TWI592665B - Probe device of vertical probe card - Google Patents
Probe device of vertical probe card Download PDFInfo
- Publication number
- TWI592665B TWI592665B TW105118118A TW105118118A TWI592665B TW I592665 B TWI592665 B TW I592665B TW 105118118 A TW105118118 A TW 105118118A TW 105118118 A TW105118118 A TW 105118118A TW I592665 B TWI592665 B TW I592665B
- Authority
- TW
- Taiwan
- Prior art keywords
- opening
- probe
- guide plate
- guide
- probe card
- Prior art date
Links
- 239000000523 sample Substances 0.000 title claims description 202
- 238000012360 testing method Methods 0.000 claims description 38
- 125000006850 spacer group Chemical group 0.000 claims description 12
- 230000000149 penetrating effect Effects 0.000 claims description 4
- 239000004744 fabric Substances 0.000 claims 1
- 239000011148 porous material Substances 0.000 claims 1
- 239000002184 metal Substances 0.000 description 14
- 235000012431 wafers Nutrition 0.000 description 14
- 230000005489 elastic deformation Effects 0.000 description 8
- 238000005259 measurement Methods 0.000 description 8
- 238000004519 manufacturing process Methods 0.000 description 7
- 229910000679 solder Inorganic materials 0.000 description 7
- 238000010586 diagram Methods 0.000 description 5
- 238000005452 bending Methods 0.000 description 4
- 238000000576 coating method Methods 0.000 description 3
- 238000000034 method Methods 0.000 description 3
- 230000002950 deficient Effects 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 1
- 238000001125 extrusion Methods 0.000 description 1
- 238000004806 packaging method and process Methods 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- 238000003672 processing method Methods 0.000 description 1
- 230000001568 sexual effect Effects 0.000 description 1
Landscapes
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
- Measuring Leads Or Probes (AREA)
Description
本發明是關於一種探針裝置,特別是關於一種用於垂直式探針卡之探針裝置。 This invention relates to a probe device, and more particularly to a probe device for a vertical probe card.
近年來,隨著電子產品朝向精密與多功能化發展,應用在電子產品內的積體電路之晶片結構也趨於複雜。在晶片的製造中通常係採用批次性的大量生產,因此為了確保晶片的電氣品質,在將晶片進行封裝前會先進行晶片級量測。現在的晶片製程中,一般而言係採用探針卡(Probe card)來測試晶片。並且根據探針的型態可分為懸臂式探針卡(cantilever probe card)與垂直式探針卡(vertical probe card)。在使用上,藉由將探針卡的探針電性接觸晶片的接觸墊,再經探針卡的電路板將電氣訊號連接到測試機(Tester),使測試機傳送測試訊號到晶片或接收來自晶片的輸出訊號,進而達到量測晶片的電氣特性之功效,並且使用者可進一步根據量測的結果將不良晶片剔除,以進行後續的封裝處理。 In recent years, as electronic products have advanced toward precision and multi-functionality, the wafer structure of integrated circuits applied in electronic products has also become complicated. In the manufacture of wafers, batch mass production is usually used. Therefore, in order to ensure the electrical quality of the wafer, wafer level measurement is performed before the wafer is packaged. In the current wafer processing, a probe card is generally used to test the wafer. And according to the type of the probe, it can be divided into a cantilever probe card and a vertical probe card. In use, the test signal is transmitted to the chip or received by electrically connecting the probe of the probe card to the contact pad of the wafer and then connecting the electrical signal to the tester via the circuit board of the probe card. The output signal from the wafer is used to measure the electrical characteristics of the wafer, and the user can further reject the defective wafer according to the measurement result for subsequent packaging processing.
請參照第1圖,其顯示一種習知的垂直式探針卡100之示意圖。該垂直式探針卡100包含一電路板110和一探針裝置。該探針裝置包含一導板組合120和複數個探針130,其中每一探針130之一端與該電路板110上之一接觸墊51’(例如金屬焊墊、金屬凸塊、錫球…等)電性連接並且該 探針130之另一端穿過該導板組合120與一待測元件50之相對應的接觸墊51電性連接。更明確地說,該導板組合120包含一上導板(upper die)121和一下導板(lower die)123,其中該上導板121形成有複數個垂直貫通的上開孔122,以及該下導板123形成有複數個垂直貫通的下開孔124。該等上開孔122係與該等下開孔124對應設置,使得每一該探針130可垂直地貫穿通過對應的其中之一該上開孔122和其中之一該下開孔124。此外,該導板組合120還包含複數個間隔元件129,藉由該等間隔元件129固定該上導板121與該下導板123,並且將該上導板121該下導板123保持在相距一縱向距離,進而在該導板組合120的內部形成一佈針空間。因此,當該垂直式探針卡100朝該測試元件50電性接觸該接觸墊51時,該等探針130會通過自身的彈性變形來吸收測試時的反向應力。也就是說,該導板組合120之該佈針空間係作為該等探針130的彈性變形空間。 Referring to Figure 1, a schematic diagram of a conventional vertical probe card 100 is shown. The vertical probe card 100 includes a circuit board 110 and a probe device. The probe device comprises a guide plate assembly 120 and a plurality of probes 130, wherein one end of each probe 130 contacts a pad 51' on one of the circuit boards 110 (for example, a metal pad, a metal bump, a solder ball... Etc) electrical connection and The other end of the probe 130 is electrically connected to the corresponding contact pad 51 of a device under test 50 through the guide plate assembly 120. More specifically, the guide assembly 120 includes an upper die 121 and a lower die 123, wherein the upper guide 121 is formed with a plurality of vertically extending upper openings 122, and The lower guide plate 123 is formed with a plurality of vertically extending lower openings 124. The upper openings 122 are disposed corresponding to the lower openings 124 such that each of the probes 130 can vertically pass through one of the corresponding upper openings 122 and one of the lower openings 124. In addition, the guide assembly 120 further includes a plurality of spacer members 129. The upper guide plate 121 and the lower guide plate 123 are fixed by the spacer members 129, and the upper guide plate 123 and the lower guide plate 123 are kept at a distance. A longitudinal distance further forms a needle space within the guide assembly 120. Therefore, when the vertical probe card 100 electrically contacts the contact pad 51 toward the test component 50, the probes 130 absorb the reverse stress during the test by their own elastic deformation. That is to say, the needle space of the guide plate assembly 120 serves as an elastic deformation space of the probes 130.
然而,該等探針130在該導板組合120之該佈針空間彈性變形時,相鄰的兩探針容易因電性接觸而導致該垂直式探針卡100短路。因此,在習知的該垂直式探針卡100中,必須將該等探針130進行絕緣塗佈處理或將該等探針130加工為具有特殊的構型,進而提高製程的難度以及增加生產成本。 However, when the probes 130 are elastically deformed in the space of the guide plate assembly 120, the adjacent two probes are likely to be short-circuited by the electrical contact. Therefore, in the conventional vertical probe card 100, the probes 130 must be subjected to an insulating coating process or the probes 130 are processed to have a special configuration, thereby improving the difficulty of the process and increasing the production. cost.
有鑑於此,有必要提供一種改良的垂直式探針卡,以解決習知技術所存在的問題。 In view of the above, it is desirable to provide an improved vertical probe card to solve the problems of the prior art.
