TWI484871B - Atmospheric plasma equipment and waveguide for the same - Google Patents
Atmospheric plasma equipment and waveguide for the same Download PDFInfo
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Description
以下本發明涉及一種大氣等離子體設備和用於該設備的波導，尤其涉及一種能夠同時獲得使經由具有一個或多個階梯的波導所施加的電磁波產生聚集效應以及穩定地保持所產生的等離子體的效果的大氣等離子體設備和用於該設備的波導。
The present invention relates to an atmospheric plasma apparatus and a waveguide therefor, and more particularly to a method capable of simultaneously obtaining an aggregation effect by electromagnetic waves applied via a waveguide having one or more steps and stably maintaining the generated plasma. An atmospheric plasma device of effect and a waveguide for the device.
現有等離子體發生裝置包括經由其傳播電磁波的波導、調整等離子體阻抗的3-短管和產生等離子體的等離子體發生部，其中排出管被設置在等離子體發生部中。當電磁波經由波導傳播時，電場聚集到波導的等離子體發生部上且從該處產生等離子體。
因此，當設計能夠有效地使電場聚集的結構時波導是重要因素。
波導的結構已經從現有矩形平坦結構發展成在高度上逐漸降低。
第1圖是示出在韓國專利申請公開No.10-2008-0033408（下文中稱為現有技術）中公開的等離子體反應器的整體示意圖。
參考第1圖，根據現有技術的等離子體反應器具有其高度以預定角度降低的錐形形狀，從而使得從導波施加的電場（電磁波）聚集，波導的後端設有反應器腔室，在施加電場的情況下，在該反應器腔室中產生等離子體。現有技術公開了最小化反射的電磁波量的錐形波導，但是存在如下問題：與波導的後端相比，在產生等離子體的實際腔室中電場的實際聚集效應減少。
A conventional plasma generating apparatus includes a waveguide through which electromagnetic waves are propagated, a 3-short tube that adjusts plasma impedance, and a plasma generating portion that generates plasma, wherein the discharge tube is disposed in the plasma generating portion. When electromagnetic waves propagate through the waveguide, an electric field is concentrated on the plasma generating portion of the waveguide and plasma is generated therefrom.
Therefore, the waveguide is an important factor when designing a structure capable of effectively concentrating an electric field.
The structure of the waveguide has evolved from the existing rectangular flat structure to a gradual decrease in height.
Fig. 1 is an overall schematic view showing a plasma reactor disclosed in Korean Patent Application Publication No. 10-2008-0033408 (hereinafter referred to as the prior art).
Referring to Fig. 1, a plasma reactor according to the prior art has a tapered shape whose height is lowered at a predetermined angle, so that an electric field (electromagnetic wave) applied from a guided wave is concentrated, and a reactor chamber is provided at a rear end of the waveguide. In the case where an electric field is applied, a plasma is generated in the reactor chamber. The prior art discloses a tapered waveguide that minimizes the amount of reflected electromagnetic waves, but there is a problem in that the actual aggregation effect of the electric field in the actual chamber in which the plasma is generated is reduced as compared with the rear end of the waveguide.
本發明意在提供一種具有能夠以相對低的功耗使電場聚集最大化的新結構的波導以及使用該波導的大氣等離子體設備。
在一個方面中，大氣等離子體設備包括：產生電磁波的振盪器；和從所述振盪器產生的電磁波被輸入到其中以經由其傳播的波導，其中所述波導包括至少一個或多個階梯，在包括末端矮部的波導區域產生等離子體。
產生等離子體的矮部可以比電磁波被輸入其中的導波的第一高度短，所述波導的至少一個階梯可通過其高度以預定角度連續降低的錐形結構實現。
波導的至少一個階梯的高度可垂直地降低，矮部的高度可降低以具有錐形結構。
階梯可全部由其高度以預定角度連續降低的錐形結構實現。
波導可以具有雙錐形結構，錐形波導可包括：具有預定高度的第一高部；與所述第一高部的端部連接且在高度上以預定角度降低的第一錐形部；與所述第一錐形部的端部連接的第二高部；與所述第二高部的端部連接的第二錐形部；和與所述第二錐形部的端部連接的矮部。
可在所述矮部、所述第二錐形部或它們的邊界區域中產生等離子體，所述第二高部可比所述第一錐形部的所述端部高。
所述第二高部的長度可以為預定長度或者更長或者為0。
在另一方面中，提供了一種具有用於大氣等離子體設備中的結構的波導。
從以下詳細描述、附圖和申請專利範圍中，其他特徵和方面將變得顯而易見。
The present invention is intended to provide a waveguide having a new structure capable of maximizing electric field concentration with relatively low power consumption and an atmospheric plasma apparatus using the same.
