TWI593491B - Electrochemical processing system and electrochemical machining methods - Google Patents
Electrochemical processing system and electrochemical machining methods Download PDFInfo
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- TWI593491B TWI593491B TW104141261A TW104141261A TWI593491B TW I593491 B TWI593491 B TW I593491B TW 104141261 A TW104141261 A TW 104141261A TW 104141261 A TW104141261 A TW 104141261A TW I593491 B TWI593491 B TW I593491B
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- 238000000034 method Methods 0.000 title description 8
- 238000003754 machining Methods 0.000 title description 4
- 238000004140 cleaning Methods 0.000 claims description 19
- 238000003672 processing method Methods 0.000 claims description 11
- 239000003792 electrolyte Substances 0.000 claims description 9
- 230000000873 masking effect Effects 0.000 claims description 5
- 238000010586 diagram Methods 0.000 description 2
- 239000012535 impurity Substances 0.000 description 2
- 150000002500 ions Chemical class 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 1
- 125000004122 cyclic group Chemical group 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
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- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25F—PROCESSES FOR THE ELECTROLYTIC REMOVAL OF MATERIALS FROM OBJECTS; APPARATUS THEREFOR
- C25F7/00—Constructional parts, or assemblies thereof, of cells for electrolytic removal of material from objects; Servicing or operating
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- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25F—PROCESSES FOR THE ELECTROLYTIC REMOVAL OF MATERIALS FROM OBJECTS; APPARATUS THEREFOR
- C25F3/00—Electrolytic etching or polishing
- C25F3/02—Etching
- C25F3/14—Etching locally
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- Chemical Kinetics & Catalysis (AREA)
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- Materials Engineering (AREA)
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- Organic Chemistry (AREA)
- Cleaning In General (AREA)
- Electrical Discharge Machining, Electrochemical Machining, And Combined Machining (AREA)
Description
本發明係有關於一種電化學加工,尤指一種可清潔電極之電化學加工系統及其方法。 The present invention relates to an electrochemical process, and more particularly to an electrochemical machining system and method for cleaning an electrode.
電化學加工為非傳統加工方法,其可對於難以加工之金屬工件進行加工處理,電化學加工是在電解液中進行,金屬工件作為陽極,而電極作為陰極,電化學加工是以陽極融解原理對工件進行加工,作為陽極之工件的表面會解離出離子,如此即對工件進行移除加工,而解離出的離子則進入電解液中形成生成物,此生成物或者雜質會附著於電極之表面,因此降低電化學加工之品質。故,當電極進行電化學加工於一段時間後,則要先停止進行電化學加工,以替換電極或清潔電極,如此一來,即會降低電化學加工之效能。 Electrochemical machining is a non-traditional processing method, which can process metal workpieces that are difficult to process. Electrochemical processing is performed in an electrolyte. The metal workpiece acts as an anode and the electrode acts as a cathode. Electrochemical processing is based on the principle of anode melting. The workpiece is processed, and the surface of the workpiece as the anode dissociates the ions, so that the workpiece is removed, and the dissociated ions enter the electrolyte to form a product, and the product or impurities may adhere to the surface of the electrode. Therefore, the quality of electrochemical processing is reduced. Therefore, when the electrode is electrochemically processed for a period of time, the electrochemical processing is stopped first to replace the electrode or clean the electrode, thereby reducing the efficiency of electrochemical processing.
本發明之一目的,在於提供一種電化學加工系統及電化學加工方法,其可於進行電化學加工之過程,清潔電極。 It is an object of the present invention to provide an electrochemical processing system and an electrochemical processing method which can clean electrodes during electrochemical processing.
本發明之一目的,在於提供一種電化學加工系統及電化學加工方法,其可連續對工件進行電化學加工。 It is an object of the present invention to provide an electrochemical processing system and an electrochemical processing method that can electrochemically process a workpiece continuously.
本發明提供一種電化學加工系統,其包含一電化學加工裝置與一清潔模組,電化學加工裝置包括一電極傳送模組與一帶狀電極,帶狀電極設置於電極傳送模組,清潔模組對應於帶狀電極之一側而設置。 The invention provides an electrochemical processing system comprising an electrochemical processing device and a cleaning module. The electrochemical processing device comprises an electrode transfer module and a strip electrode, the strip electrode is arranged on the electrode transfer module, and the cleaning module The group is provided corresponding to one side of the strip electrode.
