TWI568821B - Protect the tape - Google Patents
Protect the tape Download PDFInfo
- Publication number
- TWI568821B TWI568821B TW101106964A TW101106964A TWI568821B TW I568821 B TWI568821 B TW I568821B TW 101106964 A TW101106964 A TW 101106964A TW 101106964 A TW101106964 A TW 101106964A TW I568821 B TWI568821 B TW I568821B
- Authority
- TW
- Taiwan
- Prior art keywords
- protective tape
- metal layer
- substrate
- layer
- adhesive layer
- Prior art date
Links
- 239000010410 layer Substances 0.000 claims description 170
- 230000001681 protective effect Effects 0.000 claims description 106
- 229910052751 metal Inorganic materials 0.000 claims description 105
- 239000002184 metal Substances 0.000 claims description 105
- 239000000758 substrate Substances 0.000 claims description 87
- 239000012790 adhesive layer Substances 0.000 claims description 72
- 239000011347 resin Substances 0.000 claims description 64
- 229920005989 resin Polymers 0.000 claims description 64
- 238000000034 method Methods 0.000 claims description 62
- 229910052782 aluminium Inorganic materials 0.000 claims description 5
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 5
- 230000000052 comparative effect Effects 0.000 description 26
- 229910000679 solder Inorganic materials 0.000 description 16
- 239000000463 material Substances 0.000 description 8
- 229920000139 polyethylene terephthalate Polymers 0.000 description 8
- 239000005020 polyethylene terephthalate Substances 0.000 description 8
- 239000002390 adhesive tape Substances 0.000 description 6
- 238000005452 bending Methods 0.000 description 6
- 238000005336 cracking Methods 0.000 description 6
- -1 polyethylene terephthalate Polymers 0.000 description 6
- 239000004925 Acrylic resin Substances 0.000 description 5
- 229920000178 Acrylic resin Polymers 0.000 description 5
- 239000000853 adhesive Substances 0.000 description 5
- 230000001070 adhesive effect Effects 0.000 description 5
- 230000000694 effects Effects 0.000 description 5
- 238000010438 heat treatment Methods 0.000 description 5
- 230000006866 deterioration Effects 0.000 description 3
- 239000004642 Polyimide Substances 0.000 description 2
- 230000002542 deteriorative effect Effects 0.000 description 2
- 239000011888 foil Substances 0.000 description 2
- 229920000647 polyepoxide Polymers 0.000 description 2
- 229920001721 polyimide Polymers 0.000 description 2
- 238000003466 welding Methods 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- JOYRKODLDBILNP-UHFFFAOYSA-N Ethyl urethane Chemical compound CCOC(N)=O JOYRKODLDBILNP-UHFFFAOYSA-N 0.000 description 1
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 230000002378 acidificating effect Effects 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 229910052797 bismuth Inorganic materials 0.000 description 1
- JCXGWMGPZLAOME-UHFFFAOYSA-N bismuth atom Chemical compound [Bi] JCXGWMGPZLAOME-UHFFFAOYSA-N 0.000 description 1
- 230000000903 blocking effect Effects 0.000 description 1
- 238000007664 blowing Methods 0.000 description 1
- 239000003990 capacitor Substances 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 210000003298 dental enamel Anatomy 0.000 description 1
- 239000003814 drug Substances 0.000 description 1
- 229940079593 drug Drugs 0.000 description 1
- 229920001971 elastomer Polymers 0.000 description 1
- 239000003822 epoxy resin Substances 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 230000017525 heat dissipation Effects 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- 238000010030 laminating Methods 0.000 description 1
- 229910052747 lanthanoid Inorganic materials 0.000 description 1
- 150000002602 lanthanoids Chemical class 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 238000001579 optical reflectometry Methods 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
- 229920002635 polyurethane Polymers 0.000 description 1
- 239000004814 polyurethane Substances 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 238000010998 test method Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J7/00—Adhesives in the form of films or foils
- C09J7/20—Adhesives in the form of films or foils characterised by their carriers
- C09J7/29—Laminated material
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/30—Assembling printed circuits with electric components, e.g. with resistor
- H05K3/32—Assembling printed circuits with electric components, e.g. with resistor electrically connecting electric components or wires to printed circuits
- H05K3/34—Assembling printed circuits with electric components, e.g. with resistor electrically connecting electric components or wires to printed circuits by soldering
- H05K3/3494—Heating methods for reflowing of solder
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K1/00—Soldering, e.g. brazing, or unsoldering
- B23K1/0008—Soldering, e.g. brazing, or unsoldering specially adapted for particular articles or work
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K1/00—Soldering, e.g. brazing, or unsoldering
- B23K1/20—Preliminary treatment of work or areas to be soldered, e.g. in respect of a galvanic coating
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B15/00—Layered products comprising a layer of metal
- B32B15/04—Layered products comprising a layer of metal comprising metal as the main or only constituent of a layer, which is next to another layer of the same or of a different material
- B32B15/08—Layered products comprising a layer of metal comprising metal as the main or only constituent of a layer, which is next to another layer of the same or of a different material of synthetic resin
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B15/00—Layered products comprising a layer of metal
- B32B15/20—Layered products comprising a layer of metal comprising aluminium or copper
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B27/00—Layered products comprising a layer of synthetic resin
- B32B27/30—Layered products comprising a layer of synthetic resin comprising vinyl (co)polymers; comprising acrylic (co)polymers
- B32B27/308—Layered products comprising a layer of synthetic resin comprising vinyl (co)polymers; comprising acrylic (co)polymers comprising acrylic (co)polymers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B27/00—Layered products comprising a layer of synthetic resin
- B32B27/36—Layered products comprising a layer of synthetic resin comprising polyesters
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B7/00—Layered products characterised by the relation between layers; Layered products characterised by the relative orientation of features between layers, or by the relative values of a measurable parameter between layers, i.e. products comprising layers having different physical, chemical or physicochemical properties; Layered products characterised by the interconnection of layers
- B32B7/04—Interconnection of layers
- B32B7/12—Interconnection of layers using interposed adhesives or interposed materials with bonding properties
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J7/00—Adhesives in the form of films or foils
- C09J7/20—Adhesives in the form of films or foils characterised by their carriers
- C09J7/22—Plastics; Metallised plastics
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J7/00—Adhesives in the form of films or foils
- C09J7/20—Adhesives in the form of films or foils characterised by their carriers
- C09J7/28—Metal sheet
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J7/00—Adhesives in the form of films or foils
- C09J7/40—Adhesives in the form of films or foils characterised by release liners
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J2203/00—Applications of adhesives in processes or use of adhesives in the form of films or foils
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J2203/00—Applications of adhesives in processes or use of adhesives in the form of films or foils
- C09J2203/31—Applications of adhesives in processes or use of adhesives in the form of films or foils as a masking tape for painting
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J2301/00—Additional features of adhesives in the form of films or foils
- C09J2301/10—Additional features of adhesives in the form of films or foils characterized by the structural features of the adhesive tape or sheet
- C09J2301/16—Additional features of adhesives in the form of films or foils characterized by the structural features of the adhesive tape or sheet by the structure of the carrier layer
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J2400/00—Presence of inorganic and organic materials
- C09J2400/10—Presence of inorganic materials
- C09J2400/16—Metal
- C09J2400/163—Metal in the substrate
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J2400/00—Presence of inorganic and organic materials
- C09J2400/20—Presence of organic materials
- C09J2400/22—Presence of unspecified polymer
- C09J2400/226—Presence of unspecified polymer in the substrate
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/22—Secondary treatment of printed circuits
- H05K3/28—Applying non-metallic protective coatings
- H05K3/281—Applying non-metallic protective coatings by means of a preformed insulating foil
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Manufacturing & Machinery (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Mechanical Engineering (AREA)
- Adhesive Tapes (AREA)
- Electric Connection Of Electric Components To Printed Circuits (AREA)
- Laminated Bodies (AREA)
Description
本發明係關於一種對經過回焊工程的基板作保護之保護膠帶。 The present invention relates to a protective tape for protecting a substrate that has been subjected to reflow engineering.
以往,在將電阻或電容器、IC等之電子零件連接於基板之際,首先,將焊錫塗佈於基板上的連接部,再將適合的電子零件裝載於其上,而進入回焊工程。於回焊工程中,係藉由熱而使焊錫熔解,然後,將焊錫冷卻凝固,藉此而將基板上之連接部與電子零件作連接。 Conventionally, when an electronic component such as a resistor, a capacitor, or an IC is connected to a substrate, first, solder is applied to a connection portion on the substrate, and suitable electronic components are placed thereon to enter a reflow process. In the reflow process, the solder is melted by heat, and then the solder is cooled and solidified, whereby the connection portion on the substrate is connected to the electronic component.
