TWI675469B - Display device for displaying static pattern and manufacturing method thereof and gift box - Google Patents

Abstract

The invention provides a display device for displaying a first pattern, a manufacturing method thereof, and a gift box using the same. The display device includes a substrate and a light emitting diode provided on the substrate. The light emitting diode includes a first electrode, a transparent insulating pattern layer, a light emitting layer, and a second electrode. The transparent insulation pattern layer is disposed on the first electrode, wherein the transparent insulation pattern layer has a thickness of less than or equal to 100 nm, and the transparent insulation pattern layer has a second pattern that is complementary to the first pattern. The light emitting layer covers the transparent insulating pattern layer and the first electrode, and the light emitting layer is electrically connected to the first electrode. The second electrode is disposed on the light emitting layer.

Description

Display device for displaying static pattern, manufacturing method and gift box thereof

The invention relates to a display device for displaying a static pattern, a manufacturing method and a gift box thereof, and particularly to a display device capable of switching a pattern display mode and a non-pattern mode, and a manufacturing method and a gift box using the display device.

In order to display a pattern according to requirements, a conventional display device includes an active array circuit and a plurality of pixels, so as to control the display of the pixels through the active array circuit. However, for the needs of displaying specific patterns, such as business cards or display cards, although traditional display devices can display specific patterns to meet this demand, the cost is too high, even far exceeding the original price of the product. The display device is not applied to these needs. At present, the demand for displaying specific patterns is generally only satisfied by printed paper. Although the required patterns can be displayed, users can directly see the patterns, that is, the paper cannot be switched in different states. Therefore, the application range of this paper is limited, and thus it cannot provide users with a wider range of needs.

One of the objectives of the present invention is to provide a display device for displaying a static pattern, a manufacturing method thereof and a gift box, so as to reduce the cost and increase the application range of the display device.

An embodiment of the present invention provides a display device for displaying a first pattern. The display device includes a substrate and a light emitting diode. The light emitting diode is disposed on the substrate and includes a first electrode, a transparent insulating pattern layer, a light emitting layer, and a second electrode. The transparent insulation pattern layer is disposed on the first electrode, wherein the transparent insulation pattern layer has a thickness of less than or equal to 100 nm, and the transparent insulation pattern layer has a second pattern that is complementary to the first pattern. The light emitting layer covers the transparent insulating pattern layer, and the light emitting layer is electrically connected to the first electrode. The second electrode is disposed on the light emitting layer.

Another embodiment of the present invention provides a manufacturing method of a display device for displaying a first pattern. First, a substrate and a first electrode are provided, wherein the first electrode is formed on the substrate. Thereafter, a transparent insulating pattern layer is formed on the first electrode, wherein the transparent insulating pattern layer has a thickness of less than or equal to 100 nm, and the transparent insulating pattern layer has a second pattern that is complementary to the first pattern. Next, a light emitting layer is formed to cover the transparent insulating pattern layer and the first electrode, wherein the light emitting layer is electrically connected to the first electrode. Then, a second electrode is formed on the light emitting layer to form a light emitting diode.

Another embodiment of the present invention provides a gift box, which includes an opening and a display device. The display device covers the opening and is used to display a first pattern. The display device includes a substrate and a light emitting diode. The light emitting diode is disposed on the substrate and includes a first electrode, a transparent insulating pattern layer, a light emitting layer, and a second electrode. The transparent insulation pattern layer is disposed on the first electrode, wherein the transparent insulation pattern layer has a thickness of less than or equal to 100 nm, and the transparent insulation pattern layer has a second pattern that is complementary to the first pattern. The light emitting layer covers the transparent insulating pattern layer, and the light emitting layer is electrically connected to the first electrode. The second electrode is disposed on the light emitting layer.

In the manufacturing method of the display device of the present invention, a transparent insulating pattern layer having a thickness of less than or equal to 100 nm is formed through an atomic layer deposition process, a sputtering process, or an electron beam evaporation process, so that the transparent insulating pattern layer can achieve an insulating effect. Therefore, the display device can have the function of switching the pattern display mode and the non-pattern mode. Furthermore, by reducing the thickness of the transparent insulating pattern layer to 50 nm or less, the visibility of the transparent insulating pattern layer can also be reduced to improve the transparency of the display device.

