TWI568489B - Scrubber for processing exhaust gas - Google Patents

Description

Scrubber for processing exhaust gas

The present invention relates to a scrubber for processing exhaust gas discharged from a flat panel display device such as a semiconductor, a liquid crystal display (LCD) or an organic light emitting display (OLED), and a solar cell and an LED manufacturing program.

Exhaust gas (hereinafter referred to as "processed exhaust gas") that is harmful to the human body and the environment is generated in a process using a special gas such as a manufacturing process of a flat panel display device such as a semiconductor, an LED, or an OLED, or a manufacturing process of a solar cell or an LED. In order to prevent environmental pollution caused by the processing exhaust gas, the processing exhaust gas needs to be purified before being discharged to the outside.

The process exhaust gas is purified and discharged to the outside through a scrubber for treating the process exhaust gas. Generally, the scrubber for treating a process exhaust gas includes: a reaction chamber for providing a high temperature heat source to decompose harmful substances in the process exhaust gas or to promote a chemical reaction; and a water treatment tower for passing the reaction The solid powder is filtered in the exhaust gas of the chamber.

In addition, the process exhaust gas contains a large amount of hydrogen halide compounds, such as HF gas, HCL gas, and the like which are generated in the process of PFCs, CFCs being treated by plasma. The water-soluble gas such as a hydrogen halide compound contained in the process exhaust gas is mainly subjected to a trapping process by a wet process of passing water or spray water, and thus waste water is generated, so that an extra need is required. Collect and treat wastewater.

Further, when the wet process is used, there is a problem that the treatment efficiency of the water-soluble gas containing the hydrogen halide compound is low.

The present invention provides a scrubber for treating a process exhaust gas which can remove a water-soluble gas contained in a process exhaust gas by using an amine-based substance.

A scrubber for processing a process exhaust gas according to an embodiment of the present invention, comprising: a plasma processing unit that causes plasma to contact a process exhaust gas and decomposes the process exhaust gas; and a cooling unit that cools the plasma The processing unit decomposes the processed exhaust gas to collect reaction by-products; and the reaction unit causes the processing exhaust gas flowing out from the cooling unit to contact the amine-based substance, and removes the processed exhaust gas by the acid hydrazine reaction Water soluble gas.

And, the plasma processing unit includes: a plasma torch for generating plasma; an injection chamber to bring the process exhaust gas flowing from the outside into contact with the plasma; and a reaction chamber to contact the plasma The exhaust gas is processed and reacted to decompose the process exhaust gas.

And, the cooling unit includes: a cooling casing that is made from the plasma The processing gas flowing out of the processing unit flows into; a first cooling plate that cools the inflowing process exhaust gas once to capture reaction by-products of the process exhaust gas; and a second cooling plate that passes the first cooling The process exhaust gas of the plate is subjected to secondary cooling to capture reaction by-products of the process exhaust gas. At this time, the cooling casing includes: a casing body having a hollow interior having a side wall, another side wall, a front side wall, a rear side wall, a main body upper plate and a main body lower plate, respectively, respectively, on the main body An exhaust gas inflow port and an exhaust gas outflow port formed on one side and the other side of the plate; a first partition wall formed at a position on the opposite side of the one side wall centering on the exhaust gas inflow port inside the outer casing main body And forming a first partition hole between the rear side wall; and a second partition wall between the other side wall of the outer casing main body and the first partition wall, formed at the exhaust gas outlet a position on the opposite side of the other side wall, and includes a second partition hole formed at a lower edge of the front side end. Further, the first cooling plate has a hollow inner plate shape, and includes a gas passage pipe through which the machining waste gas flows from one side to the other side surface, and a first cooling water flow inlet through which the cooling water flows into the interior. And a first cooling water outflow port for flowing the inflowing cooling water to the outside; a plurality of the first cooling plates are spaced apart from each other, between the first partition wall and the second partition wall, perpendicular to the first partition wall and the first Two partition walls, and parallel to the front side wall. And the second cooling plate includes a grid mesh and a cooling tube, the cooling tube contacting the grid mesh and forming a meander shape for supplying cooling water from the outside and flowing it out; the plurality of the second a cooling plate constituting a level between the second partition wall and another side wall of the outer casing main body and spaced apart from each other in a vertical direction; the second cooling plate being disposed to be in contact with the second partition wall or the Alternating between the other side walls to form a second cooling hole.

Further, the scrubber for treating a process exhaust gas of the present invention further includes: a trap unit located between the cooling unit and the reaction unit to allow a process exhaust gas flowing out from the cooling unit to flow in, and to cool the inflowing portion The exhaust gas is processed to capture reaction by-products. At this time, the trap unit includes a trap casing, and the inside of the trap casing is hollow, and has a trap inlet for flowing the process exhaust gas from the cooling unit, and flowing the process exhaust gas. a collecting flow outlet; and a collecting plate, comprising a first collecting plate and a second collecting plate, wherein the first collecting plate and the second collecting plate are alternately stacked and spaced apart from each other in a vertical direction; wherein The first collecting plate has a plate shape, an outer peripheral surface of the first collecting plate is adjacent to an inner circumferential surface of the collecting casing, and a first portion is formed at a central portion of the first collecting plate The second collecting plate has a plate shape, and the outer peripheral surface of the second collecting plate is spaced apart from the collecting casing to form a second collecting hole.

