[go: up one dir, main page]

TWI697532B - Laminated body including low dielectric adhesive layer - Google Patents

Laminated body including low dielectric adhesive layer Download PDF

Info

Publication number
TWI697532B
TWI697532B TW105114487A TW105114487A TWI697532B TW I697532 B TWI697532 B TW I697532B TW 105114487 A TW105114487 A TW 105114487A TW 105114487 A TW105114487 A TW 105114487A TW I697532 B TWI697532 B TW I697532B
Authority
TW
Taiwan
Prior art keywords
resin
laminate
adhesive layer
carboxyl
substrate
Prior art date
Application number
TW105114487A
Other languages
Chinese (zh)
Other versions
TW201702341A (en
Inventor
三上忠彥
伊藤武
薗田遼
坂田秀行
Original Assignee
日商東洋紡股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 日商東洋紡股份有限公司 filed Critical 日商東洋紡股份有限公司
Publication of TW201702341A publication Critical patent/TW201702341A/en
Application granted granted Critical
Publication of TWI697532B publication Critical patent/TWI697532B/en

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B7/00Layered products characterised by the relation between layers; Layered products characterised by the relative orientation of features between layers, or by the relative values of a measurable parameter between layers, i.e. products comprising layers having different physical, chemical or physicochemical properties; Layered products characterised by the interconnection of layers
    • B32B7/04Interconnection of layers
    • B32B7/12Interconnection of layers using interposed adhesives or interposed materials with bonding properties
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B15/00Layered products comprising a layer of metal
    • B32B15/04Layered products comprising a layer of metal comprising metal as the main or only constituent of a layer, which is next to another layer of the same or of a different material
    • B32B15/08Layered products comprising a layer of metal comprising metal as the main or only constituent of a layer, which is next to another layer of the same or of a different material of synthetic resin
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B27/00Layered products comprising a layer of synthetic resin
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J123/00Adhesives based on homopolymers or copolymers of unsaturated aliphatic hydrocarbons having only one carbon-to-carbon double bond; Adhesives based on derivatives of such polymers
    • C09J123/26Adhesives based on homopolymers or copolymers of unsaturated aliphatic hydrocarbons having only one carbon-to-carbon double bond; Adhesives based on derivatives of such polymers modified by chemical after-treatment
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J125/00Adhesives based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an aromatic carbocyclic ring; Adhesives based on derivatives of such polymers
    • C09J125/02Homopolymers or copolymers of hydrocarbons
    • C09J125/04Homopolymers or copolymers of styrene
    • C09J125/08Copolymers of styrene
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J163/00Adhesives based on epoxy resins; Adhesives based on derivatives of epoxy resins
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J179/00Adhesives based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing nitrogen, with or without oxygen, or carbon only, not provided for in groups C09J161/00 - C09J177/00
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J201/00Adhesives based on unspecified macromolecular compounds
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J7/00Adhesives in the form of films or foils
    • C09J7/20Adhesives in the form of films or foils characterised by their carriers
    • C09J7/22Plastics; Metallised plastics
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J7/00Adhesives in the form of films or foils
    • C09J7/20Adhesives in the form of films or foils characterised by their carriers
    • C09J7/28Metal sheet
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B2457/00Electrical equipment
    • B32B2457/08PCBs, i.e. printed circuit boards
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J2301/00Additional features of adhesives in the form of films or foils
    • C09J2301/30Additional features of adhesives in the form of films or foils characterized by the chemical, physicochemical or physical properties of the adhesive or the carrier
    • C09J2301/312Additional features of adhesives in the form of films or foils characterized by the chemical, physicochemical or physical properties of the adhesive or the carrier parameters being the characterizing feature

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Laminated Bodies (AREA)
  • Adhesives Or Adhesive Processes (AREA)
  • Manufacturing Of Printed Wiring (AREA)
  • Adhesive Tapes (AREA)
  • Non-Metallic Protective Coatings For Printed Circuits (AREA)

Abstract

本發明提供一種疊層體,不僅是與以往的聚醯亞胺、聚酯膜,與LCP等低極性樹脂基材或金屬基材亦具有高接著性,可獲得高焊料耐熱性,且低介電特性優異。 一種疊層體(Z),係樹脂基材及金屬基材介由包括含有羧基之聚烯烴樹脂(A)之接著劑層疊層而成;其特徵為:(1)接著劑層之於頻率1MHz的相對介電常數(εc )為3.0以下,(2)接著劑層之於頻率1MHz的介電正切(tanδ)為0.02以下,(3)樹脂基材與金屬基材間的剝離強度為0.5N/mm以上,(4)疊層體(Z)之加濕焊料耐熱性為240℃以上。The present invention provides a laminate that not only has high adhesion to conventional polyimide and polyester films, but also low-polarity resin substrates such as LCP or metal substrates, can obtain high solder heat resistance, and has low dielectric properties. Excellent electrical properties. A laminated body (Z), a resin base material and a metal base material are laminated by an adhesive layer including a polyolefin resin (A) containing carboxyl groups; the characteristics are: (1) The frequency of the adhesive layer is 1MHz The relative dielectric constant (ε c ) is 3.0 or less, (2) the dielectric tangent (tanδ) of the adhesive layer at a frequency of 1MHz is 0.02 or less, and (3) the peel strength between the resin substrate and the metal substrate is 0.5 N/mm or more, (4) The heat resistance of the humidified solder of the laminate (Z) is 240°C or more.

Description

包含低介電性接著劑層的疊層體Laminated body containing low-dielectric adhesive layer

本發明關於一種包含顯現低介電常數、低介電正切之接著劑層的疊層體。更詳細言之,係關於一種樹脂基材與金屬基材介由顯現低介電常數、低介電正切之接著劑層疊層而成的疊層體。特別是關於可撓性印刷電路板(以下簡稱為FPC)用之疊層體、及含有該疊層體之表覆層膜、疊層板、附樹脂之銅箔及黏合片。The present invention relates to a laminate including an adhesive layer exhibiting a low dielectric constant and a low dielectric tangent. More specifically, it relates to a laminate in which a resin substrate and a metal substrate are laminated via an adhesive that exhibits a low dielectric constant and a low dielectric tangent. In particular, it relates to laminates for flexible printed circuit boards (hereinafter referred to as FPCs), and surface coating films, laminates, copper foils with resin, and adhesive sheets containing the laminates.

近年,伴隨印刷電路板中之傳輸信號的高速化,信號的高頻化正發展中。與此同時,對於FPC在高頻區域之低介電特性(低介電常數、低介電正切)的要求正日益增長。因應該等要求,作為FPC所使用之基材膜,有人提案以具有低介電特性之液晶聚合物(LCP)、對排聚苯乙烯(SPS)、聚苯硫醚(PPS)等基材膜替換以往的聚醯亞胺(PI)、聚對苯二甲酸乙二酯膜。 但,具有低介電特性之基材膜由於低極性的緣故,使用以往的環氧系接著劑或丙烯酸系接著劑時接著力弱,表覆層膜、疊層板等FPC用構件的製作困難。又,環氧系接著劑或丙烯酸系接著劑,低介電特性並不優異,會損害FPC的介電特性。 另一方面,聚烯烴樹脂已知具有低介電特性。因此,有人提出使用聚烯烴樹脂的FPC用接著劑組成物。例如,專利文獻1中提出了使用含有羧基之聚烯烴系共聚物、芳香族乙烯基化合物聚合物嵌段與共軛二烯系化合物聚合物嵌段之嵌段共聚物、及環氧樹脂的熱反應性接著劑組成物。又,專利文獻2中提出了使用含有羧基之苯乙烯彈性體與環氧樹脂的接著劑組成物。 [先前技術文獻] [專利文獻]In recent years, with the increase in the speed of the transmission signal in the printed circuit board, the high frequency of the signal is developing. At the same time, the requirements for low dielectric properties (low dielectric constant, low dielectric tangent) of FPC in the high-frequency region are increasing. In response to other requirements, as the base film used in FPC, some people propose to use liquid crystal polymer (LCP), parapolystyrene (SPS), polyphenylene sulfide (PPS) and other base films with low dielectric properties. Replace conventional polyimide (PI) and polyethylene terephthalate films. However, the substrate film with low dielectric properties is low in polarity, so the adhesive strength is weak when using conventional epoxy or acrylic adhesives, making it difficult to manufacture FPC components such as surface coating films and laminates. . In addition, epoxy-based adhesives or acrylic-based adhesives are not excellent in low-dielectric properties and impair the dielectric properties of FPC. On the other hand, polyolefin resins are known to have low dielectric properties. Therefore, an adhesive composition for FPC using polyolefin resin has been proposed. For example, Patent Document 1 proposes the use of a carboxyl group-containing polyolefin copolymer, a block copolymer of an aromatic vinyl compound polymer block and a conjugated diene compound polymer block, and thermal epoxy resin Reactive adhesive composition. In addition, Patent Document 2 proposes an adhesive composition using a carboxyl group-containing styrene elastomer and an epoxy resin. [Prior Art Document] [Patent Document]

[專利文獻1]日本專利3621351號公報 [專利文獻2]WO2014/147903A1公報[Patent Document 1] Japanese Patent No. 3621351 [Patent Document 2] WO2014/147903A1 Publication

[發明所欲解決之課題] 但,專利文獻1中雖有記述聚醯亞胺膜與SUS之接著性、焊料耐熱性,但並未提及介電特性,難以獲得與LCP等具有低介電特性之基材膜的接著性。又,專利文獻2中雖有記述介電特性、聚醯亞胺膜與銅箔之接著性,但並未提及與LCP等具有低介電特性之基材膜的接著性。又,雖有記述乾燥後之焊料耐熱性,但加濕後之焊料耐熱性不能說是充分。[Problem to be solved by the invention] However, although Patent Document 1 describes the adhesion of polyimide film to SUS and solder heat resistance, it does not mention the dielectric properties, and it is difficult to obtain low dielectric properties such as LCP. Adhesion of the characteristic substrate film. In addition, although Patent Document 2 describes the dielectric properties and the adhesion between the polyimide film and the copper foil, it does not mention the adhesion with the base film having low dielectric properties such as LCP. In addition, although the solder heat resistance after drying is described, the solder heat resistance after humidification cannot be said to be sufficient.

本發明為了解決上述課題而進行深入研究的結果,發現具有特定物性之接著劑層,不僅是與以往的聚醯亞胺膜,與習知技術所未預想之LCP等具有低介電特性之樹脂基材、銅箔等金屬基材的高接著性、高焊料耐熱性、及低介電特性優異,而完成了本發明。In order to solve the above-mentioned problems, the present invention has conducted in-depth research, and found that the adhesive layer with specific physical properties is not only compatible with the conventional polyimide film, but also with resins with low dielectric properties such as LCP which is not anticipated by the prior art. Metal substrates such as substrates and copper foils are excellent in high adhesiveness, high solder heat resistance, and low dielectric properties, and completed the present invention.

亦即,本發明旨在提供一種疊層體,係利用對於聚醯亞胺、LCP等各種樹脂基材與金屬基材兩者具有良好接著性,且耐熱性、低介電特性亦優異之接著劑層進行疊層而成。 [解決課題之手段]In other words, the present invention aims to provide a laminated body that has good adhesion to various resin substrates such as polyimide and LCP and metal substrates, as well as excellent heat resistance and low dielectric properties. The agent layer is laminated. [Means to solve the problem]

一種疊層體(Z),係樹脂基材及金屬基材介由包括含有羧基之聚烯烴樹脂(A)之接著劑層疊層而成;其特徵為:(1)接著劑層之於頻率1MHz的相對介電常數(εc )為3.0以下,(2)接著劑層之於頻率1MHz的介電正切(tanδ)為0.02以下,(3)樹脂基材與金屬基材間的剝離強度為0.5N/mm以上,(4)疊層體(Z)之加濕焊料耐熱性為240℃以上。A laminated body (Z), a resin base material and a metal base material are laminated by an adhesive layer including a polyolefin resin (A) containing carboxyl groups; the characteristics are: (1) The frequency of the adhesive layer is 1MHz The relative dielectric constant (ε c ) is 3.0 or less, (2) the dielectric tangent (tanδ) of the adhesive layer at a frequency of 1MHz is 0.02 or less, and (3) the peel strength between the resin substrate and the metal substrate is 0.5 N/mm or more, (4) The heat resistance of the humidified solder of the laminate (Z) is 240°C or more.

一種疊層體(X),係樹脂基材及金屬基材介由包括含有羧基之聚烯烴樹脂(A)之接著劑層疊層而成的疊層體(Z)所使用之該接著劑層與該樹脂基材的疊層體;其特徵為:(1)接著劑層之於頻率1MHz的相對介電常數(εc )為3.0以下,(2)接著劑層之於頻率1MHz的介電正切(tanδ)為0.02以下,(3)於疊層體(X)之接著劑層面疊層金屬基材時,該疊層體中之樹脂基材與金屬基材間的剝離強度為0.5N/mm以上,(4)於疊層體(X)之接著劑層面疊層金屬基材時,該疊層體之加濕焊料耐熱性為240℃以上。A laminated body (X), a resin base material and a metal base material laminated with an adhesive layer including a polyolefin resin (A) containing a carboxyl group. The adhesive layer and the laminated body (Z) used The laminated body of the resin base material is characterized by: (1) the relative permittivity (ε c ) of the adhesive layer at a frequency of 1MHz is 3.0 or less, (2) the dielectric tangent of the adhesive layer at a frequency of 1MHz (tanδ) is 0.02 or less, (3) When the metal substrate is laminated on the adhesive layer of the laminate (X), the peel strength between the resin substrate and the metal substrate in the laminate is 0.5N/mm Above, (4) When the metal base material is laminated on the adhesive layer of the laminate (X), the heat resistance of the humidified solder of the laminate is 240° C. or more.

一種疊層體(Y),係樹脂基材及金屬基材介由包括含有羧基之聚烯烴樹脂(A)之接著劑層疊層而成的疊層體(Z)所使用之該接著劑層與該金屬基材的疊層體;其特徵為:(1)接著劑層之於頻率1MHz的相對介電常數(εc )為3.0以下,(2)接著劑層之於頻率1MHz的介電正切(tanδ)為0.02以下,(3)於疊層體(Y)之接著劑層面疊層樹脂基材時,該疊層體中之樹脂基材與金屬基材間的剝離強度為0.5N/mm以上,(4)於疊層體(Y)之接著劑層面疊層樹脂基材時,該疊層體之加濕焊料耐熱性為240℃以上。A laminate (Y) comprising a resin substrate and a metal substrate via an adhesive layer including a polyolefin resin (A) containing a carboxyl group. The adhesive layer and the laminate (Z) used The laminated body of the metal substrate; it is characterized in that: (1) the relative dielectric constant (ε c ) of the adhesive layer at a frequency of 1MHz is 3.0 or less, (2) the dielectric tangent of the adhesive layer at a frequency of 1MHz (tanδ) is 0.02 or less, (3) When the resin substrate is laminated on the adhesive layer of the laminate (Y), the peel strength between the resin substrate and the metal substrate in the laminate is 0.5N/mm Above, (4) When the resin base material is laminated on the adhesive layer of the laminate (Y), the heat resistance of the humidified solder of the laminate is 240° C. or more.

一種接著劑層,係樹脂基材及金屬基材介由包括含有羧基之聚烯烴樹脂(A)之接著劑層疊層而成的疊層體(Z)所使用之該接著劑層;其特徵為:(1)接著劑層之於頻率1MHz的相對介電常數(εc )為3.0以下,(2)接著劑層之於頻率1MHz的介電正切(tanδ)為0.02以下,(3)於接著劑層之其中一面疊層樹脂基材,於另一面疊層金屬基材時,該疊層體中之樹脂基材與金屬基材間的剝離強度為0.5N/mm以上,(4)於接著劑層之其中一面疊層樹脂基材,於另一面疊層金屬基材時,該疊層體之加濕焊料耐熱性為240℃以上。An adhesive layer, which is used in a laminate (Z) in which a resin base material and a metal base material are laminated via an adhesive layer including a polyolefin resin (A) containing a carboxyl group; the characteristic is : (1) The relative dielectric constant (ε c ) of the adhesive layer at a frequency of 1MHz is 3.0 or less, (2) the dielectric tangent (tanδ) of the adhesive layer at a frequency of 1MHz is 0.02 or less, (3) When the resin substrate is laminated on one side of the agent layer, and the metal substrate is laminated on the other side, the peel strength between the resin substrate and the metal substrate in the laminate is 0.5N/mm or more. (4) When a resin substrate is laminated on one side of the agent layer and a metal substrate is laminated on the other side, the heat resistance of the humidified solder of the laminated body is 240°C or higher.

一種接著片,含有上述疊層體(Z)、疊層體(X)、疊層體(Y)或接著劑層。An adhesive sheet containing the above-mentioned laminate (Z), laminate (X), laminate (Y), or adhesive layer.