為解決上述技術問題,本發明之目的在於提供一種垂直式探針卡的探針裝置,藉由將探針裝置設計為具有兩個以上的導板,並且在內 層的導板中設置適當的開孔,使得當探針受壓而產生彈性變形時,藉由該等開孔引導該探針形成至少一彈性彎曲方向,進而避免相鄰的兩探針互相電性接觸,並省略習知技術中必須針對探針做特殊的預處理(例如,進行絕緣塗佈處理或經由二次加工形成具有特殊的構型),進而有效地簡易製程以降低生產成本。 In order to solve the above technical problems, an object of the present invention is to provide a probe device for a vertical probe card, which is designed to have two or more guide plates, and Appropriate openings are provided in the guide plates of the layer, so that when the probes are elastically deformed by pressing, the probes are guided to form at least one elastic bending direction, thereby preventing the adjacent two probes from being electrically connected to each other. Sexual contact, and omission in the prior art, special pretreatment must be performed on the probe (for example, performing an insulating coating process or forming a special configuration via secondary processing), thereby effectively simplifying the process to reduce the production cost.
為達成上述目的,本發明提供一種垂直式探針卡之探針裝置,包含:一導板組合,包含:一上導板,具有至少一垂直貫通的上開孔;一下導板,具有至少一垂直貫通的下開孔,且該至少一下開孔與該至少一上開孔對應設置;以及至少一中間導板,位在該上導板與該下導板之間,具有至少一垂直貫通的中間開孔,其中該至少一中間開孔分別與該至少一上開孔和該至少一下開孔對應設置;以及至少一探針,插設在該導板組合,且通過該至少一上開孔、該至少一中間開孔和該至少一下開孔,進而電性接觸一待測元件之一接觸墊。 In order to achieve the above object, the present invention provides a probe device for a vertical probe card, comprising: a guide plate assembly comprising: an upper guide plate having at least one vertically extending upper opening; and a lower guide plate having at least one a vertically penetrating lower opening, wherein the at least one lower opening is disposed corresponding to the at least one upper opening; and at least one intermediate guiding plate disposed between the upper guiding plate and the lower guiding plate, having at least one vertical through An intermediate opening, wherein the at least one intermediate opening is respectively disposed corresponding to the at least one upper opening and the at least one lower opening; and at least one probe is inserted in the guiding plate and passes through the at least one upper opening The at least one intermediate opening and the at least one lower opening electrically contact one of the components to be tested to contact the pad.
於本發明其中之一較佳實施例中,該至少一中間開孔的孔徑大於該至少一上開孔和該至少一下開孔的孔徑。 In a preferred embodiment of the present invention, the aperture of the at least one intermediate opening is larger than the aperture of the at least one upper opening and the at least one lower opening.
於本發明其中之一較佳實施例中,該至少一上開孔、該至少一下開孔、和該至少一中間開孔內僅允許布置單一個探針。 In a preferred embodiment of the invention, only one of the at least one upper opening, the at least one lower opening, and the at least one intermediate opening are allowed to be disposed in a single probe.
於本發明其中之一較佳實施例中,該導板組合還包含複數個間隔元件,設置在該上導板與該至少一中間導板之間以及該至少一中間導板與該下導板之間,用於固定該上導板與該至少一中間導板以及該至少一中間導板與該下導板,並分別將該上導板、該至少一中間導板和該下導板兩兩之間保持相距一縱向距離,進而在該導板組合的內部形成一佈針空間。 In a preferred embodiment of the present invention, the guide plate assembly further includes a plurality of spacer elements disposed between the upper guide plate and the at least one intermediate guide plate and the at least one intermediate guide plate and the lower guide plate Between the upper guide plate and the at least one intermediate guide plate and the at least one intermediate guide plate and the lower guide plate, and respectively respectively, the upper guide plate, the at least one intermediate guide plate and the lower guide plate The longitudinal distance between the two is maintained to form a needle space inside the guide plate assembly.
於本發明其中之一較佳實施例中,該至少一探針之截面的外廓包含圓形或多邊形。 In a preferred embodiment of the invention, the outline of the cross section of the at least one probe comprises a circle or a polygon.
於本發明其中之一較佳實施例中,該多邊形包含三角形、四角形或六角形。 In one preferred embodiment of the invention, the polygon comprises a triangle, a quadrangle or a hexagon.
於本發明其中之一較佳實施例中,該至少一中間開孔的中心線位置與該至少一上開孔和該至少一下開孔的中心線位置相距一橫向距離。 In a preferred embodiment of the present invention, the centerline position of the at least one intermediate opening is a lateral distance from the centerline position of the at least one upper opening and the at least one lower opening.
於本發明其中之一較佳實施例中,該至少一中間開孔的中心線位置相對至少一上開孔和該至少一下開孔的中心線位置向側邊偏移一橫向距離,使得當該至少一探針電性接觸該接觸墊時,該至少一探針受壓進而在該導板組合的內部形成至少一彎曲區域。 In a preferred embodiment of the present invention, the centerline position of the at least one intermediate opening is offset from the sideline of the at least one upper opening and the at least one lower opening by a lateral distance, such that When at least one probe electrically contacts the contact pad, the at least one probe is pressed to form at least one curved region inside the combination of the guide plates.
於本發明其中之一較佳實施例中,該導板組合包含一第一中間導板和一第二中間導板,該第一中間導板位在該上導板和該第二中間導板之間,以及該第二中間導板位在該第一中間導板與該下導板之間,並且該第一中間導板具有至少一垂直貫通的第一中間開孔,以及該第二中間導板具有至少一垂直貫通的第二中間開孔;其中該至少一探針貫穿通過該至少一上開孔、該至少一第一中間開孔、該至少一第二中間開孔、和該至少一下開孔以電性接觸該待測元件之該接觸墊。 In a preferred embodiment of the present invention, the guide assembly includes a first intermediate guide and a second intermediate guide, the first intermediate guide being located at the upper guide and the second intermediate guide And the second intermediate guide is located between the first intermediate guide and the lower guide, and the first intermediate guide has at least one vertically intersecting first intermediate opening, and the second intermediate The guide plate has at least one second intermediate opening vertically penetrating; wherein the at least one probe penetrates through the at least one upper opening, the at least one first intermediate opening, the at least one second intermediate opening, and the at least A hole is opened to electrically contact the contact pad of the device under test.
於本發明其中之一較佳實施例中,該至少一第一中間開孔的中心線位置與該至少一第二中間開孔的中心線位置兩者之間相距一橫向距離。 In a preferred embodiment of the present invention, the centerline position of the at least one first intermediate opening is at a lateral distance from the centerline position of the at least one second intermediate opening.