Further, the reaction unit includes: a reaction outer casing, the inside of the reaction outer casing is hollow, and includes a reaction flow inlet for flowing the processing exhaust gas, and a reaction flow outlet for flowing the processing waste gas to the outside; a support plate; The support plate is in the form of a plate having a plurality of support holes penetrating from the upper surface to the lower surface, and is formed vertically in the vertical direction inside the reaction casing; and an amine-based substance layer is laminated on the support plate The powder or block of the amine-based substance is formed; wherein the amine-based substance removes the water-soluble gas by reacting with the acid hydrazine of the process exhaust gas.

And the reaction unit includes: a reaction outer casing, the inside of the reaction outer casing is hollow, and the processing exhaust gas flows in from the cooling unit; And, a urea particle layer is formed by filling a inside of the reaction envelope with urea particles of a predetermined height and is in contact with the process exhaust gas, wherein the urea particles have an average fineness of several micrometers to several hundreds of micrometers.

Further, the amine-based substance includes a compound selected from the group consisting of urea (urea), aminobutyric acid, diphenyl amine, and N,N-diaminobenzoic acid (N,N-Diamino). Benzoic acid), glutamic acid, lauryl amine (N-dodecylamine), methacrylamide (Methylhexanamine), nicotine putrescine, stearic acid At least one substance of Stearyl amine (octadecyl amine) and Tallow amine.

Further, the scrubber for treating a process exhaust gas of the present invention brings the process exhaust gas into contact with an amine-based substance, and removes the water-soluble gas of the hydrogen halide compound contained in the process exhaust gas by an acid hydrazine reaction. At this time, before the processing exhaust gas contacts the amine-based substance, the processing exhaust gas is brought into contact with the plasma, and the processing exhaust gas is decomposed and cooled to collect reaction by-products.

According to the scrubber for treating a process exhaust gas according to the present invention, the water-soluble gas is treated by the acid hydrazine reaction of the amine-based substance and the process exhaust gas, and therefore, in addition to the circulating cooling water, there is no need to use additional water without waste water discharge, and No additional water treatment facilities are required.

Further, the scrubber for treating the exhaust gas according to the present invention can be brought into contact with an amine-based substance such as urea before the exhaust gas is finally discharged, so that the hydrogen halide compound contained in the process exhaust gas can be removed.

According to the scrubber for treating a process exhaust gas of the present invention, first, by removing the reaction by-product of the process exhaust gas by cooling the process exhaust gas, the amine-based substance is brought into contact with the process exhaust gas to perform an effective acid hydrazine reaction, thereby improving the water-soluble gas. Processing efficiency.

The scrubber for treating a process exhaust gas according to the present invention uses only electric power without using water, and thus does not generate waste water, thereby preventing the equipment from being corroded, easy to manage, and saving operating costs.

100‧‧‧Plastic processing unit

110‧‧‧ Plasma torch

130‧‧‧Injection chamber

150‧‧‧Reaction chamber

170‧‧‧Connecting pipe

200‧‧‧cooling unit

210‧‧‧cooling enclosure

230‧‧‧First cooling plate

250‧‧‧second cooling plate

300‧‧‧ Capture unit

310‧‧‧ Capture casing

330‧‧‧ Capture board

400‧‧‧Reaction unit

410‧‧‧Reaction shell

430‧‧‧support plate

450‧‧‧Amine material layer

BRIEF DESCRIPTION OF THE DRAWINGS Fig. 1 is a front elevational view of a scrubber for treating a process exhaust gas according to an embodiment of the present invention.

2 is a plan view of a scrubber for processing a process exhaust gas according to an embodiment of the present invention.

Fig. 3 is a level sectional view taken along line A-A of Fig. 1;

Fig. 4 is a vertical sectional view taken along line B-B of Fig. 3;

Figure 5 is a partially cutaway perspective view of the first cooling unit of the Figure.

Fig. 6 is a vertical sectional view taken along line C-C of Fig. 2;

Fig. 7 is a vertical sectional view showing a collecting unit and a reaction unit of a scrubber for processing exhaust gas according to another embodiment of the present invention, and is a vertical sectional view corresponding to Fig. 6.

Hereinafter, the scrubber for treating exhaust gas of the present invention will be described in detail by way of preferred embodiments with reference to the accompanying drawings.

First, the structure of the scrubber for treating exhaust gas of the present invention will be described.

BRIEF DESCRIPTION OF THE DRAWINGS Fig. 1 is a front elevational view of a scrubber for treating a process exhaust gas according to an embodiment of the present invention. 2 is a plan view of a scrubber for processing a process exhaust gas according to an embodiment of the present invention. Fig. 3 is a level sectional view taken along line A-A of Fig. 1; Fig. 4 is a vertical sectional view taken along line B-B of Fig. 3; Figure 5 is a partially cutaway perspective view of the first cooling unit of the Figure. Fig. 6 is a vertical sectional view taken along line C-C of Fig. 2;

As shown in FIGS. 1 to 6, the scrubber for treating exhaust gas of the present invention includes a plasma processing unit 100, a cooling unit 200, a trapping unit 300, and a reaction unit 400.

