TWI680351B - Self-luminous photosensitive resin composition, color filter, and image display device - Google Patents

Abstract

The present invention relates to a self-luminous photosensitive resin composition, a color filter, and an image display device. More specifically, the present invention relates to a self-luminous photosensitive resin composition including an alkali-soluble resin, photoluminescent quantum dot particles, A photopolymerizable compound, a photopolymerization initiator, and a solvent. The alkali-soluble resin has an unsaturated bond capable of polymerizing in the structure, and the acrylic fluorenyl equivalent is 300 to 2,000 g / eq. The present invention can provide a self-luminous photosensitive resin composition of a high-quality color filter having no problems such as a decrease in light efficiency and poor photosensitivity characteristics in a hard-baking process and excellent brightness characteristics.

Description

Self-luminous photosensitive resin composition, color filter, and image display device

The present invention relates to a self-luminous photosensitive resin composition, a color filter manufactured using the same, and an image display device.

The color filter is a thin film film type optical component that can extract three colors of red, green, and blue from white light to form a fine pixel unit. The size of one pixel is about several tens to several hundreds of microns. This type of color filter includes a black matrix layer for shielding the boundary portion between pixels and forming a predetermined pattern on a transparent substrate, and a plurality of colors (typically red (R), green) for forming each pixel. (G) and blue (B) 3 primary colors) in which pixel portions arranged in a predetermined order are sequentially stacked. Generally speaking, a color filter can be manufactured by coating three or more colors on a transparent substrate by a dyeing method, an electrodeposition method, a printing method, or a pigment dispersion method. Recently, a pigment dispersion method using a pigment-dispersed photosensitive resin is used. Go mainstream.

As one of the methods for realizing a color filter, a pigment dispersion method is to coat a transparent substrate provided with a black matrix with a colorant and an alkali-soluble resin, a photopolymerizable monomer, a photopolymerization initiator, an epoxy resin, The photosensitive resin composition of a solvent and other additives is a method for forming a colored film after exposing the pattern to be formed, and then removing the non-exposed part with a solvent, and performing thermal curing, and repeating this series of processes. It is used in the manufacture of LCDs for mobile phones, notebook computers, monitors, and televisions. In recent years, the actual situation is that for a photosensitive resin composition for a color filter using a pigment dispersion method having various advantages, not only excellent pattern characteristics but also further improved performance such as high color reproduction rate, high brightness, and high contrast are required.

However, the reproduction of color is achieved by passing light from a light source through a color filter, but in the process, a part of the light is absorbed by the color filter, so the light efficiency is reduced. In addition, there are pigments that are used as color filters. The fundamental limitations such as insufficient perfect color reproduction.

Korean Patent Publication No. 2009-0036373 discloses that by replacing the color filter of a liquid crystal display device with a light emitting layer formed of a quantum dot phosphor, the light emitting efficiency can be improved and the display quality can be improved. However, the radicals generated in the hard-baking process performed during the manufacturing process of the color filter cause the surface of the quantum dots to be oxidized, and as a result, a problem that the light emitting characteristics are lowered occurs.

In addition, Korean Patent Publication No. 10-2013-0000506 discloses a display device including a light source and a display panel into which light emitted from the light source is incident. The display panel includes a plurality of color conversion units, and the color conversion The section includes a plurality of wavelength-converting particles that convert the wavelength of the light, and a plurality of color filter particles that absorb light in a predetermined wavelength band in the light.

However, although the above-mentioned prior art is similar in terms of including quantum dots, the content of the photosensitive resin composition is not specifically described, and only a display device with high color reproduction rate and brightness is disclosed. Therefore, additional development of the photosensitive resin composition is required .

Prior art literature Patent literature

Patent Document 1: Korean Patent Publication No. 10-2009-0036373

Patent Document 2: Korean Patent Publication No. 10-2013-0000506

The present invention is an invention for solving the above-mentioned problems, and an object thereof is to provide an alkali-soluble resin having an unsaturated bond capable of polymerizing, so that the quantum dot particles are uniformly dispersed, and there is no problem in the manufacturing process of a color filter. Problems such as a decrease in light efficiency and poor photosensitivity characteristics can produce a self-luminous photosensitive resin composition having excellent color filters.

In addition, another object of the present invention is to provide a color filter manufactured from the above-mentioned self-emission type photosensitive resin composition and an image display device including the same.

The self-luminous photosensitive resin composition according to the embodiment of the present invention for achieving the above object is characterized by including an alkali-soluble resin, photoluminescent quantum dot particles, a photopolymerizable compound, a photopolymerization initiator, and a solvent. Alkali-soluble resins have unsaturated bonds that can be polymerized within the structure, and the propylene fluorene equivalent is 300 to 2,000 g / eq.

In addition, the present invention is characterized by a color filter manufactured from the above-mentioned self-luminous photosensitive resin composition and an image display device including the same.

As described above, the self-luminous photosensitive resin composition according to the present invention has the effect that by including an alkali-soluble resin having an acrylic fluorenyl equivalent of 300 to 2,000 g / eq, it is possible to provide a matte efficiency in the hard-baking process. High quality color filters with excellent brightness characteristics.

The self-luminous photosensitive resin composition of the present invention includes an alkali-soluble resin, photoluminescent quantum dot particles, a photopolymerizable compound, a photopolymerization initiator, and a solvent.

Hereinafter, the self-luminous photosensitive resin composition will be described in detail.

The alkali-soluble resin contained in the self-luminous photosensitive resin composition of the present invention has the effect of making the non-exposed portion of the photosensitive resin layer alkali-soluble and capable of removing it, leaving the exposed area to remain. In addition, the alkali-soluble resin of the present invention has an unsaturated bond capable of polymerizing, so that a protective layer can be effectively formed around the surface of the quantum dots at the exposure stage, so that the influence of high temperature and oxygen radicals in the POB process is maximized. Eliminate and maintain high brightness.

As long as the alkali-soluble resin has a polymerizable unsaturated bond in the structure, Although it is specifically limited, as a specific example of a monomer, 3- (propenyloxy) -2-hydroxypropyl (meth) acrylate, 2-methoxy-3-propen-2-yloxy -Propyl-2-methyl-2-propionate, 2-oxiranyl-3-propen-2-methoxy-propyl-2-butyrate, 1,3-propanediol bis (methyl Base) acrylate, 1,3-butanediol di (meth) acrylate, hydroquinone di (meth) acrylate, 1,4-phenylene di (meth) acrylate, 1,4-cyclo Hexanediol di (meth) acrylate, 2-propenyloxymethyl-2-propionate, triethylene glycol di (meth) acrylate, tetraethylene glycol di (meth) acrylate, 1,6-hexanediol di (meth) acrylate, 1,12-dodecanediol di (meth) acrylate, trimethylolpropane tri (meth) acrylate, bisphenol A bis ( (Meth) acrylate, diurethane di (meth) acrylate, neopentyl glycol diacrylate, and the like.

