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TWI513871B - Polishing pad and chemical mechanical polishing method - Google Patents

Polishing pad and chemical mechanical polishing method Download PDF

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Publication number
TWI513871B
TWI513871B TW099136694A TW99136694A TWI513871B TW I513871 B TWI513871 B TW I513871B TW 099136694 A TW099136694 A TW 099136694A TW 99136694 A TW99136694 A TW 99136694A TW I513871 B TWI513871 B TW I513871B
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Taiwan
Prior art keywords
polishing pad
polishing
fiber
fiber bundle
elastomer
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TW099136694A
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Chinese (zh)
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TW201120269A (en
Inventor
Nobuo Takaoka
Mitsuru Kato
Chihiro Okamoto
Kimio Nakayama
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Kuraray Co
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Publication of TWI513871B publication Critical patent/TWI513871B/en

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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00Lapping machines or devices; Accessories
    • B24B37/11Lapping tools
    • B24B37/20Lapping pads for working plane surfaces
    • B24B37/24Lapping pads for working plane surfaces characterised by the composition or properties of the pad materials
    • DTEXTILES; PAPER
    • D04BRAIDING; LACE-MAKING; KNITTING; TRIMMINGS; NON-WOVEN FABRICS
    • D04HMAKING TEXTILE FABRICS, e.g. FROM FIBRES OR FILAMENTARY MATERIAL; FABRICS MADE BY SUCH PROCESSES OR APPARATUS, e.g. FELTS, NON-WOVEN FABRICS; COTTON-WOOL; WADDING ; NON-WOVEN FABRICS FROM STAPLE FIBRES, FILAMENTS OR YARNS, BONDED WITH AT LEAST ONE WEB-LIKE MATERIAL DURING THEIR CONSOLIDATION
    • D04H1/00Non-woven fabrics formed wholly or mainly of staple fibres or like relatively short fibres
    • D04H1/40Non-woven fabrics formed wholly or mainly of staple fibres or like relatively short fibres from fleeces or layers composed of fibres without existing or potential cohesive properties
    • D04H1/42Non-woven fabrics formed wholly or mainly of staple fibres or like relatively short fibres from fleeces or layers composed of fibres without existing or potential cohesive properties characterised by the use of certain kinds of fibres insofar as this use has no preponderant influence on the consolidation of the fleece
    • D04H1/4282Addition polymers
    • DTEXTILES; PAPER
    • D04BRAIDING; LACE-MAKING; KNITTING; TRIMMINGS; NON-WOVEN FABRICS
    • D04HMAKING TEXTILE FABRICS, e.g. FROM FIBRES OR FILAMENTARY MATERIAL; FABRICS MADE BY SUCH PROCESSES OR APPARATUS, e.g. FELTS, NON-WOVEN FABRICS; COTTON-WOOL; WADDING ; NON-WOVEN FABRICS FROM STAPLE FIBRES, FILAMENTS OR YARNS, BONDED WITH AT LEAST ONE WEB-LIKE MATERIAL DURING THEIR CONSOLIDATION
    • D04H1/00Non-woven fabrics formed wholly or mainly of staple fibres or like relatively short fibres
    • D04H1/40Non-woven fabrics formed wholly or mainly of staple fibres or like relatively short fibres from fleeces or layers composed of fibres without existing or potential cohesive properties
    • D04H1/42Non-woven fabrics formed wholly or mainly of staple fibres or like relatively short fibres from fleeces or layers composed of fibres without existing or potential cohesive properties characterised by the use of certain kinds of fibres insofar as this use has no preponderant influence on the consolidation of the fleece
    • D04H1/4326Condensation or reaction polymers
    • D04H1/435Polyesters
    • DTEXTILES; PAPER
    • D04BRAIDING; LACE-MAKING; KNITTING; TRIMMINGS; NON-WOVEN FABRICS
    • D04HMAKING TEXTILE FABRICS, e.g. FROM FIBRES OR FILAMENTARY MATERIAL; FABRICS MADE BY SUCH PROCESSES OR APPARATUS, e.g. FELTS, NON-WOVEN FABRICS; COTTON-WOOL; WADDING ; NON-WOVEN FABRICS FROM STAPLE FIBRES, FILAMENTS OR YARNS, BONDED WITH AT LEAST ONE WEB-LIKE MATERIAL DURING THEIR CONSOLIDATION
    • D04H1/00Non-woven fabrics formed wholly or mainly of staple fibres or like relatively short fibres
    • D04H1/40Non-woven fabrics formed wholly or mainly of staple fibres or like relatively short fibres from fleeces or layers composed of fibres without existing or potential cohesive properties
    • D04H1/44Non-woven fabrics formed wholly or mainly of staple fibres or like relatively short fibres from fleeces or layers composed of fibres without existing or potential cohesive properties the fleeces or layers being consolidated by mechanical means, e.g. by rolling
    • D04H1/46Non-woven fabrics formed wholly or mainly of staple fibres or like relatively short fibres from fleeces or layers composed of fibres without existing or potential cohesive properties the fleeces or layers being consolidated by mechanical means, e.g. by rolling by needling or like operations to cause entanglement of fibres
    • DTEXTILES; PAPER
    • D06TREATMENT OF TEXTILES OR THE LIKE; LAUNDERING; FLEXIBLE MATERIALS NOT OTHERWISE PROVIDED FOR
    • D06NWALL, FLOOR, OR LIKE COVERING MATERIALS, e.g. LINOLEUM, OILCLOTH, ARTIFICIAL LEATHER, ROOFING FELT, CONSISTING OF A FIBROUS WEB COATED WITH A LAYER OF MACROMOLECULAR MATERIAL; FLEXIBLE SHEET MATERIAL NOT OTHERWISE PROVIDED FOR
    • D06N3/00Artificial leather, oilcloth or other material obtained by covering fibrous webs with macromolecular material, e.g. resins, rubber or derivatives thereof
    • D06N3/0002Artificial leather, oilcloth or other material obtained by covering fibrous webs with macromolecular material, e.g. resins, rubber or derivatives thereof characterised by the substrate
    • D06N3/0004Artificial leather, oilcloth or other material obtained by covering fibrous webs with macromolecular material, e.g. resins, rubber or derivatives thereof characterised by the substrate using ultra-fine two-component fibres, e.g. island/sea, or ultra-fine one component fibres (< 1 denier)
    • DTEXTILES; PAPER
    • D06TREATMENT OF TEXTILES OR THE LIKE; LAUNDERING; FLEXIBLE MATERIALS NOT OTHERWISE PROVIDED FOR
    • D06NWALL, FLOOR, OR LIKE COVERING MATERIALS, e.g. LINOLEUM, OILCLOTH, ARTIFICIAL LEATHER, ROOFING FELT, CONSISTING OF A FIBROUS WEB COATED WITH A LAYER OF MACROMOLECULAR MATERIAL; FLEXIBLE SHEET MATERIAL NOT OTHERWISE PROVIDED FOR
    • D06N3/00Artificial leather, oilcloth or other material obtained by covering fibrous webs with macromolecular material, e.g. resins, rubber or derivatives thereof
    • D06N3/04Artificial leather, oilcloth or other material obtained by covering fibrous webs with macromolecular material, e.g. resins, rubber or derivatives thereof with macromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds
    • D06N3/10Artificial leather, oilcloth or other material obtained by covering fibrous webs with macromolecular material, e.g. resins, rubber or derivatives thereof with macromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds with styrene-butadiene copolymerisation products or other synthetic rubbers or elastomers except polyurethanes
    • DTEXTILES; PAPER
    • D06TREATMENT OF TEXTILES OR THE LIKE; LAUNDERING; FLEXIBLE MATERIALS NOT OTHERWISE PROVIDED FOR
    • D06NWALL, FLOOR, OR LIKE COVERING MATERIALS, e.g. LINOLEUM, OILCLOTH, ARTIFICIAL LEATHER, ROOFING FELT, CONSISTING OF A FIBROUS WEB COATED WITH A LAYER OF MACROMOLECULAR MATERIAL; FLEXIBLE SHEET MATERIAL NOT OTHERWISE PROVIDED FOR
    • D06N2211/00Specially adapted uses

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  • Engineering & Computer Science (AREA)
  • Textile Engineering (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Mechanical Engineering (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)

Description

研磨墊及化學機械研磨方法Polishing pad and chemical mechanical polishing method

本發明係關於一種用於被研磨基材之平坦化或鏡面化之研磨墊、及使用該研磨墊之化學機械研磨方法。詳言之,例如較佳使用於半導體晶圓表面之表面研磨、或配線基板之研磨等之不織布型研磨墊。The present invention relates to a polishing pad for planarization or mirroring of a substrate to be polished, and a chemical mechanical polishing method using the same. More specifically, for example, a non-woven type polishing pad which is preferably used for surface polishing of a surface of a semiconductor wafer or polishing of a wiring substrate.

近年來,隨著積體電路之高積體化及多層配線化,正尋求在形成有積體電路之半導體晶圓上之高平坦度。In recent years, with the high integration of integrated circuits and multilayer wiring, high flatness on semiconductor wafers in which integrated circuits are formed is being sought.

用以研磨半導體晶圓之研磨法係廣泛採用化學機械研磨(CMP)。CMP係藉由一邊將研磨糊滴於旋轉中的被研磨基材之表面,一邊使行星齒輪狀旋轉中的研磨墊接觸而進行研磨的方法。Chemical mechanical polishing (CMP) is widely used in the grinding method for grinding semiconductor wafers. The CMP is a method of polishing by polishing a polishing pad in a planetary gear shape while dropping a polishing paste on the surface of a substrate to be polished which is rotating.

習知CMP所用之研磨墊係由如具有下列專利文獻1至4所揭示的獨立氣泡構造之高分子發泡成形體所構成的研磨墊;或如下列專利文獻5至18所揭示的不織布型研磨墊。The polishing pad used in the conventional CMP is a polishing pad composed of a polymer foam molded body having the closed cell structure disclosed in the following Patent Documents 1 to 4; or a non-woven type polishing as disclosed in the following Patent Documents 5 to 18. pad.

例如,由發泡成形體所構成的研磨墊係藉由進行二液硬化型聚胺甲酸酯之澆鑄發泡成形所製造。如此之研磨墊係利用不織布型研磨墊也具有高的剛性。因此,於研磨時,由於對被研磨基材之凸部變得容易選擇性地施加載重,研磨速率(研磨速度)較高。然而,由發泡成形體所構成的研磨墊係具有如下之缺點:所凝聚的研磨粒存在於研磨面之情形下,由於也對於所凝聚的研磨粒選擇性地施加載重,變得容易在研磨面上造成刮傷。因而,也如非專利文獻1所揭示,具有如下之缺點:在具有容易被刮傷之銅配線的基材、或研磨界面接著性弱的低介電常數材料之情形下,特別容易發生刮傷或界面剝離。另外,於澆鑄發泡成形下,由於難以獲得均質地發泡之發泡成形體,具有研磨面內之研磨不均一性容易變高的缺點。For example, a polishing pad composed of a foamed molded article is produced by casting foam molding of a two-liquid curing type polyurethane. Such a polishing pad also has high rigidity by using a non-woven type polishing pad. Therefore, at the time of polishing, since the load is easily applied to the convex portion of the substrate to be polished, the polishing rate (polishing speed) is high. However, the polishing pad composed of the foamed molded article has a drawback in that in the case where the agglomerated abrasive grains are present on the polished surface, since the load is selectively applied to the aggregated abrasive grains, it becomes easy to be ground. Scratches on the surface. Therefore, as disclosed in Non-Patent Document 1, there is a disadvantage that scratching is particularly likely to occur in the case of a substrate having a copper wiring which is easily scratched or a low dielectric constant material having a weak interface at the polishing interface. Or the interface is stripped. Further, in the case of casting foam molding, it is difficult to obtain a foamed molded body which is uniformly foamed, and there is a disadvantage that polishing unevenness in the polishing surface tends to be high.

另一方面,例如不織布型研磨墊係含有不織布、與不織布內部所賦予的聚胺甲酸酯樹脂等之高分子彈性體。如此之不織布型研磨墊也較由發泡成形體所構成的研磨墊更具有優異的柔軟性。因此,所凝聚的研磨粒即使存在於研磨面之情形下,載重也難以選擇性地施加於所凝聚的研磨粒,不易對研磨面造成刮傷。然而,不織布型研磨墊具有得不到夠高的平坦化性能之問題。認為此係如下之原因:由於不織布型研磨墊柔軟,於研磨時,隨著被研磨基材之表面形狀而變形、或研磨特性將隨時間經過而改變,應力將局部集中於纖維所存在的部分。另外,不織布型研磨墊也具有研磨速率低的問題。On the other hand, for example, the non-woven type polishing pad contains a non-woven fabric and a polymeric elastomer such as a polyurethane resin provided inside the nonwoven fabric. Such a non-woven type polishing pad also has superior flexibility as compared with a polishing pad composed of a foamed molded body. Therefore, even if the aggregated abrasive grains are present on the polished surface, it is difficult to selectively apply the load to the aggregated abrasive grains, and it is difficult to cause scratches on the polished surface. However, the non-woven type polishing pad has a problem that flattening performance is not sufficiently high. This is considered to be due to the following reasons: since the non-woven type polishing pad is soft, when it is ground, it deforms with the surface shape of the substrate to be polished, or the polishing property changes with time, and the stress is locally concentrated on the portion where the fiber exists. . In addition, the non-woven type polishing pad also has a problem that the polishing rate is low.

另外,下列專利文獻15至18係揭示以實現較習知還高精確度的研磨加工作為目的,使用由極細纖維之纖維束所形成的不織布之不織布型研磨墊。具體而言,例如專利文獻15係揭示纏繞平均纖度為0.0001至0.01分特克斯(dtex)之聚酯極細纖維之纖維束所形成的不織布、與由存在於此不織布內部空間之以聚胺甲酸酯為主成分的高分子彈性體所構成的片狀物而成之研磨墊。Further, the following Patent Documents 15 to 18 disclose a non-woven type polishing pad which uses a non-woven fabric formed of a fiber bundle of ultrafine fibers for the purpose of realizing a polishing process which is more precise and more precise. Specifically, for example, Patent Document 15 discloses a nonwoven fabric formed by winding a fiber bundle of a polyester microfiber having an average fineness of 0.0001 to 0.01 dtex, and a polyamine which is present in the inner space of the nonwoven fabric. A polishing pad made of a sheet of a polymer elastomer having an acid ester as a main component.

專利文獻1:日本專利特開2000-178374號公報Patent Document 1: Japanese Patent Laid-Open Publication No. 2000-178374

專利文獻2:日本專利特開2000-248034號公報Patent Document 2: Japanese Patent Laid-Open Publication No. 2000-248034

專利文獻3:日本專利特開2001-89548號公報Patent Document 3: Japanese Patent Laid-Open Publication No. 2001-89548

專利文獻4:日本專利特開平11-322878號公報Patent Document 4: Japanese Patent Laid-Open No. Hei 11-322878

專利文獻5:日本專利特開2002-9026號公報Patent Document 5: Japanese Patent Laid-Open Publication No. 2002-9026

專利文獻6:日本專利特開平11-99479號公報Patent Document 6: Japanese Patent Laid-Open No. Hei 11-99479

專利文獻7:日本專利特開2005-212055號公報Patent Document 7: Japanese Patent Laid-Open Publication No. 2005-212055

專利文獻8:日本專利特開平3-234475號公報Patent Document 8: Japanese Patent Laid-Open No. Hei 3-234475

專利文獻9:日本專利特開平10-128674號公報Patent Document 9: Japanese Patent Laid-Open No. Hei 10-128674

專利文獻10:日本專利特開2004-311731號公報Patent Document 10: Japanese Patent Laid-Open Publication No. 2004-311731

專利文獻11:日本專利特開平10-225864號公報Patent Document 11: Japanese Patent Laid-Open No. Hei 10-225864

專利文獻12:日本專利特表2005-518286號公報Patent Document 12: Japanese Patent Laid-Open Publication No. 2005-518286

專利文獻13:日本專利特開2003-201676號公報Patent Document 13: Japanese Patent Laid-Open Publication No. 2003-201676

專利文獻14:日本專利特開2005-334997號公報Patent Document 14: Japanese Patent Laid-Open Publication No. 2005-334997

專利文獻15:日本專利特開2007-54910號公報Patent Document 15: Japanese Patent Laid-Open Publication No. 2007-54910

專利文獻16:日本專利特開2003-170347號公報Patent Document 16: Japanese Patent Laid-Open Publication No. 2003-170347

專利文獻17:日本專利特開2004-130395號公報Patent Document 17: Japanese Patent Laid-Open Publication No. 2004-130395

專利文獻18:日本專利特開2002-172555號公報Patent Document 18: Japanese Patent Laid-Open Publication No. 2002-172555

非專利文獻1:柏木正弘等、「CMP之科學」、Science Foram股份有限公司、1997年8月20日、p. 113至119Non-Patent Document 1: Kashiwagi Masahiro, "Science of CMP", Science Foram Co., Ltd., August 20, 1997, p. 113 to 119

如上所述,雖然使用由發泡成形體所構成的研磨墊之CMP係具有優異的研磨速率,但是具有容易造成刮傷、研磨面內之研磨不均一性容易變高之問題。另外,使用不織布型研磨墊的CMP難以給予刮傷,但是具有研磨速率低,另外,由於耐磨損性低,具有壽命短的問題。As described above, the CMP system using the polishing pad composed of the foamed molded article has an excellent polishing rate, but has a problem that scratching is likely to occur and polishing unevenness in the polishing surface tends to be high. Further, CMP using a non-woven type polishing pad is difficult to give a scratch, but has a low polishing rate and has a problem that the wear resistance is low and the life is short.

本發明係為了解決如此之問題,目的在於提供一種具有優異的耐割傷性的不織布型研磨墊,其可以獲得高的研磨速率,在研磨面內之研磨不均一性低,另外,能夠實現不易造成刮傷之CMP。The present invention has been made to solve such a problem, and an object thereof is to provide a non-woven type polishing pad having excellent cut resistance, which can attain a high polishing rate, low unevenness of polishing in a polishing surface, and can be easily realized. The CMP that caused the scratch.

本發明之一形態係一種研磨墊,其係含有由平均橫截面積為0.1至30μm2 之極細纖維的纖維束所形成的不織布、與在不織布內部所賦予的高分子彈性體;於厚度方向之縱截面,從第一表面起而朝厚度方向20%以內之厚度區域中之纖維束橫截面的平均數量密度D1 為1000至5000個/mm2 ;D1 與從對向於第一表面之第二表面起而朝厚度方向20%以內之厚度區域中之纖維束橫截面的平均數量密度D2 之比(D1 /D2 )為1.3至5。One aspect of the present invention is a polishing pad comprising a nonwoven fabric formed of a fiber bundle of an ultrafine fiber having an average cross-sectional area of 0.1 to 30 μm 2 and a polymeric elastomer imparted inside the nonwoven fabric; The longitudinal section, the average number density D 1 of the cross section of the fiber bundle in the thickness region from the first surface to within 20% in the thickness direction is 1000 to 5000 / mm 2 ; D 1 and from the opposite to the first surface The ratio (D 1 /D 2 ) of the average number density D 2 of the cross section of the fiber bundle in the thickness region of the second surface up to 20% in the thickness direction is 1.3 to 5.

另外,本發明之另一形態係一種化學機械研磨方法,其係基材之化學機械研磨方法;一邊將研磨糊滴於基材之表面,一邊使該研磨墊的第一表面接觸於該基材表面而研磨。In another aspect of the present invention, a chemical mechanical polishing method is a chemical mechanical polishing method for a substrate; the first surface of the polishing pad is brought into contact with the substrate while the polishing paste is dropped on the surface of the substrate. Grinding the surface.

本發明之目的、特徵、形態及優點係藉由以下之詳細說明及所附上的圖式,變得更明白。The objects, features, aspects and advantages of the present invention will become more apparent from

藉由使用本發明之研磨墊而研磨基材表面,能夠以高的研磨速率而實現高精確度的研磨加工。另外,在所研磨的基材表面,刮傷不易殘留。再者,研磨墊之研磨面的耐磨損性高。By polishing the surface of the substrate using the polishing pad of the present invention, high-precision polishing processing can be realized at a high polishing rate. In addition, scratches are less likely to remain on the surface of the substrate to be polished. Further, the polishing surface of the polishing pad has high abrasion resistance.

針對關於本發明之研磨墊之一實施形態,一邊參照圖示且一邊詳加說明。第1圖係本實施形態的研磨墊10之示意縱截面圖。於第1圖中,1係由平均橫截面圖0.1至30μm2 之極細纖維1a之纖維束1b所形成的不織布,2係在不織布1之內部所賦予的高分子彈性體,3係研磨墊10之第一表面的研磨面,4係研磨墊10之第二表面的固定面。另外,R1 係從研磨面3之表面起而朝厚度方向20%以內之厚度區域,R2 係從對向於研磨面3之固定面4的表面起而朝厚度方向20%以內之厚度區域。又,R3 是從研磨面3表面起而朝厚度方向40至60%之厚度區域。還有,研磨面3係於研磨時接觸於被研磨基材之面,固定面4係使用雙面黏著膠帶等固定在CMP裝置之旋轉固定盤的面。An embodiment of the polishing pad according to the present invention will be described in detail with reference to the drawings. Fig. 1 is a schematic longitudinal cross-sectional view of a polishing pad 10 of the present embodiment. In Fig. 1, 1 is a nonwoven fabric formed of a fiber bundle 1b of an ultrafine fiber 1a having an average cross-sectional view of 0.1 to 30 μm 2 , 2 is a polymer elastic body imparted inside the nonwoven fabric 1, and a 3 type polishing pad 10 is provided. The polishing surface of the first surface is a fixing surface of the second surface of the polishing pad 10. Further, R 1 is a thickness region from the surface of the polishing surface 3 to 20% in the thickness direction, and R 2 is a thickness region from the surface of the fixing surface 4 of the polishing surface 3 to 20% in the thickness direction. . Further, R 3 is a thickness region from the surface of the polishing surface 3 to 40 to 60% in the thickness direction. Further, the polishing surface 3 is in contact with the surface of the substrate to be polished during polishing, and the fixing surface 4 is fixed to the surface of the rotating fixed disk of the CMP apparatus using a double-sided adhesive tape or the like.

如第1圖所示,研磨墊10係含有由極細纖維1之纖維束1b所形成的不織布1、與在不織布1之內部所賦予的高分子彈性體2的複合片。研磨墊之厚度係按照用途加以適當選擇,例如,較佳約為0.5至3 mm,進一步較佳約為0.7至2 mm。而且,研磨墊10之厚度方向的縱截面,從研磨面3之表面起而朝厚度方向20%以內之厚度區域中之纖維束橫截面的平均數量密度D1 為1000至5000個/mm2 。平均數量密度D1 、與從對向於研磨面3之固定面4的表面起而朝厚度方向20%以內之厚度區域中之纖維束橫截面的平均數量密度D2 之比(D1 /D2 )為1.3至5。如此方式,存在於研磨墊10之研磨面3表面附近的纖維束1b之密度係較存在於固定面4之表面附近的纖維束1b之密度還高。藉由使存在於研磨面3之表面附近的纖維束1b之密度成為高密度,能夠使研磨面3側之剛性及硬度比固定面4之側還高。而且,藉由使研磨面3側之剛性變高,用以對被研磨基材之表面塞入研磨粒的壓力將變高,研磨速率將變高,另外,耐磨損性也將提高。另外,藉由使存在於固定面4表面附近的纖維束1b之密度成為低密度,由於適度維持對被研磨基材表面之隨動性或適合性,在表面上變得難以發生刮傷。As shown in Fig. 1, the polishing pad 10 includes a nonwoven fabric 1 made of the fiber bundle 1b of the ultrafine fibers 1 and a composite sheet of the polymer elastic body 2 provided inside the nonwoven fabric 1. The thickness of the polishing pad is appropriately selected depending on the use, and is, for example, preferably about 0.5 to 3 mm, and more preferably about 0.7 to 2 mm. Further, the longitudinal section of the polishing pad 10 in the thickness direction is an average number density D 1 of the fiber bundle cross-section in the thickness region from the surface of the polishing surface 3 to 20% in the thickness direction of 1,000 to 5,000 / mm 2 . The average number density D 1, and the pairs at the surface of the fixing surface polishing surface 3 of 4, the average number density thickness region the thickness direction is within 20% of the of the fiber bundle cross section D 2 ratio (D 1 / D 2 ) is 1.3 to 5. In this manner, the density of the fiber bundle 1b existing in the vicinity of the surface of the polishing surface 3 of the polishing pad 10 is higher than the density of the fiber bundle 1b existing in the vicinity of the surface of the fixing surface 4. By making the density of the fiber bundle 1b existing in the vicinity of the surface of the polishing surface 3 high, the rigidity and hardness of the polishing surface 3 side can be made higher than the side of the fixed surface 4. Further, by increasing the rigidity of the polishing surface 3 side, the pressure for inserting the abrasive grains on the surface of the substrate to be polished is increased, the polishing rate is increased, and the abrasion resistance is also improved. In addition, by making the density of the fiber bundle 1b existing in the vicinity of the surface of the fixing surface 4 low, it is difficult to cause scratching on the surface due to moderate followability or suitability to the surface of the substrate to be polished.

