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TWI434927B - Washing liquid composition and substrate cleaning method - Google Patents

Washing liquid composition and substrate cleaning method Download PDF

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TWI434927B
TWI434927B TW100117503A TW100117503A TWI434927B TW I434927 B TWI434927 B TW I434927B TW 100117503 A TW100117503 A TW 100117503A TW 100117503 A TW100117503 A TW 100117503A TW I434927 B TWI434927 B TW I434927B
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TW201247865A (en
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Yu Jie Tsai
I Chun Hsieh
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Chi Mei Corp
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Description

洗淨液組成物及基板之洗淨方法Cleaning liquid composition and substrate cleaning method

本發明係有關一種洗淨液組成物及基板之洗淨方法,特別是提供一種針對玻璃基板,具生物分解性佳、高溫安定性佳之洗淨液組成物,以及一種使用該洗淨液組成物的基板之洗淨方法。The present invention relates to a cleaning liquid composition and a method for cleaning a substrate, and more particularly to providing a cleaning liquid composition having good biodegradability and high temperature stability against a glass substrate, and a cleaning composition using the same The method of cleaning the substrate.

液晶顯示器的製備中,不論是彩色濾光片基板或是薄膜電晶體陣列基板,於光阻(photoresist)成膜之前,皆須先以洗淨液進行清洗,故洗淨技術將影響到後續之光微影製程(photolithography)的品質,其中,為達到良好的洗淨效果,可增加洗淨液對基板的濕潤性,一般而言,業界常藉由界面活性劑的添加以改善濕潤性,如日本特開2004-094241專利文獻揭露炔二醇(acetylene diol)系界面活性劑的使用,其除了可提高對基板表面的濕潤性,亦可抑制發泡的產生。In the preparation of the liquid crystal display, whether it is a color filter substrate or a thin film transistor array substrate, the photoresist must be cleaned before the photoresist is formed, so the cleaning technology will affect the subsequent The quality of photolithography, in order to achieve a good cleaning effect, can increase the wettability of the cleaning liquid on the substrate. Generally, the industry often uses the addition of a surfactant to improve the wettability, such as The use of an acetylene diol-based surfactant is disclosed in Japanese Patent Laid-Open Publication No. 2004-094241, which can suppress the wettability of the surface of the substrate and suppress the occurrence of foaming.

前述習知洗淨液雖可有效增加對基板表面的濕潤性,卻存在著生物分解性不佳及高溫安定性不佳的問題。Although the above-mentioned conventional cleaning liquid can effectively increase the wettability to the surface of the substrate, there is a problem that the biodegradability is poor and the high temperature stability is poor.

有鑑於此,本案發明人乃投注心力不斷潛心研究,而終有創新並極富產業價值之本發明產生。In view of this, the inventor of this case is the focus of research on the bet, and the invention is innovated and rich in industrial value.

本發明主要目的在於提供一種洗淨液組成物,特別是用於洗淨玻璃基板,生物分解性佳、高溫安定性佳之洗淨液組成物。SUMMARY OF THE INVENTION A primary object of the present invention is to provide a composition for a cleaning liquid, particularly a cleaning liquid composition which is excellent in biodegradability and high in temperature stability for cleaning a glass substrate.

為滿足預期目的,本發明提供一種洗淨液組成物,包含鹼性化合物(A)、化合物(B)、支鏈型界面活性劑(C)以及水(D);其中,化合物(B)係具有下記結構式(1)或結構式(2)之化合物;To satisfy the intended purpose, the present invention provides a cleaning liquid composition comprising a basic compound (A), a compound (B), a branched surfactant (C), and water (D); wherein the compound (B) is a compound having the following structural formula (1) or structural formula (2);

結構式(1)及結構式(2)中,R1 表示氫原子、碳數1~6之含直鏈、支鏈或環狀之烷基;R2 表示碳數1~12之含直鏈、支鏈或環狀之烷基;EO表示乙氧基;PO表示丙氧基;(m+n)之平均值為1~30;(p+q)之平均值為0.5~10;支鏈型界面活性劑(C)以下記結構式(3)表示;In the structural formula (1) and the structural formula (2), R 1 represents a hydrogen atom, a linear, branched or cyclic alkyl group having 1 to 6 carbon atoms; and R 2 represents a linear chain having 1 to 12 carbon atoms. a branched or cyclic alkyl group; EO represents an ethoxy group; PO represents a propoxy group; (m+n) has an average value of from 1 to 30; (p+q) has an average value of from 0.5 to 10; The type of surfactant (C) is represented by the following structural formula (3);

R3 -O-(EO)a (PO)b -H 結構式(3)R 3 -O-(EO) a (PO) b -H Structural formula (3)

結構式(3)中,R3 表示碳數6~20之含支鏈之烷基、烯基或醯基,或碳數12~20之含支鏈烷基取代之苯基;EO表示乙氧基;PO表示丙氧基;a表示1~20之整數;b表示0~20之整數。In the formula (3), R 3 represents a branched alkyl group, an alkenyl group or a fluorenyl group having 6 to 20 carbon atoms, or a phenyl group substituted with a branched alkyl group having 12 to 20 carbon atoms; EO represents an ethoxy group. A group; PO represents a propoxy group; a represents an integer of 1 to 20; and b represents an integer of 0 to 20.

本發明提供一種基板之洗淨方法,該方法使用如前所述之洗淨液組成物。The present invention provides a method of cleaning a substrate using the cleaning composition as described above.

以下逐一對本發明各組成詳細說明。The components of the present invention are described in detail below.

[洗淨液組成物][washing liquid composition] 鹼性化合物(A)Basic compound (A)

本發明之洗淨液組成物所使用的鹼性化合物(A)包含無機鹼性化合物(A-1)及/或有機鹼性化合物(A-2)。The basic compound (A) used in the cleaning liquid composition of the present invention contains an inorganic basic compound (A-1) and/or an organic basic compound (A-2).

本發明之無機鹼性化合物(A-1)之具體例,如:氫氧化鋰、氫氧化鈉、氫氧化鉀、氫氧化銨等之鹼金屬氫氧化物;磷酸氫二銨、磷酸氫二鈉、磷酸氫二鉀、磷酸二氫銨、磷酸二氫鈉、磷酸二氫鉀等之鹼金屬或銨之磷酸鹽類;矽酸鋰、矽酸鈉、矽酸鉀等之鹼金屬矽酸鹽類;碳酸鋰、碳酸鈉、碳酸鉀等之鹼金屬碳酸鹽類;硼酸鋰、硼酸鈉、硼酸鉀等之鹼金屬硼酸鹽類。其中,以鹼金屬氫氧化物為較佳。上述無機鹼性化合物(A-1)可以單獨一種使用或者混合複數種使用。Specific examples of the inorganic basic compound (A-1) of the present invention include alkali metal hydroxides such as lithium hydroxide, sodium hydroxide, potassium hydroxide, ammonium hydroxide, etc.; diammonium hydrogen phosphate and disodium hydrogen phosphate; , alkali metal or ammonium phosphates such as dipotassium hydrogen phosphate, ammonium dihydrogen phosphate, sodium dihydrogen phosphate, potassium dihydrogen phosphate; alkali metal silicates such as lithium niobate, sodium citrate, potassium citrate An alkali metal carbonate such as lithium carbonate, sodium carbonate or potassium carbonate; or an alkali metal borate such as lithium borate, sodium borate or potassium borate. Among them, an alkali metal hydroxide is preferred. The above inorganic basic compound (A-1) may be used singly or in combination of plural kinds.