The above alkali-soluble resin is a homopolymer or can be used in the form of a copolymer with other unsaturated monomers or a polymer blend obtained by polymerizing other unsaturated monomers. In this case, in the case of a copolymer, it may be in the form of an alternating copolymer, a random copolymer, or a block copolymer, and is not particularly limited in the present invention.

The type of the copolymerizable monomer is not particularly limited, and specific examples include methyl (meth) acrylate, ethyl (meth) acrylate, butyl (meth) acrylate, and (meth) acrylic acid 2 -Unsubstituted or substituted alkyl ester compounds of unsaturated carboxylic acids such as hydroxyethyl ester, amino ethyl (meth) acrylate; cyclopentyl (meth) acrylate, cyclohexyl (meth) acrylate, methyl ring Hexyl (meth) acrylate, cycloheptyl (meth) acrylate, cyclooctyl (meth) acrylate, 2-isopropyl-5-methylcyclohexyl (meth) acrylate, (meth) acrylic acid Cyclopentenyl, cyclohexenyl (meth) acrylate, cycloheptenyl (meth) acrylate, cyclooctenyl (meth) acrylate, 2-isopropyl-5-methylcyclohexadienyl (Meth) acrylate, isobornyl (meth) acrylate, tetrahydropiperanyl (meth) acrylate, adamantane (meth) acrylate, norbornyl (meth) acrylate, (meth) acrylic acid Unsaturated carboxylic acid ester compounds containing alicyclic substituents, such as tetrahydrofluorenyl ester and tricyclodecyl methacrylate; diol monosaturates such as oligoethylene glycol monoalkyl (meth) acrylate Ester compounds; (meth) acrylate, benzyl (meth Group) Unsaturated carboxylic acid ester compounds containing a substituent having an aromatic ring, such as phenoxy acrylate; aromatic vinyl compounds such as styrene, α-methylstyrene, vinyl toluene; vinyl acetate, vinyl propionate Cyanated vinyl compounds such as vinyl carboxylate, (meth) acrylonitrile, α-chloroacrylonitrile; N-cyclohexyl-cis-butene-diimide, N-phenyl-cis-butene-diimide, N -Maleimide compounds such as benzylcisbutenediimide and the like.

In the present invention, the alkali-soluble resin preferably has a polystyrene-equivalent weight average molecular weight in the range of 3,000 to 100,000, and more preferably in the range of 5,000 to 50,000. If the weight-average molecular weight of the alkali-soluble resin is within the above range, it is preferred that the film in the exposed portion is less likely to develop during development and the solubility in the non-exposed portion is good.

The acid value of the alkali-soluble resin of the present invention is preferably in the range of 30 to 150 mg KOH / g based on the solid content. When the acid value is less than 30 mg KOH / g, the solubility in the alkaline developing solution may be low, and residues may remain on the substrate. When the acid value exceeds 150 mg KOH / g, the possibility of pattern peeling may change. high.

The molecular weight distribution of the alkali-soluble resin is preferably 1.0 to 6.0, and more preferably 1.5 to 4.0. When the molecular weight distribution of the alkali-soluble resin is within the above range, the developability is excellent.

The alkali-soluble resin of the present invention preferably has a propylene fluorenyl equivalent of 300 to 2,000 g / eq, and more preferably 400 to 1,000 g / eq. When the equivalent of the alkali-soluble resin acryl group is within the above-mentioned range, it is possible to prevent matte development in the color filter process. On the other hand, when the alkali-soluble resin has an acrylic fluorenyl equivalent of more than 2,000 g / eq, the ability to effectively protect the quantum dots is insufficient, so it is not suitable. When the acrylic fluorenyl equivalent is less than the above range, The aspect is good, but there is a problem that it does not dissolve during development and peels off.

The alkali-soluble resin of the present invention is preferably contained in an amount of 5 to 80% by weight, and more preferably contained in an amount of 10 to 70% by weight based on the solid content in the self-luminous photosensitive resin composition. When the content of the alkali-soluble resin is within the above range, dispersion of the quantum dots is easy, and the luminous efficiency can be maintained at a high level in the process.

The self-luminous photosensitive resin composition of the present invention includes photoluminescent quantum dot particles.

The so-called quantum dots are nanometer-sized semiconductor substances. Atoms form molecules, and molecules form aggregates of small molecules such as clusters to form nano particles. Such nano particles are called quantum dots especially when they have semiconductor characteristics. If a quantum dot receives energy from the outside and becomes an excited state, it will automatically release energy corresponding to the corresponding energy band gap.

The photosensitive resin composition of the present invention contains such photoluminescent quantum dot particles, and a color filter manufactured therefrom can emit light by photoirradiation (photoluminescence). In addition, since light having color is emitted, further color reproducibility is excellent, and light is emitted in all directions by photoluminescence, so that a viewing angle can be improved.

The quantum dot particles involved in the present invention are not particularly limited as long as the quantum dot particles can emit light by light stimulation, and can be selected from, for example, II-VI semiconductor compounds; III-V semiconductor compounds; IV-VI semiconductor compounds; Group IV elements or compounds containing them; groups consisting of combinations thereof. They can be used alone or in combination of two or more.