在此,在基板經過上述回焊工程之際,有時已熔解的焊錫會飛散。此時,於基板上之連接有電子零件之連接部以外的部位,特別是靠近連接部的地方,會被所飛散的焊錫附著,而成為電性故障的原因,或外觀變差。於是,為了防止在回焊工程中,所飛散的焊錫附著,而在靠近連接部的地方預先貼附了保護膠帶。藉此,即使萬一在靠近連接部的地方有焊錫飛散時,也只會附著在保護膠帶的表面,而可防止附著在位於其下面之靠近連接部的地方。 Here, when the substrate passes through the above-described reflow process, the melted solder sometimes scatters. At this time, a portion other than the connection portion to which the electronic component is connected to the substrate, particularly the portion close to the connection portion, is adhered by the scattered solder, which causes electrical failure or deteriorates in appearance. Therefore, in order to prevent the scattered solder from adhering during the reflow process, a protective tape is attached in advance to the place where the connection portion is located. Thereby, even if solder is scattered near the connection portion, it will only adhere to the surface of the protective tape, and it can be prevented from adhering to the place below the connection portion.
然而,習知的保護膠帶,係於聚醯亞胺(PI)上層積有作為耐熱性高的黏著層之矽系樹脂等而成的構造,因此當保護膠帶的溫度於回焊工程中遇熱而上升時,會導致貼附於基板側的黏著層之黏著力,變得較初期狀態更強。在這樣的情況下,會導致:於後續工程中,難以將保護膠帶從 基板剝離,或在將保護膠帶剝離之後,產生黏著層的殘留等。其結果,產生了在保護膠帶的剝離作業上耗費時間等,而作業性惡化的問題。因此,對於對經過回焊工程的基板作保護之保護膠帶,係要求即使遇熱也不會使黏著力上升,而容易剝離者。 However, the conventional protective tape is a structure in which a bismuth resin which is an adhesive layer having high heat resistance is laminated on polyimine (PI), so that the temperature of the protective tape is heated in the reflow process. When it rises, the adhesion force of the adhesive layer attached to the substrate side becomes stronger than the initial state. In such a case, it will cause: in subsequent projects, it is difficult to remove the protective tape from The substrate is peeled off, or after the protective tape is peeled off, residual of the adhesive layer or the like occurs. As a result, it takes time and the like to peel off the protective tape, and the workability is deteriorated. Therefore, the protective tape for protecting the substrate subjected to the reflow process requires that the adhesion is not increased even if it is heated, and it is easy to peel off.
再者,於上述習知之保護膠帶的情況中,作為黏著層之矽系樹脂,係有對電子零件造成不良的影響之虞,而且,聚醯亞胺係價格昂貴。因此,實際上,並非使用習知的保護膠帶,而是針對去除回焊工程後所飛散的焊錫等作對應。 Further, in the case of the above-mentioned conventional protective tape, the enamel resin as the adhesive layer is adversely affected by the electronic component, and the polyimide is expensive. Therefore, in actuality, instead of using a conventional protective tape, it is possible to correspond to solder or the like scattered after the reflow process is removed.
在此,就容易剝離的觀點而言,於專利文獻1中係揭示有:一種薄型且重工性優異的黏著膠帶。 Here, from the viewpoint of easy peeling, Patent Document 1 discloses an adhesive tape which is thin and excellent in workability.
[專利文獻1]日本專利第3902162號公報 [Patent Document 1] Japanese Patent No. 3902162
然而,於專利文獻1中所揭示的黏著膠帶,係貼附於LCD模組之LCD面板與背光框體之間所使用者,且為兼具對於來自光源的光之光反射性與遮光性的黏著膠帶。因此,與對經過回焊工程的基板作保護之保護膠帶,其用途或使用狀態完全不同。因而,在將專利文獻1中所揭示的黏著膠帶貼附於基板而進入回焊工程的情況下,黏著膠帶 會於工程中遇熱而劣化,而導致難以剝離,或產生殘留等之缺陷產生。 However, the adhesive tape disclosed in Patent Document 1 is attached to a user between an LCD panel of an LCD module and a backlight frame, and has both light reflectivity and light blocking property for light from a light source. Adhesive tape. Therefore, the protective tape used to protect the substrate subjected to the reflow process is completely different in its use or use state. Therefore, in the case where the adhesive tape disclosed in Patent Document 1 is attached to a substrate and enters a reflow process, the adhesive tape is used. It may be deteriorated by heat in the project, resulting in difficulty in peeling off, or generation of defects such as residues.
本發明係鑑於上述之問題而完成者,其目的為提供一種保護膠帶,其係能夠保護經過回焊工程的基板,而且,即使在回焊工程中遇熱,也不會使黏著力上升,而良好地保持剝離容易度。 The present invention has been made in view of the above problems, and an object thereof is to provide a protective tape capable of protecting a substrate subjected to reflow engineering, and which does not cause an increase in adhesion even if it is heated in a reflow process. The ease of peeling is well maintained.
本發明之保護膠帶,係被貼附於經過回焊工程的基板上,且對該基板之至少一部分作保護,該保護膠帶係具有:被貼附於前述基板上之黏著層、金屬層、以及樹脂層,且於前述黏著層上,係至少設置有前述金屬層和前述樹脂層。 The protective tape of the present invention is attached to a substrate subjected to a reflow process, and at least a part of the substrate is protected, the protective tape having an adhesive layer attached to the substrate, a metal layer, and The resin layer is provided with at least the metal layer and the resin layer on the adhesive layer.
依據上述之構造,係可藉由對基板之至少一部分作保護的保護膠帶所有的金屬層,來將回焊工程中的熱反射及散熱至外部。如此一來,藉由金屬層,而能不易將熱傳導至貼附於基板上的黏著層,因此可緩和黏著層的溫度上升。藉此,便不會導致在回焊工程後難以從基板剝離,或在剝離後產生殘留,故可防止作業性的惡化。此外,即使保護膠帶被彎曲,藉由保護膠帶所具有的樹脂層之彈性,而可緩和因彎曲而對金屬層所造成的影響。因而,藉由樹脂層而可防止在將保護膠帶從基板剝離之際金屬層的破裂。 According to the above configuration, the heat in the reflow process can be reflected and dissipated to the outside by protecting all the metal layers of the protective tape against at least a portion of the substrate. In this way, since the metal layer can hardly conduct heat to the adhesive layer attached to the substrate, the temperature rise of the adhesive layer can be alleviated. Thereby, it is not difficult to peel off from the substrate after the reflow process, or it remains after peeling, so that workability can be prevented from deteriorating. Further, even if the protective tape is bent, the influence of the bending on the metal layer can be alleviated by the elasticity of the resin layer which the protective tape has. Therefore, it is possible to prevent cracking of the metal layer when the protective tape is peeled off from the substrate by the resin layer.
此外,於本發明之保護膠帶中,前述樹脂層及前述金屬層,係亦可依照該樹脂層、該金屬層的順序被設置於前 述黏著層上。 Further, in the protective tape of the present invention, the resin layer and the metal layer may be provided in the order of the resin layer and the metal layer. Said on the adhesive layer.
依據上述的構造,即使在依照樹脂層、金屬層的順序被設置於黏著層上的情況下,藉由金屬層,也能不易將熱傳導至貼附於基板上的黏著層,進而,藉由樹脂層的彈性,而可緩和因彎曲而對金屬層所造成的影響。 According to the above configuration, even in the case where the resin layer or the metal layer is provided on the adhesive layer in the order of the resin layer or the metal layer, it is difficult to conduct heat to the adhesive layer attached to the substrate by the metal layer, and further, by the resin The elasticity of the layer can alleviate the effect on the metal layer caused by the bending.
此外,於本發明之保護膠帶中,前述樹脂層及前述金屬層,係亦可依照該金屬層、該樹脂層的順序被設置於前述黏著層上。 Further, in the protective tape of the present invention, the resin layer and the metal layer may be provided on the adhesive layer in the order of the metal layer and the resin layer.
依據上述的構造,即使在依照金屬層、樹脂層的順序被設置於黏著層上的情況下,藉由金屬層,也能不易將熱傳導至貼附於基板上的黏著層,進而,藉由樹脂層的彈性,而可緩和因彎曲而對金屬層所造成的影響。 According to the above configuration, even in the case where the metal layer or the resin layer is provided on the adhesive layer in the order of the metal layer or the resin layer, it is difficult to conduct heat to the adhesive layer attached to the substrate by the metal layer, and further, by the resin The elasticity of the layer can alleviate the effect on the metal layer caused by the bending.
此外,於本發明之保護膠帶中,前述金屬層的厚度,係亦可為6μm~30μm。 Further, in the protective tape of the present invention, the thickness of the metal layer may be 6 μm to 30 μm.
依據上述之構造,由於金屬層的厚度適當,因此變得容易將熱有效地反射及散熱。此外,藉由金屬層的厚度,而不會使保護膠帶過硬而難以剝離,或需要大量的材料而造成高成本。 According to the above configuration, since the thickness of the metal layer is appropriate, it is easy to efficiently reflect and dissipate heat. Further, by the thickness of the metal layer, the protective tape is not too hard to be peeled off, or a large amount of material is required to cause high cost.