研磨墊10之厚度方向縱截面中之平均數量密度D1 係進行如下方式所算出。使用刀刃而平行於厚度方向切斷研磨墊10,利用掃瞄型電子顯微鏡(SEM)而以100至1000倍觀察、拍攝其切斷面。還有,此時也可以利用氧化鋨等之染料以進行切斷面之染色。然後,從所拍攝的影像,計算在從研磨面3之表面起而朝厚度方向20%以內之厚度區域R1 所觀察到的纖維束1b每既定面積之橫截面的個數,算出纖維束1b每單位面積的橫截面之個數的數量密度(個/mm2 )。還有,研磨面經過立絨處理之情形下,在從所立絨的極細纖維或纖維束之根部起而朝厚度方向20%以內之厚度區域,算出數量密度。另外,在研磨墊表面形成有溝或孔之情形下,在未形成有溝或孔之部分,算出數量密度。在數個位置(例如,5個位置)到處算出如此之數量密度,將所獲得之數量密度之數量平均設為平均數量密度D1 。同樣地,平均數量密度D2 係計算在從固定面4之表面起而朝厚度方向20%以內之厚度區域R2 所觀察到的纖維束每既定面積之橫截面的個數,算出每單位面積的橫截面個數之數量密度(個/mm2 )。在數個位置(例如,5個位置)到處算出如此之數量密度,將所獲得之數量密度的數量平均設為平均數量密度D2The average number density D 1 in the longitudinal section of the polishing pad 10 in the thickness direction was calculated as follows. The polishing pad 10 was cut in parallel with the thickness direction using a blade, and the cut surface was observed by a scanning electron microscope (SEM) at 100 to 1000 times. Further, in this case, it is also possible to perform dyeing of the cut surface by using a dye such as ruthenium oxide. Then, from the image taken is calculated every predetermined number of cross-sectional area of the fiber bundle 1b and in the thickness direction is within 20% of the thickness of the region R as viewed from the surface of the polishing surface 1 to 3, the fiber bundle is calculated 1b The number density (number/mm 2 ) of the number of cross sections per unit area. Further, in the case where the polishing surface is subjected to the velvet treatment, the number density is calculated from the root portion of the fine fiber or the fiber bundle of the pile to the thickness region within 20% in the thickness direction. Further, in the case where grooves or holes are formed in the surface of the polishing pad, the number density is calculated in a portion where no groove or hole is formed. Such a number density is calculated everywhere at several positions (for example, five positions), and the number of the obtained number density is averaged to the average number density D 1 . Similarly, the average number density D 2 is calculated by calculating the number of cross sections of the fiber bundle per predetermined area observed from the surface of the fixing surface 4 and the thickness region R 2 within 20% in the thickness direction, and calculating the unit area per unit area. The number density of the cross-sections (number / mm 2 ). Such a number density is calculated everywhere at several positions (for example, five positions), and the number of the obtained number density is averaged to the average number density D 2 .

研磨墊10之平均數量密度D1 為1000至5000個/mm2 ,較佳為1000至4500個/mm2 ,進一步較佳為1100至4000個/mm2 ,特別理想為1200至3000個/mm2 之範圍。D1 低於1000個/mm2 之情形下,由於使研磨面3之表面附近的剛性變低,且由於對被研磨基材變得難以塞入研磨粒而使研磨速率降低或耐磨損性降低。另外,D1 超過5000個/mm2 之情形下,由於使研磨面3之表面附近的剛性變得過高,刮傷變得容易發生。The polishing pad 10 has an average number density D 1 of from 1,000 to 5,000 / mm 2 , preferably from 1,000 to 4,500 / mm 2 , further preferably from 1,100 to 4,000 / mm 2 , particularly preferably from 1,200 to 3,000 / mm 2 range. When D 1 is less than 1000/mm 2 , the rigidity in the vicinity of the surface of the polishing surface 3 is lowered, and the polishing rate is lowered or the abrasion resistance is lowered due to difficulty in inserting the abrasive grains into the substrate to be polished. reduce. Further, when D 1 exceeds 5,000/mm 2 , since the rigidity near the surface of the polishing surface 3 is excessively high, scratching easily occurs.

另外,研磨墊10之平均數量密度D2 為200至3500個/mm2 ,更佳為300至3000個/mm2 ,特別理想為500至2500個/mm2 之範圍。D2 過低之情形下,由於使對被研磨基材之隨動性或適合性變得過高及研磨墊整體之剛性將降低,具有平坦化性能降低之傾向。於此,所謂平坦化性能係意指在被研磨基材上形成具有高平坦度之研磨面的能力。平均數量密度D2 過高之情形下,由於使對被研磨基材之隨動性或適合性變低,具有研磨面內之研磨不均一性變高之傾向。另外,由於研磨墊內部之研磨糊的保持性將降低,具有研磨速率將降低之傾向。Further, the polishing pad 10 has an average number density D 2 of from 200 to 3,500 / mm 2 , more preferably from 300 to 3,000 / mm 2 , particularly preferably from 500 to 2,500 / mm 2 . When D 2 is too low, the followability or suitability of the substrate to be polished is too high and the rigidity of the entire polishing pad is lowered, so that the flattening performance tends to be lowered. Here, the flattening property means the ability to form a polished surface having a high flatness on a substrate to be polished. When the average number density D 2 is too high, the followability to the substrate to be polished or the suitability is lowered, and the polishing unevenness in the polishing surface tends to be high. Further, since the retention of the polishing paste inside the polishing pad is lowered, the polishing rate tends to be lowered.

研磨墊10係其平均數量密度D1 與其平均數量密度D2 之比(D1 /D2 )為1.3至5,較佳為1.4至3.7,進一步較佳為1.5至2.6之範圍。D1 /D2 低於1.3之情形下,由於提高剛性,研磨速率將提高;但是由於使對被研磨基材之隨動性變得過低,研磨不均一性將變高,同時耐磨損性也將降低。另一方面,D1 /D2 超過5之情形下,由於使對被研磨基材之隨動性變得過高,研磨速率將降低,另外,由於研磨墊之研磨面3側與固定面4側之密度差過大,研磨面3側與固定面4側之隨動性產生差異而使平坦化性能降低。The polishing pad 10 has a ratio (D 1 /D 2 ) of its average number density D 1 to its average number density D 2 of from 1.3 to 5, preferably from 1.4 to 3.7, further preferably from 1.5 to 2.6. In the case where D 1 /D 2 is less than 1.3, the polishing rate will be increased due to the increase in rigidity; however, since the followability to the substrate to be polished becomes too low, the polishing unevenness will become high while being resistant to abrasion. Sex will also decrease. On the other hand, when D 1 /D 2 exceeds 5, since the followability to the substrate to be polished becomes too high, the polishing rate is lowered, and the polishing surface 3 side and the fixing surface 4 of the polishing pad are The difference in density on the side is too large, and the followability between the side of the polishing surface 3 and the side of the fixing surface 4 is different to lower the flattening performance.

另外,研磨墊10係存在平均數量密度D1 、平均數量密度D2 、與從研磨面3之表面起而朝厚度方向40至60%之厚度區域R3 中之纖維束橫截面的平均數量密度D3 較佳為D1 >D3 >D2 之關係。具有如此關係之情形下,由於研磨墊1內部之研磨糊具有優異的保持性,實現更高的研磨速率。另外,研磨墊之剛性與對被研磨基材之隨動性也具有優異的均衡性。其結果,平坦化性能或研磨速率變得更高的同時,耐磨損性也具有變高的傾向。Further, the polishing pad 10 has an average number density D 1 , an average number density D 2 , and an average number density of fiber bundle cross sections in the thickness region R 3 from the surface of the polishing surface 3 to the thickness direction of 40 to 60%. D 3 is preferably a relationship of D 1 &gt; D 3 &gt; D 2 . In the case of such a relationship, since the polishing paste inside the polishing pad 1 has excellent retentivity, a higher polishing rate is achieved. In addition, the rigidity of the polishing pad and the followability to the substrate to be polished also have excellent balance. As a result, the flattening performance or the polishing rate becomes higher, and the abrasion resistance tends to become higher.

另外,D1 /D3 為1至1.4範圍之情形下,不織布內部之剛性均衡性將變得更適切,對研磨粒之被研磨基材的塞入硬度將變高,具有可以獲得高的研磨速率之傾向。另外,從對被研磨基材之隨動性更適切之觀點,D3 /D2 較佳為1.4至3範圍之情形。Further, in the case where D 1 /D 3 is in the range of 1 to 1.4, the rigidity balance inside the nonwoven fabric becomes more appropriate, and the penetration hardness to the substrate to be polished of the abrasive grains becomes high, and the polishing can be obtained with high polishing. The tendency of speed. Further, from the viewpoint of more suitable for the followability of the substrate to be polished, D 3 /D 2 is preferably in the range of 1.4 to 3.

形成纖維束之極細纖維的平均橫截面積係0.1至30μm2 ,較佳為10至15μm2 。由平均橫截面積低於1μm2 之極細纖維所構成的纖維束之情形下,於研磨之際,纖維將被斷裂而脫落,研磨粒將凝聚於所脫落的纖維而使刮傷變得容易發生。另外,由平均橫截面積超過30μm2 之極細纖維所構成的纖維束之情形下,極細纖維之表面積將變大,充分提高研磨面附近之纖維束的密度將變得困難。The ultrafine fibers forming the fiber bundle have an average cross-sectional area of 0.1 to 30 μm 2 , preferably 10 to 15 μm 2 . In the case of a fiber bundle composed of ultrafine fibers having an average cross-sectional area of less than 1 μm 2 , the fibers are broken and peeled off during polishing, and the abrasive particles are condensed on the detached fibers to cause scratches to easily occur. . Further, in the case of a fiber bundle composed of ultrafine fibers having an average cross-sectional area of more than 30 μm 2 , the surface area of the ultrafine fibers is increased, and it is difficult to sufficiently increase the density of the fiber bundles in the vicinity of the polished surface.

另外,纖維束之平均橫截面積為40至400μm2 ,進一步較佳為40至350μm2 。纖維束之平均橫截面積為40μm2 以上之情形下,研磨墊之強度或耐磨損性將提高,另外,也變得難以引起因不織布製造時之針扎處理所造成的纖維斷裂。另外,纖維束之平均橫截面積為400μm2 以下之情形下,由於能夠充分提高研磨面附近之纖維束的密度,能夠進一步提高研磨速率。還有,形成一纖維束之極細纖維的條數較佳為5至4000條,進一步較佳為5至30條。Further, the fiber bundle has an average cross-sectional area of 40 to 400 μm 2 , and more preferably 40 to 350 μm 2 . When the average cross-sectional area of the fiber bundle is 40 μm 2 or more, the strength or abrasion resistance of the polishing pad is improved, and it is also difficult to cause fiber breakage due to the needle sticking treatment at the time of nonwoven fabric production. Further, when the average cross-sectional area of the fiber bundle is 400 μm 2 or less, the polishing rate can be further increased because the density of the fiber bundle in the vicinity of the polished surface can be sufficiently increased. Further, the number of the ultrafine fibers forming a fiber bundle is preferably from 5 to 4,000, more preferably from 5 to 30.

形成極細纖維之聚合物並未予以特別限定。具體例,例如,可列舉:聚對苯二甲酸乙二酯(PET)、間苯二甲酸改性PET、磺基間苯二甲酸改性PET、聚對苯二甲酸丁二酯、聚對苯二甲酸己二酯等之芳香族聚酯類及其共聚物;聚乳酸、聚丁二酸乙二酯、聚丁二酸丁二酯、聚丁二酸己二酸丁二酯、聚羥基丁酸酯-聚羥基戊酸酯共聚物等之脂肪族聚酯及其共聚物;耐綸6、耐綸66、耐綸10、耐綸11、耐綸12、耐綸6-12等之聚醯胺類及其共聚物;聚丙烯、聚乙烯、聚丁烯、聚甲基戊烯、氯系聚烯烴等之聚烯烴類及其共聚物;含有25至70莫耳%之乙烯單位的改性聚乙烯醇;及聚胺甲酸酯系、耐綸系、聚酯系等之彈性體。此等聚合物能夠單獨地或組合二種以上而使用。The polymer forming the ultrafine fibers is not particularly limited. Specific examples include, for example, polyethylene terephthalate (PET), isophthalic acid modified PET, sulfoisophthalic acid modified PET, polybutylene terephthalate, and polyparaphenylene. Aromatic polyesters such as hexamethylene dicarboxylate and copolymers thereof; polylactic acid, polyethylene succinate, polybutyl succinate, polybutylene succinate, polyhydroxy butyl Aliphatic polyesters such as ester-polyhydroxyvalerate copolymers and copolymers thereof; polybenzazoles of nylon 6, nylon 66, nylon 10, nylon 11, nylon 12, nylon 6-12, etc. Amines and copolymers thereof; polyolefins and copolymers thereof such as polypropylene, polyethylene, polybutene, polymethylpentene, chlorine-based polyolefin, etc.; modification of ethylene units containing 25 to 70 mol% Polyvinyl alcohol; and an elastomer such as a polyurethane, a nylon or a polyester. These polymers can be used singly or in combination of two or more.

還有,形成極細纖維之聚合物係玻璃轉移溫度(Tg)較佳為50至300℃,進一步較佳為60至150℃,在50℃使其飽和吸水時之吸水率為0.2至2質量%之聚合物特別理想。Further, the polymer-forming glass having a very fine fiber has a glass transition temperature (Tg) of preferably 50 to 300 ° C, more preferably 60 to 150 ° C, and a water absorption ratio of 0.2 to 2 mass % when saturated with water at 50 ° C. The polymer is particularly desirable.

玻璃轉移溫度為上述範圍之情形下,由於能夠維持更高的剛性,研磨墊之平坦化性能將進一步變高,另外,於研磨之際,隨時間經過而使剛性變得不易降低。另外,在50℃使其飽和吸水時之吸水率為上述範圍之情形下,由於研磨墊於適度之範圍吸收研磨糊,研磨速率或研磨均一性進一步變得良好。另外,由於不會過度吸收研磨糊,研磨墊之剛性隨時間經過之降低及平坦化性能隨時間經過之變動將被抑制。When the glass transition temperature is in the above range, the flatness of the polishing pad is further increased because the rigidity can be maintained higher, and the rigidity is less likely to be lowered as time passes. Further, in the case where the water absorption at the time of saturated water absorption at 50 ° C is in the above range, since the polishing pad absorbs the polishing paste in an appropriate range, the polishing rate or the polishing uniformity is further improved. In addition, since the polishing paste is not excessively absorbed, the rigidity of the polishing pad is lowered with time and the variation of the flattening performance with time is suppressed.

如此之聚合物的具體例,例如,可列舉:由PET(Tg 77℃、吸水率1質量%)、間苯二甲酸改性PET(Tg 67至77℃、吸水率1質量%)、磺基間苯二甲酸改性PET(Tg 67至77℃、吸水率1至3質量%)、聚萘二甲酸丁二酯(Tg 85℃、吸水率1質量%)、聚萘二甲酸乙二酯(Tg 124℃、吸水率1質量%)等所形成的芳香族聚酯系纖維;由間苯二甲酸與壬二醇與甲基辛二醇共聚合聚醯胺(Tg 125至140℃、吸水率1至3質量%)等所形成的半芳香族聚醯胺系纖維等。尤其,將芳香族成分作為1成分單體單位而含有的PET等或改性PET等之半芳香族聚酯系聚合物特別理想。使用半芳香族聚酯系聚合物之情形下,從下列觀點而特別理想:容易提高研磨片之剛性,於研磨之際,也不易發生因水分所導致的隨時間經過變化,另外,容易形成緻密且高密度之不織布。Specific examples of such a polymer include, for example, PET (Tg 77 ° C, water absorption: 1% by mass), isophthalic acid-modified PET (Tg 67 to 77 ° C, water absorption: 1% by mass), and sulfo group. Isophthalic acid modified PET (Tg 67 to 77 ° C, water absorption 1 to 3 mass%), polybutylene naphthalate (Tg 85 ° C, water absorption 1% by mass), polyethylene naphthalate ( Aromatic polyester fiber formed by Tg 124° C., water absorption rate: 1% by mass; etc.; copolymerization of polydecylamine from isophthalic acid and decanediol and methyl octanediol (Tg 125 to 140° C., water absorption rate) A semi-aromatic polyamide fiber formed by the like, such as 1 to 3 mass%). In particular, a semi-aromatic polyester-based polymer such as PET or the like which contains an aromatic component as a monomer unit of one component or a modified PET is particularly preferable. When a semi-aromatic polyester-based polymer is used, it is particularly preferable from the viewpoint that it is easy to increase the rigidity of the polishing sheet, and it is less likely to change with time due to moisture during polishing, and it is easy to form a dense one. And high density is not woven.

另外,本實施形態中之不織布係由極細纖維之纖維束所形成,而該極細纖維係源自由極細纖維發生型纖維之長纖維所構成的長纖維棉網,具有優異的形態安定性,再者,從纖維脫落將變少的觀點也較佳。例如,如此之不織布係藉由與熔融紡紗直接鍵結的所謂紡紗黏合法而製造由如海島型複合纖維之極細纖維發生型纖維所構成的長纖維棉網,纏繞處理此長纖維棉網而作成纏繞棉網後,將極細纖維發生型纖維轉換成極細纖維所製造。還有,所謂長纖維並非使纖維長度如約10至50 mm短纖維的方式來刻意切斷的短纖維(staple),具有長的纖維長度之纖維。具體而言,例如極細纖維發生型纖維的纖維長度較佳為100 mm以上,只要技術上可製造,並且不會物理性斷裂,也可以為數m、數百m、數km之纖維長度。Further, the nonwoven fabric in the present embodiment is formed of a fiber bundle of ultrafine fibers, and the long fiber web of the ultrafine fiber-derived ultrafine fiber-generating fiber has excellent form stability, and further It is also preferable from the viewpoint that the fiber shedding is reduced. For example, such a non-woven fabric is manufactured by a so-called spinning adhesive which is directly bonded to melt-spun yarn, and a long-fiber cotton web composed of a very fine fiber-generating fiber such as an island-in-sea type composite fiber is produced, and the long-fiber cotton web is wound and processed. After the winding of the cotton web, the ultrafine fiber-forming fibers are converted into ultrafine fibers. Further, the term "long fiber" is not a staple which is intentionally cut by a fiber length of about 10 to 50 mm short fibers, and a fiber having a long fiber length. Specifically, for example, the fiber length of the ultrafine fiber-generating fiber is preferably 100 mm or more, and may be a fiber length of several m, several hundred m, or several km as long as it is technically manufacturable and does not physically break.

另外,本實施形態中之不織布也可以為使形態安定性提高之目的下而使編織物纏繞一體化的不織布。還有,使用纏繞不織布之情形,纖維束之平均數量密度係以除了編織物以外之僅不織布的厚度為基準所算出。Further, the nonwoven fabric in the present embodiment may be a nonwoven fabric in which the knitted fabric is wound and integrated for the purpose of improving the form stability. Further, in the case of using a woven non-woven fabric, the average number density of the fiber bundles is calculated based on the thickness of only the non-woven fabric other than the woven fabric.

研磨墊10係具有在由極細纖維1a之纖維束1b所形成的不織布1之內部賦予有高分子彈性體2而予以複合化的構造。The polishing pad 10 has a structure in which the polymer elastic body 2 is applied to the inside of the nonwoven fabric 1 formed of the fiber bundle 1b of the ultrafine fibers 1a, and is composited.

不織布1與高分子彈性體2之含有比率(不織布/高分子彈性體;質量比)較佳為55/45至95/5,進一步較佳為60/40至90/10,特別理想為70/30至90/10之範圍。如此範圍之情形下,可以獲得剛性為適度之研磨墊。高分子彈性體之含有比率過少之情形下,具有研磨墊之剛性變得過低之傾向。另外,高分子彈性體之含有比率過多之情形下,具有研磨墊之剛性變得過高之傾向。The content ratio of the nonwoven fabric 1 to the polymeric elastomer 2 (non-woven fabric/polymer elastomer; mass ratio) is preferably from 55/45 to 95/5, further preferably from 60/40 to 90/10, particularly preferably 70/. 30 to 90/10 range. In the case of such a range, a polishing pad having a moderate rigidity can be obtained. When the content ratio of the polymeric elastomer is too small, the rigidity of the polishing pad tends to be too low. Further, when the content ratio of the polymeric elastomer is too large, the rigidity of the polishing pad tends to be too high.

另外,如第2圖所示,於研磨墊10中,形成纖維束1b之極細纖維1a較佳為利用高分子彈性體2所黏合而予以集束。於此,所謂將極細纖維1a予以集束係意指存在於纖維束1b內部之極細纖維1a的大部分係藉由滲入纖維束1b內部之高分子彈性體2所黏合而予以束縛的狀態。如此方式,藉由使極細纖維1a予以集束,研磨墊10之剛性將變高,同時也抑制極細纖維1a之脫落。極細纖維1a未予以集束之情形下,由於極細纖維擺動,具有使研磨墊變得柔軟之傾向。Further, as shown in Fig. 2, in the polishing pad 10, the ultrafine fibers 1a forming the fiber bundle 1b are preferably bundled by the polymer elastic body 2 to be bundled. Here, the bundling of the ultrafine fibers 1a means that most of the ultrafine fibers 1a existing inside the fiber bundle 1b are bonded by the polymer elastic body 2 penetrating into the inside of the fiber bundle 1b. In this manner, by bundling the ultrafine fibers 1a, the rigidity of the polishing pad 10 becomes high, and the peeling of the ultrafine fibers 1a is also suppressed. When the ultrafine fibers 1a are not bundled, the polishing fibers tend to be soft due to the oscillation of the ultrafine fibers.

另外,如第2圖所示,複數條纖維束1b彼此較佳為藉由存在於纖維束1b之外側的高分子彈性體2所黏合而以塊狀(bulk)存在。如此方式,藉由使纖維束彼此予以黏合而提高研磨墊之形態安定性且提高研磨安定性。還有,極細纖維之集束狀態及纖維束彼此之黏合狀態能夠藉由研磨墊截面之電子顯微鏡照片而加以確認。Further, as shown in Fig. 2, the plurality of fiber bundles 1b are preferably present in a bulk by being bonded to the polymer elastic body 2 existing on the outer side of the fiber bundle 1b. In this manner, by maintaining the fiber bundles bonded to each other, the shape stability of the polishing pad is improved and the polishing stability is improved. Further, the state in which the ultrafine fibers are bundled and the state in which the fiber bundles are bonded to each other can be confirmed by an electron micrograph of the cross section of the polishing pad.