一種印刷電路板,包含上述接著片作為構成要素。 [發明之效果]A printed circuit board includes the aforementioned adhesive sheet as a constituent element. [Effects of Invention]

本發明之係樹脂基材及金屬基材介由包括含有羧基之聚烯烴樹脂(A)之接著劑層疊層而成的疊層體,由於滿足(1)接著劑層之於頻率1MHz的相對介電常數(εc )為3.0以下,(2)接著劑層之於頻率1MHz的介電正切(tanδ)為0.02以下,(3)樹脂基材與金屬基材間的剝離強度為0.5N/mm以上,(4)疊層體之加濕焊料耐熱性為240℃以上,故不僅是與以往的聚醯亞胺、聚酯膜,與習知技術所未預想之LCP膜等低極性樹脂基材或金屬基材亦具有高接著性,可獲得高焊料耐熱性,且低介電特性優異。The resin base material and the metal base material of the present invention are laminated with an adhesive layer including a polyolefin resin (A) containing a carboxyl group. Since it satisfies (1) the relative medium of the adhesive layer at a frequency of 1 MHz The electrical constant (ε c ) is 3.0 or less, (2) the dielectric tangent (tanδ) of the adhesive layer at a frequency of 1MHz is 0.02 or less, (3) the peel strength between the resin substrate and the metal substrate is 0.5N/mm Above, (4) The heat resistance of the humidified solder of the laminate is 240°C or higher, so it is not only compatible with conventional polyimide and polyester film, but also with low-polarity resin substrates such as LCP film that was not anticipated by the prior art. Or the metal substrate also has high adhesion, can obtain high solder heat resistance, and has excellent low dielectric properties.

以下,對本發明之實施形態進行詳細說明。本案發明之疊層體(Z),係樹脂基材及金屬基材介由包括含有羧基之聚烯烴樹脂(A)之接著劑層疊層而成者。Hereinafter, embodiments of the present invention will be described in detail. The laminate (Z) of the present invention is formed by laminating a resin base material and a metal base material via an adhesive layer including a carboxyl group-containing polyolefin resin (A).

<含有羧基之聚烯烴樹脂(A)> 本發明所使用之含有羧基之聚烯烴樹脂(A)(以下亦簡稱為(A)成分)並無限定,宜為藉由將α,β-不飽和羧酸及其酸酐中之至少1種接枝於聚烯烴樹脂而得者較佳。聚烯烴樹脂係指例示為乙烯、丙烯、丁烯、丁二烯、異戊二烯等之烯烴單體的均聚物、或與其他單體的共聚物、及所獲得之聚合物的氫化物或鹵化物等以烴骨架為主體的聚合物。亦即,含有羧基之聚烯烴,宜為藉由將α,β-不飽和羧酸及其酸酐中之至少1種接枝於聚乙烯、聚丙烯及丙烯-α-烯烴共聚物中之至少1種而得者較佳。<Carboxyl group-containing polyolefin resin (A)> The carboxyl group-containing polyolefin resin (A) used in the present invention (hereinafter also referred to as (A) component) is not limited, but it is preferable to use α,β-unsaturated Preferably, at least one of carboxylic acid and its anhydride is grafted onto a polyolefin resin. Polyolefin resin means homopolymers of olefin monomers such as ethylene, propylene, butene, butadiene, isoprene, etc., or copolymers with other monomers, and hydrogenated products of the obtained polymers Or halides and other polymers with a hydrocarbon skeleton as the main body. That is, the polyolefin containing carboxyl group is preferably obtained by grafting at least one of α, β-unsaturated carboxylic acid and its anhydride to at least one of polyethylene, polypropylene, and propylene-α-olefin copolymer. The kind that is obtained is better.

丙烯-α-烯烴共聚物係以丙烯為主體並與α-烯烴共聚而得者。就α-烯烴而言,例如,可使用乙烯、1-丁烯、1-庚烯、1-辛烯、4-甲基-1-戊烯、乙酸乙烯酯等之1種或多種。該等α-烯烴中,乙烯、1-丁烯為較佳。丙烯-α-烯烴共聚物之丙烯成分與α-烯烴成分的比率並無限定,丙烯成分宜為50莫耳%以上較佳,70莫耳%以上更佳。The propylene-α-olefin copolymer is obtained by copolymerizing with propylene as the main body. Regarding the α-olefin, for example, one or more of ethylene, 1-butene, 1-heptene, 1-octene, 4-methyl-1-pentene, and vinyl acetate can be used. Among these α-olefins, ethylene and 1-butene are preferred. The ratio of the propylene component to the α-olefin component of the propylene-α-olefin copolymer is not limited, and the propylene component is preferably 50 mol% or more, and more preferably 70 mol% or more.

作為α,β-不飽和羧酸及其酸酐中之至少1種,例如,可列舉馬來酸、衣康酸、檸康酸及該等之酸酐。該等中酸酐為較佳,馬來酸酐更佳。具體而言,可列舉馬來酸酐改性聚丙烯、馬來酸酐改性丙烯-乙烯共聚物、馬來酸酐改性丙烯-丁烯共聚物、馬來酸酐改性丙烯-乙烯-丁烯共聚物等,可使用該等酸改性聚烯烴之1種或2種以上組合使用。As at least one of α,β-unsaturated carboxylic acids and anhydrides thereof, for example, maleic acid, itaconic acid, citraconic acid, and these acid anhydrides can be cited. Of these, acid anhydrides are preferred, and maleic anhydride is even more preferred. Specifically, maleic anhydride modified polypropylene, maleic anhydride modified propylene-ethylene copolymer, maleic anhydride modified propylene-butene copolymer, maleic anhydride modified propylene-ethylene-butene copolymer Etc., one kind or a combination of two or more kinds of these acid-modified polyolefins can be used.

含有羧基之聚烯烴樹脂(A)的酸值,以耐熱性及與樹脂基材或金屬基材的接著性的觀點觀之,下限宜為100當量/106 g以上較佳,200當量/106 g以上更佳,250當量/106 g尤佳。未達上述值的話,與環氧樹脂(D)、碳二亞胺樹脂(C)的相容性低,會有無法顯現接著強度的情況。又,會有交聯密度低、欠缺耐熱性的情況。上限宜為1000當量/106 g以下較佳,700當量/106 g以下更佳,500當量/106 g以下尤佳。超過上述值的話,會有接著性降低的情況。又,溶液的黏度、穩定性降低,會有適用期(pot life)縮短的情況。進一步製造效率亦降低故不佳。The acid value of the carboxyl group-containing polyolefin resin (A), from the viewpoint of heat resistance and adhesion to the resin substrate or metal substrate, the lower limit is preferably 100 equivalent/10 6 g or more, preferably 200 equivalent/10 More than 6 g is more preferable, 250 equivalent/10 6 g is particularly preferable. If the value is less than the above value, the compatibility with the epoxy resin (D) and the carbodiimide resin (C) is low, and the adhesive strength may not be expressed. In addition, the crosslinking density may be low and heat resistance may be insufficient. The upper limit is preferably 1000 equivalents/10 6 g or less, more preferably 700 equivalents/10 6 g or less, and particularly preferably 500 equivalents/10 6 g or less. If the above value is exceeded, the adhesion may be reduced. In addition, the viscosity and stability of the solution decrease, and the pot life may be shortened. Further manufacturing efficiency is also reduced, so it is not good.

含有羧基之聚烯烴樹脂(A)之重量平均分子量(Mw)宜為10,000~180,000之範圍較佳。20,000~160,000之範圍更佳,30,000~150,000之範圍尤佳,40,000~140,000之範圍特佳,50,000~130,000之範圍最佳。未達上述值的話,內聚力變弱,會有接著性差的情況。另一方面,超過上述值的話,流動性低,會有接著時的操作性產生問題的情況。The weight average molecular weight (Mw) of the polyolefin resin (A) containing carboxyl groups is preferably in the range of 10,000 to 180,000. The range of 20,000-160,000 is more preferable, the range of 30,000-150,000 is especially preferable, the range of 40,000-140,000 is particularly preferable, and the range of 50,000-130,000 is the best. If it does not reach the above value, the cohesion will be weakened and the adhesion will be poor. On the other hand, if the above value is exceeded, the fluidity will be low, and there may be problems with the operability during bonding.

含有羧基之聚烯烴樹脂(A)之製造方法並無特別限定,例如可列舉自由基接枝反應(亦即,對成為主鏈之聚合物生成自由基物種,以該自由基物種作為聚合起始點而使不飽和羧酸及酸酐進行接枝聚合反應)等。The production method of the carboxyl group-containing polyolefin resin (A) is not particularly limited. For example, a radical grafting reaction (that is, a radical species is generated for the polymer that becomes the main chain, and the radical species is used as the polymerization starter). Point and graft polymerization reaction of unsaturated carboxylic acid and acid anhydride) and so on.

自由基產生劑並無特別限定,宜使用有機過氧化物較佳。有機過氧化物並無特別限定,可列舉過氧化苯二甲酸二-第三丁酯、第三丁基過氧化氫、過氧化二異丙苯、過氧化苯甲醯、過氧化苯甲酸第三丁酯、過氧化-2-乙基己酸第三丁酯、過氧化新戊酸第三丁酯、過氧化甲乙酮、二-第三丁基過氧化物、過氧化月桂醯等過氧化物;偶氮雙異丁腈、偶氮雙異丙腈等偶氮腈類等。The radical generator is not particularly limited, and organic peroxides are preferably used. The organic peroxide is not particularly limited. Examples include di-tert-butyl peroxyphthalate, tertiary butyl hydroperoxide, dicumyl peroxide, benzyl peroxide, and tertiary benzoic acid. Peroxides such as butyl ester, tert-butyl peroxy-2-ethylhexanoate, tertiary butyl peroxypivalate, methyl ethyl ketone peroxide, di-tert-butyl peroxide, laurel peroxide, etc.; Azonitriles such as azobisisobutyronitrile and azobisisopropionitrile.

<接著劑層> 本發明中,接著劑層係指將接著劑組成物塗布於基材,並使其乾燥後的接著劑組成物之層。接著劑層之厚度並無特別限定,宜為5μm以上較佳,10μm以上更佳,15μm以上尤佳。又,宜為200μm以下較佳,100μm以下更佳,50μm以下尤佳。厚度過薄時,有時會難以獲得充分的接著性能,過厚時,可列舉由於乾燥不充分,殘留溶劑容易變多,印刷電路板製造時之壓製時產生膨起的問題。<Adhesive layer> In the present invention, the adhesive layer refers to a layer of the adhesive composition after the adhesive composition is applied to the substrate and dried. The thickness of the adhesive layer is not particularly limited, but it is preferably 5 μm or more, more preferably 10 μm or more, and particularly preferably 15 μm or more. Moreover, it is preferably 200 μm or less, more preferably 100 μm or less, and particularly preferably 50 μm or less. When the thickness is too thin, it may be difficult to obtain sufficient adhesive performance. When the thickness is too thick, there may be problems such as insufficient drying, which tends to increase residual solvent, and swelling during pressing during the manufacture of the printed circuit board.

將接著劑組成物塗覆於基材上的方法並無特別限定,可列舉逗點式塗布機、逆轉輥式塗布機等。或必要時亦可在係印刷電路板構成材料之壓延銅箔、或聚醯亞胺膜上,直接或利用轉印法設置接著劑層。乾燥條件並無特別限定,乾燥後之殘留溶劑率宜為1質量%以下較佳。超過1質量%的話,可列舉印刷電路板壓製時殘留溶劑起泡而產生膨起的問題。The method of applying the adhesive composition to the substrate is not particularly limited, and examples include a comma coater, a reverse roll coater, and the like. Or, if necessary, an adhesive layer can be provided directly or by a transfer method on the rolled copper foil or the polyimide film that is the constituent material of the printed circuit board. The drying conditions are not particularly limited, and the residual solvent rate after drying is preferably 1% by mass or less. If it exceeds 1% by mass, the residual solvent foams during the pressing of the printed circuit board, causing swelling.

<樹脂基材> 本發明中之樹脂基材,只要是可塗布本發明之接著劑組成物,並乾燥形成接著劑層者即可,並無特別限定,宜為膜狀樹脂等樹脂基材(以下亦稱為基材膜層)較佳。具體而言,可例示聚酯樹脂、聚醯胺樹脂、聚醯亞胺樹脂、聚醯胺醯亞胺樹脂、液晶聚合物(LCP)、聚苯硫醚、對排聚苯乙烯、聚烯烴系樹脂、及氟系樹脂等。作為LCP膜之市售品,例如,可列舉KURARAY股份有限公司製的Vecstar(註冊商標)。又,作為聚醯亞胺膜之市售品,例如,可列舉Kaneka股份有限公司製的Apical(註冊商標)。<Resin substrate> The resin substrate in the present invention is not particularly limited as long as it can be coated with the adhesive composition of the present invention and dried to form an adhesive layer. It is preferably a resin substrate such as a film resin ( Hereinafter, it is also referred to as a base film layer). Specifically, polyester resins, polyamide resins, polyimide resins, polyimide resins, liquid crystal polymers (LCP), polyphenylene sulfide, parallel polystyrene, and polyolefin resins can be exemplified Resin, fluorine-based resin, etc. As a commercially available product of the LCP film, for example, Vecstar (registered trademark) manufactured by Kuraray Co., Ltd. can be cited. In addition, as a commercial product of the polyimide film, for example, Apical (registered trademark) manufactured by Kaneka Co., Ltd. can be cited.

樹脂基材之厚度並無特別限定,宜為1μm以上較佳,3μm以上更佳,10μm以上尤佳。又,宜為50μm以下較佳,30μm以下更佳,20μm以下尤佳。厚度過薄時,會有電路難以獲得充分的電氣性能的情況,另一方面,厚度過厚時,會有電路製作時的加工能率等降低的情況。又,樹脂基材之相對介電常數(εc )宜為5.0以下較佳,4.0以下更佳,3.5以下尤佳。下限值並無特別限定,在工業上只要為0.1以上則無問題。The thickness of the resin substrate is not particularly limited, and it is preferably 1 μm or more, more preferably 3 μm or more, and particularly preferably 10 μm or more. Furthermore, it is preferably 50 μm or less, more preferably 30 μm or less, and particularly preferably 20 μm or less. When the thickness is too thin, it may be difficult for the circuit to obtain sufficient electrical performance. On the other hand, when the thickness is too thick, the processing efficiency during circuit production may decrease. In addition, the relative dielectric constant (ε c ) of the resin substrate is preferably 5.0 or less, more preferably 4.0 or less, and particularly preferably 3.5 or less. The lower limit is not particularly limited, and there is no problem as long as it is 0.1 or more industrially.

<金屬基材> 就金屬基材而言,可使用能用於電路基板之任意以往公知的導電性材料。作為素材,可例示SUS、銅、鋁、鐵、鋼、鋅、鎳等各種金屬及各自的合金、鍍敷物、以鋅或鉻化合物等其他金屬進行處理的金屬等。金屬箔為較佳,銅箔更佳。金屬箔的厚度並無特別限定,宜為1μm以上較佳,3μm以上更佳,10μm以上尤佳。又,宜為50μm以下較佳,30μm以下更佳,20μm以下尤佳。厚度過薄時,會有電路難以獲得充分的電氣性能的情況,另一方面,厚度過厚時,會有電路製作時的加工能率等降低的情況。金屬箔通常係以捲軸狀的形態提供。製造本發明之印刷電路板時所使用之金屬箔的形態並無特別限定。使用帶狀形態的金屬箔時,其長度並無特別限定。又,其寬度亦無特別限定,宜為250~500cm左右較佳。<Metal base material> For the metal base material, any conventionally known conductive materials that can be used for circuit boards can be used. Examples of materials include various metals such as SUS, copper, aluminum, iron, steel, zinc, and nickel, and respective alloys, plating materials, and metals processed with other metals such as zinc or chromium compounds. Metal foil is preferable, and copper foil is more preferable. The thickness of the metal foil is not particularly limited, and is preferably 1 μm or more, more preferably 3 μm or more, and particularly preferably 10 μm or more. Furthermore, it is preferably 50 μm or less, more preferably 30 μm or less, and particularly preferably 20 μm or less. When the thickness is too thin, it may be difficult for the circuit to obtain sufficient electrical performance. On the other hand, when the thickness is too thick, the processing efficiency during circuit production may decrease. Metal foil is usually provided in the form of a reel. The form of the metal foil used when manufacturing the printed circuit board of this invention is not specifically limited. When the metal foil in the form of a strip is used, its length is not particularly limited. Moreover, the width is not particularly limited, but it is preferably about 250 to 500 cm.