此外,於本發明之保護膠帶中,前述金屬層,係亦可由鋁所形成。 Further, in the protective tape of the present invention, the metal layer may be formed of aluminum.
依據上述之構造,由於金屬層是由適當的材料所形成,因此可更有效地將熱反射及散熱至外部。藉此,便能更加緩和黏著層的溫度上升,且可在剝離作業中容易地將保護膠帶剝離,而使作業效率提升。 According to the above configuration, since the metal layer is formed of a suitable material, heat can be more efficiently reflected and radiated to the outside. Thereby, the temperature rise of the adhesive layer can be further alleviated, and the protective tape can be easily peeled off during the peeling operation, and the work efficiency can be improved.
此外,於本發明之保護膠帶中,於前述回焊工程中,前述基板之溫度最高為270℃亦可。 Further, in the protective tape of the present invention, in the above-mentioned reflow process, the temperature of the substrate may be at most 270 °C.
依據上述之構造,於前述回焊工程中,即使基板之溫度成為最高為270℃的情況下,也可適用保護膠帶。 According to the above configuration, in the above-described reflow process, the protective tape can be applied even when the temperature of the substrate is at most 270 °C.
此外,於本發明之保護膠帶中,前述回焊工程,係亦可以紅外線作為熱源。 Further, in the protective tape of the present invention, the above-mentioned reflow process may also use infrared rays as a heat source.
依據上述之構造,係藉由金屬層,而能將在以紅外線作為熱源的回焊工程中之熱反射及散熱至外部。如上所述,即使在以紅外線作為熱源的回焊工程中,亦可適用保護膠帶。 According to the above configuration, the heat in the reflow process using infrared rays as a heat source can be reflected and radiated to the outside by the metal layer. As described above, the protective tape can be applied even in a reflow process using infrared rays as a heat source.
依據本發明之保護膠帶,係藉由金屬層,而能不易將熱傳導至貼附於基板上的黏著層,因此可緩和黏著層的溫度上升。藉此,便不會導致在回焊工程後難以從基板剝離,或在剝離後產生殘留,故可防止作業性的惡化。此外,藉由樹脂層而可防止在將保護膠帶從基板剝離之際金屬層的破裂。 According to the protective tape of the present invention, it is difficult to conduct heat to the adhesive layer attached to the substrate by the metal layer, so that the temperature rise of the adhesive layer can be alleviated. Thereby, it is not difficult to peel off from the substrate after the reflow process, or it remains after peeling, so that workability can be prevented from deteriorating. Further, the resin layer can prevent cracking of the metal layer when the protective tape is peeled off from the substrate.
以下,針對本發明之適合的實施形態,一邊參照附圖一邊進行說明。 Hereinafter, suitable embodiments of the present invention will be described with reference to the accompanying drawings.
使用第1圖及第2圖,來說明本實施形態之保護膠帶1之概要。本實施形態之保護膠帶1,係被貼附於經過回焊工程的基板30上,且對基板30之至少一部分作保護,該保護膠帶係具有:被貼附於基板30上之黏著層11、金屬層14、以及樹脂層13,且於黏著層11上,係至少設置有金屬層14和樹脂層13。此外,第1圖及第2圖所展示之保護膠帶1,係將樹脂層13及金屬層14,依照樹脂層13、金屬層14的順序設置在黏著層11上。另外,並不限定於此等,樹脂層13及金屬層14,係亦可依照金屬層14、樹脂層13的順序被設置於黏著層11上。在此,於本實施形態之回焊工程中,於基板30之溫度,係最高為270℃。 The outline of the protective tape 1 of the present embodiment will be described with reference to Figs. 1 and 2 . The protective tape 1 of the present embodiment is attached to the substrate 30 subjected to the reflow process, and at least a part of the substrate 30 is protected. The protective tape has an adhesive layer 11 attached to the substrate 30, The metal layer 14 and the resin layer 13 are provided with at least a metal layer 14 and a resin layer 13 on the adhesive layer 11. Further, in the protective tape 1 shown in Figs. 1 and 2, the resin layer 13 and the metal layer 14 are provided on the adhesive layer 11 in the order of the resin layer 13 and the metal layer 14. Further, the resin layer 13 and the metal layer 14 may be provided on the adhesive layer 11 in the order of the metal layer 14 and the resin layer 13 in order not to be limited thereto. Here, in the reflow process of the present embodiment, the temperature at the substrate 30 is at most 270 °C.
如第1圖所示,保護膠帶1,係如一般的膠帶般將長尺狀者捲繞成滾筒狀地作收納,使用時,係由作業者的手等來切取成所需的大小。此外,已被切取的保護膠帶1,係使黏著層11為基板30之表面側而被貼附於基板30上之所欲保護的部位。 As shown in Fig. 1, the protective tape 1 is wound into a roll shape as a general tape, and is cut into a desired size by the operator's hand or the like when used. Further, the protective tape 1 which has been cut out is such that the adhesive layer 11 is the surface side of the substrate 30 and is attached to the substrate 30 to be protected.
保護膠帶1,係從貼附於基板30之側起,依序層積有:黏著層11、樹脂層13、以及金屬層14而形成。另外,金屬層14,係藉由黏著劑層12而被貼附於樹脂層13上。此外,位於保護膠帶1之最外層的金屬層14,係可將回焊工程的熱70反射,並且,將進入金屬層14的熱70a散熱到外部。因此,保護膠帶1,係能不易將熱傳導至位於金屬層14的下面之黏著層11。另外,保護膠帶1,係即使 在從貼附於基板30之側起,依序層積有:黏著層11、金屬層14、以及樹脂層13的情況下,藉由金屬層14,也可將已透過樹脂層13的熱70反射,並且,將進入的熱70a散熱至外部。 The protective tape 1 is formed by laminating the adhesive layer 11, the resin layer 13, and the metal layer 14 from the side attached to the substrate 30. Further, the metal layer 14 is attached to the resin layer 13 by the adhesive layer 12. Further, the metal layer 14 located at the outermost layer of the protective tape 1 reflects the heat 70 of the reflow process and heats the heat 70a entering the metal layer 14 to the outside. Therefore, the protective tape 1 can easily conduct heat to the adhesive layer 11 located under the metal layer 14. In addition, the protective tape 1 is even In the case where the adhesive layer 11, the metal layer 14, and the resin layer 13 are laminated in this order from the side attached to the substrate 30, the heat that has passed through the resin layer 13 can also be made by the metal layer 14. Reflected, and the incoming heat 70a is radiated to the outside.
具體而言,參照第2圖來對保護膠帶1之使用方法加以說明。本實施形態之基板30,係使用稱為可撓性印刷基板(FPC)者。該基板30,係被配置於後述第3圖之回焊工程中所使用的支撐板20上。此外,於基板30上,係設置有將電子零件40等作連接的連接部35a、35b。在第2圖的情況下,於連接部35a,係透過焊錫45來將電子零件40作連接,且於連接部35b,係貼附有保護膠帶1。如此一來,貼附於基板30的保護膠帶1,也同時被貼附於支撐板20的表面,且藉由保護膠帶1而使基板30固定於支撐板20上。如上所述,藉由將保護膠帶1貼附於沒有連接電子零件40的連接部35b處,而防止回焊工程中焊錫45熔解,而導致飛散的焊錫45附著於基板30上。另外,保護膠帶1,並不限定於基板30之連接部35b,而是可適當地貼附於基板30上之所欲保護的部分。 Specifically, a method of using the protective tape 1 will be described with reference to Fig. 2 . In the substrate 30 of the present embodiment, a flexible printed circuit board (FPC) is used. The substrate 30 is placed on the support plate 20 used in the reflow process of Fig. 3 to be described later. Further, on the substrate 30, connection portions 35a and 35b for connecting the electronic component 40 and the like are provided. In the case of Fig. 2, the electronic component 40 is connected to the connecting portion 35a via the solder 45, and the protective tape 1 is attached to the connecting portion 35b. As a result, the protective tape 1 attached to the substrate 30 is also attached to the surface of the support plate 20, and the substrate 30 is fixed to the support plate 20 by the protective tape 1. As described above, by attaching the protective tape 1 to the connecting portion 35b where the electronic component 40 is not attached, the solder 45 is prevented from being melted in the reflow process, and the scattered solder 45 is attached to the substrate 30. Further, the protective tape 1 is not limited to the connecting portion 35b of the substrate 30, but may be attached to the portion to be protected on the substrate 30 as appropriate.
