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TWI646129B - Polymer - Google Patents

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TWI646129B
TWI646129B TW105142916A TW105142916A TWI646129B TW I646129 B TWI646129 B TW I646129B TW 105142916 A TW105142916 A TW 105142916A TW 105142916 A TW105142916 A TW 105142916A TW I646129 B TWI646129 B TW I646129B
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polymer
formula
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TW201725225A (en
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何柏賢
林志祥
陳孟歆
范正欣
高信敬
張義和
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財團法人工業技術研究院
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Priority to US15/393,913 priority Critical patent/US10287396B2/en
Priority to CN201710013836.9A priority patent/CN106957430B/en
Priority to EP17150883.1A priority patent/EP3190141B1/en
Priority to JP2017002112A priority patent/JP6453915B2/en
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  • Polymers With Sulfur, Phosphorus Or Metals In The Main Chain (AREA)
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Abstract

本揭露提供一種聚合物。該聚合物,具有一如式(I)或式(II)所示結構的重複單元 ,其中Ar1及Ar2可獨立為取代或未取代二價芳香基;Y-可為R2SO3 -或ClO4 -;R1可為C1-6烷基;Ar1與Ar2不相同;以及,R2可為C1-6烷基、取代或未取代芳香環、或C1-6鹵烷基。 The present disclosure provides a polymer. The polymer having a repeating unit of the structure represented by formula (I) or formula (II) Wherein Ar 1 and Ar 2 may independently be a substituted or unsubstituted divalent aromatic group; Y - may be R 2 SO 3 - or ClO 4 - ; R 1 may be a C 1-6 alkyl group; Ar 1 and Ar 2 are not The same; and, R 2 may be a C 1-6 alkyl group, a substituted or unsubstituted aromatic ring, or a C 1-6 haloalkyl group.

Description

聚合物 polymer

本揭露關於一種聚合物,特別是一種聚芳硫醚或其鹽類。 The present disclosure relates to a polymer, particularly a polyarylene sulfide or a salt thereof.

聚芳硫醚是具有出色的物理特性,例如耐熱性、耐化學性、耐火性、及電絕緣特性,因此廣泛用於電腦附件、汽車附件、與腐蝕性化學物質接觸的零件的塗料、以及具有耐化學性的工業纖維。 Polyarylene sulfides are excellent in physical properties such as heat resistance, chemical resistance, fire resistance, and electrical insulation properties, and are therefore widely used in computer accessories, automotive accessories, coatings for parts in contact with corrosive chemicals, and Chemically resistant industrial fibers.

然而,由於傳統聚芳硫醚的製備方法主要係以鹵製程為主,除了低的聚芳硫醚樹脂產率外,還會產生無法回收的含鹵副產物,造成環境汙染。此外,傳統具有至少兩種重複單元的聚芳硫醚其重複單元普遍為無序排列(arranged in a random fashion),使得聚芳硫醚之耐熱性、耐化學性、耐火性、及電絕緣特性無法進一步提昇下降。 However, since the preparation method of the conventional polyarylene sulfide is mainly based on a halogen process, in addition to the low polyarylene sulfide resin yield, a halogen-containing by-product which cannot be recovered is generated, which causes environmental pollution. In addition, polyarylene sulfides having conventionally having at least two repeating units have a repeating unit generally arranged in a random fashion, so that heat resistance, chemical resistance, fire resistance, and electrical insulating properties of the polyarylene sulfide are obtained. Can't further improve the decline.

根據本揭露實施例,本揭露提供一種聚合物,可具有一如式(I)或式(II)所示結構的重複單元: According to an embodiment of the present disclosure, the present disclosure provides a polymer which may have a repeating unit of the structure shown in formula (I) or formula (II):

,其中Ar1及Ar2係獨立為取代或未取代二價芳香基;Y-可為R2SO3 -或ClO4 -;R1可為C1-6烷基;Ar1與Ar2不相同;以及,R2可為C1-6烷基、取代或未取代芳香環、或C1-6鹵烷基。 Wherein Ar 1 and Ar 2 are independently substituted or unsubstituted divalent aromatic groups; Y - may be R 2 SO 3 - or ClO 4 - ; R 1 may be C 1-6 alkyl; Ar 1 and Ar 2 are not The same; and, R 2 may be a C 1-6 alkyl group, a substituted or unsubstituted aromatic ring, or a C 1-6 haloalkyl group.

