNB-UHFFFAOYSA-M S(=O)(=O)([O-])[O-].[NH4+].[Co+] Chemical compound S(=O)(=O)([O-])[O-].[NH4+].[Co+] RSBNPUNXBGVNNB-UHFFFAOYSA-M 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 1
- GSEJCLTVZPLZKY-UHFFFAOYSA-N Triethanolamine Chemical compound OCCN(CCO)CCO GSEJCLTVZPLZKY-UHFFFAOYSA-N 0.000 description 1
- LEHOTFFKMJEONL-UHFFFAOYSA-N Uric Acid Chemical group N1C(=O)NC(=O)C2=C1NC(=O)N2 LEHOTFFKMJEONL-UHFFFAOYSA-N 0.000 description 1
- FMRLDPWIRHBCCC-UHFFFAOYSA-L Zinc carbonate Chemical compound [Zn+2].[O-]C([O-])=O FMRLDPWIRHBCCC-UHFFFAOYSA-L 0.000 description 1
- 229910001297 Zn alloy Inorganic materials 0.000 description 1
- QLBRROYTTDFLDX-UHFFFAOYSA-N [3-(aminomethyl)cyclohexyl]methanamine Chemical compound NCC1CCCC(CN)C1 QLBRROYTTDFLDX-UHFFFAOYSA-N 0.000 description 1
- YIMQCDZDWXUDCA-UHFFFAOYSA-N [4-(hydroxymethyl)cyclohexyl]methanol Chemical compound OCC1CCC(CO)CC1 YIMQCDZDWXUDCA-UHFFFAOYSA-N 0.000 description 1
- YFVCXGAYZXYSMQ-UHFFFAOYSA-N [SiH4].C(CCC)NCCC[Si](OC)(OC)OC Chemical compound [SiH4].C(CCC)NCCC[Si](OC)(OC)OC YFVCXGAYZXYSMQ-UHFFFAOYSA-N 0.000 description 1
- QYIBXNARBGCCNX-UHFFFAOYSA-N [V+3].CCCC[O-].CCCC[O-].CCCC[O-] Chemical compound [V+3].CCCC[O-].CCCC[O-].CCCC[O-] QYIBXNARBGCCNX-UHFFFAOYSA-N 0.000 description 1
- MGSCVPSSIVOYMY-UHFFFAOYSA-N [V+3].CC[O-].CC[O-].CC[O-] Chemical compound [V+3].CC[O-].CC[O-].CC[O-] MGSCVPSSIVOYMY-UHFFFAOYSA-N 0.000 description 1
- LXASOGUHMSNFCR-UHFFFAOYSA-D [V+5].[V+5].[O-]C(=O)C([O-])=O.[O-]C(=O)C([O-])=O.[O-]C(=O)C([O-])=O.[O-]C(=O)C([O-])=O.[O-]C(=O)C([O-])=O Chemical compound [V+5].[V+5].[O-]C(=O)C([O-])=O.[O-]C(=O)C([O-])=O.[O-]C(=O)C([O-])=O.[O-]C(=O)C([O-])=O.[O-]C(=O)C([O-])=O LXASOGUHMSNFCR-UHFFFAOYSA-D 0.000 description 1
- GLMOMDXKLRBTDY-UHFFFAOYSA-A [V+5].[V+5].[V+5].[O-]P([O-])([O-])=O.[O-]P([O-])([O-])=O.[O-]P([O-])([O-])=O.[O-]P([O-])([O-])=O.[O-]P([O-])([O-])=O Chemical compound [V+5].[V+5].[V+5].[O-]P([O-])([O-])=O.[O-]P([O-])([O-])=O.[O-]P([O-])([O-])=O.[O-]P([O-])([O-])=O.[O-]P([O-])([O-])=O GLMOMDXKLRBTDY-UHFFFAOYSA-A 0.000 description 1
- KXBFLNPZHXDQLV-UHFFFAOYSA-N [cyclohexyl(diisocyanato)methyl]cyclohexane Chemical compound C1CCCCC1C(N=C=O)(N=C=O)C1CCCCC1 KXBFLNPZHXDQLV-UHFFFAOYSA-N 0.000 description 1
- VTKVCESTLFTRPO-UHFFFAOYSA-N [ethenyl(dimethoxy)silyl]oxy-bis(trimethoxysilyl)methanamine Chemical compound CO[Si](OC)(OC)C(O[Si](OC)(OC)C=C)(N)[Si](OC)(OC)OC VTKVCESTLFTRPO-UHFFFAOYSA-N 0.000 description 1
- 150000008065 acid anhydrides Chemical class 0.000 description 1
- 230000002378 acidificating effect Effects 0.000 description 1
- 239000002535 acidifier Substances 0.000 description 1
- 238000012644 addition polymerization Methods 0.000 description 1
- WNLRTRBMVRJNCN-UHFFFAOYSA-L adipate(2-) Chemical compound [O-]C(=O)CCCCC([O-])=O WNLRTRBMVRJNCN-UHFFFAOYSA-L 0.000 description 1
- 238000007605 air drying Methods 0.000 description 1
- 239000005456 alcohol based solvent Substances 0.000 description 1
- 230000003113 alkalizing effect Effects 0.000 description 1
- 125000003342 alkenyl group Chemical group 0.000 description 1
- 150000001350 alkyl halides Chemical class 0.000 description 1
- 125000005037 alkyl phenyl group Chemical group 0.000 description 1
- 125000000304 alkynyl group Chemical group 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- CECABOMBVQNBEC-UHFFFAOYSA-K aluminium iodide Chemical compound I[Al](I)I CECABOMBVQNBEC-UHFFFAOYSA-K 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 235000012211 aluminium silicate Nutrition 0.000 description 1
- DIZPMCHEQGEION-UHFFFAOYSA-H aluminium sulfate (anhydrous) Chemical compound [Al+3].[Al+3].[O-]S([O-])(=O)=O.[O-]S([O-])(=O)=O.[O-]S([O-])(=O)=O DIZPMCHEQGEION-UHFFFAOYSA-H 0.000 description 1
- 229940118662 aluminum carbonate Drugs 0.000 description 1
- LHIJANUOQQMGNT-UHFFFAOYSA-N aminoethylethanolamine Chemical compound NCCNCCO LHIJANUOQQMGNT-UHFFFAOYSA-N 0.000 description 1
- 235000019270 ammonium chloride Nutrition 0.000 description 1
- MXZRMHIULZDAKC-UHFFFAOYSA-L ammonium magnesium phosphate Chemical compound [NH4+].[Mg+2].[O-]P([O-])([O-])=O MXZRMHIULZDAKC-UHFFFAOYSA-L 0.000 description 1
- 238000010539 anionic addition polymerization reaction Methods 0.000 description 1
- 150000001491 aromatic compounds Chemical class 0.000 description 1
- QFFVPLLCYGOFPU-UHFFFAOYSA-N barium chromate Chemical compound [Ba+2].[O-][Cr]([O-])(=O)=O QFFVPLLCYGOFPU-UHFFFAOYSA-N 0.000 description 1
- 229940083898 barium chromate Drugs 0.000 description 1
- RCMWGBKVFBTLCW-UHFFFAOYSA-N barium(2+);dioxido(dioxo)molybdenum Chemical compound [Ba+2].[O-][Mo]([O-])(=O)=O RCMWGBKVFBTLCW-UHFFFAOYSA-N 0.000 description 1
- 125000002619 bicyclic group Chemical group 0.000 description 1
- 239000004305 biphenyl Substances 0.000 description 1
- 235000010290 biphenyl Nutrition 0.000 description 1
- 125000006267 biphenyl group Chemical group 0.000 description 1
- OWMVSZAMULFTJU-UHFFFAOYSA-N bis-tris Chemical compound OCCN(CCO)C(CO)(CO)CO OWMVSZAMULFTJU-UHFFFAOYSA-N 0.000 description 1
- 229910052797 bismuth Inorganic materials 0.000 description 1
- JCXGWMGPZLAOME-UHFFFAOYSA-N bismuth atom Chemical compound [Bi] JCXGWMGPZLAOME-UHFFFAOYSA-N 0.000 description 1
- 229940049676 bismuth hydroxide Drugs 0.000 description 1
- 229910000416 bismuth oxide Inorganic materials 0.000 description 1
- 229910000380 bismuth sulfate Inorganic materials 0.000 description 1
- TZSXPYWRDWEXHG-UHFFFAOYSA-K bismuth;trihydroxide Chemical compound [OH-].[OH-].[OH-].[Bi+3] TZSXPYWRDWEXHG-UHFFFAOYSA-K 0.000 description 1
- 238000007664 blowing Methods 0.000 description 1
- 238000009835 boiling Methods 0.000 description 1
- 150000001639 boron compounds Chemical class 0.000 description 1
- UDSAIICHUKSCKT-UHFFFAOYSA-N bromophenol blue Chemical compound C1=C(Br)C(O)=C(Br)C=C1C1(C=2C=C(Br)C(O)=C(Br)C=2)C2=CC=CC=C2S(=O)(=O)O1 UDSAIICHUKSCKT-UHFFFAOYSA-N 0.000 description 1
- 238000012662 bulk polymerization Methods 0.000 description 1
- VXTQKJXIZHSXBY-UHFFFAOYSA-N butan-2-yl 2-methylprop-2-enoate Chemical compound CCC(C)OC(=O)C(C)=C VXTQKJXIZHSXBY-UHFFFAOYSA-N 0.000 description 1
- RNOOHTVUSNIPCJ-UHFFFAOYSA-N butan-2-yl prop-2-enoate Chemical compound CCC(C)OC(=O)C=C RNOOHTVUSNIPCJ-UHFFFAOYSA-N 0.000 description 1
- 125000004369 butenyl group Chemical group C(=CCC)* 0.000 description 1
- CQEYYJKEWSMYFG-UHFFFAOYSA-N butyl acrylate Chemical compound CCCCOC(=O)C=C CQEYYJKEWSMYFG-UHFFFAOYSA-N 0.000 description 1
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 229910000019 calcium carbonate Inorganic materials 0.000 description 1
- AXCZMVOFGPJBDE-UHFFFAOYSA-L calcium dihydroxide Chemical compound [OH-].[OH-].[Ca+2] AXCZMVOFGPJBDE-UHFFFAOYSA-L 0.000 description 1
- 239000000920 calcium hydroxide Substances 0.000 description 1
- 229910001861 calcium hydroxide Inorganic materials 0.000 description 1
- BCFSVSISUGYRMF-UHFFFAOYSA-N calcium;dioxido(dioxo)chromium;dihydrate Chemical compound O.O.[Ca+2].[O-][Cr]([O-])(=O)=O BCFSVSISUGYRMF-UHFFFAOYSA-N 0.000 description 1
- BIOOACNPATUQFW-UHFFFAOYSA-N calcium;dioxido(dioxo)molybdenum Chemical compound [Ca+2].[O-][Mo]([O-])(=O)=O BIOOACNPATUQFW-UHFFFAOYSA-N 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 239000006229 carbon black Substances 0.000 description 1
- 150000001732 carboxylic acid derivatives Chemical class 0.000 description 1
- 239000003054 catalyst Substances 0.000 description 1
- 239000003093 cationic surfactant Substances 0.000 description 1
- XMPZTFVPEKAKFH-UHFFFAOYSA-P ceric ammonium nitrate Chemical compound [NH4+].[NH4+].[Ce+4].[O-][N+]([O-])=O.[O-][N+]([O-])=O.[O-][N+]([O-])=O.[O-][N+]([O-])=O.[O-][N+]([O-])=O.[O-][N+]([O-])=O XMPZTFVPEKAKFH-UHFFFAOYSA-P 0.000 description 1
- 229910000420 cerium oxide Inorganic materials 0.000 description 1
- VYLVYHXQOHJDJL-UHFFFAOYSA-K cerium trichloride Chemical compound Cl[Ce](Cl)Cl VYLVYHXQOHJDJL-UHFFFAOYSA-K 0.000 description 1
- XQTIWNLDFPPCIU-UHFFFAOYSA-N cerium(3+) Chemical compound [Ce+3] XQTIWNLDFPPCIU-UHFFFAOYSA-N 0.000 description 1
- VGBWDOLBWVJTRZ-UHFFFAOYSA-K cerium(3+);triacetate Chemical compound [Ce+3].CC([O-])=O.CC([O-])=O.CC([O-])=O VGBWDOLBWVJTRZ-UHFFFAOYSA-K 0.000 description 1
- OZECDDHOAMNMQI-UHFFFAOYSA-H cerium(3+);trisulfate Chemical compound [Ce+3].[Ce+3].[O-]S([O-])(=O)=O.[O-]S([O-])(=O)=O.[O-]S([O-])(=O)=O OZECDDHOAMNMQI-UHFFFAOYSA-H 0.000 description 1
- 239000013043 chemical agent Substances 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- 125000001309 chloro group Chemical group Cl* 0.000 description 1
- NEHMKBQYUWJMIP-NJFSPNSNSA-N chloro(114C)methane Chemical compound [14CH3]Cl NEHMKBQYUWJMIP-NJFSPNSNSA-N 0.000 description 1
- KOPOQZFJUQMUML-UHFFFAOYSA-N chlorosilane Chemical class Cl[SiH3] KOPOQZFJUQMUML-UHFFFAOYSA-N 0.000 description 1
- 239000001031 chromium pigment Substances 0.000 description 1
- WYYQVWLEPYFFLP-UHFFFAOYSA-K chromium(3+);triacetate Chemical compound [Cr+3].CC([O-])=O.CC([O-])=O.CC([O-])=O WYYQVWLEPYFFLP-UHFFFAOYSA-K 0.000 description 1
- PPUZYFWVBLIDMP-UHFFFAOYSA-K chromium(3+);triiodide Chemical compound I[Cr](I)I PPUZYFWVBLIDMP-UHFFFAOYSA-K 0.000 description 1
- IAQWMWUKBQPOIY-UHFFFAOYSA-N chromium(4+);oxygen(2-) Chemical compound [O-2].[O-2].[Cr+4] IAQWMWUKBQPOIY-UHFFFAOYSA-N 0.000 description 1
- GRWVQDDAKZFPFI-UHFFFAOYSA-H chromium(III) sulfate Chemical compound [Cr+3].[Cr+3].[O-]S([O-])(=O)=O.[O-]S([O-])(=O)=O.[O-]S([O-])(=O)=O GRWVQDDAKZFPFI-UHFFFAOYSA-H 0.000 description 1
- 229910000356 chromium(III) sulfate Inorganic materials 0.000 description 1
- 239000011696 chromium(III) sulphate Substances 0.000 description 1
- 235000015217 chromium(III) sulphate Nutrition 0.000 description 1
- AYTAKQFHWFYBMA-UHFFFAOYSA-N chromium(IV) oxide Inorganic materials O=[Cr]=O AYTAKQFHWFYBMA-UHFFFAOYSA-N 0.000 description 1
- XZQOHYZUWTWZBL-UHFFFAOYSA-L chromium(ii) bromide Chemical compound [Cr+2].[Br-].[Br-] XZQOHYZUWTWZBL-UHFFFAOYSA-L 0.000 description 1
- UZDWIWGMKWZEPE-UHFFFAOYSA-K chromium(iii) bromide Chemical compound [Cr+3].[Br-].[Br-].[Br-] UZDWIWGMKWZEPE-UHFFFAOYSA-K 0.000 description 1
- 239000008199 coating composition Substances 0.000 description 1
- 239000011247 coating layer Substances 0.000 description 1
- 229910000152 cobalt phosphate Inorganic materials 0.000 description 1
- 229940044175 cobalt sulfate Drugs 0.000 description 1
- 229910000361 cobalt sulfate Inorganic materials 0.000 description 1
- KTVIXTQDYHMGHF-UHFFFAOYSA-L cobalt(2+) sulfate Chemical compound [Co+2].[O-]S([O-])(=O)=O KTVIXTQDYHMGHF-UHFFFAOYSA-L 0.000 description 1
- XTUHPOUJWWTMNC-UHFFFAOYSA-N cobalt(2+);dioxido(dioxo)chromium Chemical compound [Co+2].[O-][Cr]([O-])(=O)=O XTUHPOUJWWTMNC-UHFFFAOYSA-N 0.000 description 1
- ZBDSFTZNNQNSQM-UHFFFAOYSA-H cobalt(2+);diphosphate Chemical compound [Co+2].[Co+2].[Co+2].[O-]P([O-])([O-])=O.[O-]P([O-])([O-])=O ZBDSFTZNNQNSQM-UHFFFAOYSA-H 0.000 description 1
- ASKVAEGIVYSGNY-UHFFFAOYSA-L cobalt(ii) hydroxide Chemical compound [OH-].[OH-].[Co+2] ASKVAEGIVYSGNY-UHFFFAOYSA-L 0.000 description 1
- KTPIHRZQGZDLSN-UHFFFAOYSA-N cobalt;nitric acid Chemical compound [Co].O[N+]([O-])=O KTPIHRZQGZDLSN-UHFFFAOYSA-N 0.000 description 1
- 239000010960 cold rolled steel Substances 0.000 description 1
- 239000008119 colloidal silica Substances 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 238000007766 curtain coating Methods 0.000 description 1
- 125000004122 cyclic group Chemical group 0.000 description 1
- PDXRQENMIVHKPI-UHFFFAOYSA-N cyclohexane-1,1-diol Chemical compound OC1(O)CCCCC1 PDXRQENMIVHKPI-UHFFFAOYSA-N 0.000 description 1
- KBLWLMPSVYBVDK-UHFFFAOYSA-N cyclohexyl prop-2-enoate Chemical compound C=CC(=O)OC1CCCCC1 KBLWLMPSVYBVDK-UHFFFAOYSA-N 0.000 description 1
- 125000003493 decenyl group Chemical group [H]C([*])=C([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- GTBGXKPAKVYEKJ-UHFFFAOYSA-N decyl 2-methylprop-2-enoate Chemical compound CCCCCCCCCCOC(=O)C(C)=C GTBGXKPAKVYEKJ-UHFFFAOYSA-N 0.000 description 1
- 125000002704 decyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- FWLDHHJLVGRRHD-UHFFFAOYSA-N decyl prop-2-enoate Chemical compound CCCCCCCCCCOC(=O)C=C FWLDHHJLVGRRHD-UHFFFAOYSA-N 0.000 description 1
- 239000008367 deionised water Substances 0.000 description 1
- 229910021641 deionized water Inorganic materials 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 239000003599 detergent Substances 0.000 description 1
- LTXHKPDRHPMBKA-UHFFFAOYSA-N dialuminum;cobalt(2+);oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[O-2].[Al+3].[Al+3].[Co+2] LTXHKPDRHPMBKA-UHFFFAOYSA-N 0.000 description 1
- 150000004985 diamines Chemical class 0.000 description 1
- VODGJKZAAVKBAL-UHFFFAOYSA-L diazanium;manganese(2+);disulfate Chemical compound [NH4+].[NH4+].[Mn+2].[O-]S([O-])(=O)=O.[O-]S([O-])(=O)=O VODGJKZAAVKBAL-UHFFFAOYSA-L 0.000 description 1
- NMGYKLMMQCTUGI-UHFFFAOYSA-J diazanium;titanium(4+);hexafluoride Chemical compound [NH4+].[NH4+].[F-].[F-].[F-].[F-].[F-].[F-].[Ti+4] NMGYKLMMQCTUGI-UHFFFAOYSA-J 0.000 description 1
- TYIXMATWDRGMPF-UHFFFAOYSA-N dibismuth;oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[Bi+3].[Bi+3] TYIXMATWDRGMPF-UHFFFAOYSA-N 0.000 description 1
- BEQZMQXCOWIHRY-UHFFFAOYSA-H dibismuth;trisulfate Chemical compound [Bi+3].[Bi+3].[O-]S([O-])(=O)=O.[O-]S([O-])(=O)=O.[O-]S([O-])(=O)=O BEQZMQXCOWIHRY-UHFFFAOYSA-H 0.000 description 1
- OSXYHAQZDCICNX-UHFFFAOYSA-N dichloro(diphenyl)silane Chemical compound C=1C=CC=CC=1[Si](Cl)(Cl)C1=CC=CC=C1 OSXYHAQZDCICNX-UHFFFAOYSA-N 0.000 description 1
- ZBCBWPMODOFKDW-UHFFFAOYSA-N diethanolamine Chemical compound OCCNCCO ZBCBWPMODOFKDW-UHFFFAOYSA-N 0.000 description 1
- ORTUEUNRBVDDFY-UHFFFAOYSA-N diethoxy-methyl-(3-propoxypropyl)silane Chemical compound CCCOCCC[Si](C)(OCC)OCC ORTUEUNRBVDDFY-UHFFFAOYSA-N 0.000 description 1
- UJTGYJODGVUOGO-UHFFFAOYSA-N diethoxy-methyl-propylsilane Chemical compound CCC[Si](C)(OCC)OCC UJTGYJODGVUOGO-UHFFFAOYSA-N 0.000 description 1
- NAAXGLXYRDSIRS-UHFFFAOYSA-L dihydrogen phosphate;manganese(2+) Chemical compound [Mn+2].OP(O)([O-])=O.OP(O)([O-])=O NAAXGLXYRDSIRS-UHFFFAOYSA-L 0.000 description 1
- BMSDTRMGXCBBBH-UHFFFAOYSA-L diiodochromium Chemical compound [Cr+2].[I-].[I-] BMSDTRMGXCBBBH-UHFFFAOYSA-L 0.000 description 1
- 239000003085 diluting agent Substances 0.000 description 1
- MHJAJDCZWVHCPF-UHFFFAOYSA-L dimagnesium phosphate Chemical compound [Mg+2].OP([O-])([O-])=O MHJAJDCZWVHCPF-UHFFFAOYSA-L 0.000 description 1
- 229910000395 dimagnesium phosphate Inorganic materials 0.000 description 1
- JJQZDUKDJDQPMQ-UHFFFAOYSA-N dimethoxy(dimethyl)silane Chemical compound CO[Si](C)(C)OC JJQZDUKDJDQPMQ-UHFFFAOYSA-N 0.000 description 1
- WHGNXNCOTZPEEK-UHFFFAOYSA-N dimethoxy-methyl-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CO[Si](C)(OC)CCCOCC1CO1 WHGNXNCOTZPEEK-UHFFFAOYSA-N 0.000 description 1
- GOFSGYGYWCKLTO-UHFFFAOYSA-N dimethoxy-methyl-propylsilane;ethane-1,2-diamine Chemical compound NCCN.CCC[Si](C)(OC)OC GOFSGYGYWCKLTO-UHFFFAOYSA-N 0.000 description 1
- IEJIGPNLZYLLBP-UHFFFAOYSA-N dimethyl carbonate Chemical compound COC(=O)OC IEJIGPNLZYLLBP-UHFFFAOYSA-N 0.000 description 1
- ROORDVPLFPIABK-UHFFFAOYSA-N diphenyl carbonate Chemical compound C=1C=CC=CC=1OC(=O)OC1=CC=CC=C1 ROORDVPLFPIABK-UHFFFAOYSA-N 0.000 description 1
- ZZTCPWRAHWXWCH-UHFFFAOYSA-N diphenylmethanediamine Chemical compound C=1C=CC=CC=1C(N)(N)C1=CC=CC=C1 ZZTCPWRAHWXWCH-UHFFFAOYSA-N 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
- 125000005066 dodecenyl group Chemical group C(=CCCCCCCCCCC)* 0.000 description 1
- 125000003438 dodecyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 238000004945 emulsification Methods 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 125000003700 epoxy group Chemical group 0.000 description 1
- 239000003759 ester based solvent Substances 0.000 description 1
- CCIVGXIOQKPBKL-UHFFFAOYSA-M ethanesulfonate Chemical compound CCS([O-])(=O)=O CCIVGXIOQKPBKL-UHFFFAOYSA-M 0.000 description 1
- NKSJNEHGWDZZQF-UHFFFAOYSA-N ethenyl(trimethoxy)silane Chemical compound CO[Si](OC)(OC)C=C NKSJNEHGWDZZQF-UHFFFAOYSA-N 0.000 description 1
- MBGQQKKTDDNCSG-UHFFFAOYSA-N ethenyl-diethoxy-methylsilane Chemical compound CCO[Si](C)(C=C)OCC MBGQQKKTDDNCSG-UHFFFAOYSA-N 0.000 description 1
- RTZKZFJDLAIYFH-UHFFFAOYSA-N ether Substances CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 1
- 239000004210 ether based solvent Substances 0.000 description 1
- 125000001033 ether group Chemical group 0.000 description 1
- 150000002170 ethers Chemical class 0.000 description 1
- UPCIBFUJJLCOQG-UHFFFAOYSA-L ethyl-[2-[2-[ethyl(dimethyl)azaniumyl]ethyl-methylamino]ethyl]-dimethylazanium;dibromide Chemical compound [Br-].[Br-].CC[N+](C)(C)CCN(C)CC[N+](C)(C)CC UPCIBFUJJLCOQG-UHFFFAOYSA-L 0.000 description 1
- 125000001153 fluoro group Chemical group F* 0.000 description 1
- 150000002334 glycols Chemical class 0.000 description 1
- 150000004820 halides Chemical class 0.000 description 1
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 1
- MHIBEGOZTWERHF-UHFFFAOYSA-N heptane-1,1-diol Chemical compound CCCCCCC(O)O MHIBEGOZTWERHF-UHFFFAOYSA-N 0.000 description 1
- 125000003187 heptyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- IIRDTKBZINWQAW-UHFFFAOYSA-N hexaethylene glycol Chemical compound OCCOCCOCCOCCOCCOCCO IIRDTKBZINWQAW-UHFFFAOYSA-N 0.000 description 1
- TZMQHOJDDMFGQX-UHFFFAOYSA-N hexane-1,1,1-triol Chemical compound CCCCCC(O)(O)O TZMQHOJDDMFGQX-UHFFFAOYSA-N 0.000 description 1
- SYECJBOWSGTPLU-UHFFFAOYSA-N hexane-1,1-diamine Chemical compound CCCCCC(N)N SYECJBOWSGTPLU-UHFFFAOYSA-N 0.000 description 1
- QVTWBMUAJHVAIJ-UHFFFAOYSA-N hexane-1,4-diol Chemical compound CCC(O)CCCO QVTWBMUAJHVAIJ-UHFFFAOYSA-N 0.000 description 1
- FUZZWVXGSFPDMH-UHFFFAOYSA-M hexanoate Chemical compound CCCCCC([O-])=O FUZZWVXGSFPDMH-UHFFFAOYSA-M 0.000 description 1
- LNCPIMCVTKXXOY-UHFFFAOYSA-N hexyl 2-methylprop-2-enoate Chemical compound CCCCCCOC(=O)C(C)=C LNCPIMCVTKXXOY-UHFFFAOYSA-N 0.000 description 1
- 125000004051 hexyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- LNMQRPPRQDGUDR-UHFFFAOYSA-N hexyl prop-2-enoate Chemical compound CCCCCCOC(=O)C=C LNMQRPPRQDGUDR-UHFFFAOYSA-N 0.000 description 1
- 150000004677 hydrates Chemical class 0.000 description 1
- 150000002431 hydrogen Chemical class 0.000 description 1
- RXPAJWPEYBDXOG-UHFFFAOYSA-N hydron;methyl 4-methoxypyridine-2-carboxylate;chloride Chemical compound Cl.COC(=O)C1=CC(OC)=CC=N1 RXPAJWPEYBDXOG-UHFFFAOYSA-N 0.000 description 1
- 150000004679 hydroxides Chemical class 0.000 description 1
- XDBSEZHMWGHVIL-UHFFFAOYSA-M hydroxy(dioxo)vanadium Chemical compound O[V](=O)=O XDBSEZHMWGHVIL-UHFFFAOYSA-M 0.000 description 1
- 229910052500 inorganic mineral Inorganic materials 0.000 description 1
- 239000001023 inorganic pigment Substances 0.000 description 1
- 229910052740 iodine Inorganic materials 0.000 description 1
- FBAFATDZDUQKNH-UHFFFAOYSA-M iron chloride Chemical compound [Cl-].[Fe] FBAFATDZDUQKNH-UHFFFAOYSA-M 0.000 description 1
- 235000014413 iron hydroxide Nutrition 0.000 description 1
- MVFCKEFYUDZOCX-UHFFFAOYSA-N iron(2+);dinitrate Chemical compound [Fe+2].[O-][N+]([O-])=O.[O-][N+]([O-])=O MVFCKEFYUDZOCX-UHFFFAOYSA-N 0.000 description 1
- CANNEYRNFLETNI-UHFFFAOYSA-N iron(3+) propan-2-one Chemical compound [Fe+3].CC(=O)C CANNEYRNFLETNI-UHFFFAOYSA-N 0.000 description 1
- NPFOYSMITVOQOS-UHFFFAOYSA-K iron(III) citrate Chemical compound [Fe+3].[O-]C(=O)CC(O)(CC([O-])=O)C([O-])=O NPFOYSMITVOQOS-UHFFFAOYSA-K 0.000 description 1
- NCNCGGDMXMBVIA-UHFFFAOYSA-L iron(ii) hydroxide Chemical compound [OH-].[OH-].[Fe+2] NCNCGGDMXMBVIA-UHFFFAOYSA-L 0.000 description 1
- 125000000959 isobutyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])* 0.000 description 1
- AZQGFVRDZTUHBU-UHFFFAOYSA-N isocyanic acid;triethoxy(propyl)silane Chemical compound N=C=O.CCC[Si](OCC)(OCC)OCC AZQGFVRDZTUHBU-UHFFFAOYSA-N 0.000 description 1
- ZFSLODLOARCGLH-UHFFFAOYSA-N isocyanuric acid Chemical group OC1=NC(O)=NC(O)=N1 ZFSLODLOARCGLH-UHFFFAOYSA-N 0.000 description 1
- 125000004491 isohexyl group Chemical group C(CCC(C)C)* 0.000 description 1
- 125000001972 isopentyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])C([H])([H])* 0.000 description 1
- QQVIHTHCMHWDBS-UHFFFAOYSA-L isophthalate(2-) Chemical compound [O-]C(=O)C1=CC=CC(C([O-])=O)=C1 QQVIHTHCMHWDBS-UHFFFAOYSA-L 0.000 description 1
- 239000005453 ketone based solvent Substances 0.000 description 1
- 150000002576 ketones Chemical class 0.000 description 1
- GKQPCPXONLDCMU-CCEZHUSRSA-N lacidipine Chemical compound CCOC(=O)C1=C(C)NC(C)=C(C(=O)OCC)C1C1=CC=CC=C1\C=C\C(=O)OC(C)(C)C GKQPCPXONLDCMU-CCEZHUSRSA-N 0.000 description 1
- PAZHGORSDKKUPI-UHFFFAOYSA-N lithium metasilicate Chemical compound [Li+].[Li+].[O-][Si]([O-])=O PAZHGORSDKKUPI-UHFFFAOYSA-N 0.000 description 1
- 229910052912 lithium silicate Inorganic materials 0.000 description 1
- 229910001496 lithium tetrafluoroborate Inorganic materials 0.000 description 1
