TWI684577B - Rupture system - Google Patents
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- TWI684577B TWI684577B TW105107173A TW105107173A TWI684577B TW I684577 B TWI684577 B TW I684577B TW 105107173 A TW105107173 A TW 105107173A TW 105107173 A TW105107173 A TW 105107173A TW I684577 B TWI684577 B TW I684577B
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- 239000000758 substrate Substances 0.000 claims abstract description 388
- 238000012546 transfer Methods 0.000 claims abstract description 128
- 238000007689 inspection Methods 0.000 claims abstract description 87
- 238000006073 displacement reaction Methods 0.000 claims description 8
- 230000003287 optical effect Effects 0.000 claims description 8
- 238000000926 separation method Methods 0.000 claims description 7
- 230000032258 transport Effects 0.000 description 33
- 238000010586 diagram Methods 0.000 description 16
- 238000003776 cleavage reaction Methods 0.000 description 12
- 230000007017 scission Effects 0.000 description 12
- 239000004973 liquid crystal related substance Substances 0.000 description 7
- 238000011084 recovery Methods 0.000 description 6
- 238000000034 method Methods 0.000 description 4
- 238000012545 processing Methods 0.000 description 4
- 238000001179 sorption measurement Methods 0.000 description 4
- 238000011144 upstream manufacturing Methods 0.000 description 4
- 230000015572 biosynthetic process Effects 0.000 description 3
- 238000005520 cutting process Methods 0.000 description 3
- 238000001514 detection method Methods 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 238000012805 post-processing Methods 0.000 description 3
- 239000003566 sealing material Substances 0.000 description 3
- 239000010409 thin film Substances 0.000 description 3
- 238000013459 approach Methods 0.000 description 2
- 238000005452 bending Methods 0.000 description 2
- 238000007664 blowing Methods 0.000 description 2
- 238000005336 cracking Methods 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 238000005406 washing Methods 0.000 description 2
- 238000009434 installation Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- 238000009751 slip forming Methods 0.000 description 1
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/133351—Manufacturing of individual cells out of a plurality of cells, e.g. by dicing
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- Mathematical Physics (AREA)
- Processing Of Stones Or Stones Resemblance Materials (AREA)
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- Re-Forming, After-Treatment, Cutting And Transporting Of Glass Products (AREA)
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Abstract
本發明提供一種能夠省略作業者之檢查作業,且能夠提高裂斷後之作業效率的裂斷系統。 The invention provides a breaking system which can omit the inspection work of the operator and can improve the working efficiency after breaking.
裂斷裝置18、21,裂斷貼合第1基板及第2基板而成之基板G2以生成基板單元G3。裂斷裝置18、21,在生成基板單元G3時,為了使形成於第2基板之端子露出,而實行裂斷與端子對向之第1基板之端部的步驟。藉由裂斷裝置18、21裂斷之端部,在基板單元G3之搬送過程中,從基板單元G3分離。檢查部25、29,檢查藉由將端部從基板單元G3分離而端子露出,使未露出端子之基板單元G3從搬送路徑脫離。 The breaking devices 18 and 21 break the substrate G2 formed by bonding the first substrate and the second substrate to generate the substrate unit G3. When generating the substrate unit G3, the cleaving devices 18 and 21 perform a step of cleaving the end of the first substrate facing the terminal in order to expose the terminal formed on the second substrate. The ends of the splitting devices 18 and 21 are separated from the substrate unit G3 during the transfer of the substrate unit G3. The inspection units 25 and 29 inspect the terminal unit by separating the end portion from the substrate unit G3 to expose the terminal, thereby detaching the substrate unit G3 without the terminal from the conveyance path.
Description
本發明係關於一種在將基板裂斷時使用之裂斷系統。 The present invention relates to a breaking system used when breaking a substrate.
一般而言,在液晶面板之製造步驟中,包含從貼合第1基板及第2基板而成之所謂的貼合基板切出成為液晶面板之原型的基板單元的裂斷步驟。例如,在第1基板形成濾色片(color filter),在第2基板形成用於驅動液晶之薄膜電晶體(TFT)及用於外部連接之端子。第2基板之端子,由於係為與外部機器連接之部分,因此必須露出。因此,在裂斷步驟中,除了包含分別沿著刻劃線裂斷第1基板與第2基板以生成基板單元之外形的步驟外,進一步地,為了使形成於第2基板之端子露出,亦包含沿著刻劃線裂斷與端子對向之第1基板之端部的步驟。 In general, the manufacturing process of a liquid crystal panel includes a cleaving step of cutting out a substrate unit that is a prototype of a liquid crystal panel from a so-called bonded substrate formed by bonding a first substrate and a second substrate. For example, a color filter is formed on the first substrate, and a thin film transistor (TFT) for driving liquid crystal and terminals for external connection are formed on the second substrate. The terminals of the second board must be exposed because they are connected to external equipment. Therefore, in the splitting step, in addition to the step of splitting the first substrate and the second substrate along the scribe line to form a substrate unit, further, in order to expose the terminals formed on the second substrate, It includes the step of breaking the end of the first substrate facing the terminal along the scribe line.
在以下之專利文獻1中,記載有在薄膜電晶體陣列(transistor array)基板與濾色片基板對向貼合而成之液晶基板中,藉由切斷端部並將其去除而使端子露出的液晶面板之切斷方法。 Patent Document 1 below describes that in a liquid crystal substrate in which a thin-film transistor array substrate and a color filter substrate are opposed to each other, the terminal is exposed by cutting and removing the ends The cutting method of the LCD panel.
專利文獻1:日本特開2003-241173號公報 Patent Document 1: Japanese Patent Laid-Open No. 2003-241173
以上述方法生成之基板單元,之後進一步被供應至研磨或洗淨等之後處理步驟。為了順暢地進行後處理步驟,必須在裂斷步驟中確實地去除第1基板之端部並露出基板單元之端子。因此,對作業者而言,必 須進行就每個基板單元檢查端子是否適當且正確地露出,並根據檢查結果區分出應供應至後處理步驟之基板單元的作業。 The substrate unit generated by the above method is then further supplied to post-processing steps such as grinding or washing. In order to smoothly perform the post-processing step, it is necessary to surely remove the end of the first substrate and expose the terminals of the substrate unit in the breaking step. Therefore, for the operator, must It is necessary to check whether the terminals are properly and correctly exposed for each substrate unit, and to distinguish the substrate units that should be supplied to the post-processing step according to the inspection results.
有鑑於該課題,本發明之目的在於提供一種能夠省略作業者之檢查作業,且能夠提高裂斷後之作業效率的裂斷系統。 In view of this problem, an object of the present invention is to provide a breaking system that can omit the inspection work of the operator and can improve the work efficiency after breaking.
本發明之主要態樣之裂斷系統,具備裂斷貼合第1基板及第2基板而成之基板以生成基板單元之裂斷裝置、用於將藉由該裂斷裝置而生成之該基板單元往後段裝置搬送之搬送部、及檢查藉由該裂斷裝置而生成之該基板單元之檢查部。該裂斷裝置,在生成該基板單元時,為了使形成於該第2基板之端子露出,而實行裂斷與該端子對向之該第1基板之端部的步驟;該搬送部,具備用於使藉由該裂斷裝置而裂斷之該端部在該基板單元之搬送過程中從該基板單元分離之分離手段;該檢查部,配置於該搬送部中的該基板單元之搬送路徑上之該分離手段之下游側,檢查藉由該分離手段從該基板單元分離該端部而該端子露出,使未露出該端子之該基板單元從該搬送路徑脫離。 The splitting system of the main aspect of the present invention includes a splitting device for splitting a substrate formed by bonding a first substrate and a second substrate to generate a substrate unit, and a substrate for generating the substrate by the splitting device A transfer unit for transferring the unit to the rear stage device, and an inspection unit for inspecting the substrate unit generated by the cleaving device. The cleaving device, when generating the substrate unit, performs a step of cleaving the end of the first substrate facing the terminal in order to expose the terminal formed on the second substrate; A separating means for separating the end portion broken by the breaking device from the substrate unit during the transportation of the substrate unit; the inspection portion is arranged on the transportation path of the substrate unit in the transportation portion On the downstream side of the separation means, it is checked that the end is separated from the substrate unit by the separation means and the terminal is exposed, so that the substrate unit that does not expose the terminal is detached from the conveyance path.
