TWI584175B - Touch module and manufacturing method thereof - Google Patents
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- TWI584175B TWI584175B TW105112696A TW105112696A TWI584175B TW I584175 B TWI584175 B TW I584175B TW 105112696 A TW105112696 A TW 105112696A TW 105112696 A TW105112696 A TW 105112696A TW I584175 B TWI584175 B TW I584175B
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Description
本案是有關於一種電子裝置及其製造方法。特別是有關於一種觸控模組及其製造方法。 The present invention relates to an electronic device and a method of manufacturing the same. In particular, it relates to a touch module and a method of manufacturing the same.
隨著電子科技的快速進展,觸控模組已被廣泛地應用在各式電子裝置中,如行動電話、平板電腦等。 With the rapid development of electronic technology, touch modules have been widely used in various electronic devices, such as mobile phones, tablets, and the like.
典型的觸控模組例如可設置於顯示螢幕上,包括複數個觸控電極。在物體(手指或觸碰筆等)接近或觸碰顯示螢幕時,相應的觸控電極產生電訊號,藉此達成觸控感測。 A typical touch module can be disposed on the display screen, for example, and includes a plurality of touch electrodes. When an object (finger or touch pen, etc.) approaches or touches the display screen, the corresponding touch electrode generates an electrical signal, thereby achieving touch sensing.
在製造過程中,一般係利用蝕刻方式將觸控電極之間的導電物質移除,以圖案化觸控電極,並使觸控電極間彼此絕緣。然而,將部份導電物質移除的做法,以及僅移除部分導電物質所形成的結構,將導致觸控模組的光折射率不均勻,而影響觸控模組外觀的光學一致性。 In the manufacturing process, the conductive material between the touch electrodes is generally removed by etching to pattern the touch electrodes and insulate the touch electrodes from each other. However, the removal of a portion of the conductive material and the removal of only a portion of the conductive material result in a non-uniform refractive index of the touch module, which affects the optical consistency of the appearance of the touch module.
是以,為避免觸控模組的光折射率不均勻,本案的一態樣提供一種觸控模組。根據本案一實施例,觸控模組包括一基板、至少一第一觸控電極、至少一第二觸控電極、以及絕緣區塊。第一觸控電極形成於基板上。第二觸控電極形成於基板上,平行於第一觸控電極。絕緣區塊嵌入 形成於基板中,並位於第一觸控電極以及第二觸控電極之間。第一觸控電極電性絕緣於第二觸控電極。 Therefore, in order to avoid uneven light refractive index of the touch module, a touch module is provided in one aspect of the present invention. According to an embodiment of the present disclosure, a touch module includes a substrate, at least one first touch electrode, at least one second touch electrode, and an insulating block. The first touch electrode is formed on the substrate. The second touch electrode is formed on the substrate and is parallel to the first touch electrode. Insulation block embedding Formed in the substrate and located between the first touch electrode and the second touch electrode. The first touch electrode is electrically insulated from the second touch electrode.
根據本案一實施例,其中該第一觸控電極、該第二觸控電極與該絕緣區塊係由同一導電材料層所形成而具有相同的導電物質,並且該絕緣區塊係經一分散導電物質的絕緣化處理而具有分離的導電物質。 According to an embodiment of the present invention, the first touch electrode, the second touch electrode and the insulating block are formed of the same conductive material layer and have the same conductive material, and the insulating block is dispersed and electrically conductive. The material is insulated to have a separate conductive material.
根據本案一實施例,該絕緣區塊更位於該第一觸控電極以及該第二觸控電極的周圍。 According to an embodiment of the present disclosure, the insulating block is located around the first touch electrode and the second touch electrode.
根據本案一實施例,該絕緣區塊在該基板的該表面上的正投影位於該第一觸控電極與該第二觸控電極在該基板的一表面上的正投影之間。 According to an embodiment of the present invention, an orthographic projection of the insulating block on the surface of the substrate is between an orthographic projection of the first touch electrode and the second touch electrode on a surface of the substrate.
根據本案一實施例,該第一觸控電極、該第二觸控電極與該絕緣區塊在該基板的一表面上的正投影之間不重疊。 According to an embodiment of the present invention, the first touch electrode, the second touch electrode, and the orthographic projection of the insulating block on a surface of the substrate do not overlap.
根據本案一實施例,該觸控模組更包括複數條導線電性連接該第一觸控電極以及該第二觸控電極。 According to an embodiment of the present invention, the touch module further includes a plurality of wires electrically connected to the first touch electrode and the second touch electrode.
根據本案一實施例,該觸控模組更包括複數條輔助導線,分別位於該些導線之下,並分別電性連接該些導線。 According to an embodiment of the present invention, the touch module further includes a plurality of auxiliary wires respectively located under the wires and electrically connected to the wires.
根據本案一實施例,該觸控模組更包括複數接觸墊,分別設置於該第一觸控電極以及該第二觸控電極之上;以及複數條導線,分別電性連接該些接觸墊。 According to an embodiment of the present invention, the touch module further includes a plurality of contact pads disposed on the first touch electrodes and the second touch electrodes, and a plurality of wires electrically connected to the contact pads.
根據本案一實施例,該第一觸控電極與該第二觸控電極為魚骨狀。 According to an embodiment of the present disclosure, the first touch electrode and the second touch electrode are fishbone shaped.
本案的另一實施例揭露一種觸控模組的製造方法。該製造方 法包括:提供一基板;以及形成至少一第一觸控電極以及至少一第一觸控電極於該基板上,並同步嵌入形成一絕緣區塊於該基板中,其中絕緣區塊位於第一觸控電極以及第二觸控電極之間,且第一觸控電極電性絕緣於第二觸控電極。 Another embodiment of the present disclosure discloses a method of manufacturing a touch module. The manufacturer The method includes: providing a substrate; and forming at least one first touch electrode and at least one first touch electrode on the substrate, and simultaneously embedding to form an insulating block in the substrate, wherein the insulating block is located at the first touch The first touch electrode is electrically insulated from the second touch electrode.
根據本案一實施例,形成該第一觸控電極、該第一觸控電極於該基板上,並同步嵌入形成該絕緣區塊於該基板中的步驟包括:提供一導電材料層於該基板上;提供複數個遮罩及複數條導線於該導電材料層上;以及絕緣化該導電材料層暴露在該些遮罩之外的一部份,以形成該第一觸控電極、該第二觸控電極、以及該絕緣區塊。 According to an embodiment of the present invention, the step of forming the first touch electrode and the first touch electrode on the substrate and simultaneously embedding the insulating block in the substrate comprises: providing a conductive material layer on the substrate Providing a plurality of masks and a plurality of wires on the conductive material layer; and insulating a portion of the conductive material layer exposed to the masks to form the first touch electrode and the second touch Control electrode, and the insulating block.
根據本案一實施例,該製造方法更包括:在絕緣化該導電材料層的一部份,以形成該第一觸控電極、該第二觸控電極、以及該絕緣區塊之前,提供複數條導線於該導電材料層上。 According to an embodiment of the present invention, the manufacturing method further includes: providing a plurality of strips before insulating the portion of the conductive material layer to form the first touch electrode, the second touch electrode, and the insulating block A wire is on the layer of electrically conductive material.
根據本案一實施例,絕緣化該導電材料層暴露在該些遮罩之外的一部份,以形成該第一觸控電極、該第二觸控電極、以及該絕緣區塊的步驟包括:分散該導電材料層中暴露在該些遮罩以及該些導線之外的一第一部份中的導電物質,以絕緣化該導電材料層的該第一部份,以形成該絕緣區塊,並使該導電材料層中位於該些遮罩之下的複數個第二部份分別形成該第一觸控電極以及該第二觸控電極。 According to an embodiment of the present invention, the step of insulating the portion of the conductive material exposed to the portions of the mask to form the first touch electrode, the second touch electrode, and the insulating block comprises: Dispersing a conductive material in the conductive material layer exposed to the mask and a first portion other than the wires to insulate the first portion of the conductive material layer to form the insulating block, And the plurality of second portions of the conductive material layer under the masks respectively form the first touch electrode and the second touch electrode.
根據本案一實施例,絕緣化該導電材料層暴露在該些遮罩之外的一部份,以形成該第一觸控電極、該第二觸控電極、以及該絕緣區塊的步驟更包括:使該導電材料層中位於該些導線之下的複數個第三部份形成複數條輔助導線。 According to an embodiment of the present invention, the step of insulating the conductive material layer to be exposed to a portion of the mask to form the first touch electrode, the second touch electrode, and the insulating block further includes : forming a plurality of auxiliary wires in the plurality of third portions of the conductive material layer under the plurality of wires.
根據本案一實施例,分散該導電材料層中暴露在該些遮罩以及該些導線之外的一第一部份中的導電物質的步驟包括:提供一嵌入液於該導電材料層中暴露在該些遮罩之外以及該些導線之外的該第一部份上,以分散該導電材料層中的該第一部份中的導電物質。 According to an embodiment of the present invention, the dispersing the conductive material in the conductive material layer exposed to the mask and a first portion other than the wires comprises: providing an embedding liquid exposed in the conductive material layer The first portion of the mask and the first portion of the conductive material are dispersed outside the mask to disperse the conductive material in the first portion of the conductive material layer.
根據本案一實施例,該製造方法更包括:在絕緣化該導電材料層暴露在該些遮罩之外的一部份,以形成該第一觸控電極、該第二觸控電極、以及該絕緣區塊之前,提供複數個接觸墊於該導電材料層上。 According to an embodiment of the present invention, the manufacturing method further includes: insulating a portion of the conductive material layer exposed to the masks to form the first touch electrode, the second touch electrode, and the Prior to insulating the block, a plurality of contact pads are provided on the layer of electrically conductive material.
根據本案一實施例,絕緣化該導電材料層暴露在該些遮罩之外的一部份,以形成該第一觸控電極、該第二觸控電極、以及該絕緣區塊的步驟包括:分散該導電材料層中暴露在該些遮罩以及該些接觸墊之外的一第一部份中的導電物質,以絕緣化該導電材料層的該第一部份,以形成該絕緣區塊,並使該導電材料層中位於該些遮罩之下的複數個第二部份分別形成該第一觸控電極以及該第二觸控電極,並使該導電材料層中位於該些接觸之下的複數個第三部份形成複數條輔助導線。 According to an embodiment of the present invention, the step of insulating the portion of the conductive material exposed to the portions of the mask to form the first touch electrode, the second touch electrode, and the insulating block comprises: Dispersing a conductive material in the conductive material layer exposed to the mask and a first portion outside the contact pads to insulate the first portion of the conductive material layer to form the insulating block And the plurality of second portions of the conductive material layer under the masks respectively form the first touch electrode and the second touch electrode, and the conductive material layer is located in the contact layer The plurality of third portions below form a plurality of auxiliary wires.
根據本案一實施例,該製造方法更包括:提供複數條導線於該導電材料層上,並分別電性連接該些接觸墊。 According to an embodiment of the present invention, the manufacturing method further includes: providing a plurality of wires on the conductive material layer, and electrically connecting the contact pads respectively.
根據本案一實施例,其中該絕緣區塊在該基板的一表面上的正投影位於該第一觸控電極與該第二觸控電極在該基板的該表面上的正投影之間。 According to an embodiment of the present invention, an orthographic projection of the insulating block on a surface of the substrate is between an orthogonal projection of the first touch electrode and the second touch electrode on the surface of the substrate.
根據本案一實施例,其中該第一觸控電極、該第二觸控電極與該絕緣區塊在該基板的一表面上的正投影之間不重疊。 According to an embodiment of the present invention, the first touch electrode, the second touch electrode, and the orthographic projection of the insulating block on a surface of the substrate do not overlap.
綜上所述,透過應用上述一實施例,可實現一種觸控模組。 藉由於基板中形成絕緣區塊,可使觸控電極間彼此絕緣。如此一來,即可避免透過蝕刻方式圖案化觸控電極,並避免造成觸控模組的光折射率不均勻,而影響觸控模組外觀的光學一致性。 In summary, a touch module can be implemented by applying the above embodiment. The touch electrodes can be insulated from each other by forming insulating blocks in the substrate. In this way, the touch electrode can be prevented from being patterned by etching, and the optical refractive index of the touch module is not uniform, thereby affecting the optical consistency of the appearance of the touch module.
