TWI680871B - Fluorine resin composition, prepreg and copper foil substrate using the composition - Google Patents
Fluorine resin composition, prepreg and copper foil substrate using the composition Download PDFInfo
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- TWI680871B TWI680871B TW107134164A TW107134164A TWI680871B TW I680871 B TWI680871 B TW I680871B TW 107134164 A TW107134164 A TW 107134164A TW 107134164 A TW107134164 A TW 107134164A TW I680871 B TWI680871 B TW I680871B
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- 239000000758 substrate Substances 0.000 title claims abstract description 54
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 title claims abstract description 36
- 239000000203 mixture Substances 0.000 title claims abstract description 35
- 239000011889 copper foil Substances 0.000 title claims abstract description 33
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 title claims abstract description 19
- 229910052731 fluorine Inorganic materials 0.000 title claims abstract description 19
- 239000011737 fluorine Substances 0.000 title claims abstract description 19
- 239000011342 resin composition Substances 0.000 title claims description 14
- 229920001343 polytetrafluoroethylene Polymers 0.000 claims abstract description 58
- 239000004810 polytetrafluoroethylene Substances 0.000 claims abstract description 58
- -1 polytetrafluoroethylene Polymers 0.000 claims abstract description 50
- 239000000843 powder Substances 0.000 claims abstract description 48
- 229920005989 resin Polymers 0.000 claims abstract description 27
- 239000011347 resin Substances 0.000 claims abstract description 27
- 238000000034 method Methods 0.000 claims abstract description 21
- 229920001577 copolymer Polymers 0.000 claims abstract description 19
- 229920001774 Perfluoroether Polymers 0.000 claims abstract description 9
- BFKJFAAPBSQJPD-UHFFFAOYSA-N tetrafluoroethene Chemical group FC(F)=C(F)F BFKJFAAPBSQJPD-UHFFFAOYSA-N 0.000 claims abstract description 9
- 238000004519 manufacturing process Methods 0.000 claims abstract description 7
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical group O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 19
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 claims description 13
- 238000003825 pressing Methods 0.000 claims description 12
- 238000001816 cooling Methods 0.000 claims description 11
- VTYYLEPIZMXCLO-UHFFFAOYSA-L Calcium carbonate Chemical compound [Ca+2].[O-]C([O-])=O VTYYLEPIZMXCLO-UHFFFAOYSA-L 0.000 claims description 8
- PEVRKKOYEFPFMN-UHFFFAOYSA-N 1,1,2,3,3,3-hexafluoroprop-1-ene;1,1,2,2-tetrafluoroethene Chemical compound FC(F)=C(F)F.FC(F)=C(F)C(F)(F)F PEVRKKOYEFPFMN-UHFFFAOYSA-N 0.000 claims description 7
- 230000015556 catabolic process Effects 0.000 claims description 7
- 238000006731 degradation reaction Methods 0.000 claims description 7
- 239000004744 fabric Substances 0.000 claims description 6
- 239000003365 glass fiber Substances 0.000 claims description 6
- 239000002245 particle Substances 0.000 claims description 6
- 239000000377 silicon dioxide Substances 0.000 claims description 6
- 229910021485 fumed silica Inorganic materials 0.000 claims description 5
- 239000000395 magnesium oxide Substances 0.000 claims description 5
- CPLXHLVBOLITMK-UHFFFAOYSA-N magnesium oxide Inorganic materials [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 claims description 5
- AXZKOIWUVFPNLO-UHFFFAOYSA-N magnesium;oxygen(2-) Chemical compound [O-2].[Mg+2] AXZKOIWUVFPNLO-UHFFFAOYSA-N 0.000 claims description 5
- PZNSFCLAULLKQX-UHFFFAOYSA-N Boron nitride Chemical compound N#B PZNSFCLAULLKQX-UHFFFAOYSA-N 0.000 claims description 4
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 claims description 4
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims description 4
- JRPBQTZRNDNNOP-UHFFFAOYSA-N barium titanate Chemical compound [Ba+2].[Ba+2].[O-][Ti]([O-])([O-])[O-] JRPBQTZRNDNNOP-UHFFFAOYSA-N 0.000 claims description 4
- 229910002113 barium titanate Inorganic materials 0.000 claims description 4
- 229910000019 calcium carbonate Inorganic materials 0.000 claims description 4
- ODINCKMPIJJUCX-UHFFFAOYSA-N calcium oxide Inorganic materials [Ca]=O ODINCKMPIJJUCX-UHFFFAOYSA-N 0.000 claims description 4
- 239000011777 magnesium Substances 0.000 claims description 4
- 229910052749 magnesium Inorganic materials 0.000 claims description 4
- VTHJTEIRLNZDEV-UHFFFAOYSA-L magnesium dihydroxide Chemical compound [OH-].[OH-].[Mg+2] VTHJTEIRLNZDEV-UHFFFAOYSA-L 0.000 claims description 4
- 239000000347 magnesium hydroxide Substances 0.000 claims description 4
- 229910001862 magnesium hydroxide Inorganic materials 0.000 claims description 4
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 claims description 4
- 235000012239 silicon dioxide Nutrition 0.000 claims description 4
- VEALVRVVWBQVSL-UHFFFAOYSA-N strontium titanate Chemical compound [Sr+2].[O-][Ti]([O-])=O VEALVRVVWBQVSL-UHFFFAOYSA-N 0.000 claims description 4
- 239000004408 titanium dioxide Substances 0.000 claims description 4
- CETPSERCERDGAM-UHFFFAOYSA-N ceric oxide Chemical compound O=[Ce]=O CETPSERCERDGAM-UHFFFAOYSA-N 0.000 claims description 3
- 229910000422 cerium(IV) oxide Inorganic materials 0.000 claims description 3
- JKWMSGQKBLHBQQ-UHFFFAOYSA-N diboron trioxide Chemical compound O=BOB=O JKWMSGQKBLHBQQ-UHFFFAOYSA-N 0.000 claims description 3
- 238000004227 thermal cracking Methods 0.000 claims description 3
- 229910052582 BN Inorganic materials 0.000 claims 3
- WNROFYMDJYEPJX-UHFFFAOYSA-K aluminium hydroxide Chemical compound [OH-].[OH-].[OH-].[Al+3] WNROFYMDJYEPJX-UHFFFAOYSA-K 0.000 claims 3
- BRPQOXSCLDDYGP-UHFFFAOYSA-N calcium oxide Chemical compound [O-2].[Ca+2] BRPQOXSCLDDYGP-UHFFFAOYSA-N 0.000 claims 3
- 239000000292 calcium oxide Substances 0.000 claims 3
- AOWKSNWVBZGMTJ-UHFFFAOYSA-N calcium titanate Chemical compound [Ca+2].[O-][Ti]([O-])=O AOWKSNWVBZGMTJ-UHFFFAOYSA-N 0.000 claims 3
- PMHQVHHXPFUNSP-UHFFFAOYSA-M copper(1+);methylsulfanylmethane;bromide Chemical compound Br[Cu].CSC PMHQVHHXPFUNSP-UHFFFAOYSA-M 0.000 claims 3
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 claims 3
- 229910010271 silicon carbide Inorganic materials 0.000 claims 3
- 229910052810 boron oxide Inorganic materials 0.000 claims 2
