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TWI643204B - Memory Layout Fabricated for Preventing Reference Layer from Breaking - Google Patents

Memory Layout Fabricated for Preventing Reference Layer from Breaking Download PDF

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TWI643204B
TWI643204B TW107111379A TW107111379A TWI643204B TW I643204 B TWI643204 B TW I643204B TW 107111379 A TW107111379 A TW 107111379A TW 107111379 A TW107111379 A TW 107111379A TW I643204 B TWI643204 B TW I643204B
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contacts
contact
perforations
memory
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TW107111379A
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TW201942901A (en
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林正隆
梁萬棟
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森富科技股份有限公司
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Abstract

一種記憶體配置結構,係包含複數基板;複數分別連通設於各基板之中央處之穿孔區;複數分別連通設於各基板且位於各穿孔區一側之第一接點區,各第一接點區係用以與一記憶體之各接腳墊用訊號線連接;以及複數分別連通設於各基板且位於各穿孔區另一側之第二接點區,各第二接點區係用以與該記憶體之各接腳墊用訊號線連接,且至少包含該記憶體之PAR接腳,並使其中一基板以其第一接點區或第二接點區通過穿孔區與另一基板之第一接點區或第二接點區相互電連接。藉此,可使記憶體之各接腳與第一接點區及第二接點區電連接後,讓各基板以其第一接點區或第二接點區相對應之訊號線透過穿孔區之導引進行跨層之相互電連接,使記憶體於製作時,可有效避免參考層產生破碎之情形,且具有較佳之電源分佈以及足夠之線路佈局空間,進而可維持較佳之訊號完整性。 A memory arrangement structure includes a plurality of substrates; a plurality of perforated regions respectively disposed at a center of each of the substrates; and a plurality of first contact regions respectively disposed on each of the substrates and located at one side of each of the perforated regions, each of the first connections The dot area is connected to the signal pads of each of the memory pads; and the plurality of second contact areas respectively disposed on the other substrate and located on the other side of each of the perforated areas, and the second contact area is used for each of the second contact areas. Connected to each of the pads of the memory with a signal line, and at least includes a PAR pin of the memory, and one of the substrates passes through the perforated area with another first contact area or second contact area The first contact region or the second contact region of the substrate is electrically connected to each other. Thereby, after the pins of the memory are electrically connected to the first contact region and the second contact region, the substrates are perforated through the corresponding signal lines corresponding to the first contact region or the second contact region. The guiding of the area is electrically connected across the layers, so that the memory can be effectively prevented from being broken when the memory is produced, and the power distribution and the layout space are sufficient to maintain better signal integrity. .

Description

記憶體配置結構 Memory configuration structure

本發明是有關於一種記憶體配置結構,尤指一種使記憶體於製作時,可有效避免參考層產生破碎之情形,且具有較佳之電源分佈以及足夠之線路佈局空間,進而可維持較佳之訊號完整性者。The invention relates to a memory arrangement structure, in particular to a situation in which the memory can be effectively prevented from being broken when the memory is produced, and has a better power distribution and sufficient line layout space, thereby maintaining a better signal. Integrity.

按,一般習用之記憶體,通常係將其各接腳依配置之需求電連接至各接點,而各接點再分別以訊號線相互電連接;藉以完成記憶體之設置。 然,以習用記憶體之接線方式而言,其基板上之各處係設有穿孔,並直接將記憶體之各接腳與各接點分別以訊號線經穿孔相互電連接,除導致線路佈局空間較為侷促之外,更有電源分佈不良之情形,而造成接線時參考層產生破碎之情形,使得記憶體之參考層較無法具有訊號之完整性。 因此,為改善上述之缺失,本案之發明人特潛心研究,開發出一種「記憶體配置結構」,以有效改善習用之缺點。According to the conventional memory, the pins are usually electrically connected to the contacts according to the configuration requirements, and the contacts are electrically connected to each other by signal lines respectively; thereby completing the setting of the memory. However, in terms of the wiring method of the conventional memory, the perforations are provided on the substrate, and the pins and the contacts of the memory are directly electrically connected to each other by the signal lines through the perforation, except for the line layout. In addition to the space is more cramped, there is a situation in which the power supply is poorly distributed, and the reference layer is broken when wiring, so that the reference layer of the memory is less capable of signal integrity. Therefore, in order to improve the above-mentioned deficiency, the inventors of the present invention have devoted themselves to research and development of a "memory configuration structure" to effectively improve the disadvantages of the conventional use.