100‧‧‧觸控模組 100‧‧‧ touch module
110‧‧‧基板 110‧‧‧Substrate
120‧‧‧導電材料層 120‧‧‧ Conductive material layer
122‧‧‧第二部份 122‧‧‧ second part
124‧‧‧第一部份 124‧‧‧ first part
126‧‧‧第三部份 126‧‧‧Part III
SF1‧‧‧表面 SF1‧‧‧ surface
E1‧‧‧第一觸控電極 E1‧‧‧first touch electrode
INS‧‧‧絕緣區塊 INS‧‧‧Insulated block
MT‧‧‧金屬導線 MT‧‧‧Metal wire
TR‧‧‧透明導線 TR‧‧‧Transparent wire
PD‧‧‧接觸墊 PD‧‧‧ contact pads
MSK1‧‧‧遮罩 MSK1‧‧‧ mask
MSK2‧‧‧遮罩 MSK2‧‧‧ mask
AUX‧‧‧輔助導線 AUX‧‧‧Auxiliary wire
SNW‧‧‧奈米銀線 SNW‧‧Nee silver wire
200‧‧‧製造方法 200‧‧‧Manufacture method
S1-S2‧‧‧步驟 S1-S2‧‧‧ steps
圖1A-3A為根據本案一實施例繪示的一種觸控模組的製造方法的示意圖;圖1B-3B為圖1A-3A中的觸控模組沿線段A-a方向所繪示的剖面圖;圖4為根據本案比較例所繪示的形成觸控電極與絕緣區塊的剖面圖;圖5A-7A為根據本案一實施例繪示的一種觸控模組的製造方法的示意圖;圖5B-7B為圖5A-7A中的觸控模組沿線段A-a方向所繪示的剖面圖;圖8A-11A為根據本案一實施例繪示的一種觸控模組的製造方法的示意圖;圖8B-11B為圖8A-11A中的觸控模組沿線段A-a方向所繪示的剖面圖;圖12A為根據本案一變化的實施例繪示的一種觸控模組的製造方法中的一個步驟的示意圖;圖12B為圖12A中的觸控模組沿線段A-a方向所繪示的剖面圖;圖13A-14A為根據本案一實施例繪示的一種觸控模組的製造方法的示意圖;圖13B-14B為圖13A-14A中的觸控模組沿線段A-a方向所繪示的剖面圖;圖15A-16A為根據本案一變化的實施例繪示的一種觸控模組的製造方法中的一個步驟的示意圖;圖15B-16B為圖15A-16A中的觸控模組沿線段A-a方向所繪示的剖面圖;圖17A-20A為根據本案一實施例繪示的一種觸控模組的製造方法的示意 圖;圖17B-20B為圖17A-20A中的觸控模組沿線段A-a方向所繪示的剖面圖;圖21A為根據本案一變化的實施例繪示的一種觸控模組的製造方法中的一個步驟的示意圖;圖21B為圖21A中的觸控模組沿線段A-a方向所繪示的剖面圖;圖22A-25A為根據本案一實施例繪示的一種觸控模組的製造方法的示意圖;圖22B-25B為圖22A-25A中的觸控模組沿線段A-a方向所繪示的剖面圖;圖26A為根據本案一變化的實施例繪示的一種觸控模組的製造方法中的一個步驟的示意圖;圖26B為圖26A中的觸控模組沿線段A-a方向所繪示的剖面圖;以及圖27為根據本案一實施例繪示的一種觸控模組的製造方法的流程圖。 1A-3A are schematic views of a method for manufacturing a touch module according to an embodiment of the present invention; and FIGS. 1B-3B are cross-sectional views of the touch module of FIG. 1A-3A along a line Aa direction; 4 is a cross-sectional view showing a touch electrode and an insulating block according to a comparative example of the present invention; and FIGS. 5A-7A are schematic views showing a method of manufacturing a touch module according to an embodiment of the present invention; 7B is a cross-sectional view of the touch module of FIG. 5A-7A along the direction of the line Aa; FIG. 8A-11A is a schematic diagram of a method for manufacturing the touch module according to an embodiment of the present invention; 11B is a cross-sectional view of the touch module of FIG. 8A-11A along the direction of the line Aa; FIG. 12A is a schematic diagram of a step in the manufacturing method of the touch module according to an embodiment of the present disclosure; FIG. 12B is a cross-sectional view of the touch module of FIG. 12A along the line Aa direction; FIG. 13A-14A is a schematic diagram of a method for manufacturing the touch module according to an embodiment of the present invention; 14B is a cross-sectional view of the touch module of FIG. 13A-14A along the direction of the line Aa; FIG. 15A-16A is according to the present case. FIG. 15B-16B are cross-sectional views of the touch module of FIG. 15A-16A along the line Aa direction; FIG. 17A is a schematic diagram of a step in the manufacturing method of the touch module; -20A is a schematic diagram of a method for manufacturing a touch module according to an embodiment of the present disclosure FIG. 17B is a cross-sectional view of the touch module of FIG. 17A-20A along the line Aa direction; FIG. 21A is a diagram of a method for manufacturing a touch module according to an embodiment of the present disclosure; FIG. 21B is a cross-sectional view of the touch module of FIG. 21A along the line Aa direction; FIG. 22A-25A is a method of manufacturing a touch module according to an embodiment of the present invention. FIG. 22B is a cross-sectional view of the touch module of FIG. 22A-25A along the line Aa direction; FIG. 26A is a diagram of a method for manufacturing a touch module according to an embodiment of the present disclosure; FIG. 26B is a cross-sectional view of the touch module of FIG. 26A along the line Aa direction; and FIG. 27 is a flow chart of a method for manufacturing the touch module according to an embodiment of the present invention. Figure.
以下將以圖式及詳細敘述清楚說明本揭示內容之精神,任何所屬技術領域中具有通常知識者在瞭解本揭示內容之較佳實施例後,當可由本揭示內容所教示之技術,加以改變及修飾,其並不脫離本揭示內容之精神與範圍。 The spirit and scope of the present disclosure will be apparent from the following description of the preferred embodiments of the present disclosure. Modifications do not depart from the spirit and scope of the disclosure.
關於本文中所使用之『第一』、『第二』、…等,並非特別指稱次序或順位的意思,亦非用以限定本案,其僅為了區別以相同技術用語描述的元件或操作。 The use of the terms "first", "second", ", etc." as used herein does not specifically mean the order or the order, and is not intended to limit the present invention. It is merely to distinguish between elements or operations described in the same technical terms.
關於本文中所使用之方向用語,例如:上、下、左、右、前或後等,僅是參考附加圖式的方向。因此,使用的方向用語是用來說明並 非用來限制本創作。 Regarding the directional terms used in this article, such as: up, down, left, right, front or back, etc., only refer to the direction of the additional schema. Therefore, the direction used is used to explain Not used to limit this creation.
關於本文中所使用之『包含』、『包括』、『具有』、『含有』等等,均為開放性的用語,即意指包含但不限於。 The terms "including", "including", "having", "containing", etc., as used in this document are all open terms, meaning, but not limited to.
關於本文中所使用之『及/或』,係包括所述事物的任一或全部組合。 With respect to "and/or" as used herein, it is meant to include any or all combinations of the recited.
關於本文中所使用之用詞(terms),除有特別註明外,通常具有每個用詞使用在此領域中、在此揭露之內容中與特殊內容中的平常意義。某些用以描述本揭露之用詞將於下或在此說明書的別處討論,以提供本領域技術人員在有關本揭露之描述上額外的引導。 The terms used in this document, unless otherwise specified, generally have the usual meaning of each term used in the art, in the context of the disclosure, and in the particular content. Certain terms used to describe the disclosure are discussed below or elsewhere in this specification to provide additional guidance to those skilled in the art in the description of the disclosure.
本案的一實施態樣為一種觸控模組的製造方法。在以下段落中,本案將用以下第一實施例至第六實施例為例說明本案細節,然而本案不以下述實施例中的細節為限,其它的實施方式亦在本案範圍之中。 One embodiment of the present invention is a method of manufacturing a touch module. In the following paragraphs, the present invention will be described by using the following first to sixth embodiments as examples. However, the present invention is not limited to the details in the following embodiments, and other embodiments are also within the scope of the present invention.
第一實施例 First embodiment
圖1A-3A為根據本案一實施例繪示的一種觸控模組100的製造方法的示意圖。圖1B-3B為圖1A-3A中的觸控模組100沿線段A-a方向所繪示的剖面圖。 1A-3A are schematic diagrams showing a method of fabricating a touch module 100 according to an embodiment of the present invention. 1B-3B are cross-sectional views of the touch module 100 of FIG. 1A-3A taken along line A-a.
首先,特別參照圖1A及圖1B,在一第一步驟中,提供導電材料層120於基板110的上表面SF1上。接著,在一第二步驟中,提供複數條金屬導線MT於導電材料層120上。 First, referring specifically to FIGS. 1A and 1B, in a first step, a conductive material layer 120 is provided on the upper surface SF1 of the substrate 110. Next, in a second step, a plurality of metal wires MT are provided on the conductive material layer 120.
在一實施例中,是藉由提供含導電添加物(conducting additive)的嵌入液(embedding solvent)於基板110的上表面SF1上,以令導電添加物部份嵌入基板110中,形成導電材料層120。亦即,導電材料層120是部 份嵌入於基板110的上表面SF1上。 In one embodiment, an embedding solvent containing a conductive additive is provided on the upper surface SF1 of the substrate 110 to partially embed the conductive additive in the substrate 110 to form a conductive material layer. 120. That is, the conductive material layer 120 is a portion The portion is embedded on the upper surface SF1 of the substrate 110.
在一實施例中,基板110例如是由聚酸甲酯(polymethyl methacrylate,PMMA)、聚碳酸酯(polycarbonate,PC)、聚對苯二甲酸乙二醇酯(polyethylene terephthalate,PET)、環狀烯烴單體共聚合物(cyclo olefin polymer,COP)等適當高分子材料實現。在一實施例中,含導電添加物的嵌入液例如是藉由將導電添加物溶解於特定溶劑中所實現,其中所述之特定溶劑的溶解參數(solubility parameter)接近於基板110之材料的溶解參數,以使溶解於所述之特定溶劑中的導電添加物滲透進入基板110之中,以達成嵌入的效果。在一實施例中,上述導電添加物例如是奈米碳管、奈米金屬線、導電膠、導電高分子、石墨稀、奈米金屬等適當導電物質。 In one embodiment, the substrate 110 is, for example, polymethyl methacrylate (PMMA), polycarbonate (PC), polyethylene terephthalate (PET), cyclic olefin. It is realized by a suitable polymer material such as a cycloolefin polymer (COP). In one embodiment, the embedding fluid containing the conductive additive is achieved, for example, by dissolving the conductive additive in a specific solvent, wherein the solubility parameter of the specific solvent is close to the dissolution of the material of the substrate 110. The parameter is such that the conductive additive dissolved in the specific solvent penetrates into the substrate 110 to achieve an embedding effect. In one embodiment, the conductive additive is, for example, a suitable conductive material such as a carbon nanotube, a nanowire, a conductive paste, a conductive polymer, a graphite thinner, or a nano metal.
藉由提供含導電添加物的嵌入液於以高分子材料形成的基板110的上表面SF1上,可使基板110中鄰近上表面SF1的部份膨脹,以使部份導電添加物滲透到基板110之中,以達到部份嵌入的效果。 By providing an embedding liquid containing a conductive additive on the upper surface SF1 of the substrate 110 formed of a polymer material, a portion of the substrate 110 adjacent to the upper surface SF1 may be expanded to allow a part of the conductive additive to penetrate into the substrate 110. Among them, to achieve partial embedding effect.
為使敘述清楚,在以下的段落中,前述導電添加物將以奈米銀線為例進行說明,然而本案不以此為限。 In order to clarify the description, in the following paragraphs, the above-mentioned conductive additive will be described by taking a silver nanowire as an example, but the present invention is not limited thereto.
接著,特別參照圖2A及圖2B,在一第三步驟中,提供複數個第一遮罩MSK1與第二遮罩MSK2於導電材料層120與部分的金屬導線MT上。在一實施例中,第一遮罩MSK1係用以在而後的步驟中圖形化第一觸控電極E1,第二遮罩MSK2係用以在而後的步驟中圖形化第二觸控電極E2。 2A and 2B, in a third step, a plurality of first masks MSK1 and second masks MSK2 are provided on the conductive material layer 120 and a portion of the metal wires MT. In one embodiment, the first mask MSK1 is used to pattern the first touch electrode E1 in a subsequent step, and the second mask MSK2 is used to pattern the second touch electrode E2 in a subsequent step.
此時,導電材料層120包括暴露在遮罩MSK1、MSK2及金屬導線MT之外的第一部份124、位在遮罩MSK1、MSK2下的第二部份122、以及位在金屬導線MT下並接觸金屬導線MT的第三部份126。 At this time, the conductive material layer 120 includes a first portion 124 exposed outside the masks MSK1, MSK2 and the metal wires MT, a second portion 122 under the masks MSK1, MSK2, and under the metal wires MT. And contacting the third portion 126 of the metal wire MT.
在一實施例中,係先形成一透明材料層於導電材料層120與金屬導線MT上,而後再以移除此一透明材料層中的一部份,以形成第一遮罩MSK1與第二遮罩MSK2。在一實施例中,此一移除程序可用黃光蝕刻或乾式蝕刻實現,然本案不以此為限。 In one embodiment, a transparent material layer is first formed on the conductive material layer 120 and the metal wire MT, and then a portion of the transparent material layer is removed to form the first mask MSK1 and the second layer. Mask MSK2. In an embodiment, the removal process can be implemented by yellow etching or dry etching, but the present invention is not limited thereto.
在一實施例中,第一遮罩MSK1與第二遮罩MSK2例如可用光阻材料或其它透明的導電、非導電材料實現,然本案不以此為限。 In an embodiment, the first mask MSK1 and the second mask MSK2 can be implemented, for example, by a photoresist material or other transparent conductive or non-conductive materials, but the present invention is not limited thereto.
接著,特別參照圖3A及圖3B,在一第四步驟中,絕緣化導電材料層120的第一部份124,以形成第一觸控電極E1、第二觸控電極E2、輔助導線AUX、以及絕緣區塊INS。 Referring to FIG. 3A and FIG. 3B, in a fourth step, the first portion 124 of the conductive material layer 120 is insulated to form a first touch electrode E1, a second touch electrode E2, and an auxiliary conductor AUX. And insulating block INS.
