TWI410388B - Glass-etching device and method for etching glass - Google Patents

Abstract

The present invention discloses a glass-etching device and a method for etching a glass. The glass-etching device comprises a loading section, a first cleaning section, a buffer section, an etching section, a second cleaning section, at least one micro-polishing section, a third cleaning section, a neutralization section, a fourth cleaning section, and an unloading section. The method for etching the glass by the glass-etching device comprises the steps of: the glass-etching device transferring the glass to the etching section through the loading section, the first cleaning section and the buffer section for etching the glass; the glass-etching device transferring the glass to the micro-polishing section through the second cleaning section for treating the glass with a micro polishing treatment; the glass-etching device transferring the glass to the neutralization section through the third cleaning section for treating the glass with a neutralization treatment; and the glass-etching device unloading the glass which has been etched through the fourth cleaning section and the unloading section.

Description

Glass etching device and method for etching the same

The present invention relates to a glass etching apparatus and a method of etching the same, and more particularly to a method comprising an upper sheet section, a first cleaning section, a buffer section, an etching section, a second cleaning section, and a micro A glass etching apparatus for the polishing section, a third cleaning section, a neutralization section, a fourth cleaning section, and a lower section, which can perform a specific glass etching pattern by a series of processing procedures.

The matte acrylic mold glass is in the form of a flat spray sand mist. After the PMMA is blended and poured into two glass plates for polymerization, the acrylic surface of the matte surface is produced. The surface treatment of the sandblasting cannot meet the requirements of the optical material. And the service life of the mold glass is provided in view of this, providing a matte acrylic mold glass which satisfies higher haze and light penetration and is resistant to fingerprints.

Plastic flat plates or dies can not achieve higher scratch and wear resistance. The manufacturing method is based on the hardness and wear resistance of glass, which can be used in higher demand and can reduce equipment materials and processing costs.

The diffuser is mainly used in the direct-lit backlight module of the liquid crystal display. The main function is that the light is diffused through the diffusion layer to provide a surface light source with uniform brightness distribution of the liquid crystal display. The light source can be uniformly distributed and diffused through the diffusion plate, and guides the direction of light refraction to enhance the brightness of the panel. In addition to evenly distributing the light source, the diffusing plate has the functions of eliminating the shadow generated by the arrangement of the lamps.

Conventional diffusion plates are obtained by attaching a diffusion film to a light guide plate. Generally, the conventional diffusion film is mainly used in a diffusion film substrate, and a chemical particle is added as a scattering particle, so the light is diffused. The layer will continuously pass through two media with different refractive indices, and at the same time, many phenomena of refraction, reflection and scattering will occur, which will result in optical diffusion.

However, the current display has used a large number of Light Emitting Diodes (LEDs) as a light source. Since the LEDs generate high temperatures while emitting light, the diffusion film is destroyed in a high temperature environment, and finally the structure is destroyed. The diffuser is worn out.

In view of this, it is necessary to provide an innovative diffuser and its manufacturing method, and with a unique device for its manufacturing process, the innovative diffuser can eliminate the use of conventional diffusion film to enhance the diffuser and display Service life and performance.

Therefore, in view of the aforementioned problems and deficiencies, the inventors have accumulated years of experience, and exerted imagination and creativity. After continuous trial and modification, there has been a glass etching apparatus of the present invention and a method of etching the same.

The main object of the present invention is to provide a glass etching apparatus which can perform a special etching treatment on the surface of a glass by a series of processing sections having different functions, so as to have the functions of anti-glare and diffusion plates.

To achieve the above object, the present invention provides a glass etching apparatus comprising: at least an upper sheet section for feeding a glass into the glass etching apparatus; and a first cleaning section coupled to the upper sheet section a connection for cleaning the etched surface of one of the glass and drying the glass; a buffer section connected to the first cleaning section for temporarily storing the cleaned glass, and The temperature and humidity of the glass can be adjusted; an etched section is connected to the buffer section, and the etching surface of the glass is etched by an etching solution; and a second cleaning section is connected to the etching section The method is for cleaning the salt and residual acid produced by the etching process of the glass, and drying the glass; at least one micro-polished section is connected to the second cleaning section, which fixes the glass obliquely And polishing the etched surface of the glass with a polishing liquid; a third cleaning section is connected to the micro-polished section for cleaning the salt and the residue produced by the micro-polishing treatment of the glass Acid and can blow the glass dry; The neutralization section is connected to the third cleaning section, wherein the residual acid remaining after the etching treatment and the micropolishing treatment of the glass is neutralized by a neutralizing liquid; a fourth cleaning section is Connected to the neutralization section for cleaning the glass and drying the glass; and a lower section connected to the fourth cleaning section for etching the glass by etching Sent in the device.