本發明之主要目的係在於,可使記憶體之各接腳與第一接點區及第二接點區電連接後,讓各基板以其第一接點區或第二接點區相對應之訊號線透過穿孔區之導引進行跨層之相互電連接,使記憶體於製作時,可有效避免參考層產生破碎之情形,且具有較佳之電源分佈以及足夠之線路佈局空間,進而可維持較佳之訊號完整性。 為達上述之目的,本發明係一種記憶體配置結構,其係包含有:複數基板;複數分別連通設於各基板之中央處之穿孔區;複數分別連通設於各基板且位於各穿孔區一側之第一接點區,各第一接點區係用以與一記憶體之各接腳墊用訊號線連接;以及複數分別連通設於各基板且位於各穿孔區另一側之第二接點區,各第二接點區係用以與該記憶體之各接腳墊用訊號線連接,且至少包含該記憶體之PAR接腳,並使其中一基板以其第一接點區或第二接點區通過穿孔區與另一基板之第一接點區或第二接點區相互電連接。 於本發明之一實施例中,各穿孔區係分別包含有一第一排穿孔、一設於第一排穿孔一側之第二排穿孔、及一設於第二排穿孔一側之第三排穿孔。 於本發明之一實施例中,各第一排穿孔至少分別具有八個穿孔,各第二排穿孔至少分別具有九個穿孔,各第三排穿孔至少分別具有八個穿孔。 於本發明之一實施例中,各第一排穿孔、第二排穿孔與該各三排穿孔之間係分別具有一區隔部。 於本發明之一實施例中,各穿孔之外緣係分別具有一絕緣部,且各穿孔之間係分別具有一電源連接部。 於本發明之一實施例中,各第一接點區係分別包含有一第一排接點、一設於第一排接點一側之第二排接點、及一設於第二排接點一側之第三排接點,各第一排接點、各第二排接點與各第三排接點係分別具有至少九個接點。 於本發明之一實施例中,各第二接點區係分別包含有一第一排接點、一設於第一排接點一側之第二排接點、及一設於第二排接點一側之第三排接點,各第一排接點、各第二排接點與各第三排接點係分別具有至少九個接點。 於本發明之一實施例中,各第一接點區與各第二接點區係分別以訊號線經由該其中一基板之二表面通過該穿孔區與另一基板之一接點區或第二接點區進行電連接。 於本發明之一實施例中,各訊號線係為相同之長度。The main purpose of the present invention is to enable each substrate to be electrically connected to the first contact region and the second contact region, so that the substrates correspond to the first contact region or the second contact region. The signal lines are electrically connected to each other across the layers through the guidance of the perforated area, so that the memory can be effectively prevented from being broken when the memory is produced, and the power distribution and the layout space are sufficient to maintain Better signal integrity. In order to achieve the above object, the present invention is a memory arrangement structure comprising: a plurality of substrates; a plurality of perforated regions respectively disposed at the center of each substrate; a plurality of interconnected regions respectively disposed on the respective substrates and located in each of the perforated regions a first contact area on the side, each of the first contact areas is connected to a signal line of each of the memory pads; and a plurality of second respectively connected to the substrate and located on the other side of each of the perforated areas In the contact area, each of the second contact areas is connected to each of the pads of the memory by a signal line, and at least includes a PAR pin of the memory, and one of the substrates is a first contact area thereof Or the second contact region is electrically connected to the first contact region or the second contact region of the other substrate through the through-hole region. In one embodiment of the present invention, each of the perforated regions includes a first row of perforations, a second row of perforations disposed on one side of the first row of perforations, and a third row disposed on one side of the second row of perforations. perforation. In an embodiment of the invention, each of the first rows of perforations has at least eight perforations, and each of the second rows of perforations has at least nine perforations, and each of the third perforations has at least eight perforations. In an embodiment of the invention, each of the first row of perforations, the second row of perforations and the three rows of perforations respectively have a compartment. In an embodiment of the present invention, each of the outer edges of the perforations has an insulating portion, and each of the through holes has a power connection portion. In an embodiment of the present invention, each of the first contact regions includes a first row of contacts, a second row of contacts disposed on a side of the first row of contacts, and a second row of contacts. At the third row of contacts on one side, each of the first row of contacts, each of the second row of contacts and each of the third row of contacts has at least nine contacts. In an embodiment of the present invention, each of the second contact regions includes a first row of contacts, a second row of contacts disposed on a side of the first row of contacts, and a second row of contacts. At the third row of contacts on one side, each of the first row of contacts, each of the second row of contacts and each of the third row of contacts has at least nine contacts. In an embodiment of the present invention, each of the first contact regions and each of the second contact regions respectively passes through the through-hole region of the one of the substrates and the contact region of the other substrate by the signal line. The two contact areas are electrically connected. In one embodiment of the invention, each of the signal lines is of the same length.

