TWI503375B - Organic silane-based compositions - Google Patents
Organic silane-based compositions Download PDFInfo
- Publication number
- TWI503375B TWI503375B TW103103290A TW103103290A TWI503375B TW I503375 B TWI503375 B TW I503375B TW 103103290 A TW103103290 A TW 103103290A TW 103103290 A TW103103290 A TW 103103290A TW I503375 B TWI503375 B TW I503375B
- Authority
- TW
- Taiwan
- Prior art keywords
- acid
- group
- composition
- polyamine
- epoxy group
- Prior art date
Links
- 239000000203 mixture Substances 0.000 title claims description 99
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 title 1
- 229910000077 silane Inorganic materials 0.000 title 1
- DIOQZVSQGTUSAI-UHFFFAOYSA-N decane Chemical compound CCCCCCCCCC DIOQZVSQGTUSAI-UHFFFAOYSA-N 0.000 claims description 119
- 239000000758 substrate Substances 0.000 claims description 69
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 68
- 229920000768 polyamine Polymers 0.000 claims description 63
- 125000003700 epoxy group Chemical group 0.000 claims description 58
- AMQJEAYHLZJPGS-UHFFFAOYSA-N N-Pentanol Chemical compound CCCCCO AMQJEAYHLZJPGS-UHFFFAOYSA-N 0.000 claims description 48
- RAXXELZNTBOGNW-UHFFFAOYSA-N imidazole Natural products C1=CNC=N1 RAXXELZNTBOGNW-UHFFFAOYSA-N 0.000 claims description 46
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 claims description 38
- 230000007062 hydrolysis Effects 0.000 claims description 36
- 238000006460 hydrolysis reaction Methods 0.000 claims description 36
- 239000002245 particle Substances 0.000 claims description 36
- 238000004519 manufacturing process Methods 0.000 claims description 33
- 238000000034 method Methods 0.000 claims description 24
- 125000004432 carbon atom Chemical group C* 0.000 claims description 21
- 150000007524 organic acids Chemical class 0.000 claims description 20
- WPYMKLBDIGXBTP-UHFFFAOYSA-N Benzoic acid Natural products OC(=O)C1=CC=CC=C1 WPYMKLBDIGXBTP-UHFFFAOYSA-N 0.000 claims description 16
- 239000007859 condensation product Substances 0.000 claims description 16
- 239000002253 acid Substances 0.000 claims description 15
- 125000005010 perfluoroalkyl group Chemical group 0.000 claims description 15
- 150000001412 amines Chemical class 0.000 claims description 13
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 12
- 238000003756 stirring Methods 0.000 claims description 12
- 238000002156 mixing Methods 0.000 claims description 11
- 239000005711 Benzoic acid Substances 0.000 claims description 9
- 235000010233 benzoic acid Nutrition 0.000 claims description 9
- 238000010438 heat treatment Methods 0.000 claims description 9
- 125000004433 nitrogen atom Chemical group N* 0.000 claims description 8
- 238000001035 drying Methods 0.000 claims description 5
- 125000001316 cycloalkyl alkyl group Chemical group 0.000 claims description 4
- 238000002296 dynamic light scattering Methods 0.000 claims description 4
- 125000006551 perfluoro alkylene group Chemical group 0.000 claims description 4
- 125000002947 alkylene group Chemical group 0.000 claims description 3
- 229920001281 polyalkylene Polymers 0.000 claims description 3
- 230000008569 process Effects 0.000 claims description 3
- 150000001558 benzoic acid derivatives Chemical class 0.000 claims description 2
- -1 glycidoxy group Chemical group 0.000 description 135
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 69
- 239000008199 coating composition Substances 0.000 description 56
- 238000000576 coating method Methods 0.000 description 51
- 239000011248 coating agent Substances 0.000 description 49
- 239000007787 solid Substances 0.000 description 29
- 239000003960 organic solvent Substances 0.000 description 27
- 239000011347 resin Substances 0.000 description 24
- 229920005989 resin Polymers 0.000 description 24
- 229920000515 polycarbonate Polymers 0.000 description 22
- 239000004417 polycarbonate Substances 0.000 description 22
- 239000002904 solvent Substances 0.000 description 21
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 18
- 238000003860 storage Methods 0.000 description 16
- 239000004593 Epoxy Substances 0.000 description 15
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 description 15
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 14
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 13
- 238000009833 condensation Methods 0.000 description 13
- 230000005494 condensation Effects 0.000 description 12
- 239000000243 solution Substances 0.000 description 12
- 238000012360 testing method Methods 0.000 description 12
- 239000003054 catalyst Substances 0.000 description 11
- 150000001875 compounds Chemical class 0.000 description 11
- 239000000463 material Substances 0.000 description 11
- 238000004833 X-ray photoelectron spectroscopy Methods 0.000 description 10
- 125000000217 alkyl group Chemical group 0.000 description 10
- XNGIFLGASWRNHJ-UHFFFAOYSA-N phthalic acid Chemical compound OC(=O)C1=CC=CC=C1C(O)=O XNGIFLGASWRNHJ-UHFFFAOYSA-N 0.000 description 10
- 238000002360 preparation method Methods 0.000 description 10
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 9
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 9
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 9
- BPQQTUXANYXVAA-UHFFFAOYSA-N Orthosilicate Chemical compound [O-][Si]([O-])([O-])[O-] BPQQTUXANYXVAA-UHFFFAOYSA-N 0.000 description 9
- 229910052782 aluminium Inorganic materials 0.000 description 9
- 229910052799 carbon Inorganic materials 0.000 description 9
- 239000011521 glass Substances 0.000 description 9
- 229960004592 isopropanol Drugs 0.000 description 9
- 238000005259 measurement Methods 0.000 description 9
- 125000003118 aryl group Chemical group 0.000 description 8
- 230000008859 change Effects 0.000 description 8
- MWKFXSUHUHTGQN-UHFFFAOYSA-N decan-1-ol Chemical compound CCCCCCCCCCO MWKFXSUHUHTGQN-UHFFFAOYSA-N 0.000 description 8
- 238000009826 distribution Methods 0.000 description 8
- 150000002430 hydrocarbons Chemical group 0.000 description 8
- 239000007788 liquid Substances 0.000 description 8
- 239000005871 repellent Substances 0.000 description 8
- 229920002799 BoPET Polymers 0.000 description 7
- 125000003342 alkenyl group Chemical group 0.000 description 7
- 125000003545 alkoxy group Chemical group 0.000 description 7
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 7
- 239000002094 self assembled monolayer Substances 0.000 description 7
- 239000013545 self-assembled monolayer Substances 0.000 description 7
- 230000003068 static effect Effects 0.000 description 7
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 6
- WEVYAHXRMPXWCK-UHFFFAOYSA-N Acetonitrile Chemical compound CC#N WEVYAHXRMPXWCK-UHFFFAOYSA-N 0.000 description 6
- 239000004215 Carbon black (E152) Substances 0.000 description 6
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 6
- DNIAPMSPPWPWGF-UHFFFAOYSA-N Propylene glycol Chemical compound CC(O)CO DNIAPMSPPWPWGF-UHFFFAOYSA-N 0.000 description 6
- 235000011054 acetic acid Nutrition 0.000 description 6
- 125000003277 amino group Chemical group 0.000 description 6
- 230000015572 biosynthetic process Effects 0.000 description 6
- KRKNYBCHXYNGOX-UHFFFAOYSA-N citric acid Chemical compound OC(=O)CC(O)(C(O)=O)CC(O)=O KRKNYBCHXYNGOX-UHFFFAOYSA-N 0.000 description 6
- MTHSVFCYNBDYFN-UHFFFAOYSA-N diethylene glycol Chemical compound OCCOCCO MTHSVFCYNBDYFN-UHFFFAOYSA-N 0.000 description 6
- 125000005843 halogen group Chemical group 0.000 description 6
- 229930195733 hydrocarbon Natural products 0.000 description 6
- QQVIHTHCMHWDBS-UHFFFAOYSA-N isophthalic acid Chemical compound OC(=O)C1=CC=CC(C(O)=O)=C1 QQVIHTHCMHWDBS-UHFFFAOYSA-N 0.000 description 6
- BDAGIHXWWSANSR-UHFFFAOYSA-N methanoic acid Natural products OC=O BDAGIHXWWSANSR-UHFFFAOYSA-N 0.000 description 6
- 239000000047 product Substances 0.000 description 6
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 6
- YGSDEFSMJLZEOE-UHFFFAOYSA-N salicylic acid Chemical compound OC(=O)C1=CC=CC=C1O YGSDEFSMJLZEOE-UHFFFAOYSA-N 0.000 description 6
- 239000005361 soda-lime glass Substances 0.000 description 6
- 125000001424 substituent group Chemical group 0.000 description 6
- OFOBLEOULBTSOW-UHFFFAOYSA-N Malonic acid Chemical compound OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 5
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 5
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 5
- RHQDFWAXVIIEBN-UHFFFAOYSA-N Trifluoroethanol Chemical compound OCC(F)(F)F RHQDFWAXVIIEBN-UHFFFAOYSA-N 0.000 description 5
- 239000002585 base Substances 0.000 description 5
- 239000010949 copper Substances 0.000 description 5
- 238000011156 evaluation Methods 0.000 description 5
- 229910052751 metal Inorganic materials 0.000 description 5
- 239000002184 metal Substances 0.000 description 5
- 235000006408 oxalic acid Nutrition 0.000 description 5
- 229920003023 plastic Polymers 0.000 description 5
- 238000012545 processing Methods 0.000 description 5
- 239000002994 raw material Substances 0.000 description 5
- 239000000126 substance Substances 0.000 description 5
- 238000004506 ultrasonic cleaning Methods 0.000 description 5
- SMNDYUVBFMFKNZ-UHFFFAOYSA-N 2-furoic acid Chemical compound OC(=O)C1=CC=CO1 SMNDYUVBFMFKNZ-UHFFFAOYSA-N 0.000 description 4
- BWLBGMIXKSTLSX-UHFFFAOYSA-N 2-hydroxyisobutyric acid Chemical compound CC(C)(O)C(O)=O BWLBGMIXKSTLSX-UHFFFAOYSA-N 0.000 description 4
- XHQZJYCNDZAGLW-UHFFFAOYSA-N 3-methoxybenzoic acid Chemical compound COC1=CC=CC(C(O)=O)=C1 XHQZJYCNDZAGLW-UHFFFAOYSA-N 0.000 description 4
- ALYNCZNDIQEVRV-UHFFFAOYSA-N 4-aminobenzoic acid Chemical compound NC1=CC=C(C(O)=O)C=C1 ALYNCZNDIQEVRV-UHFFFAOYSA-N 0.000 description 4
- OTLNPYWUJOZPPA-UHFFFAOYSA-N 4-nitrobenzoic acid Chemical compound OC(=O)C1=CC=C([N+]([O-])=O)C=C1 OTLNPYWUJOZPPA-UHFFFAOYSA-N 0.000 description 4
- OBKXEAXTFZPCHS-UHFFFAOYSA-N 4-phenylbutyric acid Chemical compound OC(=O)CCCC1=CC=CC=C1 OBKXEAXTFZPCHS-UHFFFAOYSA-N 0.000 description 4
- FERIUCNNQQJTOY-UHFFFAOYSA-N Butyric acid Chemical compound CCCC(O)=O FERIUCNNQQJTOY-UHFFFAOYSA-N 0.000 description 4
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 4
- ZHNUHDYFZUAESO-UHFFFAOYSA-N Formamide Chemical compound NC=O ZHNUHDYFZUAESO-UHFFFAOYSA-N 0.000 description 4
- OAKJQQAXSVQMHS-UHFFFAOYSA-N Hydrazine Chemical class NN OAKJQQAXSVQMHS-UHFFFAOYSA-N 0.000 description 4
- PVNIIMVLHYAWGP-UHFFFAOYSA-N Niacin Chemical compound OC(=O)C1=CC=CN=C1 PVNIIMVLHYAWGP-UHFFFAOYSA-N 0.000 description 4
- CBENFWSGALASAD-UHFFFAOYSA-N Ozone Chemical compound [O-][O+]=O CBENFWSGALASAD-UHFFFAOYSA-N 0.000 description 4
- XYFCBTPGUUZFHI-UHFFFAOYSA-N Phosphine Chemical compound P XYFCBTPGUUZFHI-UHFFFAOYSA-N 0.000 description 4
- LCTONWCANYUPML-UHFFFAOYSA-N Pyruvic acid Chemical compound CC(=O)C(O)=O LCTONWCANYUPML-UHFFFAOYSA-N 0.000 description 4
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 4
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 4
- XSQUKJJJFZCRTK-UHFFFAOYSA-N Urea Natural products NC(N)=O XSQUKJJJFZCRTK-UHFFFAOYSA-N 0.000 description 4
- WNLRTRBMVRJNCN-UHFFFAOYSA-N adipic acid Chemical compound OC(=O)CCCCC(O)=O WNLRTRBMVRJNCN-UHFFFAOYSA-N 0.000 description 4
- MWPLVEDNUUSJAV-UHFFFAOYSA-N anthracene Chemical compound C1=CC=CC2=CC3=CC=CC=C3C=C21 MWPLVEDNUUSJAV-UHFFFAOYSA-N 0.000 description 4
- 239000007795 chemical reaction product Substances 0.000 description 4
- 239000003795 chemical substances by application Substances 0.000 description 4
- MLIREBYILWEBDM-UHFFFAOYSA-N cyanoacetic acid Chemical compound OC(=O)CC#N MLIREBYILWEBDM-UHFFFAOYSA-N 0.000 description 4
- PAFZNILMFXTMIY-UHFFFAOYSA-N cyclohexylamine Chemical compound NC1CCCCC1 PAFZNILMFXTMIY-UHFFFAOYSA-N 0.000 description 4
- XBDQKXXYIPTUBI-UHFFFAOYSA-N dimethylselenoniopropionate Natural products CCC(O)=O XBDQKXXYIPTUBI-UHFFFAOYSA-N 0.000 description 4
- JRBPAEWTRLWTQC-UHFFFAOYSA-N dodecylamine Chemical compound CCCCCCCCCCCCN JRBPAEWTRLWTQC-UHFFFAOYSA-N 0.000 description 4
- 229910052731 fluorine Inorganic materials 0.000 description 4
- QEWYKACRFQMRMB-UHFFFAOYSA-N fluoroacetic acid Chemical compound OC(=O)CF QEWYKACRFQMRMB-UHFFFAOYSA-N 0.000 description 4
- HHLFWLYXYJOTON-UHFFFAOYSA-N glyoxylic acid Chemical compound OC(=O)C=O HHLFWLYXYJOTON-UHFFFAOYSA-N 0.000 description 4
- NAQMVNRVTILPCV-UHFFFAOYSA-N hexane-1,6-diamine Chemical compound NCCCCCCN NAQMVNRVTILPCV-UHFFFAOYSA-N 0.000 description 4
- FUZZWVXGSFPDMH-UHFFFAOYSA-N hexanoic acid Chemical compound CCCCCC(O)=O FUZZWVXGSFPDMH-UHFFFAOYSA-N 0.000 description 4
- AQYSYJUIMQTRMV-UHFFFAOYSA-N hypofluorous acid Chemical compound FO AQYSYJUIMQTRMV-UHFFFAOYSA-N 0.000 description 4
- 125000000879 imine group Chemical group 0.000 description 4
- KQNPFQTWMSNSAP-UHFFFAOYSA-N isobutyric acid Chemical compound CC(C)C(O)=O KQNPFQTWMSNSAP-UHFFFAOYSA-N 0.000 description 4
- 150000002576 ketones Chemical class 0.000 description 4
- JVTAAEKCZFNVCJ-UHFFFAOYSA-N lactic acid Chemical compound CC(O)C(O)=O JVTAAEKCZFNVCJ-UHFFFAOYSA-N 0.000 description 4
- 229910052757 nitrogen Inorganic materials 0.000 description 4
- LCPDWSOZIOUXRV-UHFFFAOYSA-N phenoxyacetic acid Chemical compound OC(=O)COC1=CC=CC=C1 LCPDWSOZIOUXRV-UHFFFAOYSA-N 0.000 description 4
- WLJVNTCWHIRURA-UHFFFAOYSA-N pimelic acid Chemical compound OC(=O)CCCCCC(O)=O WLJVNTCWHIRURA-UHFFFAOYSA-N 0.000 description 4
- 239000004033 plastic Substances 0.000 description 4
- 229920000642 polymer Polymers 0.000 description 4
- 230000002940 repellent Effects 0.000 description 4
- 150000003839 salts Chemical class 0.000 description 4
- 230000002123 temporal effect Effects 0.000 description 4
- UMGDCJDMYOKAJW-UHFFFAOYSA-N thiourea Chemical compound NC(N)=S UMGDCJDMYOKAJW-UHFFFAOYSA-N 0.000 description 4
- IMNIMPAHZVJRPE-UHFFFAOYSA-N triethylenediamine Chemical compound C1CN2CCN1CC2 IMNIMPAHZVJRPE-UHFFFAOYSA-N 0.000 description 4
- NQPDZGIKBAWPEJ-UHFFFAOYSA-N valeric acid Chemical compound CCCCC(O)=O NQPDZGIKBAWPEJ-UHFFFAOYSA-N 0.000 description 4
- LXBGSDVWAMZHDD-UHFFFAOYSA-N 2-methyl-1h-imidazole Chemical compound CC1=NC=CN1 LXBGSDVWAMZHDD-UHFFFAOYSA-N 0.000 description 3
- OSWFIVFLDKOXQC-UHFFFAOYSA-N 4-(3-methoxyphenyl)aniline Chemical compound COC1=CC=CC(C=2C=CC(N)=CC=2)=C1 OSWFIVFLDKOXQC-UHFFFAOYSA-N 0.000 description 3
- ZEYHEAKUIGZSGI-UHFFFAOYSA-N 4-methoxybenzoic acid Chemical compound COC1=CC=C(C(O)=O)C=C1 ZEYHEAKUIGZSGI-UHFFFAOYSA-N 0.000 description 3
- 229910052684 Cerium Inorganic materials 0.000 description 3
- LCGLNKUTAGEVQW-UHFFFAOYSA-N Dimethyl ether Chemical compound COC LCGLNKUTAGEVQW-UHFFFAOYSA-N 0.000 description 3
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 3
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 3
- 229910019142 PO4 Inorganic materials 0.000 description 3
- 239000007983 Tris buffer Substances 0.000 description 3
- ISKQADXMHQSTHK-UHFFFAOYSA-N [4-(aminomethyl)phenyl]methanamine Chemical compound NCC1=CC=C(CN)C=C1 ISKQADXMHQSTHK-UHFFFAOYSA-N 0.000 description 3
- 150000001450 anions Chemical class 0.000 description 3
- 150000001732 carboxylic acid derivatives Chemical class 0.000 description 3
- 238000006243 chemical reaction Methods 0.000 description 3
- 239000012295 chemical reaction liquid Substances 0.000 description 3
- 239000012459 cleaning agent Substances 0.000 description 3
- 125000000753 cycloalkyl group Chemical group 0.000 description 3
- 150000004985 diamines Chemical class 0.000 description 3
- AYOHIQLKSOJJQH-UHFFFAOYSA-N dibutyltin Chemical compound CCCC[Sn]CCCC AYOHIQLKSOJJQH-UHFFFAOYSA-N 0.000 description 3
- UAOMVDZJSHZZME-UHFFFAOYSA-N diisopropylamine Chemical compound CC(C)NC(C)C UAOMVDZJSHZZME-UHFFFAOYSA-N 0.000 description 3
- 239000011737 fluorine Substances 0.000 description 3
- 235000019253 formic acid Nutrition 0.000 description 3
- XEEYBQQBJWHFJM-UHFFFAOYSA-N iron Substances [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 3
- ZFSLODLOARCGLH-UHFFFAOYSA-N isocyanuric acid Chemical compound OC1=NC(O)=NC(O)=N1 ZFSLODLOARCGLH-UHFFFAOYSA-N 0.000 description 3
- 230000007774 longterm Effects 0.000 description 3
- 150000007522 mineralic acids Chemical class 0.000 description 3
- 239000012046 mixed solvent Substances 0.000 description 3
- FJKROLUGYXJWQN-UHFFFAOYSA-N papa-hydroxy-benzoic acid Natural products OC(=O)C1=CC=C(O)C=C1 FJKROLUGYXJWQN-UHFFFAOYSA-N 0.000 description 3
- 239000010452 phosphate Substances 0.000 description 3
- 229920000139 polyethylene terephthalate Polymers 0.000 description 3
- 239000005020 polyethylene terephthalate Substances 0.000 description 3
- 229960004889 salicylic acid Drugs 0.000 description 3
- 150000003606 tin compounds Chemical class 0.000 description 3
- 239000010936 titanium Substances 0.000 description 3
- 229910052719 titanium Inorganic materials 0.000 description 3
- 229910052726 zirconium Inorganic materials 0.000 description 3
- BJEPYKJPYRNKOW-REOHCLBHSA-N (S)-malic acid Chemical compound OC(=O)[C@@H](O)CC(O)=O BJEPYKJPYRNKOW-REOHCLBHSA-N 0.000 description 2
- QGLWBTPVKHMVHM-KTKRTIGZSA-N (z)-octadec-9-en-1-amine Chemical compound CCCCCCCC\C=C/CCCCCCCCN QGLWBTPVKHMVHM-KTKRTIGZSA-N 0.000 description 2
- WBYWAXJHAXSJNI-VOTSOKGWSA-M .beta-Phenylacrylic acid Natural products [O-]C(=O)\C=C\C1=CC=CC=C1 WBYWAXJHAXSJNI-VOTSOKGWSA-M 0.000 description 2
- WJMXTYZCTXTFJM-UHFFFAOYSA-N 1,1,1,2-tetraethoxydecane Chemical compound C(C)OC(C(OCC)(OCC)OCC)CCCCCCCC WJMXTYZCTXTFJM-UHFFFAOYSA-N 0.000 description 2
- NNZZMYIWZFZLHU-UHFFFAOYSA-N 1,1,2,2,2-pentafluoroethanol Chemical compound OC(F)(F)C(F)(F)F NNZZMYIWZFZLHU-UHFFFAOYSA-N 0.000 description 2
- LEEANUDEDHYDTG-UHFFFAOYSA-N 1,2-dimethoxypropane Chemical compound COCC(C)OC LEEANUDEDHYDTG-UHFFFAOYSA-N 0.000 description 2
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 2
- ARXJGSRGQADJSQ-UHFFFAOYSA-N 1-methoxypropan-2-ol Chemical compound COCC(C)O ARXJGSRGQADJSQ-UHFFFAOYSA-N 0.000 description 2
- RTBFRGCFXZNCOE-UHFFFAOYSA-N 1-methylsulfonylpiperidin-4-one Chemical compound CS(=O)(=O)N1CCC(=O)CC1 RTBFRGCFXZNCOE-UHFFFAOYSA-N 0.000 description 2
- XYHKNCXZYYTLRG-UHFFFAOYSA-N 1h-imidazole-2-carbaldehyde Chemical compound O=CC1=NC=CN1 XYHKNCXZYYTLRG-UHFFFAOYSA-N 0.000 description 2
- JLZVIWSFUPLSOR-UHFFFAOYSA-N 2,3-difluorobenzoic acid Chemical compound OC(=O)C1=CC=CC(F)=C1F JLZVIWSFUPLSOR-UHFFFAOYSA-N 0.000 description 2
- AHDSRXYHVZECER-UHFFFAOYSA-N 2,4,6-tris[(dimethylamino)methyl]phenol Chemical compound CN(C)CC1=CC(CN(C)C)=C(O)C(CN(C)C)=C1 AHDSRXYHVZECER-UHFFFAOYSA-N 0.000 description 2
- MFAWEYJGIGIYFH-UHFFFAOYSA-N 2-[4-(trimethoxymethyl)dodecoxymethyl]oxirane Chemical compound C(C1CO1)OCCCC(C(OC)(OC)OC)CCCCCCCC MFAWEYJGIGIYFH-UHFFFAOYSA-N 0.000 description 2
- CABMTIJINOIHOD-UHFFFAOYSA-N 2-[4-methyl-5-oxo-4-(propan-2-yl)-4,5-dihydro-1H-imidazol-2-yl]quinoline-3-carboxylic acid Chemical compound N1C(=O)C(C(C)C)(C)N=C1C1=NC2=CC=CC=C2C=C1C(O)=O CABMTIJINOIHOD-UHFFFAOYSA-N 0.000 description 2
- MONMFXREYOKQTI-UHFFFAOYSA-N 2-bromopropanoic acid Chemical compound CC(Br)C(O)=O MONMFXREYOKQTI-UHFFFAOYSA-N 0.000 description 2
- IKCLCGXPQILATA-UHFFFAOYSA-N 2-chlorobenzoic acid Chemical compound OC(=O)C1=CC=CC=C1Cl IKCLCGXPQILATA-UHFFFAOYSA-N 0.000 description 2
- ZNQVEEAIQZEUHB-UHFFFAOYSA-N 2-ethoxyethanol Chemical compound CCOCCO ZNQVEEAIQZEUHB-UHFFFAOYSA-N 0.000 description 2
- HXDLWJWIAHWIKI-UHFFFAOYSA-N 2-hydroxyethyl acetate Chemical compound CC(=O)OCCO HXDLWJWIAHWIKI-UHFFFAOYSA-N 0.000 description 2
- SLAMLWHELXOEJZ-UHFFFAOYSA-N 2-nitrobenzoic acid Chemical compound OC(=O)C1=CC=CC=C1[N+]([O-])=O SLAMLWHELXOEJZ-UHFFFAOYSA-N 0.000 description 2
- ZCUJYXPAKHMBAZ-UHFFFAOYSA-N 2-phenyl-1h-imidazole Chemical compound C1=CNC(C=2C=CC=CC=2)=N1 ZCUJYXPAKHMBAZ-UHFFFAOYSA-N 0.000 description 2
- WLJVXDMOQOGPHL-PPJXEINESA-N 2-phenylacetic acid Chemical compound O[14C](=O)CC1=CC=CC=C1 WLJVXDMOQOGPHL-PPJXEINESA-N 0.000 description 2
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 description 2
- GWYFCOCPABKNJV-UHFFFAOYSA-M 3-Methylbutanoic acid Natural products CC(C)CC([O-])=O GWYFCOCPABKNJV-UHFFFAOYSA-M 0.000 description 2
- ANOPCGQVRXJHHD-UHFFFAOYSA-N 3-[3-(3-aminopropyl)-2,4,8,10-tetraoxaspiro[5.5]undecan-9-yl]propan-1-amine Chemical compound C1OC(CCCN)OCC21COC(CCCN)OC2 ANOPCGQVRXJHHD-UHFFFAOYSA-N 0.000 description 2
- XFDUHJPVQKIXHO-UHFFFAOYSA-N 3-aminobenzoic acid Chemical compound NC1=CC=CC(C(O)=O)=C1 XFDUHJPVQKIXHO-UHFFFAOYSA-N 0.000 description 2
- MXNBDFWNYRNIBH-UHFFFAOYSA-N 3-fluorobenzoic acid Chemical compound OC(=O)C1=CC=CC(F)=C1 MXNBDFWNYRNIBH-UHFFFAOYSA-N 0.000 description 2
- XMIIGOLPHOKFCH-UHFFFAOYSA-N 3-phenylpropionic acid Chemical compound OC(=O)CCC1=CC=CC=C1 XMIIGOLPHOKFCH-UHFFFAOYSA-N 0.000 description 2
- KOGSPLLRMRSADR-UHFFFAOYSA-N 4-(2-aminopropan-2-yl)-1-methylcyclohexan-1-amine Chemical compound CC(C)(N)C1CCC(C)(N)CC1 KOGSPLLRMRSADR-UHFFFAOYSA-N 0.000 description 2
- SXPGQGNWEWPWQZ-UHFFFAOYSA-N 4-(triethoxymethyl)dodecan-1-amine Chemical compound NCCCC(C(OCC)(OCC)OCC)CCCCCCCC SXPGQGNWEWPWQZ-UHFFFAOYSA-N 0.000 description 2
- JOOXCMJARBKPKM-UHFFFAOYSA-N 4-oxopentanoic acid Chemical compound CC(=O)CCC(O)=O JOOXCMJARBKPKM-UHFFFAOYSA-N 0.000 description 2
- ULKLGIFJWFIQFF-UHFFFAOYSA-N 5K8XI641G3 Chemical compound CCC1=NC=C(C)N1 ULKLGIFJWFIQFF-UHFFFAOYSA-N 0.000 description 2
- MJXUFBUYCLOLBZ-UHFFFAOYSA-N C(C)(=N)N.CC(=O)C Chemical compound C(C)(=N)N.CC(=O)C MJXUFBUYCLOLBZ-UHFFFAOYSA-N 0.000 description 2
- DKCXIJLUMAOOHX-UHFFFAOYSA-N C(CCCCC)C(C(OC)(OC)OC)CCCCCCCC Chemical compound C(CCCCC)C(C(OC)(OC)OC)CCCCCCCC DKCXIJLUMAOOHX-UHFFFAOYSA-N 0.000 description 2
- ODBLHEXUDAPZAU-ZAFYKAAXSA-N D-threo-isocitric acid Chemical compound OC(=O)[C@H](O)[C@@H](C(O)=O)CC(O)=O ODBLHEXUDAPZAU-ZAFYKAAXSA-N 0.000 description 2
- FEWJPZIEWOKRBE-JCYAYHJZSA-N Dextrotartaric acid Chemical compound OC(=O)[C@H](O)[C@@H](O)C(O)=O FEWJPZIEWOKRBE-JCYAYHJZSA-N 0.000 description 2
- XTHFKEDIFFGKHM-UHFFFAOYSA-N Dimethoxyethane Chemical compound COCCOC XTHFKEDIFFGKHM-UHFFFAOYSA-N 0.000 description 2
- ROSDSFDQCJNGOL-UHFFFAOYSA-N Dimethylamine Chemical compound CNC ROSDSFDQCJNGOL-UHFFFAOYSA-N 0.000 description 2
- WJJMNDUMQPNECX-UHFFFAOYSA-N Dipicolinic acid Natural products OC(=O)C1=CC=CC(C(O)=O)=N1 WJJMNDUMQPNECX-UHFFFAOYSA-N 0.000 description 2
- QUSNBJAOOMFDIB-UHFFFAOYSA-N Ethylamine Chemical compound CCN QUSNBJAOOMFDIB-UHFFFAOYSA-N 0.000 description 2
- AEMRFAOFKBGASW-UHFFFAOYSA-N Glycolic acid Chemical compound OCC(O)=O AEMRFAOFKBGASW-UHFFFAOYSA-N 0.000 description 2
- ODBLHEXUDAPZAU-FONMRSAGSA-N Isocitric acid Natural products OC(=O)[C@@H](O)[C@H](C(O)=O)CC(O)=O ODBLHEXUDAPZAU-FONMRSAGSA-N 0.000 description 2
- AFVFQIVMOAPDHO-UHFFFAOYSA-N Methanesulfonic acid Chemical compound CS(O)(=O)=O AFVFQIVMOAPDHO-UHFFFAOYSA-N 0.000 description 2
- BAVYZALUXZFZLV-UHFFFAOYSA-N Methylamine Chemical compound NC BAVYZALUXZFZLV-UHFFFAOYSA-N 0.000 description 2
- UNVWJAYEKZVDDL-UHFFFAOYSA-N N(C(=O)N)CCCC(C(OC)(OC)OC)CCCCCCCC Chemical compound N(C(=O)N)CCCC(C(OC)(OC)OC)CCCCCCCC UNVWJAYEKZVDDL-UHFFFAOYSA-N 0.000 description 2
- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 description 2
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 2
- XJDCHDFUMGSEHD-UHFFFAOYSA-N NCCCC(C(OC)(OC)OC)CCCCCCCC Chemical compound NCCCC(C(OC)(OC)OC)CCCCCCCC XJDCHDFUMGSEHD-UHFFFAOYSA-N 0.000 description 2
- ILUJQPXNXACGAN-UHFFFAOYSA-N O-methylsalicylic acid Chemical compound COC1=CC=CC=C1C(O)=O ILUJQPXNXACGAN-UHFFFAOYSA-N 0.000 description 2
- OFBQJSOFQDEBGM-UHFFFAOYSA-N Pentane Chemical compound CCCCC OFBQJSOFQDEBGM-UHFFFAOYSA-N 0.000 description 2
- GLUUGHFHXGJENI-UHFFFAOYSA-N Piperazine Chemical compound C1CNCCN1 GLUUGHFHXGJENI-UHFFFAOYSA-N 0.000 description 2