<疊層體> 本發明之疊層體(Z)係樹脂基材與金屬基材介由接著劑層疊層而成者(樹脂基材/接著劑層/金屬基材之3層疊層體),疊層體(X)係樹脂基材與接著劑層疊層而成者(樹脂基材/接著劑層),疊層體(Y)係金屬基材與接著劑層疊層而成者(金屬基材/接著劑層)。本發明中,有時將疊層體(X)、疊層體(Y)及疊層體(Z)合稱為疊層體。疊層體(X)可藉由將接著劑組成物依常規方法塗布於樹脂基材並乾燥而獲得。又,疊層體(Y)可藉由將接著劑組成物依常規方法塗布於金屬基材並乾燥而獲得。疊層體(Z)可藉由於疊層體(X)或疊層體(Y),分別疊層金屬基材或樹脂基材而獲得。亦可於疊層體(X)或疊層體(Y)之接著劑層的面上疊層脫模基材。又,在疊層體(Z)之樹脂基材或金屬基材上進一步疊層接著劑層(接著劑層/樹脂基材/接著劑層/金屬基材、樹脂基材/接著劑層/金屬基材/接著劑層、接著劑層/樹脂基材/接著劑層/金屬基材/接著劑層)亦無妨。<Laminate> The laminate (Z) of the present invention is formed by laminating a resin base material and a metal base material via an adhesive (a 3-layer laminate of resin base material/adhesive layer/metal base material), A laminate (X)-based resin base material and an adhesive layer are laminated (resin base material/adhesive layer), and a laminate (Y)-based metal base material and adhesive are laminated (metal base material) /Adhesive layer). In the present invention, the laminate (X), the laminate (Y), and the laminate (Z) may be collectively referred to as the laminate. The laminate (X) can be obtained by applying the adhesive composition to a resin substrate in a conventional method and drying. In addition, the laminate (Y) can be obtained by applying the adhesive composition to a metal substrate according to a conventional method and drying. The laminate (Z) can be obtained by laminating a metal base material or a resin base material, respectively, due to the laminate (X) or the laminate (Y). A release base material can also be laminated on the surface of the adhesive layer of the laminate (X) or the laminate (Y). Furthermore, an adhesive layer (adhesive layer/resin base material/adhesive layer/metal base material, resin base material/adhesive layer/metal base material) is further laminated on the resin base material or metal base material of the laminate (Z). The base material/adhesive layer, adhesive layer/resin base material/adhesive layer/metal base material/adhesive layer) are also acceptable.

本發明之疊層體更滿足下列要件(1)~(4)。The laminate of the present invention further satisfies the following requirements (1) to (4).

<要件(1)> 針對要件(1)進行說明。關於本案發明之疊層體(Z),接著劑層之於頻率1MHz的相對介電常數(εc )3.0以下係必要。具體而言,以使乾燥後之厚度成為25μm的方式,將接著劑組成物塗布於脫模基材,並在約130℃乾燥約3分鐘。然後在約140℃熱處理約4小時而使其硬化,將硬化後之接著劑組成物層(接著劑層)從脫模膜剝離。測定剝離後之該接著劑組成物層之於頻率1MHz的相對介電常數(εc )。相對介電常數(εc )為3.0以下,2.6以下較佳,2.3以下更佳。下限並無特別限定,實用上為2.0。又,於頻率1MHz~10GHz之全區域的相對介電常數(εc )宜為3.0以下較佳,2.6以下更佳,2.3以下尤佳。<Requirement (1)> The requirement (1) is explained. Regarding the laminate (Z) of the present invention, the relative permittivity (ε c ) of the adhesive layer at a frequency of 1 MHz is required to be 3.0 or less. Specifically, the adhesive composition was applied to the release substrate so that the thickness after drying became 25 μm, and dried at about 130° C. for about 3 minutes. Then, it is heat-treated at about 140°C for about 4 hours to harden, and the cured adhesive composition layer (adhesive layer) is peeled from the release film. The relative dielectric constant (ε c ) of the adhesive composition layer after peeling at a frequency of 1 MHz was measured. The relative dielectric constant (ε c ) is 3.0 or less, preferably 2.6 or less, and more preferably 2.3 or less. The lower limit is not particularly limited, but practically it is 2.0. In addition, the relative permittivity (ε c ) in the entire frequency range of 1 MHz to 10 GHz is preferably 3.0 or less, more preferably 2.6 or less, and particularly preferably 2.3 or less.

疊層體(Z)中之接著劑層的相對介電常數(εc )可如下述般進行測定。亦即,可例示一種方法,係將疊層體(Z)之金屬基材用蝕刻液去除乾淨,得到接著劑層與樹脂基材之2層疊層體(X)。蝕刻液並無特別限定,可使用氯化鐵(III)水溶液、氯化銅(II)水溶液、硫酸過氧化氫水混合液、鹼蝕刻液、鎳蝕刻液等。然後,將疊層體(X)之樹脂基材剝離(去除)乾淨,於殘留的接著劑層之兩面,利用蒸鍍、濺射法等薄膜法、或塗布導電性糊劑等手法形成金屬層以作為電容器,測定靜電電容,並由厚度與面積算出相對介電常數(εc )。又,就另外的方法而言,可利用前述方法於疊層體(X)之樹脂基材面上形成金屬層以作為電容器,測定樹脂基材與接著劑層的組合靜電電容相對介電常數(εc )後,將金屬層與接著劑層從疊層體(X)剝離(去除)乾淨,同樣地電容器化並測定靜電電容,測定殘留的樹脂基材的相對介電常數(εc )。由疊層體(X)所獲得之電容器的介電層視為樹脂基材與接著劑層之多層介電體,故由兩者的差可算出接著劑層的相對介電常數(εc )。The relative dielectric constant (ε c ) of the adhesive layer in the laminate (Z) can be measured as follows. That is, a method can be exemplified by removing the metal substrate of the laminate (Z) with an etching solution to obtain a two-layer laminate (X) of the adhesive layer and the resin substrate. The etching solution is not particularly limited, and an iron (III) chloride aqueous solution, a copper (II) chloride aqueous solution, a sulfuric acid hydrogen peroxide water mixed solution, an alkaline etching solution, a nickel etching solution, etc. can be used. Then, the resin substrate of the laminate (X) is peeled off (removed) clean, and the metal layer is formed on both sides of the remaining adhesive layer by thin film methods such as vapor deposition, sputtering, or coating of conductive paste As a capacitor, the electrostatic capacitance is measured, and the relative dielectric constant (ε c ) is calculated from the thickness and area. In addition, as another method, the aforementioned method can be used to form a metal layer on the resin substrate surface of the laminate (X) as a capacitor, and measure the relative dielectric constant of the combined electrostatic capacitance of the resin substrate and the adhesive layer ( After ε c ), the metal layer and the adhesive layer are peeled off (removed) from the laminate (X), and the capacitors are similarly formed, the capacitance is measured, and the relative permittivity (ε c ) of the remaining resin substrate is measured. The dielectric layer of the capacitor obtained from the laminate (X) is regarded as a multilayer dielectric of the resin substrate and the adhesive layer, so the relative dielectric constant (ε c ) of the adhesive layer can be calculated from the difference between the two .

<要件(2)> 針對要件(2)進行說明。關於本案發明之疊層體(Z),接著劑層之於頻率1MHz的介電正切(tanδ)為0.02以下係必要。具體而言,以使乾燥後之厚度成為25μm的方式,將接著劑組成物塗布於脫模基材,並在約130℃乾燥約3分鐘。然後在約140℃熱處理約4小時而使其硬化,將硬化後之接著劑組成物層(接著劑層)從脫模膜剝離。測定剝離後之該接著劑組成物之於頻率1MHz的介電正切(tanδ)。介電正切(tanδ)為0.02以下,0.01以下較佳,0.005以下更佳。下限並無特別限定,實用上為0.0001。又,於頻率1MHz~10GHz之全區域的介電正切(tanδ)宜為0.02以下較佳,0.01以下更佳,0.005以下尤佳。<Requirement (2)> Requirement (2) is explained. Regarding the laminate (Z) of the present invention, it is necessary that the dielectric tangent (tan δ) of the adhesive layer at a frequency of 1 MHz is 0.02 or less. Specifically, the adhesive composition was applied to the release substrate so that the thickness after drying became 25 μm, and dried at about 130° C. for about 3 minutes. Then, it is heat-treated at about 140°C for about 4 hours to harden, and the cured adhesive composition layer (adhesive layer) is peeled from the release film. The dielectric tangent (tanδ) of the adhesive composition after peeling at a frequency of 1 MHz was measured. The dielectric tangent (tanδ) is 0.02 or less, preferably 0.01 or less, and more preferably 0.005 or less. The lower limit is not particularly limited, but it is 0.0001 practically. In addition, the dielectric tangent (tan δ) in the entire frequency range of 1 MHz to 10 GHz is preferably 0.02 or less, more preferably 0.01 or less, and particularly preferably 0.005 or less.

針對疊層體(Z)中之接著劑層的介電正切(tanδ),亦可利用與上述介電常數同樣的操作進行測定。The dielectric tangent (tanδ) of the adhesive layer in the laminate (Z) can also be measured by the same operation as the above-mentioned dielectric constant.

<要件(3)> 針對要件(3)進行說明。關於本案發明之疊層體(Z),樹脂基材與金屬基材間的剝離強度為0.5N/mm以上係必要。具體而言,以使乾燥後之厚度成為25μm的方式,將接著劑組成物塗布於樹脂基材,並在約130℃乾燥約3分鐘。然後於接著劑組成物層(接著劑層)的面上貼合金屬基材。貼合係以使金屬基材之光澤面與接著劑組成物層接觸的方式進行,在約160℃於約40kgf/cm2 之加壓下真空壓製約30秒而接著。然後在約140℃熱處理約4小時而使其硬化,製作樹脂基材/接著劑層/金屬基材之3層疊層體(Z)。於常溫(約25℃),將該疊層體(Z)之樹脂基材以拉伸速度50mm/min進行90°剝離,並測定剝離強度。90°剝離強度為0.5N/mm以上係必要,0.8N/mm以上較佳,1.0N/mm以上更佳。此外,即使是利用上述方法以外之方法製得的疊層體(Z),只要90°剝離強度為0.5N/mm以上,即包括於本發明中。<Requirement (3)> Requirement (3) is explained. Regarding the laminate (Z) of the present invention, it is necessary that the peel strength between the resin substrate and the metal substrate is 0.5 N/mm or more. Specifically, the adhesive composition was applied to the resin base material so that the thickness after drying became 25 μm, and dried at about 130° C. for about 3 minutes. Then, a metal substrate is bonded to the surface of the adhesive composition layer (adhesive layer). The bonding is performed so that the glossy surface of the metal substrate is in contact with the adhesive composition layer, and the bonding is performed at about 160° C. under a vacuum pressure of about 40 kgf/cm 2 for 30 seconds. Then, it was heat-treated at about 140° C. for about 4 hours to harden it to produce a three-layer laminate (Z) of resin substrate/adhesive layer/metal substrate. At normal temperature (about 25°C), the resin substrate of the laminate (Z) was peeled at 90° at a tensile speed of 50 mm/min, and the peel strength was measured. It is necessary for the 90° peel strength to be 0.5 N/mm or more, preferably 0.8 N/mm or more, and more preferably 1.0 N/mm or more. In addition, even the laminate (Z) produced by a method other than the above-mentioned method is included in the present invention as long as the 90° peel strength is 0.5 N/mm or more.

從疊層體(X),可藉由於疊層體(X)之接著劑組成物層(接著劑層)的面上貼合金屬基材,而獲得本發明之疊層體(Z)。貼合係以使金屬基材之光澤面與接著劑組成物層接觸的方式進行,在約160℃於約40kgf/cm2 之加壓下真空壓製約30秒而接著。然後在約140℃熱處理約4小時而使其硬化,製作樹脂基材/接著劑層/金屬基材之3層疊層體(Z)。於常溫(約25℃),將該疊層體(Z)之樹脂基材以拉伸速度50mm/min進行90°剝離,並測定剝離強度。90°剝離強度為0.5N/mm以上係必要,0.8N/mm以上較佳,1.0N/mm以上更佳。From the laminate (X), the laminate (Z) of the present invention can be obtained by laminating a metal substrate on the surface of the adhesive composition layer (adhesive layer) of the laminate (X). The bonding is performed so that the glossy surface of the metal substrate is in contact with the adhesive composition layer, and the bonding is performed at about 160° C. under a vacuum pressure of about 40 kgf/cm 2 for 30 seconds. Then, it was heat-treated at about 140° C. for about 4 hours to harden it to produce a three-layer laminate (Z) of resin substrate/adhesive layer/metal substrate. At normal temperature (about 25°C), the resin substrate of the laminate (Z) was peeled at 90° at a tensile speed of 50 mm/min, and the peel strength was measured. It is necessary for the 90° peel strength to be 0.5 N/mm or more, preferably 0.8 N/mm or more, and more preferably 1.0 N/mm or more.

從疊層體(Y),可藉由於疊層體(Y)之接著劑組成物層(接著劑層)的面上貼合樹脂基材,而獲得本發明之疊層體(Z)。貼合係以使樹脂基材與接著劑組成物層接觸的方式進行,在約160℃於約40kgf/cm2 之加壓下真空壓製約30秒而接著。然後在約140℃熱處理約4小時而使其硬化,製作樹脂基材/接著劑層/金屬基材之3層疊層體(Z)。於常溫(約25℃),將該疊層體(Z)之樹脂基材以拉伸速度50mm/min進行90°剝離,並測定剝離強度。90°剝離強度為0.5N/mm以上係必要,0.8N/mm以上較佳,1.0N/mm以上更佳。From the laminate (Y), the laminate (Z) of the present invention can be obtained by laminating a resin substrate on the surface of the adhesive composition layer (adhesive layer) of the laminate (Y). The bonding is performed so that the resin substrate and the adhesive composition layer are brought into contact, and the bonding is performed at about 160° C. under a pressure of about 40 kgf/cm 2 under vacuum pressure for 30 seconds. Then, it was heat-treated at about 140° C. for about 4 hours to harden it to produce a three-layer laminate (Z) of resin substrate/adhesive layer/metal substrate. At normal temperature (about 25°C), the resin substrate of the laminate (Z) was peeled at 90° at a tensile speed of 50 mm/min, and the peel strength was measured. It is necessary for the 90° peel strength to be 0.5 N/mm or more, preferably 0.8 N/mm or more, and more preferably 1.0 N/mm or more.

從接著劑層,可藉由於接著劑層之其中一面貼合樹脂基材,於另一面貼合金屬基材之光澤面,而獲得本發明之疊層體(Z)。貼合係將脫模基材/接著劑層與樹脂基材,在約100℃於約3kgf/cm2 之加壓下進行約1m/min輥層壓而貼合後,將脫模基材剝離,以使金屬基材之光澤面與接著劑層接觸的方式,在約160℃於約40kgf/cm2 之加壓下真空壓製約30秒而接著。然後在約140℃熱處理約4小時而使其硬化,製作樹脂基材/接著劑層/金屬基材之3層疊層體(Z)。於常溫(約25℃),將該疊層體(Z)之樹脂基材以拉伸速度50mm/min進行90°剝離,並測定剝離強度。90°剝離強度為0.5N/mm以上係必要,0.8N/mm以上較佳,1.0N/mm以上更佳。From the adhesive layer, the laminate (Z) of the present invention can be obtained by bonding the resin substrate on one side of the adhesive layer and the glossy surface of the metal substrate on the other side. Laminating is to laminate the release substrate/adhesive layer and the resin substrate at about 100°C under a pressure of about 3kgf/cm 2 with a roll of about 1m/min, and then peel off the release substrate. , So that the glossy surface of the metal substrate is in contact with the adhesive layer, the vacuum pressure is controlled at about 160°C under a pressure of about 40 kgf/cm 2 for 30 seconds and then adhered. Then, it was heat-treated at about 140° C. for about 4 hours to harden it to produce a three-layer laminate (Z) of resin substrate/adhesive layer/metal substrate. At normal temperature (about 25°C), the resin substrate of the laminate (Z) was peeled at 90° at a tensile speed of 50 mm/min, and the peel strength was measured. It is necessary for the 90° peel strength to be 0.5 N/mm or more, preferably 0.8 N/mm or more, and more preferably 1.0 N/mm or more.

