TWI741215B - Exposure device - Google Patents

Abstract

[Problem] In the exposure device including the RtoR transport system (Roll to Roll carrier), exposure is performed while suppressing the snake of the long substrate. [Solution] In the exposure apparatus 10 including the RtoR transport system for transporting the long substrates W1 and W2, a substrate supply device 20 is provided to fasten the supply reels 22A and 22B installed on the upstream side of the exposure table 15; and The substrate winding device 30 fastens and holds the winding reels 32A and 32B provided on the downstream side. During the exposure operation, the exposure table 15 is moved in the X direction by the table moving mechanism 50, while the substrate supply device 20 and the substrate winding device 30 are moved together in the X direction by the conveying unit moving mechanism 60.

Description

Exposure device

The present invention relates to an exposure device that transports long substrates (workpieces) such as flexible printed circuit boards by means of a roll to roll carrier (Roll to Roll carrier, hereinafter referred to as RtoR transport system).

In the exposure device including the RtoR transport system, the supply reel (supply reel) is arranged on the upstream side of the exposure table, and the winding reel (winding reel) is arranged on the downstream side. After the long substrate is wound on the supply reel and the winding reel, it is exposed while being conveyed from the upstream side to the downstream side.

Specifically, the exposure table that sucks and supports the back of the long substrate is moved along the transport direction of the long substrate, and the position of the projection and projection area (exposure target area) by the exposure head set above the long substrate Corresponding pattern light. When the exposure table moves to the end of the exposure position, the exposure table goes down and returns to the initial exposure position. By repeatedly performing the same exposure operation, a pattern is formed on the entire long substrate. [Prior Patent Document] [Patent Document]

[Patent Document 1] Japanese Patent Application Publication No. 2015-222370

[The problem to be solved by the invention]

The conventional RtoR transport system is fixed to the base (frame) of the exposure device. Therefore, the long substrate is intermittently drawn out from the supply reel at the start of exposure, and sent to the downstream side. In addition, when the exposure table is returned to the upstream side after the exposure is completed, the long substrate may be rolled up to the upstream side. Due to the movement of the substrate, snakes occur on the long substrate, and damages such as deviation of the exposure position, or warpage, wrinkles or scratches of the long substrate occur. In particular, when a plurality of long substrates are exposed in parallel and simultaneously, the meandering adjustment becomes difficult.

Therefore, it is required to construct a substrate transport system that can reliably suppress the snaking of long substrates. [Means to solve the problem]

The exposure device of the present invention includes: an exposure workbench that supports a long substrate and can reciprocate along the substrate conveying line; the substrate supply part is arranged on the upstream side of the exposure workbench and is provided with a supply reel; And the substrate winding part is arranged on the downstream side of the exposure table, and a winding reel is provided. Here, "upstream side" refers to the supply reel side of the supporting exposure table, and "downstream side" refers to the winding reel side.

For example, it may be configured that the substrate supply unit includes an upstream support roller, and the substrate winding unit is provided with a downstream support roller. In addition, a long substrate may be constituted by a plurality of parallel long substrates. The exposure table may be configured such that, for example, it can move while adsorbing and holding a long substrate, and can be raised and lowered.

In the present invention, the substrate supply part and the substrate winding part are movable along the substrate conveying line. The "substrate conveying line" here means the direction in which the substrate is sent out or the opposite direction, and corresponds to the moving direction of the exposure table. As long as it is made that the substrate supply part and the substrate winding part move in accordance with the movement of the exposure table during the exposure operation.

As the exposure device, it can be set up: a table moving mechanism, which makes the exposure table reciprocate along the substrate conveying line; and a conveying part moving mechanism, which makes the substrate supply part and the substrate winding part reciprocate along the substrate conveying line move. The conveyance part moving mechanism may be, for example, a moving mechanism that can link the substrate supply part and the substrate winding part, that is, move integrally.

It is also possible to provide a movement control part which controls the movement of the substrate supply part and the substrate winding part in such a way as to maintain the relative positional relationship between the exposure table, the substrate supply part and the substrate winding part. For example, a sensor is provided which detects the distance between at least one of the substrate supply part and the substrate winding part and the exposure table, and the movement control part controls the exposure table and the exposure table in response to the detected distance. The movement of the substrate supply part and the substrate winding part is sufficient.

