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TWI598170B - Electrochemical processing equipment - Google Patents

Electrochemical processing equipment Download PDF

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Publication number
TWI598170B
TWI598170B TW104133111A TW104133111A TWI598170B TW I598170 B TWI598170 B TW I598170B TW 104133111 A TW104133111 A TW 104133111A TW 104133111 A TW104133111 A TW 104133111A TW I598170 B TWI598170 B TW I598170B
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Taiwan
Prior art keywords
carrier
electrolyte
workpiece
disposed
electrochemical processing
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TW104133111A
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Chinese (zh)
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TW201713438A (en
Inventor
陳弘毅
吳振瑋
林大裕
劉衾瑋
陳佑論
藍坤志
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財團法人金屬工業研究發展中心
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Priority to TW104133111A priority Critical patent/TWI598170B/en
Publication of TW201713438A publication Critical patent/TW201713438A/en
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Publication of TWI598170B publication Critical patent/TWI598170B/en

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Description

電化學加工裝置 Electrochemical processing device

本發明係有關於一種電化學加工裝置,其尤指一種可對工件進行電化學加工之加工裝置。 The invention relates to an electrochemical processing device, in particular to a processing device capable of electrochemically processing a workpiece.

按,傳統利用機械式加工裝置對薄型工件進行切削加工作業時,例如加工薄型工件而形成刀刃,其會衍生出許多問題,諸如工件如何夾持以及工件加工時會產生翹曲等問題,其解決方式通常藉由研磨或者沖壓等加工方式對工件進行加工。然而,利用該等加工方式進行加工會產生毛邊或加工刀紋等問題,仍需藉由其他加工方式對工件作進一步後續加工處理,如此一來,往往增加加工製程的複雜度且增長加工時間,也相對影響加工成本、加工品質與生產率。 According to the traditional processing of thin workpieces by mechanical machining devices, such as machining thin workpieces to form a cutting edge, many problems arise, such as how the workpiece is clamped and warpage during workpiece processing, and the solution is solved. The method usually processes the workpiece by grinding or stamping. However, processing by using these processing methods may cause problems such as burrs or machining knives, and further processing of the workpiece by other processing methods is required, which often increases the complexity of the processing process and increases the processing time. It also affects processing costs, processing quality and productivity.

本發明之主要目的係提供一種電化學加工裝置,其可對工件進行局部減薄加工。 SUMMARY OF THE INVENTION A primary object of the present invention is to provide an electrochemical processing apparatus that can perform partial thinning of a workpiece.

本發明之另一目的係提供一種電化學加工裝置,其可藉由阻液肋阻擋電解液,以限制電解液之流動區域,而可降低工件之雜散腐蝕現象。 Another object of the present invention is to provide an electrochemical processing apparatus which can block an electrolyte by a liquid barrier rib to restrict a flow region of the electrolyte, thereby reducing stray corrosion of the workpiece.

本發明之另一目的係提供一種電化學加工裝置,其可提供氣體於工件之非加工表面而形成遮蔽區,而為非電解加工區域,以可降 低工件之雜散腐蝕現象。 Another object of the present invention is to provide an electrochemical processing apparatus which can provide a gas to a non-machined surface of a workpiece to form a shadow area, and is a non-electrolytic processing area to be lowered. Stray corrosion of low workpieces.

本發明為一種電化學加工裝置,其包含一第一載體、一第二載體、一第一電極與一第二電極。第一電極設置於第一載體,第二電極與第一電極對應設置,第一電極與第二電極之間具有一工件容置空間。第二載體與第一載體對應設置,第一載體與第二載體位於工件容置空間之兩側。如此,工件即可容置於工件容置空間,以進行電化學加工。 The invention is an electrochemical processing device comprising a first carrier, a second carrier, a first electrode and a second electrode. The first electrode is disposed on the first carrier, and the second electrode is disposed corresponding to the first electrode, and the workpiece has a workpiece receiving space between the first electrode and the second electrode. The second carrier is disposed corresponding to the first carrier, and the first carrier and the second carrier are located at two sides of the workpiece receiving space. In this way, the workpiece can be accommodated in the workpiece receiving space for electrochemical processing.

