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TWI665520B - 著色感光性組成物，著色間隔件，彩色濾光片及液晶顯示裝置 - Google Patents

著色感光性組成物，著色間隔件，彩色濾光片及液晶顯示裝置 Download PDF

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Publication number
TWI665520B
TWI665520B TW106140131A TW106140131A TWI665520B TW I665520 B TWI665520 B TW I665520B TW 106140131 A TW106140131 A TW 106140131A TW 106140131 A TW106140131 A TW 106140131A TW I665520 B TWI665520 B TW I665520B
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TW
Taiwan
Prior art keywords
photosensitive composition
group
alkali
pigment
acid
Prior art date
Application number
TW106140131A
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English (en)
Chinese (zh)
Other versions
TW201812453A (zh
Inventor
裴麗華
澤井良尚
福井誠
Original Assignee
日商三菱化學股份有限公司
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Publication of TW201812453A publication Critical patent/TW201812453A/zh
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Publication of TWI665520B publication Critical patent/TWI665520B/zh

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133514—Colour filters
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/105—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/22—Absorbing filters
    • G02B5/223—Absorbing filters containing organic substances, e.g. dyes, inks or pigments

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Optics & Photonics (AREA)
  • Nonlinear Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Structural Engineering (AREA)
  • Mathematical Physics (AREA)
  • Architecture (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Materials For Photolithography (AREA)
  • Liquid Crystal (AREA)
  • Optical Filters (AREA)
  • Polymerisation Methods In General (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
TW106140131A 2011-10-25 2012-10-25 著色感光性組成物，著色間隔件，彩色濾光片及液晶顯示裝置 TWI665520B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2011-233900 2011-10-25
JP2011233900 2011-10-25

Publications (2)

Publication Number Publication Date
TW201812453A TW201812453A (zh) 2018-04-01
TWI665520B true TWI665520B (zh) 2019-07-11

Family

ID=48167838

Family Applications (2)

Application Number Title Priority Date Filing Date
TW101139425A TWI611263B (zh) 2011-10-25 2012-10-25 著色感光性組成物，著色間隔件，彩色濾光片及液晶顯示裝置
TW106140131A TWI665520B (zh) 2011-10-25 2012-10-25 著色感光性組成物，著色間隔件，彩色濾光片及液晶顯示裝置

Family Applications Before (1)

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TW101139425A TWI611263B (zh) 2011-10-25 2012-10-25 著色感光性組成物，著色間隔件，彩色濾光片及液晶顯示裝置

Country Status (5)

Country Link
JP (4) JP6143298B2 (ja)
KR (2) KR101921369B1 (ja)
CN (2) CN110262189A (ja)
TW (2) TWI611263B (ja)
WO (1) WO2013062011A1 (ja)

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CN105556390B (zh) * 2013-09-25 2020-02-28 三菱化学株式会社 感光性着色组合物、黑色矩阵、着色间隔物、图像显示装置及颜料分散液
WO2016027798A1 (ja) * 2014-08-20 2016-02-25 東レ株式会社 感光性着色組成物、それを用いた固体撮像素子の製造方法、および固体撮像素子
KR102218948B1 (ko) 2014-09-23 2021-02-23 동우 화인켐 주식회사 흑색 감광성 수지 조성물, 및 이로써 제조된 액정 표시장치용 블랙 매트릭스 및 칼럼 스페이서
CN107407881A (zh) * 2015-03-11 2017-11-28 三菱化学株式会社 着色间隔物形成用感光性着色组合物、固化物、着色间隔物、图像显示装置
JP2017053942A (ja) * 2015-09-08 2017-03-16 三菱化学株式会社 感光性着色組成物、硬化物、着色スペーサー、及び画像表示装置
JP6700710B2 (ja) 2015-10-16 2020-05-27 日鉄ケミカル＆マテリアル株式会社 ブラックカラムスペーサー用の感光性樹脂組成物、ブラックカラムスペーサー、液晶表示装置、ブラックカラムスペーサー用の感光性樹脂組成物の製造方法、ブラックカラムスペーサーの製造方法、および液晶表示装置の製造方法
KR102540423B1 (ko) * 2015-12-24 2023-06-05 미쯔비시 케미컬 주식회사 감광성 착색 조성물, 경화물, 착색 스페이서, 화상 표시 장치
JP7184518B2 (ja) * 2016-02-12 2022-12-06 三菱ケミカル株式会社 着色スペーサー形成用感光性着色組成物、硬化物、着色スペーサー、画像表示装置
TWI664499B (zh) * 2016-06-04 2019-07-01 奇美實業股份有限公司 黑色感光性樹脂組成物及其應用
KR102487545B1 (ko) * 2016-10-21 2023-01-11 동우 화인켐 주식회사 착색 감광성 수지 조성물, 이를 이용하여 제조된 컬러필터 및 화상 표시 장치
KR101848567B1 (ko) * 2016-11-18 2018-04-12 롬엔드하스전자재료코리아유한회사 착색 감광성 수지 조성물 및 이로부터 제조된 차광성 스페이서
JP7396786B2 (ja) 2017-02-24 2023-12-12 日鉄ケミカル＆マテリアル株式会社 遮光膜用の感光性樹脂組成物、遮光膜、液晶表示装置、スペーサー機能を有する遮光膜の製造方法、および液晶表示装置の製造方法
JP7280017B2 (ja) 2017-03-31 2023-05-23 日鉄ケミカル＆マテリアル株式会社 感光性樹脂組成物、遮光膜、液晶表示装置、および液晶表示装置の製造方法
KR102036683B1 (ko) * 2017-04-28 2019-10-25 삼성에스디아이 주식회사 감광성 수지 조성물, 이를 이용한 흑색 감광성 수지막 및 컬러필터
WO2019013108A1 (ja) 2017-07-13 2019-01-17 富士フイルム株式会社 組成物、膜、赤外線透過フィルタ、固体撮像素子、画像表示装置および赤外線センサ
WO2019065687A1 (ja) * 2017-09-26 2019-04-04 大阪有機化学工業株式会社 フォトスペーサ形成用感光性樹脂組成物、フォトスペーサの形成方法、フォトスペーサ付基板、及び、カラーフィルタ
KR102386493B1 (ko) * 2018-01-15 2022-04-14 동우 화인켐 주식회사 착색 감광성 수지 조성물, 이를 포함하는 컬러필터 및 화상표시장치
JP2025502799A (ja) 2021-12-31 2025-01-28 ボストン サイエンティフィック サイムド，インコーポレイテッド 血管画像コレジストレーションのためのシステム及び方法

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Also Published As

Publication number Publication date
JP2017146618A (ja) 2017-08-24
JP6143298B2 (ja) 2017-06-07
TW201812453A (zh) 2018-04-01
JP5605481B2 (ja) 2014-10-15
JP6421837B2 (ja) 2018-11-14
WO2013062011A1 (ja) 2013-05-02
CN103890660B (zh) 2019-05-31
KR20140093216A (ko) 2014-07-25
KR20180126090A (ko) 2018-11-26
KR102007133B1 (ko) 2019-08-02
JPWO2013062011A1 (ja) 2015-04-02
KR101921369B1 (ko) 2018-11-22
CN110262189A (zh) 2019-09-20
TWI611263B (zh) 2018-01-11
JP2019035970A (ja) 2019-03-07
TW201324044A (zh) 2013-06-16
CN103890660A (zh) 2014-06-25
JP2014146018A (ja) 2014-08-14

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