TWI578103B - A radiation-sensitive resin composition, an insulating film, and a display device - Google Patents
A radiation-sensitive resin composition, an insulating film, and a display device Download PDFInfo
- Publication number
- TWI578103B TWI578103B TW103104275A TW103104275A TWI578103B TW I578103 B TWI578103 B TW I578103B TW 103104275 A TW103104275 A TW 103104275A TW 103104275 A TW103104275 A TW 103104275A TW I578103 B TWI578103 B TW I578103B
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- Taiwan
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- group
- substituent
- carbon atoms
- resin composition
- sensitive resin
- Prior art date
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- 230000005855 radiation Effects 0.000 title claims description 89
- 239000011342 resin composition Substances 0.000 title claims description 79
- -1 ester compound Chemical class 0.000 claims description 122
- 125000001424 substituent group Chemical group 0.000 claims description 116
- 125000004432 carbon atom Chemical group C* 0.000 claims description 79
- 150000001875 compounds Chemical class 0.000 claims description 58
- 229920005989 resin Polymers 0.000 claims description 52
- 239000011347 resin Substances 0.000 claims description 52
- 125000000217 alkyl group Chemical group 0.000 claims description 44
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims description 39
- 125000000623 heterocyclic group Chemical group 0.000 claims description 29
- 239000003999 initiator Substances 0.000 claims description 29
- 125000000962 organic group Chemical group 0.000 claims description 25
- 125000001931 aliphatic group Chemical group 0.000 claims description 24
- 125000002723 alicyclic group Chemical group 0.000 claims description 22
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 21
- 125000003983 fluorenyl group Chemical group C1(=CC=CC=2C3=CC=CC=C3CC12)* 0.000 claims description 19
- 229910052799 carbon Inorganic materials 0.000 claims description 18
- 125000001624 naphthyl group Chemical group 0.000 claims description 18
- 229910052736 halogen Inorganic materials 0.000 claims description 16
- 150000002367 halogens Chemical class 0.000 claims description 16
- 125000003545 alkoxy group Chemical group 0.000 claims description 15
- 125000003277 amino group Chemical group 0.000 claims description 15
- 125000003700 epoxy group Chemical group 0.000 claims description 15
- 125000000449 nitro group Chemical group [O-][N+](*)=O 0.000 claims description 15
- 125000000609 carbazolyl group Chemical group C1(=CC=CC=2C3=CC=CC=C3NC12)* 0.000 claims description 13
- 125000004093 cyano group Chemical group *C#N 0.000 claims description 13
- 125000004453 alkoxycarbonyl group Chemical group 0.000 claims description 11
- 125000005322 morpholin-1-yl group Chemical group 0.000 claims description 10
- 125000001326 naphthylalkyl group Chemical group 0.000 claims description 10
- 125000004923 naphthylmethyl group Chemical group C1(=CC=CC2=CC=CC=C12)C* 0.000 claims description 10
- 125000003884 phenylalkyl group Chemical group 0.000 claims description 10
- 125000000753 cycloalkyl group Chemical group 0.000 claims description 9
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 8
- 150000001732 carboxylic acid derivatives Chemical class 0.000 claims description 7
- 125000002915 carbonyl group Chemical group [*:2]C([*:1])=O 0.000 claims description 6
- 125000000000 cycloalkoxy group Chemical group 0.000 claims description 6
- 239000002253 acid Substances 0.000 claims description 5
- 229910052717 sulfur Inorganic materials 0.000 claims description 5
- 125000000649 benzylidene group Chemical group [H]C(=[*])C1=C([H])C([H])=C([H])C([H])=C1[H] 0.000 claims description 4
- 229910052760 oxygen Inorganic materials 0.000 claims description 4
- 125000000951 phenoxy group Chemical group [H]C1=C([H])C([H])=C(O*)C([H])=C1[H] 0.000 claims description 4
- 125000006678 phenoxycarbonyl group Chemical group 0.000 claims description 4
- 125000006612 decyloxy group Chemical group 0.000 claims description 3
- 125000005186 naphthyloxy group Chemical group C1(=CC=CC2=CC=CC=C12)O* 0.000 claims description 3
- 125000003356 phenylsulfanyl group Chemical group [*]SC1=C([H])C([H])=C([H])C([H])=C1[H] 0.000 claims description 2
- 125000002971 oxazolyl group Chemical group 0.000 claims 1
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 49
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 18
- 230000000052 comparative effect Effects 0.000 description 18
- HRPVXLWXLXDGHG-UHFFFAOYSA-N Acrylamide Chemical compound NC(=O)C=C HRPVXLWXLXDGHG-UHFFFAOYSA-N 0.000 description 17
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 15
- 239000000758 substrate Substances 0.000 description 13
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 11
- 238000011161 development Methods 0.000 description 10
- WGTYBPLFGIVFAS-UHFFFAOYSA-M tetramethylammonium hydroxide Chemical compound [OH-].C[N+](C)(C)C WGTYBPLFGIVFAS-UHFFFAOYSA-M 0.000 description 10
- 239000011248 coating agent Substances 0.000 description 9
- 238000000576 coating method Methods 0.000 description 9
- 238000000034 method Methods 0.000 description 9
- 239000000203 mixture Substances 0.000 description 8
- 229920001577 copolymer Polymers 0.000 description 7
- 238000011156 evaluation Methods 0.000 description 7
- 239000000243 solution Substances 0.000 description 7