本揭露實施例提供一種聚合物,例如聚芳硫醚或其鹽類。根據本揭露實施例,本揭露述之聚合物其主鏈結構由不同之芳香基以交替排列方式構成,因此具有較高之結晶性,使得該聚合物具有較高之熔點(例如約大於或等於330℃),並進一步提昇耐熱性、耐化學性、耐火性、及電絕緣特性。 The disclosed embodiments provide a polymer, such as a polyarylene sulfide or a salt thereof. According to an embodiment of the present disclosure, the polymer of the present disclosure has a main chain structure composed of different aromatic groups in an alternating arrangement, and thus has a higher crystallinity such that the polymer has a higher melting point (for example, greater than or equal to 330 ° C), and further improve heat resistance, chemical resistance, fire resistance, and electrical insulation properties.

根據本揭露實施例,本揭露所述之聚合物,可具有一如式(I)或式(II)所示結構的重複單元: According to an embodiment of the present disclosure, the polymer of the present disclosure may have a repeating unit of the structure shown in formula (I) or formula (II):

,其中Ar1及Ar2係獨立為取代或未取代二價芳香基;Y-可為R2SO3 -或ClO4 -;R1可為C1-6烷基;Ar1與Ar2不相同;以及,R2可為C1-6烷基、取代或未取代芳香環、或C1-6鹵烷基。在此,本揭露所述取代之二價芳香基係指該二價芳香基之至少一者碳上的氫被C1-6烷基所取代。根據本揭露實施例,該取代之芳香環係指該芳香 環至少一者碳上的氫被C1-6烷基所取代。 Wherein Ar 1 and Ar 2 are independently substituted or unsubstituted divalent aromatic groups; Y - may be R 2 SO 3 - or ClO 4 - ; R 1 may be C 1-6 alkyl; Ar 1 and Ar 2 are not The same; and, R 2 may be a C 1-6 alkyl group, a substituted or unsubstituted aromatic ring, or a C 1-6 haloalkyl group. Herein, the substituted divalent aromatic group of the present disclosure means that the hydrogen on at least one of the divalent aromatic groups is substituted by a C 1-6 alkyl group. According to an embodiment of the present disclosure, the substituted aromatic ring means that the hydrogen on at least one of the aromatic rings is replaced by a C 1-6 alkyl group.

根據本揭露實施例,Ar1及Ar2係獨立為取代或未取代伸苯基(phenylene group)、聯苯伸基(biphenylene group)、伸萘基(naphthylene group)、伸噻吩基(thienylene group)、伸吲哚基(indolylene)、伸菲基(phenanthrenylene)、伸茚基(indenylene)、伸蒽基(anthracenylene)、或伸芴基(fluorenylene),其中取代之伸苯基(phenylene group)、聯苯伸基(biphenylene group)、伸萘基(naphthylene group)、伸噻吩基(thienylene group)、伸吲哚基(indolylene)、伸菲基(phenanthrenylene)、伸茚基(indenylene)、伸蒽基(anthracenylene)、或伸芴基(fluorenylene)係指該等二價芳香基團之至少一者碳上的氫被C1-6烷基所取代。 According to an embodiment of the present disclosure, Ar 1 and Ar 2 are independently a substituted or unsubstituted phenylene group, a biphenylene group, a naphthylene group, a thienylene group. , indolylene, phenanthrenylene, indenylene, anthracenylene, or fluorenylene, in which phenylene group, phenylene group Biphenylene group, naphthylene group, thienylene group, indolylene, phenanthrenylene, indenylene, exfoliation Anthracenylene) or fluorenylene means that hydrogen on at least one of the divalent aromatic groups is replaced by a C 1-6 alkyl group.

根據本揭露實施例,C1-6烷基可為直鏈或分支(linear or branched)鏈的烷基。舉例來說,例如R1可為甲基(methyl)、乙基(ethyl)、丙基(propyl)、異丙基(isopropyl)、正丁基(n-butyl)、叔丁基(t-butyl)、仲丁基(sec-butyl)、異丁基(isobutyl)、戊基(pentyl)、或己基(hexyl)。 According to an embodiment of the present disclosure, the C 1-6 alkyl group may be a linear or branched chain alkyl group. For example, for example, R 1 may be methyl, ethyl, propyl, isopropyl, n-butyl, t-butyl. ), sec-butyl, isobutyl, pentyl, or hexyl.