Another object of the present invention is to provide a method for etching glass by using the glass etching apparatus, and performing a special special etching treatment on the surface of the glass by a series of etching processes and in combination with each processing section of the glass etching apparatus. The treated glass can be used as a casting mold glass for producing matte acrylic and an anti-glare glass diffusion plate glass.

In order to achieve the above object, the present invention provides a method for etching glass by using the glass etching apparatus, comprising at least the following steps: (1) one of the glass etching apparatuses carries a glass into a glass etching apparatus; (2) a first cleaning section of the glass etching apparatus cleans one of the etched surfaces of the glass and blows the glass; (3) the glass is parked in a buffer section of the glass etching apparatus, and the buffer section is Adjusting the temperature and humidity; (4) etching the etched section of the glass etching device to uniformly apply an etchant to the etched surface of the glass; (5) the glass is allowed to stand in the etched section for a period of time to perform an etching reaction; (6) One of the glass etching devices: the second cleaning section cleans the glass and blows the glass; (7) at least one micro-polished section of the glass etching apparatus tilts the glass and applies a polishing liquid to the glass The etched surface is micro-polished; (8) one of the glass etching devices cleans the glass and blows the glass; (9) one of the glass etching devices neutralizes the glass with a neutralizing liquid Etched and micro The residual acid remaining after the light treatment is neutralized; (10) one of the glass etching devices cleans the glass and blows the glass; and (11) one of the glass etching devices is etched The finished glass is sent out of the glass etching apparatus.

In order to achieve the foregoing objects and effects, the inventors have integrated various etching treatment procedures, and under continuous adjustment and correction, a glass etching apparatus of the present invention and a method of etching the same have been obtained. A device for etching glass and a method for etching the same according to a first preferred embodiment, a second preferred embodiment and a third preferred embodiment of the present invention The program is described in detail.

First, please refer to the schematic diagram of the glass etching apparatus of the first preferred embodiment of the present invention. The glass etching apparatus 1 includes a top sheet section 100 and a first cleaning section 110. a buffer section 120, a shower etch section 130, a second cleaning section 140, a micro-polished section 150, a third cleaning section 160, a neutralization section 170, and a fourth cleaning section 180 and the next slice section 190.

The topsheet section 100 is used to feed a glass into the glass etching apparatus 1.

The first cleaning section 110 is coupled to the upper panel section 100 for cleaning the etched surface of one of the glasses and drying the glass.

The buffer section 120 is connected to the first cleaning section 110 for temporarily storing the cleaned glass and adjusting the temperature and humidity of the glass.

The curtain etching section 130 is connected to the buffer section 120, and the etching surface of the glass is subjected to a curtain etching treatment using an etching solution.

The second cleaning section 140 is connected to the curtain etching section 130 for cleaning the salt and residual acid produced by the etching process of the glass, and drying the glass.

The micro-polished section 150 is connected to the second cleaning section 140, which fixes the glass obliquely and micro-polishing the etched surface of the glass with a polishing liquid.

The third cleaning section 160 is connected to the micro-polishing section 150 for cleaning the salt and residual acid produced by the micro-polishing treatment of the glass, and drying the glass.

The neutralization section 170 is connected to the third cleaning section 160, and neutralizes the residual acid remaining after the glass is subjected to etching treatment and micropolishing treatment with a neutralizing liquid.

The fourth cleaning section 180 is coupled to the neutralization section 170 for cleaning the glass and drying the glass.

The lower sheet section 190 is connected to the fourth cleaning section 180 for sending the glass subjected to the etching process from the glass etching apparatus 1.

Referring to FIG. 2, a schematic diagram of a structure of a shower etch section according to a first preferred embodiment of the present invention, the shower etch section 130 mainly includes: a container 131 for accommodating the etchant The first screen 133 is connected to the container 131 and has a first-class screen 134 through which the etchant 132 flows out to be attached to the surface of the glass 10. The width of the flow screen 134 is 0.3. ～3 mm; and a circulation pump 135 is disposed between the container 131 and the flow screen 133, and the etchant 132 in the container 131 can be actively delivered into the flow screen 133. In addition, the curtain etching section 130 may further include some auxiliary components, such as a pressure regulating valve 136, a filter 137, a pressure gauge 138, and a heating/cooling device 139, which may be used to adjust the pipeline. The pressure of the etchant 132 can be used to filter out impurities in the etchant 132. The gauge 138 can be used to measure the pressure of the etchant 132 in the pipeline. The heater/cooler 139 can be used to The etching liquid 132 in the container 131 is heated or cooled to bring the etching liquid 132 to an optimum reaction temperature.