根據本態樣之裂斷系統,在藉由裂斷裝置而生成之基板單元往後段裝置搬送之搬送過程中,進行端部之相對於基板單元之分離、及其檢查,僅將端子適當且正確露出之基板單元自動地往後段裝置移送。因此,無需另外進行作業者就每個基板單元檢查端子是否適當且正確地露出,並根據檢查結果區分出應供應至後段裝置之基板單元的作業。由此,根據本態樣之裂斷系統,能夠於各段提高裂斷後之作業效率。 According to the splitting system of this aspect, during the transfer of the substrate unit generated by the splitting device to the subsequent device, the end is separated from the substrate unit and its inspection is performed, and only the terminals are properly and correctly exposed The substrate unit is automatically transferred to the rear device. Therefore, it is not necessary for the operator to separately check whether the terminals are properly and correctly exposed for each substrate unit, and to distinguish the operations of the substrate units to be supplied to the subsequent device according to the inspection result. Thus, according to the splitting system of this aspect, it is possible to improve the operating efficiency after splitting in each section.
在本態樣之裂斷系統中,可為以下之構成:該裂斷裝置,在該第1基板朝下之狀態下,裂斷該第1基板之端部;該分離手段,拾起已 裂斷該端部之該基板單元,使該基板單元之下面從搬送路徑離開。據此,由於在拾起基板單元時,端部藉由本身的重量而從基板單元分離,因此能夠自動地去除端部。 The fracturing system of this aspect may be constituted as follows: the fracturing device, in the state where the first substrate is facing down, fractures the end of the first substrate; the separating means, picks up the The substrate unit at the end is broken, and the lower surface of the substrate unit is separated from the conveyance path. According to this, since the end portion is separated from the substrate unit by its own weight when the substrate unit is picked up, the end portion can be automatically removed.
於該情形,可為以下之構成:該搬送部,使藉由該分離手段拾起之該基板單元表背面反轉並往該檢查部搬送。據此,由於在端子朝向上側之狀態下將基板單元往檢查部搬送,因此檢查部能夠從基板單元之上方檢查端子露出。據此,例如,在將基板單元載置於輸送帶以進行搬送的情形時,能夠在輸送帶上方之空出來的空間以精簡之構成容易地配置檢查部。 In this case, the following configuration may be adopted: The conveying section inverts the front and back surfaces of the substrate unit picked up by the separating means and conveys the inspection section. According to this, since the substrate unit is transported to the inspection section with the terminal facing upward, the inspection section can be exposed from the inspection terminal above the substrate unit. According to this, for example, when the substrate unit is placed on a conveyor belt for conveyance, it is possible to easily arrange the inspection section with a simplified structure in the empty space above the conveyor belt.
於該情形,可為以下之構成:該搬送部,具備使該基板單元在拾起後表背面反轉並進行移送之第1移送部、及接受已表背面反轉之該基板單元並往該檢查部搬送之第2移送部。據此,能夠順暢地進行基板單元之表背面反轉與往檢查部之轉移。 In this case, it may be configured as follows: the conveying section includes a first transfer section that reverses the front and back sides of the substrate unit after picking up and transfers the same, and receives the substrate unit that has been reversed from the front and back sides The second transfer unit transported by the inspection unit. According to this, the front and back of the substrate unit and the transfer to the inspection section can be smoothly performed.
於該情形,可為以下之構成:該第1移送部及該第2移送部,分別以保持部保持該基板單元並進行迴旋,該第1移送部之該保持部之迴旋路徑之一部分與該第2移送部之該保持部之迴旋路徑之一部分配置成在俯視觀察下互相重疊,在該二個迴旋路徑互相重疊之位置,將該基板單元從該第1移送部往該第2移送部轉移。據此,能夠精簡地整合第1移送部及第2移送部之配置空間,同時能將基板單元順暢地從第1移送部轉移至第2移送部。 In this case, the following configuration may be adopted: the first transfer part and the second transfer part respectively hold the substrate unit and rotate by the holding part, and a part of the rotation path of the holding part of the first transfer part and the A part of the turning path of the holding portion of the second transfer portion is arranged to overlap each other in a plan view, and at a position where the two turning paths overlap each other, the substrate unit is transferred from the first transfer portion to the second transfer portion . According to this, the arrangement space of the first transfer section and the second transfer section can be simplified, and the substrate unit can be smoothly transferred from the first transfer section to the second transfer section.
在本態樣之裂斷系統中,可為以下之構成:該檢查部,藉由光學式位移感測器偵測去除該端部而形成之缺口部之有無,藉此檢查該端 子適當且正確地露出。據此,能夠在不接觸基板單元之下檢查端子露出。 In the splitting system of this aspect, the following configuration may be adopted: the inspection section detects the presence or absence of the notch formed by removing the end by an optical displacement sensor, thereby inspecting the end The child is exposed properly and correctly. According to this, the exposed terminal can be inspected without contacting the substrate unit.
於該情形,可為以下之構成:該檢查部,使該光學式位移感測器沿橫切該缺口部之方向相對該基板單元相對移動,以檢查於該基板單元形成該缺口部。據此,與檢查基板單元整面的情形相比,能夠更有效率地檢查形成缺口部。 In this case, the configuration may be as follows: the inspection portion moves the optical displacement sensor relative to the substrate unit in a direction transverse to the notch portion to inspect the notch portion formed on the substrate unit. According to this, compared with the case of inspecting the entire surface of the substrate unit, it is possible to inspect the formation of the notch more efficiently.
於該情形,該搬送部,具備將該基板單元往該搬送路徑之下游搬送之輸送裝置,該輸送裝置之搬送方向設定為橫切該缺口部之方向,該檢查部,對藉由該輸送裝置搬送之該基板單元照射光以偵測該缺口部之有無。據此,由於無需為了檢查而另外設置使光學式位移感測器相對基板單元相對移動之手段,因此能夠謀求構成之精簡化。 In this case, the conveying section is provided with a conveying device that conveys the substrate unit downstream of the conveying path. The conveying direction of the conveying device is set to be transverse to the notch. The inspection section is equipped with the conveying device. The conveyed substrate unit irradiates light to detect the presence or absence of the notch. According to this, since it is not necessary to separately provide a means for relatively moving the optical displacement sensor relative to the substrate unit for inspection, it is possible to achieve a simplified structure.
如以上所述,根據本發明,能夠提供一種能省略作業者所進行之檢查作業,且可提高裂斷後之作業效率之裂斷系統。 As described above, according to the present invention, it is possible to provide a breaking system that can omit the inspection work performed by the operator and can improve the work efficiency after breaking.
本發明之效果及意義,藉由以下所示之實施形態之說明而更為清楚。但是,以下所示之實施形態,只不過是實施本發明時之一個例示,本發明並不限制於以下之實施形態記載之內容。 The effect and meaning of the present invention will be more clear from the description of the embodiments shown below. However, the embodiments shown below are only an example when implementing the present invention, and the present invention is not limited to the contents described in the following embodiments.
1‧‧‧裂斷系統 1‧‧‧Fracture system
18、21‧‧‧裂斷裝置 18.21‧‧‧Breaking device
19、22、26、30、34‧‧‧輸送裝置(搬送部) 19, 22, 26, 30, 34 ‧‧‧ Conveyor (Transport Department)
23、27‧‧‧旋轉移送部(搬送部、第1移送部) 23, 27‧‧‧Rotary transfer section (transfer section, first transfer section)
24、28‧‧‧旋轉移送部(搬送部、第2移送部) 24, 28‧‧‧Rotary transfer section (transfer section, second transfer section)
25、29‧‧‧檢查部 25, 29‧‧‧ Inspection Department
31、32‧‧‧移送部(搬送部) 31, 32‧‧‧ Transfer Department (Transport Department)
330‧‧‧驅動部(分離手段) 330‧‧‧Drive unit (separation means)
334、431‧‧‧吸附墊(保持部) 334,431‧‧‧Adsorption pad (holding part)
540‧‧‧感測器(光學式位移感測器) 540‧‧‧sensor (optical displacement sensor)
G2‧‧‧基板 G2‧‧‧ substrate
G2a‧‧‧端部 G2a‧‧‧End
G3‧‧‧基板單元 G3‧‧‧ substrate unit
G3a‧‧‧缺口部 G3a‧‧‧Notch
圖1,係顯示實施形態之裂斷系統之構成的示意圖。 FIG. 1 is a schematic diagram showing the structure of the cleavage system of the embodiment.