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 claims 1
- VGGSQFUCUMXWEO-UHFFFAOYSA-N Ethene Chemical compound C=C VGGSQFUCUMXWEO-UHFFFAOYSA-N 0.000 claims 1
- 239000005977 Ethylene Substances 0.000 claims 1
- 229910052796 boron Inorganic materials 0.000 claims 1
- 229910000420 cerium oxide Inorganic materials 0.000 claims 1
- 230000003647 oxidation Effects 0.000 claims 1
- 238000007254 oxidation reaction Methods 0.000 claims 1
- BMMGVYCKOGBVEV-UHFFFAOYSA-N oxo(oxoceriooxy)cerium Chemical compound [Ce]=O.O=[Ce]=O BMMGVYCKOGBVEV-UHFFFAOYSA-N 0.000 claims 1
- 230000005855 radiation Effects 0.000 claims 1
- 238000003475 lamination Methods 0.000 abstract description 7
- 239000000945 filler Substances 0.000 abstract 1
- 239000000463 material Substances 0.000 description 14
- 238000012545 processing Methods 0.000 description 14
- 230000000052 comparative effect Effects 0.000 description 8
- 230000017525 heat dissipation Effects 0.000 description 7
- 238000012360 testing method Methods 0.000 description 5
- 230000000694 effects Effects 0.000 description 4
- 239000000839 emulsion Substances 0.000 description 4
- 229920001780 ECTFE Polymers 0.000 description 3
- 239000002033 PVDF binder Substances 0.000 description 3
- 238000004891 communication Methods 0.000 description 3
- 239000010949 copper Substances 0.000 description 3
- 229910052802 copper Inorganic materials 0.000 description 3
- 229920000840 ethylene tetrafluoroethylene copolymer Polymers 0.000 description 3
- 238000010438 heat treatment Methods 0.000 description 3
- 238000002844 melting Methods 0.000 description 3
- 230000008018 melting Effects 0.000 description 3
- 230000000704 physical effect Effects 0.000 description 3
- 229920002620 polyvinyl fluoride Polymers 0.000 description 3
- 229920002981 polyvinylidene fluoride Polymers 0.000 description 3
- 238000002360 preparation method Methods 0.000 description 3
- 238000005245 sintering Methods 0.000 description 3
- 239000004809 Teflon Substances 0.000 description 2
- 229920006362 Teflon® Polymers 0.000 description 2
- 238000004458 analytical method Methods 0.000 description 2
- 230000009286 beneficial effect Effects 0.000 description 2
- 230000005540 biological transmission Effects 0.000 description 2
- 239000000919 ceramic Substances 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 239000004643 cyanate ester Substances 0.000 description 2
- 150000001913 cyanates Chemical class 0.000 description 2
- 238000013461 design Methods 0.000 description 2
- 238000000113 differential scanning calorimetry Methods 0.000 description 2
- 125000000524 functional group Chemical group 0.000 description 2
- 229930195733 hydrocarbon Natural products 0.000 description 2
- 150000002430 hydrocarbons Chemical class 0.000 description 2
- 238000005470 impregnation Methods 0.000 description 2
- 239000011256 inorganic filler Substances 0.000 description 2
- 229910003475 inorganic filler Inorganic materials 0.000 description 2
- 230000001788 irregular Effects 0.000 description 2
- 238000010030 laminating Methods 0.000 description 2
- 230000007774 longterm Effects 0.000 description 2
- 229920001955 polyphenylene ether Polymers 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 229920001169 thermoplastic Polymers 0.000 description 2
- 239000004416 thermosoftening plastic Substances 0.000 description 2
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 1
- PIGFYZPCRLYGLF-UHFFFAOYSA-N Aluminum nitride Chemical compound [Al]#N PIGFYZPCRLYGLF-UHFFFAOYSA-N 0.000 description 1
- 229910019440 Mg(OH) Inorganic materials 0.000 description 1
- MXRIRQGCELJRSN-UHFFFAOYSA-N O.O.O.[Al] Chemical compound O.O.O.[Al] MXRIRQGCELJRSN-UHFFFAOYSA-N 0.000 description 1
- 229910010413 TiO 2 Inorganic materials 0.000 description 1
- 238000009825 accumulation Methods 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- WEUCVIBPSSMHJG-UHFFFAOYSA-N calcium titanate Chemical compound [O-2].[O-2].[O-2].[Ca+2].[Ti+4] WEUCVIBPSSMHJG-UHFFFAOYSA-N 0.000 description 1
- 125000004432 carbon atom Chemical group C* 0.000 description 1
- 238000002425 crystallisation Methods 0.000 description 1
- 230000008025 crystallization Effects 0.000 description 1
- 230000032798 delamination Effects 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 239000003989 dielectric material Substances 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 125000001153 fluoro group Chemical group F* 0.000 description 1
- 238000009472 formulation Methods 0.000 description 1
- 239000003517 fume Substances 0.000 description 1
- 239000003292 glue Substances 0.000 description 1
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 239000002105 nanoparticle Substances 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 238000003672 processing method Methods 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 230000001568 sexual effect Effects 0.000 description 1
- 238000003786 synthesis reaction Methods 0.000 description 1
- 238000010998 test method Methods 0.000 description 1
- 229920005992 thermoplastic resin Polymers 0.000 description 1
Landscapes
- Compositions Of Macromolecular Compounds (AREA)
- Laminated Bodies (AREA)
- Reinforced Plastic Materials (AREA)
Abstract
一種氟素樹脂組合物是由(1)聚四氟乙烯(PTFE)樹脂、(2)含氟共聚物,選自四氟乙烯/全氟烷氧基乙烯基醚共聚物(PFA)或全氟乙烯丙烯共聚物(FEP)中的一種或一種以上的組合、(3)低分子量聚四氟乙烯微粉及(4)無機粉體(填充料)組成,使用用途適合應用於製作高頻電路板用的預浸體及銅箔基板,尤其是在製作銅箔基板的壓合過程中,從350℃降至250℃時,藉控制適當的壓合速率降溫介於1~4℃/min,可提高氟素樹脂組合物的結晶度,從而改善銅箔基板具備高熱導係數及寬範圍的介電常數,適合製成高頻電路基板。 A fluororesin composition is composed of (1) polytetrafluoroethylene (PTFE) resin, (2) fluorine-containing copolymer, selected from tetrafluoroethylene/perfluoroalkoxy vinyl ether copolymer (PFA) or perfluoro One or more combinations of ethylene propylene copolymer (FEP), (3) low molecular weight polytetrafluoroethylene fine powder and (4) inorganic powder (filler), suitable for use in the production of high frequency circuit boards Prepregs and copper foil substrates, especially during the lamination process of making copper foil substrates, from 350℃ to 250℃, by controlling the appropriate lamination rate to reduce the temperature between 1~4℃/min, it can be improved The crystallinity of the fluororesin composition improves the copper foil substrate with a high thermal conductivity and a wide range of dielectric constant, and is suitable for use as a high-frequency circuit substrate.