進一步來說,在第四步驟中,係分散導電材料層120中暴露在遮罩MSK1、MSK2以及金屬導線MT之外的一第一部份124中的導電物質(如奈米銀線),並使此些導電物質進一步下沉及分散至基板110之中以形成絕緣區塊INS,並使導電材料層120中位於第一遮罩MSK1之下並接觸第一遮罩MSK1的第二部份122形成第一觸控電極E1、使導電材料層120中位於第二遮罩MSK2之下並接觸第二遮罩MSK2的第二部份122形成第二觸控電極E2,並使導電材料層120中位於金屬導線MT下並接觸金屬導線MT的第三部份126形成輔助導線AUX。 Further, in the fourth step, the conductive material (such as a nano silver wire) exposed in a first portion 124 of the conductive material layer 120 exposed to the masks MSK1, MSK2 and the metal wires MT is dispersed. The conductive material is further sunk and dispersed into the substrate 110 to form the insulating block INS, and the conductive material layer 120 is located under the first mask MSK1 and contacts the second portion 122 of the first mask MSK1. Forming the first touch electrode E1, the second portion 122 of the conductive material layer 120 under the second mask MSK2 and contacting the second mask MSK2 forms the second touch electrode E2, and the conductive material layer 120 is The third portion 126 located under the metal wire MT and contacting the metal wire MT forms the auxiliary wire AUX.
在一實施例中,係藉由提供不含導電添加物的嵌入液於導電材料層120中暴露在遮罩MSK1、MSK2及金屬導線MT之外的第一部份124上,以分散導電材料層120中的第一部份124中的導電物質,並使此些導電物質進一步下沉及分散至基板110之中,以在基板110中形成嵌入的絕緣區塊INS。 In one embodiment, the conductive material layer is dispersed by providing an embedding liquid containing no conductive additive to the first portion 124 of the conductive material layer 120 outside the masks MSK1, MSK2 and the metal wires MT. The conductive material in the first portion 124 of 120 causes the conductive material to further sink and disperse into the substrate 110 to form an embedded insulating block INS in the substrate 110.
舉例而言,特別參照第4圖。如第4圖所示,在第一遮罩MSK1下的複數奈米銀線SNW係彼此連接,以形成具導電性的第一觸控電極E1,此外,暴露在第一遮罩MSK1與金屬導線MT外的奈米銀線SNW,因被不含導電添加物的嵌入液分散,故彼此不連接,以形成不具導電性的絕緣區塊INS。換言之,觸控電極E1、E2與輔助導線AUX具有彼此電性連接的導電物質,絕緣區塊INS具有彼此分散且電性隔離的導電物質。 For example, refer specifically to Figure 4. As shown in FIG. 4, the plurality of nano silver wires SNW under the first mask MSK1 are connected to each other to form a first touch electrode E1 having conductivity, and further, exposed to the first mask MSK1 and the metal wires. The nano silver wire SNW outside the MT is not connected to each other due to being dispersed by the embedding liquid containing no conductive additive to form an insulating block INS having no conductivity. In other words, the touch electrodes E1, E2 and the auxiliary wires AUX have conductive substances electrically connected to each other, and the insulating blocks INS have conductive substances that are dispersed and electrically isolated from each other.
在一實施例中,不含導電添加物的嵌入液例如是由前述的具有特定溶解參數的特定溶劑所實現。 In one embodiment, the embedding fluid without the conductive additive is achieved, for example, by the aforementioned specific solvent having specific dissolution parameters.
在一實施例中,絕緣區塊INS係形成於觸控電極E1、E2之間,以使觸控電極E1、E2彼此絕緣。在一實施例中,絕緣區塊INS亦形成於觸控電極E1、E2的周圍。在一實施例中,絕緣區塊INS係暴露於基板110的上表面SF1。 In one embodiment, the insulating block INS is formed between the touch electrodes E1 and E2 to insulate the touch electrodes E1 and E2 from each other. In an embodiment, the insulating block INS is also formed around the touch electrodes E1 and E2. In an embodiment, the insulating block INS is exposed to the upper surface SF1 of the substrate 110.
透過上述的製造方法,即可實現觸控模組100。於基板110中形成絕緣區塊INS,可使觸控電極E1、E2間彼此絕緣。如此一來,即可避免透過蝕刻方式圖案化觸控電極E1、E2,並避免造成觸控模組100的光折射率不均勻,而影響觸控模組100外觀的光學一致性。 The touch module 100 can be realized by the above manufacturing method. The insulating block INS is formed in the substrate 110 to insulate the touch electrodes E1 and E2 from each other. In this way, the touch electrodes E1 and E2 can be prevented from being patterned by etching, and the optical refractive index of the touch module 100 can be prevented from being uneven, thereby affecting the optical consistency of the appearance of the touch module 100.
換言之,藉由前述分散導電材料層120的導電物質以於基板110中形成絕緣區塊INS的方法,可使觸控電極E1、E2、輔助導線AUX與絕緣區塊INS在基板110的上表面SF1上的正投影之間大致不具間隙或大致不重疊。亦即,觸控電極E1、E2、輔助導線AUX與絕緣區塊INS在基板110的上表面SF1上的正投影可形成一完整的平面。如此一來,即可避免因折射率不均,而影響觸控模組100外觀的光學一致性。 In other words, by the method of dispersing the conductive material of the conductive material layer 120 to form the insulating block INS in the substrate 110, the touch electrodes E1 and E2, the auxiliary conductive line AUX and the insulating block INS may be on the upper surface SF1 of the substrate 110. The upper orthographic projections have substantially no gaps or substantially no overlap. That is, the positive projections of the touch electrodes E1, E2, the auxiliary wires AUX and the insulating blocks INS on the upper surface SF1 of the substrate 110 may form a complete plane. In this way, the optical consistency of the appearance of the touch module 100 can be avoided due to the uneven refractive index.
當注意到,在本案中的用語「大致」,係用以修飾可些微變化的數量以及因製造過程所造成的些微誤差,但這種些微變化及些微誤差並不會改變其本質。舉例而言,在形成絕緣區塊INS的過程中,可能產生誤差,使得觸控電極E1、E2、金屬導線MT以及絕緣區塊INS在基板110的上表面SF1上的正投影之間存在些微間隙或些微重疊。然而,此些因製造過程所造成的些微誤差,亦在本案範圍之中。 It is noted that the term "roughly" in this case is used to modify the amount of slight variations and the slight errors caused by the manufacturing process, but such slight variations and slight errors do not change their nature. For example, in the process of forming the insulating block INS, an error may occur, so that there is a slight gap between the touch electrodes E1, E2, the metal wires MT, and the orthographic projection of the insulating block INS on the upper surface SF1 of the substrate 110. Or slightly overlapping. However, some of the slight errors caused by the manufacturing process are also within the scope of this case.
在一實施例中,絕緣區塊INS在基板110的上表面SF1上的正投影位於觸控電極E1、E2在基板100的上表面SF1上的正投影之間。在一實施例中,絕緣區塊INS在基板110的上表面SF1上的正投影位於觸控電極E1、E2在基板100的上表面SF1上的正投影的周圍。 In an embodiment, the orthographic projection of the insulating block INS on the upper surface SF1 of the substrate 110 is between the orthographic projections of the touch electrodes E1, E2 on the upper surface SF1 of the substrate 100. In an embodiment, the orthographic projection of the insulating block INS on the upper surface SF1 of the substrate 110 is located around the orthographic projection of the touch electrodes E1, E2 on the upper surface SF1 of the substrate 100.
在一實施例中,觸控電極E1、E2係沿著一第一方向交替排列。在一實施例中,觸控電極E1位於遮罩MSK1下,且觸控電極E2位於遮罩MSK2下。 In one embodiment, the touch electrodes E1, E2 are alternately arranged along a first direction. In one embodiment, the touch electrode E1 is located under the mask MSK1, and the touch electrode E2 is located under the mask MSK2.
在一實施例中,觸控電極E1、E2皆為魚骨狀。亦即,每一觸控電極E1、E2皆包括一主幹以及複數與主幹電性連接的分枝。此些分枝設置於主幹的相對兩側。應注意到,上述實施例僅為例示,其它形狀的觸控電極E1、E2亦在本案範疇之中,故本案並不以此為限。 In an embodiment, the touch electrodes E1 and E2 are all fishbone. That is, each of the touch electrodes E1 and E2 includes a trunk and a plurality of branches electrically connected to the trunk. These branches are placed on opposite sides of the trunk. It should be noted that the above embodiments are merely illustrative, and the touch electrodes E1 and E2 of other shapes are also in the scope of the present case, and thus the present invention is not limited thereto.
在一實施例中,觸控電極E1、E2彼此物理上及電性上分離。 In an embodiment, the touch electrodes E1 and E2 are physically and electrically separated from each other.
在一實施例中,遮罩MSK1、MSK2係沿著一第一方向交替排列。在一實施例中,遮罩MSK1、MSK2皆為魚骨狀。 In an embodiment, the masks MSK1, MSK2 are alternately arranged along a first direction. In one embodiment, the masks MSK1, MSK2 are all fishbone shaped.
在一實施例中,遮罩MSK1、MSK2彼此分離。在一實施例中,遮罩MSK1、MSK2在基板100的上表面SF1上的正投影之間彼此不重疊。 In an embodiment, the masks MSK1, MSK2 are separated from one another. In an embodiment, the masks MSK1, MSK2 do not overlap each other between the orthographic projections on the upper surface SF1 of the substrate 100.
在一實施例中,遮罩MSK1、MSK2可在形成觸控電極E1、E2後選擇性移除,以進一步提升觸控模組100外觀的一致性,故本案不以上述實施例為限。 In an embodiment, the masks MSK1 and MSK2 are selectively removed after the touch electrodes E1 and E2 are formed to further improve the appearance of the touch module 100. Therefore, the present invention is not limited to the above embodiments.
在一實施例中,輔助導線AUX位於金屬導線MT之下。在一實施例中,輔助導線AUX電性連接金屬導線MT,並分別電性連接觸控電極E1、E2。在一實施例中,輔助導線AUX可協助金屬導線MT傳遞觸控訊號。 In an embodiment, the auxiliary conductor AUX is located below the metal conductor MT. In an embodiment, the auxiliary wires AUX are electrically connected to the metal wires MT, and are electrically connected to the touch electrodes E1 and E2, respectively. In an embodiment, the auxiliary wire AUX can assist the metal wire MT to transmit the touch signal.
在一實施例中,輔助導線AUX、絕緣區塊INS、與觸控電極E1、E2具有相同的導電物質。 In an embodiment, the auxiliary wire AUX, the insulating block INS, and the touch electrodes E1, E2 have the same conductive material.
另一方面,應注意到,在本案的一變化的實施例中,基板110可包括活化層(未繪示)以及底層(未繪示)。活化層設置於底層之上,且前述的觸控電極E1、E2、及輔助導線AUX皆部份嵌入於基板110的活化層上,且前述的絕緣區塊INS是形成於基板110的活化層之中。 On the other hand, it should be noted that in a variant embodiment of the present disclosure, the substrate 110 may include an active layer (not shown) and a bottom layer (not shown). The active layer is disposed on the bottom layer, and the touch electrodes E1, E2 and the auxiliary wires AUX are partially embedded on the active layer of the substrate 110, and the insulating block INS is formed on the active layer of the substrate 110. in.
在一實施例中,底層可以是剛性或軟性材質,例如可用玻璃、聚對苯二甲酸乙二酯(polyethylene terephthalate,PET)及/或聚碳酸酯(polycarbonate,PC)所製作。活化層例如可用聚酸甲酯、聚氯乙烯(polyvinyl chloride,PVC)及/或聚苯乙烯(polystyrene)等適當高分子材料實現。 In one embodiment, the bottom layer can be a rigid or soft material, such as glass, polyethylene terephthalate (PET), and/or polycarbonate (PC). The active layer can be realized, for example, by a suitable polymer material such as polymethyl acrylate, polyvinyl chloride (PVC), and/or polystyrene.
在一實施例中,由於第一觸控電極E1、第二觸控電極E2與絕緣區塊INS係由同一導電材料層120所形成,故具有相同的導電物質。絕緣區塊INS係經一分散導電材料層120中的導電物質的絕緣化處理(即前述之嵌入處理)而具有從導電材料層120中分離出的導電物質。 In one embodiment, since the first touch electrode E1, the second touch electrode E2, and the insulating block INS are formed of the same conductive material layer 120, they have the same conductive material. The insulating block INS has a conductive material separated from the conductive material layer 120 by an insulating treatment of the conductive material in the dispersed conductive material layer 120 (i.e., the aforementioned embedding process).
第二實施例 Second embodiment
以下將透過第二實施例,提供另一種觸控模組100的製造方 法。此一製造方法與第一實施例中的製造方法大致相同,差異之處僅在遮罩MSK1、MSK2與金屬導線MT的提供順序。故在以下說明中,重覆的部份將不贅述。 In the following, through the second embodiment, another manufacturing method of the touch module 100 is provided. law. This manufacturing method is substantially the same as the manufacturing method in the first embodiment, and the difference is only in the order in which the masks MSK1, MSK2 and the metal wires MT are provided. Therefore, in the following description, the repeated parts will not be described.
圖5A-7A為根據本案一實施例繪示的一種觸控模組100的製造方法的示意圖。圖5B-7B為圖5A-7A中的觸控模組100沿線段A-a方向所繪示的剖面圖。 5A-7A are schematic diagrams showing a method of fabricating a touch module 100 according to an embodiment of the present invention. 5B-7B are cross-sectional views of the touch module 100 of FIGS. 5A-7A taken along line A-a.
首先,特別參照圖5A及圖5B,在一第一步驟中,提供導電材料層120於基板110的上表面SF1上。接著,在一第二步驟中,提供複數個第一遮罩MSK1與第二遮罩MSK2於導電材料層120上。 First, referring specifically to FIGS. 5A and 5B, in a first step, a conductive material layer 120 is provided on the upper surface SF1 of the substrate 110. Next, in a second step, a plurality of first masks MSK1 and second masks MSK2 are provided on the conductive material layer 120.
在本實施例中,導電材料層120與遮罩MSK1、MSK2的細節可參照前述段落,故在此不贅述。 In the present embodiment, the details of the conductive material layer 120 and the masks MSK1, MSK2 can be referred to the foregoing paragraphs, and thus will not be described herein.
