TWI582658B - Display device - Google Patents

Description

Display device

The disclosure relates to a display device and to a touch display device having a sensing electrode.

With the continuous advancement of technology, various information devices are constantly being introduced, such as mobile phones, tablet computers, ultra-thin notebooks, and satellite navigation. In addition to keyboard or mouse input or manipulation, the use of touch technology to manipulate information devices is a fairly intuitive and popular way to manipulate. Among them, the touch display device has a user-friendly and intuitive input operation interface, so that users of any age can directly select or manipulate the information device with a finger or a stylus.

One of the touch display devices is an in-cell touch display device in which a sensing electrode is disposed in a display panel (for example, a liquid crystal display panel or an organic light-emitting diode panel). However, current in-cell touch display devices are not satisfactory in all aspects.

Therefore, the industry still needs a touch display device that can further enhance the display and touch quality.

The present disclosure provides a display device including: a first substrate, the first substrate includes: a plurality of scan lines disposed on the first substrate; and a plurality of data lines disposed at the first On a substrate, the scan lines and the data lines define a plurality of sub-pixels; a sensing electrode is disposed on the first substrate and corresponds to the two sub-pixels, the sensing electrode has an opening, The opening is disposed corresponding to one of the scan lines or one of the data lines; the second substrate is disposed opposite to the first substrate; and the display medium is disposed between the first substrate and the second substrate.

In order to make the features and advantages of the present disclosure more comprehensible, the preferred embodiments are described below, and are described in detail below with reference to the accompanying drawings.

50‧‧‧Area

100‧‧‧ display device

102‧‧‧First substrate

104‧‧‧ scan line

104A‧‧‧Spindle Department

104AT‧‧‧Upper edge

106‧‧‧Information line

108‧‧‧ pixels

110‧‧‧film transistor

112‧‧‧Sensor electrode

112A‧‧‧Sensor electrode

112AT‧‧‧Upper edge

112B‧‧‧Sensing electrode

112S‧‧‧ sensing electrodes

112S1‧‧‧ sensing electrodes

112S2‧‧‧ sensing electrodes

113‧‧‧Integrated circuit connection area

114‧‧‧ openings

114A‧‧‧First direction opening

114B‧‧‧second direction opening

116‧‧‧Connecting Department

118‧‧‧Touch signal line

120‧‧‧through hole

122‧‧‧Substrate

124‧‧‧gate electrode

124T‧‧‧Upper edge

126‧‧ ‧ gate dielectric layer

128‧‧‧Semiconductor layer

130‧‧‧Source electrode

132‧‧‧汲electrode

132S‧‧‧ surface

134‧‧‧first insulation

136‧‧‧flat layer

138‧‧‧Second insulation

140‧‧‧third insulation

140S‧‧‧ surface

142‧‧‧through hole

144‧‧‧ pixel electrodes

148‧‧‧second substrate

150‧‧‧Display media

152‧‧‧Substrate

154‧‧‧Lighting layer

156‧‧‧Color filter layer

158‧‧‧flat layer

160‧‧‧ spacers

162‧‧‧Connecting Department

164‧‧‧Connecting Department

200‧‧‧ display device

300A‧‧‧ display device

300B‧‧‧ display device

300C‧‧‧ display device

300D‧‧‧ display device

300E‧‧‧ display device

400‧‧‧ display device

500‧‧‧ display device

600‧‧‧ display device

700‧‧‧ display device

800‧‧‧ display device

900A‧‧‧ display device

900B‧‧‧ display device

2A-2A‧‧ ‧ line segment

5C-5C‧‧‧ segments

5D-5D‧‧‧ segments

6C-6C‧‧‧ line segment

6D-6D‧‧‧ segments

S1‧‧‧ side

S2‧‧‧ side

S3‧‧‧ side

S4‧‧‧ side

1B‧‧‧Area

7B‧‧‧Area

A1‧‧‧ first direction

A2‧‧‧ second direction

Edge of E1‧‧

E2‧‧‧ edge

E3‧‧‧ edge

E4‧‧‧ edge

W1‧‧‧Width

W2‧‧‧Width

GS1‧‧‧first spacing

GS2‧‧‧second spacing

CS‧‧‧Interlace

S5‧‧‧ first interval

S6‧‧‧Second interval

HS1‧‧‧Part I

VH1‧‧‧ Part II

VS1‧‧‧ Part II

HS2‧‧‧Part III

VS2‧‧‧Part IV

Figure 1A is a top plan view of a display device of the disclosed embodiment.

Fig. 1B is a partially enlarged view of the display device of Fig. 1A.

Figure 2A is a cross-sectional view taken along line 2A-2A of Figure 1B.

Figure 2B is a cross-sectional view of another embodiment of the present disclosure.

Figure 3A is a top view of another embodiment of the present disclosure.

Figure 3B is a top view of another embodiment of the present disclosure.

Figure 3C is a top view of another embodiment of the present disclosure.

Figure 3D is a top view of another embodiment of the present disclosure.

Figure 3E is a top view of another embodiment of the present disclosure.

Figure 4 is a top view of another embodiment of the present disclosure.

Fig. 5A is a partial enlarged view and a top view of the display device of Fig. 4.

Fig. 5B is a partial enlarged view and a bottom view of the display device of Fig. 4.

Figure 5C is a cross-sectional view taken along line 5C-5C of Figure 5A-5B.

Figure 5D is a cross-sectional view taken along line 5D-5D of Figure 5A-5B.

Figure 6A is a top view of another embodiment of the present disclosure.

Figure 6B is a bottom view of another embodiment of the present disclosure.

Figure 6C is a cross-sectional view taken along line 6C-6C of Figure 6A-6B.

Figure 6D is a cross-sectional view taken along line 6D-6D of Figures 6A-6B.

Figure 7A is a top view of another embodiment of the present disclosure.

Fig. 7B is a partially enlarged view of the display device of Fig. 7A.

Figure 8A is a top view of another embodiment of the present disclosure.

Fig. 8B is a partially enlarged view of the display device of Fig. 8A.

Fig. 8C is a partially enlarged view of the display device of Fig. 8A.

Figure 9A is a top view of another embodiment of the present disclosure.

Figure 9B is a top view of another embodiment of the present disclosure.

The display device of the present disclosure will be described in detail below. It will be appreciated that the following description provides many different embodiments or examples for implementing the various aspects of the disclosure. The specific elements and arrangements described below are merely illustrative of the disclosure. Of course, these are only used as examples and not as a limitation of the disclosure. Moreover, repeated numbers or labels may be used in different embodiments. These repetitions are merely for the purpose of simplicity and clarity of the disclosure, and are not intended to be a limitation of the various embodiments and/or structures discussed. Furthermore, when a first material layer is on or above a second material layer, the first material layer is in direct contact with the second material layer. Or, it is also possible to have one or more layers of other materials in between, in this case, the first material There may be no direct contact between the layer of material and the second layer of material.

It must be understood that the elements or devices of the drawings may be in various forms well known to those skilled in the art. In addition, when a layer is "on" another layer or substrate, it may mean "directly" on another layer or substrate, or a layer on another layer or substrate, or between other layers or substrates. Other layers.