Referring next to Table 1 below, the parameter values of the sections in the glass etching apparatus 1 of the present invention are shown. As shown in Table 1, the conveying speed of the first cleaning section 110 is 0.5-4 m/min, the buffer section 120, the curtain etching section 130, the second cleaning section 140, the micro-polishing section 150, and the third cleaning. The conveying speed of the section 160 and the neutral section 170 is 1 to 40 m/min, and the conveying speed of the fourth cleaning section 180 is 1 to 5 m/min. In addition, the temperatures of the first cleaning section 110, the shower etching section 130, the second cleaning section 140, the micro-polishing section 150, the third cleaning section 160, the neutralization section 170, and the fourth cleaning section 180 The temperature of the buffer section 120 is room temperature of 10 to 45 °C. Moreover, the inclination angles of the curtain etching section 130, the second cleaning section 140, the micro-polishing section 150, the third cleaning section 160, and the neutralization section 170 are 0 to 45 degrees.

Next, please refer to Table 2 below, which is a list of etchant formulations used in the present invention. Wherein, the component of the formula 1 comprises sulfuric acid having a mass fraction of 1 to 5 (density of 1.84 g/cm ³ ), potassium fluoride having a mass fraction of 8 to 25, and water having a mass fraction of 10 to 100; the composition of the formula 2 comprises a mass fraction of 10 ～40 acetic acid, sodium fluoride with a mass fraction of 9-30, and water with a mass fraction of 100; the composition of formula III comprises hydrofluoric acid (49%) having a mass fraction of 40-80 and ammonium fluoride having a mass fraction of 100-400 ( 40%) and water with a mass of 0-100; the composition of Formula 4 contains hydrochloric acid with a mass fraction of 25-75 (density of 1.19 g/cm ³ ), potassium sulfate with a mass of 14-50, and fluorine of 25-40 Potassium hydride and water with a mass of 100; the composition of formula 5 contains hydrofluoric acid (49%) with a mass fraction of 20-60, sulfuric acid with a mass fraction of 40-120 (density of 1.84 g/cm ³ ), and a mass fraction of 10-30. The ammonium sulfate and the water having a mass fraction of 100; the component of the formula 6 comprises hydrochloric acid having a mass fraction of 1 to 10 (density of 1.19 g/cm ³ ), potassium fluoride having a mass fraction of 10 to 60, and water having a mass fraction of 100.

Referring to FIG. 3, a method step of etching a glass by using a glass etching apparatus according to a first preferred embodiment of the present invention includes the following steps: one of the glass etching apparatuses has a glass section And feeding into the glass etching device (step 201); one of the glass etching devices cleans one of the etched surfaces of the glass, and blows the glass (step 202), wherein the reaction time of the step is 1 ~15 minutes; the glass is parked in a buffer section of the glass etching apparatus, and the buffer section is used to adjust its temperature and humidity (step 203); one of the glass etching apparatus is etched to uniformly coat an etching liquid An etching surface of the glass is disposed (step 204); the glass is allowed to stand for a period of time in the etching section of the curtain to perform an etching reaction (step 205), wherein the reaction time of the step is 1 to 15 minutes; the glass etching apparatus One of the second cleaning sections cleans the glass and blows the glass (step 206), wherein the reaction time of the step is 1 to 15 minutes; and the micro-polished section of the glass etching apparatus tilts the glass. The etched surface of the glass is micro-polished with a polishing liquid (step 207), wherein the reaction time of the step is 1 to 90 minutes; and the third cleaning section of the glass etching apparatus cleans the glass and blows the glass Drying (step 208), wherein the reaction time of this step is 1 to 15 minutes; one of the neutralization sections of the glass etching apparatus uses a neutralizing liquid to carry out the etching process and the residual acid remaining after the micro-polishing treatment And processing (step 209), wherein the reaction time of the step is 1 to 15 minutes; the fourth cleaning section of the glass etching apparatus cleans the glass and blows the glass (step 210), wherein the step The reaction time is from 1 to 15 minutes; and one of the lower portions of the glass etching apparatus sends the etched glass out of the glass etching apparatus (step 211).