根據本揭露實施例,Ar1及Ar2可獨立為 ,x係0、1、或2;R3可獨立為氫、或C1-6烷基。舉例來說,R3可獨立為氫、甲基(methyl)、乙基(ethyl)、丙基(propyl)、異丙基(isopropyl)、正丁基(n-butyl)、叔丁基(t-butyl)、仲丁基(sec-butyl)、異丁基(isobutyl)、戊基(pentyl)、或己基(hexyl)。 According to an embodiment of the present disclosure, Ar 1 and Ar 2 may be independently , x is 0, 1, or 2; R 3 may independently be hydrogen or a C 1-6 alkyl group. For example, R 3 may independently be hydrogen, methyl, ethyl, propyl, isopropyl, n-butyl, t-butyl (t -butyl), sec-butyl, isobutyl, pentyl, or hexyl.

根據本揭露實施例,該具有如式(I)所示結構的重複單 元可為,而該具有如式(II) 所示結構的重複單元可為,其中R1、R3、及Y-之定義與前述相同。 According to an embodiment of the present disclosure, the repeating unit having the structure shown in the formula (I) may be And the repeating unit having the structure represented by the formula (II) may be Wherein R 1 , R 3 , and Y - are as defined above.

根據本揭露實施例,本揭露所述之聚合物的聚合程度可視需求調整,例如可具有約600至120,000數目平均分子量或約10,000至30,000的數目平均分子量。 In accordance with embodiments of the present disclosure, the degree of polymerization of the polymers described herein may be adjusted as desired, for example, may have a number average molecular weight of from about 600 to 120,000 or a number average molecular weight of from about 10,000 to 30,000.

根據本揭露實施例,本揭露所述之聚合物的製備方法,包含將具有式(III)所示結構的化合物與酸反應,得到具有式(I)所示結構的聚合物: According to an embodiment of the present disclosure, a method for preparing a polymer according to the present disclosure comprises reacting a compound having a structure represented by the formula (III) with an acid to obtain a polymer having a structure represented by the formula (I):

其中,Ar1可為取代或未取代二價芳香基,例如取代或未取代之伸苯基(phenylene group)、聯苯伸基(biphenylene group)、伸萘基(naphthylene group)、伸噻吩基(thienylene group)、伸吲哚基(indolylene)、伸菲基(phenanthrenylene)、伸茚基(indenylene)、伸蒽基(anthracenylene)、或伸芴基(fluorenylene);Ar3可為取代或未取代芳香基,例如取代或未取代之苯基(phenyl group)、聯苯基(biphenyl group)、萘基(naphthyl group)、噻吩基(thienyl group)、吲哚基(indolyl)、菲基(phenanthrenyl)、茚基(indenyl)、蒽基(anthracenyl)、或芴基(fluorenylene),其中取代之芳香基係指芳香基團之至少一者碳上的氫被C1-6烷基所取代。Ar1係與Ar3由不同化合物所衍生,例如Ar1係伸苯基(phenylene group)時,Ar3係不為苯基(phenyl)。上述之酸可例如為硫酸(sulfuric acid)、甲磺酸(methanesulfonic acid)、苯磺酸(benzenesulfonic acid)、对甲苯磺酸(p-toluenesulfonic acid)、或三氟甲磺酸(trifluoromethanesulfonic acid)。上述的酸除了與具有式(III)所示結構的化合物反應外,亦可添加過量以作為溶劑。 Wherein Ar 1 may be a substituted or unsubstituted divalent aromatic group, such as a substituted or unsubstituted phenylene group, a biphenylene group, a naphthylene group, a thienyl group ( Thienylene group), indolylene, phenanthrenylene, indenylene, anthracenylene, or fluorenylene; Ar 3 may be substituted or unsubstituted aromatic a group, for example, a substituted or unsubstituted phenyl group, a biphenyl group, a naphthyl group, a thienyl group, an indolyl group, a phenanthrenyl group, Indenyl, anthracenyl, or fluorenylene, wherein the substituted aryl group means that at least one of the carbons of the aromatic group is replaced by a C 1-6 alkyl group. When Ar 1 and Ar 3 are derived from different compounds, for example, when Ar 1 is a phenylene group, Ar 3 is not a phenyl group. The above acid may be, for example, sulfuric acid, methanesulfonic acid, benzenesulfonic acid, p-toluenesulfonic acid, or trifluoromethanesulfonic acid. In addition to the reaction of the above-mentioned acid with a compound having a structure represented by the formula (III), an excess may be added as a solvent.