接著,特別參照圖6A及圖6B,在一第三步驟中,提供複數條金屬導線MT於導電材料層120、第一遮罩MSK1、與第二遮罩MSK2上。 Next, referring to FIG. 6A and FIG. 6B, in a third step, a plurality of metal wires MT are provided on the conductive material layer 120, the first mask MSK1, and the second mask MSK2.
此時,導電材料層120包括暴露在遮罩MSK1、MSK2及金屬導線MT之外的第一部份124、位在遮罩MSK1、MSK2下的第二部份122、以及位在金屬導線MT下並接觸金屬導線MT的第三部份126。 At this time, the conductive material layer 120 includes a first portion 124 exposed outside the masks MSK1, MSK2 and the metal wires MT, a second portion 122 under the masks MSK1, MSK2, and under the metal wires MT. And contacting the third portion 126 of the metal wire MT.
在本實施例中,金屬導線MT的細節可參照前述段落,故在此不贅述。 In the present embodiment, the details of the metal wire MT can be referred to the foregoing paragraphs, and thus will not be described herein.
接著,特別參照圖7A及圖7B,在一第四步驟中,絕緣化導電材料層120的第一部份124,以形成第一觸控電極E1、第二觸控電極E2、輔助導線AUX、以及絕緣區塊INS。 Next, referring to FIG. 7A and FIG. 7B, in a fourth step, the first portion 124 of the conductive material layer 120 is insulated to form a first touch electrode E1, a second touch electrode E2, an auxiliary lead AUX, And insulating block INS.
進一步來說,在第四步驟中,係分散導電材料層120中暴露 在遮罩MSK1、MSK2以及金屬導線MT之外的一第一部份124中的導電物質(如奈米銀線),並使此些導電物質進一步下沉及分散至基板110之中以形成絕緣區塊INS,並使導電材料層120中位於第一遮罩MSK1之下並接觸第一遮罩MSK1的第二部份122形成第一觸控電極E1、使導電材料層120中位於第二遮罩MSK2之下並接觸第二遮罩MSK2的第二部份122形成第二觸控電極E2,並使導電材料層120中位於金屬導線MT下並接觸金屬導線MT的第三部份126形成輔助導線AUX。 Further, in the fourth step, the dispersed conductive material layer 120 is exposed a conductive substance (such as a nano silver wire) in a first portion 124 other than the MSK1, MSK2 and the metal wires MT, and further sinking and dispersing the conductive materials into the substrate 110 to form an insulation The block INS, and the second portion 122 of the conductive material layer 120 under the first mask MSK1 and contacting the first mask MSK1 forms the first touch electrode E1, and the second layer of the conductive material layer 120 is located The second portion 122 under the cover MSK2 and contacting the second mask MSK2 forms the second touch electrode E2, and forms the third portion 126 of the conductive material layer 120 under the metal wire MT and contacting the metal wire MT to form an auxiliary. Wire AUX.
在本實施例中,分散導電材料層120中暴露在遮罩MSK1、MSK2以及金屬導線MT之外的一第一部份124中的導電物質的細節可參照前述段落,故在此不贅述。 In the present embodiment, the details of the conductive material in the first portion 124 of the dispersed conductive material layer 120 exposed to the masks MSK1, MSK2 and the metal wires MT can be referred to the foregoing paragraphs, and thus will not be described herein.
在一實施例中,絕緣區塊INS係形成於觸控電極E1、E2之間,以使觸控電極E1、E2彼此絕緣。在一實施例中,絕緣區塊INS亦形成於觸控電極E1、E2的周圍。在一實施例中,絕緣區塊INS係暴露於基板110的上表面SF1。 In one embodiment, the insulating block INS is formed between the touch electrodes E1 and E2 to insulate the touch electrodes E1 and E2 from each other. In an embodiment, the insulating block INS is also formed around the touch electrodes E1 and E2. In an embodiment, the insulating block INS is exposed to the upper surface SF1 of the substrate 110.
透過上述的製造方法,即可實現觸控模組100。於基板110中形成絕緣區塊INS,可使觸控電極E1、E2間彼此絕緣。如此一來,即可避免透過蝕刻方式圖案化觸控電極E1、E2,並避免造成觸控模組100的光折射率不均勻,而影響觸控模組100外觀的光學一致性。 The touch module 100 can be realized by the above manufacturing method. The insulating block INS is formed in the substrate 110 to insulate the touch electrodes E1 and E2 from each other. In this way, the touch electrodes E1 and E2 can be prevented from being patterned by etching, and the optical refractive index of the touch module 100 can be prevented from being uneven, thereby affecting the optical consistency of the appearance of the touch module 100.
換言之,藉由前述分散導電材料層120的導電物質以於基板110中形成絕緣區塊INS的方法,可使觸控電極E1、E2、輔助導線AUX與絕緣區塊INS在基板110的上表面SF1上的正投影之間大致不具間隙或大致不重疊。亦即,觸控電極E1、E2、輔助導線AUX與絕緣區塊INS在基板110的 上表面SF1上的正投影可形成一完整的平面。如此一來,即可避免因折射率不均,而影響觸控模組100外觀的光學一致性。 In other words, by the method of dispersing the conductive material of the conductive material layer 120 to form the insulating block INS in the substrate 110, the touch electrodes E1 and E2, the auxiliary conductive line AUX and the insulating block INS may be on the upper surface SF1 of the substrate 110. The upper orthographic projections have substantially no gaps or substantially no overlap. That is, the touch electrodes E1, E2, the auxiliary wire AUX and the insulating block INS are on the substrate 110. The orthographic projection on the upper surface SF1 can form a complete plane. In this way, the optical consistency of the appearance of the touch module 100 can be avoided due to the uneven refractive index.
在一實施例中,絕緣區塊INS在基板110的上表面SF1上的正投影位於觸控電極E1、E2在基板100的上表面SF1上的正投影之間。在一實施例中,絕緣區塊INS在基板110的上表面SF1上的正投影位於觸控電極E1、E2在基板100的上表面SF1上的正投影的周圍。 In an embodiment, the orthographic projection of the insulating block INS on the upper surface SF1 of the substrate 110 is between the orthographic projections of the touch electrodes E1, E2 on the upper surface SF1 of the substrate 100. In an embodiment, the orthographic projection of the insulating block INS on the upper surface SF1 of the substrate 110 is located around the orthographic projection of the touch electrodes E1, E2 on the upper surface SF1 of the substrate 100.
在一實施例中,觸控電極E1、E2係沿著一第一方向交替排列。在一實施例中,觸控電極E1位於遮罩MSK1下,且觸控電極E2位於遮罩MSK2下。 In one embodiment, the touch electrodes E1, E2 are alternately arranged along a first direction. In one embodiment, the touch electrode E1 is located under the mask MSK1, and the touch electrode E2 is located under the mask MSK2.
在一實施例中,觸控電極E1、E2皆為魚骨狀。亦即,每一觸控電極E1、E2皆包括一主幹以及複數與主幹電性連接的分枝。此些分枝設置於主幹的相對兩側。應注意到,上述實施例僅為例示,其它形狀的觸控電極E1、E2亦在本案範疇之中,故本案並不以此為限。 In an embodiment, the touch electrodes E1 and E2 are all fishbone. That is, each of the touch electrodes E1 and E2 includes a trunk and a plurality of branches electrically connected to the trunk. These branches are placed on opposite sides of the trunk. It should be noted that the above embodiments are merely illustrative, and the touch electrodes E1 and E2 of other shapes are also in the scope of the present case, and thus the present invention is not limited thereto.
在一實施例中,觸控電極E1、E2彼此物理上及電性上分離。 In an embodiment, the touch electrodes E1 and E2 are physically and electrically separated from each other.
在一實施例中,遮罩MSK1、MSK2係沿著一第一方向交替排列。在一實施例中,遮罩MSK1、MSK2皆為魚骨狀。 In an embodiment, the masks MSK1, MSK2 are alternately arranged along a first direction. In one embodiment, the masks MSK1, MSK2 are all fishbone shaped.
在一實施例中,遮罩MSK1、MSK2彼此分離。在一實施例中,遮罩MSK1、MSK2在基板100的上表面SF1上的正投影之間彼此不重疊。 In an embodiment, the masks MSK1, MSK2 are separated from one another. In an embodiment, the masks MSK1, MSK2 do not overlap each other between the orthographic projections on the upper surface SF1 of the substrate 100.
在一實施例中,遮罩MSK1、MSK2可在形成觸控電極E1、E2後選擇性移除,以進一步提升觸控模組100外觀的一致性,故本案不以上述實施例為限。 In an embodiment, the masks MSK1 and MSK2 are selectively removed after the touch electrodes E1 and E2 are formed to further improve the appearance of the touch module 100. Therefore, the present invention is not limited to the above embodiments.
在一實施例中,輔助導線AUX位於金屬導線MT之下。在一 實施例中,輔助導線AUX電性連接金屬導線MT,並分別電性連接觸控電極E1、E2。在一實施例中,輔助導線AUX可協助金屬導線MT傳遞觸控訊號。 In an embodiment, the auxiliary conductor AUX is located below the metal conductor MT. In a In the embodiment, the auxiliary wires AUX are electrically connected to the metal wires MT, and are electrically connected to the touch electrodes E1 and E2, respectively. In an embodiment, the auxiliary wire AUX can assist the metal wire MT to transmit the touch signal.
在一實施例中,輔助導線AUX、絕緣區塊INS、與觸控電極E1、E2具有相同的導電物質。 In an embodiment, the auxiliary wire AUX, the insulating block INS, and the touch electrodes E1, E2 have the same conductive material.
另一方面,在本實施例中,基板110亦可包括活化層(未繪示)以及底層(未繪示),相關細節在此不贅述。 On the other hand, in the embodiment, the substrate 110 may also include an active layer (not shown) and a bottom layer (not shown), and details are not described herein.
第三實施例 Third embodiment
以下將透過第三實施例,提供另一種觸控模組100的製造方法。此一製造方法與第二實施例中的製造方法大致相同,差異之處僅在於本實施例更提供透明導線TR。故在以下說明中,重覆的部份將不贅述。 Another method of manufacturing the touch module 100 will be provided below through the third embodiment. This manufacturing method is substantially the same as the manufacturing method in the second embodiment, except that the present embodiment further provides the transparent wiring TR. Therefore, in the following description, the repeated parts will not be described.
圖8A-11A為根據本案一實施例繪示的一種觸控模組100的製造方法的示意圖。圖8B-11B為圖8A-11A中的觸控模組100沿線段A-a方向所繪示的剖面圖。 8A-11A are schematic diagrams showing a method of fabricating a touch module 100 according to an embodiment of the present invention. 8B-11B are cross-sectional views of the touch module 100 of FIG. 8A-11A taken along line A-a.
首先,特別參照圖8A及圖8B,在一第一步驟中,提供導電材料層120於基板110的上表面SF1上。接著,在一第二步驟中,提供複數條透明導線TR於導電材料層120上。 First, referring specifically to FIGS. 8A and 8B, in a first step, a conductive material layer 120 is provided on the upper surface SF1 of the substrate 110. Next, in a second step, a plurality of transparent wires TR are provided on the conductive material layer 120.
在一實施例中,透明導線TR可用透明導電材料所形成。 In an embodiment, the transparent wire TR may be formed of a transparent conductive material.
在本實施例中,導電材料層120的細節可參照前述段落,故在此不贅述。 In the present embodiment, the details of the conductive material layer 120 can be referred to the foregoing paragraphs, and thus will not be described herein.
接著,特別參照圖9A及圖9B,在一第三步驟中,提供複數個第一遮罩MSK1與第二遮罩MSK2於導電材料層120與部分的透明導線TR上。 Next, referring to FIG. 9A and FIG. 9B, in a third step, a plurality of first masks MSK1 and second masks MSK2 are provided on the conductive material layer 120 and a portion of the transparent wires TR.
此時,導電材料層120包括暴露在遮罩MSK1、MSK2及透明導線TR之外的第一部份124、位在遮罩MSK1、MSK2下的第二部份122、以及位在透明導線TR下並接觸透明導線TR的第三部份126。 At this time, the conductive material layer 120 includes a first portion 124 exposed outside the masks MSK1, MSK2 and the transparent wires TR, a second portion 122 under the masks MSK1, MSK2, and under the transparent wires TR. And contacting the third portion 126 of the transparent wire TR.
在本實施例中,遮罩MSK1、MSK2的細節可參照前述段落,故在此不贅述。 In the present embodiment, the details of the masks MSK1 and MSK2 can be referred to the foregoing paragraphs, and thus will not be described herein.
接著,特別參照圖10A及圖10B,在一第四步驟中,絕緣化導電材料層120的第一部份124,以形成第一觸控電極E1、第二觸控電極E2、輔助導線AUX、以及絕緣區塊INS。 Then, referring to FIG. 10A and FIG. 10B, in a fourth step, the first portion 124 of the conductive material layer 120 is insulated to form a first touch electrode E1, a second touch electrode E2, an auxiliary lead AUX, And insulating block INS.
進一步來說,在第四步驟中,係分散導電材料層120中暴露在遮罩MSK1、MSK2以及透明導線TR之外的一第一部份124中的導電物質(如奈米銀線),並使此些導電物質進一步下沉及分散至基板110之中以形成絕緣區塊INS,並使導電材料層120中位於第一遮罩MSK1之下並接觸第一遮罩MSK1的第二部份122形成第一觸控電極E1、使導電材料層120中位於第二遮罩MSK2之下並接觸第二遮罩MSK2的第二部份122形成第二觸控電極E2,並使導電材料層120中位於透明導線TR下並接觸透明導線TR的第三部份126形成輔助導線AUX。 Further, in the fourth step, the conductive material (such as a nano silver wire) exposed in a first portion 124 of the conductive material layer 120 exposed to the masks MSK1, MSK2 and the transparent wire TR is dispersed. The conductive material is further sunk and dispersed into the substrate 110 to form the insulating block INS, and the conductive material layer 120 is located under the first mask MSK1 and contacts the second portion 122 of the first mask MSK1. Forming the first touch electrode E1, the second portion 122 of the conductive material layer 120 under the second mask MSK2 and contacting the second mask MSK2 forms the second touch electrode E2, and the conductive material layer 120 is The third portion 126 located under the transparent wire TR and contacting the transparent wire TR forms the auxiliary wire AUX.