In one aspect, an atmospheric plasma apparatus includes: an oscillator that generates electromagnetic waves; and a waveguide into which electromagnetic waves generated from the oscillator are input to propagate therethrough, wherein the waveguide includes at least one or more steps, The waveguide region including the terminal dwarf generates plasma.
The dwarf portion that generates the plasma may be shorter than the first height of the guided wave into which the electromagnetic wave is input, and at least one step of the waveguide may be realized by a tapered structure whose height is continuously lowered at a predetermined angle.
The height of at least one step of the waveguide may be lowered vertically, and the height of the dwarf may be lowered to have a tapered structure.
The steps can all be realized by a tapered structure whose height is continuously lowered at a predetermined angle.
The waveguide may have a double-cone structure, and the tapered waveguide may include: a first high portion having a predetermined height; a first tapered portion connected to an end of the first high portion and lowered at a predetermined angle in height; a second high portion connected to an end of the first tapered portion; a second tapered portion connected to an end of the second high portion; and a short connecting to an end portion of the second tapered portion unit.
A plasma may be generated in the dwarf portion, the second tapered portion, or a boundary region thereof, and the second upper portion may be higher than the end portion of the first tapered portion.
The length of the second upper portion may be a predetermined length or longer or 0.
In another aspect, a waveguide having a structure for use in an atmospheric plasma device is provided.
Other features and aspects will be apparent from the following detailed description, drawings and claims.
從以下參考附圖對實施例的描述中，本發明的優勢、特徵和方面將變得顯而易見，在下文中闡述該描述。然而，本發明可體現為不同形式且不應該被解釋為限制於本文闡述的實施例。相反，這些實施例被提供為使得本發明全面和完整，且將本發明的範圍充分傳達給本領域技術人員。本文中使用的術語僅是為了描述特定實施例的目的，且不打算成為示例性實施例的限制。除了上下文明確表示之外，本文使用的單數形式“一”和“該”打算也包括複數形式。應該進一步理解，在本說明書中使用的術語“包含（comprise）”和/或“包含（comprising）”指存在所陳述的特徵、整體、步驟、操作、元件和/或構件，但是不排除存在或附加一個或更多其他特徵、整體、步驟、操作、元件、構件和/或它們的組。
下文中，將參考附圖詳細描述示例性實施例。相同附圖標記將用於附圖中的相同構件，相同構件將不再描述。
在說明書的整個描述中，當描述某部件包括某構件時，除非有特定說明，不排除其他構件，而是可能其中還包括其他構件。此外，說明書中提到的諸如“單元”、“組”、“模組”和“塊”之類的術語表示執行至少一個功能或操作的單元，它們可通過硬體、軟體或其組合來實現。
本發明可同時獲得使得經由具有一個或多個階梯的波導所施加的電磁波聚集的效果和穩定地保持所產生的等離子體的效果。
這裏，高度表示對其施加電磁波的波導的一個方向上的長度，矮部表示長度縮短以使得電磁波在其上聚集的區域。
發明人發現在現有技術中，在高度連續或間斷降低的波導中產生電磁波的聚集效應，但該效應不足夠大。為了提高該效應，發明人已製造出一結構，其中在波導中設置至少一個或多個階梯以便通過諧振最大化電磁波的聚集效應，在波導的電磁波被最終反射的端部處形成矮部，在包括該矮部的區域中產生等離子體，從而實現等離子體的穩定性提高以及電磁波的聚集。在說明書中使用的階梯表示一種技術構造，其中波導的高度降低且再次增加，波導部分地包括矮部和高部。
作為一種技術構造，根據本發明一個實施例的波導，其末端波導的端部比第一波導短，兩者之間設置至少一個或多個階梯。如上所述，本說明書的階梯表示其高度降低且再次增加的結構。
第2圖是說明根據本發明一個實施例的波導的剖面圖。然而，本發明的範圍不限於以下波導的形狀。