- NQRYJNQNLNOLGT-UHFFFAOYSA-N Piperidine Chemical compound C1CCNCC1 NQRYJNQNLNOLGT-UHFFFAOYSA-N 0.000 description 2
- XBDQKXXYIPTUBI-UHFFFAOYSA-M Propionate Chemical compound CCC([O-])=O XBDQKXXYIPTUBI-UHFFFAOYSA-M 0.000 description 2
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 2
- KAESVJOAVNADME-UHFFFAOYSA-N Pyrrole Chemical compound C=1C=CNC=1 KAESVJOAVNADME-UHFFFAOYSA-N 0.000 description 2
- KDYFGRWQOYBRFD-UHFFFAOYSA-N Succinic acid Natural products OC(=O)CCC(O)=O KDYFGRWQOYBRFD-UHFFFAOYSA-N 0.000 description 2
- FEWJPZIEWOKRBE-UHFFFAOYSA-N Tartaric acid Natural products [H+].[H+].[O-]C(=O)C(O)C(O)C([O-])=O FEWJPZIEWOKRBE-UHFFFAOYSA-N 0.000 description 2
- BOTDANWDWHJENH-UHFFFAOYSA-N Tetraethyl orthosilicate Chemical compound CCO[Si](OCC)(OCC)OCC BOTDANWDWHJENH-UHFFFAOYSA-N 0.000 description 2
- DHXVGJBLRPWPCS-UHFFFAOYSA-N Tetrahydropyran Chemical compound C1CCOCC1 DHXVGJBLRPWPCS-UHFFFAOYSA-N 0.000 description 2
- DTQVDTLACAAQTR-UHFFFAOYSA-N Trifluoroacetic acid Chemical compound OC(=O)C(F)(F)F DTQVDTLACAAQTR-UHFFFAOYSA-N 0.000 description 2
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 description 2
- KXKVLQRXCPHEJC-UHFFFAOYSA-N acetic acid trimethyl ester Natural products COC(C)=O KXKVLQRXCPHEJC-UHFFFAOYSA-N 0.000 description 2
- UGAPHEBNTGUMBB-UHFFFAOYSA-N acetic acid;ethyl acetate Chemical compound CC(O)=O.CCOC(C)=O UGAPHEBNTGUMBB-UHFFFAOYSA-N 0.000 description 2
- YRKCREAYFQTBPV-UHFFFAOYSA-N acetylacetone Chemical compound CC(=O)CC(C)=O YRKCREAYFQTBPV-UHFFFAOYSA-N 0.000 description 2
- 239000001361 adipic acid Substances 0.000 description 2
- 235000011037 adipic acid Nutrition 0.000 description 2
- 150000001298 alcohols Chemical class 0.000 description 2
- 125000000304 alkynyl group Chemical group 0.000 description 2
- BJEPYKJPYRNKOW-UHFFFAOYSA-N alpha-hydroxysuccinic acid Natural products OC(=O)C(O)CC(O)=O BJEPYKJPYRNKOW-UHFFFAOYSA-N 0.000 description 2
- 229960004050 aminobenzoic acid Drugs 0.000 description 2
- 150000008064 anhydrides Chemical class 0.000 description 2
- JFCQEDHGNNZCLN-UHFFFAOYSA-N anhydrous glutaric acid Natural products OC(=O)CCCC(O)=O JFCQEDHGNNZCLN-UHFFFAOYSA-N 0.000 description 2
- 125000003710 aryl alkyl group Chemical group 0.000 description 2
- WGQKYBSKWIADBV-UHFFFAOYSA-N benzylamine Chemical compound NCC1=CC=CC=C1 WGQKYBSKWIADBV-UHFFFAOYSA-N 0.000 description 2
- GWYFCOCPABKNJV-UHFFFAOYSA-N beta-methyl-butyric acid Natural products CC(C)CC(O)=O GWYFCOCPABKNJV-UHFFFAOYSA-N 0.000 description 2
- 238000009835 boiling Methods 0.000 description 2
- WTEOIRVLGSZEPR-UHFFFAOYSA-N boron trifluoride Chemical compound FB(F)F WTEOIRVLGSZEPR-UHFFFAOYSA-N 0.000 description 2
- HQABUPZFAYXKJW-UHFFFAOYSA-N butan-1-amine Chemical compound CCCCN HQABUPZFAYXKJW-UHFFFAOYSA-N 0.000 description 2
- KDYFGRWQOYBRFD-NUQCWPJISA-N butanedioic acid Chemical compound O[14C](=O)CC[14C](O)=O KDYFGRWQOYBRFD-NUQCWPJISA-N 0.000 description 2
- NPAIMXWXWPJRES-UHFFFAOYSA-N butyltin(3+) Chemical compound CCCC[Sn+3] NPAIMXWXWPJRES-UHFFFAOYSA-N 0.000 description 2
- FOCAUTSVDIKZOP-UHFFFAOYSA-N chloroacetic acid Chemical compound OC(=O)CCl FOCAUTSVDIKZOP-UHFFFAOYSA-N 0.000 description 2
- 229940106681 chloroacetic acid Drugs 0.000 description 2
- 238000005260 corrosion Methods 0.000 description 2
- 230000007797 corrosion Effects 0.000 description 2
- LDHQCZJRKDOVOX-NSCUHMNNSA-N crotonic acid Chemical compound C\C=C\C(O)=O LDHQCZJRKDOVOX-NSCUHMNNSA-N 0.000 description 2
- 125000000392 cycloalkenyl group Chemical group 0.000 description 2
- QYQADNCHXSEGJT-UHFFFAOYSA-N cyclohexane-1,1-dicarboxylate;hydron Chemical compound OC(=O)C1(C(O)=O)CCCCC1 QYQADNCHXSEGJT-UHFFFAOYSA-N 0.000 description 2
- JQVDAXLFBXTEQA-UHFFFAOYSA-N dibutylamine Chemical compound CCCCNCCCC JQVDAXLFBXTEQA-UHFFFAOYSA-N 0.000 description 2
- 238000007865 diluting Methods 0.000 description 2
- MHPUGCYGQWGLJL-UHFFFAOYSA-N dimethyl pentanoic acid Natural products CC(C)CCCC(O)=O MHPUGCYGQWGLJL-UHFFFAOYSA-N 0.000 description 2
- OREAFAJWWJHCOT-UHFFFAOYSA-N dimethylmalonic acid Chemical compound OC(=O)C(C)(C)C(O)=O OREAFAJWWJHCOT-UHFFFAOYSA-N 0.000 description 2
- VURFVHCLMJOLKN-UHFFFAOYSA-N diphosphane Chemical compound PP VURFVHCLMJOLKN-UHFFFAOYSA-N 0.000 description 2
- SZXQTJUDPRGNJN-UHFFFAOYSA-N dipropylene glycol Chemical compound OCCCOCCCO SZXQTJUDPRGNJN-UHFFFAOYSA-N 0.000 description 2
- 150000002148 esters Chemical class 0.000 description 2
- WBJINCZRORDGAQ-UHFFFAOYSA-N ethyl formate Chemical compound CCOC=O WBJINCZRORDGAQ-UHFFFAOYSA-N 0.000 description 2
- 230000003301 hydrolyzing effect Effects 0.000 description 2
- 150000002460 imidazoles Chemical class 0.000 description 2
- 239000004615 ingredient Substances 0.000 description 2
- 229910052742 iron Inorganic materials 0.000 description 2
- PHTQWCKDNZKARW-UHFFFAOYSA-N isoamylol Chemical compound CC(C)CCO PHTQWCKDNZKARW-UHFFFAOYSA-N 0.000 description 2
- ZXEKIIBDNHEJCQ-UHFFFAOYSA-N isobutanol Chemical compound CC(C)CO ZXEKIIBDNHEJCQ-UHFFFAOYSA-N 0.000 description 2
- FGKJLKRYENPLQH-UHFFFAOYSA-N isocaproic acid Chemical compound CC(C)CCC(O)=O FGKJLKRYENPLQH-UHFFFAOYSA-N 0.000 description 2
- 239000004310 lactic acid Substances 0.000 description 2
- 235000014655 lactic acid Nutrition 0.000 description 2
- 239000010410 layer Substances 0.000 description 2
- 239000001630 malic acid Substances 0.000 description 2
- 235000011090 malic acid Nutrition 0.000 description 2
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 2
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- QOHMWDJIBGVPIF-UHFFFAOYSA-N n',n'-diethylpropane-1,3-diamine Chemical compound CCN(CC)CCCN QOHMWDJIBGVPIF-UHFFFAOYSA-N 0.000 description 2
- 125000004108 n-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 2
- KPSSIOMAKSHJJG-UHFFFAOYSA-N neopentyl alcohol Chemical compound CC(C)(C)CO KPSSIOMAKSHJJG-UHFFFAOYSA-N 0.000 description 2
- 239000011664 nicotinic acid Substances 0.000 description 2
- 229960003512 nicotinic acid Drugs 0.000 description 2
- 235000001968 nicotinic acid Nutrition 0.000 description 2
- 229920003986 novolac Polymers 0.000 description 2
- WWZKQHOCKIZLMA-UHFFFAOYSA-N octanoic acid Chemical compound CCCCCCCC(O)=O WWZKQHOCKIZLMA-UHFFFAOYSA-N 0.000 description 2
- 235000005985 organic acids Nutrition 0.000 description 2
- NFHFRUOZVGFOOS-UHFFFAOYSA-N palladium;triphenylphosphane Chemical compound [Pd].C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 NFHFRUOZVGFOOS-UHFFFAOYSA-N 0.000 description 2
- 229950009215 phenylbutanoic acid Drugs 0.000 description 2
- 229910000073 phosphorus hydride Inorganic materials 0.000 description 2
- 125000003367 polycyclic group Chemical group 0.000 description 2
- 239000004848 polyfunctional curative Substances 0.000 description 2
- 150000004032 porphyrins Chemical class 0.000 description 2
- 230000002265 prevention Effects 0.000 description 2
- 235000019260 propionic acid Nutrition 0.000 description 2
- WGYKZJWCGVVSQN-UHFFFAOYSA-N propylamine Chemical compound CCCN WGYKZJWCGVVSQN-UHFFFAOYSA-N 0.000 description 2
- KIDHWZJUCRJVML-UHFFFAOYSA-N putrescine Chemical compound NCCCCN KIDHWZJUCRJVML-UHFFFAOYSA-N 0.000 description 2
- 229940107700 pyruvic acid Drugs 0.000 description 2
- IUVKMZGDUIUOCP-BTNSXGMBSA-N quinbolone Chemical compound O([C@H]1CC[C@H]2[C@H]3[C@@H]([C@]4(C=CC(=O)C=C4CC3)C)CC[C@@]21C)C1=CCCC1 IUVKMZGDUIUOCP-BTNSXGMBSA-N 0.000 description 2
- 239000000565 sealant Substances 0.000 description 2
- 125000000547 substituted alkyl group Chemical group 0.000 description 2
- 239000004094 surface-active agent Substances 0.000 description 2
- 235000002906 tartaric acid Nutrition 0.000 description 2
- 239000011975 tartaric acid Substances 0.000 description 2
- BGHCVCJVXZWKCC-UHFFFAOYSA-N tetradecane Chemical compound CCCCCCCCCCCCCC BGHCVCJVXZWKCC-UHFFFAOYSA-N 0.000 description 2
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 2
- RSPCKAHMRANGJZ-UHFFFAOYSA-N thiohydroxylamine Chemical compound SN RSPCKAHMRANGJZ-UHFFFAOYSA-N 0.000 description 2
- ODBLHEXUDAPZAU-UHFFFAOYSA-N threo-D-isocitric acid Natural products OC(=O)C(O)C(C(O)=O)CC(O)=O ODBLHEXUDAPZAU-UHFFFAOYSA-N 0.000 description 2
- WBYWAXJHAXSJNI-VOTSOKGWSA-N trans-cinnamic acid Chemical compound OC(=O)\C=C\C1=CC=CC=C1 WBYWAXJHAXSJNI-VOTSOKGWSA-N 0.000 description 2
- LDHQCZJRKDOVOX-UHFFFAOYSA-N trans-crotonic acid Natural products CC=CC(O)=O LDHQCZJRKDOVOX-UHFFFAOYSA-N 0.000 description 2
- XFNJVJPLKCPIBV-UHFFFAOYSA-N trimethylenediamine Chemical compound NCCCN XFNJVJPLKCPIBV-UHFFFAOYSA-N 0.000 description 2
- YWWDBCBWQNCYNR-UHFFFAOYSA-N trimethylphosphine Chemical compound CP(C)C YWWDBCBWQNCYNR-UHFFFAOYSA-N 0.000 description 2
- 229940005605 valeric acid Drugs 0.000 description 2
- JWZZKOKVBUJMES-UHFFFAOYSA-N (+-)-Isoprenaline Chemical compound CC(C)NCC(O)C1=CC=C(O)C(O)=C1 JWZZKOKVBUJMES-UHFFFAOYSA-N 0.000 description 1
- OTGGHZUEAWMAAK-UHFFFAOYSA-N (1,1-dimethoxy-1-phenyldecan-2-yl)benzene Chemical compound C1(=CC=CC=C1)C(C(OC)(OC)C1=CC=CC=C1)CCCCCCCC OTGGHZUEAWMAAK-UHFFFAOYSA-N 0.000 description 1
- QBYIENPQHBMVBV-HFEGYEGKSA-N (2R)-2-hydroxy-2-phenylacetic acid Chemical compound O[C@@H](C(O)=O)c1ccccc1.O[C@@H](C(O)=O)c1ccccc1 QBYIENPQHBMVBV-HFEGYEGKSA-N 0.000 description 1
- OBETXYAYXDNJHR-SSDOTTSWSA-M (2r)-2-ethylhexanoate Chemical compound CCCC[C@@H](CC)C([O-])=O OBETXYAYXDNJHR-SSDOTTSWSA-M 0.000 description 1
- MUTGBJKUEZFXGO-OLQVQODUSA-N (3as,7ar)-3a,4,5,6,7,7a-hexahydro-2-benzofuran-1,3-dione Chemical compound C1CCC[C@@H]2C(=O)OC(=O)[C@@H]21 MUTGBJKUEZFXGO-OLQVQODUSA-N 0.000 description 1
- KMOUUZVZFBCRAM-OLQVQODUSA-N (3as,7ar)-3a,4,7,7a-tetrahydro-2-benzofuran-1,3-dione Chemical compound C1C=CC[C@@H]2C(=O)OC(=O)[C@@H]21 KMOUUZVZFBCRAM-OLQVQODUSA-N 0.000 description 1
- RUEBPOOTFCZRBC-UHFFFAOYSA-N (5-methyl-2-phenyl-1h-imidazol-4-yl)methanol Chemical compound OCC1=C(C)NC(C=2C=CC=CC=2)=N1 RUEBPOOTFCZRBC-UHFFFAOYSA-N 0.000 description 1
- WRIDQFICGBMAFQ-UHFFFAOYSA-N (E)-8-Octadecenoic acid Natural products CCCCCCCCCC=CCCCCCCC(O)=O WRIDQFICGBMAFQ-UHFFFAOYSA-N 0.000 description 1
- AFENDNXGAFYKQO-VKHMYHEASA-N (S)-2-hydroxybutyric acid Chemical compound CC[C@H](O)C(O)=O AFENDNXGAFYKQO-VKHMYHEASA-N 0.000 description 1
- ZBBLRPRYYSJUCZ-GRHBHMESSA-L (z)-but-2-enedioate;dibutyltin(2+) Chemical compound [O-]C(=O)\C=C/C([O-])=O.CCCC[Sn+2]CCCC ZBBLRPRYYSJUCZ-GRHBHMESSA-L 0.000 description 1
- CITRASDARLISIR-UHFFFAOYSA-N 1,1,1,2,2,3,3,4,4-nonafluoro-7-(trimethoxymethyl)pentadecane Chemical compound FC(C(C(C(F)(F)F)(F)F)(F)F)(CCC(C(OC)(OC)OC)CCCCCCCC)F CITRASDARLISIR-UHFFFAOYSA-N 0.000 description 1
- FQDXJYBXPOMIBX-UHFFFAOYSA-N 1,1,1,3,3,3-hexafluoro-2-methylpropan-2-ol Chemical compound FC(F)(F)C(O)(C)C(F)(F)F FQDXJYBXPOMIBX-UHFFFAOYSA-N 0.000 description 1
- BYEAHWXPCBROCE-UHFFFAOYSA-N 1,1,1,3,3,3-hexafluoropropan-2-ol Chemical compound FC(F)(F)C(O)C(F)(F)F BYEAHWXPCBROCE-UHFFFAOYSA-N 0.000 description 1
- OCGWWLDZAFOHGD-UHFFFAOYSA-N 1,1,1-trifluoro-2-methylpropan-2-ol Chemical compound CC(C)(O)C(F)(F)F OCGWWLDZAFOHGD-UHFFFAOYSA-N 0.000 description 1
- KYUCWJRUVWJDOF-UHFFFAOYSA-N 1,1,1-trifluoro-4-(triethoxymethyl)dodecane Chemical compound FC(CCC(C(OCC)(OCC)OCC)CCCCCCCC)(F)F KYUCWJRUVWJDOF-UHFFFAOYSA-N 0.000 description 1
- DQGPWNBGAYGUPK-UHFFFAOYSA-N 1,1,1-trifluoro-4-(trimethoxymethyl)dodecane Chemical compound FC(CCC(C(OC)(OC)OC)CCCCCCCC)(F)F DQGPWNBGAYGUPK-UHFFFAOYSA-N 0.000 description 1
- ANBBCZAIOXDZPV-UHFFFAOYSA-N 1,1,1-trimethoxy-2-methyldecane Chemical compound CC(C(OC)(OC)OC)CCCCCCCC ANBBCZAIOXDZPV-UHFFFAOYSA-N 0.000 description 1
- WBXAHKZHOCTGLP-UHFFFAOYSA-N 1,1,2,2,3,3,3-heptafluoropropan-1-ol Chemical compound OC(F)(F)C(F)(F)C(F)(F)F WBXAHKZHOCTGLP-UHFFFAOYSA-N 0.000 description 1
- IRTFYNWQADJCSC-UHFFFAOYSA-N 1,1,2,2,3,3,4,4,5,5,5-undecafluoropentan-1-ol Chemical compound OC(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F IRTFYNWQADJCSC-UHFFFAOYSA-N 0.000 description 1
- SSUJUUNLZQVZMO-UHFFFAOYSA-N 1,2,3,4,8,9,10,10a-octahydropyrimido[1,2-a]azepine Chemical compound C1CCC=CN2CCCNC21 SSUJUUNLZQVZMO-UHFFFAOYSA-N 0.000 description 1
- GIWQSPITLQVMSG-UHFFFAOYSA-N 1,2-dimethylimidazole Chemical compound CC1=NC=CN1C GIWQSPITLQVMSG-UHFFFAOYSA-N 0.000 description 1
- OURODNXVJUWPMZ-UHFFFAOYSA-N 1,2-diphenylanthracene Chemical compound C1=CC=CC=C1C1=CC=C(C=C2C(C=CC=C2)=C2)C2=C1C1=CC=CC=C1 OURODNXVJUWPMZ-UHFFFAOYSA-N 0.000 description 1
- GEYOCULIXLDCMW-UHFFFAOYSA-N 1,2-phenylenediamine Chemical compound NC1=CC=CC=C1N GEYOCULIXLDCMW-UHFFFAOYSA-N 0.000 description 1
- BGJSXRVXTHVRSN-UHFFFAOYSA-N 1,3,5-trioxane Chemical compound C1OCOCO1 BGJSXRVXTHVRSN-UHFFFAOYSA-N 0.000 description 1
- WZCQRUWWHSTZEM-UHFFFAOYSA-N 1,3-phenylenediamine Chemical compound NC1=CC=CC(N)=C1 WZCQRUWWHSTZEM-UHFFFAOYSA-N 0.000 description 1
- CBCKQZAAMUWICA-UHFFFAOYSA-N 1,4-phenylenediamine Chemical compound NC1=CC=C(N)C=C1 CBCKQZAAMUWICA-UHFFFAOYSA-N 0.000 description 1
- ADQQGJLCEXHTRW-UHFFFAOYSA-N 1-(dimethylamino)hexan-1-ol Chemical compound CCCCCC(O)N(C)C ADQQGJLCEXHTRW-UHFFFAOYSA-N 0.000 description 1
- VXNZUUAINFGPBY-UHFFFAOYSA-N 1-Butene Chemical group CCC=C VXNZUUAINFGPBY-UHFFFAOYSA-N 0.000 description 1
- FJLUATLTXUNBOT-UHFFFAOYSA-N 1-Hexadecylamine Chemical compound CCCCCCCCCCCCCCCCN FJLUATLTXUNBOT-UHFFFAOYSA-N 0.000 description 1
- QJAMEPRRHVBWKX-UHFFFAOYSA-N 1-[2-[2-(dimethylamino)ethoxy]ethoxy]ethanol Chemical compound CC(O)OCCOCCN(C)C QJAMEPRRHVBWKX-UHFFFAOYSA-N 0.000 description 1
- JPZYXGPCHFZBHO-UHFFFAOYSA-N 1-aminopentadecane Chemical compound CCCCCCCCCCCCCCCN JPZYXGPCHFZBHO-UHFFFAOYSA-N 0.000 description 1
- FBHPRUXJQNWTEW-UHFFFAOYSA-N 1-benzyl-2-methylimidazole Chemical compound CC1=NC=CN1CC1=CC=CC=C1 FBHPRUXJQNWTEW-UHFFFAOYSA-N 0.000 description 1
- SFHLQWDTFRLTLY-UHFFFAOYSA-N 1-benzyl-3-dodecyl-2-methylimidazol-1-ium Chemical compound CCCCCCCCCCCCN1C=C[N+](CC=2C=CC=CC=2)=C1C SFHLQWDTFRLTLY-UHFFFAOYSA-N 0.000 description 1
- VLDPXPPHXDGHEW-UHFFFAOYSA-N 1-chloro-2-dichlorophosphoryloxybenzene Chemical compound ClC1=CC=CC=C1OP(Cl)(Cl)=O VLDPXPPHXDGHEW-UHFFFAOYSA-N 0.000 description 1
- DGZPBRFJRXDRDD-UHFFFAOYSA-N 1-chloro-4-(triethoxymethyl)dodecane Chemical compound ClCCCC(C(OCC)(OCC)OCC)CCCCCCCC DGZPBRFJRXDRDD-UHFFFAOYSA-N 0.000 description 1
- BMVXCPBXGZKUPN-UHFFFAOYSA-N 1-hexanamine Chemical compound CCCCCCN BMVXCPBXGZKUPN-UHFFFAOYSA-N 0.000 description 1
- PSQZJKGXDGNDFP-UHFFFAOYSA-N 2,2,3,3,3-pentafluoropropan-1-ol Chemical compound OCC(F)(F)C(F)(F)F PSQZJKGXDGNDFP-UHFFFAOYSA-N 0.000 description 1
- WXJFKAZDSQLPBX-UHFFFAOYSA-N 2,2,3,3,4,4,4-heptafluorobutan-1-ol Chemical compound OCC(F)(F)C(F)(F)C(F)(F)F WXJFKAZDSQLPBX-UHFFFAOYSA-N 0.000 description 1
- JUGSKHLZINSXPQ-UHFFFAOYSA-N 2,2,3,3,4,4,5,5-octafluoropentan-1-ol Chemical compound OCC(F)(F)C(F)(F)C(F)(F)C(F)F JUGSKHLZINSXPQ-UHFFFAOYSA-N 0.000 description 1
- GCZWJRLXIPVNLU-UHFFFAOYSA-N 2,2-dimethoxy-3-methylundecane Chemical compound CC(C(OC)(OC)C)CCCCCCCC GCZWJRLXIPVNLU-UHFFFAOYSA-N 0.000 description 1
- HZAXFHJVJLSVMW-UHFFFAOYSA-N 2-Aminoethan-1-ol Chemical compound NCCO HZAXFHJVJLSVMW-UHFFFAOYSA-N 0.000 description 1
- XNWFRZJHXBZDAG-UHFFFAOYSA-N 2-METHOXYETHANOL Chemical compound COCCO XNWFRZJHXBZDAG-UHFFFAOYSA-N 0.000 description 1
- GTEXIOINCJRBIO-UHFFFAOYSA-N 2-[2-(dimethylamino)ethoxy]-n,n-dimethylethanamine Chemical compound CN(C)CCOCCN(C)C GTEXIOINCJRBIO-UHFFFAOYSA-N 0.000 description 1
- RILZRCJGXSFXNE-UHFFFAOYSA-N 2-[4-(trifluoromethoxy)phenyl]ethanol Chemical compound OCCC1=CC=C(OC(F)(F)F)C=C1 RILZRCJGXSFXNE-UHFFFAOYSA-N 0.000 description 1
- PQAMFDRRWURCFQ-UHFFFAOYSA-N 2-ethyl-1h-imidazole Chemical compound CCC1=NC=CN1 PQAMFDRRWURCFQ-UHFFFAOYSA-N 0.000 description 1
- UJMZZAZBRIPOHZ-UHFFFAOYSA-N 2-ethylhexan-1-ol;titanium Chemical compound [Ti].CCCCC(CC)CO UJMZZAZBRIPOHZ-UHFFFAOYSA-N 0.000 description 1
- GGDYAKVUZMZKRV-UHFFFAOYSA-N 2-fluoroethanol Chemical compound OCCF GGDYAKVUZMZKRV-UHFFFAOYSA-N 0.000 description 1
- YTWBFUCJVWKCCK-UHFFFAOYSA-N 2-heptadecyl-1h-imidazole Chemical compound CCCCCCCCCCCCCCCCCC1=NC=CN1 YTWBFUCJVWKCCK-UHFFFAOYSA-N 0.000 description 1
- AFENDNXGAFYKQO-UHFFFAOYSA-N 2-hydroxybutyric acid Chemical compound CCC(O)C(O)=O AFENDNXGAFYKQO-UHFFFAOYSA-N 0.000 description 1
- LXBGSDVWAMZHDD-UHFFFAOYSA-O 2-methyl-1h-imidazol-3-ium Chemical compound CC=1NC=C[NH+]=1 LXBGSDVWAMZHDD-UHFFFAOYSA-O 0.000 description 1
- VWSLLSXLURJCDF-UHFFFAOYSA-N 2-methyl-4,5-dihydro-1h-imidazole Chemical compound CC1=NCCN1 VWSLLSXLURJCDF-UHFFFAOYSA-N 0.000 description 1
- QTWJRLJHJPIABL-UHFFFAOYSA-N 2-methylphenol;3-methylphenol;4-methylphenol Chemical compound CC1=CC=C(O)C=C1.CC1=CC=CC(O)=C1.CC1=CC=CC=C1O QTWJRLJHJPIABL-UHFFFAOYSA-N 0.000 description 1
- BSKHPKMHTQYZBB-UHFFFAOYSA-N 2-methylpyridine Chemical compound CC1=CC=CC=N1 BSKHPKMHTQYZBB-UHFFFAOYSA-N 0.000 description 1
- BKCCAYLNRIRKDJ-UHFFFAOYSA-N 2-phenyl-4,5-dihydro-1h-imidazole Chemical compound N1CCN=C1C1=CC=CC=C1 BKCCAYLNRIRKDJ-UHFFFAOYSA-N 0.000 description 1
- 125000000094 2-phenylethyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])C([H])([H])* 0.000 description 1
- FUOZJYASZOSONT-UHFFFAOYSA-N 2-propan-2-yl-1h-imidazole Chemical compound CC(C)C1=NC=CN1 FUOZJYASZOSONT-UHFFFAOYSA-N 0.000 description 1
- MKBBSFGKFMQPPC-UHFFFAOYSA-N 2-propyl-1h-imidazole Chemical compound CCCC1=NC=CN1 MKBBSFGKFMQPPC-UHFFFAOYSA-N 0.000 description 1
- LQJBNNIYVWPHFW-UHFFFAOYSA-N 20:1omega9c fatty acid Natural products CCCCCCCCCCC=CCCCCCCCC(O)=O LQJBNNIYVWPHFW-UHFFFAOYSA-N 0.000 description 1
- HDBGBTNNPRCVND-UHFFFAOYSA-N 3,3,3-trifluoropropan-1-ol Chemical compound OCCC(F)(F)F HDBGBTNNPRCVND-UHFFFAOYSA-N 0.000 description 1
- GBIQODZRWVTONF-UHFFFAOYSA-N 3-(2-cyanoethoxy)-3-[5-(2-cyanoethoxymethyl)-2-phenyl-1H-imidazol-4-yl]-2-methylpropanenitrile Chemical compound C(#N)C(C)C(C1=C(N=C(N1)C1=CC=CC=C1)COCCC#N)OCCC#N GBIQODZRWVTONF-UHFFFAOYSA-N 0.000 description 1
- UIDDPPKZYZTEGS-UHFFFAOYSA-N 3-(2-ethyl-4-methylimidazol-1-yl)propanenitrile Chemical compound CCC1=NC(C)=CN1CCC#N UIDDPPKZYZTEGS-UHFFFAOYSA-N 0.000 description 1
- SESYNEDUKZDRJL-UHFFFAOYSA-N 3-(2-methylimidazol-1-yl)propanenitrile Chemical compound CC1=NC=CN1CCC#N SESYNEDUKZDRJL-UHFFFAOYSA-N 0.000 description 1
- BVYPJEBKDLFIDL-UHFFFAOYSA-N 3-(2-phenylimidazol-1-yl)propanenitrile Chemical compound N#CCCN1C=CN=C1C1=CC=CC=C1 BVYPJEBKDLFIDL-UHFFFAOYSA-N 0.000 description 1
- SZUPZARBRLCVCB-UHFFFAOYSA-N 3-(2-undecylimidazol-1-yl)propanenitrile Chemical compound CCCCCCCCCCCC1=NC=CN1CCC#N SZUPZARBRLCVCB-UHFFFAOYSA-N 0.000 description 1
- HNNQYHFROJDYHQ-UHFFFAOYSA-N 3-(4-ethylcyclohexyl)propanoic acid 3-(3-ethylcyclopentyl)propanoic acid Chemical compound CCC1CCC(CCC(O)=O)C1.CCC1CCC(CCC(O)=O)CC1 HNNQYHFROJDYHQ-UHFFFAOYSA-N 0.000 description 1
- RNLHGQLZWXBQNY-UHFFFAOYSA-N 3-(aminomethyl)-3,5,5-trimethylcyclohexan-1-amine Chemical compound CC1(C)CC(N)CC(C)(CN)C1 RNLHGQLZWXBQNY-UHFFFAOYSA-N 0.000 description 1
- IIEWMRPKJCXTAD-UHFFFAOYSA-N 3-(trimethoxymethyl)undecane Chemical compound C(C)C(C(OC)(OC)OC)CCCCCCCC IIEWMRPKJCXTAD-UHFFFAOYSA-N 0.000 description 1
- WVRNUXJQQFPNMN-VAWYXSNFSA-N 3-[(e)-dodec-1-enyl]oxolane-2,5-dione Chemical compound CCCCCCCCCC\C=C\C1CC(=O)OC1=O WVRNUXJQQFPNMN-VAWYXSNFSA-N 0.000 description 1
- QEYMMOKECZBKAC-UHFFFAOYSA-N 3-chloropropanoic acid Chemical compound OC(=O)CCCl QEYMMOKECZBKAC-UHFFFAOYSA-N 0.000 description 1
- RDNPPYMJRALIIH-UHFFFAOYSA-N 3-methylcyclohex-3-ene-1,1,2,2-tetracarboxylic acid Chemical compound CC1=CCCC(C(O)=O)(C(O)=O)C1(C(O)=O)C(O)=O RDNPPYMJRALIIH-UHFFFAOYSA-N 0.000 description 1
- AFPHTEQTJZKQAQ-UHFFFAOYSA-N 3-nitrobenzoic acid Chemical compound OC(=O)C1=CC=CC([N+]([O-])=O)=C1 AFPHTEQTJZKQAQ-UHFFFAOYSA-N 0.000 description 1
- FXPCFGZWQHOKJF-UHFFFAOYSA-N 4-(1,1-diethoxyethyl)dodecan-1-amine Chemical compound NCCCC(C(OCC)(OCC)C)CCCCCCCC FXPCFGZWQHOKJF-UHFFFAOYSA-N 0.000 description 1
- GNPSQUCXOBDIDY-UHFFFAOYSA-N 4-(trimethoxymethyl)dodecane Chemical compound C(CCCCCCC)C(C(OC)(OC)OC)CCC GNPSQUCXOBDIDY-UHFFFAOYSA-N 0.000 description 1
- DFYGYTNMHPUJBY-UHFFFAOYSA-N 4-(trimethoxymethyl)dodecane-1-thiol Chemical compound SCCCC(C(OC)(OC)OC)CCCCCCCC DFYGYTNMHPUJBY-UHFFFAOYSA-N 0.000 description 1
- DZIHTWJGPDVSGE-UHFFFAOYSA-N 4-[(4-aminocyclohexyl)methyl]cyclohexan-1-amine Chemical compound C1CC(N)CCC1CC1CCC(N)CC1 DZIHTWJGPDVSGE-UHFFFAOYSA-N 0.000 description 1
- VQVIHDPBMFABCQ-UHFFFAOYSA-N 5-(1,3-dioxo-2-benzofuran-5-carbonyl)-2-benzofuran-1,3-dione Chemical compound C1=C2C(=O)OC(=O)C2=CC(C(C=2C=C3C(=O)OC(=O)C3=CC=2)=O)=C1 VQVIHDPBMFABCQ-UHFFFAOYSA-N 0.000 description 1
- TYOXIFXYEIILLY-UHFFFAOYSA-N 5-methyl-2-phenyl-1h-imidazole Chemical compound N1C(C)=CN=C1C1=CC=CC=C1 TYOXIFXYEIILLY-UHFFFAOYSA-N 0.000 description 1
- YPIFGDQKSSMYHQ-UHFFFAOYSA-N 7,7-dimethyloctanoic acid Chemical compound CC(C)(C)CCCCCC(O)=O YPIFGDQKSSMYHQ-UHFFFAOYSA-N 0.000 description 1
- ZCYVEMRRCGMTRW-UHFFFAOYSA-N 7553-56-2 Chemical group [I] ZCYVEMRRCGMTRW-UHFFFAOYSA-N 0.000 description 1
- OAOABCKPVCUNKO-UHFFFAOYSA-N 8-methyl Nonanoic acid Chemical compound CC(C)CCCCCCC(O)=O OAOABCKPVCUNKO-UHFFFAOYSA-N 0.000 description 1
- KNDQHSIWLOJIGP-UHFFFAOYSA-N 826-62-0 Chemical compound C1C2C3C(=O)OC(=O)C3C1C=C2 KNDQHSIWLOJIGP-UHFFFAOYSA-N 0.000 description 1
- OUJKZIYSFNAHHZ-UHFFFAOYSA-N 9,10-diphenylanthracene-1,2-diamine Chemical compound NC1=C(C2=C(C3=CC=CC=C3C(=C2C=C1)C1=CC=CC=C1)C1=CC=CC=C1)N OUJKZIYSFNAHHZ-UHFFFAOYSA-N 0.000 description 1
- QSBYPNXLFMSGKH-UHFFFAOYSA-N 9-Heptadecensaeure Natural products CCCCCCCC=CCCCCCCCC(O)=O QSBYPNXLFMSGKH-UHFFFAOYSA-N 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 1
- 239000004925 Acrylic resin Substances 0.000 description 1
- 229920000178 Acrylic resin Polymers 0.000 description 1
- 241000251468 Actinopterygii Species 0.000 description 1
- 229910017008 AsF 6 Inorganic materials 0.000 description 1
- 229910015900 BF3 Inorganic materials 0.000 description 1
- SAIKULLUBZKPDA-UHFFFAOYSA-N Bis(2-ethylhexyl) amine Chemical compound CCCCC(CC)CNCC(CC)CCCC SAIKULLUBZKPDA-UHFFFAOYSA-N 0.000 description 1
- LSNNMFCWUKXFEE-UHFFFAOYSA-M Bisulfite Chemical compound OS([O-])=O LSNNMFCWUKXFEE-UHFFFAOYSA-M 0.000 description 1
- BTBUEUYNUDRHOZ-UHFFFAOYSA-N Borate Chemical compound [O-]B([O-])[O-] BTBUEUYNUDRHOZ-UHFFFAOYSA-N 0.000 description 1
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical group [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 1
- JZHKIUBMQMDQRG-UHFFFAOYSA-N C(=C)C(C(OC)(OC)OC)CCCCCCCC Chemical compound C(=C)C(C(OC)(OC)OC)CCCCCCCC JZHKIUBMQMDQRG-UHFFFAOYSA-N 0.000 description 1
- BNIOOHXVEYTDJT-UHFFFAOYSA-N C(C)(C)C(C(OC)(OC)C(C)C)CCCCCCCC Chemical compound C(C)(C)C(C(OC)(OC)C(C)C)CCCCCCCC BNIOOHXVEYTDJT-UHFFFAOYSA-N 0.000 description 1
- QHZTWVUCCHJANV-UHFFFAOYSA-N C(C)(C)C(C(OC)(OC)OC)CCCCCCCC Chemical compound C(C)(C)C(C(OC)(OC)OC)CCCCCCCC QHZTWVUCCHJANV-UHFFFAOYSA-N 0.000 description 1
- MWNRZTCEWSRFPZ-UHFFFAOYSA-N C(C)(C)C(C(OCC)(OCC)C(C)C)CCCCCCCC Chemical compound C(C)(C)C(C(OCC)(OCC)C(C)C)CCCCCCCC MWNRZTCEWSRFPZ-UHFFFAOYSA-N 0.000 description 1
- AWDKVIUUINUYAI-UHFFFAOYSA-N C(C)(C)C(C(OCC)(OCC)OCC)CCCCCCCC Chemical compound C(C)(C)C(C(OCC)(OCC)OCC)CCCCCCCC AWDKVIUUINUYAI-UHFFFAOYSA-N 0.000 description 1
- DRJJXOPZDAJAPY-UHFFFAOYSA-N C(C)(C)OC(C(OC(C)C)(OC(C)C)OC(C)C)CCCCCCCC Chemical compound C(C)(C)OC(C(OC(C)C)(OC(C)C)OC(C)C)CCCCCCCC DRJJXOPZDAJAPY-UHFFFAOYSA-N 0.000 description 1
- QNGUFVBAHBNZGW-UHFFFAOYSA-N C(C)C(C(OC)(OC)CC)CCCCCCCC Chemical compound C(C)C(C(OC)(OC)CC)CCCCCCCC QNGUFVBAHBNZGW-UHFFFAOYSA-N 0.000 description 1
- XEPAKJGFUVCJOW-UHFFFAOYSA-N C(C)C(C(OCC)(OCC)CC)CCCCCCCC Chemical compound C(C)C(C(OCC)(OCC)CC)CCCCCCCC XEPAKJGFUVCJOW-UHFFFAOYSA-N 0.000 description 1
- UEYMLSDWUUKDND-UHFFFAOYSA-N C(C)C(C(OCC)(OCC)OCC)CCCCCCCC Chemical compound C(C)C(C(OCC)(OCC)OCC)CCCCCCCC UEYMLSDWUUKDND-UHFFFAOYSA-N 0.000 description 1