在本實施例中,分散導電材料層120中暴露在遮罩MSK1、MSK2以及透明導線TR之外的一第一部份124中的導電物質的細節可參照前述段落,故在此不贅述。 In the present embodiment, details of the conductive material in the first portion 124 of the dispersed conductive material layer 120 exposed to the masks MSK1, MSK2 and the transparent conductive line TR can be referred to the foregoing paragraphs, and thus will not be described herein.
接著,特別參照圖11A及圖11B,在一第五步驟中,提供金屬導線MT於透明導線TR與遮罩MSK1、MSK2之上。 Next, referring specifically to FIGS. 11A and 11B, in a fifth step, a metal wire MT is provided over the transparent wire TR and the masks MSK1, MSK2.
在本實施例中,金屬導線MT的細節可參照前述段落,故在 此不贅述。 In this embodiment, the details of the metal wire MT can refer to the foregoing paragraph, so This will not go into details.
透過上述的製造方法,即可實現觸控模組100。於基板110中形成絕緣區塊INS,可使觸控電極E1、E2間彼此絕緣。如此一來,即可避免透過蝕刻方式圖案化觸控電極E1、E2,並避免造成觸控模組100的光折射率不均勻,而影響觸控模組100外觀的光學一致性。 The touch module 100 can be realized by the above manufacturing method. The insulating block INS is formed in the substrate 110 to insulate the touch electrodes E1 and E2 from each other. In this way, the touch electrodes E1 and E2 can be prevented from being patterned by etching, and the optical refractive index of the touch module 100 can be prevented from being uneven, thereby affecting the optical consistency of the appearance of the touch module 100.
換言之,藉由前述分散導電材料層120的導電物質以於基板110中形成絕緣區塊INS的方法,可使觸控電極E1、E2、輔助導線AUX與絕緣區塊INS在基板110的上表面SF1上的正投影之間大致不具間隙或大致不重疊。亦即,觸控電極E1、E2、輔助導線AUX與絕緣區塊INS在基板110的上表面SF1上的正投影可形成一完整的平面。如此一來,即可避免因折射率不均,而影響觸控模組100外觀的光學一致性。 In other words, by the method of dispersing the conductive material of the conductive material layer 120 to form the insulating block INS in the substrate 110, the touch electrodes E1 and E2, the auxiliary conductive line AUX and the insulating block INS may be on the upper surface SF1 of the substrate 110. The upper orthographic projections have substantially no gaps or substantially no overlap. That is, the positive projections of the touch electrodes E1, E2, the auxiliary wires AUX and the insulating blocks INS on the upper surface SF1 of the substrate 110 may form a complete plane. In this way, the optical consistency of the appearance of the touch module 100 can be avoided due to the uneven refractive index.
在一實施例中,絕緣區塊INS在基板110的上表面SF1上的正投影位於觸控電極E1、E2在基板100的上表面SF1上的正投影之間。在一實施例中,絕緣區塊INS在基板110的上表面SF1上的正投影位於觸控電極E1、E2在基板100的上表面SF1上的正投影的周圍。 In an embodiment, the orthographic projection of the insulating block INS on the upper surface SF1 of the substrate 110 is between the orthographic projections of the touch electrodes E1, E2 on the upper surface SF1 of the substrate 100. In an embodiment, the orthographic projection of the insulating block INS on the upper surface SF1 of the substrate 110 is located around the orthographic projection of the touch electrodes E1, E2 on the upper surface SF1 of the substrate 100.
在一實施例中,觸控電極E1、E2係沿著一第一方向交替排列。在一實施例中,觸控電極E1位於遮罩MSK1下,且觸控電極E2位於遮罩MSK2下。 In one embodiment, the touch electrodes E1, E2 are alternately arranged along a first direction. In one embodiment, the touch electrode E1 is located under the mask MSK1, and the touch electrode E2 is located under the mask MSK2.
在一實施例中,觸控電極E1、E2皆為魚骨狀。亦即,每一觸控電極E1、E2皆包括一主幹以及複數與主幹電性連接的分枝。此些分枝設置於主幹的相對兩側。應注意到,上述實施例僅為例示,其它形狀的觸控電極E1、E2亦在本案範疇之中,故本案並不以此為限。 In an embodiment, the touch electrodes E1 and E2 are all fishbone. That is, each of the touch electrodes E1 and E2 includes a trunk and a plurality of branches electrically connected to the trunk. These branches are placed on opposite sides of the trunk. It should be noted that the above embodiments are merely illustrative, and the touch electrodes E1 and E2 of other shapes are also in the scope of the present case, and thus the present invention is not limited thereto.
在一實施例中,觸控電極E1、E2彼此物理上及電性上分離。 In an embodiment, the touch electrodes E1 and E2 are physically and electrically separated from each other.
在一實施例中,遮罩MSK1、MSK2係沿著一第一方向交替排列。在一實施例中,遮罩MSK1、MSK2皆為魚骨狀。 In an embodiment, the masks MSK1, MSK2 are alternately arranged along a first direction. In one embodiment, the masks MSK1, MSK2 are all fishbone shaped.
在一實施例中,遮罩MSK1、MSK2彼此分離。在一實施例中,遮罩MSK1、MSK2在基板100的上表面SF1上的正投影之間彼此不重疊。 In an embodiment, the masks MSK1, MSK2 are separated from one another. In an embodiment, the masks MSK1, MSK2 do not overlap each other between the orthographic projections on the upper surface SF1 of the substrate 100.
在一實施例中,遮罩MSK1、MSK2可在形成觸控電極E1、E2後選擇性移除,以進一步提升觸控模組100外觀的一致性,故本案不以上述實施例為限。 In an embodiment, the masks MSK1 and MSK2 are selectively removed after the touch electrodes E1 and E2 are formed to further improve the appearance of the touch module 100. Therefore, the present invention is not limited to the above embodiments.
在一實施例中,輔助導線AUX位於透明導線TR之下。在一實施例中,輔助導線AUX電性連接透明導線TR與金屬導線MT,並分別電性連接觸控電極E1、E2。在一實施例中,輔助導線AUX可協助透明導線TR與金屬導線MT傳遞觸控訊號。 In an embodiment, the auxiliary conductor AUX is located below the transparent conductor TR. In one embodiment, the auxiliary wire AUX is electrically connected to the transparent wire TR and the metal wire MT, and electrically connected to the touch electrodes E1 and E2, respectively. In an embodiment, the auxiliary wire AUX can assist the transparent wire TR and the metal wire MT to transmit the touch signal.
在一實施例中,輔助導線AUX、絕緣區塊INS、與觸控電極E1、E2具有相同的導電物質。 In an embodiment, the auxiliary wire AUX, the insulating block INS, and the touch electrodes E1, E2 have the same conductive material.
在一實施例中,金屬導線MT可協助透明導線TR傳遞觸控訊號。 In an embodiment, the metal wire MT can assist the transparent wire TR to transmit the touch signal.
另一方面,在本實施例中,基板110亦可包括活化層(未繪示)以及底層(未繪示),相關細節在此不贅述。 On the other hand, in the embodiment, the substrate 110 may also include an active layer (not shown) and a bottom layer (not shown), and details are not described herein.
當注意到,形成金屬導線MT與形成第一觸控電極E1、第二觸控電極E2、輔助導線AUX、以及絕緣區塊INS的順序可依實際需求進行變換,而不以上述實施例中所述為限。 It is noted that the order of forming the metal wire MT and forming the first touch electrode E1, the second touch electrode E2, the auxiliary wire AUX, and the insulating block INS can be changed according to actual needs, instead of being in the above embodiment. Said to be limited.
舉例而言,參照圖12A以及12B,在前述對應圖9A以及9B的 第三步驟後(即是於形成遮罩MSK1、MSK2後),可在第四步驟中先提供金屬導線MT於透明導線TR與遮罩MSK1、MSK2之上,而後再於對應圖11A以及11B的第五步驟中絕緣化導電材料層120的第一部份124,以形成第一觸控電極E1、第二觸控電極E2、輔助導線AUX、以及絕緣區塊INS。 For example, referring to Figures 12A and 12B, in the foregoing corresponding Figures 9A and 9B After the third step (that is, after forming the masks MSK1, MSK2), the metal wires MT may be first provided on the transparent wires TR and the masks MSK1, MSK2 in the fourth step, and then in correspondence with FIGS. 11A and 11B. In the fifth step, the first portion 124 of the conductive material layer 120 is insulated to form a first touch electrode E1, a second touch electrode E2, an auxiliary wire AUX, and an insulating block INS.
應注意到,此些步驟的具體細節可參照前述段落,故在此不贅述。 It should be noted that the specific details of these steps can be referred to the foregoing paragraphs, and thus will not be described herein.
第四實施例 Fourth embodiment
以下將透過第四實施例,提供另一種觸控模組100的製造方法。此一製造方法與第一實施例中的製造方法大致相同,差異之處僅在於本實施例中的透明導線TR與遮罩MSK1、MSK2係用同一材料形成,且形成透明導線TR與形成遮罩MSK1、MSK2的步驟係整合在同一道製程中。故在以下說明中,重覆的部份將不贅述。 Another method of manufacturing the touch module 100 will be provided below through the fourth embodiment. This manufacturing method is substantially the same as the manufacturing method in the first embodiment, except that the transparent wire TR and the masks MSK1, MSK2 in the present embodiment are formed of the same material, and the transparent wire TR is formed and the mask is formed. The steps of MSK1 and MSK2 are integrated in the same process. Therefore, in the following description, the repeated parts will not be described.
圖13A-14A為根據本案一實施例繪示的一種觸控模組100的製造方法的示意圖。圖13B-14B為圖13A-14A中的觸控模組100沿線段A-a方向所繪示的剖面圖。 13A-14A are schematic diagrams showing a method of fabricating a touch module 100 according to an embodiment of the present invention. 13B-14B are cross-sectional views of the touch module 100 of FIG. 13A-14A taken along line A-a.
首先,特別參照圖13A及圖13B,在一第一步驟中,提供導電材料層120於基板110的上表面SF1上。接著,在一第二步驟中,提供複數條透明導線TR與遮罩MSK1、MSK2於導電材料層120上。 First, referring specifically to FIGS. 13A and 13B, in a first step, a conductive material layer 120 is provided on the upper surface SF1 of the substrate 110. Next, in a second step, a plurality of transparent wires TR and masks MSK1, MSK2 are provided on the conductive material layer 120.
在一實施例中,透明導線TR與遮罩MSK1、MSK2皆可用透明導電材料所形成。在一實施例中,透明導線TR與遮罩MSK1、MSK2係用同一材料所形成。藉此,即可將形成透明導線TR與形成遮罩MSK1、MSK2的步驟整合在同一道製程中。 In an embodiment, the transparent wire TR and the masks MSK1, MSK2 may be formed of a transparent conductive material. In one embodiment, the transparent wire TR and the masks MSK1, MSK2 are formed of the same material. Thereby, the steps of forming the transparent wiring TR and forming the masks MSK1, MSK2 can be integrated in the same process.
此時,導電材料層120包括暴露在遮罩MSK1、MSK2及透明導線TR之外的第一部份124、位在遮罩MSK1、MSK2下的第二部份122、以及位在透明導線TR下並接觸透明導線TR的第三部份126。 At this time, the conductive material layer 120 includes a first portion 124 exposed outside the masks MSK1, MSK2 and the transparent wires TR, a second portion 122 under the masks MSK1, MSK2, and under the transparent wires TR. And contacting the third portion 126 of the transparent wire TR.
接著,特別參照圖14A及圖14B,在一第三步驟中,絕緣化導電材料層120的第一部份124,以形成第一觸控電極E1、第二觸控電極E2、輔助導線AUX、以及絕緣區塊INS。 Next, referring to FIG. 14A and FIG. 14B, in a third step, the first portion 124 of the conductive material layer 120 is insulated to form a first touch electrode E1, a second touch electrode E2, an auxiliary lead AUX, And insulating block INS.
進一步來說,在第三步驟中,係分散導電材料層120中暴露在遮罩MSK1、MSK2以及透明導線TR之外的一第一部份124中的導電物質(如奈米銀線),並使此些導電物質進一步下沉及分散至基板110之中以形成絕緣區塊INS,並使導電材料層120中位於第一遮罩MSK1之下並接觸第一遮罩MSK1的第二部份122形成第一觸控電極E1、使導電材料層120中位於第一遮罩MSK2之下並接觸第二遮罩MSK2的第二部份122形成第二觸控電極E2,並使導電材料層120中位於透明導線TR下並接觸透明導線TR的第三部份126形成輔助導線AUX。 Further, in the third step, the conductive material (such as a nano silver wire) exposed in a first portion 124 of the conductive material layer 120 exposed to the masks MSK1, MSK2 and the transparent wire TR is dispersed. The conductive material is further sunk and dispersed into the substrate 110 to form the insulating block INS, and the conductive material layer 120 is located under the first mask MSK1 and contacts the second portion 122 of the first mask MSK1. The first touch electrode E1 is formed, and the second portion 122 of the conductive material layer 120 under the first mask MSK2 and contacting the second mask MSK2 forms the second touch electrode E2 and is disposed in the conductive material layer 120. The third portion 126 located under the transparent wire TR and contacting the transparent wire TR forms the auxiliary wire AUX.