參考第2圖，根據本發明的波導200形成為雙錐形結構，波導200包括第一高部210和第一錐形部220，其中由例如磁控管等的振盪器產生的電磁波施加到該第一高部210上，第一錐形部220連接到該第一高部210的端部且其高度以預定的角度降低。電磁波經由第一錐形部220聚集。
第一錐形部220的後端（這裏，後端表示對其施加電磁波的後端）設置有具有預定長度的平行結構的第二高部230，並且波導的高度經過該第一高部、該錐形部以及該第二高部（產生階梯）降低且再次增加。因此，聚集在第一錐形部220上的電磁波在第二高部230中產生諧振效應。在其高度以預定角度降低的現有波導中，當能量聚集且被反射時，能量正好從波導的一端反射到其另一端。然而，在根據本發明的波導中，當從能量被反射的方向上看去時，由於第二高度的下降部分（在第2圖中，指的是第一錐形部的後端部），使得不再允許反射。結果，電磁波在施加方向上更集中於第一高度的下降部分（位元於第一錐形部內）上。因此，由於一部分特定波長產生聚集並且消失，電場強度將隨著第二高度的下降部分（第二錐形部）的位置而改變，並且該電場比第一高度的下降部分的電場更強，從而電場強度在整體上增加了。第二高部的高度可設定為不同，但是從諧振效應的觀點出發，該高度最好比第一錐形部的後端部的高度h1高一些。
第二高部230的後端部設有第二錐形部240，以使得通過第二高部230的電磁波再次聚集，且該電磁波在與第二錐形部240的後端部連接的矮部250上聚集。此時，從波導的遠端250a反射的電磁波以及在通過兩個階梯（第一高部和第一錐形部之間的階梯以及第二高部和第二錐形部之間的階梯）之後被最大化的電磁波在矮部250處聚集並且被最大化。
第3圖是說明根據本發明另一實施例的波導的剖面圖。第二高部不具有預定長度，並且該波導具有連續的雙錐形部。即，波導包括第一高部210和第一錐形部220，第一錐形部220的端部直接設有第二錐形部240。即，在上述構造中，第二高部的長度為0，但是如第2圖所示形成了一個階梯（高度降低且再次增加的構造）。
在第2圖和第3圖中，公開了波導的階梯通過錐形結構來實現的技術構造，但是可以提供其中階梯僅僅通過垂直地降低高度來形成技術構造以代替錐形結構。
第4圖是說明根據本發明又一實施例的波導的剖面圖。
參考第4圖，波導包括位於第一高部410和第二高部430之間的另一矮部420。即，電磁波經由高度垂直降低的該矮部整流，且在第二高部430中產生電磁波的諧振效應。
接下來，第二高部430的後端部設有錐形部440，並且該電磁波經受諧振而聚集。錐形部440的後端部設有第二矮部450，從該端部反射的電磁波和經由錐形部聚集的電磁波在該矮部處聚集。
因此，根據本發明的大氣等離子體設備的等離子體發生區域（點）是包括末端設置在具有階梯的波導處的矮部的全部或至少一部分的區域。因此，產生的等離子體可被穩定地保持，即使所處理氣體的流率存在變化。
通過這種方式，階梯可以通過其預度長度的一部分在高度上以預定角度降低的錐形結構或高度垂直降低的結構來實現，並且穿過至少第一階梯的電磁波進入具有比第一階梯的體積更大的區域。本發明還包括一個或多個階梯，其中從末端矮部產生等離子體的任何波導包括在本發明的申請專利範圍的範圍內。
第5圖說明根據本發明一個實施例的波導的測試結果，第6圖說明其高度簡單且連續降低的波導的測試結果。
參考第5圖和第6圖，可以發現在根據本發明的包括一個或多個階梯的波導的端部（即包括矮部的錐形部）所產生的等離子體的強度（相應於圖中的E-場）大於根據現有技術的其高度連續降低而不具有任何階梯的波導所產生的等離子體的強度（第6圖上的紅色或黑色）。
根據本發明的大氣等離子體設備可同時獲得使經由具有一個或多個階梯的波導所施加的電磁波的聚集效應以及穩定地保持所產生的等離子體的效果。
雖然本發明已參照具體實施例進行了描述，但是對於本領域技術人員而言，在不背離由所列申請專利範圍限定的本發明的精神和範圍的情況下可以進行各種改變和變型。
The advantages, features, and aspects of the present invention will become apparent from the following description of the embodiments of the invention. However, the invention may be embodied in different forms and should not be construed as being limited to the embodiments set forth herein. Rather, these embodiments are provided so that this disclosure will be thorough and complete, and the scope of the invention will be The terminology used herein is for the purpose of describing particular embodiments and is not intended to The singular forms "a" and "the" It is to be understood that the term "comprise" and / or "comprising" as used in the specification means the presence of the stated features, integers, steps, operations, components and/or components, but does not exclude the presence or One or more other features, integers, steps, operations, elements, components, and/or groups thereof are added.
Hereinafter, exemplary embodiments will be described in detail with reference to the accompanying drawings. The same reference numerals will be used for the same components in the drawings, and the same components will not be described again.
