TWI581827B - Gas handling device - Google Patents
Gas handling device Download PDFInfo
- Publication number
- TWI581827B TWI581827B TW101148974A TW101148974A TWI581827B TW I581827 B TWI581827 B TW I581827B TW 101148974 A TW101148974 A TW 101148974A TW 101148974 A TW101148974 A TW 101148974A TW I581827 B TWI581827 B TW I581827B
- Authority
- TW
- Taiwan
- Prior art keywords
- gas
- water
- reactor
- water tank
- oxidizing gas
- Prior art date
Links
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 118
- 230000001590 oxidative effect Effects 0.000 claims description 48
- 238000005979 thermal decomposition reaction Methods 0.000 claims description 23
- 238000005406 washing Methods 0.000 claims description 2
- 239000007789 gas Substances 0.000 description 184
- 239000002002 slurry Substances 0.000 description 21
- 239000007787 solid Substances 0.000 description 16
- 238000004519 manufacturing process Methods 0.000 description 12
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 9
- 239000001257 hydrogen Substances 0.000 description 9
- 229910052739 hydrogen Inorganic materials 0.000 description 9
- 238000003860 storage Methods 0.000 description 8
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 7
- 238000002485 combustion reaction Methods 0.000 description 7
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 5
- 238000002347 injection Methods 0.000 description 5
- 239000007924 injection Substances 0.000 description 5
- 239000001301 oxygen Substances 0.000 description 5
- 229910052760 oxygen Inorganic materials 0.000 description 5
- 238000006243 chemical reaction Methods 0.000 description 4
- 239000007921 spray Substances 0.000 description 4
- 238000000354 decomposition reaction Methods 0.000 description 3
- 238000000034 method Methods 0.000 description 3
- 229910052757 nitrogen Inorganic materials 0.000 description 3
- 239000004065 semiconductor Substances 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- KZBUYRJDOAKODT-UHFFFAOYSA-N Chlorine Chemical compound ClCl KZBUYRJDOAKODT-UHFFFAOYSA-N 0.000 description 2
- BOTDANWDWHJENH-UHFFFAOYSA-N Tetraethyl orthosilicate Chemical compound CCO[Si](OCC)(OCC)OCC BOTDANWDWHJENH-UHFFFAOYSA-N 0.000 description 2
- 239000000498 cooling water Substances 0.000 description 2
- 238000001514 detection method Methods 0.000 description 2
- 238000001784 detoxification Methods 0.000 description 2
- 239000002360 explosive Substances 0.000 description 2
- 239000013505 freshwater Substances 0.000 description 2
- 238000012423 maintenance Methods 0.000 description 2
- 238000001179 sorption measurement Methods 0.000 description 2
- 238000009423 ventilation Methods 0.000 description 2
- CBENFWSGALASAD-UHFFFAOYSA-N Ozone Chemical compound [O-][O+]=O CBENFWSGALASAD-UHFFFAOYSA-N 0.000 description 1
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- 230000002159 abnormal effect Effects 0.000 description 1
- 230000005856 abnormality Effects 0.000 description 1
- 238000007664 blowing Methods 0.000 description 1
- 230000003197 catalytic effect Effects 0.000 description 1
- 229910000420 cerium oxide Inorganic materials 0.000 description 1
- 238000006757 chemical reactions by type Methods 0.000 description 1
- KYKAJFCTULSVSH-UHFFFAOYSA-N chloro(fluoro)methane Chemical compound F[C]Cl KYKAJFCTULSVSH-UHFFFAOYSA-N 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 239000000567 combustion gas Substances 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000000779 depleting effect Effects 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 229910001873 dinitrogen Inorganic materials 0.000 description 1
- 238000000407 epitaxy Methods 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 238000004518 low pressure chemical vapour deposition Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- HZVOZRGWRWCICA-UHFFFAOYSA-N methanediyl Chemical compound [CH2] HZVOZRGWRWCICA-UHFFFAOYSA-N 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 239000000178 monomer Substances 0.000 description 1
- BMMGVYCKOGBVEV-UHFFFAOYSA-N oxo(oxoceriooxy)cerium Chemical compound [Ce]=O.O=[Ce]=O BMMGVYCKOGBVEV-UHFFFAOYSA-N 0.000 description 1
- 230000002093 peripheral effect Effects 0.000 description 1
