TWI465562B - Cleaning solution composition and method for cleaning substrate by using the same - Google Patents

Description

Cleaning liquid composition and substrate cleaning method

The present invention relates to a cleaning liquid composition and a method for cleaning a substrate, and more particularly to a cleaning liquid composition which is excellent in detergency and good in defoaming property against a glass substrate.

In the past, as a glass substrate for liquid crystal display such as a television, a personal computer, or a clock, such as soda lime glass, borosilicate glass, bismuth glass, or alkali-free glass, a glass mother board can be obtained by melt forming, and cut into any size. For use.

In addition, in recent years, color filters for color liquid crystal displays, sensors, and color separation devices have been commonly used, and black matrix and red, green, and blue pixel images have been formed on transparent glass substrates, and dispersed pigments have been used. A photosensitive resin is obtained by a general photolithography.

However, when the glass substrate is cut, glass cullets often adhere to the substrate to hinder the subsequent precise polishing process, film processing process, and the like. In addition, when the color filter is manufactured, scattered particles or residues of the photosensitive resin used in the pre-process are attached to the substrate, which not only causes the yield of the product to be low, but also when the color filter and the TFT array are attached. It may even be the case of a common short.

Therefore, in the above process, the cleaning process of the glass substrate is introduced, and the manufacturer and manufacturer of the substrate are also working to improve the cleaning technology in order to improve the manufacturing yield. In particular, in recent years, the demand for high reliability of products and the trend of high-precision color filters have become increasingly demanding for the purification of glass substrates.

In order to effectively remove the remaining deposits on the substrate, the current improvement in the industry is to clean the glass substrate with a specific cleaning liquid composition. Japanese Laid-Open Patent Publication No. 2009-084565 discloses a base type nonionic surfactant composition containing a nonionic surfactant, water, a specific acid (or a salt thereof), and an alkali agent. However, when the glass substrate is cleaned by using the above-described cleaning liquid composition, there is a problem that the detergency is poor and the defoaming property is not good, resulting in an increase in cost.

In view of the above, there is a need to provide a cleaning liquid composition and a method for cleaning a substrate, thereby improving the disadvantages of poor cleaning power and poor defoaming properties of conventional cleaning liquid compositions.

Therefore, an aspect of the present invention provides a cleaning liquid composition which is excellent in detergency and good in defoaming property, and the cleaning liquid resin composition contains at least a basic compound (A), such as formula (I) or formula The nonionic surfactant (B), the polyhydroxycarboxylic acid compound (C), and water (D) shown in (II).

Another aspect of the present invention provides a method of cleaning a substrate by cleaning the substrate with the cleaning composition.

The cleaning liquid composition of the present invention comprises a basic compound (A), a nonionic surfactant (B) represented by the formula (I) or the formula (II), a polyhydroxycarboxylic acid compound (C), and water ( D), as described below.

Basic compound (A)

The basic compound (A) of the present invention contains an inorganic basic compound (A-1) and/or an organic basic compound (A-2).

Specific examples of the inorganic basic compound (A-1) include alkali metal hydroxides such as lithium hydroxide, sodium hydroxide, potassium hydroxide, and ammonium hydroxide; diammonium hydrogen phosphate, disodium hydrogen phosphate, and phosphoric acid. An alkali metal or ammonium phosphate such as dipotassium hydrogen phosphate, ammonium dihydrogen phosphate, sodium dihydrogen phosphate or potassium dihydrogen phosphate; an alkali metal silicate such as lithium niobate, sodium citrate or potassium citrate; An alkali metal carbonate such as lithium, sodium carbonate or potassium carbonate; or an alkali metal borate such as lithium borate, sodium borate or potassium borate. Among them, an alkali metal hydroxide is preferred. The above inorganic basic compound (A-1) may be used singly or in combination of plural kinds.