100, 404‧‧‧ display device

102‧‧‧ substrate

104‧‧‧first electrode

106‧‧‧ transparent insulating pattern layer

106a‧‧‧ transparent insulating layer

108‧‧‧ sacrificial pattern layer

108a‧‧‧ sacrificial layer

110‧‧‧ injection layer

112‧‧‧Light-emitting layer

114‧‧‧Second electrode

116‧‧‧Protective layer

302‧‧‧Online

LD‧‧‧Light Emitting Diode

P1‧‧‧The first pattern

P2‧‧‧Second Pattern

P3, P4 ‧‧‧ patterns

PW‧‧‧ Power

OP1‧‧‧first opening

OP2‧‧‧Second Opening

OP3‧‧‧ third opening

S1‧‧‧First surface

S2‧‧‧Second surface

L1, L2, L3, L4‧‧‧ curves

LB1, LB2‧‧‧‧Light

400‧‧‧ Gift Box

402‧‧‧ opening

406‧‧‧Box

408‧‧‧ Upper cover

406R‧‧‧Groove

410‧‧‧Connected to the shaft

FIG. 1 to FIG. 7 are schematic diagrams illustrating a method for manufacturing a display device according to a first embodiment of the present invention.

FIG. 8 is a schematic diagram showing the relationship between the transmittance and the wavelength of the transparent insulating layer and the substrate formed by the atomic layer deposition process.

FIG. 9 is a schematic diagram showing the relationship between the transmittance and the wavelength of a transparent insulating layer and a substrate formed by a sputtering process.

FIG. 10 is a schematic diagram showing the relationship between the transmittance and the wavelength of the transparent insulating layer and the substrate formed by the electron beam evaporation process.

11 and 12 are schematic diagrams illustrating a method for manufacturing a display device according to a second embodiment of the present invention.

FIG. 13 is a schematic diagram of a manufacturing method of a display device according to a third embodiment of the present invention.

FIG. 14 is a schematic side view of a gift box according to a fourth embodiment of the present invention when the gift box is placed on an upper lid.

FIG. 15 is a schematic side view of a gift box according to a fourth embodiment of the present invention when the upper cover is opened.

FIG. 1 to FIG. 7 are schematic diagrams of a method for manufacturing a display device according to a first embodiment of the present invention, wherein FIG. 6 is a schematic cross-sectional view of a display device according to the first embodiment of the present invention, and FIG. A schematic plan view of the display device of the embodiment. The display device 100 of the present invention is used to display a first pattern P1 that is static and has one meaning, as shown in FIG. 7. For example, the first pattern P1 may include a text description, a badge pattern, or a trademark pattern, but is not limited thereto. The manufacturing method of the display device 100 of this embodiment includes the following steps. As shown in FIG. 1, a substrate 102 and a first electrode 104 are first provided. The first electrode 104 is formed on the substrate 102. The substrate 102 is used to carry components formed in subsequent steps, and the substrate 102 may be a rigid substrate or a flexible substrate. Rigid substrates such as glass, plastic, quartz, sapphire or Other suitable materials. The flexible substrate may, for example, include at least one of polyimide (PI), polyethylene terephthalate (PET), or other suitable materials. The first electrode 104 may include a transparent conductive material. The transparent conductive material includes, for example, a transparent metal oxide material or a metal material having a thin thickness, wherein the transparent metal oxide material includes, for example, indium tin oxide (ITO), indium zinc oxide (IZO), Antimony tin oxide (ATO), aluminum zinc oxide (AZO), indium germanium zinc oxide (IGZO), other suitable oxides, or a combination of at least two of the above Or stacked, the thickness of the metal material may be, for example, less than 100 nm, so that the metal material is in a transparent state, but is not limited thereto. In an embodiment, the substrate 102 may be cut to a size that meets the requirements after the first electrode 104 is formed, but is not limited thereto.