4 is a schematic structural view of a glass etching apparatus according to the second preferred embodiment of the present invention. The glass etching apparatus 3 of the second preferred embodiment includes a top sheet section 300 and a first Cleaning section 310, a buffer section 320, a second cleaning section 340, a micro-polished section 350, a third cleaning section 360, a neutral section 370, a fourth cleaning section 380, and The slice section 390 has the same structure and function as the first preferred embodiment, and therefore will not be described again. The second preferred embodiment differs from the first preferred embodiment in that the etched section included in the second preferred embodiment is a spray etched section 330 comprising an etchant nozzle 331, the etchant nozzle 331 The caliber is 0.7 to 1.5 mm, the air pressure of the spray etching section 330 is 0.2 MPa, the air usage amount is 75 l/min, and the etching liquid ejection amount is 80 ml/min.

Referring to FIG. 5, a method step of etching a glass by using a glass etching apparatus according to a second preferred embodiment of the present invention includes the following steps: one of the glass etching apparatuses has a glass section And feeding into the glass etching device (step 401); one of the glass etching devices cleans one of the etched surfaces of the glass, and blows the glass (step 402), wherein the reaction time of the step is 1 ~15 minutes; the glass is parked in a buffer section of the glass etching apparatus, and the buffer section is used to adjust its temperature and humidity (step 403); one of the glass etching apparatuses sprays an etching section to pass an etching liquid through the pressure And the temperature is uniformly sprayed on the etched surface of the glass (step 404); the glass is allowed to stand in the spray etched section for a period of time to perform an etching reaction (step 405), wherein the reaction time of the step is 1-15 Min; one of the glass etching devices, the second cleaning section cleans the glass and blows the glass (step 406), wherein the reaction time of this step is 1 to 15 minutes; one of the glass etching devices is micro-throwed The section tilts the glass and fixes the etched surface of the glass with a polishing liquid (step 407), wherein the reaction time of the step is 1 to 90 minutes; and the third cleaning section of the glass etching apparatus The glass is cleaned and the glass is blown dry (step 408), wherein the reaction time of this step is 1 to 15 minutes; one of the glass etching devices neutralizes the glass by etching and micro-polishing with a neutralizing liquid. The remaining residual acid is subjected to a neutralization treatment (step 409), wherein the reaction time of the step is 1 to 15 minutes; the fourth cleaning section of the glass etching apparatus cleans the glass and blows the glass (step 410), wherein the reaction time of this step is 1 to 15 minutes; and the lower sheet section of the glass etching apparatus sends out the etched glass by the glass etching apparatus (step 411).

FIG. 6 is a schematic structural view of a glass etching apparatus according to the third preferred embodiment of the present invention. The glass etching apparatus 5 of the third preferred embodiment includes a top sheet section 500 and a first Cleaning section 510, a buffer section 520, a second cleaning section 540, a micro-polished section 550, a third cleaning section 560, a neutral section 570, a fourth cleaning section 580, and The structure and function of the slice section 590 are the same as those of the first preferred embodiment and the second preferred embodiment, and therefore will not be described again. The third preferred embodiment differs from the first preferred embodiment and the second preferred embodiment in that the etched section included in the third preferred embodiment is an immersion etched section 530, as described in the seventh figure. The structure of the immersion etching section of the third preferred embodiment of the present invention, the immersion etching section 530 includes an acid etching groove 531, and the etching solution 531 is provided with an etching liquid 532, and the glass 50 is sent. When immersed in the etching section 530, it is immersed in the etching liquid 532 in the etching tank 531 to perform an etching reaction for a specific time. The glass 50 must be allowed to stand during the soaking process, so that the etching liquid 532 is not allowed to flow.