The organic basic compound (A-2) of the present invention contains a hydroxy quaternary ammonium salt compound and an organic basic organic compound. Specific examples of the above-mentioned oxyhydrogen quaternary ammonium salt compound are, for example, tetramethyl ammonium hydroxide, tetrahydroammonium hydroxide, tetrapropylamine hydrochloride, tetrabutylamine hydroxide, 2-hydroxy-hydrogen peroxide A compound such as 2-hydroxyl trimethyl ammonium hydroxide; and specific examples of organic amines such as monomethylamine, dimethylamine, trimethylamine, monoethylamine, diethylamine, triethylamine, monoisopropylamine , di-isopropylamine, monoethanolamine, diethanolamine, triethanolamine, 2-(2-aminoethoxy)ethanol, monoisopropanol -amine), diisopropanolamine, triisopropanolamine, N-ethyl ethanolamine, n-butylethanolamine, N,N-dimethylethanolamine, N , N-dimethylpropanolamine, N, N-dimethyl isopropanolamine, cyclohexylamine, morpholine and the like. The above organic basic compound (A-2) may be used singly or in combination of plural kinds.

Since the organic basic compound (A-2) of the present invention does not contain metal ions in production, it is less likely to cause adverse effects such as residual images on semiconductor elements such as thin film transistors. Among them, monoethanolamine, diethanolamine, triethanolamine, and monoisopropanolamine are preferred.

Nonionic surfactant (B)

The nonionic surfactant (B) of the present invention has a structure as shown in formula (I) or formula (II):

In formula (I) and formula (II), EO is ethoxy; AO is PO and/or BO, PO is propoxy, and BO is butoxy; m is from 3 to 100; n is 0. ～0.2×m; p is a number from 3 to 100; q is a number from 0 to 0.2×p; x is 1 or 2; and y is 1 or 2.

Next, in the formulas (I) and (II), m and p are the average addition mole numbers, and m and p may be different from each other, and n and q may be different from each other. When AO is PO, n and q are the average addition moles of PO; when AO is BO, n and q are the average addition moles of BO; when AO contains PO and BO, n and q are The sum of the average addition moles of PO and the average addition mole of BO. In (EO) _m (AO) _n of formula (I) and (EO) _p (AO) _q of formula (II), the arrangement of their respective EO and AO may be block or random. When the AO of the formula (I) and the formula (II) contains PO and BO, the arrangement of PO and BO may be block or random. EO can also be inserted into an arrangement of PO and/or BO in a block or random arrangement. The above-described average addition molar number may be measured by ¹ H- nuclear magnetic resonance spectroscopy ⁽¹ H-NMR spectroscopy).

When EO and AO are arranged in a block, as long as each of the average addition mole numbers is within the above range, the number of blocks of EO and the number of blocks of AO may be one or two or more, respectively. Next, when the number of blocks composed of EO is two or more, the number of repetitions of EO in each block may be the same or different from each other. When EO is inserted into an arrangement composed of PO and/or BO in a block arrangement, the number of blocks of EO may be one or two or more. When the number of blocks of EO is two or more, the number of repetitions of EO in each block may be the same or different from each other.

When AO includes PO and BO, PO and BO may be arranged in blocks, as long as the average number of moles of PO and the number of blocks of BO is within the above range, and may be one or They are two or more. Next, when the number of blocks composed of PO is two or more, the number of repetitions of PO in each block may be the same or different from each other. When the number of blocks of BO is two or more, the number of repetitions of BO in each block may be the same or different from each other.

Further, based on the consideration of ensuring that the nonionic surfactant (B) has an appropriate water solubility, the oxygen atom (O) constituting the ether bond of the formula (I) and the formula (II) is preferably bonded to EO.

Further, in order to improve the peeling property of the resin stain adhered on the surface of the glass substrate, m and p of the formulae (I) and (II) are preferably from 3 to 70, more preferably from 3 to 50, respectively; It is preferably 0 to 0.1 × m, more preferably 0; and q is preferably 0 to 0.1 × p, more preferably 0.