Next, a transparent insulating pattern layer 106 is formed on the first electrode 104. The detailed description of forming the transparent insulating pattern layer 106 in this embodiment is as follows, but it is not limited thereto. First, a sacrificial layer 108a is formed on the first electrode 104. The sacrificial layer 108a may include, for example, a photoresist material or a tape, but is not limited thereto. Then, a patterning process is performed on the sacrificial layer 108 a to form a sacrificial pattern layer 108 on the first electrode 104 and expose the first electrode 104. The sacrificial pattern layer 108 may have a pattern P3 which is the same as the first pattern P1 to be displayed by the display device 100. In this embodiment, the patterning process may include a photolithographic process, but is not limited thereto. Specifically, as shown in FIG. 2, an exposure process and a photomask PM can be used first to make part of the sacrificial layer 108 a difficult to dissolve in the developer or easily dissolve in the developer. Taking the sacrificial layer 108a as a negative photoresist material as an example, the mask PM may have the same pattern as the first pattern P1 to be displayed by the display device 100, and the light beam LB1 transmitted through the light source passes through the mask PM to become patterned. The light LB2 is irradiated onto the sacrificial layer 108a, so that the portion of the sacrificial layer 108a having the pattern P3 is strengthened and is not easily dissolved in the developing solution. Therefore, as shown in FIG. 3, after the exposure process, a development process is performed on the sacrificial layer 108 a to remove portions that are not irradiated with light, thereby forming a sacrificial pattern layer 108. In detail, the sacrificial pattern layer 108 may have at least one first opening OP1, and the first opening OP1 exposes the first electrode 104 under the sacrificial pattern layer 108, and may have a pattern P4 complementary to the pattern P3. Yu Shi In an embodiment, the patterning process may also be an imprint process. In yet another embodiment, the patterning process may also include a laser etching process to directly remove a portion of the sacrificial layer 108 having the pattern P4 by using a laser, thereby forming a sacrificial pattern layer 108 having the pattern P3.

As shown in FIG. 4, after the sacrificial pattern layer 108 is formed, a transparent insulating layer 106 a is formed on the sacrificial pattern layer 108 and the exposed first electrode 104. In this embodiment, forming the transparent insulating layer 106 a may include, for example, an atomic layer deposition process, a sputtering process, or an electron gun evaporation process. It is worth mentioning that, when the sacrificial pattern layer 108 includes a photoresist material, in order to avoid high temperature, the photoresist material in the sacrificial pattern layer 108 is cross-linked, so that the photoresist material is not easy in subsequent processes For removal, the temperature of the atomic layer deposition process may be less than 150 ° C.

As shown in FIG. 5, the sacrificial pattern layer 108 and the transparent insulating layer 106 a on the sacrificial pattern layer 108 are subsequently removed to form a transparent insulating pattern layer 106 on the first electrode 104. Taking the sacrificial layer 108a as a photoresist material as an example, the step of removing the sacrificial pattern layer 108 may be referred to as a lift-off process, but the present invention is not limited thereto. In another embodiment, when the sacrificial layer 108 a is a tape, the tape can be peeled off directly to form a transparent insulating pattern layer 106 and the first electrode 104 is exposed. Since the sacrificial pattern layer 108 has the same pattern P3 as the first pattern P1 to be displayed by the display device 100, the transparent insulating pattern layer 106 formed by removing the sacrificial pattern layer 108 may have a second complementary to the first pattern P1. The pattern P2 and at least one second opening OP2 having a first pattern P1, wherein the second opening OP2 exposes the first electrode 104. The transparent insulating pattern layer 106 may include, for example, aluminum oxide (Al ₂ O ₃ ), hafnium oxide (HfO ₂ ), silicon oxide (SiO ₂ ), titanium oxide (TiO ₂ ), strontium titanate (SrTiO ₃ ), tantalum oxide (Ta ₂ O ₅ ), gadolinium oxide (Gd ₂ O ₃ ), zirconia (ZrO ₂ ), gallium oxide (Ga ₂ O ₃ ), vanadium oxide (V ₂ O ₅ ), cobalt oxide (Co ₃ O ₄ ), zinc oxide (ZnO), aluminum-doped zinc oxide (ZnO: Al), boron-doped zinc oxide (ZnO: B), hydrogen-doped indium oxide (In ₂ O ₃ : H), tungsten oxide (WO ₃ ), Molybdenum oxide (MoO ₃ ), niobium oxide (Nb ₂ O ₅ ), nickel oxide (NiO), magnesium oxide (MgO), ruthenium oxide (RuO ₂ ), or a combination of any of the above.