請參閱『第1圖及第2圖』所示,係分別為本發明之基本示意圖及本發明之使用狀態示意圖。如圖所示:本發明係一種記憶體配置結構,其至少包含有複數基板1、複數穿孔區2、複數第一接點區3以及複數第二接點區4。 各基板1係為電路板,且各基板1係以上下對應或層疊之方式設置。 各穿孔區2係分別連通設於各基板1之中央處。 各第一接點區3係分別連通設於各基板1且位於各穿孔區2之一側,各第一接點區3係用以與一記憶體之各接腳墊用訊號線連接(圖未示)。 各第二接點區4係分別連通設於各基板1且位於各穿孔區2之另一側,各第二接點4區係用以與該記憶體之各接腳墊用訊號線連接,且至少包含該記憶體之PAR接腳(圖未示),並使使其中一基板以其第一接點區3或該第二接點區4通過穿孔區2與另一基板1之第一接點區3或第二接點區4相互電連接。 而當該記憶體之各接腳與其中一基板1之第一接點區3及第二接點區4電連接後,係可讓該第一接點區3與該第二接點區4相對應之訊號線5透過該穿孔區2之導引與所需之另一基板1之一接點區3或第二接點區4進行相互跨層之電連接(圖未示),使記憶體於製作時,可有效避免參考層產生破碎之情形,且具有較佳之電源分佈以及足夠之線路佈局空間,進而可維持較佳之訊號完整性。 於本創作之一實施例中,各穿孔區2係分別包含有一第一排穿孔21 、一設於第一排穿孔21一側之第二排穿孔22、及一設於第二排穿孔22一側之第三排穿孔23,各第一排穿孔21至少分別具有八個穿孔211,各第二排穿孔22至少分別具有九個穿孔221,各第三排穿孔23至少分別具有八個穿孔231,各第一排穿孔21、各第二排穿孔22與各第三排穿孔23之間係分別具有一區隔部24,且各穿孔之外緣係分別具有211、221、231一絕緣部212、222、232,並於且各穿孔211、221、231之間係分別具有一電源連接部25。 於本創作之一實施例中,各第一接點區3係分別包含有一第一排接點31、一設於第一排接點31一側之第二排接點32、及一設於第二排接點32一側之第三排接點33,各第一排接點31、各第二排接點32與各第三排接點33係分別具有至少九個接點311、321 、331。 於本創作之一實施例中,各第二接點區4分別係包含有一第一排接點41、一設於第一排接點41一側之第二排接點42、及一設於第二排接點42一側之第三排接點43,各第一排接點41、各第二排接點42與各第三排接點43係分別具有至少九個接點411、421 、431。 而當記憶體與其中一基板1之第一接點區3以及第二接點區4進行電連接時,舉例說明如下: 當記憶體連接時,係至少將該記憶體之VDD接腳連接至該第一接點區3中所設第一排接點31之第一個接點311;該記憶體之A13接腳連接至該第一接點區3中所設第二排接點32之第一個接點321;該記憶體之A17接腳連接至該第一接點區3中所設第三排接點33之第一個接點331;該記憶體之PAR接腳連接至該第二接點區4中所設第一排接點41之第一個接點411;該記憶體之A11接腳連接至該第二接點區4中所設第二排接點42之第一個接點421;該記憶體之VSS接腳連接至該第二接點區4中所設第三排接點43之第一個接點431。 由於該穿孔區2係設於該第一接點區3與該第二接點區4之間,因此 ,可於該基板1之第一接點區3及第二接點區4與另一基板1(圖未示)進行電連接時,將各訊號線5分別經由該基板1之二表面通過該穿孔區2所設該第一排穿孔21、該第二排穿孔22與該第三排穿孔23之各穿孔211、221、231進行各訊號線5之走線與導引,讓該第一接點區3之各接點311、321、331與該第二接點區4之各接點411、421、431依所需穿過各穿孔211、221、231後,以各訊號線5與另一基板1第一接點區3及第二接點區4進行跨層之電連接,並依所需將電源線或接地線分別與各電源連接部25連接,本實施例中各訊號線5係為相同之長度,如此,可使各訊號線5之走線乾淨俐落,不會造成參考層之破碎,且可做到各訊號線5皆等長之功效,而具有較佳之電源分佈以及足夠之線路線路佈局空間。 而各第一排穿孔21、各第二排穿孔22與各第三排穿孔23除藉由各區隔部24加以區隔避免各訊號線5相互干擾之外,當各訊號線5穿設至各穿孔211、221、231時,可藉由各絕緣部212、222、232避免各訊號線5接觸各電源連接部25產生短路。 綜上所述,本發明記憶體配置結構,可使記憶體之各接腳與第一接點區及第二接點區電連接後,讓各基板以其第一接點區或第二接點區相對應之訊號線透過穿孔區之導引進行跨層之相互電連接,使記憶體於製作時,可有效避免參考層產生破碎之情形,且具有較佳之電源分佈以及足夠之線路佈局空間,進而可維持較佳之訊號完整性;進而使本發明之產生能更進步、更實用、更符合消費者使用之所須,確已符合發明專利申請之要件,爰依法提出專利申請。 惟以上所述者,僅為本發明之較佳實施例而已,當不能以此限定本發明實施之範圍;故,凡依本發明申請專利範圍及發明說明書內容所作之簡單的等效變化與修飾,皆應仍屬本發明專利涵蓋之範圍內。Please refer to FIG. 1 and FIG. 2 for a basic schematic view of the present invention and a schematic view of the state of use of the present invention. As shown in the figure, the present invention is a memory arrangement structure including at least a plurality of substrates 1, a plurality of perforated regions 2, a plurality of first contact regions 3, and a plurality of second contact regions 4. Each of the substrates 1 is a circuit board, and each of the substrates 1 is provided in a corresponding or stacked manner. Each of the perforated areas 2 is connected to the center of each of the substrates 1 . Each of the first contact regions 3 is connected to each of the substrates 1 and located on one side of each of the perforated regions 2, and each of the first contact regions 3 is connected to a signal line of each of the pads of the memory (Fig. Not shown). Each of the second contact regions 4 is connected to each of the substrates 1 and located on the other side of each of the perforated regions 2, and each of the second contacts 4 is connected to the respective pads of the memory by signal lines. And including at least a PAR pin (not shown) of the memory, and causing one of the substrates to pass through the perforated