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TWI402933B - Vacuum chuck seat for semiconductor component cutting equipment capable of supplying cooling water - Google Patents

Vacuum chuck seat for semiconductor component cutting equipment capable of supplying cooling water Download PDF

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Publication number
TWI402933B
TWI402933B TW099104394A TW99104394A TWI402933B TW I402933 B TWI402933 B TW I402933B TW 099104394 A TW099104394 A TW 099104394A TW 99104394 A TW99104394 A TW 99104394A TW I402933 B TWI402933 B TW I402933B
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Taiwan
Prior art keywords
cooling water
semiconductor element
support unit
support
vacuum
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TW099104394A
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Chinese (zh)
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TW201118976A (en
Inventor
白鐘大
黃義斗
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細美事有限公司
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    • H10P72/78
    • H10P52/00
    • H10P72/7616

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  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Dicing (AREA)
  • Constituent Portions Of Griding Lathes, Driving, Sensing And Control (AREA)

Description

可供應冷卻水之半導體元件切割設備的真空夾頭座Vacuum chuck seat for semiconductor component cutting equipment capable of supplying cooling water 相關申請案之交互參照Cross-references to related applications

對November 26,2009提申之韓國新型申請案2009-15344號之優先權,其整體揭示內容以參照方式併入本案。The priority of Korean New Application No. 2009-15344, which is incorporated by reference in its entirety, is hereby incorporated by reference.

發明領域Field of invention

本發明係關於可供應冷卻水之半導體元件切割設備的真空夾頭座且,更尤其,關於可使用冷卻水來冷卻在半導體元件模體中使用切割刀片切割該半導體元件模體時所產生的熱之半導體元件切割設備的真空夾頭座。The present invention relates to a vacuum chuck holder for a semiconductor element cutting apparatus which can supply cooling water and, more particularly, relates to the use of cooling water for cooling the heat generated when a semiconductor element body is cut using a cutting blade in a semiconductor element mold body. A vacuum chuck holder for a semiconductor component cutting apparatus.

發明背景Background of the invention

通常,半導體元件模體係藉由以接著劑將半導體晶片黏附至電路板或引線框安裝板之晶粒接合製程、連接設置在半導體晶片上的晶片墊與引線框或電路板引線之佈線接合製程、半導體晶片周圍內部電路與其他構件之模鑄製程製得。Generally, a semiconductor device mold system is a wiring bonding process of bonding a semiconductor wafer to a circuit board or a lead frame mounting board by an adhesive, and a wiring bonding process of connecting a wafer pad and a lead frame or a circuit board lead provided on the semiconductor wafer, A molding process is performed for internal circuits and other components around the semiconductor wafer.

製得的半導體元件模體被輸送至半導體元件切割設備並隨後切割成半導體元件(亦即個別半導體晶片單元)。用於切割半導體元件的設備係配有被構形成吸著並支承半導體元件模體的真空夾頭座,以使用切割刀片將半導體元件模體切成半導體晶片。The resulting semiconductor component phantom is transferred to a semiconductor component dicing apparatus and then diced into semiconductor components (i.e., individual semiconductor wafer units). An apparatus for cutting a semiconductor element is provided with a vacuum chuck holder configured to attract and support a semiconductor element mold body to cut a semiconductor element mold body into a semiconductor wafer using a dicing blade.

然而,在具有引線形成於其側面上之半導體元件模體中,當以切割刀片切割半導體元件模體時,熱會從半導體元件模體側面產生。現有真空夾頭座並無冷卻半導體元件模體的功能。因此,金屬引線被半導體元件模體產生的熱熔化,而和其他引線重疊,導致諸如污損或熔化之缺失。However, in the semiconductor element mold body having the lead formed on the side thereof, when the semiconductor element mold body is cut with the dicing blade, heat is generated from the side surface of the semiconductor element phantom. The existing vacuum chuck seat does not have the function of cooling the semiconductor element body. Therefore, the metal lead is melted by the heat generated by the semiconductor element phantom, and overlaps with other leads, resulting in a defect such as staining or melting.

發明概要Summary of invention

因此,本發明已針對先前技術所發生的上述問題來進行,而本發明之一目的係提供半導體元件切割設備的真空夾頭座,其可使用冷卻水來冷卻在半導體元件模體中使用切割刀片切割該半導體元件模體時所產生的熱。Accordingly, the present invention has been made in view of the above problems occurring in the prior art, and an object of the present invention is to provide a vacuum chuck holder for a semiconductor element cutting apparatus which can use cooling water for cooling to use a cutting blade in a semiconductor element mold body. The heat generated when the semiconductor element body is cut.

為達上述目的,根據本發明,提供有一種真空夾頭座,其設置在用於切割半導體元件模體的設備中並構形成支承半導體元件模體。該真空夾頭座包含一夾頭底座;支承單元,其附著至夾頭底座頂面並構形成支承半導體元件模體;及冷卻水供應單元,其構形成供應冷卻水。複數個真空孔形成在支承單元內。空氣經由真空孔被吸收,俾使半導體元件模體吸著至支承單元。冷卻水經由冷卻水供應單元供應,藉此移除切割半導體元件模體時所產生的熱。To achieve the above object, according to the present invention, there is provided a vacuum chuck holder which is provided in an apparatus for cutting a semiconductor element mold body and which is configured to support a semiconductor element mold body. The vacuum chuck holder includes a chuck base; a support unit attached to the top surface of the chuck base and configured to support the semiconductor element mold body; and a cooling water supply unit configured to supply cooling water. A plurality of vacuum holes are formed in the support unit. Air is absorbed through the vacuum holes, and the semiconductor element body is attracted to the support unit. The cooling water is supplied through the cooling water supply unit, thereby removing heat generated when the semiconductor element body is cut.