本發明之有機鹼性化合物(A-2)包含氫氧化四級銨基鹽類化合物及有機胺類之有機鹼性化合物。上述氫氧化四級銨基鹽類化合物之具體例,如:氫氧化四甲銨(tetramethyl ammonium hydroxide)、氫氧化四乙胺、氫氧化四丙胺、氫氧化四丁胺、2-羥基-氫氧化三甲銨(2-hydroxyl trimethyl ammonium hydroxide)等化合物;而有機胺類之具體例如:單甲胺、二甲胺、三甲胺、單乙胺、二乙胺、三乙胺、單異丙胺(monoisopropylamine)、二異丙胺(diisopropylamine)、單乙醇胺、二乙醇胺、三乙醇胺、2-(2-胺基乙氧基)乙醇(2-(2-aminoethoxy)ethanol)、單異丙醇胺(monoisopropanolamine)、二異丙醇胺、三異丙醇胺、正乙基乙醇胺(N-ethylethanolamine)、正丁基乙醇胺、N,N-二甲基乙醇胺(N,N-dimethylethanolamine)、N,N-二甲基 丙醇胺、N,N-二甲基異丙醇胺(N,N-dimethyl isopropanolamine)、環己胺、嗎啉(morpholine)等化合物。上述有機鹼性化合物(A-2)可以單獨一種使用或者混合複數種使用。The organic basic compound (A-2) of the present invention contains a quaternary ammonium hydroxide-based compound and an organic basic organic compound. Specific examples of the above quaternary ammonium hydroxide-based compound are, for example, tetramethyl ammonium hydroxide, tetraethylamine hydroxide, tetrapropylamine hydroxide, tetrabutylamine hydroxide, 2-hydroxy-hydroxide A compound such as 2-hydroxyl trimethyl ammonium hydroxide; and specific examples of organic amines such as monomethylamine, dimethylamine, trimethylamine, monoethylamine, diethylamine, triethylamine, monoisopropylamine , diisopropylamine, monoethanolamine, diethanolamine, triethanolamine, 2-(2-aminoethoxy)ethanol, monoisopropanolamine, two Isopropanolamine, triisopropanolamine, n-ethylethanolamine, n-butylethanolamine, N,N-dimethylethanolamine, N,N-dimethyl A compound such as propanolamine, N,N-dimethyl isopropanolamine, cyclohexylamine, morpholine or the like. The above organic basic compound (A-2) may be used singly or in combination of plural kinds.

本發明之有機鹼性化合物(A-2),於製造上因不含有金屬離子,故對於薄膜電晶體等半導體元件較不易產生殘影等不良影響。其中,乃以單乙醇胺、二乙醇胺、三乙醇胺以及單異丙醇胺為較佳。Since the organic basic compound (A-2) of the present invention does not contain metal ions in production, it is less likely to cause adverse effects such as residual images on semiconductor elements such as thin film transistors. Among them, monoethanolamine, diethanolamine, triethanolamine, and monoisopropanolamine are preferred.

化合物(B)Compound (B)

本發明洗淨液組成物所使用之化合物(B)係具有下記結構式(1)或結構式(2)之化合物; The compound (B) used in the composition of the cleaning liquid of the present invention has a compound of the following structural formula (1) or structural formula (2);

結構式(1)及結構式(2)中,R1 表示氫原子、碳數1~6之含直鏈、支鏈或環狀之烷基;R2 表示碳數1~12之含直鏈、支鏈或環狀之烷基;EO表示乙氧基;PO表示丙氧基;(m+n)之平均值為1~30;(p+q)之平均值為0.5~10。In the structural formula (1) and the structural formula (2), R 1 represents a hydrogen atom, a linear, branched or cyclic alkyl group having 1 to 6 carbon atoms; and R 2 represents a linear chain having 1 to 12 carbon atoms. A branched or cyclic alkyl group; EO represents an ethoxy group; PO represents a propoxy group; (m+n) has an average value of 1 to 30; and (p+q) has an average value of 0.5 to 10.

如上所述,(m+n)之平均值通常為1~30,較佳為3~25,更佳為5~20。(p+q)之平均值通常為0.5~10,較佳為1~9,更佳為2~8。As described above, the average value of (m + n) is usually from 1 to 30, preferably from 3 to 25, more preferably from 5 to 20. The average value of (p+q) is usually from 0.5 to 10, preferably from 1 to 9, more preferably from 2 to 8.

本發明洗淨液組成物所使用之化合物(B)可使用13 C核 磁共振光譜儀(13 C NMR Spectroscopy)量測(m+n)及(p+q)之平均值。The used cleaning solution composition of the present invention, the compound (B) using 13 C nuclear magnetic resonance spectroscopy (13 C NMR Spectroscopy) measurement of (m + n) and (p + q) of the average value.

本發明之化合物(B)中,以結構式(1)所表示之化合物之具體例如:商品名Surfynol 420、Surfynol 440、Surfynol 450、Surfynol 465、Surfynol 485、Dynol 604、Dynol 607(Air Products and Chemicals製)等。In the compound (B) of the present invention, specific examples of the compound represented by the formula (1) are, for example, trade names Surfynol 420, Surfynol 440, Surfynol 450, Surfynol 465, Surfynol 485, Dynol 604, Dynol 607 (Air Products and Chemicals). System) and so on.

本發明之化合物(B)中,以結構式(2)所表示之化合物之製備方式可參考美國公開專利US2002/0106589A1之段落0069~0080,在此不另行贅述。In the compound (B) of the present invention, the preparation of the compound represented by the structural formula (2) can be referred to the paragraphs 0069 to 0080 of the US Published Patent No. 2002/0106589 A1, which is not described herein.

上述之化合物(B)可以單獨一種使用或者混合複數種使用。The above compound (B) may be used singly or in combination of plural kinds.

本發明之洗淨液組成物中,基於鹼性化合物(A)100重量份,化合物(B)之使用量通常為10~500重量份,較佳為30~450重量份,更佳為50~400重量份。若完全未使用化合物(B),則洗淨液有高溫安定性不佳之問題。In the cleaning liquid composition of the present invention, the compound (B) is used in an amount of usually 10 to 500 parts by weight, preferably 30 to 450 parts by weight, more preferably 50%, based on 100 parts by weight of the basic compound (A). 400 parts by weight. If the compound (B) is not used at all, the cleaning solution has a problem of poor high temperature stability.

支鏈型界面活性劑(C)Branched surfactant (C)

本發明之洗淨液組成物,包含下記結構式(3)所表示之支鏈型界面活性劑(C)。The cleaning liquid composition of the present invention comprises the branched surfactant (C) represented by the following structural formula (3).

R3 -O-(EO)a (PO)b -H 結構式(3)R 3 -O-(EO) a (PO) b -H Structural formula (3)

結構式(3)中,R3 表示碳數6~20之含支鏈之烷基、烯基或醯基,或碳數12~20之含支鏈烷基取代之苯基;EO表示乙氧基;PO表示丙氧基;a表示1~20之整數;b表示0~20之整數;(EO)a (PO)b 之中,當b表示1~20之整數時,EO與PO之排列可為嵌段或隨機。In the formula (3), R 3 represents a branched alkyl group, an alkenyl group or a fluorenyl group having 6 to 20 carbon atoms, or a phenyl group substituted with a branched alkyl group having 12 to 20 carbon atoms; EO represents an ethoxy group. PO; represents a propoxy group; a represents an integer from 1 to 20; b represents an integer from 0 to 20; (EO) a (PO) b , when b represents an integer from 1 to 20, the arrangement of EO and PO Can be block or random.