In the nonionic surfactant (B) of the present invention, polyethoxylated styrenated phenyl ether having a m of 5 to 50 and n of 0, such as polyethoxy-3,5-, is preferred. Bis(1-phenethyl)phenyl ether (number of EO is 13), polyethoxy-3,5-bis(1-phenethyl)phenyl ether (number of EO is 19), polyethoxy- 3,5-bis(1-phenethyl)phenyl ether (64 number of EO), commercialized EMULGEN A-60, EMULGEN A-90, EMULGEN A-500 (made by Kao), Sinopol 607, Sinopol 609, Sinopol 610, Sinopol 614, Sinopol 620, Sinopol 623 (manufactured by Sino-Japanese Synthetic Chemicals, etc.); p is a polyethoxytribenzylated phenyl ether of 5 to 50 and q is 0, such as polyethoxy-2 4,6-tris(1-phenylmethyl)phenyl ether (the number of EO is 14), and commercialized EMULGEN B-66 (Kinghua). Among them, more preferred is polyethoxy-3,5-bis(1-phenethyl)phenyl ether (number of EO is 19), polyethoxy-3,5-bis(1-phenethyl)benzene Ether (EO number 64), EMULGEN A-60, EMULGEN A-90, Sinopol 607, Sinopol 609, Sinopol 620, Sinopol 623, polyethoxy-2,4,6-tris(1-benzyl) Phenyl ether (14 in EO) and EMULGEN B-66.

The above-mentioned nonionic surfactant (B) may be used singly or in combination of plural kinds.

In the cleaning liquid composition of the present invention, the nonionic surfactant (B) is used in an amount of usually 10 to 300 parts by weight, preferably 15 to 250 parts by weight, based on 100 parts by weight of the basic compound (A). More preferably, it is 20 to 200 parts by weight. If the nonionic surfactant (B) is not used, there is a problem that the detergency is poor due to poor wettability.

Polyhydroxycarboxylic acid compound (C)

The polyhydroxycarboxylic acid compound (C) of the present invention may contain two or more hydroxyl groups such as tartaric acid (salt), glyceric acid (salt), caffeic acid (caffeic acid), dihydroxybenzoic acid (dihydroxybenzoic acid). -benzoic acid), dihydroxyphenylacetic acid, 3-hydroxyphenylglycolic acid (salt), 3,5-dihydroxy-2-naphthalenecarboxylic acid (3,5-dihydroxy-2-naphthalenecarboxylic acid) a polyhydroxycarboxylic acid compound containing two hydroxyl groups; gallic acid (salt), shikimic acid, trihydroxy palmitic acid, dihydroxyphenyl glycolic acid (salt) a polyhydroxycarboxylic acid compound containing three hydroxyl groups; mucic acid, glucosinolate, dihydroxytartaric acid (salt), and arabinic acid (salt), etc., containing 4 hydroxyl groups a hydroxycarboxylic acid compound; an alkali metal salt such as gluconic acid, galactonic acid, glucoheptonic acid or a lower amine salt or the like containing 5 hydroxyl groups The above polyhydroxycarboxylic acid compound.

The above polyhydroxycarboxylic acid compound (C) may be used singly or in combination of plural kinds.

The polyhydroxycarboxylic acid compound (C) is used in an amount of usually 10 parts by weight to 300 parts by weight, based on 100 parts by weight of the basic compound (A), preferably 15 parts by weight to 250 parts by weight, more preferably 20 parts by weight to 200 parts by weight. If the polyhydroxycarboxylic acid compound (C) is not used, there is a problem that too much foam causes the scale to easily accumulate. When the polyhydroxycarboxylic acid compound (C) contains 3 or more hydroxyl groups, the defoaming property can be further enhanced and the scale generation can be slowed down.