本發明另提供一種電化學加工方法,其包含利用帶狀電極進行電化學加工,以及移動帶狀電極,並以機械力清潔帶狀電極之表面。 The present invention further provides an electrochemical processing method comprising electrochemically processing a strip electrode, moving the strip electrode, and mechanically cleaning the surface of the strip electrode.
1‧‧‧電化學加工系統 1‧‧‧Electrochemical processing system
10‧‧‧電化學加工裝置 10‧‧‧Electrochemical processing equipment
110‧‧‧電極傳送模組 110‧‧‧Electrode transfer module
111‧‧‧旋轉件 111‧‧‧Rotating parts
113‧‧‧驅動器 113‧‧‧ drive
130‧‧‧帶狀電極 130‧‧‧Strip electrode
150‧‧‧承載座 150‧‧‧Hosting
151‧‧‧座體 151‧‧‧
152‧‧‧加工區域 152‧‧‧Processing area
153‧‧‧架體 153‧‧‧ ‧ frame
155‧‧‧電性連接部 155‧‧‧Electrical connection
157‧‧‧工件固定件 157‧‧‧Workpiece fixings
170‧‧‧定位模組 170‧‧‧ Positioning Module
171‧‧‧定位件 171‧‧‧ Positioning parts
172‧‧‧電解液通道 172‧‧‧ electrolyte channel
173‧‧‧輸入口 173‧‧‧ input port
174‧‧‧輸出口 174‧‧‧ output
175‧‧‧絕緣件 175‧‧‧Insulation
190‧‧‧導電件 190‧‧‧Electrical parts
191‧‧‧抵接部 191‧‧‧Apartment
193‧‧‧固定部 193‧‧‧ fixed department
30‧‧‧清潔模組 30‧‧‧cleaning module
310‧‧‧輪刷 310‧‧‧ wheel brush
320‧‧‧驅動器 320‧‧‧ drive
40‧‧‧帶狀工件 40‧‧‧Striped workpiece
50‧‧‧工件輸送裝置 50‧‧‧Workpiece conveying device
510‧‧‧工件輸送模組 510‧‧‧Workpiece transport module
60‧‧‧遮罩佈設裝置 60‧‧‧Mask layout device
61‧‧‧遮罩移除裝置 61‧‧‧mask removal device
600‧‧‧鏤空部 600‧‧‧镂空部
610‧‧‧遮罩層 610‧‧‧mask layer
第一圖:其係為本發明之電化學加工系統之第一實施例之示意圖;第二圖:其係為本發明之電化學加工系統之第一實施例之另一示意圖;第三圖:其係為本發明之電化學加工系統之第一實施例之分解示意圖;第四圖:其係為本發明之電化學加工系統之第一實施例之剖視局部放大圖;第五圖:其係為本發明之電化學加工系統之第二實施例之示意圖;第六圖:其係為本發明之具有遮罩層之工件之一實施例之示意圖;以及第七圖:其係為本發明之電化學加工方法之一實施例之流程圖。 The first figure is a schematic view of a first embodiment of an electrochemical processing system of the present invention; the second figure is another schematic view of the first embodiment of the electrochemical processing system of the present invention; It is an exploded view of the first embodiment of the electrochemical processing system of the present invention; the fourth drawing is a partial enlarged view of the first embodiment of the electrochemical processing system of the present invention; BRIEF DESCRIPTION OF THE DRAWINGS FIG. 6 is a schematic view showing a second embodiment of the electrochemical processing system of the present invention; FIG. 6 is a schematic view showing an embodiment of a workpiece having a mask layer of the present invention; and a seventh diagram: A flow chart of one embodiment of an electrochemical processing method.