在此,如上所述,如本實施形態之基板30之類的可撓性印刷基板,係多半會在作業時頻繁地被彎曲。隨著上述情況的發生,有時用以保護基板30之保護膠帶1也會跟著彎曲。此外,由於在將保護膠帶1從基板30剝離之 際,保護膠帶1也會被彎曲,因此保護膠帶1,係除了對於由回焊工程所致之熱的對策以外,亦將具有即使彎曲也不易破裂的柔軟性和強度一事納入考量,而對各構成的材料或厚度等加以設定。 Here, as described above, the flexible printed circuit board such as the substrate 30 of the present embodiment is often bent frequently during work. As the above occurs, the protective tape 1 for protecting the substrate 30 is sometimes bent. In addition, since the protective tape 1 is peeled off from the substrate 30 In addition, the protective tape 1 is also bent. Therefore, in addition to the countermeasure against the heat caused by the reflow process, the protective tape 1 is also considered to have flexibility and strength which are not easily broken even if bent, and The material or thickness of the composition is set.
對本實施形態之保護膠帶1之各構成進行說明。 Each configuration of the protective tape 1 of the present embodiment will be described.
首先,針對保護膠帶1之金屬層14進行說明。金屬層14,係藉由黏著劑層12而被貼附於後述之樹脂層13上,且被配置於保護膠帶1的最外層,並具有將回焊工程中的熱反射,或散熱的功用。此外,該金屬層14的厚度,係較理想為6μm~30μm。此乃因為金屬層14的厚度若較6μm更薄,則在剝離作業之際會變得容易破裂,或變得難以散熱。另一方面,乃因為金屬層14的厚度若較30μm更厚,則會因為厚度而使保護膠帶1變得過硬而難以剝離,或需要大量的材料而造成高成本。此外,金屬層14,係亦可為鋁、銀、銅等之金屬電鍍,且亦可利用金屬箔。其中,就容易將回焊工程中的熱反射,並且散熱的特性而言,較理想為在金屬層14方面使用鋁。 First, the metal layer 14 of the protective tape 1 will be described. The metal layer 14 is attached to the resin layer 13 to be described later by the adhesive layer 12, and is disposed on the outermost layer of the protective tape 1, and has a function of reflecting heat in the reflow process or dissipating heat. Further, the thickness of the metal layer 14 is preferably 6 μm to 30 μm. This is because if the thickness of the metal layer 14 is thinner than 6 μm, it may be easily broken during the peeling operation or it may become difficult to dissipate heat. On the other hand, if the thickness of the metal layer 14 is thicker than 30 μm, the protective tape 1 becomes too hard to be peeled off due to the thickness, or a large amount of material is required to cause high cost. Further, the metal layer 14 may be plated with a metal such as aluminum, silver or copper, and a metal foil may also be used. Among them, it is easy to reflect heat in the reflow process, and in terms of heat dissipation characteristics, it is preferable to use aluminum in the metal layer 14.
依據該構成,由於可更有效地將熱反射及散熱至外部,因此可緩和黏著層11的溫度上升,且可在剝離作業中容易地將保護膠帶剝離,而使作業效率提升。 According to this configuration, since the heat can be more effectively reflected and radiated to the outside, the temperature rise of the adhesive layer 11 can be alleviated, and the protective tape can be easily peeled off during the peeling operation, and the work efficiency can be improved.
此外,由於金屬層14的厚度適當,因此變得容易將熱有效地反射及散熱。進而,藉由金屬層14的厚度,而 不會使保護膠帶1變得過硬而難以剝離,或需要大量的材料而造成高成本。 Further, since the thickness of the metal layer 14 is appropriate, it becomes easy to efficiently reflect and dissipate heat. Further, by the thickness of the metal layer 14, The protective tape 1 is not made too hard to be peeled off, or a large amount of material is required to cause high cost.
黏著劑層12,係介於金屬層14與樹脂層13之間,且具有將金屬層14貼附於樹脂層13上的功用。該黏著劑層12,係藉由聚氨基甲酸酯系黏著劑或聚酯系黏著劑所形成,且其厚度為1~6μm。 The adhesive layer 12 is interposed between the metal layer 14 and the resin layer 13 and has a function of attaching the metal layer 14 to the resin layer 13. The adhesive layer 12 is formed of a polyurethane adhesive or a polyester adhesive, and has a thickness of 1 to 6 μm.
接著,針對保護膠帶1之樹脂層13進行說明。樹脂層13,係藉由黏著劑層12而與已被貼附的金屬層14一起被設置於後述之黏著層11上。在第1圖的情況下,樹脂層13,係介於金屬層14與黏著層11之間,且藉由黏著劑層12而被貼合於金屬層14。且,樹脂層13,係防止在將保護膠帶1剝離之際金屬層14的破裂。 Next, the resin layer 13 of the protective tape 1 will be described. The resin layer 13 is provided on the adhesive layer 11 to be described later together with the metal layer 14 to be attached by the adhesive layer 12. In the case of FIG. 1, the resin layer 13 is interposed between the metal layer 14 and the adhesive layer 11, and is bonded to the metal layer 14 by the adhesive layer 12. Further, the resin layer 13 prevents cracking of the metal layer 14 when the protective tape 1 is peeled off.
樹脂層13,係藉由聚對苯二甲酸乙二酯(PET)、聚醯亞胺(PI)、環氧(樹脂)等之樹脂而形成。其中,就防止在將保護膠帶1剝離之際金屬層14的破裂,並且不會過度耗費成本的觀點而言,較理想為使用聚對苯二甲酸乙二酯。此外,樹脂層13的厚度,係為6μm~50μm。此乃因為樹脂層13的厚度若較6μm更薄,則在緩和對於金屬層14彎曲所造成的影響一事會變得較為困難。另一方面,乃因為樹脂層13的厚度若較50μm更厚,則會因為厚度而使保 護膠帶1變得過硬而難以剝離,或需要大量的材料而造成高成本。另外,於樹脂層13所使用的聚對苯二甲酸乙二酯,係在約180℃的溫度下會變成黃色而開始熱變形,且在約240℃的溫度下會收縮。因此,本實施形態之金屬層14,係將熱反射及散熱,以免樹脂層13的溫度到達會開始變色的180℃。 The resin layer 13 is formed of a resin such as polyethylene terephthalate (PET), polyimine (PI), or epoxy (resin). Among them, polyethylene terephthalate is preferably used from the viewpoint of preventing cracking of the metal layer 14 when the protective tape 1 is peeled off, and without excessive cost. Further, the thickness of the resin layer 13 is 6 μm to 50 μm. This is because if the thickness of the resin layer 13 is thinner than 6 μm, it is difficult to alleviate the influence on the bending of the metal layer 14. On the other hand, because the thickness of the resin layer 13 is thicker than 50 μm, it is guaranteed by the thickness. The protective tape 1 becomes too hard to be peeled off, or a large amount of material is required to cause high cost. Further, the polyethylene terephthalate used in the resin layer 13 turns yellow at a temperature of about 180 ° C to start thermal deformation, and shrinks at a temperature of about 240 ° C. Therefore, the metal layer 14 of the present embodiment reflects heat and dissipates heat so that the temperature of the resin layer 13 does not reach 180 ° C which starts to change color.
另外,在第1圖的情況下,樹脂層13,係雖介於金屬層14與黏著層11之間,但亦可被設置於金屬層14之表面上(保護膠帶1的最外層)。此時,不但能具有緩和對於金屬層14的彎曲所造成的影響之功用,而且也具有保護金屬層14不受酸性之藥品等影響之功用。 Further, in the case of Fig. 1, the resin layer 13 is interposed between the metal layer 14 and the adhesive layer 11, but may be provided on the surface of the metal layer 14 (the outermost layer of the protective tape 1). At this time, not only the function of alleviating the influence on the bending of the metal layer 14 but also the function of protecting the metal layer 14 from the acidic drug or the like can be provided.
依據如上所述之樹脂層13的構造,即使保護膠帶1被彎曲,藉由樹脂層13之彈性,而可緩和因彎曲而對金屬層14所造成的影響。因而,藉由樹脂層13而可防止在將保護膠帶1從基板30剝離之際金屬層14的破裂。 According to the configuration of the resin layer 13 as described above, even if the protective tape 1 is bent, the influence on the metal layer 14 due to the bending can be alleviated by the elasticity of the resin layer 13. Therefore, cracking of the metal layer 14 when the protective tape 1 is peeled off from the substrate 30 can be prevented by the resin layer 13.