該支承單元可由橡膠製成。The support unit can be made of rubber.

該冷卻水供應單元可包含複數個水平冷卻水管線,其平行於夾頭底座形成;及複數個垂直冷卻水管線,其分別以垂直方向形成在水平冷卻水管線上側並構形成供應冷卻水。The cooling water supply unit may include a plurality of horizontal cooling water lines formed parallel to the chuck base; and a plurality of vertical cooling water lines respectively formed in a vertical direction on the horizontal cooling water line side and configured to supply cooling water.

支承單元溝槽可形成在個別支承單元上側。該支承溝槽容許用於切割半導體元件之設備的切割刀片進入彼內並切割半導體元件模體。冷卻水係經由支承溝槽供應,藉此移除切割半導體元件模體時所產生的熱。The support unit grooves may be formed on the upper side of the individual support unit. The support groove allows the cutting blade of the apparatus for cutting a semiconductor element to enter and cut the semiconductor element body. The cooling water is supplied via the support grooves, thereby removing heat generated when the semiconductor element body is cut.

該真空夾頭座可又包含一夾頭底座支承體,其具有形成於彼中央之真空孔並支承夾頭底座。The vacuum collet holder may further include a collet base support having a vacuum hole formed in the center and supporting the collet base.

該支承單元可具有Hs10至Hs55之硬度。The support unit may have a hardness of Hs10 to Hs55.

該支承單元可具有Hs60至Hs95之硬度。The support unit may have a hardness of Hs60 to Hs95.

為達上述目的,根據本發明,提供有一種真空夾頭座,其設置在用於切割半導體元件模體的設備中並構形成支承半導體元件模體。該真空夾頭座包含一夾頭底座;第二支承單元,其附著至夾頭底座頂面;第一支承單元,其分別附著至第二支承單元頂面並構形成支承半導體元件模體,相比於第二支承單元材料,第一支承單元係由具較低硬度之材料製成;及冷卻水供應單元,其構形成供應冷卻水。複數個真空孔係形成在第一與第二支承單元內。空氣經由真空孔被吸收,俾使半導體元件模體吸著至第一支承單元。冷卻水經由冷卻水供應單元供應,藉此移除切割半導體元件模體時所產生的熱。To achieve the above object, according to the present invention, there is provided a vacuum chuck holder which is provided in an apparatus for cutting a semiconductor element mold body and which is configured to support a semiconductor element mold body. The vacuum collet holder includes a collet base; a second supporting unit attached to the top surface of the collet base; and a first supporting unit attached to the top surface of the second supporting unit and configured to support the semiconductor component body, The first support unit is made of a material having a lower hardness than the second support unit material; and a cooling water supply unit configured to supply cooling water. A plurality of vacuum holes are formed in the first and second support units. Air is absorbed through the vacuum holes, and the semiconductor element body is attracted to the first support unit. The cooling water is supplied through the cooling water supply unit, thereby removing heat generated when the semiconductor element body is cut.

該第一支承單元與第二支承單元可由橡膠材料製成。The first support unit and the second support unit may be made of a rubber material.

該冷卻水供應單元可包含複數個水平冷卻水管線,其平行於夾頭底座形成;及複數個垂直冷卻水管線,其分別以垂直方向形成在水平冷卻水管線上側並構形成供應冷卻水。The cooling water supply unit may include a plurality of horizontal cooling water lines formed parallel to the chuck base; and a plurality of vertical cooling water lines respectively formed in a vertical direction on the horizontal cooling water line side and configured to supply cooling water.

支承單元溝槽係形成在個別支承單元上側。該支承溝槽容許用於切割半導體元件之設備的切割刀片進入彼內並切割半導體元件模體。冷卻水係經由支承溝槽供應,藉此移除切割半導體元件模體時所產生的熱。The support unit grooves are formed on the upper side of the individual support units. The support groove allows the cutting blade of the apparatus for cutting a semiconductor element to enter and cut the semiconductor element body. The cooling water is supplied via the support grooves, thereby removing heat generated when the semiconductor element body is cut.

該真空夾頭座可又包含一夾頭底座支承體,其具有形成於彼中央之真空孔並支承夾頭底座。The vacuum collet holder may further include a collet base support having a vacuum hole formed in the center and supporting the collet base.

第一支承單元可具有Hs10至Hs55之硬度。The first support unit may have a hardness of Hs10 to Hs55.

第二支承單元可具有Hs60至Hs95之硬度。The second support unit may have a hardness of Hs60 to Hs95.

圖式簡單說明Simple illustration

本發明的其他目的與優點可由下列詳細說明連同隨附圖式而更完整地理解,其中:第1圖為展示根據本發明第一具體例之可供應冷卻水之半導體元件切割設備的真空夾頭座的透視圖;第2圖為展示根據本發明第一具體例之半導體元件切割設備的真空夾頭座的平面圖;第3圖為沿著第2圖D-D線所取的真空夾頭座截面圖;第4圖是根據本發明第一具體例之真空夾頭座中的支承單元的細部頂視圖;第5圖是沿著第4圖K-K線所取的第一支承單元截面圖;第6圖展示根據本發明第二具體例之可供應冷卻水之半導體元件切割設備的真空夾頭座的透視圖;第7圖是沿著第6圖B-B線所取的真空夾頭座截面圖;及第8圖為展示使用根據本發明第一具體例之半導體元件切割設備的真空夾頭座的實施例之圖。Other objects and advantages of the present invention will be more fully understood from the following detailed description taken in conjunction with the accompanying drawings in which: FIG. 1 is a vacuum chuck showing a semiconductor element cutting device capable of supplying cooling water according to a first specific example of the present invention. 2 is a plan view showing a vacuum chuck holder of a semiconductor element cutting apparatus according to a first embodiment of the present invention; and FIG. 3 is a sectional view of the vacuum chuck holder taken along line DD of FIG. 4 is a top plan view of a support unit in a vacuum chuck holder according to a first embodiment of the present invention; FIG. 5 is a cross-sectional view of the first support unit taken along line KK of FIG. 4; FIG. A perspective view of a vacuum chuck holder for a semiconductor element cutting apparatus capable of supplying cooling water according to a second embodiment of the present invention; and FIG. 7 is a sectional view of the vacuum chuck holder taken along line BB of FIG. 6; 8 is a view showing an embodiment of a vacuum chuck holder using the semiconductor element cutting apparatus according to the first specific example of the present invention.