為使 貴審查委員對本發明之特徵及所達成之功效有更進一步之瞭解與認識,謹佐以較佳之實施例及配合詳細之說明,說明如後: In order to provide a better understanding and understanding of the features and the efficacies of the present invention, the preferred embodiment and the detailed description are as follows:
請參閱第一圖與第二圖,其係為本發明之電化學加工系統之第一實施例之不同視角示意圖。如圖所示,本發明之電化學加工系統1包含一電化學加工裝置10與一清潔模組30。電化學加工裝置10包括一電極傳送模組110與一帶狀電極130,帶狀電極130設置於電極傳送模組110。清潔模組30對應帶狀電極130之一側而設置。如此,電極傳送模組110帶動帶狀電極130 移動,以進行電化學加工,此外帶狀電極130之部分區段會經過清潔模組30,清潔模組30即可清潔此區段,以去除附著於此區段之表面之加工生成物或雜質。於本發明之一實施例中,帶狀電極130為一環帶狀電極。本發明之帶狀電極130以循環方式使用,得以持續進行電化學加工,且清潔模組30可以清潔帶狀電極130未進行電化學加工之區段,如此可以維持帶狀電極130之表面的潔淨度。 Please refer to the first and second figures, which are schematic diagrams of different perspectives of the first embodiment of the electrochemical processing system of the present invention. As shown, the electrochemical processing system 1 of the present invention includes an electrochemical processing device 10 and a cleaning module 30. The electrochemical processing device 10 includes an electrode transfer module 110 and a strip electrode 130 disposed on the electrode transfer module 110. The cleaning module 30 is disposed corresponding to one side of the strip electrode 130. Thus, the electrode transfer module 110 drives the strip electrode 130 Moving for electrochemical processing, in addition, a portion of the strip electrode 130 passes through the cleaning module 30, and the cleaning module 30 can clean the segment to remove processing products or impurities attached to the surface of the segment. . In an embodiment of the invention, the strip electrode 130 is a ring strip electrode. The strip electrode 130 of the present invention is used in a cyclic manner to continuously perform electrochemical processing, and the cleaning module 30 can clean the section of the strip electrode 130 that is not electrochemically processed, so that the surface of the strip electrode 130 can be cleaned. degree.
請一併參閱第三圖與第四圖,其係為本發明之電化學加工系統之第一實施例之分解示意圖與剖視局部放大圖。如圖所示,於本實施例中,電化學加工裝置10更包含一承載座150。承載座150包含一座體151與一架體153,架體153設置於座體151上。座體151上具有一加工區域152,加工區域152對應於帶狀電極130。一電性連接部155設置於座體151。一帶狀工件40輸送至座體151之加工區域152,並對應於帶狀電極130,且接觸電性連接部155。 Please refer to the third and fourth figures, which are an exploded view and a partially enlarged view of the first embodiment of the electrochemical processing system of the present invention. As shown in the figure, in the embodiment, the electrochemical processing device 10 further includes a carrier 150. The carrier 150 includes a body 151 and a frame 153. The frame 153 is disposed on the base 151. The housing 151 has a processing region 152 corresponding to the strip electrode 130. An electrical connection portion 155 is disposed on the base 151 . A strip-shaped workpiece 40 is transported to the processing region 152 of the base 151 and corresponds to the strip electrode 130 and contacts the electrical connection portion 155.
再者,一定位模組170對應於帶狀電極130而設置於座體151上。定位模組170包含二個定位件171。該些個定位件171分別位於加工區域152之兩側,並抵於帶狀工件40,以定位帶狀工件40。定位模組170具有至少一電解液通道172,其設置於每一定位件171,電解液通道172具有至少一輸入口173與至少一輸出口174,輸入口173設置於定位件171上,輸出口174對應於加工區域152,而設置於定位件171之一側。另外,電化學加工裝置10更包含至少一工件固定件157,該至少一工件固定件157對應於帶狀工件40而設置於座體151,並位於帶狀工件40之上,以固定帶狀工件40。 Furthermore, a positioning module 170 is disposed on the base 151 corresponding to the strip electrode 130. The positioning module 170 includes two positioning members 171. The positioning members 171 are respectively located on both sides of the processing region 152 and abut against the strip-shaped workpiece 40 to position the strip-shaped workpiece 40. The positioning module 170 has at least one electrolyte channel 172 disposed in each of the positioning members 171. The electrolyte channel 172 has at least one input port 173 and at least one output port 174. The input port 173 is disposed on the positioning member 171. 174 corresponds to the processing region 152 and is disposed on one side of the positioning member 171. In addition, the electrochemical processing device 10 further includes at least one workpiece fixing member 157 disposed on the seat body 151 corresponding to the strip-shaped workpiece 40 and located on the strip-shaped workpiece 40 to fix the strip-shaped workpiece. 40.