As shown in FIGS. 6 and 7, after the transparent insulating pattern layer 106 is formed, a light emission is formed. The layer 112 covers the transparent insulating pattern layer 106 and the first electrode 104. Since the transparent insulating pattern layer 106 exposes the first electrode 104, the formed light-emitting layer 112 can be electrically connected to the first electrode 104 through the second opening OP2. Then, a second electrode 114 is formed on the light emitting layer 112 to form a light emitting diode LD. The light emitting diode LD may be, for example, an organic light emitting diode, a quantum dot light emitting diode, other types of light emitting diodes, or a plurality of stacks of at least one type. When the light emitting diode LD is an organic light emitting diode, the light emitting layer 112 includes an organic light emitting material. The first electrode 104 and the second electrode 114 may be an anode and a cathode, respectively, or they may be interchanged with each other. In this embodiment, the light-emitting diode LD is transparent, that is, the first electrode 104 and the second electrode 114 may be formed of a transparent conductive material, such as a metal oxide or a metal having a thin thickness, so the light-emitting diode LD Light can be emitted from the upper and lower sides (as shown by arrows in FIG. 6), so that users on both sides of the display device 100 can view the first pattern P1. The method of forming the light-emitting diode LD is well known to those having ordinary knowledge in the art, so the related description is omitted herein. In addition, the number and size of the first opening OP1 and the second opening OP2 of the present invention are determined according to the pattern of the first pattern P1. Therefore, the number and size of the first opening OP1 and the The number and size of the second openings OP2 shown in FIG. 5 and FIG. 6 are merely illustrative, and are not intended to limit the scope of the present invention.

In this embodiment, between the transparent insulating pattern layer 106 and the light emitting layer 112, an implantation layer 110 may be selectively formed to cover the transparent insulating pattern layer 106 and the first electrode 104. When the first electrode 104 is an anode, the injection layer 110 may be a hole injection layer to help inject holes from the first electrode 104 into the light emitting layer 112. When the first electrode 104 is a cathode, the injection layer 110 may be an electron injection layer to help inject electrons from the first electrode 104 into the light emitting layer 112. The injection layer 110 may be electrically connected to or contact the first electrode 104 through the second opening OP2. In another embodiment, between the light emitting layer 112 and the second electrode 114, another implantation layer may be selectively formed between the light emitting layer 112 and the second electrode 114. When the second electrode 114 is an anode, the other injection layer may be a hole injection layer. When the second electrode 114 is a cathode, the other injection layer may be an electron injection layer. The electron injection layer may, for example, include an electron injection material and / or an electron transport material, and the hole injection layer may, for example, include a hole injection material and / or a hole transport material material. In another embodiment, an additional transparent conductive layer may be optionally formed between the transparent insulating pattern layer 106 and the implantation layer 110, but the invention is not limited thereto.

In this embodiment, after the light emitting diode LD is formed, a protective layer 116 may be selectively formed on the light emitting diode LD to form the display device 100 of this embodiment. The protective layer 116 covers the light emitting diode LD to protect the light emitting diode LD. Especially when the light emitting diode LD is an organic light emitting diode, the protective layer 116 can prevent the light emitting diode LD from being exposed to moisture or oxygen. Destruction. For example, the protective layer 116 may include an organic material, an inorganic material, or a stack of an organic material and an inorganic material.