- PXUZMWOTICHNDV-UHFFFAOYSA-N C(C1=CC=CC=C1)NCCCC(C(OC)(OC)OC)CCCCCCCC Chemical compound C(C1=CC=CC=C1)NCCCC(C(OC)(OC)OC)CCCCCCCC PXUZMWOTICHNDV-UHFFFAOYSA-N 0.000 description 1
- BGURTEKVZCRPIG-UHFFFAOYSA-N C(C1CO1)OC(C(OC)(OC)OC)CCCCCCCC Chemical compound C(C1CO1)OC(C(OC)(OC)OC)CCCCCCCC BGURTEKVZCRPIG-UHFFFAOYSA-N 0.000 description 1
- KWADETUNAHTOCO-UHFFFAOYSA-N C(C=C/C(=O)OCC1=CC=CC=C1)(=O)OCC1=CC=CC=C1.C(CCC)[Sn]CCCC Chemical compound C(C=C/C(=O)OCC1=CC=CC=C1)(=O)OCC1=CC=CC=C1.C(CCC)[Sn]CCCC KWADETUNAHTOCO-UHFFFAOYSA-N 0.000 description 1
- OFTCDOQQZMYUJW-UHFFFAOYSA-N C(CC)C(C(OC)(OC)CCC)CCCCCCCC Chemical compound C(CC)C(C(OC)(OC)CCC)CCCCCCCC OFTCDOQQZMYUJW-UHFFFAOYSA-N 0.000 description 1
- ZYICQNMJAGPXKS-UHFFFAOYSA-N C(CC)C(C(OCC)(OCC)CCC)CCCCCCCC Chemical compound C(CC)C(C(OCC)(OCC)CCC)CCCCCCCC ZYICQNMJAGPXKS-UHFFFAOYSA-N 0.000 description 1
- AEBQXFPLZVQLLY-UHFFFAOYSA-N C(CC)OC(C(OCCC)(OCCC)OCCC)CCCCCCCC Chemical compound C(CC)OC(C(OCCC)(OCCC)OCCC)CCCCCCCC AEBQXFPLZVQLLY-UHFFFAOYSA-N 0.000 description 1
- IQUCDIIVDQWENU-UHFFFAOYSA-N C(CCC)C(C(OC)(OC)CCCC)CCCCCCCC Chemical compound C(CCC)C(C(OC)(OC)CCCC)CCCCCCCC IQUCDIIVDQWENU-UHFFFAOYSA-N 0.000 description 1
- GHTQBJZRHNNLIS-UHFFFAOYSA-N C(CCC)C(C(OC)(OC)OC)CCCCCCCC Chemical compound C(CCC)C(C(OC)(OC)OC)CCCCCCCC GHTQBJZRHNNLIS-UHFFFAOYSA-N 0.000 description 1
- UVPBWKQOKOQWOL-UHFFFAOYSA-N C(CCC)C(C(OCC)(OCC)CCCC)CCCCCCCC Chemical compound C(CCC)C(C(OCC)(OCC)CCCC)CCCCCCCC UVPBWKQOKOQWOL-UHFFFAOYSA-N 0.000 description 1
- FPYZFGNMCPBDBU-UHFFFAOYSA-N C(CCC)C(C(OCC)(OCC)OCC)CCCCCCCC Chemical compound C(CCC)C(C(OCC)(OCC)OCC)CCCCCCCC FPYZFGNMCPBDBU-UHFFFAOYSA-N 0.000 description 1
- DXQKRPJMNRDHBG-UHFFFAOYSA-N C(CCC)CCCCC(C(OC)(OC)OC)CCCCCCCC Chemical compound C(CCC)CCCCC(C(OC)(OC)OC)CCCCCCCC DXQKRPJMNRDHBG-UHFFFAOYSA-N 0.000 description 1
- NCGOVFJQJNGCCU-UHFFFAOYSA-N C(CCCC)C(C(OC)(OC)CCCCC)CCCCCCCC Chemical compound C(CCCC)C(C(OC)(OC)CCCCC)CCCCCCCC NCGOVFJQJNGCCU-UHFFFAOYSA-N 0.000 description 1
- BPDIDNOQBXCJJL-UHFFFAOYSA-N C(CCCC)C(C(OC)(OC)OC)CCCCCCCC Chemical compound C(CCCC)C(C(OC)(OC)OC)CCCCCCCC BPDIDNOQBXCJJL-UHFFFAOYSA-N 0.000 description 1
- QYGXFZURPXSVLU-UHFFFAOYSA-N C(CCCC)C(C(OCC)(OCC)CCCCC)CCCCCCCC Chemical compound C(CCCC)C(C(OCC)(OCC)CCCCC)CCCCCCCC QYGXFZURPXSVLU-UHFFFAOYSA-N 0.000 description 1
- HFGMVHHTDOXCCK-UHFFFAOYSA-N C(CCCCC)C(C(OCC)(OCC)CCCCCC)CCCCCCCC Chemical compound C(CCCCC)C(C(OCC)(OCC)CCCCCC)CCCCCCCC HFGMVHHTDOXCCK-UHFFFAOYSA-N 0.000 description 1
- QYMOEEIBCKABRQ-UHFFFAOYSA-N C(CCCCC)C(CCCCCCCCC)(OC)CCCCCC Chemical compound C(CCCCC)C(CCCCCCCCC)(OC)CCCCCC QYMOEEIBCKABRQ-UHFFFAOYSA-N 0.000 description 1
- SDMCCYXDOOOYDA-UHFFFAOYSA-N C(CCCCCC)C(C(OC)(OC)CCCCCCC)CCCCCCCC Chemical compound C(CCCCCC)C(C(OC)(OC)CCCCCCC)CCCCCCCC SDMCCYXDOOOYDA-UHFFFAOYSA-N 0.000 description 1
- OHEJQMYOWUSLBR-UHFFFAOYSA-N C(CCCCCC)C(C(OC)(OC)OC)CCCCCCCC Chemical compound C(CCCCCC)C(C(OC)(OC)OC)CCCCCCCC OHEJQMYOWUSLBR-UHFFFAOYSA-N 0.000 description 1
- OREFTJQAWUOUCL-UHFFFAOYSA-N C(CCCCCC)C(C(OCC)(OCC)CCCCCCC)CCCCCCCC Chemical compound C(CCCCCC)C(C(OCC)(OCC)CCCCCCC)CCCCCCCC OREFTJQAWUOUCL-UHFFFAOYSA-N 0.000 description 1
- YTRFOEIONLYOGA-UHFFFAOYSA-N C(CCCCCCC)C(C(OC)(OC)CCCCCCCC)CCCCCCCC Chemical compound C(CCCCCCC)C(C(OC)(OC)CCCCCCCC)CCCCCCCC YTRFOEIONLYOGA-UHFFFAOYSA-N 0.000 description 1
- HWGXBXCHAWZLMP-UHFFFAOYSA-N C(CCCCCCC)C(C(OCC)(OCC)CCCCCCCC)CCCCCCCC Chemical compound C(CCCCCCC)C(C(OCC)(OCC)CCCCCCCC)CCCCCCCC HWGXBXCHAWZLMP-UHFFFAOYSA-N 0.000 description 1
- JSGRIFNBTXDZQU-UHFFFAOYSA-N C1(=CC=CC=C1)C(C(OC)(OC)OC)CCCCCCCC Chemical compound C1(=CC=CC=C1)C(C(OC)(OC)OC)CCCCCCCC JSGRIFNBTXDZQU-UHFFFAOYSA-N 0.000 description 1
- STJBWPMXSJHEFV-UHFFFAOYSA-N C1(=CC=CC=C1)C(C(OCC)(OCC)C1=CC=CC=C1)CCCCCCCC Chemical compound C1(=CC=CC=C1)C(C(OCC)(OCC)C1=CC=CC=C1)CCCCCCCC STJBWPMXSJHEFV-UHFFFAOYSA-N 0.000 description 1
- WMAZOIVUIWQRKU-UHFFFAOYSA-N C1(=CC=CC=C1)C(C(OCC)(OCC)OCC)CCCCCCCC Chemical compound C1(=CC=CC=C1)C(C(OCC)(OCC)OCC)CCCCCCCC WMAZOIVUIWQRKU-UHFFFAOYSA-N 0.000 description 1
- IUUSJIOWNXNKSG-UHFFFAOYSA-N C1(=CC=CC=C1)OC1=CC=CC=C1.C(CCC)[Sn]CCCC Chemical compound C1(=CC=CC=C1)OC1=CC=CC=C1.C(CCC)[Sn]CCCC IUUSJIOWNXNKSG-UHFFFAOYSA-N 0.000 description 1
- CKZRZYXNAOOMJD-UHFFFAOYSA-N C1(CCCCC1)C(C(OCC)(OCC)OCC)CCCCCCCC Chemical compound C1(CCCCC1)C(C(OCC)(OCC)OCC)CCCCCCCC CKZRZYXNAOOMJD-UHFFFAOYSA-N 0.000 description 1
- QCSBUFGDWAFWTI-UHFFFAOYSA-N CC#N.CC#N.CC#N.CCOC(C)=O Chemical compound CC#N.CC#N.CC#N.CCOC(C)=O QCSBUFGDWAFWTI-UHFFFAOYSA-N 0.000 description 1
- MPCAWSKHXGFYAC-UHFFFAOYSA-N CC(=O)C.CC(=O)C.[Zr] Chemical compound CC(=O)C.CC(=O)C.[Zr] MPCAWSKHXGFYAC-UHFFFAOYSA-N 0.000 description 1
- LNEJJQMNHUGXDW-UHFFFAOYSA-N CC(C(OCC)(OCC)C)CCCCCCCC Chemical compound CC(C(OCC)(OCC)C)CCCCCCCC LNEJJQMNHUGXDW-UHFFFAOYSA-N 0.000 description 1
- PZKBIVOXIFYDRI-UHFFFAOYSA-N CC(C(OCC)(OCC)OCC)CCCCCCCC Chemical compound CC(C(OCC)(OCC)OCC)CCCCCCCC PZKBIVOXIFYDRI-UHFFFAOYSA-N 0.000 description 1
- FZSYTGPKNDUBKQ-UHFFFAOYSA-N CC1=CC=C(C=C1)CN2C=CN=C2C3=CC=CC=C3 Chemical compound CC1=CC=C(C=C1)CN2C=CN=C2C3=CC=CC=C3 FZSYTGPKNDUBKQ-UHFFFAOYSA-N 0.000 description 1
- QHJSCTNRFWNYID-UHFFFAOYSA-N CCC=COCCCC(C(OC)(OC)OC)CCCCCCCC Chemical compound CCC=COCCCC(C(OC)(OC)OC)CCCCCCCC QHJSCTNRFWNYID-UHFFFAOYSA-N 0.000 description 1
- CHQFUOLKDKTSEN-UHFFFAOYSA-N CCC=COCCCC(C(OCCC)(OCCC)OCCC)CCCCCCCC Chemical compound CCC=COCCCC(C(OCCC)(OCCC)OCCC)CCCCCCCC CHQFUOLKDKTSEN-UHFFFAOYSA-N 0.000 description 1
- SVYODTZWYXQVPM-UHFFFAOYSA-N CCCCCCCCC(CCCOC(=O)C(=CC)C)C(OCC)(OCC)OCC Chemical compound CCCCCCCCC(CCCOC(=O)C(=CC)C)C(OCC)(OCC)OCC SVYODTZWYXQVPM-UHFFFAOYSA-N 0.000 description 1
- OVINRBKOGQBTFM-UHFFFAOYSA-N COC(CCCCCCCCC)(OC)OC.ClCCC Chemical compound COC(CCCCCCCCC)(OC)OC.ClCCC OVINRBKOGQBTFM-UHFFFAOYSA-N 0.000 description 1
- LIOJOGAWBPJICS-UHFFFAOYSA-O Cl.C(C1=CC=CC=C1)[N+]1=C(NC=C1)C1=CC=CC=C1 Chemical compound Cl.C(C1=CC=CC=C1)[N+]1=C(NC=C1)C1=CC=CC=C1 LIOJOGAWBPJICS-UHFFFAOYSA-O 0.000 description 1
- 229910020366 ClO 4 Inorganic materials 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- MHZGKXUYDGKKIU-UHFFFAOYSA-N Decylamine Chemical class CCCCCCCCCCN MHZGKXUYDGKKIU-UHFFFAOYSA-N 0.000 description 1
- RPNUMPOLZDHAAY-UHFFFAOYSA-N Diethylenetriamine Chemical compound NCCNCCN RPNUMPOLZDHAAY-UHFFFAOYSA-N 0.000 description 1
- PIICEJLVQHRZGT-UHFFFAOYSA-N Ethylenediamine Chemical compound NCCN PIICEJLVQHRZGT-UHFFFAOYSA-N 0.000 description 1
- DCXXMTOCNZCJGO-UHFFFAOYSA-N Glycerol trioctadecanoate Natural products CCCCCCCCCCCCCCCCCC(=O)OCC(OC(=O)CCCCCCCCCCCCCCCCC)COC(=O)CCCCCCCCCCCCCCCCC DCXXMTOCNZCJGO-UHFFFAOYSA-N 0.000 description 1
- 239000002841 Lewis acid Substances 0.000 description 1
- 229920000106 Liquid crystal polymer Polymers 0.000 description 1
- 239000004977 Liquid-crystal polymers (LCPs) Substances 0.000 description 1
- CERQOIWHTDAKMF-UHFFFAOYSA-M Methacrylate Chemical compound CC(=C)C([O-])=O CERQOIWHTDAKMF-UHFFFAOYSA-M 0.000 description 1
- 241000428199 Mustelinae Species 0.000 description 1
- XEEHRQPQNJOFIQ-UHFFFAOYSA-N N(C1=CC=CC=C1)CCCC(C(OC)(OC)OC)CCCCCCCC Chemical compound N(C1=CC=CC=C1)CCCC(C(OC)(OC)OC)CCCCCCCC XEEHRQPQNJOFIQ-UHFFFAOYSA-N 0.000 description 1
- KWYHDKDOAIKMQN-UHFFFAOYSA-N N,N,N',N'-tetramethylethylenediamine Chemical compound CN(C)CCN(C)C KWYHDKDOAIKMQN-UHFFFAOYSA-N 0.000 description 1
- SVYKKECYCPFKGB-UHFFFAOYSA-N N,N-dimethylcyclohexylamine Chemical compound CN(C)C1CCCCC1 SVYKKECYCPFKGB-UHFFFAOYSA-N 0.000 description 1
- HDJGANPLOWXKTM-UHFFFAOYSA-N NC(=O)NCCCC(C(OCC)(OCC)OCC)CCCCCCCC Chemical compound NC(=O)NCCCC(C(OCC)(OCC)OCC)CCCCCCCC HDJGANPLOWXKTM-UHFFFAOYSA-N 0.000 description 1
- ZHVLGJXIAUOEBF-UHFFFAOYSA-N NCCCC(C(OC(C)C)(OC(C)C)OC(C)C)CCCCCCCC Chemical compound NCCCC(C(OC(C)C)(OC(C)C)OC(C)C)CCCCCCCC ZHVLGJXIAUOEBF-UHFFFAOYSA-N 0.000 description 1
- QZLZITSAKXSAMC-UHFFFAOYSA-N NCCCC(C(OC)(OC)C)CCCCCCCC Chemical compound NCCCC(C(OC)(OC)C)CCCCCCCC QZLZITSAKXSAMC-UHFFFAOYSA-N 0.000 description 1
- RJXVQQPBHWPOIB-UHFFFAOYSA-N NCCNCCCC(C(OC(C)C)(OC(C)C)OC(C)C)CCCCCCCC Chemical compound NCCNCCCC(C(OC(C)C)(OC(C)C)OC(C)C)CCCCCCCC RJXVQQPBHWPOIB-UHFFFAOYSA-N 0.000 description 1
- KTGXWDZUZLWXOF-UHFFFAOYSA-N NCCNCCCC(C(OC)(OC)C)CCCCCCCC Chemical compound NCCNCCCC(C(OC)(OC)C)CCCCCCCC KTGXWDZUZLWXOF-UHFFFAOYSA-N 0.000 description 1
- PEXBBTCNDBSFHT-UHFFFAOYSA-N NCCNCCCC(C(OC)(OC)OC)CCCCCCCC Chemical compound NCCNCCCC(C(OC)(OC)OC)CCCCCCCC PEXBBTCNDBSFHT-UHFFFAOYSA-N 0.000 description 1
- DCIXGUPVOHOLTK-UHFFFAOYSA-N NCCNCCCC(C(OCC)(OCC)C)CCCCCCCC Chemical compound NCCNCCCC(C(OCC)(OCC)C)CCCCCCCC DCIXGUPVOHOLTK-UHFFFAOYSA-N 0.000 description 1
- UAIIRSWVSPOAHZ-UHFFFAOYSA-N NCCNCCCC(C(OCC)(OCC)OCC)CCCCCCCC Chemical compound NCCNCCCC(C(OCC)(OCC)OCC)CCCCCCCC UAIIRSWVSPOAHZ-UHFFFAOYSA-N 0.000 description 1
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 1
- CEHXFEQFLHBPCH-UHFFFAOYSA-N OC(CC(C(OC)(OC)OC)CCCCCCCC)C Chemical compound OC(CC(C(OC)(OC)OC)CCCCCCCC)C CEHXFEQFLHBPCH-UHFFFAOYSA-N 0.000 description 1
- YUARDWTXWHETRD-UHFFFAOYSA-N OC(CC(C(OCC)(OCC)OCC)CCCCCCCC)C Chemical compound OC(CC(C(OCC)(OCC)OCC)CCCCCCCC)C YUARDWTXWHETRD-UHFFFAOYSA-N 0.000 description 1
- XKMUZFAHORAGFA-UHFFFAOYSA-N OCCC(C(OC)(OC)OC)CCCCCCCC Chemical compound OCCC(C(OC)(OC)OC)CCCCCCCC XKMUZFAHORAGFA-UHFFFAOYSA-N 0.000 description 1
- OLCHMAZGAIHNFV-UHFFFAOYSA-N OCCC(C(OCC)(OCC)OCC)CCCCCCCC Chemical compound OCCC(C(OCC)(OCC)OCC)CCCCCCCC OLCHMAZGAIHNFV-UHFFFAOYSA-N 0.000 description 1
- VKTDDRQOFNSZPM-UHFFFAOYSA-N OCCCC(C(OC)(OC)OC)CCCCCCCC Chemical compound OCCCC(C(OC)(OC)OC)CCCCCCCC VKTDDRQOFNSZPM-UHFFFAOYSA-N 0.000 description 1
- AKLAWVBBMOLVOX-UHFFFAOYSA-N OCCCC(C(OCC)(OCC)OCC)CCCCCCCC Chemical compound OCCCC(C(OCC)(OCC)OCC)CCCCCCCC AKLAWVBBMOLVOX-UHFFFAOYSA-N 0.000 description 1
- REYJJPSVUYRZGE-UHFFFAOYSA-N Octadecylamine Chemical compound CCCCCCCCCCCCCCCCCCN REYJJPSVUYRZGE-UHFFFAOYSA-N 0.000 description 1
- 239000005642 Oleic acid Substances 0.000 description 1
- ZQPPMHVWECSIRJ-UHFFFAOYSA-N Oleic acid Natural products CCCCCCCCC=CCCCCCCCC(O)=O ZQPPMHVWECSIRJ-UHFFFAOYSA-N 0.000 description 1
- LGRFSURHDFAFJT-UHFFFAOYSA-N Phthalic anhydride Natural products C1=CC=C2C(=O)OC(=O)C2=C1 LGRFSURHDFAFJT-UHFFFAOYSA-N 0.000 description 1
- 239000004721 Polyphenylene oxide Substances 0.000 description 1
- IWYDHOAUDWTVEP-UHFFFAOYSA-N R-2-phenyl-2-hydroxyacetic acid Natural products OC(=O)C(O)C1=CC=CC=C1 IWYDHOAUDWTVEP-UHFFFAOYSA-N 0.000 description 1
- KDNNKAKZKYHACO-UHFFFAOYSA-N SC(C(OCC)(OCC)OCC)CCCCCCCC Chemical compound SC(C(OCC)(OCC)OCC)CCCCCCCC KDNNKAKZKYHACO-UHFFFAOYSA-N 0.000 description 1
- KRWKYUMVNGWTNM-UHFFFAOYSA-N SCCCC(C(OCC)(OCC)OCC)CCCCCCCC Chemical compound SCCCC(C(OCC)(OCC)OCC)CCCCCCCC KRWKYUMVNGWTNM-UHFFFAOYSA-N 0.000 description 1
- 229910018286 SbF 6 Inorganic materials 0.000 description 1
- 229930182558 Sterol Natural products 0.000 description 1
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 1
- GSEJCLTVZPLZKY-UHFFFAOYSA-N Triethanolamine Chemical compound OCCN(CCO)CCO GSEJCLTVZPLZKY-UHFFFAOYSA-N 0.000 description 1
- GKXVJHDEWHKBFH-UHFFFAOYSA-N [2-(aminomethyl)phenyl]methanamine Chemical compound NCC1=CC=CC=C1CN GKXVJHDEWHKBFH-UHFFFAOYSA-N 0.000 description 1
- FDLQZKYLHJJBHD-UHFFFAOYSA-N [3-(aminomethyl)phenyl]methanamine Chemical compound NCC1=CC=CC(CN)=C1 FDLQZKYLHJJBHD-UHFFFAOYSA-N 0.000 description 1
- UUQQGGWZVKUCBD-UHFFFAOYSA-N [4-(hydroxymethyl)-2-phenyl-1h-imidazol-5-yl]methanol Chemical compound N1C(CO)=C(CO)N=C1C1=CC=CC=C1 UUQQGGWZVKUCBD-UHFFFAOYSA-N 0.000 description 1
- AZYZJSPCUMGVDB-UHFFFAOYSA-N [N]1C2=CC=C1C=C(N1)C=C(C)C1=CC([N]1)=CC=C1C=C(N1)C=CC1=C2 Chemical compound [N]1C2=CC=C1C=C(N1)C=C(C)C1=CC([N]1)=CC=C1C=C(N1)C=CC1=C2 AZYZJSPCUMGVDB-UHFFFAOYSA-N 0.000 description 1
- PHBMGNNAIBHRCI-UHFFFAOYSA-N [N]1C2=CC=C1C=C(N1)C=C(CC)C1=CC([N]1)=CC=C1C=C(N1)C=CC1=C2 Chemical compound [N]1C2=CC=C1C=C(N1)C=C(CC)C1=CC([N]1)=CC=C1C=C(N1)C=CC1=C2 PHBMGNNAIBHRCI-UHFFFAOYSA-N 0.000 description 1
- RVJLGERJGKHQJM-UHFFFAOYSA-N [Zr].C(C)#N Chemical compound [Zr].C(C)#N RVJLGERJGKHQJM-UHFFFAOYSA-N 0.000 description 1
- CQQXCSFSYHAZOO-UHFFFAOYSA-L [acetyloxy(dioctyl)stannyl] acetate Chemical compound CCCCCCCC[Sn](OC(C)=O)(OC(C)=O)CCCCCCCC CQQXCSFSYHAZOO-UHFFFAOYSA-L 0.000 description 1
- UKLDJPRMSDWDSL-UHFFFAOYSA-L [dibutyl(dodecanoyloxy)stannyl] dodecanoate Chemical compound CCCCCCCCCCCC(=O)O[Sn](CCCC)(CCCC)OC(=O)CCCCCCCCCCC UKLDJPRMSDWDSL-UHFFFAOYSA-L 0.000 description 1
- NBJODVYWAQLZOC-UHFFFAOYSA-L [dibutyl(octanoyloxy)stannyl] octanoate Chemical compound CCCCCCCC(=O)O[Sn](CCCC)(CCCC)OC(=O)CCCCCCC NBJODVYWAQLZOC-UHFFFAOYSA-L 0.000 description 1
- XQBCVRSTVUHIGH-UHFFFAOYSA-L [dodecanoyloxy(dioctyl)stannyl] dodecanoate Chemical compound CCCCCCCCCCCC(=O)O[Sn](CCCCCCCC)(CCCCCCCC)OC(=O)CCCCCCCCCCC XQBCVRSTVUHIGH-UHFFFAOYSA-L 0.000 description 1
- UZFVQGTYOXJWTF-UHFFFAOYSA-L [octadecanoyloxy(dioctyl)stannyl] octadecanoate Chemical compound CCCCCCCCCCCCCCCCCC(=O)O[Sn](CCCCCCCC)(CCCCCCCC)OC(=O)CCCCCCCCCCCCCCCCC UZFVQGTYOXJWTF-UHFFFAOYSA-L 0.000 description 1
- GTDPSWPPOUPBNX-UHFFFAOYSA-N ac1mqpva Chemical compound CC12C(=O)OC(=O)C1(C)C1(C)C2(C)C(=O)OC1=O GTDPSWPPOUPBNX-UHFFFAOYSA-N 0.000 description 1
- XLUXHEZIGIDTCC-UHFFFAOYSA-N acetonitrile;ethyl acetate Chemical compound CC#N.CCOC(C)=O XLUXHEZIGIDTCC-UHFFFAOYSA-N 0.000 description 1
- 239000003377 acid catalyst Substances 0.000 description 1
- 239000002390 adhesive tape Substances 0.000 description 1
- 230000001476 alcoholic effect Effects 0.000 description 1
- 125000002723 alicyclic group Chemical group 0.000 description 1
- 125000001931 aliphatic group Chemical group 0.000 description 1
- 150000001349 alkyl fluorides Chemical class 0.000 description 1
- OBETXYAYXDNJHR-UHFFFAOYSA-N alpha-ethylcaproic acid Natural products CCCCC(CC)C(O)=O OBETXYAYXDNJHR-UHFFFAOYSA-N 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 150000001408 amides Chemical class 0.000 description 1
- 125000002490 anilino group Chemical group [H]N(*)C1=C([H])C([H])=C([H])C([H])=C1[H] 0.000 description 1
- 125000002178 anthracenyl group Chemical group C1(=CC=CC2=CC3=CC=CC=C3C=C12)* 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- 150000004982 aromatic amines Chemical class 0.000 description 1
- 125000005018 aryl alkenyl group Chemical group 0.000 description 1
- 150000007860 aryl ester derivatives Chemical class 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 230000001580 bacterial effect Effects 0.000 description 1
- UHOVQNZJYSORNB-UHFFFAOYSA-N benzene Substances C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 1
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 1
- HZXXNQUMSGYIKQ-JRYLAINFSA-N bis(6-methylheptyl) (Z)-but-2-enedioate dibutyltin Chemical compound CCCC[Sn]CCCC.CC(C)CCCCCOC(=O)\C=C/C(=O)OCCCCCC(C)C HZXXNQUMSGYIKQ-JRYLAINFSA-N 0.000 description 1
- BCPQQVJRGVNJMJ-JRYLAINFSA-N bis(6-methylheptyl) (Z)-but-2-enedioate dioctyltin Chemical compound CCCCCCCC[Sn]CCCCCCCC.CC(C)CCCCCOC(=O)\C=C/C(=O)OCCCCCC(C)C BCPQQVJRGVNJMJ-JRYLAINFSA-N 0.000 description 1
- KGBXLFKZBHKPEV-UHFFFAOYSA-N boric acid Chemical compound OB(O)O KGBXLFKZBHKPEV-UHFFFAOYSA-N 0.000 description 1
- 239000004327 boric acid Substances 0.000 description 1
- 230000001680 brushing effect Effects 0.000 description 1
- 239000004566 building material Substances 0.000 description 1
- YHWCPXVTRSHPNY-UHFFFAOYSA-N butan-1-olate;titanium(4+) Chemical compound [Ti+4].CCCC[O-].CCCC[O-].CCCC[O-].CCCC[O-] YHWCPXVTRSHPNY-UHFFFAOYSA-N 0.000 description 1
- 239000001273 butane Substances 0.000 description 1
- JHIWVOJDXOSYLW-UHFFFAOYSA-N butyl 2,2-difluorocyclopropane-1-carboxylate Chemical compound CCCCOC(=O)C1CC1(F)F JHIWVOJDXOSYLW-UHFFFAOYSA-N 0.000 description 1
- DLIJPAHLBJIQHE-UHFFFAOYSA-N butylphosphane Chemical compound CCCCP DLIJPAHLBJIQHE-UHFFFAOYSA-N 0.000 description 1
- 239000011575 calcium Substances 0.000 description 1
- 229910052791 calcium Inorganic materials 0.000 description 1
- 239000004202 carbamide Substances 0.000 description 1
- BVKZGUZCCUSVTD-UHFFFAOYSA-N carbonic acid Chemical compound OC(O)=O BVKZGUZCCUSVTD-UHFFFAOYSA-N 0.000 description 1
- 150000001728 carbonyl compounds Chemical class 0.000 description 1
- 239000004568 cement Substances 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 229910000420 cerium oxide Inorganic materials 0.000 description 1
- 239000013522 chelant Substances 0.000 description 1
- 238000005660 chlorination reaction Methods 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- 125000001309 chloro group Chemical group Cl* 0.000 description 1
- HNEGQIOMVPPMNR-IHWYPQMZSA-N citraconic acid Chemical compound OC(=O)C(/C)=C\C(O)=O HNEGQIOMVPPMNR-IHWYPQMZSA-N 0.000 description 1
- 239000010941 cobalt Substances 0.000 description 1
- 229910017052 cobalt Inorganic materials 0.000 description 1
- 238000004891 communication Methods 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 238000006482 condensation reaction Methods 0.000 description 1
- 238000012790 confirmation Methods 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000007822 coupling agent Substances 0.000 description 1
- 238000005336 cracking Methods 0.000 description 1
- 229930003836 cresol Natural products 0.000 description 1
- WZHCOOQXZCIUNC-UHFFFAOYSA-N cyclandelate Chemical compound C1C(C)(C)CC(C)CC1OC(=O)C(O)C1=CC=CC=C1 WZHCOOQXZCIUNC-UHFFFAOYSA-N 0.000 description 1
- 125000001995 cyclobutyl group Chemical group [H]C1([H])C([H])([H])C([H])(*)C1([H])[H] 0.000 description 1
- 125000004850 cyclobutylmethyl group Chemical group C1(CCC1)C* 0.000 description 1
- 125000000582 cycloheptyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 1
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 1
- 125000004210 cyclohexylmethyl group Chemical group [H]C([H])(*)C1([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C1([H])[H] 0.000 description 1
- 125000000640 cyclooctyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C([H])([H])C1([H])[H] 0.000 description 1
- 125000006623 cyclooctylmethyl group Chemical group 0.000 description 1
- 125000001511 cyclopentyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C1([H])[H] 0.000 description 1
- 125000004851 cyclopentylmethyl group Chemical group C1(CCCC1)C* 0.000 description 1
- 125000001559 cyclopropyl group Chemical group [H]C1([H])C([H])([H])C1([H])* 0.000 description 1
- 125000004186 cyclopropylmethyl group Chemical group [H]C([H])(*)C1([H])C([H])([H])C1([H])[H] 0.000 description 1
- QQEWMMRFXYVLQU-UHFFFAOYSA-N decylhydrazine Chemical compound CCCCCCCCCCNN QQEWMMRFXYVLQU-UHFFFAOYSA-N 0.000 description 1
- 230000018044 dehydration Effects 0.000 description 1
- 238000006297 dehydration reaction Methods 0.000 description 1
- JGFBRKRYDCGYKD-UHFFFAOYSA-N dibutyl(oxo)tin Chemical compound CCCC[Sn](=O)CCCC JGFBRKRYDCGYKD-UHFFFAOYSA-N 0.000 description 1
- 239000012975 dibutyltin dilaurate Substances 0.000 description 1
- MDVDMJUUZDAHGR-LQLYOVJDSA-L dibutyltin(2+);(z)-2,3-di(tridecyl)but-2-enedioate Chemical compound CCCC[Sn+2]CCCC.CCCCCCCCCCCCC\C(C([O-])=O)=C(C([O-])=O)/CCCCCCCCCCCCC MDVDMJUUZDAHGR-LQLYOVJDSA-L 0.000 description 1
- JFHKCZFPXJVELF-UHFFFAOYSA-L dibutyltin(2+);2,2-diethylhexanoate Chemical compound CCCC[Sn+2]CCCC.CCCCC(CC)(CC)C([O-])=O.CCCCC(CC)(CC)C([O-])=O JFHKCZFPXJVELF-UHFFFAOYSA-L 0.000 description 1
- IIFKGJGNMKYHLT-FGSKAQBVSA-N dibutyltin;dimethyl (z)-but-2-enedioate Chemical compound CCCC[Sn]CCCC.COC(=O)\C=C/C(=O)OC IIFKGJGNMKYHLT-FGSKAQBVSA-N 0.000 description 1
- QGBSISYHAICWAH-UHFFFAOYSA-N dicyandiamide Chemical class NC(N)=NC#N QGBSISYHAICWAH-UHFFFAOYSA-N 0.000 description 1
- YAQSSDXHFZMMFG-UHFFFAOYSA-N didecylalumane Chemical compound C(CCCCCCCCC)[AlH]CCCCCCCCCC YAQSSDXHFZMMFG-UHFFFAOYSA-N 0.000 description 1
- 235000014113 dietary fatty acids Nutrition 0.000 description 1
- ZBCBWPMODOFKDW-UHFFFAOYSA-N diethanolamine Chemical compound OCCNCCO ZBCBWPMODOFKDW-UHFFFAOYSA-N 0.000 description 1
- HPNMFZURTQLUMO-UHFFFAOYSA-N diethylamine Chemical compound CCNCC HPNMFZURTQLUMO-UHFFFAOYSA-N 0.000 description 1
- 125000004639 dihydroindenyl group Chemical group C1(CCC2=CC=CC=C12)* 0.000 description 1
- HBGGXOJOCNVPFY-UHFFFAOYSA-N diisononyl phthalate Chemical compound CC(C)CCCCCCOC(=O)C1=CC=CC=C1C(=O)OCCCCCCC(C)C HBGGXOJOCNVPFY-UHFFFAOYSA-N 0.000 description 1
- 229940043279 diisopropylamine Drugs 0.000 description 1
- 239000000539 dimer Substances 0.000 description 1
- IUNMPGNGSSIWFP-UHFFFAOYSA-N dimethylaminopropylamine Chemical compound CN(C)CCCN IUNMPGNGSSIWFP-UHFFFAOYSA-N 0.000 description 1
- XXBDWLFCJWSEKW-UHFFFAOYSA-N dimethylbenzylamine Chemical compound CN(C)CC1=CC=CC=C1 XXBDWLFCJWSEKW-UHFFFAOYSA-N 0.000 description 1
- YOTZYFSGUCFUKA-UHFFFAOYSA-N dimethylphosphine Chemical compound CPC YOTZYFSGUCFUKA-UHFFFAOYSA-N 0.000 description 1
- LQRUPWUPINJLMU-UHFFFAOYSA-N dioctyl(oxo)tin Chemical compound CCCCCCCC[Sn](=O)CCCCCCCC LQRUPWUPINJLMU-UHFFFAOYSA-N 0.000 description 1
- LAWOZCWGWDVVSG-UHFFFAOYSA-N dioctylamine Chemical compound CCCCCCCCNCCCCCCCC LAWOZCWGWDVVSG-UHFFFAOYSA-N 0.000 description 1
- ZZTCPWRAHWXWCH-UHFFFAOYSA-N diphenylmethanediamine Chemical compound C=1C=CC=CC=1C(N)(N)C1=CC=CC=C1 ZZTCPWRAHWXWCH-UHFFFAOYSA-N 0.000 description 1
- GPAYUJZHTULNBE-UHFFFAOYSA-N diphenylphosphine Chemical compound C=1C=CC=CC=1PC1=CC=CC=C1 GPAYUJZHTULNBE-UHFFFAOYSA-N 0.000 description 1
- 238000007598 dipping method Methods 0.000 description 1
- WEHWNAOGRSTTBQ-UHFFFAOYSA-N dipropylamine Chemical compound CCCNCCC WEHWNAOGRSTTBQ-UHFFFAOYSA-N 0.000 description 1
- MTWCVKTUVWXLFS-UHFFFAOYSA-N dipropylphosphane Chemical compound CCCPCCC MTWCVKTUVWXLFS-UHFFFAOYSA-N 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
- 125000003438 dodecyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 229940079593 drug Drugs 0.000 description 1
- 239000003814 drug Substances 0.000 description 1
- 239000000975 dye Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 229920001971 elastomer Polymers 0.000 description 1
- 239000003822 epoxy resin Substances 0.000 description 1
- JDVIRCVIXCMTPU-UHFFFAOYSA-N ethanamine;trifluoroborane Chemical compound CCN.FB(F)F JDVIRCVIXCMTPU-UHFFFAOYSA-N 0.000 description 1
- 150000002170 ethers Chemical class 0.000 description 1
- 125000001301 ethoxy group Chemical group [H]C([H])([H])C([H])([H])O* 0.000 description 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- JLHMVTORNNQCRM-UHFFFAOYSA-N ethylphosphine Chemical compound CCP JLHMVTORNNQCRM-UHFFFAOYSA-N 0.000 description 1
- 125000002534 ethynyl group Chemical group [H]C#C* 0.000 description 1
- 229930195729 fatty acid Natural products 0.000 description 1
- 239000000194 fatty acid Substances 0.000 description 1
- 150000004665 fatty acids Chemical class 0.000 description 1
- 239000011152 fibreglass Substances 0.000 description 1
- 239000010419 fine particle Substances 0.000 description 1
- 239000005357 flat glass Substances 0.000 description 1
- 125000003983 fluorenyl group Chemical group C1(=CC=CC=2C3=CC=CC=C3CC12)* 0.000 description 1
- 125000001153 fluoro group Chemical group F* 0.000 description 1
- JSEWOPDRQAMJJS-UHFFFAOYSA-N formic acid nitrobenzene Chemical compound C(=O)O.[N+](=O)([O-])C1=CC=CC=C1 JSEWOPDRQAMJJS-UHFFFAOYSA-N 0.000 description 1
- 125000000524 functional group Chemical group 0.000 description 1
- 238000007646 gravure printing Methods 0.000 description 1
- 125000004051 hexyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 229910052740 iodine Inorganic materials 0.000 description 1
- JEIPFZHSYJVQDO-UHFFFAOYSA-N iron(III) oxide Inorganic materials O=[Fe]O[Fe]=O JEIPFZHSYJVQDO-UHFFFAOYSA-N 0.000 description 1