於本發明其中之一較佳實施例中,該至少一第一中間開孔的 中心線位置相對該至少一上開孔和該至少一下開孔的中心線位置向側邊偏移一横向距離,以及該至少一第二中間開孔的該中心線位置相對該至少一上開孔和該至少一下開孔的中心線位置向另一側邊偏移一横向距離,使得當該至少一探針電性接觸該接觸墊時,該至少一探針受壓進而在該導板組合的內部形成多個彎曲區域。 In a preferred embodiment of the present invention, the at least one first intermediate opening The centerline position is offset from the centerline position of the at least one upper aperture and the at least one lower aperture by a lateral distance, and the centerline position of the at least one second intermediate aperture is opposite to the at least one upper aperture And a position of the center line of the at least one opening is offset from the other side by a lateral distance, such that when the at least one probe electrically contacts the contact pad, the at least one probe is pressed and combined in the guide A plurality of curved regions are formed inside.
於本發明其中之一較佳實施例中,該至少一第一中間開孔的中心線位置和該至少一第二中間開孔的中心線位置皆相對該至少一上開孔和該至少一下開孔的中心線位置向側邊偏移一横向距離,使得當該至少一探針電性接觸該接觸墊時,該至少一探針受壓進而在該導板組合的內部形成至少一彎曲區域。 In a preferred embodiment of the present invention, the centerline position of the at least one first intermediate opening and the centerline position of the at least one second intermediate opening are opposite to the at least one upper opening and the at least one opening. The centerline position of the aperture is offset from the side by a lateral distance such that when the at least one probe is in electrical contact with the contact pad, the at least one probe is pressed to form at least one curved region within the combination of the guide.
100、200、300、400‧‧‧垂直式探針卡 100, 200, 300, 400‧‧‧ vertical probe cards
110、210、310、410‧‧‧電路板 110, 210, 310, 410‧‧‧ boards
120、220、320、420‧‧‧導板組合 120, 220, 320, 420‧‧ ‧ guide plate combination
121、221、321、421‧‧‧上導板 121, 221, 321, 421‧‧‧ upper guide
122、222、322、422‧‧‧上開孔 Open holes in 122, 222, 322, 422‧‧
123、223、323、423‧‧‧下導板 123, 223, 323, 423‧‧‧ lower guide
124、224、324、424‧‧‧下開孔 Opening holes under 124, 224, 324, 424‧‧
225‧‧‧中間導板 225‧‧‧Intermediate guide
226‧‧‧中間開孔 226‧‧‧Intermediate opening
129、229、329、429‧‧‧間隔元件 129, 229, 329, 429‧‧‧ spacer elements
130、230、330、430‧‧‧探針 130, 230, 330, 430‧‧ probes
325、425‧‧‧第一中間導板 325, 425‧‧‧ first intermediate guide
326、426‧‧‧第一中間開孔 326, 426‧‧‧ first intermediate opening
327、427‧‧‧第二中間導板 327, 427‧‧‧ second intermediate guide
328、428‧‧‧第二中間開孔 328, 428‧‧‧ second intermediate opening
50‧‧‧待測元件 50‧‧‧Device under test
51、51’‧‧‧接觸墊 51, 51'‧‧‧ contact pads
R1‧‧‧上開孔的孔徑 R1‧‧‧ aperture of the upper opening
R2‧‧‧下開孔的孔徑 R2‧‧‧ aperture of the opening
R3‧‧‧中間開孔的孔徑 R3‧‧‧ aperture in the middle opening
A-A’‧‧‧第2圖的割面線 Cut line of A-A’‧‧‧Fig. 2
d1、d2、d3、d4、d5、d6、d7、d8‧‧‧縱向距離 D1, d2, d3, d4, d5, d6, d7, d8‧‧‧ longitudinal distance
S‧‧‧彎曲區域 S‧‧‧Bending area
C1、C3‧‧‧上開孔與下開孔之中心線 C1, C3‧‧‧ centerline of upper and lower openings
C2、C6‧‧‧中間開孔之中心線 C2, C6‧‧‧ center line of the middle opening
C4、C7‧‧‧第一中間開孔之中心線 C4, C7‧‧‧ center line of the first intermediate opening
C5、C8‧‧‧第二中間開孔之中心線 C5, C8‧‧‧ centerline of the second intermediate opening
L1、L2、L3、L4、L5‧‧‧横向距離 L1, L2, L3, L4, L5‧‧‧ lateral distance
X‧‧‧方向 X‧‧‧ direction
第1圖顯示一種習知的垂直式探針卡之示意圖;第2圖顯示一種根據本發明之第一較佳實施例的垂直式探針卡之結構示意圖;第3圖顯示第2圖之垂直式探針卡在佈置探針時的結構示意圖;第4A圖至第4D圖分別顯示第2圖之探針沿著A-A’割面線的截面示意圖;第5圖顯示一種根據本發明之第二較佳實施例的垂直式探針卡之結構示意圖;以及第6圖顯示一種根據本發明之第三較佳實施例的垂直式探針卡之結構示意圖。 1 is a schematic view showing a conventional vertical probe card; FIG. 2 is a schematic view showing the structure of a vertical probe card according to a first preferred embodiment of the present invention; and FIG. 3 is a vertical view of FIG. Schematic diagram of the probe when the probe is placed; FIG. 4A to FIG. 4D respectively show a schematic cross-sectional view of the probe of FIG. 2 along the line A-A'; FIG. 5 shows a schematic diagram according to the present invention. A schematic structural view of a vertical probe card of a second preferred embodiment; and FIG. 6 is a schematic view showing the structure of a vertical probe card according to a third preferred embodiment of the present invention.
為了讓本發明之上述及其他目的、特徵、優點能更明顯易懂,下文將特舉本發明較佳實施例,並配合所附圖式,作詳細說明如下。 The above and other objects, features and advantages of the present invention will become more <RTIgt;
請參照第2圖,其顯示一種根據本發明之第一較佳實施例的垂直式探針卡200之結構示意圖。該垂直式探針卡200包含一電路板210和一探針裝置。該探針裝置包含一導板組合220和複數個探針230,其中每一探針230之一端與該電路板210上之一接觸墊51’(例如金屬焊墊、金屬凸塊、錫球…等)電性連接並且該探針230之另一端穿過該導板組合220,進而電性接觸該垂直式探針卡200之外的一待測元件50之相對應的接觸墊51。在使用上,藉由將該垂直式探針卡200的該等探針230電性接觸該待測元件50(例如晶片)之對應的接觸墊51(例如金屬焊墊、金屬凸塊、錫球…等),並將該等探針230垂直地電性接觸該接觸墊51,再經該垂直式探針卡200的該電路板210將電氣訊號連接到測試機(Tester),使測試機傳送測試訊號到該待測元件50或接收來自該待測元件50的輸出訊號,進而達到量測該待測元件50之電氣特性之功效,並且使用者可進一步根據量測的結果將不良待測元件剔除,以進行後續的處理。 Please refer to FIG. 2, which shows a schematic structural view of a vertical probe card 200 according to a first preferred embodiment of the present invention. The vertical probe card 200 includes a circuit board 210 and a probe device. The probe device comprises a guide plate assembly 220 and a plurality of probes 230, wherein one end of each probe 230 contacts a pad 51' on one of the circuit boards 210 (for example, a metal pad, a metal bump, a solder ball... The other end of the probe 230 passes through the guide plate assembly 220 to electrically contact the corresponding contact pads 51 of a device under test 50 other than the vertical probe card 200. In use, the probes 230 of the vertical probe card 200 are electrically contacted with corresponding contact pads 51 of the device under test 50 (eg, a wafer) (eg, metal pads, metal bumps, solder balls). And the probes 230 are electrically connected to the contact pads 51 vertically, and then the electrical signals are connected to the tester via the circuit board 210 of the vertical probe card 200, so that the test machine transmits Test the signal to the device under test 50 or receive the output signal from the device under test 50, thereby measuring the electrical characteristics of the device under test 50, and the user can further test the defective device according to the result of the measurement. Eliminated for subsequent processing.