接著,針對保護膠帶1之黏著層11進行說明。黏著層11,係被配置於接觸於基板30之側,且與層積於被層積在金屬層14的樹脂層13一起被貼附於基板30上。黏著層11,係藉由丙烯酸系、橡膠系、矽系、及氨基甲酸酯系等之樹脂而形成。此等當中,若考慮透明性或黏著力的安定性等,則黏著層11,係以使用丙烯酸系樹脂來形成較為理想。此外,黏著層11的厚度,係為5μm~20μm。此 乃因為黏著層11的厚度若較5μm更薄,則會變得難以貼附於基板30,且若較20μm更厚,則會變得容易在將保護膠帶1剝離之際產生殘留。另外,在黏著層11為由丙烯酸系樹脂所形成的情況下,一旦施加250℃以上的熱便會開始劣化,因此加諸於黏著層11的熱之溫度,係有必要設定在至少250℃以下。 Next, the adhesive layer 11 of the protective tape 1 will be described. The adhesive layer 11 is disposed on the side in contact with the substrate 30, and is attached to the substrate 30 together with the resin layer 13 laminated on the metal layer 14. The adhesive layer 11 is formed of a resin such as acrylic, rubber, lanthanide, or urethane. Among these, it is preferable to form the adhesive layer 11 by using an acrylic resin in consideration of transparency, adhesion stability, and the like. Further, the thickness of the adhesive layer 11 is 5 μm to 20 μm. this When the thickness of the adhesive layer 11 is thinner than 5 μm, it becomes difficult to adhere to the substrate 30, and if it is thicker than 20 μm, it tends to cause residue when the protective tape 1 is peeled off. Further, when the adhesive layer 11 is formed of an acrylic resin, heat of 250 ° C or more is started to deteriorate, so that the temperature of the heat applied to the adhesive layer 11 is required to be at least 250 ° C or less. .
接著,針對貼附有具有如上所述之構造的保護膠帶1之基板30進行說明。本實施形態之基板30,係為可撓性印刷基板(FPC)。基板30,係將無圖示的訊號用配線圖案或接地用配線圖案等之複數的配線圖案,設置於由聚醯亞胺所形成之基底構件上,且於其表面上,係藉由絕緣層等所覆蓋。於具有這樣的構造之基板30上,係設置有連接部35a及連接部35b,且藉由焊錫45來將配置於連接部35a的連接端子與配置於電子零件40的連接端子作接著,而使兩者電連接。另外,由聚醯亞胺所形成的基板30,係能耐受300℃以上的熱。此外,如第2圖所示,使保護膠帶1貼附於基板30之沒有連接電子零件40的連接部35b處,以防止回焊工程中所飛散的焊錫45附著於基板30上。另外,於本實施形態中,雖基板30是使用可撓性印刷基板(FPC),但亦可使用其他種類的基板。 Next, the substrate 30 to which the protective tape 1 having the above configuration is attached will be described. The substrate 30 of the present embodiment is a flexible printed circuit board (FPC). The substrate 30 is provided on a base member formed of polyimide by a plurality of wiring patterns such as a signal wiring pattern or a ground wiring pattern (not shown), and is provided on the surface thereof by an insulating layer. Etc. The substrate 30 having such a structure is provided with a connection portion 35a and a connection portion 35b, and the connection terminal disposed on the connection portion 35a and the connection terminal disposed on the electronic component 40 are connected by the solder 45. Both are electrically connected. Further, the substrate 30 formed of polyimine can withstand heat of 300 ° C or higher. Further, as shown in FIG. 2, the protective tape 1 is attached to the connection portion 35b of the substrate 30 where the electronic component 40 is not connected, so that the solder 45 scattered in the reflow process is prevented from adhering to the substrate 30. Further, in the present embodiment, the flexible printed circuit (FPC) is used as the substrate 30, but other types of substrates may be used.
接著,使用第3圖,來針對本實施形態之回焊工程進行說明。首先,針對回焊工程中所使用的回焊裝置50進行說明。回焊裝置50,係具有:基底部51、輸送帶52、以及熱爐部55。基底部51,係具有長尺狀的框體,且成為回焊裝置50的基底。輸送帶52,係被設置於基底部51上,且在內部設置有複數個保持一定的距離並在相同方向上並排地作配列的輥53,並以覆蓋各輥53上下面的方式來架設帶。輥53,係剖面呈圓形之細長的圓柱狀,且藉由讓各輥53以圓的中心為軸作旋轉,而使輸送帶52的帶在左右方向移動。熱爐部55,係全長為2m,且在其內部係設置有紅外線照射部56,而能夠朝向輸送帶52上照射紅外線。此外,紅外線照射部56,係與輸送帶52之間隔著一定的間隔地作設置。藉此,能夠對經過輸送帶52上的基板30,從紅外線照射部56照射紅外線。 Next, the reflow process of this embodiment will be described using FIG. First, the reflow device 50 used in the reflow process will be described. The reflow device 50 has a base portion 51, a conveyor belt 52, and a hot furnace portion 55. The base portion 51 has a long-sized frame and serves as a base of the reflow device 50. The conveyor belt 52 is disposed on the base portion 51, and is internally provided with a plurality of rollers 53 which are held at a certain distance and arranged side by side in the same direction, and are provided with a belt covering the upper and lower sides of the rollers 53. . The roller 53 has an elongated cylindrical shape in a circular cross section, and the belt of the conveyor belt 52 is moved in the left-right direction by rotating each roller 53 about the center of the circle. The hot furnace portion 55 has a total length of 2 m and is provided with an infrared ray irradiation portion 56 inside, and is capable of irradiating infrared rays onto the conveyor belt 52. Further, the infrared ray irradiation unit 56 is provided at a constant interval from the conveyor belt 52. Thereby, infrared rays can be irradiated from the infrared ray irradiation part 56 to the board|substrate 30 which passes the conveyance belt 52.
在此,於回焊工程前,係在支撐板20上配列複數個基板30,且將保護膠帶1貼附於未連接有電子零件40的連接部35b。此時,保護膠帶1,係以使基板30固定於支撐板20的方式,也同時被貼附於支撐板20上。另外,保護膠帶1之黏著層11,係為了接觸到基板30而被貼附有保護膠帶1。接著,將焊錫膏塗佈於基板30的連接部35a,並在其上放置電子零件40,而進行回焊的準備。 Here, before the reflow process, a plurality of substrates 30 are arranged on the support plate 20, and the protective tape 1 is attached to the connection portion 35b to which the electronic component 40 is not attached. At this time, the protective tape 1 is attached to the support plate 20 at the same time so that the substrate 30 is fixed to the support plate 20. Moreover, the adhesive layer 11 of the protective tape 1 is attached with the protective tape 1 in order to contact the board|substrate 30. Next, solder paste is applied to the connection portion 35a of the substrate 30, and the electronic component 40 is placed thereon to prepare for reflow.
然後,如第3圖(a)所示,將配列有如上述般所準備的基板30之支撐板20,放置在輸送帶52上。接著,藉由輸送帶52之各輥53旋轉,輸送帶52會朝向圖的右方向移 動,且配列有基板30的支撐板20也會跟著一起移動。藉由輸送帶52而朝向右方向移動的基板30,係如第3圖(b)所示,之後會到達熱爐部55之下方的位置,而從紅外線照射部56照射紅外線到基板30上。此時,在熱爐部55下方作移動的基板30,係耗費3分鐘在全長2m的熱爐部55內作移動。而,移動中基板30上的溫度,係從熱爐部55最初的位置開始溫度會緩緩地上升,之後會到達最高溫度270℃,且隨著移動到熱爐部55最後的位置處溫度會緩緩下降。藉由此溫度(270℃)的熱,而塗佈在連接部35a的焊錫45會被熔解,且連接部35a與電子零件40所配置的連接端子,會藉由焊錫45而被接著,而使兩者電連接。另外,如第3圖(b)所示,加諸於保護膠帶1上的熱,會藉由金屬層14而傳導至支撐板20上溫度較低的部位。如此一來,保護膠帶1之黏著層11的溫度,會藉由金屬層14而將紅外線反射到外部,且由紅外線所產生的熱會被散熱,因此至少會抑制在黏著層11開始劣化的250℃以下。另外,於第3圖中,本實施形態之回焊工程,係雖以紅外線作為熱源,但沒有必要限定於此。例如,亦可為藉由熱風吹拂而進行焊接的工程。只要是能藉由保護膠帶1之金屬層14來將熱反射及散熱者任何手段皆可使用。 Then, as shown in Fig. 3(a), the support plate 20 on which the substrate 30 prepared as described above is placed is placed on the conveyor belt 52. Then, by the rotation of each roller 53 of the conveyor belt 52, the conveyor belt 52 is moved toward the right direction of the figure. The support plate 20, which is arranged with the substrate 30, also moves together. The substrate 30 that has moved in the right direction by the conveyor belt 52 is as shown in FIG. 3(b), and then reaches the position below the hot furnace portion 55, and the infrared ray irradiation portion 56 irradiates infrared rays onto the substrate 30. At this time, the substrate 30 that moves under the hot furnace portion 55 is moved in the hot furnace portion 55 having a total length of 2 m in three minutes. On the other hand, the temperature on the moving substrate 30 gradually rises from the initial position of the hot furnace portion 55, and then reaches the maximum temperature of 270 ° C, and the temperature rises as it moves to the last position of the hot furnace portion 55. Slowly falling. By the heat of this temperature (270 ° C), the solder 45 applied to the connection portion 35a is melted, and the connection portion where the connection portion 35a and the electronic component 40 are disposed is followed by the solder 45, thereby making it possible to Both are electrically connected. Further, as shown in Fig. 3(b), the heat applied to the protective tape 1 is conducted to the lower portion of the support plate 20 by the metal layer 14. As a result, the temperature of the adhesive layer 11 of the protective tape 1 is reflected by the metal layer 14 to the outside, and the heat generated by the infrared rays is dissipated, so that at least the deterioration of the adhesive layer 11 is suppressed. Below °C. Further, in Fig. 3, the reflow process of the present embodiment uses infrared rays as a heat source, but is not necessarily limited thereto. For example, it is also possible to perform welding by hot air blowing. Any means that can reflect and dissipate heat by the metal layer 14 of the protective tape 1 can be used.