<要件(4)> 針對要件(4)進行說明。關於本案發明之疊層體(Z),加濕焊料耐熱性為240℃以上係必要。具體而言,以使乾燥後之厚度成為25μm的方式,將接著劑組成物塗布於樹脂基材,並約130℃乾燥約3分鐘。然後於接著劑組成物層(接著劑層)的面上貼合金屬基材。貼合係以使金屬基材之光澤面與接著劑組成物層接觸的方式進行,在約160℃於約40kgf/cm2 之加壓下真空壓製約30秒而接著。然後在約140℃熱處理約4小時而使其硬化,製作樹脂基材/接著劑層/金屬基材之3層疊層體(Z)。將該疊層體(Z)在約40℃、約80RH%之條件下處理約72小時,並於各溫度在熔融的焊料浴中流動1分鐘,測定不會引起膨起等外觀變化的溫度。加濕焊料耐熱性為240℃以上係必要,250℃以上較佳,260℃以上更佳。此外,即使是利用上述方法以外之方法製得的疊層體(Z),只要加濕焊料耐熱性為240℃以上,即包括於本發明中。<Requirement (4)> Requirement (4) is explained. Regarding the laminate (Z) of the present invention, the heat resistance of the humidified solder must be 240°C or higher. Specifically, the adhesive composition is applied to the resin substrate so that the thickness after drying becomes 25 μm, and dried at about 130° C. for about 3 minutes. Then, a metal substrate is bonded to the surface of the adhesive composition layer (adhesive layer). The bonding is performed so that the glossy surface of the metal substrate is in contact with the adhesive composition layer, and the bonding is performed at about 160° C. under a vacuum pressure of about 40 kgf/cm 2 for 30 seconds. Then, it was heat-treated at about 140° C. for about 4 hours to harden it to produce a three-layer laminate (Z) of resin substrate/adhesive layer/metal substrate. The laminate (Z) was treated under conditions of about 40° C. and about 80 RH% for about 72 hours, and was flowed in a molten solder bath at each temperature for 1 minute, and the temperature at which appearance changes such as swelling did not occur was measured. The heat resistance of the humidified solder is 240°C or higher, preferably 250°C or higher, and more preferably 260°C or higher. In addition, even a laminate (Z) produced by a method other than the above-mentioned method is included in the present invention as long as the heat resistance of the humidified solder is 240°C or higher.

從疊層體(X),可藉由於疊層體(X)之接著劑組成物層(接著劑層)的面上貼合金屬基材,而獲得本發明之疊層體(Z)。貼合係以使金屬基材之光澤面與接著劑組成物層接觸的方式進行,在約160℃於約40kgf/cm2 之加壓下真空壓製約30秒而接著。然後在約140℃熱處理約4小時而使其硬化,製作樹脂基材/接著劑層/金屬基材之3層疊層體(Z)。將該疊層體(Z)在約40℃、約80RH%之條件下處理約72小時,並於各溫度在熔融的焊料浴中流動1分鐘,測定不會引起膨起等外觀變化的溫度。加濕焊料耐熱性為240℃以上係必要,250℃以上較佳,260℃以上更佳。From the laminate (X), the laminate (Z) of the present invention can be obtained by laminating a metal substrate on the surface of the adhesive composition layer (adhesive layer) of the laminate (X). The bonding is performed so that the glossy surface of the metal substrate is in contact with the adhesive composition layer, and the bonding is performed at about 160° C. under a vacuum pressure of about 40 kgf/cm 2 for 30 seconds. Then, it was heat-treated at about 140° C. for about 4 hours to harden it to produce a three-layer laminate (Z) of resin substrate/adhesive layer/metal substrate. The laminate (Z) was treated under conditions of about 40° C. and about 80 RH% for about 72 hours, and was flowed in a molten solder bath at each temperature for 1 minute, and the temperature at which appearance changes such as swelling did not occur was measured. The heat resistance of the humidified solder is 240°C or higher, preferably 250°C or higher, and more preferably 260°C or higher.

從疊層體(Y),可藉由於疊層體(Y)之接著劑組成物層(接著劑層)的面上貼合樹脂基材,而獲得本發明之疊層體(Z)。貼合係以使樹脂基材與接著劑組成物層接觸的方式進行,在約160℃於約40kgf/cm2 之加壓下真空壓製約30秒而接著。然後在約140℃熱處理約4小時而使其硬化,製作樹脂基材/接著劑層/金屬基材之3層疊層體(Z)。將該疊層體(Z)在約40℃、約80RH%之條件下處理約72小時,並於各溫度在熔融的焊料浴中流動1分鐘,測定不會引起膨起等外觀變化的溫度。加濕焊料耐熱性為240℃以上係必要,250℃以上較佳,260℃以上更佳。From the laminate (Y), the laminate (Z) of the present invention can be obtained by laminating a resin substrate on the surface of the adhesive composition layer (adhesive layer) of the laminate (Y). The bonding is performed so that the resin substrate and the adhesive composition layer are brought into contact, and the bonding is performed at about 160° C. under a pressure of about 40 kgf/cm 2 under vacuum pressure for 30 seconds. Then, it was heat-treated at about 140° C. for about 4 hours to harden it to produce a three-layer laminate (Z) of resin substrate/adhesive layer/metal substrate. The laminate (Z) was treated under conditions of about 40° C. and about 80 RH% for about 72 hours, and was flowed in a molten solder bath at each temperature for 1 minute, and the temperature at which appearance changes such as swelling did not occur was measured. The heat resistance of the humidified solder is 240°C or higher, preferably 250°C or higher, and more preferably 260°C or higher.

又,從接著劑層,可藉由於接著劑層之其中一面貼合樹脂基材,於另一面貼合金屬基材之光澤面,而獲得本發明之疊層體(Z)。貼合係將接著劑層與樹脂基材貼合後,以使金屬基材之光澤面與接著劑層接觸的方式進行,在約160℃於約40kgf/cm2 之加壓下真空壓製約30秒而接著。然後在約140℃熱處理約4小時而使其硬化,製作樹脂基材/接著劑層/金屬基材之3層疊層體(Z)。將該疊層體(Z)在約40℃、約80RH%之條件下處理約72小時,並於各溫度在熔融的焊料浴中流動1分鐘,測定不會引起膨起等外觀變化的溫度。加濕焊料耐熱性為240℃以上係必要,250℃以上較佳,260℃以上更佳。Furthermore, from the adhesive layer, the resin substrate is bonded to one side of the adhesive layer, and the glossy surface of the metal substrate is bonded to the other side to obtain the laminate (Z) of the present invention. Laminating is performed after bonding the adhesive layer and the resin base material so that the glossy surface of the metal base material is in contact with the adhesive layer, and the vacuum pressure is controlled at about 160°C under a pressure of about 40 kgf/cm 2 Seconds and then. Then, it was heat-treated at about 140° C. for about 4 hours to harden it to produce a three-layer laminate (Z) of resin substrate/adhesive layer/metal substrate. The laminate (Z) was treated under conditions of about 40° C. and about 80 RH% for about 72 hours, and was flowed in a molten solder bath at each temperature for 1 minute, and the temperature at which appearance changes such as swelling did not occur was measured. The heat resistance of the humidified solder is 240°C or higher, preferably 250°C or higher, and more preferably 260°C or higher.

<接著劑組成物> 本發明所使用之接著劑組成物,係至少包括含有羧基之聚烯烴樹脂(A)者。藉由包括含有羧基之聚烯烴樹脂(A),介由由該接著劑組成物所構成之接著劑層而成的疊層體可顯現上述(1)~(4)之優異性能。<Adhesive composition> The adhesive composition used in the present invention includes at least a carboxyl group-containing polyolefin resin (A). By including the polyolefin resin (A) containing a carboxyl group, a laminate formed by an adhesive layer composed of the adhesive composition can exhibit the above-mentioned excellent performances (1) to (4).

本發明之接著劑組成物,除上述(A)成分以外,宜包括含有羧基之苯乙烯樹脂(B)(以下亦簡稱為(B)成分。)、碳二亞胺樹脂(C)(以下亦簡稱為(C)成分。)及/或環氧樹脂(D)(以下亦簡稱為(D)成分。)較佳。藉由包括上述(A)成分~(D)成分之4種樹脂,不僅是與以往的聚醯亞胺、聚酯膜,與習知技術所未預想之LCP膜等低極性樹脂基材、金屬基材亦具有高接著性,可獲得高焊料耐熱性,且低介電特性優異。The adhesive composition of the present invention, in addition to the above-mentioned (A) component, preferably includes a carboxyl group-containing styrene resin (B) (hereinafter also referred to as (B) component), carbodiimide resin (C) (hereinafter also It is abbreviated as (C) component.) and/or epoxy resin (D) (hereinafter also abbreviated as (D) component.) is preferable. The four types of resins including the above-mentioned (A) to (D) components are not only compatible with conventional polyimide and polyester films, but also with low-polarity resin substrates such as LCP films that were not anticipated by the prior art, and metal The substrate also has high adhesion, high solder heat resistance, and excellent low dielectric properties.

<含有羧基之苯乙烯樹脂(B)> 本發明可使用之含有羧基之苯乙烯樹脂(B)並無限定,宜為將芳香族乙烯基化合物單獨、或芳香族乙烯基化合物與共軛二烯化合物之以嵌段及/或無規結構為主體的共聚物、及其氫化物以不飽和羧酸進行改性而得者較佳。芳香族乙烯基化合物並無特別限定,例如可列舉苯乙烯、第三丁基苯乙烯、α-甲基苯乙烯、對甲基苯乙烯、二乙烯基苯、1,1-二苯基苯乙烯、N,N-二乙基-對胺基乙基苯乙烯、乙烯基甲苯、對第三丁基苯乙烯等。又,作為共軛二烯化合物,例如,可列舉丁二烯、異戊二烯、1,3-戊二烯、2,3-二甲基-1,3-丁二烯等。該等芳香族乙烯基化合物與共軛二烯化合物之共聚物的具體例,可列舉苯乙烯-乙烯-丁烯-苯乙烯嵌段共聚物(SEBS)、苯乙烯-乙烯-丙烯-苯乙烯嵌段共聚物(SEPS)、苯乙烯-乙烯-乙烯・丙烯-苯乙烯嵌段共聚物(SEEPS)等。<Carboxyl group-containing styrene resin (B)> The carboxyl group-containing styrene resin (B) that can be used in the present invention is not limited, and it is preferable to use an aromatic vinyl compound alone or an aromatic vinyl compound and a conjugated diene It is preferable to obtain a copolymer mainly composed of a block and/or random structure, and a hydrogenated product thereof modified with an unsaturated carboxylic acid. The aromatic vinyl compound is not particularly limited, and examples include styrene, tertiary butylstyrene, α-methylstyrene, p-methylstyrene, divinylbenzene, and 1,1-diphenylstyrene , N,N-Diethyl-p-aminoethyl styrene, vinyl toluene, p-tert-butyl styrene, etc. Moreover, as a conjugated diene compound, for example, butadiene, isoprene, 1,3-pentadiene, 2,3-dimethyl-1,3-butadiene, etc. are mentioned. Specific examples of the copolymers of these aromatic vinyl compounds and conjugated diene compounds include styrene-ethylene-butylene-styrene block copolymer (SEBS), styrene-ethylene-propylene-styrene block copolymers Segment copolymer (SEPS), styrene-ethylene-ethylene·propylene-styrene block copolymer (SEEPS), etc.

含有羧基之苯乙烯樹脂(B)的改性,例如,可藉由於苯乙烯樹脂的聚合時,使不飽和羧酸共聚而進行。又,亦可藉由將苯乙烯樹脂與不飽和羧酸在有機過氧化物的存在下加熱、混練而進行。不飽和羧酸並無特別限定,可列舉丙烯酸、甲基丙烯酸、馬來酸、衣康酸、富馬酸、馬來酸酐、衣康酸酐、富馬酸酐等。The modification of the carboxyl group-containing styrene resin (B) can be carried out, for example, by copolymerizing an unsaturated carboxylic acid during polymerization of the styrene resin. Moreover, it can also be performed by heating and kneading a styrene resin and an unsaturated carboxylic acid in the presence of an organic peroxide. The unsaturated carboxylic acid is not particularly limited, and acrylic acid, methacrylic acid, maleic acid, itaconic acid, fumaric acid, maleic anhydride, itaconic anhydride, fumaric anhydride, etc. can be mentioned.

含有羧基之苯乙烯樹脂(B)的酸值,以耐熱性及與樹脂基材或金屬基材的接著性的觀點觀之,下限宜為10當量/106 g以上較佳,100當量/106 g以上更佳,150當量/106 g尤佳。未達上述值的話,與環氧樹脂(D)、碳二亞胺樹脂(C)的相容性低,會有無法顯現接著強度的情況。又,會有交聯密度低、欠缺耐熱性的情況。上限宜為1000當量/106 g以下較佳,700當量/106 g以下更佳,500當量/106 g以下尤佳。超過上述值的話,會有接著性、低介電特性降低的情況。The acid value of the carboxyl group-containing styrene resin (B), from the viewpoint of heat resistance and adhesion to the resin substrate or metal substrate, the lower limit is preferably 10 equivalent/10 6 g or more, preferably 100 equivalent/10 6 g or more is more preferable, 150 equivalent/10 6 g is particularly preferable. If the value is less than the above value, the compatibility with the epoxy resin (D) and the carbodiimide resin (C) is low, and the adhesive strength may not be expressed. In addition, the crosslinking density may be low and heat resistance may be insufficient. The upper limit is preferably 1000 equivalents/10 6 g or less, more preferably 700 equivalents/10 6 g or less, and particularly preferably 500 equivalents/10 6 g or less. If the value exceeds the above value, the adhesion and low dielectric properties may decrease.

本發明所使用之接著劑組成物中,就含有羧基之苯乙烯樹脂(B)的含量而言,相對於含有羧基之聚烯烴樹脂(A)5~95質量份,宜為含有羧基之苯乙烯樹脂(B)95~5質量份之範圍,亦即(A)成分/(B)成分=5~95/95~5(質量比)較佳。(A)成分/(B)成分10~90/90~10(質量比)更佳,(A)成分/(B)成分=15~85/85~15(質量比)之範圍最佳。(A)成分量未達上述值的話,交聯密度降低,會有加濕焊料耐熱性降低的情況。(A)成分量超過上述值的話,對於基材的潤濕性降低,會有接著強度降低的情況。In the adhesive composition used in the present invention, the content of the carboxyl-containing styrene resin (B) is preferably 5 to 95 parts by mass of the carboxyl-containing polyolefin resin (A), preferably carboxyl-containing styrene The resin (B) is preferably in the range of 95 to 5 parts by mass, that is, (A) component/(B) component = 5 to 95/95 to 5 (mass ratio). (A) component/(B) component is more preferably 10 to 90/90 to 10 (mass ratio), and (A) component/(B) component = 15 to 85/85 to 15 (mass ratio) is the most preferable range. (A) If the component amount is less than the above-mentioned value, the crosslink density will decrease, and the heat resistance of the humidified solder may decrease. (A) If the amount of the component exceeds the above value, the wettability to the base material may decrease, and the adhesive strength may decrease.

<碳二亞胺樹脂(C)> 碳二亞胺樹脂(C)只要是於分子內具有碳二亞胺基者即可,並無特別限定。於分子內具有2個以上之碳二亞胺基的聚碳二亞胺較佳。藉由使用碳二亞胺樹脂(C),含有羧基之聚烯烴樹脂(A)或含有羧基之苯乙烯樹脂(B)的羧基與碳二亞胺反應,可提高接著劑組成物與基材的相互作用,並可改善接著性。<Carbodiimide resin (C)> The carbodiimide resin (C) is not particularly limited as long as it has a carbodiimide group in the molecule. Polycarbodiimide having two or more carbodiimide groups in the molecule is preferred. By using carbodiimide resin (C), carboxyl-containing polyolefin resin (A) or carboxyl-containing styrene resin (B), the carboxyl group reacts with the carbodiimide to improve the adhesive composition and substrate Interaction, and can improve adhesion.

本發明所使用之接著劑組成物中,碳二亞胺樹脂(C)的含量,相對於含有羧基之聚烯烴樹脂(A)與含有羧基之苯乙烯樹脂(B)之合計100質量份,宜為0.1~30質量份之範圍較佳。1~25質量份之範圍更佳,2~20質量份之範圍最佳。未達上述值的話,不能顯現與基材的相互作用,會有接著性降低的問題。超過上述值的話,會有接著劑的適用期縮短、低介電特性降低的問題。In the adhesive composition used in the present invention, the content of the carbodiimide resin (C) is preferably 100 parts by mass of the total of the carboxyl group-containing polyolefin resin (A) and the carboxyl group-containing styrene resin (B) It is preferably in the range of 0.1 to 30 parts by mass. The range of 1-25 parts by mass is more preferable, and the range of 2-20 parts by mass is most preferable. If the value is less than the above-mentioned value, the interaction with the base material will not be displayed, and the adhesion will be reduced. If the above value is exceeded, the pot life of the adhesive will be shortened and the low dielectric properties will be reduced.

<環氧樹脂(D)> 環氧樹脂(D)只要是於分子中具有環氧丙基者即可,並無特別限定,宜為於分子中具有2個以上之環氧丙基者較佳。具體而言雖無特別限定,但可使用選自於由聯苯基型環氧樹脂、萘型環氧樹脂、雙酚A型環氧樹脂、雙酚F型環氧樹脂、酚醛型環氧樹脂、脂環族環氧樹脂、二環戊二烯型環氧樹脂、四環氧丙基二胺基二苯基甲烷、三環氧丙基對胺基苯酚、四環氧丙基雙胺基甲基環己酮、N,N,N’,N’-四環氧丙基-間二甲苯二胺構成之群組中之至少1種。宜為雙酚A型環氧樹脂、酚醛型環氧樹脂或二環戊二烯型環氧樹脂較佳。<Epoxy resin (D)> The epoxy resin (D) is not particularly limited as long as it has a glycidyl group in the molecule, and it is preferably one having two or more glycidyl groups in the molecule. . Although it is not specifically limited, it can be selected from biphenyl type epoxy resin, naphthalene type epoxy resin, bisphenol A type epoxy resin, bisphenol F type epoxy resin, and novolac type epoxy resin. , Cycloaliphatic epoxy resin, dicyclopentadiene epoxy resin, tetraglycidyl diamino diphenyl methane, triglycidyl p-aminophenol, tetraglycidyl diamino methyl At least one of the group consisting of cyclohexanone, N,N,N',N'-tetraglycidyl-m-xylenediamine. Preferably, it is bisphenol A epoxy resin, novolac epoxy resin or dicyclopentadiene epoxy resin.