Further, the monohydroxycarboxylic acid compound may be optionally used in combination with the antifoaming property of the cleaning liquid of the present invention, and specific examples thereof include lactic acid (salt), malic acid (salt), citric acid (salt), and water. Salicylic acid, salt, hydroxybutyric acid, hydroxyheptanoic acid, hydroxyoctanoic acid Salt), hydroxyphenylpropionic acid (salt), hydroxycyclopropanecarboxylic acid (salt), hydroxycyclohexanecarboxylic acid (salt), and the like.

Water (D)

The water (D) used in the present invention is not particularly limited. Specific examples thereof include distilled water, pure water (water obtained by deionization treatment by ion exchange resin, etc.), ultrapure water (excluding inorganic ions, containing no organic matter, bacteria, fine particles, and dissolved gas) and have been proposed in recent years. Various functional waters, etc. The water (D) used in the present invention is preferably pure water or ultrapure water, more preferably ultrapure water, based on the metal ion having a poor influence on the electronic control circuit. The ultrapure water may be obtained by passing the tap water through activated carbon, ion exchange treatment, distillation treatment, irradiation with ultraviolet light if necessary, or passing through a filter. According to the resistance value of 25 °C, the resistance value is 1MΩ‧cm or more, which can be called pure water, and the resistance value is 10MΩ‧cm or more, which can be called ultrapure water.

In the cleaning liquid composition of the present invention, water (D) is usually used in an amount of from 300 parts by weight to 25,000 parts by weight, based on 100 parts by weight of the basic compound (A), preferably from 400 parts by weight to 20,000 parts by weight, more preferably It is preferably from 500 parts by weight to 15,000 parts by weight. When the amount of water (D) used is from 300 parts by weight to 25,000 parts by weight, there is a problem that the lotion remains and the detergency is lowered.

Additive (E)

The cleaning liquid composition of the present invention may further optionally be added with an additive (E) such as a pH adjuster, an organic solvent, an antifoaming agent, an antioxidant, a preservative, or the like.

Specific examples of the pH adjuster include inorganic acids such as hydrochloric acid, sulfuric acid, nitric acid, sulfamic acid, and phosphoric acid; and inorganic bases such as lithium hydroxide, sodium hydroxide, and potassium hydroxide. The above-mentioned pH adjusters may be used singly or in combination of plural kinds or more.

The above organic solvent preferably has a solubility in water of 3 (g/100 g) or more at 20 ° C, more preferably 10 or more, and specifically, for example, dimethyl sulfoxide, cyclobutyl hydrazine, and 3-methyl group. Anthraquinones such as cyclobutyl hydrazine and 2,4-dimethylcyclobutyl hydrazine; hydrazines such as dimethyl hydrazine, diethyl hydrazine, and bis(2-hydroxyethyl) hydrazine; N, N-dimethyl group Amidoxime, N-methylformamide, N,N-dimethylacetamide, N,N-dimethylpropionamide, etc.; N-methyl-2-pyrrolidone, N-B Indoleamines such as phenyl-2-pyrrolidone and N-hydroxymethyl-2-pyrrolidone; β-propiolactone, β-butyrolactone, γ-butyrolactone, γ-valerolactone, δ-pentane Lactones such as esters; alcohols such as methanol, ethanol, isopropanol; ethylene glycol, ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, diethylene glycol, diethylene glycol monomethyl Ether, diethylene glycol monoethyl ether, diethylene glycol monobutyl ether, diethylene glycol monohexyl ether, diethylene glycol monophenyl ether, triethylene glycol monomethyl ether, propylene glycol, propylene glycol Monomethyl ether, dipropylene glycol monomethyl ether, 1,3-butylene glycol, diethylene glycol dimethyl ether, diethylene glycol diethyl ether, triethylene glycol II Ethylene glycol and glycol ethers such as alkyl ether, triethylene glycol triethyl ether, etc.; N-methyl-2-oxazolidinone, 3,5-dimethyl-2-oxazolidinone, etc. Oxazoldinone; nitrile, nitrile, acrylonitrile, methacrylonitrile, benzonitrile, etc.; carbonates; (ethylene carbonate, propylene carbonate, etc.) a ketone of acetone, diethyl ketone, acetophenone, methyl ethyl ketone, cyclohexanone, cyclopentanone, diacetone or the like; a cyclic ether such as tetrahydrofuran or tetrahydropyran. The above organic solvents may be used singly or in combination of plural kinds or more.