The above II-VI semiconductor compounds may be selected from the group consisting of two elements selected from the group consisting of CdS, CdSe, CdTe, ZnS, ZnSe, ZnTe, ZnO, HgS, HgSe, HgTe, and mixtures thereof. Compound selected from the group consisting of CdSeS, CdSeTe, CdSTe, ZnSeS, ZnSeTe, ZnSTe, HgSeS, HgSeTe, HgSTe, CdZnS, CdZnSe, CdZnTe, CdHgS, CdHgSe, CdHgTe, HgZnS, HgZnSe, HgZnTe, and mixtures thereof Elemental compounds, and four-element compounds selected from the group consisting of CdZnSeS, CdZnSeTe, CdZnSTe, CdHgSeS, CdHgSeTe, CdHgSTe, HgZnSeS, HgZnSeTe, HgZnSTe, and mixtures thereof; the aforementioned III-V semiconductor compounds may be selected from the group consisting of Group: Two-element compound selected from the group consisting of GaN, GaP, GaAs, GaSb, AlN, AlP, AlAs, AlSb, InN, InP, InAs, InSb, and mixtures thereof, selected from the group consisting of GaNP, GaAs, GaNSb , GaPAs, GaPSb, AlNP, AlNAs, AlNSb, AlPAs, AlPSb, InNP, InNAs, InNSb, InPAs, InPSb, GaAlNP, and mixtures of three-element compounds selected from the group consisting of GaAlNAs, GaAlNSb, GaAlPAs, GaAlPSb, GaInNP, GaInNAs, GaInNSb, GaInPAs, The four-element compounds in the group consisting of GaInPSb, InAlNP, InAlNAs, InAlNSb, InAlPAs, InAlPSb, and mixtures thereof; the above-mentioned group IV-VI semiconductor compounds may be selected from the group consisting of: selected from the group consisting of SnS, SnSe, SnTe, The two-element compound in the group consisting of PbS, PbSe, PbTe, and mixtures thereof is selected from the three elements in the group consisting of SnSeS, SnSeTe, SnSTe, PbSeS, PbSeTe, PbSTe, SnPbS, SnPbSe, SnPbTe, and mixtures thereof A compound, and a four-element compound selected from the group consisting of SnPbSSe, SnPbSeTe, SnPbSTe, and mixtures thereof; the above-mentioned Group IV elements or compounds containing them may be selected from the group consisting of: selected from the group consisting of Si, Ge, and The elemental compound in the group consisting of the mixture, and the two-element compound selected from the group consisting of SiC, SiGe, and mixtures thereof.

The quantum dot particles may be a homogeneous single structure; a dual structure such as a core-shell, a gradient structure, or the like; or a mixed structure thereof.

In the core-shell (core-shell) dual structure, substances that form a core and a shell, respectively, may be formed of the aforementioned different semiconductor compounds. For example, the core may include one or more substances selected from the group consisting of CdSe, CdS, ZnS, ZnSe, CdTe, CdSeTe, CdZnS, PbSe, AgInZnS, and ZnO, but is not limited thereto. The shell may include one or more substances selected from the group consisting of CdSe, ZnSe, ZnS, ZnTe, CdTe, PbS, TiO, SrSe, and HgSe, but is not limited thereto.

The colored photosensitive resin composition used in the manufacture of general color filters contains red, green, and blue colorants in order to express color. Similarly, photoluminescent quantum dot particles can be classified into red quantum dot particles. , Green quantum dot particles and blue quantum dot particles, the quantum dot particles involved in the present invention may be red quantum dot particles, green quantum dot particles Or blue quantum dot particles.

Quantum dot particles can be synthesized by a wet chemical process, an organic metal chemical vapor deposition process, or a molecular beam epitaxy process.

The wet chemical process is a method in which a precursor substance is added to an organic solvent to grow particles. During crystal growth, organic solvents are naturally located on the surface of the quantum dot crystals, and play the role of dispersant to regulate the growth of crystals. Therefore, they are used in combination with metal organic chemical vapor deposition (MOCVD) and molecular beam epitaxy (MBE). Compared with vapor deposition methods such as molecular beam epitaxy, the growth of nano particles can be controlled by an easier and cheaper process.

The content of the photoluminescent quantum dot particles according to the present invention is not particularly limited. For example, it is preferably contained in the total weight of the solid component of the self-luminous photosensitive resin composition in an amount of 3 to 80% by weight, and more preferably in an amount of 5 to 70. Contained by weight. When the content of the quantum dot particles is included in a range smaller than the above range, the luminous efficiency may be very weak. In the case that the content of the quantum dot particles is included in the above range, there is a problem that the content of other compositions is relatively insufficient and it is difficult to form a pixel pattern.

The photopolymerizable compound contained in the self-luminous photosensitive resin composition of the present invention is a compound that can be polymerized by the action of light and a photopolymerization initiator described later, and examples thereof include a monofunctional monomer, a difunctional monomer, Other polyfunctional monomers.

Specific examples of the monofunctional monomer include nonylphenyl carbitol acrylate, 2-hydroxy-3-phenoxypropyl acrylate, 2-ethylhexyl carbitol acrylate, and acrylic acid 2- Hydroxyethyl, N-vinylpyrrolidone and the like.

Specific examples of the difunctional monomer include 1,6-hexanediol di (meth) acrylate, ethylene glycol di (meth) acrylate, neopentyl glycol di (meth) acrylate, Triethylene glycol di (meth) acrylate, bis (acryloxyethyl) ether of bisphenol A, 3-methylpentanediol di (meth) acrylate, and the like.

Specific examples of other polyfunctional monomers include trimethylolpropane tri (methyl) Acrylate, pentaerythritol tri (meth) acrylate, pentaerythritol tetra (meth) acrylate, dipentaerythritol penta (meth) acrylate, dipentaerythritol hexa (meth) acrylate, and the like. Among these, a difunctional or more polyfunctional monomer is preferably used.

The photopolymerizable compound is preferably contained in an amount of 5 to 50% by mass, and more preferably contained in a range of 7 to 45% by mass, with respect to the solid content in the self-luminous photosensitive resin composition. When the photopolymerizable compound is included within the above range, the strength and smoothness of the pixel portion can be improved.

The photopolymerization initiator contained in the self-luminous photosensitive resin composition of the present invention is not limited, but is selected from the group consisting of a triazine-based compound, an acetophenone-based compound, a biimidazole-based compound, and an oxime compound. More than one compound. The self-luminous photosensitive resin composition containing the above-mentioned photopolymerization initiator is highly sensitive, and an image element formed using the composition can improve the strength and patternability of the pixel portion.

In addition, when a photopolymerization initiator is used in combination with a photopolymerization initiator, the self-luminous photosensitive resin composition containing the photosensitizer is more sensitive, and the productivity when forming a color filter using the composition is improved. .

Examples of the triazine-based compound include 2,4-bis (trichloromethyl) -6- (4-methoxyphenyl) -1,3,5-triazine, 2,4-bis (tri (Chloromethyl) -6- (4-methoxynaphthyl) -1,3,5-triazine, 2,4-bis (trichloromethyl) -6-piperyl-1,3,5-tri Azine, 2,4-bis (trichloromethyl) -6- (4-methoxystyryl) -1,3,5-triazine, 2,4-bis (trichloromethyl) -6- [2- (5-methylfuran-2-yl) vinyl] -1,3,5-triazine, 2,4-bis (trichloromethyl) -6- [2- (furan-2-yl ) Vinyl] -1,3,5-triazine, 2,4-bis (trichloromethyl) -6- [2- (4-diethylamino-2-methylphenyl) vinyl] -1,3,5-triazine, 2,4-bis (trichloromethyl) -6- [2- (3,4-dimethoxyphenyl) vinyl] -1,3,5-tri Hydrazine, etc.