area 2 and the first substrate 1 with the first contact area 3 or the second contact area 4 The contact area 3 or the second contact area 4 are electrically connected to each other. When the pins of the memory are electrically connected to the first contact region 3 and the second contact region 4 of one of the substrates 1, the first contact region 3 and the second contact region 4 are allowed to be connected. The corresponding signal line 5 is electrically connected to the desired contact area 3 or the second contact area 4 of the other substrate 1 through the guiding of the perforated area 2 (not shown) to make a memory. In the production process, the reference layer can be effectively prevented from being broken, and the power distribution and the layout space are sufficient, so as to maintain better signal integrity. In one embodiment of the present invention, each of the perforated areas 2 includes a first row of perforations 21, a second row of perforations 22 disposed on one side of the first row of perforations 21, and a perforation 22 disposed in the second row of perforations 22 The third row of perforations 23 on the side, each of the first row of perforations 21 has at least eight perforations 211, and each of the second rows of perforations 22 has at least nine perforations 221, and each of the third rows of perforations 23 has at least eight perforations 231, respectively. Each of the first row of perforations 21, each of the second rows of perforations 22 and each of the third row of perforations 23 respectively have a partition portion 24, and each of the outer perforations has 211, 221, 231 an insulating portion 212, 222, 232, and each of the through holes 211, 221, 231 has a power connection portion 25. In an embodiment of the present invention, each of the first contact regions 3 includes a first row of contacts 31, a second row of contacts 32 disposed on a side of the first row of contacts 31, and a first The third row of contacts 33 on the side of the second row of contacts 32, each of the first row of contacts 31, each of the second row of contacts 32 and each of the third row of contacts 33 has at least nine contacts 311, 321 331. In an embodiment of the present invention, each of the second contact regions 4 includes a first row of contacts 41, a second row of contacts 42 disposed on a side of the first row of contacts 41, and a second The third row of contacts 43 on the side of the second row of contacts 42, each of the first row of contacts 41, each of the second row of contacts 42 and each of the third row of contacts 43 respectively have at least nine contacts 411, 421 431. When the memory is electrically connected to the first contact region 3 and the second contact region 4 of one of the substrates 1, the following is exemplified: when the memory is connected, at least the VDD pin of the memory is connected to The first contact point 311 of the first row of contacts 31 is disposed in the first contact region 3; the A13 pin of the memory is connected to the second row of contacts 32 disposed in the first contact region 3 a first contact 321; the A17 pin of the memory is connected to the first contact 331 of the third row of contacts 33 provided in the first contact region 3; the PAR pin of the memory is connected to the The first contact 411 of the first