圖2,係顯示實施形態之基板裂斷之順序的圖。 Fig. 2 is a diagram showing the sequence of breaking the substrate in the embodiment.
圖3(a),係顯示實施形態之裂斷裝置之構成的側視圖;圖3(b)、(c)係分別顯示實施形態之第1基板及第2基板裂斷時之狀態的側視圖。 Fig. 3(a) is a side view showing the configuration of the breaking device of the embodiment; Figs. 3(b) and (c) are side views showing the state when the first substrate and the second substrate of the embodiment are broken, respectively .
圖4(a)、(b),係顯示實施形態之裂斷單元之從保持構件至基板側之構成 的剖面圖。 4(a) and (b) show the structure of the breaking unit of the embodiment from the holding member to the substrate side Section view.
圖5,係顯示實施形態之裂斷單元之構成的剖面圖。 Fig. 5 is a cross-sectional view showing the structure of the split unit according to the embodiment.
圖6(a)、(b),係詳細地顯示實施形態之基板裂斷的圖。 6(a) and (b) are diagrams showing the cracking of the substrate in the embodiment in detail.
圖7(a)、(b),係分別顯示實施形態之上游側及下游側之裂斷單元之構成的示意圖。 7(a) and (b) are schematic diagrams showing the structure of the upstream and downstream cleavage units of the embodiment, respectively.
圖8,係顯示實施形態之檢查對基板形成缺口部之構成的圖。 FIG. 8 is a diagram showing a configuration in which a notch is formed on a substrate in the inspection of the embodiment.
圖9(a)~(d),係顯示實施形態之檢查部之詳細構成的圖。 9(a) to (d) are diagrams showing the detailed structure of the inspection section of the embodiment.
圖10(a)~(d),係顯示實施形態之檢查部之構成的側視圖。 10(a) to (d) are side views showing the structure of the inspection section of the embodiment.
圖11,係顯示實施形態之裂斷系統所進行之處理的流程圖。 Fig. 11 is a flowchart showing the processing performed by the cleavage system of the embodiment.
圖12,係顯示變形例之檢查對基板形成缺口部之構成的圖。 FIG. 12 is a diagram showing the configuration of the inspection to form a notch on the substrate in the modification.
以下,針對本發明之實施形態,參照圖式進行說明。另外,在各圖中,為便於說明而標記相互正交之XYZ軸。X-Y平面係與水平面平行,而Z軸正方向係垂直上方向。 Hereinafter, embodiments of the present invention will be described with reference to the drawings. In addition, in each figure, XYZ axes orthogonal to each other are marked for convenience of explanation. The X-Y plane system is parallel to the horizontal plane, and the positive direction of the Z axis is perpendicular to the upward direction.
圖1,係顯示裂斷系統1之構成的示意圖。 FIG. 1 is a schematic diagram showing the structure of the fracturing system 1.
在裂斷系統1之上游側(X軸負側),設置用於對基板G1設置刻劃線之刻劃裝置(未圖示)。裂斷系統1,接受從刻劃裝置搬送來的基板G1,藉由對基板G1沿著刻劃線進行裂斷而生成基板G2,藉由對基板G2沿著刻劃線進行裂斷而生成液晶面板之原型的基板單元G3。 On the upstream side (negative X-axis side) of the cleavage system 1, a scribing device (not shown) for providing a scribing line to the substrate G1 is provided. The cleavage system 1 receives the substrate G1 transferred from the scoring device, generates the substrate G2 by cleaving the substrate G1 along the scribe line, and generates the liquid crystal by cleaving the substrate G2 along the scribe line The base unit G3 of the prototype of the panel.
基板G1,係供切出基板單元G3之母基板,且係由相互貼合第1基板與第2基板而成之所謂的貼合基板構成。在第1基板,形成濾色片,在第2基板,形成用於驅動液晶之薄膜電晶體(TFT)及用於外部連接 之端子。第1基板與第2基板,隔著密封材貼合,在藉由第1基板、第2基板、與密封材而形成之區域注入液晶。刻劃線,沿著密封材形成於第1基板之外側面與第2基板之外側面。基板G1,以第1基板位於下面側(Z軸負側)之方式,從刻劃裝置搬送至裂斷系統1。 The substrate G1 is a mother substrate from which the substrate unit G3 is cut out, and is composed of a so-called bonded substrate formed by bonding the first substrate and the second substrate to each other. On the first substrate, a color filter is formed, and on the second substrate, a thin film transistor (TFT) for driving liquid crystal and external connection are formed 之的terminal. The first substrate and the second substrate are bonded via a sealing material, and liquid crystal is injected into a region formed by the first substrate, the second substrate, and the sealing material. A scribe line is formed along the sealing material on the outer surface of the first substrate and the outer surface of the second substrate. The substrate G1 is transferred from the scribing device to the cleavage system 1 so that the first substrate is located on the lower surface side (Z axis negative side).
裂斷系統1,具備輸送裝置11、13、17、19、20、22、26、30、34、裂斷裝置12、18、21、移送部14、15、31、32、導件16、33、旋轉移送部23、24、27、28、及檢查部25、29。
Breaking system 1, equipped with conveying
輸送裝置11,將從上游之刻劃裝置搬送來的基板G1往X軸正方向搬送。裂斷裝置12,具備分別配置於基板G1之第1基板側及第2基板側之裂斷單元12a。二個裂斷單元12a,於Z軸方向觀察時,位於輸送裝置11與輸送裝置13之間。裂斷裝置12,藉由二個裂斷單元12a,將基板G1裂斷而生成基板G2。輸送裝置13,將生成之基板G2往X軸正方向搬送,定位於移送部14、15對其進行保持之保持位置。
The transport device 11 transports the substrate G1 transferred from the upstream scoring device in the positive X-axis direction. The fracturing
移送部14、15,構成為可沿著於Y軸方向延伸之導件16移動於Y軸方向。移送部14、15,藉由從上側吸附已定位於輸送裝置13上之保持位置之基板G2,將其往上方吸起。移送部14,使已吸起之基板G2往Y軸正方向移動,旋轉90度並載置於輸送裝置17上。移送部15,使已吸起之基板G2往Y軸負方向移動,旋轉90度並載置於輸送裝置20上。從基板G1生成之基板G2,藉由移送部14、15,交互地往輸送裝置17、20搬送。
The
輸送裝置17,將基板G2往X軸正方向搬送。裂斷裝置18,具備分別配置於基板G2之第1基板側及第2基板側之裂斷單元18a。二個裂斷單元18a,於Z軸方向觀察時,位於輸送裝置17與輸送裝置19之間。
裂斷裝置18,藉由二個裂斷單元18a,將基板G2裂斷而生成基板單元G3。輸送裝置19,將生成之基板單元G3往X軸正方向搬送,定位於輸送裝置19之X軸正側之端部。
The conveying
同樣地,輸送裝置20,將基板G2往X軸正方向搬送。裂斷裝置21,具備分別配置於基板G2之第1基板側及第2基板側之裂斷單元21a。二個裂斷單元21a,於Z軸方向觀察時,位於輸送裝置20與輸送裝置22之間。裂斷裝置21,藉由二個裂斷單元21a,將基板G2裂斷而生成基板單元G3。輸送裝置22,將生成之基板單元G3往X軸正方向搬送,定位於輸送裝置22之X軸正側之端部。
Similarly, the
旋轉移送部23,將已定位於輸送裝置19之X軸正側之端部的基板單元G3吸起,使已吸起之基板單元G3表背面反轉並轉移至旋轉移送部24。旋轉移送部24,將從旋轉移送部23承接之基板單元G3轉移至檢查部25。檢查部25,對基板單元G3,檢查由裂斷裝置18進行之裂斷已被適當且正確地進行。旋轉移送部24,將已藉由檢查而被判定為適當且正確之基板單元G3往輸送裝置26之X軸負側之端部載置。輸送裝置26,將基板單元G3往X軸正方向搬送,定位於輸送裝置26之X軸正側之端部。
The
同樣地,旋轉移送部27,將已定位於輸送裝置22之X軸正側之端部的基板單元G3吸起,使已吸起之基板單元G3表背面反轉並轉移至旋轉移送部28。旋轉移送部28,將從旋轉移送部27承接之基板單元G3轉移至檢查部29。檢查部29,對基板單元G3,檢查由裂斷裝置21進行之裂斷已被適當且正確地進行。旋轉移送部28,將已藉由檢查而被判定為適當且正確之基板單元G3往輸送裝置30之X軸負側之端部載置。輸送裝置
30,將基板單元G3往X軸正方向搬送,定位於輸送裝置30之X軸正側之端部。
Similarly, the
移送部31、32,構成為可沿著於Y軸方向延伸之導件33而於Y軸方向移動。移送部31、32,分別將定位於輸送裝置26、30之X軸正側之端部的基板單元G3藉由從上側進行吸附而吸起。移送部31、32,分別使吸起的基板單元G3往Y軸負方向及Y軸正方向移動,並載置於輸送裝置34之X軸負側之端部。輸送裝置34,將基板單元G3往X軸正方向搬送,且往進行後段之研磨及洗淨的裝置(未圖示)搬出。據此,結束裂斷系統1之處理。
The
圖2,係顯示從基板G1生成基板G2與基板單元G3之順序的圖。圖2係從上側觀察搬送於裂斷系統1內之基板G1、G2及基板單元G3的圖。另外,關於基板G2與基板單元G3,亦於對應之側視圖一併顯示。 FIG. 2 is a diagram showing the sequence of generating the substrate G2 and the substrate unit G3 from the substrate G1. 2 is a diagram of the substrates G1 and G2 and the substrate unit G3 transported in the cleavage system 1 as viewed from above. In addition, the substrate G2 and the substrate unit G3 are also shown together in corresponding side views.