Description
本發明涉及一種氟素樹脂組合物,特別是成分中含有無機粉體與低分子量聚四氟乙烯微粉的氟素樹脂組合物,具備優異的介電性能及熱傳導特性,使用用途適合應用於製作高頻電路板用的預浸體及銅箔基板。 The present invention relates to a fluororesin composition, especially a fluororesin composition containing inorganic powder and low molecular weight polytetrafluoroethylene micropowder in its components. It has excellent dielectric properties and thermal conductivity characteristics. Prepreg and copper foil substrate for high-frequency circuit boards.
隨著無線網路、衛星雷達及5G通訊的快速發展,再搭配智慧聯結(Intelligence Connectivity)、彈性接取網路(Elastic RAN)及大規模陣列天線(Massive MIMO)的架構,開啟了5G為消費者帶來了新型態的電子通訊服務及汽車智慧駕駛服務。但是,5G電子產品的功率輸出不斷提高,相關的應用頻率也大幅提升至毫米波頻段(30~300GHz),相對地,對於材料的散熱性需求亦大幅提升,在這種條件下,傳統FR4基板的介電性能,尤其是在高頻率下的訊號衰減特性,已無法滿足嚴苛的高頻傳輸需求。 With the rapid development of wireless networks, satellite radar and 5G communications, combined with the architecture of Intelligent Connectivity, Elastic RAN and Massive MIMO, 5G is opened for consumption The authors have brought a new type of electronic communication services and car smart driving services. However, the power output of 5G electronic products continues to increase, and the relevant application frequency has also been greatly increased to the millimeter wave band (30~300GHz). In contrast, the heat dissipation requirements for materials have also increased significantly. Under this condition, traditional FR4 substrates The dielectric properties, especially the signal attenuation characteristics at high frequencies, have been unable to meet the stringent high-frequency transmission requirements.
為提高電子元件的散熱特性,根據先前技術的教導,大都是從材料、製程及加工方面來改良電子元件的散熱特性。例如,美國第9,508,648B2號專利教導在樹脂中調配約占90wt%的大量高導熱性無機填料,使得所製得的疊層半導體基板具備高散熱性、低熱膨脹等特性。然而,疊層半導體基板大量添加無機填料的後果,易造成疊層間的接著不佳,鑽 孔時易產生銅脫落,且材料中易出現空洞(voids),進而造成加工信賴性的問題。 In order to improve the heat dissipation characteristics of electronic components, according to the teachings of the prior art, most of them improve the heat dissipation characteristics of electronic components in terms of materials, processes and processing. For example, U.S. Patent No. 9,508,648B2 teaches that a large amount of high thermal conductivity inorganic fillers occupying about 90% by weight of the resin are compounded, so that the resulting laminated semiconductor substrate has characteristics such as high heat dissipation and low thermal expansion. However, the consequence of adding a large amount of inorganic fillers to the stacked semiconductor substrates is likely to cause poor adhesion between the stacked layers. Holes are prone to copper shedding, and voids are prone to appear in the material, thereby causing problems with processing reliability.
例如,美國專利第5,975,201號專利教導在電路板中同時使用高導熱係數材料及低導熱係數材料,並且由高導熱係數材料引導熱流至散熱片,進行有效熱量分配,以改善高功率電子元件在高功率運轉下的熱量累積問題。 For example, US Patent No. 5,975,201 teaches the use of both high thermal conductivity materials and low thermal conductivity materials in circuit boards, and the high thermal conductivity materials guide the heat flow to the heat sink for effective heat distribution to improve high-power electronic components at high The problem of heat accumulation under power operation.
印刷電路板除了從材料的選擇改善導熱特性外,藉由印刷電路板的結構設計,也可改善散熱特性。例如,於印刷電路板中埋置銅塊,並且利用銅塊的高導熱特性來改善高功率電子元件的散熱問題。 In addition to improving thermal conductivity from the choice of materials, printed circuit boards can also improve heat dissipation characteristics through the structural design of printed circuit boards. For example, a copper block is embedded in a printed circuit board, and the high thermal conductivity of the copper block is used to improve the heat dissipation problem of high-power electronic components.
另外,現有技術中的高頻微波基板,所使用的基板絕緣樹脂材料,常見的有碳氫化合物、聚苯醚、氰酸酯及聚四氟乙烯等絕緣樹脂材料。這些絕緣樹脂具有大量的對稱性結構,因此分子間的偶極矩相當小,大幅提高了高頻微波基板在高頻段下的絕緣特性。 In addition, in the prior art high-frequency microwave substrates, the insulating resin materials of the substrates used are common insulating resin materials such as hydrocarbons, polyphenylene ether, cyanate esters and polytetrafluoroethylene. These insulating resins have a large number of symmetrical structures, so the dipole moment between the molecules is quite small, which greatly improves the insulating properties of high-frequency microwave substrates at high frequency bands.