Specific examples of the antifoaming agent include polyoxymethylene, higher alcohol, polyether, fatty acid ester, polyethylene glycol, mineral oil, and a compound represented by the following structural formula (III):

In the formula (III), z represents an integer of 1 or 2, and R represents a functional group represented by the following formula (IV):

In the formula (IV), w represents an integer of from 3 to 7.

Specific examples of the compound represented by the above structural formula (III) are, for example, trade name Surfynol MD-20, Surfynol MD-30 (manufactured by Air Products and Chemicals Co., Ltd.).

The above antifoaming agents may be used singly or in combination of plural kinds or more.

Specific examples of the above antioxidant include 2,6-di-tert-butylphenol, 2-tert-butyl-4-methoxyphenol, and 2,4-dimethyl-6-tert-butylphenol. Phenol; monooctyldiphenylamine, monodecyldiphenylamine, 4,4'-dibutyldiphenylamine, 4,4'-dipentyldiphenylamine, tetrabutyldiphenylamine, tetrahexyldiphenylamine, α- An amine group such as naphthylamine or phenyl-α-naphthylamine; phenothiazine, pentaerythritol tetrakis(3-laurylthiopropionate), bis(3,5-t-butyl-4-hydroxyl) Sulfur based on bis(3,5-t-butyl-4-hydroxybenzylsulfide); bis(2,4-di-t-butylphenyl)pentaerythritol diphosphite, phosphorous acid A phosphorus system such as monophenylisoyl ketone, diphenyl diisooctyl phosphite, or triphenyl phosphite. The above-mentioned antioxidants may be used singly or in combination of plural kinds or more.

Specific examples of the above preservative include triazine derivatives such as hexahydro-1,3,5-tris(hydroxyethyl)-s-triazine; 1,2-benzisothiazolin-3-one , isothiazolin derivatives such as 2-methyl-4-isothiazolin-3-one, 5-chloro-2-methyl-4-isothiazolin-3-one; 4-(2- a morpholine derivative such as nitrobutyl)morpholine or 4,4-(2-ethyl-2-nitrotrimethylene)dimorpholine; benzene such as 2-(4-thiazolyl)benzimidazole And benzimidazole derivatives and the like. The above-mentioned preservatives may be used singly or in combination of plural kinds or more.

In the cleaning liquid composition of the present invention, the amount of the additive (F) to be used varies depending on the type of the basic compound (A), and the amount of the antifoaming agent is usually from 1 part by weight to 10 parts by weight. It is preferably 2 parts by weight to 9 parts by weight, more preferably 3 parts by weight to 8 parts by weight; the antioxidant and the preservative are usually used in an amount of 10 parts by weight or less, preferably 8 parts by weight or less, more preferably 5 parts by weight. The amount of the pH adjusting agent used is usually 90 parts by weight or less, preferably 85 parts by weight or less, more preferably 80 parts by weight or less; and the organic solvent is usually used in an amount of 500 parts by weight or less, preferably 400 parts by weight or less. Hereinafter, it is more preferably 300 parts by weight or less.

The surface tension of the cleaning composition of the present invention at 25 ° C is usually 25 dyne / cm to 60 dyne / cm, preferably 25 dyne / cm to 50 dyne / cm, more preferably 25 dyne / cm to 40 dyne /cm. When the surface tension of the cleaning liquid composition at 25 ° C is 25 dyne / cm to 60 dyne / cm, there is an advantage of good wettability and strong detergency.

wash Preparation of clean liquid composition

The preparation of the cleaning liquid composition of the present invention generally comprises the above basic compound (A), a nonionic surfactant (B), a polyhydroxycarboxylic acid compound (C), and water (D), and may be added as needed. The additive (E) such as a pH adjuster, an organic solvent, an antifoaming agent, an antioxidant, and a preservative is stirred in a stirrer to uniformly mix it into a solution state, thereby obtaining a cleaning liquid composition.