此外,所得之具有式(I)所示結構的聚合物,可進一步使用其他陰離子(例如:CH3SO3 -)置換具有式(I)所示結構的聚合物之陰離子(Y-)基團,得到其他具有不同陰離子的聚合物。 Further, the obtained polymer having the structure represented by the formula (I) may further replace the anion (Y - ) group of the polymer having the structure represented by the formula (I) with another anion (for example, CH 3 SO 3 - ). To obtain other polymers with different anions.

再者,具有式(I)所示結構的聚合物,可再利用親核試劑進行去烷基化(dealkylation)反應,得到具有式(II)所示結構的聚合物。根據本揭露實施例,該親核試劑(nucleophile)可為金屬鹵化物、金屬氫氧化物、醇、胺(例如二級胺、或三級胺)、或硫醇。舉例來說,該親核試劑可為氯化鈉、氯化鉀、氯化鋁、或4-甲基吡啶。 Further, the polymer having the structure represented by the formula (I) can be subjected to a dealkylation reaction using a nucleophilic reagent to obtain a polymer having a structure represented by the formula (II). According to embodiments of the present disclosure, the nucleophile may be a metal halide, a metal hydroxide, an alcohol, an amine (eg, a secondary amine, or a tertiary amine), or a thiol. For example, the nucleophile can be sodium chloride, potassium chloride, aluminum chloride, or 4-methylpyridine.

為了讓本揭露之上述和其他目的、特徵、和優點能更明顯易懂,下文特舉數實施例及比較實施例,作詳細說明如下: The above and other objects, features and advantages of the present invention will become more apparent and understood.

實施例1: Example 1:

將0.7g之甲基苯基亞碸(methyl phenyl sulfoxide)及1g之甲基聯苯基硫醚(methyl biphenyl sulfide)在氮氣下加入一反應瓶中,並降溫至0℃。接著,緩慢加入10ml之甲基磺酸(methanesulfonic acid)於反應瓶中,並攪拌約半小時。接著,回復室溫並持續攪拌約20小時。接著,將所得之產物倒入40ml之過氯酸中,並攪拌約1小時,並以50ml之二氯甲烷與100ml之去離子水進行萃取三次。取有機層抽乾及除水後,得到化合物(1),產率約92%。上述反應之反應式如下所示: 0.7 g of methyl phenyl sulfoxide and 1 g of methyl biphenyl sulfide were added to a reaction flask under nitrogen and cooled to 0 °C. Next, 10 ml of methanesulfonic acid was slowly added to the reaction flask and stirred for about half an hour. Next, return to room temperature and continue stirring for about 20 hours. Next, the obtained product was poured into 40 ml of perchloric acid and stirred for about 1 hour, and extracted three times with 50 ml of dichloromethane and 100 ml of deionized water. After the organic layer was drained and water was removed, compound (1) was obtained in a yield of about 92%. The reaction formula of the above reaction is as follows:

利用核磁共振光譜分析化合物(1),所得之光譜資訊如下:1H NMR(400MHz,ppm,CDCl3):2.48(-CH3,s),3.67(sulfonium-CH3,s),7.40-7.94(aromatic H,13H,m)。利用液相層析串聯式質譜儀(liquid chromatography-mass spectrometry、LC-MS)分析化合物(1),測得m/z=323(不含CH3SO3 -陰離子)。 The compound (1) was analyzed by nuclear magnetic resonance spectroscopy, and the obtained spectral information was as follows: 1 H NMR (400 MHz, ppm, CDCl 3 ): 2.48 (-CH 3 , s), 3.67 (sulfonium-CH 3 , s), 7.40-7.94 (aromatic H, 13H, m). The compound (1) was analyzed by liquid chromatography-mass spectrometry (LC-MS), and m/z = 323 (excluding CH 3 SO 3 - anion) was measured.

接著,將1.9g之化合物(1)及30ml之冰醋酸在氮氣下置於一反應瓶中。攪拌數分鐘後,緩慢加入2.02ml之雙氧水。反應約90分鐘後,將所得產物用50ml二氯甲烷與100ml去離子水進行萃取三次。取有機層抽乾及除水後,得到化合物(2)(橘黃色)。接著,將10ml 4-甲基吡啶(4-methylpyridine)與化合物(2)置於在氮氣下一反應瓶中,並攪拌30分鐘。在加熱並迴流約20分鐘後,得到化合物(3)。上述反應之反應式如下所示: Next, 1.9 g of the compound (1) and 30 ml of glacial acetic acid were placed in a reaction flask under nitrogen. After stirring for a few minutes, 2.02 ml of hydrogen peroxide was slowly added. After about 90 minutes of reaction, the obtained product was extracted three times with 50 ml of dichloromethane and 100 ml of deionized water. After the organic layer was drained and dehydrated, compound (2) (orange) was obtained. Next, 10 ml of 4-methylpyridine and the compound (2) were placed in a next reaction flask under nitrogen, and stirred for 30 minutes. After heating and refluxing for about 20 minutes, the compound (3) was obtained. The reaction formula of the above reaction is as follows:

利用核磁共振光譜分析化合物(3),所得之光譜資訊如下:1H NMR(400MHz,ppm,CDCl3):2.72(-CH3,s),7.38-7.63(aromatic H,13H,m)。利用液相層析串聯式質譜儀(liquid chromatography-mass spectrometry、LC-MS)分析化合物(3),測得m/z=325(M+H+),347(M+Na+)和671(2*M+Na+)三組訊號(M為分子量)。 The compound (3) was analyzed by nuclear magnetic resonance spectroscopy, and the obtained spectral information was as follows: 1 H NMR (400 MHz, ppm, CDCl 3 ): 2.72 (-CH 3 , s), 7.38 - 7.63 (aromatic H, 13H, m). The compound (3) was analyzed by liquid chromatography-mass spectrometry (LC-MS), and m/z = 325 (M+H + ), 347 (M+Na + ) and 671 (measured). 2*M+Na + ) three sets of signals (M is the molecular weight).

接著,將1g之化合物(3)在氮氣下置於一反應瓶中,並降溫至0℃。接著,緩慢加入15ml之三氟甲基磺酸(trifluoromethanesulfonic acid),並攪拌約2小時。接著,回溫至約18℃後,將產物倒入0℃去離子水中,觀察到白色沉澱物析出。接著,收集白色沉澱物並用去離子水重複清洗白色沉澱物,直到白色沉澱物呈現中性。接著,對所得白色沉澱物進行真空乾燥約6小時後,得到聚合物(1),產率100%。接著,將1g之聚合物(1)在氮氣下置於一反應瓶,並緩慢加入10ml 4-甲基吡啶(4-methylpyridine)。在室溫下反應約30分鐘後,加熱反應瓶至150℃並進行迴流。持續攪拌5小時後,將反應冷卻置室溫,並將反應溶液倒入含有10%鹽酸(HCl)之200ml的甲醇溶液中,觀察到白色沉澱物析出。接著,收集白色沉澱物,得聚合物(2),產率98%。上述反應之反應式如下所示: Next, 1 g of the compound (3) was placed in a reaction flask under nitrogen, and the temperature was lowered to 0 °C. Next, 15 ml of trifluoromethanesulfonic acid was slowly added and stirred for about 2 hours. Then, after returning to about 18 ° C, the product was poured into deionized water at 0 ° C, and a white precipitate was observed to precipitate. Next, a white precipitate was collected and the white precipitate was washed repeatedly with deionized water until the white precipitate appeared neutral. Next, the obtained white precipitate was vacuum dried for about 6 hours to obtain a polymer (1) in a yield of 100%. Next, 1 g of the polymer (1) was placed in a reaction flask under nitrogen, and 10 ml of 4-methylpyridine was slowly added. After reacting at room temperature for about 30 minutes, the reaction flask was heated to 150 ° C and refluxed. After continuously stirring for 5 hours, the reaction was cooled to room temperature, and the reaction solution was poured into a 200 ml methanol solution containing 10% hydrochloric acid (HCl), and a white precipitate was observed. Next, a white precipitate was collected to obtain a polymer (2) in a yield of 98%. The reaction formula of the above reaction is as follows:

經量測後可得知,聚合物(1)及聚合物(2)的數目平均分子量約為17,000至19,000。 It has been found by measurement that the polymer (1) and the polymer (2) have a number average molecular weight of about 17,000 to 19,000.

使用示差掃描量熱儀(differential scanning calorimetry、DSC)量測所得聚合物(2),得知其熔融溫度(Tm)達約330℃以及其降溫再結晶溫度(Tcc)達約251℃。接著,以紅外線光譜儀(FT-IR)量測聚合物(2),結果如下:IR(cm-1):3023,1593,1472,1388,1090,1006,808。 The obtained polymer (2) was measured by differential scanning calorimetry (DSC), and it was found that its melting temperature (Tm) reached about 330 ° C and its temperature-reducing recrystallization temperature (Tcc) reached about 251 ° C. Next, the polymer (2) was measured by an infrared spectrometer (FT-IR), and the results were as follows: IR (cm -1 ): 3023, 1593, 1472, 1388, 1090, 1006, 808.