搬送於裂斷系統1之基板G1,藉由上游的刻劃裝置形成刻劃線L1~L5。刻劃線L1,在基板G1之第1基板之下面沿著Y軸方向形成。刻劃線L2,在基板G1之第2基板之上面沿著Y軸方向形成。於Z軸方向觀察下,刻劃線L1、L2之位置相同。刻劃線L3、L5,在基板G1之第1基板之下面沿著X軸方向形成。刻劃線L4,在基板G1之第2基板之上面沿著X軸方向形成。於Z軸方向觀察下,刻劃線L3、L4之位置相同,刻劃線L3、L4之位置與刻劃線L5之位置不同。 The substrate G1 transferred to the cleavage system 1 is formed with scoring lines L1 to L5 by an upstream scoring device. The scribe line L1 is formed along the Y-axis direction under the first substrate of the substrate G1. The scribe line L2 is formed along the Y-axis direction on the upper surface of the second substrate of the substrate G1. When viewed in the Z-axis direction, the positions of the scribe lines L1 and L2 are the same. The scribe lines L3 and L5 are formed along the X-axis direction under the first substrate of the substrate G1. The scribe line L4 is formed along the X-axis direction on the upper surface of the second substrate of the substrate G1. When viewed in the Z-axis direction, the positions of the scribe lines L3 and L4 are the same, and the positions of the scribe lines L3 and L4 are different from the positions of the scribe lines L5.
在基板G1之刻劃線L1、L2被搬送至裂斷裝置12之裂斷位置時,藉由裂斷裝置12將第1基板與第2基板分別沿著刻劃線L1、L2裂斷。藉此,生成基板G2。所生成之基板G2,在藉由圖1所示之移送部14、
15而搬送至Y軸正方向及Y軸負方向之後,於Z軸方向觀察下往順時針方向旋轉90度,並載置於輸送裝置17、20。
When the scribe lines L1 and L2 of the substrate G1 are transferred to the breaking position of the breaking
接著,在基板G2之刻劃線L5被搬送至裂斷裝置18之裂斷位置時,藉由裂斷裝置18將第1基板沿著刻劃線L5裂斷。此外,在基板G2之刻劃線L3、L4被搬送至裂斷裝置18之裂斷位置時,藉由裂斷裝置18將第1基板沿著刻劃線L3裂斷,將第2基板沿著刻劃線L4裂斷。藉此,生成基板單元G3。
Next, when the scribe line L5 of the substrate G2 is transferred to the breaking position of the cleaving
此時,由於將相當於刻劃線L3、L5之間的第1基板之端部G2a(斜線部分)分離,因此在生成之基板單元G3形成在Y軸方向延伸之缺口部G3a。如上所述當分離端部G2a而形成缺口部G3a時,使形成於第2基板之端子露出。 At this time, since the end portion G2a (diagonal portion) of the first substrate corresponding to the scribe lines L3 and L5 is separated, a notch portion G3a extending in the Y-axis direction is formed in the generated substrate unit G3. As described above, when the end portion G2a is separated to form the notch portion G3a, the terminal formed on the second substrate is exposed.
同樣地,在基板G2之刻劃線L3、L4、L5被搬送至裂斷裝置21之裂斷位置時,藉由裂斷裝置21將第1基板沿著刻劃線L3、L5裂斷,將第2基板沿著刻劃線L4裂斷。藉此,生成基板單元G3,且在生成之基板單元G3形成缺口部G3a。
Similarly, when the scribe lines L3, L4, and L5 of the substrate G2 are transported to the cleavage position of the
圖3(a)係從Y軸負方向觀察裂斷裝置12之情形時的側視圖。
FIG. 3(a) is a side view when the cleaving
裂斷裝置12,如上所述具備二個裂斷單元12a。二個裂斷單元12a,以隔著被搬送於輸送裝置11上之基板G1相對向之方式配置,具有以基板G1為對稱面而相互對稱之構成。以下,參照圖3(a),針對上側之裂斷單元12a之構成進行說明。
As described above, the breaking
裂斷單元12a,具備保持構件101、導件102、汽缸103、滑動構件104、保持構件105、收容部106、及裂斷棒107。
The
保持構件101,固定設置於裂斷系統1內,保持於Z軸方向延伸之導件102及具有桿件103a之汽缸103。滑動構件104,構成為可沿導件102於Z軸方向滑動。汽缸103之桿件103a之下端,設置於滑動構件104之上面。藉由汽缸103之桿件103a於Z軸方向移動,滑動構件104沿導件102於Z軸方向移動。保持構件105設置於滑動構件104之下面,收容部106設置於保持構件105之下面。
The holding
在收容部106內,配置裂斷棒107,該裂斷棒107係沿基板G1之刻劃線L1、L2於Y軸方向延伸。在裂斷棒107之下端,形成於Y軸方向延伸之端部107a。裂斷棒107,在收容部106之內部,藉由下述之機構而支承成可於Z軸方向移動。在收容部106之下端,形成有於Y軸方向延伸之二個承受部106a,二個承受部106a,位於夾著裂斷棒107之位置。另外,關於收容部106、裂斷棒107、及收容部106內部之機構,將於以下參照圖4(a)~圖5進行說明。
In the
圖3(b),係顯示在將基板G1之下側之第1基板裂斷時之狀態的側視圖,圖3(c),係顯示在將基板G1之上側之第2基板裂斷時之狀態的側視圖。 FIG. 3(b) is a side view showing the state when the first substrate under the substrate G1 is broken, and FIG. 3(c) is showing the state when the second substrate under the substrate G1 is broken. Side view of the state.