黏合滲入極細纖維內部之高分子彈性體及極細纖維束彼此之高分子彈性體較佳為非多孔質狀。還有,所謂非多孔質狀係意指實質上不具有如多孔質狀、或海綿狀(以下,也簡稱為多孔質狀)之高分子彈性體的許多獨立氣泡的狀態。具體而言,例如,意指並非如使溶劑系聚胺甲酸酯凝固而可以獲得之具有許多微細獨立氣泡之高分子彈性體。進行集束或黏合之高分子彈性體為非多孔質狀之情形下,研磨安定性將變高,另外,由於研磨時之糊屑或墊屑變得不易堆積於空隙中,能夠不容易磨損且長時間維持高的研磨速率。再者,由於對極細纖維之接著強度變高,能夠更抑制起因於纖維脫落之刮傷的發生。再者,由於可以獲得更高的剛性,且可以獲得更具有優異的平坦化性能的研磨墊。The polymer elastomer in which the polymer elastomer and the ultrafine fiber bundle which are infiltrated into the inside of the ultrafine fibers are preferably non-porous. In addition, the term "non-porous" means a state in which a plurality of independent bubbles of a polymer elastomer having a porous shape or a sponge shape (hereinafter, also referred to simply as a porous shape) are not substantially provided. Specifically, for example, it means a polymer elastomer having many fine closed cells which are not obtained by solidifying a solvent-based polyurethane. When the polymer elastic body to be bundled or bonded is non-porous, the polishing stability is increased, and since the paste or the swarf during polishing is less likely to accumulate in the void, it is less likely to be worn and long. The time maintains a high polishing rate. Further, since the bonding strength to the ultrafine fibers is increased, the occurrence of scratches due to the falling off of the fibers can be further suppressed. Furthermore, since a higher rigidity can be obtained, a polishing pad having more excellent planarization performance can be obtained.

在研磨墊10之研磨面3之D硬度較佳為25至50,進一步較佳為30至49,特別理想為為31至47。D硬度為如此範圍之情形下,不易受到被研磨基材之表面形狀的影響,從平坦化性能之觀點,可以獲得最適剛性之研磨墊。The D hardness of the polishing surface 3 of the polishing pad 10 is preferably from 25 to 50, further preferably from 30 to 49, particularly preferably from 31 to 47. When the D hardness is in such a range, it is hard to be affected by the surface shape of the substrate to be polished, and a polishing pad having an optimum rigidity can be obtained from the viewpoint of planarization performance.

接著,針對在不織布內部所賦予的高分子彈性體而詳細加以說明。Next, the polymer elastic body provided inside the nonwoven fabric will be described in detail.

不織布之內部所賦予的高分子彈性體的種類並未予以特別限定。高分子彈性體之具體例,例如,由聚胺甲酸酯系樹脂、聚醯胺系樹脂、(甲基)丙烯酸酯系樹脂、(甲基)丙烯酸酯-苯乙烯系樹脂、(甲基)丙烯酸酯-丙烯腈系樹脂、(甲基)丙烯酸酯-烯烴系樹脂、(甲基)丙烯酸酯-(加氫)異戊二烯系樹脂、(甲基)丙烯酸酯-丁二烯系樹脂、苯乙烯-丁二烯系樹脂、苯乙烯-加氫異戊二烯系樹脂、丙烯腈-丁二烯系樹脂、丙烯腈-丁二烯-苯乙烯系樹脂、醋酸乙烯系樹脂、(甲基)丙烯酸酯-醋酸乙烯系樹脂、乙烯-醋酸乙烯系樹脂、乙烯-烯烴系樹脂、矽氧烷系樹脂、氟系樹脂、聚酯系樹脂所構成的彈性體。高分子彈性體可以各自單獨使用或是也可以組合二種以上而使用。此等高分子彈性體之中,如聚胺甲酸酯系樹脂、聚醯胺系樹脂、聚乙烯醇系樹脂等之氫鍵結性高分子彈性體特別理想。還有,氫鍵結性高分子彈性體係藉由氫鍵而進行結晶化或凝聚的高分子彈性體,對極細纖維之集束性及對極細纖維之束縛黏合性高。另外,聚胺甲酸酯系樹脂係用以集束極細纖維或黏合纖維束彼此之具特別優異的接著性,另外,從提高研磨墊之硬度,具有優異的研磨下隨時間經過的安定性之觀點則特別理想。The type of the polymer elastomer to be imparted inside the nonwoven fabric is not particularly limited. Specific examples of the polymer elastomer include, for example, a polyurethane resin, a polyamide resin, a (meth)acrylate resin, a (meth)acrylate-styrene resin, or a (meth) group. Acrylate-acrylonitrile-based resin, (meth)acrylate-olefin resin, (meth)acrylate-(hydrogenated) isoprene resin, (meth)acrylate-butadiene resin, Styrene-butadiene resin, styrene-hydrogen isoprene resin, acrylonitrile-butadiene resin, acrylonitrile-butadiene-styrene resin, vinyl acetate resin, (methyl An elastomer composed of an acrylate-vinyl acetate resin, an ethylene-vinyl acetate resin, an ethylene-olefin resin, a siloxane resin, a fluorine resin, or a polyester resin. The polymeric elastomers may be used singly or in combination of two or more. Among these polymer elastomers, a hydrogen-bonding polymer elastomer such as a polyurethane resin, a polyamide resin, or a polyvinyl alcohol resin is particularly preferable. Further, the polymer elastic body in which the hydrogen-bonded polymer elastic system is crystallized or agglomerated by hydrogen bonding has high binding property to the ultrafine fibers and high binding strength to the ultrafine fibers. Further, the polyurethane resin is used to bundle extremely fine fibers or bonded fiber bundles with particularly excellent adhesion, and from the viewpoint of improving the hardness of the polishing pad and having excellent stability over time. It is especially ideal.

高分子彈性體之玻璃轉移溫度較佳為-10℃以下,進一步較佳為-15℃以下。玻璃轉移溫度過高之情形下,由於高分子彈性體脆弱,擔憂研磨中將脫落。玻璃轉移溫度係由利用在動態黏彈性測定拉伸模式之損失彈性模數的波峰溫度所算出。玻璃轉移溫度係視高分子彈性體之α-分散的波峰溫度而定。例如,聚胺甲酸酯系樹脂之情形,藉由調整成為軟質成分之聚醇的組成或硬質成分與軟質成分之比率而能夠使玻璃轉移溫度成為-10℃以下。The glass transition temperature of the polymeric elastomer is preferably -10 ° C or lower, more preferably -15 ° C or lower. When the glass transition temperature is too high, the polymer elastomer is weak, and it is feared that it will fall off during polishing. The glass transition temperature is calculated from the peak temperature of the loss elastic modulus measured by the dynamic viscoelasticity tensile mode. The glass transition temperature depends on the peak temperature of the α-dispersion of the polymeric elastomer. For example, in the case of a polyurethane resin, the glass transition temperature can be made -10 ° C or lower by adjusting the composition of the polyester which is a soft component or the ratio of the hard component to the soft component.

另外,高分子彈性體較佳為具有如下之彈性。從研磨墊之剛性變高,另外也具有優異的彈性之觀點,高分子彈性體之在23℃及50℃之儲存彈性模數(G’)為90至900 MPa,進一步較佳為20至800 MPa。另外,從具有優異的研磨安定性之觀點,在23℃之儲存彈性模數(G23 ’)與在50℃之儲存彈性模數(G50 ’)之比(G23 ’/G50 ’)為4以下,進一步較佳為3以下且1/3以上。Further, the polymeric elastomer preferably has the following elasticity. The storage elastic modulus (G') of the polymeric elastomer at 23 ° C and 50 ° C is 90 to 900 MPa, and more preferably 20 to 800, from the viewpoint that the rigidity of the polishing pad becomes high and the elasticity is excellent. MPa. In addition, from the viewpoint of excellent polishing stability, the ratio of the storage elastic modulus (G 23 ') at 23 ° C to the storage elastic modulus (G 50 ') at 50 ° C (G 23 '/G 50 ') It is 4 or less, and further preferably 3 or less and 1/3 or more.

另外,從具有優異的研磨糊之保液性及研磨安定性之觀點,高分子彈性體係於50℃予以飽和吸水時之吸水率較佳為0.2至5質量%,進一步較佳為0.5至3質量%。Further, from the viewpoint of having excellent liquid retention properties and polishing stability of the polishing paste, the water absorption rate of the polymer elastic system at 50 ° C for saturated water absorption is preferably from 0.2 to 5% by mass, further preferably from 0.5 to 3 by mass. %.

於此,高分子彈性體之代表例係針對聚胺甲酸酯系樹脂而詳細加以說明。聚胺甲酸酯系樹脂可列舉:藉由以既定之莫耳比而使高分子聚醇、有機聚異氰酸酯、與鏈延長劑等反應所獲得之各種聚胺甲酸酯系樹脂。Here, a representative example of the polymeric elastomer is described in detail with respect to the polyurethane resin. Examples of the polyurethane resin include various polyurethane resins obtained by reacting a polymer polyol, an organic polyisocyanate, a chain extender, and the like with a predetermined molar ratio.

高分子聚醇之具體例,例如,可列舉:聚乙二醇、聚丙二醇、聚四亞甲基二醇、聚(甲基四亞甲基二醇)等之聚醚系聚醇及其共聚物;聚伸丁基己二酸酯二醇、聚伸丁基癸二酸酯二醇、聚六亞甲基二酸酯二醇、聚(3-甲基-1,5-伸戊基己二酸酯)二醇、聚(3-甲基-1,5-伸戊基癸二酸酯)二醇、間苯二甲酸共聚合聚醇、對苯二甲酸共聚合聚醇、環己醇共聚合聚醇、聚己內酯二醇等之聚酯系聚醇及其共聚物;聚六亞甲基碳酸酯二醇、聚(3-甲基-1,5-伸戊基碳酸酯)二醇、聚五亞甲基碳酸酯二醇、聚四亞甲基碳酸酯二醇、聚(甲基-1,8-八亞甲基碳酸酯)二醇、聚九亞甲基碳酸酯二醇、聚環己烷碳酸酯等之聚碳酸酯系聚醇及其共聚物;聚酯碳酸酯聚醇等。另外必要時,也可以併用三羥甲基丙烷等之3官能醇或季戊四醇等之4官能醇等之多官能醇,或是乙二醇、丙二醇、1,4-丁二醇、1,6-己二醇等之短鏈醇。Specific examples of the polymer polyol include, for example, polyether polyols such as polyethylene glycol, polypropylene glycol, polytetramethylene glycol, and poly(methyltetramethylene glycol), and copolymerization thereof. Polybutylene adipate diol, polybutylene terephthalate diol, polyhexamethylene dicarboxylate diol, poly(3-methyl-1,5-exopentyl Diester)diol, poly(3-methyl-1,5-exopentyl sebacate) diol, isophthalic acid copolymerized polyol, terephthalic acid copolymerized polyol, cyclohexanol Copolymerized polyester-based polyalcohols such as polyalcohols, polycaprolactone diols, and the like; polyhexamethylene carbonate diol, poly(3-methyl-1,5-exopentyl carbonate) Glycol, polypentamethylene carbonate diol, polytetramethylene carbonate diol, poly(methyl-1,8-octamethylene carbonate) diol, poly-n-methylene carbonate A polycarbonate-based polyalcohol or a copolymer thereof such as an alcohol or a polycyclohexane carbonate; a polyester carbonate polyalcohol or the like. Further, if necessary, a polyfunctional alcohol such as a trifunctional alcohol such as trimethylolpropane or a tetrafunctional alcohol such as pentaerythritol may be used in combination, or ethylene glycol, propylene glycol, 1,4-butanediol, or 1,6- may be used in combination. Short-chain alcohols such as hexanediol.

另外,藉由將羧基、磺酸基、烴基、碳數5以下-尤其碳數3以下之聚伸烷基二醇基等之具有親水性基之聚醇成分作為樹脂構造單位而含有,能夠使對水性介質之分散性、或對研磨糊之潤濕性提高。In addition, a polyol component having a hydrophilic group such as a carboxyl group, a sulfonic acid group, a hydrocarbon group, or a carbon number of 5 or less, particularly a carbon number of 3 or less, is contained as a resin structural unit, and can be contained. The dispersibility to the aqueous medium or the wettability to the polishing paste is improved.

具有羧基之聚醇成分的具體例,可列舉:2,2-雙(羥甲基)丙酸、2,2-雙(羥甲基)丁酸、2,2-雙(羥甲基)戊酸等之含有羧基之二醇。另外,具有碳數5以下之聚伸烷基二醇基之聚醇成分的具體例,可列舉:聚乙二醇、聚丙二醇及其共聚物。Specific examples of the polyol component having a carboxyl group include 2,2-bis(hydroxymethyl)propionic acid, 2,2-bis(hydroxymethyl)butyric acid, and 2,2-bis(hydroxymethyl)pentane. a diol containing a carboxyl group such as an acid. Further, specific examples of the polyalcohol component having a polyalkylene glycol group having 5 or less carbon atoms include polyethylene glycol, polypropylene glycol, and copolymers thereof.

還有,聚醇成分係使用具有-10℃以下,進一步具有-20℃以下之玻璃轉移溫度的聚碳酸酯系聚醇,使聚胺甲酸酯系樹脂之玻璃轉移溫度成為-10℃以下,另外,由於容易提高彈性模數而特別理想。如此之聚醇成分較佳為含有脂環式聚碳酸酯系聚醇、直鏈狀聚碳酸酯系聚醇等之聚碳酸酯系聚醇,其中特別理想為含有聚醇成分全部量之60至100質量%的熔點為0℃以下之非晶性聚碳酸酯系聚醇。從耐割傷性高且吸水性或儲存彈性模數也為適度之觀點,較佳為將如此之聚碳酸酯系聚醇作為原料之聚胺甲酸酯系樹脂。Further, the polycarbonate component is a polycarbonate-based polyol having a glass transition temperature of -10 ° C or lower and further having a glass transition temperature of -20 ° C or lower, and the glass transition temperature of the polyurethane resin is -10 ° C or lower. In addition, it is particularly desirable because it is easy to increase the modulus of elasticity. The polyalcohol component is preferably a polycarbonate-based polyalcohol containing an alicyclic polycarbonate-based polyalcohol or a linear polycarbonate-based polyalcohol, and particularly preferably contains 60 parts of the total amount of the polyalcohol component. 100% by mass of the amorphous polycarbonate-based polyalcohol having a melting point of 0 ° C or less. From the viewpoint of high cut resistance, water absorption, and storage elastic modulus, a polyurethane resin having such a polycarbonate-based polyalcohol as a raw material is preferred.

熔點為0℃以下之非晶性聚碳酸酯系聚醇的具體例,例如,可列舉:聚(3-甲基-1,5-伸戊基碳酸酯)二醇、聚(甲基-1,8-八亞甲基碳酸酯)二醇等之具有分枝之聚碳酸酯聚醇;聚六亞甲基碳酸酯二醇、聚五亞甲基碳酸酯二醇、聚四亞甲基碳酸酯二醇、聚九亞甲基碳酸酯二醇、聚環己烷碳酸酯等之聚碳酸酯系聚醇。Specific examples of the amorphous polycarbonate-based polyalcohol having a melting point of 0 ° C or lower include, for example, poly(3-methyl-1,5-exopentyl carbonate) diol and poly(methyl-1). Branched polycarbonate polyol such as 8-octamethyl carbonate) diol; polyhexamethylene carbonate diol, polypentamethylene carbonate diol, polytetramethylene carbonate A polycarbonate-based polyalcohol such as an ester diol, a polyhexamethylene carbonate diol or a polycyclohexane carbonate.

聚醇成分不論單獨使用或組合二種以上而使用皆可。The polyhydric alcohol component may be used singly or in combination of two or more.

從藉由賦予適度彈性而能夠抑制刮傷發生之觀點,源自聚胺甲酸酯系樹脂中之聚醇成分的構造單位之含有比例較佳為30至65質量%,進一步較佳為40至60質量%,特別理想為45至55質量%。From the viewpoint of suppressing the occurrence of scratches by imparting moderate elasticity, the content ratio of the structural unit derived from the polyol component in the polyurethane resin is preferably from 30 to 65 mass%, further preferably from 40 to 60% by mass, particularly preferably 45 to 55% by mass.

還有,含有源自具有親水性基之聚醇成分的構造單位之聚胺甲酸酯系樹脂係對研磨糊之潤濕性將提高,但是具有吸水率變得過高之傾向。為了獲得使在上述的50℃飽和吸水時之吸水率成為如0.2至5質量%之聚胺甲酸酯系樹脂,較佳為使具有親水性基之聚醇成分的共聚合比例成為0.1至10質量%,進一步較佳成為0.5至5質量%。藉由以如此之含有比例而使具有親水性基之聚醇成分作為構造單位而含有,能夠一邊將因吸水所導致的膨潤軟化抑制至最小限度且一邊提高吸水率或潤濕性。另外,為了抑制使吸水率變得過高,較佳為與吸水性低的聚醇成分相組合而使用。如此之聚醇的具體例,例如,可列舉進行下列之聚碳酸酯系聚醇共聚合之聚碳酸酯聚醇等:聚伸丁基癸酸酯二醇、聚(3-甲基-1,5-伸戊基己二酸酯)二醇、聚(3-甲基-1,5-伸戊基癸二酸酯)二醇等之聚酯系聚醇及其共聚物;聚(3-甲基-1,5-伸戊基碳酸酯)二醇、聚(甲基-1,8-八亞甲基碳酸酯)二醇、聚六亞甲基碳酸酯二醇、聚五亞甲基碳酸酯二醇、聚四亞甲基碳酸酯二醇、聚九亞甲基碳酸酯二醇、聚環己烷碳酸酯二醇等。In addition, the polyurethane resin containing a structural unit derived from a polyol component having a hydrophilic group improves the wettability of the polishing paste, but tends to have an excessively high water absorption rate. In order to obtain a polyurethane resin having a water absorption ratio of from 0.2 to 5% by mass in the above-mentioned saturated water absorption at 50 ° C, it is preferred to make the copolymerization ratio of the polyol component having a hydrophilic group from 0.1 to 10 The mass % is further preferably from 0.5 to 5% by mass. When the polyol component having a hydrophilic group is contained as a structural unit in such a content ratio, it is possible to suppress the swelling and softening due to water absorption to the minimum while improving the water absorption rate or the wettability. Further, in order to suppress the water absorption rate from becoming excessively high, it is preferably used in combination with a polyol component having low water absorbability. Specific examples of such a polyhydric alcohol include polycarbonate polyalcohols obtained by copolymerizing the following polycarbonate-based polyols: poly(butyl phthalate diol), poly(3-methyl-1, Polyester-based polyalcohols such as 5-extended pentyl adipate diol, poly(3-methyl-1,5-exopentenyl sebacate) diol, and the like; poly(3- Methyl-1,5-exopentyl carbonate) diol, poly(methyl-1,8-octamethylene carbonate) diol, polyhexamethylene carbonate diol, polypentamethylene Carbonate diol, polytetramethylene carbonate diol, poly nin methylene carbonate diol, polycyclohexane carbonate diol, and the like.

有機聚異氰酸酯之具體例,例如,可列舉:六亞甲基二異氰酸酯、異佛酮二異氰酸酯、降莰烷二異氰酸酯、4,4’-二環己基甲烷二異氰酸酯等之脂肪族或脂環族二異氰酸酯等之無黃變型二異氰酸酯;2,4-甲苯基二異氰酸酯、2,6-甲苯基二異氰酸酯、4,4’-二苯基甲烷二異氰酸酯、二甲苯二異氰酸酯聚胺甲酸酯等之芳香族二異氰酸酯等。另外必要時也可以併用3官能異氰酸酯或4官能異氰酸酯等之多官能異氰酸酯。此等異氰酸酯可以單獨使用,也可以組合二種以上而使用。從對極細纖維之接著性高且提高極細纖維之集束力,另外,可以獲得硬度高的研磨墊之觀點,此等異氰酸酯之中,較佳為4,4’-二環己基甲烷二異氰酸酯、2,4-甲苯基二異氰酸酯、2,6-甲苯基二異氰酸酯、4,4’-二苯基甲烷二異氰酸酯、二甲苯二異氰酸酯等之脂環式二異氰酸酯或芳香族二異氰酸酯。Specific examples of the organic polyisocyanate include aliphatic or alicyclic groups such as hexamethylene diisocyanate, isophorone diisocyanate, norbornane diisocyanate, and 4,4'-dicyclohexylmethane diisocyanate. Non-yellowing diisocyanate such as diisocyanate; 2,4-tolyl diisocyanate, 2,6-tolyl diisocyanate, 4,4'-diphenylmethane diisocyanate, xylene diisocyanate polyurethane, etc. Aromatic diisocyanate or the like. Further, if necessary, a polyfunctional isocyanate such as a trifunctional isocyanate or a tetrafunctional isocyanate may be used in combination. These isocyanates may be used singly or in combination of two or more. From the viewpoint of high adhesion to the ultrafine fibers and an increase in the bridging force of the ultrafine fibers, and a polishing pad having a high hardness can be obtained, among these isocyanates, 4,4'-dicyclohexylmethane diisocyanate and 2 are preferable. An alicyclic diisocyanate or an aromatic diisocyanate such as 4-tolyl diisocyanate, 2,6-tolyl diisocyanate, 4,4'-diphenylmethane diisocyanate or xylene diisocyanate.

鏈延長劑之具體例,例如,可列舉:肼、乙二胺、丙二胺、六亞甲基二胺、九亞甲基二胺、二甲苯二胺、異佛酮二胺、哌啶及其衍生物、己二酸二醯肼、間苯二甲酸二醯肼等之二胺類;二乙三胺等之三胺類;三乙四胺等之四胺類;乙二醇、丙二醇、1,4-丁二醇、1,6-己二醇、1,4-雙(β-羥乙氧基)苯、1,4-環己烷二醇等之二醇類;三羥甲基丙烷等之三醇類;季戊四醇等之五醇類;胺乙基醇、胺丙基醇等之胺基醇類等。此等鏈延長劑可以單獨使用或是也可以組合二種以上而使用。從對纖維之接著性高,另外,可以獲得硬度為適當的研磨墊之觀點,此等鏈延長劑之中,較佳為從肼、哌啶、六亞甲基二胺、異佛酮二胺及其衍生物、二乙三胺等之三胺之中而組合二種以上而使用。另外,與鏈延長劑一起,也可以併用乙胺、丙胺、丁胺等之單胺類;4-胺基丁酸、6-胺基己酸等之含有羧基之單胺化合物;甲醇、乙醇、丙醇、丁醇等之單醇類。而且,藉由併用2,2-雙(羥甲基)丙酸、2,2-雙(羥甲基)丁酸、2,2-雙(羥甲基)戊酸等之含有羧基之二醇等,將羧基等之離子性基導入聚胺甲酸酯系彈性體之骨架中而能夠進一步使對水之潤濕性提高。Specific examples of the chain extender include, for example, anthracene, ethylenediamine, propylenediamine, hexamethylenediamine, nonamethylenediamine, xylenediamine, isophoronediamine, piperidine, and a derivative thereof, a diamine such as diammonium adipate or dioxonium isophthalate; a triamine such as diethylenetriamine; a tetraamine such as triethylenetetramine; ethylene glycol or propylene glycol; a diol such as 1,4-butanediol, 1,6-hexanediol, 1,4-bis(β-hydroxyethoxy)benzene or 1,4-cyclohexanediol; trimethylol a triol such as propane; a pentaol such as pentaerythritol; an amine alcohol such as an amine ethyl alcohol or an aminopropyl alcohol; and the like. These chain extenders may be used singly or in combination of two or more. From the viewpoint of high adhesion to fibers and, in addition, a polishing pad having a suitable hardness can be obtained. Among these chain extenders, preferred are hydrazine, piperidine, hexamethylenediamine, isophoronediamine. Two or more kinds of triamines such as a derivative thereof and diethylenetriamine are used in combination. Further, together with the chain extender, a monoamine such as ethylamine, propylamine or butylamine; a monoamine compound having a carboxyl group such as 4-aminobutyric acid or 6-aminohexanoic acid; methanol or ethanol; Monools such as propanol and butanol. Further, a carboxyl group-containing diol such as 2,2-bis(hydroxymethyl)propionic acid, 2,2-bis(hydroxymethyl)butyric acid or 2,2-bis(hydroxymethyl)pentanoic acid is used in combination. In addition, an ionic group such as a carboxyl group can be introduced into the skeleton of the polyurethane elastomer to further improve the wettability to water.