- 125000000959 isobutyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])* 0.000 description 1
- IQPQWNKOIGAROB-UHFFFAOYSA-N isocyanate Chemical compound [N-]=C=O IQPQWNKOIGAROB-UHFFFAOYSA-N 0.000 description 1
- 239000012948 isocyanate Substances 0.000 description 1
- 125000004491 isohexyl group Chemical group C(CCC(C)C)* 0.000 description 1
- QXJSBBXBKPUZAA-UHFFFAOYSA-N isooleic acid Natural products CCCCCCCC=CCCCCCCCCC(O)=O QXJSBBXBKPUZAA-UHFFFAOYSA-N 0.000 description 1
- 125000001972 isopentyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000003253 isopropoxy group Chemical group [H]C([H])([H])C([H])(O*)C([H])([H])[H] 0.000 description 1
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- JJWLVOIRVHMVIS-UHFFFAOYSA-N isopropylamine Chemical compound CC(C)N JJWLVOIRVHMVIS-UHFFFAOYSA-N 0.000 description 1
- 150000007517 lewis acids Chemical class 0.000 description 1
- 229940018564 m-phenylenediamine Drugs 0.000 description 1
- VZCYOOQTPOCHFL-UPHRSURJSA-N maleic acid Chemical compound OC(=O)\C=C/C(O)=O VZCYOOQTPOCHFL-UPHRSURJSA-N 0.000 description 1
- FPYJFEHAWHCUMM-UHFFFAOYSA-N maleic anhydride Chemical compound O=C1OC(=O)C=C1 FPYJFEHAWHCUMM-UHFFFAOYSA-N 0.000 description 1
- 229940099690 malic acid Drugs 0.000 description 1
- 229960002510 mandelic acid Drugs 0.000 description 1
- 229910052748 manganese Inorganic materials 0.000 description 1
- 239000011572 manganese Substances 0.000 description 1
- 125000002960 margaryl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 150000007974 melamines Chemical class 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 239000007769 metal material Substances 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 229940098779 methanesulfonic acid Drugs 0.000 description 1
- 125000000956 methoxy group Chemical group [H]C([H])([H])O* 0.000 description 1
- 125000006533 methyl amino methyl group Chemical group [H]N(C([H])([H])[H])C([H])([H])* 0.000 description 1
- VYKXQOYUCMREIS-UHFFFAOYSA-N methylhexahydrophthalic anhydride Chemical compound C1CCCC2C(=O)OC(=O)C21C VYKXQOYUCMREIS-UHFFFAOYSA-N 0.000 description 1
- SAWKFRBJGLMMES-UHFFFAOYSA-N methylphosphine Chemical compound PC SAWKFRBJGLMMES-UHFFFAOYSA-N 0.000 description 1
- 125000002950 monocyclic group Chemical group 0.000 description 1
- 125000001421 myristyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- ODGYWRBCQWKSSH-UHFFFAOYSA-N n'-ethylpropane-1,3-diamine Chemical compound CCNCCCN ODGYWRBCQWKSSH-UHFFFAOYSA-N 0.000 description 1
- QHJABUZHRJTCAR-UHFFFAOYSA-N n'-methylpropane-1,3-diamine Chemical compound CNCCCN QHJABUZHRJTCAR-UHFFFAOYSA-N 0.000 description 1
- ZETYUTMSJWMKNQ-UHFFFAOYSA-N n,n',n'-trimethylhexane-1,6-diamine Chemical compound CNCCCCCCN(C)C ZETYUTMSJWMKNQ-UHFFFAOYSA-N 0.000 description 1
- MDKQJOKKKZNQDG-UHFFFAOYSA-N n,n'-dimethylhexane-1,6-diamine Chemical compound CNCCCCCCNC MDKQJOKKKZNQDG-UHFFFAOYSA-N 0.000 description 1
- TXXWBTOATXBWDR-UHFFFAOYSA-N n,n,n',n'-tetramethylhexane-1,6-diamine Chemical compound CN(C)CCCCCCN(C)C TXXWBTOATXBWDR-UHFFFAOYSA-N 0.000 description 1
- DMQSHEKGGUOYJS-UHFFFAOYSA-N n,n,n',n'-tetramethylpropane-1,3-diamine Chemical compound CN(C)CCCN(C)C DMQSHEKGGUOYJS-UHFFFAOYSA-N 0.000 description 1
- DIAIBWNEUYXDNL-UHFFFAOYSA-N n,n-dihexylhexan-1-amine Chemical compound CCCCCCN(CCCCCC)CCCCCC DIAIBWNEUYXDNL-UHFFFAOYSA-N 0.000 description 1
- XTAZYLNFDRKIHJ-UHFFFAOYSA-N n,n-dioctyloctan-1-amine Chemical compound CCCCCCCCN(CCCCCCCC)CCCCCCCC XTAZYLNFDRKIHJ-UHFFFAOYSA-N 0.000 description 1
- OOHAUGDGCWURIT-UHFFFAOYSA-N n,n-dipentylpentan-1-amine Chemical compound CCCCCN(CCCCC)CCCCC OOHAUGDGCWURIT-UHFFFAOYSA-N 0.000 description 1
- ZSEBQUPNWHMZKA-UHFFFAOYSA-N n-butyloctadecan-1-amine Chemical compound CCCCCCCCCCCCCCCCCCNCCCC ZSEBQUPNWHMZKA-UHFFFAOYSA-N 0.000 description 1
- GMTCPFCMAHMEMT-UHFFFAOYSA-N n-decyldecan-1-amine Chemical compound CCCCCCCCCCNCCCCCCCCCC GMTCPFCMAHMEMT-UHFFFAOYSA-N 0.000 description 1
- LQKYCMRSWKQVBQ-UHFFFAOYSA-N n-dodecylaniline Chemical compound CCCCCCCCCCCCNC1=CC=CC=C1 LQKYCMRSWKQVBQ-UHFFFAOYSA-N 0.000 description 1
- MJCJUDJQDGGKOX-UHFFFAOYSA-N n-dodecyldodecan-1-amine Chemical compound CCCCCCCCCCCCNCCCCCCCCCCCC MJCJUDJQDGGKOX-UHFFFAOYSA-N 0.000 description 1
- 125000003136 n-heptyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000001280 n-hexyl group Chemical group C(CCCCC)* 0.000 description 1
- RIWRFSMVIUAEBX-UHFFFAOYSA-N n-methyl-1-phenylmethanamine Chemical compound CNCC1=CC=CC=C1 RIWRFSMVIUAEBX-UHFFFAOYSA-N 0.000 description 1
- VXPJBVRYAHYMNY-UHFFFAOYSA-N n-methyl-2-[2-(methylamino)ethoxy]ethanamine Chemical compound CNCCOCCNC VXPJBVRYAHYMNY-UHFFFAOYSA-N 0.000 description 1
- SZEGKVHRCLBFKJ-UHFFFAOYSA-N n-methyloctadecan-1-amine Chemical compound CCCCCCCCCCCCCCCCCCNC SZEGKVHRCLBFKJ-UHFFFAOYSA-N 0.000 description 1
- UEKWTIYPDJLSKK-UHFFFAOYSA-N n-octadecylaniline Chemical compound CCCCCCCCCCCCCCCCCCNC1=CC=CC=C1 UEKWTIYPDJLSKK-UHFFFAOYSA-N 0.000 description 1
- HKUFIYBZNQSHQS-UHFFFAOYSA-N n-octadecyloctadecan-1-amine Chemical compound CCCCCCCCCCCCCCCCCCNCCCCCCCCCCCCCCCCCC HKUFIYBZNQSHQS-UHFFFAOYSA-N 0.000 description 1
- 125000000740 n-pentyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- JACMPVXHEARCBO-UHFFFAOYSA-N n-pentylpentan-1-amine Chemical compound CCCCCNCCCCC JACMPVXHEARCBO-UHFFFAOYSA-N 0.000 description 1
- 125000003506 n-propoxy group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])O* 0.000 description 1
- 125000004123 n-propyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000001624 naphthyl group Chemical group 0.000 description 1
- 125000001971 neopentyl group Chemical group [H]C([*])([H])C(C([H])([H])[H])(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- PXHVJJICTQNCMI-UHFFFAOYSA-N nickel Substances [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 1
- 229910017604 nitric acid Inorganic materials 0.000 description 1
- FGHSTPNOXKDLKU-UHFFFAOYSA-N nitric acid;hydrate Chemical compound O.O[N+]([O-])=O FGHSTPNOXKDLKU-UHFFFAOYSA-N 0.000 description 1
- JFOJYGMDZRCSPA-UHFFFAOYSA-J octadecanoate;tin(4+) Chemical compound [Sn+4].CCCCCCCCCCCCCCCCCC([O-])=O.CCCCCCCCCCCCCCCCCC([O-])=O.CCCCCCCCCCCCCCCCCC([O-])=O.CCCCCCCCCCCCCCCCCC([O-])=O JFOJYGMDZRCSPA-UHFFFAOYSA-J 0.000 description 1
- IOQPZZOEVPZRBK-UHFFFAOYSA-N octan-1-amine Chemical compound CCCCCCCCN IOQPZZOEVPZRBK-UHFFFAOYSA-N 0.000 description 1
- ZQPPMHVWECSIRJ-KTKRTIGZSA-N oleic acid Chemical compound CCCCCCCC\C=C/CCCCCCCC(O)=O ZQPPMHVWECSIRJ-KTKRTIGZSA-N 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 150000002923 oximes Chemical class 0.000 description 1
- BMMGVYCKOGBVEV-UHFFFAOYSA-N oxo(oxoceriooxy)cerium Chemical compound [Ce]=O.O=[Ce]=O BMMGVYCKOGBVEV-UHFFFAOYSA-N 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 125000001312 palmitoyl group Chemical group O=C([*])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000002958 pentadecyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- DPBLXKKOBLCELK-UHFFFAOYSA-N pentan-1-amine Chemical compound CCCCCN DPBLXKKOBLCELK-UHFFFAOYSA-N 0.000 description 1
- VLTRZXGMWDSKGL-UHFFFAOYSA-M perchlorate Chemical compound [O-]Cl(=O)(=O)=O VLTRZXGMWDSKGL-UHFFFAOYSA-M 0.000 description 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 1
- RPGWZZNNEUHDAQ-UHFFFAOYSA-N phenylphosphine Chemical compound PC1=CC=CC=C1 RPGWZZNNEUHDAQ-UHFFFAOYSA-N 0.000 description 1
- 150000004714 phosphonium salts Chemical class 0.000 description 1
- 229910052698 phosphorus Inorganic materials 0.000 description 1
- 239000011574 phosphorus Substances 0.000 description 1
- 239000000049 pigment Substances 0.000 description 1
- DBIWHDFLQHGOCS-UHFFFAOYSA-N piperidine;trifluoroborane Chemical compound FB(F)F.C1CCNCC1 DBIWHDFLQHGOCS-UHFFFAOYSA-N 0.000 description 1
- 229920003217 poly(methylsilsesquioxane) Polymers 0.000 description 1
- 229920005668 polycarbonate resin Polymers 0.000 description 1
- 239000004431 polycarbonate resin Substances 0.000 description 1
- 229920000647 polyepoxide Polymers 0.000 description 1
- 229920001225 polyester resin Polymers 0.000 description 1
- 239000004645 polyester resin Substances 0.000 description 1
- 229920000570 polyether Polymers 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- 239000009719 polyimide resin Substances 0.000 description 1
- 229920005862 polyol Polymers 0.000 description 1
- 150000003077 polyols Chemical class 0.000 description 1
- 150000007519 polyprotic acids Polymers 0.000 description 1
- 229920001021 polysulfide Polymers 0.000 description 1
- 239000005077 polysulfide Substances 0.000 description 1
- 150000008117 polysulfides Polymers 0.000 description 1
- 229920006295 polythiol Polymers 0.000 description 1
- 239000011591 potassium Substances 0.000 description 1
- 229910052700 potassium Inorganic materials 0.000 description 1
- QROGIFZRVHSFLM-UHFFFAOYSA-N prop-1-enylbenzene Chemical group CC=CC1=CC=CC=C1 QROGIFZRVHSFLM-UHFFFAOYSA-N 0.000 description 1
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 1
- HNJBEVLQSNELDL-UHFFFAOYSA-N pyrrolidin-2-one Chemical compound O=C1CCCN1 HNJBEVLQSNELDL-UHFFFAOYSA-N 0.000 description 1
- 239000000376 reactant Substances 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 229920006395 saturated elastomer Polymers 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 230000011664 signaling Effects 0.000 description 1
- YUVZWFKROIQRKD-UHFFFAOYSA-N silane triethoxysilane Chemical compound [SiH4].CCO[SiH](OCC)OCC YUVZWFKROIQRKD-UHFFFAOYSA-N 0.000 description 1
- 235000013599 spices Nutrition 0.000 description 1
- 238000004528 spin coating Methods 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 125000004079 stearyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 150000003432 sterols Chemical class 0.000 description 1
- 235000003702 sterols Nutrition 0.000 description 1
- 125000005504 styryl group Chemical group 0.000 description 1
- 238000004381 surface treatment Methods 0.000 description 1
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- 238000010998 test method Methods 0.000 description 1
- 125000001712 tetrahydronaphthyl group Chemical group C1(CCCC2=CC=CC=C12)* 0.000 description 1
- 125000004149 thio group Chemical group *S* 0.000 description 1
- 150000003568 thioethers Chemical class 0.000 description 1
- 150000003573 thiols Chemical class 0.000 description 1
- 150000003585 thioureas Chemical class 0.000 description 1
- 230000036962 time dependent Effects 0.000 description 1
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 1
- VPYJNCGUESNPMV-UHFFFAOYSA-N triallylamine Chemical compound C=CCN(CC=C)CC=C VPYJNCGUESNPMV-UHFFFAOYSA-N 0.000 description 1
- 125000005409 triarylsulfonium group Chemical group 0.000 description 1
- 125000002889 tridecyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- RXJKFRMDXUJTEX-UHFFFAOYSA-N triethylphosphine Chemical compound CCP(CC)CC RXJKFRMDXUJTEX-UHFFFAOYSA-N 0.000 description 1
- WZCZNEGTXVXAAS-UHFFFAOYSA-N trifluoromethanol Chemical compound OC(F)(F)F WZCZNEGTXVXAAS-UHFFFAOYSA-N 0.000 description 1
- 125000005591 trimellitate group Chemical group 0.000 description 1
- SRPWOOOHEPICQU-UHFFFAOYSA-N trimellitic anhydride Chemical compound OC(=O)C1=CC=C2C(=O)OC(=O)C2=C1 SRPWOOOHEPICQU-UHFFFAOYSA-N 0.000 description 1
- BPSIOYPQMFLKFR-UHFFFAOYSA-N trimethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CO[Si](OC)(OC)CCCOCC1CO1 BPSIOYPQMFLKFR-UHFFFAOYSA-N 0.000 description 1
- ODHXBMXNKOYIBV-UHFFFAOYSA-N triphenylamine Chemical compound C1=CC=CC=C1N(C=1C=CC=CC=1)C1=CC=CC=C1 ODHXBMXNKOYIBV-UHFFFAOYSA-N 0.000 description 1
- 150000003672 ureas Chemical class 0.000 description 1
- 229910052720 vanadium Inorganic materials 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
- 239000001993 wax Substances 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D183/00—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers
- C09D183/04—Polysiloxanes
- C09D183/06—Polysiloxanes containing silicon bound to oxygen-containing groups
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L79/00—Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing nitrogen with or without oxygen or carbon only, not provided for in groups C08L61/00 - C08L77/00
- C08L79/02—Polyamines
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/04—Polysiloxanes
- C08G77/14—Polysiloxanes containing silicon bound to oxygen-containing groups
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/04—Oxygen-containing compounds
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Organic Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Wood Science & Technology (AREA)
- Life Sciences & Earth Sciences (AREA)
- Health & Medical Sciences (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Epoxy Resins (AREA)
- Paints Or Removers (AREA)
- Silicon Polymers (AREA)
Description
本發明係關於一種有機矽烷系組合物,尤其是關於一種對塑膠基板、金屬基板等之密接性優異,進而保存穩定性亦優異之組合物。The present invention relates to an organic decane-based composition, and more particularly to a composition which is excellent in adhesion to a plastic substrate or a metal substrate, and which is excellent in storage stability.
本申請案對2013年1月29日提出申請之日本專利申請案第2013-013845號、2013年5月16日提出申請之日本專利申請案第2013-104509號主張優先權,並將其內容引用於本文中。The present application claims priority to Japanese Patent Application No. 2013-013845, filed on Jan. 29, 2013, and the Japanese Patent Application No. 2013-104509, filed on May In this article.
聚碳酸酯等之透明塑膠成形體發揮輕量、易加工性、耐衝擊性等優點,而被廣泛用作無機玻璃製品之代替品,但具有容易被溶劑侵蝕、難以進行表面改質等缺點。因此,與無機玻璃相比仍有遜色之方面,業界自先前以來一直進行用以改良該等性質之嘗試。A transparent plastic molded body such as polycarbonate exhibits advantages such as light weight, easy processability, and impact resistance, and is widely used as a substitute for inorganic glass products, but has disadvantages such as being easily corroded by a solvent and being difficult to be surface-modified. Therefore, compared with inorganic glass, the industry has been trying to improve these properties since the past.
例如已知有使用硝酸水使縮水甘油氧基三甲氧基矽烷於醇中水解,進而添加二伸乙基三胺而進一步反應並進行塗佈,藉此,可於聚碳酸酯板上形成相當於鉛筆硬度2 H之硬塗膜。(非專利文獻1)For example, it is known that a glycidyloxytrimethoxydecane is hydrolyzed in an alcohol using nitric acid water, and further, a di-ethyltriamine is added to further react and coat, thereby forming an equivalent on a polycarbonate plate. Hard coating with a pencil hardness of 2 H. (Non-Patent Document 1)
非專利文獻1:J. Korean Ind. Eng. Chem., Vol17, No2, April 2006, 170 - 176.Non-Patent Document 1: J. Korean Ind. Eng. Chem., Vol17, No2, April 2006, 170 - 176.
然而,上述塗佈組合物存在水解需要24小時之長時間,塗膜後 之硬化亦需要15小時之作業性之問題,進而如下所述其保存穩定性亦存在問題。However, it takes 24 hours for the above coating composition to be hydrolyzed after coating. The hardening also requires 15 hours of workability, and there is also a problem in its storage stability as described below.
本發明係鑒於上述情況而成者,目的在於提供一種成為組合物A之原料之三烷氧基矽烷之水解縮合物之製造方法、及進而長期保存穩定性優異之組合物A之改良品,該組合物A可適用於包括塑膠在內之寬廣範圍之基材,可如玻璃般進行表面改質,可於短時間內製造,進而可以短時間之硬化獲得具有充分硬度之塗膜。The present invention has been made in view of the above circumstances, and an object of the invention is to provide a method for producing a hydrolysis condensate of a trialkoxysilane which is a raw material of the composition A, and an improved product of the composition A which is excellent in long-term storage stability. The composition A can be applied to a wide range of substrates including plastics, can be surface-modified like glass, can be produced in a short time, and can be hardened in a short time to obtain a coating film having sufficient hardness.
本發明者為了解決上述問題進行了努力研究,結果發現:僅將含環氧基三烷氧基矽烷與特定之聚胺類或咪唑類在水中進行短時間混合攪拌而獲得該三烷氧基矽烷之水解縮合物,含有該三烷氧基矽烷之水解縮合物之組合物可以塗佈後之加熱時間亦為短時間而獲得充分硬度之塗膜,從而完成本發明。進而發現:於含有含環氧基三烷氧基矽烷水解縮合物與聚胺類之組合物中進而將具有特定之pKa之有機酸或具有全氟烷基等之醇類混合攪拌所獲得之組合物之保存穩定性亦優異,從而完成本發明。The inventors of the present invention have diligently studied to solve the above problems, and as a result, have found that only the epoxy group-containing trialkoxy decane is mixed with a specific polyamine or imidazole in water for a short time to obtain the trialkoxy decane. The hydrolysis condensate and the composition containing the hydrolysis condensate of the trialkoxysilane can be obtained by coating a film having a sufficient hardness after a coating time is also short. Further, it has been found that a combination of an organic acid having a specific pKa or an alcohol having a perfluoroalkyl group or the like is further mixed in a composition containing a hydrolyzed condensate containing an epoxy group and a polyamine. The storage stability of the material is also excellent, thereby completing the present invention.
即,本發明係關於如下者:(1)一種含環氧基三烷氧基矽烷水解縮合物之製造方法,其係將含環氧基三烷氧基矽烷及/或其水解縮合物與水、及1分子內具有2個以上鍵結有1個以上氫原子之胺基或亞胺基之聚胺類或咪唑類進行混合、攪拌;(2)如(1)之含環氧基三烷氧基矽烷水解縮合物之製造方法,其於室溫下進行混合、攪拌;(3)如(1)之含環氧基三烷氧基矽烷水解縮合物之製造方法,其中聚胺類為聚伸烷基聚胺類;(4)如(1)之含環氧基三烷氧基矽烷水解縮合物之製造方法,其中 含環氧基三烷氧基矽烷為縮水甘油氧基烷基三烷氧基矽烷;(5)如(1)之含環氧基三烷氧基矽烷水解縮合物之製造方法,其中相對於含環氧基三烷氧基矽烷及/或其水解縮合物1莫耳,於0.5莫耳以上之範圍內使用水;以及(6)如(1)至(5)中任一項之含環氧基三烷氧基矽烷水解縮合物之製造方法,其中與酸一併進行混合、攪拌。That is, the present invention relates to the following: (1) A method for producing an epoxy group-containing trialkoxydecane hydrolyzed condensate, which comprises an epoxy group-containing trialkoxy decane and/or a hydrolysis condensate thereof and water And a polyamine or an imidazole having two or more amine groups or imine groups in which one or more hydrogen atoms are bonded in one molecule, and mixing and stirring; (2) an epoxy group-containing trioxane as in (1) a method for producing a oxoxane hydrolysis condensate, which is mixed and stirred at room temperature; (3) a method for producing an epoxy group-containing trialkoxy decane hydrolyzed condensate according to (1), wherein the polyamine is a poly (4) A method for producing an epoxy group-containing trialkoxy decane hydrolyzed condensate, (4), wherein The epoxy group-containing trialkoxy decane is a glycidoxyalkyltrialkoxy decane; (5) The method for producing an epoxy group-containing trialkoxy decane hydrolyzed condensate according to (1), wherein Epoxy trialkoxy decane and/or its hydrolysis condensate 1 mol, using water in a range of 0.5 mol or more; and (6) epoxy containing according to any one of (1) to (5) A method for producing a hydrazinyl decane hydrolyzed condensate, which is mixed with an acid and stirred.
又,本發明係關於如下者:(7)一種組合物,其含有:(A)含環氧基三烷氧基矽烷之水解縮合物、(B)聚胺類、及(C-1)正戊醇;(8)一種組合物,其含有:(A)含環氧基三烷氧基矽烷之水解縮合物、(B)聚胺類、及(C-2)25℃下之pKa為2.0~6.0之範圍之有機酸或具有全氟烷基及/或全氟伸烷基的碳數2~5之醇類;(9)如(8)之組合物,其中含環氧基三烷氧基矽烷之水解縮合物之利用動態光散射法所測得之z-平均粒徑為5~50nm之範圍;(10)如(8)之組合物,其中聚胺類係選自由伸烷基聚胺、聚伸烷基聚胺、聚(伸苯基伸烷基)聚胺、及伸環烷基烷基聚胺所組成之群中之至少1種聚胺;(11)如(8)之組合物,其中相對於含環氧基三烷氧基矽烷及/或其水解縮合物中之環氧基1莫耳,於1/(聚胺類1分子中之全部氮原子上之全部氫原子個數)莫耳以上且1/(聚胺類1分子中之全部氮原子上之全部氫原子個數)之10倍莫耳以下之範圍內使用聚胺類;(12)如(8)之組合物,其中相對於聚胺類1莫耳,於0.3~1.2莫耳之 範圍內使用pKa為2.0~6.0之範圍之有機酸;(13)如(8)之組合物,其中具有全氟烷基及/或全氟伸烷基之碳數2~5之醇類為組合物整體之30質量%以上;(14)如(8)之組合物,其進而含有除具有全氟烷基及/或全氟伸烷基之碳數2~5之醇類以外的碳數1~5之醇及水;以及(15)一種薄膜,其係將如(8)至(14)中任一項之組合物塗佈於基材上並進行室溫乾燥及/或加熱而獲得。Further, the present invention relates to the following: (7) A composition comprising: (A) a hydrolyzed condensate containing an epoxytrial trialkoxysilane, (B) a polyamine, and (C-1) a positive (8) A composition comprising: (A) a hydrolysis condensate containing an epoxytrial trialkoxysilane, (B) a polyamine, and (C-2) a pKa of 2.0 at 25 ° C An organic acid in the range of ~6.0 or an alcohol having a carbon number of 2 to 5 having a perfluoroalkyl group and/or a perfluoroalkyl group; (9) a composition according to (8), wherein the epoxy group is alkoxylated The z-average particle diameter of the hydrolyzed condensate of the decane which is measured by a dynamic light scattering method is in the range of 5 to 50 nm; (10) The composition according to (8), wherein the polyamine is selected from the group consisting of alkylene group At least one polyamine of the group consisting of an amine, a polyalkylene polyamine, a poly(phenylene alkylene) polyamine, and a cycloalkylalkyl polyamine; (11) a combination of (8) And all of the hydrogen atoms on the entire nitrogen atom of 1/(polyamine 1 molecule) with respect to the epoxy group 1 molar in the epoxy group-containing trialkoxy decane and/or its hydrolysis condensate Number 1) above the mole and 1/(the number of all hydrogen atoms on all nitrogen atoms in the polyamine 1 molecule) Polyamines are used in the range of 0 times moles or less; (12) The composition of (8), which is 0.3 to 1.2 moles relative to the polyamines 1 mole. An organic acid having a pKa in the range of 2.0 to 6.0 is used in the range; (13) a composition according to (8), wherein the alcohol having a perfluoroalkyl group and/or a perfluoroalkyl group having 2 to 5 carbon atoms is a combination The composition of (8), which further contains a carbon number other than the alcohol having a carbon number of 2 to 5 having a perfluoroalkyl group and/or a perfluoroalkyl group. And a (15) film obtained by applying the composition according to any one of (8) to (14) to a substrate and drying it at room temperature and/or heating.
根據本發明之製造方法,可於短時間內製造含環氧基三烷氧基矽烷之水解縮合物,因此亦可於短時間內製造含有該水解縮合物之組合物,進而,本發明之組合物可利用短時間之加熱在塑膠等基材上形成硬度、密接性、及外觀均優異之塗膜,進而可賦予絕緣性、耐腐蝕性。又,可於所獲得之薄膜上處理矽烷系撥水劑或單分子膜形成溶液等,而實施賦予耐溶劑性、撥水性等功能等基材表面之改質。According to the production method of the present invention, the hydrolysis-condensation product containing the epoxy-containing trialkoxy-decane can be produced in a short time, and therefore, the composition containing the hydrolysis-condensation product can be produced in a short time, and further, the combination of the present invention The material can be formed into a coating film excellent in hardness, adhesion, and appearance on a substrate such as plastic by heating for a short period of time, and further imparts insulation and corrosion resistance. Further, a decane-based water repellent or a monomolecular film-forming solution or the like can be treated on the obtained film to impart a modification to the surface of the substrate such as a function of imparting solvent resistance or water repellency.
又,本發明之組合物具有與利用上述非專利文獻1中記載之方法所獲得之含有該水解縮合物之組合物相同之功能,並且於其保存穩定性方面可見明顯之提高。Moreover, the composition of the present invention has the same function as the composition containing the hydrolysis-condensation product obtained by the method described in Non-Patent Document 1, and a significant improvement in storage stability can be seen.
圖1係表示經實施例1中獲得之組合物(A-1)處理之PC樹脂基板(B-1)之利用X射線光電子光譜法(ESCA)之膜之深度方向之元素濃度的圖。Fig. 1 is a graph showing the element concentration in the depth direction of a film by X-ray photoelectron spectroscopy (ESCA) of the PC resin substrate (B-1) treated with the composition (A-1) obtained in Example 1.
圖2係表示實施例5中獲得之使用各種溶劑之組合物中之固形物成分之z-平均粒徑之經時變化的圖。Fig. 2 is a graph showing the temporal change of the z-average particle diameter of the solid content in the composition using various solvents obtained in Example 5.
圖3係表示實施例7中獲得之使用各種溶劑之組合物中之固形物成分之z-平均粒徑之經時變化的圖。Fig. 3 is a graph showing the temporal change of the z-average particle diameter of the solid content in the composition using various solvents obtained in Example 7.
圖4係表示實施例8中獲得之使用各種溶劑之組合物中之固形物 成分之z-平均粒徑之經時變化的圖。Figure 4 is a graph showing the solid matter in the composition obtained in Example 8 using various solvents. A graph of the change in z-average particle size over time.
圖5係表示經實施例9中獲得之用組合物(A-1)處理之PC樹脂基板(B-1)之利用X射線光電子光譜法(ESCA)之膜之深度方向之元素濃度的圖。Fig. 5 is a graph showing the element concentration in the depth direction of the film by X-ray photoelectron spectroscopy (ESCA) of the PC resin substrate (B-1) treated with the composition (A-1) obtained in Example 9.
圖6係表示實施例10中獲得之苯甲酸之含量不同之組合物中之固形物成分之z-平均粒徑之經時變化的圖。Fig. 6 is a graph showing changes with time in the z-average particle diameter of the solid content in the composition in which the content of benzoic acid obtained in Example 10 is different.