The exposure apparatus of other forms of the present invention includes: an exposure workbench, which supports a plurality of long substrates arranged side by side, and can reciprocate along the substrate conveying line; and a plurality of pairs of reels, which are respectively oppositely covered It is arranged on both sides of the exposure workbench and transports a plurality of long substrates; the multiple pairs of reels and the exposure workbench can reciprocate along the substrate transport line.

A plurality of pairs of reels may be wound in the same direction with a plurality of long substrates, and at least one of the plurality of pairs of reels may be configured to be wound in a direction different from other long substrates.

The exposure apparatus of another form of the present invention includes: an exposure worktable which supports a long substrate; a pair of reels which are respectively arranged on the upstream and downstream sides of the exposure worktable; and an exposure section which is a pair of long substrates. The substrate is exposed; the exposure part is a pair of exposure workbench and a pair of reels, which can move relatively along the substrate conveying line. [Effects of Invention]

According to the present invention, the exposure device including the RtoR transport system can perform exposure while restraining the snake from the long substrate.

Hereinafter, the embodiments of the present invention will be described with reference to the drawings.

Fig. 1 is a schematic configuration diagram of the exposure apparatus of this embodiment. Fig. 2 is a perspective view schematically showing a part of the exposure device. Fig. 3 is a schematic block diagram of the exposure apparatus.

The exposure apparatus 10 includes an exposure apparatus of an RtoR transport system that carries a long substrate W wound in a roll shape while performing an exposure operation, and includes a substrate supply device 20, a substrate winding device 30, and an exposure unit 40. The long substrate W here is a long film-like substrate wound on the long film after forming a copper thin film layer and coated (or pasted) a photosensitive material such as a photoresist to form a roll shape. As shown in FIG. 2, the long substrate W is composed of two (a pair) substrates W1 and W2 with the same width.

The exposure workbench (workbench) 15 sucks the back of the long substrate W and holds it flatly, and can be raised and lowered in the Z direction between the suction position on the back and a predetermined separation position separated from the back, and a lifting mechanism not shown in the figure Lift. The exposure table 15 is supported by the table moving mechanism 50 as described later, and is movable in the X direction. In addition, in the following, "X" indicates the direction along the conveying direction (conveyance line) M of the long substrate W, and "Y" indicates the direction perpendicular to the conveying direction M (the substrate width direction), and "Z" "Indicates the direction perpendicular to X and Y (vertical direction).

The exposure unit 40 is arranged at a predetermined distance from the long substrates W1 and W2 in the Z direction, and is fixed to the base 10B via a frame not shown. As shown in FIG. 3, the exposure section 40 is composed of a plurality of exposure heads, each of which includes a light source 41 such as a semiconductor laser light, an illumination optical system 42, and a DMD in which a plurality of micro mirrors are arranged in an array. The (Digital Micro-mirror Device) 43, the imaging optical system 44 and the like define the exposure area along the conveying direction M for each exposure head. The light source 41 is driven by the light source control unit 110.

The DMD of each exposure head locates the posture of the micro-mirror according to the drawing data (light field data) corresponding to the position of the exposure area transmitted from the exposure control unit 120, thereby projecting the pattern light onto the strip substrate W1 , W2. By switching the posture of the micro mirror in response to the relative movement of the long substrates W1 and W2 of the exposure unit 40, the photosensitive materials of the long substrates W1, W2 are exposed (multiple exposure, etc.), thereby forming a pattern. The controller 100 (refer to FIG. 3) controls the overall exposure operation of the exposure device 10. In addition, it can also be constructed by using the exposure part of the mask.

The substrate supply device 20 includes: supply reels 22A, 22B, which are arranged on the upstream side of the exposure table 15; a support roller 24; Rotate. The driving mechanism is composed of, for example, a stepping motor. The supply reels 22A and 22B supported by the cantilever of the substrate supply device 20 respectively hold and fix the unexposed parts of the long substrates W1 and W2 in a roll-like state. In addition, by rotating the shaft, it can be moved downstream The long substrate W is sent out from the side. In addition, when viewed from the exposure table 15, the supply reels 22A and 22B side are regarded as the "upstream side", and the winding reels 32A and 32B side are regarded as the "downstream side".