In addition, relative terms such as "lower" or "bottom" and "higher" or "top" may be used in the embodiments to describe the relative relationship of one element of the drawing to another. It will be understood that if the device of the drawing is flipped upside down, the component described on the "lower" side will become the component on the "higher" side.

Here, the terms "about", "about" and "major" generally mean within 20% of a given value or range, preferably within 10%, and more preferably within 5%, or 3 Within %, or within 2%, or within 1%, or within 0.5%. The quantity given here is an approximate quantity, that is, in the absence of specific descriptions of "about", "about" and "major", the meanings of "about", "about" and "major" may still be implied.

It will be understood that the terms "first", "second", "third", etc. may be used herein to describe various elements, components, regions, layers, and/or portions, such elements, components, and regions. The layers, and/or portions are not to be limited by the terms, and the terms are used to distinguish different elements, components, regions, layers, and/or parts. Therefore, a first element, component, region, layer, and/or portion discussed below may be referred to as a second element, component, region, layer, and/or without departing from the teachings of the disclosure. section.

Unless otherwise defined, all terms used herein, including technical and scientific terms, have the same meaning as commonly understood by the ordinary skill of the disclosure. Righteousness. It will be understood that these terms, such as those defined in commonly used dictionaries, should be interpreted as having a meaning consistent with the relevant art and the context or context of the present disclosure, and should not be in an idealized or overly formal manner. Interpretation, unless specifically defined herein.

The embodiments of the present disclosure can be understood in conjunction with the drawings, and the drawings of the present disclosure are also considered as part of the disclosure. It should be understood that the drawings of the present disclosure are not shown in the form of actual devices and components. The shapes and thicknesses of the embodiments may be exaggerated in the drawings in order to clearly illustrate the features of the present disclosure. In addition, the structures and devices in the drawings are schematically illustrated in order to clearly illustrate the features of the disclosure.

In this disclosure, relative terms such as "lower", "upper", "horizontal", "vertical", "lower", "above", "top", "bottom", etc. shall be understood as The orientation shown in the paragraph and related schemas. This relative term is used for convenience of description only, and does not mean that the device described therein is to be manufactured or operated in a particular orientation. Terms such as "joining" and "interconnecting", etc., unless otherwise defined, may mean that two structures are in direct contact, or that two structures are not in direct contact, and other structures are provided here. Between the two structures. The term "joining and joining" may also include the case where both structures are movable or both structures are fixed.

It should be noted that the term "substrate" may be used herein to refer to the substrate itself or a composite body in which various elements, various circuits, and various film layers have been formed on the substrate. Here, in order to simplify the drawing, only A flat substrate indicates this. Further, the "substrate surface" includes the uppermost and exposed film layer of the substrate, such as a glass surface or an organic polymer surface, an insulating layer and/or a metal wire. The material of the substrate itself may be glass, organic polymer, inorganic polymer, bismuth, metal, or the like.

In the display device, the electric field environment in the sensing electrode and the edge of the sensing electrode is different, so the capacitance formed in the sensing electrode and the edge of the sensing electrode and other components are different, which may cause light leakage of the display device and The display quality is degraded. In addition, if the sensing electrode overlaps with the gate line, the data line, or the touch signal line, parasitic capacitance may occur. Therefore, the shape and size design of the sensing electrode will affect the value of the parasitic capacitance in the sensing electrode and the edge of the sensing electrode, causing the difference between the two values to cause crosstalk between the electrodes (cross-talk). ), which in turn affects image and touch performance.

In the embodiment, the sensing electrode and the sensing electrode edge are in a similar electric field environment, so that the capacitance formed in the sensing electrode and the sensing electrode edge and other components are similar, thereby reducing the light leakage of the display device and improving Display quality. In addition, the parasitic capacitance between the sensing electrode and the scan line, the data line or the touch signal line can be reduced to improve image and touch performance.

FIG. 1A is a top view of the first substrate 102 of the display device 100 of the embodiment. Fig. 1B is an enlarged view of a portion of the first substrate 102 of the display device 100 of Fig. 1A in a region 1B. Referring to FIGS. 1A-1B, the first substrate 102 includes a plurality of parallel scan lines (gate lines) 104 extending in the first direction A1, and a data line parallel to the scan line 104 extending along the second direction A2. (Source line) 106. The first direction A1 and the second direction A2 may be perpendicular or orthogonal to each other. In other words, the first direction A1 may be the X axis of the coordinate system and the second direction A2 is the Y axis, but The first direction A1 and the second direction A2 may also be non-perpendicular or non-orthogonal to each other, and the included angle is not equal to 90 degrees. In addition, the scan line 104 and the data line 106 are both disposed on the first substrate 102.

In addition, a plurality of scan lines 104 are defined together with a plurality of data lines 106. A plurality of sub-pixels 108, the first substrate 102 may include a plurality of pixels 108, and the first substrate 102 further includes a plurality of thin film transistors 110 corresponding to the sub-pixels 108, two of the thin film transistors 110 The end points are electrically connected to the scan line 104 and the data line 106, respectively, as shown in FIG. 1B. The plurality of pixels 108 can form a pixel.

The data line 106 provides a source signal to the sub-pixel 108 through the thin film transistor 110, and the scan line (gate line) 104 transmits a scan pulse signal to the sub-pixel 108 through the thin film transistor 110, and cooperates with the source. The polar signal controls the sub-pixel 108 together.

Continuing to refer to FIG. 1A-1B, the first substrate 102 further includes a plurality of sensing electrodes 112 disposed on the first substrate 102. The sensing electrodes 112 cover the plurality of pixels 108. In this embodiment, the sensing is performed. The electrode 112 covers four sub-pixels 108. The sensing electrodes 112 have a first interval S5 extending along the first direction A1 and a second interval S6 extending along the second direction A2. The sensing electrodes 112 have a first pitch GS1 with respect to each other in the second direction A2, that is, a short side width of the first interval G1 in the second direction A2. The sensing electrodes 112 have a second pitch GS2 with respect to each other in the first direction A1, that is, a short side width of the second interval G2 in the first direction A1. The first interval S5 is set corresponding to the partial scan line 104, and the second interval S6 is set corresponding to the partial data line 106. The portion where the first interval S5 and the second interval S6 overlap each other is a complex interleave CS, and the interleave portion CS corresponds to a portion where the scanning line 104 and the data line 106 overlap. In this embodiment, the widths of the first pitch GS1 and the second pitch GS2 are the same. In other embodiments, the widths of the first pitch GS1 and the second pitch GS2 may be different.

The at least one sensing electrode 112 has an opening 114 corresponding to a portion of the scan line 104 or a portion of the data line 106. The opening 114 is located in the range of the sensing electrode 112, and the portion 114 of the opening 114 corresponds to the scanning line 104 or part of the data line 106. It is a partial scan line 104 that does not correspond to the first interval S5 or a partial data line 106 that does not correspond to the second interval S6. In this embodiment, the opening 114 may be the first interval S5 in the non-CS portion and extend toward the extension of the second direction A2, or the second interval S6 in the non-CS portion, and toward the first direction A1. Extend the branch. In other embodiments, the opening 114 can be located within the sensing electrode 112 without a connection portion with the first spacing S5 and the second spacing S6.