本揭露本揭露基於上述,由於本揭露所述聚合物(例如聚芳硫醚或其鹽類)其主鏈結構由不同之芳香基以交替排列方式構成,因此具有結晶性,使得該聚合物具有較高之熔點(例如約大於或等於330℃),並進一步提昇耐熱性、耐化學性、及耐火性。 The present disclosure is based on the above, since the polymer (for example, polyarylene sulfide or a salt thereof) of the present disclosure has a main chain structure composed of different aromatic groups in an alternating arrangement, and thus has crystallinity so that the polymer has Higher melting point (for example, greater than or equal to 330 ° C), and further improve heat resistance, chemical resistance, and fire resistance.

雖然本揭露已以數個實施例揭露如上,然其並非用以限定本揭露,任何本技術領域中具有通常知識者,在不脫離本揭露之精神和範圍內,當可作任意之更動與潤飾,因此本揭露之保護範圍當視後附之申請專利範圍所界定者為準。 The present disclosure has been disclosed in the above several embodiments, but it is not intended to limit the disclosure, and any one skilled in the art can make any changes and refinements without departing from the spirit and scope of the disclosure. Therefore, the scope of protection of this disclosure is subject to the definition of the scope of the patent application.

Claims (6)

一種聚合物,係具有一如式(I)或式(II)所示結構的重複單元 ,其中Ar1及Ar2係獨立為未取代二價芳香基;Y-係R2SO3 -或ClO4 -R1係C1-6烷基;Ar1與Ar2不相同;以及,R2係C1-6烷基、取代或未取代芳香環、或C1-6鹵烷基。 a polymer having a repeating unit having a structure represented by formula (I) or formula (II) Wherein Ar 1 and Ar 2 are independently unsubstituted divalent aromatic groups; Y - series R 2 SO 3 - or ClO 4 - R 1 is C 1-6 alkyl; Ar 1 is different from Ar 2 ; 2 is a C 1-6 alkyl group, a substituted or unsubstituted aromatic ring, or a C 1-6 haloalkyl group. 如申請專利範圍第1項所述之聚合物,其中R1係甲基(methyl)、乙基(ethyl)、丙基(propyl)、異丙基(isopropyl)、正丁基(n-butyl)、叔丁基(t-butyl)、仲丁基(sec-butyl)、異丁基(isobutyl)、戊基(pentyl)、或己基(hexyl)。 The polymer of claim 1, wherein R 1 is methyl, ethyl, propyl, isopropyl, n-butyl , t-butyl, sec-butyl, isobutyl, pentyl, or hexyl. 如申請專利範圍第1項所述之聚合物,其中Ar1及Ar2係獨立為未取代伸苯基(phenylene group)、聯苯伸基(biphenylene group)、伸萘基(naphthylene group)、伸噻吩基(thienylene group)、伸吲哚基(indolylene)、伸菲基(phenanthrenylene)、伸茚基(indenylene)、伸蒽基(anthracenylene)、或伸芴基(fluorenylene)。 The polymer according to claim 1, wherein the Ar 1 and Ar 2 are independently an unsubstituted phenylene group, a biphenylene group, a naphthylene group, and an extension. Thienylene group, indolylene, phenanthrenylene, indenylene, anthracenylene, or fluorenylene. 如申請專利範圍第1項所述之聚合物,其中Ar1及Ar2係 獨立為,R3係為氫,以及x係0、1、或2。 The polymer of claim 1, wherein the Ar 1 and Ar 2 are independently R 3 is hydrogen, and x is 0, 1, or 2. 如申請專利範圍第1項所述之聚合物,其中該具有如式(I)所示結構的重複單元係,其中R1係C1-6烷基;R3係為氫;以及,Y-係R2SO3 -或ClO4 -The polymer according to claim 1, wherein the repeating unit having the structure represented by the formula (I) Wherein R 1 is C 1-6 alkyl; R 3 is hydrogen; and Y - is R 2 SO 3 - or ClO 4 - . 如申請專利範圍第1項所述之聚合物,其中該具有如式(II)所示結構的重複單元係,其中R3係為氫。 The polymer according to claim 1, wherein the repeating unit having the structure represented by formula (II) Wherein R 3 is hydrogen.
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