The scrubber for treating the process exhaust gas treats a process exhaust gas including a halogen element such as chlorine Cl or fluorine F. In particular, the scrubber for processing the process exhaust gas decomposes and dissociates the process exhaust gas in the plasma processing unit 100, cools the decomposed process exhaust gas and the by-products generated during the processing in the cooling unit 200, and captures the reaction state in the powder state. product. The scrubber for treating the process exhaust gas additionally traps reaction by-products (powder by-products) in the trap unit 300, and removes the water-soluble gas by reacting the amine-based substance with the acid hydrazine of the process exhaust gas in the reaction unit 400. Thereby, the scrubber for treating the process exhaust gas can capture and remove a water-soluble gas such as a hydrogen halide compound contained in the process exhaust gas without using water. Wherein, the hydrogen halide compound includes a water-soluble gas such as HX (X=F, Cl).

The plasma processing unit 100 includes a plasma torch 110, an injection chamber 130, and a reaction chamber 150. Also, the plasma processing unit 100 may further include a connection tube 170.

The plasma processing unit 100 causes the plasma generated in the plasma torch 110 The flame and process exhaust gases are contacted in the injection chamber 130 and reacted in the reaction chamber 150 to decompose and dissociate the process exhaust gas and supply activation energy.

The plasma torch 110 is located at the upper end of the plasma processing unit 100 for generating plasma. The plasma torch 110 may be a conventional plasma torch used in a scrubber for processing exhaust gas, and may have various structures. Additionally, the plasma torch 110 can be replaced by one selected from the group consisting of a gas torch, an electric heater, and the like.

The injection chamber 130 is generally cylindrical in shape with a top and a bottom open to the lower end of the plasma torch 110. The injection chamber 130 includes a plurality of process exhaust gas injection pipes 131 that are spaced apart in the circumferential direction and penetrate the inside. The process exhaust gas is injected into the inside of the injection chamber 130 through the process exhaust gas injection pipe 131. Also, a plasma flame flows from the upper plasma torch 110 to the injection chamber 130. Thus, the injection chamber 130 provides a space for the plasma flame to be in contact with the process exhaust gas. The injection chamber 130 causes the process exhaust gas in contact with the plasma flame to flow into the bottom.

The process exhaust gas inflow pipe 131 is connected to a process exhaust pipe (not shown) connected to a processing equipment (not shown) to flow the process exhaust gas into the internal space of the injection chamber 130.

The reaction chamber 150 has a substantially cylindrical shape in which the upper portion and the lower portion are open, and is connected to the lower end of the injection chamber 130. The reaction chamber 150 provides a space in which the process exhaust gas comes into contact with the plasma flame and flows into and is decomposed. The process exhaust gas is decomposed and dissociated by thermal energy of the plasma flame.

The connecting tube 170 is in a substantially cylindrical shape in which the upper portion and the lower portion are open, and is connected to the lower end of the reaction chamber 150. The connecting tube 170 can be Separate into multiple. The connecting pipe 170 connects the reaction chamber 150 and the cooling unit 200, and provides a passage for the processed process exhaust gas in the reaction chamber 150 to flow into the cooling unit 200. When the reaction chamber 150 is directly connected to the cooling unit 200, the connection tube 170 can be omitted.

The connecting pipe 170 may form a cooling water passage (not shown) along the outer peripheral surface, and cool the processed process exhaust gas by the cooling water and flow it into the cooling unit 200. In this case, the connecting pipe 170 sharply cools the temperature of the process exhaust gas to improve the collection efficiency of reaction by-products.

The cooling unit 200 includes a cooling casing 210, a first cooling plate 230, and a second cooling plate 250. The cooling unit 200 cools the process exhaust gas which is decomposed and dissociated in the plasma processing unit 100 and flows into the interior of the cooling casing 210 in the first cooling plate 230 to trap the reaction by-products generated, and The second cooling plate 250 is subjected to secondary cooling to collect the reaction by-products in the form of the resulting powder.

The cooling casing 210 includes a casing body 211, an exhaust gas inflow port 213, an exhaust gas outflow port 215, a first partition wall 217, and a second partition wall 219.

The outer casing main body 211 has a substantially hollow box shape and may have a rectangular box shape. For example, the outer casing body 211 may include a side wall 211a, another side wall 211b, a front side wall 211c, a rear side wall 211d, a main body upper plate 211e, and a main body lower plate 211f. The outer casing main body 211 internally houses the first cooling plate 230 and the second cooling plate 250 and provides a space for flowing the processing exhaust gas.

The exhaust gas inflow port 213 is located on one side of the main body upper plate 211e of the outer casing main body 211, and is connected to the reaction chamber 150 or the connecting pipe 170. The exhaust gas inflow port 213 provides a process exhaust gas to be treated in the reaction chamber 150 to flow into the cold However, the path of the inside of the outer casing 210.

The exhaust gas outflow port 215 is located on the other side of the main body upper plate 211e of the outer casing main body 211, and is connected to the trap unit 300. The exhaust gas outflow port 215 provides a path for the process exhaust gas from which the reaction by-product is removed to flow out to the trap unit 300.

The first partition wall 217 has a plate shape and has a width smaller than a side wall 211a of the outer casing main body 211. The first partition wall 217 is located at a position on the opposite side of a side wall 211a of the casing main body 211 centering on the exhaust gas inflow port 213. That is, the exhaust gas inflow port 213 is located between the first partition wall 217 and a side wall 211a of the outer casing main body 211. Further, one end of the first partition wall 217 is in contact with the front side wall 211c of the outer casing main body 211, and the other side end is spaced apart from the rear side wall 211d of the outer casing main body 211. Thereby, the first partition wall 217 divides the space on one side of the casing main body 211 into two. Further, a first partition hole 217a through which the machining exhaust gas flows is formed between the first partition wall 217 and the rear side wall 211d of the outer casing main body 211. The first partition hole 217a provides a passage through which the process exhaust gas flowing in from the exhaust gas inflow port 213 flows toward the first cooling plate 230.