在本實施例中,分散導電材料層120中暴露在遮罩MSK1、MSK2以及透明導線TR之外的一第一部份124中的導電物質的細節可參照前述段落,故在此不贅述。 In the present embodiment, details of the conductive material in the first portion 124 of the dispersed conductive material layer 120 exposed to the masks MSK1, MSK2 and the transparent conductive line TR can be referred to the foregoing paragraphs, and thus will not be described herein.
透過上述的製造方法,即可實現觸控模組100。於基板110中形成絕緣區塊INS,可使觸控電極E1、E2間彼此絕緣。如此一來,即可避免透過蝕刻方式圖案化觸控電極E1、E2,並避免造成觸控模組100的光折射率不均勻,而影響觸控模組100外觀的光學一致性。 The touch module 100 can be realized by the above manufacturing method. The insulating block INS is formed in the substrate 110 to insulate the touch electrodes E1 and E2 from each other. In this way, the touch electrodes E1 and E2 can be prevented from being patterned by etching, and the optical refractive index of the touch module 100 can be prevented from being uneven, thereby affecting the optical consistency of the appearance of the touch module 100.
換言之,藉由前述分散導電材料層120的導電物質以於基板 110中形成絕緣區塊INS的方法,可使觸控電極E1、E2、輔助導線AUX與絕緣區塊INS在基板110的上表面SF1上的正投影之間大致不具間隙或大致不重疊。亦即,觸控電極E1、E2、輔助導線AUX與絕緣區塊INS在基板110的上表面SF1上的正投影可形成一完整的平面。如此一來,即可避免因折射率不均,而影響觸控模組100外觀的光學一致性。 In other words, the conductive material of the conductive material layer 120 is dispersed on the substrate The method of forming the insulating block INS in 110 can make the touch electrodes E1, E2, the auxiliary wires AUX and the insulating block INS have substantially no gap or substantially no overlap between the orthographic projections on the upper surface SF1 of the substrate 110. That is, the positive projections of the touch electrodes E1, E2, the auxiliary wires AUX and the insulating blocks INS on the upper surface SF1 of the substrate 110 may form a complete plane. In this way, the optical consistency of the appearance of the touch module 100 can be avoided due to the uneven refractive index.
在一實施例中,絕緣區塊INS在基板110的上表面SF1上的正投影位於觸控電極E1、E2在基板100的上表面SF1上的正投影之間。在一實施例中,絕緣區塊INS在基板110的上表面SF1上的正投影位於觸控電極E1、E2在基板100的上表面SF1上的正投影的周圍。 In an embodiment, the orthographic projection of the insulating block INS on the upper surface SF1 of the substrate 110 is between the orthographic projections of the touch electrodes E1, E2 on the upper surface SF1 of the substrate 100. In an embodiment, the orthographic projection of the insulating block INS on the upper surface SF1 of the substrate 110 is located around the orthographic projection of the touch electrodes E1, E2 on the upper surface SF1 of the substrate 100.
在一實施例中,觸控電極E1、E2係沿著一第一方向交替排列。在一實施例中,觸控電極E1位於遮罩MSK1下,且觸控電極E2位於遮罩MSK2下。 In one embodiment, the touch electrodes E1, E2 are alternately arranged along a first direction. In one embodiment, the touch electrode E1 is located under the mask MSK1, and the touch electrode E2 is located under the mask MSK2.
在一實施例中,觸控電極E1、E2皆為魚骨狀。亦即,每一觸控電極E1、E2皆包括一主幹以及複數與主幹電性連接的分枝。此些分枝設置於主幹的相對兩側。應注意到,上述實施例僅為例示,其它形狀的觸控電極E1、E2亦在本案範疇之中,故本案並不以此為限。 In an embodiment, the touch electrodes E1 and E2 are all fishbone. That is, each of the touch electrodes E1 and E2 includes a trunk and a plurality of branches electrically connected to the trunk. These branches are placed on opposite sides of the trunk. It should be noted that the above embodiments are merely illustrative, and the touch electrodes E1 and E2 of other shapes are also in the scope of the present case, and thus the present invention is not limited thereto.
在一實施例中,觸控電極E1、E2彼此物理上及電性上分離。 In an embodiment, the touch electrodes E1 and E2 are physically and electrically separated from each other.
在一實施例中,遮罩MSK1、MSK2係沿著一第一方向交替排列。在一實施例中,遮罩MSK1、MSK2皆為魚骨狀。 In an embodiment, the masks MSK1, MSK2 are alternately arranged along a first direction. In one embodiment, the masks MSK1, MSK2 are all fishbone shaped.
在一實施例中,遮罩MSK1、MSK2彼此分離。在一實施例中,遮罩MSK1、MSK2在基板100的上表面SF1上的正投影之間彼此不重疊。 In an embodiment, the masks MSK1, MSK2 are separated from one another. In an embodiment, the masks MSK1, MSK2 do not overlap each other between the orthographic projections on the upper surface SF1 of the substrate 100.
在一實施例中,遮罩MSK1、MSK2可在形成觸控電極E1、 E2後選擇性移除,以進一步提升觸控模組100外觀的一致性,故本案不以上述實施例為限。 In an embodiment, the masks MSK1, MSK2 can form the touch electrode E1. The E2 is selectively removed to further improve the appearance of the touch module 100. Therefore, the present invention is not limited to the above embodiment.
在一實施例中,輔助導線AUX位於透明導線TR之下。在一實施例中,輔助導線AUX電性連接透明導線TR,並分別電性連接觸控電極E1、E2。在一實施例中,輔助導線AUX可協助透明導線TR傳遞觸控訊號。 In an embodiment, the auxiliary conductor AUX is located below the transparent conductor TR. In an embodiment, the auxiliary wires AUX are electrically connected to the transparent wires TR, and are electrically connected to the touch electrodes E1 and E2, respectively. In an embodiment, the auxiliary wire AUX can assist the transparent wire TR to transmit the touch signal.
在一實施例中,輔助導線AUX、絕緣區塊INS、與觸控電極E1、E2具有相同的導電物質。 In an embodiment, the auxiliary wire AUX, the insulating block INS, and the touch electrodes E1, E2 have the same conductive material.
另一方面,在本實施例中,基板110亦可包括活化層(未繪示)以及底層(未繪示),相關細節在此不贅述。 On the other hand, in the embodiment, the substrate 110 may also include an active layer (not shown) and a bottom layer (not shown), and details are not described herein.
當注意到,在一些變化的實施例中,亦可提供金屬導線MT於透明導線TR上,以協助透明導線TR傳遞觸控訊號。 It is noted that in some variant embodiments, a metal wire MT may be provided on the transparent wire TR to assist the transparent wire TR to transmit the touch signal.
舉例而言,特別參照圖15A-16A以及15B-16B,在前述的第二步驟後(即是於形成遮罩MSK1、MSK2與透明導線TR後),可在對應圖13A以及13B的第三步驟之後先提供金屬導線MT於透明導線TR之上(如圖15A、15B所示),而後再於第四步驟中絕緣化導電材料層120的第一部份124,以形成第一觸控電極E1、第二觸控電極E2、輔助導線AUX、以及絕緣區塊INS(如圖16A、16B所示)。 For example, referring specifically to FIGS. 15A-16A and 15B-16B, after the second step described above (ie, after forming the masks MSK1, MSK2 and the transparent wires TR), the third step corresponding to FIGS. 13A and 13B may be performed. Then, the metal wire MT is first provided on the transparent wire TR (as shown in FIGS. 15A and 15B), and then the first portion 124 of the conductive material layer 120 is insulated in the fourth step to form the first touch electrode E1. The second touch electrode E2, the auxiliary wire AUX, and the insulating block INS (as shown in FIGS. 16A and 16B).
應注意到,此些步驟的具體細節可參照前述段落,故在此不贅述。 It should be noted that the specific details of these steps can be referred to the foregoing paragraphs, and thus will not be described herein.
第五實施例 Fifth embodiment
以下將透過第五實施例,提供另一種觸控模組100的製造方法。此一製造方法與第三實施例中的製造方法大致相同,差異之處僅在於 本實施例提供接觸墊PD,而非透明導線TR。故在以下說明中,重覆的部份將不贅述。 A method of manufacturing another touch module 100 will be provided below through the fifth embodiment. This manufacturing method is substantially the same as the manufacturing method in the third embodiment, and the only difference is that This embodiment provides a contact pad PD instead of a transparent wire TR. Therefore, in the following description, the repeated parts will not be described.
圖17A-20A為根據本案一實施例繪示的一種觸控模組100的製造方法的示意圖。圖17B-20B為圖17A-20A中的觸控模組100沿線段A-a方向所繪示的剖面圖。 17A-20A are schematic diagrams showing a method of fabricating a touch module 100 according to an embodiment of the present invention. 17B-20B are cross-sectional views of the touch module 100 of FIGS. 17A-20A taken along line A-a.
首先,特別參照圖17A及圖17B,在一第一步驟中,提供導電材料層120於基板110的上表面SF1上。接著,在一第二步驟中,提供複數個接觸墊PD於導電材料層120上。 First, referring specifically to FIGS. 17A and 17B, in a first step, a conductive material layer 120 is provided on the upper surface SF1 of the substrate 110. Next, in a second step, a plurality of contact pads PD are provided on the conductive material layer 120.
在一實施例中,接觸墊PD可用透明導電材料所形成。 In an embodiment, the contact pads PD may be formed of a transparent conductive material.
在本實施例中,導電材料層120的細節可參照前述段落,故在此不贅述。 In the present embodiment, the details of the conductive material layer 120 can be referred to the foregoing paragraphs, and thus will not be described herein.
接著,特別參照圖18A及圖18B,在一第三步驟中,提供複數個第一遮罩MSK1與第二遮罩MSK2於導電材料層120與部分的接觸墊PD上。 Next, with particular reference to FIGS. 18A and 18B, in a third step, a plurality of first masks MSK1 and second masks MSK2 are provided on the conductive material layer 120 and a portion of the contact pads PD.
此時,導電材料層120包括暴露在遮罩MSK1、MSK2及接觸墊PD之外的第一部份124、位在遮罩MSK1、MSK2下的第二部份122、以及位在接觸墊PD下並接觸接觸墊PD的第三部份126。 At this time, the conductive material layer 120 includes a first portion 124 exposed outside the masks MSK1, MSK2 and the contact pads PD, a second portion 122 under the masks MSK1, MSK2, and under the contact pads PD. And contacting the third portion 126 of the contact pad PD.
在本實施例中,遮罩MSK1、MSK2的細節可參照前述段落,故在此不贅述。 In the present embodiment, the details of the masks MSK1 and MSK2 can be referred to the foregoing paragraphs, and thus will not be described herein.
接著,特別參照圖19A及圖19B,在一第四步驟中,絕緣化導電材料層120的第一部份124,以形成第一觸控電極E1、第二觸控電極E2、輔助導線AUX、以及絕緣區塊INS。 Next, referring to FIG. 19A and FIG. 19B, in a fourth step, the first portion 124 of the conductive material layer 120 is insulated to form a first touch electrode E1, a second touch electrode E2, an auxiliary lead AUX, And insulating block INS.
進一步來說,在第四步驟中,係分散導電材料層120中暴露在遮罩MSK1、MSK2以及接觸墊PD之外的一第一部份124中的導電物質(如奈米銀線),並使此些導電物質進一步下沉及分散至基板110之中以形成絕緣區塊INS,並使導電材料層120中位於第一遮罩MSK1之下並接觸第一遮罩MSK1的第二部份122形成第一觸控電極E1、使導電材料層120中位於第二遮罩MSK2之下並接觸第二遮罩MSK2的第二部份122形成第二觸控電極E2,並使導電材料層120中位於接觸墊PD下並接觸接觸墊PD的第三部份126形成輔助導線AUX。 Further, in the fourth step, the conductive material (such as a nano silver wire) exposed in a first portion 124 of the conductive material layer 120 exposed to the masks MSK1, MSK2 and the contact pads PD is dispersed, and The conductive material is further sunk and dispersed into the substrate 110 to form the insulating block INS, and the conductive material layer 120 is located under the first mask MSK1 and contacts the second portion 122 of the first mask MSK1. Forming the first touch electrode E1, the second portion 122 of the conductive material layer 120 under the second mask MSK2 and contacting the second mask MSK2 forms the second touch electrode E2, and the conductive material layer 120 is The third portion 126 located under the contact pad PD and contacting the contact pad PD forms the auxiliary lead AUX.
在本實施例中,分散導電材料層120中暴露在遮罩MSK1、MSK2以及接觸墊PD之外的一第一部份124中的導電物質的細節可參照前述段落,故在此不贅述。 In the present embodiment, the details of the conductive material in the first portion 124 of the dispersed conductive material layer 120 exposed to the masks MSK1, MSK2 and the contact pads PD can be referred to the foregoing paragraphs, and thus will not be described herein.
接著,特別參照圖20A及圖20B,在一第五步驟中,提供金屬導線MT於接觸墊PD與絕緣區塊INS之上。 Next, referring specifically to FIGS. 20A and 20B, in a fifth step, a metal wire MT is provided over the contact pad PD and the insulating block INS.
在本實施例中,金屬導線MT的細節可參照前述段落,故在此不贅述。 In the present embodiment, the details of the metal wire MT can be referred to the foregoing paragraphs, and thus will not be described herein.