此外,本發明之第二載體可具有一阻液肋,阻液肋抵頂位於工件容置空間之工件的加工表面,用於阻擋電解液,而限制電解液之流動區域,以可降低工件之雜散腐蝕現象。另外,本發明之電化學加工裝置更可包含一氣體傳輸模組,其傳輸一氣體於工件之非加工表面,而形成工件之遮蔽區,而為非電解加工區域,以可降低工件之雜散腐蝕現象。 In addition, the second carrier of the present invention may have a liquid-repellent rib that abuts against the processing surface of the workpiece located in the workpiece receiving space for blocking the electrolyte and restricting the flow area of the electrolyte to reduce the workpiece. Stray corrosion. In addition, the electrochemical processing apparatus of the present invention may further comprise a gas transmission module that transmits a gas to the non-machined surface of the workpiece to form a masking area of the workpiece, and is a non-electrolytic processing area to reduce the stray of the workpiece. Corrosion phenomenon.

1‧‧‧電化學加工裝置 1‧‧‧Electrochemical processing equipment

10‧‧‧第一載體 10‧‧‧ first carrier

11‧‧‧導料件 11‧‧‧Guide parts

12‧‧‧座體 12‧‧‧ body

121‧‧‧基座 121‧‧‧Base

123‧‧‧定位座 123‧‧‧ Positioning Block

1231‧‧‧容置凹槽 1231‧‧‧ accommodating grooves

125‧‧‧定位塊 125‧‧‧ Positioning block

1251‧‧‧第一定位件 1251‧‧‧First positioning piece

14‧‧‧流道溝槽 14‧‧‧Flow channel trench

20‧‧‧第一電極 20‧‧‧First electrode

25‧‧‧第二電極 25‧‧‧second electrode

251‧‧‧第二定位件 251‧‧‧Second positioning parts

27‧‧‧工件容置空間 27‧‧‧Working space

30‧‧‧第二載體 30‧‧‧second carrier

31‧‧‧本體 31‧‧‧Ontology

310‧‧‧第二定位件 310‧‧‧Second positioning parts

311‧‧‧電解液容置空間 311‧‧‧Electrolyte accommodating space

313‧‧‧電解液流道 313‧‧‧ electrolyte flow path

315‧‧‧電解液出口 315‧‧‧Electrolyte outlet

317‧‧‧側面開口 317‧‧‧Side opening

318‧‧‧斜面 318‧‧‧Bevel

319‧‧‧均流構件 319‧‧‧current sharing components

35‧‧‧蓋體 35‧‧‧ cover

358‧‧‧斜面 358‧‧‧Bevel

359‧‧‧凸肋 359‧‧‧ ribs

37‧‧‧阻液肋 37‧‧‧Resistance ribs

50‧‧‧電解液傳輸模組 50‧‧‧Electrolyte transfer module

51‧‧‧電解液輸入接頭 51‧‧‧Electrolyte input connector

60‧‧‧工件 60‧‧‧Workpiece

70‧‧‧氣體傳輸模組 70‧‧‧ gas transmission module

80‧‧‧遮蔽區 80‧‧‧shaded area

90‧‧‧固定模組 90‧‧‧Fixed modules

91‧‧‧固定架 91‧‧‧Retaining frame

911‧‧‧桿件 911‧‧‧ rods

913‧‧‧桿件 913‧‧‧ rods

915‧‧‧桿件 915‧‧‧ rods

93‧‧‧固定座 93‧‧‧ Fixed seat

97‧‧‧抵頂件 97‧‧‧After the top piece

99‧‧‧勾扣件 99‧‧‧Hooks

第一圖:其為本發明之一實施例之電化學加工裝置的立體示意圖;第二圖:其為本發明之一實施例之電化學加工裝置之另一視角的立體示意圖;第三圖:其為本發明之一實施例之電化學加工裝置的分解示意圖;第四圖:其為本發明之一實施例之第二載體的分解示意圖;第五圖:其為本發明之一實施例之電化學加工裝置之剖視圖;第六A圖:其為本發明之一實施例之電化學加工裝置的另一剖視圖; 第六B圖:其為第六A圖的局部放大圖;第七A圖:其為本發明之一實施例之工件進行電化學加工前的示意圖;以及第七B圖與第七C圖:其為本發明之一實施例之工件進行電化學加工與形成遮蔽區的示意圖。 1 is a perspective view of an electrochemical processing apparatus according to an embodiment of the present invention; and a second perspective view showing another perspective of an electrochemical processing apparatus according to an embodiment of the present invention; An exploded view of an electrochemical processing apparatus according to an embodiment of the present invention; a fourth drawing: an exploded perspective view of a second carrier according to an embodiment of the present invention; and a fifth drawing: an embodiment of the present invention A cross-sectional view of an electrochemical processing apparatus; FIG. 6A is another cross-sectional view of an electrochemical processing apparatus according to an embodiment of the present invention; FIG. 6B is a partial enlarged view of FIG. 6A; FIG. 7A is a schematic view showing the workpiece before performing electrochemical processing on the workpiece according to an embodiment of the present invention; and FIG. 7B and FIG. It is a schematic diagram of electrochemical processing and forming a masking region of a workpiece according to an embodiment of the present invention.