In this embodiment, the second electrode 114 and the first electrode 104 are two electrode terminals of the display device 100, respectively, and are used to be electrically connected to a power source PW. When the power PW is turned on and a voltage is applied between the second electrode 114 and the first electrode 104, the display device 100 switches to the pattern display mode to display the static first pattern P1. In addition, through the blocking of the transparent insulating pattern layer 106, the current provided by the power source must flow through the second opening OP2, so that the light emitting diode LD portion corresponding to the second opening OP2 having the first pattern P1 will generate light and emit light. The diode LD shows a first pattern P1 that is defined in advance. Thereby, the display device 100 can display the first pattern P1 from the first surface S1 and the second surface S2, respectively. Since the substrate 102, the light-emitting diode LD, and the protective layer 116 of this embodiment are all transparent, the display device 100 may be a transparent display device when the power is turned off, that is, when the voltage is not applied to the display device 100, The pattern mode is transparent, so that the user can view the scene behind the display device 100. It can be known from this that the display device 100 of this embodiment has the function of switching the pattern display mode and the non-pattern mode, so the limitation of the traditional paper can be improved, and the application range of the display device 100 can be improved. For example, the display device 100 may be in a non-pattern mode when the user first starts using it, and the display device 100 performs a pattern display mode to display the first pattern P1 when the user triggers a specific action, so that the use of the user can be improved Feel. In addition, the display device 100 of this embodiment only includes the light emitting diode LD, and the first pattern P1 can be displayed by providing the light emitting diode LD voltage, thereby greatly reducing the cost and operation complexity of the display device 100. The display device 100 may be, for example, a tablet, a display card, a cover of a gift box, or other suitable products.

The light-emitting diode of the present invention is not limited thereto. In another embodiment, the first electrode 104 may include an opaque conductive material, and the second electrode 114 includes a transparent conductive material, so the light emitting diode LD emits light on one side. In this case, the display device 100 displays the first pattern P1 from the first surface S1 thereof. In yet another embodiment, the first electrode 104 may include a transparent conductive material, and the second electrode includes an opaque conductive material, so the light emitting diode LD also emits light on one side. In this case, the display device 100 displays the first pattern P1 from the second surface S2 thereof.

It is worth mentioning that because the quality and thickness of the transparent insulating pattern layer 106 determines whether the transparent insulating pattern layer 106 will have a leakage problem, that is, whether the light-emitting diode LD can clearly display the first pattern P1, so this The embodiment forms the transparent insulating layer 106a by using an atomic layer deposition process, a sputtering process, or an electron beam evaporation process to maintain the quality of the transparent insulating pattern layer 106, and the transparent insulating pattern layer 106 may have a thickness that is less than or equal to 100 nanometers. In addition, in the transparent display device 100 of this embodiment, since the transparent insulating pattern layer 106 has the second pattern P2, the transparency of the display device 100 depends on the visibility of the transparent insulating pattern layer 106. The thickness of the transparent insulating pattern layer 106 determines the visibility of the transparent insulating pattern layer 106. Therefore, the thickness of the transparent insulating pattern layer 106 is preferably less than or equal to 50 nanometers, which makes it difficult for users to visually observe the transparent insulating pattern layer 106. Therefore, the transparency of the display device 100 can be improved. However, the thickness of the transparent insulating pattern layer 106 also affects the electrical leakage. Therefore, when the thickness of the transparent insulating pattern layer 106 is thinner, the method of forming the transparent insulating layer 106a preferably uses an atomic layer deposition process to avoid the occurrence of the transparent insulating pattern layer 106. Leakage, and maintain the quality of the transparent insulating pattern layer 106. For example, under the condition that the transparent insulating layer 106a is formed using an atomic layer deposition process, the thickness of the transparent insulating pattern layer 106 may be less than or equal to 30 nm.

Hereinafter, the visibility of the transparent insulating pattern layer 106 formed by the atomic layer deposition process, the sputtering process, and the electron beam evaporation process will be further compared. Fig. 8 is a schematic diagram showing the relationship between the transmittance and wavelength of the transparent insulating layer and the substrate formed by the atomic layer deposition process, and Fig. 9 is the transmittance and wavelength of the transparent insulating layer and the substrate formed by the sputtering process. Schematic diagram, and Figure 10 shows electron beam evaporation The relationship between the transmittance and wavelength of the transparent insulating layer formed by the substrate and the substrate is shown in FIG. 8, FIG. 9, and FIG. 10. The thickness of the transparent insulating layer 106 a in FIG. 8, FIG. 9, and FIG. Glass is an example, but not limited to this. As shown in FIGS. 8, 9 and 10, the curve L1 represents the relationship between the transmittance of the substrate 102 and the wavelength, and the curve L2 represents the transmittance of the transparent insulating layer 106 a formed by the atomic layer deposition process. Wavelength relationship curve, curve L3 represents the relationship between the transmittance and wavelength of the transparent insulating layer 106a formed by the sputtering process, and curve L4 represents the transmittance of the transparent insulating layer 106a formed by the electron beam evaporation process Curve with wavelength. According to the curve L1, curve L2, curve L3, and curve L4, when the formed transparent insulating layer 106a has a thickness of 30 nm, the transparent insulating layer formed by the atomic layer deposition process, the sputtering process, and the electron beam evaporation process is formed. The penetration of 106a can be close to the penetration of the substrate 102. Therefore, although the transparent insulating pattern layer 106 has the second opening OP2, the transparent insulating pattern layer 106 is still not easily seen by the user. It is worth noting that the transparency of the transparent insulating layer 106 formed by the atomic layer deposition process, the sputtering process, and the electron beam evaporation process at a wavelength of 550 nm can be greater than 99%, 98%, and 92%, respectively. In addition, the transmittance of the substrate 102 at a wavelength of 550 nm may be greater than 99%. Therefore, the transparent insulating pattern layer 106 is preferably formed through an atomic layer deposition process.