Since the sensing electrode 112 overlaps the scan line 104 or the data line 106, the capacitance generated is different from the capacitance generated between the edge of the sensing electrode 112 and the scan line 104 or the data line 106. The embodiment of the present disclosure is such that the opening 114 corresponds to the scan line 104 or the data line 106, so that most of the area in the sensing electrode 112 can be avoided where the scan line 104 or the data line 106 is located, so that the sensing electrode 112 is large. The portion of the region and the edge of the sensing electrode 112 are in a similar electric field environment, so that the capacitance formed in the sensing electrode 112 and the edge of the sensing electrode 112 and other components are similar, which reduces the light leakage of the display device 100 and improves the display quality. On the other hand, since the portion where the sensing electrode 112 overlaps the scan line 104 or the data line 106 is reduced, the parasitic capacitance between the sensing electrode 112 and the scan line 104 or the data line 106 is reduced, and the image of the product can be improved. Touch performance.

In detail, referring to FIG. 1A-1B , at least one sensing electrode 112 may have a plurality of sub-sensing electrodes 112S and a connecting portion 116 , and the plurality of sub sensing electrodes 112S are through the opening 114 . They are separated and electrically connected to each other by the connecting portion 116.

Further, the connecting portion 116 may be provided, for example, in a central region of four adjacent sensing electrodes 112S adjacent to each other. For example, in this embodiment, the sensing electrode 112 is composed of four secondary sensing electrodes 112S adjacent to each other, and the connecting portion 116 is provided to the four mutual ones. The central region of the adjacent secondary sensing electrode 112S. Further, in this embodiment, each of the secondary sensing electrodes 112S corresponds to one sub-pixel 108 setting.

In addition to the connecting portion 116, the region of the sensing electrode 112 corresponding to the scanning line 104 and/or the data line 106 is provided with an opening 114. Thereby, most of the area in the sensing electrode 112 and the edge of the sensing electrode 112 are similar to the electric field environment formed between the scanning line 104 or the data line 106, thereby enabling the sensing electrode 112 and the sensing electrode 112. The capacitance formed by the edge and other components is also similar, which reduces light leakage of the display device 100 and improves display quality. On the other hand, since the portion where the sensing electrode 112 overlaps the scan line 104 or the data line 106 is reduced, the parasitic capacitance between the sensing electrode 112 and the scan line 104 or the data line 106 is reduced, and the image of the product can be improved. Touch performance. The embodiment of the present disclosure has an area of the sensing electrode 112 having an opening 114 of about 50% to 90% of the area of the sensing electrode 112 having no opening 114. In other words, the ratio of the area of the sensing electrode 112 to the area of the opening 114 is between 1 and 9.

In addition, the first substrate 102 further includes a touch signal line 118. One end of the touch signal line 118 is electrically connected to the sensing electrode 112 through the through hole 120, and the other end is electrically connected to the integrated circuit connection area (IC). Bonding region) 113. The position of the touch signal line 118 is not limited to the 1A-1B map, and may also be disposed on the data line 106.

It should be noted that in addition to the embodiments shown in Figures 1A-1B above, one of the sensing electrodes of the present disclosure may also include other numbers of secondary sensing electrodes. Therefore, the scope of the disclosure is not limited to the embodiment shown in Figures 1A-1B. In addition, the connecting portion 116 and the sub-sensing electrode 112S illustrated in FIG. 1A-1B may be completed in the same program or different procedures according to actual needs, and the materials used may be the same or different from each other.

In addition, it should be noted that in order to clearly describe the disclosure, the above Subsequent pixel electrodes are not shown in Figures 1A-1B.

Referring to Figure 2A, the figure is a cross-sectional view taken along line 2A-2A of Figure 1B. As shown in FIG. 2A, the first substrate 102 can include a substrate 122, which can include a transparent substrate, such as a glass substrate, a ceramic substrate, a plastic substrate, or any other suitable substrate. The thin film transistor 110 includes a gate electrode 124 disposed on the substrate 122, and a gate dielectric layer 126 disposed on the gate electrode 124 and the substrate 122. The gate electrode 124 extends from the scan line 104 in the second direction A2.

The gate electrode 124 can be an amorphous germanium, a germanium germanium, one or more metals, a metal nitride, a conductive metal oxide, or a combination thereof. The above metals may include, but are not limited to, molybdenum, tungsten, titanium, tantalum, platinum or hafnium. The above metal nitrides may include, but are not limited to, molybdenum nitride, tungsten nitride, titanium nitride, and tantalum nitride. The above conductive metal oxide may include, but is not limited to, ruthenium oxide and indium tin oxide. The gate electrode 124 can be formed by the aforementioned chemical vapor deposition (CVD), sputtering, resistance heating evaporation, electron beam evaporation, or any other suitable deposition method, for example, in an embodiment. The amorphous germanium conductive material layer or the polycrystalline germanium conductive material layer may be deposited by low pressure chemical vapor deposition (LPCVD) at a temperature between 525 and 650 ° C, and may have a thickness ranging from about 1000 Å to about 10000 Å.

The gate dielectric layer 126 can be tantalum oxide, tantalum nitride, hafnium oxynitride, a high-k dielectric material, or any other suitable dielectric material, or a combination thereof. The material of the high-k dielectric material may be a metal oxide, a metal nitride, a metal halide, a transition metal oxide, a transition metal nitride, a transition metal telluride, a metal oxynitride, Metal aluminate, zirconium silicate, zirconium aluminate. For example, the high-k dielectric material may be LaO, AlO, ZrO, TiO, Ta ₂ O ₅ , Y ₂ O ₃ , SrTiO ₃ (STO), BaTiO ₃ (BTO), BaZrO, HfO. ₂ , HfO ₃ , HfZrO, HfLaO, HfSiO, HfSiON, LaSiO, AlSiO, HfTaO, HfTiO, HfTaTiO, HfAlON, (Ba, Sr)TiO ₃ (BST), Al ₂ O ₃ , other high dielectric constants of other suitable materials Dielectric material, or a combination of the above. The gate dielectric layer 126 can be formed by chemical vapor deposition (CVD) or spin coating. The chemical vapor deposition method can be, for example, low pressure chemical vapor deposition (LPCVD). Low temperature chemical vapor deposition (LTCVD), rapid thermal chemical vapor deposition (RTCVD), plasma enhanced chemical vapor deposition (PECVD) Atomic layer deposition (ALD) or other commonly used methods of atomic layer chemical vapor deposition.

The thin film transistor 110 further includes a semiconductor layer 128 disposed on the gate dielectric layer 126. The semiconductor layer 128 overlaps the gate electrode 124, and the source electrode 130 and the drain electrode 132 of the thin film transistor 110 are respectively disposed on Both sides of the semiconductor layer 128 are overlapped with portions of both sides of the semiconductor layer 128, respectively. In addition, the source electrode 130 is part of the data line 106.

The semiconductor layer 128 may include an elemental semiconductor including germanium, germanium; a compound semiconductor including gallium nitride (GaN), silicon carbide, gallium arsenide, gallium phosphide ( Gallium phosphide), indium phosphide, indium arsenide and/or indium antimonide; alloy semiconductors including niobium alloys (SiGe), phosphorus gallium arsenide alloy (GaAsP), arsenic aluminum indium alloy (AlInAs), arsenic aluminum gallium alloy (AlGaAs), arsenic gallium alloy (GaInAs), indium gallium alloy (GaInP) and/or phosphorus arsenide gallium nitride Alloy (GaInAsP) or a combination of the above materials.