本發明所使用之接著劑組成物中,環氧樹脂(D)的含量,相對於含有羧基之聚烯烴樹脂(A)與含有羧基之苯乙烯樹脂(B)之合計100質量份,宜為1~30質量份之範圍較佳,2~15質量份之範圍更佳,3~10質量份之範圍最佳。未達上述範圍的話,會有不能獲得充分的硬化效果、接著性及耐熱性降低的情況。又,為上述範圍以上的話,會有接著劑的適用期縮短、低介電特性降低的問題。In the adhesive composition used in the present invention, the content of epoxy resin (D) relative to 100 parts by mass of the total of carboxyl group-containing polyolefin resin (A) and carboxyl group-containing styrene resin (B) is preferably 1 The range of -30 parts by mass is preferable, the range of 2-15 parts by mass is more preferable, and the range of 3-10 parts by mass is most preferable. If it is less than the above range, a sufficient curing effect may not be obtained, and adhesiveness and heat resistance may decrease. Moreover, if it is more than the said range, there will be a problem that the pot life of the adhesive is shortened, and the low-dielectric characteristic falls.

本發明所使用之接著劑組成物,進一步可含有有機溶劑。就本發明所使用之有機溶劑而言,只要是可使含有羧基之聚烯烴樹脂(A)、含有羧基之苯乙烯樹脂(B)、碳二亞胺樹脂(C)、及環氧樹脂(D)溶解者即可,並無特別限定。具體而言,例如,可使用苯、甲苯、二甲苯等芳香族烴;己烷、庚烷、辛烷、癸烷等脂肪族系烴;環己烷、環己烯、甲基環己烷、乙基環己烷等脂環族烴;三氯乙烯、二氯乙烯、氯苯、氯仿等鹵化烴;甲醇、乙醇、異丙醇、丁醇、戊醇、己醇、丙二醇、苯酚等醇系溶劑;丙酮、甲基異丁酮、甲乙酮、戊酮、己酮、環己酮、異佛酮、苯乙酮等酮系溶劑;甲基賽珞蘇、乙基賽珞蘇等賽珞蘇類;乙酸甲酯、乙酸乙酯、乙酸丁酯、丙酸甲酯、甲酸丁酯等酯系溶劑;乙二醇單正丁醚、乙二醇單異丁醚、乙二醇單第三丁醚、二乙二醇單正丁醚、二乙二醇單異丁醚、三乙二醇單正丁醚、四乙二醇單正丁醚等二醇醚系溶劑等,可使用該等中之1種或2種以上倂用。The adhesive composition used in the present invention may further contain an organic solvent. As for the organic solvent used in the present invention, as long as it can be made of polyolefin resin (A) containing carboxyl group, styrene resin (B) containing carboxyl group, carbodiimide resin (C), and epoxy resin (D) ) Whatever is dissolved is not particularly limited. Specifically, for example, aromatic hydrocarbons such as benzene, toluene, and xylene; aliphatic hydrocarbons such as hexane, heptane, octane, and decane; cyclohexane, cyclohexene, methylcyclohexane, Alicyclic hydrocarbons such as ethyl cyclohexane; halogenated hydrocarbons such as trichloroethylene, dichloroethylene, chlorobenzene, chloroform; methanol, ethanol, isopropanol, butanol, pentanol, hexanol, propylene glycol, phenol and other alcohols Solvents; ketone solvents such as acetone, methyl isobutyl ketone, methyl ethyl ketone, pentanone, hexanone, cyclohexanone, isophorone, acetophenone, etc.; methyl serosol, ethyl serosol and other serosols ; Ester solvents such as methyl acetate, ethyl acetate, butyl acetate, methyl propionate, butyl formate, etc.; ethylene glycol mono n-butyl ether, ethylene glycol mono isobutyl ether, ethylene glycol mono tertiary butyl ether , Diethylene glycol mono-n-butyl ether, diethylene glycol mono-isobutyl ether, triethylene glycol mono-n-butyl ether, tetraethylene glycol mono-n-butyl ether and other glycol ether solvents, etc., can be used One or more than two kinds are useful.

就有機溶劑而言,相對於含有羧基之聚烯烴樹脂(A)與含有羧基之苯乙烯樹脂(B)之合計100質量份,宜為100~1000質量份之範圍較佳,200~900質量份之範圍更佳,300~800質量份之範圍最佳。未達上述範圍的話,會有液體性及適用期特性降低的情況。又,超過上述範圍的話,會有在製造成本、輸送成本的方面變得不利的問題。Regarding the organic solvent, the range of 100-1000 parts by weight is preferable, 200-900 parts by weight, relative to the total of 100 parts by weight of carboxyl-containing polyolefin resin (A) and carboxyl-containing styrene resin (B) The range is better, and the range of 300 to 800 parts by mass is the best. If it does not reach the above range, the liquidity and pot life characteristics may decrease. Moreover, if it exceeds the said range, there will be a problem that it becomes disadvantageous in terms of manufacturing cost and transportation cost.

又,於本發明所使用之接著劑組成物中,必要時亦可進一步含有其他成分。該等成分的具體例,可列舉阻燃劑、黏接性賦予劑、填料、矽烷偶聯劑。In addition, the adhesive composition used in the present invention may further contain other components if necessary. Specific examples of these components include flame retardants, adhesiveness-imparting agents, fillers, and silane coupling agents.

<阻燃劑> 於本發明所使用之接著劑組成物中,必要時亦可摻合阻燃劑。作為阻燃劑,可列舉溴系、磷系、氮系、氫氧化金屬化合物等。其中,磷系阻燃劑較佳,例如可使用磷酸三甲酯、磷酸三苯酯、磷酸三甲苯酯等磷酸酯;次磷酸鋁等磷酸鹽、磷腈等公知的磷系阻燃劑。該等可單獨使用,亦可將2種以上任意組合使用。含有阻燃劑時,相對於(A)~(D)成分之合計100質量份,以1~200質量份之範圍含有阻燃劑較佳,5~150質量份之範圍更佳,10~100質量份之範圍最佳。未達上述範圍的話,會有阻燃性低的情況。超過上述範圍的話,會有接著性、耐熱性、電氣特性等惡化的問題。<Flame retardant> In the adhesive composition used in the present invention, a flame retardant may be blended if necessary. Examples of flame retardants include bromine-based, phosphorus-based, nitrogen-based, and metal hydroxide compounds. Among them, phosphorus-based flame retardants are preferred. For example, phosphoric acid esters such as trimethyl phosphate, triphenyl phosphate, and tricresyl phosphate; phosphates such as aluminum hypophosphite; phosphazenes, and other known phosphorus-based flame retardants can be used. These can be used alone or in any combination of two or more kinds. When a flame retardant is contained, the flame retardant is preferably contained in the range of 1 to 200 parts by mass relative to 100 parts by mass of the total of components (A) to (D), more preferably in the range of 5 to 150 parts by mass, and 10 to 100 The range of mass parts is the best. If it does not reach the above range, the flame retardancy may be low. If it exceeds the above range, there will be problems such as deterioration in adhesion, heat resistance, and electrical characteristics.

<黏接性賦予劑> 於本發明所使用之接著劑組成物中,必要時亦可摻合黏接性賦予劑。黏接性賦予劑,可列舉聚萜烯樹脂、松香系樹脂、脂肪族系石油樹脂、脂環族系石油樹脂、共聚系石油樹脂、苯乙烯樹脂及氫化石油樹脂等,係為了提高接著強度而使用。該等可單獨使用,亦可將2種以上任意組合使用。<Adhesiveness-imparting agent> In the adhesive composition used in the present invention, an adhesiveness-imparting agent may be blended if necessary. Adhesive imparting agents include polyterpene resins, rosin-based resins, aliphatic petroleum resins, alicyclic petroleum resins, copolymerized petroleum resins, styrene resins, and hydrogenated petroleum resins, etc., which are used to improve the bonding strength use. These can be used alone or in any combination of two or more kinds.

<填料> 於本發明所使用之接著劑組成物中,必要時亦可摻合二氧化矽等填料。藉由摻合二氧化矽,耐熱性之特性得到改善,故非常理想。就二氧化矽而言,一般已知有疏水性二氧化矽與親水性二氧化矽,此處為了賦予耐吸濕性,宜為以二甲基二氯矽烷、或六甲基二矽氮烷、辛基矽烷等進行處理之疏水性二氧化矽。二氧化矽的摻合量,相對於(A)~(D)成分之合計100質量份宜為0.05~30質量份之摻合量較佳。未達0.05質量份的話,會有無法發揮使耐熱性提高的效果的情況。另一方面,超過30質量份的話,會有發生二氧化矽的分散不良、溶液黏度變得過高而作業性產生不便、或接著性降低的情況。<Filler> In the adhesive composition used in the present invention, fillers such as silica may be blended if necessary. By blending silicon dioxide, the heat resistance characteristics are improved, which is very ideal. As far as silica is concerned, hydrophobic silica and hydrophilic silica are generally known. In order to impart moisture resistance, dimethyldichlorosilane, or hexamethyldisilazane, Hydrophobic silica treated with octyl silane, etc. The blending amount of silica is preferably 0.05-30 parts by mass relative to 100 parts by mass of the total of components (A) to (D). If it is less than 0.05 parts by mass, the effect of improving heat resistance may not be exhibited. On the other hand, if it exceeds 30 parts by mass, poor dispersion of silica may occur, the viscosity of the solution may become too high, workability may be inconvenient, or adhesiveness may decrease.

<矽烷偶聯劑> 於本發明所使用之接著劑組成物中,必要時亦可摻合矽烷偶聯劑。藉由摻合矽烷偶聯劑,對於金屬的接著性或耐熱性之特性得到改善,故非常理想。矽烷偶聯劑並無特別限定,可列舉具有不飽和基者、具有環氧丙基者、具有胺基者等。該等中以耐熱性的觀點觀之,γ-環氧丙氧基丙基三甲氧基矽烷、β-(3,4-環氧環己基)乙基三甲氧基矽烷、β-(3,4-環氧環己基)乙基三乙氧基矽烷等具有環氧丙基的矽烷偶聯劑更佳。矽烷偶聯劑的摻合量,相對於(A)~(D)成分之合計100質量份宜為0.5~20質量份之摻合量較佳。未達0.5質量份的話,會有耐熱性變得不良的情況。另一方面,超過20質量份的話,會有耐熱性不良或接著性降低的情況。<Silane coupling agent> In the adhesive composition used in the present invention, a silane coupling agent may be blended if necessary. By blending the silane coupling agent, the adhesion to metals and the characteristics of heat resistance are improved, which is very ideal. The silane coupling agent is not particularly limited, and examples include those having unsaturated groups, those having glycidyl groups, and those having amine groups. From the viewpoint of heat resistance, γ-glycidoxypropyltrimethoxysilane, β-(3,4-epoxycyclohexyl)ethyltrimethoxysilane, β-(3,4) -Epoxycyclohexyl) ethyl triethoxy silane and other silane coupling agents having glycidyl groups are more preferable. The blending amount of the silane coupling agent is preferably 0.5-20 parts by mass relative to 100 parts by mass of the total of components (A) to (D). If it is less than 0.5 parts by mass, heat resistance may become poor. On the other hand, if it exceeds 20 parts by mass, heat resistance may be poor or adhesiveness may be reduced.

<接著片> 本發明中,接著片係將上述疊層體(Z)與脫模基材介由接著劑組成物疊層而成者、或於疊層體(X)或疊層體(Y)之接著劑層面疊層脫模基材而成者、或於接著劑層之至少其中一面疊層脫模基材而成者。具體的構成態樣,可列舉脫模基材/接著劑層、脫模基材/接著劑層/脫模基材、樹脂基材/接著劑層/脫模基材、金屬基材/接著劑層/脫模基材、疊層體/接著劑層/脫模基材、或脫模基材/接著劑層/疊層體/接著劑層/脫模基材。藉由疊層脫模基材,可發揮作為基材之保護層的功能。又,藉由使用脫模基材,可將脫模基材從接著片脫模,而將接著劑層轉印至另外的基材。<Adhesive Sheet> In the present invention, the adhesive sheet is formed by laminating the above-mentioned laminate (Z) and the release base material via an adhesive composition, or on the laminate (X) or the laminate (Y). ) The adhesive layer is laminated with a release substrate, or at least one side of the adhesive layer is laminated with a release substrate. Specific configuration aspects include release substrate/adhesive layer, release substrate/adhesive layer/release substrate, resin substrate/adhesive layer/release substrate, metal substrate/adhesive Layer/release base material, laminate/adhesive layer/release base material, or release base material/adhesive layer/laminated body/adhesive layer/release base material. By laminating the release substrate, it can function as a protective layer of the substrate. In addition, by using a release substrate, the release substrate can be released from the adhesive sheet, and the adhesive layer can be transferred to another substrate.

藉由將本發明所使用之接著劑組成物,依常規方法塗布於各種疊層體並乾燥,可獲得本發明之接著片。又,乾燥後將脫模基材貼附於接著劑層的話,可不造成朝基材背面的轉移而進行捲繞,作業性優異,同時接著劑層受到保護,故保存性優異,使用亦容易。又,塗布於脫模基材並乾燥後,視需要貼附另外的脫模基材的話,亦可將接著劑層其本身轉印至其他基材。By applying the adhesive composition used in the present invention to various laminates according to a conventional method and drying, the adhesive sheet of the present invention can be obtained. In addition, if the release base material is attached to the adhesive layer after drying, it can be wound without transferring to the back of the base material, and the workability is excellent, and the adhesive layer is protected at the same time, so it has excellent storage properties and is easy to use. In addition, after coating on a release substrate and drying, if another release substrate is attached as necessary, the adhesive layer itself may be transferred to another substrate.

<脫模基材> 脫模基材並無特別限定,例如,可列舉於優質紙、牛皮紙、捲紙、玻璃紙等紙的兩面,設置黏土、聚乙烯、聚丙烯等填平劑的塗布層,進一步在其各塗布層之上塗布矽酮系、氟系、醇酸系脫模劑而成者。又,亦可列舉於聚乙烯、聚丙烯、乙烯-α-烯烴共聚物、丙烯-α-烯烴共聚物等各種烯烴膜單獨、及聚對苯二甲酸乙二酯等膜上塗布上述脫模劑而成者。由於脫模基材與接著劑層間的脫模力、矽酮會對電氣特性造成不良影響等理由,宜為於優質紙之兩面進行聚丙烯填平處理並於其上使用醇酸系脫模劑者、或於聚對苯二甲酸乙二酯上使用醇酸系脫模劑者較佳。<Release base material> The mold release base material is not particularly limited. For example, it can be exemplified on both sides of paper such as high-quality paper, kraft paper, roll paper, cellophane, etc., provided with a coating layer of a leveling agent such as clay, polyethylene, and polypropylene. Furthermore, a silicone-based, fluorine-based, and alkyd-based mold release agent is applied on each coating layer. In addition, various olefin films such as polyethylene, polypropylene, ethylene-α-olefin copolymer, propylene-α-olefin copolymer, etc. alone, and films such as polyethylene terephthalate are coated with the above-mentioned release agent. Become. Due to the demolding force between the mold release substrate and the adhesive layer, and the adverse effects of silicone on the electrical characteristics, it is advisable to apply polypropylene filling treatment on both sides of high-quality paper and use an alkyd mold release agent on it. It is better to use alkyd mold release agent on polyethylene terephthalate.

<印刷電路板> 本發明中之「印刷電路板」,係包含由形成導體電路之金屬箔與樹脂基材所形成的疊層體作為構成要素者。印刷電路板,例如,可使用覆金屬疊層體並利用減去(subtractive)法等以往公知的方法製造。係必要時將由金屬箔形成的導體電路部分性或全面性地使用表覆膜、網版印刷印墨等被覆之所謂撓性電路板(FPC)、扁平電纜、捲帶式自動接合(TAB)用電路板等的總稱。<Printed circuit board> The "printed circuit board" in the present invention includes a laminate composed of a metal foil forming a conductor circuit and a resin substrate as a constituent element. The printed circuit board can be manufactured by a conventionally known method such as a subtractive method using a metal-clad laminate, for example. It is used for so-called flexible circuit boards (FPC), flat cables, and tape-to-tape automatic bonding (TAB), which are partially or fully coated with surface film, screen printing ink, etc., if necessary. Generic term for circuit boards, etc.

