TWI560841B - Wafer level package and fabrication method thereof - Google Patents
Wafer level package and fabrication method thereofInfo
- Publication number
- TWI560841B TWI560841B TW104128257A TW104128257A TWI560841B TW I560841 B TWI560841 B TW I560841B TW 104128257 A TW104128257 A TW 104128257A TW 104128257 A TW104128257 A TW 104128257A TW I560841 B TWI560841 B TW I560841B
- Authority
- TW
- Taiwan
- Prior art keywords
- fabrication method
- wafer level
- level package
- package
- wafer
- Prior art date
Links
Classifications
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- H10W74/137—
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/18—Printed circuits structurally associated with non-printed electric components
- H05K1/181—Printed circuits structurally associated with non-printed electric components associated with surface mounted components
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- H10P72/74—
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- H10W70/60—
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- H10W70/611—
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- H10W70/635—
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- H10W70/685—
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- H10W70/69—
-
- H10W70/692—
-
- H10W74/014—
-
- H10W74/117—
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- H10W90/701—
-
- H10P72/7412—
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- H10P72/7424—
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- H10P72/744—
-
- H10W72/0198—
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- H10W72/072—
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- H10W72/07207—
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- H10W72/241—
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- H10W74/019—
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- H10W74/142—
-
- H10W74/15—
-
- H10W90/724—
-
- H10W90/734—
Landscapes
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Power Engineering (AREA)
- Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US14/745,473 US9520333B1 (en) | 2015-06-22 | 2015-06-22 | Wafer level package and fabrication method thereof |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TWI560841B true TWI560841B (en) | 2016-12-01 |
| TW201701443A TW201701443A (zh) | 2017-01-01 |
Family
ID=57483987
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW104128257A TWI560841B (en) | 2015-06-22 | 2015-08-28 | Wafer level package and fabrication method thereof |
Country Status (3)
| Country | Link |
|---|---|
| US (1) | US9520333B1 (zh) |
| CN (2) | CN106257658A (zh) |
| TW (1) | TWI560841B (zh) |
Families Citing this family (29)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20170062240A1 (en) * | 2015-08-25 | 2017-03-02 | Inotera Memories, Inc. | Method for manufacturing a wafer level package |
| US9704790B1 (en) * | 2016-03-14 | 2017-07-11 | Micron Technology, Inc. | Method of fabricating a wafer level package |
| US9984995B1 (en) * | 2016-11-13 | 2018-05-29 | Nanya Technology Corporation | Semiconductor package and manufacturing method thereof |
| US10854568B2 (en) * | 2017-04-07 | 2020-12-01 | Taiwan Semiconductor Manufacturing Company, Ltd. | Packages with Si-substrate-free interposer and method forming same |
| DE102017124104B4 (de) | 2017-04-07 | 2025-05-15 | Taiwan Semiconductor Manufacturing Co., Ltd. | Packages mit si-substrat-freiem interposer und verfahren zum bilden derselben |