The material of the source electrode 130 and the drain electrode 132 may include copper, aluminum, molybdenum, tungsten, gold, chromium, nickel, platinum, titanium, niobium, tantalum, the above alloy, the above combination or other conductive metal. The material may be, for example, a three-layer structure of molybdenum aluminum molybdenum (Mo/Al/Mo) or titanium aluminum titanium (Ti/Al/Ti). In other embodiments, the material of the source electrode 130 and the drain electrode 132 may be a non-metal material as long as the material used has conductivity. The material of the source electrode 130 and the drain electrode 132 may be formed by the aforementioned chemical vapor deposition (CVD), sputtering, resistance heating evaporation, electron beam evaporation, or any other suitable deposition method. . In some embodiments, the material of the source electrode 130 and the drain electrode 132 may be the same and may be formed by the same deposition step. However, in other embodiments, the source electrode 130 and the drain electrode 132 may be formed by different deposition steps, and the materials thereof may be different from each other.

Continuing to refer to FIG. 2A, the first substrate 102 further includes a first insulating layer 134 covering the thin film transistor 110 and the gate dielectric layer 126. The first insulating layer 134 may be tantalum nitride, hafnium oxide, or hafnium oxynitride. The first insulating layer 134 can be formed by chemical vapor deposition (CVD) or spin coating. The chemical vapor deposition method can be, for example, low pressure chemical vapor deposition (LPCVD), low temperature chemistry. Low temperature chemical vapor deposition (LTCVD), rapid thermal chemical vapor deposition (RTCVD), plasma enhanced chemical vapor deposition (PECVD), atom Atomic layer deposition (ALD) of layer chemical vapor deposition It is a commonly used method.

In the embodiment, the touch signal line 118 is disposed on the first insulating layer 134. The material of the touch signal line 118 may include copper, aluminum, molybdenum, tungsten, gold, chromium, nickel, platinum, titanium, tantalum, niobium, the above alloy, the above combination or other conductive metal materials, for example, It is a three-layer structure of molybdenum aluminum molybdenum (Mo/Al/Mo) or titanium aluminum titanium (Ti/Al/Ti). In other embodiments, the material of the touch signal line 118 may be a non-metal material as long as the material used is electrically conductive. The material of the touch signal line 118 can be formed by the aforementioned chemical vapor deposition (CVD), sputtering, resistance heating evaporation, electron beam evaporation, or any other suitable deposition method.

Continuing to refer to FIG. 2A , the first substrate 102 further includes a second insulating layer 138 disposed on the first insulating layer 134 and covering the touch signal line 118 . The second insulating layer 138 may be tantalum nitride, hafnium oxide, or hafnium oxynitride, and may be formed by the aforementioned chemical vapor deposition (CVD) or spin coating method.

Then, a flat layer 136 is selectively disposed on the second insulating layer 138. The material of the flat layer 136 may be an organic insulating material (photosensitive resin) or an inorganic insulating material (tantalum nitride, cerium oxide, cerium oxynitride, tantalum carbide, aluminum oxide, or a combination thereof).

The sensing electrode 112 (or the secondary sensing electrode 112S) is disposed on the flat layer 136 as shown in FIG. 2A. The sensing electrode 112 may include a transparent conductive material such as indium tin oxide (ITO), tin oxide (SnO), indium zinc oxide (IZO), indium gallium zinc oxide (IGZO), indium tin zinc oxide (ITZO), Antimony tin oxide (ATO), antimony zinc oxide (AZO), combinations of the above, or any other suitable transparent conductive oxide material may also be a layer of conductive transparent material formed by nanosilver. In addition, the sensing electrode 112 is not only a sensing electrode when the touch is used, but also a common electrode of the display device, wherein the touch electrode The control driving mode can be a self-capacitive type, and the touch electrode (Tx) and the receive electrode (Rx) are the sensing electrodes 112. In addition, the sensing electrode 112 can be electrically connected to the touch signal line 118 at the secondary sensing electrode 112S (see FIG. 1B).

Continuing to refer to FIG. 2A, the first substrate 102 further includes a third insulating layer 140 disposed on the flat layer 136 and covering the sensing electrode 112. The third insulating layer 140 may be tantalum nitride, hafnium oxide, or oxynitride.矽, and can be formed by the aforementioned chemical vapor deposition (CVD) or spin coating method.

In addition, the first substrate 102 has a through hole 142 extending downward from the upper surface 140S of the third insulating layer 140 to the drain electrode 132 and exposing a portion of the surface 132S of the drain electrode 132.

The first substrate 102 further includes a pixel electrode 144 disposed on the third insulating layer 140 and electrically connected to the drain electrode 132. In detail, the pixel electrode 144 is disposed on a portion of the third insulating layer 140 and extends into the through hole 142 to electrically connect the gate electrode 132.

In addition, referring to FIG. 2A , the display device 100 further includes a second substrate 148 disposed opposite to the first substrate 102 and a display medium 150 disposed between the first substrate 102 and the second substrate 148 . Display medium 150 can be a liquid crystal, an organic electroluminescent diode (OLED), an inorganic electroluminescent diode (LED), or an electrophoretic (Electro-Phoretic) particle.

The display device 100 can be a touch liquid crystal display, such as a thin film transistor liquid crystal display. Alternatively, the liquid crystal display can be a Twisted Nematic (TN) type liquid crystal display, a Super Twisted Nematic (STN) type liquid crystal display, or a double-layer super twisted nematic (Double layer Super Twisted Nematic, DSTN) liquid crystal display, Vertical Alignment (VA) type liquid crystal display, In-Plane Switching (IPS) type liquid crystal display, Cholesteric type liquid crystal display, Blue Phase Liquid crystal display, marginal electric field effect (FFS) type liquid crystal display, or any other suitable liquid crystal display. In other embodiments, the display device 100 may be an organic electroluminescent diode display, an inorganic electroluminescent diode, or an electrophoretic display.

In some embodiments, the second substrate 148 is a color filter layer substrate. In detail, the second substrate 148 as a color filter layer substrate may include a substrate 152, a plurality of light shielding layers 154 disposed on the substrate 152, and a color filter layer 156 disposed between the plurality of light shielding layers 154. And a flat layer 158 covering the light shielding layer 154 and the color filter layer 156.

The substrate 152 may include a transparent substrate, such as a glass substrate, a ceramic substrate, a plastic substrate, or any other suitable transparent substrate. The light shielding layer 154 may include a black photoresist, a black printing ink, and a black resin. The color filter layer 156 may include a red filter layer, a green filter layer, a blue filter layer, or any other suitable color filter layer.

The display device 100 further includes a spacer 160 disposed between the first substrate 102 and the second substrate 148. The spacer 160 is a main structure for spacing the first substrate 102 and the second substrate 148 to maintain the inter-substrate. The first substrate 102 is prevented from coming into contact with the second substrate 148 when the display device 100 is pressed by a certain distance.