如此一來,藉由對基板30之至少一部分作保護的保護膠帶1所有之金屬層14,而可將回焊工程中之熱反射及散熱至外部。如此一來,藉由金屬層14,而能不易將熱傳導至貼附於基板30上的黏著層11,因此可緩和黏著層11 的溫度上升。藉此,便不會導致在回焊工程後難以從基板30剝離,或在剝離後產生殘留,而可防止作業性的惡化。 In this way, by protecting at least a portion of the substrate 30, all of the metal layer 14 of the protective tape 1 can reflect and dissipate heat from the reflow process to the outside. As a result, the metal layer 14 can easily conduct heat to the adhesive layer 11 attached to the substrate 30, so that the adhesive layer 11 can be alleviated. The temperature rises. Thereby, it is not difficult to peel off from the substrate 30 after the reflow process, or it remains after peeling, and it can prevent deterioration of workability.
此外,藉由金屬層14,而可將在以紅外線作為熱源的回焊工程中之熱反射及散熱至外部。如此一來,即使在以紅外線作為熱源的回焊工程中,亦可適用保護膠帶1。 Further, by the metal layer 14, heat in the reflow process using infrared rays as a heat source can be reflected and radiated to the outside. In this way, the protective tape 1 can be applied even in a reflow process using infrared rays as a heat source.
此外,於前述回焊工程中,即使基板30之溫度成為最高為270℃的情況下,也可適用本實施形態之保護膠帶1。 Further, in the above-described reflow process, the protective tape 1 of the present embodiment can be applied even when the temperature of the substrate 30 is at most 270 °C.
接著,使用本實施形態之保護膠帶1的實施例1及比較例1來具體地說明本發明。 Next, the present invention will be specifically described using Example 1 and Comparative Example 1 of the protective tape 1 of the present embodiment.
於實施例1中,使用第1圖所展示之本發明的保護膠帶1,並由金屬層14、樹脂層13、以及黏著層11所構成。具體而言,金屬層14,係由鋁(Al)箔所形成,且其厚度為9μm。此外,樹脂層13,係由聚對苯二甲酸乙二酯(PET)所形成,且其厚度為12μm。再者,黏著層11,係藉由丙烯酸系樹脂所形成,且其厚度為10μm。另一方面,比較例,係不使用金屬層14,而是僅以由聚對苯二甲酸乙二酯(PET)所成之樹脂層13及由丙烯酸系樹脂所成之黏著層11的構造來姑且進行了實驗,但保護膠帶會收縮而無法測定。因此,於比較例1中,係使用了僅由環氧樹脂所成之樹脂層13及丙烯酸系樹脂所成之黏著層11的構造。 In the first embodiment, the protective tape 1 of the present invention shown in Fig. 1 is used, and is composed of a metal layer 14, a resin layer 13, and an adhesive layer 11. Specifically, the metal layer 14 is formed of an aluminum (Al) foil and has a thickness of 9 μm. Further, the resin layer 13 was formed of polyethylene terephthalate (PET) and had a thickness of 12 μm. Further, the adhesive layer 11 was formed of an acrylic resin and had a thickness of 10 μm. On the other hand, in the comparative example, the metal layer 14 was not used, but only the resin layer 13 made of polyethylene terephthalate (PET) and the adhesive layer 11 made of an acrylic resin were used. The experiment was carried out, but the protective tape shrinks and cannot be measured. Therefore, in Comparative Example 1, a structure in which the resin layer 13 made of only an epoxy resin and the adhesive layer 11 made of an acrylic resin were used was used.
接著,就評估方法而言,係進行了使用有依JIS Z 0237 所規定的黏著膠帶、黏著薄片試驗方法的剝離試驗。具體而言,係將切割成寬10mm、長100mm的保護膠帶1,貼附於由不鏽鋼材料所構成的試驗板上,且藉由拉力試驗機來測量將保護膠帶1從試驗板朝180°方向拉扯剝離時的拉力。 Then, as far as the evaluation method is concerned, the system has been used in accordance with JIS Z 0237. Peel test for the specified adhesive tape and adhesive sheet test method. Specifically, the protective tape 1 cut into a width of 10 mm and a length of 100 mm is attached to a test plate made of a stainless steel material, and the protective tape 1 is measured from the test plate toward the 180° direction by a tensile tester. Pull the pulling force when peeling off.
在第3圖所示之回焊工程的前後,實施了如上所述般的剝離試驗。也就是說,分別於在紅外線下基板30之溫度成為270℃的回焊工程之前、實施第1次回焊工程之後、實施第3次回焊工程之後實施了剝離實驗。另外,試驗,係於實施例1及比較例1中各準備4種試樣的試驗品,並測量了各自的拉力。將其結果展示於第4圖。 The peeling test as described above was carried out before and after the reflow process shown in Fig. 3. In other words, the peeling test was carried out before the reflow process in which the temperature of the substrate 30 under infrared rays was 270 ° C, after the first reflow process was performed, and after the third reflow process was performed. Further, in the test, the test pieces of the four kinds of samples were prepared in each of Example 1 and Comparative Example 1, and the respective tensile forces were measured. The results are shown in Figure 4.
依據第4圖所示的試驗結果,回焊工程前的測量值,係於實施例1、比較例1中拉力的平均值皆相同為0.27N,並無差異。其後,若於經過1次回焊工程之後實施試驗,則實施例1的拉力平均值為0.30N,而比較例1的拉力平均值成為0.61N,兩者的拉力出現了差異。接著,若於經過3次回焊工程之後實施試驗,則相對於實施例1的拉力平均值為0.33N,比較例1的拉力平均值成為1.04N,兩者的拉力出現了較大的差異。此外,可得知:於實施例1中,通過1次回焊工程時,拉力為1.1倍,經過3次回焊工程時,雖拉力為1.22倍幾乎沒有改變地推移,但於比較例1中,通過1次回焊工程時,拉力為2.25倍,通過3次回焊工程時,大大地上升至3.85倍。此乃認為是因為在比較例1的情況下,由於不具有金屬層14,因此無 法將熱反射及散熱,而使其下面的黏著層11的溫度上升。也就是說,認為:藉由回焊工程的熱,而導致黏著層11的溫度上升至黏著層11會開始劣化的250℃以上,且黏著層11的材料會分解而使黏著力變強,其結果造成在從試驗板60剝離時的拉力變大。另一方面,在實施例1的情況中,係由於最外層為金屬層14,因此,藉由金屬層14而將熱反射及散熱,且不易將熱傳導至黏著層11,而黏著層11的溫度便不會上升到250℃以上。因此,黏著層11的黏著力,會保持在起始的狀態,且在從基板30將保護膠帶1剝離時的拉力也不太會改變,而在從試驗板60剝離時,也不會導致黏著層11的殘留產生。如上所述,可獲得實施例1係全部的試驗品皆為『○』,而比較例為『×』的綜合評價。 According to the test results shown in Fig. 4, the measured values before the reflow process were the same as the average values of the tensile forces in Example 1 and Comparative Example 1 being 0.27 N, and there was no difference. Thereafter, if the test was carried out after one reflow process, the average tensile force of Example 1 was 0.30 N, and the average value of the tensile force of Comparative Example 1 was 0.61 N, and the tensile forces of the two were different. Next, when the test was carried out after three times of reflowing, the average value of the tensile force with respect to Example 1 was 0.33 N, and the average value of the tensile force of Comparative Example 1 was 1.04 N, and the tensile force of the two showed a large difference. Further, in the first embodiment, in the case of the first reflow process, the tensile force was 1.1 times, and when the reflow process was performed three times, the tensile force was changed to 1.22 times with almost no change, but in the comparative example 1, When the reflowing project was carried out once, the pulling force was 2.25 times, and when it was passed through the three reflowing projects, it greatly increased to 3.85 times. This is considered to be because in the case of Comparative Example 1, since there is no metal layer 14, there is no The method reflects heat and dissipates heat, and causes the temperature of the adhesive layer 11 below it to rise. In other words, it is considered that the temperature of the adhesive layer 11 rises to 250 ° C or more at which the adhesive layer 11 starts to deteriorate by the heat of the reflow process, and the material of the adhesive layer 11 is decomposed to increase the adhesive force. As a result, the tensile force at the time of peeling from the test plate 60 becomes large. On the other hand, in the case of Embodiment 1, since the outermost layer is the metal layer 14, heat is radiated and dissipated by the metal layer 14, and heat is not easily conducted to the adhesive layer 11, and the temperature of the adhesive layer 11 is maintained. It will not rise above 250 °C. Therefore, the adhesive force of the adhesive layer 11 is maintained at the initial state, and the tensile force when the protective tape 1 is peeled off from the substrate 30 is less likely to change, and does not cause adhesion when peeled off from the test plate 60. The residue of layer 11 is produced. As described above, all of the test articles of Example 1 were obtained as "○", and the comparative example was "X".