如第2圖所示,該導板組合220包含一上導板(upper die)221、一中間導板(middle die)225和一下導板(lower die)223,其中該上導板221形成有複數個垂直貫通的上開孔222,該中間導板225形成有複數個垂直貫通的中間開孔226,以及該下導板223形成有複數個垂直貫通的下開孔224。該等上開孔222、該等中間開孔226、和該等下開孔224皆為對應設 置,使得每一該探針230貫穿通過對應的其中之一該上開孔222、其中之一該中間開孔226和其中之一該下開孔224,進而電性接觸一待測元件50之相對應的接觸墊51。如第2圖所示,該上開孔222與該下開孔224之中心線C1的位置相對該中間開孔226的中心線位置C2向側邊偏移一橫向距離L1,並且該中間開孔226的側壁與該探針230抵靠,使得該探針230受該中間開孔226的該側壁的推擠進而在該導板組合220的內部形成至少一彎曲區域S。應當注意的是,每一該上開孔222、每一該下開孔224、和每一該中間開孔226內僅允許布置單一個探針。也就是說,在每一開孔內不會同時存在一個以上的探針,進而避免探針之間互相電性接觸。 As shown in FIG. 2, the guide plate assembly 220 includes an upper die 221, a middle die 225 and a lower die 223, wherein the upper guide 221 is formed with A plurality of vertically extending upper openings 222 are formed. The intermediate guide 225 is formed with a plurality of vertically extending intermediate openings 226, and the lower guide plate 223 is formed with a plurality of vertically extending lower openings 224. The upper opening 222, the intermediate opening 226, and the lower opening 224 are all corresponding So that each of the probes 230 passes through the corresponding one of the upper openings 222, one of the intermediate openings 226 and one of the lower openings 224, thereby electrically contacting a device under test 50. Corresponding contact pads 51. As shown in FIG. 2, the position of the center line C1 of the upper opening 222 and the lower opening 224 is offset from the center line position C2 of the intermediate opening 226 by a lateral distance L1, and the intermediate opening is The side wall of the 226 abuts the probe 230 such that the probe 230 is pushed by the side wall of the intermediate opening 226 to form at least one curved region S inside the guide plate assembly 220. It should be noted that only a single probe is allowed to be disposed within each of the upper apertures 222, each of the lower apertures 224, and each of the intermediate apertures 226. That is to say, more than one probe does not exist simultaneously in each opening, thereby avoiding electrical contact between the probes.
如第2圖所示,該導板組合220還包含複數個間隔元件229。藉由該等間隔元件229固定該上導板221與該中間導板225以及固定該中間導板225與該下導板223,並且將該上導板221與該中間導板225保持在相距一縱向距離d1以及同樣將該中間導板225與該下導板223保持在相距一縱向距離d2,進而在該導板組合220的內部形成一佈針空間。 As shown in FIG. 2, the guide assembly 220 further includes a plurality of spacer elements 229. The upper guide plate 221 and the intermediate guide plate 225 are fixed by the spacer members 229, and the intermediate guide plate 225 and the lower guide plate 223 are fixed, and the upper guide plate 221 and the intermediate guide plate 225 are kept at a distance from each other. The longitudinal distance d1 and the intermediate guide 225 are also maintained at a longitudinal distance d2 from the lower guide 223, thereby forming a needle space inside the guide assembly 220.
請參照第3圖,其顯示第2圖之垂直式探針卡200在佈置探針230時的結構示意圖。在佈置探針230時,該中間導板225朝X方向移動,使得該等上開孔222、該等中間開孔226、和該等下開孔224的同一側邊互相對齊。因此,每一該探針230可順利地垂直貫穿通過對應的其中之一該上開孔222、其中之一該中間開孔226和其中之一該下開孔224。同理,當該等探針230佈置完成後,該中間導板225朝反方向(即,與X方向相反的方向)移動,以使得該探針230受該中間開孔226的該側壁的推擠進而在該導板組合220的內部形成該彎曲區域S。 Please refer to FIG. 3, which shows a schematic structural view of the vertical probe card 200 of FIG. 2 when the probe 230 is disposed. When the probe 230 is disposed, the intermediate guide 225 is moved in the X direction such that the same side of the upper opening 222, the intermediate opening 226, and the lower opening 224 are aligned with each other. Thus, each of the probes 230 can smoothly pass vertically through one of the corresponding upper apertures 222, one of the intermediate apertures 226, and one of the lower apertures 224. Similarly, when the probes 230 are arranged, the intermediate guide 225 is moved in the opposite direction (ie, the direction opposite to the X direction) so that the probe 230 is pushed by the side wall of the intermediate opening 226. The bending region S is formed in the interior of the guide plate assembly 220 by extrusion.
當量測時,先將該垂直式探針卡200之該等探針230電性接觸該接觸墊51,之後將該垂直式探針卡200朝該測試元件50垂直地電性接觸該接觸墊51,該等探針230受壓後會通過自身的彈性變形來吸收受壓時的反向應力。也就是說,該導板組合220之該佈針空間係作為該等探針230的彈性變形空間。如第2圖和第3圖所示,由於該中間導板225之該等中間開孔226的孔徑R3大於該上導板221之該等上開孔222的孔徑R1以及大於該下導板223之該等下開孔224的孔徑R2。因此,該等探針230受壓後該等探針230之上下兩端會分別受到孔徑較小的該等上開孔222和該等下開孔224限制而不會產生較大的變形偏移,並且該等探針230的中央的彎曲區域S會沿著該等中間開孔226的開孔延伸方向進一步產生更大的彎曲,進而使得向該導板組合220內部微縮的該等探針230皆朝向預期的方向有規律的彎曲,進而避免兩兩相鄰的探針230互相電性接觸而造成該垂直式探針卡200短路。應當注意的是,在該等探針230的彎曲區域S中,該等探針230可呈現弧形的彎曲或者是有角度的彎折,且彎折或彎曲角度介於0至180度之間。 During the equivalent measurement, the probes 230 of the vertical probe card 200 are first electrically contacted to the contact pads 51, and then the vertical probe card 200 is electrically electrically contacted to the contact pads perpendicularly to the test component 50. 51. After being pressed, the probes 230 absorb the reverse stress under pressure by their own elastic deformation. That is to say, the needle space of the guide plate assembly 220 serves as an elastic deformation space of the probes 230. As shown in FIG. 2 and FIG. 3 , the aperture R3 of the intermediate opening 226 of the intermediate guiding plate 225 is larger than the aperture R1 of the upper opening 222 of the upper guiding plate 221 and larger than the lower guiding plate 223 . The aperture R2 of the lower opening 224. Therefore, after the probes 230 are pressed, the upper and lower ends of the probes 230 are respectively restricted by the upper apertures 222 and the lower apertures 224 having smaller apertures without a large deformation offset. And the central curved region S of the probes 230 further produces a greater curvature along the direction of the opening of the intermediate openings 226, thereby causing the probes 230 to be internally contracted toward the guide plate assembly 220. Both are regularly curved in a desired direction, thereby preventing the two adjacent probes 230 from electrically contacting each other to cause the vertical probe card 200 to be short-circuited. It should be noted that in the curved region S of the probes 230, the probes 230 may exhibit an arcuate curvature or an angular bend with a bend or bend angle between 0 and 180 degrees. .