本發明之印刷電路板,可為能被採用作為印刷電路板之任意的疊層構成。例如,可為由基材膜層、金屬箔層、接著劑層及表覆膜層之4層所構成的印刷電路板。又,例如可為由基材膜層、接著劑層、金屬箔層、接著劑層及表覆膜層之5層所構成的印刷電路板。The printed circuit board of the present invention may have any laminated structure that can be adopted as a printed circuit board. For example, it may be a printed circuit board composed of four layers of a base film layer, a metal foil layer, an adhesive layer, and a cover film layer. Also, for example, it may be a printed circuit board composed of five layers of a base film layer, an adhesive layer, a metal foil layer, an adhesive layer, and a surface coating film layer.

進一步,必要時亦可為將2個或3個以上之上述印刷電路板疊層而得的構成。Furthermore, if necessary, it can also be a structure which laminated|stacked two or more said printed circuit boards.

本發明所使用之接著劑組成物適合使用於印刷電路板之各接著劑層。特別是將本發明所使用之接著劑組成物作為接著劑使用的話,不僅是與構成印刷電路板之以往的聚醯亞胺、聚酯膜、銅箔,與LCP等低極性的樹脂基材亦具有高接著性,可獲得耐焊料回焊性,且接著劑層自身低介電特性優異。因此,適合作為表覆層膜、疊層板、附樹脂之銅箔及黏合片所使用之接著劑組成物。The adhesive composition used in the present invention is suitable for each adhesive layer of a printed circuit board. In particular, when the adhesive composition used in the present invention is used as an adhesive, it is not only compatible with conventional polyimide, polyester film, and copper foil constituting printed circuit boards, but also with low-polarity resin substrates such as LCP. It has high adhesion, can obtain solder reflow resistance, and the adhesive layer itself has excellent low dielectric properties. Therefore, it is suitable as an adhesive composition for surface coating films, laminates, copper foil with resin, and adhesive sheets.

本發明之印刷電路板中,就基材膜而言,可使用自以往既已作為印刷電路板之基材而使用之任意的樹脂膜。作為基材膜之樹脂,可例示聚酯樹脂、聚醯胺樹脂、聚醯亞胺樹脂、聚醯胺醯亞胺樹脂、液晶聚合物、聚苯硫醚、對排聚苯乙烯、聚烯烴系樹脂、及氟系樹脂等。特別是即使對於液晶聚合物、聚苯硫醚、對排聚苯乙烯、聚烯烴系樹脂等的低極性基材,亦具有優異的接著性。In the printed circuit board of the present invention, as the base film, any resin film that has been conventionally used as a base material of a printed circuit board can be used. As the resin of the base film, polyester resin, polyamide resin, polyimide resin, polyimide resin, liquid crystal polymer, polyphenylene sulfide, parapolystyrene, polyolefin series Resin, fluorine-based resin, etc. In particular, it has excellent adhesion even to low-polarity substrates such as liquid crystal polymer, polyphenylene sulfide, para-polystyrene, and polyolefin resin.

<表覆膜> 就表覆膜而言,可使用以往公知的任意絕緣膜作為印刷電路板用之絕緣膜。例如,可使用由聚醯亞胺、聚酯、聚苯硫醚、聚醚碸、聚醚醚酮、芳香族聚醯胺、聚碳酸酯、聚芳酯、聚醯亞胺、聚醯胺醯亞胺、液晶聚合物、對排聚苯乙烯、聚烯烴系樹脂等各種聚合物所製成的膜。聚醯亞胺膜或液晶聚合物膜為更佳。<Surface coating film> As for the surface coating film, any conventionally known insulating film can be used as an insulating film for a printed circuit board. For example, polyimide, polyester, polyphenylene sulfide, polyether ether, polyether ether ketone, aromatic polyamide, polycarbonate, polyarylate, polyimide, polyimide can be used. Films made of various polymers such as imines, liquid crystal polymers, parapolystyrene, and polyolefin resins. Polyimide film or liquid crystal polymer film is more preferable.

本發明之印刷電路板,除使用上述各層之材料以外,可使用以往公知的任意製程進行製造。The printed circuit board of the present invention can be manufactured using any conventionally known process in addition to the materials of the above-mentioned layers.

較佳之實施態様係製造於表覆膜層疊層接著劑層而成的半成品(以下稱為「表覆膜側半成品」)。另一方面,係製造於基材膜層疊層金屬箔層並形成所期望之電路圖案的半成品(以下稱為「基材膜側2層半成品」)、或於基材膜層疊層接著劑層且於其上疊層金屬箔層並形成所期望之電路圖案的半成品(以下稱為「基材膜側3層半成品」)(以下將基材膜側2層半成品與基材膜側3層半成品合稱為「基材膜側半成品」)。藉由將以此種方式所獲得之表覆膜側半成品與基材膜側半成品貼合,可獲得4層或5層之印刷電路板。A preferred embodiment is a semi-finished product (hereinafter referred to as "semi-finished product on the surface-coated film side") formed by laminating an adhesive layer on a surface coating film. On the other hand, it is a semi-finished product in which a metal foil layer is laminated on a base film and a desired circuit pattern is formed (hereinafter referred to as a "base film side two-layer semi-finished product"), or an adhesive layer is laminated on the base film and A semi-finished product (hereinafter referred to as "3-layer semi-finished product on the base film side") on which a metal foil layer is laminated and a desired circuit pattern is formed (hereinafter, a 2-layer semi-finished product on the substrate film side and a 3-layer semi-finished product on the substrate film side are combined Called "substrate film side semi-finished products"). By bonding the semi-finished product on the surface film side and the semi-finished product on the base film side obtained in this way, a 4-layer or 5-layer printed circuit board can be obtained.

基材膜側半成品,例如,可藉由包括以下步驟之製造方法而獲得:(A)於上述金屬箔塗布成為基材膜之樹脂的溶液,並將塗膜進行初步乾燥的步驟;(B)將(A)中所獲得之金屬箔與初步乾燥塗膜的疊層物進行熱處理・乾燥的步驟(以下稱為「熱處理・脫溶劑步驟」)。The semi-finished product on the substrate film side, for example, can be obtained by a manufacturing method including the following steps: (A) a step of coating the metal foil with a resin solution that becomes the substrate film, and performing preliminary drying of the coating film; (B) A step of heat-treating and drying the laminate of the metal foil and the preliminary dried coating film obtained in (A) (hereinafter referred to as "heat-treatment and solvent removal step").

金屬箔層中之電路的形成,可使用以往公知的方法。可使用加成法(additive),亦可使用減去法。減去法為較佳。For the formation of the circuit in the metal foil layer, a conventionally known method can be used. Additive and subtractive methods can be used. The subtraction method is better.

所獲得之基材膜側半成品,可直接使用在與表覆膜側半成品之貼合,又,亦可貼合脫模膜進行保存後,使用在與表覆膜側半成品之貼合。The obtained semi-finished product on the film side of the substrate can be directly used for bonding with the semi-finished product on the side of the surface covering film, and it can also be used for bonding with the semi-finished product on the side of surface covering film after being laminated with a release film.

表覆膜側半成品,例如,可於表覆膜塗布接著劑而製造。必要時,可進行所塗布之接著劑中的交聯反應。較佳實施態様中,係使接著劑層半硬化。The semi-finished product on the surface coating film side can be manufactured by applying an adhesive to the surface coating film, for example. If necessary, the crosslinking reaction in the applied adhesive can be carried out. In a preferred embodiment, the adhesive layer is semi-hardened.

所獲得之表覆膜側半成品,可直接使用在與基材膜側半成品之貼合,又,亦可貼合脫模膜進行保存後,使用在與基材膜側半成品之貼合。The obtained semi-finished product on the surface film side can be directly used for bonding with the semi-finished product on the substrate film side, or it can be used for bonding with the semi-finished product on the substrate film side after being pasted with a release film for storage.

基材膜側半成品與表覆膜側半成品,係分別例如以捲軸的形態保存後,進行貼合而製成印刷電路板。就貼合方法而言,可使用任意的方法,例如可使用壓製或滾軸等進行貼合。又,亦可藉由加熱壓製或使用加熱滾軸裝置等方法,邊加熱邊將兩者貼合。The semi-finished product on the base film side and the semi-finished product on the surface film side are stored in the form of a reel, for example, and then bonded together to produce a printed circuit board. As for the bonding method, any method can be used, for example, pressing or rollers can be used for bonding. In addition, it is also possible to bond the two while heating by heating and pressing or using a heating roller device.

補強材料側半成品,例如,如聚醯亞胺膜般柔軟且可捲繞之補強材料的情況下,於補強材料塗布接著劑而製造較理想。又,例如如以環氧樹脂使SUS、鋁等金屬板、玻璃纖維硬化而得之板等堅硬且無法捲繞之補強板的情況下,藉由將預先塗布於脫模基材之接著劑進行轉印塗布而製造較理想。又,必要時可進行所塗布之接著劑中的交聯反應。較佳實施態様中,係使接著劑層半硬化。The semi-finished product on the side of the reinforcing material, for example, in the case of a reinforcing material that is flexible and windable like a polyimide film, it is ideal to manufacture the reinforcing material by coating an adhesive. In addition, for example, in the case of hard and unwindable reinforcing plates such as metal plates such as SUS, aluminum, etc., and glass fibers that are hardened with epoxy resin, it is performed by applying an adhesive that is pre-coated on the release substrate. It is ideal for manufacturing by transfer coating. In addition, the crosslinking reaction in the applied adhesive can be performed when necessary. In a preferred embodiment, the adhesive layer is semi-hardened.

所獲得之補強材料側半成品,可直接使用在與印刷電路板背面之貼合,又,亦可貼合脫模膜進行保存後,使用在與基材膜側半成品之貼合。The obtained semi-finished product on the side of the reinforcing material can be directly used for bonding with the back of the printed circuit board, and it can also be used for bonding with the semi-finished product on the side of the base film after being laminated with a release film for storage.

基材膜側半成品、表覆膜側半成品、補強材料側半成品皆為本發明中之印刷電路板用疊層體。The semi-finished product on the base film side, the semi-finished product on the surface film side, and the semi-finished product on the reinforcing material side are all laminates for printed circuit boards in the present invention.

<實施例> 以下,列舉實施例對本發明進行更詳細地說明。但,本發明並不限定於實施例。實施例中及比較例中之簡稱份表示質量份。<Examples> Hereinafter, the present invention will be explained in more detail with examples. However, the present invention is not limited to the Examples. The abbreviated parts in the examples and comparative examples indicate parts by mass.

(物性評價方法)(Physical property evaluation method)

(酸值(A)成分:含有羧基之聚烯烴樹脂) 本發明中之酸值(當量/106 g),係使用FT-IR(島津製作所公司製、FT-IR8200PC),並利用馬來酸酐之羰基(C=O)鍵之伸縮峰部(1780cm-1 )的吸光度(I)、同排聚合物所特有之峰部(840cm-1 )的吸光度(II)、及由馬來酸酐(東京化成製)之氯仿溶液所作成之檢量線獲得的係數(f)根據下式算出,該算出的值以樹脂1ton中之當量(當量/106 g)表示。 酸值=[吸光度(I)/吸光度(II)×(f)/馬來酸酐的分子量×2×104 ] 馬來酸酐的分子量:98.06(Acid value (A) component: carboxyl group-containing polyolefin resin) The acid value (equivalent/10 6 g) in the present invention uses FT-IR (manufactured by Shimadzu Corporation, FT-IR8200PC) and uses maleic anhydride The absorbance (I) of the stretch peak (1780cm -1 ) of the carbonyl (C=O) bond, the absorbance (II) of the peak (840cm -1 ) unique to the same row of polymers, and the absorbance of maleic anhydride (Tokyo The coefficient (f) obtained from the calibration curve of the chloroform solution produced by Kasei Co., Ltd. is calculated according to the following formula, and the calculated value is expressed as the equivalent (equivalent/10 6 g) in 1 ton of resin. Acid value=[Absorbance (I)/Absorbance (II)×(f)/Molecular weight of maleic anhydride×2×10 4 ] Molecular weight of maleic anhydride: 98.06

(酸值(B)成分:含有羧基之苯乙烯樹脂) 本發明中之酸值(當量/106 g),係將含有羧基之苯乙烯樹脂溶解於甲苯,並在甲醇鈉之甲醇溶液中以酚酞作為指示劑進行滴定。以樹脂1ton中之當量(當量/106 g)表示。(Acid value of component (B): the carboxyl group-containing styrene resin) of the present invention, the acid value (eq / 10 6 g), a styrene-based resin containing a carboxyl group dissolved in toluene, and to the solution of sodium methoxide in methanol Phenolphthalein is used as an indicator for titration. It is expressed as the equivalent weight in 1 ton of resin (equivalent weight/10 6 g).

(重量平均分子量(Mw)) 本發明中之重量平均分子量係利用凝膠滲透層析法(以下稱GPC,標準物質:聚苯乙烯樹脂,移動相:四氫呋喃)測得的值。(Weight average molecular weight (Mw)) The weight average molecular weight in the present invention is a value measured by gel permeation chromatography (hereinafter referred to as GPC, standard material: polystyrene resin, mobile phase: tetrahydrofuran).

(1)剝離強度(接著性) 以使乾燥後之厚度成為25μm的方式,將後述接著劑組成物塗布於厚度12.5μm之聚醯亞胺膜(Kaneka股份有限公司製、Apical)、或厚度25μm之LCP膜(KURARAY股份有限公司製、Vecstar),並在130℃乾燥3分鐘。將如此獲得之接著性膜(B階段品)與18μm之壓延銅箔貼合。貼合係以使壓延銅箔之光澤面與接著劑接觸的方式進行,在160℃於40kgf/cm2 之加壓下壓製30秒而接著。然後在140℃熱處理4小時而使其硬化,得到剝離強度評價用樣品。剝離強度係於25℃拉伸膜,以拉伸速度50mm/min進行90°剝離試驗並測定剝離強度。該試驗係表示於常溫的接著強度。 <評價基準> ◎:1.0N/mm以上 ○:0.8N/mm以上未達1.0N/mm △:0.5N/mm以上未達0.8N/mm ×:未達0.5N/mm(1) Peel strength (adhesiveness) The adhesive composition described later is applied to a polyimide film (manufactured by Kaneka Co., Ltd., Apical) with a thickness of 12.5 μm or a thickness of 25 μm so that the thickness after drying becomes 25 μm LCP film (manufactured by KURARAY Co., Ltd., Vecstar), and dried at 130°C for 3 minutes. The adhesive film (B-stage product) thus obtained was bonded to 18 μm rolled copper foil. The bonding was performed so that the glossy surface of the rolled copper foil was brought into contact with the adhesive, and pressed at 160° C. under a pressure of 40 kgf/cm 2 for 30 seconds, and then adhered. Then, it was heat-treated at 140°C for 4 hours to be hardened, and a sample for peel strength evaluation was obtained. The peel strength is to stretch the film at 25°C, and perform a 90° peel test at a tensile speed of 50 mm/min to measure the peel strength. This test indicates the bonding strength at room temperature. <Evaluation criteria> ◎: 1.0N/mm or more ○: 0.8N/mm or more and less than 1.0N/mm △: 0.5N/mm or more and less than 0.8N/mm ×: less than 0.5N/mm

(2)乾燥焊料耐熱性 利用與上述相同的方法製作樣品,將2.0cm×2.0cm之樣品片於120℃進行30分鐘乾燥處理,並於各溫度在熔融的焊料浴中流動1分鐘,測定不會引起膨起等外觀變化的溫度。 <評價基準> ◎:310℃以上 ○:300℃以上未達310℃ △:290℃以上未達300℃ ×:未達290℃(2) Heat resistance of dry solder. Samples were prepared by the same method as above. A sample piece of 2.0cm×2.0cm was dried at 120°C for 30 minutes, and then flowed in a molten solder bath at each temperature for 1 minute. The temperature that causes changes in appearance such as swelling. <Evaluation criteria> ◎: 310°C or higher ○: 300°C or higher and less than 310°C △: 290°C or more and less than 300°C ×: Less than 290°C

(3)加濕焊料耐熱性 利用與上述相同的方法製作樣品,將2.0cm×2.0cm之樣品片進行40℃×80RH%×72小時處理,並於各溫度在熔融的焊料浴中流動1分鐘,測定不會引起膨起等外觀變化的溫度。 <評價基準> ◎:260℃以上 ○:250℃以上未達260℃ △:240℃以上未達250℃ ×:未達240℃(3) Heat resistance of humidified solder. Samples are made by the same method as above, and the 2.0cm×2.0cm sample piece is processed at 40℃×80RH%×72 hours, and flows in the molten solder bath for 1 minute at each temperature , Measure the temperature that does not cause changes in appearance such as swelling. <Evaluation criteria> ◎: 260°C or higher ○: 250°C or higher and less than 260°C △: 240°C or more and less than 250°C ×: less than 240°C