The second partition wall 219 has a plate shape and has a width equal to a side wall 211a of the main body 211. The second partition wall 219 is located between the other side wall 211b of the outer casing main body 211 and the first partition wall 217, and is located on the opposite side of the other side wall 211b of the outer casing main body 211 with the exhaust gas outflow port 215 as the center. That is, the exhaust gas outflow port 215 is located between the other side wall 211b of the outer casing main body 211 and the first partition wall 217. Further, one end of the second partition wall 219 is in contact with the front side wall 211c of the outer casing main body 211, and the other side end is spaced apart from the rear side wall 211d of the outer casing main body 211. And, one side end of the second partition wall 219 and the front side wall 211c of the outer casing main body 211 In contact, the other side end is in contact with the rear side wall 211d of the outer casing main body 211.

Also, the second partition wall 219 includes a second partition hole 219a at a lower edge of the front side end. The second partition hole 219a provides a passage for flowing the process exhaust gas passing through the first cooling plate 230 to the second cooling plate 250.

The first cooling plate 230 has a hollow hexahedral plate shape inside and has a plurality of gas penetrating tubes 231 penetrating from one side to the other side. The first cooling plate 230 may be formed by combining an upper plate and a lower plate and a side plate. Also, the first cooling plate 230 includes a first cooling water inflow port 233 and a first cooling water outflow port 235 at an upper portion. The first cooling plate 230 may be formed by combining an upper plate and a lower plate and a side plate.

The first cooling plate 230 has an area corresponding to the width and height between the first partition wall 217 and the second partition wall 219, and is located at a position perpendicular to the first partition wall 217 and the second partition wall 219. Further, a plurality of the first cooling plates 230 are parallel to the front side wall 211c and spaced apart from each other between the front side wall 211c and the rear side wall 211d of the outer casing main body 211. The central axis of the gas through pipe 231 is maintained at a level. The gas through pipe 231 does not penetrate the gas through pipe 231 of the adjacent other first cooling plate 230. Thereby, the process exhaust gas zig-zag flows between the first cooling plates 230 and passes through the gas through pipe 231, and is cooled by contact with the surface of the first cooling plate 230.

The first cooling plate 230 is cooled by the internally flowing cooling water, thereby cooling the exhaust gas flowing through the gas through pipe 231. The cooling water flows in from the first cooling water inlet 233 and flows through the inside of the first cooling plate 230, and then flows out from the first cooling water outlet 235. The first cooling plate 230 cools the processing exhaust gas flowing after being decomposed by the plasma processing unit 100 to capture the powder form. Reaction by-product.

The first cooling water inlet 233 and the first cooling water outlet 235 are respectively located at a position of the upper plate, the lower plate or the side plates of the first cooling plate 230. The first cooling water inflow port 233 causes the cooling water to flow into the inside of the first cooling plate 230, and the first cooling water outflow port 235 causes the cooling water flowing into the inside of the first cooling plate 230 to flow out. The cooling water cools the first cooling plate 230 so that the process exhaust gas in contact with the surface thereof is effectively cooled and trapped.

The second cooling plate 250 includes a grid mesh 251, a support rod 253, and a cooling tube 255. The second cooling plate 250 has a width smaller than a distance between the first partition wall 217 and the second partition wall 219, and a length corresponding to a distance between the front side wall 211c and the rear side wall 211d of the outer casing main body 211. The second cooling plate 250 is located between the first partition wall 217 and the second partition wall 219 and maintains a horizontal plane, and the plurality of second cooling plates 250 are disposed to be spaced apart from each other in the vertical direction. At this time, the plurality of second cooling plates 250 alternately contact the other side wall 211b or the second partition wall 219 of the cooling casing 210. Thereby, a second cooling hole 250a through which the machining exhaust gas flows is formed between the second cooling plate 250 and the other side wall 211b or the second partition wall 219. A part of the processing exhaust gas flows upward between the grids 251, and the remaining portion is meandered by the second cooling holes 250a. The second cooling hole 250a increases the time during which the process exhaust gas comes into contact with the grid mesh 251. When a large amount of reaction by-products are deposited on the grid mesh 251, the process exhaust gas also flows smoothly.

The second cooling plate 250 cools the process exhaust gas flowing in through the first cooling plate 230 while passing through the grid 251 and is trapped as a reaction by-product.

The grid mesh 251 may be a general grid mesh in which a plurality of wires are combined in a lattice shape to form a plurality of holes penetrating vertically, or may be formed into a plate shape. A perforated plate having a plurality of holes penetrating vertically is formed. The grid mesh 251 has a substantially rectangular shape with a width smaller than a distance between the first partition wall 217 and the second partition wall 219, and a length corresponding to a distance between the front side wall 211c and the rear side wall 211d of the outer casing main body 211.

The grille mesh 251 includes an upper grille net 251a and a lower grille net 251b and may be spaced apart from each other in the vertical direction. However, the grid mesh 251 may be formed only by the upper grid mesh 251a or the lower grid mesh 251b. The grid mesh 251 cools the passed process exhaust gas through a plurality of holes penetrating vertically to collect reaction by-products.