- 239000011777 magnesium Substances 0.000 description 1
- 229910052749 magnesium Inorganic materials 0.000 description 1
- ZLNQQNXFFQJAID-UHFFFAOYSA-L magnesium carbonate Chemical compound [Mg+2].[O-]C([O-])=O ZLNQQNXFFQJAID-UHFFFAOYSA-L 0.000 description 1
- 239000001095 magnesium carbonate Substances 0.000 description 1
- 229910000021 magnesium carbonate Inorganic materials 0.000 description 1
- VTHJTEIRLNZDEV-UHFFFAOYSA-L magnesium dihydroxide Chemical compound [OH-].[OH-].[Mg+2] VTHJTEIRLNZDEV-UHFFFAOYSA-L 0.000 description 1
- ORUIBWPALBXDOA-UHFFFAOYSA-L magnesium fluoride Chemical compound [F-].[F-].[Mg+2] ORUIBWPALBXDOA-UHFFFAOYSA-L 0.000 description 1
- 229910001635 magnesium fluoride Inorganic materials 0.000 description 1
- 239000000347 magnesium hydroxide Substances 0.000 description 1
- 229910001862 magnesium hydroxide Inorganic materials 0.000 description 1
- 229910052943 magnesium sulfate Inorganic materials 0.000 description 1
- 235000019341 magnesium sulphate Nutrition 0.000 description 1
- 239000011656 manganese carbonate Substances 0.000 description 1
- 235000006748 manganese carbonate Nutrition 0.000 description 1
- 229940093474 manganese carbonate Drugs 0.000 description 1
- IPJKJLXEVHOKSE-UHFFFAOYSA-L manganese dihydroxide Chemical compound [OH-].[OH-].[Mn+2] IPJKJLXEVHOKSE-UHFFFAOYSA-L 0.000 description 1
- MIVBAHRSNUNMPP-UHFFFAOYSA-N manganese(2+);dinitrate Chemical compound [Mn+2].[O-][N+]([O-])=O.[O-][N+]([O-])=O MIVBAHRSNUNMPP-UHFFFAOYSA-N 0.000 description 1
- 229910000016 manganese(II) carbonate Inorganic materials 0.000 description 1
- XMWCXZJXESXBBY-UHFFFAOYSA-L manganese(ii) carbonate Chemical compound [Mn+2].[O-]C([O-])=O XMWCXZJXESXBBY-UHFFFAOYSA-L 0.000 description 1
- QWYFOIJABGVEFP-UHFFFAOYSA-L manganese(ii) iodide Chemical compound [Mn+2].[I-].[I-] QWYFOIJABGVEFP-UHFFFAOYSA-L 0.000 description 1
- JDSHMPZPIAZGSV-UHFFFAOYSA-N melamine Chemical compound NC1=NC(N)=NC(N)=N1 JDSHMPZPIAZGSV-UHFFFAOYSA-N 0.000 description 1
- ALTWGIIQPLQAAM-UHFFFAOYSA-N metavanadate Chemical compound [O-][V](=O)=O ALTWGIIQPLQAAM-UHFFFAOYSA-N 0.000 description 1
- 239000005055 methyl trichlorosilane Substances 0.000 description 1
- JLUFWMXJHAVVNN-UHFFFAOYSA-N methyltrichlorosilane Chemical compound C[Si](Cl)(Cl)Cl JLUFWMXJHAVVNN-UHFFFAOYSA-N 0.000 description 1
- 235000010755 mineral Nutrition 0.000 description 1
- 239000011707 mineral Substances 0.000 description 1
- 239000011259 mixed solution Substances 0.000 description 1
- 229910000476 molybdenum oxide Inorganic materials 0.000 description 1
- 239000000178 monomer Substances 0.000 description 1
- HYSQEYLBJYFNMH-UHFFFAOYSA-N n'-(2-aminoethyl)-n'-methylethane-1,2-diamine Chemical compound NCCN(C)CCN HYSQEYLBJYFNMH-UHFFFAOYSA-N 0.000 description 1
- INJVFBCDVXYHGQ-UHFFFAOYSA-N n'-(3-triethoxysilylpropyl)ethane-1,2-diamine Chemical compound CCO[Si](OCC)(OCC)CCCNCCN INJVFBCDVXYHGQ-UHFFFAOYSA-N 0.000 description 1
- YLBPOJLDZXHVRR-UHFFFAOYSA-N n'-[3-[diethoxy(methyl)silyl]propyl]ethane-1,2-diamine Chemical compound CCO[Si](C)(OCC)CCCNCCN YLBPOJLDZXHVRR-UHFFFAOYSA-N 0.000 description 1
- MQWFLKHKWJMCEN-UHFFFAOYSA-N n'-[3-[dimethoxy(methyl)silyl]propyl]ethane-1,2-diamine Chemical compound CO[Si](C)(OC)CCCNCCN MQWFLKHKWJMCEN-UHFFFAOYSA-N 0.000 description 1
- SCZVXVGZMZRGRU-UHFFFAOYSA-N n'-ethylethane-1,2-diamine Chemical compound CCNCCN SCZVXVGZMZRGRU-UHFFFAOYSA-N 0.000 description 1
- QHJABUZHRJTCAR-UHFFFAOYSA-N n'-methylpropane-1,3-diamine Chemical compound CNCCCN QHJABUZHRJTCAR-UHFFFAOYSA-N 0.000 description 1
- ODZZIKZQNODXFS-UHFFFAOYSA-N n,n'-dimethyl-n'-[2-(methylamino)ethyl]ethane-1,2-diamine Chemical compound CNCCN(C)CCNC ODZZIKZQNODXFS-UHFFFAOYSA-N 0.000 description 1
- YNTOKMNHRPSGFU-UHFFFAOYSA-N n-Propyl carbamate Chemical compound CCCOC(N)=O YNTOKMNHRPSGFU-UHFFFAOYSA-N 0.000 description 1
- BPLYVSYSBPLDOA-GYOJGHLZSA-N n-[(2r,3r)-1,3-dihydroxyoctadecan-2-yl]tetracosanamide Chemical compound CCCCCCCCCCCCCCCCCCCCCCCC(=O)N[C@H](CO)[C@H](O)CCCCCCCCCCCCCCC BPLYVSYSBPLDOA-GYOJGHLZSA-N 0.000 description 1
- DRRZZMBHJXLZRS-UHFFFAOYSA-N n-[3-[dimethoxy(methyl)silyl]propyl]cyclohexanamine Chemical compound CO[Si](C)(OC)CCCNC1CCCCC1 DRRZZMBHJXLZRS-UHFFFAOYSA-N 0.000 description 1
- DVYVMJLSUSGYMH-UHFFFAOYSA-N n-methyl-3-trimethoxysilylpropan-1-amine Chemical compound CNCCC[Si](OC)(OC)OC DVYVMJLSUSGYMH-UHFFFAOYSA-N 0.000 description 1
- 125000001971 neopentyl group Chemical group [H]C([*])([H])C(C([H])([H])[H])(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- 230000007935 neutral effect Effects 0.000 description 1
- 230000003472 neutralizing effect Effects 0.000 description 1
- QMMRZOWCJAIUJA-UHFFFAOYSA-L nickel dichloride Chemical compound Cl[Ni]Cl QMMRZOWCJAIUJA-UHFFFAOYSA-L 0.000 description 1
- 229910000480 nickel oxide Inorganic materials 0.000 description 1
- 229910000159 nickel phosphate Inorganic materials 0.000 description 1
- LGQLOGILCSXPEA-UHFFFAOYSA-L nickel sulfate Chemical compound [Ni+2].[O-]S([O-])(=O)=O LGQLOGILCSXPEA-UHFFFAOYSA-L 0.000 description 1
- JOCJYBPHESYFOK-UHFFFAOYSA-K nickel(3+);phosphate Chemical compound [Ni+3].[O-]P([O-])([O-])=O JOCJYBPHESYFOK-UHFFFAOYSA-K 0.000 description 1
- 229910000008 nickel(II) carbonate Inorganic materials 0.000 description 1
- 229910000363 nickel(II) sulfate Inorganic materials 0.000 description 1
- ZULUUIKRFGGGTL-UHFFFAOYSA-L nickel(ii) carbonate Chemical compound [Ni+2].[O-]C([O-])=O ZULUUIKRFGGGTL-UHFFFAOYSA-L 0.000 description 1
- BFDHFSHZJLFAMC-UHFFFAOYSA-L nickel(ii) hydroxide Chemical compound [OH-].[OH-].[Ni+2] BFDHFSHZJLFAMC-UHFFFAOYSA-L 0.000 description 1
- KBJMLQFLOWQJNF-UHFFFAOYSA-N nickel(ii) nitrate Chemical compound [Ni+2].[O-][N+]([O-])=O.[O-][N+]([O-])=O KBJMLQFLOWQJNF-UHFFFAOYSA-N 0.000 description 1
- LHJARSDQUNCSJG-UHFFFAOYSA-N nickel;propan-2-one Chemical compound [Ni].CC(C)=O LHJARSDQUNCSJG-UHFFFAOYSA-N 0.000 description 1
- GUCVJGMIXFAOAE-UHFFFAOYSA-N niobium atom Chemical compound [Nb] GUCVJGMIXFAOAE-UHFFFAOYSA-N 0.000 description 1
- VPDYSPXEGTXWEU-UHFFFAOYSA-K niobium(3+);trichloride Chemical compound Cl[Nb](Cl)Cl VPDYSPXEGTXWEU-UHFFFAOYSA-K 0.000 description 1
- 150000002823 nitrates Chemical class 0.000 description 1
- 150000002825 nitriles Chemical class 0.000 description 1
- QJGQUHMNIGDVPM-UHFFFAOYSA-N nitrogen group Chemical group [N] QJGQUHMNIGDVPM-UHFFFAOYSA-N 0.000 description 1
- BKIMMITUMNQMOS-UHFFFAOYSA-N nonane Chemical compound CCCCCCCCC BKIMMITUMNQMOS-UHFFFAOYSA-N 0.000 description 1
- 125000005187 nonenyl group Chemical group C(=CCCCCCCC)* 0.000 description 1
- 239000002736 nonionic surfactant Substances 0.000 description 1
- 125000001400 nonyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- OEIJHBUUFURJLI-UHFFFAOYSA-N octane-1,8-diol Chemical compound OCCCCCCCCO OEIJHBUUFURJLI-UHFFFAOYSA-N 0.000 description 1
- 125000004365 octenyl group Chemical group C(=CCCCCCC)* 0.000 description 1
- NZIDBRBFGPQCRY-UHFFFAOYSA-N octyl 2-methylprop-2-enoate Chemical compound CCCCCCCCOC(=O)C(C)=C NZIDBRBFGPQCRY-UHFFFAOYSA-N 0.000 description 1
- 229940065472 octyl acrylate Drugs 0.000 description 1
- 125000002347 octyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- ANISOHQJBAQUQP-UHFFFAOYSA-N octyl prop-2-enoate Chemical compound CCCCCCCCOC(=O)C=C ANISOHQJBAQUQP-UHFFFAOYSA-N 0.000 description 1
- JRZJOMJEPLMPRA-UHFFFAOYSA-N olefin Natural products CCCCCCCC=C JRZJOMJEPLMPRA-UHFFFAOYSA-N 0.000 description 1
- 239000012860 organic pigment Substances 0.000 description 1
- 150000002902 organometallic compounds Chemical class 0.000 description 1
- 229940045681 other alkylating agent in atc Drugs 0.000 description 1
- WFGKQSTWXDPEJD-UHFFFAOYSA-N oxalic acid;vanadium Chemical compound [V].OC(=O)C(O)=O WFGKQSTWXDPEJD-UHFFFAOYSA-N 0.000 description 1
- LXPCOISGJFXEJE-UHFFFAOYSA-N oxifentorex Chemical compound C=1C=CC=CC=1C[N+](C)([O-])C(C)CC1=CC=CC=C1 LXPCOISGJFXEJE-UHFFFAOYSA-N 0.000 description 1
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 1
- BMMGVYCKOGBVEV-UHFFFAOYSA-N oxo(oxoceriooxy)cerium Chemical compound [Ce]=O.O=[Ce]=O BMMGVYCKOGBVEV-UHFFFAOYSA-N 0.000 description 1
- PQQKPALAQIIWST-UHFFFAOYSA-N oxomolybdenum Chemical compound [Mo]=O PQQKPALAQIIWST-UHFFFAOYSA-N 0.000 description 1
- GNRSAWUEBMWBQH-UHFFFAOYSA-N oxonickel Chemical compound [Ni]=O GNRSAWUEBMWBQH-UHFFFAOYSA-N 0.000 description 1
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 description 1
- 238000010979 pH adjustment Methods 0.000 description 1
- 238000010422 painting Methods 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- JLFNLZLINWHATN-UHFFFAOYSA-N pentaethylene glycol Chemical compound OCCOCCOCCOCCOCCO JLFNLZLINWHATN-UHFFFAOYSA-N 0.000 description 1
- 125000002255 pentenyl group Chemical group C(=CCCC)* 0.000 description 1
- 125000001147 pentyl group Chemical group C(CCCC)* 0.000 description 1
- PNJWIWWMYCMZRO-UHFFFAOYSA-N pent‐4‐en‐2‐one Natural products CC(=O)CC=C PNJWIWWMYCMZRO-UHFFFAOYSA-N 0.000 description 1
- ZUOUZKKEUPVFJK-UHFFFAOYSA-N phenylbenzene Natural products C1=CC=CC=C1C1=CC=CC=C1 ZUOUZKKEUPVFJK-UHFFFAOYSA-N 0.000 description 1
- NBIIXXVUZAFLBC-UHFFFAOYSA-K phosphate Chemical compound [O-]P([O-])([O-])=O NBIIXXVUZAFLBC-UHFFFAOYSA-K 0.000 description 1
- 150000003013 phosphoric acid derivatives Chemical class 0.000 description 1
- 125000002270 phosphoric acid ester group Chemical group 0.000 description 1
- 229920001515 polyalkylene glycol Polymers 0.000 description 1
- 238000006068 polycondensation reaction Methods 0.000 description 1
- 229920002223 polystyrene Polymers 0.000 description 1
- 229920000909 polytetrahydrofuran Polymers 0.000 description 1
- 229920005749 polyurethane resin Polymers 0.000 description 1
- GRLPQNLYRHEGIJ-UHFFFAOYSA-J potassium aluminium sulfate Chemical compound [Al+3].[K+].[O-]S([O-])(=O)=O.[O-]S([O-])(=O)=O GRLPQNLYRHEGIJ-UHFFFAOYSA-J 0.000 description 1
- 239000012286 potassium permanganate Substances 0.000 description 1
- 235000019353 potassium silicate Nutrition 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 238000007781 pre-processing Methods 0.000 description 1
- 238000002203 pretreatment Methods 0.000 description 1
- 239000011164 primary particle Substances 0.000 description 1
- YCJBFDACUZRMEO-UHFFFAOYSA-N propan-1-olate vanadium(4+) Chemical compound [V+4].CCC[O-].CCC[O-].CCC[O-].CCC[O-] YCJBFDACUZRMEO-UHFFFAOYSA-N 0.000 description 1
- PNKHPQMATQQYFZ-UHFFFAOYSA-N propan-2-one;vanadium Chemical compound [V].CC(C)=O PNKHPQMATQQYFZ-UHFFFAOYSA-N 0.000 description 1
- BOQSSGDQNWEFSX-UHFFFAOYSA-N propan-2-yl 2-methylprop-2-enoate Chemical compound CC(C)OC(=O)C(C)=C BOQSSGDQNWEFSX-UHFFFAOYSA-N 0.000 description 1
- LYBIZMNPXTXVMV-UHFFFAOYSA-N propan-2-yl prop-2-enoate Chemical compound CC(C)OC(=O)C=C LYBIZMNPXTXVMV-UHFFFAOYSA-N 0.000 description 1
- XJMOSONTPMZWPB-UHFFFAOYSA-M propidium iodide Chemical compound [I-].[I-].C12=CC(N)=CC=C2C2=CC=C(N)C=C2[N+](CCC[N+](C)(CC)CC)=C1C1=CC=CC=C1 XJMOSONTPMZWPB-UHFFFAOYSA-M 0.000 description 1
- NHARPDSAXCBDDR-UHFFFAOYSA-N propyl 2-methylprop-2-enoate Chemical compound CCCOC(=O)C(C)=C NHARPDSAXCBDDR-UHFFFAOYSA-N 0.000 description 1
- PNXMTCDJUBJHQJ-UHFFFAOYSA-N propyl prop-2-enoate Chemical compound CCCOC(=O)C=C PNXMTCDJUBJHQJ-UHFFFAOYSA-N 0.000 description 1
- JTDPJYXDDYUJBS-UHFFFAOYSA-N quinoline-2-carbohydrazide Chemical compound C1=CC=CC2=NC(C(=O)NN)=CC=C21 JTDPJYXDDYUJBS-UHFFFAOYSA-N 0.000 description 1
- 238000007151 ring opening polymerisation reaction Methods 0.000 description 1
- 229920006395 saturated elastomer Polymers 0.000 description 1
- 229940116351 sebacate Drugs 0.000 description 1
- CXMXRPHRNRROMY-UHFFFAOYSA-L sebacate(2-) Chemical compound [O-]C(=O)CCCCCCCCC([O-])=O CXMXRPHRNRROMY-UHFFFAOYSA-L 0.000 description 1
- 125000002914 sec-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- 125000005372 silanol group Chemical group 0.000 description 1
- XJKVPKYVPCWHFO-UHFFFAOYSA-N silicon;hydrate Chemical compound O.[Si] XJKVPKYVPCWHFO-UHFFFAOYSA-N 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 239000000600 sorbitol Substances 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000012086 standard solution Substances 0.000 description 1
- NVKTUNLPFJHLCG-UHFFFAOYSA-N strontium chromate Chemical compound [Sr+2].[O-][Cr]([O-])(=O)=O NVKTUNLPFJHLCG-UHFFFAOYSA-N 0.000 description 1
- 229910052567 struvite Inorganic materials 0.000 description 1
- 150000005846 sugar alcohols Polymers 0.000 description 1
- 150000003467 sulfuric acid derivatives Chemical class 0.000 description 1
- 239000004094 surface-active agent Substances 0.000 description 1
- SJMYWORNLPSJQO-UHFFFAOYSA-N tert-butyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OC(C)(C)C SJMYWORNLPSJQO-UHFFFAOYSA-N 0.000 description 1
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- ISXSCDLOGDJUNJ-UHFFFAOYSA-N tert-butyl prop-2-enoate Chemical compound CC(C)(C)OC(=O)C=C ISXSCDLOGDJUNJ-UHFFFAOYSA-N 0.000 description 1
- 238000010998 test method Methods 0.000 description 1
- BPEWUONYVDABNZ-DZBHQSCQSA-N testolactone Chemical compound O=C1C=C[C@]2(C)[C@H]3CC[C@](C)(OC(=O)CC4)[C@@H]4[C@@H]3CCC2=C1 BPEWUONYVDABNZ-DZBHQSCQSA-N 0.000 description 1
- 229960005353 testolactone Drugs 0.000 description 1
- 125000005207 tetraalkylammonium group Chemical group 0.000 description 1
- 150000004685 tetrahydrates Chemical class 0.000 description 1
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 1
- AWDBHOZBRXWRKS-UHFFFAOYSA-N tetrapotassium;iron(6+);hexacyanide Chemical compound [K+].[K+].[K+].[K+].[Fe+6].N#[C-].N#[C-].N#[C-].N#[C-].N#[C-].N#[C-] AWDBHOZBRXWRKS-UHFFFAOYSA-N 0.000 description 1
- 125000003396 thiol group Chemical group [H]S* 0.000 description 1
- RYYWUUFWQRZTIU-UHFFFAOYSA-K thiophosphate Chemical compound [O-]P([O-])([O-])=S RYYWUUFWQRZTIU-UHFFFAOYSA-K 0.000 description 1
- IUTCEZPPWBHGIX-UHFFFAOYSA-N tin(2+) Chemical compound [Sn+2] IUTCEZPPWBHGIX-UHFFFAOYSA-N 0.000 description 1
- 150000003609 titanium compounds Chemical class 0.000 description 1
- 235000010215 titanium dioxide Nutrition 0.000 description 1
- XROWMBWRMNHXMF-UHFFFAOYSA-J titanium tetrafluoride Chemical compound [F-].[F-].[F-].[F-].[Ti+4] XROWMBWRMNHXMF-UHFFFAOYSA-J 0.000 description 1
- NLPMQGKZYAYAFE-UHFFFAOYSA-K titanium(iii) fluoride Chemical compound F[Ti](F)F NLPMQGKZYAYAFE-UHFFFAOYSA-K 0.000 description 1
- YXFVVABEGXRONW-UHFFFAOYSA-N toluene Substances CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 1
- DVKJHBMWWAPEIU-UHFFFAOYSA-N toluene 2,4-diisocyanate Chemical compound CC1=CC=C(N=C=O)C=C1N=C=O DVKJHBMWWAPEIU-UHFFFAOYSA-N 0.000 description 1
- 238000005809 transesterification reaction Methods 0.000 description 1
- CPUDPFPXCZDNGI-UHFFFAOYSA-N triethoxy(methyl)silane Chemical compound CCO[Si](C)(OCC)OCC CPUDPFPXCZDNGI-UHFFFAOYSA-N 0.000 description 1
- NBXZNTLFQLUFES-UHFFFAOYSA-N triethoxy(propyl)silane Chemical compound CCC[Si](OCC)(OCC)OCC NBXZNTLFQLUFES-UHFFFAOYSA-N 0.000 description 1
- XQGWAPPLBJZCEV-UHFFFAOYSA-N triethoxy(propyl)silane;urea Chemical compound NC(N)=O.CCC[Si](OCC)(OCC)OCC XQGWAPPLBJZCEV-UHFFFAOYSA-N 0.000 description 1
- JXUKBNICSRJFAP-UHFFFAOYSA-N triethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CCO[Si](OCC)(OCC)CCCOCC1CO1 JXUKBNICSRJFAP-UHFFFAOYSA-N 0.000 description 1
- BPSIOYPQMFLKFR-UHFFFAOYSA-N trimethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CO[Si](OC)(OC)CCCOCC1CO1 BPSIOYPQMFLKFR-UHFFFAOYSA-N 0.000 description 1
- 239000005051 trimethylchlorosilane Substances 0.000 description 1
- QXJQHYBHAIHNGG-UHFFFAOYSA-N trimethylolethane Chemical compound OCC(C)(CO)CO QXJQHYBHAIHNGG-UHFFFAOYSA-N 0.000 description 1
- YQMWDQQWGKVOSQ-UHFFFAOYSA-N trinitrooxystannyl nitrate Chemical compound [Sn+4].[O-][N+]([O-])=O.[O-][N+]([O-])=O.[O-][N+]([O-])=O.[O-][N+]([O-])=O YQMWDQQWGKVOSQ-UHFFFAOYSA-N 0.000 description 1
- MBYLVOKEDDQJDY-UHFFFAOYSA-N tris(2-aminoethyl)amine Chemical compound NCCN(CCN)CCN MBYLVOKEDDQJDY-UHFFFAOYSA-N 0.000 description 1
- 125000005065 undecenyl group Chemical group C(=CCCCCCCCCC)* 0.000 description 1
- 125000002948 undecyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- LSGOVYNHVSXFFJ-UHFFFAOYSA-N vanadate(3-) Chemical compound [O-][V]([O-])([O-])=O LSGOVYNHVSXFFJ-UHFFFAOYSA-N 0.000 description 1
- 239000012002 vanadium phosphate Substances 0.000 description 1
- VLOPEOIIELCUML-UHFFFAOYSA-L vanadium(2+);sulfate Chemical compound [V+2].[O-]S([O-])(=O)=O VLOPEOIIELCUML-UHFFFAOYSA-L 0.000 description 1
- UUUGYDOQQLOJQA-UHFFFAOYSA-L vanadyl sulfate Chemical compound [V+2]=O.[O-]S([O-])(=O)=O UUUGYDOQQLOJQA-UHFFFAOYSA-L 0.000 description 1
- 229940041260 vanadyl sulfate Drugs 0.000 description 1
- 229910000352 vanadyl sulfate Inorganic materials 0.000 description 1
- 125000005023 xylyl group Chemical group 0.000 description 1
- 239000011667 zinc carbonate Substances 0.000 description 1
- 235000004416 zinc carbonate Nutrition 0.000 description 1
- 229910000010 zinc carbonate Inorganic materials 0.000 description 1
- 239000011592 zinc chloride Substances 0.000 description 1
- 235000005074 zinc chloride Nutrition 0.000 description 1
- LRXTYHSAJDENHV-UHFFFAOYSA-H zinc phosphate Chemical compound [Zn+2].[Zn+2].[Zn+2].[O-]P([O-])([O-])=O.[O-]P([O-])([O-])=O LRXTYHSAJDENHV-UHFFFAOYSA-H 0.000 description 1
- 229910000165 zinc phosphate Inorganic materials 0.000 description 1
- NWONKYPBYAMBJT-UHFFFAOYSA-L zinc sulfate Chemical compound [Zn+2].[O-]S([O-])(=O)=O NWONKYPBYAMBJT-UHFFFAOYSA-L 0.000 description 1
- 229910000368 zinc sulfate Inorganic materials 0.000 description 1
- 229960001763 zinc sulfate Drugs 0.000 description 1
- NDKWCCLKSWNDBG-UHFFFAOYSA-N zinc;dioxido(dioxo)chromium Chemical compound [Zn+2].[O-][Cr]([O-])(=O)=O NDKWCCLKSWNDBG-UHFFFAOYSA-N 0.000 description 1
- 150000003755 zirconium compounds Chemical class 0.000 description 1
- 229910001928 zirconium oxide Inorganic materials 0.000 description 1
- PAPBSGBWRJIAAV-UHFFFAOYSA-N ε-Caprolactone Chemical compound O=C1CCCCCO1 PAPBSGBWRJIAAV-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D175/00—Coating compositions based on polyureas or polyurethanes; Coating compositions based on derivatives of such polymers
- C09D175/04—Polyurethanes
- C09D175/08—Polyurethanes from polyethers
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D175/00—Coating compositions based on polyureas or polyurethanes; Coating compositions based on derivatives of such polymers
- C09D175/04—Polyurethanes
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D3/00—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
- B05D3/002—Pretreatement
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D7/00—Processes, other than flocking, specially adapted for applying liquids or other fluent materials to particular surfaces or for applying particular liquids or other fluent materials
- B05D7/14—Processes, other than flocking, specially adapted for applying liquids or other fluent materials to particular surfaces or for applying particular liquids or other fluent materials to metal, e.g. car bodies
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D175/00—Coating compositions based on polyureas or polyurethanes; Coating compositions based on derivatives of such polymers
- C09D175/04—Polyurethanes
- C09D175/06—Polyurethanes from polyesters
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D5/00—Coating compositions, e.g. paints, varnishes or lacquers, characterised by their physical nature or the effects produced; Filling pastes
- C09D5/08—Anti-corrosive paints
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D7/00—Features of coating compositions, not provided for in group C09D5/00; Processes for incorporating ingredients in coating compositions
- C09D7/40—Additives
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D2202/00—Metallic substrate
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D2350/00—Pretreatment of the substrate
- B05D2350/60—Adding a layer before coating
Landscapes
- Chemical & Material Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Engineering & Computer Science (AREA)
- Wood Science & Technology (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
- Paints Or Removers (AREA)
- Laminated Bodies (AREA)
- Polyurethanes Or Polyureas (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Chemical Treatment Of Metals (AREA)
- Inorganic Chemistry (AREA)
Abstract
本發明的課題係提供一種水系金屬表面處理劑等,前述水系金屬表面處理劑係具有表面處理皮膜,該表面處理皮膜係能夠形成於金屬材料與塗膜之間,且能夠在形成塗膜時,針對金屬材料,賦予優異的加工密著性、耐藥品性及耐腐蝕性。 The subject of the present invention is to provide a water-based metal surface treatment agent, etc., wherein the water-based metal surface treatment agent system has a surface treatment film that can be formed between a metal material and a coating film, and when the coating film is formed, For metal materials, it provides excellent processing adhesion, chemical resistance and corrosion resistance.