Examples of the acetophenone-based compound include diethoxyacetophenone, 2-hydroxy-2-methyl-1-phenylpropane-1-one, benzophenone dimethyl ketal, and 2-acetophenone. Hydroxy-1- [4- (2-hydroxyethoxy) phenyl] -2-methylpropane-1-one, 1-hydroxycyclohexylphenyl ketone, 2-methyl-1- (4-methyl Thiophenyl) -2-morpholinopropane-1-one, 2-benzyl-2-dimethylamino-1- (4-morpholinophenyl) butane-1-one, 2- An oligomer of hydroxy-2-methyl-1- [4- (1-methylvinyl) phenyl] propane-1-one and the like. Moreover, the compound represented by the following chemical formula 1 is mentioned.

In the above Chemical Formula 1, R ₁ to R ₄ are each independently the same or different from each other, and represent a hydrogen atom, a halogen atom, a hydroxyl group, a C1-C12 alkyl group substituted or unsubstituted phenyl group, a C1-C12 alkyl group, or Unsubstituted benzyl, or C1-C12 alkyl substituted or unsubstituted naphthyl.

The type of the compound represented by the above Chemical Formula 1 is not particularly limited, and specifically, 2-methyl-2-amino (4-morpholinylphenyl) ethane-1-one, 2-ethyl 2-amino (4-morpholinophenyl) ethane-1-one, 2-propyl-2-amino (4-morpholinophenyl) ethane-1-one, 2-butyl 2-amino (4-morpholinophenyl) ethane-1-one, 2-methyl-2-amino (4-morpholinophenyl) propane-1-one, 2-methyl- 2-amino (4-morpholinophenyl) butane-1-one, 2-ethyl-2-amino (4-morpholinophenyl) propane-1-one, 2-ethyl-2 -Amino (4-morpholinophenyl) butane-1-one, 2-methyl-2-methylamino (4-morpholinophenyl) propane-1-one, 2-methyl- 2-dimethylamino (4-morpholinophenyl) propane-1-one, 2-methyl-2-diethylamino (4-morpholinophenyl) propane-1-one, and the like.

Examples of the biimidazole compound include 2,2'-bis (2-chlorophenyl) -4,4 ', 5,5'-tetraphenylbiimidazole and 2,2'-bis (2,3 -Dichlorophenyl) -4,4 ', 5,5'-tetraphenylbiimidazole, 2,2'-bis (2-chlorophenyl) -4,4', 5,5'-tetrakis (alkane) Oxyphenyl) biimidazole, 2,2'-bis (2-chlorophenyl) -4,4 ', 5,5'-tetrakis (trialkoxyphenyl) biimidazole, 4,4', 5 , An imidazole compound in which a phenyl group at the 5 ′ position is substituted with an alkoxycarbonyl group, and the like. Among them, 2,2'-bis (2-chlorophenyl) -4,4 ', 5,5'-tetraphenylbiimidazole and 2,2'-bis (2,3-dichlorophenyl) are preferably used. -4,4 ', 5,5'-tetraphenylbiimidazole.

As said oxime compound, the following chemical formula is mentioned.

系化合物、蒽系化合物等。其能夠分別單獨使用或兩種以上組合使用。 In addition, as long as the effect of the present invention is not impaired, other photopolymerization initiators and the like commonly used in the technology may be further included. Examples of other photopolymerization initiators include benzoin-based compounds, benzophenone-based compounds, and 9-oxosulfur.

Compounds, anthracene compounds, and the like. They can be used individually or in combination of two or more kinds.

Examples of the benzoin-based compound include benzoin, benzoin methyl ether, benzoin ethyl ether, benzoin isopropyl ether, and benzoin isobutyl ether.

Examples of the benzophenone-based compound include benzophenone, methyl benzophenone benzoate, 4-phenylbenzophenone, and 4-benzophenone-4'-methyldiphenylsulfide. Compounds, 3,3 ', 4,4'-tetrakis (third butylperoxycarbonyl) benzophenone, 2,4,6-trimethylbenzophenone, 4,4'-bis (N, N'-dimethylamino) -benzophenone and the like.

系化合物，可舉出例如2-異丙基9-氧硫

、2,4-二乙基9-氧硫

、2,4-二氯9-氧硫

、1-氯-4-丙氧基9-氧硫

等。 As 9-oxysulfur

Compounds, such as 2-isopropyl 9-oxosulfur

, 2,4-diethyl 9-oxysulfur

, 2,4-dichloro 9-oxysulfur

, 1-chloro-4-propoxy9-oxysulfur

Wait.

Examples of the anthracene-based compound include 9,10-dimethoxyanthracene, 2-ethyl-9,10-dimethoxyanthracene, 9,10-diethoxyanthracene, and 2-ethyl-9 , 10-diethoxyanthracene and the like.

Other examples include 2,4,6-trimethylbenzidinediphenylphosphine oxide, 10-butyl-2-chloroacridone, 2-ethylanthraquinone, benzoin, 9,10- Phenanthrenequinone, camphorquinone, methyl benzamate, titanocene compound, etc. are used as other photopolymerization initiators.

In addition, as the photopolymerization initiation aid that can be used in combination with a photopolymerization initiator in the present invention, one or more compounds selected from the group consisting of an amine compound, a carboxylic acid compound, and the like can be preferably used.

Specific examples of the amine compound in the photopolymerization initiation aid include aliphatic amine compounds such as triethanolamine, methyldiethanolamine, and triisopropanolamine, and 4-dimethylaminobenzoic acid. Methyl ester, ethyl 4-dimethylaminobenzoate, isoamyl 4-dimethylaminobenzoate, 2-ethylhexyl 4-dimethylaminobenzoate, 2-dimethylbenzoate Ethylaminoethyl, N, N-dimethyl-p-toluidine, 4,4'-bis (dimethylamino) benzophenone (alias: melidone), 4,4'-bis (bis Aromatic amine compounds such as ethylamino) benzophenone. As the amine compound, an aromatic amine compound is preferably used.