結構式(3)中,當b=0時,表示(EO)a (PO)b 僅由乙氧基 構成,當b表示為1~10之整數時,表示(EO)a (PO)b 係由乙氧基與丙氧基構成。當(EO)a (PO)b 由乙氧基與丙氧基構成時,EO與PO的排列可為嵌段,亦可為隨機,其中,當EO與PO的排列為嵌段時,只要各個平均數於上述範圍之內,則EO之嵌段數及PO之嵌段數可分別為1個,亦可分別為2個以上。EO之嵌段數為2個以上時,各嵌段中之重複數可相同,亦可不同;PO之嵌段數為2個以上時,各嵌段中之重複數可相同,亦可不同。In the structural formula (3), when b=0, it means that (EO) a (PO) b is composed only of an ethoxy group, and when b is an integer of 1 to 10, it means (EO) a (PO) b system. It consists of ethoxy and propoxy. When (EO) a (PO) b is composed of an ethoxy group and a propoxy group, the arrangement of EO and PO may be a block or a random one, wherein when the arrangement of EO and PO is a block, as long as each When the average value is within the above range, the number of blocks of EO and the number of blocks of PO may be one or two or more. When the number of blocks of EO is two or more, the number of repetitions in each block may be the same or different, and when the number of blocks of PO is two or more, the number of repetitions in each block may be the same or different.

EO與PO的排列為嵌段或隨機時,若EO與PO之莫耳比[MEO /MPO ]為9.5/0.5~5/5,可達到高水溶性。而(EO)a (PO)b 中,基於高水溶性之考量下,a較佳為1~15,更佳為1~10,b較佳為1~15,更佳為1~10,(a+b)較佳為2~30,更佳為2~20。When the arrangement of EO and PO is block or random, if the molar ratio of EO to PO [M EO /M PO ] is 9.5/0.5 to 5/5, high water solubility can be achieved. In (EO) a (PO) b , a is preferably from 1 to 15, more preferably from 1 to 10, more preferably from 1 to 15, more preferably from 1 to 10, based on high water solubility. a+b) is preferably 2 to 30, more preferably 2 to 20.

上記結構式(3)所表示之支鏈型界面活性劑(C)之具體例如:商品名SINOPOL E8002、SINOPOL E8003、SINOPOL E8008、SINOPOL E8015(中日合成化學製)、Lutensol TO3、Lutensol TO5、Lutensol TO7、Lutensol TO10(BASF製)、Newcol 1004、Newcol 1006、Newcol 1008、Newcol 1020(日本乳化劑製)、NONION EH-204、NONION EH-208(日本油脂製)等。The specific examples of the branched surfactant (C) represented by the structural formula (3) are as follows: trade names SINOPOL E8002, SINOPOL E8003, SINOPOL E8008, SINOPOL E8015 (manufactured by Sino-Japanese Synthetic Chemical Co., Ltd.), Lutensol TO3, Lutensol TO5, Lutensol TO7, Lutensol TO10 (manufactured by BASF), Newcol 1004, Newcol 1006, Newcol 1008, Newcol 1020 (manufactured by Nippon Emulsifier), NONION EH-204, NONION EH-208 (manufactured by Nippon Oil Co., Ltd.), and the like.

上述之支鏈型界面活性劑(C)可以單獨一種使用或者混合複數種使用。The above-mentioned branched type surfactant (C) may be used singly or in combination of plural kinds.

本發明之洗淨液組成物中,基於鹼性化合物(A)100重量份,支鏈型界面活性劑(C)之使用量通常為10~500重量份,較佳為30~450重量份,更佳為50~400重量份。若 完全未使用支鏈型界面活性劑(C),則洗淨液組成物會有生物分解性低下之問題。In the cleaning liquid composition of the present invention, the amount of the branched surfactant (C) is usually 10 to 500 parts by weight, preferably 30 to 450 parts by weight, based on 100 parts by weight of the basic compound (A). More preferably 50 to 400 parts by weight. If When the branched surfactant (C) is not used at all, the detergent composition has a problem that the biodegradability is low.

水(D)Water (D)

本發明之洗淨液組成物所使用的水(D)並無特別限制。其具體例如:蒸餾水、純水(經離子交換樹脂等行脫鹽處理而得之水)、超純水(除無機離子外,不含有機物、生菌、微粒子及溶解氣體)及近年來被提案之各種機能水等。基於金屬離子對電子控制迴路具不佳影響,本發明中所使用的水(D)較佳為純水或超純水,更佳為超純水。其中,上述超純水可藉由將自來水通過活性碳、離子交換處理、蒸餾處理後,必要時以紫外光照射殺菌,或者通過過濾器而得。根據25℃之電阻值來區分,電阻值在1MΩ.cm以上即可稱為純水,電阻值在10MΩ.cm以上即可稱為超純水。The water (D) used in the cleaning liquid composition of the present invention is not particularly limited. Specific examples thereof include distilled water, pure water (water obtained by deionization treatment by ion exchange resin, etc.), ultrapure water (excluding inorganic ions, containing no organic matter, bacteria, fine particles, and dissolved gas) and have been proposed in recent years. Various functional waters, etc. The water (D) used in the present invention is preferably pure water or ultrapure water, more preferably ultrapure water, based on the metal ion having a poor influence on the electronic control circuit. The ultrapure water may be obtained by passing the tap water through activated carbon, ion exchange treatment, distillation treatment, irradiation with ultraviolet light if necessary, or passing through a filter. According to the resistance value of 25 °C, the resistance value is 1MΩ. Above cm, it can be called pure water, and the resistance value is 10MΩ. More than cm can be called ultrapure water.

本發明之洗淨液組成物,基於鹼性化合物(A)100重量份,水(D)之使用量通常為500~30,000重量份,較佳為500~20,000重量份,更佳為500~15,000重量份。The cleaning liquid composition of the present invention is usually used in an amount of 500 to 30,000 parts by weight, preferably 500 to 20,000 parts by weight, more preferably 500 to 15,000, based on 100 parts by weight of the basic compound (A). Parts by weight.

直鏈型界面活性劑(E)Linear surfactant (E)

本發明之洗淨液組成物中,可視需要進一步添加下記結構式(4)所表示之直鏈型界面活性劑(E);R4 -O-(EO)c (PO)d -H 結構式(4)In the cleaning liquid composition of the present invention, a linear surfactant (E) represented by the following structural formula (4) may be further added as needed; R 4 -O-(EO) c (PO) d -H structural formula (4)

結構式(4)中,R4 表示碳數8~18之含直鏈之烷基、烯基或醯基,或碳數14~18之含直鏈烷基取代之苯基;EO表示乙氧基;PO表示丙氧基;c及d分別為EO及PO的平均加成莫耳數,c表示1~20之整數,d表示0~20之整數。(EO)c (PO)d 中的EO與PO的排列方式可以是嵌段型也可以是 隨機型。In the formula (4), R 4 represents a linear alkyl group, an alkenyl group or a fluorenyl group having a carbon number of 8 to 18, or a linear alkyl group-substituted phenyl group having a carbon number of 14 to 18; EO represents an ethoxy group. PO; represents propoxy; c and d are the average addition moles of EO and PO, respectively, c represents an integer from 1 to 20, and d represents an integer from 0 to 20. The arrangement of EO and PO in (EO) c (PO) d may be a block type or a random type.

結構式(4)中,當d=0時,表示(EO)c (PO)d 僅由乙氧基構成,當d表示為1~20之整數時,表示(EO)c (PO)d 係由乙氧基與丙氧基構成。當(EO)c (PO)d 由乙氧基與丙氧基構成時,EO與PO的排列可為嵌段,亦可為隨機,其中,當EO與PO的排列為嵌段時,只要各個平均數於上述範圍之內,則EO之嵌段數及PO之嵌段數可以分別是1個,亦可分別是2個以上。EO之嵌段數為2個以上時,各嵌段中之重複數可以相同,亦可不同;PO之嵌段數為2個以上時,各嵌段中之重複數可相同,亦可不同。In the structural formula (4), when d=0, it means that (EO) c (PO) d is composed only of ethoxy groups, and when d is an integer of 1 to 20, it means (EO) c (PO) d system. It consists of ethoxy and propoxy. When (EO) c (PO) d is composed of an ethoxy group and a propoxy group, the arrangement of EO and PO may be a block or a random one, wherein when the arrangement of EO and PO is a block, as long as each When the average value is within the above range, the number of blocks of EO and the number of blocks of PO may be one or two or more. When the number of blocks of EO is two or more, the number of repetitions in each block may be the same or different, and when the number of blocks of PO is two or more, the number of repetitions in each block may be the same or different.