| US10522449B2 (en) * | 2017-04-10 | 2019-12-31 | Taiwan Semiconductor Manufacturing Company, Ltd. | Packages with Si-substrate-free interposer and method forming same |
| DE102017123449B4 (de) | 2017-04-10 | 2023-12-28 | Taiwan Semiconductor Manufacturing Co. Ltd. | Gehäuse mit Si-substratfreiem Zwischenstück und Ausbildungsverfahren |
| US10177011B2 (en) * | 2017-04-13 | 2019-01-08 | Powertech Technology Inc. | Chip packaging method by using a temporary carrier for flattening a multi-layer structure |
| KR102077455B1 (ko) * | 2017-07-04 | 2020-02-14 | 삼성전자주식회사 | 반도체 장치 |
| US10290571B2 (en) * | 2017-09-18 | 2019-05-14 | Taiwan Semiconductor Manufacturing Company, Ltd. | Packages with si-substrate-free interposer and method forming same |
| US11101209B2 (en) * | 2017-09-29 | 2021-08-24 | Taiwan Semiconductor Manufacturing Company, Ltd. | Redistribution structures in semiconductor packages and methods of forming same |
| WO2019079937A1 (en) * | 2017-10-23 | 2019-05-02 | Boe Technology Group Co., Ltd. | INTEGRATED CIRCUIT CHIP, DISPLAY APPARATUS, AND METHOD FOR MANUFACTURING INTEGRATED CIRCUIT CHIP |
| TWI699840B (zh) | 2017-10-23 | 2020-07-21 | 美商應用材料股份有限公司 | 形成扇出互連結構與互連結構的方法 |
| KR102099750B1 (ko) | 2017-11-01 | 2020-04-10 | 삼성전자주식회사 | 반도체 패키지 |
| KR102019355B1 (ko) * | 2017-11-01 | 2019-09-09 | 삼성전자주식회사 | 반도체 패키지 |
| US10529693B2 (en) * | 2017-11-29 | 2020-01-07 | Advanced Micro Devices, Inc. | 3D stacked dies with disparate interconnect footprints |
| KR102055595B1 (ko) * | 2017-12-15 | 2019-12-16 | 삼성전자주식회사 | 반도체 패키지 |
| TWI655739B (zh) * | 2018-04-19 | 2019-04-01 | 南亞電路板股份有限公司 | 封裝結構及其形成方法 |
| US10727204B2 (en) | 2018-05-29 | 2020-07-28 | Advances Micro Devices, Inc. | Die stacking for multi-tier 3D integration |
| US10937755B2 (en) | 2018-06-29 | 2021-03-02 | Advanced Micro Devices, Inc. | Bond pads for low temperature hybrid bonding |
| US10923421B2 (en) | 2019-04-23 | 2021-02-16 | Taiwan Semiconductor Manufacturing Company, Ltd. | Package structure and method of manufacturing the same |
| US11296062B2 (en) * | 2019-06-25 | 2022-04-05 | Taiwan Semiconductor Manufacturing Company, Ltd. | Three-dimension large system integration |
| CN113451140A (zh) * | 2020-03-24 | 2021-09-28 | 合肥晶合集成电路股份有限公司 | 封装结构的形成方法 |
| TWI739413B (zh) * | 2020-05-04 | 2021-09-11 | 力成科技股份有限公司 | 半導體裝置及其製造方法 |
| KR102792183B1 (ko) * | 2020-09-07 | 2025-04-09 | 삼성전자주식회사 | 반도체 패키지 |
| KR102901937B1 (ko) * | 2021-03-31 | 2025-12-18 | 엘지이노텍 주식회사 | 회로기판 및 이를 포함하는 패키지 기판 |
| US12033947B2 (en) * | 2021-04-15 | 2024-07-09 | Taiwan Semiconductor Manufacturing Company, Ltd. | Semiconductor package structure and method for forming the same |
| US11973058B2 (en) | 2021-11-25 | 2024-04-30 | International Business Machines Corporation | Multiple die assembly |
| CN119542149A (zh) * | 2023-08-29 | 2025-02-28 | 矽磐微电子(重庆)有限公司 | 半导体结构的制造方法及半导体结构 |
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| TW201411751A (zh) * | 2012-09-14 | 2014-03-16 | 史達晶片有限公司 | 於扇出晶圓級晶片尺寸封裝形成兩側互連結構的半導體裝置及方法 |
| TW201417197A (zh) * | 2012-09-28 | 2014-05-01 | 史達晶片有限公司 | 形成支撐層於薄扇出晶圓級晶片尺寸封裝中之半導體晶粒之上的半導體裝置和方法 |
| US20150108635A1 (en) * | 2013-10-23 | 2015-04-23 | Taiwan Semiconductor Manufacturing Company Ltd. | Semiconductor structure and manufacturing method thereof |
| TW201526125A (zh) * | 2013-12-23 | 2015-07-01 | 史達晶片有限公司 | 半導體裝置和在扇出封裝中於半導體晶粒上形成細節距重新分佈層之方法 |
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| CN2612071Y (zh) * | 2003-02-27 | 2004-04-14 | 威盛电子股份有限公司 | 芯片封装结构 |
| JP2004349440A (ja) * | 2003-05-22 | 2004-12-09 | Renesas Technology Corp | フリップチップ実装方法 |