聚胺甲酸酯系樹脂係用以控制吸水率或儲存彈性模數,較佳為藉由添加分子內含有2個以上可與形成聚胺甲酸酯之單體單位所具有的官能基進行反應之官能基的交聯劑、或聚異氰酸酯系化合物、多官能嵌段異氰酸酯系化合物等之自我交聯性化合物而形成交聯教構造。單體單位所具有的官能基與交聯劑的官能基之組合,可列舉:羧基與唑啉基、羧基與碳二醯亞胺基、羧基與環氧基、羧基與環碳酸酯基、羧基與氮雜環丙烷基、羧基與肼衍生物或醯肼衍生物等。從交聯形成為容易且所獲得之研磨墊之剛性或耐磨損性為優異之觀點,於此等組合之中,特別理想為具有羧基之單體單位與具有唑啉基、碳二醯亞胺基或環氧基之交聯劑的組合;具有羥基或胺基之單體單位與具有嵌段異氰酸酯基之交聯劑的組合;及具有羧基之單體單位與肼衍生物或醯肼衍生物的組合。具有碳二醯亞胺基之交聯劑,例如,可列舉:日清紡績股份有限公司製「Carbodilite E-01」、「Carbodilite E-02」、「Carbodilite V-02」等之水分散碳二醯亞胺系化合物。另外,具有唑啉基之交聯劑,例如,可列舉:日本觸媒股份有限公司製「Epocross K-2010E」、「Epocross K-2020E」、「Epocross WS-500」等之水分散唑啉系化合物。相對於聚胺甲酸酯系樹脂而言,交聯劑之有效成分較佳為1至20質量%。更佳為1.5至10質量%。The polyurethane resin is used to control the water absorption rate or the storage elastic modulus, and it is preferred to carry out a reaction by adding two or more functional groups which can be combined with the monomer unit forming the polyurethane. A functional crosslinker or a self-crosslinkable compound such as a polyisocyanate compound or a polyfunctional block isocyanate compound forms a crosslinked structure. The combination of the functional group of the monomer unit and the functional group of the crosslinking agent may be exemplified by a carboxyl group and An oxazoline group, a carboxyl group and a carbodiimide group, a carboxyl group and an epoxy group, a carboxyl group and a cyclic carbonate group, a carboxyl group and an aziridine group, a carboxyl group, an anthracene derivative or an anthracene derivative. From the viewpoint that the crosslinking is formed easily and the rigidity or abrasion resistance of the obtained polishing pad is excellent, among these combinations, it is particularly preferable that the monomer unit having a carboxyl group has a combination of an oxazoline group, a carbodiimide group or an epoxy group crosslinking agent; a combination of a monomer unit having a hydroxyl group or an amine group and a crosslinking agent having a blocked isocyanate group; and a monomer unit having a carboxyl group Combination with an anthracene derivative or an anthracene derivative. For example, a water-dispersible carbon dioxide such as "Carbodilite E-01", "Carbodilite E-02", or "Carbodilite V-02" manufactured by Nisshinbo Co., Ltd. can be used as the crosslinking agent having a carbodiimide group. Imine compound. In addition, with Examples of the oxazoline-based crosslinking agent include water dispersion such as "Epocross K-2010E", "Epocross K-2020E", and "Epocross WS-500" manufactured by Nippon Shokubai Co., Ltd. An oxazoline compound. The active ingredient of the crosslinking agent is preferably from 1 to 20% by mass based on the polyurethane resin. More preferably, it is 1.5 to 10% by mass.

於不損害本發明之效果的範圍內,聚胺甲酸酯系樹脂也可以更含有滲透劑、消泡劑、潤滑劑、撥水劑、撥油劑、增黏劑、增量劑、硬化促進劑、抗氧化劑、紫外線吸收劑、防黴劑、發泡劑、聚乙烯醇、羧甲基纖維素等之水溶性高分子化合物、染料、顏料、無機微粒等。The polyurethane resin may further contain a penetrating agent, an antifoaming agent, a lubricant, a water repellent, an oil repellent, a tackifier, a bulking agent, and a hardening promotion, within a range not impairing the effects of the present invention. A water-soluble polymer compound such as a solvent, an antioxidant, an ultraviolet absorber, an antifungal agent, a foaming agent, polyvinyl alcohol or carboxymethyl cellulose, a dye, a pigment, an inorganic fine particle or the like.

接著,針對本實施形態之研磨墊之製造方法之一例詳細加以說明。Next, an example of a method of manufacturing the polishing pad of the present embodiment will be described in detail.

(1)棉網製造步驟(1) Cotton web manufacturing steps

於本製造方法中,首先製造由進行水溶性熱可塑性樹脂與非水溶性熱可塑性樹脂之熔融紡紗所獲得之海島型複合纖維所構成的長纖維棉網。還有,於本實施形態中,將海島型複合纖維作為用以形成極細纖維之複合纖維使用,也可以使用多層積層型截面纖維等之習知的極細纖維發生型纖維以取代海島型複合纖維。In the present production method, a long-fiber cotton web composed of a sea-island type composite fiber obtained by melt-spinning a water-soluble thermoplastic resin and a water-insoluble thermoplastic resin is first produced. In addition, in the present embodiment, the sea-island type composite fiber is used as a composite fiber for forming an ultrafine fiber, and a conventional ultrafine fiber-generating fiber such as a multilayer laminated fiber may be used instead of the sea-island type composite fiber.

海島型複合纖維係分別進行水溶性熱可塑性樹脂、及與水溶性熱可塑性樹脂相溶性低的非水溶性熱可塑性樹脂之熔融紡紗後,藉由使其複合化所獲得。然後,藉由從如此之海島型複合纖維進行水溶性熱可塑性樹脂之溶解去除或分解去除而形成極細纖維。從工業性之觀點,海島型複合纖維之寬度較佳為0.5至3分特克斯,進一步較佳為0.8至2.5分特克斯。The sea-island type composite fiber is obtained by melt-spinning a water-soluble thermoplastic resin and a water-insoluble thermoplastic resin having low compatibility with a water-soluble thermoplastic resin, and then combining them. Then, the ultrafine fibers are formed by dissolving or decomposing and removing the water-soluble thermoplastic resin from such island-in-sea type composite fibers. From the industrial point of view, the width of the sea-island type composite fiber is preferably from 0.5 to 3 dtex, more preferably from 0.8 to 2.5 dtex.

水溶性熱可塑性樹脂係藉由水或鹼水溶液、酸水溶液等之水溶液,於加熱條件下或加壓條件下,予以溶解去除或分解去除之聚合物。水溶性熱可塑性樹脂之具體例,例如,可列舉:聚乙烯醇(PVA)、PVA系共聚物、共聚合聚氧乙烯聚乙二醇及/或含有磺酸鹼金屬鹽之化合物等之改性聚酯等。此等水溶性熱可塑性樹脂之中,從具有優異的對水的溶解性之觀點,較佳為PVA或PVA系共聚物。The water-soluble thermoplastic resin is a polymer which is dissolved or removed by decomposition in an aqueous solution such as water or an aqueous alkali solution or an aqueous acid solution under heating or under a pressurized condition. Specific examples of the water-soluble thermoplastic resin include, for example, polyvinyl alcohol (PVA), a PVA-based copolymer, a copolymerized polyoxyethylene polyethylene glycol, and/or a compound containing a sulfonic acid alkali metal salt. Polyester, etc. Among these water-soluble thermoplastic resins, PVA or PVA-based copolymers are preferred from the viewpoint of having excellent solubility in water.

另外,非水溶性熱可塑性樹脂係用以形成上述之極細纖維的各種聚合物,並無特別限定而能夠使用。還有,非水溶性熱可塑性樹脂也可以含有各種添加劑。添加劑之具體例可列舉:觸媒、著色防止劑、耐熱劑、難燃劑、潤滑劑、防污劑、螢光增白劑、消豔劑、著色劑、光澤改良劑、除電劑、抗菌劑、防蟎劑、無機微粒等。Further, the water-insoluble thermoplastic resin is used for forming various polymers of the above-mentioned ultrafine fibers, and can be used without particular limitation. Further, the water-insoluble thermoplastic resin may contain various additives. Specific examples of the additive include a catalyst, a coloring preventive agent, a heat resistant agent, a flame retardant, a lubricant, an antifouling agent, a fluorescent whitening agent, a deodorant, a coloring agent, a gloss improving agent, a static eliminating agent, and an antibacterial agent. , anti-caries agents, inorganic particles, etc.

藉由熔融紡紗水溶性熱可塑性樹脂與非水溶性熱可塑性樹脂而予以複合化之後,針對藉由紡紗黏合法而形成長纖維棉網之方法,以下,詳細加以說明。The method of forming a long-fiber cotton web by the spunbonding method by the melt-spinning water-soluble thermoplastic resin and the water-insoluble thermoplastic resin is hereinafter described in detail.

首先,藉由分別各自的擠出劑而熔融混煉水溶性熱可塑性樹脂及非水溶性熱可塑性樹脂,同時使從各不相同的紡紗噴嘴而使熔融樹脂之紗束同時噴出。然後,藉由利用複合噴嘴而使所噴出的紗束使其複合後,從紡紗頭之噴嘴孔使其噴出而形成海島型複合纖維。從容易縮小單纖維的截面積且可以獲得纖維密度高的纖維束之觀點,海島型複合纖維中之島數較佳為5至4000島/纖維,進一步較佳為10至1000島/纖維。First, the water-soluble thermoplastic resin and the water-insoluble thermoplastic resin are melt-kneaded by the respective extrusion agents, and the yarn bundle of the molten resin is simultaneously discharged from the different spinning nozzles. Then, the discharged yarn bundles are combined by a composite nozzle, and then ejected from the nozzle holes of the spinning head to form island-in-sea type composite fibers. The number of islands in the sea-island type composite fiber is preferably from 5 to 4,000 islands/fiber, and more preferably from 10 to 1,000 islands/fiber, from the viewpoint of easily reducing the cross-sectional area of the single fiber and obtaining a fiber bundle having a high fiber density.

利用冷卻裝置以冷卻海島型複合纖維後,利用空氣噴射/噴嘴等之抽氣裝置,藉由速度相當於1000至6000m/分鐘之拉取速度的高速氣流而成為目的之纖度的方式來予以拉伸。之後,藉由將所拉伸的複合纖維堆積於移動式之收集面上而形成有長纖維棉網。還有此時,必要時也可以部分壓黏所堆積的長纖維棉網。從工業性之觀點,長纖維棉網之基重量(單位面積質量)較佳為20至500 g/m2 之範圍。After the sea-island type composite fiber is cooled by a cooling device, it is stretched by means of an air suction device such as an air jet/nozzle by means of a high-speed air flow having a pulling speed of 1000 to 6000 m/min. . Thereafter, a long fiber web is formed by depositing the drawn composite fibers on a movable collecting surface. Also, at this time, if necessary, the long fiber web which is deposited may be partially pressed. From the industrial point of view, the basis weight (mass per unit area) of the long-fiber cotton web is preferably in the range of 20 to 500 g/m 2 .

(2)棉網纏繞步驟(2) Cotton web winding step

接著,針對藉由重疊數片纏繞所獲得之長纖維棉網而形成纏繞棉網之棉網纏繞步驟加以說明。纏繞棉網係利用針扎或高壓水流處理等之習知不織布製造方法,藉由對長纖維棉網進行纏繞處理而可以獲得。Next, a cotton web winding step of forming a wound web by overlapping a plurality of long fiber webs obtained by winding a plurality of sheets will be described. The wound cotton web is obtained by a conventional nonwoven fabric manufacturing method such as needle sticking or high-pressure water flow treatment by winding a long-fiber web.

首先,將防止針折斷油劑、抗靜電油劑、纏繞改善油劑等之矽氧烷系油劑或礦物油系油劑賦予至長纖維棉網。還有,為了使基重不均減低,也可以藉由交叉包覆材而重疊二片以上之纖維棉網且賦予油劑。其後,藉由針扎而進行使纖維三次元纏繞的纏繞處理。藉由進行針扎而可以獲得高的纖維密度且難以引起纖維脫落之纏繞棉網。於針扎中,藉由改變表面側與背面側之針扎條件,能夠對表面側與背面側之纖維束密度賦予差異。First, a phthalic acid-based oil or a mineral oil-based oil which prevents a needle breakage oil, an antistatic oil agent, a entanglement-improving oil agent, or the like is applied to a long-fiber web. Further, in order to reduce the basis weight unevenness, it is also possible to laminate two or more fiber webs by the cross-cladding material and to provide an oil agent. Thereafter, a winding process of winding the fibers three-dimensionally is performed by needle sticking. By winding the needle, it is possible to obtain a wound web which has a high fiber density and is difficult to cause the fibers to fall off. In the needle sticking, by changing the needle-forming conditions on the front side and the back side, it is possible to impart a difference in the fiber bundle density between the front side and the back side.

在針扎之油劑的種類或量、針形狀、針深度、扎針次等之針條件係使成為研磨面之表面側的纖維束密度、與成為固定面之背面側的纖維束密度成為適切之密度差的方式來予以適當選擇。The needle condition such as the type or amount of the oil agent to be needled, the shape of the needle, the depth of the needle, and the number of needles is such that the density of the fiber bundle on the surface side of the polishing surface and the density of the fiber bundle on the back side of the fixed surface become appropriate. The method of density difference is appropriately selected.

針之鉤數係從例如1至9鉤之中所選出,於未發生針折斷之範圍越多越好。另外,針扎深度較佳設為在棉網表面針扎後之模樣並不明顯的範圍。具體而言,例如,可列舉如下之條件:初期係利用6至9鉤之針而以5至25 mm之深度進行針扎處理,後半則利用3至6鉤之針而作成深度0.1至15 mm來集中纏繞表面側之纖維。另外,針扎數係根據針形狀、油劑之種類及用量等而適當選擇,具體而言,較佳約為500至5000扎/cm2 ,另外,相對於從背面側之扎數,較佳為以1.5至2倍以上而處理從表面側之扎數。另外,與背面側作一比較,表面側較佳使用針之扎數較多的針,針之扎深度越淺越好。另外,較佳為提高扎數而藉由針之鉤而選擇性地纏繞表面側之纖維。The number of hooks of the needle is selected from, for example, 1 to 9 hooks, and the more the needle breakage does not occur, the better. Further, the pinning depth is preferably set to a range in which the appearance of the surface of the cotton web after the needle is not noticeable. Specifically, for example, the following conditions may be mentioned: the initial stage uses a 6 to 9 hook needle to perform a needle sticking process at a depth of 5 to 25 mm, and the latter half uses a 3 to 6 hook needle to make a depth of 0.1 to 15 mm. To concentrate the fibers on the side of the surface. Further, the number of needles is appropriately selected depending on the shape of the needle, the type and amount of the oil, and the like, and specifically, it is preferably about 500 to 5,000 oz/cm 2 , and it is preferably relative to the number of ties from the back side. The number of strands from the surface side is treated to be 1.5 to 2 times or more. Further, in comparison with the back side, it is preferable to use a needle having a large number of needles on the surface side, and the shallower the depth of the needle, the better. Further, it is preferable to increase the number of the strands and selectively wind the fibers on the surface side by the hooks of the needles.

另外,從可以獲得纖維密度高的纏繞棉網之觀點,針扎後之纏繞棉網的基重較佳成為針前之長纖維棉網基重的1.2倍以上,進一步較佳為1.5倍以上的方式來進行。纏繞棉網的基重係按照成為目的之研磨墊的厚度等而予以適當選擇,從具有優異的操作性之觀點,較佳為100至1500 g/m2 之範圍。In addition, from the viewpoint of obtaining a wound cotton web having a high fiber density, the basis weight of the wound cotton web after needle sticking is preferably 1.2 times or more, more preferably 1.5 times or more, based on the basis weight of the long fiber web before the needle. Way to proceed. The basis weight of the wound cotton web is appropriately selected in accordance with the thickness of the polishing pad to be used, etc., and is preferably in the range of 100 to 1,500 g/m 2 from the viewpoint of excellent workability.

另外,從可以獲得形態保持性良好、纖維之脫落少且纖維密度高的纏繞棉網之觀點,纏繞棉網的層間剝離強度較佳為2 kg/2.5 cm以上,進一步較佳為4 kg/2.5 cm以上。還有,層間剝離強度係成為三次元纏繞程度的目標。層間剝離強度過小之情形下,纖維纏繞體之纖維密度並不充分高。另外,雖然纏繞不織布之層間剝離強度的上限並未予以特別限定,從纏繞處理效率之觀點,較佳約為30 kg/2.5 cm以下。Further, from the viewpoint of obtaining a wound web having good form retention, less fiber shedding, and high fiber density, the interlaminar peel strength of the wound web is preferably 2 kg/2.5 cm or more, and further preferably 4 kg/2.5. More than cm. Also, the interlaminar peel strength is the target of the degree of three-dimensional winding. In the case where the interlayer peel strength is too small, the fiber density of the filament wound body is not sufficiently high. Further, the upper limit of the peeling strength between the layers of the entangled nonwoven fabric is not particularly limited, and is preferably about 30 kg/2.5 cm or less from the viewpoint of the winding treatment efficiency.

(3)濕熱收縮處理步驟(3) Wet heat shrinking treatment step

接著,藉由使纏繞棉網濕熱收縮而提高纏繞棉網之纖維密度及纏繞程度。還有,於本步驟中,與含有短纖維之纏繞棉網濕熱收縮之情形作一比較,藉由使含有長纖維之纏繞棉網濕熱收縮更能夠使纏繞棉網大幅收縮,因此,極細纖維之纖維密度變得緻密。濕熱收縮處理較佳為藉由水蒸氣加熱而進行。Next, the fiber density and the degree of entanglement of the wound cotton web are increased by shrinking the cotton web by heat and humidity. In addition, in this step, compared with the case of wet heat shrinkage of the wound cotton web containing short fibers, the wet cotton shrinkage of the wrapped cotton web containing long fibers can further shrink the wound cotton web, so that the ultrafine fibers are The fiber density becomes dense. The moist heat shrinkage treatment is preferably carried out by steam heating.

水蒸氣加熱條件係環境氣溫較佳為60至130℃之範圍,相對濕度較佳為75%以上,相對濕度進一步較佳為80%以上,進行60至600秒鐘之加熱處理。從能夠以高收縮率而使纏繞棉網收縮之觀點,較佳為如此加熱條件之情形。還有,相對濕度過低之情形下,藉由接觸於纖維之水分將快速乾燥,具有收縮將變得不充分之傾向。The steam heating condition is preferably in the range of 60 to 130 ° C, the relative humidity is preferably 75% or more, the relative humidity is more preferably 80% or more, and the heat treatment is performed for 60 to 600 seconds. From the viewpoint of being able to shrink the wound web at a high shrinkage ratio, it is preferable to carry out such heating conditions. Further, in the case where the relative humidity is too low, the moisture which is in contact with the fibers is rapidly dried, and the shrinkage tends to be insufficient.

濕熱收縮處理係使纏繞棉網之面積收縮率較佳成為35%以上,進一步較佳成為40%以上的方式來使其收縮。如此方式,藉由以高的收縮率而使其收縮,纖維密度將變得緻密。面積收縮率之上限並未予以特別限定,從收縮之限度或處理效率之觀點,較佳約為80%。還有,面積收縮率(%)係藉由下式(1)所算出:面積收縮率(%)=(收縮處理前之片材面的面積-收縮處理後之片材面的面積)/收縮處理前之片材面的面積×100...(1)。The wet heat shrinkage treatment is such that the area shrinkage ratio of the wound cotton web is preferably 35% or more, and more preferably 40% or more. In this way, the fiber density becomes dense by shrinking it with a high shrinkage ratio. The upper limit of the area shrinkage ratio is not particularly limited, and is preferably about 80% from the viewpoint of the shrinkage limit or the treatment efficiency. Further, the area shrinkage ratio (%) is calculated by the following formula (1): area shrinkage ratio (%) = (area of sheet surface before shrinkage treatment - area of sheet surface after shrinkage treatment) / shrinkage The area of the sheet surface before the treatment × 100 (1).

如此方式,予以濕熱收縮處理之纏繞棉網係藉由於海島型複合纖維之熱變形溫度以上之溫度予以加熱輥或加熱壓縮,進一步也可以提高纖維密度。此時,藉由對表面側與背面側,利用不同的條件進行加熱壓縮,也能夠使纖維束之密度梯度形成。藉由加熱輥所進行的壓縮條件,例如,可列舉:輥溫度為110至150℃、輥壓力為0.05至0.4 MPa之條件。收縮處理後之纏繞棉網的基重對收縮處理前之纏繞棉網的基重較佳為1.2至4倍,進一步較佳為1.5至4倍。In this manner, the wound cotton web subjected to the moist heat shrinkage treatment can further increase the fiber density by heating the roll or heating and compressing at a temperature higher than the heat distortion temperature of the sea-island type composite fiber. At this time, by performing heat compression on the front side and the back side by different conditions, the density gradient of the fiber bundle can be formed. The compression conditions by the heating roller include, for example, a roller temperature of 110 to 150 ° C and a roller pressure of 0.05 to 0.4 MPa. The basis weight of the wound web after the shrinkage treatment is preferably 1.2 to 4 times, more preferably 1.5 to 4 times, the basis weight of the wound web before the shrinking treatment.

(4)高分子彈性體填充步驟I(4) Polymer elastomer filling step I

也可以藉由於予以收縮處理之纏繞棉網的海島型複合纖維之進行極細纖維化處理之前,將高分子彈性體賦予纏繞棉網之內部而使海島型複合纖維黏著。如此方式,藉由於進行極細纖維化處理之前,將高分子彈性體賦予纏繞棉網,能夠提高纏繞棉網的形態安定性,或是調整所獲得之研磨墊纖維束之密度梯度。It is also possible to adhere the sea-island type composite fiber to the inside of the wound cotton web by applying the polymer elastic body to the inside of the wound cotton web by the ultrafine fiberizing treatment of the sea-island type composite fiber of the wound cotton web which has been subjected to shrinkage treatment. In this manner, by applying the polymeric elastomer to the wound web before the ultrafine fiberizing treatment, the form stability of the wound web can be improved, or the density gradient of the obtained polishing pad fiber bundle can be adjusted.

本步驟係藉由使高分子彈性體之水性液含浸於予以收縮處理後之纏繞棉網後,使高分子彈性體凝固而使高分子彈性體含浸賦予纏繞棉網之內部。In this step, the polymer elastomer is impregnated with the wound cotton web after the shrinkage treatment, and the polymer elastomer is solidified to impregnate the polymer elastomer to the inside of the wound cotton web.

所謂高分子彈性體之水性液係使形成高分子彈性體之成分分散於水系介質的水性分散液中,另外,使形成高分子彈性體之成分溶解於水性介質的水性溶液中。高分子彈性體之水性液的固形物濃度較佳為10質量%以上,進一步更佳為15質量%以上。In the aqueous liquid of the polymeric elastomer, the component forming the polymeric elastomer is dispersed in the aqueous dispersion of the aqueous medium, and the component forming the polymeric elastomer is dissolved in the aqueous solution of the aqueous medium. The solid content of the aqueous liquid of the polymeric elastomer is preferably 10% by mass or more, and more preferably 15% by mass or more.

即使高分子彈性體之水性分散液為高濃度,黏度也低,由於也具有優異的含浸滲透性,容易對纏繞棉網進行高填充,對纖維也具有優異的接著性。因而,藉由本步驟所含浸賦予的高分子彈性體能夠強力束縛海島型複合纖維,另外,也容易提高研磨墊之表觀密度。另外,由於凝固高分子彈性體之水性分散液所獲得之高分子彈性體係對水之潤濕性高,可以獲得能夠均勻且大量保持研磨粒的研磨墊。Even if the aqueous dispersion of the polymeric elastomer is high in concentration, the viscosity is low, and since it has excellent impregnation permeability, it is easy to highly fill the wound cotton web and has excellent adhesion to the fiber. Therefore, the sea-island type composite fiber can be strongly restrained by the polymer elastic body impregnated in this step, and the apparent density of the polishing pad can be easily increased. Further, since the polymer elastic system obtained by solidifying the aqueous dispersion of the polymeric elastomer has high wettability with water, a polishing pad capable of uniformly and in large amounts retaining abrasive grains can be obtained.

於水性分散液中,包含懸浮及乳化。分散於水性分散液的高分子彈性體的平均粒徑較佳約為0.01至0.2μm。In the aqueous dispersion, suspension and emulsification are included. The polymer elastomer dispersed in the aqueous dispersion preferably has an average particle diameter of about 0.01 to 0.2 μm.