較佳實施例之詳細說明Detailed description of the preferred embodiment

隨後,將參照所附圖式詳細說明本發明的一些具體例。Hereinafter, some specific examples of the present invention will be described in detail with reference to the accompanying drawings.

第1圖為展示根據本發明第一具體例之可供應冷卻水之半導體元件切割設備的真空夾頭座的透視圖。第2圖為展示根據本發明第一具體例之半導體元件切割設備的真空夾頭座的平面圖。第3圖為沿著第2圖D-D線所取的真空夾頭座截面圖。Fig. 1 is a perspective view showing a vacuum chuck holder of a semiconductor element cutting apparatus which can supply cooling water according to a first embodiment of the present invention. Fig. 2 is a plan view showing a vacuum chuck holder of a semiconductor element cutting apparatus according to a first specific example of the present invention. Figure 3 is a cross-sectional view of the vacuum chuck seat taken along line D-D of Figure 2;

如第1至3圖所示,真空夾頭座200包括夾頭底座220、各別置於夾頭底座220頂面並構形成支承半導體元件模體110的支承單元240、構形成供應冷卻水的冷卻水供應單元210、和構形成支承夾頭底座220並具有大真空孔400形成於其中央的夾頭底座支承體230。As shown in FIGS. 1 to 3, the vacuum chuck holder 200 includes a chuck base 220, a top surface of the chuck base 220, and a support unit 240 for supporting the semiconductor element mold body 110, and is configured to supply cooling water. The cooling water supply unit 210, and the collet base support body 230 formed to support the collet base 220 and having a large vacuum hole 400 formed in the center thereof.

夾頭底座220構成真空夾頭座200的本體並有複數個真空孔400形成於其中。真空孔400係構形成穿透夾頭底座220。The collet base 220 constitutes the body of the vacuum collet holder 200 and has a plurality of vacuum holes 400 formed therein. The vacuum aperture 400 is configured to penetrate the collet base 220.

複數個真空孔400係形成於支承單元240內。一真空吸入器(未顯示)經由真空孔400吸取空氣,俾使半導體元件模體110吸著至支承單元240。A plurality of vacuum holes 400 are formed in the support unit 240. A vacuum inhaler (not shown) draws air through the vacuum hole 400 to cause the semiconductor element mold body 110 to be sucked to the support unit 240.

支承單元240提供真空夾頭座穩定性,使得半導體元件模體不被側向切割壓力推動。The support unit 240 provides vacuum chuck seat stability such that the semiconductor component phantom is not pushed by the lateral cutting pressure.

支承單元240各被構形成具有形成於彼內之真空孔400並和夾頭底座220耦合。支承單元240的真空孔400係對應於夾頭底座220的個別真空孔400。支承單元溝槽241係形成在支承單元240上側。支承溝槽241可使半導體元件切割設備的切割刀片進入彼內並切割半導體元件模體110。再者,冷卻水係經由支承溝槽241供應,藉此移除切割半導體元件模體110時所產生的熱。The support units 240 are each configured to have a vacuum hole 400 formed therein and coupled to the collet base 220. The vacuum holes 400 of the support unit 240 correspond to the individual vacuum holes 400 of the chuck base 220. The support unit groove 241 is formed on the upper side of the support unit 240. The support groove 241 allows the cutting blade of the semiconductor element cutting device to enter and cut the semiconductor element mold body 110. Further, the cooling water is supplied via the support groove 241, thereby removing heat generated when the semiconductor element body 110 is cut.

夾頭底座220較佳由鐵製成,而支承單元240可由橡膠製成。支承單元240可具有Hs10至Hs55或Hs60至Hs95之硬度。The collet base 220 is preferably made of iron, and the support unit 240 may be made of rubber. The support unit 240 may have a hardness of Hs10 to Hs55 or Hs60 to Hs95.

冷卻水供應單元210包括平行於夾頭底座220形成的複數個水平冷卻水管線211和垂直於夾頭底座220形成的複數個垂直冷卻水管線212。垂直冷卻水管線212係形成在個別水平冷卻水管線211的上側並構形成供應冷卻水。垂直冷卻水管線212係形成在夾頭底座220與支承單元240內。經由冷卻水供應單元210供應的冷卻水係用於移除切割半導體元件模體110時所產生的熱。The cooling water supply unit 210 includes a plurality of horizontal cooling water lines 211 formed parallel to the collet base 220 and a plurality of vertical cooling water lines 212 formed perpendicular to the collet base 220. A vertical cooling water line 212 is formed on the upper side of the individual horizontal cooling water line 211 and configured to supply cooling water. A vertical cooling water line 212 is formed in the collet base 220 and the support unit 240. The cooling water supplied via the cooling water supply unit 210 is for removing heat generated when the semiconductor element body 110 is cut.

第4圖是根據本發明第一具體例之真空夾頭座中的支承單元的細部頂視圖,第5圖是沿著第4圖K-K線所取的第一支承單元截面圖。Fig. 4 is a detailed plan view of a support unit in a vacuum chuck holder according to a first embodiment of the present invention, and Fig. 5 is a cross-sectional view of the first support unit taken along line K-K of Fig. 4.