row of contacts 41 is disposed in the second contact region 4; the A11 pin of the memory is connected to the second row of contacts 42 of the second contact region 4 A contact 421; the VSS pin of the memory is connected to the first contact 431 of the third row of contacts 43 provided in the second contact region 4. Since the perforated area 2 is disposed between the first contact area 3 and the second contact area 4, the first contact area 3 and the second contact area 4 of the substrate 1 and another When the substrate 1 (not shown) is electrically connected, the signal lines 5 are respectively disposed through the perforated area 2 through the two surfaces of the substrate 1 to the first row of through holes 21, the second row of holes 22 and the third row. Each of the through holes 211, 221, and 231 of the through hole 23 performs routing and guiding of each signal line 5, so that the contacts 311, 321, 331 of the first contact area 3 and the second contact area 4 are connected. The points 411, 421, and 431 pass through the respective through holes 211, 221, and 231 as needed, and the electrical connection between the signal lines 5 and the first contact area 3 and the second contact area 4 of the other substrate 1 is performed. The power cable or the grounding wire is connected to each power connection portion 25 as needed. In this embodiment, the signal lines 5 are the same length, so that the lines of the signal lines 5 can be cleaned and fallen. Causes the breaking of the reference layer, and can achieve each signal line 5 are equal in length, with better power distribution and enough line layout space. The first row of perforations 21, the second rows of perforations 22, and the third row of perforations 23 are separated by the partitions 24 to prevent the signal lines 5 from interfering with each other. When the signal lines 5 are worn to When the perforations 211, 221, and 231 are formed, the respective insulating portions 212, 222, and 232 can prevent the respective signal lines 5 from coming into contact with the respective power supply connecting portions 25 to cause a short circuit. In summary, the memory configuration structure of the present invention can electrically connect the pins of the memory to the first contact region and the second contact region, and let the substrates have their first contact regions or second connections. The signal lines corresponding to the dot areas are electrically connected to each other through the guiding of the perforated area, so that the memory can be effectively prevented from being broken when the memory is produced, and the power distribution and the layout space are sufficient. In turn, the better signal integrity can be maintained; thus, the invention can be made more progressive, more practical, and more in line with the needs of the consumer, and indeed meets the requirements of the invention patent application, and the patent application is filed according to law. However, the above is only the preferred embodiment of the present invention, and the scope of the present invention is not limited thereto; therefore, the simple equivalent changes and modifications made in accordance with the scope of the present invention and the contents of the invention are modified. All should remain within the scope of the invention patent.

