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TWI562271B - - Google Patents

Info

Publication number
TWI562271B
TWI562271B TW099144803A TW99144803A TWI562271B TW I562271 B TWI562271 B TW I562271B TW 099144803 A TW099144803 A TW 099144803A TW 99144803 A TW99144803 A TW 99144803A TW I562271 B TWI562271 B TW I562271B
Authority
TW
Taiwan
Application number
TW099144803A
Other versions
TW201133700A (en
Inventor
Daisuke Yuki
Takahiro Miike
Hiroshi Mori
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Publication of TW201133700A publication Critical patent/TW201133700A/zh
Application granted granted Critical
Publication of TWI562271B publication Critical patent/TWI562271B/zh

Links

Classifications

    • H10P72/7606
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B38/00Ancillary operations in connection with laminating processes
    • B32B38/18Handling of layers or the laminate
    • H10P10/128
    • H10P54/00
    • H10P72/0428
    • H10P72/722
    • H10P72/7608
    • H10P72/7618
    • H10P72/7624
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T156/00Adhesive bonding and miscellaneous chemical manufacture
    • Y10T156/10Methods of surface bonding and/or assembly therefor
TW099144803A 2009-12-18 2010-12-20 Pair of substrate holders, method for manufacturing device, separation device, method for separating substrates, substrate holder, and device for positioning substrate TW201133700A (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2009288121 2009-12-18
JP2009288261 2009-12-18

Publications (2)

Publication Number Publication Date
TW201133700A TW201133700A (en) 2011-10-01
TWI562271B true TWI562271B (zh) 2016-12-11

Family

ID=44167044

Family Applications (1)

Application Number Title Priority Date Filing Date
TW099144803A TW201133700A (en) 2009-12-18 2010-12-20 Pair of substrate holders, method for manufacturing device, separation device, method for separating substrates, substrate holder, and device for positioning substrate

Country Status (6)

Country Link
US (1) US8863808B2 (zh)
EP (1) EP2515322A4 (zh)
JP (1) JP6051523B2 (zh)
KR (1) KR101860956B1 (zh)
TW (1) TW201133700A (zh)
WO (1) WO2011074274A1 (zh)

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4676026B1 (ja) 2010-09-17 2011-04-27 日東電工株式会社 液晶表示素子の製造システム及び製造方法
JP4733227B1 (ja) * 2010-09-30 2011-07-27 日東電工株式会社 液晶表示素子の製造システム及び製造方法
TWI616975B (zh) * 2011-12-14 2018-03-01 Nikon Corporation 基板固定器及基板貼合裝置
US9947637B2 (en) 2013-11-01 2018-04-17 Nikon Corporation System and method for clamping wafers together in alignment using pressure
JP6473908B2 (ja) * 2015-02-17 2019-02-27 ボンドテック株式会社 ウエハ接合装置及びウエハ接合方法
CN107749407B (zh) * 2017-09-22 2020-08-28 沈阳拓荆科技有限公司 晶圆承载盘及其支撑结构
WO2019146424A1 (ja) * 2018-01-23 2019-08-01 東京エレクトロン株式会社 基板処理装置、および基板処理方法
KR102217780B1 (ko) * 2018-06-12 2021-02-19 피에스케이홀딩스 (주) 정렬 장치
US11309177B2 (en) * 2018-11-06 2022-04-19 Stmicroelectronics S.R.L. Apparatus and method for manufacturing a wafer
WO2020194310A1 (en) 2019-03-27 2020-10-01 Yaskawa Europe Technology Ltd. Semiconductor flipper
JP7267111B2 (ja) * 2019-05-31 2023-05-01 東京エレクトロン株式会社 位置決め機構及び位置決め方法
JP7288832B2 (ja) * 2019-10-01 2023-06-08 キヤノントッキ株式会社 回転駆動装置
CN111668092B (zh) * 2020-04-24 2025-07-15 北京华卓精科科技股份有限公司 晶圆键合的方法
KR102507268B1 (ko) * 2021-04-26 2023-03-07 (주)에스티아이 라미네이션 시스템
US12538756B2 (en) * 2022-05-06 2026-01-27 Nuflare Technology, Inc. Vapor phase growth apparatus and reflector
US20240006196A1 (en) * 2022-06-29 2024-01-04 Sky Tech Inc. Bonding machine for warped substrates