- 239000002904 solvent Substances 0.000 description 7
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 6
- DNIAPMSPPWPWGF-UHFFFAOYSA-N Propylene glycol Chemical compound CC(O)CO DNIAPMSPPWPWGF-UHFFFAOYSA-N 0.000 description 6
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 5
- MWPLVEDNUUSJAV-UHFFFAOYSA-N anthracene Chemical compound C1=CC=CC2=CC3=CC=CC=C3C=C21 MWPLVEDNUUSJAV-UHFFFAOYSA-N 0.000 description 5
- 239000007864 aqueous solution Substances 0.000 description 5
- UHOVQNZJYSORNB-UHFFFAOYSA-N benzene Substances C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 5
- MTHSVFCYNBDYFN-UHFFFAOYSA-N diethylene glycol Chemical compound OCCOCCO MTHSVFCYNBDYFN-UHFFFAOYSA-N 0.000 description 5
- 125000002950 monocyclic group Chemical group 0.000 description 5
- 239000000178 monomer Substances 0.000 description 5
- JRZJOMJEPLMPRA-UHFFFAOYSA-N olefin Natural products CCCCCCCC=C JRZJOMJEPLMPRA-UHFFFAOYSA-N 0.000 description 5
- XHTUOWXUBNMVEU-UHFFFAOYSA-N 1-benzoyl-5-ethyl-5-(3-methylbutyl)-1,3-diazinane-2,4,6-trione Chemical group O=C1C(CC)(CCC(C)C)C(=O)NC(=O)N1C(=O)C1=CC=CC=C1 XHTUOWXUBNMVEU-UHFFFAOYSA-N 0.000 description 4
- VZCYOOQTPOCHFL-OWOJBTEDSA-N Fumaric acid Chemical compound OC(=O)\C=C\C(O)=O VZCYOOQTPOCHFL-OWOJBTEDSA-N 0.000 description 4
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 4
- 239000002585 base Substances 0.000 description 4
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 4
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 4
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 4
- 125000004663 dialkyl amino group Chemical group 0.000 description 4
- 150000002148 esters Chemical class 0.000 description 4
- 229910052757 nitrogen Inorganic materials 0.000 description 4
- LLHKCFNBLRBOGN-UHFFFAOYSA-N propylene glycol methyl ether acetate Chemical compound COCC(C)OC(C)=O LLHKCFNBLRBOGN-UHFFFAOYSA-N 0.000 description 4
- 230000035945 sensitivity Effects 0.000 description 4
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 4
- 238000002834 transmittance Methods 0.000 description 4
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 4
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- KWOLFJPFCHCOCG-UHFFFAOYSA-N Acetophenone Chemical compound CC(=O)C1=CC=CC=C1 KWOLFJPFCHCOCG-UHFFFAOYSA-N 0.000 description 3
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 3
- YLQBMQCUIZJEEH-UHFFFAOYSA-N Furan Chemical compound C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 3
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 3
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 3
- OFOBLEOULBTSOW-UHFFFAOYSA-N Propanedioic acid Natural products OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 150000001252 acrylic acid derivatives Chemical class 0.000 description 3
- 239000000654 additive Substances 0.000 description 3
- 230000000996 additive effect Effects 0.000 description 3
- 125000002947 alkylene group Chemical group 0.000 description 3
- 238000006243 chemical reaction Methods 0.000 description 3
- 125000001511 cyclopentyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C1([H])[H] 0.000 description 3
- 150000002170 ethers Chemical class 0.000 description 3
- 125000003055 glycidyl group Chemical group C(C1CO1)* 0.000 description 3
- 150000002430 hydrocarbons Chemical group 0.000 description 3
- RAXXELZNTBOGNW-UHFFFAOYSA-N imidazole Natural products C1=CNC=N1 RAXXELZNTBOGNW-UHFFFAOYSA-N 0.000 description 3
- 125000004108 n-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 3
- 125000000740 n-pentyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 3
- WXZMFSXDPGVJKK-UHFFFAOYSA-N pentaerythritol Chemical compound OCC(CO)(CO)CO WXZMFSXDPGVJKK-UHFFFAOYSA-N 0.000 description 3
- 125000003367 polycyclic group Chemical group 0.000 description 3
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 3
- PBMFSQRYOILNGV-UHFFFAOYSA-N pyridazine Chemical compound C1=CC=NN=C1 PBMFSQRYOILNGV-UHFFFAOYSA-N 0.000 description 3
- 238000000926 separation method Methods 0.000 description 3
- 239000007787 solid Substances 0.000 description 3
- 229920002554 vinyl polymer Polymers 0.000 description 3
- YXIWHUQXZSMYRE-UHFFFAOYSA-N 1,3-benzothiazole-2-thiol Chemical compound C1=CC=C2SC(S)=NC2=C1 YXIWHUQXZSMYRE-UHFFFAOYSA-N 0.000 description 2
- FCEHBMOGCRZNNI-UHFFFAOYSA-N 1-benzothiophene Chemical compound C1=CC=C2SC=CC2=C1 FCEHBMOGCRZNNI-UHFFFAOYSA-N 0.000 description 2
- OZAIFHULBGXAKX-UHFFFAOYSA-N 2-(2-cyanopropan-2-yldiazenyl)-2-methylpropanenitrile Chemical compound N#CC(C)(C)N=NC(C)(C)C#N OZAIFHULBGXAKX-UHFFFAOYSA-N 0.000 description 2
- SBASXUCJHJRPEV-UHFFFAOYSA-N 2-(2-methoxyethoxy)ethanol Chemical compound COCCOCCO SBASXUCJHJRPEV-UHFFFAOYSA-N 0.000 description 2
- JAHNSTQSQJOJLO-UHFFFAOYSA-N 2-(3-fluorophenyl)-1h-imidazole Chemical compound FC1=CC=CC(C=2NC=CN=2)=C1 JAHNSTQSQJOJLO-UHFFFAOYSA-N 0.000 description 2
- TXBCBTDQIULDIA-UHFFFAOYSA-N 2-[[3-hydroxy-2,2-bis(hydroxymethyl)propoxy]methyl]-2-(hydroxymethyl)propane-1,3-diol Chemical compound OCC(CO)(CO)COCC(CO)(CO)CO TXBCBTDQIULDIA-UHFFFAOYSA-N 0.000 description 2
- DZZAHLOABNWIFA-UHFFFAOYSA-N 2-butoxy-1,2-diphenylethanone Chemical compound C=1C=CC=CC=1C(OCCCC)C(=O)C1=CC=CC=C1 DZZAHLOABNWIFA-UHFFFAOYSA-N 0.000 description 2
- VUIWJRYTWUGOOF-UHFFFAOYSA-N 2-ethenoxyethanol Chemical compound OCCOC=C VUIWJRYTWUGOOF-UHFFFAOYSA-N 0.000 description 2
- ZNQVEEAIQZEUHB-UHFFFAOYSA-N 2-ethoxyethanol Chemical compound CCOCCO ZNQVEEAIQZEUHB-UHFFFAOYSA-N 0.000 description 2