Throughout the description of the specification, when a component is described as including a component, unless otherwise specified, other components are not excluded, and other components may be included therein. In addition, terms such as "unit", "group", "module" and "block" as used in the specification mean a unit that performs at least one function or operation, which can be implemented by hardware, software, or a combination thereof. .
The present invention can simultaneously obtain an effect of aggregating electromagnetic waves applied via a waveguide having one or more steps and an effect of stably maintaining the generated plasma.
Here, the height indicates the length in one direction of the waveguide to which electromagnetic waves are applied, and the short portion indicates the region in which the length is shortened so that electromagnetic waves are concentrated thereon.
The inventors have found that in the prior art, an aggregation effect of electromagnetic waves is generated in a highly continuous or intermittently reduced waveguide, but the effect is not large enough. In order to enhance this effect, the inventors have created a structure in which at least one or more steps are provided in the waveguide to maximize the effect of aggregation of electromagnetic waves by resonance, forming a dwarf at the end where the electromagnetic wave of the waveguide is finally reflected, A plasma is generated in a region including the dwarf, thereby achieving an improvement in stability of plasma and aggregation of electromagnetic waves. The step used in the specification denotes a technical configuration in which the height of the waveguide is lowered and increased again, and the waveguide partially includes a short portion and a high portion.
As a technical configuration, a waveguide according to an embodiment of the present invention has an end waveguide whose end portion is shorter than the first waveguide, and at least one or more steps are provided therebetween. As described above, the step of the present specification indicates a structure whose height is lowered and increased again.
Figure 2 is a cross-sectional view illustrating a waveguide in accordance with one embodiment of the present invention. However, the scope of the invention is not limited to the shape of the following waveguides.
Referring to FIG. 2, the waveguide 200 according to the present invention is formed into a double-cone structure, and the waveguide 200 includes a first high portion 210 and a first tapered portion 220 to which electromagnetic waves generated by an oscillator such as a magnetron or the like are applied. On the first upper portion 210, the first tapered portion 220 is coupled to the end of the first elevated portion 210 and its height is lowered at a predetermined angle. The electromagnetic waves are concentrated via the first tapered portion 220.