EO與PO的排列為嵌段或隨機時,若EO與PO之莫耳比[MEO /MPO ]為9.5/0.5~5/5,可達到高水溶性。而(EO)c (PO)d 中,基於高水溶性考量,c較佳為1~15,更佳為1~10,d較佳為1~15,更佳為1~10,(c+d)較佳為2~30,更佳為2~20。When the arrangement of EO and PO is block or random, if the molar ratio of EO to PO [M EO /M PO ] is 9.5/0.5 to 5/5, high water solubility can be achieved. In (EO) c (PO) d , based on the high water solubility consideration, c is preferably from 1 to 15, more preferably from 1 to 10, and d is preferably from 1 to 15, more preferably from 1 to 10, (c+ d) is preferably 2 to 30, more preferably 2 to 20.

上述結構式(4)所表示之直鏈型界面活性劑(E)包含下記結構式(5)~(9)之化合物:Cj H2j+1 -O-(EO)r -H 結構式(5)The linear surfactant (E) represented by the above structural formula (4) contains a compound of the following structural formula (5) to (9): C j H 2j+1 -O-(EO) r -H structural formula ( 5)

Cj H2j+1 -O-(EO)s (PO)t -H 結構式(6)C j H 2j+1 -O-(EO) s (PO) t -H Structural formula (6)

Cj H2j+1 -O-(PO)s (EO)t -H 結構式(7)C j H 2j+1 -O-(PO) s (EO) t -H Structural formula (7)

Cj H2j+1 -O-(EO)u (PO)v (EO)w -H 結構式(8)C j H 2j+1 -O-(EO) u (PO) v (EO) w -H Structural formula (8)

Cj H2j+1 -O-(EO)s (PO)t -H 結構式(9)C j H 2j+1 -O-(EO) s (PO) t -H Structural formula (9)

其中,結構式(6)~(8)之EO與PO為嵌段排列,結構式(9)之EO與PO為隨機排列,j表示8~18之整數,r、s、t、u、v及w表示EO或PO之平均加成莫耳數,r表示1~ 20之整數,s表示1~20之整數,t表示1~20之整數,u表示1~10之整數,v表示1~10之整數,w表示1~10之整數。Wherein, the EO and PO of the structural formulas (6) to (8) are arranged in blocks, the EO and PO of the structural formula (9) are randomly arranged, and j represents an integer of 8 to 18, r, s, t, u, v And w represents the average addition of EO or PO, and r represents 1~ An integer of 20, s represents an integer from 1 to 20, t represents an integer from 1 to 20, u represents an integer from 1 to 10, v represents an integer from 1 to 10, and w represents an integer from 1 to 10.

上記結構式(4)所表示之直鏈型界面活性劑(E)之具體例如:辛醇、癸醇、十三烷醇、十二烷醇、十八烷醇、硬脂醇、油醇、辛基酚、壬基酚、十二烷基酚等化合物之乙氧基及/或丙氧基加成之化合物、商品名SINOPOL 1308FG(中日合成化學製)、NONION K-204、NONION K-220、NONION K-230、NONION P-208、NONION P-210、NONION E-202、NONION E-205、NONION S-207、NONION S-220(日本油脂製)、EMULGEN 103、EMULGEN 220、EMULGEN 350、EMULGEN LS-106、EMULGEN LS-110(花王化學製)等。Specific examples of the linear surfactant (E) represented by the structural formula (4) are, for example, octanol, decyl alcohol, tridecyl alcohol, dodecanol, stearyl alcohol, stearyl alcohol, oleyl alcohol, An ethoxylated and/or propoxylated compound of a compound such as octylphenol, nonylphenol or dodecylphenol, trade name SINOPOL 1308FG (made by Sino-Japanese Synthetic Chemical Co., Ltd.), NONION K-204, NONION K- 220, NONION K-230, NONION P-208, NONION P-210, NONION E-202, NONION E-205, NONION S-207, NONION S-220 (made by Nippon Oil & Fats), EMULGEN 103, EMULGEN 220, EMULGEN 350 , EMULGEN LS-106, EMULGEN LS-110 (made by Kao Chemical).

上述之直鏈型界面活性劑(E)可以單獨一種使用或者混合複數種使用。The linear surfactants (E) described above may be used singly or in combination of plural kinds.

本發明之洗淨液組成物中,基於鹼性化合物(A)100重量份,直鏈型界面活性劑(E)之使用量通常為1~300重量份,較佳為10~250重量份,更佳為20~200重量份。當該直鏈型界面活性劑(E)之使用量為1~300重量份時,則可更進一步提高洗淨液組成物的生物分解性。In the cleaning liquid composition of the present invention, the linear surfactant (E) is used in an amount of usually 1 to 300 parts by weight, preferably 10 to 250 parts by weight, based on 100 parts by weight of the basic compound (A). More preferably, it is 20 to 200 parts by weight. When the amount of the linear surfactant (E) used is from 1 to 300 parts by weight, the biodegradability of the cleaning liquid composition can be further improved.

添加劑(F)Additive (F)

本發明之洗淨液組成物中,選擇性地,可進一步添加添加劑(F),如:消泡劑、螯合劑、抗氧化劑、pH調整劑、緩衝溶劑、防腐劑、水溶性有機溶劑、分散劑等。In the cleaning liquid composition of the present invention, optionally, an additive (F) such as an antifoaming agent, a chelating agent, an antioxidant, a pH adjuster, a buffering solvent, a preservative, a water-soluble organic solvent, and a dispersion may be further added. Agents, etc.

本發明之洗淨液組成物,視需要可進一步添加消泡劑,其具體例如:聚矽氧系、高級醇系、聚醚系、脂肪酸 酯系、聚乙二醇系、鑛物油系及包含下記結構式(10)所表示之化合物: Further, the cleaning liquid composition of the present invention may further contain an antifoaming agent, and specific examples thereof include polyfluorene-based, higher alcohol-based, polyether-based, fatty acid ester-based, polyethylene glycol-based, and mineral oil-based Contains the compound represented by the following structural formula (10):

結構式(10)中,x表示1或2之整數;R表示下記結構式(11)所表示之官能基。In the formula (10), x represents an integer of 1 or 2; and R represents a functional group represented by the following structural formula (11).

結構式(11)中,y表示3~7之整數。In the structural formula (11), y represents an integer of 3 to 7.

上述之結構式(10)所表示之化合物之具體例如:商品名Surfynol MD-20、Surfynol MD-30(Air Products and Chemicals公司製)。Specific examples of the compound represented by the above structural formula (10) are, for example, trade name Surfynol MD-20, Surfynol MD-30 (manufactured by Air Products and Chemicals Co., Ltd.).

上述之消泡劑可單獨一種或混合複數種以上使用。The above antifoaming agents may be used singly or in combination of plural kinds or more.