- 125000000954 2-hydroxyethyl group Chemical group [H]C([*])([H])C([H])([H])O[H] 0.000 description 2
- UJOBWOGCFQCDNV-UHFFFAOYSA-N 9H-carbazole Chemical compound C1=CC=C2C3=CC=CC=C3NC2=C1 UJOBWOGCFQCDNV-UHFFFAOYSA-N 0.000 description 2
- FERIUCNNQQJTOY-UHFFFAOYSA-N Butyric acid Chemical compound CCCC(O)=O FERIUCNNQQJTOY-UHFFFAOYSA-N 0.000 description 2
- PEDCQBHIVMGVHV-UHFFFAOYSA-N Glycerol Natural products OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 description 2
- OAKJQQAXSVQMHS-UHFFFAOYSA-N Hydrazine Chemical compound NN OAKJQQAXSVQMHS-UHFFFAOYSA-N 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- QIGBRXMKCJKVMJ-UHFFFAOYSA-N Hydroquinone Chemical compound OC1=CC=C(O)C=C1 QIGBRXMKCJKVMJ-UHFFFAOYSA-N 0.000 description 2
- FFOPEPMHKILNIT-UHFFFAOYSA-N Isopropyl butyrate Chemical compound CCCC(=O)OC(C)C FFOPEPMHKILNIT-UHFFFAOYSA-N 0.000 description 2
- UFWIBTONFRDIAS-UHFFFAOYSA-N Naphthalene Chemical compound C1=CC=CC2=CC=CC=C21 UFWIBTONFRDIAS-UHFFFAOYSA-N 0.000 description 2
- ATUOYWHBWRKTHZ-UHFFFAOYSA-N Propane Chemical compound CCC ATUOYWHBWRKTHZ-UHFFFAOYSA-N 0.000 description 2
- KYQCOXFCLRTKLS-UHFFFAOYSA-N Pyrazine Chemical compound C1=CN=CC=N1 KYQCOXFCLRTKLS-UHFFFAOYSA-N 0.000 description 2
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 2
- KAESVJOAVNADME-UHFFFAOYSA-N Pyrrole Chemical compound C=1C=CNC=1 KAESVJOAVNADME-UHFFFAOYSA-N 0.000 description 2
- LOUPRKONTZGTKE-WZBLMQSHSA-N Quinine Chemical compound C([C@H]([C@H](C1)C=C)C2)C[N@@]1[C@@H]2[C@H](O)C1=CC=NC2=CC=C(OC)C=C21 LOUPRKONTZGTKE-WZBLMQSHSA-N 0.000 description 2
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 2
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 2
- YTPLMLYBLZKORZ-UHFFFAOYSA-N Thiophene Chemical compound C=1C=CSC=1 YTPLMLYBLZKORZ-UHFFFAOYSA-N 0.000 description 2
- ZJCCRDAZUWHFQH-UHFFFAOYSA-N Trimethylolpropane Chemical compound CCC(CO)(CO)CO ZJCCRDAZUWHFQH-UHFFFAOYSA-N 0.000 description 2
- QYKIQEUNHZKYBP-UHFFFAOYSA-N Vinyl ether Chemical class C=COC=C QYKIQEUNHZKYBP-UHFFFAOYSA-N 0.000 description 2
- MPIAGWXWVAHQBB-UHFFFAOYSA-N [3-prop-2-enoyloxy-2-[[3-prop-2-enoyloxy-2,2-bis(prop-2-enoyloxymethyl)propoxy]methyl]-2-(prop-2-enoyloxymethyl)propyl] prop-2-enoate Chemical compound C=CC(=O)OCC(COC(=O)C=C)(COC(=O)C=C)COCC(COC(=O)C=C)(COC(=O)C=C)COC(=O)C=C MPIAGWXWVAHQBB-UHFFFAOYSA-N 0.000 description 2
- 150000008065 acid anhydrides Chemical class 0.000 description 2
- 150000001335 aliphatic alkanes Chemical class 0.000 description 2
- 239000003513 alkali Substances 0.000 description 2
- 239000002518 antifoaming agent Substances 0.000 description 2
- 125000004429 atom Chemical group 0.000 description 2
- PXXJHWLDUBFPOL-UHFFFAOYSA-N benzamidine Chemical compound NC(=N)C1=CC=CC=C1 PXXJHWLDUBFPOL-UHFFFAOYSA-N 0.000 description 2
- ISAOCJYIOMOJEB-UHFFFAOYSA-N benzoin Chemical compound C=1C=CC=CC=1C(O)C(=O)C1=CC=CC=C1 ISAOCJYIOMOJEB-UHFFFAOYSA-N 0.000 description 2
- IOJUPLGTWVMSFF-UHFFFAOYSA-N benzothiazole Chemical compound C1=CC=C2SC=NC2=C1 IOJUPLGTWVMSFF-UHFFFAOYSA-N 0.000 description 2
- DKPFZGUDAPQIHT-UHFFFAOYSA-N butyl acetate Chemical compound CCCCOC(C)=O DKPFZGUDAPQIHT-UHFFFAOYSA-N 0.000 description 2
- XUPYJHCZDLZNFP-UHFFFAOYSA-N butyl butanoate Chemical compound CCCCOC(=O)CCC XUPYJHCZDLZNFP-UHFFFAOYSA-N 0.000 description 2
- HNEGQIOMVPPMNR-IHWYPQMZSA-N citraconic acid Chemical compound OC(=O)C(/C)=C\C(O)=O HNEGQIOMVPPMNR-IHWYPQMZSA-N 0.000 description 2
- 229940018557 citraconic acid Drugs 0.000 description 2
- LDHQCZJRKDOVOX-NSCUHMNNSA-N crotonic acid Chemical compound C\C=C\C(O)=O LDHQCZJRKDOVOX-NSCUHMNNSA-N 0.000 description 2
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 2
- 125000004386 diacrylate group Chemical group 0.000 description 2
- 238000004090 dissolution Methods 0.000 description 2
- 238000001035 drying Methods 0.000 description 2
- 125000001301 ethoxy group Chemical group [H]C([H])([H])C([H])([H])O* 0.000 description 2
- 125000003754 ethoxycarbonyl group Chemical group C(=O)(OCC)* 0.000 description 2
- LZCLXQDLBQLTDK-UHFFFAOYSA-N ethyl 2-hydroxypropanoate Chemical compound CCOC(=O)C(C)O LZCLXQDLBQLTDK-UHFFFAOYSA-N 0.000 description 2
- BHXIWUJLHYHGSJ-UHFFFAOYSA-N ethyl 3-ethoxypropanoate Chemical compound CCOCCC(=O)OCC BHXIWUJLHYHGSJ-UHFFFAOYSA-N 0.000 description 2
- XLLIQLLCWZCATF-UHFFFAOYSA-N ethylene glycol monomethyl ether acetate Natural products COCCOC(C)=O XLLIQLLCWZCATF-UHFFFAOYSA-N 0.000 description 2
- 239000001530 fumaric acid Substances 0.000 description 2
- 238000005227 gel permeation chromatography Methods 0.000 description 2
- 150000004820 halides Chemical class 0.000 description 2
- CATSNJVOTSVZJV-UHFFFAOYSA-N heptan-2-one Chemical compound CCCCCC(C)=O CATSNJVOTSVZJV-UHFFFAOYSA-N 0.000 description 2
- 239000003112 inhibitor Substances 0.000 description 2
- 230000002401 inhibitory effect Effects 0.000 description 2
- MLFHJEHSLIIPHL-UHFFFAOYSA-N isoamyl acetate Chemical compound CC(C)CCOC(C)=O MLFHJEHSLIIPHL-UHFFFAOYSA-N 0.000 description 2
- 125000002510 isobutoxy group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])O* 0.000 description 2
- 125000000959 isobutyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])* 0.000 description 2
- 239000004973 liquid crystal related substance Substances 0.000 description 2
- VZCYOOQTPOCHFL-UPHRSURJSA-N maleic acid Chemical compound OC(=O)\C=C/C(O)=O VZCYOOQTPOCHFL-UPHRSURJSA-N 0.000 description 2