於本實施例中,電極傳送模組110設置於架體153,電極傳送模組110更包含一旋轉件111與一驅動器113,其為第一驅動器。於本發明之一實施例中,驅動器113為馬達,而旋轉件111可為輪圈。旋轉件111對應於帶狀 電極130之內側而設置,並抵於帶狀電極130之內側。驅動器113連接旋轉件111,以驅使旋轉件111旋轉。又,電化學加工裝置10更包含一導電件190,導電件190對應於帶狀電極130之內側而設置,並抵於帶狀電極130之內側,導電件190位於電極傳送模組110之下方。再者,導電件190包含一抵接部191與一固定部193,抵接部191設置於固定部193之底部。抵接部191之底部表面抵於帶狀電極130之內側,抵接部191之底部表面具有一平面,此平面對應於加工區域152,即對應於帶狀工件40,此外,相鄰於此平面之兩側面為一曲面,抵接部191位於該些個定位件171之間,如此定位模組170即可定位帶狀電極130,而固定部193則設置於該些個定位件171,以固定導電件190。 In this embodiment, the electrode transfer module 110 is disposed on the frame 153. The electrode transfer module 110 further includes a rotating member 111 and a driver 113, which is a first driver. In one embodiment of the invention, the driver 113 is a motor and the rotating member 111 can be a rim. The rotating member 111 corresponds to a strip shape The inner side of the electrode 130 is disposed and abuts against the inner side of the strip electrode 130. The driver 113 is coupled to the rotary member 111 to drive the rotary member 111 to rotate. Moreover, the electrochemical processing device 10 further includes a conductive member 190 disposed corresponding to the inner side of the strip electrode 130 and opposite to the inner side of the strip electrode 130. The conductive member 190 is located below the electrode transfer module 110. Furthermore, the conductive member 190 includes an abutting portion 191 and a fixing portion 193 , and the abutting portion 191 is disposed at the bottom of the fixing portion 193 . The bottom surface of the abutting portion 191 abuts against the inner side of the strip electrode 130, and the bottom surface of the abutting portion 191 has a plane corresponding to the processing region 152, that is, corresponding to the strip-shaped workpiece 40, and further, adjacent to the plane The two sides are a curved surface, and the abutting portion 191 is located between the positioning members 171. The positioning module 170 can position the strip electrode 130, and the fixing portion 193 is disposed on the positioning members 171 for fixing. Conductive member 190.
由上述得知,旋轉件111與導電件190分別抵於帶狀電極130之上半部內側與下半部內側,帶狀電極130能環繞於旋轉件111之圓弧面與導電件190之抵接部191之平面與兩側曲面。再者,導電件190位於該些個定位件171之間,使帶狀電極130之一區段對應於位在加工區域152之帶狀工件40,並與帶狀工件40間隔一間距。 It can be seen from the above that the rotating member 111 and the conductive member 190 respectively abut the inner side of the upper half of the strip electrode 130 and the inner side of the lower half, and the strip electrode 130 can surround the arc surface of the rotating member 111 and the conductive member 190. The plane of the joint 191 and the curved surfaces on both sides. Moreover, the conductive member 190 is located between the plurality of positioning members 171 such that a section of the strip electrode 130 corresponds to the strip-shaped workpiece 40 positioned in the processing region 152 and spaced apart from the strip-shaped workpiece 40 by a distance.
另外,一電源供應模組(圖未示)提供電源,其陽極與陰極分別耦接電性連接部155與導電件190,以供應電源至帶狀工件40與帶狀電極130,帶狀工件40作為陽極,而帶狀電極130作為負極,以進行電化學加工。此外,二絕緣件175分別設置於導電件190之固定部193與該些個定位件171之接觸處,以避免發生短路。 In addition, a power supply module (not shown) provides a power source, and an anode and a cathode are respectively coupled to the electrical connection portion 155 and the conductive member 190 to supply power to the strip workpiece 40 and the strip electrode 130, and the strip workpiece 40 As the anode, the strip electrode 130 serves as a negative electrode for electrochemical processing. In addition, the two insulating members 175 are respectively disposed at the contact portions of the fixing portion 193 of the conductive member 190 and the positioning members 171 to avoid short circuit.