本發明之螫合劑之具體例如:乙二胺四乙酸(鹽)(EDTA)、二乙三胺五乙酸(鹽)(DTPA)、三乙四胺六乙酸(鹽)(TTHA)、羥乙基乙二胺三乙酸(鹽)(HEDTA)、二羥乙基乙二胺四乙酸(鹽)(DHEDDA)、次氮基三乙酸(鹽)(NTA)、羥乙基亞胺基二乙酸(鹽)(HIDA)、β-丙胺酸二乙酸(鹽)、天冬醯胺酸二乙酸(鹽)、甲基甘胺酸二乙酸(鹽)、亞胺基二琥珀酸(鹽)、絲胺酸二乙酸(鹽)、羥基亞胺基二琥珀酸(鹽)、二羥基乙基甘胺酸(鹽)、天冬醯胺酸(鹽)、麩胺酸(鹽)等之胺基多羧酸(鹽);羥基乙酸(鹽)、酒石酸(鹽)、檸檬酸(鹽)、葡萄糖酸(鹽)等之羥基羧酸(鹽);甲基二膦酸 (鹽)、胺基三(亞甲基膦酸)(鹽)、1-羥基亞乙基-1,1-二膦酸(鹽)、乙二胺四(亞甲基膦酸)(鹽)、己二胺四(亞甲基膦酸)(鹽)、丙二胺四(亞甲基膦酸)(鹽)、二乙三胺五(亞甲基膦酸)(鹽)、三乙四胺六(亞甲基膦酸)(鹽)、三胺基三乙基胺六(亞甲基膦酸)(鹽)、反-1,2-環己二胺四(亞甲基膦酸)(鹽)、二醇醚二胺四(亞甲基膦酸)(鹽)、四乙五胺七(亞甲基膦酸)(鹽)等之膦酸(鹽);偏磷酸(鹽)、三聚磷酸(鹽)、六偏磷酸(鹽)等之縮合磷酸(鹽)等。上述之螫合劑可單獨一種或混合複數種以上使用。Specific examples of the chelating agent of the present invention are: ethylenediaminetetraacetic acid (salt) (EDTA), diethylenetriaminepentaacetic acid (salt) (DTPA), triethylenetetramine hexaacetic acid (salt) (TTHA), hydroxyethyl Ethylenediaminetriacetic acid (salt) (HEDTA), dihydroxyethylethylenediaminetetraacetic acid (salt) (DHEDDA), nitrilotriacetic acid (salt) (NTA), hydroxyethyliminodiacetic acid (salt) (HIDA), β-alanine diacetic acid (salt), aspartic acid diacetic acid (salt), methyl glycine diacetic acid (salt), imidodisuccinic acid (salt), serine Aminopolycarboxylic acid such as diacetic acid (salt), hydroxyiminodisuccinic acid (salt), dihydroxyethylglycine (salt), aspartic acid (salt), glutamic acid (salt), etc. (salt); hydroxycarboxylic acid (salt) of glycolic acid (salt), tartaric acid (salt), citric acid (salt), gluconic acid (salt), etc.; methyl diphosphonic acid (salt), aminotris(methylenephosphonic acid) (salt), 1-hydroxyethylidene-1,1-diphosphonic acid (salt), ethylenediaminetetrakis (methylenephosphonic acid) (salt) , hexamethylene diamine tetra (methylene phosphonic acid) (salt), propylene diamine tetra (methylene phosphonic acid) (salt), diethylene triamine penta (methylene phosphonic acid) (salt), triethylene tetra Amine hexa (methylene phosphonic acid) (salt), triamine triethylamine hexa(methylene phosphonic acid) (salt), trans-1,2-cyclohexanediamine tetra (methylene phosphonic acid) (salt), a phosphonic acid (salt) such as a glycol ether diamine tetra (methylene phosphonic acid) (salt), tetraethylenepentamine (methylene phosphonic acid) (salt), or the like, a metaphosphoric acid (salt), Condensed phosphoric acid (salt) such as tripolyphosphate (salt) or hexametaphosphoric acid (salt). The above-mentioned chelating agents may be used singly or in combination of plural kinds or more.

本發明之抗氧化劑之具體例如:2,6-二-第三丁基苯酚、2-第三丁基-4-甲氧基苯酚、2,4-二甲基-6-第三丁基苯酚等之苯酚系;單辛基二苯胺、單壬基二苯胺、4,4’-二丁基二苯胺、4,4’-二戊基二苯胺、四丁基二苯胺、四己基二苯胺、α-萘胺、苯基-α-萘胺等之胺系;吩噻嗪(phenothiazine)、季戊四醇四(3-月桂基硫代丙酸酯)、雙(3,5-第三丁基-4-羥基芐基)硫醚(bis(3,5-t-butyl-4-hydroxybenzyl)sulfide)等之硫系;二亞磷酸雙(2,4-二-第三丁基苯基)季戊四醇酯、亞磷酸一苯二異葵酯、亞磷酸二苯二異辛酯、亞磷酸三苯酯等之磷系等。上述之抗氧化劑可單獨一種或混合複數種以上使用。Specific examples of the antioxidant of the present invention are: 2,6-di-tert-butylphenol, 2-tert-butyl-4-methoxyphenol, 2,4-dimethyl-6-tert-butylphenol Phenol type; monooctyldiphenylamine, monodecyldiphenylamine, 4,4'-dibutyldiphenylamine, 4,4'-dipentyldiphenylamine, tetrabutyldiphenylamine, tetrahexyldiphenylamine, Amines such as α-naphthylamine and phenyl-α-naphthylamine; phenothiazine, pentaerythritol tetrakis(3-laurylthiopropionate), bis(3,5-tert-butyl-4) a sulfur system such as bis(3,5-t-butyl-4-hydroxybenzylsulfide); bis(2,4-di-t-butylphenyl)pentaerythritol diphosphite, Phosphorus such as monophenylisobutyl phosphite, diphenyl diisooctyl phosphite, and triphenyl phosphite. The above-mentioned antioxidants may be used singly or in combination of plural kinds or more.

本發明之pH調整劑之具體例如:鹽酸、硫酸、硝酸、磺胺酸、磷酸等之無機酸;氫氧化鋰、氫氧化鈉、氫氧化鉀等之無機鹼等。上述之pH調整劑可單獨一種或混合複數種以上使用。Specific examples of the pH adjuster of the present invention include inorganic acids such as hydrochloric acid, sulfuric acid, nitric acid, sulfamic acid, and phosphoric acid; and inorganic bases such as lithium hydroxide, sodium hydroxide, and potassium hydroxide. The above-mentioned pH adjusters may be used singly or in combination of plural kinds or more.

本發明之緩衝溶劑之具體例如:蟻酸、醋酸、琥珀酸、 乳酸、蘋果酸、酪酸、順丁烯二酸、丙酮酸、丙二酸、沒食子酸等之有機酸及鹽類;磷酸、硼酸等之無機酸及其鹽類等。上述之緩衝溶劑可單獨一種或混合複數種以上使用。Specific examples of the buffer solvent of the present invention are: formic acid, acetic acid, succinic acid, Organic acids and salts such as lactic acid, malic acid, butyric acid, maleic acid, pyruvic acid, malonic acid, gallic acid; inorganic acids such as phosphoric acid and boric acid, and salts thereof. The above-mentioned buffering solvents may be used singly or in combination of plural kinds or more.

本發明之防腐劑之具體例如:六氫-1,3,5-三(羥乙基)-s-三嗪等之三嗪(triazine)衍生物;1,2-苯並異噻唑啉-3-酮、2-甲基-4-異噻唑啉-3-酮、5-氯-2-甲基-4-異噻唑啉-3-酮等之異噻唑啉(isothiazolin)衍生物;4-(2-硝基丁基)嗎啉、4,4-(2-乙基-2-硝基三亞甲基)二嗎啉等之嗎啉衍生物;2-(4-噻唑基)苯並咪唑等之苯並咪唑(benzimidazole)衍生物等。上述之防腐劑可單獨一種或混合複數種以上使用。Specific examples of the preservative of the present invention include triazine derivatives such as hexahydro-1,3,5-tris(hydroxyethyl)-s-triazine; 1,2-benzisothiazoline-3; -isothiazolin derivatives such as ketone, 2-methyl-4-isothiazolin-3-one, 5-chloro-2-methyl-4-isothiazolin-3-one; 4-( a morpholine derivative such as 2-nitrobutyl)morpholine or 4,4-(2-ethyl-2-nitrotrimethylene)dimorpholine; 2-(4-thiazolyl)benzimidazole Benzimidazole derivatives and the like. The above-mentioned preservatives may be used singly or in combination of plural kinds or more.