將基板G1往X軸正方向搬送,如圖3(a)所示,在將刻劃線L1、L2定位於裂斷棒107之端部107a之位置時,如圖3(b)所示,驅動裂斷裝置12。具體而言,藉由將上側之裂斷棒107往下方向驅動,而將上側之裂斷棒107之端部107a按壓於第2基板。此外,藉由將下側之桿件103a往上方向驅動,而將下側之收容部106之承受部106a按壓於第1基板。
When the substrate G1 is transported in the positive direction of the X axis, as shown in FIG. 3(a), when the scribe lines L1, L2 are positioned at the
如上所述,將端部107a按壓於第2基板之刻劃線L2,將承
受部106a按壓於第1基板之從刻劃線L1往X軸正方向及X軸負方向偏移既定寬度之位置。藉此,將第1基板沿刻劃線L1裂斷。關於第1基板之裂斷,將於以下參照圖6(a)詳細地進行說明。
As described above, pressing the
當裂斷第1基板時,基板G1之位置不動,接著,如圖3(c)所示,驅動裂斷裝置12。具體而言,將上側之裂斷棒107往上方向驅動,將上側之桿件103a往下方向驅動,藉此,將上側之收容部106之承受部106a按壓於第2基板。此外,將下側之桿件103a往下方向驅動,將下側之裂斷棒107往上方向驅動,藉此,將下側之裂斷棒107之端部107a按壓於第1基板。
When the first substrate is broken, the position of the substrate G1 does not move, and then, as shown in FIG. 3(c), the breaking
如上所述,將端部107a按壓於第1基板之刻劃線L1,將承受部106a按壓於第2基板之從刻劃線L2往X軸正方向及X軸負方向偏移既定寬度之位置。藉此,將第2基板沿刻劃線L2裂斷。關於第2基板之裂斷,將於以下參照圖6(b)詳細地進行說明。
As described above, the
圖4(a)、(b)與圖5,係顯示從上側之裂斷單元12a之保持構件105起下方之構成的剖面圖。圖4(a)係圖4(b)所示之A1-A2剖面圖,圖4(b)係圖4(a)所示之B1-B2剖面圖,圖5係圖4(a)、(b)所示之C1-C2剖面圖。A1-A2剖面,係與XZ平面平行之剖面,B1-B2剖面,係與YZ平面平行之剖面,C1-C2剖面,係與XY平面平行之剖面。
FIGS. 4(a), (b) and FIG. 5 are cross-sectional views showing the configuration below from the holding
如圖4(a)、(b)與圖5所示,收容部106,由與YZ平面平行之二個壁部106b及與XZ平面平行之二個壁部106c構成。如圖4(a)、(b)所示,承受部106a,形成於二個壁部106b之下端。承受部106a之外側面往收容部106之內側方向傾斜,藉此,承受部106a之X軸方向之寬度(於水平方
向橫切刻劃線L1、L2之方向的寬度),隨著接近基板G1而變窄。二個壁部106c之下端,定位於較承受部106a之下端更上方。
As shown in FIGS. 4( a ), (b) and FIG. 5, the
在壁部106b、106c所圍繞之空間內,收容有馬達201、滾珠螺桿202、支承構件203、204、及裂斷棒107。馬達201,設置於保持構件105之下面。滾珠螺桿202,固定於馬達201之旋轉軸。支承構件203,固定於滾珠螺桿202之螺帽。支承構件204之上端,固定於支承構件203之下面。支承構件204之下端,分成二個。支承構件204之二個下端,位於在Y軸方向分開之位置,在該下端固定有裂斷棒107。裂斷棒107之端部107a之側面傾斜,藉此,端部107a之X軸方向之寬度,隨著接近基板G1而變窄。亦即,裂斷棒107之端部107a,形成V字狀。
In the space surrounded by the
如圖4(a)、(b)與圖5所示,在壁部106c之內側面,形成有凹部106d。在Y軸正側與Y軸負側之壁部106c之凹部106d,分別收容裂斷棒107之Y軸正側與Y軸負側之端部。
As shown in FIGS. 4(a), (b) and FIG. 5, a
如圖5所示,在將基板G1之Y軸方向之寬度設為W1、將Y軸正側之壁部106c之內側面與Y軸負側之壁部106c之內側面的間隔設為W2、將Y軸正側之凹部106d之Y軸正側面與Y軸負側之凹部106d之Y軸負側面的間隔設為W3、將Y軸正側之壁部106c之外側面與Y軸負側之壁部106c之外側面的間隔設為W4時,W1~W4的關係為W1<W2<W3<W4。在將裂斷棒107之X軸方向之寬度設為W5、凹部106d之X軸方向之寬度設為W6時,W5、W6的關係為W5<W6。
As shown in FIG. 5, when the width of the substrate G1 in the Y-axis direction is W1, the distance between the inner surface of the
參照圖4(a)、(b),在將裂斷棒107往下方向移動的情形時,以滾珠螺桿202之螺帽往下方向移動之方式驅動馬達201。藉此,用於支承
裂斷棒107的支承構件203、204往下方向移動,裂斷棒107往下方向移動。另一方面,在將裂斷棒107往上方向移動的情形時,以滾珠螺桿202之螺帽往上方向移動之方式驅動馬達201。藉此,用於支承裂斷棒107的支承構件203、204往上方向移動,裂斷棒107往上方向移動。此時,裂斷棒107,藉由被導引於凹部106d,而確實地僅往上下方向移動。
4(a) and (b), when the splitting
圖6(a)、(b),係詳細地顯示藉由收容部106之承受部106a及裂斷棒107之端部107a將基板G1裂斷的圖。圖6(a)、(b),係與圖4(a)同樣之A1-A2剖面圖。
6(a) and (b) are diagrams showing in detail that the substrate G1 is broken by the receiving
如圖6(a)所示,在將第1基板裂斷的情形時,將上側之裂斷棒107之端部107a按壓於第2基板,將下側之收容部106之承受部106a按壓於第1基板之下面。此時,藉由基板G1往下方向撓曲而將第1基板裂斷。如圖6(b)所示,在將第2基板裂斷的情形時,將上側之收容部106之承受部106a按壓於第2基板,將下側之裂斷棒107之端部107a按壓於第1基板之下面。此時,藉由基板G1往上方向撓曲而裂斷第2基板。
As shown in FIG. 6(a), when the first substrate is broken, the
以上,雖已參照圖3(a)~圖6(b)針對裂斷裝置12之構成、與裂斷裝置12將基板G1裂斷之動作進行了說明,但裂斷裝置18之構成、與裂斷裝置18將基板G2裂斷之動作亦大致相同,裂斷裝置21之構成、與裂斷裝置21將基板G2裂斷之動作亦大致相同。
Although the structure of the breaking
圖7(a),係顯示裂斷裝置12之上側之裂斷單元12a的示意圖,圖7(b),係顯示裂斷裝置18、21之上側之裂斷單元18a、21a的示意圖。另外,裂斷裝置18、21,具有互為相同之構成。
FIG. 7(a) is a schematic diagram showing the
如圖7(a)、(b)所示,裂斷單元18a、21a,與裂斷單元12a相
比較,在保持構件105、收容部106、及裂斷棒107之Y軸方向之長度較短的這方面是不相同的。裂斷單元18a、21a之其他構成,則與裂斷單元12a相同。
As shown in FIGS. 7(a) and (b), the breaking
此外,亦在裂斷單元18a、21a中,將圖5所示之W1~W4之長度的關係設定為相同。亦即,在圖5中,若將W1作為基板G2之Y軸方向之寬度、W2~W4作為裂斷單元18a、21a之相對應之長度,則W1~W4的關係與裂斷單元12a的情形相同,為W1<W2<W3<W4。
In addition, in the
此外,裂斷裝置18之二個裂斷單元18a,以隔著基板G2相對向之方式配置,具有以基板G2為對稱面而相互對稱之構成。同樣地,裂斷裝置21之二個裂斷單元21a,以隔著基板G2相對向之方式配置,具有以基板G2為對稱面而相互對稱之構成。因此,裂斷裝置18、21,與裂斷裝置12同樣地,能夠裂斷基板G2。
In addition, the two breaking
接下來,針對用於檢查對基板單元G3形成缺口部G3a之構成及處理進行說明。此處,輸送裝置19、26、旋轉移送部23、24、及檢查部25、與輸送裝置22、30、旋轉移送部27、28、及檢查部29,分別為以XZ平面為對稱面而相對稱之構成。因此,在以下,針對檢查藉由裂斷裝置18而生成之基板單元G3的情形進行說明,關於檢查藉由裂斷裝置21而生成之基板單元G3的情形則省略說明。
Next, the configuration and processing for inspecting the notch G3a formed on the substrate unit G3 will be described. Here, the conveying
圖8,係從上側觀察包含輸送裝置19、26、旋轉移送部23、24、及檢查部25的周邊之構成的圖。在圖8中,為便於說明,省略裂斷裝置18之圖示。