調製水性分散液之方法並未予以特別限定。例如,聚胺甲酸酯系樹脂之情形,藉由將具有羧基、磺酸基、羥基、碳數為5以下一尤其碳數為3以下之聚伸烷基二醇基等之具有親水性基的單體單位作為樹脂構造單位而含有,能夠賦予對水性介質之分散性。從一邊將因吸水所造成的膨潤軟化抑制至最小限度且一邊提高吸水率或潤濕性之觀點,具有如此之親水性基之單體單位的共聚合比例較佳為0.1至10質量%,進一步較佳為0.5至5質量%。The method of preparing the aqueous dispersion is not particularly limited. For example, in the case of a polyurethane resin, a hydrophilic group having a carboxyl group, a sulfonic acid group, a hydroxyl group, a carbon number of 5 or less, and especially a polyalkylene group having a carbon number of 3 or less is used. The monomer unit is contained as a resin structural unit, and can impart dispersibility to an aqueous medium. The copolymerization ratio of the monomer unit having such a hydrophilic group is preferably from 0.1 to 10% by mass from the viewpoint of suppressing swelling and softening by water absorption to the minimum and improving water absorption or wettability. It is preferably from 0.5 to 5% by mass.

另外,藉由使用界面活性劑,也能夠使聚胺甲酸酯系樹脂之粒子乳化或懸浮於水系介質中。可用於乳化或懸浮之界面活性劑的具體例,例如,可列舉:月桂基硫酸鈉、月桂基硫酸銨、聚伸氧烷基十二烷基醚醋酸鈉、十二烷基苯磺酸鈉、烷基二苯基醚二磺酸鈉、二辛基磺基琥珀酸鈉等之陰離子性界面活性劑;聚伸氧乙基壬基苯基醚、聚伸氧乙基辛基苯基醚、聚伸氧乙基月桂基醚、聚伸氧乙基硬脂醯基醚、聚伸氧乙基-聚伸氧丙基嵌段共聚物等之非離子性界面活性劑等。另外,也可以使用具有反應性之所謂的反應性界面活性劑。另外,藉由適當選擇界面活性劑之濁點,也能夠將感熱凝膠化性賦予聚胺甲酸酯樹脂。Further, by using a surfactant, particles of the polyurethane resin can be emulsified or suspended in an aqueous medium. Specific examples of the surfactant which can be used for emulsifying or suspending, for example, sodium lauryl sulfate, ammonium lauryl sulfate, sodium polyoxyalkylene lauryl ether acetate, sodium dodecylbenzenesulfonate, An anionic surfactant such as sodium alkyl diphenyl ether disulfonate or sodium dioctyl sulfosuccinate; poly(extended ethoxyethyl phenyl ether), polyoxyethylene octyl phenyl ether, poly A nonionic surfactant such as oxygen-extended ethyl lauryl ether, polyoxyethylene ethyl stearyl ether, polyoxy-extension ethyl-polyoxypropylene block copolymer, or the like. Further, a reactive so-called reactive surfactant can also be used. Further, the thermal gelation property can be imparted to the polyurethane resin by appropriately selecting the cloud point of the surfactant.

使高分子彈性體之水性液含浸於纏繞棉網中之方法,例如,可列舉:使用刮刀塗布機、桿塗布機、或輥塗布機之方法,或是進行浸漬之方法等。然後,藉由進行含浸有高分子彈性體水性液的纏繞棉網之乾燥,能夠使高分子彈性體凝固。乾燥方法可列舉:於50至200℃之乾燥裝置中進行熱處理之方法;或是於紅外線加熱之後,於乾燥機中進行熱處理之方法等。還有,藉由使高分子彈性體之水性液含浸於纏繞棉網中之後進行乾燥之情形,水分將從纏繞棉網之表層蒸發而水性液將遷移至表層。較佳為藉由以促進該遷移之條件使其乾燥,使高分子彈性體於表層中不均而使纖維束之密度梯度形成。熱風乾燥機之熱處理溫度的具體例,例如,較佳為130至170℃,進一步較佳為140至170℃。利用如此之方法,藉由不僅依照纖維束之密度差,也依照高分子彈性體所造成的密度差而提高研磨面側之密度,並藉由使研磨面側進一步變得緻密而可以獲得耐磨損性更高的研磨墊。The method of impregnating the wound cotton web with the aqueous liquid of the polymeric elastomer may, for example, be a method using a knife coater, a bar coater, or a roll coater, or a method of immersing. Then, the polymer elastomer can be solidified by drying the wound cotton web impregnated with the aqueous polymer elastomer aqueous solution. The drying method may be a method of performing heat treatment in a drying apparatus at 50 to 200 ° C, or a method of performing heat treatment in a dryer after infrared heating. Further, by immersing the aqueous liquid of the polymeric elastomer in the wound cotton web and then drying it, the water will evaporate from the surface layer of the wound cotton web and the aqueous liquid will migrate to the surface layer. It is preferred to form a density gradient of the fiber bundle by drying the polymer elastomer under conditions which promote the migration, and the polymer elastomer is uneven in the surface layer. Specific examples of the heat treatment temperature of the hot air dryer are, for example, preferably 130 to 170 ° C, and more preferably 140 to 170 ° C. By such a method, the density of the side of the polishing surface can be increased not only in accordance with the density difference of the fiber bundle but also the density difference caused by the polymer elastomer, and wear resistance can be obtained by further densifying the side of the polishing surface. A more abrasive pad.

(5)極細纖維形成步驟(5) Very fine fiber forming step

針對藉由去除海島型複合纖維中之水溶性熱可塑性樹脂而形成極細纖維之步驟,詳細加以說明。The step of forming the ultrafine fibers by removing the water-soluble thermoplastic resin in the sea-island type composite fiber will be described in detail.

海島型複合纖維中之水溶性熱可塑性樹脂係使用水、鹼性水溶液、酸性水溶液等予以溶解去除或予以分解去除。The water-soluble thermoplastic resin in the island-in-the-sea composite fiber is dissolved or removed by using water, an alkaline aqueous solution, an acidic aqueous solution or the like.

於本步驟中,首先纏繞棉網或賦予高分子彈性體之纏繞棉網係被浸漬於水、鹼性水溶液、酸性水溶液等之熱水中而予以熱水處理。另外,為了提高溶解效率,必要時也可以進行利用輥之壓輥處理、高壓水流處理、超音波處理、噴淋處理、攪拌處理、搓揉處理等。還有,為了使固定面之纖維束成為低密度,也可以藉由高速水流或機械而進行搓揉處理來處理。In this step, the wound cotton web which is first wound around the cotton web or imparted to the polymeric elastomer is immersed in hot water such as water, an alkaline aqueous solution, or an acidic aqueous solution to be subjected to hot water treatment. Further, in order to improve the dissolution efficiency, a roll press treatment, a high-pressure water flow treatment, an ultrasonic treatment, a shower treatment, a stirring treatment, a hydrazine treatment, or the like may be performed as necessary. Further, in order to make the fiber bundle of the fixing surface low in density, it may be treated by a high-speed water flow or a mechanical treatment.

還有,不進行濕熱收縮處理步驟(3),於本步驟中,也可以同時進行纏繞棉網之收縮處理與海島型複合纖維之極細纖維化。如此之同時進行收縮處理、與極細纖維化之方法的具體例,例如,可列舉:第1階段係將纏繞棉網於65至90℃的熱水中浸漬5至300秒鐘之後,再者,第2階段係於85至100℃的熱水中處理100至600秒鐘之條件。Further, the wet heat shrinkage treatment step (3) is not carried out, and in this step, the shrinkage treatment of the wound cotton web and the extremely fine fiberization of the sea-island type composite fiber may be simultaneously performed. Specific examples of the method of performing the shrinkage treatment and the ultrafine fiber at the same time include, for example, immersing the wound cotton web in hot water at 65 to 90 ° C for 5 to 300 seconds in the first stage, and further, The second stage is carried out in hot water at 85 to 100 ° C for 100 to 600 seconds.

(6)高分子彈性體填充步驟II(6) Polymer elastomer filling step II

接著,集束極細纖維,另外,為了進一步束縛極細纖維束彼此,針對賦予高分子彈性體之步驟加以說明。於極細纖維形成步驟(5)中,藉由對海島型複合纖維實施極細纖維化處理,水溶性熱可塑性樹脂將被去除而在極細纖維束之內部形成有空隙。於本步驟中,藉由將高分子彈性體賦予如此之空隙中而集束極細纖維。另外,同時進一步藉由高分子彈性體而束縛極細纖維束彼此。還有,極細纖維已形成纖維束之情形下,藉由毛細現象,高分子彈性體之水性液容易被纖維束之內部所吸收。還有,本發明所用之高分子彈性體的水性液可以使用相同於高分子彈性體填充步驟I所說明的水性液。另外,使高分子彈性體填充及凝固之方法,方法上也可以使用相同於高分子彈性體填充步驟I所說明的方法。進行如此方式,研磨墊前驅物將被形成。Next, the ultrafine fibers are bundled, and in order to further bind the ultrafine fiber bundles, the step of imparting the polymeric elastomer will be described. In the ultrafine fiber forming step (5), the sea-island type composite fiber is subjected to an extremely fine fiberizing treatment, whereby the water-soluble thermoplastic resin is removed and a void is formed inside the ultrafine fiber bundle. In this step, the ultrafine fibers are bundled by imparting a polymeric elastomer to such a void. Further, at the same time, the ultrafine fiber bundles are further bound to each other by the polymeric elastomer. Further, in the case where the ultrafine fibers have formed a fiber bundle, the aqueous liquid of the polymeric elastomer is easily absorbed by the inside of the fiber bundle by the capillary phenomenon. Further, the aqueous liquid of the polymeric elastomer used in the present invention may be the same as the aqueous liquid described in the step I of the polymeric elastomer. Further, in the method of filling and solidifying the polymer elastomer, the method described in the same manner as in the step of filling the polymer elastomer may be used. In this manner, the polishing pad precursor will be formed.

(7)精加工步驟(7) Finishing steps

藉由對於所獲得之研磨墊前驅物實施平坦化處理,本實施形態之研磨墊將可以獲得。平坦化處理係藉由將研磨墊前驅物熱壓縮成形成既定之厚度,藉由利用砂紙、扎針布、鑽石等以研磨表面而平滑地精加工表面,用以調整厚度之處理。進行如此方式,所精加工的研磨墊之厚度較佳約為0.5至3 mm。The polishing pad of the present embodiment can be obtained by performing a planarization treatment on the obtained polishing pad precursor. The flattening treatment is a process for adjusting the thickness by thermally compressing the polishing pad precursor to a predetermined thickness and smoothing the surface by grinding the surface with sandpaper, wire cloth, diamond, or the like. In this manner, the thickness of the finished polishing pad is preferably about 0.5 to 3 mm.

另外,研磨墊之表面也可以予以起毛處理。藉由進行起毛處理,研磨墊之研磨面與被研磨基材之接觸面積將變大,另外,與研磨糊之潤濕性將提高。起毛處理係利用砂紙而拋光處理研磨墊表面之方法。砂紙較佳使用研磨粒棉紗支數#40號至#80號之砂紙。起毛處理之具體例,例如,可列舉:利用接觸型拋光機所進行的連續起毛處理、或金剛砂型拋光處理、或組合接觸型與金剛砂型之拋光處理等。另外,為了形成均一之起毛狀態,也可以壓縮研磨墊所起毛處理的表面。In addition, the surface of the polishing pad can also be raised. By performing the raising treatment, the contact area between the polishing surface of the polishing pad and the substrate to be polished becomes large, and the wettability with the polishing paste is improved. The raising process is a method of polishing the surface of the polishing pad using sandpaper. For the sandpaper, sandpaper of #40###80 is used. Specific examples of the raising treatment include, for example, a continuous raising treatment by a contact type polishing machine, or a diamond-type polishing treatment, or a combination contact type and a diamond-type polishing treatment. Further, in order to form a uniform raised state, it is also possible to compress the surface of the polishing pad which is raised.

另外,為了使平坦化性能更提高,也可以在研磨墊之表面實施用以形成同心圓狀、螺旋狀、格子狀等之溝或孔的表面加工。藉由實施如此之表面加工,能夠在研磨面更均一地使研磨糊佈滿。Further, in order to further improve the flattening performance, surface processing for forming grooves or holes of concentric, spiral, or lattice shape may be performed on the surface of the polishing pad. By performing such surface processing, the polishing paste can be more uniformly filled on the polishing surface.

接著,針對使用本實施形態之研磨墊的化學機械研磨方法,一邊參照第3圖且一邊詳細說明。第3圖係顯示使用本實施形態之研磨墊10的化學機械研磨方法之實施模樣的側面圖。Next, the chemical mechanical polishing method using the polishing pad of the present embodiment will be described in detail with reference to FIG. 3 . Fig. 3 is a side view showing an embodiment of a chemical mechanical polishing method using the polishing pad 10 of the present embodiment.

於使用本實施形態之研磨墊10的化學機械研磨方法中,例如可使用具備如第3圖所示之圓形旋轉固定盤11、糊供應噴嘴12、載體13、與墊調節器14的CMP裝置20。在旋轉固定盤11之表面,藉由雙面膠帶而利用其固定面4以貼附研磨墊10。另外,載體13係被研磨基材15所支撐。In the chemical mechanical polishing method using the polishing pad 10 of the present embodiment, for example, a CMP device having a circular rotary fixed disk 11 as shown in FIG. 3, a paste supply nozzle 12, a carrier 13, and a pad conditioner 14 can be used. 20. On the surface of the rotary fixed disk 11, the fixing surface 4 is attached by means of a double-sided tape to attach the polishing pad 10. Further, the carrier 13 is supported by the polishing substrate 15.

於CMP裝置20中,固定盤11係藉由省略圖面的馬達而於箭頭記號所示之方向上旋轉。另外,載體13係在固定盤11之面內,行星齒輪狀地藉由省略圖面的馬達而於例如箭頭記號所示之方向上旋轉。墊調節器14也在固定盤11之面內,行星齒輪狀地藉由省略圖面的馬達而於例如箭頭記號所示之方向上旋轉。In the CMP apparatus 20, the fixed disk 11 is rotated in the direction indicated by the arrow mark by omitting the motor of the drawing. Further, the carrier 13 is placed in the plane of the fixed disk 11, and is rotated in a direction indicated by, for example, an arrow mark by a motor in which the drawing is omitted. The pad conditioner 14 is also rotated in the direction indicated by the arrow mark by the motor omitting the motor in the plane of the fixed disk 11.

首先,一邊將蒸餾水流至被旋轉固定盤11所固定而旋轉的研磨墊10之表面上,一邊按壓旋轉於研磨墊10表面之墊調節器14而進行研磨墊10表面之調節。接著,從糊供應噴嘴12而將含有各種化學成分及硬質之微細研磨粒的研磨糊16供應至進行旋轉之研磨墊10之表面。然後,在研磨糊16各處所佈滿的研磨墊10上,按壓被載體13所固定而進行旋轉之被研磨基材15。然後,直到可以獲得既定之平坦度為止而持續研磨處理。藉由調整作用於研磨時之按壓力或是旋轉固定盤11與載體13之相對運動速度,精加工品質將受到影響。First, while the distilled water flows onto the surface of the polishing pad 10 that is fixed by the rotation of the rotating fixed disk 11, the pad conditioner 14 that is rotated on the surface of the polishing pad 10 is pressed to adjust the surface of the polishing pad 10. Next, the polishing paste 16 containing various chemical components and hard fine abrasive grains is supplied from the paste supply nozzle 12 to the surface of the polishing pad 10 to be rotated. Then, on the polishing pad 10 which is filled around the polishing paste 16, the substrate 15 to be polished which is fixed by the carrier 13 and rotated is pressed. Then, the grinding process is continued until a predetermined flatness can be obtained. The finishing quality is affected by adjusting the pressing force applied to the grinding or by rotating the relative movement speed of the fixed disk 11 and the carrier 13.

於本實施形態之化學機械研磨方法中,研磨墊10係在旋轉固定盤11之表面,被固定面4所固定。藉由利用固定面4以固定研磨墊10,由於纖維束之數量密度高且剛性高的研磨面3成為外表面,研磨速率及耐磨損性將變高,另外,研磨面內之研磨不均一性將變低。另外,由於被旋轉固定盤11所固定的固定面4側之表層係纖維束之數量密度低且剛性低,能夠維持對被研磨基材15之表面的適度隨動性或適合性。In the chemical mechanical polishing method of the present embodiment, the polishing pad 10 is attached to the surface of the rotating fixed disk 11 and fixed by the fixing surface 4. By fixing the polishing pad 10 by the fixing surface 4, since the number of the fiber bundles is high and the polishing surface 3 having high rigidity becomes the outer surface, the polishing rate and the abrasion resistance are increased, and the polishing in the polishing surface is uneven. Sex will become lower. Further, since the surface layer fiber bundle on the side of the fixing surface 4 fixed to the rotating fixed disk 11 has a low number density and low rigidity, it is possible to maintain appropriate followability or suitability for the surface of the substrate 15 to be polished.

研磨糊16之成分係根據被研磨基材15之種類而予以適當選擇。研磨粒之具體例,例如,可列舉:具有數十nm至數百nm粒徑之SiO2 、Al2 O3 、CeO2 、Mn2 O3 、鑽石粒子等。另外,化學成分之具體例,例如,可列舉:改質酸/鹼等被研磨面之成分或界面活性劑等。The components of the polishing paste 16 are appropriately selected depending on the type of the substrate 15 to be polished. Specific examples of the abrasive grains include, for example, SiO 2 , Al 2 O 3 , CeO 2 , Mn 2 O 3 , diamond particles having a particle diameter of several tens nm to several hundreds nm. Further, specific examples of the chemical component include, for example, a component of a surface to be polished such as a modified acid/base or a surfactant.

如此之本實施形態之化學機械研磨方法係可用於各種基材之研磨。基材之具體例,例如,可列舉:矽、氧化矽、氧氟化矽、有機聚合物等之絕緣材料;銅、鋁、鎢等之導電材料;鉭、鈦、氮化鉭、氮化鈦等之位障材料等。另外,其用途之具體例,例如,可列舉:矽晶圓、化合物半導體晶圓、半導體晶圓、半導體元件、液晶構件、光學元件、水晶、光學基板、電子電路基板、電子電路遮罩基板、多層配線基板、硬碟、MEMS(微機電系統)基材等之研磨。還有,研磨可以為一次研磨、二次研磨(調整研磨)、精加工研磨、鏡面研磨等中任一種。The chemical mechanical polishing method of this embodiment can be used for polishing various substrates. Specific examples of the substrate include, for example, an insulating material such as ruthenium, osmium oxide, yttrium oxyfluoride or an organic polymer; conductive materials such as copper, aluminum, and tungsten; tantalum, titanium, tantalum nitride, and titanium nitride; Waiting for barrier materials, etc. Moreover, specific examples of the use thereof include a germanium wafer, a compound semiconductor wafer, a semiconductor wafer, a semiconductor element, a liquid crystal member, an optical element, a crystal, an optical substrate, an electronic circuit board, and an electronic circuit mask substrate. Grinding of multilayer wiring boards, hard disks, MEMS (Micro Electro Mechanical Systems) substrates, and the like. Further, the polishing may be any one of primary polishing, secondary polishing (adjustment polishing), finishing polishing, mirror polishing, and the like.

實施例Example

以下,藉由實施例以具體說明實施例。還有,本發明之範圍係依照實施例之記載,並未予以任何限定。Hereinafter, embodiments will be specifically described by way of examples. Further, the scope of the present invention is not limited by the description of the embodiments.

首先,彙整本實施例所用之評估方法而加以說明。First, the evaluation method used in the present embodiment will be described.

[評估方法][evaluation method]

(1)極細纖維束之平均數量密度(D1 、D2 、D3 )、單纖維之平均截面積及纖維束之平均截面積的測定(1) Determination of the average number density (D 1 , D 2 , D 3 ) of the ultrafine fiber bundles, the average cross-sectional area of the single fibers, and the average cross-sectional area of the fiber bundles

藉由使用切刀之刃而平行於厚度方向進行切斷研磨墊,形成厚度方向之截面。然後,利用氧化鋨以染色所獲得之截面。再利用掃瞄型電子顯微鏡(SEM),以100至1000倍觀察截面,拍攝其影像。然後,從所獲得之影像而任意求得所選出的100個極細纖維束之截面積,將其平均值設為極細纖維束之平均截面積。另外,求得形成極細纖維束之100條極細纖維的截面積,將其平均值作為極細纖維的單纖維之平均截面積。The polishing pad is cut parallel to the thickness direction by using the blade of the cutter to form a cross section in the thickness direction. Then, the obtained cross section is dyed with yttrium oxide. The cross section was observed by a scanning electron microscope (SEM) at 100 to 1000 times, and an image was taken. Then, the cross-sectional area of the selected 100 ultrafine fiber bundles was arbitrarily determined from the obtained image, and the average value thereof was defined as the average cross-sectional area of the ultrafine fiber bundle. Further, the cross-sectional area of the 100 ultrafine fibers forming the ultrafine fiber bundle was determined, and the average value thereof was defined as the average cross-sectional area of the single fibers of the ultrafine fibers.

另外,從所獲得之影像,從研磨墊之表面起而朝厚度方向20%以內之厚度區域中,各處選擇5個位置之0.1 mm正方形區域,計算各位置中之極細纖維束的個數。從其結果,算出存在於每1 mm2 之極細纖維束的個數。將5個位置之平均設為D1Further, from the obtained image, a 0.1 mm square region of five positions was selected from the surface of the polishing pad in the thickness direction of 20% in the thickness direction, and the number of the ultrafine fiber bundles at each position was calculated. From the results, the number of fine fiber bundles present per 1 mm 2 was calculated. The average of the five positions is set to D 1 .

另外,從所獲得之影像,從研磨墊之背面起而朝厚度方向20%以內之厚度區域中,各處選擇5個位置之0.1 mm正方形區域,計算各位置中之極細纖維束的個數。從其結果,算出存在於每1 mm2 之極細纖維束的個數。將5個位置之平均設為D2Further, from the obtained image, a 0.1 mm square region of five positions was selected from the back surface of the polishing pad in the thickness direction of 20% in the thickness direction, and the number of the ultrafine fiber bundles at each position was calculated. From the results, the number of fine fiber bundles present per 1 mm 2 was calculated. The average of the five positions is set to D 2 .

另外,從所獲得之影像,從研磨墊之表面起而朝厚度方向50%附近之部分中,各處選擇5個位置之0.1 mm正方形區域,計算各位置中之極細纖維束的個數。從其結果,算出存在於每1 mm2 之極細纖維束的個數。將5個位置之平均設為D3Further, from the obtained image, a 0.1 mm square region of five positions was selected from the surface of the polishing pad in the vicinity of 50% in the thickness direction, and the number of the ultrafine fiber bundles at each position was calculated. From the results, the number of fine fiber bundles present per 1 mm 2 was calculated. The average of the five positions is set to D 3 .

(2)纏繞棉網之層間剝離強度(2) Interlaminar peel strength of wound cotton web

從所獲得之纏繞棉網,製作長23 cm、寬2.5 cm之長方形上之試驗片。然後,在試驗片之一端,利用刮鬍刀而將刻痕劃入厚度方向之約略中央。然後,用手拉伸距離邊緣約10 cm而剝離。然後,將所剝離的兩片邊緣固定於各自拉伸試驗機之夾頭。然後,利用拉伸試驗機拉伸,獲得應力-歪斜曲線(SS曲線),從其平坦部分之應力而求出剝離強力。還有,拉伸速度係以100 mm/分鐘進行。還有,所獲得之結果係3個試驗片之平均值。A test piece of a rectangular length of 23 cm and a width of 2.5 cm was prepared from the obtained wound cotton web. Then, at one end of the test piece, the scribe was drawn into the approximate center of the thickness direction by a razor. Then, it was peeled off by hand stretching about 10 cm from the edge. Then, the two peeled edges were fixed to the chucks of the respective tensile testers. Then, it was stretched by a tensile tester to obtain a stress-skew curve (SS curve), and the peeling strength was obtained from the stress of the flat portion. Also, the stretching speed was performed at 100 mm/min. Also, the results obtained are the average of 3 test pieces.