The rear end of the first tapered portion 220 (here, the rear end represents the rear end to which electromagnetic waves are applied) is provided with the second high portion 230 having a parallel structure of a predetermined length, and the height of the waveguide passes through the first high portion, The tapered portion and the second high portion (creating the step) are lowered and increased again. Therefore, the electromagnetic waves collected on the first tapered portion 220 generate a resonance effect in the second high portion 230. In an existing waveguide whose height is lowered at a predetermined angle, when energy is concentrated and reflected, energy is reflected from one end of the waveguide to the other end thereof. However, in the waveguide according to the present invention, when viewed from the direction in which the energy is reflected, due to the descending portion of the second height (in FIG. 2, referring to the rear end portion of the first tapered portion), This makes reflections no longer allowed. As a result, the electromagnetic wave is more concentrated in the application direction in the falling portion of the first height (the bit is in the first tapered portion). Therefore, since a part of the specific wavelength is generated and disappears, the electric field intensity will change with the position of the falling portion of the second height (the second tapered portion), and the electric field is stronger than the electric field of the falling portion of the first height, thereby The electric field strength is increased as a whole. The height of the second upper portion may be set to be different, but from the viewpoint of the resonance effect, the height is preferably higher than the height h1 of the rear end portion of the first tapered portion.
The rear end portion of the second high portion 230 is provided with the second tapered portion 240 such that electromagnetic waves passing through the second high portion 230 are again gathered, and the electromagnetic wave is connected to the dwarf portion of the rear end portion of the second tapered portion 240. Gathered on 250. At this time, the electromagnetic wave reflected from the distal end 250a of the waveguide and after passing through the two steps (the step between the first high portion and the first tapered portion and the step between the second high portion and the second tapered portion) The maximized electromagnetic waves are concentrated at the dwarf 250 and maximized.
Figure 3 is a cross-sectional view illustrating a waveguide in accordance with another embodiment of the present invention. The second high portion does not have a predetermined length, and the waveguide has a continuous double tapered portion. That is, the waveguide includes a first high portion 210 and a first tapered portion 220, and the end of the first tapered portion 220 is directly provided with the second tapered portion 240. That is, in the above configuration, the length of the second high portion is 0, but as shown in Fig. 2, a step (a structure in which the height is lowered and increased again) is formed.
In FIGS. 2 and 3, a technical configuration in which the step of the waveguide is realized by the tapered structure is disclosed, but it is possible to provide a technical configuration in which the step is formed by replacing the tapered structure only by vertically lowering the height.
Figure 4 is a cross-sectional view illustrating a waveguide in accordance with still another embodiment of the present invention.
Referring to FIG. 4, the waveguide includes another dwarf portion 420 between the first elevated portion 410 and the second elevated portion 430. That is, the electromagnetic wave is rectified by the dwarf whose height is vertically lowered, and the resonance effect of the electromagnetic wave is generated in the second high portion 430.
Next, the rear end portion of the second upper portion 430 is provided with a tapered portion 440, and the electromagnetic waves are subjected to resonance to gather. The rear end portion of the tapered portion 440 is provided with a second dwarf portion 450 at which electromagnetic waves reflected from the end portion and electromagnetic waves collected via the tapered portion are gathered.
Therefore, the plasma generating region (dot) of the atmospheric plasma apparatus according to the present invention is a region including all or at least a part of the dwarf whose end is provided at the waveguide having the step. Therefore, the generated plasma can be stably maintained even if there is a change in the flow rate of the treated gas.
In this way, the step can be realized by a tapered structure or a highly vertically reduced structure whose height is reduced by a predetermined angle in a part of the pre-length, and the electromagnetic wave passing through at least the first step enters the first step. Larger area. The invention also includes one or more steps, wherein any waveguide that generates a plasma from the end dwarf is included within the scope of the claimed invention.
Figure 5 illustrates the test results of the waveguide in accordance with one embodiment of the present invention, and Figure 6 illustrates the test results of the waveguide which is highly simple and continuously reduced.
Referring to Figures 5 and 6, it can be found that the intensity of the plasma generated at the end of the waveguide comprising one or more steps (i.e., the tapered portion including the dwarf portion) according to the present invention (corresponding to The E-field is greater than the intensity of the plasma generated by the waveguide whose height is continuously lowered without any step according to the prior art (red or black on Fig. 6).