The substrate winding device 30 includes: winding reels 32A and 32B, which are arranged on the downstream side of the exposure table 15; a support roller 34; 32B performs shaft rotation. The winding reels 32A and 32B respectively hold and fix the exposed parts of the long substrates W1 and W2 in the state of being wound in a roll shape, and can wind the long substrates W1 and W2 by rotating the shaft. The winding process of the long substrates W1 and W2 by the substrate supply device 20 and the substrate winding device 30 is controlled by the transport control unit 130 (see FIG. 3).

The support rollers 24 and 34 respectively arranged between the supply reels 22A, 22B, the winding reels 32A, 32B, and the exposure table 15 support the long substrates W1, W2, and are configured to transport the long substrates W1, W2. The tension roller that rotates the shaft at the same time. The support rollers 24 and 34 adjust the heights of the long substrates W1 and W2 to the downstream side at the height of the exposure surface or a position slightly lower than the height of the exposure surface, and are adjusted by the substrate supply device 20 and the substrate winding device 30, respectively. Cantilever support. In the long substrates W1 and W2, proper tension is applied to the erection part of the section T (refer to FIG. 1) of the support rollers 24 and 34, and the long substrates W1 and W2 are transported in a wrinkle-free or stretched state.

The supply reels 22A, 22B and the winding reels 32A, 32B include well-known mechanisms 26A, 26B and 36A, 36B that fix the roll-shaped winding portions of the long substrates W1, W2 when the substrates are mounted. In addition, the drive mechanisms of the substrate supply device 20 and the substrate winding device 30 respectively cause the supply reel 22A and the winding reel 32A, and the supply reel 22B and the winding reel 32B to rotate synchronously, and the long substrate W1 and W2 only carry a predetermined length intermittently.

The table moving mechanism 50 includes: a moving member 52 equipped with a lifting mechanism (not shown) for cantilever support of the exposure table 15; and a pair of guide rails 54A, 54B and an actuator 55, which are arranged on the base 10B . A pair of guide rails 54A and 54B extend along the X direction, and the moving member 52 can move along the guide rails 54A and 54B in the X direction and the opposite direction. The actuator 55 is composed of, for example, a ball screw.

The transport unit moving mechanism 60 includes a plate-shaped moving member 62, a pair of guide rails 64A, 64B and an actuator 65 provided on the base 10B. The substrate supply device 20 and the substrate winding device 30 are mounted on the moving member 62 and move integrally (linked). A pair of guide rails 64A, 64B extend along the X direction, and the moving member 62 can move along the guide rails 64A, 64B in the X direction and the opposite direction.

The movement control unit 70 provided on the base 10B controls the driving of the actuators 55 and 65 to maintain the relative positional relationship between the conveying system (the substrate supply device 20 and the substrate winding device 30) and the exposure table 15. That is, the movement of the exposure table 15 and the substrate supply device 20, and the substrate winding device 30 are feedback controlled so that the relative distance interval becomes a fixed value.

In order to measure the relative distance between the exposure table 15 and the substrate supply device 20 (substrate winding device 30) along the conveying direction M, a position detection photo sensor 90 is arranged between the substrate supply device 20 and the exposure table 15 Opposite sides (refer to Figure 2). The light sensor 90 for position detection has a built-in light source such as an LED, and illuminates the side surface of the exposure table 15. The side surface of the exposure table 15 is formed so that a difference in light quantity occurs between the light irradiation position at a reference position and a position other than the reference position. The movement control unit 70 controls the actuators 55 and 65 based on the difference between the relative distance interval corresponding to the detected light amount and the relative distance interval used as a reference.