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- FPYJFEHAWHCUMM-UHFFFAOYSA-N maleic anhydride Chemical compound O=C1OC(=O)C=C1 FPYJFEHAWHCUMM-UHFFFAOYSA-N 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- LPEKGGXMPWTOCB-UHFFFAOYSA-N methyl 2-hydroxypropionate Chemical compound COC(=O)C(C)O LPEKGGXMPWTOCB-UHFFFAOYSA-N 0.000 description 2
- 125000001570 methylene group Chemical group [H]C([H])([*:1])[*:2] 0.000 description 2
- LVHBHZANLOWSRM-UHFFFAOYSA-N methylenebutanedioic acid Natural products OC(=O)CC(=C)C(O)=O LVHBHZANLOWSRM-UHFFFAOYSA-N 0.000 description 2
- 238000002156 mixing Methods 0.000 description 2
- 125000004433 nitrogen atom Chemical group N* 0.000 description 2
- 125000002868 norbornyl group Chemical group C12(CCC(CC1)C2)* 0.000 description 2
- 125000002347 octyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 2
- 239000003960 organic solvent Substances 0.000 description 2
- HVAMZGADVCBITI-UHFFFAOYSA-M pent-4-enoate Chemical compound [O-]C(=O)CCC=C HVAMZGADVCBITI-UHFFFAOYSA-M 0.000 description 2
- FDPIMTJIUBPUKL-UHFFFAOYSA-N pentan-3-one Chemical compound CCC(=O)CC FDPIMTJIUBPUKL-UHFFFAOYSA-N 0.000 description 2
- 125000001147 pentyl group Chemical group C(CCCC)* 0.000 description 2
- 125000001148 pentyloxycarbonyl group Chemical group 0.000 description 2
- 239000003505 polymerization initiator Substances 0.000 description 2
- 239000011148 porous material Substances 0.000 description 2
- YKYONYBAUNKHLG-UHFFFAOYSA-N propyl acetate Chemical compound CCCOC(C)=O YKYONYBAUNKHLG-UHFFFAOYSA-N 0.000 description 2
- 125000004805 propylene group Chemical group [H]C([H])([H])C([H])([*:1])C([H])([H])[*:2] 0.000 description 2
- 229930195734 saturated hydrocarbon Natural products 0.000 description 2
- 125000006850 spacer group Chemical group 0.000 description 2
- 238000003756 stirring Methods 0.000 description 2
- 150000003440 styrenes Chemical class 0.000 description 2
- 239000004094 surface-active agent Substances 0.000 description 2
- 125000000383 tetramethylene group Chemical group [H]C([H])([*:1])C([H])([H])C([H])([H])C([H])([H])[*:2] 0.000 description 2
- 238000012719 thermal polymerization Methods 0.000 description 2
- LDHQCZJRKDOVOX-UHFFFAOYSA-N trans-crotonic acid Natural products CC=CC(O)=O LDHQCZJRKDOVOX-UHFFFAOYSA-N 0.000 description 2
- 229920001567 vinyl ester resin Polymers 0.000 description 2
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- 125000005448 ethoxyethyl group Chemical group [H]C([H])([H])C([H])([H])OC([H])([H])C([H])([H])* 0.000 description 1
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Classifications
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- G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
- G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
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- C08F2/00—Processes of polymerisation
- C08F2/46—Polymerisation initiated by wave energy or particle radiation
- C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
- C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
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- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
- C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
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- G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
- G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
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Description
本發明關於一種感放射線性樹脂組成物、使用該感放射線性樹脂組成物而形成的絕緣膜、及具備該絕緣膜之顯示裝置。
於如液晶顯示裝置之顯示裝置中,如絕緣膜或間隔件之材料,需要使由如背光源這樣的光源所發出的光高效地透過。因此,使用利用曝光而提供透明的硬化膜之感放射線性樹脂組成物(感光性樹脂組成物),以形成絕緣膜或間隔件的圖案。藉由將此種感放射線性樹脂組成物選擇性地曝光,可形成透明的硬化膜的圖案。
作為可形成透明的硬化膜之感放射線性樹脂組成物(感光性樹脂組成物),提出一種例如包含樹脂、聚合性化合物、特定結構的聚合引發劑及溶劑之組成物(專利文獻1)。具體而言,於專利文獻1的實施例中,揭示出一種感放射線性樹脂組成物,其包含甲基丙烯酸與具有脂環式環氧基之丙烯酸酯的共聚物、二季戊四醇六丙烯酸酯、由下式所表示之聚合引發劑、及由3-甲氧基-1-丁醇、丙二醇單甲醚乙酸酯、3-乙氧基丙酸乙酯及3-甲氧基乙酸丁酯所構成之混合溶劑。
專利文獻1:日本特開2012-58728號公報
然而,使用專利文獻1所記載的感放射線性樹脂組成物而形成的硬化膜,其透明性並不充分。又,在將專利文獻1所記載的感放射性樹脂組成物的塗膜曝光之後,利用如氫氧化四甲銨的水溶液之鹼性顯影液將塗膜顯影時,應殘留的曝光部會過度溶解,難以形成所需形狀的圖案。
本發明是鑒於上述問題而完成,其目的在於提供一種感放射線性樹脂組成物、使用該感放射線性樹脂組成物而形成的絕緣膜及具備該絕緣膜之顯示裝置,其中,該感放射線性樹脂組成物提供透明性優異的硬化膜,並於曝光後的顯
影時抑制曝光部的過度溶解。
本發明人發現,藉由向感放射性樹脂組成物中,調配(A)鹼可溶性樹脂、(B)光聚合性化合物及(C)光聚合引發劑,可解決上述問題,從而完成本發明;其中,該(A)鹼可溶性樹脂是由包含(a1)來自於不飽和羧酸之單元、與(a2)來自於不飽和化合物之單元之共聚物所構成,該不飽和化合物含有不具有環氧基之脂環式骨架;該(C)光聚合引發劑包含特定結構的肟酯化合物。
本發明的第一態樣是一種感放射線性樹脂組成物,其包含(A)鹼可溶性樹脂、(B)光聚合性化合物及(C)光聚合引發劑;前述(A)鹼可溶性樹脂,包含(a1)來自於不飽和羧酸之單元、與(a2)來自於不飽和化合物之單元,該不飽和化合物含有不具有環氧基之脂環式骨架;前述(C)光聚合引發劑,包含由下述式(1)所表示之肟酯化合物,
(R1為選自由1價的有機基團、胺基、鹵素、硝基及氰基所組成之群組中的基團,m為0~4的整數,p為0或1,R2為亦可具有取代基之苯基或亦可具有取代基之咔唑基,R3為
氫原子或碳數1~6的烷基)。
本發明的第二態樣,是一種絕緣膜,其使用第一態樣的感放射線性樹脂組成物而形成。
本發明的第三態樣,是一種顯示裝置,其具備第二態樣的絕緣膜。
根據本發明,可提供一種感放射線性樹脂組成物、使用該感放射線性樹脂組成物而形成的絕緣膜及具備該絕緣膜之顯示裝置,其中,該感放射線性樹脂組成物提供透明性優異的硬化膜,並於曝光後的顯影時抑制曝光部的過度溶解。
《感放射線性樹脂組成物》
本發明的感放射線性樹脂組成物,含有:(A)鹼可溶性樹脂,其包含特定的單元;(B)光聚合性化合物;及,(C)光聚合引發劑,其包含特定結構的肟酯化合物。以下,說明感放射線性樹脂組成物中所含有的各成分。
<(A)鹼可溶性樹脂>
(A)鹼可溶性樹脂,是指利用樹脂濃度20質量%的樹脂溶液(溶劑:丙二醇單甲醚乙酸酯),於基板上形成膜厚1μm的樹脂膜,當在23℃浸漬於2.38質量%的氫氧化四甲銨(Tetramethylammonium Hydroxide,TMAH)水溶液中1分鐘時,膜厚溶解0.01μm以上者。
作為(A)鹼可溶性樹脂,使用包含以下單元之共聚物:(a1)來自於不飽和羧酸之單元(以下,亦記為(a1)單元)、與(a2)來自於不飽和化合物之單元(以下,亦記為(a2)單元),該不飽和化合物含有不具有環氧基之脂環式骨架。藉由使用包含(a1)單元與(a2)單元之(A)鹼可溶性樹脂,易於獲得以下感放射線性樹脂組成物:提供透明性優異的硬化膜,並於曝光後的顯影時抑制曝光部的過度溶解。
作為(A)成分而使用之樹脂,若為包含(a1)單元與(a2)單元之樹脂,則並無特別限定,可自以往各種感放射線性樹脂組成物中所使用的鹼可溶性樹脂適當選擇並使用。