本發明之水溶性有機溶劑於20℃時對水之溶解度以3(g/100g)以上為佳,更佳為10以上。其具體例如:二甲基亞碸、環丁碸、3-甲基環丁碸、2,4-二甲基環丁碸等之亞碸類;二甲碸、二乙碸、雙(2-羥乙基)碸等之碸類;N,N-二甲基甲醯胺、N-甲基甲醯胺、N,N-二甲基乙醯胺、N,N-二甲基丙酼胺等之醯胺類;N-甲基-2-吡咯烷酮、N-乙基-2-吡咯烷酮、N-羥甲基-2-吡咯烷酮等之內醯胺類;β-丙內酯、β-丁內酯、γ-丁內酯、γ-戊內酯、δ-戊內酯等之內酯類;甲醇、乙醇、異丙醇等之醇類;乙二醇、乙二醇單甲基醚、乙二醇單乙基醚、二乙二醇、二乙二醇單甲基醚、二乙二醇單乙基醚、二乙二醇單丁基醚、二乙二醇單己基醚、二乙二醇單苯基醚、三乙二醇單甲基醚、丙二醇、丙二醇單甲基醚、二丙二醇單甲基醚、1,3-丁二醇、二乙二醇二甲基醚、二乙二醇二乙基醚、三乙二醇二甲基醚、 三乙二醇三乙基醚等之乙二醇及乙二醇醚類;N-甲基-2-噁唑烷酮、3,5-二甲基-2-噁唑烷酮等之噁唑烷酮(oxazolidinone)類;乙腈、丙腈、丁腈、丙烯腈、甲基丙烯腈、苯甲腈等之腈(nitrile)類;碳酸鹽類;碳酸乙烯酯、碳酸丙烯酯等之碳酸酯類;丙酮、二乙酮、苯乙酮、甲乙酮、環己酮、環戊酮、二丙酮醇等之酮類;四氫呋喃、四氫吡喃等之環醚類等。上述之水溶性有機溶劑可單獨一種或混合複數種以上使用。The water-soluble organic solvent of the present invention preferably has a solubility in water of 3 (g/100 g) or more at 20 ° C, more preferably 10 or more. Specifically, for example, dimethyl hydrazine, cyclobutyl hydrazine, 3-methylcyclobutyl fluorene, 2,4-dimethylcyclobutyl fluorene, etc.; dimethyl hydrazine, diethyl hydrazine, double (2- Anthraquinones such as hydroxyethyl)hydrazine; N,N-dimethylformamide, N-methylformamide, N,N-dimethylacetamide, N,N-dimethylpropanamide Such as guanamine; N-methyl-2-pyrrolidone, N-ethyl-2-pyrrolidone, N-hydroxymethyl-2-pyrrolidone, etc.; β-propiolactone, β-butane Lactones such as esters, γ-butyrolactone, γ-valerolactone, δ-valerolactone, alcohols such as methanol, ethanol, and isopropanol; ethylene glycol, ethylene glycol monomethyl ether, and B Glycol monoethyl ether, diethylene glycol, diethylene glycol monomethyl ether, diethylene glycol monoethyl ether, diethylene glycol monobutyl ether, diethylene glycol monohexyl ether, diethylene glycol Alcohol monophenyl ether, triethylene glycol monomethyl ether, propylene glycol, propylene glycol monomethyl ether, dipropylene glycol monomethyl ether, 1,3-butylene glycol, diethylene glycol dimethyl ether, diethylene glycol Alcohol diethyl ether, triethylene glycol dimethyl ether, Ethylene glycol and glycol ethers such as triethylene glycol triethyl ether; oxazoles such as N-methyl-2-oxazolidinone and 3,5-dimethyl-2-oxazolidinone An oxazolidinone; a nitrile of acetonitrile, propionitrile, butyronitrile, acrylonitrile, methacrylonitrile, benzonitrile, etc.; carbonates; carbonates such as ethylene carbonate and propylene carbonate a ketone such as acetone, diethyl ketone, acetophenone, methyl ethyl ketone, cyclohexanone, cyclopentanone or diacetone; a cyclic ether such as tetrahydrofuran or tetrahydropyran. The above-mentioned water-soluble organic solvents may be used singly or in combination of plural kinds or more.

本發明之分散劑之具體例如:羥乙基纖維素、陽離子化纖維素、羥甲基纖維素、羥丙基纖維素、瓜爾膠(guar gum)、陽離子化瓜爾膠、三仙膠(xanthan gum)、海藻酸鹽、陽離子化澱粉等之多糖類及其衍生物;植酸(phytic acid)、二(聚氧乙烯)烷基醚磷酸、三(聚氧乙烯)烷基醚磷酸等之聚乙烯醇(poval)及其磷酸酯類。上述之分散劑可單獨一種或混合複數種以上使用。Specific examples of the dispersing agent of the present invention are: hydroxyethyl cellulose, cationized cellulose, hydroxymethyl cellulose, hydroxypropyl cellulose, guar gum, cationized guar gum, and trisin ( Polysaccharides and derivatives thereof such as xanthan gum), alginate, cationized starch, etc.; phytic acid, bis(polyoxyethylene) alkyl ether phosphate, tris(polyoxyethylene) alkyl ether phosphate, etc. Polyphenol (poval) and its phosphates. The above dispersing agents may be used singly or in combination of plural kinds or more.

本發明所使用之添加劑(F)中,基於鹼性化合物(A)100重量份,消泡劑之使用量介於0.1~10重量份,較佳為0.3~9重量份,更佳為0.5~8重量份;螫合劑之使用量通常為30重量份以下,較佳為1~20重量份,更佳為3~20重量份;抗氧化劑、緩衝溶劑、防腐劑及分散劑之使用量通常為10重量份以下,較佳為8重量份以下,更佳為5重量份以下;pH調整劑之使用量通常為90重量份以下,較佳為85重量份以下,更佳為80重量份以下;水溶性有機溶劑之使用量通常為500重量份以下,較佳為400重量份以下,更佳為300重量份以下。In the additive (F) used in the present invention, the antifoaming agent is used in an amount of 0.1 to 10 parts by weight, preferably 0.3 to 9 parts by weight, more preferably 0.5%, based on 100 parts by weight of the basic compound (A). 8 parts by weight; the chelating agent is usually used in an amount of 30 parts by weight or less, preferably 1 to 20 parts by weight, more preferably 3 to 20 parts by weight; the antioxidant, buffer solvent, preservative and dispersing agent are usually used in an amount of usually 10 parts by weight or less, preferably 8 parts by weight or less, more preferably 5 parts by weight or less; the pH adjusting agent is usually used in an amount of 90 parts by weight or less, preferably 85 parts by weight or less, more preferably 80 parts by weight or less; The amount of the water-soluble organic solvent to be used is usually 500 parts by weight or less, preferably 400 parts by weight or less, more preferably 300 parts by weight or less.

[基板之洗淨方法][Method of cleaning substrate]

本發明進一步提供一種基板之洗淨方法,該洗淨方法係使用前述本發明之洗淨液組成物清洗基板;具體的洗淨手段包括但不限於浸泡法、沖淋法、刷洗法、超音波洗淨法及泡沫洗淨法等方法。其中,浸泡法係於浸泡槽內填滿洗淨液組成物,再將基板浸入洗淨液組成物內;沖淋法係將洗淨液組成物以沖淋、噴霧、噴射等方式清洗基板;刷洗法係將洗淨液組成物利用海綿、刷子等工具對基板進行清洗。The present invention further provides a method for cleaning a substrate, which is to clean the substrate by using the cleaning composition of the present invention; the specific cleaning means include, but are not limited to, a soaking method, a shower method, a brushing method, and an ultrasonic wave. Washing method and foam washing method. Wherein, the immersion method is filled in the immersion tank with the composition of the cleaning liquid, and then the substrate is immersed in the composition of the cleaning liquid; the rinsing method washes the substrate by washing, spraying, spraying, etc.; In the brushing method, the substrate is cleaned by a tool such as a sponge or a brush.