接著,使用本實施形態之保護膠帶1的實施例2~4及比較例2來具體地說明本發明。 Next, the present invention will be specifically described using Examples 2 to 4 and Comparative Example 2 of the protective tape 1 of the present embodiment.
實施例2、3及比較例2,雖皆具有與本實施形態之保護膠帶1同樣的構造,但僅金屬層14的厚度各不相同。具體而言,於實施例2中之金屬層14的厚度為6μm、實施例3中之金屬層14的厚度為9μm、比較例2中之金屬層14的厚度為0.1μm。另外,其他的厚度係與第4圖所示之實施例1相同。此外,實施例4,係於黏著層11上設置有厚度為9μm之金屬層14,且進一步於金屬層14之上 ,層積有由12μm之聚醯亞胺(PI)所構成之樹脂層13。在該實施例4的情況中,藉由聚醯亞胺(PI)所構成之樹脂層13,而防止在將保護膠帶1從基板30剝離之際金屬層14的破裂。進而,由於由聚醯亞胺(PI)所構成之樹脂層13係位於保護膠帶1的最外層,因此也可保護金屬層14不受酸性等之藥品影響。 In Examples 2, 3 and Comparative Example 2, the same structure as the protective tape 1 of the present embodiment was obtained, but only the thickness of the metal layer 14 was different. Specifically, the thickness of the metal layer 14 in Example 2 was 6 μm, the thickness of the metal layer 14 in Example 3 was 9 μm, and the thickness of the metal layer 14 in Comparative Example 2 was 0.1 μm. In addition, the other thickness is the same as that of the first embodiment shown in Fig. 4. In addition, in the embodiment 4, the metal layer 14 having a thickness of 9 μm is disposed on the adhesive layer 11 and further on the metal layer 14 A resin layer 13 composed of 12 μm polyimine (PI) was laminated. In the case of the fourth embodiment, the resin layer 13 composed of polyimine (PI) prevents cracking of the metal layer 14 when the protective tape 1 is peeled off from the substrate 30. Further, since the resin layer 13 composed of polyimine (PI) is located at the outermost layer of the protective tape 1, the metal layer 14 can be protected from chemicals such as acid.
使用具有如上述般的構造之實施例2~4及比較例2,分別於實施回焊工程之前、實施第1次回焊工程之後、實施第3次回焊工程之後實施了前述剝離實驗。此外,將實施例2~4及比較例2的保護膠帶,投入溫度不同的熱風乾燥機3分鐘,並在那之後實施了剝離試驗。另外,於熱風乾燥機之試驗中,係分別實施了在200℃的溫度下加熱3分鐘的試驗,和在270℃的溫度下加熱3分鐘的試驗。將其結果展示於第5圖。 Using the examples 2 to 4 and the comparative example 2 having the above-described structures, the peeling test was carried out before the reflow process was carried out, after the first reflow process, and after the third reflow process. Further, the protective tapes of Examples 2 to 4 and Comparative Example 2 were placed in a hot air dryer having different temperatures for 3 minutes, and then a peeling test was performed. Further, in the test of the hot air dryer, a test of heating at a temperature of 200 ° C for 3 minutes and a test of heating at a temperature of 270 ° C for 3 minutes were respectively carried out. The results are shown in Figure 5.
依據第5圖所展示的試驗結果,回焊工程前的測量值如下:實施例2為0.38N、實施例3為0.45N、實施例4為0.32N、比較例2為0.17N。接著,若在通過1次回焊工程之後實施試驗,則實施例2為0.43N、實施例3為0.51N、實施例4為0.39N、比較例2為0.52N。此外,若在通過3次回焊工程之後實施試驗,則實施例2為0.49N、實施例3為0.55N、實施例4為0.36N、比較例2為0.62N。如上所述,於金屬層14的厚度不同,以及金屬層14上之樹脂層13的有無方面,即使實施3次回焊工程,拉力也沒有太大的差異。 According to the test results shown in Fig. 5, the measured values before the reflow process were as follows: Example 2 was 0.38 N, Example 3 was 0.45 N, Example 4 was 0.32 N, and Comparative Example 2 was 0.17 N. Next, when the test was carried out after passing through the primary reflow process, Example 2 was 0.43 N, Example 3 was 0.51 N, Example 4 was 0.39 N, and Comparative Example 2 was 0.52 N. Further, when the test was carried out after passing through the three reflow processes, Example 2 was 0.49 N, Example 3 was 0.55 N, Example 4 was 0.36 N, and Comparative Example 2 was 0.62 N. As described above, in terms of the thickness of the metal layer 14 and the presence or absence of the resin layer 13 on the metal layer 14, even if the reflow process is performed three times, the tensile force is not greatly different.
此外,於在200℃的溫度下加熱3分鐘後之熱風乾燥機的試驗中,實施例2為0.44N、實施例3為0.48N、實施例4為0.35N、比較例2為0.34N。然而,於在270℃的溫度下加熱3分鐘後之熱風乾燥機的試驗中,實施例2為0.41N、實施例3為0.38N、實施例4為0.37N,而相對於在200℃的溫度下加熱3分鐘後之熱風乾燥機的試驗中並沒有太大的變化,在比較例2的情況中,保護膠帶會收縮而無法測量。 Further, in the test of the hot air dryer after heating at a temperature of 200 ° C for 3 minutes, Example 2 was 0.44 N, Example 3 was 0.48 N, Example 4 was 0.35 N, and Comparative Example 2 was 0.34 N. However, in the test of the hot air dryer after heating at 270 ° C for 3 minutes, Example 2 was 0.41 N, Example 3 was 0.38 N, and Example 4 was 0.37 N, and relative to the temperature at 200 ° C. There was not much change in the test of the hot air dryer after heating for 3 minutes, and in the case of Comparative Example 2, the protective tape was shrunk and could not be measured.
此乃認為在比較例2的情況中,由於金屬層14的厚度較薄,因此在270℃的溫度之熱風乾燥機試驗中,金屬層14並無法耐熱。由其結果得知:在金屬層14的厚度至少為6μm以上的情況下,不論是在3次的回焊工程之實施後,或投入在270℃的溫度下加熱3分鐘後之熱風乾燥機之後,黏著層11的黏著力也不太會提升。 This is considered to be because in the case of Comparative Example 2, since the thickness of the metal layer 14 was thin, the metal layer 14 was not heat-resistant in the hot air dryer test at a temperature of 270 °C. As a result, it is known that, in the case where the thickness of the metal layer 14 is at least 6 μm or more, whether after the execution of the three-time reflow process or after the hot air dryer is heated at a temperature of 270 ° C for 3 minutes, The adhesion of the adhesive layer 11 is also less likely to increase.
如此一來,依據使用了實施例及比較例的試驗,藉由保護膠帶1所具有之金屬層14,而可將回焊工程中之熱反射及散熱至外部。如此一來,藉由金屬層14,而能不易將熱傳導至貼附於基板30上的黏著層11,因此可緩和黏著層11的溫度上升。藉此,便不會導致在回焊工程後難以從基板30剝離,或在剝離後產生殘留,而可防止作業性的惡化。 As a result, the heat in the reflow process can be reflected and radiated to the outside by the metal layer 14 of the protective tape 1 according to the test using the embodiment and the comparative example. As a result, the metal layer 14 can easily conduct heat to the adhesive layer 11 attached to the substrate 30, so that the temperature rise of the adhesive layer 11 can be alleviated. Thereby, it is not difficult to peel off from the substrate 30 after the reflow process, or it remains after peeling, and it can prevent deterioration of workability.
此外,若金屬層14的厚度為6μm以上,則由於金屬層14的厚度成為適中,而變得容易將熱有效地反射及散熱。 Further, when the thickness of the metal layer 14 is 6 μm or more, the thickness of the metal layer 14 is moderate, and it is easy to efficiently reflect and dissipate heat.
此外,於前述回焊工程中,即使基板30之溫度成為最高為270℃的情況,也可適用本實施形態之保護膠帶1。 Further, in the above-described reflow process, the protective tape 1 of the present embodiment can be applied even when the temperature of the substrate 30 is at most 270 °C.