其中,所述碳氫化合物、聚苯醚及氰酸酯等絕緣樹脂,大多利用官能基的改性進行熱硬化,因此官能基的種類及數量顯著影響其介電特性。當需要同時達成機械及耐化等多項特性指標時,這些樹脂必須部分犧牲其優異的介電特性。 Among them, most of the insulating resins such as hydrocarbons, polyphenylene ether, and cyanate esters are thermally hardened by modification of functional groups, so the type and number of functional groups significantly affect their dielectric properties. When multiple characteristics such as mechanical and chemical resistance need to be achieved at the same time, these resins must partially sacrifice their excellent dielectric properties.
相對地,所述聚四氟乙烯樹脂為一熱塑性樹脂,主鏈碳原子周圍的氫原子被電負度最高的氟原子所取代,且具有極高的結晶度及對稱性,分子量通常高達1,000,000~5,000,000,因此聚四氟乙烯具有優異的化學惰性、熱穩定性(長期使用溫度可自-50℃至260℃)及介電特性(即,低介電常數及低介質損耗)。所以,聚四氟乙烯材料目前已大量廣泛運用於微 波通訊產業中。 In contrast, the polytetrafluoroethylene resin is a thermoplastic resin. The hydrogen atoms around the main chain carbon atoms are replaced by the most electronegative fluorine atoms, and it has extremely high crystallinity and symmetry. The molecular weight is usually as high as 1,000,000~ 5,000,000, so PTFE has excellent chemical inertness, thermal stability (long-term use temperature can be from -50 ℃ to 260 ℃) and dielectric characteristics (ie, low dielectric constant and low dielectric loss). Therefore, PTFE materials have been widely used in micro Wave communication industry.
聚四氟乙烯樹脂雖具備優異的物理特性,然而極大分子量的特性,導致其在熔點下具有極高的黏度(約1010~1012),流動不易,因此無法利用傳統熱塑性塑膠加工方式進行成型。此外,聚四氟乙烯樹脂的熔點高達327℃,亦使得聚四氟乙烯的加工環境更為嚴苛,對於加工機械及電力設備皆非傳統熱塑性塑膠加工設備可以滿足。 Although Teflon resin has excellent physical properties, but the characteristics of extremely large molecular weight, it has a very high viscosity at the melting point (about 10 10 ~ 10 12 ), the flow is not easy, so it can not be molded by traditional thermoplastic processing methods . In addition, the melting point of polytetrafluoroethylene resin is as high as 327℃, which also makes the processing environment of PTFE more severe. It is not enough for processing machinery and electric equipment that is not traditional thermoplastic processing equipment.
為了改善聚四氟乙烯不易加工的特性,現有技術中引進聚四氟乙烯的全氟系或非全氟系可熔融氟系樹脂,如四氟乙烯/全氟烷氧基乙烯基醚共聚物(PFA)、聚全氟乙丙烯(FEP)、乙烯-四氟乙烯共聚物(ETFE)、乙烯-三氟氯乙烯共聚物(ECTFE)、聚氟乙烯(PVF)或聚偏氟乙烯(PVDF)等。 In order to improve the difficult processing characteristics of polytetrafluoroethylene, the prior art introduced polytetrafluoroethylene perfluorinated or non-perfluorinated meltable fluorine resins, such as tetrafluoroethylene/perfluoroalkoxy vinyl ether copolymer ( PFA), polyperfluoroethylene propylene (FEP), ethylene-tetrafluoroethylene copolymer (ETFE), ethylene-chlorotrifluoroethylene copolymer (ECTFE), polyvinyl fluoride (PVF) or polyvinylidene fluoride (PVDF), etc. .
全氟系樹脂(PFA或FEP)多可維持氟系樹脂優異的介電性能,且有較低之加工溫度,但是價格較為昂貴,使其應用的普及有所受限。非全氟系樹脂(ETFE、ECTFE、PVF或PVDF等)雖同樣具有較低的加工溫度,且具有較優異之機械性能,然其長期可使用的溫度較低,且其熱穩定性、耐化性及介電性能都明顯較差。 Perfluorinated resins (PFA or FEP) can maintain the excellent dielectric properties of fluorinated resins, and have a lower processing temperature, but the price is more expensive, which limits their application. Although non-perfluorinated resins (ETFE, ECTFE, PVF, PVDF, etc.) also have lower processing temperatures and excellent mechanical properties, their long-term service temperature is lower, and their thermal stability and resistance Sexual and dielectric properties are significantly worse.
聚四氟乙烯為一高度結晶聚合物,生料(合成後未經任何熱履歷加工處理)結晶度高達92~98%,然而經過加工、燒結及冷卻後,結晶度會大幅降低到70%以下,熱傳導係數約為0.25W/m.K,無法有效應用於高功率電子元件產品。為解決此問題,現有技術教導藉添加大量高導熱無機陶瓷粉體,才能有效提高熱傳導係數至約1.5W/m.K的水準。然而,大量添加高導熱無機陶瓷粉體易影響高頻基板或板材的加工性及信賴性,使得 原聚四氟乙烯優異的物理及介電特性均被減弱。 PTFE is a highly crystalline polymer with a raw material (without any thermal history processing after synthesis) crystallinity is as high as 92~98%, but after processing, sintering and cooling, the crystallinity will be greatly reduced to below 70% , The thermal conductivity coefficient is about 0.25W/mK, which can not be effectively used in high-power electronic component products. In order to solve this problem, the prior art teaches that by adding a large amount of high thermal conductivity inorganic ceramic powder, the thermal conductivity can be effectively increased to a level of about 1.5 W/m.K. However, the addition of a large amount of high thermal conductivity inorganic ceramic powder easily affects the workability and reliability of high-frequency substrates or plates, making The excellent physical and dielectric properties of the original polytetrafluoroethylene are weakened.