Examples of the carboxylic acid compound include phenylthioacetic acid, methylphenylthioacetic acid, ethylphenylthioacetic acid, methylethylphenylthioacetic acid, dimethylphenylthioacetic acid, and methylformaldehyde. Oxyphenyl thioacetic acid, dimethoxyphenyl thioacetic acid, chlorophenyl thioacetic acid, dichlorophenyl thioacetic acid, N-phenylglycine, phenoxyacetic acid, naphthylthio Aromatic heteroacetic acids such as acetic acid, N-naphthyl glycine, and naphthyloxyacetic acid.

The content of the photopolymerization initiator in the self-luminous photosensitive resin composition of the present invention is preferably included in the range of 0.1 to 20% by mass, and more preferably 1 to 10% by mass based on the overall solid content. When the use amount of the photopolymerization initiator is included within the above range, the self-luminous photosensitive resin composition is highly sensitive, and the strength of the pixel portion and the smoothness of the surface of the pixel portion are excellent.

In addition, the usage amount of the photopolymerization initiation aid is preferably included in the range of 0.1 to 20% by mass, and more preferably 1 to 10% by mass based on the above-mentioned basis. When the use amount of the photopolymerization initiation aid is included within the above range, the sensitivity efficiency of the self-luminous photosensitive resin composition is further increased, and the productivity of a color filter formed using the composition can be improved. .

The solvent contained in the self-luminous photosensitive resin composition of the present invention is not particularly limited, and may be an organic solvent generally used in this technology.

Specific examples include ethylene glycol monoalkyl ethers such as ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, ethylene glycol monopropyl ether, and ethylene glycol monobutyl ether; diethyl ether; Diethylene glycol dialkyl ethers such as glycol dimethyl ether, diethylene glycol diethyl ether, diethylene glycol dipropyl ether, and diethylene glycol dibutyl ether; methyl cellosolve B Acid esters, ethyl cellosolve acetates and other ethylene glycol alkyl ether acetates; propylene glycol monomethyl ethers and other propylene glycol dialkyl ethers; propylene glycol monomethyl ether acetate and propylene glycol monoethyl ether ethyl Esters, propylene glycol monopropyl ether acetate, methoxybutyl acetate, methoxypentyl acetate and other alkylene glycol alkyl ether acetates; methyl ethyl ketone, acetone, Ketones such as methylpentyl ketone, methyl isobutyl ketone, cyclohexanone; alcohols such as ethanol, propanol, butanol, hexanol, cyclohexanol, ethylene glycol, glycerol; 3-ethoxypropane Esters such as ethyl acetate and methyl 3-methoxypropionate; cyclic esters such as γ-butyrolactone; etc. They can be used alone or in combination of two or more.

The viscosity of the solvent can be changed according to the coating method and device. Therefore, the content of the solvent is appropriately adjusted so that the concentration of the self-luminous photosensitive resin composition having the above-mentioned composition becomes 10 to 50% by weight. It is preferably 10 to 30% by weight.

The content of the solvent according to the present invention is not particularly limited. For example, the solvent may be contained in a total weight of 60 to 90% by weight, and may preferably be contained in a range of 70 to 85% by weight. When a solvent is included in the said range, coating property is favorable.

The present invention also provides a color filter manufactured from the above-mentioned self-light-emitting photosensitive resin composition.

When the color filter of the present invention is applied to an image display device, since it emits light by light from a light source of the image display device, excellent light efficiency can be achieved. In addition, since the light having color is released, the color reproducibility is excellent, and since light is emitted in all directions by photoluminescence, the viewing angle can be improved.

In more detail, in a common image display device including a color filter, white light passes through the color filter to express a color, and a part of the light is absorbed by the color filter in the process, so that the light efficiency may decrease. However, in the case where the color filter manufactured from the self-luminous photosensitive resin composition of the present invention is included, the color filter emits light due to the light from the light source, and therefore, excellent light efficiency can be achieved.

The color filter includes a substrate and a pattern layer formed on the substrate.

Regarding the substrate, the color filter itself may be a substrate, or may be a portion where the color filter is located in a display device or the like, which is not particularly limited. The substrate may be glass, silicon (Si), silicon oxide (SiO _x ), or a polymer substrate, and the polymer substrate may be polyethersulfone (PES) or polycarbonate (PC).

The pattern layer is a layer containing the self-luminous photosensitive resin composition of the present invention, and may be a layer formed by coating the above-mentioned self-luminous photosensitive resin composition, exposing with a predetermined pattern, developing, and thermally curing.

The pattern layer formed of the self-light-emitting photosensitive resin composition may include a red pattern layer containing red quantum dot particles, a green pattern layer containing green quantum dot particles, and a blue pattern layer containing blue quantum dot particles. When light is irradiated, the red pattern layer emits red light, the green pattern layer emits green light, and the blue pattern layer emits blue light.

In this case, when applied to an image display device, the light emitted from the light source is not particularly limited, but in terms of excellent color reproducibility, a light source that emits blue light can be used.

According to another embodiment of the present invention, the pattern layer may include only two color pattern layers among a red pattern layer, a green pattern layer, and a blue pattern layer. In this case, the pattern layer further includes a transparent pattern layer containing no quantum dot particles.

When the pattern layer includes only two colors, a light source that emits light of a wavelength of the remaining color that is not included can be used. For example, when a red pattern layer and a green pattern layer are included, a light source that emits blue light can be used. In this case, the red quantum dot particles emit red light, the green quantum dot particles emit green light, and the transparent pattern layer directly transmits blue light to display blue.

The color filter including the substrate and the pattern layer described above may further include a spacer formed between the patterns, and may further include a black matrix. In addition, a protective film formed on an upper portion of the pattern layer of the color filter may be further included.

In addition, the present invention provides an image display device including the color filter.

The color filter of the present invention can be applied not only to common liquid crystal display devices, but also to It is used in various image display devices such as electroluminescence display devices, plasma display devices, and field emission display devices.

The image display device of the present invention may include a color filter including a red pattern layer containing red quantum dot particles, a green pattern layer containing green quantum dot particles, and a blue pattern layer containing blue quantum dot particles. In this case, when applied to an image display device, the light emitted from the light source is not particularly limited, but in terms of excellent color reproducibility, a light source that emits blue light is preferably used.

According to another embodiment of the present invention, the image display device of the present invention may include a color filter including only two color pattern layers among a red pattern layer, a green pattern layer, and a blue pattern layer. In this case, the color filter further includes a transparent pattern layer containing no quantum dot particles.

When the pattern layer includes only two colors, a light source that emits light of a wavelength of the remaining color that is not included can be used. For example, when a red pattern layer and a green pattern layer are included, a light source that emits blue light can be used. In this case, the red quantum dot particles emit red light, the green quantum dot particles emit green light, and the transparent pattern layer directly transmits blue light to display blue.