藉由本發明的水系金屬表面處理劑,解決前述課題。前述金屬表面處理劑,其特徵在於,包含:超過10g/L的特定氨基甲酸酯樹脂(A);含氟化合物(B),其係還含有選自硼、矽、鈦及鋯所組成之群組中的至少一種元素。 The aforementioned problem is solved by the water-based metal surface treatment agent of the present invention. The aforementioned metal surface treatment agent is characterized by comprising: a specific urethane resin (A) exceeding 10 g/L; a fluorine-containing compound (B), which is also selected from the group consisting of boron, silicon, titanium and zirconium At least one element in the group.
Description
本發明係關於一種適用於基底處理層製造的水系金屬表面處理劑,具有使用前述水系金屬表面處理劑的基底處理層之金屬材料的製造方法,以及藉由前述製造方法而獲得之具有基底處理層及塗膜的金屬材料。 The present invention relates to a water-based metal surface treatment agent suitable for the production of a substrate treatment layer, a method for manufacturing a metal material having a substrate treatment layer using the aforementioned water-based metal surface treatment agent, and a substrate treatment layer obtained by the aforementioned manufacturing method And the metal material of the coating film.
一直以來,開發著能夠形成皮膜的金屬表面處理劑,且前述皮膜係能夠賦予金屬材料各種性能。舉例來說,在專利文獻1中,揭示一種技術,其係關於含有特定陽離子性水系氨基甲酸酯樹脂之金屬材料表面處理用水系塗料組成物。 Conventionally, metal surface treatment agents capable of forming a film have been developed, and the aforementioned film system can impart various properties to metal materials. For example, Patent Document 1 discloses a technique relating to a water-based coating composition for surface treatment of a metal material containing a specific cationic water-based urethane resin.
[先前技術文獻] [Prior Technical Literature]
[專利文獻] [Patent Literature]
[專利文獻1]:國際公開第2005/092998號公報 [Patent Document 1]: International Publication No. 2005/092998
[發明概要] [Summary of the invention]
然而,即使藉由上述技術於金屬材料的表面上形成皮膜後,雖然形成於此皮膜上的塗膜具有優異的耐藥品性及耐腐蝕性,但就加工密著性而言,並非充分。 However, even after the coating film is formed on the surface of the metal material by the above-mentioned technique, although the coating film formed on the coating film has excellent chemical resistance and corrosion resistance, it is not sufficient in terms of processing adhesion.
因此,本發明係以提供一種水系金屬表面處理劑、具有該表面處理皮膜(以下稱為「基底處理層」)的金屬材料及其製造方法作為目的,前述水系金屬表面處理劑係具有表面處理皮膜,該表面處理皮膜係能夠形成於金屬材料與塗膜之間,且能夠在形成塗膜時,針對金屬材料,賦予優異的加工密著性、耐藥品性及耐腐蝕性。 Therefore, the present invention aims to provide a water-based metal surface treatment agent, a metal material having the surface treatment film (hereinafter referred to as "substrate treatment layer"), and a method for producing the same. The water-based metal surface treatment agent system has a surface treatment film The surface treatment film can be formed between the metal material and the coating film, and can impart excellent processing adhesion, chemical resistance, and corrosion resistance to the metal material when the coating film is formed.
本發明人們在進行深入探討後,結果發現,藉由使用包含特定的氨基甲酸酯樹脂及特定的含氟化合物之表面處理劑,能夠解決上述課題,遂而完成本發明。本發明係如下所述。 After conducting in-depth studies, the inventors found that the above-mentioned problems can be solved by using a surface treatment agent containing a specific urethane resin and a specific fluorine-containing compound, and the present invention was completed. The present invention is as follows.
[1]一種水系金屬表面處理劑,其特徵在於,包含:超過10g/L的氨基甲酸酯樹脂(A);含氟化合物(B),其係還含有選自硼、矽、鈦及鋯所組成之群組中的至少一種元素;其中,前述氨基甲酸酯樹脂(A)係包括:來自以下式(1)所表示之具有環己烷環構造的聚異氰酸酯的構造單元;來自以下式(2)所表示之多元醇的構造單元;來自以下式(3)所表示之重量平均分子量大於600的二元醇的構造單元;來自以下式(4)所表示之重量平均分子量在500以下的二元醇的構造單元;來自以下式(5)所表示之第3級胺化合物及/或其鹽的構造單元;又,式(1):O=C=N-R1-N=C=O [1] A water-based metal surface treatment agent, characterized by comprising: more than 10g/L of urethane resin (A); fluorine-containing compound (B), which system further contains selected from boron, silicon, titanium and zirconium At least one element in the group consisting of; wherein, the aforementioned urethane resin (A) includes: a structural unit derived from a polyisocyanate having a cyclohexane ring structure represented by the following formula (1); from the following formula (2) The structural unit of the polyol represented by the following formula (3); the structural unit derived from the diol with a weight average molecular weight greater than 600 represented by the following formula (3); A structural unit of a glycol; a structural unit derived from a tertiary amine compound and/or its salt represented by the following formula (5); and, the formula (1): O=C=NR 1 -N=C=O
(其中,式(1)中的R1係以-R2-R3-R4-表示,R2係單鍵或亞烷基,R3係[化1] (且R5、R6及R7係各自獨立為氫原子或烷基。) (Among them, R 1 in the formula (1) is represented by -R 2 -R 3 -R 4 -, R 2 is a single bond or an alkylene group, and R 3 is [化1] (And R 5 , R 6 and R 7 are each independently a hydrogen atom or an alkyl group.)
R4係[化2] 單鍵;亞烷基;(且其左側的鍵結位置與R3鍵結。)) R 4 is [化2] single bond; alkylene; (And the bonding position on the left is bonded to R 3. ))
式(2):[化3] HO-R8-OH、、 (其中,n為整數。) Formula (2): [化3] HO-R 8 -OH, , (Among them, n is an integer.)
(式(2)中的R8係以-R9-R10-R11-表示,R9係[化4] 單鍵;(其右側的鍵結位置與R10鍵結。);-R13-CO-(其右 側的鍵結位置與R10鍵結。) (R 8 in formula (2) is represented by -R 9 -R 10 -R 11 -, R 9 is a single bond; (The bonding position on the right side is bonded to R 10. ); -R 13 -CO- (The bonding position on the right side is bonded to R 10. )
(R12係直鏈或是支鏈的亞烷基;R13係-R18-O-或(此等化合 物右側的鍵結位置與CO鍵結。);又,R18係直鏈或是支鏈的亞烷基,x係1~5的整數,l為2~4的整數。) (R 12 is a linear or branched alkylene group; R 13 is -R 18 -O- or (The bonding position on the right side of these compounds is bonded to CO.); In addition, R 18 is a linear or branched alkylene group, x is an integer from 1 to 5, and l is an integer from 2 to 4. )
R10係[化5]
R11係[化6] 單鍵、、、 、-CO-R13-(除了單鍵以外的上述化合物,左側的 鍵結位置皆與R10鍵結。) R 11 series [化6] single bond, , , , -CO-R 13- (Except for the single bond, the bonding positions on the left are all bonded to R 10 .)
(其中,R12係直鏈或是支鏈的亞烷基;R13係-R18-O-或(且 此等化合物右側的鍵結位置與CO鍵結。);又,R15及R16係各自獨立為氫原子、烷基、鹵化烷基或苯基,R17係氫原子、烷基或苯基,R18係直鏈或支鏈的亞烷基,x為1~5的整數,l為2~4的整數 (Among them, R 12 is a linear or branched alkylene group; R 13 is -R 18 -O- or (And the bonding position on the right side of these compounds is bonded to CO.); In addition, R 15 and R 16 are each independently a hydrogen atom, an alkyl group, a halogenated alkyl group or a phenyl group, and R 17 is a hydrogen atom, an alkyl group or Phenyl, R 18 is a linear or branched alkylene group, x is an integer from 1 to 5, and l is an integer from 2 to 4
R14係[化7] 氫原子、烷基、苯基、、(其 中,R18係直鏈或支鏈的亞烷基,l為2~4的整數。)) R 14 series [化7] hydrogen atom, alkyl group, phenyl group, , (Among them, R 18 is a linear or branched alkylene group, and l is an integer of 2 to 4.))
式(3):HO-R19-H (3) Formula (3): HO-R 19 -H (3)
(式(3)中R19係[化8]
(其中,R20係獨立地為亞烷基、或金剛烷環,且 R21係亞烷基,m為2~4的整數,n為整數。)) (Wherein R 20 is independently an alkylene group, Or an adamantane ring, and R 21 is an alkylene group, m is an integer of 2 to 4, and n is an integer. ))
式(4):HO-R22-OH Formula (4): HO-R 22 -OH
(式(4)中R22係[化9] 亞烷基、、金剛烷環、 、(其中,y係2或3,z 係1~6的整數。)) (In formula (4), R 22 is a [化9] alkylene group, , Adamantane ring, , (Among them, y is 2 or 3, and z is an integer from 1 to 6.)
式(5):[化10] (式中,R23係烷基、氨烷基、羥烷基、 、,R24為羥烷基、 氨烷基或N-烷氨基烷基。)。 Formula (5): [化 10] (In the formula, R 23 is alkyl, aminoalkyl, hydroxyalkyl, , , R 24 is hydroxyalkyl, aminoalkyl or N-alkylaminoalkyl. ).
[2]如前述[1]所述之水系金屬表面處理劑,其中,前述含氟化合物(B)係還含有選自四氟硼酸、六氟鈦酸、六氟鋯酸、六氟矽酸及此等的金屬酸鹽或無機酸鹽所組成之群組中的至少一種。 [2] The water-based metal surface treatment agent described in [1], wherein the fluorine-containing compound (B) further contains selected from the group consisting of tetrafluoroboric acid, hexafluorotitanic acid, hexafluorozirconic acid, hexafluorosilicic acid and At least one of these metal acid salts or inorganic acid salts.
[3]如前述[1]或[2]所述之水系金屬表面處理劑,還包含:矽化合物(C),其係選自水分散性二氧化矽及矽烷偶聯劑所組成之群組中的至少一種。 [3] The water-based metal surface treatment agent as described in [1] or [2], further comprising: a silicon compound (C) selected from the group consisting of water-dispersible silica and silane coupling agent At least one of them.
[4]如前述[1]~[3]中任一者所述之水系金屬表面處理劑,還包含:金屬化合物(D),其係選自Ni、Mn、Co、Mo、V、W、Ce、Mg、Al、Zn、Fe、Bi、Nb、Sn、Cr所組成之群組中的至少一種。 [4] The water-based metal surface treatment agent described in any one of [1] to [3] above, further comprising: a metal compound (D) selected from the group consisting of Ni, Mn, Co, Mo, V, W, At least one of the group consisting of Ce, Mg, Al, Zn, Fe, Bi, Nb, Sn, and Cr.
[5]如前述[1]~[4]中任一者所述之水系金屬表面處理劑,還包含:水溶性或水分散性的樹脂(E),其係選自前述氨基甲酸酯樹脂以外的氨基甲酸酯樹脂、酚醛樹脂、矽樹脂、環氧樹脂、聚酯樹脂、丙烯酸樹脂、聚烯烴樹脂和聚醯胺樹脂所組成之群組中的至少一種。 [5] The water-based metal surface treatment agent described in any one of [1] to [4], further comprising: a water-soluble or water-dispersible resin (E) selected from the aforementioned urethane resins At least one of the group consisting of urethane resin, phenol resin, silicone resin, epoxy resin, polyester resin, acrylic resin, polyolefin resin and polyamide resin.
[6]如前述[1]~[5]中任一者所述之水系金屬表面處理劑,還包含:交聯劑(F),其係選自噁唑啉系樹脂、嵌段異氰酸酯系樹脂、碳二亞胺系樹脂、氮丙啶系樹脂和環氧系樹脂所組成之群組中的至少一種。 [6] The water-based metal surface treatment agent described in any one of [1] to [5], further comprising: a crosslinking agent (F) selected from the group consisting of oxazoline resins and blocked isocyanate resins , At least one of the group consisting of carbodiimide resin, aziridine resin and epoxy resin.
[7]一種金屬材料的製造方法,其係具有基底處理層之金屬材料的製造方法,包含:基底處理步驟,其係使如前述[1]~[6]中任一者所述之水系金屬表面處理劑與金屬材料的表面接觸,而形成基底處理層。 [7] A method of manufacturing a metal material, which is a method of manufacturing a metal material with a substrate treatment layer, comprising: a substrate treatment step of making the water-based metal described in any one of [1] to [6] The surface treatment agent contacts the surface of the metal material to form a base treatment layer.
[8]如[7]所述之金屬材料的製造方法,還包含:塗裝步驟,其係於經過前述基底處理步驟後的金屬材料,塗裝塗料。 [8] The method for manufacturing a metal material as described in [7], further comprising: a coating step of coating the metal material after the aforementioned substrate treatment step with paint.
[9]一種金屬材料,其特徵在於,包含:基底處理層;塗膜,形成於前述基底處理層上;其中,前述基底處理層係藉由如前述[1]~[6]中任一者所述之水系金屬表面處理劑,所形成之層。 [9] A metal material characterized by comprising: a base treatment layer; a coating film formed on the base treatment layer; wherein the base treatment layer is formed by any one of the aforementioned [1] to [6] The layer formed by the water-based metal surface treatment agent.
根據本發明,提供一種水系金屬表面處理劑、具有該表面處理皮膜(以下稱為「基底處理層」)的金屬材料及其製造方法,前述水系金屬表面處理劑係具有表面處理皮膜,該表面處理皮膜係能夠形成於金屬材料與塗膜之間,且能夠在形成塗膜時,針對金屬材料,賦予優異的加工密著性、耐藥品性及耐腐蝕性。 According to the present invention, there is provided a water-based metal surface treatment agent, a metal material having the surface treatment film (hereinafter referred to as "substrate treatment layer"), and a method for producing the same. The water-based metal surface treatment agent system has a surface treatment film, and the surface treatment The film system can be formed between the metal material and the coating film, and can impart excellent processing adhesion, chemical resistance, and corrosion resistance to the metal material when the coating film is formed.
以下,顯示具體的實施形態,詳細地說明本發明。 Hereinafter, specific embodiments are shown to explain the present invention in detail.
本發明的一形態係水系金屬表面處理劑。水系金屬表面處理劑係包含:後述的超過10g/L的氨基甲酸酯樹脂(A);以及含氟化合物(B),其係還含有選自硼、矽、鈦及鋯所組成之群組中的至少一種元素。藉由使用此水系金屬表面處理劑而於金屬材料的表面上形成基底處理層後,藉由於該基底處理層上形成塗膜,能夠發揮優異的加工密著性、耐藥品性及耐腐蝕性。 One aspect of the present invention is a water-based metal surface treatment agent. The water-based metal surface treatment agent includes: the urethane resin (A) above 10g/L; and the fluorine-containing compound (B), which also contains the group selected from the group consisting of boron, silicon, titanium and zirconium At least one element in. After forming a base treatment layer on the surface of a metal material by using this water-based metal surface treatment agent, by forming a coating film on the base treatment layer, excellent processing adhesion, chemical resistance, and corrosion resistance can be exhibited.
藉由使氨基甲酸酯預聚物與水反應,而可代表性地獲得上述氨基甲酸酯樹脂(A)。此時,為了促進反應,亦可含有因應必要而添加之不包 含第3級胺化合物的多胺化合物。具體而言,被含於氨基甲酸酯預聚物中之異氰酸酯基團,其係與藉由水而生成的胺或因應必要而添加之多胺化合物反應,而在經過上述反應後形成脲鍵,並成為氨基甲酸酯樹脂。 By reacting a urethane prepolymer with water, the above-mentioned urethane resin (A) can be typically obtained. At this time, in order to promote the reaction, it can also contain A polyamine compound containing a tertiary amine compound. Specifically, the isocyanate group contained in the urethane prepolymer reacts with the amine generated by water or the polyamine compound added as necessary, and after the above reaction, the urea bond is formed , And become a urethane resin.
氨基甲酸酯預聚物係用於製造氨基甲酸酯樹脂(A)的成分,其係至少由下述化合物反應而得:具有環己烷環構造的聚異氰酸酯;不含氮原子但包含苯環的多元醇;不含苯環及氮原子之重量平均分子量大於600的二元醇(以下,亦稱為高分子量二元醇);不含苯環及氮原子之重量平均分子量在500以下的二元醇(以下,亦稱為低分子量二元醇);含有2個以上活性氫的第3級胺化合物及/或其鹽。 The urethane prepolymer is a component used to manufacture the urethane resin (A), which is obtained by reacting at least the following compounds: a polyisocyanate with a cyclohexane ring structure; it does not contain nitrogen atoms but contains benzene Ring polyols; diols with a weight average molecular weight greater than 600 without benzene ring and nitrogen atoms (hereinafter, also referred to as high molecular weight diols); without benzene rings and nitrogen atoms with a weight average molecular weight below 500 Glycol (hereinafter, also referred to as low-molecular-weight diol); a tertiary amine compound containing two or more active hydrogens and/or a salt thereof.
就其他觀點而言,氨基甲酸酯預聚物係包含:來自以下式(1)所表示之具有環己烷環構造的聚異氰酸酯的構造單元;來自以下式(2)所表示之多元醇的構造單元;來自以下式(3)所表示之重量平均分子量大於600的二元醇的構造單元;來自以下式(4)所表示之重量平均分子量在500以下的二元醇的構造單元;來自以下式(5)所表示之第3級胺化合物及/或其鹽的構造單元。 From another point of view, the urethane prepolymer contains: a structural unit derived from a polyisocyanate having a cyclohexane ring structure represented by the following formula (1); a structural unit derived from a polyol represented by the following formula (2) Structural unit; a structural unit derived from a diol with a weight average molecular weight greater than 600 represented by the following formula (3); a structural unit derived from a diol with a weight average molecular weight of less than 500 represented by the following formula (4); derived from the following The structural unit of the tertiary amine compound represented by formula (5) and/or its salt.
具體而言,被含於式(2)所表示之多元醇、式(3)所表示之高分子量二元醇以及式(4)所表示之低分子量的二元醇之中的羥基,與被含於式(1)所表示之聚異氰酸酯的異氰酸酯基反應,而形成氨基甲酸酯鍵。又,被含於上述聚異氰酸酯的異氰酸酯基,與被含於式(5)所表示之第3級胺化合物及/或其鹽的氫原子(活性氫)反應,而形成氨基甲酸酯鍵及脲鍵等。 Specifically, the hydroxyl group contained in the polyol represented by formula (2), the high molecular weight diol represented by formula (3), and the low molecular weight diol represented by formula (4), and is The isocyanate group contained in the polyisocyanate represented by formula (1) reacts to form a urethane bond. In addition, the isocyanate group contained in the above-mentioned polyisocyanate reacts with the hydrogen atom (active hydrogen) contained in the tertiary amine compound represented by formula (5) and/or its salt to form a urethane bond and Urea bond and so on.
又,為了與如上述般之不含水及第3級胺化合物的多胺化合物反應,在本實施形態所使用之氨基甲酸酯預聚物,係包含來自具有環己烷環構造的聚異氰酸酯之異氰酸酯基。 In addition, in order to react with the above-mentioned polyamine compound that does not contain water and a tertiary amine compound, the urethane prepolymer used in this embodiment contains a polyisocyanate derived from a cyclohexane ring structure. Isocyanate group.
具有環己烷環構造的聚異氰酸酯(以下,亦單純稱為「聚異氰酸酯」)係能夠用於氨基甲酸酯預聚物的製造,並能夠使用以下式(1)來表示。 The polyisocyanate (hereinafter, simply referred to as "polyisocyanate") having a cyclohexane ring structure can be used for the production of a urethane prepolymer, and can be represented by the following formula (1).
式(1):O=C=N-R1-N=C=O Formula (1): O=C=NR 1 -N=C=O
式(1)中,R1係以-R2-R3-R4-表示,且R2係單鍵或亞烷基,R3係以[化11]
來表示(其中,式中的R5、R6及R7係各自獨立為氫原子或烷基。) (Wherein, R 5 , R 6 and R 7 in the formula are each independently a hydrogen atom or an alkyl group.)
R4係以[化12] 單鍵、亞烷基或(左側的鍵結位置係與R3鍵結)來表 示。 R 4 is based on [化12] single bond, alkylene or (The bonding position on the left is bonded to R 3 ).
R1較佳係[化13]
又,就環己烷環構造而言,亦包含具有環己烷的二環式構造。又,亦可於聚異氰酸酯中包含複數個環己烷環構造。 In addition, the cyclohexane ring structure also includes a bicyclic structure having cyclohexane. In addition, a plurality of cyclohexane ring structures may be included in the polyisocyanate.
在後述之氨基甲酸酯預聚物的製造中,相對於在氨基甲酸酯預聚物的製造中所使用之聚異氰酸酯、後述之多元醇、後述之高分子量二元醇、後述之低分子量二元醇以及後述之第3級胺化合物及/或其鹽的合計量,聚異氰酸酯的用量較佳係20~80質量%,更佳係30~70質量%,特佳係40~65質量%,最佳係50~60質量%。換言之,在本實施形態所使用之氨基甲酸酯樹脂(A)中,來自式(1)之聚異氰酸酯的構造單元的存在量(質量換算)較佳係氨基甲酸酯樹脂(A)中的20~80%,更佳係30~70%,特佳係40~65%,最佳係50~60%。 In the production of the urethane prepolymer described later, in contrast to the polyisocyanate used in the production of the urethane prepolymer, the polyol described later, the high molecular weight diol described later, and the low molecular weight The total amount of the diol and the third-level amine compound and/or its salt mentioned later, the amount of polyisocyanate is preferably 20 to 80% by mass, more preferably 30 to 70% by mass, particularly preferably 40 to 65% by mass , The best system is 50-60% by mass. In other words, in the urethane resin (A) used in this embodiment, the amount (in terms of mass) of the structural unit derived from the polyisocyanate of formula (1) is preferably that of the urethane resin (A) 20~80%, better 30~70%, particularly good 40~65%, best 50~60%.
在本實施形態之氨基甲酸酯預聚物中,於使用後述之「不含苯環及氮原子之三元醇以上的多元醇」的情況下,「不含苯環及氮原子之三元醇以上的多元醇」的用量亦被算入至上述合計量。 In the urethane prepolymer of this embodiment, in the case of using the "polyol with no benzene ring and nitrogen atom or more" mentioned later, "the ternary alcohol without benzene ring and nitrogen atom" is used. The amount of "polyol above alcohol" is also included in the above total amount.
就聚異氰酸酯而言,雖然只要是具有一個以上的環己烷環與2個以上的異氰酸酯基團之式(1)所示之聚異氰酸酯即可,並未特別限定,但可舉出例如異佛爾酮二異氰酸酯、1,3-或1,4-雙(異氰酸甲酯基)環己烷、1,3-或1,4-二異氰酸酯環己烷、3-異氰酸酯-甲基-3,5,5-三甲基環己基異氰酸酯、二環己基甲烷4,4'-二異氰酸酯等。 Regarding the polyisocyanate, it is not particularly limited as long as it is a polyisocyanate represented by formula (1) having one or more cyclohexane rings and two or more isocyanate groups, but it may be, for example, isocyanate. Ketone diisocyanate, 1,3- or 1,4-bis(isocyanatomethyl) cyclohexane, 1,3- or 1,4-diisocyanate cyclohexane, 3-isocyanate-methyl-3 ,5,5-Trimethylcyclohexyl isocyanate, dicyclohexylmethane 4,4'-diisocyanate, etc.