有鑒於以上所述,本發明提供了一種氟素樹脂組合物,具備優異的介電性能及熱傳導特性,使用用途適合應用於製作高頻電路板用的預浸體及銅箔基板;尤其是,在製作銅箔基板的壓合過程中,從350℃降至250℃時,藉控制適當的壓合速率降溫介於1~4℃/min,可提高氟素樹脂組合物的結晶度,從而改善銅箔基板導熱性,且具備高熱導係數及寬範圍的介電常數,適合製成高頻電路基板。 In view of the above, the present invention provides a fluororesin composition with excellent dielectric properties and thermal conductivity characteristics, suitable for use in the production of prepregs and copper foil substrates for high-frequency circuit boards; in particular, In the process of laminating copper foil substrates, when the temperature is reduced from 350℃ to 250℃, by controlling the proper lamination rate and lowering the temperature between 1 and 4℃/min, the crystallinity of the fluororesin composition can be improved, thereby improving The copper foil substrate has thermal conductivity, and has a high thermal conductivity coefficient and a wide range of dielectric constant, which is suitable for making a high-frequency circuit substrate.
所述氟素樹脂組合物的成分,基於樹脂組合物的總重量,包含以下成份且各成分的總和為100wt%:(1)聚四氟乙烯(PTFE)樹脂,佔10~90wt%;(2)含氟共聚物,佔1~10wt%,選自四氟乙烯/全氟烷氧基乙烯基醚共聚物(PFA)或全氟乙烯丙烯共聚物(FEP)中的一種或一種以上;(3)低分子量聚四氟乙烯微粉,佔5~50%,且所述聚四氟乙烯的分子量為2,000~200,000,可以使用熱裂解降解法或輻照降解法製得;及(4)無機粉體,佔1~80wt%。 The components of the fluororesin composition, based on the total weight of the resin composition, contain the following components and the sum of the components is 100 wt%: (1) polytetrafluoroethylene (PTFE) resin, accounting for 10 to 90 wt%; (2 ) Fluorine-containing copolymer, accounting for 1~10wt%, one or more than one selected from tetrafluoroethylene/perfluoroalkoxy vinyl ether copolymer (PFA) or perfluoroethylene propylene copolymer (FEP); (3 ) Low molecular weight polytetrafluoroethylene fine powder, accounting for 5~50%, and the molecular weight of the polytetrafluoroethylene is 2,000~200,000, which can be prepared by thermal cracking degradation method or irradiation degradation method; and (4) inorganic powder, It accounts for 1~80wt%.
本發明的氟素樹脂組合物的有益效果,包括:1.氟素樹脂組合物藉導入低分子量聚四氟乙烯微粉提升熱傳導係數,可使樹脂組合物中的各成分用量更為多元,且更易控制氟素樹脂組合物的介電特性;2.使用此氟素樹脂組合物製得的銅箔基板,具備高熱導係數及寬範圍的介 電常數,且適合製成高頻電路基板,大幅改善了以往高導熱高頻微波基板無法同時兼顧熱傳導係數、介電特性及加工信賴性等綜合問題。 The beneficial effects of the fluororesin composition of the present invention include: 1. The fluororesin composition improves the thermal conductivity by introducing low molecular weight polytetrafluoroethylene fine powder, which can make the amount of each component in the resin composition more diverse and easier Control the dielectric properties of the fluororesin composition; 2. The copper foil substrate prepared using the fluororesin composition has a high thermal conductivity and a wide range of dielectric The electrical constant is suitable for making high-frequency circuit boards, which greatly improves the conventional problems of high thermal conductivity and high-frequency microwave substrates that cannot simultaneously take into account the thermal conductivity, dielectric characteristics and processing reliability.
本發明的氟素樹脂組合物,成分中含有無機粉體與低分子量聚四氟乙烯微粉的氟素樹脂組合物,具備優異的介電性能及熱傳導特性,使用用途適合應用於製作高頻電路板用的預浸體及銅箔基板。 The fluororesin composition of the present invention contains an inorganic powder and a low molecular weight polytetrafluoroethylene micropowder as a component, has excellent dielectric properties and thermal conductivity characteristics, and is suitable for use in the production of high-frequency circuit boards Used prepreg and copper foil substrate.
所述氟素樹脂組合物的成分,基於樹脂組合物的總重量,包含以下成份且各成分的總和為100wt%:(1)聚四氟乙烯(PTFE)樹脂,佔10~90wt%;(2)含氟共聚物,佔1~10wt%;(3)低分子量聚四氟乙烯微粉,佔5~50%;及(4)無機粉體,佔1~80wt%。 The components of the fluororesin composition, based on the total weight of the resin composition, contain the following components and the sum of the components is 100 wt%: (1) polytetrafluoroethylene (PTFE) resin, accounting for 10 to 90 wt%; (2 ) Fluorine-containing copolymer, accounting for 1~10wt%; (3) Low molecular weight polytetrafluoroethylene fine powder, accounting for 5~50%; and (4) Inorganic powder, accounting for 1~80wt%.
所述含氟共聚物選自四氟乙烯/全氟烷氧基乙烯基醚共聚物(PFA)或全氟乙烯丙烯共聚物(FEP)中的一種或一種以上。本發明的氟素樹脂組合物的含氟共聚物使用量大於10wt%時,在製作銅箔基板的壓合過程中,易出現流膠,影響銅箔基板的加工性及厚度均勻性。若含氟共聚物之比例小於1%,則銅箔基板容易有空洞產生。 The fluorine-containing copolymer is selected from one or more of tetrafluoroethylene/perfluoroalkoxy vinyl ether copolymer (PFA) or perfluoroethylene propylene copolymer (FEP). When the use amount of the fluorinated copolymer of the fluororesin composition of the present invention is greater than 10 wt%, during the lamination process of manufacturing the copper foil substrate, flow glue easily occurs, which affects the processability and thickness uniformity of the copper foil substrate. If the proportion of the fluorinated copolymer is less than 1%, the copper foil substrate is likely to have voids.
所述聚四氟乙烯(PTFE)樹脂的結構,如結構式(A)所示:
所述四氟乙烯/全氟烷氧基乙烯基醚共聚物(PFA)的結構,如結構式(B)所示:
所述全氟乙烯丙烯共聚物(FEP)的結構,如結構(C)所示:
所述低分子量聚四氟乙烯微粉可使用熱裂解降解法或或輻照降解法製得,優選為使用能源應用效率較高的輻照降解法製得。所述低分子量聚四氟乙烯微粉的分子量,為2,000~200,000,優選為10,000~100,000,平均粒徑為1~10微米。 The low-molecular-weight polytetrafluoroethylene fine powder can be prepared by thermal cracking degradation method or irradiation degradation method, preferably by using irradiation degradation method with high energy application efficiency. The molecular weight of the low molecular weight polytetrafluoroethylene fine powder is 2,000-200,000, preferably 10,000-100,000, and the average particle size is 1-10 microns.