As shown in FIG. 2A, the embodiment of the present disclosure can make most of the area in the sensing electrode 112 and the sensing electrode 112 by setting the opening 114 corresponding to the data line 106 (ie, the source electrode 130 of FIG. 2A). The edge is provided in the area corresponding to the data line 106 The opening 114 allows the majority of the area in the sensing electrode 112 and the edge of the sensing electrode 112 to be in a similar electric field environment, thereby allowing the capacitance formed in the sensing electrode 112 and the edge of the sensing electrode 112 and other components to be Similarly, the light leakage of the display device 100 is lowered and the display quality is improved. On the other hand, since the portion where the sensing electrode 112 overlaps the scan line 104 or the data line 106 is reduced, the parasitic capacitance between the sensing electrode 112 and the scan line 104 or the data line 106 is reduced, and the image of the product can be improved. Touch performance.

It should be noted that, in addition to the embodiment shown in FIG. 2A above, the sensing electrode, the pixel electrode and the touch signal line of the present disclosure may have other configurations, as shown in the embodiment of FIG. 2B. The scope of the disclosure is not limited to the embodiment shown in FIG. 2A. This section will be explained in detail later.

It should be noted that elements or layers that are the same or similar to those in the foregoing will be denoted by the same or similar reference numerals, and the materials, manufacturing methods and functions thereof are the same or similar to those described above, and therefore will not be described later. Narration.

2B is a cross-sectional view of a display device 200 in accordance with another embodiment of the present disclosure. As shown in FIG. 2B, the first substrate 102 can include a substrate 122. The thin film transistor 110 includes a gate electrode 124 disposed on the substrate 122, and a gate dielectric layer 126 disposed on the gate electrode 124 and the substrate 122. The gate electrode 124 extends from the scan line 104 in the second direction A2.

The thin film transistor 110 further includes a semiconductor layer 128 disposed on the gate dielectric layer 126. The semiconductor layer 128 overlaps the gate electrode 124, and the source electrode 130 and the drain electrode 132 of the thin film transistor 110 are respectively disposed on Both sides of the semiconductor layer 128 are overlapped with portions of both sides of the semiconductor layer 128, respectively. In addition, the source electrode 130 is part of the data line 106.

Continuing to refer to FIG. 2B, the first substrate 102 further includes a cover film electro-crystal The first insulating layer 134 of the body 110 and the gate dielectric layer 126. The first insulating layer 134 may be tantalum nitride, hafnium oxide, or hafnium oxynitride. The first insulating layer 134 can be formed by chemical vapor deposition (CVD) or spin coating.

Then, a flat layer 136 is selectively disposed on the first insulating layer 134. The material of the flat layer 136 may be an organic insulating material (photosensitive resin) or an inorganic insulating material (tantalum nitride, cerium oxide, cerium oxynitride, tantalum carbide, aluminum oxide, or a combination thereof).

The first substrate 102 further includes a pixel electrode 144 disposed on the flat layer 136 and electrically connected to the drain electrode 132. In detail, the pixel electrode 144 is disposed on the partial flat layer 136 and extends into the through hole 142 to electrically connect the drain electrode 132.

The touch signal line 118 is disposed on the flat layer 136. The material of the touch signal line 118 may include copper, aluminum, molybdenum, tungsten, gold, chromium, nickel, platinum, titanium, tantalum, niobium, the above alloy, the above combination or other conductive metal materials, for example, It is a three-layer structure of molybdenum aluminum molybdenum (Mo/Al/Mo) or titanium aluminum titanium (Ti/Al/Ti). In other embodiments, the material of the touch signal line 118 may be a non-metal material as long as the material used is electrically conductive.

Continuing to refer to FIG. 2B, the first substrate 102 further includes a second insulating layer 138 disposed on the planar layer 136 and covering the pixel electrode 144. The second insulating layer 138 may be tantalum nitride, hafnium oxide, or oxynitride.矽, and can be formed by the aforementioned chemical vapor deposition (CVD) or spin coating method.

The sensing electrode 112 (or the secondary sensing electrode 112S) is disposed on the second insulating layer 138 as shown in FIG. 2B. The sensing electrode 112 may include a transparent conductive material such as indium tin oxide (ITO), tin oxide (SnO), indium zinc oxide (IZO), indium gallium zinc oxide (IGZO), indium tin zinc oxide (ITZO), Antimony tin oxide (ATO), antimony zinc oxide (AZO), The above combination or any other suitable transparent conductive oxide material may also be a layer of conductive transparent material formed by nanosilver. In addition, the sensing electrode 112 is not only a sensing electrode when the touch is used, but also a common electrode of the display device. The driving mode of the touch can be a self-capacitive type. The transmit electrode (Tx) and the receive electrode (Rx) are the same as the sense electrode 112. In addition, the sensing electrode 112 can be electrically connected to the touch signal line 118 at the secondary sensing electrode 112S (see FIG. 1B).

In addition, referring to FIG. 2B , the display device 100 further includes a second substrate 148 disposed opposite the first substrate 102 and a display medium 150 disposed between the first substrate 102 and the second substrate 148 . Display medium 150 can be a liquid crystal, an organic electroluminescent diode (OLED), an inorganic electroluminescent diode (LED), or an electrophoretic (Electro-Phoretic) particle.

In some embodiments, the second substrate 148 is a color filter layer substrate. In detail, the second substrate 148 as a color filter layer substrate may include a substrate 152, a plurality of light shielding layers 154 disposed on the substrate 152, and a color filter layer 156 disposed between the plurality of light shielding layers 154. And a flat layer 158 covering the light shielding layer 154 and the color filter layer 156.

As shown in FIG. 2B, in the embodiment of the present disclosure, most of the area in the sensing electrode 112 and the sensing electrode 112 can be made by arranging the opening 114 corresponding to the data line 106 (ie, the source electrode 130 of FIG. 2B). The edge is provided with an opening 114 in the region corresponding to the data line 106, so that most of the area in the sensing electrode 112 and the edge of the sensing electrode 112 are in a similar electric field environment, thereby making the sensing electrode 112 feel The capacitance of the edge of the electrode 112 is similar to that of other components, which reduces light leakage of the display device 200 and improves display quality. On the other hand, since the sensing electrode 112 and the gate line 104 are reduced or The portion where the data lines 106 overlap, thereby reducing the parasitic capacitance between the sensing electrodes 112 and the gate lines 104 or the data lines 106, can improve the image and touch performance of the product.

FIG. 3A is a top view of the first substrate 102 of the display device 300A according to another embodiment of the present disclosure. The embodiment shown in Fig. 3A differs from the embodiment of the first embodiment 1A-1B in that the connecting portion 162 of the sensing electrode 112 is of a polygonal type. The opening 114 is an extended branch of the first interval G1 or the second interval G2, and the opening 114 is interconnected with the first interval G1 and the second interval G2. It should be noted that elements or layers that are the same or similar to those in the foregoing will be denoted by the same or similar reference numerals, and the materials, manufacturing methods and functions thereof are the same or similar to those described above, and therefore will not be described later. Narration.