The support bars 253 are in the shape of a rod and support the front and rear sides of the upper grille net 251a and the lower grille net 251b, respectively. The support bar 253 supports the grille mesh 251 by being coupled to the second partition wall 219 and the other side wall 211b on both sides.

The cooling tube 255 is an inner hollow tube. The cooling pipe 255 has a meander shape, and both side ends are extended toward the outside of the other side wall 211b of the cooling casing 210. The cooling tube 255 is combined with the upper or lower surface of the grid mesh 251, preferably between the upper grid mesh 251a and the lower grid mesh 251b. The cooling pipe 255 is connected to an external cooling water supply pipe (not shown), and is cooled by the cooling water supplied and discharged from the outside. And, the cooling pipe 255 is for cooling the upper grille net 251a and the lower grille net 251b. The cooling pipe 255 cools the process exhaust gas flowing from the lower portion to the upper portion through the grid mesh 251 together with the grid mesh 251 to effectively capture reaction by-products.

The trap unit 300 includes a trap housing 310 and a catch plate 330. The trap unit 300 cools the process exhaust gas that has been lifted up by the cooling unit 200 to additionally capture reaction by-products contained in the process exhaust gas. In addition, in passing the second When the processing exhaust gas of the cooling plate 250 contains a small amount of reaction by-products, the trap unit 300 can be omitted.

The trap casing 310 has a hollow cylindrical shape inside, and may have a cylindrical shape. The trap housing 310 has a trap inlet 311 and a trap outlet 313. The trap inlet 311 of the trap casing 310 is located at a lower portion of the trap casing 310 and is coupled to the exhaust gas outlet 215 of the casing main body 211. The trap inlet 311 allows the process exhaust gas flowing out of the exhaust gas outlet 215 to flow into the inside of the trap casing 310.

The trap stream outlet 313 is located at an upper portion of the trap housing 310 and is coupled to the reaction unit 400. The trap outlet 313 allows the process exhaust flowing inside the trap casing 310 to flow out and flow into the reaction unit 400.

The collecting plate 330 includes a first collecting plate 331 and a second collecting plate 333. The first collecting plate 331 and the second collecting plate 333 of the collecting plate 330 are alternately stacked inside the collecting casing 310, and are spaced apart from each other in the vertical direction. At this time, the first collecting plate 331 and the second collecting plate 333 are supported by the other collecting support bars 335 and are spaced apart. The collecting plate 330 is for collecting reaction by-products contained in the process exhaust gas flowing from the lower portion and contacting the upper portion.

The first collecting plate 331 has a shape corresponding to an internal leveling cross section of the collecting casing 310, and may have a disk shape. The outer peripheral surface of the first collecting plate 331 is adjacent to or in contact with the inner peripheral surface of the collecting casing. Moreover, the first collecting plate 331 includes a first collecting hole 331a of a central portion of the bit. The first trap hole 331a provides a passage for flowing the process exhaust gas flowing in through the trap stream inlet 311 to the upper portion. The process exhaust gas flows in through the trap inlet 311, and then rises in contact with the lower surface of the first collecting plate 331 or directly through the first collecting hole 331a.

The second collecting plate 333 has a shape corresponding to an internal leveling cross section of the collecting casing 310, and may have a disk shape. The second collecting plate 333 has a smaller diameter than the first collecting plate 331. Thereby, the outer peripheral surface of the second collecting plate 333 is spaced apart from the inner peripheral surface of the collecting casing 310, and a second collecting hole 333a is formed between the inner peripheral surface of the collecting casing 310 and the inner peripheral surface of the collecting casing 310. The second trap hole 333a provides a passage for flowing the process exhaust gas flowing in through the first trap hole 331a to the upper portion. The process exhaust gas rises through the first collecting hole 331a, contacts the lower surface of the second collecting plate 333, and then rises through the second collecting hole 333a.

In addition, since the first collecting plate 331 and the second collecting plate 333 are alternately stacked, the processed exhaust gas sequentially passes through the first collecting hole 331a and the second collecting hole 33a, and is zigzag in the first collecting plate 331 and the The two collecting plates 333 flow between.

The reaction unit 400 includes a reaction outer casing 410, a support plate 430, and an amine-based substance layer 450. The reaction unit 400 is located at an upper portion of the cooling unit or the trap unit, and the process exhaust gas flows in from the cooling unit 200 or the trap unit 300. The reaction unit 400 reacts a water-soluble gas amine-based substance layer 450 such as a hydrogen halide compound contained in the process exhaust gas, and removes it by an acid hydrazine reaction.

The reaction outer casing 410 has an inner hollow cylindrical shape, preferably a cylindrical shape. The reaction housing 410 has a reaction inlet 411 and a reaction outlet 413. Also, the reaction housing 410 may further include a reaction upper plate 415 for sealing the upper opening. The reaction inlet 411 of the reaction housing 410 is located at a lower portion of the reaction housing 410 and is coupled to the trap flow outlet 313 of the trap housing 310. The reaction stream inlet 411 causes the process exhaust gas flowing out of the trap stream outlet 313 to flow into the inside of the reaction housing 410.

The reaction stream outlet 413 is located at the upper portion of the reaction housing 410 and is positionable On the outer peripheral surface of the reaction casing 410. Also, the reaction stream outlet 413 may be located in the reaction upper plate 415. The reaction outflow port 413 allows the process exhaust gas flowing inside the reaction casing 410 to flow out to the outside.