所述氟素樹脂組合物的無機粉體使用量大於80wt%時,會影響銅箔基板的板材間的接著力及板材與銅箔間的接著力,易造成銅箔基板出現分層。 When the amount of the inorganic powder used in the fluororesin composition is greater than 80 wt%, it will affect the adhesion between the plates of the copper foil substrate and the adhesion between the plates and the copper foil, which may easily cause delamination of the copper foil substrate.
所述無機粉體的平均粒徑介於0.01~50微米,可選自為球型或不規則二氧化矽(SiO2)、二氧化鈦(TiO2)、氫氧化鋁(Al(OH)3)、球型或不規則型氧化鋁(Al2O3)、氫氧化鎂(Mg(OH)2)、氧化鎂(MgO)、碳酸鈣 (CaCO3)、氧化硼(B2O3)、氧化鈣(CaO)、鈦酸鍶(SrTiO3)、鈦酸鋇(BaTiO3)、鈦酸鈣(CaTiO3)、鈦酸鎂(2MgO.TiO2)、球型或團聚型或片狀氮化硼(BN)、氮化鋁(AlN)、碳化矽(SiC)、二氧化鈰(CeO2)或燻矽石(fume silica)中的一種或一種以上的組合。其中,所述燻矽石也可選自多孔奈米級(nano-sized)矽石粒子,平均粒徑為1至100奈米(nm)。所述二氧化矽可為熔融型及結晶型,考量組合物的介電特性,優選為熔融型二氧化矽。所述二氧化鈦可為金紅石、銳鈦礦或板鈦礦,考量組合物的介電特性,優選為金紅石。 The average particle size of the inorganic powder ranges from 0.01 to 50 microns, which can be selected from spherical or irregular silica (SiO 2 ), titanium dioxide (TiO 2 ), aluminum hydroxide (Al(OH) 3 ), Spherical or irregular alumina (Al 2 O 3 ), magnesium hydroxide (Mg(OH) 2 ), magnesium oxide (MgO), calcium carbonate (CaCO 3 ), boron oxide (B 2 O 3 ), calcium oxide (CaO), strontium titanate (SrTiO 3 ), barium titanate (BaTiO 3 ), calcium titanate (CaTiO 3 ), magnesium titanate (2MgO.TiO 2 ), spherical or agglomerated or flake boron nitride ( BN), aluminum nitride (AlN), silicon carbide (SiC), ceria (CeO 2 ) or fumed silica (fume silica) one or more combinations. Wherein, the fumed silica can also be selected from porous nano-sized silica particles with an average particle size of 1 to 100 nanometers (nm). The silicon dioxide may be of a molten type and a crystalline type, and considering the dielectric properties of the composition, it is preferably a molten silicon dioxide. The titanium dioxide may be rutile, anatase or brookite, and considering the dielectric properties of the composition, it is preferably rutile.
本發明的氟素樹脂組合物,有添加低分子量聚四氟乙烯微粉及無機粉體,利用低分子量聚四氟乙烯微粉優異的短分子鏈排列能力,並搭配適當之高溫燒結及高溫壓合之製程參數,可有效增加預浸體及銅箔基板的結晶度。增加材料結晶度的目的,在於提高材料的熱傳導係數。 The fluororesin composition of the present invention has the addition of low molecular weight polytetrafluoroethylene fine powder and inorganic powder, utilizes the excellent short molecular chain arrangement ability of low molecular weight polytetrafluoroethylene fine powder, and is matched with appropriate high temperature sintering and high temperature pressing. The process parameters can effectively increase the crystallinity of the prepreg and copper foil substrate. The purpose of increasing the crystallinity of the material is to increase the thermal conductivity of the material.
本發明控制低分子量聚四氟乙烯微粉結晶度的具體方法,是在製作銅箔基板的壓合過程中,藉控制及調整壓合過程的降溫速率達成,優選降溫速率(或稱結晶速率)為1~4℃/min。當降溫速率太快,則無法使低分子量聚四氟乙烯微粉排列結晶;但若降溫速率太慢,則製程耗時太長,影響產能,不具實用性。 The specific method for controlling the crystallinity of the low molecular weight polytetrafluoroethylene micropowder in the present invention is achieved by controlling and adjusting the cooling rate of the pressing process during the pressing process of making the copper foil substrate. The preferred cooling rate (or crystallization rate) is 1~4℃/min. When the cooling rate is too fast, the low molecular weight polytetrafluoroethylene powder can not be arranged and crystallized; but if the cooling rate is too slow, the process takes too long, affecting productivity, and is not practical.
本發明的氟素樹脂預浸體,是以玻璃纖維布為基材,且進行多次含浸塗佈本發明的氟素樹脂組合物製得。 The fluororesin prepreg of the present invention is obtained by using glass fiber cloth as a base material and performing the impregnation and coating of the fluororesin composition of the present invention multiple times.
本發明的銅箔基板,是以本發明的氟素樹脂預浸體為基板,經上表面及下表面貼合銅箔後,進行壓合過程中,在從350℃降至250℃時,藉控制適當的壓合速率降溫介於1~4℃/min,可控制及提高氟素樹脂 組合物的結晶度,從而改善銅箔基板導熱性,並且製得具備高熱導係數及寬範圍的介電常數的高頻電路基板。 The copper foil substrate of the present invention uses the fluororesin prepreg of the present invention as a substrate. After the copper foil is pasted on the upper surface and the lower surface, during the lamination process, when the temperature falls from 350°C to 250°C, Control the proper pressing rate and lower the temperature between 1~4℃/min, which can control and improve the fluororesin The crystallinity of the composition improves the thermal conductivity of the copper foil substrate, and a high-frequency circuit substrate having a high thermal conductivity and a wide range of dielectric constants is produced.
茲列舉以下實施例及比較例來闡明本發明的效果,但本發明的權利範圍不是僅限於實施例的範圍。 The following examples and comparative examples are cited to clarify the effect of the present invention, but the scope of rights of the present invention is not limited to the scope of the examples.