- 238000005268 plasma chemical vapour deposition Methods 0.000 description 1
- 238000003672 processing method Methods 0.000 description 1
- 239000003507 refrigerant Substances 0.000 description 1
- 150000003304 ruthenium compounds Chemical class 0.000 description 1
- 230000032258 transport Effects 0.000 description 1
- 238000011144 upstream manufacturing Methods 0.000 description 1
- 238000010792 warming Methods 0.000 description 1
Landscapes
- Treating Waste Gases (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2012066215A JP5540035B2 (ja) | 2012-03-22 | 2012-03-22 | ガス処理装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TW201338828A TW201338828A (zh) | 2013-10-01 |
| TWI581827B true TWI581827B (zh) | 2017-05-11 |
Family
ID=49185776
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW101148974A TWI581827B (zh) | 2012-03-22 | 2012-12-21 | Gas handling device |
Country Status (3)
| Country | Link |
|---|---|
| JP (1) | JP5540035B2 (ja) |
| CN (1) | CN103316561B (ja) |
| TW (1) | TWI581827B (ja) |
Families Citing this family (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR20170057329A (ko) | 2014-09-12 | 2017-05-24 | 어플라이드 머티어리얼스, 인코포레이티드 | 반도체 프로세싱 장비 유출물의 처리를 위한 제어기 |
| WO2018221067A1 (ja) * | 2017-05-29 | 2018-12-06 | カンケンテクノ株式会社 | 排ガスの減圧除害方法及びその装置 |
| KR101984814B1 (ko) * | 2017-08-31 | 2019-05-31 | 주식회사 에코에너젠 | Ipa를 포함하는 공정 배기 스트림의 처리 시스템 |
| KR102362761B1 (ko) * | 2017-11-22 | 2022-02-15 | 씨에스케이(주) | 가스 처리 장치 |
| CN109028102A (zh) * | 2018-06-27 | 2018-12-18 | 德淮半导体有限公司 | 气体的燃烧装置及其使用方法 |
| KR20210057154A (ko) * | 2018-11-06 | 2021-05-20 | 칸켄 테크노 가부시키가이샤 | 배기 가스 도입 노즐과 수처리 장치 및 배기 가스 처리 장치 |
| CN109821373B (zh) * | 2019-03-11 | 2020-09-01 | 中南大学 | 一种等离子体废气处理装置及方法 |
| JP7545317B2 (ja) * | 2020-12-21 | 2024-09-04 | 株式会社荏原製作所 | 処理ガス吸入構造および排ガス処理装置 |
| CN113041810B (zh) * | 2020-12-30 | 2022-08-30 | 北京京仪自动化装备技术股份有限公司 | 废气处理系统 |
| DE102021103365B4 (de) | 2021-02-12 | 2024-02-15 | Das Environmental Expert Gmbh | Verfahren und Brenner zur thermischen Entsorgung von Schadstoffen in Prozessgasen |
| CN116550103A (zh) * | 2023-03-08 | 2023-08-08 | 长春铭孚水处理技术有限公司 | 一种油田储罐呼吸阀配套用硫化氢气体吸收装置 |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6409802B1 (en) * | 1997-11-10 | 2002-06-25 | Ebara Corporation | Method for preventing scaling in wet-process waste gas treatment equipment |
| TW200900135A (en) * | 2007-01-30 | 2009-01-01 | Kanken Techno Co Ltd | Gas processing apparatus |
| TWM373236U (en) * | 2009-10-01 | 2010-02-01 | Jian Jia Technologies Co Ltd | Improved exhaust gas treatment device |
Family Cites Families (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2000334294A (ja) * | 1999-05-31 | 2000-12-05 | Shinmeiwa Auto Engineering Ltd | 代替フロンのプラズマアーク分解方法及び装置 |
| JP2001170479A (ja) * | 1999-12-16 | 2001-06-26 | Mitsubishi Heavy Ind Ltd | 有機ハロゲン化合物の分解処理装置 |
| JP2003144844A (ja) * | 2001-11-07 | 2003-05-20 | Mitsubishi Heavy Ind Ltd | 有機ハロゲン化合物の分解装置 |
| KR100647997B1 (ko) * | 2004-12-13 | 2006-11-23 | 유니셈 주식회사 | 폐가스 처리 장치 |
| JP2010023000A (ja) * | 2008-07-24 | 2010-02-04 | Kanken Techno Co Ltd | 排ガス除害装置 |
| JP4955027B2 (ja) * | 2009-04-02 | 2012-06-20 | クリーン・テクノロジー株式会社 | 排ガス処理装置における磁場によるプラズマの制御方法 |
-
2012
- 2012-03-22 JP JP2012066215A patent/JP5540035B2/ja active Active
- 2012-12-21 TW TW101148974A patent/TWI581827B/zh not_active IP Right Cessation
-
2013
- 2013-01-10 CN CN201310009031.9A patent/CN103316561B/zh active Active
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6409802B1 (en) * | 1997-11-10 | 2002-06-25 | Ebara Corporation | Method for preventing scaling in wet-process waste gas treatment equipment |
| TW200900135A (en) * | 2007-01-30 | 2009-01-01 | Kanken Techno Co Ltd | Gas processing apparatus |
| TWM373236U (en) * | 2009-10-01 | 2010-02-01 | Jian Jia Technologies Co Ltd | Improved exhaust gas treatment device |
Also Published As
| Publication number | Publication date |
|---|---|
| JP5540035B2 (ja) | 2014-07-02 |
| JP2013193069A (ja) | 2013-09-30 |
| TW201338828A (zh) | 2013-10-01 |
| CN103316561A (zh) | 2013-09-25 |
| CN103316561B (zh) | 2016-07-06 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| MM4A | Annulment or lapse of patent due to non-payment of fees |