亦可將下述化合物與式(1)所示之聚異氰酸酯合併使用:作為不被含於式(1)之如聚異氰酸酯的異氰酸酯二聚體(Uretdione)構造般之二聚體、如異氰脲酸酯構造般的三聚體、或者作為使用多官能多元醇的加合物之1分子中具有3個以上異氰酸酯基的聚異氰酸酯等。 The following compounds can also be used in combination with the polyisocyanate represented by the formula (1): as a dimer that is not contained in the formula (1) as a polyisocyanate-like isocyanate dimer (Uretdione) structure, such as isocyanate A trimer like a urate structure, or a polyisocyanate having 3 or more isocyanate groups in one molecule as an adduct using a polyfunctional polyol, etc.
聚異氰酸酯可單獨使用1種,亦可併用2種以上。 A polyisocyanate may be used individually by 1 type, and may use 2 or more types together.
不含氮原子但包含苯環的多元醇(以下,亦單純稱為「多元醇」)係能夠用於氨基甲酸酯預聚物的製造,並能夠使用以下式(2)來表示。 A polyol that does not contain a nitrogen atom but contains a benzene ring (hereinafter, also simply referred to as "polyol") can be used for the production of a urethane prepolymer, and can be represented by the following formula (2).
式(2):[化14]
HO-R8-OH、、
(n為整數) (n is an integer)
式(2)中R8係以-R9-R10-R11-表示,且R9係[化15] 單鍵、(右側的鍵結位置與R10鍵結)、或-R13-CO-(右側的 鍵結位置與R10鍵結。)(其中,R12係直鏈或支鏈的亞烷基,R13係-R18-O-(右 側的鍵結位置與CO鍵結)、(右側的鍵結位置與CO鍵結)。 又,R18係直鏈或支鏈的亞烷基,x為1~5的整數,l(小寫的L)為2~4的整數。)又,R10係[化16] ,且R11係 [化17] 單鍵、、、或-CO- R13-(除單鍵之外,上述化合物之左側的鍵結位置與R10鍵結。)(其中,R12係直鏈或支鏈的亞烷基,R13係-R18-O-(右側的鍵結位置與CO鍵結)、或 (右側的鍵結位置與CO鍵結)。又,R15及R16係各自獨立為氫 原子、烷基、鹵化烷基或苯基,R17係氫原子、烷基或苯基,R18係直鏈或支鏈的亞烷基,x為1~5的整數,l為2~4的整數。) In formula (2), R 8 is represented by -R 9 -R 10 -R 11 -, and R 9 is [化15] single bond, (The bonding position on the right is bonded to R 10 ), or -R 13 -CO- (the bonding position on the right is bonded to R 10. ) (wherein R 12 is a linear or branched alkylene group, and R 13 series -R 18 -O- (the bonding position on the right is bonded with CO), (The bonding position on the right is bonded with CO). In addition, R 18 is a linear or branched alkylene group, x is an integer of 1 to 5, and l (lowercase L) is an integer of 2 to 4. ) Also, R 10 series [化16] , And R 11 is [化17] single bond, , , Or -CO- R 13- (except for single bonds, the bonding position on the left side of the above compound is bonded to R 10. ) (wherein R 12 is a linear or branched alkylene group, and R 13 is -R 18 -O- (the bonding position on the right is bonded with CO), or (The bonding position on the right is bonded with CO). In addition, R 15 and R 16 are each independently a hydrogen atom, an alkyl group, a halogenated alkyl group or a phenyl group, R 17 is a hydrogen atom, an alkyl group or a phenyl group, and R 18 is a linear or branched alkylene group, x It is an integer from 1 to 5, and l is an integer from 2 to 4. )
又,R14係[化18] 氫原子、烷基、苯基、、。 (其中,R18係直鏈或支鏈的亞烷基,l為2~4的整數。) In addition, R 14 is a hydrogen atom, an alkyl group, a phenyl group, , . (Among them, R 18 is a linear or branched alkylene group, and l is an integer of 2 to 4.)
R8較佳係[化19]
、(右側的鍵結位置與OH鍵
結)、
在後述之氨基甲酸酯預聚物的製造中,相對於在氨基甲酸酯預聚物的製造中所使用之聚異氨酸酯、多元醇、後述之高分子量二元醇、後述之低分子量二元醇以及後述之第3級胺化合物及/或其鹽的合計量,雖然多元醇的用量較佳通常能夠為1~40質量%,但較佳係1~30質量%,更佳係3~25質量%,特佳係6~20質量%。換言之,在本實施形態所使用之氨基甲酸酯樹脂(A)中,來自式(2)之多元醇的構造單元的存在量(質量換算)通常係氨基甲酸酯樹脂(A)中的1~40%,較佳係1~30%,更佳係3~25%,特佳係6~20%。 In the production of the urethane prepolymer described later, compared to the polyisoinate, polyol, the high molecular weight diol described later, and the low molecular weight diol used in the production of the urethane prepolymer The total amount of the molecular weight diol and the third-level amine compound and/or its salt described later, although the amount of polyol is preferably usually 1-40% by mass, it is preferably 1-30% by mass, more preferably 3-25% by mass, especially good 6-20% by mass. In other words, in the urethane resin (A) used in this embodiment, the amount (in terms of mass) of the structural unit derived from the polyol of formula (2) is usually 1 in the urethane resin (A) ~40%, preferably 1~30%, more preferred 3~25%, especially preferred 6~20%.
在本實施形態之氨基甲酸酯預聚物中,於使用後述之「不含苯環及氮原子之三元醇以上的多元醇」的情況下,「不含苯環及氮原子之三元醇以上的多元醇」的用量亦被算入至上述合計量。 In the urethane prepolymer of this embodiment, in the case of using the "polyol with no benzene ring and nitrogen atom or more" mentioned later, "the ternary alcohol without benzene ring and nitrogen atom" is used. The amount of "polyol above alcohol" is also included in the above total amount.
若多元醇係具有1個以上的苯環與2個以上的羥基,且係不具有氮原子之式(2)所表示之多元醇,則並未特別限定,可舉出例如間苯二酚、2-甲基間苯二酚、雙酚A、雙酚S、雙酚F等芳香族多元醇;雙酚A-環氧乙烷2莫耳 加成物、雙酚A-環氧乙烷4莫耳加成物、雙酚A-環氧乙烷6莫耳加成物、雙酚A-環氧丙烷10莫耳加成物、雙酚A-環氧丙烷2莫耳加成物、雙酚A-環氧丙烷4莫耳加成物、雙酚A-環氧丙烷6莫耳加成物、雙酚A-環氧丙烷10莫耳加成物等具有苯環的聚醚多元醇;由鄰苯二甲酸、間苯二甲酸、對苯二甲酸、偏苯三酸等芳香族聚羧酸,與乙二醇、丙二醇、二乙二醇、三乙二醇、四乙二醇、2-甲基丙二醇、新戊二醇、1,4-丁二醇、1,5-戊二醇、1,6-己二醇、3-甲基戊二醇等多元醇類的縮聚所得到之具有苯環的聚酯多元醇;包含從碳酸乙烯酯與雙酚A等多元醇的酯交換反應而獲得之具有苯環的聚碳酸酯多元醇等。 If the polyol has one or more benzene rings and two or more hydroxyl groups, and is a polyol represented by formula (2) that does not have a nitrogen atom, it is not particularly limited. Examples include resorcinol, Aromatic polyols such as 2-methylresorcinol, bisphenol A, bisphenol S, and bisphenol F; bisphenol A-ethylene oxide 2 mol Adduct, bisphenol A-ethylene oxide 4 mol adduct, bisphenol A-ethylene oxide 6 mol adduct, bisphenol A-propylene oxide 10 mol adduct, bisphenol A-propylene oxide 2 mol adduct, bisphenol A-propylene oxide 4 mol adduct, bisphenol A-propylene oxide 6 mol adduct, bisphenol A-propylene oxide 10 mol Adducts and other polyether polyols with benzene ring; composed of phthalic acid, isophthalic acid, terephthalic acid, trimellitic acid and other aromatic polycarboxylic acids, and ethylene glycol, propylene glycol, diethylene Alcohol, triethylene glycol, tetraethylene glycol, 2-methylpropanediol, neopentyl glycol, 1,4-butanediol, 1,5-pentanediol, 1,6-hexanediol, 3-methyl Polyester polyol with benzene ring obtained by polycondensation of polyols such as base pentanediol; including polycarbonate polyol with benzene ring obtained from the transesterification reaction of ethylene carbonate and polyols such as bisphenol A Wait.
多元醇可單獨使用1種,亦可併用2種以上。 A polyol may be used individually by 1 type, and may use 2 or more types together.
高分子量二元醇係能夠用於氨基甲酸酯預聚物的製造,並能夠使用以下式(3)來表示,且不包含苯環及氮原子。 The high-molecular-weight diol system can be used for the production of a urethane prepolymer, can be represented by the following formula (3), and does not contain a benzene ring and a nitrogen atom.
式(3):HO-R19-H (3) Formula (3): HO-R 19 -H (3)
式(3)中R19係[化20]
在氨基甲酸酯預聚物的製造中,相對於在氨基甲酸酯預聚物的製造中所使用之聚異氰酸酯、多元醇、高分子量二元醇、後述之低分子量二元醇以及後述之第3級胺化合物及/或其鹽的合計量,雖然高分子量二元醇的用量較佳通常能夠為1~50質量%,但較佳係3~40質量%,更佳係5~35質量%,特佳係10~30質量%。換言之,在本實施形態所使用之氨基甲酸酯樹脂(A)中,來自式(3)之二元醇的構造單元的存在量(質量換算)通常係氨基甲酸酯樹脂(A)中的1~50%,較佳係3~40%,更佳係5~35%,特佳係10~30%。 In the production of urethane prepolymers, compared to polyisocyanates, polyols, high-molecular-weight diols, low-molecular-weight diols described later, and those used in the production of urethane prepolymers The total amount of the tertiary amine compound and/or its salt, although the amount of high-molecular-weight diol can usually be preferably 1-50% by mass, preferably 3-40% by mass, more preferably 5~35% by mass %, 10-30% by mass, especially good. In other words, in the urethane resin (A) used in this embodiment, the amount (in terms of mass) of the structural unit derived from the diol of formula (3) is usually the amount in the urethane resin (A) 1~50%, preferably 3~40%, more preferably 5~35%, especially good 10~30%.
在本實施形態之氨基甲酸酯預聚物中,於使用後述之「不含苯環及氮原子之三元醇以上的多元醇」的情況下,「不含苯環及氮原子之三元醇以上的多元醇」的用量亦被算入至上述合計量。 In the urethane prepolymer of this embodiment, in the case of using the "polyol with no benzene ring and nitrogen atom or more" mentioned later, "the ternary alcohol without benzene ring and nitrogen atom" is used. The amount of "polyol above alcohol" is also included in the above total amount.
雖然高分子量二元醇的重量平均分子量係大於600,但較佳係大於600且在10000以下,更佳係大於600且在5000以下,特佳係800~4000,最佳係1000~3000。 Although the weight average molecular weight of the high molecular weight diol is greater than 600, it is preferably greater than 600 and less than 10,000, more preferably greater than 600 and less than 5000, particularly preferably 800-4000, and most preferably 1000-3000.
若本實施形態中各成分的重量平均分子量並未特別規定,其係藉由GPC(凝膠滲透色譜儀)測定,且經聚苯乙烯換算的值。 If the weight average molecular weight of each component in this embodiment is not specifically defined, it is a value measured by GPC (gel permeation chromatography) and converted to polystyrene.
就高分子量二元醇而言,只要是不含苯環及氮原子且重量平均分子量大於600的二元醇,並未特別限定,舉例來說,能夠使用聚醚二醇、聚酯二醇、聚碳酸酯二醇等。 As for the high molecular weight diol, it is not particularly limited as long as it does not contain a benzene ring and a nitrogen atom and has a weight average molecular weight greater than 600. For example, polyether diol, polyester diol, Polycarbonate diol and so on.
就上述聚醚二醇而言,可舉出例如聚乙二醇,聚丙二醇,聚丁二醇(聚四亞甲基醚乙二醇)等。舉例來說,能夠在鹼性觸媒下,使氧化乙烯或氧化丙烯等的烯氧化物進行加成聚合反應而製造聚醚二醇。 Examples of the above-mentioned polyether glycols include polyethylene glycol, polypropylene glycol, polybutylene glycol (polytetramethylene ether glycol) and the like. For example, an alkylene oxide such as ethylene oxide or propylene oxide can be subjected to addition polymerization reaction under an alkaline catalyst to produce polyether glycol.
舉例來說,上述聚酯二醇,係可藉由使例如作為酸種之丙二酸、琥珀酸、戊二酸、己二酸、庚二酸等脂肪族二羧酸、癸二酸等不飽和羧酸等,與作為醇種之乙二醇、丙二醇、四乙二醇、1,5-戊二醇、1,6-己二醇、1,7-庚二醇、1,8-辛二醇、1,9-壬二醇、1,10-癸二醇、新戊二醇、2-甲基-1,3-丙二醇、3-甲基-1,5-戊二醇、環己二醇、1,3-金剛烷二醇等,進行酯化反應而製造。 For example, the above-mentioned polyester diols can be made of aliphatic dicarboxylic acids such as malonic acid, succinic acid, glutaric acid, adipic acid, and pimelic acid, sebacic acid and the like as acid species. Saturated carboxylic acid, etc., and ethylene glycol, propylene glycol, tetraethylene glycol, 1,5-pentanediol, 1,6-hexanediol, 1,7-heptanediol, 1,8-octane as alcohol species Glycol, 1,9-nonanediol, 1,10-decanediol, neopentyl glycol, 2-methyl-1,3-propanediol, 3-methyl-1,5-pentanediol, cyclohexane Diol, 1,3-adamantanediol, etc. are produced by esterification reaction.
就上述聚碳酸酯二醇而言,可舉出例如將ε-己內酯等的環狀酯藉由乙二醇進行開環聚合反應而製得之物,具體而言,係指使碳酸二甲酯、碳酸二乙酯、碳酸二苯酯等,與在上述聚酯二醇中所舉出之醇種反應,而製得之物。 The above-mentioned polycarbonate diols include, for example, cyclic esters such as ε-caprolactone and the like obtained by ring-opening polymerization of ethylene glycol. Specifically, it refers to dimethyl carbonate Ester, diethyl carbonate, diphenyl carbonate, etc., react with the alcohols listed in the above-mentioned polyester diols to obtain products.
高分子二元醇係可單獨使用1種,亦可併用2種以上。 A polymer diol system may be used individually by 1 type, and may use 2 or more types together.
低分子量二元醇係能夠用於氨基甲酸酯預聚物的製造,並能夠使用以下式(4)來表示,且不包含苯環及氮原子。 The low-molecular-weight diol system can be used for the production of a urethane prepolymer, can be represented by the following formula (4), and does not contain a benzene ring and a nitrogen atom.
式(4):HO-R22-OH Formula (4): HO-R 22 -OH
式(4)中R22係[化21] 亞烷基、、金剛烷環、 、(其中,y係2或3,z 係1~6的整數。) In formula (4), R 22 is a [化21] alkylene group, , Adamantane ring, , (Among them, y is 2 or 3, and z is an integer from 1 to 6.)
在氨基甲酸酯預聚物的製造中,相對於在氨基甲酸酯預聚物的製造中所使用之聚異氰酸酯、多元醇、高分子量二元醇、低分子量二元醇以及 後述之第3級胺化合物及/或其鹽的合計量,雖然低分子二元醇的用量通常能夠為1~25質量%,但較佳係1~20質量%,更佳係2~15質量%,特佳係3~10質量%。換言之,在本實施形態所使用之氨基甲酸酯樹脂(A)中,來自式(4)之低分子量二元醇的構造單元的存在量(質量換算)通常係氨基甲酸酯樹脂(A)中的1~25%,較佳係1~20%,更佳係2~15%,特佳係3~10%。 In the production of urethane prepolymers, compared to polyisocyanates, polyols, high molecular weight diols, low molecular weight diols and the polyisocyanates used in the production of urethane prepolymers The total amount of the third-level amine compound and/or its salt described later, although the amount of low-molecular diol can usually be 1-25% by mass, it is preferably 1-20% by mass, more preferably 2-15% by mass %, especially good line 3~10% by mass. In other words, in the urethane resin (A) used in this embodiment, the amount (in terms of mass) of the structural unit derived from the low molecular weight diol of formula (4) is usually the urethane resin (A) 1~25% of the medium, preferably 1~20%, more preferably 2~15%, especially good 3~10%.
在本實施形態之氨基甲酸酯預聚物中,於使用後述之「不含苯環及氮原子之三元醇以上的多元醇」的情況下,「不含苯環及氮原子之三元醇以上的多元醇」的用量亦被算入至上述合計量。 In the urethane prepolymer of this embodiment, in the case of using the "polyol with no benzene ring and nitrogen atom or more" mentioned later, "the ternary alcohol without benzene ring and nitrogen atom" is used. The amount of "polyol above alcohol" is also included in the above total amount.
雖然低分子量二元醇的重量平均分子量係在500以下,但較佳係400以下,更佳係250以下。又,下限值較佳係60以上,更佳係100以上。 Although the weight average molecular weight of the low molecular weight diol is 500 or less, it is preferably 400 or less, and more preferably 250 or less. In addition, the lower limit is preferably 60 or more, more preferably 100 or more.
就低分子量二元醇而言,可舉出例如乙二醇(62.07g/mol)、丙二醇(76.09g/mol)、1,5-戊二醇(104.15g/mol)、1,6-己二醇(118.17g/mol)、1,7-庚二醇(132.2g/mol)、1,8-辛二醇(146.23g/mol)、1,9-壬二醇(160.25g/mol)、1,10-癸二醇(174.28g/mol)、新戊二醇(104.15g/mol)、2-甲基-1.3-丙二醇(90.12g/mol)、3-甲基-1,5-戊二醇(118.17g/mol)、1,4-環己基二甲醇(146.14g/mol)、1,3-金剛烷二醇(168.23g/mol)等的烷基二醇;二乙二醇(106.12g/mol)、三乙二醇(150.17g/mol)、四乙二醇(194.23g/mol)、五乙二醇(238.28g/mol)、六乙二醇(282.33g/mol)、庚二醇(323.28g/mol)、二丙二醇(134.17g/mol)等的聚亞烷基乙二醇;二羥甲基丙酸(134g/mol)等。此等低分子量二元醇係可單獨使用1種,亦可併用2種以上。 For low molecular weight diols, for example, ethylene glycol (62.07g/mol), propylene glycol (76.09g/mol), 1,5-pentanediol (104.15g/mol), 1,6-hexane Diol (118.17g/mol), 1,7-heptanediol (132.2g/mol), 1,8-octanediol (146.23g/mol), 1,9-nonanediol (160.25g/mol) , 1,10-decanediol (174.28g/mol), neopentyl glycol (104.15g/mol), 2-methyl-1.3-propanediol (90.12g/mol), 3-methyl-1,5- Alkyl glycols such as pentanediol (118.17g/mol), 1,4-cyclohexyldimethanol (146.14g/mol), 1,3-adamantanediol (168.23g/mol), etc.; diethylene glycol (106.12g/mol), triethylene glycol (150.17g/mol), tetraethylene glycol (194.23g/mol), pentaethylene glycol (238.28g/mol), hexaethylene glycol (282.33g/mol) , Heptanediol (323.28g/mol), dipropylene glycol (134.17g/mol) and other polyalkylene glycols; dimethylolpropionic acid (134g/mol) and so on. These low-molecular-weight diols may be used singly, or two or more of them may be used in combination.
第3級胺化合物(以下,亦單純稱為第3級胺)及/或其鹽係能夠用於上述氨基甲酸酯預聚物的製造,並能夠使用以下式(5)來表示。 The tertiary amine compound (hereinafter, simply referred to as tertiary amine) and/or its salt can be used for the production of the above-mentioned urethane prepolymer, and can be represented by the following formula (5).
式(5):[化22]
(其中,式中R23為烷基、氨烷基、羥烷基、
R24為羥烷基、氨烷基或N-烷氨基烷基。) R 24 is a hydroxyalkyl group, an aminoalkyl group or an N-alkylaminoalkyl group. )
R23中的氨烷基較佳係-(CH2)2-NH2或-(CH2)3-NH2。R24中的氨烷基較佳係-(CH2)2-NH2。R23及R24中的羥烷基較佳係-(CH2)2-OH。R24中的N-烷氨基烷基較佳係-(CH2)2-NH-CH3。 The aminoalkyl group in R 23 is preferably -(CH 2 ) 2 -NH 2 or -(CH 2 ) 3 -NH 2 . The aminoalkyl group in R 24 is preferably -(CH 2 ) 2 -NH 2 . The hydroxyalkyl group in R 23 and R 24 is preferably -(CH 2 ) 2 -OH. The N-alkylaminoalkyl group in R 24 is preferably -(CH 2 ) 2 -NH-CH 3 .
藉由使第3級胺化合物及/或其鹽的活性氫與上述聚異氰酸酯反應,能夠獲得導入有來自第3級胺化合物及/或其鹽的基團之氨基甲酸酯預聚物(氨基甲酸酯樹脂)。 By reacting the active hydrogen of the tertiary amine compound and/or its salt with the above-mentioned polyisocyanate, it is possible to obtain a urethane prepolymer (amino Formate resin).
又,於第3級胺化合物及/或其鹽含有2個以上的活性氫,例如較佳係包含2個以上之具有氨基、羥基或N-烷基氨基等的活性氫之取代基團。又,就N-烷基氨基而言,較佳係2-甲基氨基。 In addition, the third-stage amine compound and/or its salt contains two or more active hydrogens, for example, preferably contains two or more substituents having active hydrogen such as amino, hydroxyl, or N-alkylamino. In addition, the N-alkylamino group is preferably 2-methylamino group.
在氨基甲酸酯預聚物的製造中,相對於在氨基甲酸酯預聚物的製造中所使用之聚異氰酸酯、多元醇、高分子量二元醇、低分子量二元醇以及第3級胺化合物及/或其鹽的合計量,雖然第3級胺化合物及/或其鹽的用量通常 能夠為1~20質量%,但較佳係2~15質量%,更佳係2~13質量%,特佳係3~10質量%。換言之,在本實施形態所使用之氨基甲酸酯樹脂(A)中,來自式(5)之第3級胺化合物及/或其鹽的構造單元的存在量(質量換算)通常係氨基甲酸酯樹脂(A)中的1~20%,較佳係2~15%,更佳係2~13%,特佳係3~10%。 In the production of urethane prepolymers, compared to polyisocyanates, polyols, high molecular weight diols, low molecular weight diols and tertiary amines used in the production of urethane prepolymers The total amount of the compound and/or its salt, although the amount of the tertiary amine compound and/or its salt is usually It can be 1-20% by mass, but is preferably 2-15% by mass, more preferably 2-13% by mass, and particularly preferably 3-10% by mass. In other words, in the urethane resin (A) used in this embodiment, the amount (in terms of mass) of the structural unit derived from the tertiary amine compound of formula (5) and/or its salt is usually carbamic acid 1-20% in the ester resin (A), preferably 2-15%, more preferably 2-13%, particularly preferably 3-10%.
在本實施形態之氨基甲酸酯預聚物中,於使用後述之「不含苯環及氮原子之三元醇以上的多元醇」的情況下,「不含苯環及氮原子之三元醇以上的多元醇」的用量亦被算入至上述合計量。 In the urethane prepolymer of this embodiment, in the case of using the "polyol with no benzene ring and nitrogen atom or more" mentioned later, "the ternary alcohol without benzene ring and nitrogen atom" is used. The amount of "polyol above alcohol" is also included in the above total amount.
就第3級胺化合物而言,若是具有2個以上活性氫的第3級胺,則並未特別限定,可舉出例如N-甲基二乙醇胺、N-乙基二乙醇胺、N-丁基二乙醇胺、N-t-丁基二乙醇胺、N-(3-氨丙基)二乙醇胺等N-氨基烷基二烷醇胺;三乙醇胺、N,N,N',N'-四(2-羥乙基)乙二胺、雙(2-羥乙基)氨基三(羥甲基)甲烷、1-[雙(2-羥乙基)氨基]-2-丙醇等之亦可具有取代基的三烷醇胺;2,2'-二氨基-N-甲基二乙胺、N,N',N"-三甲基二乙烯三胺、三(2-氨基乙基)胺等第3級胺。此等第3級胺亦可作為甲酸、乙酸等的有機酸之鹽來使用;或作為鹽酸、硫酸等無機酸之鹽來使用;且亦可使用經過硫酸二甲酯、硫酸二乙酯、碘化甲烷等烷化劑作用的4級鹽化之物。就第3級胺化合物而言,可舉出N-氨基烷基二烷醇胺,且特別較佳的是N-甲基二乙醇胺。 Regarding the tertiary amine compound, if it is a tertiary amine having two or more active hydrogens, it is not particularly limited, and examples thereof include N-methyldiethanolamine, N-ethyldiethanolamine, and N-butyl N-aminoalkyl dialkanolamines such as diethanolamine, Nt-butyldiethanolamine, N-(3-aminopropyl)diethanolamine; triethanolamine, N,N,N',N'-tetra(2-hydroxylamine) Ethyl)ethylenediamine, bis(2-hydroxyethyl)aminotris(hydroxymethyl)methane, 1-[bis(2-hydroxyethyl)amino]-2-propanol, etc. may also have substituents Trialkanolamine; 2,2'-diamino-N-methyldiethylamine, N,N',N"-trimethyldiethylenetriamine, tris(2-aminoethyl)amine, etc. 3rd level Amines. These tertiary amines can also be used as salts of organic acids such as formic acid and acetic acid; or as salts of inorganic acids such as hydrochloric acid and sulfuric acid; and can also be used after dimethyl sulfate and diethyl sulfate , Methyl iodide and other alkylating agents. The third-level amine compound includes N-aminoalkyl dialkanolamine, and N-methyl bis Ethanolamine.
本實施形態的氨基甲酸酯樹脂(A)係能夠將來自第3級胺的構造部分(第3級胺)之一部分或全部,以酸等進行中和後之物。就此時所使用的酸而言,可舉出例如甲酸、乙酸、丙酸、丁酸、乳酸、酒石酸、蘋果酸、丙二酸、己二酸等有機羧酸的有機酸;甲烷磺酸、乙烷磺酸、三氟甲磺酸等有機 磺酸等的有機酸;鹽酸、硫酸、硝酸、氟酸、溴酸、磷酸等無機酸。此等酸可單獨使用1種,亦可併用2種以上。 The urethane resin (A) of the present embodiment is a product that can neutralize part or all of the structural part (third-stage amine) derived from the third-stage amine with acid or the like. As for the acid used at this time, for example, organic acids such as formic acid, acetic acid, propionic acid, butyric acid, lactic acid, tartaric acid, malic acid, malonic acid, adipic acid and other organic carboxylic acids; Alkanesulfonic acid, trifluoromethanesulfonic acid and other organic Organic acids such as sulfonic acid; inorganic acids such as hydrochloric acid, sulfuric acid, nitric acid, hydrofluoric acid, bromic acid, and phosphoric acid. These acids may be used individually by 1 type, and may use 2 or more types together.