The image display device of the present invention has excellent light efficiency, high display brightness, excellent color reproducibility, and can have a wide viewing angle.

Hereinafter, the present invention will be described in detail through examples. However, the following examples are used to further explain the present invention, and the scope of the present invention is not limited by the following examples. The following embodiments can be appropriately modified and changed by those skilled in the art within the scope of the present invention.

Production Example 1. Synthesis of a photoluminescence green quantum dot particle A having a CdSe (core) / ZnS (shell) structure

Add CdO (0.4mmol), zinc acetate (4mmol), oleic acid (5.5mL) and 1-octadecene (20mL) to the reactor, and heat It was allowed to react to 150 ° C. Then, in order to remove the acetic acid generated by replacing oleic acid with zinc, the above reactant was left under a vacuum of 100 mTorr for 20 minutes. Then, heat was applied at 310 ° C to obtain a transparent mixture, and the mixture was maintained at 310 ° C for 20 minutes. Then, 0.4 mmol of Se powder and 2.3 mmol of S powder were dissolved in 3 mL of trioctylphosphine. The Se and S solutions were quickly injected into the reactor charged with Cd (OA) ₂ and Zn (OA) ₂ solutions. After the thus-obtained mixture was grown at 310 ° C for 5 minutes, the growth was interrupted using an ice bath. Then, it was precipitated with ethanol, and the quantum dots were separated by a centrifugal separator. Excess impurities were washed with chloroform and ethanol, thereby obtaining 3 ~ CdSe (core) / ZnS (shell) structure quantum dot particle A with 5nm particle.

Production Example 2-1. Synthetic alkali-soluble resin (D1)

Prepare a flask equipped with a stirrer, a thermometer reflux cooling tube, a dropping funnel, and a nitrogen introduction tube. On the other hand, put in 40 parts by weight of N-benzyl cis butylene diimide and 10 parts by weight of tricyclodecyl methacrylate. 50 parts by weight of acrylic acid, 4 parts by weight of m-butylbutylperoxy-2-ethylhexanoate, 20 parts by weight of propylene glycol monomethyl ether acetate (hereinafter referred to as "PGMEA"), 20 parts by weight of propylene glycol After monomethyl ether, the mixture was stirred and mixed to prepare a monomer dropping funnel. 6 parts by weight of n-dodecanethiol and 24 parts by weight of PGMEA were added and stirred to prepare a chain transfer agent dropping funnel.

Then, 395 parts by weight of PGMEA was introduced into the flask, and after the atmosphere in the flask was replaced with air from nitrogen, the temperature of the flask was raised to 90 ° C. while stirring. Then, the monomer and the chain transfer agent were added dropwise from the dropping funnel. During the dropwise addition, the temperature was maintained at 90 ° C for 2h, and after 1h, the temperature was raised to 110 ° C and maintained for 3h, and then cooled to room temperature to obtain 29.1% by weight of solid content, a weight average molecular weight of 10,000, and an acid value of 140mg KOH / g of resin D1.

Production Example 2-2: Synthesis of alkali-soluble resin (D2)

Prepare a flask equipped with a stirrer, a thermometer reflux cooling tube, a dropping funnel, and a nitrogen introduction tube. On the other hand, put in 40 parts by weight of N-benzyl cis butylene diimide and 10 parts by weight of tricyclodecyl methacrylate. , 50 parts by weight of acrylic acid, 4 parts by weight of m-third butyl peroxide- 2-Ethylhexanoate, 20 parts by weight of propylene glycol monomethyl ether acetate (hereinafter referred to as "PGMEA"), 20 parts by weight of propylene glycol monomethyl ether, stirred and mixed to prepare a monomer dropping funnel, and add 6 parts by weight of n-dodecanethiol and 24 parts by weight of PGMEA were stirred and mixed to prepare a chain transfer agent dropping funnel.

Then, 395 parts by weight of PGMEA was introduced into the flask, and after the atmosphere in the flask was replaced with air from nitrogen, the temperature of the flask was raised to 90 ° C. while stirring. Next, the monomer and the chain transfer agent were dropped from the dropping funnel. During the dropwise addition, the temperature was maintained at 90 ° C. for 2 hours, and after 1 hour, the temperature was increased to 110 ° C. and maintained for 3 hours, and then the gas introduction tube was introduced to start bubbling of a mixed gas of oxygen / nitrogen = 5/95 (v / v). Next, 5 parts by weight of glycidyl methacrylate, 0.4 parts by weight of 2,2′-methylenebis (4-methyl-6-tert-butylphenol), and 0.8 parts by weight of triethylamine were charged into the flask. The reaction was continued at 110 ° C. for 8 hours, and then cooled to room temperature to obtain a resin D2 having a solid content of 29.1% by weight, a weight average molecular weight of 10,000, an acid value of 130 mg KOH / g, and an equivalent of 4,300 g / eq of acrylfluorene.

Production Example 2-3: Synthesis of alkali-soluble resin (D3)

Prepare a flask equipped with a stirrer, a thermometer reflux cooling tube, a dropping funnel, and a nitrogen introduction tube. On the other hand, put in 40 parts by weight of N-benzyl cis butylene diimide and 10 parts by weight of tricyclodecyl methacrylate. 50 parts by weight of acrylic acid, 4 parts by weight of m-butylbutylperoxy-2-ethylhexanoate, 20 parts by weight of propylene glycol monomethyl ether acetate (hereinafter referred to as "PGMEA"), 20 parts by weight of propylene glycol After monomethyl ether, the mixture was stirred and mixed to prepare a monomer dropping funnel. 6 parts by weight of n-dodecanethiol and 24 parts by weight of PGMEA were added and stirred to prepare a chain transfer agent dropping funnel.

Then, 395 parts by weight of PGMEA was introduced into the flask, and after the atmosphere in the flask was replaced with air from nitrogen, the temperature of the flask was raised to 90 ° C. while stirring. Next, the monomer and the chain transfer agent were dropped from the dropping funnel. During the dropwise addition, the temperature was maintained at 90 ° C. for 2 hours, and after 1 hour, the temperature was increased to 110 ° C. and maintained for 3 hours, and then the gas introduction tube was introduced to start bubbling of a mixed gas of oxygen / nitrogen = 5/95 (v / v). Next, 15 parts by weight of methyl was put into the flask. Glycidyl acrylate, 0.4 parts by weight of 2,2'-methylenebis (4-methyl-6-tert-butylphenol), 0.8 parts by weight of triethylamine, the reaction was continued at 110 ° C for 8 hours, and then cooled To the room temperature, a resin D3 having a solid content of 29.1% by weight, a weight average molecular weight of 10,000, an acid value of 110 mg KOH / g, and an acrylic fluorenyl equivalent of 1450 g / eq was obtained.