The reaction upper plate 415 is used to temporarily shield the upper opening of the reaction housing 410. When it is necessary to replace the amine-based substance layer 450 in the reaction case 410, the reaction upper plate 415 is temporarily separated from the reaction case 410, and the upper portion of the reaction case 410 is opened.

The support plate 430 has a plate shape and has a plurality of support holes 431 penetrating from the upper surface to the lower surface. Also, the support plate 430 may have a vertical plate 433 formed along the outer peripheral surface. The support plate 430 is formed in plurality and spaced apart from each other in the vertical direction. An amine-based substance layer 450 is formed on the upper portion of the support plate 430, and the process exhaust gas which is lifted up through the support hole 431 is brought into contact with the amine-based substance layer 450.

The vertical plate 433 is extended from the outer circumferential surface of the support plate 430 in the upper direction to support the outer peripheral surface of the amine-based substance layer 450.

A powder or a block in which an amine-based substance is laminated on the amine-based substance layer 450 includes a plurality of pores therein. The amine-based substance layer includes an amine-based substance mixed with other substances for supporting the amine-based substance. The amine-based substance may include a compound selected from the group consisting of urea (urea), aminobutyric acid, diphenyl amine, and N,N-diaminobenzoic acid (N,N-Diamino benzoic). Acid), glutamic acid, lauryl amine (N-dodecylamine), methacrylamide (Methylhexanamine), nicotine putrescine, stearic acid amine (Stearylamine (octadecyl amine)) and at least one substance in Tallow amine. The amine substance The layer 450 causes the process exhaust gas to flow to the lower portion and flow upward, and traps the water-soluble gas contained in the process exhaust gas. The amine-based substance is subjected to an acid hydrazine reaction with a water-soluble gas such as a hydrogen halide compound contained in the process exhaust gas to collect a water-soluble gas.

For example, when the amine-based substance is urea, urea reacts with a hydrogen halide compound by the following main reaction formula or side reaction formula to trap a hydrogen halide compound. According to the main reaction formula, the hydrogen halide compound will be bonded to the hydrogen atom of the amine group of carbamide without substitution based on a halogen element. As the urea combines with the hydrogen halide compound, it changes from a powder state to an emulsion state. Further, according to the side reaction formula, urea is decomposed into a carbonyl group and an amine group in the presence of heat, a carbonyl group is converted into carbon dioxide (CO ₂ ), and an amine group is reacted with a hydrogen halide compound to be formed into NH. ₄ X.

A scrubber for treating a process exhaust gas according to another embodiment of the present invention will be described below.

Fig. 7 is a vertical sectional view showing a collecting unit and a reaction unit of a scrubber for processing exhaust gas according to another embodiment of the present invention, and is a vertical sectional view corresponding to Fig. 6.

As shown in FIGS. 1 to 5 and 7, a scrubber for processing a process exhaust gas according to another embodiment of the present invention includes a plasma processing unit 100, a cooling unit 200, a trap unit 300, and a reaction unit 400a.

Referring to Fig. 7, a scrubber for processing a process exhaust gas according to another embodiment of the present invention is compared with a scrubber for processing a process exhaust gas of an embodiment of Figs. 1 to 6, which differs only in the reaction unit 400a. structure. Therefore, the reaction unit 400a for treating the scrubber for processing the exhaust gas will be mainly described below. Further, in the scrubber for processing the process exhaust gas, the same portions as those of the scrubber for processing the exhaust gas of an embodiment of FIGS. 1 to 6 will be given the same reference numerals, and the specific ones will be omitted. Description.

The reaction unit 400a includes a reaction outer casing 410a and a urea particle layer 420a. The reaction unit 400a is located at an upper portion of the cooling unit 200 or the trap unit 300, and is disposed to flow the process exhaust gas from the cooling unit 200 or the trap unit 300. The reaction unit 400a contacts a water-soluble gas such as a hydrogen halide compound contained in the process exhaust gas with the urea substance of the urea particle layer 420a, and is removed by an acid hydrazine reaction.

The reaction outer casing 410a has a hollow cylindrical shape inside, and is preferably cylindrical. The reaction housing 410a includes a reaction stream inlet 411a and a reaction stream outlet 413a. And, the reaction housing 410a may further include a seal for opening the upper portion The reaction of the mouth is on the upper plate 415a. The reaction inlet 411a of the reaction housing 410a is located at a lower portion of the reaction housing 410a and is coupled to the trap flow outlet 313 of the trap housing 310. The reaction stream inlet 411a causes the process exhaust gas flowing out of the trap stream outlet 313 to flow into the inside of the reaction housing 410a.

The reaction outflow port 413a is located at an upper portion of the reaction housing 410a and may be located on an outer peripheral surface of the reaction housing 410a. Also, the reaction stream outlet 413a may be located in the reaction upper plate 415a. The reaction outflow port 413a allows the process exhaust gas flowing inside the reaction casing 410a to flow out to the outside.

The reaction upper plate 415a is for temporarily shielding the upper opening of the reaction housing 410a. When it is necessary to replace the urea particles of the urea particle layer 420a in the reaction casing 410a, the reaction upper plate 415a is temporarily separated from the reaction casing 410a, and the upper portion of the reaction casing 410a is opened.