圖7係表示實施例11中獲得之使用各種有機酸而獲得之組合物中之固形物成分之z-平均粒徑之經時變化的圖。Fig. 7 is a graph showing the temporal change of the z-average particle diameter of the solid content in the composition obtained by using various organic acids obtained in Example 11.
本發明之含環氧基三烷氧基矽烷水解縮合物之製造方法係將含環氧基三烷氧基矽烷及/或其水解縮合物與水、及聚胺類或咪唑類進行混合、攪拌者。The method for producing an epoxy group-containing trialkoxy decane hydrolyzed condensate of the present invention comprises mixing and stirring an epoxy group-containing trialkoxy decane and/or a hydrolysis condensate thereof with water, a polyamine or an imidazole. By.
非專利文獻1中記載之先前之製造方法係使用含環氧基三烷氧基矽烷與碳數1~5之醇、水、及無機酸或有機酸等酸進行水解縮合的方法,聚胺類或咪唑類通常係於其後添加而製備組合物,但於此種方法中,存在水解縮合之步驟具較長時間,又,於使所獲得之含有水解物之組合物硬化之情形時,為了使該塗膜具備充分之硬度,亦需要長時間且高溫之加熱的問題,而缺乏實用性。本發明之方法係藉由於聚胺類或咪唑類之存在下製備該三烷氧基矽烷之水解縮合物,而可製造克服先前缺點之組合物。The prior production method described in Non-Patent Document 1 is a method of hydrolyzing and condensing an epoxy group-containing trialkoxysilane with an alcohol having 1 to 5 carbon atoms, water, and an acid such as an inorganic acid or an organic acid, and a polyamine. Or an imidazole is usually added afterwards to prepare a composition, but in this method, the step of hydrolytic condensation is carried out for a long period of time, and in the case where the obtained hydrolyzate-containing composition is hardened, The coating film is provided with sufficient hardness, and also requires a long time and high temperature heating, and lacks practicality. The process of the present invention produces a composition which overcomes the aforementioned disadvantages by preparing a hydrolysis condensate of the trialkoxysilane in the presence of a polyamine or an imidazole.
再者,藉由本發明之製造方法所獲得之含環氧基三烷氧基矽烷之水解縮合物為含環氧基三烷氧基矽烷經縮合而成之聚合物或低聚物。於原料已為水解縮合物之情形時,產物為水解縮合物經進一步水解縮合而成者。Further, the hydrolysis-condensation product containing an epoxy group-containing trialkoxysilane obtained by the production method of the present invention is a polymer or oligomer obtained by condensing an epoxy group-containing trialkoxysilane. When the raw material is already a hydrolyzed condensate, the product is a hydrolyzed condensate which is further hydrolyzed and condensed.
本發明之方法所使用之含環氧基三烷氧基矽烷只要為因水解等而失去之官能基部分以外含有環氧基之三烷氧基矽烷,則其結構並無特別限制,例如可例示下述式(I)所表示之化合物。The epoxy group-containing trialkoxy decane to be used in the method of the present invention is not particularly limited as long as it is an epoxy group-containing trialkoxy decane other than the functional group moiety lost by hydrolysis or the like, and for example, it can be exemplified. A compound represented by the following formula (I).
R-Si(OR1 )3 ...(I)R-Si(OR 1 ) 3 ...(I)
(式中,R表示具有環氧基或縮水甘油氧基之烴基,R1 表示未經取代或具有取代基之碳數1~10之烷基)(wherein R represents a hydrocarbon group having an epoxy group or a glycidoxy group, and R 1 represents an unsubstituted or substituted alkyl group having 1 to 10 carbon atoms)
R中,環氧基或縮水甘油氧基只要含有1個以上即可,較佳為含有1~3個,亦可含有環氧基、縮水甘油氧基兩者。In R, the epoxy group or the glycidoxy group may be one or more, preferably one to three, and may contain both an epoxy group and a glycidoxy group.
作為R之「具有環氧基或縮水甘油氧基之烴基」之「烴基」,具體而言,可例示:烷基、環烷基、環烷基烷基、烯基、環烯基、炔基、芳基、芳烷基、芳烯基等,作為碳數,較佳為1~30個之範圍,進而較佳為1~10個之範圍。Specific examples of the "hydrocarbon group" of the "hydrocarbon group having an epoxy group or a glycidoxy group" of R include an alkyl group, a cycloalkyl group, a cycloalkylalkyl group, an alkenyl group, a cycloalkenyl group, and an alkynyl group. The aryl group, the aralkyl group, the aralkenyl group or the like is preferably in the range of 1 to 30, more preferably in the range of 1 to 10, as the carbon number.
作為「烷基」,具體而言,可例示:甲基、乙基、正丙基、異丙基、正丁基、異丁基、第三丁基、正戊基、異戊基、新戊基、正己基、異己基、正庚基、正辛基、正壬基、異壬基、正癸基等;月桂基、十三烷基、肉豆蔻基、十五烷基、棕櫚基、十七烷基、硬脂基等。Specific examples of the "alkyl group" include methyl group, ethyl group, n-propyl group, isopropyl group, n-butyl group, isobutyl group, tert-butyl group, n-pentyl group, isopentyl group, and neopentyl group. Base, n-hexyl, isohexyl, n-heptyl, n-octyl, n-decyl, isodecyl, n-decyl, etc.; lauryl, tridecyl, myristyl, pentadecyl, palmitoyl, ten Heptadecyl, stearyl and the like.
作為「環烷基」,具體而言,可例示:環丙基、環丁基、環戊基、環己基、環庚基、環辛基等。Specific examples of the "cycloalkyl group" include a cyclopropyl group, a cyclobutyl group, a cyclopentyl group, a cyclohexyl group, a cycloheptyl group, and a cyclooctyl group.
作為「環烷基烷基」,具體而言,可例示:環丙基甲基、環丙基乙基、環丙基丙基、環丁基甲基、環戊基甲基、環己基甲基、環庚基甲基、環辛基甲基等,較佳為碳數3~10之環烷基與碳數1~10之烷基鍵結。Specific examples of the "cycloalkylalkyl group" include a cyclopropylmethyl group, a cyclopropylethyl group, a cyclopropylpropyl group, a cyclobutylmethyl group, a cyclopentylmethyl group, a cyclohexylmethyl group, and a ring. Heptylmethyl, cyclooctylmethyl, etc., preferably a cycloalkyl group having 3 to 10 carbon atoms bonded to an alkyl group having 1 to 10 carbon atoms.
作為「烯基」,具體而言,可例示:乙烯基、1-丙烯-1-基、烯丙基、1-丁烯-1-基、2-丁烯-1-基、3-丁烯-1-基、1-丁烯-2-基、3-丁烯- 2-基、1-戊烯-1-基、4-戊烯-1-基、1-戊烯-2-基、4-戊烯-2-基、3-甲基-1-丁烯-1-基、1-己烯-1-基、5-己烯-1-基、1-庚烯-1-基、6-庚烯-1-基、1-辛烯-1-基、7-辛烯-1-基、1,3-丁二烯-1-基等。Specific examples of the "alkenyl group" include a vinyl group, a 1-propen-1-yl group, an allyl group, a 1-buten-1-yl group, a 2-buten-1-yl group, and a 3-butene group. -1-yl, 1-buten-2-yl, 3-butene- 2-yl, 1-penten-1-yl, 4-penten-1-yl, 1-penten-2-yl, 4-penten-2-yl, 3-methyl-1-butene- 1-yl, 1-hexen-1-yl, 5-hexen-1-yl, 1-hepten-1-yl, 6-hepten-1-yl, 1-octene-1-yl, 7 - Octene-1-yl, 1,3-butadien-1-yl and the like.
作為「環烯基」,具體而言,可例示:1-環戊烯-1-基、2-環戊烯-1-基、1-環己烯-1-基、2-環己烯-1-基、3-環己烯-1-基等。Specific examples of the "cycloalkenyl group" include 1-cyclopenten-1-yl, 2-cyclopenten-1-yl, 1-cyclohexen-1-yl, 2-cyclohexene- 1-yl, 3-cyclohexen-1-yl and the like.
作為「炔基」,具體而言,可例示:乙炔基、1-丙炔-1-基、2-丙炔-1-基、1-丁炔-1-基、3-丁炔-1-基、1-戊炔-1-基、4-戊炔-1-基、1-己炔-1-基、5-己炔-1-基、1-庚炔-1-基、1-辛炔-1-基、7-辛炔-1-基等。Specific examples of the "alkynyl group" include an ethynyl group, a 1-propyn-1-yl group, a 2-propyn-1-yl group, a 1-butyn-1-yl group, and a 3-butyne-1- , 1-pentyn-1-yl, 4-pentyn-1-yl, 1-hexyn-1-yl, 5-hexyn-1-yl, 1-heptyn-1-yl, 1-octyl Alkyn-1-yl, 7-octyn-1-yl and the like.
「芳基」意指單環或多環之芳基,於多環芳基之情形時,除完全不飽和之基以外,亦包含部分飽和之基。具體而言,可例示:苯基、萘基、薁基、茚基、二氫茚基、四氫萘基等。"Aryl" means a monocyclic or polycyclic aryl group which, in the case of a polycyclic aryl group, contains a partially saturated group in addition to the fully unsaturated group. Specifically, a phenyl group, a naphthyl group, an anthracenyl group, a fluorenyl group, a dihydroindenyl group, a tetrahydronaphthyl group, etc. are illustrated.
作為「芳烷基」,具體而言,可例示:苄基、苯乙基、3-苯基-正丙基、4-苯基-正丁基、5-苯基-正戊基、8-苯基-正辛基等,較佳為碳數6-10之芳基與碳數1~10之烷基鍵結而成之基。Specific examples of the "aralkyl group" include a benzyl group, a phenethyl group, a 3-phenyl-n-propyl group, a 4-phenyl-n-butyl group, a 5-phenyl-n-pentyl group, and a 8-phenyl group. Phenyl-n-octyl or the like is preferably a group in which an aryl group having 6 to 10 carbon atoms is bonded to an alkyl group having 1 to 10 carbon atoms.
「芳烯基」係芳基與烯基鍵結而成之基,具體而言,可例示:苯乙烯基、3-苯基-1-丙烯-1-基、3-苯基-2-丙烯-1-基、4-苯基-1-丁烯-1-基、4-苯基-3-丁烯-1-基、5-苯基-1-戊烯-1-基、5-苯基-4-戊烯-1-基、8-苯基-1-辛烯-1-基、8-苯基-7-辛烯-1-基、萘基乙烯基等,較佳為碳數6~10之芳基與碳數2~10之烯基鍵結而成之基。The "arylalkenyl group" is a group in which an aryl group and an alkenyl group are bonded, and specifically, a styryl group, a 3-phenyl-1-propen-1-yl group, and a 3-phenyl-2-propene group are exemplified. -1-yl, 4-phenyl-1-buten-1-yl, 4-phenyl-3-buten-1-yl, 5-phenyl-1-penten-1-yl, 5-benzene Alkyl-4-penten-1-yl, 8-phenyl-1-octene-1-yl, 8-phenyl-7-octene-1-yl, naphthylvinyl, etc., preferably carbon number A group of 6 to 10 aryl groups bonded to an alkenyl group having 2 to 10 carbon atoms.
於上述「烴基」中亦可具有除環氧基及縮水甘油氧基以外之取代基,作為此種取代基,具體而言,可例示:鹵素原子、烷基、烯基、烷氧基、(甲基)丙烯醯氧基等。Further, the above-mentioned "hydrocarbon group" may have a substituent other than the epoxy group and the glycidoxy group. Specific examples of such a substituent include a halogen atom, an alkyl group, an alkenyl group, an alkoxy group, and Methyl) acryloxy group or the like.
此處,作為鹵素原子,具體而言,可例示:氟原子、氯原子、溴原子、碘原子等。Here, specific examples of the halogen atom include a fluorine atom, a chlorine atom, a bromine atom, and an iodine atom.
作為烷氧基,具體而言,可例示:甲氧基、乙氧基、正丙氧 基、異丙氧基、正丁氧基、異丁氧基、第三丁氧基等。Specific examples of the alkoxy group include a methoxy group, an ethoxy group, and a n-propoxy group. Base, isopropoxy, n-butoxy, isobutoxy, tert-butoxy and the like.
作為烷基、烯基,可例示與上述R中之烷基、烯基相同之具體例。Specific examples of the alkyl group and the alkenyl group which are the same as the alkyl group and the alkenyl group in the above R can be exemplified.
作為R1 之「未經取代或具有取代基之碳數1~10之烷基」之「碳數1~10之烷基」,可例示與上述R中之烷基相同者。The "alkyl group having 1 to 10 carbon atoms" of the "unsubstituted or substituted alkyl group having 1 to 10 carbon atoms" of R 1 may be the same as the alkyl group in the above R.
作為「具有取代基」之取代基,具體而言,可例示:鹵素原子、烷氧基、(甲基)丙烯醯氧基等。作為鹵素原子、烷氧基,具體而言,可例示與作為上述R中之除環氧基及縮水甘油氧基以外之取代所例示之鹵素原子、烷氧基相同之具體例。Specific examples of the substituent having a "substituent group" include a halogen atom, an alkoxy group, and a (meth) acryloxy group. Specific examples of the halogen atom and the alkoxy group are the same as those exemplified as the halogen atom and the alkoxy group exemplified as the substituent other than the epoxy group and the glycidoxy group in the above R.
作為原料之含環氧基三烷氧基矽烷或其水解縮合物,具體而言,可例示下述化合物,但並不限定於此。又,該等可單獨使用1種或混合2種以上使用。Specific examples of the epoxy group-containing trialkoxysilane or the hydrolysis-condensation product thereof include the following compounds, but are not limited thereto. Further, these may be used alone or in combination of two or more.
[化1]
其中,較佳為縮水甘油氧基烷基三烷氧基矽烷、或縮水甘油氧基烯基烷氧基矽烷,具體而言,可例示下述式所示之化合物。Among them, a glycidoxyalkyltrialkalkoxydecane or a glycidoxyalkenyl alkoxydecane is preferable, and specifically, a compound represented by the following formula can be exemplified.
[化2]
該等可單獨使用1種或混合2種以上使用。These may be used alone or in combination of two or more.
於本發明之製造方法中,可於上述含環氧基三烷氧基矽烷中適當添加四烷氧基矽烷類、除含環氧基三烷氧基矽烷以外之三烷氧基矽烷類、或二烷氧基矽烷類而使用。作為此種烷氧基矽烷類,具體而言,可例示:四甲氧基矽烷、四乙氧基矽烷、四(正丙氧基)矽烷、四(異丙氧基)矽烷、四(正丁氧基)矽烷等四烷氧基矽烷類;甲基三甲氧基矽烷、甲基三乙氧基矽烷、乙基三甲氧基矽烷、乙基三乙氧基矽烷、正丙基三甲氧基矽烷、正丙基三乙氧基矽烷、異丙基三甲氧基矽烷、異丙基三乙氧基矽烷、正丁基三甲氧基矽烷、正丁基三乙氧基矽烷、正戊基三甲氧基矽烷、正己基三甲氧基矽烷、正庚基三甲氧基矽烷、正辛基三甲氧基矽烷、乙烯基三甲氧基矽烷、乙烯基三乙氧基矽烷、烯丙基三甲氧基矽烷、環己基三甲氧基矽烷、環己基三乙氧基矽烷、苯基三甲氧基矽烷、苯基三乙氧基矽烷、3-氯丙 基三甲氧基矽烷、3-氯丙基三乙氧基矽烷、3,3,3-三氟丙基三甲氧基矽烷、3,3,3-三氟丙基三乙氧基矽烷、九氟己基三甲氧基矽烷、十三氟辛基三甲氧基矽烷、十七氟癸基三甲氧基矽烷、三氟丙基三乙氧基矽烷、十三氟辛基三乙氧基矽烷、十七氟癸基三乙氧基矽烷、3-胺基丙基三甲氧基矽烷、3-胺基丙基三乙氧基矽烷、2-羥基乙基三甲氧基矽烷、2-羥基乙基三乙氧基矽烷、2-羥基丙基三甲氧基矽烷、2-羥基丙基三乙氧基矽烷、3-羥基丙基三甲氧基矽烷、3-羥基丙基三乙氧基矽烷、3-巰基丙基三甲氧基矽烷、3-巰基丙基三乙氧基矽烷、3-異氰酸酯基丙基三甲氧基矽烷、3-異氰酸酯基丙基三乙氧基矽烷、3-(甲基)丙烯醯氧基丙基三甲氧基矽烷、3-(甲基)甲基丙烯醯氧基丙基三乙氧基矽烷、3-(甲基)丙烯醯氧基丙基三正丙氧基矽烷、3-(甲基)丙烯醯氧基丙基三異丙氧基矽烷、3-脲基丙基三甲氧基矽烷、3-脲基丙基三乙氧基矽烷等三烷氧基矽烷類;二甲基二甲氧基矽烷、二甲基二乙氧基矽烷、二乙基二甲氧基矽烷、二乙基二乙氧基矽烷、二正丙基二甲氧基矽烷、二正丙基二乙氧基矽烷、二異丙基二甲氧基矽烷、二異丙基二乙氧基矽烷、二正丁基二甲氧基矽烷、二正丁基二乙氧基矽烷、二正戊基二甲氧基矽烷、二正戊基二乙氧基矽烷、二正己基二甲氧基矽烷、二正己基二乙氧基矽烷、二正庚基二甲氧基矽烷、二正庚基二乙氧基矽烷、二正辛基二甲氧基矽烷、二正辛基二乙氧基矽烷、二正環己基二甲氧基矽烷、二正環己基二乙氧基矽烷、二苯基二甲氧基矽烷、二苯基二乙氧基矽烷、3-(甲基)丙烯醯氧基丙基甲基二甲氧基矽烷、十七氟癸基甲基二甲氧基矽烷等二烷氧基矽烷類等,亦可同樣地使用該等之部分水解縮合物。作為此種部分水解縮合物,具體而言,可例示:三菱化學公司製造之商品名「MKC Silicate MS51」、「MKC Silicate MS56」、「MKC Silicate MS57」、「MKC Silicate MS60」(均為四甲氧基矽烷之縮合 物);Colcoat公司製造之商品名「Ethyl Silicate 40」、「Ethyl Silicate 48」(均為四乙氧基矽烷之縮合物)等,又,作為所含有之烷基不同之四烷氧基矽烷之縮合物之具體例,可例示:三菱化學公司製造之商品名「MKC Silicate MS56B15」、「MKC Silicate MS56B30」、「MKC Silicate MS58B15」、「MKC Silicate MS56I30」、「MKC Silicate MS56F20」;Colcoat公司製造之商品名「EMS-485」等。In the production method of the present invention, a tetraalkoxy decane or a trialkoxy decane other than the epoxy-containing trialkoxy decane may be appropriately added to the epoxy group-containing trialkoxy decane, or Used as a dialkoxy decane. Specific examples of such alkoxydecanes include tetramethoxydecane, tetraethoxydecane, tetra(n-propoxy)decane, tetra(isopropoxy)decane, and tetra(n-butyl). a tetraalkoxynonane such as oxy)decane; methyltrimethoxydecane, methyltriethoxydecane, ethyltrimethoxydecane, ethyltriethoxydecane, n-propyltrimethoxydecane, N-propyl triethoxy decane, isopropyl trimethoxy decane, isopropyl triethoxy decane, n-butyl trimethoxy decane, n-butyl triethoxy decane, n-pentyl trimethoxy decane , n-hexyltrimethoxydecane, n-heptyltrimethoxydecane, n-octyltrimethoxydecane, vinyltrimethoxydecane, vinyltriethoxydecane,allyltrimethoxydecane,cyclohexyltrimethyl Oxydecane, cyclohexyltriethoxydecane, phenyltrimethoxydecane, phenyltriethoxydecane, 3-chloropropane Trimethoxy decane, 3-chloropropyltriethoxy decane, 3,3,3-trifluoropropyltrimethoxydecane, 3,3,3-trifluoropropyltriethoxydecane, nonafluoro Hexyltrimethoxydecane, tridecafluorooctyltrimethoxydecane, heptadecafluorodecyltrimethoxydecane,trifluoropropyltriethoxydecane,tridecafluorooctyltriethoxydecane,heptadecafluoro Mercapto triethoxy decane, 3-aminopropyl trimethoxy decane, 3-aminopropyl triethoxy decane, 2-hydroxyethyl trimethoxy decane, 2-hydroxyethyl triethoxy Decane, 2-hydroxypropyltrimethoxydecane, 2-hydroxypropyltriethoxydecane, 3-hydroxypropyltrimethoxydecane, 3-hydroxypropyltriethoxydecane, 3-mercaptopropyltrimethyl Oxydecane, 3-mercaptopropyltriethoxydecane, 3-isocyanatepropyltrimethoxydecane, 3-isocyanatepropyltriethoxydecane, 3-(methyl)propenyloxypropyl Trimethoxydecane, 3-(methyl)methacryloxypropyltriethoxydecane, 3-(methyl)propenyloxypropyltri-n-propoxydecane, 3-(methyl) Propylene methoxypropyl triisopropoxy decane a trialkoxy decane such as 3-ureidopropyltrimethoxydecane or 3-ureidopropyltriethoxydecane; dimethyldimethoxydecane, dimethyldiethoxydecane, and diethyl Dimethoxy decane, diethyl diethoxy decane, di-n-propyl dimethoxy decane, di-n-propyl diethoxy decane, diisopropyl dimethoxy decane, diisopropyl Diethoxydecane, di-n-butyldimethoxydecane, di-n-butyldiethoxydecane, di-n-pentyldimethoxydecane, di-n-pentyldiethoxydecane, di-n-hexyl Methoxydecane, di-n-hexyldiethoxydecane, di-n-heptyldimethoxydecane, di-n-heptyldiethoxydecane, di-n-octyldimethoxydecane, di-n-octyldiethyl Oxy decane, di-n-cyclohexyl dimethoxy decane, di-n-cyclohexyl diethoxy decane, diphenyl dimethoxy decane, diphenyl diethoxy decane, 3-(methyl) propylene oxime As the dialkoxy decane such as oxypropylmethyldimethoxydecane or heptadecafluoromethyldimethoxydecane, the partially hydrolyzed condensate may be used in the same manner. Specific examples of such a partially hydrolyzed condensate include "MKC Silicate MS51", "MKC Silicate MS56", "MKC Silicate MS57", and "MKC Silicate MS60" manufactured by Mitsubishi Chemical Corporation. Condensation of oxydecane "Ethyl Silicate 40" manufactured by Colcoat, "Ethyl Silicate 48" (all condensates of tetraethoxy decane), etc., and as a tetraalkyloxydecane having a different alkyl group. Specific examples of the condensate include: "MKC Silicate MS56B15", "MKC Silicate MS56B30", "MKC Silicate MS58B15", "MKC Silicate MS56I30", and "MKC Silicate MS56F20" manufactured by Mitsubishi Chemical Corporation; manufactured by Colcoat The product name is "EMS-485".
於本發明之方法中所使用之水之量只要為足以使所使用之含環氧基三烷氧基矽烷及/或其水解縮合物某程度地水解縮合之量以上,則並無特別限制,具體而言,相對於所使用之含環氧基三烷氧基矽烷及/或其水解縮合物(其中,於併用含環氧基三烷氧基矽烷及其水解縮合物之情形時,表示該兩者之合計,又,於併用除含環氧基三烷氧基矽烷以外之烷氧基矽烷之情形時,亦表示其等整體之合計)1莫耳,較佳為0.5莫耳以上,進而較佳為1.0莫耳以上、2.0莫耳以上、5.0莫耳以上、或10莫耳以上。The amount of water used in the method of the present invention is not particularly limited as long as it is sufficient to hydrolyze or condense the epoxy group-containing trialkoxysilane and/or its hydrolysis-condensation product to some extent. Specifically, it is represented by the case where the epoxy group-containing trialkoxy decane and/or its hydrolysis condensate is used, wherein the epoxy group-containing trialkoxy decane and its hydrolysis condensate are used in combination In the case of a combination of alkoxy decanes other than the epoxy-containing trialkoxy decane, the total of the two is also 1 mol, preferably 0.5 mol or more. It is preferably 1.0 mol or more, 2.0 mol or more, 5.0 mol or more, or 10 mol or more.
本發明所使用之聚胺類只要為1分子中具有2個以上鍵結有1個以上氫原子之胺基或亞胺基之化合物,則並無特別限制,具體而言,可例示:乙二胺、三亞甲基二胺、四亞甲基二胺、六亞甲基二胺、二伸乙基三胺、三伸乙基四胺、四伸乙基五胺、二伸丙基三胺、甲基胺基丙基胺、乙基胺基丙基胺、N,N'-二甲基六亞甲基二胺、雙(2-甲基胺基乙基)醚、薄荷烷二胺、異佛爾酮二胺、3,9-雙(3-胺基丙基)-2,4,8,10-四氧螺(5,5)十一烷加成物、雙(4-胺基環己基)甲烷、鄰苯二胺、間苯二胺、對苯二胺、二胺基二苯基甲烷、二胺基二苯基碸、間苯二甲胺等,該等可單獨使用1種或混合2種以上使用。其中,較佳為聚伸烷基聚胺類,具體而言,可例示:二伸乙基三胺、三伸乙基四 胺、四伸乙基五胺、二伸丙基三胺等。The polyamine to be used in the present invention is not particularly limited as long as it has two or more amine groups or imine groups having one or more hydrogen atoms bonded thereto, and specifically, it can be exemplified: Amine, trimethylenediamine, tetramethylenediamine, hexamethylenediamine, diethylidene triamine, triethylidenetetramine, tetraethylamamine, dipropyltriamine, Methylaminopropylamine, ethylaminopropylamine, N,N'-dimethylhexamethylenediamine, bis(2-methylaminoethyl)ether, menthanediamine, iso Vorketone diamine, 3,9-bis(3-aminopropyl)-2,4,8,10-tetraoxaspiro(5,5)undecane adduct, bis(4-amino ring Hexyl)methane, o-phenylenediamine, m-phenylenediamine, p-phenylenediamine, diaminodiphenylmethane, diaminodiphenylanthracene, m-xylylenediamine, etc., which may be used alone or Mix two or more types. Among them, preferred are polyalkylene polyamines, and specific examples thereof include di-ethyltriamine and tri-ethylidene Amine, tetraethylamamine, dipropyltriamine, and the like.
所使用之聚胺類之使用量並無特別限制,較佳為相對於含環氧基三烷氧基矽烷及/或其水解縮合物中之環氧基1莫耳使用1/(聚胺類1分子中之全部氮原子上之全部氫原子個數)莫耳以上,較佳為1/(聚胺類1分子中之全部氮原子上之全部氫原子個數)之1.2倍~10倍莫耳之範圍、1.5倍~5倍莫耳、或1.8倍~2.5倍莫耳之範圍。於低於1/(聚胺類1分子中之全部氮原子上之全部氫原子個數)莫耳之情形時,有硬化不充分,而無法獲得較高硬度之膜之情形,於高於1/(聚胺類1分子中之全部氮原子上之全部氫原子個數)之10倍莫耳之情形時,有殘存聚胺類而無法獲得充分硬度之膜之情形。The amount of the polyamine to be used is not particularly limited, and it is preferred to use 1/(polyamine) relative to the epoxy group containing 1 -(epoxy group) in the epoxy group-containing trialkoxy decane and/or its hydrolysis condensate. 1.2 times to 10 times the number of all hydrogen atoms on all nitrogen atoms in one molecule, more than moles, preferably 1/(the total number of hydrogen atoms on all nitrogen atoms in the polyamine 1 molecule) The range of the ear, 1.5 times to 5 times the molar, or 1.8 times to 2.5 times the range of the molar. In the case of less than 1/(the total number of hydrogen atoms on all nitrogen atoms in the polyamine 1 molecule), there is a case where the hardening is insufficient, and a film having a higher hardness cannot be obtained, which is higher than 1 When 10% of the total number of hydrogen atoms on all nitrogen atoms in the polyamine-based one molecule is 10 moles, there is a case where a polyamine is left and a film having sufficient hardness cannot be obtained.
又,作為本發明所使用之咪唑類,具體而言,可例示:咪唑、2-甲基咪唑、2-乙基咪唑、2-異丙基咪唑、2-正丙基咪唑、2-十一烷基-1H-咪唑、2-十七烷基-1H-咪唑、1,2-二甲基咪唑、2-乙基-4-甲基咪唑、2-苯基-1H-咪唑、4-甲基-2-苯基-1H-咪唑、2-苯基-4-甲基咪唑、1-苄基-2-甲基咪唑、1-氰乙基-2-甲基咪唑、1-氰乙基-2-乙基-4-甲基咪唑、1-氰乙基-2-十一烷基咪唑、1-氰乙基-2-苯基咪唑、1-氰乙基-2-乙基-4-甲基咪唑鎓偏苯三酸鹽、1-氰乙基-2-十一烷基咪唑鎓偏苯三酸鹽、1-氰乙基-2-苯基咪唑鎓偏苯三酸鹽、2,4-二胺基-6-[2'-甲基咪唑基-(1')]-乙基-均三、2,4-二胺基-6-(2'-十一烷基咪唑基-)-乙基-均三、2,4-二胺基-6-[2'-乙基-4-咪唑基-(1')]-乙基-均三、2,4-二胺基-6-[2'-甲基咪唑基-(1')]-乙基-均三異三聚氰酸加成物、2-苯基咪唑異三聚氰酸加成物、2-甲基咪唑異三聚氰酸加成物、2-苯基-4,5-二羥基甲基咪唑、2-苯基-4-甲基-5-羥基甲基咪唑、1-氰乙基-2-苯基-4,5-二(2-氰基乙氧基)甲基咪唑、氯化1-十二烷基-2-甲基-3-苄基咪唑鎓、1-苄基-2-苯基咪唑鹽酸鹽、1-苄基-2-苯基咪唑鎓偏苯三酸鹽 等,該等可單獨使用1種或混合2種以上使用。Further, as the imidazole to be used in the present invention, specifically, imidazole, 2-methylimidazole, 2-ethylimidazole, 2-isopropylimidazole, 2-n-propylimidazole, 2-111 can be exemplified. Alkyl-1H-imidazole, 2-heptadecyl-1H-imidazole, 1,2-dimethylimidazole, 2-ethyl-4-methylimidazole, 2-phenyl-1H-imidazole, 4-methyl Benzyl-2-phenyl-1H-imidazole, 2-phenyl-4-methylimidazole, 1-benzyl-2-methylimidazole, 1-cyanoethyl-2-methylimidazole, 1-cyanoethyl 2-ethyl-4-methylimidazole, 1-cyanoethyl-2-undecylimidazole, 1-cyanoethyl-2-phenylimidazole, 1-cyanoethyl-2-ethyl-4 -methylimidazolium trimellitate, 1-cyanoethyl-2-undecylimidazolium trimellitate, 1-cyanoethyl-2-phenylimidazolium trimellitate, 2 ,4-diamino-6-[2'-methylimidazolyl-(1')]-ethyl-all three 2,4-Diamino-6-(2'-undecylimidazolyl-)-ethyl-all three 2,4-Diamino-6-[2'-ethyl-4-imidazolyl-(1')]-ethyl-all three 2,4-Diamino-6-[2'-methylimidazolyl-(1')]-ethyl-all three Iso-cyanuric acid adduct, 2-phenylimidazolium isocyanurate adduct, 2-methylimidazolium iso-cyanate adduct, 2-phenyl-4,5-dihydroxymethyl Imidazole, 2-phenyl-4-methyl-5-hydroxymethylimidazole, 1-cyanoethyl-2-phenyl-4,5-di(2-cyanoethoxy)methylimidazole, chlorination 1-dodecyl-2-methyl-3-benzylimidazolium, 1-benzyl-2-phenylimidazolium hydrochloride, 1-benzyl-2-phenylimidazolium trimellitate, etc. These may be used alone or in combination of two or more.
所使用之咪唑類之量只要為觸媒量以上,則並無特別限制,相對於所使用之三烷氧基矽烷所含有之環氧基1莫耳,較佳為0.001~1.0莫耳之範圍,進而較佳為0.001~0.5莫耳、或0.01~0.1莫耳之範圍。The amount of the imidazole to be used is not particularly limited as long as it is at least the amount of the catalyst, and is preferably in the range of 0.001 to 1.0 mol per mol of the epoxy group contained in the trialkoxysilane to be used. Further preferably, it is in the range of 0.001 to 0.5 mol, or 0.01 to 0.1 mol.
於本發明中,較佳為視需要於水解步驟中進而使酸共存而進行該步驟。In the present invention, it is preferred to carry out this step as needed in the hydrolysis step to further coexist acid.
作為所使用之酸,具體而言,可例示有機酸、無機酸等,更具體而言,作為有機酸,可例示:乙酸、甲酸、草酸、碳酸、鄰苯二甲酸、三氟乙酸、對甲苯磺酸、甲磺酸等,作為無機酸,可例示:鹽酸、硝酸、硼酸、氟硼酸等,其中,較佳為使用20℃下之pKa為2.0~6.0之範圍之有機酸。作為此種有機酸,具體而言,可例示:甲酸、乙酸、丙酸、丁酸、異丁酸、戊酸、異戊酸、己酸、異己酸、氯乙酸、氟乙酸、溴乙酸、3-氯丙酸、2-溴丙酸、2-羥基丁酸、苯乙酸、苯丙酸、4-苯丁酸、苯氧基乙酸、氰乙酸、草酸、丙二酸、2,2-二甲基丙二酸、己二酸、琥珀酸、庚二酸、鄰苯二甲酸、戊二酸、草醯乙酸、檸檬酸、異檸檬酸、環己烷-1,1-二羧酸、酒石酸、鄰甲氧苯甲酸、間甲氧苯甲酸、對甲氧苯甲酸、苯甲酸、鄰氯苯甲酸、間氟苯甲酸、2,3-二氟苯甲酸、鄰硝基苯甲酸、間硝基苯甲酸、對硝基苯甲酸、間胺基苯甲酸、對胺基苯甲酸、水楊酸、鄰苯二甲酸、間苯二甲酸、反式-肉桂酸、2-呋喃甲酸、乙醛酸、乙醇酸、丁烯酸、乳酸、2-羥基-2-甲基丙酸、丙酮酸、苦杏仁酸、蘋果酸、乙醯丙酸、2,6-吡啶二羧酸、菸鹼酸等。所使用之酸之量並無特別限制,相對於所使用之聚胺類或咪唑類1莫耳,較佳為0.3~1.2莫耳之範圍,進而較佳為0.5~1.0莫耳、或0.6~0.9莫耳之範圍。Specific examples of the acid to be used include an organic acid, an inorganic acid, and the like. More specifically, examples of the organic acid include acetic acid, formic acid, oxalic acid, carbonic acid, phthalic acid, trifluoroacetic acid, and p-toluene. Sulfonic acid, methanesulfonic acid, etc., and the inorganic acid may, for example, be hydrochloric acid, nitric acid, boric acid or fluoroboric acid. Among them, an organic acid having a pKa at 20 ° C of 2.0 to 6.0 is preferably used. Specific examples of such an organic acid include formic acid, acetic acid, propionic acid, butyric acid, isobutyric acid, valeric acid, isovaleric acid, caproic acid, isohexanoic acid, chloroacetic acid, fluoroacetic acid, and bromoacetic acid. - chloropropionic acid, 2-bromopropionic acid, 2-hydroxybutyric acid, phenylacetic acid, phenylpropionic acid, 4-phenylbutyric acid, phenoxyacetic acid, cyanoacetic acid, oxalic acid, malonic acid, 2,2-dimethyl Malonic acid, adipic acid, succinic acid, pimelic acid, phthalic acid, glutaric acid, oxalic acid, citric acid, isocitric acid, cyclohexane-1,1-dicarboxylic acid, tartaric acid, O-methoxybenzoic acid, m-methoxybenzoic acid, p-methoxybenzoic acid, benzoic acid, o-chlorobenzoic acid, m-fluorobenzoic acid, 2,3-difluorobenzoic acid, o-nitrobenzoic acid, m-nitrobenzene Formic acid, p-nitrobenzoic acid, m-aminobenzoic acid, p-aminobenzoic acid, salicylic acid, phthalic acid, isophthalic acid, trans-cinnamic acid, 2-furancarboxylic acid, glyoxylic acid, ethanol Acid, crotonic acid, lactic acid, 2-hydroxy-2-methylpropionic acid, pyruvic acid, mandelic acid, malic acid, acetopropionic acid, 2,6-pyridinedicarboxylic acid, nicotinic acid, and the like. The amount of the acid to be used is not particularly limited, and is preferably in the range of 0.3 to 1.2 mol, and more preferably 0.5 to 1.0 mol, or 0.6 to 1 mol of the polyamine or imidazole to be used. 0.9 range of moles.