以上,雖對本發明之實施例作了說明,但不過是將具體例作了例示,並不特別對本發明作限定,具體的構造等係可適當設計變更。此外,發明之實施形態中所記載的作用及效果,只不過是列舉出由本發明所產生之最適當的作用及效果,依據本發明所產生之作用及效果,並不限定於本發明之實施形態所記載者。 The embodiments of the present invention have been described above, but the specific examples are exemplified, and the present invention is not limited thereto, and specific structures and the like can be appropriately modified. Further, the actions and effects described in the embodiments of the present invention are merely illustrative of the most appropriate actions and effects produced by the present invention, and the actions and effects produced by the present invention are not limited to the embodiments of the present invention. Recorded.
本發明,係可適用於用以保護經過回焊工程的基板之保護膠帶。 The present invention is applicable to a protective tape for protecting a substrate subjected to reflow engineering.
1‧‧‧保護膠帶 1‧‧‧Protection tape
11‧‧‧黏著層 11‧‧‧Adhesive layer
13‧‧‧樹脂層 13‧‧‧ resin layer
14‧‧‧金屬層 14‧‧‧metal layer
70‧‧‧熱 70‧‧‧Hot
[第1圖]係展示本實施形態之保護膠帶的外觀及橫剖面之說明圖。 [Fig. 1] is an explanatory view showing the appearance and cross section of the protective tape of the present embodiment.
[第2圖]係展示將本實施形態之保護膠帶貼附於基板的狀態之說明圖。 [Fig. 2] is an explanatory view showing a state in which the protective tape of the embodiment is attached to a substrate.
[第3圖]係展示本實施形態之回焊工程的說明圖。 [Fig. 3] is an explanatory view showing a reflowing work of the embodiment.
[第4圖]係展示使用本實施形態之保護膠帶的實施例1及比較例1的剝離試驗結果之說明圖。 [Fig. 4] is an explanatory view showing the results of the peeling test of Example 1 and Comparative Example 1 using the protective tape of the present embodiment.
[第5圖]係展示使用本實施形態之保護膠帶的實施例2~4及比較例2的剝離試驗結果之說明圖。 [Fig. 5] is an explanatory view showing the results of peeling tests of Examples 2 to 4 and Comparative Example 2 using the protective tape of the present embodiment.
1‧‧‧保護膠帶 1‧‧‧Protection tape
11‧‧‧黏著層 11‧‧‧Adhesive layer
12‧‧‧黏著劑層 12‧‧‧Adhesive layer
13‧‧‧樹脂層 13‧‧‧ resin layer
14‧‧‧金屬層 14‧‧‧metal layer
70、70a‧‧‧熱 70, 70a‧‧‧ hot
Claims (6)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2011047111A JP5963395B2 (en) | 2011-03-04 | 2011-03-04 | Protective tape |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TW201243012A TW201243012A (en) | 2012-11-01 |
| TWI568821B true TWI568821B (en) | 2017-02-01 |
Family
ID=46797991
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW101106964A TWI568821B (en) | 2011-03-04 | 2012-03-02 | Protect the tape |
Country Status (5)
| Country | Link |
|---|---|
| JP (1) | JP5963395B2 (en) |
| KR (1) | KR101843415B1 (en) |
| CN (1) | CN103416107A (en) |
| TW (1) | TWI568821B (en) |
| WO (1) | WO2012121022A1 (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWI696867B (en) * | 2019-03-22 | 2020-06-21 | 友達光電股份有限公司 | Tape structure, display panel and display device utilized the tape structure |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109075085B (en) * | 2016-03-30 | 2022-04-05 | 三井化学东赛璐株式会社 | Method for manufacturing semiconductor device |
| JP6809077B2 (en) * | 2016-09-20 | 2021-01-06 | 日本電気株式会社 | Transport pallet and transport method |
| CN110000005B (en) * | 2019-02-13 | 2020-11-24 | 浙江润洁环境科技股份有限公司 | Preparation process of electric dust collector shell and electric dust collector applying same |
| TWI710288B (en) * | 2020-01-22 | 2020-11-11 | 頎邦科技股份有限公司 | Method and device for adhering heat sinks to a circuit board tape |
| TWI825705B (en) * | 2022-05-09 | 2023-12-11 | 山太士股份有限公司 | Protection tape and manufacturing method of semiconductor device |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101323760A (en) * | 2007-04-09 | 2008-12-17 | 日东电工株式会社 | Double-sided pressure-sensitive adhesive tape or sheet and wiring circuit board with double-sided pressure-sensitive adhesive tape |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0548376U (en) * | 1991-11-28 | 1993-06-25 | 甲府日本電気株式会社 | Masking tape |
| JPH0974266A (en) * | 1995-09-07 | 1997-03-18 | Lintec Corp | Semiconductor chip fixing adhesive agent tape and feeding method of semiconductor chip fixing adhesive |
| JPH10107408A (en) * | 1996-09-30 | 1998-04-24 | Ibiden Co Ltd | Wiring board with solder layer, and its surface treatment method |
| JP4727139B2 (en) * | 2002-11-28 | 2011-07-20 | 信越化学工業株式会社 | Silicone adhesive composition and adhesive tape |
| JP3649288B1 (en) * | 2004-03-15 | 2005-05-18 | 千住金属工業株式会社 | Heat-resistant masking tape for soldering and printed circuit board soldering method |
-
2011
- 2011-03-04 JP JP2011047111A patent/JP5963395B2/en active Active
-
2012
- 2012-02-23 CN CN2012800110477A patent/CN103416107A/en active Pending
- 2012-02-23 KR KR1020137020968A patent/KR101843415B1/en active Active
- 2012-02-23 WO PCT/JP2012/054429 patent/WO2012121022A1/en not_active Ceased
- 2012-03-02 TW TW101106964A patent/TWI568821B/en not_active IP Right Cessation
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101323760A (en) * | 2007-04-09 | 2008-12-17 | 日东电工株式会社 | Double-sided pressure-sensitive adhesive tape or sheet and wiring circuit board with double-sided pressure-sensitive adhesive tape |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWI696867B (en) * | 2019-03-22 | 2020-06-21 | 友達光電股份有限公司 | Tape structure, display panel and display device utilized the tape structure |
Also Published As
| Publication number | Publication date |
|---|---|
| JP5963395B2 (en) | 2016-08-03 |
| JP2012186240A (en) | 2012-09-27 |
| TW201243012A (en) | 2012-11-01 |
| CN103416107A (en) | 2013-11-27 |
| KR101843415B1 (en) | 2018-03-29 |
| WO2012121022A1 (en) | 2012-09-13 |
| KR20140048841A (en) | 2014-04-24 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| TWI568821B (en) | Protect the tape | |
| EP2231402A2 (en) | High temperature composite tape and method for manufacturing the same | |
| TWI696682B (en) | Surface protection film | |
| JP2010239022A (en) | Flexible printed wiring board and semiconductor device using the same | |
| WO2008091119A1 (en) | Surface protective film | |
| JP7075893B2 (en) | Manufacturing method of double-sided adhesive sheet and semiconductor device | |
| KR20150087353A (en) | Multilayer film and shielded printed wiring board | |
| JP2013138152A (en) | Transfer jig, transfer method, and transfer jig material | |
| KR20090112445A (en) | How to make a screen protector window | |
| JP4109689B2 (en) | Manufacturing method of flexible printed wiring board for COF | |
| JP2007534023A (en) | Electronic ink display device and manufacturing method thereof | |
| US20110220728A1 (en) | Protective film for electronic component, method for manufacturing the same, and use thereof | |
| CN109632800A (en) | The detection method of FOB class product bonding effect | |
| JP4628154B2 (en) | Flexible printed circuit board and semiconductor device | |
| JP6918452B2 (en) | Substrate and module for light emitting element | |
| JP4916057B2 (en) | Protective film for FPC, resin conductor foil laminate with protective film for FPC, and method for producing flexible printed wiring board using the same | |
| TW540257B (en) | Component of printed circuit boards | |
| KR20130070888A (en) | White coverlay film and a flexible printed circuit board comprising the same | |
| TWI634817B (en) | Cover film for circuit board punching process | |
| JP6934225B2 (en) | Laminate | |
| JP2014123755A (en) | Protective film for fpc, resin conductor foil laminate with protective film for fpc, and method of manufacturing flexible printed wiring board using it | |
| KR20180031488A (en) | Mirror-reflecting film and preparing method of the same | |
| JP5288898B2 (en) | Adhesive sheet sticking device and sticking method, and electronic component mounting device and mounting method | |
| JP4595900B2 (en) | Method for producing multilayer metal foil-clad laminate | |
| JP5942507B2 (en) | Manufacturing method of electronic parts |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| MM4A | Annulment or lapse of patent due to non-payment of fees |