為使 貴審查委員對本發明之特徵及所達成之功效有更進一步之瞭解與認識,謹佐以較佳之實施例及配合詳細之說明,說明如後:參閱第一圖、第二圖及第三圖,其為本發明之一實施例之電化學加工裝置的不同視角立體示意圖與分解示意圖。如圖所示,本發明之電化學加工裝置1包含一第一載體10、一第一電極20、一第二電極25、一第二載體30與一電解液傳輸模組50。第一電極20設置於第一載體10之一側壁。於一實施例中,可藉由鎖固元件將第一電極20固定於第一載體10。第二電極25與第一電極20對應設置,第一電極20與第二電極25之間具有一工件容置空間27(如第六A圖與第六B圖所示),以供一工件60置放其間。第二載體30與第一載體10對應設置,第一載體10與第二載體30位於工件容置空間27之兩側。電解液傳輸模組50傳輸電解液於工件容置空間27,以供電化學加工裝置1對工件60進行電化學加工。 For a better understanding and understanding of the features of the present invention and the efficacies achieved, please refer to the preferred embodiment and the detailed description for the following: refer to the first, second and third FIG. 3 is a perspective view and an exploded perspective view of an electrochemical processing apparatus according to an embodiment of the present invention. As shown in the figure, the electrochemical processing apparatus 1 of the present invention comprises a first carrier 10, a first electrode 20, a second electrode 25, a second carrier 30 and an electrolyte transport module 50. The first electrode 20 is disposed on one sidewall of the first carrier 10. In an embodiment, the first electrode 20 can be fixed to the first carrier 10 by a locking component. The second electrode 25 is disposed corresponding to the first electrode 20, and a workpiece accommodating space 27 (shown in FIGS. 6A and 6B) between the first electrode 20 and the second electrode 25 is provided for a workpiece 60. Place it in between. The second carrier 30 is disposed corresponding to the first carrier 10, and the first carrier 10 and the second carrier 30 are located on both sides of the workpiece receiving space 27. The electrolyte transfer module 50 transfers the electrolyte to the workpiece accommodating space 27 to supply the chemical processing device 1 to electrochemically process the workpiece 60.

於本實施例中,電化學加工裝置1更包含一座體12,其設置於第一載體10之側面,第二電極25與第二載體30設置於座體12,如此第二電極25與第一電極20對應設置,而第二載體30與第一載體10對應設置。於本發明之一實施例中,座體12可與第一載體10為一 體成型。 In this embodiment, the electrochemical processing device 1 further includes a body 12 disposed on a side of the first carrier 10, and the second electrode 25 and the second carrier 30 are disposed on the base 12 such that the second electrode 25 and the first The electrodes 20 are correspondingly disposed, and the second carrier 30 is disposed corresponding to the first carrier 10. In an embodiment of the invention, the base 12 can be a first carrier 10 Body molding.

座體12可包含一基座121、一定位座123與一定位塊125。基座121設置於第一載體10之側面,定位座123設置於基座121,並具有一容置凹槽1231。定位塊125具有複數第一定位件1251,定位塊125容置於容置凹槽1231。於本發明之一實施例中,該些第一定位件1251為定位柱。第二電極25具有複數第二定位件251,藉由該些第二定位件251配合該些第一定位件1251,第二電極25定位於定位塊125,而設置於座體12,如此可定位第二電極25之位置,而定位第二電極25與工件60之間的間隙。於此實施例中,第一電極20與第二電極25分別為正電極與負電極,而分別耦接於正電源與負電源,第二電極25作為加工電極。 The base 12 can include a base 121, a positioning base 123 and a positioning block 125. The pedestal 121 is disposed on the side of the first carrier 10. The locating base 123 is disposed on the pedestal 121 and has a receiving recess 1231. The positioning block 125 has a plurality of first positioning members 1251, and the positioning blocks 125 are received in the receiving recesses 1231. In an embodiment of the invention, the first positioning members 1251 are positioning posts. The second electrode 25 has a plurality of second positioning members 251. The second positioning members 251 are coupled to the first positioning members 1251. The second electrodes 25 are positioned on the positioning block 125 and are disposed on the base 12 so as to be positionable. The position of the second electrode 25 positions the gap between the second electrode 25 and the workpiece 60. In this embodiment, the first electrode 20 and the second electrode 25 are a positive electrode and a negative electrode, respectively, and are respectively coupled to a positive power source and a negative power source, and the second electrode 25 serves as a processing electrode.