The urea particle layer 420a is formed by filling urea inside a reaction shell 410a with a predetermined height. Here, the urea particles mean that the urea substance is agglomerated into a powder or a block form. Also, the urea particle layer may be formed of the amine-based substance mentioned above. The urea particle layer 420a includes a plurality of pores formed by filling urea particles to provide a passage through which the process exhaust gas passes. A urea (for example) in which a plurality of holes are formed in the lower plate and the upper plate is filled with urea particles, and is placed inside the reaction casing 410a to form the urea particle layer 420a. Further, the urea particle layer 420a may be formed by laminating urea particles of a predetermined height on the upper portion of another perforated plate (not shown) located at the lower inner side of the reaction casing 410a.

The average fineness of the urea particles is from several micrometers to several hundreds of micrometers. If the average fineness of the urea particles is too small, it cannot be effectively provided for The processing exhaust gas does not flow smoothly through the passage through which the exhaust gas passes. Further, if the average fineness of the urea particles is too large, the urea particles and the process gas are not sufficiently contacted, and the hydrogen halide compound cannot be completely removed. The urea particle layer 420a of an appropriate height may be formed according to the processed exhaust gas treatment capacity of the scrubber or the average fineness of the urea particles.

The urea particle layer 420a flows the processing waste gas from the lower portion to the upper portion, and collects a water-soluble gas such as a hydrogen halide compound of the HF gas or the HCl gas contained in the process gas.

The action of the scrubber for treating exhaust gas of the present invention will be described below.

The action of the scrubber for treating exhaust gas of the present invention will be described below.

First, the process exhaust gas generated in the semiconductor process or the like flows into the inside of the injection chamber 130 through the process exhaust gas injection pipe 131. At this time, the plasma torch 110 forms a plasma flame and is supplied to the injection chamber 130. The process exhaust gas is in contact with the plasma flame inside the injection chamber 130 and flows into the reaction chamber 150. The process exhaust gas reacts with the plasma flame to be decomposed and dissociated. The process exhaust gas is cooled by the connection pipe 170, and a part thereof becomes a reaction by-product, and flows into the cooling unit 200.

The process exhaust gas flows into a side wall 211a of the outer casing main body 211 and the first partition wall 217 through the exhaust gas inflow port 213 located at one side of the cooling casing 210. The process exhaust gas flows through the first partition wall hole 217a of the first partition wall 217 to a space between the first partition wall 217 and the second partition wall 219, and is in contact with the first cooling plate 230. The first cooling plate 230 is in contact with the inflowing process exhaust gas, The process waste gas is cooled and the reaction by-products are trapped. The first cooling plate 230 is cooled by cooling water flowing inside through the first cooling water inflow port 233 and the first cooling water outflow port 235 to continuously cool the process exhaust gas and trap reaction by-products. The process exhaust gas will flow through the gas through pipe 231 located in the first cooling plate 230. The process exhaust gas flows into the space between the second partition wall 219 and the other side wall 211b of the outer casing main body 211 through the second partition wall hole 219a of the second partition wall 219 after passing through all of the first cooling plates 230. The second cooling plate 250 brings the process exhaust gas into contact with the grid mesh 215 and the cooling tube 255 as it passes, to cool the process exhaust gas and trap reaction by-products. One side and the other side of the second cooling plate 250 are formed with a second cooling hole 250a, and the process exhaust gas flows between the second cooling plates 250 in a meandering manner, thereby increasing the time of contact with the grid mesh 251.

The process exhaust gas flows out of the cooling casing 210 through the exhaust gas outflow port 215 after passing through all of the second cooling plates 250, and flows into the inside of the trap casing 310 through the trapping inflow port 311. The trap unit 300 brings the process exhaust gas that has flowed in through the trap inlet 311 into contact with the collecting plate 330 and causes it to flow upward. The collecting plate 330 brings the processing exhaust gas into contact with the first collecting plate 331 and the second collecting plate 333 and cools it, thereby additionally collecting reaction by-products. The collecting plate 330 alternately passes the processing exhaust gas through the first collecting holes 331a of the first collecting plate 331 and the second collecting holes 333a of the second collecting plate 333, and flows in a meandering manner.

The process exhaust gas flows out through the trapping outlets 313 of the trap casing 310 after passing through all the collecting plates 330, and flows into the inside of the reaction casing 410 through the reaction inflow port 411 of the reaction casing 410. When the amine-based substance layer 450 of the reaction unit 400 is in contact with the process exhaust gas, it is in contact with a water-soluble gas such as a hydrogen halide compound contained in the process exhaust gas according to the above-described main reaction formula and side reaction formula. The acid hydrazine reaction is carried out to capture a water-soluble gas. After passing through the amine-based substance layer 450, the process exhaust gas flows out to the outside through the reaction outflow port 413 of the reaction casing 410.

Thus, the processed exhaust gas treatment device of the present invention does not use additional water other than the cooling water supplied to the first cooling plate 230 and the second cooling plate 250 of the cooling unit 200 and recirculates, so that there is almost no discharge of waste water, A water treatment facility that needs to treat wastewater. Therefore, the processed exhaust gas treating apparatus of the present invention treats the exhaust gas in an environmentally friendly manner. Further, the processed exhaust gas treatment device of the present invention completely decomposes and dissociates the exhaust gas by thermal energy such as plasma, and cools the decomposed and dissociated exhaust gas to convert it into a powdery reaction by-product (powder by-product), thereby It can further reduce the emission concentration of exhaust gas. Further, in the present invention, only electric power is used substantially, so that management is easy and the operating cost can be reduced.