On the support roller 24 side of the exposure table 15, a position sensor 80 that detects the position of the respective end faces of the long substrates W1 and W2 is provided. The position sensor 80 can be constituted by a transmissive light sensor such as a line sensor. The substrate supply device 20 and the substrate winding device 30 respectively include mechanisms (not shown) that control the axial positions of the supply reels 22A, 22B and the winding reels 32A, 32B, and respond to the detected end surface positions, Adjust the axial position of the reel, and can correct the snaking.

Fig. 4 is a diagram showing the positions of the exposure table and the conveying system at the beginning and the end of exposure.

Before the exposure starts, the exposure table 15 sucks and holds the long substrates W1 and W2, and the supply reels 22A, 22B and the winding reels 32A, 32B are not driven, so they are in a stationary state. With the start of exposure, the exposure table 15 is gradually moved along the X direction at a predetermined speed. At this time, the substrate supply device 20 and the substrate winding device 30 move in accordance with the movement of the exposure table 15.

That is, it starts to move in synchronization with the exposure table 15, and gradually moves in the X direction at the same speed as the exposure table 15 while maintaining the relative positional relationship between the substrate supply device 20 and the substrate winding device 30 and the exposure table 15. Move (parallel). Therefore, the long substrates W1 and W2 are not sent out to the downstream side between before the movement of the exposure table 15 and during the movement of the exposure table 15, and are stationary with respect to the exposure table 15. During the movement of the exposure table 15, the pattern light corresponding to the position of the exposure area of each exposure head is projected from the exposure section 40.

When the exposure table 15 and the substrate supply device 20 and the substrate winding device 30 reach the exposure end position, the exposure table 15 releases the suction support of the long substrates W1 and W2 and descends. Then, the supply reels 22A, 22B and the winding reels 32A, 32B rotate synchronously, and the long substrates W1, W2 are wound on the winding reels 32A, 32B with only a predetermined length.

When the winding on the winding reels 32A and 32B is completed, the exposure table 15 moves in synchronization with the substrate supply device 20 and the substrate winding device 30 and returns to the exposure start position. During this period, since the supply reels 22A and 22B and the winding reels 32A and 32B are not driven, they are in a stationary state. By repeating the above-mentioned exposure operation, patterns are gradually formed on the entire long substrates W1 and W2.

In this way, according to the present embodiment, in the exposure apparatus 10 including the RtoR transport system for transporting the long substrates W1 and W2, a substrate supply device 20 is provided to fasten the supply roll provided on the upstream side of the exposure table 15 The reels 22A, 22B; and the substrate winding device 30 fasten and hold the winding reels 32A, 32B provided on the downstream side. During the exposure operation, the exposure table 15 is moved in the X direction by the table moving mechanism 50, and at the same time, the substrate supply device 20 and the substrate winding device 30 are moved together in the X direction by the conveying unit moving mechanism 60.

Since the substrate transport system (the substrate supply device 20 and the substrate winding device 30) moves together with the exposure table 15, the long substrates W1 and W2 are not sent downstream before and during the movement of the exposure table 15. Therefore, it is possible to suppress the meandering during the exposure of the conventional conveying system, and the deviation of the exposure position caused by the meandering, the generation of wrinkles and warpage of the substrate, etc. will not occur. In addition, by configuring such a substrate transport system, it is not necessary to provide a mechanism such as a tension roller, so that the substrate transport system can be constructed with a simple configuration.

The substrate supply device 20 and the substrate winding device 30 only need to feed the long substrate W in one direction on the downstream side during exposure, and it is not necessary to rewind. Therefore, pattern exposure that suppresses the meandering of the long substrate W can be realized. Particularly, it is suitable for an exposure device that conveys two long substrates W which are difficult to adjust the snaking motion.

Since the substrate transfer system moves, the substrate transfer length (the substrate length between the supply reels 22A, 22B and the winding reels 32A, 32B) can be made short. As the substrate transport length is shortened, wrinkles and elongation of the long substrates W1 and W2 are difficult to occur, and patterns can be formed with high accuracy. In particular, it is possible to construct a conveying system in which long substrates W1 and W2 can be sent out only by providing one support roller 24, 34.

In addition, after the exposure operation is completed, the long substrates W1 and W2 are fed and wound on the downstream side between the long substrates W1 and W2 that are not sucked and supported by the exposure table 15, so that the long substrates W1 and W2 can be wound smoothly. At this time, because the substrate transport length is short, winding in a short time can be achieved.