| US7394161B2 (en) * | 2003-12-08 | 2008-07-01 | Megica Corporation | Chip structure with pads having bumps or wirebonded wires formed thereover or used to be tested thereto |
| US20070237890A1 (en) * | 2004-02-20 | 2007-10-11 | Jsr Corporation | Bilayer Laminated Film for Bump Formation and Method of Bump Formation |
| US7915744B2 (en) * | 2005-04-18 | 2011-03-29 | Mediatek Inc. | Bond pad structures and semiconductor devices using the same |
| US20090200675A1 (en) * | 2008-02-11 | 2009-08-13 | Thomas Goebel | Passivated Copper Chip Pads |
| US20100099250A1 (en) * | 2008-10-21 | 2010-04-22 | Samsung Electronics Co., Ltd. | Methods of Forming Integrated Circuit Contact Pads Using Electroless Plating of Diffusion Barrier Layers |
| US8592992B2 (en) * | 2011-12-14 | 2013-11-26 | Stats Chippac, Ltd. | Semiconductor device and method of forming vertical interconnect structure with conductive micro via array for 3-D Fo-WLCSP |
| WO2010100706A1 (ja) * | 2009-03-05 | 2010-09-10 | パナソニック株式会社 | 半導体装置 |
| US8866258B2 (en) * | 2009-10-06 | 2014-10-21 | Broadcom Corporation | Interposer structure with passive component and method for fabricating same |
| US20110266670A1 (en) * | 2010-04-30 | 2011-11-03 | Luke England | Wafer level chip scale package with annular reinforcement structure |
| KR20110124993A (ko) * | 2010-05-12 | 2011-11-18 | 삼성전자주식회사 | 반도체 칩 및 이를 포함하는 반도체 패키지 및 반도체 칩의 제조 방법 |
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| US9502390B2 (en) * | 2012-08-03 | 2016-11-22 | Invensas Corporation | BVA interposer |
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| US9508674B2 (en) * | 2012-11-14 | 2016-11-29 | Taiwan Semiconductor Manufacturing Company, Ltd. | Warpage control of semiconductor die package |
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| US9764153B2 (en) * | 2013-03-14 | 2017-09-19 | Taiwan Semiconductor Manufacturing Company, Ltd. | Interconnect structure and method of forming same |
| CN104051411B (zh) * | 2013-03-15 | 2018-08-28 | 台湾积体电路制造股份有限公司 | 叠层封装结构 |
| US9000302B2 (en) * | 2013-04-17 | 2015-04-07 | Shinko Electric Industries Co., Ltd. | Wiring board |
| JP2015095482A (ja) * | 2013-11-08 | 2015-05-18 | アイメックImec | 半導体部品上へのマイクロバンプの作製方法 |
| JP5662551B1 (ja) * | 2013-12-20 | 2015-01-28 | 新光電気工業株式会社 | 配線基板、半導体装置及び配線基板の製造方法 |
| US9402312B2 (en) * | 2014-05-12 | 2016-07-26 | Invensas Corporation | Circuit assemblies with multiple interposer substrates, and methods of fabrication |
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-
2015
- 2015-06-22 US US14/745,473 patent/US9520333B1/en active Active
- 2015-08-28 TW TW104128257A patent/TWI560841B/zh active
- 2015-11-05 CN CN201510744361.1A patent/CN106257658A/zh active Pending
- 2015-11-05 CN CN202110375997.9A patent/CN113113365B/zh active Active
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TW201411751A (zh) * | 2012-09-14 | 2014-03-16 | 史達晶片有限公司 | 於扇出晶圓級晶片尺寸封裝形成兩側互連結構的半導體裝置及方法 |
| TW201417197A (zh) * | 2012-09-28 | 2014-05-01 | 史達晶片有限公司 | 形成支撐層於薄扇出晶圓級晶片尺寸封裝中之半導體晶粒之上的半導體裝置和方法 |
| US20150108635A1 (en) * | 2013-10-23 | 2015-04-23 | Taiwan Semiconductor Manufacturing Company Ltd. | Semiconductor structure and manufacturing method thereof |
| TW201526125A (zh) * | 2013-12-23 | 2015-07-01 | 史達晶片有限公司 | 半導體裝置和在扇出封裝中於半導體晶粒上形成細節距重新分佈層之方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| CN113113365B (zh) | 2025-01-28 |
| CN113113365A (zh) | 2021-07-13 |
| TW201701443A (zh) | 2017-01-01 |
| US20160372395A1 (en) | 2016-12-22 |
| US9520333B1 (en) | 2016-12-13 |
| CN106257658A (zh) | 2016-12-28 |
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