作為生成(a1)單元之不飽和羧酸,可列舉:(甲基)丙烯酸、巴豆酸等單羧酸;馬來酸、富馬酸、檸康酸、中康酸及伊康酸等二羧酸;及,該等二羧酸的酐等。其中,自共聚反應性、所獲得之樹脂的鹼溶性及取得的容易性等方面來看,較佳為(甲基)丙烯酸和馬來酸酐。(A)鹼可溶性樹脂亦可包含組合2種以上的由該等不飽和羧酸所衍生的(a1)單元。
(a2)單元,若為來自於不飽和化合物之單元(該不飽和化合物含有不具有環氧基之脂環式骨架),則並無特別限定。脂環式骨架可為單環亦可為多環。作為含有脂環式骨架之不飽和化合物中所包含之單環的脂環式基團,可列舉環戊基、環己基等。又,作為多環的脂環式基團,可列舉金剛烷基、降莰基、異莰基、三環壬基、三環癸基及四環十二烷基等。(A)鹼可溶性樹脂亦可包含組合2種以上的(a2)單元。
作為提供(a2)單元之不飽和化合物(該不飽和化合物
含有不具有環氧基之脂環式基團),可列舉例如由下述式(a2-1)~(a2-7)所表示之化合物。於該等中,自易於獲得顯影性良好的感放射線性樹脂組成物之方面來看,較佳為由下述式(a2-3)~(a2-8)所表示之化合物,更佳為由下述式(a2-3)或(a2-4)所表示之化合物。
上述式中,Ra1表示氫原子或甲基,Ra2表示單鍵或碳數1~6的2價的脂肪族飽和烴基,Ra3表示氫原子或碳數1~5的烷基。作為Ra2,較佳為單鍵、直連狀或支鏈狀的亞烷基(伸烷基),例如為亞甲基、亞乙基、亞丙基、四亞甲基、乙基亞乙基(ethyl ethylene group)、五亞甲基、六亞甲基。作為Ra3,較佳為甲基、乙基。
又,較佳為,(A)鹼可溶性樹脂不僅包含(a1)單元和(a2)單元,亦包含(a3)來自於含有脂環式環氧基之不飽和化合物之單元(以下,亦記為(a3)單元)。於(A)鹼可溶性樹脂包含(a3)單元之情況下,當將使用感放射線性樹脂組成物而形成的塗佈膜曝光後,進行後烘乾時,易於抑制塗佈膜的過度的形狀變化。
於(a3)單元中,構成脂環式環氧基之脂環式基團,
可為單環亦可為多環。作為單環的脂環式基團,可列舉環戊基、環己基等。又,作為多環的脂環式基團,可列舉降莰基、異莰基、三環壬基、三環癸基及四環十二烷基等。(A)鹼可溶性樹脂亦可將(a3)單元組合2種以上來包含。
作為提供(a3)單元之不飽和化合物(該不飽和化合物含有脂環式環氧基)的具體例,可列舉例如由下述式(a3-1)~(a3-16)所表示之化合物。其中,為了使感放射性樹脂組成物的顯影性為適當的程度,較佳為由下述式(a3-1)~(a3-6)所表示之化合物,更佳為由下述式(a3-1)~(a3-4)所表示之化合物。
上述式中,Ra4表示氫原子或甲基,Ra5表示碳數1~6的2價的脂肪族飽和烴基,Ra6表示碳數1~10的2價的烴基,n表示0~10的整數。作為Ra5,較佳為直連狀或支鏈狀的亞烷基,例如為亞甲基、亞乙基、亞丙基、四亞甲基、乙基亞乙基、五亞甲基及六亞甲基。作為R13,較佳為例如亞甲基、亞乙基、亞丙基、四亞甲基、乙基亞乙基、五亞甲基、六亞甲基、亞苯基、亞環己基及-CH2-Ph-CH2-(Ph表示亞苯基)。
(A)鹼可溶性樹脂亦可包含上述(a1)單元、(a2)單元及(a3)單元以外之單元。作為提供上述單元以外之單元之化合物,可列舉(甲基)丙烯酸酯類、(甲基)丙烯醯胺類、烯丙化合
物、乙烯醚類、乙烯酯類、苯乙烯類及含有不具有脂環式基團之環氧基之不飽和化合物等。該等化合物可單獨使用,或組合2種以上使用。
作為(甲基)丙烯酸酯類,可列舉:(甲基)丙烯酸甲酯、(甲基)丙烯酸乙酯、(甲基)丙烯酸丙酯、(甲基)丙烯酸戊酯及(甲基)丙烯酸三級辛酯等直連狀或支鏈狀的(甲基)丙烯酸烷基酯;(甲基)丙烯酸氯乙酯、2,2-二甲基羥基(甲基)丙烯酸丙酯、(甲基)丙烯酸2-羥乙酯、三羥甲基丙烷單(甲基)丙烯酸酯、(甲基)丙烯酸苄酯及(甲基)丙烯酸糠酯等。
作為(甲基)丙烯醯胺類,可列舉:(甲基)丙烯醯胺、N-烷基(甲基)丙烯醯胺、N-芳基(甲基)丙烯醯胺、N,N-二烷基(甲基)丙烯醯胺、N,N-芳基(甲基)丙烯醯胺、N-甲基-N-苯基(甲基)丙烯醯胺及N-羥乙基-N-甲基(甲基)丙烯醯胺等。
作為烯丙化合物,可列舉:乙酸烯丙酯、己酸烯丙酯、辛酸烯丙酯、月桂酸烯丙酯、棕櫚酸烯丙酯、硬脂酸烯丙酯、苯甲酸烯丙酯、乙醯乙酸烯丙酯及乳酸烯丙酯等烯丙酯類;及,烯丙氧基乙醇等。
作為乙烯醚類,可列舉:己基乙烯醚、辛基乙烯醚、癸基乙烯醚、乙基己基乙烯醚、甲氧基乙基乙烯醚、乙氧基乙基乙烯醚、氯乙基乙烯醚、1-甲基-2,2-二甲基丙基乙烯醚、2-乙基丁基乙烯醚、羥乙基乙烯醚、二乙二醇乙烯醚、二甲基氨乙基乙烯醚、二乙基氨乙基乙烯醚、丁基氨乙基乙烯醚、苄基乙烯醚、四氫化糠基乙烯醚等烷基乙烯醚;及,乙烯基苯基醚、乙烯基甲苯基醚、乙烯基氯苯醚、乙烯基-2,4-二氯
苯醚、乙烯基萘基醚、乙烯基蒽醚等乙烯基芳基醚等。
作為乙烯酯類,可列舉:丁酸乙烯酯、異丁酸乙烯酯、三甲基乙酸乙烯酯、二乙基乙酸乙烯酯、戊酸乙烯酯、己酸乙烯酯、氯乙酸乙烯酯、二氯乙酸乙烯酯、甲氧基乙酸乙烯酯、丁氧基乙酸乙烯酯、乙烯基乙酸苯酯、乙醯乙酸乙烯酯、乳酸乙烯酯、乙烯基-β-丁酸苯酯、苯甲酸乙烯酯、水楊酸乙烯酯、氯苯甲酸乙烯酯、四氯苯甲酸乙烯酯及萘甲酸乙烯酯等。
作為苯乙烯類,可列舉:苯乙烯;甲基苯乙烯、二甲基苯乙烯、三甲基苯乙烯、乙基苯乙烯、二乙基苯乙烯、異丙基苯乙烯、丁基苯乙烯、己基苯乙烯、環己基苯乙烯、癸基苯乙烯、苄基苯乙烯、氯甲基苯乙烯、三氟甲基苯乙烯、乙氧基甲基苯乙烯及乙醯氧基甲基苯乙烯等烷基苯乙烯;甲氧基苯乙烯、4-甲氧基-3-甲基苯乙烯及二甲氧基苯乙烯等烷氧基苯乙烯;及,氯苯乙烯、二氯苯乙烯、三氯苯乙烯、四氯苯乙烯、五氯苯乙烯、溴苯乙烯、二溴苯乙烯、碘苯乙烯、氟苯乙烯、三氟苯乙烯、2-溴-4-三氟甲基苯乙烯、4-氟-3-三氟甲基苯乙烯等鹵代苯乙烯等。
作為含有不具有脂環式基團之環氧基之不飽和化合物,可列舉:(甲基)丙烯酸縮水甘油酯、(甲基)丙烯酸2-甲基縮水甘油酯、(甲基)丙烯酸3,4-環氧丁酯及(甲基)丙烯酸6,7-環氧庚酯等(甲基)丙烯酸環氧烷基酯類;α-乙基丙烯酸縮水甘油酯、α-正丙基丙烯酸縮水甘油酯、α-正丁基丙烯酸縮水甘油酯及α-乙基丙烯酸6,7-環氧庚酯等α-烷基丙烯酸環氧
烷基酯類等。於該等中,較佳為(甲基)丙烯酸縮水甘油酯、(甲基)丙烯酸2-甲基縮水甘油酯及(甲基)丙烯酸6,7-環氧庚酯。
上述(a1)單元、上述(a2)單元及上述(a3)單元於(A)鹼可溶性樹脂也就是共聚物中所佔之比例,於不妨礙本發明的目的之範圍內並無特別限定。上述(a1)單元於(A)鹼可溶性樹脂也就是共聚物中所佔之比例,較佳為5~25質量%,更佳為8~16質量%。上述(a2)單元於(A)鹼可溶性樹脂也就是共聚物中所佔之比例,較佳為10~50質量%,更佳為11~30質量%。上述(a3)單元於(A)鹼可溶性樹脂也就是共聚物中所佔之比例,較佳為10~70質量%,更佳為15~50質量%。
(A)鹼可溶性樹脂的質量平均分子量(Mw:利用凝膠滲透層析法(Gel Permeation Chromatography,GPC)的苯乙烯換算所獲得之測定值;於本說明書中相同。),較佳為2000~200000,更佳為2000~18000,尤其較佳為3000~15000。藉由使用質量平均分子量處於上述範圍內之(A)鹼可溶性樹脂,易於使感放射線性樹脂組成物的曝光後的顯影性尤其優異。
(A)鹼可溶性樹脂可利用公知的自由基聚合法來製造。也就是說,可藉由在將提供以上所說明的單元之單體與公知的自由基聚合引發劑溶解於聚合溶劑後,進行加熱攪拌來製造。
<(B)光聚合性化合物>
作為感放射線性樹脂組成物中所含有的(B)光聚合性化合物(以下,亦記為(B)成分),可較佳為使用具有乙烯性不飽
和基團之化合物。於此具有乙烯性不飽和基團之化合物中,存在單官能化合物與多官能化合物。
作為單官能化合物,可列舉:(甲基)丙烯醯胺、羥甲基(甲基)丙烯醯胺、甲氧基甲基(甲基)丙烯醯胺、乙氧基甲基(甲基)丙烯醯胺、丙氧基甲基(甲基)丙烯醯胺、丁氧基甲氧基甲基(甲基)丙烯醯胺、N-羥甲基(甲基)丙烯醯胺、N-羥基甲基(甲基)丙烯醯胺、(甲基)丙烯酸、富馬酸、馬來酸、馬來酸酐、伊康酸、伊康酸酐、檸康酸、檸康酸酐、巴豆酸、2-丙烯醯胺-2-甲基丙烷磺酸、三級丁基丙烯醯胺磺酸、(甲基)丙烯酸甲酯、(甲基)丙烯酸乙酯、(甲基)丙烯酸丁酯、(甲基)丙烯酸2-乙基己酯、(甲基)丙烯酸環己酯、(甲基)丙烯酸2-羥乙酯、(甲基)丙烯酸2-羥丙酯、(甲基)丙烯酸2-羥丁酯、2-苯氧基-(甲基)丙烯酸2-羥丙酯、2-(甲基)丙烯醯氧基-2-羥基丙基鄰苯二甲酸酯、單(甲基)丙烯酸甘油酯、(甲基)丙烯酸四氫糠酯、(甲基)丙烯酸二甲胺基酯、(甲基)丙烯酸縮水甘油酯、(甲基)丙烯酸2,2,2-三氟乙酯、(甲基)丙烯酸2,2,3,3-四氟丙酯及鄰苯二甲酸衍生物的半(甲基)丙烯酸酯等。該等單官能單體可單獨使用,或組合2種以上使用。
另一方面,作為多官能單體,可列舉:乙二醇二(甲基)丙烯酸酯、二乙二醇二(甲基)丙烯酸酯、四乙二醇二(甲基)丙烯酸酯、丙二醇二(甲基)丙烯酸酯、聚丙二醇二(甲基)丙烯酸酯、丁二醇二(甲基)丙烯酸酯、新戊二醇二(甲基)丙烯酸酯、1,6-己二醇二(甲基)丙烯酸酯、三羥甲基丙烷三(甲基)丙烯酸酯、二(甲基)丙烯酸甘油酯、季戊四醇三丙烯酸酯、季戊
四醇四丙烯酸酯、二季戊四醇五丙烯酸酯、二季戊四醇六丙烯酸酯、季戊四醇二(甲基)丙烯酸酯、季戊四醇三(甲基)丙烯酸酯、季戊四醇四(甲基)丙烯酸酯、二季戊四醇五(甲基)丙烯酸酯、二季戊四醇六(甲基)丙烯酸酯、2,2-雙(4-(甲基)丙烯醯氧基二乙氧基苯基)丙烷、2,2-雙(4-(甲基)丙烯醯氧基聚乙氧基苯基)丙烷、2-羥基-3-(甲基)丙烯醯氧基丙基(甲基)丙烯酸酯、乙二醇二縮水甘油醚二(甲基)丙烯酸酯、二乙二醇二縮水甘油醚二(甲基)丙烯酸酯、鄰苯二甲酸二縮水甘油酯二(甲基)丙烯酸酯、三丙烯酸甘油酯、聚縮水甘油醚聚(甲基)丙烯酸甘油酯、氨酯(甲基)丙烯酸酯(也就是,甲苯二異氰酸酯)、三甲基六亞甲基二異氰酸酯和六亞甲基二異氰酸酯等與(甲基)丙烯酸2-羥乙酯的反應物、亞甲基雙(甲基)丙烯醯胺、(甲基)丙烯醯胺亞甲基醚、多元醇與N-羥甲基(甲基)丙烯醯胺的縮合物、三丙烯醯基縮甲醛(Triacrylformal)、2,4,6-三氧代六氫-1,3,5-三嗪-1,3,5-三乙醇三丙烯酸酯、及2,4,6-三氧代六氫-1,3,5-三嗪-1,3,5-三乙醇二丙烯酸酯等。該等多官能單體可單獨使用,或組合2種以上使用。
於該等具有乙烯性不飽和基團之化合物中,自可獲得提供強度、與對基板的密接性優異的硬化物之感放射線性樹脂組成物之方面來看,較佳為3官能以上的多官能單體。
(B)成分的含量,相對於感放射線性樹脂組成物的固體成分,較佳為5~60質量%,更佳為10~50質量%。藉由使感放射線性樹脂組成物中的(B)成分的含量為上述範圍,存在易於使感放射線性樹脂組成物的敏感度、顯影性及解析度
保持平衡之趨勢。
<(C)光聚合性化合物>
感放射線性樹脂組成物,含有下述結構的肟酯化合物作為(C)光聚合引發劑(以下,亦記為(C)成分)。藉由使用由下述式(1)所表示之結構的肟酯化合物來作為光聚合引發劑,可獲得可形成透明性優異的硬化膜之感放射線性樹脂組成物。
(R1為選自由1價的有機基團、胺基、鹵素、硝基及氰基所組成之群組中的基團,m為0~4的整數,p為0或1,R2為亦可具有取代基之苯基或亦可具有取代基之咔唑基,R3為氫原子或碳數1~6的烷基)。
上述式(1)中,當R1為1價的有機基團時,R1於不妨礙本發明的目的之範圍內,並無特別限定,可自各種有機基團適當選擇。作為R1為有機基團時之適合的例子,可列舉:烷基、烷氧基、環烷基、環烷氧基、飽和脂肪族醯基、烷氧羰基、飽和脂肪族醯氧基、亦可具有取代基之苯基、亦可具有取代基之苯氧基、亦可具有取代基之苯甲醯基、亦可具有取代基之苯氧基羰基、亦可具有取代基之苯甲醯氧基、亦可具有取代基之苯基烷基、亦可具有取代基之萘基、亦可具有取代基之萘氧基、亦可具有取代基之萘甲醯基、亦可具有取
代基之萘氧基羰基、亦可具有取代基之萘甲醯氧基、亦可具有取代基之萘基烷基、亦可具有取代基之雜環基、被1價或2價的有機基團所取代之胺基、嗎啉-1-基及呱嗪-1-基等。當m為2~4的整數時,R1可相同亦可不同。又,取代基的碳數中,不包含取代基進一步具有之取代基的碳數。
當R1為烷基時,其碳數較佳為1~20,更佳為1~6。又,當R1為烷基時,可為直連,亦可為支鏈。作為R1為烷基時之具體例,可列舉:甲基、乙基、正丙基、異丙基、正丁基、異丁基、二級丁基、三級丁基、正戊基、異戊基、二級戊基、三級戊基、正己基、正庚基、正辛基、異辛基、二級辛基、三級辛基、正壬基、異壬基、正癸基及異癸基等。又,當R1為烷基時,烷基亦可於碳鏈中包含醚鍵(-O-)。作為碳鏈中具有醚鍵之烷基的例子,可列舉甲氧基乙基、乙氧基乙基、甲氧基乙氧基乙基、乙氧基乙氧基乙基、丙氧基乙氧基乙基及甲氧基丙基等。