In this embodiment, the exposure table 15 and the substrate transport system (the substrate supply device 20 and the substrate winding device 30) are driven separately by the table moving mechanism 50 and the transport unit moving mechanism 60. For the long substrates W1 and W2, the winding diameters of the roll-shaped parts of the supply reels 22A, 22B and the roll-shaped parts of the winding reels 32A, 32B are gradually wound around the long substrates W1 and W2. The process of the substrate winding device 30 gradually changes, and the weight balance becomes unstable.

However, by providing the conveying part moving mechanism 60 which is different from the table moving mechanism 50, even if the weight balance of the long substrates W1 and W2 is changed, it is prevented from affecting the movement control of the exposure table 15. In addition, the transport system can be constructed by directly using the conventional table moving mechanism.

On the other hand, the substrate supply device 20 is fixed and supported by the moving member 62 in the same manner as the substrate winding device 30, and moves integrally. Since the substrate supply device 20 and the substrate winding device 30 are linked, the relative positional relationship between the substrate supply device 20 and the substrate winding device 30 does not change, and the relative positional relationship with the exposure table 15 is maintained as easy. In addition, the transport unit moving mechanism 60 can be centralized with one drive system.

On the other hand, the movement control unit 70 drives the actuators 55 and 65 to maintain the relative positional relationship between the exposure table 15 and the substrate supply device 20 and the substrate winding device 30 during the movement of the exposure table 15. control. This suppresses the elongation and warpage of the long substrates W1 and W2 due to the proximity of the supply reels 22A, 22B and the winding reels 32A, 32B to the exposure table 15, and also prevents the exposure position deviation.

In addition, the movement control unit 70 may be configured to control the movement speed and acceleration when the distance interval becomes equal to or greater than the threshold value. Alternatively, the supply reels 22A and 22B and/or the winding reels 32A and 32B may be controlled to rotate their shafts and adjusted so that appropriate tension acts on the long substrates W1 and W2.

Not only two long substrates W1 and W2, but also more long substrates can be arranged side by side and conveyed at the same time, and it can also be constituted by a single long substrate. Regarding the substrate supply device 20 and the substrate winding device 30, it is also possible to make the substrate supply device 20 and the substrate winding device 30 not be mechanically connected, but to be moved by a different moving mechanism. In addition, it is also possible to make the exposure table 15, the substrate supply device 20, and the substrate winding device 30 move by the same moving mechanism.

In the above embodiment, the substrate supply device 20 is installed on the upstream side of the exposure table 15, the substrate winding device 30 is installed on the downstream side of the exposure table 15, and the supply reels 22A, 22B and the winding reels are installed. The disks 32A and 32B are driven to move the long substrates W1 and W2 in the same direction, but the long substrates W1 and W2 may also move in opposite directions to each other.

That is, two pairs of reels can be installed on both sides of the exposure table 15, and the supply reel and the winding reel can be set to wind one of the reel pairs in the X direction. On the other hand, the supply reel and the winding The reel is set to wind the other reel pair in the -X direction. In this case, a pair of conveying devices that combine the functions of a substrate supply device and a substrate winding device are moved to the exposure table. In this way, when the long substrates W1 and W2 move in opposite directions to each other, the change in the weight balance of the long substrates on the upstream side and the downstream side of the exposure table can be reduced.

Furthermore, in the above embodiment, the exposure table 15 is moved to realize the relative movement of the long substrates W1, W2 and the exposure section 40 for exposure. However, the exposure table 15 can also be fixed to the base 10B. The exposure unit 40 is moved in the substrate conveying direction by a moving device not shown, thereby performing relative movement. In this case, the substrate supply device 20 and the substrate winding device 30 are fixed to the base 10B so as to maintain the relative positional relationship with the exposure table 15.