又,氨基甲酸酯樹脂(A)中來自第3級胺化合物的構造部分(第3級胺)之一部分或全部係能夠成為4級化。就在4級化時所使用的4級化劑而言,具體來說,可舉出例如硫酸二甲酯、硫酸二乙酯等硫酸酯;甲基氯、芐基氯、甲基溴、芐基溴、甲基碘等烷基鹵化物;碳酸二甲酯、碳酸二乙酯等碳酸酯等。此等4級化劑可單獨使用1種,亦可併用2種以上。又,亦可併用作為中和劑之酸與4級化劑。又,在本說明書中,亦有將此等酸及4級化劑稱為離子化劑的情形。 In addition, part or all of the structural part (third-stage amine) derived from the third-stage amine compound in the urethane resin (A) can be quaternary. Regarding the quaternization agent used in quaternization, specific examples include sulfuric acid esters such as dimethyl sulfate and diethyl sulfate; methyl chloride, benzyl chloride, methyl bromide, and benzyl chloride. Alkyl halides such as methyl bromide and methyl iodide; carbonates such as dimethyl carbonate and diethyl carbonate. These quaternary agents may be used singly, or two or more of them may be used in combination. In addition, it is also possible to use an acid as a neutralizing agent and a quaternary chemical agent in combination. In addition, in this specification, these acids and quaternary agents may be referred to as ionizing agents.
在本說明書中,雖然「烷基」並未特別限制,或雖然被含於鹵化烷基、氨基烷基、羥基烷基、N-烷基氨基烷基等的「烷基」並未特別限制,但通常其係指碳原子數為20以下的烷基,較佳係碳原子數為12以下的烷基,更佳係碳原子數為6以下的烷基。就代表性的烷基而言,可舉出例如甲基、乙基、丙基、異丙基、丁基、異丁基、叔丁基、仲丁基、戊基、異戊基、新戊基、己基、異己基、3-甲基戊基、庚基、辛基、壬基、癸基、十一烷基、十二烷基等。 In this specification, although "alkyl" is not particularly limited, or although "alkyl" contained in halogenated alkyl, aminoalkyl, hydroxyalkyl, N-alkylaminoalkyl, etc. is not particularly limited, However, it generally refers to an alkyl group having 20 or less carbon atoms, preferably an alkyl group having 12 or less carbon atoms, and more preferably an alkyl group having 6 or less carbon atoms. For representative alkyl groups, for example, methyl, ethyl, propyl, isopropyl, butyl, isobutyl, tert-butyl, sec-butyl, pentyl, isopentyl, neopentyl Base, hexyl, isohexyl, 3-methylpentyl, heptyl, octyl, nonyl, decyl, undecyl, dodecyl, etc.
又,雖然「亞烷基」並未特別限制,但通常係碳原子數為20以下的亞烷基,較佳係碳原子數為12以下的亞烷基,更佳係碳原子數為6以下的亞烷基。就代表性的亞烷基而言,可舉出例如乙烯基、丙烯基、丁烯基、異丁烯基、叔丁烯基、仲丁烯基、戊烯基、異戊烯基、新戊烯基、二甲苯基、異二甲苯基、3-甲基戊烯基、庚烯基、辛烯基、壬烯基、癸烯基,十一烯基、十二烯基等。 Also, although the "alkylene group" is not particularly limited, it is usually an alkylene group having 20 or less carbon atoms, preferably an alkylene group having 12 or less carbon atoms, and more preferably an alkylene group having 6 or less carbon atoms的alkylene. Representative alkylene groups include, for example, vinyl, propenyl, butenyl, isobutenyl, tert-butenyl, sec-butenyl, pentenyl, isopentenyl, and neopentenyl. , Xylyl, isoxylyl, 3-methylpentenyl, heptenyl, octenyl, nonenyl, decenyl, undecenyl, dodecenyl, etc.
又,鹵化烷基係可例如為,上述烷基中的1個以上的氫原子,被氟原子、氯原子、溴原子或碘原子取代之烷基。 In addition, the halogenated alkyl group may be, for example, an alkyl group in which one or more hydrogen atoms in the above-mentioned alkyl group are substituted with a fluorine atom, a chlorine atom, a bromine atom, or an iodine atom.
在本實施形態之氨基甲酸酯預聚物的製造中,亦可使用上述成分以外的其他成分。就其他成分而言,可舉出例如上述聚異氰酸酯以外的聚異氰酸酯;上述多元醇、高分子量二元醇及低分子量二元醇以外之不含苯環及氮原子的多元醇;有機溶劑;第3級胺以外的多胺化合物;離子化劑;酸;有機金屬化合物等。 In the production of the urethane prepolymer of this embodiment, components other than the above-mentioned components may also be used. Other components include, for example, polyisocyanates other than the above-mentioned polyisocyanates; polyols other than the above-mentioned polyols, high-molecular-weight diols, and low-molecular-weight diols that do not contain benzene rings and nitrogen atoms; organic solvents; Polyamine compounds other than tertiary amines; ionizing agents; acids; organometallic compounds, etc.
就上述聚異氰酸酯以外的聚異氰酸酯而言,雖然並未特別限定,但可舉出例如1,4-四亞甲基二異氰酸酯、乙基(2,6-二異氰酸酯)己酸酯、1,6-六亞甲基二異氰酸酯、1,12-十二烷基二異氰酸酯、2,2,4-或2,4,4-三甲基六亞甲基二異氰酸酯等的脂肪族二異氰酸酯;m-或p-亞苯基二異氰酸酯、三烯-2,4-二異氰酸酯或三烯-2,6-二異氰酸酯、二苯甲烷-4,4'-二異氰酸酯、1,3-雙(2-異氰酸酯-2-丙基)苯、萘-1,5-二異氰酸酯、二苯-4,4'-二異氰酸酯、4,4'-二異氰酸酯-3,3'-二甲基二苯基、3-甲基-二苯甲烷-4,4'-二異氰酸酯、二苯醚-4,4'-二異氰酸酯、四甲基二異氰酸酯等的芳香族二異氰酸酯;1,3,6-六亞甲基三異氰酸酯、1,8-二異氰酸酯-4-異氰酸酯甲基辛烷、2-異氰酸乙酯(2,6-二異氰酸酯)己酸酯等的脂肪族三異氰酸酯;三苯甲烷三異氰酸酯、三(異氰酸酯苯基)硫磷酸鹽等的芳香族三異氰酸酯等。上述聚異氰酸酯以外的聚異氰酸酯係可為如異氰酸酯二聚體(Uretdione)構造般之二聚體、如異氰脲酸酯構造般的三聚體、或者作為使 用多官能多元醇的加合物之1分子中具有3個以上異氰酸酯基的聚異氰酸酯等。 Regarding polyisocyanates other than the above-mentioned polyisocyanates, although not particularly limited, examples thereof include 1,4-tetramethylene diisocyanate, ethyl (2,6-diisocyanate) hexanoate, and 1,6 -Aliphatic diisocyanates such as hexamethylene diisocyanate, 1,12-dodecyl diisocyanate, 2,2,4- or 2,4,4-trimethylhexamethylene diisocyanate; m- Or p-phenylene diisocyanate, triene-2,4-diisocyanate or triene-2,6-diisocyanate, diphenylmethane-4,4'-diisocyanate, 1,3-bis(2-isocyanate -2-propyl)benzene, naphthalene-1,5-diisocyanate, diphenyl-4,4'-diisocyanate, 4,4'-diisocyanate-3,3'-dimethyldiphenyl, 3- Aromatic diisocyanates such as methyl-diphenylmethane-4,4'-diisocyanate, diphenyl ether-4,4'-diisocyanate, and tetramethyl diisocyanate; 1,3,6-hexamethylenetri Aliphatic triisocyanates such as isocyanate, 1,8-diisocyanate-4-isocyanate methyl octane, 2-isocyanate ethyl (2,6-diisocyanate) caproate, etc.; triphenylmethane triisocyanate, tris( Aromatic triisocyanates such as isocyanate phenyl) thiophosphate and the like. The polyisocyanate system other than the above-mentioned polyisocyanate can be a dimer such as an isocyanate dimer (Uretdione) structure, a trimer such as an isocyanurate structure, or as a Use the polyisocyanate etc. which have 3 or more isocyanate groups in 1 molecule of the adduct of a polyfunctional polyol.
此等當中,較佳係使用芳香族二異氰酸酯及芳香族三異氰酸酯等芳香族多異氰酸酯,更佳係使用芳香族二異氰酸酯。就其他成分的含量及來自氨基甲酸酯樹脂(A)中其他成分的構造的存在量而言,在不阻害本發明效果的範圍內,本領域的業者能夠適當地設定。 Among these, aromatic polyisocyanates such as aromatic diisocyanates and aromatic triisocyanates are preferably used, and aromatic diisocyanates are more preferably used. The content of the other components and the amount of the structure derived from the other components in the urethane resin (A) can be appropriately set by those skilled in the art within a range that does not impair the effects of the present invention.
就上述多元醇、高分子量二元醇及低分子量二元醇以外的多元醇而言,能夠使用不含苯環及氮原子的三元醇以上之多元醇,可舉出例如三羥甲基丙烷,季戊四醇等。 For polyols other than the above-mentioned polyols, high-molecular-weight diols, and low-molecular-weight diols, it is possible to use polyols of more than triols that do not contain a benzene ring and a nitrogen atom, such as trimethylolpropane , Pentaerythritol and so on.
在不含苯環及氮原子的三元醇以上之多元醇中,較佳係三羥甲基丙烷(TMP)。 Among the polyols containing no benzene ring and nitrogen atom or more, trimethylolpropane (TMP) is preferred.
在氨基甲酸酯預聚物的製造中使用不含苯環及氮原子的三元醇以上之多元醇的情況下,相對於在氨基甲酸酯預聚物的製造中所使用之聚異氰酸酯、多元醇、高分子量二元醇、低分子量二元醇、第3級胺化合物及/或其鹽以及不含苯環及氮原子的三元醇以上之多元醇的合計量,不含苯環及氮原子的三元醇以上之多元醇的用量較佳係0.5~18質量%,更佳係3~10質量%。換言之,在本實施形態所使用之氨基甲酸酯樹脂(A)中,來自不含苯環及氮原子的三元醇以上之多元醇的構造單元的存在量(質量換算)通常係氨基甲酸酯樹脂(A)中的0.5~18%,較佳係3~10%。 In the case of using polyols that do not contain a benzene ring and a nitrogen atom or more in the production of a urethane prepolymer, compared to the polyisocyanate used in the production of the urethane prepolymer, The total amount of polyols, high-molecular-weight diols, low-molecular-weight diols, tertiary amine compounds and/or their salts, and triols or more polyols that do not contain benzene rings and nitrogen atoms, and do not contain benzene rings and The amount of the polyol above the triol of the nitrogen atom is preferably 0.5-18% by mass, more preferably 3-10% by mass. In other words, in the urethane resin (A) used in this embodiment, the amount (in terms of mass) of structural units derived from polyols that do not contain a benzene ring and a nitrogen atom is usually carbamic acid. 0.5-18% in the ester resin (A), preferably 3-10%.
本實施形態的氨基甲酸酯樹脂,較佳係具有分支構造。就導入分支構造的方法而言,如上述般,雖然能夠舉出使用不含苯環及氮原子的三元醇以上之多元醇的方法,但並不限於此方法。 The urethane resin of this embodiment preferably has a branched structure. As for the method of introducing a branch structure, as described above, although a method of using a triol or higher polyol that does not contain a benzene ring and a nitrogen atom can be mentioned, it is not limited to this method.
在氨基甲酸酯預聚物的製造及/或氨基甲酸酯樹脂(A)的製造中,亦可使用有機溶劑。有機溶劑係能夠作為使上述各成分反應的溶媒來使用。就如此之有機溶劑而言,雖然並未特別限定,但可舉出例如丙酮、甲基乙酮、甲基異丁酮等酮類溶劑;乙酸乙酯、乙酸丁酯等酯類溶劑;四氫呋喃、1,4-二噁烷等醚系溶劑;乙腈、丙烯腈等腈系溶劑;甲基丙烯酸酯、乙基丙烯酸酯、甲基丙烯酸甲酯、乙基甲基丙烯酸酯等丙烯酸酯類溶劑;二甲基甲醯胺、二甲基乙醯胺、N-甲基吡咯烷酮、N-乙基吡咯烷酮等醯胺類溶劑;二甲基亞碸等亞碸類溶劑等。從降低環境負荷的觀點來看,此等有機溶劑可於氨基甲酸酯預聚物的製造及/或氨基甲酸酯樹脂(A)的製造後,因應必要而藉由減壓蒸餾法去除。 In the production of the urethane prepolymer and/or the production of the urethane resin (A), an organic solvent may also be used. The organic solvent system can be used as a solvent for reacting the above-mentioned components. Such organic solvents are not particularly limited, but examples include ketone solvents such as acetone, methyl ethyl ketone, and methyl isobutyl ketone; ester solvents such as ethyl acetate and butyl acetate; tetrahydrofuran, Ether solvents such as 1,4-dioxane; Nitrile solvents such as acetonitrile and acrylonitrile; Acrylic solvents such as methacrylate, ethacrylate, methyl methacrylate, and ethyl methacrylate; 2 Amine-based solvents such as methylformamide, dimethylacetamide, N-methylpyrrolidone, and N-ethylpyrrolidone; sulfenite-based solvents such as dimethyl sulfide, etc. From the viewpoint of reducing the environmental load, these organic solvents can be removed by vacuum distillation as necessary after the production of the urethane prepolymer and/or the production of the urethane resin (A).
至少藉由使聚異氰酸酯、多元醇、高分子量二元醇、低分子量二元醇、第3級胺及/或其鹽等反應,獲得本實施形態的氨基甲酸酯預聚物。 The urethane prepolymer of this embodiment is obtained by at least reacting polyisocyanate, polyol, high molecular weight diol, low molecular weight diol, tertiary amine and/or its salt, etc.
又,藉由使如上述般所獲得之氨基甲酸酯預聚物與水反應,能夠獲得本實施形態的氨基甲酸酯樹脂。此時,亦可因應必要而添加作為鏈伸長劑的多胺化合物,此時的多胺化合物並非第3級胺。 In addition, by reacting the urethane prepolymer obtained as described above with water, the urethane resin of this embodiment can be obtained. At this time, a polyamine compound as a chain extender may be added as necessary, and the polyamine compound in this case is not a tertiary amine.
以下,顯示本實施形態氨基甲酸酯預聚物及氨基甲酸酯樹脂的製造方法的一例(製造方法1~6)。 Hereinafter, an example of the manufacturing method of the urethane prepolymer and urethane resin of this embodiment (manufacturing methods 1 to 6) is shown.
(製造方法1) (Manufacturing method 1)
藉由將聚異氰酸酯、多元醇、高分子量二元醇、低分子量二元醇及第3級胺等溶解於有機溶劑並使其反應,調製氨基甲酸酯預聚物,且因應必要,藉由離子化劑,將氨基甲酸酯預聚物中的第3級胺的一部分或全部離子化,再添加水進行乳化。 By dissolving and reacting polyisocyanate, polyol, high molecular weight diol, low molecular weight diol, and tertiary amine in an organic solvent, a urethane prepolymer is prepared, and if necessary, by The ionizing agent ionizes part or all of the tertiary amine in the urethane prepolymer, and then adds water for emulsification.
(製造方法2) (Manufacturing method 2)
藉由將聚異氰酸酯、多元醇、高分子量二元醇、低分子量二元醇及第3級胺等溶解於有機溶劑並使其反應,調製氨基甲酸酯預聚物,且因應必要,藉由離子化劑,將氨基甲酸酯預聚物中的第3級胺的一部分或全部離子化,再藉由多胺化合物等的鏈伸長劑,一邊將鏈伸長一邊添加水,而進行乳化。 By dissolving and reacting polyisocyanate, polyol, high molecular weight diol, low molecular weight diol, and tertiary amine in an organic solvent, a urethane prepolymer is prepared, and if necessary, by The ionizing agent ionizes part or all of the tertiary amine in the urethane prepolymer, and then emulsifies by adding water while extending the chain with a chain extender such as a polyamine compound.
(製造方法3) (Manufacturing method 3)
不使用有機溶劑,而是藉由使聚異氰酸酯、多元醇、高分子量二元醇、低分子量二元醇及第3級胺等反應(本體聚合法)來調製氨基甲酸酯預聚物,且因應必要,藉由離子化劑,將氨基甲酸酯預聚物中的第3級胺的一部分或全部4級化,再藉由添加水進行乳化。 Without using organic solvents, urethane prepolymers are prepared by reacting polyisocyanates, polyols, high molecular weight diols, low molecular weight diols, and tertiary amines (bulk polymerization method), and If necessary, part or all of the tertiary amine in the urethane prepolymer is quaternized with an ionizing agent, and then emulsified by adding water.
(製造方法4) (Manufacturing method 4)
使用酸化劑或鹼化劑將第3級胺離子化之後,添加聚異氰酸酯、多元醇、高分子量二元醇、低分子量二元醇等並藉由使其反應來調製氨基甲酸酯預聚物,且因應必要,藉由離子化劑,將氨基甲酸酯預聚物中的第3級胺的一部分或全部離子化,再藉由添加水進行乳化。 After ionizing the tertiary amine with an acidifying agent or an alkalizing agent, add polyisocyanate, polyol, high molecular weight diol, low molecular weight diol, etc., and react to prepare a urethane prepolymer And if necessary, part or all of the tertiary amine in the urethane prepolymer is ionized by an ionizing agent, and then emulsified by adding water.
(製造方法5) (Manufacturing method 5)
將聚異氰酸酯、多元醇、高分子量二元醇、低分子量二元醇等加入至有機溶劑並使其反應後,添加第3級胺,調製末端部分具有第3級胺構造的氨基甲酸酯預聚物,且因應必要,藉由離子化劑,將氨基甲酸酯預聚物中的第3級胺的一部分或全部離子化,再藉由添加水進行乳化。 After adding polyisocyanate, polyol, high-molecular-weight diol, low-molecular-weight diol, etc., to the organic solvent and reacting it, a tertiary amine is added to prepare a urethane preform with tertiary amine structure at the end part. If necessary, part or all of the tertiary amine in the urethane prepolymer is ionized by an ionizing agent, and then emulsified by adding water.
(製造方法6) (Manufacturing method 6)
將聚異氰酸酯、多元醇、高分子量二元醇、低分子量二元醇等加入至有機溶劑並使其反應後,添加第3級胺,調製末端部分具有第3級胺構造的氨基甲酸酯預聚物,且因應必要,藉由離子化劑,將氨基甲酸酯預聚物中的第3級胺的一部分或全部離子化,再藉由多胺化合物等的鏈伸長劑,一邊將鏈伸長一邊添加水,而進行乳化。 After adding polyisocyanate, polyol, high-molecular-weight diol, low-molecular-weight diol, etc., to the organic solvent and reacting it, a tertiary amine is added to prepare a urethane preform with tertiary amine structure at the end part. If necessary, part or all of the tertiary amine in the urethane prepolymer is ionized by an ionizing agent, and the chain is extended by a chain extender such as a polyamine compound. Emulsify while adding water.
又,上述製造方法1~6中,能夠使用習知的乳化劑。 In addition, in the above-mentioned manufacturing methods 1 to 6, a conventional emulsifier can be used.
就作為鏈伸長劑而使用的多胺化合物而言,可舉出例如乙二胺、1,2-丙二胺、1,6-六亞甲基二胺、哌嗪、2,5-二甲基哌嗪、異佛爾酮二胺、4,4'-二環己基甲烷二胺、3,3'-二甲基-4,4'-二環己基甲烷二胺、1,4-環己二胺、1,3-雙氨基甲基環己烷、2-氨基乙基氨丙基三甲氧基矽烷;N-羥甲基氨基乙胺、N-羥乙基氨基乙胺、N-羥丙基氨基丙胺、N-乙基氨基乙胺、N-甲基氨丙胺;二乙烯三胺、二丙烯三胺、三乙烯四胺;肼、1,6-六亞甲基雙肼;丁二酸二醯肼、己二酸二醯肼、戊二酸二醯肼、癸二酸二醯肼、異鄰苯二甲酸二醯肼;β-半氨基甲酸醯肼、3-氨基脲丙基氨基甲酸酯、氨基脲-3-氨基脲甲基-3,5,5-三甲基環己烷等。此等當中,較佳係使用肼或乙二胺。 As for the polyamine compound used as a chain extender, for example, ethylene diamine, 1,2-propylene diamine, 1,6-hexamethylene diamine, piperazine, 2,5-dimethyl Piperazine, isophorone diamine, 4,4'-dicyclohexylmethane diamine, 3,3'-dimethyl-4,4'-dicyclohexylmethane diamine, 1,4-cyclohexyl Diamine, 1,3-bisaminomethylcyclohexane, 2-aminoethylaminopropyltrimethoxysilane; N-hydroxymethylaminoethylamine, N-hydroxyethylaminoethylamine, N-hydroxypropyl Aminopropylamine, N-ethylaminoethylamine, N-methylaminopropylamine; diethylenetriamine, dipropylenetriamine, triethylenetetramine; hydrazine, 1,6-hexamethylene bishydrazine; succinic acid Dihydrazine, dihydrazine adipate, dihydrazine glutarate, dihydrazine sebacate, dihydrazine isophthalate; β -semicarbamate, 3-semicarbazide, 3-semicarbazide propylcarbamate Acid ester, semicarbazide-3-semicarbazide methyl-3,5,5-trimethylcyclohexane, etc. Among these, hydrazine or ethylenediamine is preferably used.
在使用鏈伸長劑時,相對於氨基甲酸酯預聚物100質量份,多胺化合物的用量較佳係0.1~10質量份,更佳係0.2~5質量份。 When a chain extender is used, the amount of the polyamine compound is preferably 0.1-10 parts by mass, more preferably 0.2-5 parts by mass relative to 100 parts by mass of the urethane prepolymer.
本實施形態的水系金屬表面處理劑係包含超過10g/L的氨基甲酸酯樹脂(A)。因為在水系金屬表面處理劑中含有較高濃度的氨基甲酸酯樹脂(A),故較適用於形成基底處理層之目的。水系金屬表面處理劑中氨基甲酸 酯樹脂(A)的含量較佳係12g/L以上。雖然上限值並未特別限定,但通常為120g/L以下。 The water-based metal surface treatment agent system of this embodiment contains the urethane resin (A) exceeding 10 g/L. Because the water-based metal surface treatment agent contains a higher concentration of urethane resin (A), it is more suitable for the purpose of forming a base treatment layer. Carbamate in water-based metal surface treatment agent The content of the ester resin (A) is preferably 12 g/L or more. Although the upper limit is not particularly limited, it is usually 120 g/L or less.
本實施形態的水系金屬表面處理劑除了包含特定的氨基甲酸酯樹脂(A)之外,還包含:含氟化合物(B)(以下亦單純稱為「化合物B」),其係還含有選自硼、矽、鈦及鋯所組成之群組中的至少一種元素。在藉由本實施形態的水系金屬表面處理劑所形成之基底處理層上形成塗膜的情況下,除了能夠針對金屬材料賦予優異的耐腐蝕性以外,還能夠賦予優異的加工密著性、耐鹼性或耐酸性等的耐藥品性等之性能。 In addition to the specific urethane resin (A), the water-based metal surface treatment agent of this embodiment also contains: a fluorine-containing compound (B) (hereinafter also simply referred to as "compound B"), which also contains options At least one element from the group consisting of boron, silicon, titanium and zirconium. In the case of forming a coating film on the base treatment layer formed by the water-based metal surface treatment agent of this embodiment, in addition to providing excellent corrosion resistance to metal materials, it is also possible to provide excellent processing adhesion and alkali resistance. Performance such as chemical resistance, acid resistance, etc.
就化合物(B)而言,只要是含有選自硼、矽、鈦及鋯所組成之群組中的至少一種元素,以及氟的化合物,則並未特別限定。具體而言,可舉出例如四氟硼酸、四氟硼酸銨、四氟硼酸鋰、六氟矽酸、六氟矽酸銨、六氟矽酸鈉、氟化鈦(III)、氟化鈦(IV)、六氟鈦酸(H2TiF6)、六氟鈦酸銨、六氟鋯酸、六氟鋯酸銨等。可僅使用此等之一,亦可組合複數來使用。 The compound (B) is not particularly limited as long as it contains at least one element selected from the group consisting of boron, silicon, titanium, and zirconium, and fluorine. Specifically, for example, tetrafluoroboric acid, ammonium tetrafluoroborate, lithium tetrafluoroborate, hexafluorosilicic acid, ammonium hexafluorosilicate, sodium hexafluorosilicate, titanium (III) fluoride, titanium fluoride ( IV), hexafluorotitanic acid (H 2 TiF 6 ), ammonium hexafluorotitanate, hexafluorozirconate, ammonium hexafluorozirconate, etc. Only one of these may be used, or plural numbers may be used in combination.
較佳係以使氨基甲酸酯樹脂(A)的固體成分質量(AM)與化合物(B)的質量(BM)的比值[(BM)/(AM)]在1/100~4的範圍內的方式,來調整化合物(B)的摻合量,更佳係調整至1/50~2的範圍內,最佳係調整至1/20~1的範圍內。 In preferred carbamate-based resin (A) in the solid content mass (A M) and the mass ratio of the compound (B), (B M) of [(B M) / (A M)] 1/100 ~ Adjust the blending amount of the compound (B) within the range of 4, preferably within the range of 1/50~2, and optimally within the range of 1/20~1.
本實施形態的水系金屬表面處理劑較佳係還包含:矽化合物(C),其係選自水分散性二氧化矽及矽烷偶聯劑所組成之群組中的至少一種。藉由使矽化合物(C)被包含在水系金屬表面處理劑,能夠提升上述耐藥品性等性能。水分散性二氧化矽在水中以粒子存在,且雖然其尺寸並未限定,但作為一次粒子可在1nm~1μm的範圍。就水分散性二氧化矽而言,雖然並未特 別限定,但可舉出例如二氧化矽溶膠、氣相二氧化矽分散在水中之物、鋰矽酸鹽、1號矽酸Na、2號矽酸Na、3號矽酸Na、4號矽酸Na、矽酸K等水玻璃。 The water-based metal surface treatment agent of this embodiment preferably further includes a silicon compound (C), which is at least one selected from the group consisting of water-dispersible silica and silane coupling agents. By including the silicon compound (C) in the water-based metal surface treatment agent, the above-mentioned chemical resistance and other properties can be improved. Water-dispersible silica exists as particles in water, and although its size is not limited, it can be in the range of 1 nm to 1 μm as a primary particle. As far as water-dispersible silica is concerned, although there is no special Not limited, but for example, silica sol, fumed silica dispersed in water, lithium silicate, No. 1 Na silicate, No. 2 Na silicate, No. 3 Na silica, and No. 4 silicon Water glass such as acid Na, silicate K, etc.
就二氧化矽溶膠的具體例而言,可舉出例如Snowtex C、Snowtex O、Snowtex N、Snowtex NXS、Snowtex OS、Snowtex OUP、Snowtex OL、Snowtex PS-MO、Snowtex PS-S、Snowtex 20、Snowtex 30、Snowtex 40(以上全部由日產化學工業公司製造);Silica doll-20、Silica doll-30、Silica doll-40、Silica doll-30S、Silica doll-20AL、Silica doll-20A、Silica doll-20G、Silica doll-20GA、Silica doll-40G-80、Silica doll-20P、Silica doll-12S-4(以上全部由日產化學工業公司製造);AT-20、AT-30、AT-40、AT-50、AT-20A、AT-300(以上全部由Adeka公司製造)等。 Specific examples of silica sol include Snowtex C, Snowtex O, Snowtex N, Snowtex NXS, Snowtex OS, Snowtex OUP, Snowtex OL, Snowtex PS-MO, Snowtex PS-S, Snowtex 20, Snowtex 30. Snowtex 40 (all the above are manufactured by Nissan Chemical Industry Company); Silica doll-20, Silica doll-30, Silica doll-40, Silica doll-30S, Silica doll-20AL, Silica doll-20A, Silica doll-20G, Silica doll-20GA, Silica doll-40G-80, Silica doll-20P, Silica doll-12S-4 (all of the above are manufactured by Nissan Chemical Industry Co.); AT-20, AT-30, AT-40, AT-50, AT-20A, AT-300 (all of the above are manufactured by Adeka), etc.