如第4與5圖所示,冷卻水係經由水平冷卻水管線211供應並經由垂直冷卻水管線212到達支承單元溝槽241。到達支承單元溝槽241的冷卻水係用於移除半導體元件切割設備的切割刀片切割半導體元件模體110時所產生的熱。如第4圖所示,支承單元溝槽241係形成為圍繞各別真空孔400。As shown in FIGS. 4 and 5, the cooling water is supplied via the horizontal cooling water line 211 and reaches the support unit groove 241 via the vertical cooling water line 212. The cooling water reaching the support unit groove 241 is for removing heat generated when the cutting blade of the semiconductor element cutting device cuts the semiconductor element mold body 110. As shown in FIG. 4, the support unit grooves 241 are formed to surround the respective vacuum holes 400.

第6圖展示根據本發明第二具體例之可供應冷卻水之半導體元件切割設備的真空夾頭座的透視圖,第7圖是沿著第6圖B-B線所取的真空夾頭座截面圖。Figure 6 is a perspective view showing a vacuum chuck holder of a semiconductor element cutting device capable of supplying cooling water according to a second embodiment of the present invention, and Figure 7 is a sectional view of the vacuum chuck holder taken along line BB of Figure 6 .

如第6與7圖所示,和第一具體例相比,根據第二具體例之半導體元件切割設備的真空夾頭座又包括第二支承單元250。根據第二具體例的真空夾頭座200包括夾頭底座220、耦合至夾頭底座220頂面的第二支承單元250、分別附著至第二支承單元250頂面並構形成支承半導體元件模體110的第一支承單元240、構形成供應冷卻水的冷卻水供應單元210、和構形成具有大真空孔400形成於其中央並支承夾頭底座220的夾頭底座支承體230。在此,構成第一支承單元240的材料具有比構成第二支承單元250的材料較低的硬度。As shown in FIGS. 6 and 7, the vacuum chuck holder of the semiconductor element cutting apparatus according to the second specific example further includes the second supporting unit 250 as compared with the first specific example. The vacuum collet holder 200 according to the second embodiment includes a collet base 220, a second supporting unit 250 coupled to the top surface of the collet base 220, and is attached to the top surface of the second supporting unit 250, respectively, and configured to support the semiconductor component mold body. The first supporting unit 240 of the 110, the cooling water supply unit 210 configured to supply cooling water, and the collet base supporting body 230 formed to have a large vacuum hole 400 formed in the center thereof and supporting the collet base 220. Here, the material constituting the first support unit 240 has a lower hardness than the material constituting the second support unit 250.

夾頭底座220、第一支承單元240、冷卻水供應單元210、及夾頭底座支承體230係具有和第一具體例相同的構形,為簡化省略其說明。複數個真空孔400係形成在各別第二支承單元250內。第二支承單元250的真空孔400係耦合至第一支承單元240的個別真空孔400一真空吸入器(未顯示)經由真空孔400吸取空氣,俾使半導體元件模體110吸著至第一支承單元240。又,用於供應冷卻水的複數個垂直冷卻水管線212係形成在各別第二支承單元250內。垂直水平冷卻水管線212係形成在各別第一支承單元240內並和個別水平冷卻水管線211耦合。因此,冷卻水係經由水平冷卻水管線211與垂直水平冷卻水管線212供應。The chuck base 220, the first support unit 240, the cooling water supply unit 210, and the collet base support body 230 have the same configuration as the first specific example, and the description thereof is omitted for simplicity. A plurality of vacuum holes 400 are formed in the respective second support units 250. The vacuum hole 400 of the second supporting unit 250 is coupled to the individual vacuum hole 400 of the first supporting unit 240. A vacuum inhaler (not shown) draws air through the vacuum hole 400 to cause the semiconductor element mold body 110 to be sucked to the first support. Unit 240. Further, a plurality of vertical cooling water lines 212 for supplying cooling water are formed in the respective second supporting units 250. Vertical horizontal cooling water lines 212 are formed in respective first support units 240 and coupled to individual horizontal cooling water lines 211. Therefore, the cooling water is supplied via the horizontal cooling water line 211 and the vertical horizontal cooling water line 212.

第二支承單元250係由具有─較佳─Hs60至Hs95硬度之硬橡膠製成。第二支承單元250係分別耦合至第一支承單元240的下側以吸著並支承半導體元件模體110。因此,第二支承單元250提供真空夾頭座200穩定性,以防止半導體元件模體110被側向切割壓力推動。The second support unit 250 is made of a hard rubber having a hardness of preferably - Hs60 to Hs95. The second support unit 250 is coupled to the lower side of the first support unit 240, respectively, to attract and support the semiconductor element mold body 110. Therefore, the second support unit 250 provides stability of the vacuum collet holder 200 to prevent the semiconductor element mold body 110 from being pushed by the lateral cutting pressure.

第一支承單元240係由具有─較佳─Hs10至Hs55硬度之軟橡膠製成。半導體元件模體110係配置座落於第一支承單元240的頂面。第一支承單元240吸著並支承半導體元件模體110。由於第一支承單元240係由軟性材料製成,所以半導體元件模體座落並吸著至第一支承單元240時所生成的震動可減至最小。The first support unit 240 is made of a soft rubber having a hardness of preferably - Hs10 to Hs55. The semiconductor element mold body 110 is disposed on the top surface of the first support unit 240. The first supporting unit 240 sucks and supports the semiconductor element mold body 110. Since the first supporting unit 240 is made of a soft material, the vibration generated when the semiconductor element body is seated and sucked to the first supporting unit 240 can be minimized.