本發明之洗淨液組成物,可應用於鈉鈣玻璃、硼矽玻璃、二氧化矽玻璃及無鹼玻璃等玻璃基板的洗淨。The cleaning liquid composition of the present invention can be applied to the cleaning of a glass substrate such as soda lime glass, borosilicate glass, cerium oxide glass or alkali-free glass.

本發明之洗淨液組成物在25℃時之濁點為40~55℃,較佳為42~52℃,更佳為45~50℃。當洗淨液組成物在25℃時之濁點為40~55℃時,則對於玻璃基板之洗淨力佳。The cleaning liquid composition of the present invention has a cloud point of 40 to 55 ° C at 25 ° C, preferably 42 to 52 ° C, more preferably 45 to 50 ° C. When the cloud composition has a cloud point of 40 to 55 ° C at 25 ° C, the detergency for the glass substrate is good.

【評價方式】[Evaluation method] (1)濁點(1) cloud point

取25℃(室溫狀態)的洗淨液組成物50ml倒入100ml透明玻璃燒杯,並將燒杯置於加熱板上加熱,加熱同時以磁石攪拌子對洗淨液組成物進行攪拌,待洗淨液組成物完全轉變為白色混濁狀時,測得洗淨液組成物的溫度為濁點。Pour 50ml of the cleaning solution composition at 25 ° C (room temperature state) into a 100 ml transparent glass beaker, and heat the beaker on a hot plate, while heating and stirring the composition of the cleaning solution with a magnetic stirrer, to be washed. When the liquid composition was completely converted into a white turbid shape, the temperature of the composition of the washing liquid was measured as a cloud point.

(2)生物分解性(2) Biodegradability

將洗淨液組成物以水稀釋至1%,而後,使用DRB200(HACH製)進行化學需氧量(COD)的量測,並依據以下基準評價生物分解性。The composition of the cleaning solution was diluted with water to 1%, and then the chemical oxygen demand (COD) was measured using DRB200 (manufactured by HACH), and the biodegradability was evaluated in accordance with the following criteria.

◎:COD<2000ppm◎: COD<2000ppm

○:2000ppm≦COD<3000ppm○: 2000 ppm ≦ COD < 3000 ppm

△:3000ppm≦COD<4000ppm△: 3000ppm ≦COD<4000ppm

×:4000ppm≦COD×: 4000 ppm ≦ COD

(3)高溫安定性性(3) High temperature stability

將洗淨液組成物以水稀釋至5%,而後,將稀釋液加熱至70℃並維持240小時,接著以肉眼觀察稀釋液是否有沉澱物產生,並依據以下基準評價生物分解性。The detergent composition was diluted with water to 5%, and then the diluted solution was heated to 70 ° C for 240 hours, and then the dilution was visually observed for the presence of precipitate, and the biodegradability was evaluated according to the following criteria.

○:沒有沉澱物產生○: no precipitate is produced

×:有沉澱物產生×: There is sediment production

為使本發明之特徵及其目的、功效獲致更進一步之瞭解與認同,本發明將例舉以下實施例進一步說明,但應瞭解的是,該等實施例僅為例示說明之用,而不應被解釋為本發明實施之限制。The present invention will be further exemplified by the following examples in order to provide a further understanding of the present invention, and the purpose and effect of the present invention, but it should be understood that these embodiments are for illustrative purposes only and should not be It is to be construed as limiting the implementation of the invention.

[製備化合物(B)][Preparation of Compound (B)] <製備例1><Preparation Example 1>

在一容積1000毫升之高壓鍋中添加Surfynol 104(Air Products and Chemicals製)的EO加成物(EO含量為1.3莫耳)341g(1.2莫耳),並於密封後導入氮氣將空氣排出。接著將高壓鍋加壓至6.7bar,並於加熱至40℃後使用注射器添加三氟化硼二乙醚(boron trifluoride diethyletherate)1.2g。然後,使用注射泵浦分別以1.5mL/min及1.0mL/min之流量同時添加環氧乙烷(ethylene oxide)175g(3.97莫耳)及環氧丙烷(propylene oxide)600g(10.3莫耳),而在添加完畢後追加三氟化硼二乙醚0.7g,並於45℃下攪拌6小時,待冷卻後可得化合物(B-3)(以Surfynol 104/EOPO表示)。所得之化合物(B-3)以核磁共振光譜儀測得(m+n)為5.1,(p+q)為9.7。An EO adduct (EO content: 1.3 mol) of Surfynol 104 (manufactured by Air Products and Chemicals) was added to 341 g (1.2 mol) of a 1000 ml autoclave, and after sealing, nitrogen gas was introduced to discharge the air. The autoclave was then pressurized to 6.7 bar, and after heating to 40 ° C, 1.2 g of boron trifluoride diethyletherate was added using a syringe. Then, using an injection pump, ethylene oxide 175 g (3.97 mol) and propylene oxide (propylene) were simultaneously added at a flow rate of 1.5 mL/min and 1.0 mL/min, respectively. Oxide) 600g (10.3 mol), and after adding 0.7g of boron trifluoride diethyl ether, and stirring at 45 ° C for 6 hours, after cooling to obtain compound (B-3) (to Surfynol 104 / EOPO Express). The obtained compound (B-3) was analyzed by a nuclear magnetic resonance spectrometer to have (m+n) of 5.1 and (p+q) of 9.7.

<製備例2><Preparation Example 2>

在一容積1000毫升之高壓鍋中添加Surfynol 440(Air Products and Chemicals製)400g(1.05莫耳),並於密封後導入氮氣將空氣排出。接著使用氣密注射器添加三甲胺2.37g(0.04莫耳),再將高壓鍋加壓至6.7bar,加熱至100℃。然後,使用注射泵浦以1.0mL/min之流量添加環氧丙烷120g(2.06莫耳),並在添加完畢後於100℃下攪拌12小時。最後,待冷卻取出產物,並於真空下加熱13小時去除三甲胺後可得化合物(B-4)(以Surfynol 440/PO表示)。所得之化合物(B-4)以核磁共振光譜儀測得(m+n)為3.8,(p+q)為1.9。In a 1000 ml autoclave, Surfgol 440 (manufactured by Air Products and Chemicals) 400 g (1.05 mol) was added, and after sealing, nitrogen gas was introduced to discharge the air. Next, 2.37 g (0.04 mol) of trimethylamine was added using a gas-tight syringe, and the autoclave was pressurized to 6.7 bar and heated to 100 °C. Then, 120 g of propylene oxide (2.06 mol) was added using a syringe pump at a flow rate of 1.0 mL/min, and after the addition was completed, the mixture was stirred at 100 ° C for 12 hours. Finally, the product was removed by cooling, and heated under vacuum for 13 hours to remove the trimethylamine to give the compound (B-4) (in the form of Surfynol 440/PO). The obtained compound (B-4) was measured by a nuclear magnetic resonance spectrometer to have (m+n) of 3.8 and (p+q) of 1.9.