請參照第4A圖至第4D圖,其分別顯示第2圖之探針230沿著A-A’割面線的截面示意圖。由於本發明的垂直式探針卡200之該導板組合220中進一步設置有該中間導板225,使得插裝在該導板組合220內的所有探針230能有效地被區隔分開。因此,在本發明的該垂直式探針卡200中,該等探針230不須進行絕緣塗佈的步驟,也不需要經由二次加工形成特殊的構型,故可有效的簡化生產步驟以及降低生產成本。也就是說,如第4A至4D圖所示,在本發明中該等探針230可採用加工難度最低方法形成最基本的幾何構型,例如該等探針230之截面的外廓可為圓形(如第4A圖所示)或各種 多邊形(如第4B圖所示之三角形、如第4B圖所示之四角形以及如第4B圖所示之六角形)。同理,在本發明的其他較佳實施例中,垂直式探針卡之探針同樣可採用如同上述之加工難度最低方法形成最基本的幾何構型,進而降低生產成本。 Referring to Figs. 4A to 4D, there are shown schematic cross-sectional views of the probe 230 of Fig. 2 along the line A-A'. Since the intermediate guide 225 is further disposed in the guide assembly 220 of the vertical probe card 200 of the present invention, all of the probes 230 inserted in the guide assembly 220 can be effectively separated. Therefore, in the vertical probe card 200 of the present invention, the probes 230 do not need to be subjected to the step of insulating coating, and do not need to be formed into a special configuration by secondary processing, so that the production steps can be effectively simplified and reduce manufacturing cost. That is, as shown in FIGS. 4A to 4D, in the present invention, the probes 230 can be formed into the most basic geometric configuration by the method with the least difficulty in processing. For example, the outline of the cross section of the probes 230 can be a circle. Shape (as shown in Figure 4A) or various A polygon (such as a triangle shown in Fig. 4B, a quadrangle as shown in Fig. 4B, and a hexagon as shown in Fig. 4B). Similarly, in other preferred embodiments of the present invention, the probe of the vertical probe card can also adopt the lowest processing method as described above to form the most basic geometric configuration, thereby reducing the production cost.
請參照第5圖,其顯示一種根據本發明之第二較佳實施例的垂直式探針卡300在量測時之作動示意圖。該垂直式探針卡300包含一電路板310和一探針裝置。該探針裝置包含一導板組合320和複數個探針330,其中每一探針330之一端與該電路板310上之一接觸墊51’(例如金屬焊墊、金屬凸塊、錫球…等)電性連接並且該探針330之另一端穿過該導板組合320,進而電性接觸該垂直式探針卡300之外的一待測元件50之相對應的接觸墊51電性連接。在使用上,藉由將該垂直式探針卡300的該等探針330電性接觸該待測元件50(例如晶片)之對應的接觸墊51(例如金屬焊墊、金屬凸塊、錫球…等),並將該等探針330垂直地電性接觸該接觸墊51,再經該垂直式探針卡300的該電路板310將電氣訊號連接到測試機,使測試機傳送測試訊號到該待測元件50或接收來自該待測元件50的輸出訊號,進而達到量測該待測元件50之電氣特性之功效,並且使用者可進一步根據量測的結果將不良待測元件剔除,以進行後續的處理。 Referring to Figure 5, there is shown a schematic diagram of the operation of a vertical probe card 300 in accordance with a second preferred embodiment of the present invention. The vertical probe card 300 includes a circuit board 310 and a probe device. The probe device comprises a guide plate assembly 320 and a plurality of probes 330, wherein one end of each probe 330 contacts a pad 51' on one of the circuit boards 310 (for example, a metal pad, a metal bump, a solder ball... The other end of the probe 330 is electrically connected, and the other end of the probe 330 is electrically connected to the corresponding contact pad 51 of a device to be tested 50 other than the vertical probe card 300. . In use, the probes 330 of the vertical probe card 300 are electrically contacted with corresponding contact pads 51 of the device under test 50 (eg, a wafer) (eg, metal pads, metal bumps, solder balls). And the probes 330 are electrically connected to the contact pads 51 vertically, and then the electrical signals are connected to the testing machine via the circuit board 310 of the vertical probe card 300, so that the testing machine transmits the test signals to The device under test 50 receives the output signal from the device under test 50, thereby measuring the electrical characteristics of the device under test 50, and the user can further remove the bad device to be tested according to the measurement result. Perform subsequent processing.
如第5圖所示,該導板組合320包含一上導板321、一第一中間導板325、一第二中間導板327和一下導板323,其中該上導板321形成有複數個垂直貫通的上開孔322,該第一中間導板325形成有複數個垂直貫通的第一中間開孔326,該第二中間導板327形成有複數個垂直貫通的第二中間開孔328,以及該下導板323形成有複數個垂直貫通的下開孔324。該等上 開孔322、該等第一中間開孔326、該等第二中間開孔328、和該等下開孔324皆為對應設置,使得每一該探針330可貫穿通過對應的其中之一該上開孔322、其中之一該第一中間開孔326、其中之一該第二中間開孔328和其中之一該下開孔324,進而電性接觸一待測元件50之相對應的接觸墊51。應當注意的是,每一該上開孔322、每一該下開孔324、每一該第一中間開孔326、和每一該第二中間開孔328內僅允許布置單一個探針330。也就是說,在每一開孔內不會同時存在一個以上的探針330,進而避免探針330之間互相電性接觸。 As shown in FIG. 5, the guide plate assembly 320 includes an upper guide plate 321, a first intermediate guide plate 325, a second intermediate guide plate 327, and a lower guide plate 323. The upper guide plate 321 is formed with a plurality of upper guide plates 321 a vertically extending upper opening 322, the first intermediate guiding plate 325 is formed with a plurality of vertically intersecting first intermediate openings 326, and the second intermediate guiding plate 327 is formed with a plurality of vertically intersecting second intermediate openings 328. And the lower guide plate 323 is formed with a plurality of vertically extending lower openings 324. On the above The opening 322, the first intermediate opening 326, the second intermediate opening 328, and the lower opening 324 are all correspondingly disposed such that each of the probes 330 can pass through one of the corresponding ones. The upper opening 322, one of the first intermediate opening 326, one of the second intermediate opening 328 and one of the lower opening 324, thereby electrically contacting a corresponding contact of the device under test 50 Pad 51. It should be noted that only one single probe 330 is allowed to be disposed in each of the upper opening 322, each of the lower opening 324, each of the first intermediate opening 326, and each of the second intermediate opening 328. . That is to say, more than one probe 330 does not exist simultaneously in each opening, thereby avoiding electrical contact between the probes 330.