FIG. 8 is a diagram of the configuration including the periphery of the conveying
旋轉移送部23,具備於Z軸方向延伸之軸310、以軸310為
中心旋轉之旋轉體320、及設置於旋轉體320之側面的四個驅動部330。驅動部330,具備支承部331、由支承部331支承之軸332、設置於軸332之前端之吸附墊支承部333、及藉由吸附墊支承部333支承之吸附墊334。驅動部330,相對於旋轉體320升降,使軸332以該軸332為中心旋轉,且使吸附墊334內之空氣進行進出。藉由驅動驅動部330,基板單元G3透過吸附墊334而升降及表背面旋轉。
The
旋轉移送部24,具備於Z軸方向延伸之軸410、以軸410為中心旋轉之旋轉體420、及設置於旋轉體420之下面的四個驅動部430。驅動部430,具備吸附墊431。驅動部430,使吸附墊431相對於旋轉體420升降,且使吸附墊431內之空氣進行進出。藉由將驅動部430驅動,基板單元G3透過吸附墊431而升降。檢查部25,具備輸送裝置510、二個軌道520、門架530、感測器540、及移送部550。
The
藉由裂斷裝置18而生成之基板單元G3,藉由輸送裝置19往X軸正方向搬送,定位於輸送裝置19之X軸正側之位置P1。位置P1之基板單元G3,藉由吸附墊334吸附,從輸送裝置19之搬送路徑吸起。
The substrate unit G3 generated by the cleaving
此處,經分離之第1基板之端部G2a,亦藉由輸送裝置19而與基板單元G3一起往X軸正方向搬送。然後,基板單元G3藉由驅動部330之吸附墊334而被拾起,在基板單元G3之下面從輸送裝置19之搬送路徑離開時,端部G2a因本身的重量而自基板單元G3分離。亦即,驅動部330,使端部G2a從基板單元G3分離。自基板單元G3分離且殘留於輸送裝置19上之端部G2a,進一步被往X軸正方向搬送而於輸送裝置19之X軸正側落下以藉此回收。
Here, the end G2a of the separated first substrate is also conveyed by the conveying
另外,端部G2a,亦可在由裂斷裝置18裂斷後、移送至檢查部25為止之期間,藉由上述以外之手段從基板單元G3分離。例如,端部G2a,亦可藉由從輸送裝置17、19之間往下落下而分離,亦可藉由吹送空氣以使其從輸送裝置19落下而分離,亦可藉由其他的吸附墊吸附而去除。
In addition, the end portion G2a may be separated from the substrate unit G3 by means other than the above after being broken by the breaking
繼而,將旋轉體320在從上側觀察下往逆時針方向旋轉90度,將在位置P1吸起之基板單元G3,定位於位置P2。然後,軸332以該軸332為中心旋轉,將位置P2之基板單元G3表背面反轉。藉此,基板單元G3之缺口部G3a朝向上面側。繼而,將旋轉體320在從上側觀察下往逆時針方向旋轉90度,將位置P2之基板單元G3定位於位置P3。
Then, the
繼而,位置P3之基板單元G3,從由旋轉移送部23之吸附墊334支承之狀態,移至由旋轉移送部24之吸附墊431吸附之狀態。然後,將旋轉體420在從上側觀察下往順時針方向旋轉90度,將基板單元G3載置於輸送裝置510之X軸正側之位置P4。另外,當將基板單元G3載置於位置P4時,將旋轉體430旋轉45度,並將驅動部430退避至不妨礙檢查部25之檢查的位置。
Then, the substrate unit G3 at the position P3 is moved from the state supported by the
繼而,門架530,於軌道520上往X軸正方向移動,定位於位置P4之基板單元G3之正上方。然後,感測器540藉由移送部550往Y軸負方向移送。根據感測器540之檢測訊號,檢查於位置P4之基板單元G3形成缺口部G3a。關於檢查部25之詳細的構成,將於以下參照圖9(a)~(d)進行說明。
Then, the
當判定未形成缺口部G3a時,將位置P4之基板單元G3,藉由輸送裝置510往X軸負方向搬送,於輸送裝置510之X軸負側落下。在
輸送裝置510之X軸負側設置未圖示之回收部,將未形成缺口部G3a之基板單元G3,由回收部回收。另一方面,當判定形成有缺口部G3a時,將位置P4之基板單元G3,再次藉由旋轉移送部24之吸附墊431吸起。然後,將旋轉體420在從上側觀察下往順時針方向旋轉90度,將在位置P4吸起之基板單元G3載置於輸送裝置26之X軸負側之位置P5。位置P5之基板單元G3,藉由輸送裝置26往X軸正方向搬送,定位於輸送裝置26之X軸正側之位置P6。
When it is determined that the notch G3a is not formed, the substrate unit G3 at the position P4 is transported in the negative X-axis direction by the
位置P6之基板單元G3,藉由移送部31之吸附墊31a吸起。然後,移送部31沿著導件33往Y軸負方向移動,將基板單元G3載置於輸送裝置34上。載置於輸送裝置34上之基板單元G3,藉由輸送裝置34往X軸正方向搬送,並往後段之裝置搬送。
The substrate unit G3 at the position P6 is sucked up by the
圖9(a)~(d),係顯示檢查部25之構成的圖。圖9(a)、(c)係檢查部25之立體圖,圖9(b)、(d)分別係從上側觀察圖9(a)、(c)的圖。在圖9(a)~(d)中,顯示位於位置P4之基板單元G3。
9(a) to (d) are diagrams showing the configuration of the
二個軌道520,設於輸送裝置510之Y軸正側與Y軸負側,且固定於裂斷系統1內。門架530,構成為可於二個軌道520上沿X軸方向滑動。感測器540,在門架530之Y軸方向延伸之構件之下面側,藉由移送部550支承。感測器540,藉由移送部550而可於Y軸方向移動。感測器540,係具備未圖示之雷射光源及受光元件的光學式位移感測器。感測器540,從雷射光源往Z軸負方向射出雷射光,並藉由受光元件接受經由物體反射之雷射光。感測器540,以受光元件上之受光位置作為檢測訊號輸出。根據感測器540之檢測訊號,以三角測距方式取得從感測器540起至對象物之距離。
The two
如圖9(a)、(b)所示,當於輸送裝置510之位置P4載置基板單元G3時,將門架530沿著二個軌道520往X軸正方向移送,如圖9(c)、(d)所示,將感測器540定位於位置P4之基板單元G3之正上方。當感測器540定位於基板單元G3之正上方時,從感測器540射出雷射光,且將感測器540往Y軸負方向移送。
As shown in FIGS. 9(a) and (b), when the substrate unit G3 is placed at the position P4 of the conveying
圖10(a)~(d),係於X軸負方向觀察檢查部25的側視圖。
10(a) to (d) are side views of the
當感測器540定位於位置P4之基板單元G3之正上方、且從感測器540之雷射光源射出雷射光時,如圖10(a)所示,經由基板單元G3反射之雷射光藉由感測器540之受光元件接受。然後,從圖10(a)所示之狀態起,將感測器540往Y軸負方向移送。
When the
在適當且正確地形成有缺口部G3a的情形下,當從圖10(a)所示之狀態起將感測器540往Y軸負方向移送既定距離時,如圖10(b)所示,從感測器540起至Z軸負方向之對象物的距離,以缺口部G3a之Z軸方向之寬度變長。如上所述,在已使感測器540往Y軸負方向移送既定距離時,從感測器540起至Z軸負方向之對象物的距離以缺口部G3a之Z軸方向之寬度變長的情形時,判定為在該基板單元G3形成有缺口部G3a。
When the notch G3a is formed properly and correctly, when the
另一方面,在未適當且正確地形成有缺口部G3a的情形下,即便從圖10(a)所示之狀態起將感測器540往Y軸負方向移送既定距離,如圖10(c)所示,從感測器540起至Z軸負方向之對象物的距離亦大致不變。如上所述,在已使感測器540往Y軸負方向移送既定距離時,從感測器540起至Z軸負方向之對象物的距離大致不變的情形時,判定為在該基板單元G3未形成有缺口部G3a。
On the other hand, if the cutout G3a is not formed properly and correctly, even if the
另外,如圖10(d)所示,亦可使感測器540進一步往Y軸負方向移送。據此,在從感測器540起至對象物的距離呈二階段變化的情形時,可判定為形成有缺口部G3a。另一方面,在從感測器540起至對象物的距離僅呈一階段變化的情形時,可判定為未形成有缺口部G3a。
In addition, as shown in FIG. 10(d), the
圖11,係顯示裂斷系統1進行之處理的流程圖。 FIG. 11 is a flowchart showing the processing performed by the fracturing system 1.