Production Example 2-4: Synthesis of alkali-soluble resin (D4)

Prepare a flask equipped with a stirrer, a thermometer reflux cooling tube, a dropping funnel, and a nitrogen introduction tube. On the other hand, put in 40 parts by weight of N-benzyl cis butylene diimide and 10 parts by weight of tricyclodecyl methacrylate. 50 parts by weight of acrylic acid, 4 parts by weight of m-butylbutylperoxy-2-ethylhexanoate, 20 parts by weight of propylene glycol monomethyl ether acetate (hereinafter referred to as "PGMEA"), 20 parts by weight of propylene glycol After monomethyl ether, the mixture was stirred and mixed to prepare a monomer dropping funnel. 6 parts by weight of n-dodecanethiol and 24 parts by weight of PGMEA were added and stirred to prepare a chain transfer agent dropping funnel.

Then, 395 parts by weight of PGMEA was introduced into the flask, and after the atmosphere in the flask was replaced with air from nitrogen, the temperature of the flask was raised to 90 ° C. while stirring. Next, the monomer and the chain transfer agent were dropped from the dropping funnel. During the dropwise addition, the temperature was maintained at 90 ° C. for 2 hours, and after 1 hour, the temperature was increased to 110 ° C. and maintained for 3 hours, and then the gas introduction tube was introduced to start bubbling of a mixed gas of oxygen / nitrogen = 5/95 (v / v). Next, 30 parts by weight of glycidyl methacrylate, 0.4 parts by weight of 2,2′-methylenebis (4-methyl-6-tert-butylphenol), and 0.8 parts by weight of triethylamine were put into the flask. The reaction was continued at 110 ° C. for 8 hours, and then cooled to room temperature to obtain 29.1% by weight of solid content, a weight average molecular weight of 10,000, an acid value of 85 mg KOH / g, and a propylene aquivalent equivalent of 725 g / eq of resin D4.

Production Example 2-5: Synthesis of alkali-soluble resin (D5)

A flask equipped with a stirrer, a thermometer reflux cooling tube, a dropping funnel, and a nitrogen introduction tube was prepared. On the other hand, 35 parts by weight of N-benzylcis butene diamidine and 10 parts by weight of tricyclodecyl methacrylate were charged. 55 parts by weight of acrylic acid, 4 parts by weight of m-tert-butylperoxy-2-ethylhexanoate, 20 parts by weight of propylene glycol monomethyl ether acetate (hereinafter referred to as "PGMEA"), 20 parts by weight of propylene glycol monomethyl ether, and then stirred to prepare a monomer dropping funnel. Add 6 parts by weight of n-dodecanethiol and 24 parts by weight of PGMEA and stir to prepare a chain transfer agent. funnel.

Then, 395 parts by weight of PGMEA was introduced into the flask, and after the atmosphere in the flask was replaced with air from nitrogen, the temperature of the flask was raised to 90 ° C. while stirring. Next, the monomer and the chain transfer agent were dropped from the dropping funnel. During the dropwise addition, the temperature was maintained at 90 ° C. for 2 hours, and after 1 hour, the temperature was increased to 110 ° C. and maintained for 3 hours, and then the gas introduction tube was introduced to start bubbling of a mixed gas of oxygen / nitrogen = 5/95 (v / v). Next, put 50 parts by weight of glycidyl methacrylate, 0.4 parts by weight of 2,2'-methylenebis (4-methyl-6-third-butylphenol), and 0.8 parts by weight of triethylamine into the flask. The reaction was continued at 110 ° C. for 8 hours, and then cooled to room temperature to obtain a resin D5 having a solid content of 29.1% by weight, a weight average molecular weight of 10,000, an acid value of 60 mg KOH / g, and an acrylfluorenyl equivalent of 435 g / eq.

Production Example 2-6: Synthesis of alkali-soluble resin (D6)

Prepare a flask equipped with a stirrer, a thermometer reflux cooling tube, a dropping funnel, and a nitrogen introduction tube. On the other hand, put 10 parts by weight of N-benzyl cis butylene diimide and 10 parts by weight of tricyclodecyl methacrylate. 80 parts by weight of glycidyl methacrylate, 4 parts by weight of m-butylbutylperoxy-2-ethylhexanoate, and 20 parts by weight of propylene glycol monomethyl ether acetate (hereinafter referred to as "PGMEA") After 20 parts by weight of propylene glycol monomethyl ether, the mixture was stirred and mixed to prepare a monomer dropping funnel. 6 parts by weight of n-dodecanethiol and 24 parts by weight of PGMEA were added and stirred to prepare a chain transfer agent dropping funnel.

Then, 395 parts by weight of PGMEA was introduced into the flask, and after the atmosphere in the flask was replaced with air from nitrogen, the temperature of the flask was raised to 90 ° C. while stirring. Next, the monomer and the chain transfer agent were dropped from the dropping funnel. During the dropwise addition, the temperature was maintained at 90 ° C. for 2 hours, and after 1 hour, the temperature was increased to 110 ° C. and maintained for 3 hours, and then the gas introduction tube was introduced to start bubbling of a mixed gas of oxygen / nitrogen = 5/95 (v / v). Next, 85 parts by weight of acrylic acid, 0.4 parts by weight of 2,2′-methylenebis (4-methyl-6-tert-butylphenol), and 0.8 parts by weight were charged into the flask. Triethylamine was further reacted at 110 ° C for 8 hours, and then cooled to room temperature to obtain a resin having a solid content of 29.1% by weight, a weight-average molecular weight of 10,000, an acid value of 60mg KOH / g, and an acrylic equivalent of 270g / eq. D6.

Examples 1 to 3 and Comparative Examples 1 to 3: Production of a self-luminous photosensitive resin composition

As described in the following Table 1, after mixing the components, the whole solid content was diluted with propylene glycol monomethyl ether acetate so that the solid content was 20% by weight, and then the mixture was sufficiently stirred to obtain a self-luminous photosensitive resin composition.

Manufacturing Example of Color Filter (Glass Substrate)

A color filter was manufactured using the self-luminous photosensitive resin composition manufactured in Examples 1 to 3 and Comparative Examples 1 to 3. That is, each of the above self-luminous photosensitive resin compositions was applied on a glass substrate by a spin coating method, and then placed on a hot plate and maintained at a temperature of 100 ° C. for 3 minutes to form a thin film. Next, a test was carried out on the film with a transmission pattern having a regular quadrangle having a length of 20 mm × 20 mm and a line / gap pattern of 1 μm to 100 μm. The photomask was irradiated with ultraviolet rays at a distance of 100 μm from the test photomask.