Referring to FIG. 8 , a method step of etching a glass by using a glass etching apparatus according to a third preferred embodiment of the present invention includes the following steps: one of the glass etching apparatuses has a glass section And feeding into the glass etching device (step 601); one of the glass etching devices cleans one of the etched surfaces of the glass, and blows the glass (step 602), wherein the reaction time of the step is 1 ~15 minutes; the glass is parked in a buffer section of the glass etching apparatus, and the buffer section is used to adjust its temperature and humidity (step 603); the glass is sent to an immersion etching section and immersed in acid Etching in the etching solution in the trench (step 604); the glass is allowed to stand in the immersion etching section for a period of time to perform an etching reaction (step 605), wherein the reaction time of the step is 1 to 15 minutes; the glass etching apparatus One of the second cleaning sections cleans the glass and blows the glass (step 606), wherein the reaction time of the step is 1 to 15 minutes; and the micro-polished section of the glass etching apparatus tilts the glass and In a The photo-liquid is micro-polished to the etched surface of the glass (step 607), wherein the reaction time of the step is 1 to 90 minutes; the third cleaning section of the glass etching apparatus cleans the glass and blows the glass ( Step 608), wherein the reaction time of the step is 1 to 15 minutes; and the neutralization section of the glass etching apparatus neutralizes the residual acid remaining after the etching treatment and the micro-polishing treatment of the glass by using a neutralizing liquid. (Step 609), wherein the reaction time of this step is 1 to 15 minutes; the fourth cleaning section of the glass etching apparatus cleans the glass and blows the glass (step 610), wherein the reaction time of this step For 1 to 15 minutes; and one of the glass etching devices, the etched glass is sent out from the glass etching apparatus (step 611).

After the above detailed description of the system structure and technical contents of the present invention, the following advantages can be summarized:

1. An etched glass produced by the manufacturing method of the present invention, which has excellent diffusion plate properties, and thus can be applied to a structure of a backlight panel to obtain desired performance and life.

2. The series of manufacturing methods used in the present invention can simplify the process of traditional etching glass, not only shorten the process time, but also save the cost, and is more secure for the operator, so it is a very potential device and process. .

3. The glass etching apparatus of the present invention has a very excellent throughput, so that a larger amount and more precise etching of the glass can be produced in the same time.

4. Since the glass produced by the present invention has an etched structure formed directly on the surface of the glass, it is not destroyed by the high temperature generated by the LED, thereby having high performance and long life, and is applied. It is not easy to be deformed and wear-resistant and scratch-resistant on the anti-glare glass panel.

The embodiments described above are merely illustrative of the technical spirit and characteristics of the present invention, and the purpose of the present invention is to enable those skilled in the art to understand the contents of the present invention and to implement the present invention. Equivalent variations or modifications in accordance with the spirit of the invention are still intended to be included within the scope of the invention.

1, 3, 5. . . Glass etching device

10, 50. . . glass

100, 300, 500. . . Upper section

110, 310, 510. . . First cleaning section

120, 320, 520. . . Buffer segment

130. . . Sliding etching section

131. . . container

132, 532. . . Etching solution

133. . . Flow screen

134. . . Flow screen

135. . . Circulating pump

136. . . A pressure regulating valve

137. . . Filter

138. . . pressure gauge

139. . . Heating/cooler

140, 340, 540. . . Second cleaning section

150, 350, 550. . . Micro-polished section

160, 360, 560. . . Third cleaning section

170, 370, 570. . . Neutral section

180, 380, 580. . . Fourth cleaning section

190, 390, 590. . . Lower section

201～211. . . Step number of the first preferred embodiment

330. . . Spray etching section

331. . . Etching solution nozzle

401~411. . . Step number of the second preferred embodiment

530. . . Immersion etching section

531. . . Acid etching tank

601 ~ 611. . . Step number of the third preferred embodiment

1 is a schematic structural view of a glass etching apparatus according to a first preferred embodiment of the present invention;

2 is a schematic structural view of a curtain etching section of the first preferred embodiment of the present invention;

3 is a diagram showing the steps of a method for etching glass using a glass etching apparatus according to a first preferred embodiment of the present invention;

4 is a schematic structural view of a glass etching apparatus according to a second preferred embodiment of the present invention;

Figure 5 is a diagram showing the steps of a method for etching glass using a glass etching apparatus according to the second preferred embodiment of the present invention;

Figure 6 is a schematic view showing the structure of a glass etching apparatus according to a third preferred embodiment of the present invention;

7 is a schematic structural view of an immersion etching section of the third preferred embodiment of the present invention; and

Figure 8 is a diagram showing the steps of a method of etching glass using a glass etching apparatus according to a third preferred embodiment of the present invention.