如第5圖所示,每一該第一中間開孔326的中心線C4位置相對對應之該上開孔322和該下開孔324的中心線C3位置向右側邊偏移一横向距離L2,以及每一該第二中間開孔328的中心線C5位置相對對應之該上開孔322和該下開孔324的中心線C3位置向左側邊偏移一横向距離L3,以及每一該第一中間開孔326的中心線C4位置與每一該第二中間開孔328的中心線C5位置兩者之間亦相距一橫向距離(即,距離L2與距離L3的合),使得該探針330受該第一中間開孔326和該第二中間開孔328的該側壁的推擠進而在該導板組合320的內部形成多個彎曲區域S。舉例來說,呈現類似「Z」字型的多個彎曲區域S。也就是說,藉由將該等對應的開孔之間設置為錯位設計,使得該探針330在具有較大伸縮行程的同時,還可避免兩兩相鄰之探針330互相電性接觸。應當注意的是,在該等探針330的彎曲區域S中,該等探針330可呈現弧形的彎曲或者是有角度的彎折,且彎折或彎曲角度介於0至180度之間。 As shown in FIG. 5, the position of the center line C4 of each of the first intermediate openings 326 is offset from the center line C3 of the upper opening 322 and the lower opening 324 by a lateral distance L2. And the center line C5 of each of the second intermediate openings 328 is opposite to the position of the center line C3 of the upper opening 322 and the lower opening 324, and is offset to the left side by a lateral distance L3, and each of the first The position of the center line C4 of the intermediate opening 326 and the position of the center line C5 of each of the second intermediate openings 328 are also separated by a lateral distance (ie, the distance L2 and the distance L3), so that the probe 330 The pushing of the side walls of the first intermediate opening 326 and the second intermediate opening 328 further forms a plurality of curved regions S inside the guide plate assembly 320. For example, a plurality of curved regions S resembling a "Z" shape are presented. That is to say, by setting the corresponding openings between the corresponding openings, the probe 330 can avoid the electrical contact between the two adjacent probes 330 while having a large telescopic stroke. It should be noted that in the curved region S of the probes 330, the probes 330 may exhibit an arcuate curvature or an angular bend with a bend or bend angle between 0 and 180 degrees. .
如第5圖所示,該導板組合320還包含複數個間隔元件329。 藉由該等間隔元件329固定該上導板321與該第一中間導板325、固定該第一中間導板325與該第二中間導板327以及固定該第二中間導板327與該下導板323,並且將該上導板321與該第一中間導板325保持在相距一縱向距離d3、將該第一中間導板325與該第二中間導板327保持在相距一縱向距離d4以及將該第二中間導板327與該下導板323保持在相距一縱向距離d5,進而在該導板組合320的內部形成一佈針空間。 As shown in FIG. 5, the guide assembly 320 also includes a plurality of spacer elements 329. The upper guide plate 321 and the first intermediate guide 325 are fixed by the spacer elements 329, the first intermediate guide 325 and the second intermediate guide 327 are fixed, and the second intermediate guide 327 is fixed and the lower a guiding plate 323, and maintaining the upper guiding plate 321 and the first intermediate guiding plate 325 at a longitudinal distance d3, and maintaining the first intermediate guiding plate 325 and the second intermediate guiding plate 327 at a longitudinal distance d4 And maintaining the second intermediate guide 327 and the lower guide 323 at a longitudinal distance d5, thereby forming a needle space inside the guide assembly 320.
當量測時,先將該垂直式探針卡300之該等探針330電性接觸該接觸墊51,之後將該垂直式探針卡300朝該測試元件50垂直地電性接觸該接觸墊51,該等探針330受壓後會通過自身的彈性變形來吸收受壓時的反向應力。也就是說,該導板組合320之該佈針空間係作為該等探針330的彈性變形空間。應當注意的是,由於該第一中間導板325和該第二中間導板327之該等第一中間開孔326和該等第二中間開孔328的孔徑大於該上導板321之該等上開孔322的孔徑以及大於該下導板323之該等下開孔324的孔徑,因此當該等探針330電性接觸該接觸墊51並且該等探針330受壓時,該等探針330之上下兩端會分別受到孔徑較小的該等上開孔322和該等下開孔324限制而不會產生較大的變形偏移,並且該等探針330的彎曲區域S會沿著該等第一中間開孔326和該等第二中間開孔328的開孔延伸方向彎曲,進而使得向該導板組合320內部微縮的該等探針330皆朝向預期的方向有規律的彎曲,進而避免兩兩相鄰的探針330互相電性接觸而造成該垂直式探針卡300短路。 During the equivalent measurement, the probes 330 of the vertical probe card 300 are first electrically contacted to the contact pads 51, and then the vertical probe card 300 is vertically electrically contacted with the contact pads toward the test component 50. 51. After being pressed, the probes 330 absorb the reverse stress under pressure by their own elastic deformation. That is, the needle space of the guide assembly 320 serves as an elastic deformation space for the probes 330. It should be noted that the first intermediate opening 326 and the second intermediate opening 327 of the first intermediate guiding plate 325 and the second intermediate guiding plate 327 have larger apertures than the upper guiding plate 321 . The aperture of the upper opening 322 and the aperture of the lower opening 324 of the lower guiding plate 323, so when the probes 330 electrically contact the contact pad 51 and the probes 330 are pressed, the probes The upper and lower ends of the needle 330 are respectively restricted by the upper opening 322 and the lower opening 324 having a smaller aperture without causing a large deformation offset, and the curved region S of the probe 330 is along The first intermediate opening 326 and the second intermediate opening 328 are bent in the direction in which the openings extend, so that the probes 330 which are internally contracted toward the guide assembly 320 are regularly curved in a desired direction. In addition, the two adjacent probes 330 are prevented from electrically contacting each other to cause the vertical probe card 300 to be short-circuited.
請參照第6圖,其顯示一種根據本發明之第三較佳實施例的垂直式探針卡400在量測時之作動示意圖。該垂直式探針卡400包含一電路 板410和一探針裝置。該探針裝置包含一導板組合420和複數個探針430,其中每一探針430之一端與該電路板410上之一接觸墊51’(例如金屬焊墊、金屬凸塊、錫球…等)電性連接並且該探針430之另一端穿過該導板組合420,進而電性接觸該垂直式探針卡400之外的一待測元件50之相對應的接觸墊51電性連接。在使用上,藉由將該垂直式探針卡400的該等探針430電性接觸該待測元件50(例如晶片)之對應的接觸墊51(例如金屬焊墊、金屬凸塊、錫球…等),並將該等探針430垂直地電性接觸該接觸墊51,再經該垂直式探針卡400的該電路板410將電氣訊號連接到測試機,使測試機傳送測試訊號到該待測元件50或接收來自該待測元件50的輸出訊號,進而達到量測該待測元件50之電氣特性之功效,並且使用者可進一步根據量測的結果將不良待測元件剔除,以進行後續的處理。 Referring to Figure 6, there is shown a schematic diagram of the operation of a vertical probe card 400 in accordance with a third preferred embodiment of the present invention. The vertical probe card 400 includes a circuit Plate 410 and a probe device. The probe device comprises a guide plate assembly 420 and a plurality of probes 430, wherein one end of each probe 430 contacts a pad 51' on one of the circuit boards 410 (for example, a metal pad, a metal bump, a solder ball... The other end of the probe 430 is electrically connected, and the other end of the probe 430 is electrically connected to the corresponding contact pad 51 of a device under test 50 other than the vertical probe card 400. . In use, the probes 430 of the vertical probe card 400 are electrically contacted with corresponding contact pads 51 of the device under test 50 (eg, a wafer) (eg, metal pads, metal bumps, solder balls). And the probes 430 are electrically connected to the contact pads 51 vertically, and then the electrical signals are connected to the testing machine via the circuit board 410 of the vertical probe card 400, so that the testing machine transmits the test signals to The device under test 50 receives the output signal from the device under test 50, thereby measuring the electrical characteristics of the device under test 50, and the user can further remove the bad device to be tested according to the measurement result. Perform subsequent processing.