Substrate cleaning method

The present invention further provides a method for cleaning a substrate, which is to clean the substrate by using the cleaning composition obtained as described above; the specific cleaning means include, but are not limited to, a soaking method, a shower method, a brushing method, and an ultrasonic washing method. Net method and foam washing method. Wherein, the immersion method is filled in the immersion tank with the composition of the cleaning liquid, and then the substrate is immersed in the composition of the cleaning liquid; the rinsing method washes the substrate by washing, spraying, spraying, etc.; In the brushing method, the substrate is cleaned by a tool such as a sponge or a brush.

The cleaning liquid composition of the present invention can be applied to the cleaning of a glass substrate such as soda lime glass, borosilicate glass, cerium oxide glass or alkali-free glass.

The following embodiments are used to illustrate the application of the present invention, and are not intended to limit the present invention. Those skilled in the art can make various changes without departing from the spirit and scope of the present invention. Retouching.

Preparation of cleaning solution composition

Hereinafter, the cleaning liquid compositions of Examples 1 to 9 and Comparative Examples 1 to 4 were prepared according to Table 1.

Example 1

100 parts by weight of potassium hydroxide (hereinafter referred to as A-1) and 80 parts by weight of polyethoxy-3,5-bis(1-phenethyl)phenyl ether (the number of EO is 19; Abbreviated as B-1), 150 parts by weight of tartaric acid (hereinafter referred to as C-1) and 3000 parts by weight of water. The above components are uniformly mixed by a rocking stirrer to obtain a cleaning liquid composition. The obtained cleaning liquid composition was evaluated by the following evaluation methods, and the results are as described in Table 1, in which the method of detecting surface tension, detergency, and defoaming property will be described later.

Examples 2 to 9

The method for preparing the cleaning liquid composition of the first embodiment differs in that the examples 2 to 9 change the type and amount of the raw material in the cleaning liquid composition, and the formulation and the detection result are as shown in the first table. No further details are given.

Comparative Examples 1 to 4

The method for preparing the cleaning liquid composition of the first embodiment is different in that the cleaning liquid composition prepared in the comparative examples 1 to 4 does not simultaneously use the nonionic surfactant (B) and the polyhydroxycarboxylic acid compound ( C), the formulation and test results are also shown in Table 1.

Evaluation method

1. Surface tension:

The composition of the washing liquid was controlled at 25 ° C with a constant temperature water bath, and the surface tension was measured using a surface tension meter (Tensiometer Model CBVP-A2, manufactured by Kyowa Interface Science Co., Ltd.). (Unit: dyne/cm). The surface tension measured was as described in Table 1.

2. Detergency

Soda lime glass (Soda Lime Glass) was pulverized, and the ground powder (particle size of 10 μm to 100 μm) was uniformly dispersed in water, and then coated on a glass substrate (20 mm × 100 mm). Next, after drying at 110 ° C for 30 minutes, it was immersed in the composition of the cleaning liquid, and controlled at 25 ° C with a constant temperature water bath. After soaking for 3 minutes, it was washed with 500 mL of pure water and then blown dry with high pressure air. Thereafter, the surface state of the glass substrate was observed with a microscope (magnification: 50 times), and evaluated according to the following criteria:

○: No cutting powder remains.

╳: There is obvious residue of cutting powder.

3. Defoaming

50 mL of the various cleaning liquid compositions prepared in Examples 1 to 9 and Comparative Examples 1 to 4 were poured into a 100 mL measuring cylinder, and after shaking up and down for 20 times, the foam height (T1) was measured, and after standing for 30 seconds, The foam height (T2) was measured again and evaluated according to the following formula (III):

Defoaming rate (%) = [(T1-T2) / (T1)] × 100 (V)

◎: 90% ≦ defoaming rate.