當R1為烷氧基時,其碳數較佳為1~20,更佳為1~6。又,當R1為烷氧基時,可為直連,亦可為支鏈。作為R1為烷氧基時之具體例,可列舉:甲氧基、乙氧基、正丙氧基、異丙氧基、正丁氧基、異丁氧基、二級丁氧基、三級丁氧基、正戊氧基、異戊氧基、二級戊氧基、三級戊氧基、正己氧基、正庚氧基、正辛氧基、異辛氧基、二級辛氧基、三級辛氧基、正壬氧基、異壬氧基、正癸氧基及異癸氧基等。又,當R1為烷氧基時,烷氧基亦可於碳鏈中包含醚鍵(-O-)。作為碳鏈中具有醚鍵之烷氧基的例子,可列舉甲氧基乙氧
基、乙氧基乙氧基、甲氧基乙氧基乙氧基、乙氧基乙氧基乙氧基、丙氧基乙氧基乙氧基及甲氧基丙氧基等。
當R1為環烷基或環烷氧基時,其碳數較佳為3~10,更佳為3~6。作為R1為環烷基時之具體例,可列舉環丙基、環丁基、環戊基、環己基、環庚基及環辛基等。作為R1為環烷氧基時之具體例,可列舉環丙氧基、環丁氧基、環戊氧基、環己氧基、環庚氧基及環辛氧基等。
當R1為飽和脂肪族醯基或飽和脂肪族醯氧基時,其碳數較佳為2~20,更佳為2~7。作為R1為飽和脂肪族醯基時之具體例,可列舉乙醯基、丙醯基、正丁醯基、2-甲基丙醯基、正戊醯基、2,2-二甲基丙醯基、正己醯基、正庚醯基、正辛醯基、正壬醯基、正癸醯基、正十一醯基、正十二醯基、正十三醯基、正十四醯基、正十五醯基及正十六醯基等。作為R1為飽和脂肪族醯氧基時之具體例,可列舉乙醯氧基、丙醯氧基、正丁醯氧基、2-甲基丙醯氧基、正戊醯氧基、2,2-二甲基丙醯氧基、正己醯氧基、正庚醯氧基、正辛醯氧基、正壬醯氧基、正癸醯氧基、正十一醯氧基、正十二醯氧基、正十三醯氧基、正十四醯氧基、正十五醯氧基及正十六醯氧基。
當R1為烷氧羰基時,其碳數較佳為2~20,更佳為2~7。作為R1為烷氧羰基時之具體例,可列舉:甲氧基羰基、乙氧基羰基、正丙氧基羰基、異丙氧基羰基、正丁氧基羰基、異丁氧基羰基、二級丁氧基羰基、三級丁氧基羰基、正戊氧基羰基、異戊氧基羰基、二級戊氧基羰基、三級戊氧基羰基、正己氧基羰基、正庚氧基羰基、正辛氧基羰基、異辛氧基羰
基、二級辛氧基羰基、三級辛氧基羰基、正壬氧基羰基、異壬氧基羰基、正癸氧基羰基及異癸氧基羰基等。
當R1為苯基烷基時,其碳數較佳為7~20,更佳為7~10。又,當R1為萘基烷基時,其碳數較佳為11~20,更佳為11~14。作為R1為苯基烷基時之具體例,可列舉苄基、2-苯乙基、3-苯丙基及4-苯丁基。作為R1為萘基烷基時之具體例,可列舉α-萘基甲基、β-萘基甲基、2-(α-萘基)乙基及2-(β-萘基)乙基。當R1為苯基烷基或萘基烷基時,R1亦可於苯基或萘基上進一步具有取代基。
當R1為雜環基時,雜環基為包含1以上的N、S、O之5員或6員的單環、或相關單環彼此或相關單環與苯環縮合之雜環基。當雜環基為縮合環時,環數最多為3。作為相關之構成雜環基之雜環,可列舉:呋喃、噻吩、吡咯、噁唑、異噁唑、噻唑、噻二唑、異噻唑、咪唑、吡唑琳桐、三唑、吡啶、吡嗪、嘧啶、噠嗪、苯并呋喃、苯并噻吩、吲跺、異吲跺、吲嗪、苯并咪唑、苯并三唑、苯并噁唑、苯并噻唑、咔唑、嘌呤、奎林、異奎林、喹唑啉、酞嗪、1,2-二氮萘及奎喏林等。當R1為雜環基時,雜環基亦可進一步具有取代基。
當R1為被1價或2價的有機基團所取代之胺基時,有機基團的適合的例子,可列舉:碳數1~20的烷基、碳數3~10的環烷基、碳數2~20的飽和脂肪族醯基、亦可具有取代基之苯基、亦可具有取代基之苯甲醯基、亦可具有取代基之碳數7~20的苯基烷基、亦可具有取代基之萘基、亦可具有取代基之萘甲醯基、亦可具有取代基之碳數11~20的萘基
烷基及雜環基等。該等適合的有機基團的具體例與R1相同。作為被1價或2價的有機基團所取代之氨基的具體例,可列舉:甲胺基、乙胺基、二乙胺基、正丙胺基、二正丙胺基、異丙胺基、正丁胺基、二正丁胺基、正戊胺基、正己胺基、正庚胺基、正辛胺基、正壬胺基、正癸胺基、苯胺基、萘胺基、乙醯胺基、丙醯胺基、正丁醯胺基、正戊醯胺基、正己醯胺基、正庚醯胺基、正辛醯胺基、正癸醯胺基、苯甲醯胺基、α-萘醯胺基及β-萘醯胺基等。
作為R1中所包含之苯基、萘基及雜環基進一步具有取代基時之取代基,可列舉:碳數1~6的烷基、碳數1~6的烷氧基、碳數2~7的飽和脂肪族醯基、碳數2~7的烷氧羰基、碳數2~7的飽和脂肪族醯氧基、具有碳數1~6的烷基之單烷基胺基、具有碳數1~6的烷基之二烷基胺基、嗎啉-1-基、呱嗪-1-基、鹵素、硝基及氰基等。當R1中所包含之苯基、萘基及雜環基進一步具有取代基時,該取代基的數量,於不妨礙本發明的目的之範圍內,並無限定,但較佳為1~4。當R1中所包含之苯基、萘基及雜環基具有複數個取代基時,複數個取代基,可相同亦可不同。
於R1中,自化學上穩定、立體的障礙較少而容易合成肟酯化合物、及相對於溶劑之溶解性較高等方面來看,較佳為選自由硝基、碳數1~6的烷基、碳數1~6的烷氧基及碳數2~7的飽和脂肪族醯基所組成之群組中的基團,更佳為硝基或碳數1~6的烷基,尤其較佳為硝基或甲基。
R1鍵結於苯基之位置,關於R1鍵結之苯基,當以苯
基與肟酯化合物的主骨架的原子鍵結的位置為1位、以甲基的位置為2位時,較佳為4位或5位,更加為5位。又,m較佳為0~3的整數,更佳為0~2的整數,尤其較佳為0或1。
R2為亦可具有取代基之苯基或亦可具有取代基之咔唑基。又,當R2為亦可具有取代基之咔唑基時,咔唑基上的氮原子,亦可被碳數1~6的烷基所取代。
於R2中,苯基或咔唑基具有之取代基,於不妨礙本發明的目的之範圍內,並無特別限定。作為苯基或咔唑基亦可於碳原子上具有之適合的取代基的例子,可列舉:碳數1~20的烷基、碳數1~20的烷氧基、碳數3~10的環烷基、碳數3~10的環烷氧基、碳數2~20的飽和脂肪族醯基、碳數2~20的烷氧羰基、碳數2~20的飽和脂肪族醯氧基、亦可具有取代基之苯基、亦可具有取代基之苯氧基、亦可具有取代基之苯硫基、亦可具有取代基之苯甲醯基、亦可具有取代基之苯氧基羰基、亦可具有取代基之苯甲醯氧基、亦可具有取代基之碳數7~20的苯基烷基、亦可具有取代基之萘基、亦可具有取代基之萘氧基、亦可具有取代基之萘甲醯基、亦可具有取代基之萘氧基羰基、亦可具有取代基之萘甲醯氧基、亦可具有取代基之碳數11~20的萘基烷基、亦可具有取代基之雜環基、亦可具有取代基之雜環羰基、胺基、被1價或2價的有機基團所取代之胺基、嗎啉-1-基及呱嗪-1-基、鹵素、硝基及氰基等。
當R2為咔唑基時,作為咔唑基亦可於氮原子上具有之適合的取代基的例子,可列舉:碳數1~20的烷基、碳數3
~10的環烷基、碳數2~20的飽和脂肪族醯基、碳數2~20的烷氧羰基、亦可具有取代基之苯基、亦可具有取代基之苯甲醯基、亦可具有取代基之苯氧基羰基、亦可具有取代基之碳數7~20的苯基烷基、亦可具有取代基之萘基、亦可具有取代基之萘甲醯基、亦可具有取代基之萘氧基羰基、亦可具有取代基之碳數11~20的萘基烷基、亦可具有取代基之雜環基及亦可具有取代基之雜環羰基等。於該等取代基中,較佳為碳數1~20的烷基,更佳為碳數1~6的烷基,尤其較佳為乙基。
於苯基或咔唑基亦可具有之取代基的具體例中,關於烷基、烷氧基、環烷基、環烷氧基、飽和脂肪族醯基、烷氧羰基、飽和脂肪族醯氧基、亦可具有取代基之苯基烷基、亦可具有取代基之萘基烷基、亦可具有取代基之雜環基及被1價或2價的有機基團所取代之胺基,與R1相同。
於R2中,作為苯基或咔唑基具有之取代基中所包含之苯基、萘基及雜環基進一步具有取代基時之取代基的例子,可列舉:碳數1~6的烷基;碳數1~6的烷氧基;碳數2~7的飽和脂肪族醯基;碳數2~7的烷氧羰基;碳數2~7的飽和脂肪族醯氧基;苯基;萘基;苯甲醯基;萘甲醯基;苯甲醯基,其被選自由碳數1~6的烷基、嗎啉-1-基、呱嗪-1-基及苯基所組成之群組中的基團所取代;單烷基胺基,其具有碳數1~6的烷基;二烷基胺基,其具有碳數1~6的烷基;嗎啉-1-基;呱嗪-1-基;鹵素;硝基;及,氰基。當苯基或咔唑基具有之取代基中所包含之苯基、萘基及雜環基進一步具
有取代基時,其取代基的數量,於不妨礙本發明的目的之範圍內,並無限定,但較佳為1~4。當苯基、萘基及雜環基具有複數個取代基時,複數個取代基,可相同亦可不同。
於R2中,自感放射線性樹脂組成物的敏感度優異之方面來看,較佳為由下述式(2)或(3)所表示之基團,更佳為由下述式(2)所表示之基團,於由下述式(2)所表示之基團中,尤其較佳為A為S之基團。
(R4為選自由1價的有機基團、胺基、鹵素、硝基及氰基所組成之群組中的基團,A為S或O,n為0~4的整數)。
(R5和R6分別為1價的有機基團)。
當式(2)中的R4為有機基團時,於不妨礙本發明的目的之範圍內,可自各種有機基團選擇。於式(2)中,作為R4為有機基團時之適合的例子,可列舉:碳數1~6的烷基;碳數1~6的烷氧基;碳數2~7的飽和脂肪族醯基;碳數2~7的烷氧羰基;碳數2~7的飽和脂肪族醯氧基;苯基;萘基;
苯甲醯基;萘甲醯基;苯甲醯基,其被選自由碳數1~6的烷基基、嗎啉-1-基、呱嗪-1-基及苯基所組成之群組中的基團所取代;單烷基胺基,其具有碳數1~6的烷基;二烷基胺基,其具有碳數1~6的烷基;嗎啉-1-基;呱嗪-1-基;鹵素;硝基;及,氰基。
於R4中,較佳為:苯甲醯基;萘甲醯基;苯甲醯基,其被選自由碳數1~6的烷基、嗎啉-1-基、呱嗪-1-基及苯基所組成之群組中的基團所取代;及,硝基;更佳為:苯甲醯基;萘甲醯基;2-甲基苯基羰基;4-(呱嗪-1-基)苯基羰基;及,4-(苯基)苯基羰基。
又,於式(2)中,n較佳為0~3的整數,更佳為0~2的整數,尤其較佳為0或1。當n為1時,R4鍵結之位置,相對於R4鍵結之苯基與硫原子鍵結之原子鍵結,較佳為對位。
式(3)中的R5,於不妨礙本發明的目的之範圍內,可自各種有機基團選擇。作為R5的適合的例子,可列舉:碳數1~20的烷基、碳數3~10的環烷基、碳數2~20的飽和脂肪族醯基、碳數2~20的烷氧羰基、亦可具有取代基之苯基、亦可具有取代基之苯甲醯基、亦可具有取代基之苯氧基羰基、亦可具有取代基之碳數7~20的苯基烷基、亦可具有取代基之萘基、亦可具有取代基之萘甲醯基、亦可具有取代基之萘氧基羰基、亦可具有取代基之碳數11~20的萘基烷基、亦可具有取代基之雜環基及亦可具有取代基之雜環羰基等。
於R5中,較佳為碳數1~20的烷基,更佳為碳數1~6的烷基,尤其較佳為乙基。
式(3)中的R6,於不妨礙本發明的目的之範圍內,並無特別限定,可自各種有機基團選擇。作為R6的適合的基團的具體例,可列舉碳數1~20的烷基、亦可具有取代基之苯基、亦可具有取代基之基及亦可具有取代基之雜環基。作為R6,於該等基團中,更佳為亦可具有取代基之苯基,尤其較佳為2-甲基苯基。
作為R4、R5或R6中所包含之苯基、萘基及雜環基進一步具有取代基時之取代基,可列舉:碳數1~6的烷基、碳數1~6的烷氧基、碳數2~7的飽和脂肪族醯基、碳數2~7的烷氧羰基、碳數2~7的飽和脂肪族醯氧基、具有碳數1~6的烷基之單烷基胺基、具有碳數1~6的烷基之二烷基胺基、嗎啉-1-基、呱嗪-1-基、鹵素、硝基及氰基等。當R4、R5或R6中所包含之苯基、萘基及雜環基進一步具有取代基時,其取代基的數量,於不妨礙本發明的目的之範圍內,並無限定,但較佳為1~4。當R4、R5或R6中所包含之苯基、萘基及雜環基具有複數個取代基時,複數個取代基,可相同亦可不同。
式(1)中的R3,為氫原子或碳數1~6的烷基。作為R3,較佳為甲基或乙基,更佳為甲基。當R3為甲基時,由式(1)所表示之化合物所構成之光聚合引發劑,敏感度尤其優異。
由式(1)所表示之肟酯化合物,當p為0時,可依照例如下述方案1來合成。具體而言,可使用由下述式(1-2)所表示之鹵代烴化合物,將由下述式(1-1)所表示之芳香族化合物利用夫裡德耳-誇夫特(Friedel-Crafts)反應進行醯化,獲得
由下述式(1-3)所表示之酮化合物,將所得之酮化合物(1-3)利用羥胺進行肟化,獲得由下述式(1-4)所表示之肟類化合物,繼而,使式(1-4)的肟類化合物與由下述式(1-5)所表示之酸酐((R3CO)2O)、或由下述式(1-6)所表示之酸鹵化物(R3COHal、Hal為鹵素)反應,獲得由下述式(1-7)所表示之肟酯化合物。再者,於下述式(1-2)中,Hal為鹵素,於下述式(1-1)、(1-2)、(1-3)、(1-4)及(1-7)中,R1、R2、R3及m與式(1)相同。
<方案1>
由式(1)所表示之肟酯化合物,當p為1時,可依照例如下述方案2來合成。具體而言,可對由下述式(2-1)所表示之酮化合物,於鹽酸的存在下使由下述式(2-2)所表示之亞硝酸酯(RONO、R為碳數1~6的烷基)反應,獲得由下述式(2-3)所表示之酮肟化合物,繼而,使由下述式(2-3)所表示之酮肟化合物與由下述式(2-4)所表示之酸酐((R3CO)2O)、或由下述式(2-5)所表示之酸鹵化物(R3COHal、Hal為鹵素)反應,獲得由下述式(2-6)所表示之肟酯化合物。再者,於下述式(2-1)、(2-3)、(2-4)、(2-5)及(2-6)中,R1、R2、R3及m與式(1)相同。