於本實施例中,清潔模組30設置於架體153,並位於電極傳送模組110之一側,其包含一輪刷310與一驅動器320,驅動器320為第二驅動器。輪刷310對應於帶狀電極130之外側而設置,並接觸於帶狀電極130之外側表面,驅動器320連接輪刷310,並驅使輪刷310轉動,輪刷310轉動時會持續與帶狀電極130之外側表面接觸,以清潔帶狀電極130之表面。 In this embodiment, the cleaning module 30 is disposed on the frame 153 and located on one side of the electrode transfer module 110. The switch module 30 includes a wheel brush 310 and a driver 320. The driver 320 is a second driver. The wheel brush 310 is disposed corresponding to the outer side of the strip electrode 130 and contacts the outer surface of the strip electrode 130. The driver 320 is coupled to the wheel brush 310 and drives the wheel brush 310 to rotate. The wheel brush 310 continues to rotate with the strip electrode. The outer side surface of 130 is in contact to clean the surface of the strip electrode 130.
於本實施例中,進行電化學加工時,帶狀工件40設置於座體151之加工區域152,並位於該些個定位件171之間,帶狀電極130與帶狀工件40間具有一間距。傳輸電解液至電解液通道172,使電解液位於帶狀工件40與帶狀電極130之間,且接觸帶狀工件40與帶狀電極130之外側表面。電源供應模組提供電源至帶狀工件40與帶狀電極130,以進行電化學加工。於進行電化學加工一段時間後,帶狀電極130對應於帶狀工件40之加工表面的外側表面會附著生成物。利用電極傳送模組110帶動帶狀電極130移動,使帶狀電極130之已進行電化學加工之區段被移出加工區域152,被移出之區段即不進行電化學加工,而帶狀電極130之尚未進行電化學加工區段(已清潔之區段)則移動至加工區域152之上方,以接續進行電化學加工。於移動帶狀電極130之過程中,驅動器320驅動輪刷310轉動,輪刷310接觸帶狀電極130之目前未進行電化學加工之區段的外側表面,以機械力的方式除去附著於帶狀電極130之外側表面的生成物或雜物,以清潔帶狀電極130之外側表面,以可用於後續的電化學加工,如此即可避免電化學加工的品質受到影響。 In the present embodiment, when the electrochemical processing is performed, the strip-shaped workpiece 40 is disposed on the processing region 152 of the base 151 and located between the positioning members 171, and the strip electrode 130 has a spacing between the strip-shaped workpiece 40 and the strip-shaped workpiece 40. . The electrolyte is transferred to the electrolyte passage 172 such that the electrolyte is located between the strip-shaped workpiece 40 and the strip electrode 130, and contacts the strip-shaped workpiece 40 and the outer surface of the strip-shaped electrode 130. The power supply module supplies power to the strip workpiece 40 and the strip electrode 130 for electrochemical processing. After the electrochemical processing is performed for a while, the strip electrode 130 adheres to the product on the outer surface of the processed surface of the strip-shaped workpiece 40. The strip electrode 130 is moved by the electrode transfer module 110, so that the electrochemically processed portion of the strip electrode 130 is removed from the processing region 152, and the removed portion is not electrochemically processed, and the strip electrode 130 is removed. The electrochemical processing section (cleaned section) is then moved over the processing zone 152 for subsequent electrochemical processing. During the movement of the strip electrode 130, the driver 320 drives the wheel brush 310 to rotate. The wheel brush 310 contacts the outer surface of the strip electrode 130 which is not currently electrochemically processed, and is mechanically removed to adhere to the strip. The product or foreign matter on the outer surface of the electrode 130 is used to clean the outer surface of the strip electrode 130 for subsequent electrochemical processing, so that the quality of the electrochemical processing can be prevented from being affected.
於本實施例中,帶狀電極130大致上可以被分為進行電化學加工之區段與未進行電化學加工之區段(已清潔之區段)。當進行電化學加工時,未進行電化學加工之區段(已清潔之區段)被移入於加工區域152,而作為電化學加工之電極。已進行過電化學加工之區段則被移出加工區域152,同時清潔模組30對帶狀電極130之已進行電化學加工的區段進行清潔,如此能持續清潔帶狀電極130,以持續進行電化學加工。由上述可知,因為清潔模組30可以於電化學加工過程持續清潔帶狀電極130,而不需要停止進行電化學加工,如此可以節省清潔之工序及時間,提升電化學加工之效率。 In the present embodiment, the strip electrode 130 can be roughly divided into a section for electrochemical processing and a section not subjected to electrochemical processing (cleaned section). When electrochemical machining is performed, the section (cleaned section) that has not been electrochemically processed is moved into the processing region 152 as an electrode for electrochemical processing. The section that has been electrochemically processed is removed from the processing zone 152, and the cleaning module 30 cleans the electrochemically processed section of the strip electrode 130 so that the strip electrode 130 can be continuously cleaned for continued operation. Electrochemical processing. As can be seen from the above, since the cleaning module 30 can continuously clean the strip electrode 130 during the electrochemical processing without stopping the electrochemical processing, the cleaning process and time can be saved, and the efficiency of the electrochemical processing can be improved.