於低於0.3莫耳之情形時,有組合物之保存穩定性降低之情形, 於高於1.2莫耳之情形時,有無法形成充分之硬度之塗膜之情形。In the case of less than 0.3 mol, there is a case where the storage stability of the composition is lowered, When it is higher than 1.2 m, there is a case where a coating film of sufficient hardness cannot be formed.
於本發明之製造方法中,可視需要使用有機溶劑,作為此種溶劑,只要為可某程度地保持溶液之均勻性、穩定性等之溶劑,則並無特別限定,具體而言,可例示:甲醇、乙醇、正丙醇、異丙醇、正丁醇、異丁醇、第二丁醇、第三丁醇、正戊醇、異戊醇、第二戊醇、第三戊醇、新戊醇、乙二醇、二乙二醇、丙二醇、二丙二醇、乙二醇單甲醚、丙二醇單甲醚、乙二醇單乙醚、2-乙醯氧基乙醇等醇類;四氫呋喃、乙二醇二甲醚、丙二醇二甲醚、四氫吡喃等醚類;丙酮、甲基乙基酮、乙醯丙酮等酮類;乙酸甲酯、乙二醇單乙酸酯等酯類;甲醯胺、N,N-二甲基甲醯胺、N,N-二甲基乙醯胺、吡咯啶酮、N-甲基吡咯啶酮等醯胺類等,其中,較佳為碳數1~5之醇。該等可單獨使用1種或併用2種以上。碳數1~5之醇亦可於適當之碳上具有鹵素原子等取代基,作為此種醇,具體而言,可例示全氟乙醇、全氟戊醇等。In the production method of the present invention, an organic solvent may be used as needed. The solvent is not particularly limited as long as it can maintain the uniformity and stability of the solution to some extent. Specifically, it can be exemplified: Methanol, ethanol, n-propanol, isopropanol, n-butanol, isobutanol, second butanol, third butanol, n-pentanol, isoamyl alcohol, second pentanol, third pentanol, neopentyl Alcohol, ethylene glycol, diethylene glycol, propylene glycol, dipropylene glycol, ethylene glycol monomethyl ether, propylene glycol monomethyl ether, ethylene glycol monoethyl ether, 2-ethoxycarbonyl alcohol, etc.; tetrahydrofuran, ethylene glycol An ether such as dimethyl ether, propylene glycol dimethyl ether or tetrahydropyran; a ketone such as acetone, methyl ethyl ketone or acetamidine acetone; an ester such as methyl acetate or ethylene glycol monoacetate; and formamide And N,N-dimethylformamide, N,N-dimethylacetamide, pyrrolidone, N-methylpyrrolidone and the like, wherein the carbon number is preferably from 1 to 5. Alcohol. These may be used alone or in combination of two or more. The alcohol having 1 to 5 carbon atoms may have a substituent such as a halogen atom on a suitable carbon. Specific examples of the alcohol include perfluoroethanol and perfluoropentanol.
該等可單獨使用1種或混合2種以上使用。於考慮到作業環境、及減少於塗膜上之殘留等之情形時,較佳為碳數3以下之醇,可尤佳地例示異丙醇、正丙醇等。於考慮到水解縮合物之保存穩定性之情形時,較佳為使用正戊醇。These may be used alone or in combination of two or more. In the case of considering the working environment and the residue on the coating film, it is preferably an alcohol having 3 or less carbon atoms, and particularly preferably isopropyl alcohol or n-propanol. In the case where the storage stability of the hydrolysis condensate is considered, n-pentanol is preferably used.
較佳為使用水作為其他溶劑,於該情形時,所使用之有機溶劑較佳為溶解於水之有機溶劑。又,水與有機溶劑之比率較佳為使用各自所需之量後成為均勻溶液之量比。於使用碳數3以下之醇等相對易溶解於水之有機溶劑之情形時,水與有機溶劑之質量比(水/有機溶劑)較佳為30/70~95/5之範圍,進而較佳為50/50~90/10、60/40~80/20、或65/35~75/25之範圍。It is preferred to use water as the other solvent. In this case, the organic solvent to be used is preferably an organic solvent dissolved in water. Further, the ratio of water to organic solvent is preferably an amount ratio which becomes a uniform solution after using the respective amounts required. When a solvent having a carbon number of 3 or less or the like is relatively easily dissolved in an organic solvent of water, the mass ratio of water to the organic solvent (water/organic solvent) is preferably in the range of 30/70 to 95/5, and further preferably. It is in the range of 50/50~90/10, 60/40~80/20, or 65/35~75/25.
又,於使用碳數4以上之醇等相對難溶解於水之有機溶劑之情形時,由於水在有機溶劑中之溶解度較低,故而所使用之水之量較佳為 以三烷氧基矽烷之水解所需之量以上且溶液成為均勻之範圍之量使用。Further, when an organic solvent such as an alcohol having 4 or more carbons is relatively difficult to dissolve in water, since the solubility of water in an organic solvent is low, the amount of water used is preferably It is used in an amount greater than the amount required for the hydrolysis of the trialkoxysilane and the solution is in a uniform range.
所使用之溶劑量並無特別限制,考慮到使用含有藉由本發明之製造方法所製造之水解縮合物之組合物的塗膜之外觀、該組合物之塗佈性、硬化性、使用該組合物之塗膜之性質、該組合物或水解縮合物之保存穩定性等,較佳為使用反應液中之固形物成分濃度成為0.5~50質量%之範圍之量,進而較佳為1.0~30質量%、1.0~20質量%、1.0~10質量%、1.5~5.0質量%、或1.8~3質量%之範圍。The amount of the solvent to be used is not particularly limited, and the appearance of the coating film containing the composition containing the hydrolysis-condensation product produced by the production method of the present invention, the coatability and hardenability of the composition, and the use of the composition are considered. The nature of the coating film, the storage stability of the composition or the hydrolysis condensate, and the like are preferably such that the concentration of the solid content in the reaction liquid is in the range of 0.5 to 50% by mass, and more preferably 1.0 to 30% by mass. %, 1.0 to 20% by mass, 1.0 to 10% by mass, 1.5 to 5.0% by mass, or 1.8 to 3% by mass.
於本發明中,將含環氧基三烷氧基矽烷及/或其水解縮合物與水、及1分子內具有2個以上鍵結有1個以上氫原子之胺基或亞胺基之聚胺類、或咪唑類、視需要之酸、及視需要之有機溶劑進行混合、攪拌,而製造含環氧基三烷氧基矽烷之水解縮合物,但其混合順序及攪拌速度並無特別限定,可設定任意順序或任意速度。混合時及攪拌時之溫度並無特別限定,較佳為於室溫至所使用之溶劑之沸點之範圍內進行,進而較佳為於室溫下進行。所謂室溫,於該情形時成為進行混合攪拌之場所之外部氣體溫度,較佳為15~35℃之範圍之溫度。In the present invention, the epoxy group-containing trialkoxy decane and/or its hydrolysis-condensation product and water and one or more amine groups or imine groups having one or more hydrogen atoms bonded in one molecule are aggregated. The amine or the imidazole, the acid as needed, and the organic solvent as needed are mixed and stirred to produce a hydrolysis condensate containing an epoxytrial trialkoxysilane. However, the mixing order and the stirring speed are not particularly limited. , can be set in any order or any speed. The temperature at the time of mixing and stirring is not particularly limited, but it is preferably carried out at a temperature ranging from room temperature to the boiling point of the solvent to be used, and more preferably at room temperature. The room temperature is, in this case, the temperature of the outside air at the place where the mixing is performed, and is preferably a temperature in the range of 15 to 35 °C.
較佳為於使含環氧基三烷氧基矽烷與水、及1分子內具有2個以上鍵結有1個以上氫原子之胺基或亞胺基之聚胺類、或咪唑全部共存之狀態下,於室溫下攪拌2小時至3小時。Preferably, the epoxy group-containing trialkoxysilane is coexistent with water and a polyamine or imidazole having two or more amine groups or imine groups having one or more hydrogen atoms bonded in one molecule. In the state, it is stirred at room temperature for 2 hours to 3 hours.
水解後,視需要利用有機溶劑或水進行稀釋。After the hydrolysis, it is diluted with an organic solvent or water as needed.
含有利用本發明之製造方法所獲得之水解縮合物之組合物的固形物成分濃度並無特別限定,較佳為於0.5~50質量%之範圍內使用,進而較佳為1.0~30質量%、1.0~20質量%、1.0~10質量%、1.5~5.0質量%、或1.8~3.0質量%之範圍。於低於0.5質量%之情形時,有難以均質地形成膜之情形,於高於50質量%之情形,有組合物之穩定性、塗膜 之透明性、外觀、或塗佈性等產生問題之情形。固形物成分濃度可最初便調整為特定之固形物成分濃度,亦可於以較濃之狀態製備組合物後進行稀釋而調整為特定之固形物成分濃度。The concentration of the solid content of the composition containing the hydrolysis-condensation product obtained by the production method of the present invention is not particularly limited, but is preferably used in the range of 0.5 to 50% by mass, more preferably 1.0 to 30% by mass. 1.0 to 20% by mass, 1.0 to 10% by mass, 1.5 to 5.0% by mass, or 1.8 to 3.0% by mass. When it is less than 0.5% by mass, there is a case where it is difficult to form a film homogeneously, and in the case of more than 50% by mass, stability of the composition, coating film A situation in which transparency, appearance, or coatability cause problems. The concentration of the solid component can be initially adjusted to a specific solid component concentration, and can be adjusted to a specific solid component concentration by preparing the composition in a relatively concentrated state.
本發明之組合物包含含有藉由本發明之製造方法或其他方法而獲得之含環氧基三烷氧基矽烷之水解縮合物(A)、(B)及(C)之組合物。The composition of the present invention comprises a composition containing the hydrolysis-condensation products (A), (B) and (C) of the epoxy group-containing trialkoxysilane obtained by the production method of the present invention or other methods.
(A)含環氧基三烷氧基矽烷之水解縮合物(A) Hydrolyzed condensate containing epoxy alkoxy oxane
(B)聚胺類、及(B) polyamines, and
(C)(C)
(C-1)正戊醇、或(C-1) n-pentanol, or
(C-2)20℃下之pKa為2.0~6.0之範圍之有機酸或具有全氟烷基及/或全氟伸烷基之碳數2~5之醇類(C-2) an organic acid having a pKa in the range of 2.0 to 6.0 at 20 ° C or an alcohol having a perfluoroalkyl group and/or a perfluoroalkyl group having 2 to 5 carbon atoms
以下,對含有成分(A)、(B)及(C)之組合物進行詳細說明。Hereinafter, the composition containing the components (A), (B), and (C) will be described in detail.
組合物中之含環氧基三烷氧基矽烷之水解縮合物等之固形物成分濃度並無特別限制,較佳為1~50質量%之範圍,進而較佳為1~10質量%、或1.5~3質量%之範圍。The concentration of the solid content component of the hydrolysis-condensation product containing the epoxy-oxytrialkoxide-containing decane in the composition is not particularly limited, but is preferably in the range of 1 to 50% by mass, more preferably 1 to 10% by mass, or 1.5 to 3 mass% range.
固形物成分濃度可最初便調整為特定之固形物成分濃度,亦可於以較濃之狀態製備組合物後進行稀釋而調整為特定之固形物成分濃度。The concentration of the solid component can be initially adjusted to a specific solid component concentration, and can be adjusted to a specific solid component concentration by preparing the composition in a relatively concentrated state.
成分(A)之含環氧基三烷氧基矽烷之水解縮合物之製造方法可較佳地例示上述(1)中所說明之本發明之製造方法,除此以外,具體而言,可例示如下方法等:於含環氧基三烷氧基矽烷及/或其水解縮合物中添加水、視需要之矽烷醇縮合觸媒,並於5~100℃、較佳為20~60℃下反應1分鐘~10天、較佳為30分鐘~24小時。The method for producing the hydrolysis-condensation product of the epoxy group-containing trialkoxy decane of the component (A) is preferably exemplified by the production method of the present invention described in the above (1), and specifically, it can be exemplified. The following method and the like: adding water, optionally a stanol condensation catalyst, to the epoxy group-containing trialkoxy decane and/or its hydrolysis condensate, and reacting at 5 to 100 ° C, preferably 20 to 60 ° C 1 minute to 10 days, preferably 30 minutes to 24 hours.
於含環氧基三烷氧基矽烷及/或其水解縮合物中添加水、視需要 之矽烷醇縮合觸媒之方法中,作為原料之含環氧基三烷氧基矽烷及/或其水解縮合物可使用與本發明之製造方法之項中所示者相同者。又,亦可與本發明之製造方法之部分所記載同樣地使四烷氧基矽烷、除含環氧基三烷氧基矽烷及/或其水解縮合物以外之三烷氧基矽烷、二烷氧基矽烷、或其等之部分水解縮合物共存而製造。Adding water to the epoxy-containing trialkoxy decane and/or its hydrolysis condensate, if necessary In the method of the decyl alcohol condensation catalyst, the epoxy group-containing trialkoxy decane and/or its hydrolysis condensate as a raw material can be used in the same manner as those shown in the item of the production method of the present invention. Further, in the same manner as described in the section of the production method of the present invention, a tetraalkoxy decane, a trialkoxy decane or a dioxane other than the epoxy group-containing alkoxy oxane and/or a hydrolysis-condensation product thereof may be used. Oxydecane, or a partially hydrolyzed condensate thereof, is produced by coexistence.
水之量只要為足以使所使用之含環氧基三烷氧基矽烷及/或其水解縮合物某程度地水解縮合之量以上,則並無特別限制,具體而言,相對於所使用之三烷氧基矽烷及/或其水解縮合物1莫耳,較佳為0.5莫耳以上,進而較佳為1.0莫耳以上、2.0莫耳以上、5.0莫耳以上、或10莫耳以上。The amount of water is not particularly limited as long as it is sufficient to hydrolyze or condense the epoxy group-containing trialkoxysilane and/or its hydrolysis-condensation product to some extent, and specifically, it is used in comparison with The trialkoxysilane and/or its hydrolysis condensate 1 mole is preferably 0.5 mole or more, more preferably 1.0 mole or more, 2.0 mole or more, 5.0 mole or more, or 10 mole or more.
矽烷醇縮合觸媒之使用量並無特別限制,相對於作為原料之含環氧基三烷氧基矽烷及/或其水解縮合物中之全部以未縮合所換算之三烷氧基矽烷基之量,以莫耳比(矽烷醇觸媒/該矽烷基)計較佳為0.001~1.0之範圍,進而較佳為0.01~1.0、或0.1~0.5之範圍。The amount of the stanol-condensation catalyst to be used is not particularly limited, and the allyl group containing the epoxy group-containing trialkoxy decane and/or its hydrolysis condensate as a raw material in terms of uncondensed The amount is preferably in the range of 0.001 to 1.0, more preferably 0.01 to 1.0, or 0.1 to 0.5, based on the molar ratio (the stanol catalyst / the alkylene group).
作為矽烷醇縮合觸媒,只要為使含環氧基三烷氧基矽烷之烷氧基水解,並使矽烷醇縮合而形成矽氧烷鍵者,則並無特別限制,具體而言,可例示:二月桂酸二丁基錫、二乙酸二丁基錫、二乙基己酸二丁基錫、二辛酸二丁基錫、二甲基順丁烯二酸二丁基錫、二乙基順丁烯二酸二丁基錫、二丁基順丁烯二酸二丁基錫、二異辛基順丁烯二酸二丁基錫、二-十三烷基順丁烯二酸二丁基錫、二苄基順丁烯二酸二丁基錫、順丁烯二酸二丁基錫、二乙酸二辛基錫、二硬脂酸二辛基錫、二月桂酸二辛基錫、二乙基順丁烯二酸二辛基錫、二異辛基順丁烯二酸二辛基錫等二羧酸二烷基錫類;二丁基二甲醇錫、二苯氧化二丁基錫等二烷基烷醇錫類;二(乙醯丙酮)二丁基錫、二(乙醯乙酸乙酯)二丁基錫等二烷基錫螯合物類;氧化二丁基錫或氧化二辛基錫等氧化二烷基錫與鄰苯二甲酸二辛酯、鄰苯二甲酸二異癸酯、順丁烯二 酸甲酯等酯化合物之反應物、使氧化二烷基錫、羧酸及醇化合物反應而獲得之錫化合物、雙(三乙氧基矽酸)二丁基錫、雙(三乙氧基矽酸)二辛基錫等氧化二烷基錫與矽酸鹽化合物之反應物、以及該等二烷基錫化合物之含氧衍生物(錫氧烷(Stannoxane)化合物)等4價錫化合物類;辛酸錫、環烷酸錫、硬脂酸錫、支鏈烷烴羧酸錫(Tin versatate)等2價錫化合物類、或者該等與下述月桂基胺等胺系化合物之反應物及混合物;三辛酸單丁基錫或三異丙氧化單丁基錫等單丁基錫化合物或單辛基錫化合物等單烷基錫類;鈦酸四丁酯、鈦酸四丙酯、鈦酸四(2-乙基己基)酯、異丙氧基雙(乙醯乙酸乙酯)合鈦等鈦酸酯類;三(乙醯丙酮)合鋁、三(乙醯乙酸乙酯)合鋁、二異丙氧基(乙醯乙酸乙酯)合鋁等有機鋁化合物類;羧酸鉍、羧酸鐵、羧酸鈦、羧酸鉛、羧酸釩、羧酸鋯、羧酸鈣、羧酸鉀、羧酸鋇、羧酸錳、羧酸鈰、羧酸鎳、羧酸鈷、羧酸鋅、羧酸鋁等羧酸(2-乙基己酸、新癸酸、特十碳酸(Versatic acid)、油酸、環烷酸等)金屬鹽、或者該等與下述月桂基胺等胺系化合物之反應物及混合物;四(乙醯丙酮)合鋯、三丁氧基(乙醯丙酮)合鋯、二丁氧基(二乙醯丙酮)合鋯、乙醯丙酮雙(乙醯乙酸乙酯)合鋯、四(乙醯丙酮)合鈦等螯合化合物類;甲基胺、乙基胺、丙基胺、異丙基胺、丁基胺、戊基胺、己基胺、辛基胺、2-乙基己基胺、壬基胺、癸基胺、月桂基胺、十五烷基胺、鯨蠟基胺、硬脂基胺、環己基胺等脂肪族一級胺類,二甲基胺、二乙基胺、二丙基胺、二異丙基胺、二丁基胺、二戊基胺、二辛基胺、二(2-乙基己基)胺、二癸基胺、二月桂基胺、二-鯨蠟基胺、二硬脂基胺、甲基硬脂基胺、乙基硬脂基胺、丁基硬脂基胺等脂肪族二級胺類,三戊基胺、三己基胺、三辛基胺等脂肪族三級胺類,三烯丙基胺、油胺等脂肪族不飽和胺類,月桂基苯胺、硬脂基苯胺、三苯基胺等芳香族胺類,及作為其他胺類之單乙醇胺、二乙醇胺、三乙醇胺、二伸乙基三胺、三伸乙基四胺、油 胺、環己基胺、苄胺、二乙基胺基丙基胺、苯二甲胺、乙二胺、六亞甲基二胺、三伸乙基二胺、胍、二苯基胍、2,4,6-三(二甲基胺基甲基)苯酚、啉、N-甲基啉、2-乙基-4-甲基咪唑、1,8-二氮雙環(5,4,0)十一烯(DBU)等胺系化合物、或者該等胺系化合物與羧酸等之鹽;月桂基胺與辛酸錫之反應物或混合物之類的胺系化合物與有機錫化合物之反應物及混合物;由過量之聚胺與多元酸獲得之低分子量聚醯胺樹脂;過量之聚胺與環氧化合物之反應產物;γ-胺基丙基三甲氧基矽烷、γ-胺基丙基三乙氧基矽烷、γ-胺基丙基三異丙氧基矽烷、γ-胺基丙基甲基二甲氧基矽烷、γ-胺基丙基甲基二乙氧基矽烷、N-(β-胺基乙基)胺基丙基三甲氧基矽烷、N-(β-胺基乙基)胺基丙基甲基二甲氧基矽烷、N-(β-胺基乙基)胺基丙基三乙氧基矽烷、N-(β-胺基乙基)胺基丙基甲基二乙氧基矽烷、N-(β-胺基乙基)胺基丙基三異丙氧基矽烷、γ-脲基丙基三甲氧基矽烷、N-苯基-γ-胺基丙基三甲氧基矽烷、N-苄基-γ-胺基丙基三甲氧基矽烷、N-乙烯基苄基-γ-胺基丙基三乙氧基矽烷等。又,可例示作為將該等改性而成之衍生物的胺基改性矽烷基聚合物、矽烷化胺基聚合物、不飽和胺基矽烷錯合物、苯基胺基長鏈烷基矽烷、胺基矽烷化聚矽氧等具有胺基之矽烷偶合劑等矽烷醇縮合觸媒、以及支鏈烷烴羧酸(Versatic acid)等脂肪酸或有機酸性磷酸酯化合物等其他酸性觸媒、鹼性觸媒等公知之矽烷醇縮合觸媒等。The sterol condensation catalyst is not particularly limited as long as it hydrolyzes the alkoxy group containing the epoxy group-containing trialkoxy decane and condenses the decyl alcohol to form a decane bond. Specifically, it can be exemplified. : Dibutyltin dilaurate, dibutyltin diacetate, dibutyltin diethylhexanoate, dibutyltin dioctoate, dibutyltin dimethyl maleate, dibutyltin diethyldibutyl maleate, dibutyl cis-butane Dibutyltin olefinate, dibutyltin diisooctyl maleate, dibutyltin di-tridecylmaleate, dibutyltin dibenzyl maleate, dibutyltin maleate, two Dicarboxylic acid such as dioctyltin acetate, dioctyltin distearate, dioctyltin dilaurate, dioctyltin diethyl succinate, dioctyltin diisooctyl maleate Dialkyltin acid; dialkylalkanol tin such as dibutyl dimethoxide, dibutyltin diphenyl oxide; dioxane such as dibutyltin diacetate or dibutyltin diacetate Base tin chelate; dialkyltin oxide and isophthalic acid such as dibutyltin oxide or dioctyltin oxide a reaction product of an ester compound such as dioctyl formate, diisononyl phthalate or methyl maleate; a tin compound obtained by reacting a dialkyltin oxide, a carboxylic acid, and an alcohol compound, and a double (three) a reaction of a dialkyltin oxide such as dibutyltin ethoxylate or dioctyltin bis(triethoxytin) with a phthalate compound, and an oxygen-containing derivative of the dialkyltin compound a tetravalent tin compound such as a stannoxane compound; a divalent tin compound such as tin octylate, tin naphthenate, tin stearate or tin versatate; or a reaction product and a mixture of an amine compound such as laurylamine; a monobutyltin compound such as monobutyltin trioctoate or monobutyltin trioxide or a monoalkyltin such as a monooctyltin compound; tetrabutyl titanate or titanium; a titanate such as tetrapropyl acrylate, tetrakis(2-ethylhexyl) titanate, isopropoxy bis(acetic acid ethyl acetate) titanium; tris(acetonitrile)aluminum, tris(acetonitrile) Ethyl acetate, aluminum, diisopropoxy (acetic acid ethyl acetate), aluminum, and other organoaluminum compounds; cerium carboxylate, iron carboxylate, carboxylic acid Carboxylic acid carboxylate, vanadium carboxylate, zirconium carboxylate, calcium carboxylate, potassium carboxylate, cerium carboxylate, manganese carboxylic acid, cerium carboxylate, nickel carboxylate, cobalt carboxylate, zinc carboxylate, aluminum carboxylate, etc. a metal salt of an acid (2-ethylhexanoic acid, neodecanoic acid, Versatic acid, oleic acid, naphthenic acid, etc.) or a reaction product and a mixture thereof with an amine compound such as the following laurylamine ; tetrakis(acetonitrile)zirconium, tributoxide (acetonitrile) zirconium, dibutoxy (diacetone) zirconium, acetamidine acetone bis(acetonitrile ethyl acetate) zirconium, four (acetylacetone) chelating compounds such as titanium; methylamine, ethylamine, propylamine, isopropylamine, butylamine, amylamine, hexylamine, octylamine, 2-ethylhexyl An aliphatic primary amine such as an amine, a mercaptoamine, a mercaptoamine, laurylamine, pentadecylamine, cetylamine, stearylamine or cyclohexylamine, dimethylamine, diethylamine, Dipropylamine, diisopropylamine, dibutylamine, dipentylamine, dioctylamine, di(2-ethylhexyl)amine, didecylamine, dilaurylamine, di-cetamine Base amine, distearylamine, methyl stearylamine, ethyl stearin An aliphatic secondary amine such as an amine or a butyl stearylamine; an aliphatic tertiary amine such as a triamylamine, a trihexylamine or a trioctylamine; an aliphatic unsaturated such as a triallylamine or an oleylamine; Amines, aromatic amines such as lauryl aniline, stearyl aniline, triphenylamine, and monoethanolamine, diethanolamine, triethanolamine, di-ethyltriamine, and tri-ethyltetramine as other amines , oleylamine, cyclohexylamine, benzylamine, diethylaminopropylamine, xylylenediamine, ethylenediamine, hexamethylenediamine, triethylenediamine, anthracene, diphenylanthracene, 2,4,6-tris(dimethylaminomethyl)phenol, Porphyrin, N-methyl An amine compound such as a porphyrin, 2-ethyl-4-methylimidazole or 1,8-diazabicyclo(5,4,0)undecene (DBU), or a salt of the amine compound and a carboxylic acid or the like a reactant and mixture of an amine compound such as a reaction or mixture of laurylamine and tin octylate with an organotin compound; a low molecular weight polyamine resin obtained from an excess of a polyamine and a polybasic acid; an excess of a polyamine and Reaction product of epoxy compound; γ-aminopropyltrimethoxydecane, γ-aminopropyltriethoxydecane, γ-aminopropyltriisopropoxydecane, γ-aminopropylmethyl Dimethoxy decane, γ-aminopropylmethyldiethoxy decane, N-(β-aminoethyl)aminopropyltrimethoxydecane, N-(β-aminoethyl) Aminopropylmethyldimethoxydecane, N-(β-aminoethyl)aminopropyltriethoxydecane, N-(β-aminoethyl)aminopropylmethyldiethyl Oxydecane, N-(β-aminoethyl)aminopropyltriisopropoxydecane, γ-ureidopropyltrimethoxydecane, N-phenyl-γ-aminopropyltrimethoxy Decane, N-benzyl-γ-aminopropyltrimethoxydecane, N-vinylbenzyl-γ-amine Silane triethoxysilane and the like. Further, an amine-modified oxime alkyl polymer, a decylated amine-based polymer, an unsaturated amino decane complex, and a phenylamino long-chain alkyl decane which are derivatives which are modified as such may be exemplified. a stanol condensation catalyst such as an amino group-containing decane coupling agent such as an amine group, and a fatty acid such as a branched alkane carboxylic acid or an organic acid phosphate compound, and an alkaline contact. A well-known stanol condensation catalyst or the like.
作為酸性觸媒之有機酸性磷酸酯化合物,具體而言,可例示:(CH3 O)2 P(=O)(OH)、(CH3 O)P(=O)(OH)2 、(C2 H5 O)2 P(=O)(OH)、(C2 H5 O)P(=O)(OH)2 、(C3 H7 O)2 P(=O)(OH)、(C3 H7 O)P(=O)(OH)2 、(C4 H9 O)2 P(=O)(OH)、(C4 H9 O)P(=O)(OH)2 、(C8 H17 O)2 P(=O)(OH)、(C8 H17 O)P(=O)(OH)2 、(C10 H21 O)2P(=O)(OH)、(C10 H21 O)P(=O)(OH)2 、(C13 H27 O)2 P(=O)(OH)、(C13 H27 O)P(=O)(OH)2 、(C16 H33 O)2 P(=O)(OH)、(C16 H33 O)P(=O)(OH)2 、(HOC6 H12 O)2 P(=O)(OH)、(HOC6 H12 O)P(=O)(OH)2 、 (HOC8 H16 O)2 P(=O)(OH)、(HOC8 H16 O)P(=O)(OH)2 、[(HOCH2 CH(OH)O]2 P(=O)(OH)、[(HOCH2 CH(OH)O]P(=O)(OH)2 、[(HOCH2 CH(OH)C2 H4 O]2 P(=O)(OH)、[(HOCH2 CH(OH)C2 H4 O]P(=O)(OH)2 等。Specific examples of the organic acid phosphate compound as the acid catalyst include (CH 3 O) 2 P(=O)(OH), (CH 3 O)P(=O)(OH) 2 , (C) 2 H 5 O) 2 P(=O)(OH), (C 2 H 5 O)P(=O)(OH) 2 , (C 3 H 7 O) 2 P(=O)(OH), ( C 3 H 7 O)P(=O)(OH) 2 , (C 4 H 9 O) 2 P(=O)(OH), (C 4 H 9 O)P(=O)(OH) 2 , (C 8 H 17 O) 2 P(=O)(OH), (C 8 H 17 O)P(=O)(OH) 2 , (C 10 H 21 O)2P(=O)(OH), (C 10 H 21 O)P(=O)(OH) 2 , (C 13 H 27 O) 2 P(=O)(OH), (C 13 H 27 O)P(=O)(OH) 2 , (C 16 H 33 O) 2 P(=O)(OH), (C 16 H 33 O)P(=O)(OH) 2 , (HOC 6 H 12 O) 2 P(=O)(OH ), (HOC 6 H 12 O)P(=O)(OH) 2 , (HOC 8 H 16 O) 2 P(=O)(OH), (HOC 8 H 16 O)P(=O)(OH 2 , [(HOCH 2 CH(OH)O] 2 P(=O)(OH), [(HOCH 2 CH(OH)O]P(=O)(OH) 2 , [(HOCH 2 CH(OH C 2 H 4 O] 2 P(=O)(OH), [(HOCH 2 CH(OH)C 2 H 4 O]P(=O)(OH) 2 or the like.
又,亦可使用光酸產生劑作為矽烷醇縮合觸媒。作為光酸產生劑,具體而言,可使用:四氟硼酸根(BF4 - )、六氟磷酸根(PF6 - )、氟烷基磷酸根(PFm(RF)6-m - (RF表示氟化烷基,m表示0~5之整數))、六氟銻酸根(SbF6 - )、六氟砷酸根(AsF6 - )、六氯銻酸根(SbCl6 - )、四苯基硼酸根、四(三氟甲基苯基)硼酸根、四(五氟甲基苯基)硼酸根、過氯酸根離子(ClO4 - )、三氟甲磺酸根離子(CF3 SO3 - )、氟磺酸根離子(FSO3 - )、甲苯磺酸根離子、三硝基苯磺酸根陰離子、三硝基甲苯磺酸根陰離子等具有陰離子之鋶鹽或錪鹽。Further, a photoacid generator can also be used as the stanol condensation catalyst. As the photoacid generator, specifically, tetrafluoroborate (BF 4 - ), hexafluorophosphate (PF 6 - ), or fluoroalkyl phosphate (PFm(RF) 6-m - (RF) can be used. Alkyl fluoride, m represents an integer from 0 to 5), hexafluoroantimonate (SbF 6 - ), hexafluoroarsenate (AsF 6 - ), hexachloroantimonate (SbCl 6 - ), tetraphenylborate , tetrakis(trifluoromethylphenyl)borate, tetrakis(pentafluoromethylphenyl)borate, perchlorate ion (ClO 4 - ), trifluoromethanesulfonate ion (CF 3 SO 3 - ), fluorine An anthracene or phosphonium salt having an anion such as a sulfonate ion (FSO 3 - ), a tosylate ion, a trinitrobenzenesulfonate anion or a trinitrotosylate anion.
矽烷醇縮合觸媒可單獨使用1種或使用2種以上之組合。The stanol condensation catalyst may be used alone or in combination of two or more.
於本發明之組合物中,使用聚胺類或咪唑類作為含環氧基三烷氧基矽烷之硬化劑或硬化促進劑,因此較佳為亦使用聚胺類、咪唑類作為矽烷醇縮合觸媒。關於聚胺類及咪唑類之詳情,如上述本發明之製造方法之部分中所說明。In the composition of the present invention, a polyamine or an imidazole is used as a hardener or a hardening accelerator for an epoxy-containing trialkoxysilane. Therefore, it is preferred to use a polyamine or an imidazole as a decyl alcohol condensation contact. Media. Details of the polyamines and imidazoles are as described in the section of the above-described production method of the present invention.
關於本發明中使用之含環氧基三烷氧基矽烷之水解縮合物之利用動態光散射法所測得之z-平均粒徑,就膜之硬度或塗佈時之塗佈不均等觀點而言,較佳為5~50nm之範圍,進而較佳為5~30nm。於大於50nm之情形時,有使用壽命較短,保存穩定性上存在問題,或有塗佈後產生塗佈斑之情形,於小於5nm之情形時,有由本組合物獲得之塗膜之硬度不充分之情形。The z-average particle diameter measured by a dynamic light scattering method for the hydrolysis-condensation product containing an epoxy-containing trialkoxy-decane used in the present invention is based on the viewpoint of the hardness of the film or the uneven coating at the time of coating. In other words, it is preferably in the range of 5 to 50 nm, and more preferably 5 to 30 nm. When it is larger than 50 nm, there is a short service life, there is a problem in storage stability, or a coating spot is formed after coating, and when it is less than 5 nm, the hardness of the coating film obtained from the composition is not Sufficient situation.