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI264080B (en) * 2003-03-24 2006-10-11 Sumitomo Electric Industries Wafer holder for semiconductor manufacturing device and semiconductor manufacturing device in which it is installed
US7207763B2 (en) * 2004-01-15 2007-04-24 Terasemicon Co., Ltd Semiconductor manufacturing system and wafer holder for semiconductor manufacturing system
TW200917410A (en) * 2007-08-15 2009-04-16 Nikon Corp Aligning apparatus, bonding apparatus, laminated substrate manufacturing apparatus, exposure apparatus and aligning method
TW200919626A (en) * 2007-10-25 2009-05-01 Topcon Corp Wafer holder
TWI483339B (zh) * 2007-06-12 2015-05-01 尼康股份有限公司 Wafer bonding device, wafer bonding method, wafer detection device and wafer detection method

Family Cites Families (14)

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Publication number Priority date Publication date Assignee Title
JPH11261000A (ja) 1998-03-13 1999-09-24 Japan Science & Technology Corp 3次元半導体集積回路装置の製造方法
JP2005310939A (ja) * 2004-04-20 2005-11-04 Hitachi Cable Ltd ウェハ接合用治具及びウェハ接合方法
JP2006332563A (ja) * 2005-05-30 2006-12-07 Nikon Corp ウェハ搬送装置、ウェハ積層体搬送装置及び積層型半導体装置製造方法
JP2007115978A (ja) 2005-10-21 2007-05-10 Nikon Corp 加圧装置及び半導体装置の製造方法
JP4692238B2 (ja) * 2005-11-15 2011-06-01 株式会社ニコン マスク収納容器開装置、露光装置
JP5098165B2 (ja) * 2005-12-08 2012-12-12 株式会社ニコン ウェハの接合方法、接合装置及び積層型半導体装置の製造方法
WO2008114337A1 (ja) * 2007-02-22 2008-09-25 Shin-Etsu Engineering Co., Ltd. 真空貼り合わせ方法及び真空貼り合わせ装置
JP5561572B2 (ja) * 2007-08-30 2014-07-30 株式会社チユーオー 屋根上設置物の取付け用金物
TWI471971B (zh) * 2007-10-30 2015-02-01 尼康股份有限公司 Substrate holding member, substrate bonding apparatus, laminated substrate manufacturing apparatus, substrate bonding method, laminated substrate manufacturing method, and laminated semiconductor device manufacturing method
US8245751B2 (en) 2007-11-07 2012-08-21 Advanced Display Process Engineering Co., Ltd. Substrate bonding apparatus
JP2009194264A (ja) 2008-02-18 2009-08-27 Nikon Corp 基板貼り合わせ装置
JPWO2009113317A1 (ja) * 2008-03-13 2011-07-21 株式会社ニコン 基板ホルダ、基板ホルダユニット、基板搬送装置および基板貼り合わせ装置
JP4786693B2 (ja) * 2008-09-30 2011-10-05 三菱重工業株式会社 ウェハ接合装置およびウェハ接合方法
US8276262B2 (en) * 2008-12-03 2012-10-02 Intel Corporation Magnetically coupled thin-wafer handling system

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI264080B (en) * 2003-03-24 2006-10-11 Sumitomo Electric Industries Wafer holder for semiconductor manufacturing device and semiconductor manufacturing device in which it is installed
US7207763B2 (en) * 2004-01-15 2007-04-24 Terasemicon Co., Ltd Semiconductor manufacturing system and wafer holder for semiconductor manufacturing system
TWI483339B (zh) * 2007-06-12 2015-05-01 尼康股份有限公司 Wafer bonding device, wafer bonding method, wafer detection device and wafer detection method
TW200917410A (en) * 2007-08-15 2009-04-16 Nikon Corp Aligning apparatus, bonding apparatus, laminated substrate manufacturing apparatus, exposure apparatus and aligning method
TW200919626A (en) * 2007-10-25 2009-05-01 Topcon Corp Wafer holder

Also Published As

Publication number Publication date
EP2515322A4 (en) 2017-03-01
TW201133700A (en) 2011-10-01
KR101860956B1 (ko) 2018-05-24
JPWO2011074274A1 (ja) 2013-04-25
EP2515322A1 (en) 2012-10-24
KR20120109561A (ko) 2012-10-08
JP6051523B2 (ja) 2016-12-27
WO2011074274A1 (ja) 2011-06-23
US20130008581A1 (en) 2013-01-10
US8863808B2 (en) 2014-10-21

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