100‧‧‧Plastic processing unit

110‧‧‧ Plasma torch

131‧‧‧Exhaust gas injection pipe

130‧‧‧Injection chamber

150‧‧‧Reaction chamber

170‧‧‧Connecting pipe

200‧‧‧cooling unit

300‧‧‧ Capture unit

400‧‧‧Reaction unit

Claims (9)

A scrubber for treating a process exhaust gas, comprising: a plasma processing unit that causes a plasma to contact a process exhaust gas to decompose the process exhaust gas; and a cooling unit that cools and is decomposed by the plasma processing unit Processing the exhaust gas to capture reaction by-products; the reaction unit is configured to contact the process exhaust gas flowing out from the cooling unit with the amine-based substance, to remove the water-soluble gas contained in the process exhaust gas by the acid hydrazine reaction; and the trapping unit, Located between the cooling unit and the reaction unit, inflowing a process exhaust gas flowing out from the cooling unit, and cooling the inflowing process exhaust gas to capture reaction by-products, the trap unit comprising: trapping a casing having a hollow interior, a trap inlet for flowing the process exhaust gas from the cooling unit, and a trap outlet for flowing the process exhaust; and a collecting plate, including a catching plate and a second collecting plate, the first collecting plate and the second collecting plate are alternately stacked and spaced apart from each other in a vertical direction; wherein the first collecting plate a plate shape, an outer circumferential surface of the first collecting plate is adjacent to an inner circumferential surface of the collecting casing, and a first collecting hole is formed in a central portion of the first collecting plate, the second The collecting plate has a plate shape, and an outer peripheral surface of the second collecting plate is spaced apart from the collecting casing to form a second collecting hole. A scrubber for processing a process exhaust gas according to claim 1, wherein the plasma processing unit comprises: a plasma torch for generating plasma; and a chamber for injecting a process exhaust gas flowing from the outside Contacting the plasma; The reaction chamber causes the plasma to contact the process exhaust gas and react to decompose the process exhaust gas. A scrubber for processing a process exhaust gas according to claim 1, wherein the cooling unit comprises: a cooling casing that allows the process gas flowing out of the plasma processing unit to flow in; the first cooling plate, the inflow The process exhaust gas is once cooled to capture reaction by-products of the process exhaust gas; and a second cooling plate is used for secondary cooling of the process exhaust gas passing through the first cooling plate to capture the process exhaust gas Reaction by-product. A scrubber for processing a process exhaust gas according to claim 3, wherein the cooling casing comprises: a casing body having a hollow interior having a side wall, another side wall, a front side wall, and a rear The side wall, the main body upper plate and the main body lower plate include an exhaust gas inflow port and an exhaust gas outflow port respectively formed on one side and the other side of the main body upper plate; the first partition wall is formed inside the outer casing main body The exhaust gas flow inlet is centered at a position opposite to the one side wall and forms a first partition wall hole with the rear side wall; and a second partition wall is located at the other side wall of the outer casing main body and The first partition wall is formed at a position on the opposite side of the other side wall centering on the exhaust gas outflow port, and includes a second partition hole formed at a lower edge of the front side end. A scrubber for processing a process exhaust gas according to claim 4, wherein the first cooling plate is an inner hollow plate shape, including: facing from one side to another a gas passage pipe through which the machining waste gas flows, a first cooling water inlet port through which the cooling water flows into the first cooling water flow inlet, and a first cooling water flow outlet through which the inflowing cooling water flows outward; a plurality of the first cooling The plates are spaced apart from each other between the first partition wall and the second partition wall, perpendicular to the first partition wall and the second partition wall, and are parallel to the front side wall. A scrubber for processing a process exhaust gas according to claim 4, wherein the second cooling plate comprises a grid mesh and a cooling pipe, the cooling pipe contacting the grid mesh and forming a meander shape, For supplying cooling water from the outside and flowing it out; a plurality of the second cooling plates are leveled between the second partition wall and the other side wall of the outer casing main body, and are spaced apart from each other in a vertical direction; The second cooling plate is disposed to alternately form a second cooling hole between the second partition wall or the other side wall. A scrubber for processing a process exhaust gas according to claim 1, wherein the reaction unit comprises: a reaction outer casing, the inside of the reaction casing being hollow, including a reaction flow inlet for flowing the process exhaust gas, And a reaction flow outlet for flowing the processing waste gas to the outside; a support plate having a plate shape having a plurality of support holes penetrating from the upper surface to the lower surface, and vertically spaced apart inside the reaction housing Forming; and an amine-based substance layer, the powder of the amine-based substance is laminated on the support plate Or formed by a block; wherein the amine-based substance removes the water-soluble gas by reacting with the acid hydrazine of the process exhaust gas. A scrubber for processing a process exhaust gas according to claim 1, wherein the reaction unit comprises: a reaction outer casing, the inside of the reaction casing being hollow, allowing the process exhaust gas to flow from the cooling unit; And a urea particle layer formed by filling a inside of the reaction envelope with urea particles of a predetermined height and in contact with the process exhaust gas, wherein the urea particles have an average fineness of several micrometers to several hundreds of micrometers. A scrubber for treating a process exhaust gas according to claim 1, wherein the amine-based substance comprises a urea (urea), aminobutyric acid, diphenylamine, N,N-diaminobenzoic acid, and a valley. At least one of amino acid, laurylamine (n-dodecylamine), methacrylamide, nicotine putrescine, stearic acid amine (stearylamine), and tallow amine.