1. . . Glass etching device

100. . . Upper section

110. . . First cleaning section

120. . . Buffer segment

130. . . Sliding etching section

140. . . Second cleaning section

150. . . Micro-polished section

160. . . Third cleaning section

170. . . Neutral section

180. . . Fourth cleaning section

190. . . Lower section

Claims (10)

A glass etching apparatus comprising: at least an upper sheet section for feeding a glass into the glass etching apparatus; and a first cleaning section coupled to the upper sheet section for attaching the glass One of the etched surfaces is cleaned and the glass is blown dry; a buffer section is connected to the first cleaning section for temporarily storing the cleaned glass and adjusting the temperature and humidity of the glass; The etched section is connected to the buffer section by etching the etched surface of the glass with an etchant; a second cleaning section is connected to the etched section for cleaning the glass by etching The salt and residual acid produced after the treatment, and the glass can be blown dry; at least one micro-polished section is connected to the second cleaning section, which fixes the glass obliquely and uses a polishing liquid to the glass The etched surface is micro-polished; a third cleaning section is connected to the micro-polished section for cleaning the salt and residual acid produced by the micro-polishing treatment of the glass, and drying the glass; a neutral section, and the third cleaning Segment connection, which uses a neutralizing liquid to neutralize the residual acid remaining after the etching treatment and micro-polishing treatment of the glass; a fourth cleaning section is connected to the neutralization section, which is used for The glass is cleaned and the glass is blown dry; and the lower sheet section is connected to the fourth cleaning section for sending the etched glass to the glass etching apparatus. The glass etching apparatus of claim 1, wherein the type of the etching section is selected from the group consisting of: a spray etching section, a immersion etching section, and a shower etching section. The glass etching apparatus according to claim 2, wherein the spray etching section comprises an etching liquid nozzle having a diameter of 0.7 to 1.5 mm, and an air pressure of the spraying etching section is 0.2 MPa, the air usage is 75 l/min, and the etching liquid ejection amount is 80 ml/min. The glass etching apparatus according to claim 2, wherein the curtain etching section comprises at least: a container for accommodating the etching liquid; and a first-class screen device connected to the container, which has The first-class screen, the etching liquid can flow out through the flow screen; and a circulation pump is disposed between the container and the flow screen to actively transport the etching liquid in the container to the flow screen. The glass etching apparatus according to claim 4, wherein the flow screen opening has a width of 0.3 to 3 mm. The glass etching apparatus according to claim 1, wherein the first cleaning section has a conveying speed of 0.5 to 4 m/min, the buffer section, the etching section, the second cleaning section, The conveying speed of the micro-polished section, the third cleaning section and the neutralization section is 1 to 40 m/min, and the conveying speed of the fourth cleaning section is 1 to 5 m/min. The glass etching apparatus of claim 1, wherein the first cleaning section, the etching section, the second cleaning section, the micro-polishing section, the third cleaning section, the The temperature of the neutralization section and the fourth cleaning section is 10 to 45 ° C, and the temperature of the buffer section is room temperature. The glass etching apparatus of claim 1, wherein the etching section, the second cleaning section, the micro-polished section, the third cleaning section, and the neutralization section have an inclination angle It is 0 to 45 degrees. A method for etching glass by using a glass etching apparatus comprises at least the following steps: (1) one of the glass etching apparatuses sends a glass into the glass etching apparatus; and (2) one of the glass etching apparatuses The etched surface of one of the glass is cleaned and the glass is blown dry; (3) the glass is parked in a buffer section of the glass etching apparatus, (4) and the buffer section is used to adjust the temperature and humidity thereof; (5) an etching section of the glass etching apparatus uniformly applies an etching solution to the etched surface of the glass; (6) the glass is left in the etching section for a period of time to perform an etching reaction; (7) a glass etching apparatus a second cleaning section cleans the glass and blows the glass; (8) at least one micro-polished section of the glass etching apparatus tilts the glass and micro-polishs the etched surface of the glass with a polishing solution (9) one of the glass etching devices, the third cleaning section cleans the glass and blows the glass; (10) one of the glass etching devices neutralizes the glass by etching and micropolishing the glass with a neutralizing liquid The residual acid remaining after the treatment is subjected to neutralization treatment; (11) one of the glass etching devices cleans the glass and blows the glass; and (12) one of the glass etching devices is etched The finished glass is sent out of the glass etching apparatus. A method for etching glass by using a glass etching apparatus according to claim 9, wherein the reaction time of the step (2) is 1 to 15 minutes, and the reaction time of the step (5) is 1 to 15 minutes. (6) The reaction time is 1 to 15 minutes, the reaction time of the step (7) is 1 to 90 minutes, the reaction time of the step (8) is 1 to 15 minutes, and the reaction time of the step (9) is 1 to 15 minutes. The reaction time of the step (10) is 1 to 15 minutes.