(4)相對介電常數(εc )及介電正切(tanδ) 以使乾燥硬化後之厚度成為25μm的方式,將後述接著劑組成物塗布於厚度35μm之電解銅箔之光澤面,並在130℃乾燥3分鐘。然後在140℃熱處理4小時使其硬化,而得到試驗用之覆銅疊層板。於所獲得之試驗用覆銅疊層板之已硬化的接著劑組成物面,利用網版印刷塗布蒸發乾固型的導電性銀糊劑成為直徑50mm的圓形,並在120℃乾燥30分鐘使其硬化,進一步於導電性銀糊劑所形成之圓的中央,利用導電性接著劑接著長度30mm的引線,得到平行平板電容器。使用PRECISION LCR meter HP-4284A,在22℃下以頻率1MHz之條件測定所獲得之平行平板電容器的靜電電容Cap與損耗係數D(介電正切),並根據下式算出相對介電常數(εc )。 εc =(Cap×d)/(S×ε0 ) 此處,Cap:靜電電容[F] d:介電體層厚度=25×10-6 [m] S:被測定介電體面積=π×(25×10-3 )2 ε0 :真空的介電常數 8.854×10-12 針對所獲得之相對介電常數、介電正切,如下述般進行評價。 <相對介電常數的評價基準> ◎:2.3以下 ○:超過2.3至2.6以下 △:超過2.6至3.0以下 ×:超過3.0 <介電正切的評價基準> ◎:0.005以下 ○:超過0.005至0.01以下 △:超過0.01至0.02以下 ×:超過0.02(4) Relative permittivity (ε c ) and dielectric tangent (tanδ) The adhesive composition described below is applied to the glossy surface of 35 μm electrolytic copper foil so that the thickness after drying and curing becomes 25 μm, and Dry at 130°C for 3 minutes. Then, it was heat-treated at 140°C for 4 hours to harden it to obtain a copper clad laminate for testing. On the hardened adhesive composition surface of the obtained copper-clad laminate for testing, screen printing was used to apply an evaporation-dry conductive silver paste into a circle with a diameter of 50 mm, and then dried at 120°C for 30 minutes It was cured, and a lead with a length of 30 mm was bonded with a conductive adhesive at the center of the circle formed by the conductive silver paste to obtain a parallel plate capacitor. Using PRECISION LCR meter HP-4284A, the capacitance Cap and the loss coefficient D (dielectric tangent) of the parallel plate capacitor obtained were measured at 22°C at a frequency of 1MHz, and the relative permittivity (ε c ) was calculated according to the following formula ). ε c =(Cap×d)/(S×ε 0 ) Here, Cap: electrostatic capacitance [F] d: thickness of dielectric layer = 25×10 -6 [m] S: area of measured dielectric = π ×(25×10 -3 ) 2 ε 0 : The dielectric constant of the vacuum 8.854×10 -12 The obtained relative dielectric constant and dielectric tangent were evaluated as follows. <Evaluation criteria of relative permittivity> ◎: 2.3 or less ○: more than 2.3 to 2.6 or less △: more than 2.6 to 3.0 or less ×: more than 3.0 <dielectric tangent evaluation criteria> ◎: 0.005 or less ○: more than 0.005 to 0.01 or less △: more than 0.01 to 0.02 or less ×: more than 0.02

(含有羧基之聚烯烴樹脂) [製造例1] 於1L高壓釜(autoclave)中,加入丙烯-丁烯共聚物(三井化學公司製「TAFMER(註冊商標)XM7080」)100質量份、甲苯150質量份及馬來酸酐19質量份、二-第三丁基過氧化物6質量份,升溫至140℃後,進一步攪拌3小時。之後,將所獲得之反應液冷卻後,注入裝有大量甲乙酮的容器中並使樹脂析出。然後,藉由離心分離該含有樹脂之溶液,將馬來酸酐接枝聚合而得的酸改性丙烯-丁烯共聚物,與(聚)馬來酸酐及低分子量物進行分離、純化。其後,藉由於減壓下、70℃使其乾燥5小時,得到馬來酸酐改性丙烯-丁烯共聚物(CO-1、酸值410當量/106 g、重量平均分子量60,000、Tm80℃、△H35J/g)。(Carboxyl group-containing polyolefin resin) [Manufacturing Example 1] In a 1L autoclave, 100 parts by mass of propylene-butene copolymer ("TAFMER (registered trademark) XM7080" manufactured by Mitsui Chemicals Co., Ltd.) and 150 mass parts of toluene were added Parts, 19 parts by mass of maleic anhydride, and 6 parts by mass of di-tert-butyl peroxide were heated to 140° C., and then stirred for further 3 hours. Then, after cooling the obtained reaction liquid, it was poured into a container containing a large amount of methyl ethyl ketone and the resin was precipitated. Then, by centrifugal separation of the resin-containing solution, the acid-modified propylene-butene copolymer obtained by graft polymerization of maleic anhydride is separated and purified from (poly)maleic anhydride and low molecular weight products. Thereafter, it was dried for 5 hours at 70°C under reduced pressure to obtain a maleic anhydride modified propylene-butene copolymer (CO-1, acid value 410 equivalent/10 6 g, weight average molecular weight 60,000, Tm 80°C , △H35J/g).

[製造例2] 將馬來酸酐的添加量變更為11質量份,除此以外,利用與製造例1同樣的方法,得到馬來酸酐改性丙烯-丁烯共聚物(CO-2、酸值220當量/106 g、重量平均分子量65,000、Tm78℃、△H25J/g)。[Production Example 2] Except that the amount of maleic anhydride added was changed to 11 parts by mass, the same method as that of Production Example 1 was used to obtain a maleic anhydride modified propylene-butene copolymer (CO-2, acid value 220 equivalent/10 6 g, weight average molecular weight 65,000, Tm78°C, △H25J/g).

[實施例1] 在配備有水冷回流冷凝器與攪拌器的500mL四口燒瓶中,加入製造例1所獲得之馬來酸酐改性丙烯-丁烯共聚物(CO-1)80質量份、含有羧基之苯乙烯樹脂(Tuftec(註冊商標)M1943)20質量份、甲苯500質量份,邊攪拌邊升溫至80℃,藉由持續攪拌1小時而溶解。於冷卻獲得之溶液中,摻合5質量份碳二亞胺樹脂V-05、10質量份環氧樹脂HP-7200,得到接著劑組成物。摻合量、接著強度、焊料耐熱性、電氣特性顯示於表1中。[Example 1] In a 500 mL four-neck flask equipped with a water-cooled reflux condenser and a stirrer, 80 parts by mass of the maleic anhydride modified propylene-butene copolymer (CO-1) obtained in Production Example 1 was added, containing 20 parts by mass of carboxyl-based styrene resin (Tuftec (registered trademark) M1943) and 500 parts by mass of toluene were heated to 80° C. while stirring, and the stirring was continued for 1 hour to dissolve. In the solution obtained by cooling, 5 parts by mass of carbodiimide resin V-05 and 10 parts by mass of epoxy resin HP-7200 are blended to obtain an adhesive composition. The blending amount, adhesive strength, solder heat resistance, and electrical properties are shown in Table 1.

[實施例2~10] 將含有羧基之聚烯烴樹脂(A)、含有羧基之苯乙烯樹脂(B)、碳二亞胺樹脂(C)、環氧樹脂(D)如表1所示進行變更,利用與實施例1同樣的方法實施實施例2~14,使其變更成為表1所示之各摻合量。接著強度、焊料耐熱性、電氣特性顯示於表1中。[Examples 2-10] The polyolefin resin (A) containing carboxyl group, styrene resin (B) containing carboxyl group, carbodiimide resin (C), and epoxy resin (D) were changed as shown in Table 1 , Examples 2-14 were implemented by the same method as Example 1, and they were changed to each blending amount shown in Table 1. The subsequent strength, solder heat resistance, and electrical characteristics are shown in Table 1.

[表1]

Figure 105114487-A0304-0001
[Table 1]
Figure 105114487-A0304-0001

[比較例1~7] 將含有羧基之聚烯烴樹脂(A)、含有羧基之苯乙烯樹脂(B)、碳二亞胺樹脂(C)、環氧樹脂(D)如表2所示進行變更,利用與實施例1同樣的方法實施比較例1~7,使其變更成為表2所示之各摻合量。摻合量、接著強度、焊料耐熱性、電氣特性顯示於表2中。[Comparative Examples 1-7] The polyolefin resin (A) containing carboxyl group, styrene resin (B) containing carboxyl group, carbodiimide resin (C), and epoxy resin (D) were changed as shown in Table 2 In the same manner as in Example 1, Comparative Examples 1 to 7 were implemented, and the blending amounts shown in Table 2 were changed. The blending amount, adhesive strength, solder heat resistance, and electrical properties are shown in Table 2.

[表2]

Figure 105114487-A0304-0002
[Table 2]
Figure 105114487-A0304-0002

表1、2中所使用之聚烯烴樹脂、含有羧基之苯乙烯樹脂(B)、碳二亞胺樹脂(C)、環氧樹脂(D)係如以下者。 含有羧基之苯乙烯樹脂:Tuftec(註冊商標)M1911(旭化成化學公司製) 含有羧基之苯乙烯樹脂:Tuftec(註冊商標)M1913(旭化成化學公司製) 含有羧基之苯乙烯樹脂:Tuftec(註冊商標)M1943(旭化成化學公司製) 聚烯烴樹脂:TAFMER(註冊商標)XM7080(三井化學公司製) 苯乙烯樹脂:Tuftec(註冊商標)H1052(旭化成化學公司製) 含有羧基之丙烯腈-丁二烯橡膠NBR(JSR股份有限公司製) 碳二亞胺樹脂:V-05(日清紡化學公司製) 碳二亞胺樹脂:V-03(日清紡化學公司製) 鄰甲酚酚醛型環氧樹脂:YDCN-700-10(新日鐵住金化學公司製) 二環戊二烯型環氧樹脂:HP-7200(DIC公司製)The polyolefin resin, carboxyl group-containing styrene resin (B), carbodiimide resin (C), and epoxy resin (D) used in Tables 1 and 2 are as follows. Styrene resin containing carboxyl group: Tuftec (registered trademark) M1911 (manufactured by Asahi Kasei Chemical Co., Ltd.) Styrene resin containing carboxyl group: Tuftec (registered trademark) M1913 (manufactured by Asahi Kasei Chemical Co., Ltd.) Styrene resin containing carboxyl group: Tuftec (registered trademark) M1943 (manufactured by Asahi Kasei Chemical Co., Ltd.) Polyolefin resin: TAFMER (registered trademark) XM7080 (manufactured by Mitsui Chemicals Co., Ltd.) Styrene resin: Tuftec (registered trademark) H1052 (manufactured by Asahi Kasei Chemical Co., Ltd.) Acrylonitrile-butadiene rubber NBR containing carboxyl groups (Manufactured by JSR Co., Ltd.) Carbodiimide resin: V-05 (manufactured by Nisshinbo Chemical Co., Ltd.) Carbodiimide resin: V-03 (manufactured by Nisshinbo Chemical Co., Ltd.) Ortho-cresol novolac epoxy resin: YDCN-700- 10 (manufactured by Nippon Steel & Sumikin Chemical Co., Ltd.) Dicyclopentadiene epoxy resin: HP-7200 (manufactured by DIC Corporation)

由表1可知:實施例1~14中,和聚醯亞胺(PI)與銅箔具有優異的接著性、焊料耐熱性,同時和液晶聚合物(LCP)與銅箔亦具有優異的接著性、焊料耐熱性。又,關於接著劑組成物的電氣特性,介電常數、介電正切皆低,係良好。反觀由表2可知:比較例1中未摻合含有羧基之苯乙烯樹脂,故加濕焊料耐熱性、接著強度差。比較例2中未摻合含有羧基之聚烯烴樹脂,故交聯密度低,加濕焊料耐熱性差。比較例3中聚烯烴樹脂不含羧基,故交聯密度低,加濕焊料耐熱性差。比較例4中苯乙烯樹脂不含羧基,故交聯密度低,加濕焊料耐熱性差。比較例5中未摻合碳二亞胺樹脂,故與LCP界面的相互作用小,接著強度低。比較例6中未摻合環氧樹脂,故交聯密度低,焊料耐熱性差。比較例7中未摻合聚烯烴樹脂、苯乙烯樹脂,故接著劑組成物的低介電特性差。 [產業上利用性]It can be seen from Table 1 that in Examples 1-14, polyimide (PI) and copper foil have excellent adhesion and solder heat resistance, and liquid crystal polymer (LCP) and copper foil also have excellent adhesion , Solder heat resistance. In addition, regarding the electrical properties of the adhesive composition, both the dielectric constant and the dielectric tangent are low, which is good. On the other hand, it can be seen from Table 2: Comparative Example 1 did not incorporate a carboxyl group-containing styrene resin, so the heat resistance and adhesive strength of the humidified solder were poor. In Comparative Example 2, a polyolefin resin containing a carboxyl group was not blended, so the crosslink density was low, and the heat resistance of the humidified solder was poor. In Comparative Example 3, the polyolefin resin does not contain a carboxyl group, so the crosslink density is low, and the humidified solder has poor heat resistance. In Comparative Example 4, the styrene resin does not contain a carboxyl group, so the crosslink density is low, and the heat resistance of the humidified solder is poor. In Comparative Example 5, the carbodiimide resin was not blended, so the interaction with the LCP interface was small, and the bonding strength was low. In Comparative Example 6, no epoxy resin was blended, so the crosslinking density was low and the solder heat resistance was poor. In Comparative Example 7, no polyolefin resin or styrene resin was blended, so the adhesive composition had poor low dielectric properties. [Industrial availability]

根據本發明,可提供一種疊層體,不僅是與以往的聚醯亞胺、聚對苯二甲酸乙二酯膜,與LCP等具有低介電特性之樹脂基材、銅箔等金屬基材亦具有高接著性,可獲得高焊料耐熱性,且低介電特性優異。基於上述特性,在可撓性印刷電路板用途,特別是要求於高頻區域之低介電特性(低介電常數、低介電正切)的FPC用途係有用。According to the present invention, it is possible to provide a laminated body that is not only compatible with conventional polyimide and polyethylene terephthalate films, but also with LCP and other low-dielectric resin substrates, copper foils and other metal substrates. It also has high adhesiveness, high solder heat resistance, and excellent low dielectric properties. Based on the above characteristics, it is useful for flexible printed circuit board applications, especially FPC applications that require low dielectric properties (low dielectric constant, low dielectric tangent) in the high-frequency region.