如第五圖所示,第二載體30之底部亦具有複數第二定位件310,藉由該些第二定位件310配合該些第一定位件1251,第二載體30定位於定位塊125,而設置於座體12,如此可定位第二載體30與第一載體10之對應位置。於本發明之一實施例中,該些第二定位件251與310為定位孔,且基座121、定位座123與定位塊125可為一體成型。 As shown in the fifth figure, the bottom of the second carrier 30 also has a plurality of second positioning members 310. The second positioning members 310 are disposed on the positioning block 125 by the second positioning members 310. The base 12 is disposed so as to position the corresponding position of the second carrier 30 and the first carrier 10. In one embodiment of the present invention, the second positioning members 251 and 310 are positioning holes, and the base 121, the positioning base 123 and the positioning block 125 can be integrally formed.

請一併參閱第三圖與第四圖,第四圖為本發明之一實施例之第二載體的分解示意圖。如圖所示,第二載體30包含一本體31、一蓋體35與一阻液肋37。本體31具有一電解液容置空間311、一電解液流道313(如第五圖所示)、一電解液出口315與一側面開口317。電解液容置空間311用於容置電解液,電解液流道313連通於電解液容置空間311與電解液出口315。蓋體35蓋設於本體31之側面開口317。阻液肋37設置於本體31之底部與蓋體35之底部之 間,而相鄰於工件容置空間27(如第六A圖與第六B圖所示)。於本發明之一實施例中,本體31之底部與蓋體35之底部具有互相對應之斜面318與358,阻液肋37則設置於本體31之斜面318與蓋體35之斜面358之間,因而傾斜具有斜度。此外,蓋體35之表面具有複數凸肋359。 Please refer to the third and fourth figures together. The fourth figure is an exploded schematic view of the second carrier according to an embodiment of the present invention. As shown, the second carrier 30 includes a body 31, a cover 35 and a liquid barrier rib 37. The body 31 has an electrolyte accommodating space 311, an electrolyte flow path 313 (as shown in FIG. 5), an electrolyte outlet 315 and a side opening 317. The electrolyte accommodating space 311 is for accommodating the electrolyte, and the electrolyte flow path 313 is in communication with the electrolyte accommodating space 311 and the electrolyte outlet 315. The cover body 35 is disposed on the side opening 317 of the body 31. The liquid blocking rib 37 is disposed at the bottom of the body 31 and the bottom of the cover 35 Between and adjacent to the workpiece accommodating space 27 (as shown in Figures 6A and 6B). In one embodiment of the present invention, the bottom of the body 31 and the bottom of the cover 35 have mutually opposite inclined faces 318 and 358, and the liquid-repellent ribs 37 are disposed between the inclined surface 318 of the body 31 and the inclined surface 358 of the cover 35. Thus the tilt has a slope. Further, the surface of the cover 35 has a plurality of ribs 359.

電解液傳輸模組50連接第二載體30之本體31,並連通於電解液容置空間311。於本發明之一實施例中,電解液傳輸模組50包含複數電解液輸入接頭51,其用於連接管路(圖未示)而傳輸電解液至電解液容置空間311。此外,電解液容置空間311內可進一步設置複數均流構件319,以用於均勻電解液傳輸模組50傳輸之電解液。電解液經該些電解液輸入接頭51傳輸至電解液容置空間311時,電解液受到該些均流構件319之引導,即會均勻填充於電解液容置空間311,如此電解液可均勻地從電解液出口315流出。 The electrolyte transfer module 50 is connected to the body 31 of the second carrier 30 and communicates with the electrolyte accommodating space 311. In one embodiment of the present invention, the electrolyte delivery module 50 includes a plurality of electrolyte input connectors 51 for connecting a conduit (not shown) to transfer electrolyte to the electrolyte housing space 311. In addition, a plurality of current sharing members 319 may be further disposed in the electrolyte accommodating space 311 for the electrolyte transported by the uniform electrolyte transport module 50. When the electrolyte is transferred to the electrolyte accommodating space 311 through the electrolyte input joints 51, the electrolyte is guided by the averaging members 319, that is, uniformly filled in the electrolyte accommodating space 311, so that the electrolyte can be uniformly It flows out from the electrolyte outlet 315.