FIG. 3B is a top view of the first substrate 102 of the display device 300B of another embodiment of the present invention. The difference between the embodiment shown in FIG. 3B and the embodiment of FIG. 3A is that the connecting portion 164 can be provided at the edge of the sensing electrode 112. The opening 114 is located in the sensing electrode 112, and the connecting portion 164 is located between the opening 114 and the first interval G1 or the second interval G2. In this embodiment, the opening 114 is not connected to the first interval G1 and the second interval G2. In other embodiments, the opening 114 may be partially connected to the first interval G1 or the second interval G2. The number of the connecting portions 164 is not limited to that shown in FIG. 3B, and the number of the connecting portions 164 can be adjusted according to actual needs, as shown in FIG. 3C.

FIG. 3C is a top view of the first substrate 102 of the display device 300C according to another embodiment of the present disclosure. The difference between the embodiment shown in FIG. 3C and the embodiment in FIG. 3B is that the connecting portion 164 is only disposed at the edge of the three sides of the sensing electrode 112, that is, the opening 114 can be adjacent to the sensing electrode 112. One of the first intervals G1 is connected to each other, and has a connection portion 164 between the first interval G1 and the second interval G2 adjacent to the other sensing electrodes 112.

3D is the first display device 300D of another embodiment of the present disclosure A top view of the substrate 102. The embodiment shown in FIG. 3D differs from the embodiment of FIG. 3A in that each of the secondary sensing electrodes 112S corresponds to a plurality of sub-pixels 108, for example, corresponding to two sub-pixels 108. In other embodiments, each of the secondary sensing electrodes 112S can also be disposed corresponding to the other number of sub-pixels 108, and electrically connected to each other by the connecting portion, and has an opening 114 corresponding to the scanning line 104 or the data line 106.

FIG. 3E is a top view of the first substrate 102 of the display device 300E of another embodiment. The embodiment shown in FIG. 3E differs from the embodiment in FIG. 3A in that at least one sub-sense electrode 112S1 corresponds to one sub-pixel 108, and at least another sub-sense electrode 112S2 corresponds to a plurality of sub-pixels. 108 settings.

FIG. 4 is a top view of a display device 400 according to another embodiment of the present disclosure. Fig. 5A is a partial enlarged view and a top view of the display device 400 of Fig. 4 in the area 50. FIG. 5B is a partial enlarged view and a bottom view of the display device 400 of FIG. 4 in the area 50. As shown in FIG. 4-5B, the scanning line 104 includes a main shaft portion 104A and a plurality of gate electrodes 124 extending from the autonomous shaft portion 104A in the direction A2.

It should be noted that elements or layers that are the same or similar to those in the foregoing will be denoted by the same or similar reference numerals, and the materials, manufacturing methods and functions thereof are the same or similar to those described above, and therefore will not be described later. Narration.

As shown in FIG. 4-5B, at least one sensing electrode 112 has a plurality of openings 114 including a first direction opening 114A and a second direction opening 114B. It should be noted that the first direction A1 is the extending direction of the main shaft portion 104A of the scanning line 104, and the second direction A2 is the extending direction of the data line 106.

Continuing to refer to FIG. 4-5B, the first direction opening 114A is disposed between two adjacent gate electrodes 124, and the second direction opening 114B is disposed corresponding to the data line 106. In other embodiments, the first direction opening 114A can also be exposed. The main shaft portion 104A of the sub-scanning line 104, wherein the definition of the partial scanning line 104 can be regarded as a region where the sensing electrode 112 does not overlap with the main shaft portion 104A of the scanning line 104.

In addition, in the embodiment where the touch signal line 118 is disposed to overlap with the data line 106, the second direction opening 114B is also disposed corresponding to the touch signal line 118.

The embodiment of the present disclosure can make most of the area in the sensing electrode 112 by setting the first direction opening 114A corresponding to the two adjacent gate electrodes 124 and the second direction opening 114B corresponding to the data line 106. And the edge of the sensing electrode 112 is provided with an opening 114 in the area corresponding to the scanning line 104 or the data line 106, so that most of the area in the sensing electrode 112 and the edge of the sensing electrode 112 are in a similar electric field environment, thereby The parasitic capacitance formed in the sensing electrode 112 and the edge of the sensing electrode 112 and other components can also be similar, which reduces the light leakage of the display device 500 and improves the display quality. On the other hand, since the portion where the sensing electrode 112 overlaps the scan line 104, the data line 106 or the touch signal line 118 is reduced, the parasitic capacitance between the sensing electrode 112 and the scan line 104 or the data line 106 is reduced. Can improve the image and touch performance of the product.

In addition, in some embodiments, two adjacent sensing electrodes 112 are separated by a first interval S5 and a second interval S6, and a width W1 of the first direction opening 114A may be in a second direction with the first interval S5. The width of A2 is the same as the first pitch GS1, as shown in Fig. 4.

In addition, in some embodiments, the first direction openings 114A are the farthest sides S1 and S2 in the first direction A1, and the two gate electrodes 124 corresponding to the first direction openings 114A are respectively in the first direction A1. The edges E1 and E2 are aligned, as shown in Figure 5A and subsequent Figure 5B.

In other embodiments, along the first direction A1 direction, the two sides The distance between the edges S1 and S2 may be smaller or larger than the distance between the edges E1 and E2, wherein the side S1 may be aligned with the edge E1 and the side S2 may not be aligned with the edge E2, or the side S2 may be The edge E2 is aligned and the side S1 is not aligned with the edge E1, or the side S1 is not aligned with the edge E1 and the side S2 is not aligned with the edge E2.

Moreover, in some embodiments, the second direction opening 114B is disposed between two adjacent scan lines 104. Moreover, in some embodiments, the width W3 of the second direction opening 114B is the same as the second spacing GS2 of the second interval G2 in the first direction A2.

In addition, in some embodiments, the second direction opening 114B is the farthest side edges S3 and S4 in the first direction, and the two gate lines 104 corresponding to the second direction opening 114B are respectively at the edge of the second direction A2. E3 and E4 are aligned as shown in Figure 5B.

In other embodiments, along the second direction A2, the distance between the two sides S3 and S4 may be smaller or larger than the distance between the edges E4 and E4, wherein the side S3 may be aligned with the edge E3. The side S4 is not aligned with the edge E4, or the side S4 is aligned with the edge E4 and the side S3 is not aligned with the edge E3, or the side S3 is not aligned with the edge E3 and the side S4 is not Edge E4 is aligned.

Figure 5C is a cross-sectional view taken along line 5C-5C of Figure 5A-5B. Figure 5D is a cross-sectional view taken along line 5D-5D of Figure 5A-5B. It should be noted that elements or layers that are the same or similar to those in the foregoing will be denoted by the same or similar reference numerals, and the materials, manufacturing methods and functions thereof are the same or similar to those described above, and therefore will not be described later. Narration.

As shown in FIG. 5C-5D, the embodiment of the present disclosure is such that the first direction opening 114A is disposed between two adjacent gate electrodes 124, and the second direction is opened. The port 114B is disposed corresponding to the data line 106, so that most of the area in the sensing electrode 112 and the edge of the sensing electrode 112 are provided with an opening 114 in the area corresponding to the scanning line 104 or the data line 106, so that the sensing electrode 112 can be Most of the inner region and the edge of the sensing electrode 112 are in a similar electric field environment, so that the capacitance formed in the sensing electrode 112 and the edge of the sensing electrode 112 and other components are similar, thereby reducing the light leakage of the display device 500 and improving Display quality. On the other hand, since the portion where the sensing electrode 112 overlaps the scan line 104, the data line 106 or the touch signal line 118 is reduced, the parasitic capacitance between the sensing electrode 112 and the scan line 104 or the data line 106 is reduced. Can improve the image and touch performance of the product.