再者,第一支承單元240與第二支承單元250係藉由樹脂黏著材料附著在一起。因此,第一支承單元240與第二支承單元250附著在一起時的黏著性可增強,因該等係由相同橡膠材料製成。Furthermore, the first support unit 240 and the second support unit 250 are attached together by a resin adhesive material. Therefore, the adhesion when the first supporting unit 240 and the second supporting unit 250 are attached together can be enhanced because the same is made of the same rubber material.

同時,半導體元件模體110係由塑膠等等製成,並可彎折約1 mm。當如上述般彎折的半導體元件模體110吸著至平坦表面時,彎折的半導體元件模體110係恢復至其原始位置並經受和半導體元件模體110彎折方向呈相反方向的彎折力。換言之,假設半導體元件模體彎折了約1 mm,當其吸著至平坦表面時,半導體元件模體則恢復至其原始位置約1 mm。因此,在恢復過程期間有半導體元件模體110被施加於其的外力損壞的可能性。At the same time, the semiconductor element mold body 110 is made of plastic or the like and can be bent by about 1 mm. When the semiconductor element mold body 110 bent as described above is attracted to the flat surface, the bent semiconductor element mold body 110 is restored to its original position and subjected to bending in the opposite direction to the bending direction of the semiconductor element mold body 110. force. In other words, assuming that the semiconductor element phantom is bent by about 1 mm, when it is attracted to a flat surface, the semiconductor element phantom returns to its original position by about 1 mm. Therefore, there is a possibility that the semiconductor element phantom 110 is damaged by the external force applied thereto during the recovery process.

然而,在本發明具體例中,當半導體元件模體被吸著時,由軟性材料製成的第一支承單元240承受了半導體元件模體110的若干彎折現象。因此,可防止外力在吸著時施加於半導體元件模體110。However, in the specific example of the present invention, when the semiconductor element mold body is sucked, the first supporting unit 240 made of a soft material withstands some bending phenomenon of the semiconductor element mold body 110. Therefore, it is possible to prevent the external force from being applied to the semiconductor element mold body 110 at the time of absorbing.

更詳細地說,假設半導體元件模體110彎折了1 mm,因為第一支承單元240柔軟性的緣故,半導體元件模體110可以半導體元件模體110彎折約0.5 mm的狀態被吸著至第一支承單元240的頂面。因此,儘管半導體元件模體110彎折了1 mm,假使半導體元件模體110可在被吸著至第一支承單元240的頂面時以僅約0.5 mm就恢復至其原始位置,半導體元件模體110不會經受外力。In more detail, assuming that the semiconductor element mold body 110 is bent by 1 mm, the semiconductor element mold body 110 can be slid to a state in which the semiconductor element mold body 110 is bent by about 0.5 mm because of the flexibility of the first support unit 240. The top surface of the first support unit 240. Therefore, although the semiconductor element mold body 110 is bent by 1 mm, if the semiconductor element mold body 110 can be restored to its original position with only about 0.5 mm when being attracted to the top surface of the first support unit 240, the semiconductor element mold The body 110 does not experience external forces.

又,如上述般彎折的半導體元件模體110係配置置放至平坦表面上。當彎折的半導體元件模體110開始被吸著至第一支承單元240的頂面時,半導體元件模體110的特定部分會和該平坦表面接觸。在此狀態下,當半導體元件模體110恢復至其原始位置時,和平坦表面接觸並對平坦表面具較少摩擦力的半導體元件模體110局部的一部分可能會滑動,所以半導體元件模體位置可能改變。假使半導體元件模體110的配置狀態因為半導體元件模體110位置改變而被破壞,則在半導體元件模體110吸著至平坦表面後進行的切割製程時,切割精確度可能降低。Further, the semiconductor element mold body 110 bent as described above is placed on a flat surface. When the bent semiconductor element mold body 110 starts to be attracted to the top surface of the first support unit 240, a specific portion of the semiconductor element mold body 110 comes into contact with the flat surface. In this state, when the semiconductor element mold body 110 is restored to its original position, a part of the semiconductor element mold body 110 which is in contact with the flat surface and has less friction with the flat surface may slide, so the semiconductor element mold body position May change. If the arrangement state of the semiconductor element mold body 110 is broken due to the change in the position of the semiconductor element mold body 110, the cutting accuracy may be lowered at the time of the cutting process performed after the semiconductor element mold body 110 is sucked to the flat surface.

第一支承單元240係如上述般由軟性材料製成。因此,第一支承單元240在吸著前對半導體元件模體110具有少量恢復性與高摩擦力。由於可防止半導體元件模體110在吸著至第一支承單元240時滑動,故可防止半導體元件模體110位置改變。假使如上述般防止了半導體元件模體110的位置改變,則切割精確度可改善。The first support unit 240 is made of a soft material as described above. Therefore, the first supporting unit 240 has a small amount of restoring property and high frictional force to the semiconductor element mold body 110 before absorbing. Since the semiconductor element mold body 110 can be prevented from slipping while being sucked to the first support unit 240, the positional change of the semiconductor element mold body 110 can be prevented. If the positional change of the semiconductor element mold body 110 is prevented as described above, the cutting accuracy can be improved.

同時,第一支承單元240具有─較佳─0.1 mm至1.0 mm之厚度。如上所述,第一支承單元240係由具有Hs10至Hs55硬度之橡膠材料製成。第一支承單元240的厚度係較佳隨著橡膠材料硬度增加而增加。At the same time, the first support unit 240 has a thickness of preferably -0.1 mm to 1.0 mm. As described above, the first supporting unit 240 is made of a rubber material having a hardness of Hs10 to Hs55. The thickness of the first support unit 240 preferably increases as the hardness of the rubber material increases.