[實施例及比較例][Examples and Comparative Examples] <實施例1><Example 1>

將100重量份的氫氧化鉀(potassium hydroxide,以下簡稱A-1-1)、200重量份的Surfynol 465(Air Products and Chemicals製,以下簡稱B-1)、160重量份的支鏈型界面活性劑(Lutensol TO7,BASF製,以下簡稱C-1)以及2500重量份的水(D),以搖動式攪拌器混合均勻,即可獲得本發明之洗淨液組成物,該洗淨液組成物以前記各評價方式進行評價,所得結果如表1所示。100 parts by weight of potassium hydroxide (hereinafter referred to as A-1-1), 200 parts by weight of Surfynol 465 (manufactured by Air Products and Chemicals, hereinafter abbreviated as B-1), and 160 parts by weight of branched interfacial activity A detergent (Lutensol TO7, manufactured by BASF, hereinafter referred to as C-1) and 2500 parts by weight of water (D) are uniformly mixed by a shaker to obtain a cleaning liquid composition of the present invention, and the cleaning liquid composition The evaluation methods were previously evaluated, and the results are shown in Table 1.

<實施例2~9><Examples 2 to 9>

相同於實施例1的操作方法,不同的地方在於:改變原料的種類及其使用量,其配方及評價結果如表1所示。The operation method similar to that of Example 1 differs in that the kind of the raw material and the amount thereof are changed, and the formulation and evaluation results are shown in Table 1.

<比較例1~4><Comparative Examples 1 to 4>

相同於實施例1的操作方法,不同的地方在於:改變原料的種類及其使用量,其配方及評價結果如表1所示。The operation method similar to that of Example 1 differs in that the kind of the raw material and the amount thereof are changed, and the formulation and evaluation results are shown in Table 1.

由前述實施例及比較例可知,本發明之洗淨液組成物的生物分解性佳且高溫安定性佳;比較例1~3由於未同時併用化合物(B)及支鏈型界面活性劑(C),因此有生物分解性不佳或高溫安定性不佳之問題;比較例4中使用習知的基板處理溶液,仍無法得到良好的生物分解性及高溫安定性;實施例4及實施例6由於進一步使用直鏈型界面活性劑(E),使得實施例4及實施例6的生物分解性更優於其他實施例。另外,本發明之洗淨液組成物各實施例的濁點均介於40~55℃之間,對於玻璃基板的洗淨力佳。It can be seen from the above examples and comparative examples that the cleaning liquid composition of the present invention has good biodegradability and high temperature stability; Comparative Examples 1 to 3 do not simultaneously use the compound (B) and the branched surfactant (C). Therefore, there is a problem that the biodegradability is poor or the high temperature stability is not good; in the comparative example 4, the conventional substrate treatment solution is used, and good biodegradability and high temperature stability are still not obtained; Examples 4 and 6 are Further use of the linear type surfactant (E) makes the biodegradability of Example 4 and Example 6 superior to the other examples. Further, in each of the examples of the cleaning liquid composition of the present invention, the cloud point is between 40 and 55 ° C, and the cleaning power of the glass substrate is good.

惟以上所述者,僅為本發明之較佳實施例而已,當不能以此限定本發明實施之範圍,即大凡依本發明申請專利範圍及發明說明書內容所作之簡單的等效變化與修飾,皆應仍屬本發明專利涵蓋之範圍內。The above is only the preferred embodiment of the present invention, and the scope of the present invention is not limited thereto, that is, the simple equivalent changes and modifications made by the scope of the invention and the description of the invention are All should remain within the scope of the invention patent.

【附表說明】[Note to the attached table]

表一係本發明洗淨液組成物實施例及比較例之組成及評價結果。Table 1 shows the composition and evaluation results of the examples and comparative examples of the composition of the cleaning solution of the present invention.

Claims (6)

一種洗淨液組成物,包含:鹼性化合物(A);化合物(B);支鏈型界面活性劑(C);以及水(D);其中:化合物(B)係具有下記結構式(1)或結構式(2)之化合物; 結構式(1)及結構式(2)中,R1 表示氫原子、碳數1~6之含直鏈、支鏈或環狀之烷基;R2 表示碳數1~12之含直鏈、支鏈或環狀之烷基;EO表示乙氧基;PO表示丙氧基;(m+n)之平均值為1~30;(p+q)之平均值為0.5~10;支鏈型界面活性劑(C)以下記結構式(3)表示;R3 -O-(EO)a (PO)b -H 結構式(3)結構式(3)中,R3 表示碳數6~20之含支鏈之烷基、烯基或醯基,或碳數12~20之含支鏈烷基取代之苯基;EO表示乙氧基;PO表示丙氧基;a表示1~20之整數;b表示0~20之整數。A cleaning liquid composition comprising: a basic compound (A); a compound (B); a branched surfactant (C); and water (D); wherein: the compound (B) has the following structural formula (1) Or a compound of formula (2); In the structural formula (1) and the structural formula (2), R 1 represents a hydrogen atom, a linear, branched or cyclic alkyl group having 1 to 6 carbon atoms; and R 2 represents a linear chain having 1 to 12 carbon atoms. a branched or cyclic alkyl group; EO represents an ethoxy group; PO represents a propoxy group; (m+n) has an average value of from 1 to 30; (p+q) has an average value of from 0.5 to 10; The type of surfactant (C) is represented by the following structural formula (3); R 3 -O-(EO) a (PO) b -H. In the structural formula (3), R 3 represents a carbon number of 6 to a branched alkyl group, an alkenyl group or a fluorenyl group, or a phenyl group substituted with a branched alkyl group having 12 to 20 carbon atoms; EO represents an ethoxy group; PO represents a propoxy group; and a represents a group of 1 to 20 An integer; b represents an integer from 0 to 20. 如申請專利範圍第1項所述之洗淨液組成物,其中,基於鹼性化合物(A) 100重量份,化合物(B)的使用量為10~500重量份,支鏈型界面活性劑(C)的使用量為10~500重量份,水(D)的使用量為500~30,000重量份。The cleaning liquid composition according to the first aspect of the invention, wherein the compound (B) is used in an amount of 10 to 500 parts by weight based on 100 parts by weight of the basic compound (A), and a branched surfactant ( The amount of use of C) is 10 to 500 parts by weight, and the amount of water (D) used is 500 to 30,000 parts by weight. 如申請專利範圍第1項所述之洗淨液組成物,更進一步含有下記結構式(4)所表示之直鏈型界面活性劑(E);R4 -O-(EO)c (PO)d -H 結構式(4)結構式(4)中,R4 表示碳數8~18之含直鏈之烷基、烯基或醯基,或碳數14~18之含直鏈烷基取代之苯基;EO表示乙氧基;PO表示丙氧基;c表示1~20之整數;d表示0~20之整數。The cleaning liquid composition according to claim 1, further comprising a linear surfactant (E) represented by the following structural formula (4); R 4 -O-(EO) c (PO) d -H In the structural formula (4), R 4 represents a linear alkyl group, an alkenyl group or a fluorenyl group having a carbon number of 8 to 18, or a linear alkyl group having a carbon number of 14 to 18 Phenyl; EO represents ethoxy; PO represents propoxy; c represents an integer from 1 to 20; and d represents an integer from 0 to 20. 如申請專利範圍第3項所述之洗淨液組成物,其中,基於鹼性化合物(A) 100重量份,直鏈型界面活性劑(E)的使用量為1~300重量份。The cleaning liquid composition according to the third aspect of the invention, wherein the linear surfactant (E) is used in an amount of from 1 to 300 parts by weight based on 100 parts by weight of the basic compound (A). 如申請專利範圍第1項所述之洗淨液組成物,其中,該組成物在25℃之濁點介於40~55℃。The composition of the cleaning solution according to claim 1, wherein the composition has a cloud point of from 40 to 55 ° C at 25 ° C. 一種基板之洗淨方法,該方法使用申請專利範圍第1~5項任一項所述之洗淨液組成物。A method of cleaning a substrate, which comprises using the cleaning liquid composition according to any one of claims 1 to 5.
TW100117503A 2011-05-18 2011-05-18 Washing liquid composition and substrate cleaning method TWI434927B (en)

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