就氣相二氧化矽的具體例而言,可舉出例如Aerosil 50、Aerosil 130、Aerosil 200、Aerosil 300、Aerosil 380、Aerosil TT600、Aerosil MOX80、Aerosil MOX170(以上全部由日本Aerosil公司製造);AERODISP VP W7622、AERODISP W7520N(以上全部由degussa公司製造);CAB-O-SPERSE 2017A、CAB-O-SPERSEGP32/12、CAB-O-SIL M5(CABOT CORPRATION社製)、NIPGELAY200、NIPGELAY220、NIPGELAY420、NIPGELAY451、NIPGELAY460、NIPGELAY401、NIPGELAY601、NIPGELAY603、NIPGELAZ200、NIPGELAZ201、NIPGELAZ204、NIPGELAZ260、NIPGELAZ360、NIPGELAZ400、NIPGELAZ410、NIPGELAZ600、NIPGELBY200、NIPGEL BY400(以上全部由日本silica工業公司製造)等。可僅使用此等水分散性二氧化矽的其中之一,亦可組合複數來使用。 Specific examples of fumed silica include Aerosil 50, Aerosil 130, Aerosil 200, Aerosil 300, Aerosil 380, Aerosil TT600, Aerosil MOX80, Aerosil MOX170 (all of the above are manufactured by Japan Aerosil Corporation); AERODISP VP W7622, AERODISP W7520N (all of the above are manufactured by degussa company); CAB-O-SPERSE 2017A, CAB-O-SPERSEGP32/12, CAB-O-SIL M5 (manufactured by CABOT CORPRATION), NIPGELAY200, NIPGELAY220, NIPGELAY420, NIPGELAY451, NIPGELAY460, NIPGELAY401, NIPGELAY601, NIPGELAY603, NIPGELAZ200, NIPGELAZ201, NIPGELAZ204, NIPGELAZ260, NIPGELAZ360, NIPGELAZ400, NIPGELAZ410, NIPGELAZ600, NIPGELBY200, NIPGEL BY400 (all of the above are manufactured by Japan Silica Industrial Co., Ltd.). Only one of these water-dispersible silicas may be used, or a plurality of them may be used in combination.
就矽烷偶聯劑而言,雖未特別限定,但較佳係具有水溶性官能基。就水溶性官能基而言,可舉出例如第一級氨基、第二級氨基、第三級氨基、第四級銨基或其鹽、羥基、醚基、環氧基、巰基等。 The silane coupling agent is not particularly limited, but preferably has a water-soluble functional group. The water-soluble functional group includes, for example, a first-stage amino group, a second-stage amino group, a third-stage amino group, a fourth-stage ammonium group or a salt thereof, a hydroxyl group, an ether group, an epoxy group, and a mercapto group.
就矽烷偶聯劑的具體例而言,可舉出例如γ-氨丙基三甲氧基矽烷、γ-氨丙基三乙氧基矽烷、N-苯基-3-丙基三甲氧基矽烷、N-苯基-3-丙基三乙氧基矽烷、N-(2-氨乙基)氨丙基三甲氧基矽烷、N-(2-氨乙基)氨丙基甲基二甲氧基矽烷、N-(2-氨乙基)氨丙基三乙氧基矽烷、N-(2-氨乙基)氨丙基甲基二乙氧基矽烷、N-(2-氨乙基)氨丙基甲基二甲氧基矽烷、γ-甲基丙烯醯氧丙基三甲氧基矽烷、γ-甲基丙烯醯丙基甲基二甲氧基矽烷、γ-甲基丙烯醯氧丙基三乙氧基矽烷、γ-甲基丙烯醯氧丙基甲基二乙氧基矽烷、N-β-(N-乙烯基芐氨基乙基)-3-氨丙基三甲氧基矽烷、N-β-(N-乙烯基芐胺乙基)-3-氨丙基甲基二甲氧基矽烷、N-β-(N-乙烯基芐氨基乙基)-3-氨丙基三乙氧基矽烷、N-β-(N-乙烯基芐氨基乙基)-3-氨丙基甲基二乙氧基矽烷、N-甲基氨丙基三甲氧基矽烷、N-丁基氨丙基三甲氧基矽烷、γ-環氧丙氧丙基三甲氧基矽烷、γ-環氧丙氧丙基甲基二甲氧基矽烷、γ-環氧丙氧丙基三乙氧基矽烷、γ-環氧丙氧丙基甲基二乙氧基矽烷、γ-巰丙基三甲氧基矽烷、γ-巰丙基三乙氧基矽烷、γ-巰丙基甲基二乙氧基矽烷、γ-巰丙基甲基二甲氧基矽烷、甲基三甲氧基矽烷、二甲基二甲氧基矽烷、甲基三乙氧基矽烷、二甲基二乙氧基矽烷、乙烯基三乙氧基矽烷、γ-氯丙基三甲氧基矽烷、γ-氯丙基甲基二甲氧基矽烷、γ-氯丙基三乙氧基矽烷、γ-氯丙基甲基二乙氧基矽烷、六甲基二矽氮烷、γ-苯胺丙基三甲氧基矽烷、γ-苯胺丙基甲基二甲氧基矽烷、γ-苯胺丙基三乙氧基矽烷、γ-苯胺丙基甲基二乙氧基矽烷、異氰酸丙酯丙基三甲氧 基矽烷、異氰酸酯丙基三乙氧基矽烷、脲丙基三乙氧基矽烷、雙(三甲氧基甲矽烷基)氨基乙烯基三甲氧基矽烷、乙烯基甲基二甲氧基矽烷、乙烯基三乙氧基矽烷、乙烯基甲基二乙氧基矽烷、十八烷基二甲基[3-(三甲氧基甲矽烷基)丙基]氯化銨、十八烷基二甲基[3-(甲基二甲氧基甲矽烷基)丙基]氯化銨、十八烷基二甲基[3-(三乙氧基甲矽烷基)丙基]氯化銨、十八烷基二甲基[3-(甲基二乙氧基甲矽烷基)丙基]氯化銨、γ-氯丙基甲基二甲氧基矽烷、γ-巰基丙基甲基二甲氧基矽烷、甲基三氯矽烷、二甲基二氯矽烷、三甲基氯矽烷等。可僅使用此等的其中之一,亦可組合複數來使用。 Specific examples of the silane coupling agent include, for example, γ-aminopropyltrimethoxysilane, γ-aminopropyltriethoxysilane, N-phenyl-3-propyltrimethoxysilane, N-phenyl-3-propyltriethoxysilane, N-(2-aminoethyl)aminopropyltrimethoxysilane, N-(2-aminoethyl)aminopropylmethyldimethoxy Silane, N-(2-aminoethyl)aminopropyltriethoxysilane, N-(2-aminoethyl)aminopropylmethyl diethoxysilane, N-(2-aminoethyl)amine Propylmethyldimethoxysilane, γ-methacryloxypropyltrimethoxysilane, γ-methacryloxypropylmethyldimethoxysilane, γ-methacryloxypropyltrimethoxysilane Ethoxysilane, γ-methacryloxypropylmethyldiethoxysilane, N-β-(N-vinylbenzylaminoethyl)-3-aminopropyltrimethoxysilane, N- β -(N-vinylbenzylaminoethyl)-3-aminopropylmethyldimethoxysilane, N- β -(N-vinylbenzylaminoethyl)-3-aminopropyltriethoxysilane , N- β -(N-vinylbenzylaminoethyl)-3-aminopropylmethyldiethoxysilane, N-methylaminopropyltrimethoxysilane, N-butylaminopropyltrimethoxysilane Silane, γ-glycidoxypropyl trimethoxysilane, γ-glycidoxypropyl methyldimethoxysilane, γ-glycidoxypropyl triethoxysilane, γ-epoxy Propoxypropylmethyldiethoxysilane, γ-mercaptopropyltrimethoxysilane, γ-mercaptopropyltriethoxysilane, γ-mercaptopropylmethyldiethoxysilane, γ-mercaptopropyl Methyl dimethoxy silane, methyl trimethoxy silane, dimethyl dimethoxy silane, methyl triethoxy silane, dimethyl diethoxy silane, vinyl triethoxy silane, γ-chloropropyltrimethoxysilane, γ-chloropropylmethyldimethoxysilane, γ-chloropropyltriethoxysilane, γ-chloropropylmethyldiethoxysilane, hexamethyl Disilazane, γ-aniline propyl trimethoxy silane, γ-aniline propyl methyl dimethoxy silane, γ-aniline propyl triethoxy silane, γ-aniline propyl methyl diethoxy Silane, propyl isocyanate propyl trimethoxy silane, isocyanate propyl triethoxy silane, urea propyl triethoxy silane, bis(trimethoxysilyl) amino vinyl trimethoxy silane, ethylene Methyl dimethoxy silane, vinyl triethoxy silane, vinyl methyl diethoxy silane, octadecyl dimethyl [3-(trimethoxysilyl) propyl] chloride Ammonium, octadecyldimethyl[3-(methyldimethoxysilyl)propyl]ammonium chloride, octadecyldimethyl[3-(triethoxysilyl)propyl Base]ammonium chloride, octadecyldimethyl[3-(methyldiethoxysilyl)propyl]ammonium chloride, γ-chloropropylmethyldimethoxysilane, γ-mercapto Propylmethyldimethoxysilane, methyltrichlorosilane, dimethyldichlorosilane, trimethylchlorosilane, etc. Only one of these may be used, or plural numbers may be used in combination.
於使用上述水分散性二氧化矽時,亦可使用於水分散性二氧化矽適當添加有酸或鹼基團之物。就酸而言,可舉出例如鹽酸、硫酸、磷酸、硝酸、氟酸、溴酸等無機酸;甲酸、乙酸、丙酸、丁酸、乳酸、酒石酸、蘋果酸、丙二酸、己二酸、甲烷磺酸、乙烷磺酸、三氟甲磺酸等的有機酸等。就鹼基團而言,可舉出例如氨、氫氧化鈉、氫氧化鉀、氫氧化鈣、氫氧化鋁等。可僅使用此等的其中之1種成分,亦可組合複數來使用。 When the above-mentioned water-dispersible silica is used, it can also be used with water-dispersible silica with appropriate acid or basic groups added. As for the acid, for example, mineral acids such as hydrochloric acid, sulfuric acid, phosphoric acid, nitric acid, hydrofluoric acid, bromic acid; formic acid, acetic acid, propionic acid, butyric acid, lactic acid, tartaric acid, malic acid, malonic acid, adipic acid , Methanesulfonic acid, ethanesulfonic acid, trifluoromethanesulfonic acid and other organic acids. The basic group includes, for example, ammonia, sodium hydroxide, potassium hydroxide, calcium hydroxide, aluminum hydroxide, and the like. Only one of these components may be used, or a plurality of them may be used in combination.
較佳係以使氨基甲酸酯樹脂(A)的固體成分質量(AM)與矽化合物(C)的質量(CM)的比值[(CM)/(AM)]在1/100~2的範圍內的方式,來調整矽化合物(C)的摻合量,更佳係調整至3/100~1.5的範圍內,最佳係調整至1/10~1的範圍內。 In preferred carbamate-based resin (A) in the solid content mass (A M) and the mass ratio of silicon compound (C), (C M) of [(C M) / (A M)] 1/100 Adjust the blending amount of the silicon compound (C) in the range of ~2. It is better to adjust to the range of 3/100 to 1.5, and the best to adjust to the range of 1/10 to 1.
本實施形態的水系金屬表面處理劑較佳係還包含:金屬化合物(D),其係選自Ni、Mn、Co、Mo、V、W、Ce、Mg、Al、Zn、Fe、Bi、Nb、Sn、Cr所組成之群組中的至少一種。由使金屬化合物(D)被摻合在水系金屬表面處理劑,能夠提升上述耐藥品性等性能。 The water-based metal surface treatment agent of this embodiment preferably further includes: a metal compound (D) selected from the group consisting of Ni, Mn, Co, Mo, V, W, Ce, Mg, Al, Zn, Fe, Bi, Nb At least one of the group consisting of Sn, Cr. By blending the metal compound (D) with the water-based metal surface treatment agent, it is possible to improve the above-mentioned chemical resistance and other properties.
就金屬化合物(D)而言,只要能從上述所示例的金屬中選擇即可,並未特別限定,能夠使用上述金屬的碳酸鹽、氧化物、氫氧化物、硫酸鹽、硝酸鹽、磷酸鹽、鹵化物、氟酸(鹽)、有機酸鹽、有機錯合物、有機硼化合物、有機鈦化合物、有機鋯化合物等。 The metal compound (D) is not particularly limited as long as it can be selected from the metals exemplified above, and carbonates, oxides, hydroxides, sulfates, nitrates, and phosphates of the above metals can be used. , Halides, hydrofluoric acid (salt), organic acid salts, organic complexes, organic boron compounds, organic titanium compounds, organic zirconium compounds, etc.
具體而言,氧化鎳、氫氧化鎳、碳酸鎳、硝酸鎳、硫酸鎳、磷酸鎳、氯化鎳、乙醯丙酮鎳;過錳酸、過錳酸鉀、過錳酸鈉、磷酸二氫錳、硝酸錳、硫酸錳(II)、硫酸錳(III)或硫酸錳(IV)、氟化錳(II)或氟化錳(III)、碳酸錳、醋酸錳(II)或醋酸錳(III)、硫酸銨錳,乙醯丙酮錳,碘化錳,氧化錳,氫氧化錳;氯化鈷、氯五胺鈷氯化物、六氨基鈷氯化物、鉻酸鈷、硫酸鈷、硫酸銨鈷、硝酸鈷、氧化鈷二鋁、氫氧化鈷、磷酸鈷;磷釩鉬酸、氧化鉬、鉬酸、鉬酸銨、仲鉬酸銨、鉬酸鈉、鉬磷酸化合物(例如鉬酸銨,鉬磷酸鈉等);釩酸鉍、偏釩酸、偏釩酸鈉、偏釩酸鉀、偏釩酸銨、雙乙醯丙酮釩、二乙醯丙酮釩、五氧化釩、三氧化釩、氟化釩、磷酸釩、硫酸釩、草酸釩、氧化三異丙基釩、氧化三丁氧基釩、氧化三乙氧基釩、氧化三異丙氧基釩、氧化三乙醇胺釩、氧化檸檬酸銨釩、三丁氧基硫醇釩、氧三異丙氧基釩、氧化釩、偏釩酸、偏釩酸銨、偏釩酸鈉、三氧化二釩、氟化釩、磷酸氧釩、硫酸氧釩、草酸釩、乙醯丙酮氧釩(Vanadyl acetylacetonate)、乙醯丙酮釩、四丙氧基釩、四丁氧基釩、三丁氧基硬脂酸酯釩; 偏鎢酸、偏鎢酸銨、偏鎢酸鈉、對鎢酸、對鎢酸銨、對鎢酸鈉;氧化鈰、乙酸鈰、硝酸鈰(III)或硝酸鈰(IV)、硝酸鈰銨、硫酸鈰、氯化鈰;硝酸鎂、硫酸鎂、碳酸鎂、氫氧化鎂、氟化鎂、磷酸銨鎂、磷酸氫鎂、氧化鎂;硝酸鋁、硫酸鋁、硫酸鋁鉀、硫酸鋁鈉、硫酸鋁銨、磷酸鋁、碳酸鋁、氧化鋁、氫氧化鋁、碘化鋁;硫酸鋅、碳酸鋅、氯化鋅、碘化鋅、乙醯丙酮鋅、氧化鋅、碘化鋅、磷酸二氫鋅、乙醯丙酮鋅、磷酸二氫鋅;氫氧化鐵(II)或氫氧化鐵(III)、硝酸鐵(II)或硝酸鐵(III)、乙醯丙酮鐵(III)、氯化鐵(II)或氯化鐵(III)、檸檬酸鐵(III)、氧化鐵(II)或氧化鐵(III)、六氰基鐵(II)或六氰基鐵(III)、六氰基鐵酸(II)、六氰基鐵酸鉀(III)、硫酸鐵銨(II)或硫酸鐵銨(III)、磷酸鐵(II);氧化鉍、硫酸鉍、硝酸鉍、氫氧化鉍、檸檬酸鉍;氯化鈮(III)、氯化鈮(IV)或氯化鈮(V)、氟化鈮(III)、氟化鈮(IV)或氟化鈮(V)、氧化鈮(II)、氧化鈮(IV)或氧化鈮(V);氧化錫(II)或氧化錫(IV)、氯化錫(II)或氯化錫(IV)、氟化錫(II)或氟化錫(IV)、硝酸錫(II)或硝酸錫(IV)、氫氧化錫(II)或氫氧化錫(IV)、硫酸錫(II)或硫酸錫(IV);氧化鉻(II)、氧化鉻(III)、氧化鉻(IV)或氧化鉻(VI);氯化鉻(II)、氯化鉻(III)、氯化鉻(IV);氟化鉻(II)、氟化鉻(III)、氟化鉻(IV)、氟化鉻(V)或氟化鉻(VI);氫氧化鉻(II)或氫氧化鉻(III); 硫酸鉻(III);乙酸鉻(III);硝酸鉻(III);碘化鉻(II)或碘化鉻(III);溴化鉻(II)或溴化鉻(III)等。 Specifically, nickel oxide, nickel hydroxide, nickel carbonate, nickel nitrate, nickel sulfate, nickel phosphate, nickel chloride, nickel acetone; permanganic acid, potassium permanganate, sodium permanganate, manganese dihydrogen phosphate , Manganese nitrate, manganese sulfate (II), manganese sulfate (III) or manganese sulfate (IV), manganese fluoride (II) or manganese fluoride (III), manganese carbonate, manganese acetate (II) or manganese acetate (III) , Ammonium manganese sulfate, manganese acetone acetone, manganese iodide, manganese oxide, manganese hydroxide; cobalt chloride, pentaamine cobalt chloride, hexaamino cobalt chloride, cobalt chromate, cobalt sulfate, cobalt ammonium sulfate, nitric acid Cobalt, cobalt aluminum oxide, cobalt hydroxide, cobalt phosphate; phosphovanadomolybdic acid, molybdenum oxide, molybdic acid, ammonium molybdate, ammonium paramolybdate, sodium molybdate, molybdate phosphate compounds (such as ammonium molybdate, sodium molybdate phosphate Etc.); bismuth vanadate, metavanadate, sodium metavanadate, potassium metavanadate, ammonium metavanadate, vanadium diacetone, vanadium diacetone, vanadium pentoxide, vanadium trioxide, vanadium fluoride, Vanadium phosphate, vanadium sulfate, vanadium oxalate, vanadium triisopropyl oxide, vanadium tributoxide, vanadium triethoxide oxide, vanadium triisopropoxide oxide, vanadium triethanolamine oxide, vanadium ammonium citrate oxide, tris Vanadium butoxy mercaptan, vanadium triisopropoxide, vanadium oxide, metavanadic acid, ammonium metavanadate, sodium metavanadate, vanadium trioxide, vanadium fluoride, vanadyl phosphate, vanadyl sulfate, oxalic acid Vanadium, vanadyl acetylacetonate, vanadyl acetylacetonate, vanadium tetrapropoxide, vanadium tetrabutoxide, vanadium tributoxystearate; Metatungstic acid, ammonium metatungstate, sodium metatungstate, p-tungstic acid, ammonium p-tungstate, sodium p-tungstate; cerium oxide, cerium acetate, cerium (III) or cerium nitrate (IV), cerium ammonium nitrate, Cerium sulfate, cerium chloride; magnesium nitrate, magnesium sulfate, magnesium carbonate, magnesium hydroxide, magnesium fluoride, magnesium ammonium phosphate, magnesium hydrogen phosphate, magnesium oxide; aluminum nitrate, aluminum sulfate, potassium aluminum sulfate, sodium aluminum sulfate, sulfuric acid Aluminum ammonium, aluminum phosphate, aluminum carbonate, aluminum oxide, aluminum hydroxide, aluminum iodide; zinc sulfate, zinc carbonate, zinc chloride, zinc iodide, zinc acetone, zinc oxide, zinc iodide, zinc dihydrogen phosphate , Zinc acetone, zinc dihydrogen phosphate; iron (II) or iron hydroxide (III), iron (II) or iron nitrate (III), iron (III) acetone, iron chloride (II) ) Or iron (III) chloride, iron (III) citrate, iron (II) or iron oxide (III), hexacyanoferric (II) or hexacyanoferric (III), hexacyanoferric acid ( II) Potassium hexacyanoferrate (III), ammonium ferric sulfate (II) or ammonium ferric sulfate (III), iron phosphate (II); bismuth oxide, bismuth sulfate, bismuth nitrate, bismuth hydroxide, bismuth citrate; Niobium (III) chloride, niobium chloride (IV) or niobium chloride (V), niobium fluoride (III), niobium fluoride (IV) or niobium fluoride (V), niobium (II), niobium oxide (IV) or niobium oxide (V); tin oxide (II) or tin oxide (IV), tin chloride (II) or tin chloride (IV), tin fluoride (II) or tin fluoride (IV), Tin (II) or tin nitrate (IV), tin hydroxide (II) or tin hydroxide (IV), tin sulfate (II) or tin sulfate (IV); chromium oxide (II), chromium oxide (III), Chromium (IV) oxide or chromium oxide (VI); chromium chloride (II), chromium chloride (III), chromium chloride (IV); chromium fluoride (II), chromium fluoride (III), chromium fluoride (IV), chromium fluoride (V) or chromium fluoride (VI); chromium hydroxide (II) or chromium hydroxide (III); Chromium(III) sulfate; chromium(III) acetate; chromium(III) nitrate; chromium(II) iodide or chromium(III) iodide; chromium(II) bromide or chromium(III) bromide, etc.
此等可為無水物,亦可為水合物。可單獨使用此等化合物,亦可組合2種以上來使用。 These can be anhydrous or hydrates. These compounds may be used alone or in combination of two or more kinds.
就前述金屬化合物(D)的摻合量而言,較佳係以使氨基甲酸酯樹脂(A)的固體成分質量(AM)與化合物(D)的質量(DM)的比值[(DM)/(AM)]在1/100~1的範圍內的方式,來調整化合物(D)的摻合量,更佳係調整至1/50~3/4的範圍內,最佳係調整至1/25~1/2的範圍內。 Regarding the blending amount of the aforementioned metal compound (D), it is preferable to set the ratio of the mass (A M ) of the solid content of the urethane resin (A) to the mass (D M ) of the compound (D) [( D M )/(A M )] is adjusted within the range of 1/100~1 to adjust the blending amount of compound (D). It is better to adjust to the range of 1/50~3/4, the best The system is adjusted to the range of 1/25~1/2.
本實施形態的水系金屬表面處理劑還可包含:水溶性或水分散性的樹脂(E)(以下,亦單純稱為「樹脂(E)」),其係選自氨基甲酸酯樹脂(除了前述所說明過之本實施形態的氨基甲酸酯樹脂(A)以外)、酚醛樹脂、矽樹脂、環氧樹脂、聚酯樹脂、丙烯酸樹脂、聚烯烴樹脂和聚醯胺樹脂所組成之群組中的至少一種。藉由摻合樹脂(E),能夠賦予柔軟性或適度彈性於被形成之基底處理層。結果,能夠獲得良好的加工密著性。 The water-based metal surface treatment agent of this embodiment may further include: water-soluble or water-dispersible resin (E) (hereinafter, also simply referred to as "resin (E)"), which is selected from urethane resins (except The group consisting of phenol resin, silicone resin, epoxy resin, polyester resin, acrylic resin, polyolefin resin, and polyamide resin (other than the urethane resin (A) of this embodiment described above) At least one of them. By blending resin (E), softness or moderate elasticity can be imparted to the formed base treatment layer. As a result, good processing adhesion can be obtained.
能夠藉由丙烯酸、丙烯酸酯類等的自由基聚合、陽離子聚合或陰離子聚合,來獲得前述丙烯酸樹脂。就在此等聚合反應所使用的單體而言,雖然並未特別限定,但可舉出例如丙烯酸甲酯、丙烯酸乙酯、丙烯酸丙酯、丙烯酸異丙酯、丙烯酸丁酯、丙烯酸異丁酯、丙烯酸s-丁基酯、丙烯酸t-丁基酯、丙烯酸n-己基酯、丙烯酸環己酯、丙烯酸辛酯、丙烯酸異辛酯、丙烯酸2-乙基己基酯、丙烯酸癸基酯、丙烯酸2-羥基乙基酯、甲基丙烯酸甲酯、甲基丙烯酸乙酯、甲基丙烯酸丙酯、甲基丙烯酸異丙酯、甲基丙烯酸丁酯、甲基丙烯酸異丁酯、甲基丙烯酸s-丁基酯、甲基丙烯酸t-丁基酯、甲基丙烯酸n-己基酯、甲基 丙烯酸環己基酯、甲基丙烯酸辛酯、甲基丙烯酸異辛酯、甲基丙烯酸2-乙基己基酯、甲基丙烯酸癸酯、甲基丙烯酸2-羥基乙基酯等。可進一步藉由適當地組合乙烯基三甲氧基矽烷等,於化合物結構中導入烷氧基甲矽烷基(alkoxysilyl group)。此等係可單獨使用,亦可併用2種以上。 The aforementioned acrylic resin can be obtained by radical polymerization, cationic polymerization, or anionic polymerization of acrylic acid, acrylic esters, or the like. The monomers used in these polymerization reactions are not particularly limited, but examples include methyl acrylate, ethyl acrylate, propyl acrylate, isopropyl acrylate, butyl acrylate, and isobutyl acrylate. , S-butyl acrylate, t-butyl acrylate, n-hexyl acrylate, cyclohexyl acrylate, octyl acrylate, isooctyl acrylate, 2-ethylhexyl acrylate, decyl acrylate, acrylic acid 2 -Hydroxyethyl ester, methyl methacrylate, ethyl methacrylate, propyl methacrylate, isopropyl methacrylate, butyl methacrylate, isobutyl methacrylate, s-butyl methacrylate Base ester, t-butyl methacrylate, n-hexyl methacrylate, methyl Cyclohexyl acrylate, octyl methacrylate, isooctyl methacrylate, 2-ethylhexyl methacrylate, decyl methacrylate, 2-hydroxyethyl methacrylate, etc. Further, an alkoxysilyl group can be introduced into the compound structure by appropriately combining vinyl trimethoxysilane and the like. These systems can be used alone, or two or more of them can be used in combination.