如第6圖所示,該導板組合420包含一上導板421、一第一中間導板425、一第二中間導板427和一下導板423,其中該上導板421形成有複數個垂直貫通的上開孔422,該第一中間導板425形成有複數個垂直貫通的第一中間開孔426,該第二中間導板427形成有複數個垂直貫通的第二中間開孔428,以及該下導板423形成有複數個垂直貫通的下開孔424。該等上開孔422、該等第一中間開孔426、該等第二中間開孔428、和該等下開孔424皆為對應設置,使得每一該探針430可貫穿通過對應的其中之一該上開孔422、其中之一該第一中間開孔426、其中之一該第二中間開孔428和其中之一該下開孔424,進而電性接觸一待測元件50之相對應的接觸墊51。應當注意的是,每一該上開孔422、每一該下開孔424、每一該第一中間開孔426、和每一該第二中間開孔428內僅允許布置單一個探針430。也就是說,在每 一開孔內不會同時存在一個以上的探針430,進而避免探針430之間互相電性接觸。 As shown in FIG. 6, the guide plate assembly 420 includes an upper guide plate 421, a first intermediate guide plate 425, a second intermediate guide plate 427, and a lower guide plate 423. The upper guide plate 421 is formed with a plurality of upper guide plates 421. a vertically extending upper opening 422, the first intermediate guiding plate 425 is formed with a plurality of vertically intersecting first intermediate openings 426, and the second intermediate guiding plate 427 is formed with a plurality of vertically intersecting second intermediate openings 428. And the lower guide plate 423 is formed with a plurality of vertically extending lower openings 424. The upper opening 422, the first intermediate opening 426, the second intermediate opening 428, and the lower opening 424 are correspondingly disposed such that each of the probes 430 can pass through the corresponding one. One of the upper openings 422, one of the first intermediate openings 426, one of the second intermediate openings 428 and one of the lower openings 424, thereby electrically contacting a phase of the device under test 50 Corresponding contact pads 51. It should be noted that only one single probe 430 is allowed to be disposed in each of the upper opening 422, each of the lower opening 424, each of the first intermediate opening 426, and each of the second intermediate opening 428. . That is, at every More than one probe 430 does not exist simultaneously in an opening, thereby avoiding electrical contact between the probes 430.
如第6圖所示,每一該第一中間開孔426的中心線C7位置相對對應之該上開孔422和該下開孔424的中心線C6位置向右側邊偏移一較短的距離L4,以及每一該第二中間開孔428的中心線C8位置相對對應之該上開孔422和該下開孔424的中心線C6位置向右側邊偏移一較長的距離L5,以及每一該第一中間開孔426的中心線C7位置與每一該第二中間開孔428的中心線C8位置兩者之間亦相距一橫向距離(即,該距離L5與距離L4之間的差值),使得該探針430受該第一中間開孔426和該第二中間開孔428的該側壁的推擠進而在該導板組合420的內部形成一個彎曲區域S。舉例來說,呈現類似「ㄑ」字型的彎曲區域S。也就是說,藉由將該等對應的開孔之間設置為錯位設計,使得該探針430在具有較大伸縮行程的同時,還可避免兩兩相鄰之探針430互相電性接觸。應當注意的是,在該等探針430的彎曲區域S中,該等探針430可呈現弧形的彎曲或者是有角度的彎折,且彎折或彎曲角度介於0至180度之間。 As shown in FIG. 6, the center line C7 of each of the first intermediate openings 426 is offset from the corresponding center line C42 and the center line C6 of the lower opening 424 by a short distance to the right side. L4, and the center line C8 of each of the second intermediate openings 428 are oppositely positioned. The positions of the center line C6 of the upper opening 422 and the lower opening 424 are offset to the right side by a longer distance L5, and each A lateral distance between the center line C7 of the first intermediate opening 426 and the center line C8 of each of the second intermediate openings 428 is also a lateral distance (ie, the difference between the distance L5 and the distance L4). The value of the probe 430 is caused by the pushing of the first intermediate opening 426 and the side wall of the second intermediate opening 428 to form a curved region S inside the guide plate assembly 420. For example, a curved region S resembling a "ㄑ" shape is presented. That is to say, by setting the corresponding openings between the corresponding openings, the probe 430 can avoid the electrical contact between the two adjacent probes 430 while having a large telescopic stroke. It should be noted that in the curved region S of the probes 430, the probes 430 may exhibit an arcuate curvature or an angular bend with a bend or bend angle between 0 and 180 degrees. .
如第6圖所示,該導板組合420還包含複數個間隔元件429。藉由該等間隔元件429固定該上導板421與該第一中間導板425、固定該第一中間導板425與該第二中間導板427以及固定該第二中間導板427與該下導板423,並且將該上導板421與該第一中間導板425保持在相距一縱向距離d6、將該第一中間導板425與該第二中間導板427保持在相距一縱向距離d7以及將該第二中間導板427與該下導板423保持在相距一縱向距離d8,進而在該導板組合420的內部形成一佈針空間。 As shown in FIG. 6, the guide assembly 420 also includes a plurality of spacer elements 429. Fixing the upper guiding plate 421 and the first intermediate guiding plate 425, fixing the first intermediate guiding plate 425 and the second intermediate guiding plate 427, and fixing the second intermediate guiding plate 427 and the lower portion by the spacer members 429 a guiding plate 423, and maintaining the upper guiding plate 421 and the first intermediate guiding plate 425 at a longitudinal distance d6, and maintaining the first intermediate guiding plate 425 and the second intermediate guiding plate 427 at a longitudinal distance d7 And maintaining the second intermediate guiding plate 427 and the lower guiding plate 423 at a longitudinal distance d8, thereby forming a needle space inside the guiding plate assembly 420.