It should be noted that, in addition to the embodiments shown in the above 5A-5D, the sensing electrodes, the pixel electrodes and the touch signal lines of the present disclosure may have other configurations, as in the embodiment of FIGS. 6A-6D. Show. The scope of the disclosure is not limited to the embodiments shown in Figures 5A-5D. This section will be explained in detail later.

6A-6D are diagrams showing a display device 600 of another embodiment. Figure 6A is a top view of the display device 600 of the present disclosure. Figure 6B is a bottom view of the display device 600 of the present disclosure. Figure 6C is a cross-sectional view taken along line 6C-6C of Figure 6A-6B. Figure 6D is a cross-sectional view taken along line 6D-6D of Figures 6A-6B. It should be noted that elements or layers that are the same or similar to those in the foregoing will be denoted by the same or similar reference numerals, and the materials, manufacturing methods and functions thereof are the same or similar to those described above, and therefore will not be described later. Narration.

The difference between the embodiment shown in Figures 6A-6D (similar to Figure 2A above) and the embodiment of Figure 5A-5D (similar to Figure 2B above) is that the pixels of Figures 6A-6D are observed if viewed from the above view. The electrode system is disposed on the sensing electrode, and the pixel electrode of the 5A-5D diagram is disposed under the sensing electrode. In addition, as shown in Figures 6A-6D, the disclosure In the embodiment, the first direction opening 114A is disposed corresponding to the two adjacent gate electrodes 124, and the second direction opening 114B is disposed corresponding to the data line 106 or the touch signal line 118, so that the sensing electrode 112 can be disposed. Most of the regions and the sensing electrodes 112 are provided with openings 114 in the regions corresponding to the scanning lines 104, the data lines 106 or the touch signal lines 118, so that most of the sensing electrodes 112 and the sensing electrodes can be formed. The edge of the 112 is in a similar electric field environment, so that the capacitance formed in the sensing electrode 112 and the edge of the sensing electrode 112 and other components are similar, which reduces the light leakage of the display device 600 and improves the display quality. On the other hand, since the portion where the sensing electrode 112 overlaps the scan line 104, the data line 106 or the touch signal line 118 is reduced, the parasitic capacitance between the sensing electrode 112 and the scan line 104 or the data line 106 is reduced. Can improve the image and touch performance of the product.

FIG. 7A is a top view of a display device 700 according to another embodiment of the present disclosure. Fig. 7B is a partially enlarged view of the display device 700 of Fig. 7A in the area 7B. It should be noted that elements or layers that are the same or similar to those in the foregoing will be denoted by the same or similar reference numerals, and the materials, manufacturing methods and functions thereof are the same or similar to those described above, and therefore will not be described later. Narration.

As shown in FIGS. 7A-7B, the spacing 166 between two adjacent sensing electrodes 112 is corresponding to the light shielding layer 154. By arranging the space 166 corresponding to the light shielding layer 154, the area of the device that is easy to leak light (that is, the area corresponding to the space 166) can be shielded by the light shielding layer 154, so that the display quality of the device can be improved.

FIG. 8A is a top view of a display device 800 according to another embodiment of the present disclosure. Fig. 8B is a partially enlarged view of the display device 800 of Fig. 8A in the area 8B. Fig. 8C is a partially enlarged view of the display device 800 of Fig. 8A in the area 8C. It should be noted that elements or layers that are the same or similar in the foregoing will be identical or similar. The number indicates that the materials, manufacturing methods and functions are the same as or similar to those described above, so this section will not be described later.

As shown in FIGS. 8A-8C, the first interval S5 extending in the first direction A1 is disposed corresponding to the plurality of scanning lines 104, and the second interval S6 extending in the second direction A2 is disposed corresponding to the plurality of data lines 106.

In this embodiment, the first interval S5 includes a plurality of first portions HS1 along the first direction A1, and a plurality of second portions VS1 along the second direction A2. The first portion HS1 corresponds to the scan line 104, and the second portion VS1 corresponds to the data line. 106, the first portion HS1 may correspond to the width of the at least one pixel 108 in the first direction A1, the second portion VS1 may correspond to the width of the at least one pixel 108 in the second direction A2, and the first portion HS1 and the second portion VH1 are connected to each other. The first interval S5.

In this embodiment, the second interval S6 includes a plurality of third portions HS2 along the first direction A1, and a plurality of fourth portions VS2 along the second direction A2. The third portion HS2 corresponds to the scan line 104, and the fourth portion VS2 corresponds to The data line 106, the third portion HS2 may correspond to the width of the at least one pixel 108 in the first direction A1, the fourth portion VS2 may correspond to the width of the at least one pixel 108 in the second direction A2, and the third portion HS2 and the fourth portion VS2 are connected to each other to form a second interval S6

In other embodiments, the setting of the first interval S5 and the second interval S6 is not limited to FIG. 8A, and may have two portions corresponding to the scan line 104 and the data line 106 only at the first interval S5 or the second interval S6. .

In some embodiments, the first interval S5 extending along the first direction A1 is corresponding to 3 to 10 scan lines 104, and the first interval S5 is spaced apart from the edge of the second direction A2 by the first portion HS1 by 3 to 10 scan lines. 104. And the second interval S6 extending along the second direction A2 corresponds to 3 to 10 data lines 106, and the second interval S6 is The two edges of the one direction A1, the fourth portion VS2, are spaced from 3 to 10 data lines 106.

Since the first interval S5 between the two sensing electrodes 112 is corresponding to the plurality of scanning lines 104, and the second spacing S6 is corresponding to the plurality of data lines 106, the edges of the sensing electrodes 112 also correspond to the plurality of scanning lines. 104 and/or a plurality of data lines 106 are disposed, so that the capacitance between the edge of the sensing electrode 112 and the scan line 104 or the data line 106 (also referred to as gate loading) can be equally divided into multiple scans. The line 104 and/or the plurality of data lines 106 can thereby make the plurality of scan lines 104 and/or the plurality of data lines 106 in a similar electric field environment, thereby reducing light leakage of the display device 800 and improving display quality.

FIG. 9A is a top view of a display device 900A according to another embodiment of the present disclosure. It should be noted that elements or layers that are the same or similar to those in the foregoing will be denoted by the same or similar reference numerals, and the materials, manufacturing methods and functions thereof are the same or similar to those described above, and therefore will not be described later. Narration.

As shown in FIG. 9A, the two adjacent sensing electrodes 112A and 112B are separated by a first interval S5 which is disposed outside the region corresponding to the main axis portion 104A of the scanning line 104. In other words, the sensing electrode 112A disposed corresponding to the main shaft portion 104A of the scanning line 104 completely covers the main shaft portion 104A.

By completely covering the main shaft portion 104A with the sensing electrode 112A, each of the main shaft portions 104A in the display device 900 can be placed in a similar electric field environment, so that light leakage of the display device 900 can be reduced and display quality can be improved.