於本發明之組合物中含有特定之聚胺類。作為聚胺類,可例示上述(1)之製造方法中所示之聚胺類。關於其使用量,亦如上述(1)之製造方法中所記載。Specific polyamines are included in the compositions of the present invention. The polyamines shown in the production method of the above (1) can be exemplified as the polyamines. The amount of use is also as described in the production method of the above (1).
進而,可視需要添加除該等以外之硬化劑或硬化促進劑。Further, a curing agent or a curing accelerator other than the above may be added as needed.
具體而言,可例示:上述(1)之製造方法中所示之咪唑類;二甲基胺基丙基胺、二乙基胺基丙基胺、三甲基六亞甲基二胺、戊二胺、雙(2-二甲基胺基乙基)醚、五甲基二伸乙基三胺、烷基-第三單胺、1,4-二氮雙環(2,2,2)辛烷(三伸乙基二胺)、N,N,N',N'-四甲基六亞甲基二胺、N,N,N',N'-四甲基丙二胺、N,N,N',N'-四甲基乙二胺、N,N-二甲基環己基胺、二甲基胺基乙氧基乙氧基乙醇、二甲基胺基己醇等脂肪族胺系,哌啶、哌、薄荷烷二胺、異佛爾酮二胺、甲基啉、乙基啉、N,N',N"-三(二甲基胺基丙基)六氫-均三、3,9-雙(3-胺基丙基)-2,4,8,10-四氧螺(5,5)十一烷加成物、N-胺基乙基哌、三甲基胺基乙基哌、雙(4-胺基環己基)甲烷、N,N'-二甲基哌、1,8-二氮雙環(4,5,0)十一烯-7等脂環式或雜環式胺系,苄基甲基胺、二甲基苄胺、吡啶、甲基吡啶等芳香族胺系,環氧化合物加成聚胺、麥可加成聚胺、曼尼希加成聚胺、硫脲加成聚胺、酮封阻聚胺等改性胺系,雙氰胺、胍、有機酸醯肼、二胺順丁烯二腈、胺醯亞胺、三氟化硼-哌啶錯合物、三氟化硼-單乙基胺錯合物等其他胺系等胺系化合物;2-甲基咪唑啉、2-苯基咪唑啉等咪唑啉系化合物;藉由二聚酸與聚胺之縮合而獲得之聚醯胺等醯胺系化合物;羧酸之芳基及硫代芳基酯等活性羰基化合物;苯酚酚醛清漆、甲酚酚醛清漆、多元醇、聚硫醇、多硫化物、2-(二甲基胺基甲基苯酚)、2,4,6-三(二甲基胺基甲基)苯酚、2,4,6-三(二甲基胺基甲基)苯酚之三-2-乙基己基鹽酸鹽等酚系、醇系、硫醇系、醚系、或硫醚系化合物;丁基化脲、丁基化三聚氰胺、丁基化硫脲、三氟化硼等脲系、硫脲系、或路易斯酸系化合物; 乙基膦、丁基膦等烷基膦,苯基膦等一級膦,二甲基膦、二丙基膦等二烷基膦,二苯基膦、甲基乙基膦等二級膦,三甲基膦、三乙基膦等三級膦等磷系化合物;鄰苯二甲酸酐、六氫鄰苯二甲酸酐、甲基四氫鄰苯二甲酸酐、甲基六氫鄰苯二甲酸酐、內亞甲基四氫鄰苯二甲酸酐、甲基內亞甲基四氫鄰苯二甲酸酐、順丁烯二酸酐、四亞甲基順丁烯二酸酐、偏苯三甲酸酐、氯橋酸酐、均苯四甲酸二酐、十二烯基琥珀酸酐、二苯甲酮四羧酸二酐、乙二醇雙(脫水偏苯三酸酯)、甲基環己烯四羧酸二酐、聚壬二酸酐等酸酐系化合物;芳基重氮鎓鹽、二芳基錪鹽、三芳基鋶鹽、三苯基矽烷醇-鋁錯合物、三苯基甲氧基矽烷-鋁錯合物、過氧化矽烷基-鋁錯合物、三苯基矽烷醇-三(水楊醛酸)鋁錯合物等鎓鹽系、或活性矽化合物-鋁錯合物系化合物等。Specifically, the imidazoles shown in the production method of the above (1); dimethylaminopropylamine, diethylaminopropylamine, trimethylhexamethylenediamine, and pentane are exemplified. Diamine, bis(2-dimethylaminoethyl)ether, pentamethyldiethylideneamine, alkyl-third monoamine, 1,4-diazabicyclo(2,2,2) octyl Alkane (tri-ethylenediamine), N,N,N',N'-tetramethylhexamethylenediamine, N,N,N',N'-tetramethylpropanediamine, N,N , N', N'-tetramethylethylenediamine, N,N-dimethylcyclohexylamine, dimethylaminoethoxyethoxyethanol, dimethylaminohexanol and other aliphatic amines , piperidine, piperazine , menthane diamine, isophorone diamine, methyl Porphyrin, ethyl Porphyrin, N, N', N"-tris(dimethylaminopropyl)hexahydro-all three ,3,9-bis(3-aminopropyl)-2,4,8,10-tetraoxaspiro(5,5)undecane adduct, N-aminoethylpipe Trimethylaminoethylpiperine , bis(4-aminocyclohexyl)methane, N,N'-dimethylperazine , 1,8-diazabicyclo(4,5,0) undecene-7 and other alicyclic or heterocyclic amines, benzylmethylamine, dimethylbenzylamine, pyridine, methylpyridine, etc. Amine-based, epoxy compound addition polyamine, methacrylate polyamine, Mannich addition polyamine, thiourea addition polyamine, ketone block polyamine and other modified amines, dicyandiamide, hydrazine An amine compound such as an organic acid hydrazine, a diamine maleimonitrile, an amine sulfimine, a boron trifluoride-piperidine complex, a boron trifluoride-monoethylamine complex, and the like An imidazoline compound such as 2-methylimidazoline or 2-phenylimidazoline; a guanamine compound such as polyamine obtained by condensation of a dimer acid with a polyamine; an aryl group and a thio group of a carboxylic acid; Active carbonyl compounds such as aryl esters; phenol novolacs, cresol novolacs, polyols, polythiols, polysulfides, 2-(dimethylaminomethylphenol), 2,4,6-three (two Phenolic, alcoholic, thiol, and ether systems such as methylaminomethyl)phenol and 2,4,6-tris(dimethylaminomethyl)phenol such as tris-2-ethylhexyl hydrochloride Or a thioether compound; butylated urea, butylated melamine, butylated thiourea a urea-based, thiourea-based or Lewis-acid-based compound such as boron trifluoride; an alkylphosphine such as ethylphosphine or butylphosphine; a primary phosphine such as phenylphosphine; a dialkyl group such as dimethylphosphine or dipropylphosphine; a phosphine, a diphosphine such as diphenylphosphine or a methylphosphine, a phosphorus compound such as a trisphosphine such as trimethylphosphine or triethylphosphine; phthalic anhydride, hexahydrophthalic anhydride, and Tetrahydrophthalic anhydride, methylhexahydrophthalic anhydride, endomethylenetetrahydrophthalic anhydride, methyl endomethylenetetrahydrophthalic anhydride, maleic anhydride , tetramethylene maleic anhydride, trimellitic anhydride, chloro-bromic anhydride, pyromellitic dianhydride, dodecenyl succinic anhydride, benzophenone tetracarboxylic dianhydride, ethylene glycol double (dehydration) An acid anhydride compound such as trimellitate), methylcyclohexene tetracarboxylic dianhydride or polysebacic anhydride; aryldiazonium salt, diarylsulfonium salt, triarylsulfonium salt, triphenylstanol - anthracene salt such as aluminum complex, triphenylmethoxy decane-aluminum complex, decyl decyl-aluminum complex, triphenyl decyl alcohol-tris(salicylic acid) aluminum complex Active 矽Compound - complexes of aluminum-based compound and the like.
本發明之組合物所使用之有機酸只要為25℃下之pKa為2.0~6.0之範圍、較佳為3.0~5.0之範圍之有機酸,則並無特別限制,具體而言,可例示:甲酸、乙酸、丙酸、丁酸、異丁酸、戊酸、異戊酸、己酸、異己酸、氯乙酸、氟乙酸、溴乙酸、3-氯丙酸、2-溴丙酸、2-羥基丁酸、苯基乙酸、苯基丙酸、4-苯基丁酸、苯氧基乙酸、氰乙酸、草酸、丙二酸、2,2-二甲基丙二酸、己二酸、琥珀酸、庚二酸、鄰苯二甲酸、戊二酸、草醯乙酸、檸檬酸、異檸檬酸、環己烷-1,1-二羧酸、酒石酸、鄰甲氧基苯甲酸、間甲氧基苯甲酸、對甲氧基苯甲酸、苯甲酸、鄰氯苯甲酸、間氟苯甲酸、2,3-二氟苯甲酸、鄰硝基苯甲酸、間硝基苯甲酸、對硝基苯甲酸、間胺基苯甲酸、對胺基苯甲酸、水楊酸、鄰苯二甲酸、間苯二甲酸、反式-肉桂酸、2-呋喃甲酸、乙醛酸、乙醇酸、丁烯酸、乳酸、2-羥基-2-甲基丙酸、丙酮酸、苦杏仁 酸、蘋果酸、乙醯丙酸、2,6-吡啶二羧酸、菸鹼酸等,其中,可較佳地例示脂肪族單羧酸、或者經取代或未經取代之苯甲酸。The organic acid to be used in the composition of the present invention is not particularly limited as long as it is an organic acid having a pKa in the range of from 2.0 to 6.0, preferably from 3.0 to 5.0, at 25 ° C. Specifically, formic acid is exemplified. , acetic acid, propionic acid, butyric acid, isobutyric acid, valeric acid, isovaleric acid, caproic acid, isohexanoic acid, chloroacetic acid, fluoroacetic acid, bromoacetic acid, 3-chloropropionic acid, 2-bromopropionic acid, 2-hydroxyl Butyric acid, phenylacetic acid, phenylpropionic acid, 4-phenylbutyric acid, phenoxyacetic acid, cyanoacetic acid, oxalic acid, malonic acid, 2,2-dimethylmalonic acid, adipic acid, succinic acid , pimelic acid, phthalic acid, glutaric acid, oxalic acid, citric acid, isocitric acid, cyclohexane-1,1-dicarboxylic acid, tartaric acid, o-methoxybenzoic acid, m-methoxy Benzoic acid, p-methoxybenzoic acid, benzoic acid, o-chlorobenzoic acid, m-fluorobenzoic acid, 2,3-difluorobenzoic acid, o-nitrobenzoic acid, m-nitrobenzoic acid, p-nitrobenzoic acid, M-aminobenzoic acid, p-aminobenzoic acid, salicylic acid, phthalic acid, isophthalic acid, trans-cinnamic acid, 2-furancarboxylic acid, glyoxylic acid, glycolic acid, crotonic acid, lactic acid, 2-hydroxy -2-methylpropanoic acid, pyruvic acid, mandelic An acid, malic acid, acetopropionic acid, 2,6-pyridinedicarboxylic acid, nicotinic acid or the like, among which an aliphatic monocarboxylic acid or a substituted or unsubstituted benzoic acid can be preferably exemplified.
所使用之酸之量並無特別限制,相對於所使用之聚胺類1莫耳,較佳為0.3~1.2莫耳之範圍,進而較佳為0.5~1.0莫耳、或0.6~0.9莫耳之範圍。The amount of the acid to be used is not particularly limited, and is preferably in the range of 0.3 to 1.2 mol, more preferably 0.5 to 1.0 mol, or 0.6 to 0.9 mol, relative to the polyamine 1 mole used. The scope.
於低於0.3莫耳之情形時,有組合物之保存穩定性降低之情形,於高於1.2莫耳之情形時,有無法形成充分之硬度之塗膜之情形。In the case of less than 0.3 mol, there is a case where the storage stability of the composition is lowered, and when it is higher than 1.2 mol, there is a case where a coating film having a sufficient hardness cannot be formed.
作為本發明之組合物所使用之具有全氟烷基及/或全氟伸烷基之碳數2~5之醇類,具體而言,可例示:三氟甲醇、2,2,2-三氟乙醇、1,1,2,2,2-五氟乙醇、3,3,3-三氟-1-丙醇、2,2,3,3,3-五氟-1-丙醇、1,1,2,2,3,3,3-七氟-1-丙醇、1,1,1,3,3,3-六氟-2-丙醇、2-三氟甲基-2-丙醇、2-甲基-1,1,1,3,3,3-六氟-2-丙醇、2,2,3,3,4,4,4-七氟-1-丁醇、九氟第三丁醇、2,2,3,3,4,4,5,5-八氟-1-戊醇等。As the alcohol having a perfluoroalkyl group and/or a perfluoroalkylene group having 2 to 5 carbon atoms, which is used in the composition of the present invention, specifically, trifluoromethanol, 2, 2, 2-three can be exemplified. Fluoroethanol, 1,1,2,2,2-pentafluoroethanol, 3,3,3-trifluoro-1-propanol, 2,2,3,3,3-pentafluoro-1-propanol, 1 ,1,2,2,3,3,3-heptafluoro-1-propanol, 1,1,1,3,3,3-hexafluoro-2-propanol, 2-trifluoromethyl-2- Propanol, 2-methyl-1,1,1,3,3,3-hexafluoro-2-propanol, 2,2,3,3,4,4,4-heptafluoro-1-butanol, Nonafluorobutanol, 2,2,3,3,4,4,5,5-octafluoro-1-pentanol, and the like.
本組合物中之氟醇之使用量並無特別限制,較佳為組合物整體之30質量%以上,進而較佳為40質量%以上。於小於30質量%之情形時,有組合物之長期保存穩定性降低之情形。The amount of the fluoroalcohol used in the composition is not particularly limited, but is preferably 30% by mass or more, and more preferably 40% by mass or more based on the entire composition. When it is less than 30% by mass, there is a case where the long-term storage stability of the composition is lowered.
關於本發明之組合物,為了調整組合物中之固形物成分濃度,可使用有機溶劑,作為此種溶劑,只要為可保持溶液之均勻性、穩定性等之溶劑,則無特別限定,具體而言,可例示:甲醇、乙醇、丙醇、異丙醇、正丁醇、第二丁醇、第三丁醇、正戊醇、乙二醇、二乙二醇、丙二醇、二丙二醇、乙二醇單甲醚、丙二醇單甲醚、乙二醇單乙醚等醇類;四氫呋喃、乙二醇二甲醚、丙二醇二甲醚、四氫吡喃等醚類;丙酮、甲基乙基酮、乙醯丙酮等酮類;乙酸甲酯、乙二醇單乙酸酯等酯類;甲醯胺、N,N-二甲基甲醯胺、N,N-二甲基乙醯胺、吡咯 啶酮、N-甲基吡咯啶酮等醯胺類等,其中,較佳為碳數1~5之醇。該等可單獨使用1種或併用2種以上。In the composition of the present invention, an organic solvent can be used in order to adjust the concentration of the solid content in the composition. The solvent is not particularly limited as long as it is a solvent capable of maintaining uniformity and stability of the solution. In other words, methanol, ethanol, propanol, isopropanol, n-butanol, second butanol, third butanol, n-pentanol, ethylene glycol, diethylene glycol, propylene glycol, dipropylene glycol, ethylene Alcohol monomethyl ether, propylene glycol monomethyl ether, ethylene glycol monoethyl ether and other alcohols; tetrahydrofuran, ethylene glycol dimethyl ether, propylene glycol dimethyl ether, tetrahydropyran and other ethers; acetone, methyl ethyl ketone, B Ketones such as acetone; esters such as methyl acetate and ethylene glycol monoacetate; formamide, N,N-dimethylformamide, N,N-dimethylacetamide, pyrrole An amide such as ketone or N-methylpyrrolidone is preferred, and among them, an alcohol having 1 to 5 carbon atoms is preferred. These may be used alone or in combination of two or more.
較佳為使用水作為其他溶劑,於該情形時,所使用之有機溶劑較佳為溶解於水之有機溶劑。又,水與有機溶劑之比率只要為使用各自所需之量後以組合物之形式成為均勻溶液之量比,則並無特別限制。於使用碳數3以下之醇等相對易溶解於水之有機溶劑之情形時,水與有機溶劑之質量比(水/有機溶劑)較佳為30/70~95/5之範圍,進而較佳為50/50~90/10、60/40~80/20、或65/35~75/25之範圍。It is preferred to use water as the other solvent. In this case, the organic solvent to be used is preferably an organic solvent dissolved in water. Further, the ratio of the water to the organic solvent is not particularly limited as long as it is a ratio of the amount required to obtain a uniform solution in the form of a composition. When a solvent having a carbon number of 3 or less or the like is relatively easily dissolved in an organic solvent of water, the mass ratio of water to the organic solvent (water/organic solvent) is preferably in the range of 30/70 to 95/5, and further preferably. It is in the range of 50/50~90/10, 60/40~80/20, or 65/35~75/25.
又,於使用碳數4以上之醇等相對難溶解於水之有機溶劑之情形時,由於水在有機溶劑中之溶解度較低,故而所使用之水之量較佳為以三烷氧基矽烷之水解所需之量以上且組合物成為均勻之範圍之量使用。Further, when an organic solvent such as an alcohol having 4 or more carbon atoms is relatively difficult to dissolve in water, since the solubility of water in an organic solvent is low, the amount of water used is preferably a trialkoxy decane. It is used in an amount greater than the amount required for hydrolysis and the composition is in a uniform range.
本發明之組合物中之固形物成分濃度並無特別限制,考慮到塗膜之外觀、塗佈性、硬化性、塗膜之性質、組合物之保存穩定性等,較佳為使用成為0.5~50質量%之範圍之量,進而較佳為1.0~30質量%、1.0~20質量%、1.0~10質量%、1.5~5.0質量%、或1.8~3質量%之範圍。於小於0.5質量%之情形時,有難以均質地形成膜之情形,於大於50質量%之情形時,有組合物之穩定性、塗膜之透明性、外觀、或塗佈性等產生問題之情形。The concentration of the solid content component in the composition of the present invention is not particularly limited, and is preferably 0.5 to 0.5 in consideration of the appearance, coatability, hardenability, properties of the coating film, storage stability of the composition, and the like of the coating film. The amount in the range of 50% by mass is more preferably in the range of 1.0 to 30% by mass, 1.0 to 20% by mass, 1.0 to 10% by mass, 1.5 to 5.0% by mass, or 1.8 to 3% by mass. When it is less than 0.5% by mass, it is difficult to form a film uniformly, and when it is more than 50% by mass, the stability of the composition, the transparency of the coating film, the appearance, or the coating property may cause problems. situation.
有機溶劑及水之使用量亦可考慮到在可調整為上述固形物成分濃度之範圍內所併用之氟醇類之量而適當決定。The amount of the organic solvent and water to be used can be appropriately determined in consideration of the amount of the fluoroalcohol to be used in combination with the concentration of the solid content.
於本發明之組合物中,可根據其用途而添加其他成分,具體而言,可例示:膠體狀二氧化矽或膠體狀氧化鋁等無機微粒子、各種界面活性劑、染料、顏料、分散材料、撥水材料、增黏材料、香料、抗 菌性成分等。In the composition of the present invention, other components may be added depending on the use thereof, and specific examples thereof include inorganic fine particles such as colloidal cerium oxide or colloidal alumina, various surfactants, dyes, pigments, and dispersion materials. Water-repellent materials, sticky materials, spices, anti-drugs Bacterial ingredients, etc.
本發明之組合物之製造方法並無特別限制,具體而言,可例示以下之方法等。The method for producing the composition of the present invention is not particularly limited, and specifically, the following methods and the like can be exemplified.
i)將含環氧基三烷氧基矽烷及/或其水解縮合物、矽烷醇縮合觸媒、水及視需要之有機溶劑(包含正戊醇)於室溫下進行混合、攪拌,繼而,添加聚胺類、視需要之有機酸或氟醇類,並利用有機溶劑(包含正戊醇)及視需要之水進行稀釋。i) mixing and stirring the epoxy-containing trialkoxy decane and/or its hydrolysis condensate, decyl alcohol condensation catalyst, water and optionally an organic solvent (including n-pentanol) at room temperature, and then Polyamines, optionally organic acids or fluoroalcohols are added and diluted with an organic solvent (including n-pentanol) and optionally water.
ii)將含環氧基三烷氧基矽烷及/或其水解縮合物、水、有機溶劑(包含正戊醇)、及聚胺類於室溫下進行混合、攪拌,進而視需要添加有機酸或氟醇類,進而利用有機溶劑(包含正戊醇)及視需要之水進行稀釋。Ii) mixing and stirring the epoxy group-containing trialkoxy decane and/or its hydrolysis condensate, water, organic solvent (including n-pentanol), and polyamine at room temperature, and further adding an organic acid as needed Or fluoroalcohols, and further diluted with an organic solvent (including n-pentanol) and optionally water.
iii)將含環氧基三烷氧基矽烷及/或其水解縮合物、水、作為溶劑之醇(包含正戊醇)、聚胺類、及視需要之有機酸或氟醇類於室溫下進行混合、攪拌,進而利用有機溶劑(包含正戊醇)及視需要之水進行稀釋。Iii) an epoxy group-containing trialkoxy decane and/or its hydrolysis condensate, water, a solvent alcohol (including n-pentanol), a polyamine, and optionally an organic acid or a fluoroalcohol at room temperature The mixture is stirred and stirred, and further diluted with an organic solvent (including n-pentanol) and optionally water.
iv)將含環氧基三烷氧基矽烷、水、作為溶劑之醇(包含正戊醇)、聚胺類、及視需要之有機酸或氟醇類於室溫下進行混合、攪拌。Iv) The epoxy group-containing trialkoxy decane, water, a solvent alcohol (including n-pentanol), a polyamine, and, if necessary, an organic acid or a fluoroalcohol are mixed and stirred at room temperature.
攪拌溫度並無特別限制,較佳為室溫至所使用之溶劑之沸點溫度之範圍,進而較佳為於室溫下進行。於該情形時,室溫成為進行攪拌之場所之外部氣體溫度,較佳為15~35℃之範圍。The stirring temperature is not particularly limited, and is preferably from room temperature to the boiling point temperature of the solvent to be used, and is more preferably carried out at room temperature. In this case, the room temperature becomes the temperature of the outside air at the place where the stirring is performed, and is preferably in the range of 15 to 35 °C.
本發明之組合物可藉由刷塗、噴霧、浸漬、旋轉塗佈、棒式塗佈、凹版印刷等公知之所有塗佈方法而於作為對象物之基材之表面形成塗膜。乾燥可藉由室溫乾燥及/或加熱而進行。具體而言,於20℃~250℃、較佳為20℃~150℃下進行10秒~24小時、較佳為30秒~10小 時左右。The composition of the present invention can form a coating film on the surface of the substrate as an object by all known coating methods such as brushing, spraying, dipping, spin coating, bar coating, and gravure printing. Drying can be carried out by drying and/or heating at room temperature. Specifically, it is carried out at 20 ° C to 250 ° C, preferably 20 ° C to 150 ° C for 10 seconds to 24 hours, preferably 30 seconds to 10 hours. Around.
雖無特別限制,但所獲得之薄膜較佳為超過10nm且為5μm以下。Although not particularly limited, the obtained film is preferably more than 10 nm and 5 μm or less.
作為處理本發明之組合物之基材,只要可進行處理則並無特別限制,具體而言,可例示:鐵、不鏽鋼、銅、鋁及其他金屬、陶瓷、水泥、玻璃、聚碳酸酯樹脂、丙烯酸系樹脂、聚醯亞胺樹脂、聚酯樹脂、環氧樹脂、液晶聚合物樹脂、聚醚碸等樹脂基材等,亦可利用其他塗佈材料對表面進行塗佈。於該等之中,尤佳為樹脂基材或金屬基材。The substrate to which the composition of the present invention is treated is not particularly limited as long as it can be treated, and specific examples thereof include iron, stainless steel, copper, aluminum, and other metals, ceramics, cement, glass, and polycarbonate resins. A resin substrate such as an acrylic resin, a polyimide resin, a polyester resin, an epoxy resin, a liquid crystal polymer resin, or a polyether oxime may be coated on the surface with another coating material. Among these, a resin substrate or a metal substrate is particularly preferable.
於由本發明之組合物所獲得之薄膜上,可進而積層撥水層或含有金屬界面活性劑之水解縮合物之層、或自組化單分子膜等。On the film obtained from the composition of the present invention, a water repellent layer or a layer containing a hydrolysis condensate of a metal surfactant, or a self-assembled monomolecular film or the like may be further laminated.
本發明之組合物例如可用於對熱交換器、熱交換器用散熱片、建築材料、屋頂、窗玻璃、擋風玻璃、各種鏡子、塑膠透鏡、透鏡、輪胎、橡膠、磁性記錄媒體、半導體材料表面等之處理;對降雪地區之天線、鐵塔、電氣通信設施、道路交通標記、信號機等之處理;船舶與水之摩擦阻力之降低化、防止車輛/飛機之本體之污垢附著、防止各種金屬材料表面或電池材料等之電極之腐蝕;對魚網表面之處理;向密封劑、耐火防水密封劑、汽車蠟等中之添加等。又,經本發明之組合物處理之樹脂基板由於其表面硬質化,故而亦可用作汽車之前擋風玻璃等先前曾使用玻璃之用途之替代品。The composition of the present invention can be used, for example, for a heat exchanger, a heat sink for a heat exchanger, a building material, a roof, a window glass, a windshield, various mirrors, a plastic lens, a lens, a tire, a rubber, a magnetic recording medium, a surface of a semiconductor material. Processing of antennas, towers, electrical communication facilities, road traffic signs, signalling machines, etc. in snowfall areas; reduction of frictional resistance of ships and water, prevention of dirt adhesion of vehicles/aircraft bodies, prevention of various metal materials Corrosion of electrodes such as surfaces or battery materials; treatment of the surface of fish nets; addition to sealants, refractory waterproof sealants, automotive waxes, etc. Further, since the resin substrate treated by the composition of the present invention is hardened on the surface, it can be used as a substitute for the use of glass which has previously been used for a windshield such as a car.
以下記載實施例,但本發明之技術範圍並不限定於該等實施例。The examples are described below, but the technical scope of the present invention is not limited to the examples.
向分散於1.25g之水中之0.54g之2-甲基咪唑中添加乙酸0.44g並 使其溶解。於所獲得之水溶液中添加16.5g之3-縮水甘油氧基丙基三甲氧基矽烷(GPTMS),並於室溫下攪拌2小時。利用40.0g之Solmix(註冊商標)(AP-7,Japan Alcohol Trading股份有限公司製造)對10.0g之縮合反應液加以稀釋,而獲得固形物成分20wt%之塗佈組合物(A-1)。0.44 g of acetic acid was added to 0.54 g of 2-methylimidazole dispersed in 1.25 g of water and Let it dissolve. To the obtained aqueous solution, 16.5 g of 3-glycidoxypropyltrimethoxydecane (GPTMS) was added, and the mixture was stirred at room temperature for 2 hours. 10.0 g of the condensation reaction liquid was diluted with 40.0 g of Solmix (registered trademark) (AP-7, manufactured by Japan Alcohol Trading Co., Ltd.) to obtain a coating composition (A-1) having a solid content of 20% by weight.
於聚碳酸酯(PC)樹脂基板上進行塗佈用組合物(A-1)之成膜。首先,於PC樹脂基板上浸漬塗佈所製備之塗佈用組合物(A-1)。將塗佈後之基板於烘箱內進行乾燥(120℃,20min),而獲得塗佈用組合物處理基板(B-1)。於所獲得之處理後之基板上塗佈氟系玻璃表面撥液處理劑Ultra Glaco(註冊商標)(Soft 99公司製造),而獲得基底膜-撥液處理PC樹脂基板(C-1)。Film formation of the coating composition (A-1) was carried out on a polycarbonate (PC) resin substrate. First, the prepared coating composition (A-1) was immersed on a PC resin substrate. The coated substrate was dried in an oven (120 ° C, 20 min) to obtain a coating composition-treated substrate (B-1). A fluorine-based glass surface liquid repellent agent, Ultra Glaco (registered trademark) (manufactured by Soft 99 Co., Ltd.), was applied onto the obtained substrate to obtain a base film-liquid-repellent treated PC resin substrate (C-1).
使用接觸角測定器(Drop Master 700,協和界面科學公司製造)測定所獲得之(C-1)之靜態接觸角。將其結果示於表1。為了進行比較,製作經Ultra Glaco(註冊商標)處理之鹼石灰玻璃(SLG)基板(cC-1),並同樣地進行靜態接觸角測定。The static contact angle of (C-1) obtained was measured using a contact angle measuring device (Drop Master 700, manufactured by Kyowa Interface Science Co., Ltd.). The results are shown in Table 1. For comparison, a soda lime glass (SLG) substrate (cC-1) treated with Ultra Glaco (registered trademark) was produced, and static contact angle measurement was performed in the same manner.
*1:十四烷*1: Tetradecane
其結果得知,藉由使用本發明之塗佈組合物,而亦可於PC樹脂基板上形成與鹼石灰玻璃基板上相同之撥水性膜。As a result, it was found that the water-repellent film similar to that on the soda lime glass substrate can be formed on the PC resin substrate by using the coating composition of the present invention.
對於塗佈用組合物處理基板(B-1),實施利用X射線光電子光譜裝置(Quantera II,ULVAC-PHI公司製造)之測定。於1kV之濺鍍條件下進行100次循環,測定至約200nm之深度。將測定結果示於圖1。由圖1得知,確實形成有富含Si成分之類似玻璃之無機膜。The substrate (B-1) for coating the composition was subjected to measurement by an X-ray photoelectron spectroscopy apparatus (Quantera II, manufactured by ULVAC-PHI Co., Ltd.). The cycle was carried out for 100 cycles under a sputtering condition of 1 kV to a depth of about 200 nm. The measurement results are shown in Fig. 1. It is understood from Fig. 1 that a glass-like inorganic film rich in Si component is formed.
依據JIS K-5400(1999年)中所記載之棋盤格膠帶剝離試驗法進行(B-1)之棋盤格剝離試驗。將PC樹脂基板上之塗佈膜十字切割成1mm×1mm之棋盤格狀,並使用透明黏著帶進行剝離試驗。對各棋盤格之塗佈膜利用光學顯微鏡進行評價,結果完全未觀察到剝離(非剝離數/試驗數=100/100)。其結果得知,PC樹脂基板與塗佈膜良好地密接。The checkerboard peeling test of (B-1) was carried out in accordance with the checkerboard tape peeling test method described in JIS K-5400 (1999). The coating film on the PC resin substrate was cross-cut into a checkerboard shape of 1 mm × 1 mm, and a peeling test was performed using a transparent adhesive tape. The coating film of each checkerboard was evaluated by an optical microscope, and as a result, no peeling was observed at all (non-peeling number/test number=100/100). As a result, it was found that the PC resin substrate and the coating film were in good contact with each other.
利用與實施例1相同之方法獲得塗佈用組合物(A-1)。The coating composition (A-1) was obtained in the same manner as in Example 1.
使用所獲得之塗佈用組合物(A-1),於SUS304鏡面板及Cu鏡面板上進行成膜。首先,於SUS304鏡面板及Cu鏡面板上浸漬塗佈所製備之塗佈用組合物(A-1)。將塗佈後之基板於烘箱內進行加熱硬化(200℃,20min),而獲得處理基板(B-2)及(B-3)。對加熱處理後之Cu鏡面板以目視進行評價,結果未處理品因鏽而失去鏡面,但塗佈用組合物處理品(B-3)與加熱前相比未見變化,而維持鏡面。The coating composition (A-1) obtained was used to form a film on a SUS304 mirror panel and a Cu mirror panel. First, the prepared coating composition (A-1) was immersed on a SUS304 mirror panel and a Cu mirror panel. The coated substrate was heat-hardened (200 ° C, 20 min) in an oven to obtain treated substrates (B-2) and (B-3). The Cu mirror panel after the heat treatment was visually evaluated. As a result, the untreated product lost its mirror surface due to rust, but the coating composition treated product (B-3) did not change as compared with that before heating, and the mirror surface was maintained.
進行(B-2)、(B-3)之熱循環試驗。試驗係使用熱風乾燥機(LC-234,Espec公司製造)。以使25℃至200℃循環2小時之方式設定,放入處理基板,進行5週之熱循環試驗。藉由目視確認出(B-2)及(B-3)於 試驗後均無龜裂或剝離。The thermal cycle test of (B-2) and (B-3) was carried out. The test system used a hot air dryer (LC-234, manufactured by Espec Corporation). The sample was placed in a cycle of 25 ° C to 200 ° C for 2 hours, placed in a treated substrate, and subjected to a heat cycle test for 5 weeks. By visually confirming (B-2) and (B-3) There was no cracking or peeling after the test.
將2.0g之GPTMS、0.5g之二伸乙基三胺、0.3g之水及8.0g之正戊醇進行混合,並於室溫下攪拌2小時。利用9.0g之正戊醇對1.0g之反應溶液加以稀釋,而製備以固形物成分之質量濃度換算計為2%之塗佈組合物(A-2)。藉由粒度分佈計(Zetasizer Nano,Malvern公司製造,測定條件:溶液黏度3.31,粒子之折射率1.50)測定塗佈用組合物中之GPTMS之水解縮合物之平均粒徑,結果塗佈組合物製備1天後之粒徑為11nm。2.0 g of GPTMS, 0.5 g of diethyltriamine, 0.3 g of water and 8.0 g of n-pentanol were mixed and stirred at room temperature for 2 hours. 1.0 g of the reaction solution was diluted with 9.0 g of n-pentanol to prepare a coating composition (A-2) in an amount of 2% by mass of the solid content. The average particle diameter of the GPTMS hydrolysis condensate in the coating composition was measured by a particle size distribution meter (Zetasizer Nano, manufactured by Malvern, measuring conditions: solution viscosity 3.31, particle refractive index 1.50), and as a result, coating composition preparation was carried out. The particle size after 1 day was 11 nm.