當量測時,先將該垂直式探針卡400之該等探針430電性接觸該接觸墊51,之後將該垂直式探針卡400朝該測試元件50垂直地電性接觸該接觸墊51,該等探針430受壓後會通過自身的彈性變形來吸收受壓時的反向應力。也就是說,該導板組合420之該佈針空間係作為該等探針430的彈性變形空間。應當注意的是,由於該第一中間導板425和該第二中間導板427之該等第一中間開孔426和該等第二中間開孔428的孔徑大於該上導板421之該等上開孔422的孔徑以及大於該下導板423之該等下開孔424的孔徑,因此當該等探針430電性接觸該接觸墊51並且該等探針430受壓時,該等探針430之上下兩端會分別受到孔徑較小的該等上開孔422和該等下開孔424限制而不會產生較大的變形偏移,並且該等探針430的彎曲區域S會沿著該等第一中間開孔426和該等第二中間開孔428的開孔延伸方向彎曲,進而使得向該導板組合420內部微縮的該等探針430皆朝向預期的方向有規律的彎曲,進而避免兩兩相鄰的探針430互相電性接觸而造成該垂直式探針卡400短路。 During the equivalent measurement, the probes 430 of the vertical probe card 400 are first electrically contacted to the contact pads 51, and then the vertical probe card 400 is electrically contacted perpendicularly to the test elements 50. 51. After the probes 430 are pressed, they will absorb the reverse stress under pressure by their own elastic deformation. That is to say, the needle space of the guide plate assembly 420 serves as an elastic deformation space of the probes 430. It should be noted that the first intermediate opening 426 and the second intermediate opening 428 of the first intermediate guiding plate 425 and the second intermediate guiding plate 427 have larger apertures than the upper guiding plate 421. The aperture of the upper opening 422 and the aperture of the lower opening 424 of the lower guiding plate 423, so when the probes 430 electrically contact the contact pads 51 and the probes 430 are pressed, the probes The upper and lower ends of the needle 430 are respectively restricted by the upper opening 422 having a smaller aperture and the lower opening 424 without a large deformation offset, and the curved region S of the probe 430 is along The first intermediate opening 426 and the second intermediate opening 428 are bent in the direction in which the opening extends, so that the probes 430 which are internally contracted toward the guide assembly 420 are regularly curved in a desired direction. In addition, the two adjacent probes 430 are prevented from electrically contacting each other to cause the vertical probe card 400 to be short-circuited.
雖然本發明已用較佳實施例揭露如上,然其並非用以限定本發明,本發明所屬技術領域中具有通常知識者,在不脫離本發明之精神和範圍內,當可作各種之更動與潤飾,因此本發明之保護範圍當視後附之申請專利範圍所界定者為準。 While the invention has been described above in terms of the preferred embodiments, the invention is not intended to limit the invention, and the invention may be practiced without departing from the spirit and scope of the invention. The scope of protection of the present invention is therefore defined by the scope of the appended claims.
200‧‧‧垂直式探針卡 200‧‧‧Vertical probe card
210‧‧‧電路板 210‧‧‧ boards
220‧‧‧導板組合 220‧‧‧ Guide plate combination
221‧‧‧上導板 221‧‧‧Upper guide
222‧‧‧上開孔 Opening 222‧‧‧
223‧‧‧下導板 223‧‧‧ lower guide
224‧‧‧下開孔 224‧‧‧ opening
225‧‧‧中間導板 225‧‧‧Intermediate guide
226‧‧‧中間開孔 226‧‧‧Intermediate opening
229‧‧‧間隔元件 229‧‧‧ spacer elements
230‧‧‧探針 230‧‧‧ probe
50‧‧‧待測元件 50‧‧‧Device under test
51、51’‧‧‧接觸墊 51, 51'‧‧‧ contact pads
L1‧‧‧橫向距離 L1‧‧‧ lateral distance
A-A’‧‧‧第2圖的割面線 Cut line of A-A’‧‧‧Fig. 2
d1、d2‧‧‧縱向距離 D1, d2‧‧‧ longitudinal distance
C1‧‧‧上開孔與下開孔之中心線 C1‧‧‧ centerline of upper and lower openings
C2‧‧‧中間開孔之中心線 C2‧‧‧ centerline of the middle opening
S‧‧‧彎曲區域 S‧‧‧Bending area
Claims (10)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| TW105118118A TWI592665B (en) | 2016-06-08 | 2016-06-08 | Probe device of vertical probe card |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| TW105118118A TWI592665B (en) | 2016-06-08 | 2016-06-08 | Probe device of vertical probe card |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TWI592665B true TWI592665B (en) | 2017-07-21 |
| TW201743063A TW201743063A (en) | 2017-12-16 |
Family
ID=60048500
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW105118118A TWI592665B (en) | 2016-06-08 | 2016-06-08 | Probe device of vertical probe card |
Country Status (1)
| Country | Link |
|---|---|
| TW (1) | TWI592665B (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWI626454B (en) * | 2017-11-20 | 2018-06-11 | Probe device and method of manufacturing same | |
| TWI640782B (en) * | 2017-08-25 | 2018-11-11 | 中華精測科技股份有限公司 | Probe device of vertical probe card |
-
2016
- 2016-06-08 TW TW105118118A patent/TWI592665B/en not_active IP Right Cessation
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWI640782B (en) * | 2017-08-25 | 2018-11-11 | 中華精測科技股份有限公司 | Probe device of vertical probe card |
| CN109425763A (en) * | 2017-08-25 | 2019-03-05 | 中华精测科技股份有限公司 | Probe apparatus of vertical probe card |
| TWI626454B (en) * | 2017-11-20 | 2018-06-11 | Probe device and method of manufacturing same |
Also Published As
| Publication number | Publication date |
|---|---|
| TW201743063A (en) | 2017-12-16 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| TWM529167U (en) | Probe device of vertical probe card | |
| TWI640782B (en) | Probe device of vertical probe card | |
| TWI596346B (en) | Vertical probe card probe device | |
| CN111751583B (en) | Probe Heads and Probe Cards | |
| US20210102974A1 (en) | Hybrid probe card for testing component mounted wafer | |
| KR20160063825A (en) | A contact probe | |
| JP2013217800A (en) | Contact and connector | |
| US9429593B2 (en) | Testing head for a test equipment of electronic devices | |
| TWI592665B (en) | Probe device of vertical probe card | |
| KR20170001805A (en) | Bga probe pin for connection | |
| JP2024514988A (en) | Probe pin and probe pin manufacturing method | |
| KR102172785B1 (en) | Lance contact pin for burn-in test socket using lancing press and method of manufacturing the same | |
| KR102046808B1 (en) | By-directional electrically conductive pin, by-directional electrically conductive module and manufacturing method thereof | |
| KR101890327B1 (en) | Test socket pin having improved contact characteristic structure | |
| KR102270275B1 (en) | Test socket | |
| KR20000023512A (en) | A socket for inspecting semiconductor device, a semiconductor equipment and a method for fabricating the semiconductor equipment | |
| KR101538937B1 (en) | Probe pin and probe card having the same | |
| TWI806091B (en) | Needle for vertical probe card with improved alignment efficiency | |
| KR20170119469A (en) | Mesh type contact pin for testing electric terminal | |
| JP7311561B2 (en) | Chip test pad structure | |
| TWM553422U (en) | Vertical probe card and probe head for wafer test | |
| JP2023020799A (en) | Probe and probe card device | |
| TWI890408B (en) | Side wettable package with probe mark and method for making the same | |
| KR20100020286A (en) | Probe card | |
| KR102864393B1 (en) | Test socket and assembly device thereof |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| MM4A | Annulment or lapse of patent due to non-payment of fees |