復參閱第一圖與第三圖,本發明之電化學加工裝置1更包含複數導料件11,該些導料件11分別設置於第一載體10之側面的兩邊,其係用於引導工件60進入工件容置空間27(如第六B圖所示),藉此定位工件60及電化學加工裝置1之一軸向的相對位置,以利於電化學加工裝置1對工件60進行電化學加工,且當工件60加工完成,亦可藉由導料件11引導工件60離開電化學加工裝置1,如此即可連續進行電化學加工。 Referring to the first and third figures, the electrochemical processing apparatus 1 of the present invention further includes a plurality of guiding members 11 respectively disposed on two sides of the side of the first carrier 10 for guiding the workpiece. 60 enters the workpiece accommodating space 27 (as shown in FIG. 6B), thereby positioning the axial position of the workpiece 60 and the electrochemical processing device 1 to facilitate electrochemical processing of the workpiece 60 by the electrochemical processing device 1. And when the workpiece 60 is processed, the workpiece 60 can be guided away from the electrochemical processing device 1 by the guiding member 11, so that the electrochemical processing can be continuously performed.

請參閱第六A圖與第六B圖,其分別為本發明之一實施例之電化學加工裝置的剖視圖與第六A圖的局部放大圖。如圖所示,當電化學加工裝置1對工件60進行電化學加工時,工件60會容置於工件容置空間27,且工件60與第一電極20接觸,工件60與第二電極25 之間具有間隙,電解液傳輸模組50傳輸電解液至第二載體30,電解液經第二載體30之電解液流道313與電解液出口315而傳輸至工件容置空間27,如此電化學加工裝置1即可對工件60進行電化學加工。此外,當電化學加工裝置1對工件60進行電化學加工時,蓋體35之凸肋359與阻液肋37會抵頂於工件60,使工件60貼於第一載體10,而確實接觸第一電極20。 Please refer to FIG. 6A and FIG. 6B, which are respectively a cross-sectional view of the electrochemical processing apparatus and a partial enlarged view of the sixth A diagram of an embodiment of the present invention. As shown in the figure, when the electrochemical machining device 1 performs electrochemical machining on the workpiece 60, the workpiece 60 is accommodated in the workpiece receiving space 27, and the workpiece 60 is in contact with the first electrode 20, and the workpiece 60 and the second electrode 25 are With a gap therebetween, the electrolyte transfer module 50 transports the electrolyte to the second carrier 30, and the electrolyte is transferred to the workpiece receiving space 27 through the electrolyte flow path 313 of the second carrier 30 and the electrolyte outlet 315, thus electrochemically The processing device 1 can electrochemically process the workpiece 60. In addition, when the electrochemical machining device 1 performs electrochemical machining on the workpiece 60, the rib 359 and the liquid-repellent rib 37 of the cover 35 abut against the workpiece 60, so that the workpiece 60 is attached to the first carrier 10, and the contact is actually made. An electrode 20.

如第七A圖所示,若工件60為薄型工件,而欲對工件60進行局部減薄加工時,例如於工件60之下端緣處形成刀刃,本發明之電化學加工裝置1之第二電極25相對於工件60之下端緣,如此對工件60進行電化學加工後,工件60之下端緣處即會被減薄而形成刀刃。此外,電化學加工裝置1進行電化學加工時,阻液肋37會抵頂於工件60之加工表面,如此即可以避免電解液從電解液出口315流出時向上濺射而接觸到工件60之預定非加工區域,以避免工件60產生雜散腐蝕現象。換言之,阻液肋37限制電解液之流動區域,而可降低工件60之雜散腐蝕現象。 As shown in FIG. 7A, if the workpiece 60 is a thin workpiece and the workpiece 60 is to be locally thinned, for example, a blade is formed at the lower edge of the workpiece 60, the second electrode of the electrochemical processing apparatus 1 of the present invention 25 With respect to the lower end edge of the workpiece 60, after the workpiece 60 is electrochemically processed, the lower edge of the workpiece 60 is thinned to form a cutting edge. In addition, when the electrochemical processing apparatus 1 performs electrochemical processing, the liquid-repellent ribs 37 will abut against the processing surface of the workpiece 60, so as to avoid the upward sputtering of the electrolyte to the workpiece 60 when flowing out of the electrolyte outlet 315. Non-machined areas to avoid stray corrosion of workpiece 60. In other words, the liquid barrier ribs 37 limit the flow area of the electrolyte, and the stray corrosion of the workpiece 60 can be reduced.