10‧‧‧Exposure device 15‧‧‧Exposure table 20‧‧‧Substrate supply device 22A, 22B‧‧‧Supply reel 30‧‧‧Substrate winding device 32A, 32B‧‧‧Winding reel 40‧‧ ‧Exposure unit 50‧‧‧Working table moving mechanism 60‧‧‧Transporting unit moving mechanism 70‧‧‧Motion control unit 80‧‧‧Position sensor 90‧‧‧Photo sensor for position detection

[Fig. 1] is a schematic configuration diagram of the exposure apparatus of this embodiment. [Fig. 2] A perspective view schematically showing a part of the exposure device. [Fig. 3] A schematic block diagram of the exposure apparatus. [Figure 4] is a diagram showing the positions of the exposure table and the transport system at the start and end of exposure.

10‧‧‧Exposure device

10B‧‧‧Base

15‧‧‧Exposure Workbench

20‧‧‧Substrate supply device

22A、22B‧‧‧Supply reel

24‧‧‧Support roller

30‧‧‧Substrate winding device

32A、32B‧‧‧Winding reel

34‧‧‧Support roller

40‧‧‧Exposure Department

50‧‧‧Working table moving mechanism

54A、54B‧‧‧Guide rail

55‧‧‧Actuator

60‧‧‧Moving mechanism of transport department

62‧‧‧Mobile component

64A、64B‧‧‧Guide

65‧‧‧Actuator

90‧‧‧Light sensor for position detection

W, W1, W2‧‧‧Long substrate

M‧‧‧Transporting direction

Claims (11)

An exposure device, which is characterized by comprising: an exposure worktable, which supports a long substrate and can reciprocate along the substrate conveying line; a substrate supply part is arranged on the upstream side of the exposure worktable, and is provided with a supply roll The substrate winding part is arranged on the downstream side of the exposure table and is provided with a winding reel; the table moving mechanism makes the exposure table reciprocate along the substrate conveying line; and the conveying part moves The mechanism is such that the substrate supply part, the substrate winding part and the exposure table are reciprocated along the substrate conveying line, and the conveying section moving mechanism is different from the table moving mechanism. For example, the exposure apparatus of the first item of the scope of the patent application further includes a movement control part that controls the substrate in a manner that maintains the relative positional relationship between the exposure table, the substrate supply part, and the substrate winding part Movement of the supply part and the substrate winding part. For example, the exposure device of item 2 of the scope of patent application further includes a sensor which detects the distance between at least one of the substrate supply part and the substrate winding part and the exposure table; the movement control The part controls the movement of the exposure table, the substrate supply part and the substrate winding part according to the detected distance interval. Such as the exposure device of any one of items 1 to 3 in the scope of patent application, wherein the substrate supply part is linked with the substrate winding part. Such as the exposure device of any one of items 1 to 3 in the scope of patent application, wherein the substrate supply part includes an upstream side support roller; the substrate winding part includes a downstream side support roller. Such as the exposure device of any one of items 1 to 3 in the scope of patent application, where the multiple Several long substrates constitute the long substrate. For example, the exposure device of any one of items 1 to 3 in the scope of patent application, wherein the exposure workbench absorbs and holds the long substrate while moving, and can be raised and lowered. An exposure device, which is characterized by comprising: an exposure workbench, which supports a long substrate and can reciprocate along the substrate conveying line; and a pair of reels, which are respectively arranged on the upstream side and downstream of the exposure workbench Side, and carry the long substrate; the pair of reels are moved back and forth along the substrate conveying line together with the exposure table by means of a moving mechanism that is different from the moving mechanism of the exposure workbench. An exposure device, which is characterized by comprising: an exposure worktable, which supports a plurality of long substrates arranged side by side, and can reciprocate along the substrate conveying line; and a plurality of pairs of reels are arranged opposite to each other. Expose the two sides of the exposure workbench, and transport a plurality of long substrates; the plural pairs of reel pairs are moved by a moving mechanism different from the moving mechanism of the exposure workbench, and together with the exposure workbench, they can be transported along the substrate transport line Perform reciprocating movement. Such as the exposure device of item 9 of the scope of patent application, wherein the plurality of reel pairs wind the plurality of long substrates in the same direction. For example, in the exposure device of item 9 of the scope of patent application, at least one of the plurality of pairs of reels is wound in a direction different from the other long substrates.

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