(3)研磨墊之D硬度的測定方法(3) Method for measuring D hardness of polishing pad

使用硬度計D型(高分子計器股份有限公司製),根據JIS K 6253而測定研磨墊的研磨面之D硬度。還有,載重係設定為5kg。The D hardness of the polishing surface of the polishing pad was measured in accordance with JIS K 6253 using a hardness meter D type (manufactured by Kobunshi Co., Ltd.). Also, the load system is set to 5 kg.

(4)磨耗重量減輕(4) Wear weight reduction

根據JIS K5600-5-9之方法而測定切斷成直徑13 cm圓形之研磨墊研磨面的Taber(塔柏)磨損。還有,以磨損輪:H-22、載重:500g、旋轉數:1000次之條件而測定。求出測定前重量與測定後重量之差的重量減輕(mg)。The Taber abrasion of the polishing pad cut into a circular diameter of 13 cm was measured according to the method of JIS K5600-5-9. Further, it was measured under the conditions of a wear wheel: H-22, a load: 500 g, and a number of revolutions: 1,000. The weight loss (mg) of the difference between the weight before measurement and the weight after measurement was determined.

(5)高分子彈性體之玻璃轉移溫度(Tg)的測定(5) Determination of glass transition temperature (Tg) of polymeric elastomers

作成由構成研磨墊之高分子彈性體而成之長4 cm×寬0.5 cm×厚400μm±100μm之薄膜。然後,利用測微計以測定薄膜之厚度後,使用動態黏彈性測定裝置(DVE Rheospectoler、Rheology股份有限公司製),以頻率11 Hz、升溫速度3℃/分鐘之條件而進行動態黏彈性之測定,將損失彈性模數之主要分散波峰溫度設為玻璃轉移溫度。A film having a length of 4 cm × a width of 0.5 cm × a thickness of 400 μm ± 100 μm made of a polymeric elastomer constituting a polishing pad was prepared. Then, the thickness of the film was measured by a micrometer, and dynamic viscoelasticity was measured at a frequency of 11 Hz and a temperature increase rate of 3 ° C/min using a dynamic viscoelasticity measuring apparatus (DVE Rheospectoler, manufactured by Rheology Co., Ltd.). The main dispersion peak temperature of the loss elastic modulus is set as the glass transition temperature.

(6)在23℃及50℃之高分子彈性體的儲存彈性模數測定方法(6) Method for measuring storage elastic modulus of polymeric elastomers at 23 ° C and 50 ° C

將構成研磨墊之高分子彈性體作成長4 cm×寬0.5 cm×厚400μm±100μm之薄膜。然後,利用測微計以測定薄膜之厚度後,使用動態黏彈性測定裝置(DVE Rheospectoler、Rheology股份有限公司製),以頻率11 Hz、升溫速度3℃/分鐘之條件而測定在23℃及50℃之儲存彈性模數,算出儲存彈性模數。The polymer elastomer constituting the polishing pad was made into a film having a length of 4 cm × a width of 0.5 cm × a thickness of 400 μm ± 100 μm. Then, the thickness of the film was measured by a micrometer, and then measured at 23 ° C and 50 using a dynamic viscoelasticity measuring apparatus (DVE Rheospectoler, manufactured by Rheology Co., Ltd.) at a frequency of 11 Hz and a temperature increase rate of 3 ° C/min. The storage elastic modulus of °C is calculated, and the storage elastic modulus is calculated.

(7)高分子彈性體之飽和吸水率測定方法(7) Method for measuring saturated water absorption of polymer elastomer

將構成研磨墊之高分子彈性體在50℃乾燥後所獲得之厚度200μm之薄膜,於130℃進行30分鐘之熱處理。然後,在20℃、65%RH之條件下放置3日。然後,測定此時之乾燥時的質量。在將乾燥的薄膜,於50℃之水中浸漬2日。然後,從50℃之水取出後,隨即拭去薄膜最外表面之多餘的水滴等,測定吸水後之質量。然後,藉由下式而算出飽和吸水率。A film having a thickness of 200 μm obtained by drying the polymer elastomer constituting the polishing pad at 50 ° C was heat-treated at 130 ° C for 30 minutes. Then, it was allowed to stand at 20 ° C and 65% RH for 3 days. Then, the mass at the time of drying at this time was measured. The dried film was immersed in water at 50 ° C for 2 days. Then, after taking out water of 50 ° C, excess water droplets and the like on the outermost surface of the film were wiped off, and the mass after water absorption was measured. Then, the saturated water absorption rate was calculated by the following formula.

飽和吸水率(%)=[(吸水後之質量-乾燥時之質量)/乾燥時之質量]×100Saturated water absorption (%) = [(mass after water absorption - mass at drying) / mass at dry time] × 100

(8)研磨墊之研磨性能(8) Grinding performance of the polishing pad

將雙面黏著膠帶貼附於研磨墊之固定面而固定於CMP研磨裝置(野村製作所股份有限公司製「PPO-60S」)之旋轉固定盤。然後,藉由使用棉紗支數#200之鑽石修整器(diamond dresser)(三菱Material(股)製之MEC200L),以壓力177kPa、修整器旋轉數110旋轉/分鐘之條件,一邊流入速度120mL/分鐘之蒸餾水,一邊研削研磨墊表面18分鐘而進行調節(風乾)。The double-sided adhesive tape was attached to the fixed surface of the polishing pad and fixed to a rotary fixed disk of a CMP polishing apparatus ("PPO-60S" manufactured by Nomura Manufacturing Co., Ltd.). Then, by using a diamond dresser of cotton yarn count #200 (MEC200L manufactured by Mitsubishi Material Co., Ltd.), the flow rate was 120 mL/min under the conditions of a pressure of 177 kPa and a dresser rotation number of 110 rotations/min. The distilled water was conditioned by grinding the surface of the polishing pad for 18 minutes (air drying).

接著,將研磨糊供應至固定於旋轉固定盤之研磨墊表面。研磨糊係使用以蒸餾水而將Cabot公司製研磨糊SS25稀釋成2倍之研磨糊。另外,研磨糊之供應量係設為120ml/分鐘。然後,以壓板旋轉數50旋轉/分鐘、頭旋轉數49旋轉/分鐘、研磨壓力35kPa之條件,進行具有氧化膜表面之直徑8吋矽晶圓之100秒鐘研磨。Next, the polishing paste is supplied to the surface of the polishing pad fixed to the rotary fixed disk. In the polishing paste, a polishing paste obtained by diluting a polishing paste SS25 made by Cabot Corporation into two times with distilled water was used. Further, the supply amount of the polishing paste was set to 120 ml/min. Then, 100 seconds of polishing of the 8-inch diameter wafer having the surface of the oxide film was carried out under the conditions of a platen rotation number of 50 rotations/min, a head rotation number of 49 rotations/min, and a polishing pressure of 35 kPa.

然後,在矽晶圓面內,測定49點之研磨前及研磨後的氧化膜膜厚,求出研磨速率(nm/分鐘)。另外,將49點之研磨速率的平均值設為平均研磨速率(R),進一步求出研磨速率之標準偏差(σ)。然後,藉由式(1):Then, the film thickness of the oxide film before and after the polishing at 49 points was measured in the wafer surface, and the polishing rate (nm/min) was determined. Further, the average value of the polishing rate of 49 points was defined as the average polishing rate (R), and the standard deviation (σ) of the polishing rate was further determined. Then, by equation (1):

不均一性(%)=(σ/R)×100...(1)Heterogeneity (%) = (σ/R) × 100...(1)

而算出不均一性。不均一性之值越小,顯示研磨面內越被均一地研磨。而且,能夠實現高精確度之研磨加工。And calculate the heterogeneity. The smaller the value of the heterogeneity, the more uniformly the inside of the polished surface is displayed. Moreover, it is possible to achieve high-precision grinding processing.

另外,藉由式(2):In addition, by equation (2):

研磨速率安定性(%)=(研磨速率最大值-研磨速率最小值)×100...(2)Grinding rate stability (%) = (maximum grinding rate - minimum grinding rate) × 100... (2)

而算出研磨速率安定性。The polishing rate stability was calculated.

再者,藉由使用晶圓表面檢查裝置Surfscan SP1(KLA-Tencor公司製)而測定存在於研磨後之具有氧化膜之矽晶圓表面的0.16μm以上大小之刮傷來評估刮傷性。Further, the scratch resistance was evaluated by using a wafer surface inspection apparatus Surfscan SP1 (manufactured by KLA-Tencor Co., Ltd.) to measure a scratch of 0.16 μm or more which was present on the surface of the tantalum wafer having the oxide film after polishing.

[實施例1][Example 1]

使用作為島成分之PVA樹脂、作為海成分之改性度6莫耳%之間苯二甲酸改性PET。還有,間苯二甲酸改性PET係使在50℃飽和吸水時之吸水率為1質量%,其玻璃轉移溫度為77℃。藉由從25島/纖維之熔融複合紡紗用噴嘴(噴嘴溫度260℃),以25:75(質量比)之比例而使PVA樹脂與間苯二甲酸改性PET噴出,形成海島型複合纖維之紗束。然後,藉由設置於噴嘴正下方之空氣噴射抽氣裝置而拉伸從噴嘴所噴出之紗束,一邊進行拉伸而細化且一邊進行冷卻而紡紗出平均纖度2.0dtex之海島型複合長纖維。還有,空氣噴射抽氣裝置之抽氣力係從每單位時間之噴出量、與所獲得之長纖維纖度之比例而使間接所求出的紡紗速度成為4000m/min的方式來予以調整。然後,藉由在設置於空氣噴射抽氣裝置正下方的移動式網上進行海島型複合纖維之連續收集,獲得基重量40 g/m2 之紡紗黏合片(長纖維棉網)。A PVA resin as an island component and a modification degree of 6 mol% as a sea component were used as a phthalic acid-modified PET. Further, the isophthalic acid-modified PET had a water absorption ratio of 1% by mass when saturated at 50 ° C and a glass transition temperature of 77 ° C. The PVA resin and the isophthalic acid-modified PET are sprayed at a ratio of 25:75 (mass ratio) from a 25-island/fiber fusion composite spinning nozzle (nozzle temperature: 260 ° C) to form an island-in-sea type composite fiber. Yarn bundle. Then, the yarn bundle ejected from the nozzle is stretched by an air jet pumping device disposed directly under the nozzle, and is stretched and refined, and cooled to be spun, and the island-type composite length of the average fineness of 2.0 dtex is spun. fiber. In addition, the pumping force of the air jet pumping device was adjusted so that the indirect obtained spinning speed became 4000 m/min from the ratio of the discharge amount per unit time and the obtained long fiber fineness. Then, by continuously collecting the sea-island type composite fibers on a mobile net disposed directly below the air jet suction device, a spunbonded web (long fiber web) having a basis weight of 40 g/m 2 was obtained.

接著,藉由交叉拋光而重疊12片之所獲得之紡紗黏合片,製作總基重為480 g/m2 之棉網積層體。然後,所獲得之棉網積層體噴灑防止針折斷油劑。接著,棉網積層體係依序使用針棉紗支數42號、鉤數3個之針、及針棉紗支數42號、鉤數6個之針,利用從其第一表面側起而以針深度5至25 mm之深度且扎數1500扎/cm2 之條件而予以針扎處理,進一步利用從其第二表面側起而以針深度0至15 mm之深度且扎數500扎/cm2 之條件而予以針扎處理。因針扎所造成的棉網積層體之面積收縮率為30%。藉由如此之針扎處理而可以獲得基重600 g/m2 、層間剝離強度11.0 kg/2.5 cm之纏繞棉網。Next, the spun yarn sheets obtained by superposing 12 sheets by cross-polishing were used to prepare a web laminate having a total basis weight of 480 g/m 2 . Then, the obtained cotton mesh laminate is sprayed to prevent the needle from breaking the oil. Next, the cotton mesh layering system sequentially uses needle cotton yarn count No. 42, needle number three needles, and needle cotton yarn count No. 42 and hook number six needles, using needle depth from the first surface side thereof The needle is treated under the condition of a depth of 5 to 25 mm and a number of sheets of 1500 扎/cm 2 , and further, with a depth of 0 to 15 mm from the side of the second surface thereof and a number of sheets of 500 扎/cm 2 The condition is handled by needle sticking. The area shrinkage of the cotton web laminate due to needle sticking is 30%. By such a needle-punching treatment, a wound web having a basis weight of 600 g/m 2 and an interlayer peeling strength of 11.0 kg/2.5 cm can be obtained.

接著,藉由將所獲得之纏繞棉網於70℃之熱水中浸漬90秒鐘而使島成分應力緩和,使得面積收縮43%,進一步10分鐘浸漬於95℃之熱水中而使PVA樹脂溶解去除。還有,於乾燥狀態中,因熱水處理所造成的纏繞棉網之面積收縮率為45%。藉由熱水處理而可以獲得由極細纖維之纖維束所構成的不織布。不織布之基重為780 g/m2 、表觀密度為0.55 g/m3Then, by immersing the obtained wound cotton web in hot water at 70 ° C for 90 seconds, the island component stress is alleviated, so that the area shrinks by 43%, and further immersed in hot water of 95 ° C for 10 minutes to make PVA resin. Dissolved and removed. Further, in the dry state, the area shrinkage of the wound web due to hot water treatment was 45%. A non-woven fabric composed of fiber bundles of ultrafine fibers can be obtained by hot water treatment. The nonwoven fabric has a basis weight of 780 g/m 2 and an apparent density of 0.55 g/m 3 .

然後,使得已調整至固形物濃度25質量%之聚胺甲酸酯彈性體A之水性乳液含浸於所獲得之不織布中。還有,水性乳液中之聚胺甲酸酯彈性體A之平均粒徑為0.05μm。Then, an aqueous emulsion of the polyurethane elastomer A adjusted to a solid concentration of 25% by mass was impregnated into the obtained nonwoven fabric. Further, the average particle diameter of the polyurethane elastomer A in the aqueous emulsion was 0.05 μm.

還有,聚胺甲酸酯彈性體A係如下之高分子。相對於高分子二醇50質量%而言,聚胺甲酸酯彈性體A係使共聚合1.5質量%之4,4’-二環己基甲烷二異氰酸酯與短鏈胺與短鏈二醇與2,2’-雙(羥甲基)丙酸的合計量50質量%反應的聚碳酸酯系無黃變型聚胺甲酸酯100質量份,再利用碳二醯亞胺系5質量份使其交聯的交聯聚胺甲酸酯樹脂。還有,高分子二醇係以99.9:0.1(莫耳比)來混合非晶性聚碳酸酯系聚醇之六亞甲基碳酸酯與五亞甲基碳酸酯之共聚合聚醇、與碳數2至3之聚烷二醇的混合物。Further, the polyurethane elastomer A is a polymer as follows. Polyurethane elastomer A is copolymerized with 1.5% by mass of 4,4'-dicyclohexylmethane diisocyanate and short-chain amine and short-chain diol with respect to 50% by mass of the polymer diol. 100 parts by mass of a polycarbonate-based non-yellowing type polyurethane having a total amount of 2'-bis(hydroxymethyl)propionic acid in a total amount of 50% by mass, and 5 parts by mass of a carbodiimide group A crosslinked polyurethane resin. Further, the polymer diol is a mixture of a non-polymerized polyalcohol of octa methylene carbonate and penta methylene carbonate of an amorphous polycarbonate-based polyalcohol and a carbon at 99.9:0.1 (mole ratio). A mixture of 2 to 3 polyalkylene glycols.

聚胺甲酸酯彈性體A係吸水率2質量%、在23℃之儲存彈性模數450 MPa、在50℃之儲存彈性模數300 MPa、及玻璃轉移溫度-25℃。另外,以聚胺甲酸酯彈性體A之固形物換算,相對於不織布之質量而言,水性乳液係含浸15質量%。接著,藉由於90℃、50%RH氣體環境中,進行含浸有水性乳液的不織布之凝固處理,進一步於150℃進行乾燥處理,在進一步於150℃進行熱壓縮而可以獲得研磨墊前驅物A0。研磨墊前驅物A0係基重量910 g/m2 、表觀密度0.62 g/m3 、厚度1.45 mm。另外,不織布與聚胺甲酸酯彈性體A之質量比率為87/13。The polyurethane elastomer A has a water absorption ratio of 2% by mass, a storage elastic modulus of 450 MPa at 23 ° C, a storage elastic modulus of 300 MPa at 50 ° C, and a glass transition temperature of -25 ° C. In addition, the aqueous emulsion was impregnated with 15% by mass based on the mass of the nonwoven fabric in terms of the solid content of the polyurethane elastomer A. Next, the coagulation treatment of the nonwoven fabric impregnated with the aqueous emulsion was carried out in a 90° C. or 50% RH gas atmosphere, and further dried at 150° C., and further thermally compressed at 150° C. to obtain a polishing pad precursor A0. The polishing pad precursor A0 had a basis weight of 910 g/m 2 , an apparent density of 0.62 g/m 3 , and a thickness of 1.45 mm. Further, the mass ratio of the nonwoven fabric to the polyurethane elastomer A was 87/13.

然後,藉由拋光研削加工研磨墊前驅物A0,可以獲得所平坦化的研磨墊A1。利用電子顯微鏡以觀察研磨墊A1之截面,極細纖維束之平均存在密度D1 約為2500個/mm2 ,極細纖維束之平均存在密度D2 約為1200個/mm2 ,D1 /D2 約為2.1。另外,於其截面中,觀察到由平均截面積約為11μm2 之極細纖維所構成的平均截面積約為320μm2 之極細纖維束。而且,極細纖維係藉由滲入極細纖維束內部之聚胺甲酸酯彈性體所集束,另外,極細纖維束彼此也藉由聚胺甲酸酯彈性體所黏著。研磨墊A1係基重量750 g/m2 、表觀密度0.61 g/m3 、厚度1.23 mm、D密度37。Then, the polishing pad precursor A1 can be obtained by polishing the polishing pad precursor A0. An electron microscope was used to observe the cross section of the polishing pad A1. The average density D 1 of the ultrafine fiber bundle was about 2,500 / mm 2 , and the average density D 2 of the ultrafine fiber bundle was about 1,200 / mm 2 , D 1 /D 2 It is about 2.1. Further, in the cross section thereof, an ultrafine fiber bundle having an average cross-sectional area of about 320 μm 2 composed of ultrafine fibers having an average cross-sectional area of about 11 μm 2 was observed. Further, the ultrafine fibers are bundled by the polyurethane elastomer which penetrates into the inside of the ultrafine fiber bundle, and the ultrafine fiber bundles are also adhered to each other by the polyurethane elastomer. The polishing pad A1 had a basis weight of 750 g/m 2 , an apparent density of 0.61 g/m 3 , a thickness of 1.23 mm, and a D density of 37.

所獲得之研磨墊A1係被切斷成直徑51 cm之圓形,進一步實施在主要面形成寬2.0 mm、深1.0 mm、間隔15.0 mm之格子狀溝的加工。藉由上述之評估方法而評估如此之研磨墊A1的研磨性能。將結果顯示於表1。The obtained polishing pad A1 was cut into a circular shape having a diameter of 51 cm, and further processing for forming a lattice-like groove having a width of 2.0 mm, a depth of 1.0 mm, and a spacing of 15.0 mm was formed on the main surface. The polishing performance of such a polishing pad A1 was evaluated by the above evaluation method. The results are shown in Table 1.

[實施例2][Embodiment 2]

以環境氣溫60℃、相對溼度80%、500秒鐘之條件,進行實施例1所獲得之纏繞棉網之蒸氣加熱。然後,對於所蒸氣加熱處理的纏繞棉網,利用120℃之熱輥僅壓縮處理其表面。於乾燥狀態下,藉由此蒸氣加熱處理及壓縮處理所造成的纏繞棉網之面積收縮率係40%。然後,使固形物濃度15質量%之聚胺甲酸酯彈性體A的水性乳液含浸於該處理後之纏繞棉網中。接著,藉由於90℃、50%RH氣體環境中,進行含浸有水性乳液的不織布之凝固處理,進一步於150℃進行乾燥處理,形成纏繞棉網與聚胺甲酸酯彈性體A之複合體(纏繞棉網複合體)。還有,以聚胺甲酸酯彈性體A之固形物換算,相對於纏繞棉網複合體之全部質量,水性乳液含浸有7質量%。然後,藉由將所獲得之纏繞棉網複合體於95℃之熱水中浸漬10分鐘而使PVA樹脂溶解去除,進一步藉由進行乾燥而形成由極細纖維之纖維束所構成的不織布與聚胺甲酸酯彈性體A之複合體(不織布複合體)。The steam heating of the wound cotton web obtained in Example 1 was carried out under the conditions of an ambient temperature of 60 ° C, a relative humidity of 80%, and 500 seconds. Then, for the steam-treated wound web, the surface of the wound web was only subjected to compression treatment using a heat roller of 120 °C. In the dry state, the area shrinkage of the wound web by the steam heat treatment and the compression treatment is 40%. Then, an aqueous emulsion of a polyurethane elastomer A having a solid concentration of 15% by mass was impregnated into the wound cotton web after the treatment. Next, the coagulation treatment of the non-woven fabric impregnated with the aqueous emulsion was carried out in a 90 ° C, 50% RH gas atmosphere, and further dried at 150 ° C to form a composite of the wound cotton web and the polyurethane elastomer A ( Wrap the cotton mesh composite). Further, in terms of the solid content of the polyurethane elastomer A, the aqueous emulsion was impregnated with 7 mass% based on the total mass of the wound cotton web composite. Then, the PVA resin is dissolved and removed by immersing the obtained wound cotton web composite in hot water at 95 ° C for 10 minutes, and further, by drying, a nonwoven fabric and a polyamine composed of fiber bundles of ultrafine fibers are formed. A complex of formate elastomer A (nonwoven composite).

然後,進一步使已調整至固形物濃度25質量%之聚胺甲酸酯彈性體A的水性乳液含浸於不織布複合體中。以聚胺甲酸酯彈性體A之固形物換算,相對於不織布之全部質量而言,水性乳液係含浸15質量%。接著,藉由於90℃、50%RH氣體環境中,進行含浸有水性乳液的不織布之凝固處理,進一步於150℃進行乾燥處理,再進一步於150℃進行熱壓縮而可以獲得研磨墊前驅物B0。研磨墊前驅物B0係基重量730 g/m2 、表觀密度0.58 g/m3 、厚度1.26 mm。另外,不織布與聚胺甲酸酯彈性體A之質量比率為80/20。Then, the aqueous emulsion of the polyurethane elastomer A adjusted to a solid concentration of 25% by mass was further impregnated into the nonwoven fabric composite. In terms of the solid content of the polyurethane elastomer A, the aqueous emulsion was impregnated with 15% by mass based on the total mass of the nonwoven fabric. Next, the coagulation treatment of the nonwoven fabric impregnated with the aqueous emulsion was carried out in a 90° C. or 50% RH gas atmosphere, and further dried at 150° C., and further heat-compressed at 150° C. to obtain a polishing pad precursor B0. The polishing pad precursor B0 had a basis weight of 730 g/m 2 , an apparent density of 0.58 g/m 3 , and a thickness of 1.26 mm. Further, the mass ratio of the nonwoven fabric to the polyurethane elastomer A was 80/20.

然後,藉由拋光研削加工研磨墊前驅物B0,可以獲得所平坦化的研磨墊B1。利用電子顯微鏡以觀察研磨墊B1之截面,極細纖維束之平均存在密度D1 約為2450個/mm2 ,極細纖維束之平均存在密度D2 約為1260個/mm2 ,D1 /D2 約為1.9。另外,於其截面中,觀察到由平均截面積約為12μm2 之極細纖維所構成的平均截面積約為525μm2 之極細纖維束。而且,極細纖維係藉由滲入極細纖維束內部之聚胺甲酸酯彈性體所集束,另外,研磨墊B1係基重量614 g/m2 、表觀密度0.58 g/m3 、厚度1.06 mm、D硬度36。而且,所獲得之研磨墊B1係相同於實施例1被加工、評估。將結果顯示於表1。Then, by polishing the polishing pad precursor B0 by polishing, the flattened polishing pad B1 can be obtained. An electron microscope was used to observe the cross section of the polishing pad B1. The average density D 1 of the ultrafine fiber bundle was about 2450 / mm 2 , and the average density D 2 of the ultrafine fiber bundle was about 1260 / mm 2 , D 1 /D 2 It is about 1.9. In addition, its cross section was observed by the average cross-sectional area of the average cross-sectional area of about 12μm 2 ultrafine fiber composed of microfine fiber bundles of about 525μm 2. Further, the ultrafine fibers are bundled by the polyurethane elastomer penetrating into the inside of the ultrafine fiber bundle, and the polishing pad B1 has a basis weight of 614 g/m 2 , an apparent density of 0.58 g/m 3 , and a thickness of 1.06 mm. D hardness 36. Further, the obtained polishing pad B1 was processed and evaluated in the same manner as in Example 1. The results are shown in Table 1.