Further, as shown in FIG. 9A, the upper edge 112AT of the sensing electrode 112A disposed corresponding to the main shaft portion 104A of the scanning line 104 is aligned with the upper edge 104AT of the main shaft portion 104A.

FIG. 9B is a top view of the display device 900B according to another embodiment of the present disclosure. Figure. The difference between the embodiment shown in FIG. 9B and the embodiment of FIG. 9A is that the upper edge 112AT of the sensing electrode 112A disposed corresponding to the main shaft portion 104A of the scanning line 104 is aligned with the upper edge 124T of the gate electrode 124.

It should be noted that if the sensing electrode 112A disposed corresponding to the main shaft portion 104A of the scanning line 104 does not completely cover the main shaft portion 104A, each of the main shaft portions 104A cannot be effectively placed in a similar electric field environment and the display quality is improved. However, if the upper edge 112AT of the sensing electrode 112A disposed corresponding to the main shaft portion 104A of the scanning line 104 exceeds the upper edge 124T of the gate electrode 124, the aperture ratio of the device is lowered.

In summary, the embodiment of the present disclosure is such that the sensing electrode and the sensing electrode edge are in a similar electric field environment, so that the capacitance formed in the sensing electrode and the sensing electrode edge and other components are similar, and the display is lowered. Light leakage from the device and improved display quality. On the other hand, since the portion where the sensing electrode 112 overlaps the scan line 104, the data line 106 or the touch signal line 118 is reduced, the parasitic capacitance between the sensing electrode 112 and the scan line 104 or the data line 106 is reduced. Can improve the image and touch performance of the product.

In addition, it should be noted that those skilled in the art are well aware that the drains and sources described herein are interchangeable because their definition is related to the voltage level to which they are connected.

It should be noted that the component sizes, component parameters, and component shapes described above are not limitations of the disclosure. Those of ordinary skill in the art can adjust these settings according to different needs. Further, the display device and the method of manufacturing the same according to the present disclosure are not limited to the state illustrated in FIGS. 1A-9B. The disclosure may include only any one or more of the features of any one or a plurality of embodiments of Figures 1A-9B. In other words, not all features of the illustrations must be implemented simultaneously in this disclosure. A display device and a method of manufacturing the same.

Although the embodiments of the present disclosure and its advantages are disclosed above, it should be understood that those skilled in the art can make changes, substitutions, and refinements without departing from the spirit and scope of the disclosure. In addition, the scope of the disclosure is not limited to the processes, machines, manufactures, compositions, devices, methods, and steps in the specific embodiments described in the specification, and those of ordinary skill in the art may disclose the disclosure It is understood that the processes, machines, manufactures, compositions, devices, methods, and procedures that are presently or in the future may be used in accordance with the present disclosure as long as they can perform substantially the same function or achieve substantially the same results in the embodiments described herein. Accordingly, the scope of protection of the present disclosure includes the above-described processes, machines, manufacturing, material compositions, devices, methods, and procedures. In addition, each patent application scope constitutes an individual embodiment, and the scope of protection of the disclosure also includes a combination of the scope of the patent application and the embodiments.

100‧‧‧ display device

102‧‧‧First substrate

104‧‧‧ scan line

106‧‧‧Information line

108‧‧‧ pixels

112‧‧‧Sensor electrode

112S‧‧‧ sensing electrodes

113‧‧‧Integrated circuit connection area

114‧‧‧ openings

116‧‧‧Connecting Department

118‧‧‧Touch signal line

120‧‧‧through hole

1B‧‧‧Area

A1‧‧‧ first direction

A2‧‧‧ second direction

CS‧‧‧Interlace

S5‧‧‧ first interval

S6‧‧‧Second interval

GS1‧‧‧first spacing

GS2‧‧‧second spacing

Claims (20)

A display device includes: a first substrate, the first substrate includes: a plurality of scan lines disposed on the first substrate; a plurality of data lines disposed on the first substrate, and the scan lines and the data The line defines a plurality of sub-pixels; a sensing electrode is disposed on the first substrate and has an opening; a second substrate disposed opposite to the first substrate; and a display medium disposed on the first substrate Between the second substrate and the second substrate, wherein the sensing electrode corresponds to at least two of the plurality of pixel settings, the opening corresponding to one of the scan lines or one of the data lines, wherein the sensing electrode At least a portion covers at least one of the sub-pixels. The display device of claim 1, wherein the sensing electrode has a plurality of sensing electrodes and a connecting portion, wherein the opening is located between the sub sensing electrodes, and the sub sensing electrodes are The connecting portions are electrically connected to each other. The display device of claim 2, wherein the connecting portion is disposed at a center of the sensing electrode. The display device of claim 2, wherein the connecting portion is disposed at an edge of the sensing electrode. The display device of claim 1, wherein the first substrate comprises: a plurality of thin film transistors respectively connected to the scan lines, the data lines and the sub-pixels; and a touch signal line, The sensing electrode is connected by a through hole. The display device of claim 2, wherein each of the sensing electrodes corresponds to at least two of the sub-pixel settings. The display device of claim 2, wherein a part of the sub-sense electrodes are disposed corresponding to one of the pixels, and the other portions of the sub-sense electrodes correspond to at least two of the times Picture setting. The display device of claim 1, wherein the scan line comprises a main shaft portion and a plurality of gate electrodes extending from the main shaft portion, wherein the sensing electrode has a plurality of openings, and the openings comprise a first a first direction opening and a second direction opening, wherein the first direction is an extending direction of the main shaft portion of the scanning line, and the second direction is an extending direction of the data line, wherein the first direction opening is correspondingly disposed on the two phases Between the gate electrodes adjacent to the gate electrode, wherein the second direction opening is disposed corresponding to one of the data lines. The display device of claim 8, further comprising: a plurality of touch signal lines disposed on the first substrate, wherein the second direction opening is disposed corresponding to one of the touch signal lines. The display device of claim 8, wherein the two adjacent sensing electrodes are separated by a first interval, and the first direction is opened in the second direction and the first The width is the same in the second direction. The display device of claim 8, wherein the two side edges of the first direction opening are respectively aligned with the two adjacent edges of the gate electrodes corresponding to the first direction opening. The display device of claim 8, wherein the second direction The opening is disposed between the main shaft portions of the two adjacent scan lines. The display device of claim 8, wherein the two adjacent sensing electrodes are separated by a second interval, and the width of the second direction opening in the first direction is different from the second interval. The width in the first direction is the same. The display device of claim 8, wherein the two side edges of the second direction opening are respectively aligned with the two adjacent edges of the scan lines corresponding to the second direction opening. The display device of claim 1, wherein the second substrate comprises a light shielding layer, and the two adjacent sensing electrodes are separated by a first interval, and the first spacer corresponds to the light shielding layer. Settings. The display device of claim 1, wherein the first interval extending along a first direction corresponds to the plurality of scan lines, wherein the first direction is an extension direction of the scan lines. The display device of claim 16, wherein the first interval corresponds to 3 to 10 of the scan line settings. The display device of claim 1, wherein the second interval extending in a second direction corresponds to the plurality of data lines, wherein the second direction is an extending direction of the data lines. The display device of claim 18, wherein the second interval corresponds to 3 to 10 of the data line settings. The display device of claim 1, wherein a ratio of an area of the sensing electrode to an area of the opening is between 1 and 9.