<方案2>
又,由式(1)所表示之肟酯化合物,當p為1,R1為甲基,相對於鍵結於R1鍵結之苯環之甲基,R1鍵結於對位時,例如亦可藉由用與方案1相同的方法,將由下述式(2-7)所表示之化合物進行肟化和醯化來合成。再者,於下述式(2-7)中,R2與式(1)相同。
作為由式(1)所表示之肟酯化合物中特別適合的化合物,可列舉下述式的化合物。
感放射線性樹脂組成物,於不妨礙本發明的目的之範圍內,亦可根據需要包含除由式(1)所表示之肟酯化合物以外之其他光聚合引發劑。作為其他光聚合引發劑的具體例,可列舉:1-羥基環己基苯基酮、2-羥基-2-甲基-1-苯基丙烷-1-酮、1-[4-(2-羥基乙氧基)苯基]-2-羥基-2-甲基-1-丙烷-1-酮、1-(4-異丙基苯基)-2-羥基-2-甲基丙烷-1-酮、1-(4-十二烷基苯基)-2-羥基-2-甲基丙烷-1-酮、2,2-二甲氧基-1,2-二苯乙烷-1-酮、雙(4-二甲胺基苯基)酮、2-甲基-1-[4-(甲硫基)苯基]-2-嗎啉基丙烷-1-酮、2-苄基-2-二甲胺基-1-(4-嗎啉基苯基)-丁烷-1-酮、乙酮,1-[9-乙基-6-(2-甲基苯甲醯)-9H-咔唑-3-基],1-(鄰乙
醯肟)、2,4,6-三甲基苯甲醯二苯基氧化膦、4-苯甲醯-4'-甲基二甲硫醚、4-二甲胺基苯甲酸、4-二甲胺基苯甲酸甲酯、4-二甲胺基苯甲酸乙酯、4-二甲胺基苯甲酸丁酯、4-二甲胺基苯甲酸2-乙基己酯、4-二甲胺基苯甲酸2-異戊酯、苄基-β-甲氧基乙基縮醛、苄基二甲基縮酮、1-苯基-1,2-丙二酮-2-(鄰乙氧羰基)肟、鄰苯甲醯苯甲酸甲酯、2,4-二乙基噻噸酮、2-氯噻噸酮、2,4-二甲基噻噸酮、1-氯-4-丙氧基噻噸酮、噻噸、2-氯噻噸、2,4-二乙基噻噸、2-甲基噻噸、2-異丙基噻噸、2-乙基恩菎、八甲基恩菎、1,2-苯并恩菎、2,3-二苯基恩菎、偶氮雙異丁腈、過氧化苯甲醯、過氧化異丙基苯、2-巰基苯并咪唑、2-巰基苯并噁唑、2-巰基苯并噻唑、2-(鄰氯苯基)-4,5-二苯基咪唑二聚體、2-(鄰氯苯基)-4,5-二(甲氧基苯基)咪唑二聚體、2-(鄰氟苯基)-4,5-二苯基咪唑二聚體、2-(鄰甲氧基苯基)-4,5-二苯基咪唑二聚體、2-(對甲氧基苯基)-4,5-二苯基咪唑二量體、2,4,5-三芳基咪唑二量體、二苯甲酮、2-氯二苯甲酮、4,4’-雙二甲胺基二苯甲酮(也就是,米其勒酮)、4,4’-雙二乙胺基二苯甲酮(也就是,乙基米其勒酮)、4,4’-二氯二苯甲酮、3,3-二甲基-4-甲氧基二苯甲酮、苄基、苯偶姻、苯偶姻甲醚、苯偶姻乙醚、苯偶姻異丙醚、苯偶姻正丁醚、苯偶姻異丁醚、苯偶姻丁醚、苯乙酮、2,2-二乙氧基苯乙酮、對二甲基苯乙酮、對二甲胺基苯丙酮、二氯苯乙酮、三氯苯乙酮、對三級丁基苯乙酮、對二甲胺基苯乙酮、對三級丁基三氯苯乙酮、對三級丁基二氯苯乙酮、α,α-二氯-4-苯氧基苯乙酮、噻噸酮、2-甲基噻噸酮、2-異丙基噻噸酮、二苯并環庚酮、戊基-4-二
甲胺基苯甲酸酯、9-苯基吖啶、1,7-雙-(9-吖啶基)庚烷、1,5-雙-(9-吖啶基)戊烷、1,3-雙-(9-吖啶基)丙烷、對甲氧基三嗪、2,4,6-三(三氯甲基)-s-三嗪、2-甲基-4,6-雙(三氯甲基)-s-三嗪、2-[2-(5-甲基呋喃-2-基)乙烯基]-4,6-雙(三氯甲基)-s-三嗪、2-[2-(呋喃-2-基)乙烯基]-4,6-雙(三氯甲基)-s-三嗪、2-[2-(4-二乙胺基-2-甲基苯基)乙烯基]-4,6-雙(三氯甲基)-s-三嗪、2-[2-(3,4-二甲氧基苯基)乙烯基]-4,6-雙(三氯甲基)-s-三嗪、2-(4-甲氧基苯基)-4,6-雙(三氯甲基)-s-三嗪、2-(4-乙氧基苯乙烯基)-4,6-雙(三氯甲基)-s-三嗪、2-(4-正丁氧基苯基)-4,6-雙(三氯甲基)-s-三嗪、2,4-雙-三氯甲基-6-(3-溴-4-甲氧基)苯基-s-三嗪、2,4-雙-三氯甲基-6-(2-溴-4-甲氧基)苯基-s-三嗪、2,4-雙-三氯甲基-6-(3-溴-4-甲氧基)苯乙烯基苯基-s-三嗪及2,4-雙-三氯甲基-6-(2-溴-4-甲氧基)苯乙烯基苯基-s-三嗪等。其中,自敏感度的方面來看,尤其較佳為使用肟系的光聚合引發劑。該等光聚合引發劑,可單獨使用,或組合2種以上使用。
當感放射線性樹脂組成物包含除由式(1)所表示之肟酯化合物以外之其他光聚合引發劑時,其他光聚合性化合物的含量,於不妨礙本發明的目的之範圍內,並無特別限定。此時,其他光聚合引發劑的含量,典型地為相對於感放射線性樹脂組成物中所包含之光聚合引發劑的總量,較佳為50質量%以下,更佳為30質量%以下,尤其較佳為10質量%以下。
(C)成分也就是光聚合引發劑的含量,相對於感放射線性樹脂組成物的固體成分的合計100質量份,較佳為0.1~
50質量份,更佳為0.5~10質量份。藉由以上述範圍內的量使用(C)成分,可利用放射線使感放射性樹脂組成物充分地硬化,而獲得提供透明性優異的硬化膜之感放射性樹脂組成物。
<(S)溶劑>
本發明的感放射線性樹脂組成物,較佳為包含(S)有機溶劑(以下,亦稱為「(S)成分」),以改善塗佈性和調整黏度。
作為有機溶劑,具體而言,可列舉:乙二醇單甲醚、乙二醇單乙醚、乙二醇單正丙醚、乙二醇單正丁醚、二乙二醇單甲醚、二乙二醇單乙醚、二乙二醇單正丙醚、二乙二醇單正丁醚、三乙二醇單甲醚、三乙二醇單乙醚、丙二醇單甲醚、丙二醇單乙醚、丙二醇單正丙醚、丙二醇單正丁醚、二丙二醇單甲醚、二丙二醇單乙醚、二丙二醇單正丙醚、二丙二醇單正丁醚、三丙二醇單甲醚及三丙二醇單乙醚等(聚)烯烴二醇單烷基醚類;乙二醇單甲醚乙酸酯、乙二醇單乙醚乙酸酯、二乙二醇單甲醚乙酸酯、二乙二醇單乙醚乙酸酯、丙二醇單甲醚乙酸酯(Propylene glycol monomethyl ether acetate,PGMEA)及丙二醇單乙醚乙酸酯等(聚)烯烴二醇單烷基醚乙酸酯類;二乙二醇二甲醚、二乙二醇甲基乙基醚、二乙二醇二乙醚及四氫呋喃等其他醚類;甲基乙基酮、環已酮、2-庚酮及3-庚酮等酮類;2-羥基丙酸甲酯、2-羥基丙酸乙酯等乳酸烷基酯類;2-羥基-2-甲基丙酸乙酯、3-甲氧基丙酸甲酯、3-甲氧基丙酸乙酯、3-乙氧基丙酸甲酯、3-乙氧基丙酸乙酯、乙氧基乙酸乙酯、羥基乙酸乙酯、2-羥基-3-甲基丁酸甲酯、3-甲氧基乙酸丁酯、3-甲基-3-甲氧基乙酸丁酯、3-甲基-3-甲氧基丁
基丙酸酯、乙酸乙酯、乙酸正丙酯、乙酸異丙酯、乙酸正丁酯、乙酸異丁酯、甲酸正戊酯、乙酸異戊酯、丙酸正丁酯、酪酸乙酯、酪酸正丙酯、酪酸異丙酯、酪酸正丁酯、丙酮酸甲酯、丙酮酸乙酯、丙酮酸正丙酯、乙醯乙酸甲酯、乙醯乙酸乙酯及2-氧代丁酸乙酯等其他酯類;甲苯、二甲苯等芳香族烴類;及,N-甲基吡咯啶酮、N,N-二甲基甲醯胺及N,N-二甲基乙醯胺等醯胺類等。其中,較佳為烯烴二醇單烷基醚類、烯烴二醇單烷基醚乙酸酯類、上述之其他醚類、乳酸烷基酯類及上述之其他酯類;更佳為烯烴二醇單烷基醚乙酸酯類、上述之其他醚類及上述之其他酯類。該等溶劑,可單獨使用,或組合2種以上使用。
感放射線性樹脂組成物中的(S)成分的含量,並無特別限定,以可將感放射線性樹脂組成物塗佈於基板等之範圍內的量,並根據塗佈膜厚適當設定。感放射線性樹脂組成物的黏度,較佳為0.9~500cp,更佳為1~50cp,進一步較佳為1~30cp。又,感放射線性樹脂組成物的固體成分濃度,較佳為1~80質量%,更佳為5~50質量%。
<其他成分>
可根據需要使本發明的感放射線性樹脂組成物中含有表面活性劑、密接性提高劑、熱聚合抑制劑、及消泡劑等添加劑。任一種添加劑,均可使用以往公知的添加劑。作為表面活性劑,可列舉陰離子系、陽離子系及非離子系等的化合物;作為密接性提高劑,可列舉以往公知的矽烷偶合劑(Silane coupling agent);作為熱聚合抑制劑,可列舉氫醌、氫醌單乙醚
等;作為消泡劑,可列舉矽酮系、氟系化合物等。
<感放射線性樹脂組成物的製備方法>
本發明的感放射線性樹脂組成物,可使用電磁攪拌器將上述各成分攪拌、混合溶解,並根據需要用0.2μm膜片過濾器等過濾器進行過濾來製備。
《絕緣膜》
本發明的絕緣膜,除使用上述的感放射線性樹脂組成物以外,與使用感放射線性樹脂組成物而形成的以往的絕緣膜相同。以下,僅說明絕緣膜的形成方法。
使用上述的感放射線性樹脂組成物形成絕緣膜之方法,並無特別限制,可自以往所採用之方法適當選擇。作為適合的絕緣膜的形成方法,可列舉包含以下步驟之方法:塗佈步驟,其將上述的感放射線性樹脂組成物塗佈於基板上,形成感放射線性樹脂層;曝光步驟,其將感放射線性樹脂層按照特定的絕緣膜的圖案進行曝光;及,顯影步驟,其將經曝光之感放射線性樹脂層顯影,形成絕緣膜的圖案。
首先,於塗佈步驟中,使用輥式塗佈機、逆轉塗佈機、棒式塗佈機等接觸轉印型塗佈裝置或旋轉器(旋轉式塗佈裝置)、幕塗流動塗料器(curtain flow coater)等非接觸型塗佈裝置,將本發明的感放射線性樹脂組成物塗佈於應形成絕緣膜之基板上,並根據需要利用乾燥去掉溶劑,形成感放射線性樹脂層。
繼而,將表面形成有感放射線性樹脂層之基板提供至曝光步驟中。於曝光步驟中,經由負像遮片(negative
mask),向感放射線性樹脂層上照射ArF準分子激光、KrF準分子激光、F2準分子激光、極紫外線(extreme ultraviolet,EUV)、真空紫外線(vacuum ultraviolet rays,VUV)、電子束、X線及軟X線等放射線,將感放射線性樹脂層按照特定的絕緣膜的圖案部分曝光。曝光量根據感放射線性樹脂組成物的組成而不同,但例如10~600mJ/cm2左右為較佳。
前述的感放射線性樹脂組成物,難以於曝光後,相對於鹼性顯影液而過度地溶解。因此,藉由使用前述的感放射線性樹脂組成物,易於形成以曝光部為凸部、以未曝光部為凹部之圖案來作為良好形狀的圖案。
於顯影步驟中,藉由將曝光後的感放射線性樹脂層用顯影液進行顯影,來形成特定圖案的絕緣膜。顯影方法並無特別限定,可使用浸漬法、噴塗等。作為顯影液的具體例,可列舉:單乙醇胺、二乙醇胺及三乙醇胺等有機系的顯影液;或,氫氧化鈉、氫氧化鉀、碳酸鈉、阿摩尼亞及季銨鹽等的水溶液。
之後,根據需要,對顯影後的絕緣膜的圖案施加後烘乾,來加熱硬化。後烘乾的溫度較佳為150~270℃。
使用前述的感放射線性樹脂組成物而形成的絕緣膜,由於透明性優異,因此,可適合用作內嵌式觸控面板方式的液晶顯示裝置、超高孔徑(Ultra High Aperture,UHA)面板等需要透明性優異的絕緣膜之顯示裝置用的絕緣膜。
以下,利用實施例進一步詳細地說明本發明,但本
發明並非被該等實施例所限定。
[實施例1~實施例24和比較例1~比較例5]
將由表1中記載的單元所構成之鹼可溶性樹脂15質量份、光聚合性化合物7質量份、光聚合引發劑0.5質量份、表面調整劑(BYK-310,聚酯改性聚二甲基矽氧烷,BYK Japan KK製造)0.5質量份、丙二醇單甲醚乙酸酯15質量份及二乙二醇單甲醚35質量份混合,使成為均勻的溶液,來製備實施例1~實施例24和比較例1~比較例5的感放射線性樹脂組成物。
表2中記載的構成鹼可溶性樹脂之單元I~Ⅶ為由下式所表示之單元。
作為光聚合性化合物,使用2,4,6-三氧代六氫-1,3,5-三嗪-1,3,5-三乙醇三丙烯酸酯和2,4,6-三氧代六氫-1,3,5-三嗪
-1,3,5-三乙醇二丙烯酸酯的混合物也就是M315(東亞合成股份有限公司(Toagosei Co.,Ltd.)製造)。
作為光聚合引發劑,使用由下式所表示之化合物。
關於實施例1~實施例24和比較例1~比較例5中獲得之感放射線性樹脂組成物,依照以下的方法,進行殘膜率、耐熱性及分離解析度的評價與斷點(break point,BP)的測定。評價結果記於表1。
(殘膜率評價)
將上述各實施例和比較例中製備之感放射線性樹脂組成物用旋轉器(Mikasa spinner IH-360S,Mikasa Corporation製造)旋塗於玻璃基板上後,以100℃使塗膜乾燥120秒,形成感光放射線性樹脂層。繼而,利用曝光裝置(MPA600FA,佳能股份有限公司(CANON INC)製造),以曝光量100mJ/cm2,將感放射線性樹脂層曝光。繼而,將氫氧化四甲銨的濃度2.38質量%的水溶液用作顯影液,在23℃進行60秒水坑式顯影(Puddle Development),形成圖案。顯影後,將圖案以230℃後烘乾20分鐘。後烘乾後的圖案的膜厚為6μm。使用觸針式表面形狀測定器(Dektak 3st,愛發科股份有限公司(ULVAC,Inc.)製造)測定圖案的膜厚。測定後烘乾後的膜厚/顯影前的膜厚,求得殘膜率。依照以下的標準判定殘膜率得當與否。