11 and 12 are schematic diagrams illustrating a method for manufacturing a display device according to a second embodiment of the present invention. The manufacturing method of this embodiment is different from the manufacturing method of the above-mentioned first embodiment in that the manner of forming the transparent insulating pattern layer 106 in this embodiment is to directly pattern the transparent insulating layer 106a. Specifically, as shown in FIG. 11, after the substrate 102 and the first electrode 104 are provided, a transparent insulating layer 106 a is directly formed on the first electrode 104. Then, as shown in FIG. 12, a patterning process is performed on the transparent insulating layer 106 a to form a transparent insulating pattern layer 106 on the first electrode 104. In this embodiment, the patterning process may include, for example, a laser engraving process or a lithography and etching process, but is not limited thereto. The steps after the transparent insulating pattern layer 106 is formed in this embodiment are the same as those in the first embodiment, so they are not described in detail here.

FIG. 13 is a schematic diagram of a manufacturing method of a display device according to a third embodiment of the present invention. The difference between the manufacturing method of this embodiment and the manufacturing method of the first embodiment is that the transparent insulation The pattern of the edge pattern layer 106 is a screen printing process. Specifically, as shown in FIG. 13, after the substrate 102 and the first electrode 104 are provided, a screen 302 having the same pattern as the first pattern P1 is disposed on the first electrode 104, where the screen 302 may have at least one The third opening OP3, and the third opening OP3 exposes the first electrode 104, and may have a pattern complementary to the first pattern P1. Then, a transparent insulating layer 106a is formed on the exposed first electrode 104 and the screen 302. The method for forming the transparent insulating layer 106a in this embodiment may be the same as that in the first embodiment, so it is not described in detail. Next, the screen 302 and the transparent insulating layer 106a on the screen 302 are removed to form a transparent insulating pattern layer 106, as shown in FIG. 6. The steps after the transparent insulating pattern layer 106 is formed in this embodiment are the same as those in the first embodiment, so they are not described in detail here.

The present invention further provides a gift box to which the display device of any one of the above embodiments is applied. FIG. 14 is a schematic side view of a gift box according to a fourth embodiment of the present invention when it is placed on an upper lid, and FIG. 15 is a schematic side view of a gift box according to a fourth embodiment of the present invention when the cover is opened. The gift box 400 in this embodiment includes an opening 402, and the display device 404 can cover the opening 402 to display the first pattern P1 at the opening 402. In this embodiment, the gift box 400 may include a box body 406 and an upper cover 408. The box body 406 may include a plurality of side walls and a bottom, and the side walls are erected on the edges of the bottom and connected in order to make the side walls A groove 406R may be formed with the bottom to receive an object, such as a gift. In addition, the groove 406R can also receive a fixed structure or other decorative object of the fixed object according to actual needs. The upper cover 408 is used to cover the groove 406R, so that the gift box 400 can completely protect the objects. The box body 406 and the upper cover 408 may include paper, plastic, or other suitable materials, and may be composed of the same or different materials.

The gift box 400 in this embodiment may optionally further include a connecting shaft 410 connected between the side of the upper cover 408 and the top of one side wall of the box body 406, so that the upper cover 408 can be lifted or closed. In other embodiments, the upper cover 408 and the box body 406 may be integrally formed.