就前述氨基甲酸酯樹脂(A)以外的氨基甲酸酯樹脂而言,只要具有環己烷環構造,則並未特別限定。舉例來說,可為以下的氨基甲酸酯樹脂:藉由習知的方法,使六亞甲基二異氰酸酯(HDI)、二環己基甲烷二異氰酸酯(H12MDI)、異佛爾酮二異氰酸酯(IPDI)等脂肪族、脂環式或芳香族二異氰酸酯,與在聚酯多元醇、聚醚多元醇或聚碳酸酯多元醇的鏈中導入有氨基的多元醇聚合,更進一步藉由具有第3級胺基的多元醇類,進行鏈伸長所獲得之氨基甲酸酯樹脂;以及使用烷基硫酸等,將該氨基甲酸酯樹脂中的一部分氨基或全部氨基4級化後之陽離子性氨基甲酸酯樹脂。就陽離子性官能基而言,雖然能夠舉出與氮鍵結的取代基係氫、烷基、芳基、烯基、炔基、羥基烷基等,但並不限於此。亦可單獨使用1種氨基甲酸酯樹脂或組合2種以上來使用。 The urethane resin other than the aforementioned urethane resin (A) is not particularly limited as long as it has a cyclohexane ring structure. For example, it can be the following urethane resin: by a conventional method, hexamethylene diisocyanate (HDI), dicyclohexylmethane diisocyanate (H12MDI), isophorone diisocyanate (IPDI) ) And other aliphatic, alicyclic or aromatic diisocyanates are polymerized with polyols having amino groups introduced into the chain of polyester polyols, polyether polyols or polycarbonate polyols. Amino polyols, urethane resins obtained by chain extension; and cationic urethanes obtained by quaternizing part or all of the amino groups in the urethane resin using alkyl sulfuric acid, etc. Ester resin. The cationic functional group includes hydrogen, an alkyl group, an aryl group, an alkenyl group, an alkynyl group, a hydroxyalkyl group, etc., as a substituent bonded to nitrogen, but it is not limited thereto. You may use 1 type of urethane resin individually or in combination of 2 or more types.
就前述環氧樹脂而言,雖然並未特別限定,但可舉出例如使用下述之縮水甘油醚類或酯類等,藉由進一步與胺類產生作用而導入水溶性官能基的化合物:藉由苯酚、雙酚A、鄰-甲酚、間-甲酚、對-甲酚、鄰苯二甲酸、間苯二甲酸、對苯二甲酸與環氧氯丙烷進行反應而獲得之縮水甘油醚類或酯類;藉由具有酚醛清漆酚、聚對乙烯基苯酚等羥基的芳香族化合物與環氧氯丙烷進行反應而獲得之縮水甘油醚類;藉由乙二醇、聚乙二醇、丙二醇、聚丙二醇、甘油、山梨糖醇等脂肪族多元醇類與環氧氯丙烷進行反應而獲得之縮水甘 油醚類。亦可於此等環氧樹脂導入矽烷醇基、烷氧基甲矽烷基、磷酸基、磷酸酯基。可僅使用此等中的1種成分,亦可組合複數成分來使用。 Although there is no particular limitation on the aforementioned epoxy resin, for example, the following glycidyl ethers or esters, etc., are used to further interact with amines to introduce water-soluble functional groups: Glycidyl ethers obtained by the reaction of phenol, bisphenol A, o-cresol, m-cresol, p-cresol, phthalic acid, isophthalic acid, terephthalic acid and epichlorohydrin Or esters; glycidyl ethers obtained by reacting aromatic compounds with hydroxyl groups such as novolac and polyparavinylphenol with epichlorohydrin; by ethylene glycol, polyethylene glycol, propylene glycol, Polypropylene glycol, glycerin, sorbitol and other aliphatic polyols are reacted with epichlorohydrin to obtain glycerin Oil ethers. Silanol groups, alkoxysilyl groups, phosphoric acid groups, and phosphoric acid ester groups can also be introduced into these epoxy resins. Only one of these components may be used, or plural components may be used in combination.
前述聚酯樹脂只要是多元酸與多元醇的酯化產物,就並未特別限定。 The aforementioned polyester resin is not particularly limited as long as it is an esterification product of a polybasic acid and a polyhydric alcohol.
就多元酸而言,雖然並未特別限定,但可使用例如鄰苯二甲酸、對苯二甲酸、間苯二甲酸、琥珀酸、己二酸、癸二酸、富馬酸、馬來酸酐等二元酸;偏苯三甲酸酐、均苯四甲酸酐等三價以上的多元酸。 As for the polybasic acid, although not particularly limited, for example, phthalic acid, terephthalic acid, isophthalic acid, succinic acid, adipic acid, sebacic acid, fumaric acid, maleic anhydride, etc. can be used Dibasic acid; Trimellitic anhydride, pyromellitic anhydride and other polybasic acids with more than trivalent.
就多元醇而言,雖然並未特別限定,但可使用例如乙二醇、二甘醇、聚乙二醇、丙二醇、二丙二醇、聚丙二醇、新戊二醇、3-甲基戊二醇、新戊二醇、1,4-丁二醇、1,5-戊二醇、1,4-己二醇、1,6-己二醇、1,4-環己烷二甲醇等的脂肪族或脂環族的二價醇;甘油、三羥甲基乙烷、三羥甲基丙烷、三羥甲基丁烷、己三醇、季戊四醇、二季戊四醇、1,1,2,2-四(4-羥基苯基)乙烷等三價以上的多價醇。可僅使用此等中的1種成分,亦可組合複數成分來使用。 As for the polyol, although not particularly limited, for example, ethylene glycol, diethylene glycol, polyethylene glycol, propylene glycol, dipropylene glycol, polypropylene glycol, neopentyl glycol, 3-methylpentanediol, Aliphatic such as neopentyl glycol, 1,4-butanediol, 1,5-pentanediol, 1,4-hexanediol, 1,6-hexanediol, 1,4-cyclohexanedimethanol, etc. Or alicyclic divalent alcohol; glycerol, trimethylolethane, trimethylolpropane, trimethylolbutane, hexanetriol, pentaerythritol, dipentaerythritol, 1,1,2,2-tetra( 4-hydroxyphenyl) ethane and other trivalent or higher polyvalent alcohols. Only one of these components may be used, or plural components may be used in combination.
就苯酚樹脂而言,雖然只要是具有酚醛清漆酚醛樹脂、聚乙烯苯酚、聚雙酚A等苯酚構造的聚合物,並未特別限定,但亦能夠使用在其結構中不具有烷氧基甲矽烷基之化合物。 The phenol resin is not particularly limited as long as it is a polymer having a phenol structure such as novolak phenol resin, polyvinyl phenol, polybisphenol A, etc., but it can also be used without alkoxysilane in its structure. The base compound.
就前述聚醯胺樹脂而言,只要是多元酸與多元胺的酯化產物,就並未特別限定。 The aforementioned polyamide resin is not particularly limited as long as it is an esterification product of a polybasic acid and a polyamine.
就多元酸而言,雖然並未特別限定,但可使用鄰苯二甲酸、對苯二甲酸、間苯二甲酸、琥珀酸、己二酸、癸二酸、富馬酸、馬來酸酐等二元酸;偏苯三甲酸酐、均苯四甲酸酐等三價以上的多元酸;就多元胺而言,雖然並未特別限定,但可使用乙二胺、丙二胺、二乙基三胺、己二胺、三亞乙基四胺、四亞乙 基五胺、異佛爾酮二胺、哌嗪、二苯甲烷二胺、肼、四甲基乙二胺等二元胺等。可僅使用此等中的1種成分,亦可組合複數成分來使用。 As far as polybasic acids are concerned, although not particularly limited, phthalic acid, terephthalic acid, isophthalic acid, succinic acid, adipic acid, sebacic acid, fumaric acid, maleic anhydride, etc. can be used. Polybasic acid; Trimellitic anhydride, pyromellitic anhydride, and other trivalent or higher polybasic acids; as far as polyamines are concerned, although not particularly limited, ethylenediamine, propylenediamine, diethyltriamine, Hexanediamine, triethylenetetramine, tetraethylene Diamines such as pentamine, isophoronediamine, piperazine, diphenylmethanediamine, hydrazine, tetramethylethylenediamine, etc. Only one of these components may be used, or plural components may be used in combination.
就前述矽樹脂而言,只要是矽烷類的脫水縮合物,就並未特別限定。就矽烷類而言,可舉出例如二甲基二氯矽烷、二乙基二氯矽烷、二苯基二氯矽烷等氯矽烷類;甲基三甲氧基矽烷、二甲基二乙氧基矽烷、n-丙基三甲氧基矽烷等烷氧基矽烷類等。可僅使用此等中的1種成分,亦可組合複數成分來使用。 The aforementioned silicone resin is not particularly limited as long as it is a dehydrated condensate of silanes. Silanes include, for example, chlorosilanes such as dimethyldichlorosilane, diethyldichlorosilane, and diphenyldichlorosilane; methyltrimethoxysilane, dimethyldiethoxysilane, etc. , N-propyl trimethoxysilane and other alkoxysilanes. Only one of these components may be used, or plural components may be used in combination.
就前述聚烯烴樹脂而言,只要是烯烴類的化合物,就並未特別限定。就烯烴類而言,能夠使用例如乙烯、丙烯、異戊二烯、α-丁烯等烯烴,並藉由自由基聚合與陽離子聚合等的聚合反應而獲得之物。此等聚合物亦可使用與具有雙鍵的酸酐或羧酸進行共聚合反應之物。可僅使用此等中的1種成分,亦可組合複數成分來使用。 The aforementioned polyolefin resin is not particularly limited as long as it is an olefin-based compound. As for olefins, for example, olefins such as ethylene, propylene, isoprene, and α-butene can be used and obtained by polymerization reactions such as radical polymerization and cationic polymerization. These polymers can also be copolymerized with acid anhydrides or carboxylic acids having double bonds. Only one of these components may be used, or plural components may be used in combination.
前述樹脂(E)較佳係陽離子性或非離子性,且其在水中的存在形態較佳係溶解狀態或分散狀態。樹脂(E)可藉由自溶解性或自分散性而達成朝水的溶解或分散,亦可藉由陽離子性界面活性劑(例如四烷基銨等)及/或非離子性界面活性劑(例如烷基苯基醚等)的存在而分散。 The aforementioned resin (E) is preferably cationic or nonionic, and its existing form in water is preferably a dissolved state or a dispersed state. Resin (E) can be dissolved or dispersed in water by self-solubility or self-dispersibility, or by cationic surfactants (such as tetraalkylammonium, etc.) and/or nonionic surfactants ( For example, the presence of alkyl phenyl ether, etc.) is dispersed.
就前述樹脂(E)的含量而言,較佳係以使氨基甲酸酯樹脂(A)的固體成分質量(AM)與樹脂(E)的質量(EM)的比值[(EM)/(AM)]在1/50以上且5以下的範圍內的方式,來調整樹脂(E)的含量,更佳係調整至1/25以上且3以下的範圍內,最佳係調整至1/10以上且1以下的範圍內。 The content of the resin to (E), preferably such that the urethane-based resin (A) in the solid content mass (A M) and the mass ratio (E M) resin (E) of [(E M) /(A M )] is adjusted within the range of 1/50 or more and 5 or less to adjust the content of resin (E), more preferably adjusted to within the range of 1/25 or more and 3 or less, and optimally adjusted to Within the range of 1/10 or more and 1 or less.
本實施形態的水系金屬表面處理劑較佳係還包含:交聯劑(F),其係選自噁唑啉系樹脂、嵌段異氰酸酯系樹脂、碳二亞胺系樹脂、氮 丙啶系樹脂和環氧系樹脂所組成之群組中的至少一種。藉由將其摻合至可形成上述水溶液或水性乳液樹脂的基底處理層,能更進一步提升加工密著性。 The water-based metal surface treatment agent of this embodiment preferably further includes: a crosslinking agent (F) selected from the group consisting of oxazoline resins, blocked isocyanate resins, carbodiimide resins, and nitrogen At least one of the group consisting of propidium-based resin and epoxy-based resin. By blending it into the base treatment layer that can form the above-mentioned aqueous solution or aqueous emulsion resin, the processing adhesion can be further improved.
就交聯劑(F)的含量而言,較佳係以使氨基甲酸酯樹脂(A)的固體成分質量(AM)與交聯劑(F)的質量(FM)的比值[(FM)/(AM)]在1/50以上且5以下的範圍內的方式,來調整交聯劑(F)的含量,更佳係調整至1/25以上且3以下的範圍內,最佳係調整至1/10以上且1以下的範圍內。 Regarding the content of the crosslinking agent (F), it is preferable to set the ratio of the mass (A M ) of the solid content of the urethane resin (A) to the mass (F M ) of the crosslinking agent (F) [( F M )/(A M )] is adjusted within the range of 1/50 or more and 5 or less to adjust the content of the crosslinking agent (F), and more preferably within the range of 1/25 or more and 3 or less, The best system is adjusted to the range of 1/10 or more and 1 or less.
本實施形態的水系金屬表面處理劑能夠在不損害水系金屬表面處理劑的液穩定性及皮膜性能的範圍內,還包含:提升溼潤性的界面活性劑、增黏劑、消泡劑、用於提升焊接性的導電性物質、用於提升設計性的著色顏料、用於調整塗膜厚度的增量顏料(extender pigment)。 The water-based metal surface treatment agent of this embodiment can further include: surfactants, tackifiers, defoamers, and additives for Conductive substances to improve solderability, coloring pigments to improve design, extender pigments to adjust the thickness of the coating film.
能夠藉由在水性溶媒,混合氨基甲酸酯樹脂(A)及化合物(B),且因應必要,混合氨基甲酸酯樹脂(A)及化合物(B)以外的上述各成分,而製造本實施形態的水系金屬表面處理劑。就水性溶媒而言,只要在以全部溶媒的質量為基準時,含有90質量%以上的水,就並未特別限定。就被含於水性溶媒的水以外之溶劑而言,可舉出例如甲醇、乙醇、丁醇等的醇類溶劑;丙酮等酮類;乙二醇單乙醚;乙二醇單-n-丁醚等乙二醇單烷基醚。又,此等水以外的溶劑雖可混合1種,亦可組合2種以上來混合。 This embodiment can be manufactured by mixing the urethane resin (A) and the compound (B) in an aqueous solvent, and if necessary, mixing the above-mentioned components other than the urethane resin (A) and the compound (B) A water-based metal surface treatment agent. The aqueous solvent is not particularly limited as long as it contains 90% by mass or more of water based on the mass of the entire solvent. Examples of solvents other than water contained in the aqueous solvent include alcohol solvents such as methanol, ethanol, and butanol; ketones such as acetone; ethylene glycol monoethyl ether; ethylene glycol mono-n-butyl ether Etc glycol monoalkyl ether. Moreover, although these solvents other than water may mix 1 type, you may mix 2 or more types in combination.
本實施形態水系金屬表面處理劑中的pH值較佳係在2.5~12.0的範圍內,更佳係在4.0~7.0的範圍內。在需要進行pH調整時,能夠藉由氨、二甲胺或三乙胺等鹼性成分或能夠藉由乙酸、磷酸等酸性成分等,進行調整。 The pH value in the water-based metal surface treatment agent of this embodiment is preferably in the range of 2.5 to 12.0, more preferably in the range of 4.0 to 7.0. When pH adjustment is necessary, it can be adjusted by alkaline components such as ammonia, dimethylamine, or triethylamine, or can be adjusted by acidic components such as acetic acid and phosphoric acid.
就本實施形態水系金屬表面處理劑中的合計固體成分濃度而言,雖然只要能夠達成本發明的效果,就並未特別限定,但從水系金屬表面處 理劑穩定性的觀點來看,其上限值較佳係40質量%以下。合計固體成分濃度較佳係0.1~40質量%,更佳係1~30質量%,特佳係5~25質量%。 Regarding the total solid content concentration in the water-based metal surface treatment agent of this embodiment, although it is not particularly limited as long as it can achieve the effect of the invention, it is from the surface of the water-based metal From the viewpoint of the stability of the physical agent, the upper limit thereof is preferably 40% by mass or less. The total solid content concentration is preferably 0.1-40% by mass, more preferably 1-30% by mass, and particularly preferably 5-25% by mass.
接著,針對本實施形態的基底處理層的形成方法以及具有基底處理層之金屬材料的製造方法,進行說明。 Next, the method of forming the base treatment layer and the method of manufacturing the metal material having the base treatment layer of the present embodiment will be described.
藉由塗佈等方式,使如上述之本實施形態的水系金屬表面處理劑與金屬材料的表面接觸,而形成本實施形態的基底處理層。之後,可不經過水洗而使其乾燥。 The water-based metal surface treatment agent of this embodiment as described above is brought into contact with the surface of the metal material by means of coating or the like to form the base treatment layer of this embodiment. After that, it can be dried without washing with water.
就前述金屬材料而言,能夠使用冷軋鋼板、熱軋鋼板、熔融鍍鋅鋼板、電鍍鋅鋼板、熔融合金化鍍鋅鋼板、鍍鋁鋼板、鍍鋁-鋅合金化鋼板、鍍鋅-鋁-鎂合金化鋼板、不鏽鋼鋼板、鋁板、銅板、鈦板、鎂板、鍍鎳板、鍍錫板等習知的金屬材料。 As for the aforementioned metal materials, cold-rolled steel sheets, hot-rolled steel sheets, hot-dip galvanized steel sheets, electro-galvanized steel sheets, melt-alloyed galvanized steel sheets, aluminum-plated steel sheets, aluminum-zinc alloyed steel sheets, and galvanized-aluminum steel sheets can be used. Conventional metal materials such as magnesium alloy steel plate, stainless steel plate, aluminum plate, copper plate, titanium plate, magnesium plate, nickel plated plate, tin plated plate, etc.
前述金屬材料較佳係在經由本實施形態的水系金屬表面處理劑的基底處理之前,進行前處理。 The aforementioned metal material is preferably subjected to pretreatment before the substrate treatment by the water-based metal surface treatment agent of this embodiment.
就前處理的方法而言,能夠舉出脫脂步驟、熱水洗步驟、溶劑洗淨步驟等,且此等步驟係為了去除附著於金屬材料的油份、污染,而使用鹼脫脂劑或酸性脫脂劑洗淨。又,亦可因應必要,於此等步驟後,進行使用習知的表面調整劑之表面調整步驟及/或使用習知的化學轉化處理劑之化學轉化處理步驟。又,就脫脂步驟、溶劑洗淨步驟、表面調整步驟、化學轉化處理步驟等而言,亦可於步驟結束後進行水洗。 The pre-treatment method includes a degreasing step, a hot water washing step, a solvent washing step, etc., and these steps are used to remove oil and contamination attached to the metal material, using an alkali degreasing agent or an acid degreasing agent Wash. Furthermore, if necessary, after these steps, a surface conditioning step using a conventional surface conditioning agent and/or a chemical conversion treatment step using a conventional chemical conversion treatment agent may be performed. In addition, the degreasing step, the solvent washing step, the surface adjustment step, the chemical conversion treatment step, etc., may be washed with water after the step is completed.
經由本實施形態的水系金屬表面處理劑的基底處理,係藉由塗佈水系金屬表面處理劑而接觸,來進行的。之後,亦可不經過水洗而進行乾燥,亦可經過水洗之後再進行乾燥。 The substrate treatment via the water-based metal surface treatment agent of this embodiment is performed by applying the water-based metal surface treatment agent to contact. After that, it may be dried without washing with water, or it may be dried after washing with water.
就本實施形態水系金屬表面處理劑的接觸方法而言,並未特別限制,可舉出例如輥塗法、簾流塗佈法、空氣噴塗法、無空氣噴塗法、浸漬法、棒塗法、刷毛塗佈法等通常方法。就水系金屬表面處理劑的溫度而言,雖未特別限制,但因為本實施形態水系金屬表面處理劑的溶媒係以水為主體,水系金屬表面處理劑的溫度較佳係在0~60℃的範圍內,更佳係在5~40℃的範圍內。 The contact method of the water-based metal surface treatment agent of this embodiment is not particularly limited, and examples include roll coating, curtain coating, air spraying, airless spraying, dipping, bar coating, Common methods such as brush coating method. The temperature of the water-based metal surface treatment agent is not particularly limited, but because the solvent of the water-based metal surface treatment agent of this embodiment is mainly water, the temperature of the water-based metal surface treatment agent is preferably 0-60 ℃ Within the range, more preferably within the range of 5-40°C.
在使本實施形態的水系金屬表面處理劑接觸後進行乾燥的情況下,雖然亦可進行例如經由風乾、吹氣等進行乾燥,但亦可進行使用火爐等的加熱進行乾燥。就加熱乾燥的溫度而言,較佳係在50~250℃的範圍內,更佳係在60~220℃的範圍內。又,上述加熱乾燥的溫度係表示金屬材料本身的溫度。 When the water-based metal surface treatment agent of the present embodiment is brought into contact and then dried, drying may be performed, for example, by air drying, air blowing, or the like, but heating using a stove or the like may be performed for drying. Regarding the heating and drying temperature, it is preferably in the range of 50 to 250°C, and more preferably in the range of 60 to 220°C. In addition, the temperature of the above-mentioned heating and drying means the temperature of the metal material itself.
就可形成基底處理層的附著量而言,作為乾燥後皮膜中來自含氟化合物的硼、矽、鈦、鋯等元素換算質量(在乾燥皮膜中含有2種以上的元素時,則為總量),通常係在0.01~1g/m2的範圍內,較佳係在0.02~0.5g/m2的範圍內,更佳係在0.03~0.25g/m2的範圍內。藉由使附著量在此範圍內,能夠更進一步提升上述耐腐蝕性及加工密著性。又,乾燥後皮膜中的上述元素換算質量係能夠使用螢光X射線分析裝置,藉由測定乾燥後皮膜中各元素的質量而得。 In terms of the amount of adhesion that can form the base treatment layer, the mass of elements such as boron, silicon, titanium, and zirconium from the fluorine-containing compound in the dried film is converted into mass (when the dried film contains two or more elements, it is the total amount ), with usually in the range of 0.01 ~ 1g / m 2, preferably in the range-based 0.02 ~ 0.5g / m 2, and more preferably in the range-based 0.03 ~ 0.25g / m 2 of. By setting the adhesion amount within this range, the above-mentioned corrosion resistance and processing adhesion can be further improved. In addition, the above-mentioned element-converted mass in the film after drying can be obtained by measuring the mass of each element in the film after drying using a fluorescent X-ray analyzer.
又,雖然通常將如前述般所形成之基底處理層,作為用於具有塗膜的金屬材料的基底處理層來使用,但因為其密著性優異,其亦可作為高功能塗層材料的基底來使用,且將能夠賦予耐指紋性或潤滑性等之1~3層的皮膜層作為前述高功能塗層材料的上層。又,亦可作為導電鋼板用基底或層壓鋼板用基底來使用。 In addition, although the base treatment layer formed as described above is usually used as a base treatment layer for a metal material with a coating film, it can also be used as a base for high-functional coating materials because of its excellent adhesion. It is used as the upper layer of the above-mentioned high-functional coating material, and one to three coating layers that can impart fingerprint resistance, lubricity, etc., are used. Moreover, it can also be used as a base for conductive steel sheets or a base for laminated steel sheets.
接著,針對具有本實施形態的基底處理層之金屬材料(以下,亦稱為預塗金屬材料)的製造方法進行說明。 Next, the manufacturing method of the metal material (hereinafter, also referred to as the pre-coated metal material) having the base treatment layer of the present embodiment will be described.
本實施形態預塗金屬材料的製造方法係具備下述步驟的預塗金屬材料的製造方法:基底處理步驟,其係使本實施形態的水系金屬表面處理劑與金屬材料的表面接觸,而形成基底處理層;塗裝步驟,其係於前述基底處理層上,塗裝塗料。 The manufacturing method of the pre-coated metal material of this embodiment is a manufacturing method of the pre-coated metal material having the following steps: a substrate treatment step, which is to contact the water-based metal surface treatment agent of this embodiment with the surface of the metal material to form a substrate Treatment layer; coating step, which is applied to the aforementioned substrate treatment layer and coating paint.
本實施形態的預塗金屬材料的製造方法中的基底處理步驟係能夠實施與在本施實施形態的基底處理層的形成方法中相同的步驟。 The base treatment step in the method of manufacturing the precoated metal material of the present embodiment can implement the same steps as in the method of forming the base treatment layer of the present embodiment.
塗裝步驟係只要能在基底處理層上形成塗膜即可,例如下述方法:在基底處理層上塗佈底漆並使其乾燥後,再塗佈面漆(塗料)的塗裝法;不使用底漆而是直接塗佈面漆的塗裝法;貼付層壓膜的方法等。舉例來說,可針對預塗金屬材料進行一般的塗裝法。 The coating step is as long as the coating film can be formed on the base treatment layer, for example, the following method: after coating a primer on the base treatment layer and drying, then coating the top coat (paint); A coating method that does not use a primer but a topcoat directly; a method of attaching a laminated film, etc. For example, a general coating method can be applied to pre-coated metal materials.
就上述底漆而言,雖然並未特別限制,但較佳係使用無鉻底漆。無鉻底漆係指,未摻合鉻酸鹽系防鏽顏料之物。就無鉻底漆而言,通常係包含樹脂及因應必要的著色顏料或防鏽顏料等。就樹脂而言,可為水系、溶劑系、粉體系等任何形態之物。就樹脂的種類而言,雖然只要是習知之樹脂,並未特別限定,但能夠單獨使用例如聚丙烯酸系樹脂、聚烯烴系樹脂、聚氨基甲酸酯系樹脂、環氧系樹脂、聚酯系樹脂、聚丁醛系樹脂、三聚氰胺系樹脂、氟系樹脂等樹脂,或組合2種以上來使用。 Regarding the above-mentioned primer, although there is no particular limitation, it is preferable to use a chromium-free primer. Chromium-free primer refers to the thing that is not blended with chromate-based anti-corrosion pigments. As far as chromium-free primers are concerned, they usually contain resins and necessary coloring pigments or anti-rust pigments. As far as the resin is concerned, it can be in any form such as water-based, solvent-based, and powder-based systems. As far as the type of resin is concerned, although it is not particularly limited as long as it is a conventional resin, it can be used alone, for example, polyacrylic resin, polyolefin resin, polyurethane resin, epoxy resin, and polyester resin. Resins, polybutyraldehyde-based resins, melamine-based resins, fluorine-based resins, and other resins, or a combination of two or more of them can be used.
又,亦可於上述樹脂使用摻合有鉻顏料的鉻底漆。在使用鉻底漆時亦可因應必要摻合著色顏料。 In addition, a chromium primer blended with a chromium pigment can also be used for the above-mentioned resin. Coloring pigments can also be blended as necessary when using chrome primers.
就著色顏料而言,能夠使用鈦白、氧化鋅、氧化鋯、碳酸鈣、硫酸鋇、氧化鋁、高嶺土、炭黑、氧化鐵等無機顏料;或顏料黃、吡唑啉酮橙、偶氮系顏料等有機顏料等習知的著色顏料。就防鏽顏料而言,能夠使用習知之物,舉例來說,磷酸鋅、磷酸鐵、磷酸鋁等磷酸系防鏽顏料;鉬酸鈣、鉬酸鋁、鉬酸鋇等鉬酸系防鏽顏料;氧化釩等釩系防鏽顏料;亦可使用水分散性二氧化矽、氣相二氧化矽等微粒二氧化矽等。又,就鉻酸鹽系防鏽顏料而言,亦可使用鉻酸鍶、鉻酸鋅、鉻酸鈣、鉻酸鉀、鉻酸鋇等。又,亦可適當摻合消泡劑、分散補助劑、用於使塗料黏度下降的稀釋劑等添加劑。 As for coloring pigments, inorganic pigments such as titanium white, zinc oxide, zirconium oxide, calcium carbonate, barium sulfate, alumina, kaolin, carbon black, iron oxide, etc. can be used; or pigment yellow, pyrazolone orange, azo series Conventional coloring pigments such as organic pigments such as pigments. As far as anti-rust pigments are concerned, conventional ones can be used, for example, phosphoric acid-based anti-rust pigments such as zinc phosphate, iron phosphate, and aluminum phosphate; and molybdic acid-based anti-rust pigments such as calcium molybdate, aluminum molybdate, and barium molybdate. ;Vanadium-based anti-rust pigments such as vanadium oxide; water-dispersible silicon dioxide, fumed silicon dioxide and other particulate silicon dioxide can also be used. In addition, as chromate-based anti-rust pigments, strontium chromate, zinc chromate, calcium chromate, potassium chromate, barium chromate, etc. can also be used. In addition, additives such as defoamers, dispersion aids, and diluents for lowering the viscosity of the paint can also be appropriately blended.