○: 80% ≦ defoaming rate <90%.

△: 50% ≦ defoaming rate <80%.

╳: Defoaming rate <50%.

The evaluation results of the surface tension, the detergency and the defoaming property of the cleaning liquid composition obtained in the above examples are shown in Table 1.

As is apparent from the results of the first table, when the nonionic surfactant (B) and the polyhydroxycarboxylic acid compound (C) are used at the same time, the prepared cleaning liquid composition has better detergency and is preferable. Defoaming. Secondly, when the nonionic surfactant (B) and the polyhydroxycarboxylic acid compound (C) having three hydroxyl groups are used at the same time, better defoaming property can be obtained, so that the object of the present invention can be attained.

Comparative Example 5

Further, 100 parts by weight of potassium hydroxide, 83 parts by weight of a nonionic surfactant (trade name: EMALGEN LS-110; manufactured by Kao), 83 parts by weight of sodium p-toluenesulfonic acid, and 3900 parts by weight of water. Each of the above components was uniformly mixed by a rocking stirrer to obtain a cleaning liquid composition, and the obtained cleaning liquid composition was also evaluated by the above evaluation methods. After the performance evaluation by the above evaluation methods, the obtained detergency and defoaming properties were all ╳.

It should be noted that the present invention describes the cleaning liquid composition and the substrate cleaning method of the present invention by using specific compounds, compositions, reaction conditions, processes, analytical methods or specific instruments as an example, but the technical field to which the present invention pertains It is to be understood by those skilled in the art that the present invention is not limited thereto, and other compounds, compositions, and reactions may be used in the cleaning composition and substrate cleaning method of the present invention without departing from the spirit and scope of the present invention. Conditions, processes, analytical methods or instruments.

The present invention has been disclosed in the above embodiments, and is not intended to limit the present invention. Any one of ordinary skill in the art to which the present invention pertains can make various changes without departing from the spirit and scope of the invention. The scope of protection of the present invention is therefore defined by the scope of the appended claims.

Claims (7)

A cleaning liquid composition comprising: a basic compound (A); a nonionic surfactant (B) as shown in formula (I) or formula (II); In the formula (I) and the formula (2), the EO is an ethoxy group; the AO is PO and/or BO, the PO is a propoxy group, and the BO is a butoxy group; the m is 3~ a number of 100; the n is a number from 0 to 0.2×m; the p is a number from 3 to 100; the q is a number from 0 to 0.2×p; the x is 1 or 2; and the y is 1 or 2; The polyhydroxycarboxylic acid compound (C) wherein the polyhydroxycarboxylic acid compound (C) contains 3 or more hydroxyl groups; and water (D). The cleaning solution composition according to claim 1, wherein the EO of the nonionic surfactant (B) and the AO are arranged in a block or randomly arranged. The cleaning liquid composition according to claim 1, wherein in the AO of the nonionic surfactant (B), the PO and the BO are block-arranged or randomly arranged. The cleaning liquid composition according to claim 1, wherein the polyhydroxycarboxylic acid compound (C) contains 4 or more hydroxyl groups. The cleaning liquid composition according to claim 1, wherein the nonionic surfactant (B) is used in an amount of 10 parts by weight to 300 parts by weight based on 100 parts by weight of the basic compound (A). The polyhydroxycarboxylic acid compound (C) is used in an amount of 10 parts by weight to 300 parts by weight, and the water (D) is used in an amount of 500 parts by weight to 30,000 parts by weight. The cleaning liquid composition according to claim 1, wherein the cleaning liquid composition has a surface tension of 25 dyne/cm to 60 dyne/cm. A method of cleaning a substrate, which is to clean a substrate by using the cleaning liquid composition according to any one of claims 1 to 6.