由上述可知,本發明之電化學加工裝置1可適用於對薄型工件進行電化學加工,更適合用於減薄加工。然而,此並非限制本發明僅能用於薄型工件,也並非限制本發明必然需要阻液肋37。另外,當電化學加工裝置1對工件60進行電化學加工時,蓋體35之凸肋359會抵頂於工件60之表面,所以凸肋359亦可以避免電解液向上濺射而接觸到工件60之預定非加工區域,以避免工件60產生雜散腐蝕現象。 As can be seen from the above, the electrochemical processing apparatus 1 of the present invention can be applied to electrochemical processing of thin workpieces, and is more suitable for use in thinning processing. However, this does not limit the invention to only a thin workpiece, nor does it limit the invention to necessarily require a liquid barrier rib 37. In addition, when the electrochemical machining device 1 performs electrochemical machining on the workpiece 60, the rib 359 of the cover 35 abuts against the surface of the workpiece 60, so the rib 359 can also prevent the electrolyte from being sputtered upward to contact the workpiece 60. The non-processed area is predetermined to avoid stray corrosion of the workpiece 60.

此外,本發明亦可不需要透過第二載體30傳輸電解液,電解液傳輸模組50可直接傳輸電解液至工件容置空間27,又或者運用其他 方式傳輸電解液至工件容置空間27,傳輸電解液之方式甚多,在此不再贅述。 In addition, the present invention may also not need to transmit the electrolyte through the second carrier 30, and the electrolyte transport module 50 may directly transfer the electrolyte to the workpiece accommodating space 27, or use other In the manner of transferring the electrolyte to the workpiece accommodating space 27, there are many ways to transfer the electrolyte, and details are not described herein again.

復參閱第二圖、第三圖、第六A圖與第六B圖,本發明之電化學加工裝置1更包含一氣體傳輸模組70,其設置於第一載體10,並用於傳輸氣體。第一載體10具有至少一流道溝槽14,氣體傳輸模組70連通於流道溝槽14,流道溝槽14相鄰且連通於工件容置空間27,因而氣體傳輸模組70可經流道溝槽14傳輸氣體於位在工件容置空間27之工件60的非加工表面,而於工件60之非加工表面形成保護氣膜,以形成一遮蔽區80,而為非電解加工區域,如第七B圖與第七C圖所示,如此可防止電解液接觸工件60的非加工表面,以可降低工件60之雜散腐蝕現象。於本發明之一實施例中,可依據遮蔽區80欲形成於工件60的位置而設計流道溝槽14之位置與形狀。 Referring to FIG. 2, FIG. 3, FIG. 6A and FIG. 6B, the electrochemical processing apparatus 1 of the present invention further includes a gas transmission module 70 disposed on the first carrier 10 and configured to transport gas. The first carrier 10 has at least a first channel groove 14 , and the gas transmission module 70 is connected to the channel groove 14 . The channel groove 14 is adjacent to and communicates with the workpiece accommodating space 27 , so that the gas transmission module 70 can flow. The channel trench 14 transports gas to the non-machined surface of the workpiece 60 located in the workpiece receiving space 27, and forms a protective gas film on the non-machined surface of the workpiece 60 to form a masking region 80, which is a non-electrolytic processing region, such as As shown in the seventh B and seventh C, the electrolyte is prevented from contacting the non-machined surface of the workpiece 60 to reduce the stray corrosion of the workpiece 60. In an embodiment of the present invention, the position and shape of the flow channel groove 14 can be designed according to the position of the shadow region 80 to be formed on the workpiece 60.

由上述可知,於本發明之一實施例中,氣體傳輸模組70與電解液傳輸模組50個別從工件容置空間27之兩側傳輸電解液與氣體。本發明之電化學加工裝置1並非必定設置氣體傳輸模組70才能形成遮蔽區80。於本發明之另一實施例中,工件60之預定非加工區域可先形成絕緣層,以形成上述之遮蔽區,再送入電化學加工裝置1。 As can be seen from the above, in one embodiment of the present invention, the gas transfer module 70 and the electrolyte transport module 50 individually transfer electrolyte and gas from both sides of the workpiece accommodating space 27. The electrochemical processing apparatus 1 of the present invention does not necessarily have to provide the gas transfer module 70 to form the masking region 80. In another embodiment of the present invention, the predetermined non-processed region of the workpiece 60 may be first formed with an insulating layer to form the above-described masking region, and then fed to the electrochemical processing device 1.