各實施例及比較例所製成的銅箔基板,係根據下述方法進行物性評估: The copper foil substrates produced in the examples and comparative examples were evaluated for physical properties according to the following methods:
1.銅箔基板壓合過程中的降溫速率:以熱壓機的溫控系統控制,且可控制的調整範圍介於1~20℃/min。 1. The cooling rate of copper foil substrate during the lamination process: It is controlled by the temperature control system of the hot press, and the controllable adjustment range is 1~20℃/min.
2.差示掃描量熱法(DSC)测试:使用(TA儀器公司的DSC Q20)示差掃描熱量分析儀量測基板的一次熔融熱焓。 2. Differential scanning calorimetry (DSC) test: (TA Instruments' DSC Q20) differential scanning calorimeter was used to measure the primary melting enthalpy of the substrate.
3.熱傳導分析測試:根據ASTM-D5470測試方法,使用界面材料熱阻及熱傳導係數量測儀器(臺灣瑞領科技股份有限公司;型號LW-9389)進行熱傳導分析測試。 3. Thermal conductivity analysis and testing: According to the ASTM-D5470 test method, thermal conductivity analysis and testing are performed using interface material thermal resistance and thermal conductivity coefficient measuring instruments (Taiwan Ruiling Technology Co., Ltd.; model LW-9389).
4.介電常數Dk(10GHz):使用介電分析儀(Dielectric Analyzer),型號HP Agilent E4991A,測試在頻率10G Hz時的介電常數Dk。 4. Dielectric constant Dk (10GHz): Use a dielectric analyzer (Dielectric Analyzer), model HP Agilent E4991A, to test the dielectric constant Dk at a frequency of 10G Hz.
5.介電損耗Df(10GHz):使用介電分析儀(Dielectric Analyzer),型號HP Agilent E4991A測試在頻率10G Hz時的介電損耗Df。 5. Dielectric loss Df (10GHz): Use a dielectric analyzer (Dielectric Analyzer), model HP Agilent E4991A to test the dielectric loss Df at a frequency of 10G Hz.
【實施例1~5、比較例1~3】 [Examples 1 to 5, Comparative Examples 1 to 3]
配製氟素樹脂組合物預浸液: Preparation of prepreg solution of fluorine resin composition :
根據表一的配方及比例,進行氟素樹脂組合物預浸液的配製。配製步驟包括:將聚四氟乙烯樹脂乳液及含氟共聚物樹脂乳液以轉速100rpm均勻攪拌混合20分鐘;接著,添加低分子量聚四氟乙烯微粉及無機 粉體到前述均勻混合的乳液中,並以轉速500rpm攪拌30分鐘至低分子量聚四氟乙烯微粉及無機粉體均勻分散懸浮於乳液中;最後,再以轉速100rpm均勻攪拌混合20分鐘製得氟素樹脂組合物預浸液。 According to the formulation and ratio of Table 1, the preparation of the fluororesin composition prepreg is performed. The preparation steps include: mixing Teflon resin emulsion and fluorocopolymer resin emulsion at 100 rpm for 20 minutes; then, adding low molecular weight polytetrafluoroethylene powder and inorganic The powder is mixed into the aforementioned homogeneously mixed emulsion, and stirred at 500 rpm for 30 minutes until the low molecular weight polytetrafluoroethylene fine powder and inorganic powder are uniformly dispersed and suspended in the emulsion; finally, it is stirred and mixed at 100 rpm for 20 minutes to prepare fluorine Prepreg of plain resin composition.
製作氟素樹脂預浸體: Production of fluorine resin prepreg :
取玻璃纖維布含浸上述製得的氟素樹脂組合物預浸液,之後,將含浸預浸液的玻璃纖維布送入高溫爐體內進行80~120℃下的乾燥、200~240℃下的烘焙、以及340~360℃下的燒結,加熱過程各區段皆維持至少20分鐘的充足加熱過程。重複上述含浸塗佈及加熱步驟,直至玻璃纖維布上的樹脂組合物層厚度,達到約100μm,即製得一種氟素樹脂預浸體。 The glass fiber cloth is impregnated with the prepreg solution of the fluorine resin composition prepared above, and then the glass fiber cloth impregnated with the prepreg liquid is sent into a high-temperature furnace body for drying at 80 to 120°C and baking at 200 to 240°C. , And sintering at 340~360℃, each section of the heating process maintains a sufficient heating process for at least 20 minutes. The above impregnation coating and heating steps are repeated until the thickness of the resin composition layer on the glass fiber cloth reaches about 100 μm, that is, a fluorine resin prepreg is prepared.
製作銅箔基板: Making copper foil substrate :
取上述製得之氟素樹脂浸漬體,經貼合銅箔後,在溫度350℃及壓力50kg/cm2的條件下,與銅箔壓合,持溫持壓2小時,之後,降溫至250℃後,再以10℃/min速率降溫至常溫製得銅箔基板;其中,在壓合過程中,溫度由350℃降至250℃時,實施例1~5及比較例1~3的氟素樹脂組合物中的聚四氟乙烯微粉結晶度,會因為降溫速率的不同,而產生不同結晶度,進而影響熱傳導係數。 Take the fluorinated resin impregnated body prepared above, after laminating the copper foil, press the copper foil under the conditions of temperature 350℃ and pressure 50kg/cm 2 , keep the temperature and pressure for 2 hours, then lower the temperature to 250 After ℃, then lower the temperature to room temperature at a rate of 10 ℃/min to prepare a copper foil substrate; wherein, during the lamination process, the temperature is reduced from 350 ℃ to 250 ℃, the fluorine of Examples 1 to 5 and Comparative Examples 1 to 3 The crystallinity of the polytetrafluoroethylene fine powder in the plain resin composition will have different crystallinity due to the different cooling rate, which will affect the thermal conductivity.
評估基板的結晶度、熱傳導係數及介電特性。各物性量測的結果如表一所示。 Evaluate the crystallinity, thermal conductivity and dielectric properties of the substrate. The results of each physical property measurement are shown in Table 1.