然而,假使第一支承單元240具有大於1.0 mm的厚度,儘管具有Hs55之硬度,但當對被吸著並受支承的半導體元件模體進行切割製程時,因為第一支承單元240由軟性材料製成的緣故,半導體元件模體110可能被切割刀片的側向切割壓力推動。因此,切割精確度可能降低。However, if the first supporting unit 240 has a thickness of more than 1.0 mm, although having a hardness of Hs55, when the dicing and supporting semiconductor element phantom is subjected to a cutting process, since the first supporting unit 240 is made of a soft material For this reason, the semiconductor element mold body 110 may be pushed by the lateral cutting pressure of the cutting blade. Therefore, the cutting accuracy may be lowered.

又,假使第一支承單元240具有小於0.1 mm的厚度,儘管具有Hs10之硬度,但半導體元件模體110的彎折不能被充分承受,半導體元件模體110不能穩定地置放且半導體元件模體110的吸收震動不能被充分吸收。Further, in the case where the first supporting unit 240 has a thickness of less than 0.1 mm, the bending of the semiconductor element mold body 110 cannot be sufficiently withstood despite the hardness of Hs10, and the semiconductor element molded body 110 cannot be stably placed and the semiconductor element molded body The absorption shock of 110 cannot be fully absorbed.

複數個真空孔400係形成得穿透夾頭底座220與第二支承單元250的頂面與底面,以吸收並支承座落配置在第一支承單元240頂面的半導體元件模體110。複數個真空孔400係形成得俾使半導體元件模體110被切割刀片切割且真空孔400可吸著半導體晶片單元之個別半導體元件。亦即,真空孔400的位置與數目係對應於半導體晶片單元之個別半導體元件的位置與數目。The plurality of vacuum holes 400 are formed to penetrate the top surface and the bottom surface of the chuck base 220 and the second support unit 250 to absorb and support the semiconductor element mold body 110 disposed on the top surface of the first support unit 240. The plurality of vacuum holes 400 are formed such that the semiconductor element mold body 110 is cut by the dicing blade and the vacuum holes 400 can smother individual semiconductor elements of the semiconductor wafer unit. That is, the position and number of vacuum holes 400 correspond to the position and number of individual semiconductor elements of the semiconductor wafer unit.

形成在第一支承單元240內的複數個真空孔400係和形成在第二支承單元250內的複數個個別真空孔400相通。由於形成在第一支承單元240內的真空孔400和形成在第二支承單元250內的複數個個別真空孔400相通,所以形成了從夾頭底座220底面穿逶至第一支承單元240頂面的複數個空氣導管。The plurality of vacuum holes 400 formed in the first support unit 240 are in communication with a plurality of individual vacuum holes 400 formed in the second support unit 250. Since the vacuum hole 400 formed in the first supporting unit 240 communicates with the plurality of individual vacuum holes 400 formed in the second supporting unit 250, the bottom surface of the first supporting unit 240 is formed from the bottom surface of the chuck base 220. Multiple air ducts.

在本發明較佳具體例中,形成在第二支承單元250內的複數個真空孔400係形成得穿透夾頭底座220與第二支承單元250的頂面與底面。形成在夾頭底座支承體230中央的大真空孔400係耦合至形成在第二支承單元250內的真空孔400。儘管例示了真空吸入器(未顯示)耦合至形成在夾頭底座支承體230內的真空孔400,但本發明不限於真空孔400耦合至真空吸入器(未顯示)之例。In a preferred embodiment of the present invention, the plurality of vacuum holes 400 formed in the second support unit 250 are formed to penetrate the top surface and the bottom surface of the chuck base 220 and the second support unit 250. The large vacuum hole 400 formed at the center of the chuck base support body 230 is coupled to the vacuum hole 400 formed in the second support unit 250. Although a vacuum inhaler (not shown) is illustrated coupled to the vacuum port 400 formed in the collet base support 230, the invention is not limited to the case where the vacuum port 400 is coupled to a vacuum inhaler (not shown).

第8圖為展示使用根據本發明第一具體例之半導體元件切割設備的真空夾頭座的實施例之圖。如第8圖所示,半導體元件模體110可被半導體元件切割設備的切割刀片300所切。假使切割製程產生熱,則冷卻水500噴出,俾使冷卻受熱半導體元件模體110與半導體元件切割設備的受熱切割刀片300。Fig. 8 is a view showing an embodiment of a vacuum chuck holder using the semiconductor element cutting apparatus according to the first specific example of the present invention. As shown in Fig. 8, the semiconductor element mold body 110 can be cut by the cutting blade 300 of the semiconductor element cutting device. If the cutting process generates heat, the cooling water 500 is ejected, so that the heated semiconductor element body 110 and the heated cutting blade 300 of the semiconductor element cutting device are cooled.

如上所述,本發明之益處在於可使用冷卻水移除半導體元件切割設備的切割刀片切割半導體元件模體時所產生的熱。As described above, the present invention is advantageous in that the heat generated when the cutting blade of the semiconductor element cutting device cuts the semiconductor element mold body can be removed using the cooling water.

由於受熱半導體元件模體被冷卻,所以缺失部位─例如受熱熔化的金屬引線與其他引線重疊所產生的污損或熔化─可大幅地減少。Since the heated semiconductor element body is cooled, the missing portion, such as the stain or melt caused by the overlapping of the thermally melted metal lead and other leads, can be greatly reduced.

再者,產率可增加,因為缺失部位減少了。Furthermore, the yield can be increased because the number of missing sites is reduced.

因此,本發明就產業而言係極為有利,因為受熱半導體元件模體被冷卻,所以缺失部位─例如受熱熔化的金屬引線與其他引線重疊所產生的污損或熔化─可大幅地減少。Therefore, the present invention is extremely advantageous in the industry because the heated semiconductor element phantom is cooled, so that the missing portion, such as the stain or melt caused by the overlapping of the heat-fused metal lead and other leads, can be greatly reduced.