At this time, the ultra-high pressure mercury lamp (trade name USH-250D) manufactured by Shiyo Electric Co., Ltd. was used for the ultraviolet light source to irradiate the light with an exposure amount (365 nm) of 200 mJ / cm ² in the atmosphere, without using a special optical filter. The film irradiated with ultraviolet rays as described above was dipped in a KOH aqueous solution developing solution at pH 10.5 for 80 seconds for development. The glass plate to which the film was applied was washed with distilled water, dried by blowing nitrogen gas, and heated in a heating oven at 150 ° C. for 10 minutes to produce a color filter pattern. The film thickness of the self-luminous color pattern manufactured by the above was 3.0 μm.

Luminous Intensity Measurement

The area where the light was converted was measured using a 365nm Tube-type 4W UV irradiator (VL-4LC, VILBER LOURMAT) on the pattern portion formed by the 20mm × 20mm regular quadrangular pattern in the color filter forming the self-emitting pixel. In Example 1, In ~ 3 and Comparative Examples 1 ~ 2, the luminous intensity (Intensity) in the 550 nm region was measured using a spectrometer (Ocean Optics). It can be judged that the higher the measured luminous intensity (Intensity), the more excellent the self-luminous characteristics are exhibited. The measured results of luminous intensity (Intensity) are shown in Table 2 below.

In addition, a hard bake was performed at 230 ° C for 60 minutes, and the luminous intensity (Intensity) before the hard bake and the luminous intensity (Intensity) after the hard bake were measured to confirm that the level of luminous efficiency was maintained. In Table 2, the luminous intensity was maintained. Rate display.

Measurement of development type of self-luminous photosensitive resin composition

After the self-light-emitting photosensitive resin compositions of Examples 1 to 3 and Comparative Examples 1 to 3 were applied on a glass substrate by a spin coating method, they were placed on a hot plate and maintained at a temperature of 100 ° C. After forming a thin film for 3 minutes, it was immersed in a KOH aqueous solution developing solution at pH 10.5, and it was confirmed that the coated self-luminous photosensitive resin composition layer had a dissolved form or a peeled form during development, as described in In Table 2 below.

In the case of the dissolved form, the formation of the pixel pattern becomes good, but in the peeled form In this case, it is difficult to form a pixel pattern and it cannot be used.

As can be seen from Table 2 above, when Examples 1 to 3 and Comparative Example 3 using a resin having an acrylic fluorenyl equivalent of 2,000 g / eq or less, it was confirmed that the light emission intensity (Intensity) is superior to that of Comparative Examples 1 and 2. After the baking step is performed at 230 ° C, the luminous intensity is also maintained high.

Specifically, in Examples 1 to 3 and Comparative Example 3, as the equivalent of the acryl fluorene group increases, the luminous intensity (Intensity) and the maintenance rate increase, so it can be confirmed that it has the following effects: acryl fluorene in the structure The base functions as a protective layer for the quantum dots, and suppresses the development by extinction in the process. However, in the case of Comparative Example 3 using a resin having a propylene fluorene-based equivalent weight of 300 g / eq or less, it was confirmed that the light emission intensity and the maintenance rate were high. On the other hand, peeling occurred during development, and therefore it was not suitable for pattern formation.

Claims (8)

A self-luminous photosensitive resin composition, comprising an alkali-soluble resin, photoluminescent quantum dot particles, a photopolymerizable compound, a photopolymerization initiator, and a solvent, wherein the content is 3 to the total weight of the solid content. ~ 80% by weight of the aforementioned photoluminescent quantum dot particles, 5 ~ 50% by weight of the aforementioned photopolymerizable compound, 0.1 ~ 20% by weight of the aforementioned photopolymerization initiator, 5 ~ 80% by weight of the aforementioned alkali-soluble resin, and the alkali-soluble resin is in the structure It has unsaturated bonds that can be polymerized. The propylene fluorenyl equivalent is 300 to 2,000 g / eq. The aforementioned solvent does not contain a hydrocarbon-based solvent, and contains a group selected from ethylene glycol monoalkyl ethers and diethylene glycol dialkyl ethers. One or more selected from the group consisting of ethylene glycol alkyl ether acetates, propylene glycol dialkyl ethers, alkylene glycol alkyl ether acetates, ketones and alcohols. The self-luminous photosensitive resin composition according to claim 1, wherein the alkali-soluble resin is selected from the group consisting of 3- (propenyloxy) -2-hydroxypropyl (meth) acrylate, 2-methoxy- 3-propene-2-methoxy-propyl-2-methyl-2-propionate, 2-oxiranyl-3-propene-2-methoxy-propyl-2-butyrate , 1,3-propanediol di (meth) acrylate, 1,3-butanediol di (meth) acrylate, hydroquinone di (meth) acrylate, 1,4-phenylene di (meth) acrylate ) Acrylate, 1,4-cyclohexanediol di (meth) acrylate, 2-propenyloxymethyl-2-propionate, triethylene glycol di (meth) acrylate, tetraethylene glycol Alcohol di (meth) acrylate, 1,6-hexanediol di (meth) acrylate, 1,12-dodecanediol di (meth) acrylate, trimethylolpropane tri (methyl) ) One or more of the group consisting of acrylate, bisphenol A di (meth) acrylate, diurethane di (meth) acrylate, and neopentyl glycol diacrylate. The self-luminous photosensitive resin composition according to claim 1, wherein the alkali-soluble resin has a polystyrene-equivalent weight average molecular weight of 3,000 to 100,000. The self-luminous photosensitive resin composition according to claim 1, wherein the alkali-soluble resin has an acid value of 30 to 150 mg KOH / g. The self-luminous photosensitive resin composition according to claim 1, wherein the photoluminescent quantum dot particles are red quantum dot particles, green quantum dot particles, or blue quantum dot particles. The self-luminous photosensitive resin composition according to claim 1, wherein the photoluminescence quantum dot particles comprise a compound selected from the group consisting of a II-VI semiconductor compound, a III-V semiconductor compound, a IV-VI semiconductor compound, and a group IV element. Or one of a group consisting of a compound thereof and a combination thereof. A color filter manufactured by the self-emission type photosensitive resin composition as described in any one of Claims 1-6. An image display device comprising a color filter as claimed in claim 7.