Claims (11)

一種疊層體(Z),係樹脂基材及金屬基材介由接著劑層疊層而成;該接著劑層含有含羧基之聚烯烴樹脂(A)及碳二亞胺樹脂(C);其特徵為:(1)接著劑層之於頻率1MHz的相對介電常數(εc)為3.0以下,(2)接著劑層之於頻率1MHz的介電正切(tanδ)為0.02以下,(3)樹脂基材與金屬基材間的剝離強度為0.5N/mm以上,(4)疊層體(Z)之加濕焊料耐熱性為240℃以上。 A laminated body (Z) comprising a resin base material and a metal base material laminated through an adhesive; the adhesive layer contains a carboxyl group-containing polyolefin resin (A) and a carbodiimide resin (C); The characteristics are: (1) the relative dielectric constant (ε c ) of the adhesive layer at a frequency of 1MHz is 3.0 or less, (2) the dielectric tangent (tanδ) of the adhesive layer at a frequency of 1MHz is 0.02 or less, (3) The peel strength between the resin base material and the metal base material is 0.5 N/mm or more, and (4) the heat resistance of the humidified solder of the laminate (Z) is 240° C. or more. 一種疊層體(X),係樹脂基材及金屬基材介由接著劑層疊層而成的疊層體(Z)所使用之該接著劑層與該樹脂基材的疊層體;該接著劑層含有含羧基之聚烯烴樹脂(A)及碳二亞胺樹脂(C);其特徵為:(1)接著劑層之於頻率1MHz的相對介電常數(εc)為3.0以下,(2)接著劑層之於頻率1MHz的介電正切(tanδ)為0.02以下,(3)於疊層體(X)之接著劑層面疊層金屬基材時,該疊層體中之樹脂基材與金屬基材間的剝離強度為0.5N/mm以上,(4)於疊層體(X)之接著劑層面疊層金屬基材時,該疊層體之加濕焊料耐熱性為240℃以上。 A laminate (X), a laminate of the adhesive layer and the resin substrate used in a laminate (Z) in which a resin substrate and a metal substrate are laminated via an adhesive; the adhesive The agent layer contains carboxyl group-containing polyolefin resin (A) and carbodiimide resin (C); it is characterized by: (1) The relative dielectric constant (ε c ) of the adhesive layer at a frequency of 1 MHz is 3.0 or less, ( 2) The dielectric tangent (tanδ) of the adhesive layer at a frequency of 1MHz is 0.02 or less, (3) When the metal substrate is laminated on the adhesive layer of the laminate (X), the resin substrate in the laminate The peel strength between the metal substrate and the metal substrate is 0.5N/mm or more. (4) When the metal substrate is laminated on the adhesive layer of the laminate (X), the heat resistance of the humidified solder of the laminate is 240°C or more . 一種疊層體(Y),係樹脂基材及金屬基材介由接著劑層疊層而成的疊層體(Z)所使用之該接著劑層與該金屬基材的疊層體;該接著劑層含有含羧基之聚烯烴樹脂(A)及碳二亞胺樹脂(C);其特徵為:(1)接著劑層之於頻率1MHz的相對介電常數(εc)為3.0以下,(2)接著劑層之於頻率1MHz的介電正切(tanδ)為0.02以下,(3)於疊層體(Y)之接著劑層面疊層樹脂基材時,該疊層體中之樹脂基材與金屬基材間的剝離強度為0.5N/mm以上,(4)於疊層體(Y)之接著劑層面疊層樹脂基材時,該疊層體之加濕焊料耐熱性為240℃以上。 A laminate (Y), a laminate of the adhesive layer and the metal substrate used in a laminate (Z) formed by laminating a resin substrate and a metal substrate via an adhesive; the adhesive The agent layer contains carboxyl group-containing polyolefin resin (A) and carbodiimide resin (C); it is characterized by: (1) The relative dielectric constant (ε c ) of the adhesive layer at a frequency of 1 MHz is 3.0 or less, ( 2) The dielectric tangent (tanδ) of the adhesive layer at a frequency of 1MHz is 0.02 or less, (3) When the resin substrate is laminated on the adhesive layer of the laminate (Y), the resin substrate in the laminate The peel strength with the metal substrate is 0.5N/mm or more. (4) When the resin substrate is laminated on the adhesive layer of the laminate (Y), the heat resistance of the humidified solder of the laminate is 240°C or higher . 一種接著劑層,係樹脂基材及金屬基材介由接著劑層疊層而成的疊層體(Z)所使用之該接著劑層;該接著劑層含有含羧基之聚烯烴樹脂(A)及碳二亞胺樹脂(C);其特徵為:(1)接著劑層之於頻率1MHz的相對介電常數(εc)為3.0以下,(2)接著劑層之於頻率1MHz的介電正切(tanδ)為0.02以下,(3)於接著劑層之其中一面疊層樹脂基材,於另一面疊層金屬基材時,該疊層體中之樹脂基材與金屬基材間的剝離強度為0.5N/mm以上,(4)於接著劑層之其中一面疊層樹脂基材,於另一面疊層金屬基材時,該疊層體之加濕焊料耐熱性為240℃以上。 An adhesive layer, which is used in a laminate (Z) formed by laminating a resin substrate and a metal substrate via an adhesive; the adhesive layer contains a carboxyl group-containing polyolefin resin (A) And carbodiimide resin (C); characterized in that: (1) the relative dielectric constant (ε c ) of the adhesive layer at a frequency of 1MHz is 3.0 or less, (2) the dielectric constant of the adhesive layer at a frequency of 1MHz The tangent (tanδ) is 0.02 or less, (3) when the resin substrate is laminated on one side of the adhesive layer and the metal substrate is laminated on the other side, the peeling between the resin substrate and the metal substrate in the laminate The strength is 0.5N/mm or more. (4) When the resin substrate is laminated on one side of the adhesive layer and the metal substrate is laminated on the other side, the heat resistance of the wetted solder of the laminate is 240°C or more. 一種疊層體(Z),係樹脂基材及金屬基材介由接著劑層疊層而成;該接著劑層含有含羧基之聚烯烴樹脂(A),更含有含羧基之苯乙烯樹脂(B)、碳二亞胺樹脂(C)及環氧樹脂(D);該碳二亞胺樹脂(C)之含量相對於含羧基之聚烯烴樹脂(A)與含羧基之苯乙烯樹脂(B)之合計100質量份,為0.1~30質量份之範圍;該環氧樹脂(D)之含量相對於含羧基之聚烯烴樹脂(A)與含羧基之苯乙烯樹脂(B)之合計100質量份,為1~30質量份之範圍。 A laminate (Z), a resin base material and a metal base material laminated through an adhesive; the adhesive layer contains a carboxyl-containing polyolefin resin (A), and further contains a carboxyl-containing styrene resin (B ), carbodiimide resin (C) and epoxy resin (D); the content of the carbodiimide resin (C) is relative to the carboxyl-containing polyolefin resin (A) and carboxyl-containing styrene resin (B) A total of 100 parts by mass is in the range of 0.1-30 parts by mass; the content of the epoxy resin (D) is relative to the total 100 parts by mass of the carboxyl-containing polyolefin resin (A) and the carboxyl-containing styrene resin (B) , Is the range of 1-30 parts by mass. 一種疊層體(X),係樹脂基材及金屬基材介由接著劑層疊層而成的疊層體(Z)所使用之該接著劑層與該樹脂基材的疊層體;該接著劑層含有含羧基之聚烯烴樹脂(A),更含有含羧基之苯乙烯樹脂(B)、碳二亞胺樹脂(C)及環氧樹脂(D);該碳二亞胺樹脂(C)之含量相對於含羧基之聚烯烴樹脂(A)與含羧基之苯乙烯樹脂(B)之合計100質量份,為0.1~30質量份之範圍;該環氧樹脂(D)之含量相對於含羧基之聚烯烴樹脂(A)與含羧基之苯乙烯樹脂(B)之合計100質量份,為1~30質量份之範圍。 A laminate (X), a laminate of the adhesive layer and the resin substrate used in a laminate (Z) in which a resin substrate and a metal substrate are laminated via an adhesive; the adhesive The agent layer contains carboxyl-containing polyolefin resin (A), and carboxyl-containing styrene resin (B), carbodiimide resin (C) and epoxy resin (D); the carbodiimide resin (C) The content of carboxyl-containing polyolefin resin (A) and carboxyl-containing styrene resin (B) total 100 parts by mass, in the range of 0.1-30 parts by mass; the content of epoxy resin (D) is relative to the The total of 100 parts by mass of the carboxyl group-containing polyolefin resin (A) and carboxyl group-containing styrene resin (B) is in the range of 1-30 parts by mass. 一種疊層體(Y),係樹脂基材及金屬基材介由接著劑層疊層而成的疊層體(Z)所使用之該接著劑層與該金屬基材的疊層體;該接著劑層含有含羧基之聚烯烴樹脂(A),更含有含羧基之苯乙烯樹脂(B)、碳二亞胺樹脂(C)及環氧樹脂(D); 該碳二亞胺樹脂(C)之含量相對於含羧基之聚烯烴樹脂(A)與含羧基之苯乙烯樹脂(B)之合計100質量份,為0.1~30質量份之範圍;該環氧樹脂(D)之含量相對於含羧基之聚烯烴樹脂(A)與含羧基之苯乙烯樹脂(B)之合計100質量份,為1~30質量份之範圍。 A laminate (Y), a laminate of the adhesive layer and the metal substrate used in a laminate (Z) formed by laminating a resin substrate and a metal substrate via an adhesive; the adhesive The agent layer contains carboxyl-containing polyolefin resin (A), and carboxyl-containing styrene resin (B), carbodiimide resin (C) and epoxy resin (D); The content of the carbodiimide resin (C) is in the range of 0.1-30 parts by mass relative to the total 100 parts by mass of the carboxyl-containing polyolefin resin (A) and the carboxyl-containing styrene resin (B); the epoxy The content of the resin (D) is in the range of 1-30 parts by mass relative to 100 parts by mass of the total of the carboxyl-containing polyolefin resin (A) and the carboxyl-containing styrene resin (B). 一種接著劑層,係樹脂基材及金屬基材介由接著劑層疊層而成的疊層體(Z)所使用之該接著劑層;該接著劑層含有含羧基之聚烯烴樹脂(A),更含有含羧基之苯乙烯樹脂(B)、碳二亞胺樹脂(C)及環氧樹脂(D);該碳二亞胺樹脂(C)之含量相對於含羧基之聚烯烴樹脂(A)與含羧基之苯乙烯樹脂(B)之合計100質量份,為0.1~30質量份之範圍;該環氧樹脂(D)之含量相對於含羧基之聚烯烴樹脂(A)與含羧基之苯乙烯樹脂(B)之合計100質量份,為1~30質量份之範圍。 An adhesive layer, which is used in a laminate (Z) formed by laminating a resin substrate and a metal substrate via an adhesive; the adhesive layer contains a carboxyl group-containing polyolefin resin (A) , It also contains carboxyl-containing styrene resin (B), carbodiimide resin (C) and epoxy resin (D); the content of the carbodiimide resin (C) is relative to the carboxyl-containing polyolefin resin (A) ) And carboxyl-containing styrene resin (B) total 100 parts by mass, in the range of 0.1-30 parts by mass; the content of the epoxy resin (D) is relative to the carboxyl-containing polyolefin resin (A) and carboxyl-containing The total 100 parts by mass of the styrene resin (B) is in the range of 1-30 parts by mass. 一種接著劑組成物,含有含羧基之聚烯烴樹脂(A)、含羧基之苯乙烯樹脂(B)、碳二亞胺樹脂(C)及環氧樹脂(D);該碳二亞胺樹脂(C)之含量相對於含羧基之聚烯烴樹脂(A)與含羧基之苯乙烯樹脂(B)之合計100質量份,為0.1~30質量份之範圍;該環氧樹脂(D)之含量相對於含羧基之聚烯烴樹脂(A)與含羧基之苯乙烯樹脂(B)之合計100質量份,為1~30質量份之範圍。 An adhesive composition containing carboxyl-containing polyolefin resin (A), carboxyl-containing styrene resin (B), carbodiimide resin (C) and epoxy resin (D); the carbodiimide resin ( The content of C) is in the range of 0.1-30 parts by mass relative to the total 100 parts by mass of the carboxyl-containing polyolefin resin (A) and carboxyl-containing styrene resin (B); the content of the epoxy resin (D) is relative The total 100 parts by mass of the carboxyl-containing polyolefin resin (A) and the carboxyl-containing styrene resin (B) is in the range of 1-30 parts by mass. 一種接著片,含有如申請專利範圍第1項之疊層體(Z)、如申請專利範圍第2項之疊層體(X)、如申請專利範圍第3項之疊層體(Y)或如申請專利範圍第4項之接著劑層。 An adhesive sheet containing, for example, the laminated body (Z) of the first patent application, the laminated body (X) of the second patent application, the laminated body (Y) of the third patent application, or Such as the adhesive layer of item 4 in the scope of patent application. 一種印刷電路板,包含如申請專利範圍第10項之接著片作為構成要素。 A printed circuit board that contains the adhesive sheet as described in item 10 of the scope of patent application as a constituent element.
TW105114487A 2015-05-15 2016-05-11 Laminated body including low dielectric adhesive layer TWI697532B (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2015-099766 2015-05-15
JP2015099766 2015-05-15

Publications (2)

Publication Number Publication Date
TW201702341A TW201702341A (en) 2017-01-16
TWI697532B true TWI697532B (en) 2020-07-01

Family

ID=57320234

Family Applications (1)

Application Number Title Priority Date Filing Date
TW105114487A TWI697532B (en) 2015-05-15 2016-05-11 Laminated body including low dielectric adhesive layer

Country Status (5)

Country Link
JP (2) JP6791131B2 (en)
KR (1) KR102160499B1 (en)
CN (1) CN107109182B (en)
TW (1) TWI697532B (en)
WO (1) WO2016185956A1 (en)

Families Citing this family (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI697532B (en) * 2015-05-15 2020-07-01 日商東洋紡股份有限公司 Laminated body including low dielectric adhesive layer
JP6537172B2 (en) * 2015-06-01 2019-07-03 住友電工プリントサーキット株式会社 Printed wiring board
KR102340014B1 (en) * 2016-08-09 2021-12-16 도요보 가부시키가이샤 Laminate Containing a Low-Dielectric Adhesive Layer
JP6930784B2 (en) * 2017-01-05 2021-09-01 住友電工プリントサーキット株式会社 Original board for printed wiring and printed wiring board
US11603466B2 (en) 2017-01-10 2023-03-14 Sumitomo Seika Chemicals Co.. Ltd. Epoxy resin composition
JP6934312B2 (en) * 2017-04-04 2021-09-15 Nok株式会社 Rubber metal laminates and gaskets
JP6984401B2 (en) * 2017-12-26 2021-12-22 Dic株式会社 Polyarylene sulfide resin composition, molded article, composite structure and manufacturing method
CN111936880B (en) * 2018-05-02 2024-01-02 三菱化学株式会社 Millimeter wave radar cover and millimeter wave radar module equipped with the cover
WO2019230445A1 (en) * 2018-05-28 2019-12-05 東洋紡株式会社 Low-dielectric adhesive composition
US20210317339A1 (en) 2018-09-06 2021-10-14 Riken Technos Corporation Hot-melt adhesive, reinforcing tape, and flexible flat cable having reinforced at conductor terminal with reinforcing tape
CN109666434B (en) * 2018-12-27 2021-09-10 苏州赛伍应用技术股份有限公司 Adhesive, preparation method, adhesive film containing adhesive, preparation method and application
CN114207068B (en) * 2019-09-06 2024-04-02 东洋纺Mc株式会社 Polyolefin adhesive composition
CN114555740B (en) * 2019-11-28 2024-01-05 东洋纺Mc株式会社 Adhesive films, laminates and printed wiring boards
CN114302933B (en) * 2019-12-04 2024-05-10 东洋纺Mc株式会社 Low dielectric laminate
CN114729246B (en) * 2019-12-23 2024-05-28 三井化学株式会社 Adhesive for electronic label and electronic label
CN114945465A (en) * 2020-01-16 2022-08-26 住友精化株式会社 Laminate comprising copper foil and epoxy resin composition layer
KR102324559B1 (en) * 2020-02-28 2021-11-10 (주)이녹스첨단소재 Bonding film, bonding film laminate comprising the same and metal clad laminate comprising the same
CN111393724A (en) * 2020-03-30 2020-07-10 广东生益科技股份有限公司 Resin composition, and prepreg and circuit material using same
WO2023163101A1 (en) * 2022-02-28 2023-08-31 富士フイルム株式会社 Laminate, wiring substate, and method for fabricating wiring substrate

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002235061A (en) * 2001-02-08 2002-08-23 Nitto Denko Corp Heat-reactive adhesive composition and heat-reactive adhesive film

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0771151B2 (en) 1985-06-27 1995-07-31 日本電気株式会社 Time-division switch speech path test method
JP4067144B2 (en) * 1996-08-20 2008-03-26 三井化学株式会社 Adhesive composition
JP2000104025A (en) * 1998-09-29 2000-04-11 Nisshinbo Ind Inc Film for flexible printed wiring boards
JP2000345132A (en) * 1999-06-01 2000-12-12 Nisshinbo Ind Inc LCP joining method
TWI255499B (en) * 2004-05-06 2006-05-21 Mitsui Chemicals Inc Adhesive film and manufacturing method of semiconductor device using the same
JP2010222408A (en) * 2009-03-19 2010-10-07 Panasonic Electric Works Co Ltd Resin composition for flexible printed wiring board, resin film, prepreg, metal foil with resin, flexible printed wiring board
WO2014147903A1 (en) 2013-03-22 2014-09-25 東亞合成株式会社 Adhesive composition, and coverlay film and flexible copper-clad laminate using same
TWI697532B (en) * 2015-05-15 2020-07-01 日商東洋紡股份有限公司 Laminated body including low dielectric adhesive layer

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002235061A (en) * 2001-02-08 2002-08-23 Nitto Denko Corp Heat-reactive adhesive composition and heat-reactive adhesive film

Also Published As

Publication number Publication date
TW201702341A (en) 2017-01-16
JP6984701B2 (en) 2021-12-22
CN107109182A (en) 2017-08-29
KR102160499B1 (en) 2020-09-28
WO2016185956A1 (en) 2016-11-24
JPWO2016185956A1 (en) 2018-03-01
JP2021000828A (en) 2021-01-07
KR20180008373A (en) 2018-01-24
JP6791131B2 (en) 2020-11-25
CN107109182B (en) 2019-06-07

Similar Documents

Publication Publication Date Title
TWI697532B (en) Laminated body including low dielectric adhesive layer
TWI749038B (en) Laminated body with low dielectric adhesive layer
TWI688474B (en) Low dielectric flame retardant adhesive composition
JP6761588B2 (en) Low Dielectric Adhesive Composition
TWI691566B (en) Low dielectric adhesive composition
JP6941308B2 (en) Low Dielectric Adhesive Composition
TW202130766A (en) Adhesive film, laminate, and printed wiring board
TW202242060A (en) Adhesive composition, and bonding sheet, multilayer body and printed wiring board each containing same