透過上述的製造方法,即可實現觸控模組100。於基板110中形成絕緣區塊INS,可使觸控電極E1、E2間彼此絕緣。如此一來,即可避免透過蝕刻方式圖案化觸控電極E1、E2,並避免造成觸控模組100的光折射率不均勻,而影響觸控模組100外觀的光學一致性。 The touch module 100 can be realized by the above manufacturing method. The insulating block INS is formed in the substrate 110 to insulate the touch electrodes E1 and E2 from each other. In this way, the touch electrodes E1 and E2 can be prevented from being patterned by etching, and the optical refractive index of the touch module 100 can be prevented from being uneven, thereby affecting the optical consistency of the appearance of the touch module 100.
換言之,藉由前述分散導電材料層120的導電物質以於基板110中形成絕緣區塊INS的方法,可使觸控電極E1、E2、輔助導線AUX與絕緣區塊INS在基板110的上表面SF1上的正投影之間大致不具間隙或大致不 重疊。亦即,觸控電極E1、E2、輔助導線AUX與絕緣區塊INS在基板110的上表面SF1上的正投影可形成一完整的平面。如此一來,即可避免因折射率不均,而影響觸控模組100外觀的光學一致性。 In other words, by the method of dispersing the conductive material of the conductive material layer 120 to form the insulating block INS in the substrate 110, the touch electrodes E1 and E2, the auxiliary conductive line AUX and the insulating block INS may be on the upper surface SF1 of the substrate 110. There is no gap or roughly between the orthographic projections on the top overlapping. That is, the positive projections of the touch electrodes E1, E2, the auxiliary wires AUX and the insulating blocks INS on the upper surface SF1 of the substrate 110 may form a complete plane. In this way, the optical consistency of the appearance of the touch module 100 can be avoided due to the uneven refractive index.
此外,透過上述的製造方法,可避免金屬導線MT因接觸基板110中的導電物質而造成短路。 Further, by the above-described manufacturing method, it is possible to prevent the metal wire MT from being short-circuited by contacting the conductive material in the substrate 110.
在一實施例中,絕緣區塊INS在基板110的上表面SF1上的正投影位於觸控電極E1、E2在基板100的上表面SF1上的正投影之間。在一實施例中,絕緣區塊INS在基板110的上表面SF1上的正投影位於觸控電極E1、E2在基板100的上表面SF1上的正投影的周圍。 In an embodiment, the orthographic projection of the insulating block INS on the upper surface SF1 of the substrate 110 is between the orthographic projections of the touch electrodes E1, E2 on the upper surface SF1 of the substrate 100. In an embodiment, the orthographic projection of the insulating block INS on the upper surface SF1 of the substrate 110 is located around the orthographic projection of the touch electrodes E1, E2 on the upper surface SF1 of the substrate 100.
在一實施例中,觸控電極E1、E2係沿著一第一方向交替排列。在一實施例中,觸控電極E1位於遮罩MSK1下,且觸控電極E2位於遮罩MSK2下。 In one embodiment, the touch electrodes E1, E2 are alternately arranged along a first direction. In one embodiment, the touch electrode E1 is located under the mask MSK1, and the touch electrode E2 is located under the mask MSK2.
在一實施例中,觸控電極E1、E2皆為魚骨狀。亦即,每一觸控電極E1、E2皆包括一主幹以及複數與主幹電性連接的分枝。此些分枝設置於主幹的相對兩側。應注意到,上述實施例僅為例示,其它形狀的觸控電極E1、E2亦在本案範疇之中,故本案並不以此為限。 In an embodiment, the touch electrodes E1 and E2 are all fishbone. That is, each of the touch electrodes E1 and E2 includes a trunk and a plurality of branches electrically connected to the trunk. These branches are placed on opposite sides of the trunk. It should be noted that the above embodiments are merely illustrative, and the touch electrodes E1 and E2 of other shapes are also in the scope of the present case, and thus the present invention is not limited thereto.
在一實施例中,觸控電極E1、E2彼此物理上及電性上分離。 In an embodiment, the touch electrodes E1 and E2 are physically and electrically separated from each other.
在一實施例中,遮罩MSK1、MSK2係沿著一第一方向交替排列。在一實施例中,遮罩MSK1、MSK2皆為魚骨狀。 In an embodiment, the masks MSK1, MSK2 are alternately arranged along a first direction. In one embodiment, the masks MSK1, MSK2 are all fishbone shaped.
在一實施例中,遮罩MSK1、MSK2彼此分離。在一實施例中,遮罩MSK1、MSK2在基板100的上表面SF1上的正投影之間彼此不重疊。 In an embodiment, the masks MSK1, MSK2 are separated from one another. In an embodiment, the masks MSK1, MSK2 do not overlap each other between the orthographic projections on the upper surface SF1 of the substrate 100.
在一實施例中,遮罩MSK1、MSK2可在形成觸控電極E1、 E2後選擇性移除,以進一步提升觸控模組100外觀的一致性,故本案不以上述實施例為限。 In an embodiment, the masks MSK1, MSK2 can form the touch electrode E1. The E2 is selectively removed to further improve the appearance of the touch module 100. Therefore, the present invention is not limited to the above embodiment.
在一實施例中,輔助導線AUX位於接觸墊PD之下。在一實施例中,輔助導線AUX電性連接接觸墊PD與金屬導線MT,並分別電性連接觸控電極E1、E2。在一實施例中,輔助導線AUX可協助觸控電極E1、E2與金屬導線MT傳遞觸控訊號。 In an embodiment, the auxiliary lead AUX is located below the contact pad PD. In an embodiment, the auxiliary wire AUX is electrically connected to the contact pad PD and the metal wire MT, and electrically connected to the touch electrodes E1 and E2, respectively. In an embodiment, the auxiliary wire AUX can assist the touch electrodes E1, E2 and the metal wire MT to transmit touch signals.
在一實施例中,輔助導線AUX、絕緣區塊INS、與觸控電極E1、E2具有相同的導電物質。 In an embodiment, the auxiliary wire AUX, the insulating block INS, and the touch electrodes E1, E2 have the same conductive material.
另一方面,在本實施例中,基板110亦可包括活化層(未繪示)以及底層(未繪示),相關細節在此不贅述。 On the other hand, in the embodiment, the substrate 110 may also include an active layer (not shown) and a bottom layer (not shown), and details are not described herein.
當注意到,形成金屬導線MT與形成第一觸控電極E1、第二觸控電極E2、輔助導線AUX、以及絕緣區塊INS的順序可依實際需求進行變換,而不以上述實施例中所述為限。 It is noted that the order of forming the metal wire MT and forming the first touch electrode E1, the second touch electrode E2, the auxiliary wire AUX, and the insulating block INS can be changed according to actual needs, instead of being in the above embodiment. Said to be limited.
舉例而言,參照圖21A以及21B,在前述對應圖18A以及18B的第三步驟後(即是於形成遮罩MSK1、MSK2後),可在第四步驟中先提供金屬導線MT於接觸墊PD之上,而後再於第五步驟中絕緣化導電材料層120的第一部份124,以形成第一觸控電極E1、第二觸控電極E2、輔助導線AUX、以及絕緣區塊INS。 For example, referring to FIGS. 21A and 21B, after the foregoing third step corresponding to FIGS. 18A and 18B (that is, after forming the masks MSK1, MSK2), the metal wire MT may be first provided in the contact pad PD in the fourth step. Then, the first portion 124 of the conductive material layer 120 is insulated in the fifth step to form the first touch electrode E1, the second touch electrode E2, the auxiliary conductive line AUX, and the insulating block INS.
應注意到,此些步驟的具體細節可參照前述段落,故在此不贅述。 It should be noted that the specific details of these steps can be referred to the foregoing paragraphs, and thus will not be described herein.
第六實施例 Sixth embodiment
以下將透過第六實施例,提供另一種觸控模組100的製造方 法。此一製造方法與第五實施例中的製造方法大致相同,差異之處僅在於本實施例中的形成接觸墊PD與形成遮罩MSK1、MSK2之順序不同。故在以下說明中,重覆的部份將不贅述。 The manufacturer of another touch module 100 will be provided through the sixth embodiment. law. This manufacturing method is substantially the same as the manufacturing method in the fifth embodiment, except that the order in which the contact pads PD are formed in this embodiment is different from the order in which the masks MSK1, MSK2 are formed. Therefore, in the following description, the repeated parts will not be described.
圖22A-25A為根據本案一實施例繪示的一種觸控模組100的製造方法的示意圖。圖22B-25B為圖22A-25A中的觸控模組100沿線段A-a方向所繪示的剖面圖。 22A-25A are schematic diagrams showing a method of fabricating a touch module 100 according to an embodiment of the present invention. 22B-25B are cross-sectional views of the touch module 100 of FIG. 22A-25A taken along line A-a.
首先,特別參照圖22A及圖22B,在一第一步驟中,提供導電材料層120於基板110的上表面SF1上。接著,在一第二步驟中,提供複數個第一遮罩MSK1與第二遮罩MSK2於導電材料層120上。 First, referring specifically to FIGS. 22A and 22B, in a first step, a conductive material layer 120 is provided on the upper surface SF1 of the substrate 110. Next, in a second step, a plurality of first masks MSK1 and second masks MSK2 are provided on the conductive material layer 120.
在本實施例中,導電材料層120的細節可參照前述段落,故在此不贅述。 In the present embodiment, the details of the conductive material layer 120 can be referred to the foregoing paragraphs, and thus will not be described herein.
在本實施例中,遮罩MSK1、MSK2的細節可參照前述段落,故在此不贅述。 In the present embodiment, the details of the masks MSK1 and MSK2 can be referred to the foregoing paragraphs, and thus will not be described herein.
接著,特別參照圖23A及圖23B,在一第三步驟中,提供複數個接觸墊PD於導電材料層120與遮罩MSK1、MSK2上。 Next, referring specifically to FIGS. 23A and 23B, in a third step, a plurality of contact pads PD are provided on the conductive material layer 120 and the masks MSK1, MSK2.
在本實施例中,接觸墊PD的細節可參照前述段落,故在此不贅述。 In the present embodiment, the details of the contact pad PD can be referred to the foregoing paragraphs, and thus will not be described herein.
此時,導電材料層120包括暴露在遮罩MSK1、MSK2及接觸墊PD之外的第一部份124、位在遮罩MSK1、MSK2下的第二部份122、以及位在接觸墊PD下並接觸接觸墊PD的第三部份126。 At this time, the conductive material layer 120 includes a first portion 124 exposed outside the masks MSK1, MSK2 and the contact pads PD, a second portion 122 under the masks MSK1, MSK2, and under the contact pads PD. And contacting the third portion 126 of the contact pad PD.
接著,特別參照圖24A及圖24B,在一第四步驟中,絕緣化導電材料層120的第一部份124,以形成第一觸控電極E1、第二觸控電極E2、 輔助導線AUX、以及絕緣區塊INS。 Next, referring to FIG. 24A and FIG. 24B, in a fourth step, the first portion 124 of the conductive material layer 120 is insulated to form a first touch electrode E1 and a second touch electrode E2. Auxiliary wire AUX, and insulating block INS.
進一步來說,在第四步驟中,係分散導電材料層120中暴露在遮罩MSK1、MSK2以及接觸墊PD之外的一第一部份124中的導電物質(如奈米銀線),並使此些導電物質進一步下沉及分散至基板110之中以形成絕緣區塊INS,並使導電材料層120中位於第一遮罩MSK1之下並接觸第一遮罩MSK1的第二部份122形成第一觸控電極E1、使導電材料層120中位於第二遮罩MSK2之下並接觸第一遮罩MSK1的第二部份122形成第二觸控電極E2,並使導電材料層120中位於接觸墊PD下並接觸接觸墊PD的第三部份126形成輔助導線AUX。 Further, in the fourth step, the conductive material (such as a nano silver wire) exposed in a first portion 124 of the conductive material layer 120 exposed to the masks MSK1, MSK2 and the contact pads PD is dispersed, and The conductive material is further sunk and dispersed into the substrate 110 to form the insulating block INS, and the conductive material layer 120 is located under the first mask MSK1 and contacts the second portion 122 of the first mask MSK1. Forming the first touch electrode E1, the second portion 122 of the conductive material layer 120 under the second mask MSK2 and contacting the first mask MSK1 forms the second touch electrode E2, and the conductive material layer 120 is The third portion 126 located under the contact pad PD and contacting the contact pad PD forms the auxiliary lead AUX.
在本實施例中,分散導電材料層120中暴露在遮罩MSK1、MSK2以及接觸墊PD之外的一第一部份124中的導電物質的細節可參照前述段落,故在此不贅述。 In the present embodiment, the details of the conductive material in the first portion 124 of the dispersed conductive material layer 120 exposed to the masks MSK1, MSK2 and the contact pads PD can be referred to the foregoing paragraphs, and thus will not be described herein.
接著,特別參照圖25A及圖25B,在一第五步驟中,提供金屬導線MT於接觸墊PD與絕緣區塊INS之上。 Next, referring specifically to FIGS. 25A and 25B, in a fifth step, a metal wire MT is provided over the contact pad PD and the insulating block INS.
在本實施例中,金屬導線MT的細節可參照前述段落,故在此不贅述。 In the present embodiment, the details of the metal wire MT can be referred to the foregoing paragraphs, and thus will not be described herein.
透過上述的製造方法,即可實現觸控模組100。於基板110中形成絕緣區塊INS,可使觸控電極E1、E2間彼此絕緣。如此一來,即可避免透過蝕刻方式圖案化觸控電極E1、E2,並避免造成觸控模組100的光折射率不均勻,而影響觸控模組100外觀的光學一致性。 The touch module 100 can be realized by the above manufacturing method. The insulating block INS is formed in the substrate 110 to insulate the touch electrodes E1 and E2 from each other. In this way, the touch electrodes E1 and E2 can be prevented from being patterned by etching, and the optical refractive index of the touch module 100 can be prevented from being uneven, thereby affecting the optical consistency of the appearance of the touch module 100.