1‧‧‧基板1‧‧‧Substrate

2‧‧‧穿孔區 2‧‧‧Perforated area

21‧‧‧第一排穿孔 21‧‧‧First row of perforations

211、221、231‧‧‧穿孔 211, 221, 231‧‧ ‧ piercing

212、222、232‧‧‧絕緣部 212, 222, 232‧‧‧Insulation

22‧‧‧第二排穿孔 22‧‧‧Second row of perforations

23‧‧‧第三排穿孔 23‧‧‧ Third row of perforations

24‧‧‧區隔部 24‧‧‧section

25‧‧‧電源連接部 25‧‧‧Power connection

3‧‧‧第一接點區 3‧‧‧First junction area

31‧‧‧第一排接點 31‧‧‧first row of contacts

311、321、331‧‧‧接點 311, 321, 331‧‧‧ contacts

32‧‧‧第二排接點 32‧‧‧second row of contacts

33‧‧‧第三排接點 33‧‧‧ third row of contacts

4‧‧‧第二接點區 4‧‧‧Second junction area

41‧‧‧第一排接點 41‧‧‧first row of contacts

411、421、431‧‧‧接點 411, 421, 431‧‧‧ contacts

42‧‧‧第二排接點 42‧‧‧second row of contacts

43‧‧‧第三排接點 43‧‧‧ third row of contacts

5‧‧‧訊號線 5‧‧‧Signal line

第1圖,係本發明之基本示意圖。 第2圖,係本發明之使用狀態示意圖。Figure 1 is a basic schematic view of the present invention. Fig. 2 is a schematic view showing the state of use of the present invention.

Claims (9)