儘管已說明本發明某些較佳具體例,但本發明並不限於該等具體例,而僅限於附加之申請專利範圍。能理解到的是熟習此藝者可在不逸離本發明範疇與精神之下修改或更動該等具體例。Although certain preferred embodiments of the invention have been described, the invention is not limited to the specific examples, but is limited to the scope of the appended claims. It will be appreciated that those skilled in the art can modify or modify the specific embodiments without departing from the scope and spirit of the invention.

110...半導體元件模體110. . . Semiconductor component phantom

200...真空夾頭座200. . . Vacuum chuck seat

210...冷卻水供應單元210. . . Cooling water supply unit

211...水平冷卻水管線211. . . Horizontal cooling water line

212...垂直冷卻水管線212. . . Vertical cooling water line

220...夾頭底座220. . . Chuck base

230‧‧‧夾頭底座支承體230‧‧‧Chuck base support

240、250‧‧‧支承單元240, 250‧‧‧ support unit

241‧‧‧支承單元溝槽241‧‧‧Support unit groove

300‧‧‧切割刀片300‧‧‧Cutting Blade

400‧‧‧真空孔400‧‧‧vacuum hole

500‧‧‧冷卻水500‧‧‧cooling water

第1圖為展示根據本發明第一具體例之可供應冷卻水之半導體元件切割設備的真空夾頭座的透視圖;1 is a perspective view showing a vacuum chuck holder of a semiconductor element cutting device capable of supplying cooling water according to a first specific example of the present invention;

第2圖為展示根據本發明第一具體例之半導體元件切割設備的真空夾頭座的平面圖;2 is a plan view showing a vacuum chuck holder of a semiconductor element cutting apparatus according to a first specific example of the present invention;

第3圖為沿著第2圖D-D線所取的真空夾頭座截面圖;Figure 3 is a cross-sectional view of the vacuum chuck seat taken along line D-D of Figure 2;

第4圖是根據本發明第一具體例之真空夾頭座中的支承單元的細部頂視圖;Figure 4 is a top plan view showing a detail of a support unit in a vacuum chuck holder according to a first embodiment of the present invention;

第5圖是沿著第4圖K-K線所取的第一支承單元截面圖;Figure 5 is a cross-sectional view of the first supporting unit taken along line K-K of Figure 4;

第6圖展示根據本發明第二具體例之可供應冷卻水之半導體元件切割設備的真空夾頭座的透視圖;Figure 6 is a perspective view showing a vacuum chuck holder of a semiconductor element cutting device which can supply cooling water according to a second embodiment of the present invention;

第7圖是沿著第6圖B-B線所取的真空夾頭座截面圖;及Figure 7 is a cross-sectional view of the vacuum chuck seat taken along line B-B of Figure 6;

第8圖為展示使用根據本發明第一具體例之半導體元件切割設備的真空夾頭座的實施例之圖。Fig. 8 is a view showing an embodiment of a vacuum chuck holder using the semiconductor element cutting apparatus according to the first specific example of the present invention.

200...真空夾頭座200. . . Vacuum chuck seat

210...冷卻水供應單元210. . . Cooling water supply unit

212...垂直冷卻水管線212. . . Vertical cooling water line

220...夾頭底座220. . . Chuck base

230...夾頭底座支承體230. . . Chuck base support

240...支承單元240. . . Support unit

400...真空孔400. . . Vacuum hole

Claims (14)