復參閱第一圖與第三圖,電化學加工裝置1更包含一固定模組90,其連接座體12,並固定第二載體30於座體12。固定模組90包含一固定架91、複數固定座93、複數抵頂件97與一勾扣件99。於本發明之一實施例中,固定架91包含三桿件911、913與915,桿件911與913呈L型,桿件915連接於桿件911與913之間,如此固定架 91呈ㄇ字型。該些固定座93固定於座體12之基座121之側面,桿件911與913之一端分別樞設於該些固定座93,如此固定架91樞設於該些固定座93,而可以以固定座93為支點而往上轉動。該些抵頂件97分別設置於桿件911與913之不同位置。勾扣件99設置於第一載體10之頂部。 Referring to the first and third figures, the electrochemical processing apparatus 1 further includes a fixing module 90 that connects the base 12 and fixes the second carrier 30 to the base 12. The fixing module 90 includes a fixing frame 91, a plurality of fixing seats 93, a plurality of abutting members 97 and a hooking member 99. In an embodiment of the invention, the fixing frame 91 comprises three rods 911, 913 and 915, the rod members 911 and 913 are L-shaped, and the rod member 915 is connected between the rod members 911 and 913. 91 is a font type. The fixing bases 93 are fixed to the side of the base 121 of the base 12, and one of the rods 911 and 913 is pivotally disposed on the fixing bases 93, so that the fixing brackets 91 are pivotally mounted on the fixing bases 93. The holder 93 rotates upward as a fulcrum. The abutting members 97 are respectively disposed at different positions of the rod members 911 and 913. The hooking member 99 is disposed on the top of the first carrier 10.

承接上述,當第二電極25與第二載體30設置於座體12後,向上轉動固定架91,且藉由勾扣件99勾扣住固定架91。如此,部分抵頂件97即會朝第一載體10之方向抵頂第二載體30,如此驅使第二載體30之阻液肋37與凸肋359(如第六A圖與第六B圖所示)抵頂工件60而貼於第一載體10之側壁,以接觸第一電極20。此外,位於桿件911與913之上部位的該些抵頂件97則朝座體12之方向往下抵頂第二載體30,如此確保第二載體30與第二電極25固定於座體12。 After the second electrode 25 and the second carrier 30 are disposed on the base 12, the fixing frame 91 is rotated upward, and the fixing frame 91 is hooked by the hooking member 99. Thus, the partial abutting member 97 abuts against the second carrier 30 in the direction of the first carrier 10, thus driving the liquid barrier rib 37 and the rib 359 of the second carrier 30 (as shown in FIGS. 6A and 6B). The workpiece 60 is attached to the sidewall of the first carrier 10 to contact the first electrode 20. In addition, the abutting members 97 located at the upper portions of the rod members 911 and 913 are pressed downward toward the second carrier 30 in the direction of the seat body 12, thus ensuring that the second carrier 30 and the second electrode 25 are fixed to the seat body 12. .

綜合上述,本發明之電化學加工裝置之第一電極與第二電極對應設置,且兩者之間具有工件容置空間,此外第一載體與第二載體對應設置,而位於工件容置空間之兩側,如此電化學加工裝置即可對工件容置空間之工件進行電化學加工。 In summary, the first electrode of the electrochemical processing device of the present invention is disposed corresponding to the second electrode, and has a workpiece accommodating space therebetween, and the first carrier is disposed corresponding to the second carrier, and is located in the workpiece accommodating space. On both sides, the electrochemical processing device can electrochemically process the workpiece in the workpiece receiving space.

由上述可知,本發明確實已經達於突破性之結構,而具有改良之發明內容,同時又能夠達到產業上利用性與進步性,當符合專利法之規定,爰依法提出發明專利申請,懇請 鈞局審查委員授予合法專利權,至為感禱。 As can be seen from the above, the present invention has indeed achieved a breakthrough structure, and has improved invention content, and at the same time, can achieve industrial utilization and progress. When complying with the provisions of the Patent Law, the invention patent application is filed according to law. The Board of Review examiners granted legal patent rights and was praying.