請參閱第五圖與第六圖,其係為本發明之電化學加工系統之第二實施例之示意圖與具有遮罩層之工件之一實施例之示意圖。如圖所示,本 實施例更包含一工件輸送裝置50,其包含二個工件輸送模組510,該些個工件輸送模組510分別位於電化學加工裝置10之前與後,以用於輸送帶狀工件40。再者,於本實施例更包含一遮罩佈設裝置60與一遮罩移除裝置61,遮罩佈設裝置60位於電化學加工裝置10之前,遮罩移除裝置61位於電化學加工裝置10之後。遮罩佈設裝置60用於佈設一遮罩層610於帶狀工件40,遮罩層610具有複數個鏤空部600,以露出帶狀工件40之表面,鏤空部600之圖形係對應於欲形成於帶狀工件40之圖形。遮罩佈設裝置60可以運用印刷或者曝光-顯影方式佈設遮罩層610於帶狀工件40,但並非限制必須以上述方式,其他可達成佈設遮罩層610之方式皆可。遮罩移除裝置61用於移除經電化學加工後之帶狀工件40的遮罩層610。 Please refer to the fifth and sixth figures, which are schematic views of a second embodiment of the electrochemical processing system of the present invention and an embodiment of a workpiece having a mask layer. As shown, this The embodiment further includes a workpiece transporting device 50 comprising two workpiece transport modules 510 located before and after the electrochemical processing device 10 for transporting the strip-shaped workpiece 40, respectively. Furthermore, the present embodiment further includes a masking device 60 and a mask removing device 61. The masking device 60 is located before the electrochemical processing device 10, and the mask removing device 61 is located behind the electrochemical device 10. . The masking device 60 is configured to lay a mask layer 610 on the strip-shaped workpiece 40. The mask layer 610 has a plurality of hollow portions 600 to expose the surface of the strip-shaped workpiece 40. The pattern of the hollow portion 600 corresponds to the formation of the hollow portion 600. The pattern of the strip workpiece 40. The masking device 60 may slap the mask layer 610 on the strip-shaped workpiece 40 by printing or exposure-developing, but it is not limited to the above-described manner, and other ways of arranging the mask layer 610 may be achieved. The mask removal device 61 is used to remove the mask layer 610 of the electrochemically processed strip workpiece 40.
請一併參閱第七圖,其係為本發明之電化學加工方法之一實施例之流程圖。如圖所示,本實施例係說明本發明之電化學加工方法,其如步驟S1所示,佈設遮罩層610於帶狀工件40,之後如步驟S3所示,利用帶狀電極130對帶狀工件40進行電化學加工。接著,如步驟S5所示,移動帶狀電極130,並以機械力清潔帶狀電極130之表面,以除去附著於帶狀電極130之表面的附著物。之後,如步驟S7所示,移除帶狀工件40之遮罩層610。此外,於S5步驟中,移動帶狀電極130過程中,同時清潔帶狀電極130之未進行電化學加工之區段。上述之步驟S1與步驟S5並非必要步驟,亦可不需要佈設遮罩層610於帶狀工件40。 Please refer to the seventh figure, which is a flow chart of an embodiment of the electrochemical processing method of the present invention. As shown in the figure, the present embodiment describes an electrochemical processing method of the present invention. As shown in step S1, a mask layer 610 is disposed on the strip-shaped workpiece 40, and then, as shown in step S3, the strip electrode 130 is used. The workpiece 40 is electrochemically processed. Next, as shown in step S5, the strip electrode 130 is moved, and the surface of the strip electrode 130 is cleaned by mechanical force to remove the adhering matter attached to the surface of the strip electrode 130. Thereafter, as shown in step S7, the mask layer 610 of the strip-shaped workpiece 40 is removed. Further, in the step S5, during the movement of the strip electrode 130, the section of the strip electrode 130 which is not subjected to electrochemical processing is simultaneously cleaned. The above steps S1 and S5 are not essential steps, and it is not necessary to provide the mask layer 610 to the strip-shaped workpiece 40.