就底漆的塗裝方法而言,並未特別限制,可使用浸漬法、噴塗法、輥塗法、空氣噴塗法、無空氣噴塗法等。由底漆所形成的塗膜厚度,作為乾燥的膜厚度,較佳係在1~30μm的範圍內,更佳係在2~20μm的範圍內。 The coating method of the primer is not particularly limited, and a dipping method, spraying method, roll coating method, air spraying method, airless spraying method, etc. can be used. The thickness of the coating film formed by the primer, as a dry film thickness, is preferably in the range of 1 to 30 μm, more preferably in the range of 2 to 20 μm.
就底漆的燒結(乾燥)條件而言,雖然並未特別限定,但可在130~250℃之範圍的溫度內,進行10秒~5分鐘之間的燒結(乾燥)。又,亦可在塗裝面漆之後,進行暫時的加熱乾燥處理。 The sintering (drying) conditions of the primer are not particularly limited, but the sintering (drying) can be performed at a temperature in the range of 130 to 250°C for 10 seconds to 5 minutes. In addition, after the top coat is applied, a temporary heat drying treatment may be performed.
就本實施形態預塗金屬材料的製造方法所使用之面漆(塗料)而言,並未特別限制,能夠使用習知的塗裝用面漆。面漆係包含樹脂,且因應必要,還包含著色顏料或防鏽顏料等。 The topcoat (paint) used in the manufacturing method of the precoated metal material of this embodiment is not particularly limited, and a conventional topcoat for coating can be used. The top coat contains resin, and if necessary, it also contains coloring pigments or anti-rust pigments.
就樹脂、著色顏料、防鏽顏料及其他添加物而言,能夠使用與在底漆的部分所使用之物相同。 Regarding resins, coloring pigments, anti-corrosion pigments, and other additives, the same ones as those used in the primer can be used.
面漆的塗裝方法或燒結(乾燥)條件係可與底漆的情況相同。藉由面漆所形成的塗膜厚度,作為乾燥的膜厚度,較佳係在3~50μm的範圍內,更佳係在5~40μm的範圍內。 The coating method or sintering (drying) conditions of the top coat can be the same as the case of the primer. The thickness of the coating film formed by the topcoat, as a dry film thickness, is preferably in the range of 3-50 μm, more preferably in the range of 5-40 μm.
藉由上述之本實施形態預塗金屬材料的製造方法,所獲得之本實施形態的預塗金屬材料,其加工密著性、耐藥品性、耐腐蝕性優異。 According to the method of manufacturing the precoated metal material of the present embodiment described above, the precoated metal material of the present embodiment obtained is excellent in processing adhesion, chemical resistance, and corrosion resistance.
[實施例] [Example]
以下,雖然列舉本發明的實施例及比較例,更具體說明本發明,但本發明係不被僅限定於此等實施例。 Hereinafter, although examples and comparative examples of the present invention are cited to describe the present invention more specifically, the present invention is not limited to these examples only.
1.氨基甲酸酯樹脂的調製 1. Preparation of urethane resin
(合成例1) (Synthesis example 1)
將雙酚A-聚氧乙烯2莫耳加成物(Newpol BPE-20T,三洋化成工業公司製)(後述的b1)63g;聚乙二醇(PEG2000,第一工業製藥公司製)(後述的c1)67g;N-甲基二乙醇胺(氨基醇MDA,日本乳化劑公司製)(後述的e1)30g;二甘醇(二甘醇,日本觸媒公司製)(後述的d1)30g;以及異佛爾酮二異氰酸酯(Desmodule I,拜爾公司製)(後述的a1)230g,加入至甲基乙基酮400g,並使其充分溶解。將此混合溶液在80℃下反應約5小時後,確認到含有3質量%以下的異氰酸酯基團,之後添加硫酸二甲酯(後述的離子化劑g1)25g。又,異氰酸酯基團的含有率係能夠依據JIS K7301:1995,將反應溶液2g溶解於二甲基甲醯胺,在添加n-二丁胺-甲苯溶液10ml後,將溴酚藍用作指示劑,以0.5mol/L的鹽酸液滴定,並以下述的式子算出。 Bisphenol A-polyoxyethylene 2 mol adduct (Newpol BPE-20T, manufactured by Sanyo Kasei Kogyo Co., Ltd.) (b1 described later) 63 g; polyethylene glycol (PEG2000, manufactured by Daiichi Kogyo Pharmaceutical Co., Ltd.) (described later c1) 67g; N-methyldiethanolamine (amino alcohol MDA, manufactured by Nippon Emulsifier Co., Ltd.) (e1 described later) 30 g; Diethylene glycol (diethylene glycol, manufactured by Nippon Shokubai Co., Ltd.) (d1 described later) 30 g; and 230 g of isophorone diisocyanate (Desmodule I, manufactured by Bayer) (a1 described later) was added to 400 g of methyl ethyl ketone and fully dissolved. After reacting this mixed solution at 80°C for about 5 hours, it was confirmed that the isocyanate group was contained at 3% by mass or less, and then 25 g of dimethyl sulfate (ionizing agent g1 described later) was added. In addition, the isocyanate group content rate is based on JIS K7301: 1995. 2 g of the reaction solution is dissolved in dimethylformamide, and 10 ml of n-dibutylamine-toluene solution is added, and bromophenol blue is used as an indicator , Titrate with 0.5mol/L hydrochloric acid solution, and calculate with the following formula.
(式中,A係表示,針對調製特定量的反應溶液所使用之異氰酸酯的量(質量),進行滴定時所需要的鹽酸液體積;B係表示,針對反應溶液進行滴定時所需要的鹽酸液體積;f係表示「1」,N係表示鹽酸標準溶液的莫耳濃度,S係表示反應溶液的質量) (In the formula, A represents the volume (mass) of isocyanate used to prepare a specific amount of the reaction solution and the volume of hydrochloric acid required for titration; B represents the volume of hydrochloric acid required for the titration of the reaction solution Volume; f represents "1", N represents the molar concentration of the hydrochloric acid standard solution, and S represents the mass of the reaction solution)
接著,加入去離子水1000g並調製聚氨酯乳液(Emulsion)。藉由減壓蒸餾法,從獲得之聚氨酯乳液去除甲基乙基酮,且調製氨基甲酸酯樹脂濃度為25質量%之合成例1的氨基甲酸酯樹脂。 Next, 1000 g of deionized water was added to prepare a polyurethane emulsion (Emulsion). By the vacuum distillation method, methyl ethyl ketone was removed from the obtained polyurethane emulsion, and the urethane resin of Synthesis Example 1 with a urethane resin concentration of 25% by mass was prepared.
如表1所示,使用各種成分及用量(質量%),以與合成例1相同的方法,調製合成例2~8及12~19的氨基甲酸酯樹脂。 As shown in Table 1, the urethane resins of Synthesis Examples 2 to 8 and 12 to 19 were prepared in the same manner as Synthesis Example 1 using various components and amounts (% by mass).
除了使用離子化劑g2(85%磷酸)25g作為離子化劑g1(硫酸二甲酯)25g的代替以外,以與合成例1相同的製造方法,調製合成例9的氨基甲酸酯樹脂。 Except that 25 g of ionizing agent g2 (85% phosphoric acid) was used instead of 25 g of ionizing agent g1 (dimethyl sulfate), the urethane resin of Synthesis Example 9 was prepared by the same manufacturing method as Synthesis Example 1.
除了使用離子化劑g3(甲酸)10g作為離子化劑g1(硫酸二甲酯)25g的代替以外,以與合成例1相同的製造方法,調製合成例10的氨基甲酸酯樹脂。 The urethane resin of Synthesis Example 10 was prepared by the same manufacturing method as Synthesis Example 1 except that 10 g of ionizing agent g3 (formic acid) was used instead of 25 g of ionizing agent g1 (dimethyl sulfate).
除了使用離子化劑g4(甲烷磺酸)19g作為離子化劑g1(硫酸二甲酯)25g的代替以外,以與合成例1相同的製造方法,調製合成例11的氨基甲酸酯樹脂。 Except that 19 g of ionizing agent g4 (methanesulfonic acid) was used instead of 25 g of ionizing agent g1 (dimethyl sulfate), the same production method as in Synthesis Example 1 was used to prepare the urethane resin of Synthesis Example 11.
表1所記載的各成分,係如下所示。又,表1所記載各成分的用量(質量%)係以(a)~(e)成分的合計量作為基準,且在使用(f)時亦將其合併至前述合計量來計算。又,藉由各合成例所獲得之氨基甲酸酯預聚物皆含有異氰酸酯基。 The components described in Table 1 are as follows. In addition, the amount (% by mass) of each component described in Table 1 is calculated based on the total amount of the components (a) to (e), and when (f) is used, it is also combined into the aforementioned total amount. In addition, all the urethane prepolymers obtained by each synthesis example contained isocyanate groups.
<聚異氰酸酯(a;以下的一部分係具有環己烷構造的聚異氰酸酯)> <Polyisocyanate (a; part of the following is a polyisocyanate having a cyclohexane structure)>
a1:異佛爾酮二異氰酸酯(Desmodule I,拜爾公司製) a1: Isophorone diisocyanate (Desmodule I, manufactured by Bayer)
a2:二環己基甲烷4,4'-二異氰酸酯(DesmoduleW,拜爾公司製) a2: Dicyclohexylmethane 4,4'-diisocyanate (DesmoduleW, manufactured by Bayer)
a3:甲苯二異氰酸酯(Cosmonate T80,三井化學公司製) a3: Toluene diisocyanate (Cosmonate T80, manufactured by Mitsui Chemicals Co., Ltd.)
a4:六亞甲基二異氰酸酯(50M-HDI,旭化成公司製) a4: Hexamethylene diisocyanate (50M-HDI, manufactured by Asahi Kasei Corporation)
<多元醇(b)> <Polyol (b)>
b1:雙酚A-聚氧乙烯2莫耳加成物(Newpol BPE-20T,三洋化成工業公司製) b1: Bisphenol A-polyoxyethylene 2 mol adduct (Newpol BPE-20T, manufactured by Sanyo Kasei Kogyo Co., Ltd.)
b2:芳香族二元酸聚酯多元醇(Teslac 2508-70,日立化成公司製) b2: Aromatic dibasic acid polyester polyol (Teslac 2508-70, manufactured by Hitachi Chemical Co., Ltd.)
b3:聚碳酸酯二元醇(Nipporan981,東曹公司製) b3: Polycarbonate diol (Nipporan 981, manufactured by Tosoh Corporation)
<二元醇(c;以下的一部分係不含苯環及氮原子之重量平均分子量大於600的二元醇)> <Diol (c; the following part is a diol with a weight average molecular weight greater than 600 without benzene ring and nitrogen atom)>
c1:聚乙二醇(PEG2000,Mw2000,第一工業製藥公司製) c1: Polyethylene glycol (PEG2000, Mw2000, manufactured by Daiichi Industrial Pharmaceutical Co., Ltd.)
c2:聚酯多元醇(Nipporan4040,Mw2000,東曹公司製) c2: Polyester polyol (Nipporan4040, Mw2000, manufactured by Tosoh Corporation)
c3:聚丁二醇(PTMG2000,Mw2000,三菱化學公司製) c3: Polybutylene glycol (PTMG2000, Mw2000, manufactured by Mitsubishi Chemical Corporation)
c4:聚酯乙二醇(K-FLEX XM360,Mw520,KING公司製) c4: Polyester glycol (K-FLEX XM360, Mw520, manufactured by KING)
<二元醇(d;以下的一部分係不含苯環及氮原子之重量平均分子量在500以下的二元醇)> <Diol (d; the following part is a diol with a weight average molecular weight of 500 or less without benzene ring and nitrogen atom)>
d1:二甘醇(二甘醇,Mw106,日本觸媒公司製) d1: Diethylene glycol (Diethylene glycol, Mw106, manufactured by Nippon Shokubai Co., Ltd.)
d2:1,5-戊二醇(1,5-戊二醇,Mw104,宇部興產公司製) d2: 1,5-pentanediol (1,5-pentanediol, Mw104, manufactured by Ube Industries Co., Ltd.)
d3:1,6-己二醇(1,6-己二醇,Mw106,宇部興產公司製) d3: 1,6-hexanediol (1,6-hexanediol, Mw106, manufactured by Ube Kosan Co., Ltd.)
d4:聚酯多元醇(Placcel 205,Mw 530,Daicel化學公司製) d4: Polyester polyol (Placcel 205, Mw 530, manufactured by Daicel Chemical Co., Ltd.)
<第3級胺(e)> <Tier 3 Amine (e)>
e1:N-甲基二乙醇胺(氨基醇MDA,日本乳化劑公司製) e1: N-methyldiethanolamine (amino alcohol MDA, manufactured by Japan Emulsifier Company)
<其他(不含苯環及氮原子之三元醇以上的多元醇)(f)> <Others (polyols of more than triols without benzene ring and nitrogen atom) (f)>
f1:三羥甲基丙烷(TMP,Perstorp公司製) f1: Trimethylolpropane (TMP, manufactured by Perstorp)
<離子化劑> <Ionizing Agent>
離子化劑g1:硫酸二甲酯(辻本化學公司製) Ionizing agent g1: Dimethyl sulfate (manufactured by Tsujimoto Chemical Co., Ltd.)
離子化劑g2:85%磷酸(日本化學工業公司製) Ionizing agent g2: 85% phosphoric acid (manufactured by Nippon Chemical Industry Co., Ltd.)
離子化劑g3:甲酸(純正化學公司製) Ionizing agent g3: formic acid (manufactured by Junsei Chemical Co., Ltd.)
離子化劑g4:甲烷磺酸(東曹公司製) Ionizing agent g4: Methanesulfonic acid (manufactured by Tosoh Corporation)
2.水系金屬表面處理劑的調製 2. Preparation of water-based metal surface treatment agent
如表2所示,將特定量的各成分,氨基甲酸酯樹脂(A)、化合物(B)、矽化合物(C)、金屬化合物(D)、樹脂(E)、交聯劑(F)以此順序加入至水並調製實施例1~50及比較例1~11的水系金屬表面處理劑。表2所記載的各成分係如下所示。 As shown in Table 2, the specific amounts of each component, urethane resin (A), compound (B), silicon compound (C), metal compound (D), resin (E), crosslinking agent (F) The water-based metal surface treatment agents of Examples 1 to 50 and Comparative Examples 1 to 11 were prepared by adding to water in this order. The components described in Table 2 are as follows.
化合物(B) Compound (B)
(B1)六氟鈦酸(森田化學工業公司製) (B1) Hexafluorotitanic acid (manufactured by Morita Chemical Industry Co., Ltd.)
(B2)六氟矽酸(森田化學工業公司製) (B2) Hexafluorosilicic acid (manufactured by Morita Chemical Industry Co., Ltd.)
(B3)六氟鋯酸(森田化學工業公司製) (B3) Hexafluorozirconic acid (manufactured by Morita Chemical Industry Co., Ltd.)
(B4)四氟硼酸(和光純藥工業公司製) (B4) Tetrafluoroboric acid (manufactured by Wako Pure Chemical Industries, Ltd.)
矽化合物(C) Silicon compound (C)
(C1)3-氨丙基三乙氧基矽烷(信越化學公司製) (C1) 3-Aminopropyltriethoxysilane (manufactured by Shin-Etsu Chemical Co., Ltd.)
(C2)膠體二氧化矽(日產化學公司製) (C2) Colloidal silica (manufactured by Nissan Chemical Co.)
金屬化合物(D) Metal compound (D)
(D1)氧化鎂(協和化學工業公司製) (D1) Magnesium oxide (manufactured by Kyowa Chemical Industry Co., Ltd.)
(D2)乙酸錳(II)四水合物(Nacalai Tesque公司製) (D2) Manganese acetate (II) tetrahydrate (manufactured by Nacalai Tesque)
(D3)乙醯丙酮氧釩(新興化學工業公司製) (D3) Vanadium acetone (manufactured by Xinxing Chemical Industry Co., Ltd.)
實施例28所使用之D1與D3的質量比係D1:D3=1:1。 The mass ratio of D1 to D3 used in Example 28 is D1:D3=1:1.
樹脂(E) Resin (E)
(E1)丙烯酸樹脂(A-655,楠本化成公司製) (E1) Acrylic resin (A-655, manufactured by Kusumoto Chemical Co., Ltd.)
(E2)氨基甲酸酯樹脂(Super flex 650,第一工業製藥公司製) (E2) Urethane resin (Super flex 650, manufactured by Daiichi Kogyo Pharmaceutical Co., Ltd.)
(E3)苯酚樹脂(IG-1002 DIC公司製) (E3) Phenol resin (manufactured by IG-1002 DIC)
交聯劑(F) Crosslinking agent (F)
(F1)碳二亞胺樹脂(Carbodilite SV-02,日清紡化學公司製) (F1) Carbodiimide resin (Carbodilite SV-02, manufactured by Nisshinbo Chemical Co., Ltd.)
(F2)嵌段異氰酸酯樹脂(TRIXENE AQUA BI 220,Baxenden Chemicals Limited公司製) (F2) Blocked isocyanate resin (TRIXENE AQUA BI 220, manufactured by Baxenden Chemicals Limited)
3.預塗鋼板的製作 3. Production of pre-coated steel sheet
3.1 試驗用材料 3.1 Test materials
(i)熔融鍍鋅鋼板(以下記號:GI)板厚0.45mm (i) Hot-dip galvanized steel sheet (the following symbol: GI) thickness 0.45mm
(ii)鍍55%鋁-鋅合金鋼板(以下記號:GL)板厚0.35mm (ii) 55% aluminum-zinc alloy plated steel sheet (the following symbol: GL) thickness 0.35mm
3.2 前處理 3.2 Pre-processing
將各種試驗用材料在60℃下浸漬於鹼脫脂劑(將精細清潔劑E6406(日本帕卡瀨精股份有限公司製)與水混合,並使濃度成為20g/L之溶液)10秒鐘,並以純水水洗後乾燥。針對GI材,於鹼脫脂後,在50℃下浸漬於表面調整劑(將 PL-4015(日本帕卡瀨精股份有限公司製)與水混合,並使濃度成為100g/L之溶液),並以純水水洗後乾燥。又,浸漬於表面調整劑的浸漬時間係使Ni附著量調整成5mg/m2的時間。 The various test materials were immersed in an alkali degreasing agent (mixing fine detergent E6406 (manufactured by Japan Parker Seiki Co., Ltd.) and water to make the concentration a 20g/L solution) at 60°C for 10 seconds, and Rinse with pure water and dry. For GI materials, after alkali degreasing, they are immersed in a surface conditioner (PL-4015 (manufactured by Japan Parker Seiki Co., Ltd.) and water are mixed, and the concentration becomes a 100g/L solution) at 50°C, and Rinse with pure water and dry. In addition, the immersion time for immersion in the surface conditioner is the time for adjusting the Ni adhesion amount to 5 mg/m 2 .
3.3 基底處理 3.3 Substrate treatment
使用棒塗機,將各種實施例或比較例的水系金屬表面處理劑,塗佈於經過前處理後的試驗用材料的表面(單面)後,不進行水洗,藉由在80℃(PMT:乾燥時試驗用材料的最高溫度)下乾燥,以乾燥皮膜中的硼、矽、鈦、鋯等元素換算質量計,形成100mg/m2基底處理層。 Using a bar coater, the water-based metal surface treatment agents of the various examples or comparative examples were applied to the surface (single side) of the test material after the pretreatment, without washing, and by heating at 80°C (PMT: Drying at the highest temperature of the test material during drying), to form a 100mg/m 2 base treatment layer based on the mass of elements such as boron, silicon, titanium, and zirconium in the dried film.
3.4 塗裝 3.4 Painting
在3.3所製作的皮膜上,塗佈以環氧樹脂作為底層之底漆,藉由在210℃下進行乾燥‧燒結,形成乾燥膜厚為5μm的底漆層。 On the film made in 3.3, apply a primer with epoxy resin as the bottom layer, and dry and sinter at 210°C to form a primer layer with a dry film thickness of 5μm.
接著,於底漆層上,塗佈以聚酯樹脂作為底層之面漆塗料,藉由在220℃下進行乾燥‧燒結,形成乾燥膜厚為15μm的面漆層,而獲得各種預塗鋼板(No.1~64)。 Then, coat the topcoat paint with polyester resin as the bottom layer on the primer layer, and dry and sinter at 220°C to form a topcoat layer with a dry film thickness of 15μm to obtain various pre-coated steel sheets ( No.1~64).
4.評價試驗 4. Evaluation test
針對各種預塗鋼板中具有基底處理層、底漆層及面漆層的面,進行以下的加工密著性試驗、耐腐蝕性試驗及耐藥品性試驗。 The following processing adhesion test, corrosion resistance test, and chemical resistance test were performed on the surface of various pre-coated steel sheets with a primer layer, a primer layer, and a topcoat layer.
將結果顯示於表3。 The results are shown in Table 3.
4.1.1一次加工密著性試驗 4.1.1 One-time processing adhesion test
依據JIS-G3312:2012的試驗方法,將各種預塗鋼板折曲至180度。在折曲部分貼付玻璃紙膠帶後,將玻璃紙膠帶剝離,以肉眼觀察塗膜的剝離狀態,並根據下述的評價基準,來評價加工密著性。又,本試驗在20℃的室溫下進行。又,在本評價中,B以上為合格。 According to the test method of JIS-G3312:2012, various pre-coated steel plates are bent to 180 degrees. After the cellophane tape was attached to the bent portion, the cellophane tape was peeled off, the peeling state of the coating film was observed with the naked eye, and the processing adhesion was evaluated based on the following evaluation criteria. In addition, this test was performed at a room temperature of 20°C. In addition, in this evaluation, B or higher is considered a pass.
<評價基準> <Evaluation criteria>
A:未產生剝離 A: No peeling
B:剝離面積小於10% B: The peeling area is less than 10%
C:剝離面積在10%以上且小於25% C: The peeling area is more than 10% and less than 25%
D:剝離面積在25%以上且小於50% D: The peeling area is more than 25% and less than 50%
E:剝離面積在50%以上 E: The peeling area is more than 50%
4.1.2 二次加工密著性試驗 4.1.2 Adhesion test for secondary processing
將各種預塗鋼板浸漬於沸騰的水中2小時後,進行乾燥。乾燥後,放置一天,且與一次加工密著性試驗相同地,將各種預塗鋼板折曲至180度。在折曲部分貼付玻璃紙膠帶後,將玻璃紙膠帶剝離,評價加工密著性。又,在本評價中,B以上為合格。 After immersing various pre-coated steel sheets in boiling water for 2 hours, they were dried. After drying, it was left for one day, and the various pre-coated steel sheets were bent to 180 degrees in the same way as the first processing adhesion test. After the cellophane tape was applied to the bent portion, the cellophane tape was peeled off, and the processing adhesion was evaluated. In addition, in this evaluation, B or higher is considered a pass.
<評價基準> <Evaluation criteria>
AA:未產生剝離 AA: No peeling
A:剝離面積小於10% A: The peeling area is less than 10%
B:剝離面積在10%以上且小於25% B: The peeling area is more than 10% and less than 25%
C:剝離面積在25%以上且小於50% C: The peeling area is more than 25% and less than 50%
D:剝離面積在50%以上 D: The peeling area is more than 50%
4.2 耐酸性試驗 4.2 Acid resistance test
將各種預塗鋼板浸漬於5%硫酸水溶液,並在室溫下浸漬72小時後,進行水洗,之後乾燥。乾燥後,以肉眼確認水泡的產生數量及產生密度,並依據ASTM D714-56所規定的判斷基準進行判斷後,基於以下評價基準進行耐酸性的評價。又,在本評價中,B以上為合格。 Various pre-coated steel sheets were immersed in a 5% sulfuric acid aqueous solution and immersed at room temperature for 72 hours, then washed with water, and then dried. After drying, the number and density of blisters were visually confirmed, and after judging according to the judgment criteria specified in ASTM D714-56, the acid resistance was evaluated based on the following evaluation criteria. In addition, in this evaluation, B or higher is considered a pass.
<評價基準> <Evaluation criteria>
A:其係為10 A: Its department is 10
B:其係為9F B: Its department is 9F
C:其係為8F或9M C: Its line is 8F or 9M
D:其係為7F或8M D: It is 7F or 8M
E:其係為6F或7M或9MD E: It is 6F or 7M or 9MD
4.3 耐鹼性試驗 4.3 Alkali resistance test
將各種預塗鋼板浸漬於5%氫氧化鈉水溶液,並在室溫(20℃)下浸漬72小時後,進行水洗,之後乾燥。乾燥後,以肉眼確認水泡的產生數量及產生密度,並依據與耐酸性試驗相同的判斷基準進行判斷後,基於以下評價基準進行耐鹼性的評價。又,在本評價中,B以上為合格。 Various pre-coated steel sheets were immersed in a 5% sodium hydroxide aqueous solution and immersed at room temperature (20°C) for 72 hours, washed with water, and then dried. After drying, the number and density of blisters were visually confirmed, and after judging based on the same judgment criteria as the acid resistance test, the alkali resistance was evaluated based on the following evaluation criteria. In addition, in this evaluation, B or higher is considered a pass.
4.4 耐腐蝕性試驗 4.4 Corrosion resistance test
於各種預塗鋼板的塗膜面,用刮刀切割出到達金屬基層的x狀切痕,依據JIS H8502:1999,進行中性鹽水噴霧360小時。之後,測定來自交叉(x)的切痕之塗膜膨脹幅度(單側最大膨脹幅度)。又,亦測定來自預塗鋼板的端部之塗膜膨脹幅度(最大膨脹幅度)。又,在本評價中,B以上為合格。 On the coating surface of various pre-coated steel sheets, use a spatula to cut x-shaped cuts that reach the metal base layer. According to JIS H8502: 1999, spray neutral salt water for 360 hours. After that, the swelling width of the coating film (the maximum swelling width on one side) from the cut of the intersection (x) was measured. In addition, the expansion width (maximum expansion width) of the coating film from the end of the pre-coated steel sheet was also measured. In addition, in this evaluation, B or higher is considered a pass.
<評價基準-x切痕> <Evaluation Criteria-x Notch>
A:小於1mm A: less than 1mm
B:1mm以上且小於3mm B: 1mm or more and less than 3mm
C:3mm以上且小於5mm C: 3mm or more and less than 5mm
D:5mm以上且小於8mm D: 5mm or more and less than 8mm
E:8mm以上 E: 8mm or more
<評價基準-端部> <Evaluation Criteria-Ends>
A:小於2mm A: Less than 2mm
B:2mm以上且小於4mm B: 2mm or more and less than 4mm
C:4mm以上且小於6mm C: 4mm or more and less than 6mm
D:6mm以上且小於8mm D: 6mm or more and less than 8mm
E:8mm以上 E: 8mm or more
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