The upper cover 408 of this embodiment may have an opening 402, and an edge of the display device 404 may be embedded in a side wall of the opening 402 of the upper cover 408, but the present invention is not limited thereto. According to actual design requirements, the display device 404 may also be disposed on an inner side of the upper cover 408 facing the groove 406R or on an outer side of the upper cover 408. Some real In the embodiment, the opening 402 may also be provided on at least one side wall or bottom of the box body 406. In some embodiments, the display device 404 may be a transparent display device, so that a user located outside the gift box 400 can view the objects located inside the gift box 400 through the display device 404. The shape of the box body 406 is not limited to a cube shape, and can be adjusted according to actual needs. For example, the shape of the box body 406 may also be a columnar body, a sphere, an ellipsoid, or other suitable shapes. The display device 404 of this embodiment can be applied to the display device of any of the above embodiments. It is worth noting that the display device 404 in this embodiment may be transparent when the upper cover 408 is closed, instead of displaying the first pattern P1, and the first pattern P1 is displayed when the upper cover 408 is opened, so that a gift box is received. In addition to the good feelings of the gift, the user can be surprised by the display of the first pattern P1, and can understand the heart of the gift giver through the displayed first pattern P1 (such as a text description). In some embodiments, the time point at which the display device 404 displays the first pattern may be determined according to actual needs. For example, the first pattern may also be displayed when the upper cover 408 is closed or when the user receives the gift box, and may be displayed when opened. Transparent state, but not limited to this.

In summary, in the manufacturing method of the display device of the present invention, a transparent insulating pattern layer having a thickness of less than or equal to 100 nm is formed through an atomic layer deposition process, a sputtering process, or an electron beam evaporation process, so that the transparent insulating pattern can be made. The layer achieves the effect of insulation, so the display device can have the function of switching the pattern display mode and the non-pattern mode. Furthermore, by reducing the thickness of the transparent insulating pattern layer to 50 nm or less, the visibility of the transparent insulating pattern layer can also be reduced to improve the transparency of the display device.

The above description is only a preferred embodiment of the present invention, and all equivalent changes and modifications made in accordance with the scope of patent application of the present invention shall fall within the scope of the present invention.

Claims (25)