將PC樹脂基板(80×80mm)於水、烴系清洗劑(NS Clean 100,JX Nippon Oil & Energy公司製造)及異丙醇中分別進行各10分鐘之利用超音波之清洗。於清洗後PC樹脂基板上滴加所製備之塗佈用組合物(A-2)約0.5ml,並利用Kimwipe均勻地塗開後,於溫度管理為25℃之乾燥櫃內靜置8小時,而獲得處理基板(B-4)。於相同之基板上同樣地將塗佈組合物(A-2)塗開後,於烘箱內、120℃下加熱20分鐘,而獲得處理基板(B-5)。對於所獲得之(B-4)及(B-5),使用表面硬度計(Picodentor,Fischer公司製造,測定條件:最大負荷0.5mN,蠕變速度20sec)進行維氏硬度(Vickers hardness)(HV,單位N/mm2 )及馬氏硬度(Martens hardness)(HM,單位N/mm2 )之測定。將其結果示於表2。The PC resin substrate (80 × 80 mm) was subjected to ultrasonic cleaning for 10 minutes in each of water, a hydrocarbon-based cleaning agent (NS Clean 100, manufactured by JX Nippon Oil & Energy Co., Ltd.), and isopropyl alcohol. About 0.5 ml of the prepared coating composition (A-2) was dropped on the PC resin substrate after washing, and uniformly coated with Kimwipe, and then allowed to stand in a drying cabinet at a temperature of 25 ° C for 8 hours. The treated substrate (B-4) was obtained. The coating composition (A-2) was coated on the same substrate in the same manner, and then heated in an oven at 120 ° C for 20 minutes to obtain a treated substrate (B-5). For the obtained (B-4) and (B-5), Vickers hardness (HV) was performed using a surface hardness meter (Picodentor, manufactured by Fischer, measuring conditions: maximum load 0.5 mN, creep rate 20 sec). , unit N/mm 2 ) and Martens hardness (HM, unit N/mm 2 ). The results are shown in Table 2.
使用GPTMS、二伸乙基三胺,利用與實施例3相同之方法製備塗佈組合物(A-2)。The coating composition (A-2) was prepared in the same manner as in Example 3 using GPTMS and diethylenetriamine.
將約0.5ml之塗佈組合物(A-2)滴至聚對苯二甲酸乙二酯(PET)膜上,並利用Kimwipe以成為均勻之方式塗開。於烘箱中以120℃加熱20分鐘,而獲得塗佈組合物處理PET膜(B-6)。About 0.5 ml of the coating composition (A-2) was dropped onto a polyethylene terephthalate (PET) film and spread by a Kimwipe in a uniform manner. The coating composition-treated PET film (B-6) was obtained by heating at 120 ° C for 20 minutes in an oven.
藉由相同之方法將相同溶液於SUS304鏡面板上塗開後,利用烘箱於200℃下加熱20分鐘,而獲得塗佈組合物處理SUS304鏡面板(B-7)。The same solution was spread on a SUS304 mirror panel by the same method, and then heated at 200 ° C for 20 minutes in an oven to obtain a coating composition-treated SUS304 mirror panel (B-7).
針對所獲得之兩基板(B-6)、(B-7),對塗佈膜上進行10分鐘之UV(Ultraviolet,紫外線)臭氧處理(約12,000mJ/cm2 )後,於SAM形成溶液(SAMLAY(註冊商標),日本曹達公司製造)中浸漬5分鐘,其後,將該表面於烴系清洗劑(NS Clean 100,JX Nippon Oil & Energy公司製造)中進行超音波清洗,而獲得SAM處理基板(C-2)、(C-3)。利用與上述相同之方法對各基板進行靜態接觸角測定。將其結果示於表3。After UV (Ultraviolet) ozone treatment (about 12,000 mJ/cm 2 ) was performed on the coated substrates for 10 minutes on the obtained two substrates (B-6) and (B-7), a solution was formed in the SAM ( SAMLAY (registered trademark), manufactured by Nippon Soda Co., Ltd.) was immersed for 5 minutes, and then the surface was subjected to ultrasonic cleaning in a hydrocarbon-based cleaning agent (NS Clean 100, manufactured by JX Nippon Oil & Energy Co., Ltd.) to obtain SAM treatment. Substrate (C-2), (C-3). The static contact angle measurement was performed on each substrate by the same method as described above. The results are shown in Table 3.
於水、TD之情形時均觀察到SAM之典型之接觸角。The typical contact angle of SAM was observed in the case of water and TD.
將2.0g之GPTMS、0.5g之二伸乙基三胺、0.22g(相對於GPTMS 為2莫耳當量)之水及8.0g之正戊醇進行混合,並於室溫下攪拌2小時,進而利用90g之正戊醇進行稀釋,而製備以固形物成分之質量濃度換算計為2.5%之塗佈組合物(A-3)。藉由粒度分佈計(Zetasizer Nano,Malvern公司製造,測定條件:將溶液黏度設定為作為主溶劑之正戊醇之黏度,粒子之折射率1.50)測定塗佈用組合物中之GPTMS之水解縮合物之平均粒徑,結果塗佈組合物製備1天後之粒徑為11nm。2.0 g of GPTMS, 0.5 g of diethyltriamine, 0.22 g (relative to GPTMS) 2 parts of water and 8.0 g of n-pentanol were mixed and stirred at room temperature for 2 hours, and further diluted with 90 g of n-pentanol to prepare a mass concentration of 2.5 in terms of solid content. % coating composition (A-3). The hydrolysis condensate of GPTMS in the coating composition was measured by a particle size distribution meter (Zetasizer Nano, manufactured by Malvern, measuring conditions: setting the viscosity of the solution to the viscosity of n-pentanol as a main solvent, and the refractive index of the particles was 1.50) The average particle diameter was as follows. The particle size of the coating composition after 1 day of preparation was 11 nm.
使用異丙醇、甲醇、乙醇、正丁醇代替正戊醇,利用與上述方法相同之方法製備塗佈組合物(A-31)~(A-34)。The coating composition (A-31) to (A-34) was prepared by the same method as the above method using isopropanol, methanol, ethanol, n-butanol instead of n-pentanol.
將(A-3)及(A-31)~(A-34)裝入塞緊之瓶中,保存於25℃下,利用上述粒度分佈計(測定條件與正戊醇之情形相同,設定為各主溶劑之黏度,粒子之折射率與上述相同)測定各組合物中之z-平均粒徑之經時變化。將其結果示於圖2。(A-3) and (A-31) to (A-34) were placed in a stoppered bottle and stored at 25 ° C. The measurement was carried out under the same conditions as in the case of n-pentanol. The viscosity of each main solvent and the refractive index of the particles were the same as described above. The temporal change of the z-average particle diameter in each composition was measured. The results are shown in Fig. 2.
由圖2得知,於使用正戊醇之情形時,保存穩定性最佳。It is known from Fig. 2 that the storage stability is optimal when n-pentanol is used.
將2.0g之GPTMS、0.5g之二伸乙基三胺、0.22g之水及8.0g之正戊醇進行混合,其後,於室溫下進行攪拌,而製備塗佈組合物。於剛混合後進行取樣,利用正戊醇稀釋至10倍,並利用粒度分佈計(Zetasizer Nano,Malvern公司製造,測定條件:與實施例3相同)測定z-平均粒徑。將剩餘之塗佈組合物於室溫下攪拌1小時、8小時、1天、2天及3天後進行取樣,以相同之條件進行稀釋,並測定z-平均粒徑。2.0 g of GPTMS, 0.5 g of diethyltriamine, 0.22 g of water, and 8.0 g of n-pentanol were mixed, and then stirred at room temperature to prepare a coating composition. The mixture was sampled immediately after mixing, diluted to 10 times with n-pentanol, and the z-average particle diameter was measured by a particle size distribution meter (Zetasizer Nano, manufactured by Malvern, measuring conditions: same as in Example 3). The remaining coating composition was stirred at room temperature for 1 hour, 8 hours, 1 day, 2 days, and 3 days, and then diluted under the same conditions, and the z-average particle diameter was measured.
於在水、烴系清洗劑(NS Clean 100,JX Nippon Oil & Energy公司製造)及異丙醇中分別進行各10分鐘之利用超音波之清洗後的PC樹脂基板(80×80mm)上滴加所取樣之各塗佈用組合物約0.5ml,並利用 Kimwipe均勻地塗開,其後,於120℃之烘箱中進行10分鐘加熱硬化,而獲得處理基板,以目視確認有無塗佈不均(外觀評價)。將無塗佈不均之情形判定為○,將有塗佈不均之情形判定為×。又,將所獲得之膜利用Kimwipe輕微擦拭10次,並以目視確認有無擦傷(摩擦試驗)。將無擦傷之情形判定為○,將有擦傷之情形判定為×。將其結果示於表4。On a PC resin substrate (80 × 80 mm) which was washed with ultrasonic waves for 10 minutes in water, a hydrocarbon-based cleaning agent (NS Clean 100, manufactured by JX Nippon Oil & Energy Co., Ltd.), and isopropyl alcohol. Each of the coating compositions sampled was about 0.5 ml and utilized. Kimwipe was uniformly spread, and then heat-hardened in an oven at 120 ° C for 10 minutes to obtain a treated substrate to visually confirm the presence or absence of coating unevenness (appearance evaluation). The case where there was no coating unevenness was judged as ○, and the case where coating unevenness was applied was judged as ×. Further, the obtained film was lightly wiped 10 times with a Kimwipe, and visually confirmed whether or not there was a scratch (friction test). The case where no scratch was caused was judged as ○, and the case where there was scratch was judged as ×. The results are shown in Table 4.
根據上述內容得知,若平均粒徑為5nm以下,則無法獲得充分硬度之膜,若平均粒徑為50nm以上,則塗膜之塗佈性較差,到處可見塗佈斑。According to the above, when the average particle diameter is 5 nm or less, a film having sufficient hardness cannot be obtained, and when the average particle diameter is 50 nm or more, the coating property of the coating film is inferior, and a coating spot is observed everywhere.
將2.0g之GPTMS、0.5g之二伸乙基三胺、水與異丙醇(IPA)之質量比(水/IPA)為5/2之混合溶劑8.0g進行混合,並於室溫下攪拌2小時,進而利用水/IPA之質量比為5/2之混合溶劑90g進行稀釋,而製備以固形物成分之質量濃度換算計為2.5%之塗佈組合物(A-4)。Mix 2.0 g of GPTMS, 0.5 g of diethyltriamine, 8.0 g of water and isopropyl alcohol (IPA) in a mass ratio (water/IPA) of 5/2, and stir at room temperature. Further, the mixture was diluted with 90 g of a mixed solvent of water/IPA in a mass ratio of 5/2 for 2 hours to prepare a coating composition (A-4) in an amount of 2.5% by mass of the solid content.
將2.0g之GPTMS、0.5g之二伸乙基三胺、水與異丙醇(IPA)之質量比(水/IPA)為5/2之混合溶劑8.0g進行混合,於室溫下攪拌2小時,並利用IPA 90g進行稀釋,而製備以固形物成分之質量濃度換算計為2.5%之塗佈組合物(A-41)。Mix 2.0 g of GPTMS, 0.5 g of diethyltriamine, 8.0 g of water and isopropyl alcohol (IPA) in a mass ratio (water/IPA) of 5/2, and stir at room temperature 2 The coating composition (A-41) having a mass concentration of the solid content of 2.5% was prepared by diluting with IPA 90 g in an hour.
將(A-4)及(A-41)裝入塞緊之瓶中,保存於25℃下,藉由粒度分佈計(Zetasizer Nano,Malvern公司製造,測定條件:與實施例3相同)測定組合物中之固形物成分之z-平均粒徑,並測定其經時變化。將其結果示於圖3。(A-4) and (A-41) were placed in a stoppered bottle, and stored at 25 ° C, and the combination was measured by a particle size distribution meter (Zetasizer Nano, manufactured by Malvern, measuring conditions: same as in Example 3). The z-average particle size of the solids component in the material and its change over time. The result is shown in Fig. 3.
將2.0g之GPTMS、0.5g之二伸乙基三胺、水與異丙醇(IPA)之質量比(水/IPA)為5/2之混合溶劑8.0g進行混合,並於室溫下攪拌2小時,進而添加16g、32g、48g之2,2,2-三氟乙醇(TFE)或0.5g、1.0g、2.0g之1,1,1,3,3,3-六氟-2-丙醇(HFIP),進而利用水/IPA質量比為5/2之混合溶劑以使組合物整體成為100g之方式進行稀釋,而製備塗佈組合物(A-51)~(A-56)。又,除了不添加TFE及HFIP以外,利用與上述方法相同之方法進行製備,而獲得塗佈組合物(A-50)。Mix 2.0 g of GPTMS, 0.5 g of diethyltriamine, 8.0 g of water and isopropyl alcohol (IPA) in a mass ratio (water/IPA) of 5/2, and stir at room temperature. 2 hours, further adding 16g, 32g, 48g of 2,2,2-trifluoroethanol (TFE) or 0.5g, 1.0g, 2.0g of 1,1,1,3,3,3-hexafluoro-2- The coating composition (A-51) to (A-56) was prepared by diluting with propanol (HFIP) and further using a mixed solvent of water/IPA mass ratio of 5/2 so that the entire composition became 100 g. Further, the coating composition (A-50) was obtained by the same method as the above method except that TFE and HFIP were not added.
將(A-50)~(A-54)裝入塞緊之瓶中,保存於25℃下,藉由粒度分佈計(Zetasizer Nano,Malvern公司製造,測定條件:與實施例3相同)測定組合物中之固形物成分之z-平均粒徑,並測定其經時變化。將其結果示於圖4。(A-50) to (A-54) were placed in a stoppered bottle, and stored at 25 ° C, and the combination was measured by a particle size distribution meter (Zetasizer Nano, manufactured by Malvern, measuring conditions: same as in Example 3). The z-average particle size of the solids component in the material and its change over time. The result is shown in Fig. 4.
根據上述內容得知,為了長期保存,較佳為使用組合物整體之30質量%以上之TFE。又,得知於添加少量HFIP之情形時,亦可確保某程度之保存穩定性。According to the above, it is preferable to use TFE of 30% by mass or more of the entire composition for long-term storage. Further, it has been found that a certain degree of storage stability can be ensured when a small amount of HFIP is added.
將2.0g之GPTMS、0.5g之二伸乙基三胺、0.5g之苯甲酸、70.0g之水及28.0g之IPA進行混合,其後,於室溫下攪拌2小時,而製備以固形物成分之質量濃度換算計為3%之塗佈組合物(A-6)。藉由粒度分佈計(Zetasizer Nano,Malvern公司製造)測定塗佈用組合物中之固形物成分之平均粒徑,結果塗佈組合物製備1天後之粒徑為8.5nm。2.0 g of GPTMS, 0.5 g of diethyltriamine, 0.5 g of benzoic acid, 70.0 g of water and 28.0 g of IPA were mixed, and then stirred at room temperature for 2 hours to prepare a solid. The coating composition (A-6) in terms of mass concentration of the component was 3%. The average particle diameter of the solid content in the coating composition was measured by a particle size distribution meter (Zetasizer Nano, manufactured by Malvern Co., Ltd.), and as a result, the particle size of the coating composition after one day of preparation was 8.5 nm.
將PC樹脂基板(80×80mm)於水、烴系溶劑(NS Clean 100)及IPA中分別進行各10分鐘之利用超音波之清洗。使用棒式塗佈而將所製備之塗佈用組合物於清洗後之PC樹脂基板上成膜,並於溫度管理為100℃之循環型烘箱內進行10分鐘加熱乾燥,而獲得由塗佈組合物(A-6)所形成之塗膜之膜厚約50nm之處理基板(B-8)。The PC resin substrate (80 × 80 mm) was subjected to ultrasonic cleaning for 10 minutes in each of water, a hydrocarbon solvent (NS Clean 100), and IPA. The prepared coating composition was formed into a film on the cleaned PC resin substrate by bar coating, and dried by heating in a circulating oven of 100 ° C for 10 minutes to obtain a coating combination. A substrate (B-8) having a film thickness of about 50 nm of the coating film formed of the object (A-6).
使用色彩-濁度測定器(COH400,日本電子工業股份有限公司製造)分別求出(B-8)之霧度率、及L*值、a*值、b*值。為了進行比較,亦對未經處理之PC樹脂基板同樣地進行測定。將其結果示於表5。The haze ratio (B-8), the L* value, the a* value, and the b* value of (B-8) were respectively determined using a color-turbidity measuring instrument (COH400, manufactured by JEOL Ltd.). For comparison, the untreated PC resin substrate was also measured in the same manner. The results are shown in Table 5.
根據上述內容得知,本發明之塗膜為無色、透明之塗膜。According to the above, the coating film of the present invention is a colorless, transparent coating film.
使用各種基材,以表5所示之條件使用塗佈組合物(A-6)進行處理,對處理後之基板利用基於JIS K5400(1999年)中記載之棋盤格膠帶剝離試驗之方法進行試驗。將其結果示於表6。Using various substrates, the coating composition (A-6) was treated under the conditions shown in Table 5, and the treated substrate was tested by a checkerboard tape peeling test described in JIS K5400 (1999). . The results are shown in Table 6.
*1:聚對苯二甲酸乙二酯*1: Polyethylene terephthalate
*2:玻璃纖維強化塑膠*2: Glass fiber reinforced plastic
*3:括號內表示(未剝離數/試驗數)。*3: Indicated in parentheses (number of unpeeled/tests).
*4:塗佈方法係使用棒式塗佈。*4: The coating method is a bar coating.
*5:於塗佈前進行了UV臭氧處理(約2400mJ/cm2 )。*5: UV ozone treatment (about 2400 mJ/cm 2 ) was carried out before coating.
根據上述內容得知,無論無機、有機、金屬,對所有基材均可形成密接性優異之塗膜。According to the above, it is known that a coating film excellent in adhesion can be formed on all the substrates regardless of inorganic, organic or metallic.
對塗佈用組合物處理基板(B-8)實施利用X射線光電子光譜裝置(Quantera II,ULVAC-PHI公司製造,測定條件:電壓:1kV,循環次數100,測定至約200nm之深度)之測定。將測定結果示於圖5。The coating composition-treated substrate (B-8) was measured by an X-ray photoelectron spectroscopy apparatus (Quantera II, manufactured by ULVAC-PHI, measuring conditions: voltage: 1 kV, cycle number 100, measured to a depth of about 200 nm) . The measurement results are shown in Fig. 5.
使用棒式塗佈而將約0.5mL之塗佈組合物(A-6)於PET膜上成膜,利用烘箱於100℃下加熱10分鐘,而獲得經塗佈組合物處理之PET膜(B-9)。進而,獲得對(B-9)之塗佈面進行10分鐘UV臭氧處理(約12000mJ/cm2 )後之膜(B-10)。進而,將(B-10)於SAMLAY(註冊商標)中浸漬5分鐘,其後,將該表面於NS Clean 100中進行超音波清洗,而獲得SAM處理膜(C-4)。About 0.5 mL of the coating composition (A-6) was formed into a film on a PET film by bar coating, and heated at 100 ° C for 10 minutes in an oven to obtain a PET film treated with the coated composition (B) -9). Further, a film (B-10) obtained by subjecting the coated surface of (B-9) to UV ozone treatment (about 12000 mJ/cm 2 ) for 10 minutes was obtained. Further, (B-10) was immersed in SAMLAY (registered trademark) for 5 minutes, and thereafter, the surface was subjected to ultrasonic cleaning in NS Clean 100 to obtain a SAM-treated film (C-4).
為了進行比較,製作利用SAMLAY(註冊商標)對無處理PET膜進行處理後之膜(cC-4)。For comparison, a film (cC-4) obtained by treating the untreated PET film with SAMLAY (registered trademark) was prepared.
針對無處理之PET膜、(B-9)、(B-10)、(C-4)、及(cC-4)各膜,利用與上述相同之方法測定靜態接觸角。將其結果一併示於表7。The static contact angle was measured by the same method as described above for the untreated PET film, (B-9), (B-10), (C-4), and (cC-4) films. The results are shown together in Table 7.
根據上述內容得知,藉由使用本發明之塗膜,可於聚合物上進行與玻璃相同之表面處理。From the above, it is known that the same surface treatment as glass can be carried out on the polymer by using the coating film of the present invention.
將2.0g之GPTMS、0.5g之二伸乙基三胺、0.5g、0.2g、0.08g之苯甲酸、70.0g之水及28.0g之IPA進行混合,其後,於室溫下攪拌2小時,而製備塗佈組合物(A-71)~(A-73)。亦同樣地製備不使用苯甲酸之組合物(A-70)。將所獲得之(A-70)及(A-71)~(A-73)裝入塞緊之瓶中,保存於25℃下,藉由粒度分佈計(Zetasizer Nano,Malvern公司製造)測定組合物中之固形物成分之z-平均粒徑之經時變化。將其結果示於圖6。2.0 g of GPTMS, 0.5 g of diethyltriamine, 0.5 g, 0.2 g, 0.08 g of benzoic acid, 70.0 g of water and 28.0 g of IPA were mixed, and then stirred at room temperature for 2 hours. The coating composition (A-71) to (A-73) was prepared. A composition (A-70) which does not use benzoic acid is also prepared in the same manner. The obtained (A-70) and (A-71) to (A-73) were placed in a stoppered bottle, and stored at 25 ° C, and the combination was measured by a particle size distribution meter (Zetasizer Nano, manufactured by Malvern). The z-average particle size of the solids component in the material changes over time. The result is shown in Fig. 6.
將0.5g之GPTMS、0.125g之二伸乙基三胺、0.171g之對硝基苯甲酸、17.5g之水及7.0g之IPA進行混合,其後,於室溫下攪拌2小時,而製備塗佈組合物(A-80)。藉由相同之操作,製備使用0.156g之對甲氧基苯甲酸或0.0615g之乙酸代替對硝基苯甲酸之塗佈組合物(A-81)或(A-82)。0.5 g of GPTMS, 0.125 g of diethyltriamine, 0.171 g of p-nitrobenzoic acid, 17.5 g of water and 7.0 g of IPA were mixed, and then stirred at room temperature for 2 hours to prepare Coating composition (A-80). By the same operation, a coating composition (A-81) or (A-82) using 0.156 g of p-methoxybenzoic acid or 0.0615 g of acetic acid instead of p-nitrobenzoic acid was prepared.
將(A-80)、(A-81)及(A-82)裝入塞緊之瓶中,保存於25℃下,藉由粒度分佈計(Zetasizer Nano,Malvern公司製造,測定條件:與實施例3相同)測定組合物中之固形物成分之z-平均粒徑,並測定其經時變 化。將其結果示於圖7。(A-80), (A-81), and (A-82) were placed in a stoppered bottle, and stored at 25 ° C, and were measured by a particle size distribution meter (Zetasizer Nano, manufactured by Malvern Co., Ltd., measurement conditions: and implementation). Example 3 is the same) determining the z-average particle size of the solid component in the composition and measuring its time-dependent Chemical. The result is shown in Fig. 7.
使用棒式塗佈將約0.5mL之塗佈組合物(A-80)、(A-81)及(A-82)於PET膜上成膜,利用烘箱於100℃下加熱10分鐘,而獲得塗佈組合物處理PET膜(B-11)、(B-12)及(B-13)。進而,對塗佈面進行10分鐘UV臭氧處理(約12000mJ/cm2 )後,於SAMLAY(註冊商標)中浸漬5分鐘,其後,將該表面於NS Clean 100中進行超音波清洗,而獲得經SAM處理之膜(C-5)、(C-6)及(C-7)。利用與上述相同之方法對各膜進行靜態接觸角測定。將其結果一併示於表8。About 0.5 mL of the coating compositions (A-80), (A-81), and (A-82) were formed into a film on a PET film by bar coating, and heated at 100 ° C for 10 minutes in an oven. The coating compositions were treated with PET films (B-11), (B-12) and (B-13). Further, the coated surface was subjected to UV ozone treatment (about 12,000 mJ/cm 2 ) for 10 minutes, and then immersed in SAMLAY (registered trademark) for 5 minutes, and then the surface was ultrasonically cleaned in NS Clean 100 to obtain SAM treated membranes (C-5), (C-6) and (C-7). Each film was subjected to static contact angle measurement by the same method as described above. The results are shown together in Table 8.
將0.5g之GPTMS、0.05g之3,3,4,4,5,5,6,6,6-九氟己基三甲氧基矽烷、0.125g之二伸乙基三胺、0.125g之苯甲酸、2.0g之2,2,2-三氟乙醇、16.0g之水及6.5g之IPA進行混合,其後,於室溫下攪拌24小時,而獲得塗佈組合物(A-8)。0.5 g of GPTMS, 0.05 g of 3,3,4,4,5,5,6,6,6-nonafluorohexyltrimethoxydecane, 0.125 g of diethyltriamine, 0.125 g of benzoic acid 2.0 g of 2,2,2-trifluoroethanol, 16.0 g of water and 6.5 g of IPA were mixed, and then stirred at room temperature for 24 hours to obtain a coating composition (A-8).
將PC樹脂基板(80×80mm)於水、NS Clean及IPA中分別進行各10分鐘之利用超音波之清洗。使用棒式塗佈而將所製備之塗佈用組合物(A-8)於清洗後之PC樹脂基板上成膜,並於溫度管理為120℃之循環型烘箱內進行20分鐘加熱乾燥,而獲得處理基板(B-11)。The PC resin substrate (80 × 80 mm) was subjected to ultrasonic cleaning for 10 minutes in each of water, NS Clean, and IPA. The prepared coating composition (A-8) was formed into a film on the cleaned PC resin substrate by bar coating, and dried in a circulating oven having a temperature management of 120 ° C for 20 minutes. The treated substrate (B-11) was obtained.
利用與上述相同之方法,對所獲得之處理基板(B-11)及進而對該處理基板(B-11)摩擦之後之處理基板(B-12)之靜態接觸角進行測定。為了進行比較,亦對未添加氟三甲氧基矽烷所製備獲得之處理基板 (R-1)進行相同之測定。將其結果示於表9。The static contact angle of the obtained processing substrate (B-11) and the processing substrate (B-12) after the processing substrate (B-11) was rubbed was measured by the same method as described above. For comparison, a processed substrate prepared by adding no fluorotrimethoxydecane was also prepared. (R-1) The same measurement was carried out. The results are shown in Table 9.
於16.5g之3-縮水甘油氧基丙基三甲氧基矽烷(信越化學公司製造KBM-403)中添加1vol%乙酸水溶液1.27g,並於室溫下攪拌3天。於所獲得之反應液中添加0.54g之2-甲基咪唑,並添加94.3g之醇系混合溶劑Solmix(註冊商標)(AP-7,Japan Alcohol Trading股份有限公司製造),而獲得固形物成分20wt%之塗佈組合物(cA-2)。To 16.5 g of 3-glycidoxypropyltrimethoxydecane (KBM-403 manufactured by Shin-Etsu Chemical Co., Ltd.), 1.27 g of a 1 vol% aqueous acetic acid solution was added, and the mixture was stirred at room temperature for 3 days. To the obtained reaction liquid, 0.54 g of 2-methylimidazole was added, and 94.3 g of an alcohol-based mixed solvent Solmix (registered trademark) (AP-7, manufactured by Japan Alcohol Trading Co., Ltd.) was added to obtain a solid component. 20% by weight of the coating composition (cA-2).
於PC樹脂基板上浸漬塗佈所製備之塗佈組合物(cA-2)。將塗佈後之基板於烘箱內進行乾燥(120℃,20分鐘),而獲得塗佈組合物處理基板(cB-1)。於所獲得之處理基板上塗佈氟系玻璃表面撥液處理劑Ultra Glaco(註冊商標)(Soft 99 Corporation製造),而獲得塗佈組合物-撥液處理PC基板(cC-2)。The prepared coating composition (cA-2) was dip-coated on a PC resin substrate. The coated substrate was dried in an oven (120 ° C, 20 minutes) to obtain a coating composition-treated substrate (cB-1). A fluorine-based glass surface liquid repellent agent, Ultra Glaco (registered trademark) (manufactured by Soft 99 Corporation), was applied onto the obtained treated substrate to obtain a coating composition-liquid-repellent treated PC substrate (cC-2).
為了進行比較,獲得對鹼石灰玻璃塗佈處理氟系玻璃表面撥液處理劑Ultra Glaco(註冊商標)(Soft 99 Corporation製造)後之基板(cC-3)。For comparison, a substrate (cC-3) obtained by applying a fluoroglass glass surface liquid treatment agent, Ultra Glaco (registered trademark) (manufactured by Soft 99 Corporation), to a soda lime glass coating was obtained.
利用與上述相同之方法測定所獲得之(cC-2)、(cC-3)之靜態接觸角。將其結果示於表10。The static contact angles of (cC-2) and (cC-3) obtained were measured by the same method as described above. The results are shown in Table 10.
該值雖為與對鹼石灰玻璃(SLG)基材進行了Ultra Glaco處理之情形同等之撥液性,但塗佈組合物之製備會需要3天。This value is equivalent to the liquid repellency of the case where the soda lime glass (SLG) substrate is subjected to Ultra Glaco treatment, but the preparation of the coating composition takes 3 days.
Claims (13)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2013013845 | 2013-01-29 | ||
| JP2013104509 | 2013-05-16 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TW201441307A TW201441307A (en) | 2014-11-01 |
| TWI503375B true TWI503375B (en) | 2015-10-11 |
Family
ID=51262000
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW103103290A TWI503375B (en) | 2013-01-29 | 2014-01-28 | Organic silane-based compositions |
Country Status (3)
| Country | Link |
|---|---|
| JP (1) | JP5951050B2 (en) |
| TW (1) | TWI503375B (en) |
| WO (1) | WO2014119282A1 (en) |
Families Citing this family (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2014198419A (en) * | 2013-03-29 | 2014-10-23 | 大日本印刷株式会社 | Thermal transfer image receiving sheet and manufacturing method thereof |
| JPWO2016006212A1 (en) * | 2014-07-11 | 2017-05-25 | 日本曹達株式会社 | Laminate |
| WO2016009617A1 (en) * | 2014-07-16 | 2016-01-21 | 日本曹達株式会社 | Silane coating composition |
| JP2016131215A (en) * | 2015-01-14 | 2016-07-21 | 日本曹達株式会社 | Organic thin film transistor |
| WO2016121316A1 (en) * | 2015-01-26 | 2016-08-04 | 日本曹達株式会社 | Substrate equipped with electroconductive film |
| JP2017155124A (en) * | 2016-03-01 | 2017-09-07 | セイコーインスツル株式会社 | Coating agent, method for producing coating agent and method of forming coating film |
| CN107267031A (en) * | 2017-08-02 | 2017-10-20 | 合肥万之景门窗有限公司 | A kind of preparation method of New insulated coating for plastic-steel door and window |
| KR102736123B1 (en) * | 2019-03-29 | 2024-12-02 | 미쯔이가가꾸가부시끼가이샤 | Method for producing optical material, polymerizable composition for optical material |
| WO2022112662A1 (en) * | 2020-11-30 | 2022-06-02 | Brightplus Oy | Coating for glass articles |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5525469A (en) * | 1978-08-14 | 1980-02-23 | Japan Atom Energy Res Inst | Thermosetting resin composition |
| JP2011006592A (en) * | 2009-06-26 | 2011-01-13 | Jgc Catalysts & Chemicals Ltd | Process for producing polyorganosiloxane particle |
| JP2011523424A (en) * | 2008-04-08 | 2011-08-11 | ウオーターズ・テクノロジーズ・コーポレイシヨン | Nanoparticle-containing composites and their use in chromatography |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR2523590B1 (en) * | 1982-03-16 | 1984-06-29 | Inst Nat Rech Chimique | BASIC LIQUID COMPOSITION SUITABLE FOR PRODUCING TRANSPARENT OR VARNISHED COATINGS ON SOLID SURFACES, PROCESS FOR OBTAINING VARNISHES AND VARNISHES THEREFROM |
| JPH0830169B2 (en) * | 1986-08-19 | 1996-03-27 | 日本合成ゴム株式会社 | Coating composition |
| US4800122A (en) * | 1987-09-22 | 1989-01-24 | Gentex Corporation | Siloxane-based tintable coating |
| JP3949142B2 (en) * | 2005-03-18 | 2007-07-25 | 旭ファイバーグラス株式会社 | Aqueous binder for inorganic fiber and heat insulating sound absorbing material for inorganic fiber |
| GB0524189D0 (en) * | 2005-11-28 | 2006-01-04 | Welding Inst | Process for the production of organosilsesquioxanes |
-
2014
- 2014-01-28 JP JP2014559566A patent/JP5951050B2/en not_active Expired - Fee Related
- 2014-01-28 WO PCT/JP2014/000407 patent/WO2014119282A1/en not_active Ceased
- 2014-01-28 TW TW103103290A patent/TWI503375B/en not_active IP Right Cessation
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5525469A (en) * | 1978-08-14 | 1980-02-23 | Japan Atom Energy Res Inst | Thermosetting resin composition |
| JP2011523424A (en) * | 2008-04-08 | 2011-08-11 | ウオーターズ・テクノロジーズ・コーポレイシヨン | Nanoparticle-containing composites and their use in chromatography |
| JP2011006592A (en) * | 2009-06-26 | 2011-01-13 | Jgc Catalysts & Chemicals Ltd | Process for producing polyorganosiloxane particle |
Also Published As
| Publication number | Publication date |
|---|---|
| JP5951050B2 (en) | 2016-07-13 |
| JPWO2014119282A1 (en) | 2017-01-26 |
| TW201441307A (en) | 2014-11-01 |
| WO2014119282A1 (en) | 2014-08-07 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| TWI503375B (en) | Organic silane-based compositions | |
| KR102008550B1 (en) | Curable resin composition, resin composition, resin sheet formed by using said curable resin composition and resin composition, and hardener for said curable resin composition and resin composition | |
| TW200909541A (en) | Abrasion-resistant coating composition and coated article | |
| KR20160089361A (en) | Transparent hydrophobic coating materials with improved durability and methods of making same | |
| TW201823258A (en) | Liquid composition for film formation and method for producing same | |
| JP2020513450A (en) | Abrasion resistant coating composition using inorganic metal oxide | |
| JP5178199B2 (en) | Using polysilazane for coating metal strips. | |
| CN104428135B (en) | Thin film laminate with self-organized film | |
| Seok et al. | Preparation of corrosion protective coatings on galvanized iron from aqueous inorganic–organic hybrid sols by sol–gel method | |
| TWI490254B (en) | Inorganic passivation coating material, method for forming the same, and inorganic passivation protective film produced therefrom | |
| CN108264842A (en) | Anti-glare coating composition and anti-glare substrate comprising same | |
| CN108384443B (en) | Organic/inorganic hybrid super-hydrophobic coating and preparation method and application thereof | |
| JP2016050276A (en) | Surface treatment agent for coated steel panel | |
| TWI550043B (en) | Silane coating composition | |
| CN114901475A (en) | Laminate, method for producing same, and coating composition for forming moisture-absorbing film | |
| JP6077659B2 (en) | Coating composition | |
| JPH09272859A (en) | Production of composition for water-repellent and antistatic coating film and production of base material bearing the coating film | |
| TWI587322B (en) | The substrate with conductive film | |
| TWI589646B (en) | Organic-inorganic complex | |
| TWI537136B (en) | Laminated body | |
| KR101970510B1 (en) | Coating paint using photo reactive filler | |
| JP2016117820A (en) | Organosilane composition for dip coating | |
| JP2022523924A (en) | An improved way to apply silane-based coatings on solid surfaces, especially metal surfaces | |
| JP2012180544A (en) | Glass coating agent | |
| JP2002161241A (en) | Antifogging composition for coating surface and antifogging surface-coated product |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| MM4A | Annulment or lapse of patent due to non-payment of fees |