當基板G1藉由裂斷裝置12裂斷時,生成基板G2(S11)。將所生成之基板G2,往裂斷裝置18、21搬送(S12)。當基板G2藉由裂斷裝置18、21裂斷時,生成基板單元G3(S13)。藉由裂斷裝置18而生成之基板單元G3,藉由輸送裝置19與旋轉移送部23、24往檢查部25搬送,藉由裂斷裝置21而生成之基板單元G3,藉由輸送裝置22與旋轉移送部27、28往檢查部29搬送(S14)。
When the substrate G1 is broken by the breaking
檢查部25、29,檢查於基板單元G3形成缺口部G3a(S15)。在未形成有缺口部G3a的情形時(S16:NO),基板單元G3藉由輸送裝置510往X軸負方向搬送,藉此從搬送路徑脫離,由回收部回收(S17)。在形成有缺口部G3a的情形時(S16:YES),基板單元G3往後段之裝置搬出(S18)。具體而言,位於檢查部25之基板單元G3,藉由旋轉移送部24、輸送裝置26、移送部31、及輸送裝置34而往後段之裝置搬出。位於檢查部29之基板單元G3,藉由旋轉移送部28、輸送裝置30、移送部32、及輸送裝置34而往後段之裝置搬出。
The
<實施形態之效果> <Effect of the embodiment>
根據本實施形態,能發揮以下之效果。 According to this embodiment, the following effects can be exhibited.
在將藉由裂斷裝置18、21而生成之基板單元G3往後段裝置搬送之搬送過程中,進行端部G2a相對於基板單元G3之分離、與其檢查,僅將端子已適當且正確地露出的基板單元G3自動地往後段裝置移送。因此,無需另外進行以下之作業,即,作業者就每一基板單元G3檢查端子是否適當且正確地露出,根據檢查結果區分應移往後段裝置之基板單元G3。由此,根據本實施形態之裂斷系統1,能夠於各段提高裂斷後之作業效率。
During the transfer process of the substrate unit G3 generated by the cleaving
裂斷裝置18、21,在第1基板朝向下面側的狀態下,裂斷第1基板之端部G2a,驅動部330,將端部G2a已被裂斷之基板單元G3從輸送裝置19、22拾起,使基板單元G3之下面從輸送裝置19、22之搬送路徑離開。藉此,在將基板單元G3拾起時,由於端部G2a因本身的重量而從基板單元G3分離,因此能夠自動地去除端部G2a。
The
旋轉移送部23、27,分別使從輸送裝置19、22拾起之基板單元G3表背面反轉,往檢查部25、29搬送。藉此,由於是在端子已朝向上側的狀態下將基板單元G3往檢查部25、29搬送,因此檢查部25、29能夠從基板單元G3之上方檢查端子露出。由此,如本實施形態,能夠在已載置基板單元G3之輸送裝置510之上方空間,以精簡的構成容易地配置用於檢查之感測器540。
The
旋轉移送部23、27,使拾起之基板單元G3表背面反轉,旋轉移送部24、28,分別從旋轉移送部23、27承接基板單元G3並往檢查部25、29搬送。藉此,能夠順暢地進行基板單元G3之表背面反轉與往檢查部25、29之轉移。
The
旋轉移送部23、24,分別構成為以吸附墊保持基板單元G3
並進行迴旋。此外,旋轉移送部23之吸附墊334之迴旋路徑之一部分、與旋轉移送部24之吸附墊431之迴旋路徑之一部分,以在俯視觀察下相互重疊之方式配置,在二個迴旋路徑相互重疊之位置,將基板單元G3從旋轉移送部23轉移至旋轉移送部24。藉此,能夠精簡地整合旋轉移送部23、24之配置空間,同時能順暢地將基板單元G3從旋轉移送部23轉移至旋轉移送部24。同樣地,能夠精簡地整合旋轉移送部27、28之配置空間,同時能順暢地將基板單元G3從旋轉移送部27轉移至旋轉移送部28。
The
檢查部25、29,藉由光學式位移感測器構成之感測器540偵測去除端部G2a而形成之缺口部G3a之有無,藉此檢查端子適當且正確地露出。藉此,能夠在不接觸基板單元G3之下檢查端子露出。
The
檢查部25、29,使感測器540相對於位置P4之基板單元G3往Y軸負方向移動,以檢查於基板單元G3形成缺口部G3a。藉此,與檢查基板單元G3之整面的情形相比,能夠更有效率地檢查形成缺口部G3a。
The
在對基板G1、G2之第1基板進行裂斷的情形時,在配置於第1基板側之裂斷單元12a、18a、21a之二個承受部106a支承第1基板的狀態下,將配置於第2基板側之裂斷單元12a、18a、21a之裂斷棒107按壓於第2基板。另一方面,在對基板G1、G2之第2基板進行裂斷的情形時,在配置於第2基板側之裂斷單元12a、18a、21a之二個承受部106a支承第2基板的狀態下,將配置於第1基板側之裂斷單元12a、18a、21a之裂斷棒107按壓於第1基板。由此,根據本實施形態之裂斷裝置12、18、21,藉由將二個裂斷單元以和第1基板側與第2基板側對向之方式配置,而能夠在相同位置裂斷第1基板及第2基板。據此,能夠以精簡之構成將基板G1、G2
裂斷。
When splitting the first substrate of the substrates G1 and G2, the two receiving
<變形例> <Modification>
以上,雖已針對本發明之實施形態進行了說明,但本發明並不限定於上述實施形態,此外,本發明之實施形態除了上述以外,亦可進行各種之變形。 Although the embodiments of the present invention have been described above, the present invention is not limited to the above-mentioned embodiments. In addition, the embodiments of the present invention may be variously modified in addition to the above.
例如,在上述實施形態中,是在第1基板朝向下側且第2基板朝向上側之狀態下進行裂斷,但亦可在第1基板朝向上側且第2基板朝向下側之狀態下進行裂斷。於該情形,刻劃線L5設於上面側,在藉由裂斷裝置18、21而生成基板單元G3時,缺口部G3a朝向上側。由此,在裂斷後缺口部G3a朝向上側的情形時,無需藉由旋轉移送部23、27將基板單元G3表背面反轉。
For example, in the above embodiment, the first substrate is oriented downward and the second substrate is oriented upward. However, the first substrate is oriented upward and the second substrate is oriented downward. Break. In this case, the score line L5 is provided on the upper surface side, and when the substrate unit G3 is generated by the cleaving
但是,於該情形,成為被分離之端部G2a殘留於基板單元G3上之狀態。因此,在將基板單元G3搬送至檢查部25、29之前,可藉由空氣之吹送等,去除留在基板單元G3之端部G2a。
However, in this case, the separated end G2a remains on the substrate unit G3. Therefore, before the substrate unit G3 is transported to the
此外,在上述實施形態中,藉由裂斷裝置18、21而裂斷之基板單元G3,分別藉由旋轉移送部23、27表背面反轉,但並不限於此,亦可不表背面反轉。於該情形,由於在檢查部25、29中缺口部G3a朝向下面側,因此使檢查部25、29從基板單元G3之下側檢查形成缺口部G3a。於該情形,例如,檢查部25、29,構成為從使雷射光穿透之檢查台之下方、或者透過載置有基板單元G3之台之間隙從下方檢測缺口部G3a之有無。但是,若採用上述方式,則與上述實施形態相比,檢查部25、29之構成變複
雜。因此,如上述實施形態,較佳為:在缺口部G3a朝向上側之狀態下,檢查部25、29從上方檢查形成缺口部G3a。
In addition, in the above embodiment, the substrate unit G3 split by the
此外,在上述實施形態中,被判定為未形成有缺口部G3a之基板單元G3,由位於輸送裝置510之X軸負側之回收部回收。但是,並不限於此,被判定為未形成有缺口部G3a之基板單元G3,亦可在已使其表背面反轉之下,再次往輸送裝置17或輸送裝置20搬送。於該情形,藉由裂斷裝置18或裂斷裝置21,將第1基板再次沿刻劃線L5裂斷。
In addition, in the above-described embodiment, the substrate unit G3 determined not to have the notch G3a is recovered by the recovery unit located on the negative side of the X axis of the
此外,在上述實施形態中,檢查部25、29,具備有用於將基板單元G3於X軸方向搬送之輸送裝置510,但作為用於搬送基板單元G3之輸送裝置,亦可分別使用輸送裝置26、30。
In addition, in the above-described embodiment, the
圖12,係顯示該情形之檢查部25之構成的圖。從該情形之檢查部25,省略輸送裝置510、軌道520、移送部550。門架530,以橫跨輸送裝置26之中間位置附近之方式固定於裂斷系統1內,感測器540則固定在於門架530之Y軸方向延伸之構件之下面。
FIG. 12 is a diagram showing the configuration of the
參照圖12,旋轉移送部24,當從旋轉移送部23接受基板單元G3時,將已接受之基板單元G3載置於輸送裝置26上之位置P5。位置P5之基板單元G3,藉由輸送裝置往X軸正方向搬送。此時,藉由感測器540,對往X軸正方向前進之基板單元G3檢測至其上面為止的距離,與上述實施形態同樣地,檢查形成缺口部G3a。當未形成有缺口部G3a時,基板單元G3往輸送裝置26之X軸正側落下,由未圖示之回收部回收。當形成有缺口部G3a時,將基板單元G3定位於位置P6。然後,將形成有缺口部G3a之基板單元G3,與上述實施形態同樣地,往後段之裝置搬送。