1‧‧‧電化學加工裝置 1‧‧‧Electrochemical processing equipment

10‧‧‧第一載體 10‧‧‧ first carrier

11‧‧‧導料件 11‧‧‧Guide parts

30‧‧‧第二載體 30‧‧‧second carrier

60‧‧‧工件 60‧‧‧Workpiece

90‧‧‧固定模組 90‧‧‧Fixed modules

Claims (9)

一種電化學加工裝置,其包含一第一載體,一第一電極設置於該第一載體,一第二電極與該第一電極對應設置,該第一電極與該第二電極之間具有一工件容置空間,以及一第二載體與該第一載體對應設置,該第一載體與該第二載體位於該工件容置空間之兩側,該第二載體具有一阻液肋,該阻液肋相鄰於該工件容置空間。 An electrochemical processing device includes a first carrier, a first electrode is disposed on the first carrier, a second electrode is disposed corresponding to the first electrode, and a workpiece is disposed between the first electrode and the second electrode The accommodating space, and a second carrier corresponding to the first carrier, the first carrier and the second carrier are located on two sides of the workpiece accommodating space, the second carrier has a liquid barrier rib, the liquid barrier rib Adjacent to the workpiece housing space. 如申請專利範圍第1項所述之電化學加工裝置,其更包含一氣體傳輸模組,該氣體傳輸模組設置於該第一載體,並傳輸一氣體於該工件容置空間。 The electrochemical processing device of claim 1, further comprising a gas transmission module disposed on the first carrier and transmitting a gas to the workpiece receiving space. 如申請專利範圍第2項所述之電化學加工裝置,其中該第一載體具有至少一流道溝槽,該氣體傳輸模組連通於該流道溝槽,該流道溝槽連通於該工件容置空間。 The electrochemical processing apparatus of claim 2, wherein the first carrier has at least a channel, the gas transmission module is in communication with the channel groove, and the channel groove is connected to the workpiece Set the space. 如申請專利範圍第1項所述之電化學加工裝置,其更包含有複數導料件,該些導料件分別設置於該第一載體之一側面的兩邊。 The electrochemical processing device of claim 1, further comprising a plurality of guiding members disposed on two sides of one side of the first carrier. 如申請專利範圍第1項所述之電化學加工裝置,其更包含一電解液傳輸模組,而傳輸一電解液,該第二載體具有一電解液容置空間與一電解液出口,該電解液出口連通於該電解液容置空間,該電解液傳輸模組連接該第二載體並連通於該電解液容置空間。 The electrochemical processing device of claim 1, further comprising an electrolyte transport module for transporting an electrolyte, the second carrier having an electrolyte storage space and an electrolyte outlet, the electrolysis The liquid outlet is connected to the electrolyte accommodating space, and the electrolyte transport module is connected to the second carrier and communicates with the electrolyte accommodating space. 如申請專利範圍第5項所述之電化學加工裝置,其中該第二載體包含一本體,其具有該電解液容置空間、該電解液出口與一側面開口,該電解液傳輸模組連接該本體,並連通於該電解液容置空 間,一蓋體蓋設於該側面開口,一阻液肋設置於該本體與該蓋體之間,該阻液肋相鄰於該工件容置空間。 The electrochemical processing device of claim 5, wherein the second carrier comprises a body having the electrolyte receiving space, the electrolyte outlet and a side opening, the electrolyte transfer module connecting the Body, and connected to the electrolyte A cover member is disposed on the side opening, and a liquid barrier rib is disposed between the body and the cover. The liquid barrier rib is adjacent to the workpiece receiving space. 如申請專利範圍第5項所述之電化學加工裝置,其更包含有複數均流構件,該些均流構件設置於該電解液容置空間內。 The electrochemical processing apparatus according to claim 5, further comprising a plurality of current sharing members disposed in the electrolyte accommodation space. 如申請專利範圍第1項所述之電化學加工裝置,其更包含一座體,該座體設置於該第一載體之一側面,該第二電極與該第二載體設置於該座體。 The electrochemical processing device of claim 1, further comprising a body disposed on a side of the first carrier, the second electrode and the second carrier being disposed on the base. 如申請專利範圍第8項所述之電化學加工裝置,其更包含有一固定模組,該固定模組連接該座體,並固定該第二載體於該座體。 The electrochemical processing device of claim 8, further comprising a fixing module, the fixing module connecting the seat body and fixing the second carrier to the seat body.
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