[實施例3][Example 3]

以環境氣溫80℃、相對濕度80%、500秒鐘之條件,進行實施例1所獲得之纏繞棉網之蒸氣加熱。然後,對於所蒸氣加熱處理的纏繞棉網,利用120℃之熱輥僅壓縮處理其表面。於乾燥狀態下,藉由此蒸氣加熱處理及壓縮處理所造成的纏繞棉網之面積收縮率係50%。然後,使固形物濃度15質量%之聚胺甲酸酯彈性體A的水性乳液含浸於該處理後之纏繞棉網中。接著,藉由於90℃、50%RH氣體環境中,進行含浸有水性乳液的不織布之凝固處理,進一步於150℃進行乾燥處理,形成纏繞棉網與聚胺甲酸酯彈性體A之複合體。還有,以聚胺甲酸酯彈性體A之固形物換算,相對於纏繞棉網複合體之全部質量,水性乳液含浸有7質量%。然後,藉由將纏繞棉網複合體於95℃之熱水中浸漬10分鐘而使PVA樹脂溶解去除,進一步藉由進行乾燥而形成由極細纖維之纖維束所構成的不織布與聚胺甲酸酯彈性體A之複合體。The steam heating of the wound cotton web obtained in Example 1 was carried out under the conditions of an ambient temperature of 80 ° C, a relative humidity of 80%, and 500 seconds. Then, for the steam-treated wound web, the surface of the wound web was only subjected to compression treatment using a heat roller of 120 °C. In the dry state, the area shrinkage of the wound web by the steam heat treatment and the compression treatment is 50%. Then, an aqueous emulsion of a polyurethane elastomer A having a solid concentration of 15% by mass was impregnated into the wound cotton web after the treatment. Next, the coagulation treatment of the nonwoven fabric impregnated with the aqueous emulsion was carried out in a 90 ° C, 50% RH gas atmosphere, and further dried at 150 ° C to form a composite of the wound cotton web and the polyurethane elastomer A. Further, in terms of the solid content of the polyurethane elastomer A, the aqueous emulsion was impregnated with 7 mass% based on the total mass of the wound cotton web composite. Then, the PVA resin is dissolved and removed by immersing the wound cotton web composite in hot water at 95 ° C for 10 minutes, and further, by drying, a nonwoven fabric and a polyurethane composed of fiber bundles of ultrafine fibers are formed. A composite of elastomer A.

然後,進一步使已調整至固形物濃度25質量%之聚胺甲酸酯彈性體A的水性乳液含浸於不織布複合體中。以聚胺甲酸酯彈性體A之固形物換算,相對於不織布之全部質量而言,水性乳液係含浸15質量%。接著,藉由於90℃、50%RH氣體環境中,進行含浸有水性乳液的不織布之凝固處理,進一步於150℃進行乾燥處理,再進一步於150℃進行熱壓縮而可以獲得研磨墊前驅物C0。研磨墊前驅物C0係基重量790 g/m2 、表觀密度0.63 g/m3 、厚度1.25 mm。另外,不織布與聚胺甲酸酯彈性體A之質量比率為80/20。Then, the aqueous emulsion of the polyurethane elastomer A adjusted to a solid concentration of 25% by mass was further impregnated into the nonwoven fabric composite. In terms of the solid content of the polyurethane elastomer A, the aqueous emulsion was impregnated with 15% by mass based on the total mass of the nonwoven fabric. Next, the solidification treatment of the nonwoven fabric impregnated with the aqueous emulsion was carried out in a 90 ° C, 50% RH gas atmosphere, and further dried at 150 ° C, and further heat-compressed at 150 ° C to obtain a polishing pad precursor C0. The polishing pad precursor C0 has a basis weight of 790 g/m 2 , an apparent density of 0.63 g/m 3 , and a thickness of 1.25 mm. Further, the mass ratio of the nonwoven fabric to the polyurethane elastomer A was 80/20.

然後,藉由拋光研削加工研磨墊前驅物C0,可以獲得所平坦化的研磨墊C1。利用電子顯微鏡以觀察研磨墊C1之截面,極細纖維束之平均存在密度D1 約為2840個/mm2 ,極細纖維束之平均存在密度D2 約為1890個/mm2 ,D1 /D2 約為1.5。另外,於其截面中,觀察到由平均截面積約為13μm2 之極細纖維所構成的平均截面積約為325μm2 之極細纖維束。而且,極細纖維係藉由滲入極細纖維束內部之聚胺甲酸酯彈性體所集束,另外,研磨墊C1係基重量650 g/m2 、表觀密度0.63 g/m3 、厚度1.03 mm、D硬度37。而且,所獲得之研磨墊C1係相同於實施例1被加工、評估。將結果顯示於表1。Then, the polishing pad precursor C1 can be obtained by polishing the polishing pad precursor C0. An electron microscope was used to observe the cross section of the polishing pad C1. The average density D 1 of the ultrafine fiber bundle was about 2840/mm 2 , and the average density D 2 of the ultrafine fiber bundle was about 1890/mm 2 , D 1 /D 2 It is about 1.5. In addition, its cross section was observed by the average cross-sectional area of about 13μm average cross sectional area of the ultrafine fiber 2 constituted of the ultrafine fiber bundle was about 325μm 2. Further, the ultrafine fibers are bundled by a polyurethane elastomer penetrating into the inside of the ultrafine fiber bundle, and the polishing pad C1 has a basis weight of 650 g/m 2 , an apparent density of 0.63 g/m 3 , and a thickness of 1.03 mm. D hardness 37. Further, the obtained polishing pad C1 was processed and evaluated in the same manner as in Example 1. The results are shown in Table 1.

[實施例4][Example 4]

藉由交叉拋光而重疊12片之與實施例1所獲得之同樣的紡紗黏合片,製作總基重為480 g/m2 之棉網積層體。然後,將防止針折斷油劑噴灑於所獲得之棉網積層體。接著,棉網積層體係依序使用針棉紗支數42號、鉤數1個之針、及針棉紗支數42號、鉤數6個之針,以從其第一表面側而以針深度5至25 mm之深度且扎數1200扎/cm2 之條件而予以針扎處理,進一步從第二表面側而以針深度0至10 mm之深度且扎數300扎/cm2 之條件而予以針扎處理。因針扎所造成的棉網積層體之面積收縮率為20%。藉由如此之針扎處理而可以獲得基重560 g/m2 、層間剝離強度9.0 kg/2.5 cm之纏繞棉網。A 12-piece spunbonded sheet obtained in the same manner as in Example 1 was superposed by cross-polishing to prepare a web laminate having a total basis weight of 480 g/m 2 . Then, the needle breaking oil is prevented from being sprayed on the obtained web laminate. Next, the cotton mesh layering system sequentially uses needle cotton yarn count No. 42, needle number one needle, and needle cotton yarn count No. 42 and hook number six needles to have a needle depth of 5 from the first surface side thereof. The needle is treated to a depth of 25 mm and a condition of 1200 扎/cm 2 , and the needle is further needled from the second surface side at a depth of the needle depth of 0 to 10 mm and a number of sheets of 300 扎/cm 2 . Tie processing. The area shrinkage of the cotton web laminate due to needle sticking is 20%. By such a needle-punching treatment, a wound web having a basis weight of 560 g/m 2 and an interlayer peel strength of 9.0 kg/2.5 cm can be obtained.

以環境氣溫60℃、相對濕度70%、500秒鐘之條件,進行所獲得之纏繞棉網之蒸氣加熱。然後,對於所蒸氣加熱處理的纏繞棉網,利用110℃之熱輥僅壓縮處理其表面。於乾燥狀態下,藉由此蒸氣加熱處理及壓縮處理所造成的纏繞棉網之面積收縮率係35%。然後,使固形物濃度15質量%之聚胺甲酸酯彈性體A的水性乳液含浸於該處理後之纏繞棉網中。接著,藉由於90℃、50%RH氣體環境中,進行含浸有水性乳液的不織布之凝固處理,進一步於150℃進行乾燥處理,形成纏繞棉網與聚胺甲酸酯彈性體A之複合體。還有,以聚胺甲酸酯彈性體A之固形物換算,相對於纏繞棉網複合體之全部質量,水性乳液含浸有7質量%。然後,藉由將纏繞棉網複合體於95℃之熱水中浸漬10分鐘而使PVA樹脂溶解去除,進一步藉由進行乾燥而形成由極細纖維之纖維束所構成的不織布與聚胺甲酸酯彈性體A之不織布複合體。The steam heating of the obtained wound cotton web was carried out under the conditions of an ambient temperature of 60 ° C, a relative humidity of 70%, and 500 seconds. Then, for the steam-treated wound web, the surface of the wound web was only subjected to compression treatment using a heat roller of 110 °C. In the dry state, the area shrinkage of the wound web by the steam heat treatment and the compression treatment was 35%. Then, an aqueous emulsion of a polyurethane elastomer A having a solid concentration of 15% by mass was impregnated into the wound cotton web after the treatment. Next, the coagulation treatment of the nonwoven fabric impregnated with the aqueous emulsion was carried out in a 90 ° C, 50% RH gas atmosphere, and further dried at 150 ° C to form a composite of the wound cotton web and the polyurethane elastomer A. Further, in terms of the solid content of the polyurethane elastomer A, the aqueous emulsion was impregnated with 7 mass% based on the total mass of the wound cotton web composite. Then, the PVA resin is dissolved and removed by immersing the wound cotton web composite in hot water at 95 ° C for 10 minutes, and further, by drying, a nonwoven fabric and a polyurethane composed of fiber bundles of ultrafine fibers are formed. Non-woven composite of Elastomer A.

然後,進一步使已調整至固形物濃度25質量%之聚胺甲酸酯彈性體A的水性乳液含浸於不織布複合體中。以聚胺甲酸酯彈性體A之固形物換算,相對於不織布之全部質量而言,水性乳液係含浸15質量%。接著,藉由於90℃、50%RH氣體環境中,進行含浸有水性乳液的不織布之凝固處理,進一步於150℃進行乾燥處理,再進一步於150℃進行熱壓縮而可以獲得研磨墊前驅物E0。研磨墊前驅物E0係基重量665 g/m2 、表觀密度0.53g/m3 、厚度1.25 mm。另外,不織布與聚胺甲酸酯彈性體A之質量比率為80/20。Then, the aqueous emulsion of the polyurethane elastomer A adjusted to a solid concentration of 25% by mass was further impregnated into the nonwoven fabric composite. In terms of the solid content of the polyurethane elastomer A, the aqueous emulsion was impregnated with 15% by mass based on the total mass of the nonwoven fabric. Next, the solidification treatment of the nonwoven fabric impregnated with the aqueous emulsion was carried out in a 90 ° C, 50% RH gas atmosphere, and further dried at 150 ° C, and further heat-compressed at 150 ° C to obtain a polishing pad precursor E0. The polishing pad precursor E0 had a basis weight of 665 g/m 2 , an apparent density of 0.53 g/m 3 , and a thickness of 1.25 mm. Further, the mass ratio of the nonwoven fabric to the polyurethane elastomer A was 80/20.

然後,藉由拋光研削加工研磨墊前驅物E0,可以獲得所平坦化的研磨墊E1。利用電子顯微鏡以觀察研磨墊E1之截面,極細纖維束之平均存在密度D1 約為2300個/mm2 ,極細纖維束之平均存在密度D2 約為540個/mm2 ,D1 /D2 約為4.3。另外,於其截面中,觀察到由平均截面積約為11μm2 之極細纖維所構成的平均截面積約為325μm2 之極細纖維束。而且,極細纖維係藉由滲入極細纖維束內部之聚胺甲酸酯彈性體所集束,另外,研磨墊E1係基重量559 g/m2 、表觀密度0.53 g/m3 、厚度1.05 mm、D硬度34。而且,所獲得之研磨墊E1係相同於實施例1被加工、評估。將結果顯示於表1。Then, by polishing the polishing pad precursor E0, the flattened polishing pad E1 can be obtained. Using an electron microscope to observe the cross section of the polishing pad E1, the average density D 1 of the ultrafine fiber bundles was about 2,300 / mm 2 , and the average density D 2 of the ultrafine fiber bundles was about 540 / mm 2 , D 1 /D 2 It is about 4.3. In addition, its cross section was observed by the average cross-sectional area of about 11μm average cross sectional area of the ultrafine fiber 2 constituted of the ultrafine fiber bundle was about 325μm 2. Further, the ultrafine fibers are bundled by the polyurethane elastomer penetrating into the inside of the ultrafine fiber bundle, and the polishing pad E1 has a basis weight of 559 g/m 2 , an apparent density of 0.53 g/m 3 , and a thickness of 1.05 mm. D hardness 34. Further, the obtained polishing pad E1 was processed and evaluated in the same manner as in Example 1. The results are shown in Table 1.

[比較例1][Comparative Example 1]

藉由交叉拋光而重疊12片之與實施例1所獲得之同樣的紡紗黏合片,製作總基重為480 g/m2 之棉網積層體。然後,將防止針折斷油劑噴灑於所獲得之棉網積層體。接著,棉網積層體係使用針棉紗支數42號、鉤數6個之針,以分別從其第一表面側及其第二表面側而以針深度10至15 mm之深度且扎數900扎/cm2 之條件而合計1800扎/cm2 進行針扎處理。因針扎所造成的棉網積層體之面積收縮率為30%。藉由如此之針扎處理而可以獲得基重600 g/m2 、層間剝離強度11.0 kg/2.5 cm之纏繞棉網。以下,以相同於實施例1之條件,藉由進行纏繞棉網之熱水處理而使PVA樹脂溶解去除,進一步含浸賦予聚胺甲酸酯彈性體A,進一步藉由於150℃進行熱壓縮而可以獲得研磨墊前驅物F0。研磨墊前驅物F0係基重量740 g/m2 、表觀密度0.63 g/m3 、厚度1.17 mm。另外,不織布與聚胺甲酸酯彈性體A之質量比率為87/13。A 12-piece spunbonded sheet obtained in the same manner as in Example 1 was superposed by cross-polishing to prepare a web laminate having a total basis weight of 480 g/m 2 . Then, the needle breaking oil is prevented from being sprayed on the obtained web laminate. Next, the cotton mesh layering system uses a needle cotton yarn count No. 42 and a hook number of six needles to have a depth of 10 to 15 mm from the first surface side and the second surface side thereof, respectively, and a number of bars of 900 / cm and a total of 1800 condition 2 bar / cm 2 for treatment needle. The area shrinkage of the cotton web laminate due to needle sticking is 30%. By such a needle-punching treatment, a wound web having a basis weight of 600 g/m 2 and an interlayer peeling strength of 11.0 kg/2.5 cm can be obtained. Hereinafter, the PVA resin was dissolved and removed by hot water treatment of the wound cotton web under the same conditions as in Example 1, and the polyurethane elastomer A was further impregnated, and further heat-compressed at 150 ° C. A polishing pad precursor F0 was obtained. The polishing pad precursor F0 has a basis weight of 740 g/m 2 , an apparent density of 0.63 g/m 3 , and a thickness of 1.17 mm. Further, the mass ratio of the nonwoven fabric to the polyurethane elastomer A was 87/13.

然後,藉由拋光研削加工研磨墊前驅物F0,可以獲得所平坦化的研磨墊F1。利用電子顯微鏡以觀察研磨墊F1之截面,極細纖維束之平均存在密度D1 約為2550個/mm2 ,極細纖維束之平均存在密度D2 約為2340個/mm2 ,D1 /D2 約為1.1。另外,於其截面中,觀察到由平均截面積約為14μm2 之極細纖維所構成的平均截面積約為350μm2 之極細纖維束。而且,極細纖維係藉由滲入極細纖維束內部之聚胺甲酸酯彈性體所集束,另外,研磨墊F1係基重量613 g/m2 、表觀密度0.63 g/m3 、厚度0.98 mm、D硬度38。而且,所獲得之研磨墊F1係相同於實施例1被加工、評估。將結果顯示於表1。Then, by polishing the polishing pad precursor F0, the flattened polishing pad F1 can be obtained. An electron microscope was used to observe the cross section of the polishing pad F1. The average density D 1 of the ultrafine fiber bundle was about 2550/mm 2 , and the average density D 2 of the ultrafine fiber bundle was about 2340 / mm 2 , D 1 /D 2 It is about 1.1. Further, in the cross section thereof, an ultrafine fiber bundle having an average cross-sectional area of about 350 μm 2 composed of ultrafine fibers having an average cross-sectional area of about 14 μm 2 was observed. Further, the ultrafine fibers are bundled by the polyurethane elastomer penetrating into the inside of the ultrafine fiber bundle, and the polishing pad F1 has a basis weight of 613 g/m 2 , an apparent density of 0.63 g/m 3 , and a thickness of 0.98 mm. D hardness 38. Further, the obtained polishing pad F1 was processed and evaluated in the same manner as in Example 1. The results are shown in Table 1.

[比較例2][Comparative Example 2]

藉由交叉拋光而重疊12片之與實施例1所獲得之同樣的紡紗黏合片,製作總基重為480 g/m2 之棉網積層體。然後,將防止針折斷油劑噴灑於所獲得之棉網積層體。接著,棉網積層體係依序使用針棉紗支數42號、鉤數1個之針、及針棉紗支數42號、鉤數6個之針,以從其第一表面側而以針深度5至25 mm之深度且扎數1200扎/cm2 之條件而予以針扎處理,進一步從第二表面側而以針深度0至5 mm之深度且扎數300扎/cm2 之條件而予以針扎處理。因針扎所造成的棉網積層體之面積收縮率為20%。藉由如此之針扎處理而可以獲得基重560 g/m2 、層間剝離強度9.4 kg/2.5 cm之纏繞棉網。A 12-piece spunbonded sheet obtained in the same manner as in Example 1 was superposed by cross-polishing to prepare a web laminate having a total basis weight of 480 g/m 2 . Then, the needle breaking oil is prevented from being sprayed on the obtained web laminate. Next, the cotton mesh layering system sequentially uses needle cotton yarn count No. 42, needle number one needle, and needle cotton yarn count No. 42 and hook number six needles to have a needle depth of 5 from the first surface side thereof. The needle is treated to a depth of 25 mm and a number of 1200 za/cm 2 , and the needle is further needled from the second surface side at a depth of the needle depth of 0 to 5 mm and a number of sheets of 300 扎/cm 2 . Tie processing. The area shrinkage of the cotton web laminate due to needle sticking is 20%. By such a needle sticking process, a wound web having a basis weight of 560 g/m 2 and an interlayer peel strength of 9.4 kg/2.5 cm can be obtained.

以環境氣溫60℃、相對濕度70%、500秒鐘之條件,進行所獲得之纏繞棉網之蒸氣加熱。然後,對於所蒸氣加熱處理的纏繞棉網,利用110℃之熱輥僅壓縮處理其表面。於乾燥狀態下,藉由此蒸氣加熱處理及壓縮處理所造成的纏繞棉網之面積收縮率係35%。然後,使固形物濃度15質量%之聚胺甲酸酯彈性體A的水性乳液含浸於該處理後之纏繞棉網中。接著,藉由於90℃、50%RH氣體環境中,進行含浸有水性乳液的不織布之凝固處理,進一步於150℃進行乾燥處理,形成纏繞棉網與聚胺甲酸酯彈性體A之複合體。還有,以聚胺甲酸酯彈性體A之固形物換算,相對於纏繞棉網複合體之全部質量,水性乳液含浸有7質量%。然後,藉由將纏繞棉網複合體於95℃之熱水中浸漬10分鐘而使PVA樹脂溶解去除,進一步藉由進行乾燥而形成由極細纖維之纖維束所構成的不織布與聚胺甲酸酯彈性體A之不織布複合體。The steam heating of the obtained wound cotton web was carried out under the conditions of an ambient temperature of 60 ° C, a relative humidity of 70%, and 500 seconds. Then, for the steam-treated wound web, the surface of the wound web was only subjected to compression treatment using a heat roller of 110 °C. In the dry state, the area shrinkage of the wound web by the steam heat treatment and the compression treatment was 35%. Then, an aqueous emulsion of a polyurethane elastomer A having a solid concentration of 15% by mass was impregnated into the wound cotton web after the treatment. Next, the coagulation treatment of the nonwoven fabric impregnated with the aqueous emulsion was carried out in a 90 ° C, 50% RH gas atmosphere, and further dried at 150 ° C to form a composite of the wound cotton web and the polyurethane elastomer A. Further, in terms of the solid content of the polyurethane elastomer A, the aqueous emulsion was impregnated with 7 mass% based on the total mass of the wound cotton web composite. Then, the PVA resin is dissolved and removed by immersing the wound cotton web composite in hot water at 95 ° C for 10 minutes, and further, by drying, a nonwoven fabric and a polyurethane composed of fiber bundles of ultrafine fibers are formed. Non-woven composite of Elastomer A.

然後,進一步使已調整至固形物濃度25質量%之聚胺甲酸酯彈性體A的水性乳液含浸於不織布複合體中。以聚胺甲酸酯彈性體A之固形物換算,相對於不織布之全部質量而言,水性乳液係含浸15質量%。接著,藉由於90℃、50%RH氣體環境中,進行含浸有水性乳液的不織布之凝固處理,進一步於150℃進行乾燥處理,再進一步於150℃進行熱壓縮而可以獲得研磨墊前驅物G0。研磨墊前驅物G0係基重量665 g/m2 、表觀密度0.53 g/m3 、厚度1.25 mm。另外,不織布與聚胺甲酸酯彈性體A之質量比率為80/20。Then, the aqueous emulsion of the polyurethane elastomer A adjusted to a solid concentration of 25% by mass was further impregnated into the nonwoven fabric composite. In terms of the solid content of the polyurethane elastomer A, the aqueous emulsion was impregnated with 15% by mass based on the total mass of the nonwoven fabric. Next, the solidification treatment of the nonwoven fabric impregnated with the aqueous emulsion was carried out in a 90 ° C, 50% RH gas atmosphere, and further dried at 150 ° C, and further heat-compressed at 150 ° C to obtain a polishing pad precursor G0. The polishing pad precursor G0 had a basis weight of 665 g/m 2 , an apparent density of 0.53 g/m 3 , and a thickness of 1.25 mm. Further, the mass ratio of the nonwoven fabric to the polyurethane elastomer A was 80/20.

然後,藉由拋光研削加工研磨墊前驅物G0,可以獲得所平坦化的研磨墊G1。利用電子顯微鏡以觀察研磨墊G1之截面,極細纖維束之平均存在密度D1 約為2400個/mm2 ,極細纖維束之平均存在密度D2 約為400個/mm2 ,D1 /D2 約為6.0。另外,於其截面中,觀察到由平均截面積約為11μm2 之極細纖維所構成的平均截面積約為325μm2 之極細纖維束。而且,極細纖維係藉由滲入極細纖維束內部之聚胺甲酸酯彈性體所集束,另外,研磨墊G1係基重量559 g/m2 、表觀密度0.53 g/m3 、厚度1.05 mm、D硬度34。而且,所獲得之研磨墊E1係相同於實施例1被加工、評估。將結果顯示於表1。Then, by polishing the polishing pad precursor G0 by polishing, the flattened polishing pad G1 can be obtained. Using an electron microscope to observe the cross section of the polishing pad G1, the average density D 1 of the ultrafine fiber bundle is about 2400 / mm 2 , and the average density D 2 of the ultrafine fiber bundle is about 400 / mm 2 , D 1 / D 2 It is about 6.0. In addition, its cross section was observed by the average cross-sectional area of about 11μm average cross sectional area of the ultrafine fiber 2 constituted of the ultrafine fiber bundle was about 325μm 2. Further, the ultrafine fibers are bundled by the polyurethane elastomer penetrating into the inside of the ultrafine fiber bundle, and the polishing pad G1 has a basis weight of 559 g/m 2 , an apparent density of 0.53 g/m 3 , and a thickness of 1.05 mm. D hardness 34. Further, the obtained polishing pad E1 was processed and evaluated in the same manner as in Example 1. The results are shown in Table 1.