一種記憶體配置結構,其包含有:複數基板;複數穿孔區,係分別連通設於各基板之中央處;複數第一接點區,係分別連通設於各基板且位於各穿孔區之一側,各第一接點區係用以與一記憶體之各接腳墊用訊號線連接;以及複數第二接點區,係分別連通設於各基板且位於各穿孔區之另一側,各第二接點區係用以與該記憶體之各接腳墊用訊號線連接,且至少包含該記憶體之PAR接腳,並使其中一基板以其第一接點區或第二接點區通過穿孔區與另一基板之第一接點區或第二接點區相互電連接。 A memory arrangement structure comprising: a plurality of substrates; a plurality of perforated regions respectively connected at a center of each substrate; and a plurality of first contact regions respectively connected to each of the substrates and located at one side of each of the perforated regions Each of the first contact regions is connected to the signal pads of each of the memory pads; and the plurality of second contact regions are respectively connected to the respective substrates and located on the other side of each of the perforated regions, each of The second contact area is connected to the signal pads of the memory, and includes at least the PAR pin of the memory, and one of the substrates is the first contact area or the second contact The region is electrically connected to the first contact region or the second contact region of the other substrate through the perforated area. 依申請專利範圍第1項所述之記憶體配置結構,其中,各穿孔區係分別包含有一第一排穿孔、一設於第一排穿孔一側之第二排穿孔、及一設於第二排穿孔一側之第三排穿孔。 The memory arrangement according to claim 1, wherein each of the perforated areas comprises a first row of perforations, a second row of perforations disposed on one side of the first row of perforations, and one of the second perforations. The third row of perforations on one side of the perforation. 依申請專利範圍第2項所述之記憶體配置結構,其中,各第一排穿孔至少分別具有八個穿孔,各第二排穿孔至少分別具有九個穿孔,各第三排穿孔至少分別具有八個穿孔。 The memory arrangement according to claim 2, wherein each of the first rows of perforations has at least eight perforations, and each of the second rows of perforations has at least nine perforations, and each of the third rows of perforations has at least eight Perforation. 依申請專利範圍第3項所述之記憶體配置結構,其中,各第一排穿孔、各第二排穿孔與各第三排穿孔之間係分別具有一區隔部。 The memory arrangement according to claim 3, wherein each of the first row of perforations, the second row of perforations and the third row of perforations respectively have a compartment. 依申請專利範圍第3項所述之記憶體配置結構,其中,各穿孔之外緣係分別具有一絕緣部,且各穿孔之間係分別具有一電源連接部。 The memory arrangement according to claim 3, wherein each of the outer edges of the perforations has an insulating portion, and each of the through holes has a power connection portion. 依申請專利範圍第1項所述之記憶體配置結構,其中,各第一接點區係分別包含有一第一排接點、一設於第一排接點一側之第二排接點、及一設於第二排接點一側之第三排接點,各第一排接點、各第二排接點與各第三排接點係分別具有至少九個接點。According to the memory configuration of claim 1, wherein each of the first contact regions includes a first row of contacts and a second row of contacts disposed on a side of the first row of contacts, And a third row of contacts disposed on one side of the second row of contacts, each of the first row of contacts, each of the second row of contacts and each of the third row of contacts respectively have at least nine contacts. 依申請專利範圍第1項所述之記憶體配置結構,其中,各第二接 點區係分別包含有一第一排接點、一設於第一排接點一側之第二排接點、及一設於第二排接點一側之第三排接點,各第一排接點、各第二排接點與各第三排接點係分別具有至少九個接點。According to the memory arrangement structure of claim 1, wherein each of the second contact points includes a first row of contacts and a second row of contacts disposed on a side of the first row of contacts, And a third row of contacts disposed on one side of the second row of contacts, each of the first row of contacts, each of the second row of contacts and each of the third row of contacts respectively have at least nine contacts. 依申請專利範圍第1項所述之記憶體配置結構,其中,各第一接 點區與各第二接點區係分別以訊號線經由其中一基板之二表面通過穿孔區與另一基板之一接點區或第二接點區進行電連接。According to the memory configuration of claim 1, wherein each of the first contact regions and each of the second contact regions respectively pass through the perforated region and the other substrate via the two surfaces of one of the substrates by signal lines. A contact area or a second contact area is electrically connected. 依申請專利範圍第8項所述之記憶體配置結構,其中,各訊號線 係為相同之長度。The memory arrangement according to item 8 of the patent application scope, wherein each of the signal lines has the same length.
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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI792288B (en) * 2021-04-28 2023-02-11 森富科技股份有限公司 memory testing device

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7042735B2 (en) * 2003-10-16 2006-05-09 Hitachi, Ltd. Fitting substrate for connection and fitting substrate for connection for use in disk array control apparatus
US7102905B2 (en) * 2003-11-06 2006-09-05 Elpida Memory, Inc. Stacked memory, memory module and memory system
TW201027692A (en) * 2009-01-06 2010-07-16 Chipmos Technologies Inc Semiconductor package structure and method for manufacturing the same
TW201413720A (en) * 2012-08-27 2014-04-01 英帆薩斯公司 Common support board and microelectronic package
TW201616926A (en) * 2014-10-31 2016-05-01 Mpi Corp Multilayer circuit board
TW201804571A (en) * 2011-12-02 2018-02-01 英特爾公司 Memory device, system with stacked memory device, and memory die element (2)

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7042735B2 (en) * 2003-10-16 2006-05-09 Hitachi, Ltd. Fitting substrate for connection and fitting substrate for connection for use in disk array control apparatus
US7102905B2 (en) * 2003-11-06 2006-09-05 Elpida Memory, Inc. Stacked memory, memory module and memory system
TW201027692A (en) * 2009-01-06 2010-07-16 Chipmos Technologies Inc Semiconductor package structure and method for manufacturing the same
TW201804571A (en) * 2011-12-02 2018-02-01 英特爾公司 Memory device, system with stacked memory device, and memory die element (2)
TW201413720A (en) * 2012-08-27 2014-04-01 英帆薩斯公司 Common support board and microelectronic package
TW201616926A (en) * 2014-10-31 2016-05-01 Mpi Corp Multilayer circuit board

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI792288B (en) * 2021-04-28 2023-02-11 森富科技股份有限公司 memory testing device

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