Referring to FIG. 12, when the
另外,如圖12所示,在檢查部25使用其他的輸送裝置的情形時,檢查部25可設置於輸送裝置26之X軸負側之端部附近,亦可設置於輸送裝置19之中間位置附近。此外,檢查部25、29,亦可使用輸送裝置34作為用於搬送基板單元G3之輸送裝置。
In addition, as shown in FIG. 12, when the
此外,在上述實施形態中,在以檢查部25進行檢查之後,將基板單元G3藉由旋轉移送部24搬送至輸送裝置26,在以檢查部29進行檢查之後,將基板單元G3藉由旋轉移送部28搬送至輸送裝置30。但是,並不限於此,亦可在省略輸送裝置26、30、移送部31、32、及導件33,且以檢查部25、29進行檢查後,將基板單元G3分別藉由旋轉移送部24、28搬送至輸送裝置34。
In the above-described embodiment, after the inspection by the
輸送裝置19上之基板單元G3,藉由旋轉移送部23、24,一邊迴旋一邊往檢查部25與輸送裝置26移送,輸送裝置22上之基板單元G3,藉由旋轉移送部27、28,一邊迴旋一邊往檢查部29與輸送裝置30移送。但是,亦可取代旋轉移送部23、24、27、28,設置線性移送基板單元G3之移送部。但是,於該情形,與上述實施形態相比,移送部之設置空間變大。因此,如上述實施形態,較佳為:藉由旋轉移送部23、24、27、28移送基板單元G3。
The substrate unit G3 on the
此外,在上述實施形態中,在裂斷裝置12中,二個裂斷單元12a為互為相同之構成,在裂斷裝置18中,二個裂斷單元18a為互為相同之構成,在裂斷裝置21中,二個裂斷單元21a為互為相同之構成。但是,並不限於此,二個裂斷單元不一定要為相同之構成亦可。
In addition, in the above embodiment, in the
此外,在上述實施形態中,馬達201與滾珠螺桿202,藉由
支承構件204於二處支承裂斷棒107,但並不限於此,亦可藉由支承構件204於三處以上支承裂斷棒107。於該情形,支承構件204,以於Y軸方向分開之三處以上之部位固定於裂斷棒107。另外,在裂斷裝置18、21中,由於裂斷棒107之Y軸方向之長度較短,因此馬達201及滾珠螺桿202亦可藉由支承構件204於一處支承裂斷棒107。
In addition, in the above embodiment, the
此外,在上述實施形態中,如圖4(a)、(b)所示,壁部106c之基板側之端部,位於較承受部106a之基板側之端部更離開基板之位置。但是,並不限於此,亦可在Z軸方向,壁部106c之基板側之端部為與承受部106a之基板側之端部相同之位置。
In addition, in the above embodiment, as shown in FIGS. 4(a) and (b), the end of the
此外,在上述實施形態中,承受部106a呈圖4(a)中所示之形狀,但並不限於此,亦可為其他形狀。例如,亦可藉由承受部106a之內側面亦往收容部106之外側方向傾斜,而從Y軸方向觀察時,承受部106a形成V字狀。此外,亦可在從Y軸方向觀察時,承受部106a之外側面及內側面形成圓弧狀。此外,亦可在從Y軸方向觀察時,承受部106a形成矩形。
In addition, in the above-described embodiment, the receiving
此外,在上述實施形態中,於收容部106之基板側之端部,連續地形成承受部106a,但並不限於此,亦可局部地形成承受部106a。此外,承受部106a之形成方向,與刻劃線平行,但亦可不與刻劃線平行。此外,承受部106a,形成直線狀,但亦可為蜿蜒曲折狀。
In addition, in the above-described embodiment, the receiving
本發明之實施形態,在申請專利範圍所揭示之技術性思想之範圍內,可適當地進行各種變更。 The embodiments of the present invention can be appropriately modified in various ways within the scope of the technical idea disclosed in the patent application scope.
1‧‧‧裂斷系統 1‧‧‧Fracture system
12、18、21‧‧‧裂斷裝置 12, 18, 21‧‧‧rupture device
12a、18a、21a‧‧‧裂斷單元 12a, 18a, 21a‧‧‧rupture unit
11、13、17、19、20、22、26、30、34‧‧‧輸送裝置(搬送部) 11, 13, 17, 19, 20, 22, 26, 30, 34
23、27‧‧‧旋轉移送部(搬送部、第1移送部) 23, 27‧‧‧Rotary transfer section (transfer section, first transfer section)
24、28‧‧‧旋轉移送部(搬送部、第2移送部) 24, 28‧‧‧Rotary transfer section (transfer section, second transfer section)
25、29‧‧‧檢查部 25, 29‧‧‧ Inspection Department
14、15、31、32‧‧‧移送部(搬送部) 14, 15, 31, 32 ‧‧‧ Transfer Department (Transport Department)
16、33‧‧‧導件 16, 33‧‧‧Guide
G1、G2‧‧‧基板 G1, G2‧‧‧ substrate
G3‧‧‧基板單元 G3‧‧‧ substrate unit
Claims (7)
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2015112052A JP6524803B2 (en) | 2015-06-02 | 2015-06-02 | Break system |
| JPJP2015-112052 | 2015-06-02 |
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| Publication Number | Publication Date |
|---|---|
| TW201643126A TW201643126A (en) | 2016-12-16 |
| TWI684577B true TWI684577B (en) | 2020-02-11 |
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| Application Number | Title | Priority Date | Filing Date |
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| TW105107173A TWI684577B (en) | 2015-06-02 | 2016-03-09 | Rupture system |
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| JP (1) | JP6524803B2 (en) |
| KR (1) | KR20160142222A (en) |
| CN (1) | CN106226935A (en) |
| TW (1) | TWI684577B (en) |
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| JP6829870B2 (en) * | 2016-11-25 | 2021-02-17 | 三星ダイヤモンド工業株式会社 | Board division system |
| JP7015047B2 (en) * | 2017-11-30 | 2022-02-02 | 三星ダイヤモンド工業株式会社 | Substrate processing equipment |
| JP2019109292A (en) * | 2017-12-15 | 2019-07-04 | 三星ダイヤモンド工業株式会社 | End material removing device and end material removing method |
| CN109085708B (en) * | 2018-09-25 | 2021-06-18 | 苏州凌云视界智能设备有限责任公司 | Frock suitable for adjustment of triangle carousel tool layer board |
| CN110342801B (en) * | 2019-07-16 | 2023-10-27 | 咸宁南玻玻璃有限公司 | Full-automatic longitudinal breaking separation system for large-plate glass |
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| TW201315557A (en) * | 2011-09-28 | 2013-04-16 | Mitsuboshi Diamond Ind Co Ltd | Mother substrate splitting method |
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| KR20160142222A (en) | 2016-12-12 |
| CN106226935A (en) | 2016-12-14 |
| TW201643126A (en) | 2016-12-16 |
| JP6524803B2 (en) | 2019-06-05 |
| JP2016224328A (en) | 2016-12-28 |
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