[比較例3][Comparative Example 3]

進行相同於實施例1之方式,藉由以3000m/min捲取從噴嘴所噴出的海島型複合纖維紗束而獲得長纖維。然後,藉由捲取及切斷所獲得之長纖維,獲得切斷長度30 mm之短纖維。然後,以相同於實施例1之條件而針扎所獲得之短纖維。藉由如此之針扎處理,可以獲得基重600 g/m2 、層間剝離強度7.5 kg/2.5 cm之短纖維纏繞不織布。還有,由依照針扎所獲得之片材之面積收縮率為25%。使用所獲得之短纖維纏繞不織布以取代纏繞棉網,藉由以相同於實施例1之條件,使PVA樹脂溶解去除,獲得表觀密度0.35 g/m3 之不織布。還有,於溶解去除PVA樹脂之際,藉由大幅拉伸短纖維纏繞不織布而頻繁引起極細纖維之脫落。然後,藉由將聚胺甲酸酯彈性體A含浸賦予於所獲得之不織布中,進一步於150℃進行熱壓縮而可以獲得研磨墊前驅物H0。研磨墊前驅物H0係基重量480 g/m2 、表觀密度0.43 g/m3 、厚度1.15 mm。另外,不織布與聚胺甲酸酯彈性體A之質量比率為87/13。In the same manner as in Example 1, long fibers were obtained by winding up the sea-island type composite fiber yarn bundle discharged from the nozzle at 3000 m/min. Then, by winding and cutting the obtained long fibers, short fibers having a cut length of 30 mm were obtained. Then, the obtained short fibers were needled under the same conditions as in Example 1. By such a needle-punching treatment, a short-fiber wound non-woven fabric having a basis weight of 600 g/m 2 and an interlayer peeling strength of 7.5 kg/2.5 cm can be obtained. Also, the area shrinkage rate of the sheet obtained by the needle stick was 25%. Using the obtained short fiber wound non-woven fabric instead of the wound cotton web, a PVA resin was dissolved and removed under the same conditions as in Example 1, to obtain a nonwoven fabric having an apparent density of 0.35 g/m 3 . Further, when the PVA resin is dissolved and removed, the ultrafine fibers are frequently peeled off by greatly stretching the short fibers and winding the nonwoven fabric. Then, the polishing pad precursor H0 was obtained by further impregnating the obtained nonwoven fabric with the obtained polyurethane nonwoven fabric A and further heat-compressing at 150 °C. The polishing pad precursor H0 has a basis weight of 480 g/m 2 , an apparent density of 0.43 g/m 3 , and a thickness of 1.15 mm. Further, the mass ratio of the nonwoven fabric to the polyurethane elastomer A was 87/13.

然後,藉由拋光研削加工研磨墊前驅物H0,可以獲得所平坦化的研磨墊H1。利用電子顯微鏡以觀察研磨墊H1之截面,極細纖維束之平均存在密度D1 約為350個/mm2 ,極細纖維束之平均存在密度D2 約為350個/mm2 ,D1 /D2 約為1.0。另外,於其截面中,觀察到由平均截面積約為16μm2 之極細纖維所構成的平均截面積約為350μm2 之極細纖維束。而且,極細纖維係藉由滲入極細纖維束內部之聚胺甲酸酯彈性體所集束,另外,研磨墊H1係基重量397 g/m2 、表觀密度0.42 g/m3 、厚度0.95 mm、D硬度27。而且,所獲得之研磨墊H1係相同於實施例1被加工、評估。將結果顯示於表1。還有,藉由大幅拉伸短纖維纏繞不織布,由於頻繁引起極細纖維之脫落的狀態之故,研磨評估係被省略。Then, the polishing pad precursor H1 can be obtained by polishing the polishing pad precursor H0. An electron microscope was used to observe the cross section of the polishing pad H1. The average density D 1 of the ultrafine fiber bundle was about 350/mm 2 , and the average density D 2 of the ultrafine fiber bundle was about 350 / mm 2 , D 1 /D 2 It is about 1.0. Further, in the cross section thereof, an ultrafine fiber bundle having an average cross-sectional area of about 350 μm 2 composed of ultrafine fibers having an average cross-sectional area of about 16 μm 2 was observed. Further, the ultrafine fibers are bundled by the polyurethane elastomer penetrating into the inside of the ultrafine fiber bundle, and the polishing pad H1 has a basis weight of 397 g/m 2 , an apparent density of 0.42 g/m 3 , and a thickness of 0.95 mm. D hardness 27. Further, the obtained polishing pad H1 was processed and evaluated in the same manner as in Example 1. The results are shown in Table 1. Further, by sufficiently stretching the short fibers and winding the nonwoven fabric, the polishing evaluation is omitted because the state in which the ultrafine fibers are frequently peeled off is caused.

[比較例4][Comparative Example 4]

進行相同於實施例1之方式,藉由以3000m/min捲取從噴嘴所噴出的海島型複合纖維紗束而獲得長纖維。然後,藉由捲取及切斷所獲得之長纖維,獲得切斷長度30 mm之短纖維。然後,以相同於實施例1之條件而針扎所獲得之短纖維。藉由如此之針扎處理,可以獲得基重600 g/m2 、層間剝離強度7 kg/2.5 cm之短纖維纏繞不織布。還有,由依照針扎所獲得之層之面積收縮率為25%。In the same manner as in Example 1, long fibers were obtained by winding up the sea-island type composite fiber yarn bundle discharged from the nozzle at 3000 m/min. Then, by winding and cutting the obtained long fibers, short fibers having a cut length of 30 mm were obtained. Then, the obtained short fibers were needled under the same conditions as in Example 1. By such a needle-punching treatment, a short-fiber wound non-woven fabric having a basis weight of 600 g/m 2 and an interlayer peeling strength of 7 kg/2.5 cm can be obtained. Also, the area shrinkage ratio of the layer obtained by the needle stick was 25%.

以相同於實施例2之條件,進行所獲得之短纖維纏繞不織布之蒸氣加熱處理及噴灑處理。然後,以相同於實施例2之條件,藉由將聚胺甲酸酯彈性體A含浸賦予於該處理後之短纖維纏繞不織布中,使PVA樹脂溶解去除,進一步藉由進行聚胺甲酸酯彈性體A之含浸賦予、乾燥及於150℃之熱壓縮,可以獲得研磨墊前驅物I0。研磨墊前驅物I0係基重量730 g/m2 、表觀密度0.58 g/m3 、厚度1.25 mm。另外,不織布與聚胺甲酸酯彈性體A之質量比率為80/20。The steam heat treatment and the spray treatment of the obtained short fiber wound nonwoven fabric were carried out under the same conditions as in Example 2. Then, the PVA resin was dissolved and removed by subjecting the polyurethane elastomer A to the treated short fiber-wound nonwoven fabric under the same conditions as in Example 2, further by performing the polyurethane. The impregnation imparting, drying and thermal compression at 150 ° C of the elastomer A can obtain the polishing pad precursor I0. The polishing pad precursor I0 had a basis weight of 730 g/m 2 , an apparent density of 0.58 g/m 3 , and a thickness of 1.25 mm. Further, the mass ratio of the nonwoven fabric to the polyurethane elastomer A was 80/20.

然後,藉由拋光研削加工研磨墊前驅物I0,可以獲得所平坦化的研磨墊I1。利用電子顯微鏡以觀察研磨墊I1之截面,極細纖維束之平均存在密度D1 約為1010個/mm2 ,極細纖維束之平均存在密度D2 約為930個/mm2 ,D1 /D2 約為1.1。另外,於其截面中,觀察到由平均截面積約為16μm2 之極細纖維所構成的平均截面積約為350μm2 之極細纖維束。而且,極細纖維係藉由滲入極細纖維束內部之聚胺甲酸酯彈性體所集束,另外,研磨墊I1係基重量613 g/m2 、表觀密度0.58 g/m3 、厚度1.06 mm、D硬度35。而且,所獲得之研磨墊I1係相同於實施例1而實施加工、評估。將結果顯示於表1。Then, the polishing pad precursor I1 can be obtained by polishing the polishing pad precursor I0. An electron microscope was used to observe the cross section of the polishing pad I1. The average density D 1 of the ultrafine fiber bundle was about 1010 / mm 2 , and the average density D 2 of the ultrafine fiber bundle was about 930 / mm 2 , D 1 / D 2 It is about 1.1. Further, in the cross section thereof, an ultrafine fiber bundle having an average cross-sectional area of about 350 μm 2 composed of ultrafine fibers having an average cross-sectional area of about 16 μm 2 was observed. Further, the ultrafine fibers are bundled by the polyurethane elastomer penetrating into the inside of the ultrafine fiber bundle, and the polishing pad I1 has a basis weight of 613 g/m 2 , an apparent density of 0.58 g/m 3 , and a thickness of 1.06 mm. D hardness 35. Further, the obtained polishing pad I1 was processed and evaluated in the same manner as in Example 1. The results are shown in Table 1.

[比較例5][Comparative Example 5]

藉由從熔融複合紡紗用噴嘴(噴嘴溫度260℃)而使間苯二甲酸改性PET噴出,形成間苯二甲酸改性PET之紗束。然後,藉由設置於噴嘴正下方之空氣噴射抽氣裝置而拉伸從噴嘴所噴出之紗束,一邊拉伸而細化且一邊冷卻而紡紗平均纖度0.2dtex之間苯二甲酸改性PET長纖維。然後,藉由在設置於空氣噴射抽氣裝置之正下方的移動式網上進行連續收集PET長纖維,獲得基重30 g/m2 之PET的紡紗黏合片(長纖維棉網)。The pitch of the isophthalic acid-modified PET was formed by ejecting the isophthalic acid-modified PET from a nozzle for melt-composite spinning (nozzle temperature: 260 ° C). Then, the yarn bundle ejected from the nozzle is stretched by an air jet suction device disposed directly below the nozzle, and is stretched and refined, and cooled while spinning, and the average fineness of the yarn is 0.2 dtex. Long fiber. Then, by continuously collecting PET long fibers on a mobile net disposed directly below the air jet suction device, a spunbonded sheet (long fiber web) of PET having a basis weight of 30 g/m 2 was obtained.

接著,藉由交叉拋光而重疊12片之所獲得之紡紗黏合片,製作總基重為360 g/m2 之棉網積層體。然後,進行相同於實施例1,藉由針扎處理所獲得之棉網積層體,獲得不織布。然後,藉由將所獲得之不織布90秒鐘浸漬於70℃之熱水中而使其應力緩和,使得面積收縮7%。如此所熱水處理的不織布之表觀密度為0.25 g/cm3Next, the spun yarn sheets obtained by superposing 12 sheets by cross-polishing were used to prepare a web laminate having a total basis weight of 360 g/m 2 . Then, the same manner as in Example 1 was carried out, and the nonwoven fabric obtained by the needle sticking treatment was obtained to obtain a non-woven fabric. Then, the obtained non-woven fabric was immersed in hot water of 70 ° C for 90 seconds to relax the stress, so that the area was shrunk by 7%. The non-woven fabric thus treated with hot water had an apparent density of 0.25 g/cm 3 .

然後,以相同於實施例1之條件,藉由將聚胺甲酸酯彈性體A含浸賦予所熱水處理的不織布中,進一步於150℃進行熱壓縮而可以獲得研磨墊前驅物J0。研磨墊前驅物J0係基重量390 g/m2 、表觀密度0.25 g/cm3 、厚度1.55 mm。另外,不織布與聚胺甲酸酯彈性體A之質量比率為88/12。Then, the polishing pad precursor J0 was obtained by subjecting the polyurethane elastomer A to the non-woven fabric subjected to hot water treatment under the same conditions as in Example 1 and further heat-compressing at 150 °C. The polishing pad precursor J0 has a basis weight of 390 g/m 2 , an apparent density of 0.25 g/cm 3 , and a thickness of 1.55 mm. Further, the mass ratio of the nonwoven fabric to the polyurethane elastomer A was 88/12.

然後,藉由拋光研削加工研磨墊前驅物J0,可以獲得所平坦化的研磨墊J1。利用電子顯微鏡以觀察研磨墊J1之截面,觀察到未形成纖維束之平均截面積約為20μm2 之極細纖維。另外,極細纖維橫截面之平均存在密度D1 約為300個/mm2 ,極細纖維橫截面之平均存在密度D2 約為300個/mm2 ,D1 /D2 約為1.0。另外,研磨墊J1係基重量315 g/m2 、表觀密度0.25 g/cm3 、厚度1.25 mm、D硬度28。而且,所獲得之研磨墊J1係相同於實施例1而予以加工。還有,磨損重量減輕測定之結果,由於重量大幅減輕,研磨評估係被省略。Then, by polishing the polishing pad precursor J0, the flattened polishing pad J1 can be obtained. An electron microscope was used to observe the cross section of the polishing pad J1, and an ultrafine fiber having an average cross-sectional area of about 20 μm 2 in which the fiber bundle was not formed was observed. Further, the average density D 1 of the cross section of the ultrafine fibers is about 300 / mm 2 , and the average density D 2 of the cross section of the ultrafine fibers is about 300 / mm 2 and D 1 / D 2 is about 1.0. Further, the polishing pad J1 had a basis weight of 315 g/m 2 , an apparent density of 0.25 g/cm 3 , a thickness of 1.25 mm, and a D hardness of 28. Further, the obtained polishing pad J1 was processed in the same manner as in Example 1. Further, as a result of the wear weight reduction measurement, the grinding evaluation was omitted because the weight was greatly reduced.

由表1之結果,關於本發明之實施例1至4中任一種研磨墊皆具有優異的研磨速率、研磨均一性、耐磨損性、平坦化性能、耐刮傷性。另一方面,D1 /D2 為1.1之比較例1的研磨墊之情形,由於剛性高,研磨速率係優異,但是由於隨動性低,研磨均一性差,另外,耐磨損性低。另一方面,D1 /D2 為6之比較例2的研磨墊之情形,由於剛性低,研磨速率低,另外,隨動性過高而平坦化性能變差。另外,使用海島型複合纖維之短纖維所獲得之比較例3及比較例4的研磨墊之情形,無法形成纖維之高密度化。因此,僅獲得剛性低的研磨墊,耐磨損性低。另外,使用以紡紗黏合法所直接形成的極細纖維之不織布所獲得之比較例5的研磨糊之情形也無法形成纖維之高密度化。因此,僅獲得剛性低的研磨墊,耐磨損性低。From the results of Table 1, all of the polishing pads of Examples 1 to 4 of the present invention have excellent polishing rate, polishing uniformity, abrasion resistance, flattening property, and scratch resistance. On the other hand, in the case of the polishing pad of Comparative Example 1 in which D 1 /D 2 is 1.1, since the polishing rate is high, the polishing rate is excellent, but the followability is low, the polishing uniformity is poor, and the abrasion resistance is low. On the other hand, in the case of the polishing pad of Comparative Example 2 in which D 1 /D 2 was 6, the polishing rate was low, the polishing rate was low, and the flatness was deteriorated because the followability was too high. Further, in the case of the polishing pads of Comparative Example 3 and Comparative Example 4 obtained by using the short fibers of the sea-island type composite fiber, the density of the fibers could not be formed. Therefore, only the polishing pad having low rigidity is obtained, and the abrasion resistance is low. Further, in the case of the polishing paste of Comparative Example 5 obtained by using the nonwoven fabric of the ultrafine fibers directly formed by the spunbonding method, the density of the fibers could not be formed. Therefore, only the polishing pad having low rigidity is obtained, and the abrasion resistance is low.

產業上利用之可能性Industrial use possibility

關於本發明之研磨墊能夠作為用以研磨進行平坦化或鏡面化之各種元件、各種基板等之各種製品使用,例如,半導體基板、半導體元件、化合物半導體元件、化合物半導體基板、化合物半導體製品、LED基板、LED製品、矽晶圓、硬碟基板、玻璃基板、玻璃製品、金屬基板、金屬製品、塑膠基板、塑膠製品、陶瓷基板、陶瓷製品等。The polishing pad of the present invention can be used as various products for polishing various elements such as planarization or mirroring, various substrates, and the like, for example, a semiconductor substrate, a semiconductor element, a compound semiconductor element, a compound semiconductor substrate, a compound semiconductor product, and an LED. Substrate, LED product, germanium wafer, hard disk substrate, glass substrate, glass product, metal substrate, metal product, plastic substrate, plastic product, ceramic substrate, ceramic product, and the like.

1...不織布1. . . Non-woven

1a...極細纖維1a. . . Very fine fiber

1b...極細纖維之纖維束1b. . . Fiber bundle of very fine fibers

2...高分子彈性體2. . . Polymer elastomer

3...研磨面(第一表面)3. . . Grinding surface (first surface)

4...固定面(第二表面)4. . . Fixed surface (second surface)

10...研磨墊10. . . Abrasive pad

R1 ...從研磨面3之表面起而朝厚度方向20%以內之厚度區域R 1 . . . a thickness region from the surface of the polishing surface 3 to within 20% of the thickness direction

R2 ...從固定面4之表面起而朝厚度方向20%以內之厚度區域R 2 . . . a thickness region from the surface of the fixing surface 4 to within 20% of the thickness direction

R3 ...從研磨面3之表面起而朝厚度方向40至60%之厚度區域R 3 . . . a thickness region from the surface of the abrasive surface 3 to 40 to 60% in the thickness direction

11...旋轉固定盤11. . . Rotating fixed disk

12...糊供應噴嘴12. . . Paste supply nozzle

13...載體13. . . Carrier

14...墊調節器14. . . Pad conditioner

15...被研磨基材15. . . Ground substrate

16...研磨糊16. . . Grind paste

20...CMP裝置20. . . CMP device

第1圖係本實施形態的研磨墊10之示意縱截面圖。Fig. 1 is a schematic longitudinal cross-sectional view of a polishing pad 10 of the present embodiment.

第2圖係本實施形態的研磨墊10之部分放大示意圖。Fig. 2 is a partially enlarged schematic view showing the polishing pad 10 of the present embodiment.

第3圖係本實施形態的用於化學機械研磨之CMP裝置20之概略圖。Fig. 3 is a schematic view of a CMP apparatus 20 for chemical mechanical polishing according to the present embodiment.

1...不織布1. . . Non-woven

1a...極細纖維1a. . . Very fine fiber

1b...極細纖維之纖維束1b. . . Fiber bundle of very fine fibers

2...高分子彈性體2. . . Polymer elastomer

3...研磨面(第一表面)3. . . Grinding surface (first surface)

4...固定面(第二表面)4. . . Fixed surface (second surface)

R1 ...從研磨面3之表面起而朝厚度方向20%以內之厚度區域R 1 . . . a thickness region from the surface of the polishing surface 3 to within 20% of the thickness direction

R2 ...從固定面4之表面起而朝厚度方向20%以內之厚度區域R 2 . . . a thickness region from the surface of the fixing surface 4 to within 20% of the thickness direction

R3 ...從研磨面3之表面起而朝厚度方向40至60%之厚度區域R 3 . . . a thickness region from the surface of the abrasive surface 3 to 40 to 60% in the thickness direction

10...研磨墊10. . . Abrasive pad

Claims (13)

一種研磨墊,其係包含由平均橫截面積為0.1至30μm2 之極細纖維的纖維束所形成的不織布、與在該不織布內部所賦予的高分子彈性體;在將第一表面設為研磨面且將第二表面設為固定面的情況下,於厚度方向之縱截面,從該第一表面起而朝厚度方向20%以內之厚度區域中之該纖維束橫截面的平均數量密度D1 為1000至5000個/mm2 ;D1 與從對向於該第一表面之該第二表面起而朝厚度方向20%以內之厚度區域中之該纖維束橫截面的平均數量密度D2 之比(D1 /D2 )為1.3至5。A polishing pad comprising a nonwoven fabric formed of a fiber bundle of an ultrafine fiber having an average cross-sectional area of 0.1 to 30 μm 2 and a polymeric elastomer imparted inside the nonwoven fabric; wherein the first surface is a polished surface Further, in the case where the second surface is a fixed surface, the average number density D 1 of the cross section of the fiber bundle in the thickness region from the first surface to the thickness direction of 20% in the longitudinal direction in the thickness direction is 1000 to 5000 / mm 2 ; ratio of D 1 to the average number density D 2 of the cross section of the fiber bundle in a thickness region from the second surface opposite to the first surface to 20% in the thickness direction (D 1 /D 2 ) is from 1.3 to 5. 如申請專利範圍第1項之研磨墊,其中該D1 、該D2 、與從該第一表面起而朝厚度方向40至60%之厚度區域中之該纖維束橫截面的平均數量密度D3 為D1 >D3 >D2 之關係。The polishing pad of claim 1, wherein the D 1 , the D 2 , and the average number density D of the fiber bundle cross-section in a thickness region from the first surface to the thickness direction of 40 to 60% 3 is a relationship of D 1 >D 3 >D 2 . 如申請專利範圍第2項之研磨墊,其中該D1 與該D3 之比(D1 /D3 )為1至1.4。The patentable scope of application of the polishing pad, Paragraph 2, wherein the ratio of the D-D. 1 and 3 of (D 1 / D 3) is 1 to 1.4. 如申請專利範圍第2項之研磨墊,其中該D2 與該D3 之比(D3 /D2 )為14至3。The polishing pad of claim 2, wherein the ratio of D 2 to the D 3 (D 3 /D 2 ) is 14 to 3. 如申請專利範圍第3項之研磨墊,其中該D2 與該D3 之比(D3 /D2 )為1.4至3。The polishing pad of claim 3, wherein the ratio of D 2 to the D 3 (D 3 /D 2 ) is 1.4 to 3. 如申請專利範圍第1至5項中任一項之研磨墊,其中該 D2 為200至3500個/mm2The polishing pad of any one of claims 1 to 5, wherein the D 2 is 200 to 3500 / mm 2 . 如申請專利範圍第1至5項中任一項之研磨墊,其中該纖維束之平均橫截面積為40至400μm2The polishing pad according to any one of claims 1 to 5, wherein the fiber bundle has an average cross-sectional area of 40 to 400 μm 2 . 如申請專利範圍第1至5項中任一項之研磨墊,其中該極細纖維為長纖維(filament)。 The polishing pad of any one of claims 1 to 5, wherein the ultrafine fibers are filaments. 如申請專利範圍第1至5項中任一項之研磨墊,其中該高分子彈性體係具有-10℃以下之玻璃轉移溫度,在23℃與50℃之儲存彈性模數為90至900MPa,於50℃使其飽和吸水時之吸水率為0.2至5質量%。 The polishing pad according to any one of claims 1 to 5, wherein the polymer elastic system has a glass transition temperature of -10 ° C or less, and a storage elastic modulus of 90 to 900 MPa at 23 ° C and 50 ° C, The water absorption when saturated with water at 50 ° C is 0.2 to 5% by mass. 如申請專利範圍第1至5項中任一項之研磨墊,其中該不織布與該高分子彈性體之質量比率(不織布/高分子彈性體)為95/5至55/45。 The polishing pad according to any one of claims 1 to 5, wherein a mass ratio of the nonwoven fabric to the polymeric elastomer (non-woven fabric/polymer elastomer) is 95/5 to 55/45. 如申請專利範圍第1至5項中任一項之研磨墊,其中該第一表面之D硬度為25至50。 The polishing pad of any one of claims 1 to 5, wherein the first surface has a D hardness of 25 to 50. 如申請專利範圍第1至5項中任一項之研磨墊,其中用以貼合於研磨固定盤之黏著膠帶是黏著於該第二表面。 The polishing pad of any one of claims 1 to 5, wherein the adhesive tape for adhering to the abrasive fixing disk is adhered to the second surface. 一種化學機械研磨方法,其係基材之化學機械研磨方法;一邊將研磨糊滴於基材之表面,一邊使如申請專利範圍第1至12項中任一項之研磨墊的該第一表面接觸於該基材表面而研磨。 A chemical mechanical polishing method for a chemical mechanical polishing method of a substrate; the first surface of the polishing pad according to any one of claims 1 to 12, while the polishing paste is dropped on the surface of the substrate Grinding by contact with the surface of the substrate.
TW099136694A 2009-10-30 2010-10-27 Polishing pad and chemical mechanical polishing method TWI513871B (en)

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