結果: The result :
實施例1至3的氟素樹脂組合物,藉添加不同比例的低分子量聚四氟乙烯微粉調整其結晶度,當低分子量聚四氟乙烯添加量增加,氟素樹脂組合物的結晶度明顯提升,進而提高基板的熱傳導係數至最高 1.33W/m.K,並且仍維持優異的介電特性及耐熱性。相較於比較例1的氟素樹脂組合物未添加任何低分子量聚四氟乙烯微粉,經壓板後,基板的耐熱性及電性雖皆優異,然而熱傳導係數僅有0.61W/m.K,顯示氟素樹脂組合物添加低分子量聚四氟乙烯的,具有顯著提高熱傳導係數的效果。 For the fluororesin compositions of Examples 1 to 3, the crystallinity is adjusted by adding different proportions of low molecular weight polytetrafluoroethylene fine powder. When the amount of low molecular weight polytetrafluoroethylene added increases, the crystallinity of the fluororesin composition is significantly improved To further increase the thermal conductivity of the substrate to the highest 1.33W/m.K, and still maintain excellent dielectric properties and heat resistance. Compared with the fluororesin composition of Comparative Example 1, without adding any low molecular weight polytetrafluoroethylene fine powder, after pressing the plate, although the substrate has excellent heat resistance and electrical properties, but the thermal conductivity coefficient is only 0.61W/mK, showing fluorine The addition of low molecular weight polytetrafluoroethylene to the plain resin composition has the effect of significantly improving the thermal conductivity.
實施例4及5的氟素樹脂組合物,藉調整無機粉體種類及與聚四氟乙烯樹脂比例,降溫速率提升至4.0m/min仍維持優異的結晶度及熱傳導係數,基板的介電常數Dk可以介於2.5~12.5間調整,較寬的介電常數範圍有利於不同印刷電路板的線路設計,低介電常數可用於高速傳輸特性的產品應用,高介電常數則可使線路微型化,縮小整體電子元件大小。 The fluororesin compositions of Examples 4 and 5 are adjusted by adjusting the type of inorganic powder and the ratio of polytetrafluoroethylene resin, the cooling rate is increased to 4.0m/min and the excellent crystallinity and thermal conductivity are maintained, and the dielectric constant of the substrate Dk can be adjusted from 2.5 to 12.5. The wider dielectric constant range is beneficial to the circuit design of different printed circuit boards. The low dielectric constant can be used for product applications with high-speed transmission characteristics. The high dielectric constant can make the circuit miniaturized. , Reduce the size of the overall electronic components.
與實施例2相較,比較例2將實施例2的基板壓合降溫速率從1.0℃/min提升至5.0℃/min,基板的熱傳導係數由原先1.15W/m.K降至0.79W/m.K,顯示低分子量聚四氟乙烯微粉的分子排列對於結晶度及熱傳導係數的影響。比較例3則將壓合降溫速率降低至0.5℃/min,對於提高結晶度及熱傳導係數效果不顯著,且耗時耗能,加工成本大幅提升。 Compared with Example 2, Comparative Example 2 increases the substrate cooling rate of Example 2 from 1.0°C/min to 5.0°C/min, and the thermal conductivity of the substrate is reduced from 1.15W/mK to 0.79W/mK. The effect of molecular arrangement of low molecular weight polytetrafluoroethylene powder on crystallinity and thermal conductivity. In Comparative Example 3, the temperature drop rate of pressing is reduced to 0.5°C/min, which has no significant effect on improving the crystallinity and thermal conductivity, and consumes time and energy, and the processing cost is greatly increased.
比較例4添加大量的無機粉體,且未添加低分子量聚四氟乙烯微粉,壓板後雖可有效提升熱導係數至1.83W/m.K,然而大量的無機粉體導致基板的無機粉體分散不佳,不均勻的介面導致介質損耗過高,且耐熱性不佳,易造成印刷電路板加工的信賴性問題。 Comparative Example 4 A large amount of inorganic powder is added, and low molecular weight polytetrafluoroethylene fine powder is not added. Although the thermal conductivity can be effectively improved to 1.83W/mK after pressing, the large amount of inorganic powder causes the inorganic powder of the substrate not to be dispersed Good, uneven interface leads to high dielectric loss, and poor heat resistance, which is easy to cause reliability problems in printed circuit board processing.
實施例1~5的銅箔基板,使用所製作的氟素樹脂預浸體壓合製成,具有優異的熱傳導性、介電性能及穩定的加工信賴性,且可同時實現寬範圍的介電常數區間,滿足高頻高功率電子產品對於散熱及介電特性的要求。 The copper foil substrates of Examples 1 to 5 are made by pressing the produced fluororesin prepreg, which has excellent thermal conductivity, dielectric properties and stable processing reliability, and can simultaneously achieve a wide range of dielectrics The constant interval meets the requirements for heat dissipation and dielectric characteristics of high-frequency high-power electronic products.
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| TWI766401B (en) | 2020-10-26 | 2022-06-01 | 南亞塑膠工業股份有限公司 | Fluoride-based resin prepreg material and printed circuit board using the same |
| TWI895571B (en) | 2021-01-06 | 2025-09-01 | 日商Agc股份有限公司 | Method for producing tetrafluoroethylene polymer composition, composition, metal foil laminate and stretched sheet |
| CN112812476B (en) * | 2021-02-04 | 2022-09-23 | 上海材料研究所 | Polytetrafluoroethylene composite material and preparation method and application thereof |
| CN115594512B (en) * | 2021-07-08 | 2023-05-30 | 清华大学 | PTFE-ceramic slurry for high-frequency microwaves and sintering film thereof, and preparation method and application thereof |
| CN113912968B (en) * | 2021-11-02 | 2022-12-20 | 中国科学院长春应用化学研究所 | Heat-resistant modified PTFE (polytetrafluoroethylene) heat-shrinkable material as well as preparation method and application thereof |
| CN114561072B (en) * | 2022-03-02 | 2023-07-25 | 浙江工业大学 | A preparation method of inorganic filler doped modified FEP composite dielectric film |
| CN115073865B (en) * | 2022-07-05 | 2023-11-07 | 广东生益科技股份有限公司 | Non-woven fabric prepreg, metal-clad foil plate and printed circuit board |
| CN115612232B (en) * | 2022-12-20 | 2023-04-28 | 中国电子科技集团公司第四十六研究所 | High-heat-conductivity low-dielectric-constant composite slurry for impregnation process and preparation method thereof |
| WO2024176534A1 (en) | 2023-02-22 | 2024-08-29 | 富士高分子工業株式会社 | Fluororesin sheet, method for producing same, and metal-clad fluororesin substrate containing same |
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