一種真空夾頭座,其設置在用於切割一半導體元件模體的設備中並組配成支承該半導體元件模體,該真空夾頭座包含:一夾頭底座;支承單元,其附著至該夾頭底座的頂面並組配成支承該半導體元件模體;及冷卻水供應單元,其組配成供應冷卻水,其中複數個真空孔形成在該等支承單元中,空氣經由該等真空孔被吸收,俾使該半導體元件模體吸著至該等支承單元,且該冷卻水經由該等冷卻水供應單元供應,藉此移除切割該半導體元件模體時所產生的熱。 A vacuum chuck holder disposed in an apparatus for cutting a semiconductor component mold body and assembled to support the semiconductor component mold body, the vacuum chuck holder comprising: a chuck base; a support unit attached to the a top surface of the chuck base and assembled to support the semiconductor element mold body; and a cooling water supply unit assembled to supply cooling water, wherein a plurality of vacuum holes are formed in the support unit through which the air passes After being absorbed, the semiconductor element body is attracted to the supporting units, and the cooling water is supplied through the cooling water supply units, thereby removing heat generated when the semiconductor element body is cut. 如申請專利範圍第1項之真空夾頭座,其中該等支承單元係由橡膠製成。 A vacuum chuck holder according to claim 1, wherein the support units are made of rubber. 如申請專利範圍第1或2項之真空夾頭座,其中該等冷卻水供應單元包含:複數個水平冷卻水管線,其平行於該夾頭底座形成;及複數個垂直冷卻水管線,其分別以垂直方向形成在該等水平冷卻水管線之上側並組配成供應該冷卻水。 The vacuum chuck seat of claim 1 or 2, wherein the cooling water supply unit comprises: a plurality of horizontal cooling water lines formed parallel to the chuck base; and a plurality of vertical cooling water lines, respectively The upper side of the horizontal cooling water line is formed in a vertical direction and assembled to supply the cooling water. 如申請專利範圍第1項之真空夾頭座,其中複數個支承單元溝槽係形成在個別支承單元之上側,其中該等支承單元溝槽容許用於切割半導體元件之設備的切割刀片 進入彼內並切割該半導體元件模體,而且該冷卻水係經由該等支承單元溝槽供應,藉此移除切割該半導體元件模體時所產生的熱。 A vacuum chuck holder according to claim 1, wherein a plurality of support unit grooves are formed on an upper side of the individual support unit, wherein the support unit grooves allow a cutting blade for a device for cutting a semiconductor element The semiconductor element body is cut into and cut, and the cooling water is supplied through the support unit grooves, thereby removing heat generated when the semiconductor element body is cut. 如申請專利範圍第1項之真空夾頭座,其又包含一夾頭底座支承體,該夾頭底座支承體具有一形成於彼中央之真空孔並支承該夾頭底座。 The vacuum collet holder of claim 1, further comprising a collet base support body having a vacuum hole formed in the center and supporting the collet base. 如申請專利範圍第1項之真空夾頭座,其中該支承單元具有Hs10至Hs55之硬度。 A vacuum chuck holder according to claim 1, wherein the support unit has a hardness of Hs10 to Hs55. 如申請專利範圍第1項之真空夾頭座,其中該支承單元具有Hs60至Hs95之硬度。 A vacuum chuck holder according to claim 1, wherein the support unit has a hardness of Hs60 to Hs95. 一種真空夾頭座,其設置在用於切割一半導體元件模體的設備中並組配成支承該半導體元件模體,該真空夾頭座包含:一夾頭底座;第二支承單元,其附著至該夾頭底座的頂面;第一支承單元,其分別附著至該等第二支承單元的一頂面並組配成支承該半導體元件模體,該等第一支承單元係由具低於該等第二支承單元的材料硬度之材料製成;及冷卻水供應單元,其組配成供應冷卻水,其中複數個真空孔係形成在該等第一與第二支承單元的每一者中,空氣經由該等真空孔被吸收,俾使該半導體元件模體吸著至該等第一支承單元,且 該冷卻水經由該等冷卻水供應單元供應,藉此移除切割該半導體元件模體時所產生的熱。 A vacuum chuck holder disposed in an apparatus for cutting a semiconductor component mold body and assembled to support the semiconductor component mold body, the vacuum chuck holder comprising: a chuck base; and a second support unit attached a top surface of the chuck base; a first support unit attached to a top surface of the second support unit and assembled to support the semiconductor component mold body, the first support unit being lower than And a cooling water supply unit configured to supply cooling water, wherein a plurality of vacuum holes are formed in each of the first and second support units Air is absorbed through the vacuum holes to cause the semiconductor element body to be attracted to the first support units, and The cooling water is supplied through the cooling water supply units, thereby removing heat generated when the semiconductor element body is cut. 如申請專利範圍第8項之真空夾頭座,其中該等第一支承單元與該等第二支承單元係由橡膠材料製成。 The vacuum chuck holder of claim 8, wherein the first support unit and the second support unit are made of a rubber material. 如申請專利範圍第8或9項之真空夾頭座,其中該等冷卻水供應單元包含:複數個水平冷卻水管線,其平行於該夾頭底座形成,及複數個垂直冷卻水管線,其分別以垂直方向形成在該水平冷卻水管線之上側並組配成供應該冷卻水。 The vacuum chuck seat of claim 8 or 9, wherein the cooling water supply unit comprises: a plurality of horizontal cooling water pipelines formed parallel to the chuck base, and a plurality of vertical cooling water pipelines, respectively The upper side of the horizontal cooling water line is formed in a vertical direction and assembled to supply the cooling water. 如申請專利範圍第8項之真空夾頭座,其中複數個支承單元溝槽係形成在個別支承單元之上側,其中該等支承單元溝槽容許用於切割半導體元件之設備的切割刀片進入彼內並切割該半導體元件模體,而且該冷卻水係經由該等支承單元溝槽供應,藉此移除切割該半導體元件模體時所產生的熱。 A vacuum chuck holder according to claim 8 wherein a plurality of support unit grooves are formed on an upper side of the individual support unit, wherein the support unit grooves allow the cutting blade of the apparatus for cutting the semiconductor element to enter the inside And cutting the semiconductor element body, and the cooling water is supplied through the support cell grooves, thereby removing heat generated when the semiconductor element body is cut. 如申請專利範圍第8項之真空夾頭座,其又包含一夾頭底座支承體,該夾頭底座支承體具有一形成於彼中央之真空孔並支承該夾頭底座。 A vacuum collet holder according to claim 8 further comprising a collet base support body having a vacuum hole formed in the center and supporting the collet base. 如申請專利範圍第8項之真空夾頭座,其中該第一支承單元具有Hs10至Hs55之硬度。 A vacuum chuck holder according to claim 8 wherein the first support unit has a hardness of Hs10 to Hs55. 如申請專利範圍第8項之真空夾頭座,其中該第二支承單元具有Hs60至Hs95之硬度。 A vacuum chuck holder according to claim 8 wherein the second support unit has a hardness of Hs60 to Hs95.
TW099104394A 2009-11-26 2010-02-11 Vacuum chuck seat for semiconductor component cutting equipment capable of supplying cooling water TWI402933B (en)

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US5192849A (en) * 1990-08-10 1993-03-09 Texas Instruments Incorporated Multipurpose low-thermal-mass chuck for semiconductor processing equipment
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JPH03183151A (en) * 1989-12-12 1991-08-09 Denki Kagaku Kogyo Kk Electrostatic chuck plate
US5192849A (en) * 1990-08-10 1993-03-09 Texas Instruments Incorporated Multipurpose low-thermal-mass chuck for semiconductor processing equipment
KR20060131261A (en) * 2005-06-15 2006-12-20 삼성전자주식회사 Chuck Assembly of Semiconductor Manufacturing Equipment
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JP2009113145A (en) * 2007-11-06 2009-05-28 Disco Abrasive Syst Ltd Polishing machine chuck table mechanism

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