換言之,藉由前述分散導電材料層120的導電物質以於基板110中形成絕緣區塊INS的方法,可使觸控電極E1、E2、輔助導線AUX與絕 緣區塊INS在基板110的上表面SF1上的正投影之間大致不具間隙或大致不重疊。亦即,觸控電極E1、E2、輔助導線AUX與絕緣區塊INS在基板110的上表面SF1上的正投影可形成一完整的平面。如此一來,即可避免因折射率不均,而影響觸控模組100外觀的光學一致性。 In other words, by the method of dispersing the conductive material of the conductive material layer 120 to form the insulating block INS in the substrate 110, the touch electrodes E1, E2, the auxiliary wires AUX and the The edge blocks INS have substantially no or substantially no overlap between the orthographic projections on the upper surface SF1 of the substrate 110. That is, the positive projections of the touch electrodes E1, E2, the auxiliary wires AUX and the insulating blocks INS on the upper surface SF1 of the substrate 110 may form a complete plane. In this way, the optical consistency of the appearance of the touch module 100 can be avoided due to the uneven refractive index.
此外,透過上述的製造方法,可避免金屬導線MT因接觸基板110中的導電物質而造成短路。 Further, by the above-described manufacturing method, it is possible to prevent the metal wire MT from being short-circuited by contacting the conductive material in the substrate 110.
在一實施例中,絕緣區塊INS在基板110的上表面SF1上的正投影位於觸控電極E1、E2在基板100的上表面SF1上的正投影之間。在一實施例中,絕緣區塊INS在基板110的上表面SF1上的正投影位於觸控電極E1、E2在基板100的上表面SF1上的正投影的周圍。 In an embodiment, the orthographic projection of the insulating block INS on the upper surface SF1 of the substrate 110 is between the orthographic projections of the touch electrodes E1, E2 on the upper surface SF1 of the substrate 100. In an embodiment, the orthographic projection of the insulating block INS on the upper surface SF1 of the substrate 110 is located around the orthographic projection of the touch electrodes E1, E2 on the upper surface SF1 of the substrate 100.
在一實施例中,觸控電極E1、E2係沿著一第一方向交替排列。在一實施例中,觸控電極E1位於遮罩MSK1下,且觸控電極E2位於遮罩MSK2下。 In one embodiment, the touch electrodes E1, E2 are alternately arranged along a first direction. In one embodiment, the touch electrode E1 is located under the mask MSK1, and the touch electrode E2 is located under the mask MSK2.
在一實施例中,觸控電極E1、E2皆為魚骨狀。亦即,每一觸控電極E1、E2皆包括一主幹以及複數與主幹電性連接的分枝。此些分枝設置於主幹的相對兩側。應注意到,上述實施例僅為例示,其它形狀的觸控電極E1、E2亦在本案範疇之中,故本案並不以此為限。 In an embodiment, the touch electrodes E1 and E2 are all fishbone. That is, each of the touch electrodes E1 and E2 includes a trunk and a plurality of branches electrically connected to the trunk. These branches are placed on opposite sides of the trunk. It should be noted that the above embodiments are merely illustrative, and the touch electrodes E1 and E2 of other shapes are also in the scope of the present case, and thus the present invention is not limited thereto.
在一實施例中,觸控電極E1、E2彼此物理上及電性上分離。 In an embodiment, the touch electrodes E1 and E2 are physically and electrically separated from each other.
在一實施例中,遮罩MSK1、MSK2係沿著一第一方向交替排列。在一實施例中,遮罩MSK1、MSK2皆為魚骨狀。 In an embodiment, the masks MSK1, MSK2 are alternately arranged along a first direction. In one embodiment, the masks MSK1, MSK2 are all fishbone shaped.
在一實施例中,遮罩MSK1、MSK2彼此分離。在一實施例中,遮罩MSK1、MSK2在基板100的上表面SF1上的正投影之間彼此不重疊。 In an embodiment, the masks MSK1, MSK2 are separated from one another. In an embodiment, the masks MSK1, MSK2 do not overlap each other between the orthographic projections on the upper surface SF1 of the substrate 100.
在一實施例中,遮罩MSK1、MSK2可在形成觸控電極E1、E2後選擇性移除,以進一步提升觸控模組100外觀的一致性,故本案不以上述實施例為限。 In an embodiment, the masks MSK1 and MSK2 are selectively removed after the touch electrodes E1 and E2 are formed to further improve the appearance of the touch module 100. Therefore, the present invention is not limited to the above embodiments.
在一實施例中,輔助導線AUX位於接觸墊PD之下。在一實施例中,輔助導線AUX電性連接接觸墊PD與金屬導線MT,並分別電性連接觸控電極E1、E2。在一實施例中,輔助導線AUX可協助觸控電極E1、E2與金屬導線MT傳遞觸控訊號。 In an embodiment, the auxiliary lead AUX is located below the contact pad PD. In an embodiment, the auxiliary wire AUX is electrically connected to the contact pad PD and the metal wire MT, and electrically connected to the touch electrodes E1 and E2, respectively. In an embodiment, the auxiliary wire AUX can assist the touch electrodes E1, E2 and the metal wire MT to transmit touch signals.
在一實施例中,輔助導線AUX、絕緣區塊INS、與觸控電極E1、E2具有相同的導電物質。 In an embodiment, the auxiliary wire AUX, the insulating block INS, and the touch electrodes E1, E2 have the same conductive material.
另一方面,在本實施例中,基板110亦可包括活化層(未繪示)以及底層(未繪示),相關細節在此不贅述。 On the other hand, in the embodiment, the substrate 110 may also include an active layer (not shown) and a bottom layer (not shown), and details are not described herein.
當注意到,形成金屬導線MT與形成第一觸控電極E1、第二觸控電極E2、輔助導線AUX、以及絕緣區塊INS的順序可依實際需求進行變換,而不以上述實施例中所述為限。 It is noted that the order of forming the metal wire MT and forming the first touch electrode E1, the second touch electrode E2, the auxiliary wire AUX, and the insulating block INS can be changed according to actual needs, instead of being in the above embodiment. Said to be limited.
舉例而言,參照圖26A以及26B,在前述圖23A以及23B對應的第三步驟後(即是於形成接觸墊PD後),可在第四步驟中先提供金屬導線MT於接觸墊PD之上,而後再於第五步驟中絕緣化導電材料層120的第一部份124,以形成第一觸控電極E1、第二觸控電極E2、輔助導線AUX、以及絕緣區塊INS。 For example, referring to FIGS. 26A and 26B, after the third step corresponding to the foregoing FIGS. 23A and 23B (that is, after forming the contact pad PD), the metal wire MT may be first provided on the contact pad PD in the fourth step. Then, the first portion 124 of the conductive material layer 120 is insulated in the fifth step to form the first touch electrode E1, the second touch electrode E2, the auxiliary conductive line AUX, and the insulating block INS.
應注意到,此些步驟的具體細節可參照前述段落,故在此不贅述。 It should be noted that the specific details of these steps can be referred to the foregoing paragraphs, and thus will not be described herein.
圖27為根據本案一實施例繪示的一種觸控模組的製造方法 200的流程圖。製造方法200可用以製作上述第一實施例至第六實施例中的觸控模組100,然不以此為限。在以下段落,將用第一實施例中的觸控模組100為例進行製造方法200的說明,然本案不以此為限。製造方法200包括以下步驟。 FIG. 27 is a diagram of a method for manufacturing a touch module according to an embodiment of the present disclosure Flow chart of 200. The manufacturing method 200 can be used to fabricate the touch module 100 in the first embodiment to the sixth embodiment, but not limited thereto. In the following paragraphs, the description of the manufacturing method 200 is performed by using the touch module 100 in the first embodiment as an example. However, the present invention is not limited thereto. Manufacturing method 200 includes the following steps.
在步驟S1中,提供基板110。 In step S1, a substrate 110 is provided.
在步驟S2中,形成至少一第一觸控電極E1以及至少一第一觸控電極E2於一基板110上,並同步嵌入形成一絕緣區塊INS於基板110中,其中絕緣區塊INS位於第一觸控電極E以及第二觸控電極E2之間,且第一觸控電極E1電性絕緣於第二觸控電極E2。 In step S2, at least one first touch electrode E1 and at least one first touch electrode E2 are formed on a substrate 110, and are simultaneously embedded to form an insulating block INS in the substrate 110, wherein the insulating block INS is located at A touch electrode E and a second touch electrode E2 are electrically insulated from the second touch electrode E2.
透過上述的製造方法,即可實現觸控模組100。於基板110中形成絕緣區塊INS,可使觸控電極E1、E2間彼此絕緣。如此一來,即可避免透過蝕刻方式圖案化觸控電極E1、E2,並避免造成觸控模組100的光折射率不均勻,而影響觸控模組100外觀的光學一致性。 The touch module 100 can be realized by the above manufacturing method. The insulating block INS is formed in the substrate 110 to insulate the touch electrodes E1 and E2 from each other. In this way, the touch electrodes E1 and E2 can be prevented from being patterned by etching, and the optical refractive index of the touch module 100 can be prevented from being uneven, thereby affecting the optical consistency of the appearance of the touch module 100.
綜上所述,本案的一實施例揭露一種觸控模組。觸控模組包括一基板、至少一第一觸控電極、至少一第二觸控電極、以及絕緣區塊。第一觸控電極形成於基板上。第二觸控電極形成於基板上,平行於第一觸控電極。絕緣區塊嵌入形成於基板中,並位於第一觸控電極以及第二觸控電極之間。第一觸控電極電性絕緣於第二觸控電極。 In summary, an embodiment of the present disclosure discloses a touch module. The touch module includes a substrate, at least one first touch electrode, at least one second touch electrode, and an insulating block. The first touch electrode is formed on the substrate. The second touch electrode is formed on the substrate and is parallel to the first touch electrode. The insulating block is embedded in the substrate and located between the first touch electrode and the second touch electrode. The first touch electrode is electrically insulated from the second touch electrode.
本案的另一實施例揭露一種觸控模組的製造方法。製造方法包括:形成至少一第一觸控電極以及至少一第一觸控電極於一基板上,並嵌入形成一絕緣區塊於該基板中,其中絕緣區塊位於第一觸控電極以及第二觸控電極之間,且第一觸控電極電性絕緣於第二觸控電極。 Another embodiment of the present disclosure discloses a method of manufacturing a touch module. The manufacturing method includes: forming at least one first touch electrode and at least one first touch electrode on a substrate, and embedding an insulating block in the substrate, wherein the insulating block is located at the first touch electrode and the second The first touch electrodes are electrically insulated from the second touch electrodes.
透過應用上述的實施例,即可避免透過蝕刻方式圖案化觸控電極,並避免造成觸控模組的光折射率不均勻,而影響觸控模組外觀的光學一致性。 By applying the above embodiments, the touch electrodes can be patterned by etching, and the optical refractive index of the touch module is not uniform, thereby affecting the optical consistency of the appearance of the touch module.
雖然本案已以實施例揭露如上,然其並非用以限定本案,任何熟習此技藝者,在不脫離本案之精神和範圍內,當可作各種之更動與潤飾,因此本案之保護範圍當視後附之申請專利範圍所界定者為準。 Although the present invention has been disclosed in the above embodiments, it is not intended to limit the present case. Anyone skilled in the art can make various changes and refinements without departing from the spirit and scope of the present case. The scope defined in the patent application is subject to change.
100‧‧‧觸控模組 100‧‧‧ touch module
110‧‧‧基板 110‧‧‧Substrate
SF1‧‧‧表面 SF1‧‧‧ surface
E1‧‧‧第一觸控電極 E1‧‧‧first touch electrode
INS‧‧‧絕緣區塊 INS‧‧‧Insulated block
MT‧‧‧金屬導線 MT‧‧‧Metal wire
MSK1‧‧‧遮罩 MSK1‧‧‧ mask
AUX‧‧‧輔助導線 AUX‧‧‧Auxiliary wire
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| TWM457921U (en) * | 2012-10-29 | 2013-07-21 | Tpk Touch Solutions Xiamen Inc | Touch sensor structures |
| TW201602850A (en) * | 2014-07-01 | 2016-01-16 | 勝華科技股份有限公司 | Touch device |
| TW201602880A (en) * | 2014-07-07 | 2016-01-16 | 勝華科技股份有限公司 | Mutual capacitive touch device |
| TWM530987U (en) * | 2016-02-15 | 2016-10-21 | 宸鴻光電科技股份有限公司 | Touch module |
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| TWM454587U (en) * | 2012-09-14 | 2013-06-01 | Inv Element Inc | With use of a metal line is connected to the touch sensing layer electrode embedded touch display panel system |
| CN103049132A (en) * | 2012-12-20 | 2013-04-17 | 苏州瀚瑞微电子有限公司 | Monolayer electrode layout of touch screen |
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| CN104898871B (en) * | 2014-03-05 | 2018-10-26 | 宸鸿光电科技股份有限公司 | Manufacturing method of touch module |
| CN110502161A (en) * | 2014-03-27 | 2019-11-26 | 林志忠 | Manufacturing method of touch module |
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| TWM457921U (en) * | 2012-10-29 | 2013-07-21 | Tpk Touch Solutions Xiamen Inc | Touch sensor structures |
| TW201602850A (en) * | 2014-07-01 | 2016-01-16 | 勝華科技股份有限公司 | Touch device |
| TW201602880A (en) * | 2014-07-07 | 2016-01-16 | 勝華科技股份有限公司 | Mutual capacitive touch device |
| TWM530987U (en) * | 2016-02-15 | 2016-10-21 | 宸鴻光電科技股份有限公司 | Touch module |
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