綜合上述,本發明之電化學加工系統與電化學加工方法可於進行電化學加工之過程中,移動帶狀電極且對帶狀電極進行清潔,可以不需要拆卸帶狀電極,也不需要停止進行電化學加工,如此可以減少維護電極所需的時間與工序,且可提高電化學加工之效能。 In summary, the electrochemical processing system and the electrochemical processing method of the present invention can move the strip electrode and clean the strip electrode during electrochemical processing, without disassembling the strip electrode or stopping Electrochemical processing can reduce the time and process required to maintain the electrode and improve the efficiency of electrochemical processing.
由上述可知,本發明確實已經達於突破性之結構,而具有改良之發明內容,同時又能夠達到產業上利用性與進步性,當符合專利法之規定,爰依法提出新型專利申請,懇請鈞局審查委員授予合法專利權,至為感禱。 It can be seen from the above that the present invention has indeed achieved a breakthrough structure, and has improved invention content, and at the same time, can achieve industrial utilization and progress. When complying with the provisions of the Patent Law, the new patent application is filed according to law. The Board of Review examiners granted legal patent rights and was praying.
1 電化學加工系統1 Electrochemical processing system
10 電化學加工裝置10 Electrochemical processing equipment
110 電極傳送模組110 electrode transfer module
111 旋轉件111 rotating parts
113 驅動器113 drive
130 帶狀電極130 strip electrode
150 承載座150 carrier
151 座體151 seat
153 架體153 frame
30 清潔模組30 cleaning module
320 驅動器320 drive
Claims (10)
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| TW104141261A TWI593491B (en) | 2015-12-09 | 2015-12-09 | Electrochemical processing system and electrochemical machining methods |
| US14/984,044 US20170167046A1 (en) | 2015-12-09 | 2015-12-30 | Electrochemical processing system |
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| Application Number | Priority Date | Filing Date | Title |
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| TW104141261A TWI593491B (en) | 2015-12-09 | 2015-12-09 | Electrochemical processing system and electrochemical machining methods |
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| Publication Number | Publication Date |
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| TW201720560A TW201720560A (en) | 2017-06-16 |
| TWI593491B true TWI593491B (en) | 2017-08-01 |
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| TW104141261A TWI593491B (en) | 2015-12-09 | 2015-12-09 | Electrochemical processing system and electrochemical machining methods |
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| US (1) | US20170167046A1 (en) |
| TW (1) | TWI593491B (en) |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6287449B1 (en) * | 1997-11-06 | 2001-09-11 | Nihon Micro Coating Co., Ltd. | Method of electrolytic texturing and electrolytic liquid slurry |
| TW548168B (en) * | 2000-07-18 | 2003-08-21 | Nisshin Spinning | Slitter for an electrode raw material sheet and its slitting process |
| CN1993604A (en) * | 2004-07-30 | 2007-07-04 | 瑞尼斯豪公司 | Scale making method |
| TW201503978A (en) * | 2013-07-18 | 2015-02-01 | Metal Ind Res & Dev Ct | Continuous processing system and processing method thereof |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4119514A (en) * | 1977-04-21 | 1978-10-10 | The International Nickel Company, Inc. | Production of perforated metal foil |
| US5066370A (en) * | 1990-09-07 | 1991-11-19 | International Business Machines Corporation | Apparatus, electrochemical process, and electrolyte for microfinishing stainless steel print bands |
-
2015
- 2015-12-09 TW TW104141261A patent/TWI593491B/en active
- 2015-12-30 US US14/984,044 patent/US20170167046A1/en not_active Abandoned
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6287449B1 (en) * | 1997-11-06 | 2001-09-11 | Nihon Micro Coating Co., Ltd. | Method of electrolytic texturing and electrolytic liquid slurry |
| TW548168B (en) * | 2000-07-18 | 2003-08-21 | Nisshin Spinning | Slitter for an electrode raw material sheet and its slitting process |
| CN1993604A (en) * | 2004-07-30 | 2007-07-04 | 瑞尼斯豪公司 | Scale making method |
| TW201503978A (en) * | 2013-07-18 | 2015-02-01 | Metal Ind Res & Dev Ct | Continuous processing system and processing method thereof |
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| US20170167046A1 (en) | 2017-06-15 |
| TW201720560A (en) | 2017-06-16 |
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