○:80%以上。
×:不足80%。
(耐熱性評價)
用與殘膜率評價相同的方法,形成顯影後的形狀的錐角為50°以上且90°以下、後烘乾後的膜厚為6μm之圖案。根據後烘乾後的圖案的剖面照片,於基板表面與圖案的表面所成之角中,測定銳角也就是錐角(°)。基於錐角的測定結果,並依照以下的標準判定耐熱性。
○:錐角為30~70°。
×:錐角不足30°,或超過70°。
(分離解析度)
用與殘膜率評價相同的方法,進行曝光和顯影,形成具有孔徑10μm的孔之孔圖案。後烘乾處理後,觀察孔的底部是否到達基板。基於孔的觀察結果,並依照以下的標準判定分離解析度。
○:孔的底部到達基板。
×:孔的底部未到達基板。
(斷點的測定)
將上述各實施例和比較例中製備之感放射線性樹脂組成物用旋轉器(Mikasa spinner IH-360S,Mikasa Corporation製造)旋塗於Si基板後,以100℃使塗膜乾燥120秒,形成感光放射線性樹脂層。繼而,利用曝光裝置(MPA600FA,佳能股份有限公司製造),以曝光量100mJ/cm2,將感放射線性樹脂層曝光。繼而,將氫氧化四甲銨的濃度2.38質量%的水溶液用作顯影液,在23℃進行60秒水坑式顯影,測定自顯影
液接觸基板之時間至光阻膜消失之時間,作為斷點。
根據實施例1~實施例24和比較例1~比較例5得知,若為包含(A)鹼可溶性樹脂、(B)光聚合性化合物及(C)光聚合引發劑之感放射線樹脂組成物,則於曝光後的顯影時,曝光部不會過度溶解,其中,該(A)鹼可溶性樹脂是由包含(a1)來自於不飽和羧酸之單元(單元I)與(a2)來自於含有不具有環氧基之脂環式骨架之不飽和化合物之單元(單元Ⅱ)之共聚物所構成,該(C)光聚合引發劑包含由上述式(1)所表示之結構的肟酯化合物。
(透明性評價)
使用實施例11的感放射線性樹脂組成物、與比較例6和比較例7的感放射線性樹脂組成物,評價使用感放射線性樹
脂組成物而獲得之絕緣膜的透明性,其中,比較例6和比較例7的感放射線性樹脂組成物,除光聚合引發劑的種類以外,與實施例11的感光性組成物為相同的組成。
於比較例6中,使用由下式所表示之光聚合引發劑。
於比較例7中,使用由下式所表示之光聚合引發劑。
使用各實施例和比較例的感放射線性樹脂組成物,除曝光時選擇性進行曝光以外,與前述的殘膜率的評價方法同樣地形成經後烘乾之感放射線性樹脂組成物的硬化膜。硬化膜的膜厚為6μm。使用MCPD-3000(大塚電子(股)(Otsuka Electronics Co.,Ltd.)製造)測定所形成之硬化膜於波長400nm中的240度透過率後,實施例11的感放射線性樹脂組成物的硬化膜的透過率為88.8%,比較例6的感放射線性樹脂組成物的硬化膜的透過率為76.2%,比較例7的感放射線性樹脂組成物的硬化膜的透過率為76.1%。
根據以上的結果得知,相較於包含式(1)所不包含之化合物作為光聚合引發劑之感放射線性樹脂組成物,前述包含由式(1)所表示之化合物作為光聚合引發劑之感放射線性樹脂組成物提供透明性顯著優異的絕緣膜。
Claims (6)
- 一種感放射線性樹脂組成物,其包含(A)鹼可溶性樹脂、(B)光聚合性化合物及(C)光聚合引發劑;前述(A)鹼可溶性樹脂,包含(a1)來自於不飽和羧酸之單元、與(a2)來自於不飽和化合物之單元,該不飽和化合物含有不具有環氧基之脂環式骨架;前述(C)光聚合引發劑,包含由下述式(1)所表示之肟酯化合物:
R1為選自由1價的有機基團、胺基、鹵素、硝基及氰基所組成之群組中的基團,m為0~4的整數,p為0或1,R2為亦可具有取代基之苯基或亦可具有取代基之咔唑基,R3為氫原子或碳數1~6的烷基,其中,前述咔唑基亦可具有的取代基是選自下述的基團:碳數1~20的烷基、碳數1~20的烷氧基、碳數3~10的環烷基、碳數3~10的環烷氧基、碳數2~20的飽和脂肪族醯基、碳數2~20的烷氧羰基、碳數2~20的飽和脂肪族醯氧基、亦可具有取代基之苯基、亦可具有取代基之苯氧基、亦可具有 取代基之苯硫基、亦可具有取代基之苯甲醯基、亦可具有取代基之苯氧基羰基、亦可具有取代基之苯甲醯氧基、亦可具有取代基之碳數7~20的苯基烷基、亦可具有取代基之萘基、亦可具有取代基之萘氧基、亦可具有取代基之萘甲醯基、亦可具有取代基之萘氧基羰基、亦可具有取代基之萘甲醯氧基、亦可具有取代基之碳數11~20的萘基烷基、亦可具有取代基之雜環基、亦可具有取代基之雜環羰基、胺基、被1價或2價的有機基團所取代之胺基、嗎啉-1-基及呱嗪-1-基、鹵素、及氰基;前述肟酯化合物不包含下述化合物: - 如請求項1所述之感放射線性樹脂組成物,其中,前述R2是由下式(2)所表示之基團:
R4為選自由1價的有機基團、胺基、鹵素、硝基及氰基所組成之群組中的基團,A為S或O,n為0~4的整數;或R2為由下式(3)所表示之基團: R5和R6分別為1價的有機基團。 - 一種感放射線性樹脂組成物,其包含(A)鹼可溶性樹脂、(B)光聚合性化合物及(C)光聚合引發劑;前述(A)鹼可溶性樹脂,包含(a1)來自於不飽和羧酸之單元、與(a2)來自於不飽和化合物之單元,該不飽和化合物含有不具有環氧基之脂環式骨架;前述(C)光聚合引發劑,包含由下述式(1)所表示之肟酯化合物:
R1為選自由1價的有機基團、胺基、鹵素、硝基及氰基所組成之群組中的基團,m為0~4的整數,p為0或1,R2是由下式(2)所表示之基團: R4為選自由1價的有機基團、胺基、鹵素、硝基及氰基所組成之群組中的基團,A為S或O,n為0~4的整數;或R2為由下式(3)所表示之基團, R5和R6分別為1價的有機基團,R3為氫原子或碳數1~6的烷基。 - 如請求項1~3中任一項所述之感放射線性樹脂組成物,其中,前述(A)鹼可溶性樹脂,進一步包含(a3)來自於含有脂環式環氧基之不飽和化合物之單元。
- 一種絕緣膜,其使用如請求項1~4中任一項所述之感放射線性樹脂組成物而形成。
- 一種顯示裝置,其具備如請求項5所述之絕緣膜。
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| JP (1) | JP5890337B2 (zh) |
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| TW (1) | TWI578103B (zh) |
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| JP6764636B2 (ja) * | 2014-10-08 | 2020-10-07 | 東京応化工業株式会社 | 感放射線性樹脂組成物、パターン製造方法、透明絶縁膜、及び表示装置 |
| JP6894188B2 (ja) * | 2015-09-02 | 2021-06-30 | 東京応化工業株式会社 | 感光性組成物、当該感光性組成物の製造方法、当該感光性組成物を用いる膜の形成方法、感光性組成物の保管時の増粘抑制方法、光重合開始剤、及び光重合開始剤の製造方法 |
| JP6705661B2 (ja) * | 2016-02-26 | 2020-06-03 | 東京応化工業株式会社 | カルボン酸エステル含有組成物 |
| KR102311850B1 (ko) * | 2017-12-21 | 2021-10-12 | 동우 화인켐 주식회사 | 감광성 수지 조성물 및 이로부터 형성된 절연 패턴 |
| KR20210104754A (ko) * | 2018-12-21 | 2021-08-25 | 다이요 잉키 세이조 가부시키가이샤 | 불산 내성 레지스트 조성물, 및 이것을 사용하여 얻어진 기재 가공품 |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2010049238A (ja) * | 2008-07-24 | 2010-03-04 | Jsr Corp | 感放射線性樹脂組成物および液晶表示素子用スペーサーとその製造法 |
| JP2012008205A (ja) * | 2010-06-22 | 2012-01-12 | Tokyo Ohka Kogyo Co Ltd | 樹脂パターンの製造方法 |
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| JP4713262B2 (ja) | 2005-07-22 | 2011-06-29 | 昭和電工株式会社 | 感光性の樹脂組成物 |
| JP5117397B2 (ja) | 2005-12-20 | 2013-01-16 | チバ ホールディング インコーポレーテッド | オキシムエステル光開始剤 |
| JP4833040B2 (ja) * | 2006-11-22 | 2011-12-07 | 東京応化工業株式会社 | 感光性樹脂組成物及び液晶パネル用スペーサ |
| JP4223071B2 (ja) * | 2006-12-27 | 2009-02-12 | 株式会社Adeka | オキシムエステル化合物及び該化合物を含有する光重合開始剤 |
| JP5576091B2 (ja) * | 2008-11-05 | 2014-08-20 | 東京応化工業株式会社 | 感光性樹脂組成物及び基材 |
| CN102317863B (zh) * | 2009-02-13 | 2013-11-20 | 株式会社Lg化学 | 光活性化合物和含有该化合物的光敏树脂组合物 |
| JP5476758B2 (ja) * | 2009-03-19 | 2014-04-23 | Jsr株式会社 | 感放射線性樹脂組成物、液晶表示素子の層間絶縁膜、保護膜及びスペーサーとその形成方法 |
| JP5603634B2 (ja) * | 2010-03-31 | 2014-10-08 | 東京応化工業株式会社 | 樹脂パターンの製造方法 |
| JP4914972B2 (ja) * | 2010-06-04 | 2012-04-11 | ダイトーケミックス株式会社 | オキシムエステル化合物、オキシムエステル化合物の製造方法、光重合開始剤および感光性組成物 |
| JP2012058728A (ja) * | 2010-08-10 | 2012-03-22 | Sumitomo Chemical Co Ltd | 感光性樹脂組成物 |
| KR101831912B1 (ko) * | 2010-10-05 | 2018-02-26 | 바스프 에스이 | 벤조카르바졸 화합물의 옥심 에스테르 유도체 및 광중합성 조성물에서의 광개시제로서의 그의 용도 |
| JP5981167B2 (ja) * | 2011-03-24 | 2016-08-31 | 東京応化工業株式会社 | 感光性樹脂組成物 |
| JP2013113933A (ja) * | 2011-11-25 | 2013-06-10 | Toyo Ink Sc Holdings Co Ltd | 感光性着色組成物、着色膜及びカラーフィルタ |
| JP2013122506A (ja) * | 2011-12-09 | 2013-06-20 | Toyo Ink Sc Holdings Co Ltd | カラーフィルタ用感光性着色組成物及びカラーフィルタ |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2010049238A (ja) * | 2008-07-24 | 2010-03-04 | Jsr Corp | 感放射線性樹脂組成物および液晶表示素子用スペーサーとその製造法 |
| JP2012008205A (ja) * | 2010-06-22 | 2012-01-12 | Tokyo Ohka Kogyo Co Ltd | 樹脂パターンの製造方法 |
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| JP5890337B2 (ja) | 2016-03-22 |
| TW201432377A (zh) | 2014-08-16 |
| JP2014153687A (ja) | 2014-08-25 |
| KR102116146B1 (ko) | 2020-05-27 |
| KR20140102145A (ko) | 2014-08-21 |
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