A display device is used to display a first pattern, and the display device includes: a substrate; and a light emitting diode disposed on the substrate, and the light emitting diode includes: a first electrode; a transparent insulation A pattern layer disposed on the first electrode, wherein the transparent insulating pattern layer has a thickness of less than or equal to 100 nm, and the transparent insulating pattern layer has a second pattern complementary to the first pattern; a light emitting layer Covering the transparent insulating pattern layer and the first electrode, and the light emitting layer is electrically connected to the first electrode; and a second electrode is disposed on the light emitting layer. The display device according to claim 1, wherein the transparent insulating pattern layer includes a plurality of openings, and the light emitting layer is electrically connected to the first electrode through the openings. The display device according to claim 2, wherein the openings have the first pattern. The display device according to claim 2, wherein the light emitting diode further includes an injection layer sandwiched between the light emitting layer and the transparent insulating pattern layer. The display device according to claim 1, wherein the thickness of the transparent insulating pattern layer is less than or equal to 30 nm. The display device according to claim 1, wherein the transparent insulating pattern layer includes aluminum oxide (Al ₂ O ₃ ), hafnium oxide (HfO ₂ ), silicon oxide (SiO ₂ ), titanium oxide (TiO ₂ ), and strontium titanate (SrTiO ₃ ), tantalum oxide (Ta ₂ O ₅ ), hafnium oxide (Gd ₂ O ₃ ), zirconium oxide (ZrO ₂ ), gallium oxide (Ga ₂ O ₃ ), vanadium oxide (V ₂ O ₅ ), cobalt oxide (Co ₃ O ₄ ), zinc oxide (ZnO), aluminum-doped zinc oxide (ZnO: Al), boron-doped zinc oxide (ZnO: B), hydrogen-doped indium oxide (In ₂ O ₃ : H ), Tungsten oxide (WO ₃ ), molybdenum oxide (MoO ₃ ), niobium oxide (Nb ₂ O ₅ ), nickel oxide (NiO), magnesium oxide (MgO), ruthenium oxide (RuO ₂ ), or a combination of any of the above . The display device according to claim 1, further comprising a protective layer covering the light-emitting diode. The display device according to claim 1, wherein the first pattern comprises a text description, a badge pattern or a trademark pattern. The display device according to claim 1, wherein the display device is a movie or a display card. The display device according to claim 1, wherein the transparent insulating pattern layer has a transmittance of greater than 92% at a wavelength of 550 nm. A manufacturing method of a display device is used for displaying a first pattern, and the manufacturing method includes: providing a substrate and a first electrode, wherein the first electrode is formed on the substrate; and on the first electrode A transparent insulating pattern layer is formed thereon, wherein the transparent insulating pattern layer has a thickness of less than or equal to 100 nanometers, and the transparent insulating pattern layer has a second pattern complementary to the first pattern; forming a light-emitting layer covering the The transparent insulating pattern layer is on the first electrode, and the light emitting layer is electrically connected. Connected to the first electrode; and forming a second electrode on the light emitting layer to form a light emitting diode. The method for manufacturing a display device according to claim 11, wherein forming the transparent insulating pattern layer comprises: forming a sacrificial layer on the first electrode; and performing a patterning process on the sacrificial layer to form a sacrificial pattern layer, And exposing the first electrode, wherein the sacrificial pattern layer has the first pattern; forming a transparent insulating layer on the sacrificial pattern layer and the exposed first electrode; and removing the sacrificial pattern layer and the sacrificial pattern layer The transparent insulating layer on the pattern layer to form the transparent insulating pattern layer. The method for manufacturing a display device according to claim 12, wherein the sacrificial layer comprises a photoresist material or a tape. The method for manufacturing a display device according to claim 12, wherein patterning the sacrificial layer includes a lithography process or a laser etching process. The method for manufacturing a display device according to claim 12, wherein forming the transparent insulating layer includes an atomic layer deposition process, a sputtering process, or an electron beam evaporation process. The method for manufacturing a display device according to claim 11, wherein forming the transparent insulating pattern layer comprises: forming a transparent insulating layer on the first electrode; and A patterning process is performed on the transparent insulating layer to form a transparent insulating pattern layer. The method for manufacturing a display device according to claim 16, wherein the patterning process includes a laser engraving process. The method for manufacturing a display device according to claim 11, wherein forming the transparent insulating pattern layer comprises: providing a screen plate on the first electrode; forming a transparent insulating layer on the first electrode and the screen plate; and The screen and the transparent insulating layer on the screen are removed to form the transparent insulating pattern layer. The method for manufacturing a display device according to claim 11, further comprising forming a protective layer on the light-emitting diode, and the protective layer covers the light-emitting diode. The method for manufacturing a display device according to claim 11, wherein the transparent insulating pattern layer includes at least one opening, and the light-emitting layer is electrically connected to the first electrode through the opening. The method for manufacturing a display device according to claim 20, further comprising forming an implanted layer covering the transparent insulating pattern layer and the first electrode between the transparent insulating pattern layer and the light emitting layer. A gift box includes: a box body having a groove for accommodating an object, and the box body includes a plurality of side walls and a bottom; An upper cover for covering the groove of the box body, and at least one of the side walls, the bottom and the upper cover has an opening; and a display device covering the opening and for displaying a first pattern And the display device includes: a substrate; and a light emitting diode disposed on the substrate, and the light emitting diode includes: a first electrode; a transparent insulating pattern layer disposed on the first electrode, The transparent insulating pattern layer has a thickness of less than or equal to 100 nanometers, and the transparent insulating pattern layer has a second pattern that is complementary to the first pattern. A light-emitting layer covers the transparent insulating pattern layer and the first layer. An electrode, and the light-emitting layer is electrically connected to the first electrode; and a second electrode, which is disposed on the light-emitting layer. The gift box of claim 22, wherein the upper cover has the opening. The gift box according to claim 23, further comprising a connecting shaft connected between a side edge of the upper cover and a top end of a side wall of the box body. The gift box according to claim 22, wherein the display device is a transparent display device, so that a user located outside the gift box can view the inside of the gift box through the display device.