The atmospheric plasma apparatus according to the present invention can simultaneously obtain an effect of aggregating effects of electromagnetic waves applied via a waveguide having one or more steps and stably maintaining the generated plasma.
While the invention has been described with respect to the specific embodiments thereof, various modifications and changes can be made by those skilled in the art without departing from the spirit and scope of the invention.
200．．．波導200. . . waveguide
210、410．．．第一高部210, 410. . . First high
220．．．第一錐形部220. . . First taper
230、430．．．第二高部230,430. . . Second high
240．．．第二錐形部240. . . Second tapered portion
250．．．矮部250. . . Dwarf
250a．．．波導的遠端250a. . . Far end of the waveguide
420．．．另一矮部420. . . Another dwarf
440．．．錐形部440. . . Tapered part
450．．．第二矮部450. . . Second dwarf
從以下與附圖結合的某些示例性實施例的描述中，本發明的上述和其他目的、特徵和優勢將變得顯而易見，在附圖中：
第1圖是說明在韓國專利申請公開No.10-2008-0033408（以下稱為現有技術）中公開的等離子體反應器的整體示意圖；
第2圖是說明根據本發明一個實施例的波導的剖面圖；
第3圖是說明根據本發明另一實施例的波導的剖面圖；
第4圖是說明根據本發明又另一實施例的波導的剖面圖；
第5圖說明根據本發明一個實施例的波導的測試結果；和
第6圖說明其高度簡單地連續降低的波導的測試結果。
The above and other objects, features and advantages of the present invention will become apparent from the <
Fig. 1 is a schematic overall view showing a plasma reactor disclosed in Korean Patent Application Laid-Open No. 10-2008-0033408 (hereinafter referred to as the prior art);
Figure 2 is a cross-sectional view illustrating a waveguide in accordance with one embodiment of the present invention;
Figure 3 is a cross-sectional view illustrating a waveguide in accordance with another embodiment of the present invention;
Figure 4 is a cross-sectional view showing a waveguide according to still another embodiment of the present invention;
Figure 5 illustrates the test results of the waveguide in accordance with one embodiment of the present invention; and Figure 6 illustrates the test results of the waveguide which is highly simply and continuously reduced.
200．．．波導200. . . waveguide
210、410．．．第一高部210, 410. . . First high
220．．．第一錐形部220. . . First taper
230、430．．．第二高部230,430. . . Second high
240．．．第二錐形部240. . . Second tapered portion
250．．．矮部250. . . Dwarf
250a．．．波導的遠端250a. . . Far end of the waveguide
Claims (4)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| TW100125987A TWI484871B (en) | 2011-07-22 | 2011-07-22 | Atmospheric plasma equipment and waveguide for the same |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| TW100125987A TWI484871B (en) | 2011-07-22 | 2011-07-22 | Atmospheric plasma equipment and waveguide for the same |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TW201306670A TW201306670A (en) | 2013-02-01 |
| TWI484871B true TWI484871B (en) | 2015-05-11 |
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| Application Number | Title | Priority Date | Filing Date |
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| TW100125987A TWI484871B (en) | 2011-07-22 | 2011-07-22 | Atmospheric plasma equipment and waveguide for the same |
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| Country | Link |
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| TW (1) | TWI484871B (en) |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH09295900A (en) * | 1996-02-19 | 1997-11-18 | Hitachi Ltd | Microwave plasma substrate processing equipment |
| TW413731B (en) * | 1997-04-25 | 2000-12-01 | Air Liquide | Device for exciting a gas by a surface wave plasma and gas treatment apparatus incorporating such a device |
| US7799119B2 (en) * | 2004-12-23 | 2010-09-21 | L'air Liquide, Societe Anonyme Pour L'etude Et L'exploitation Des Procedes Georges Claude | Microwave plasma exciters |
-
2011
- 2011-07-22 TW TW100125987A patent/TWI484871B/en active
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH09295900A (en) * | 1996-02-19 | 1997-11-18 | Hitachi Ltd | Microwave plasma substrate processing equipment |
| TW413731B (en) * | 1997-04-25 | 2000-12-01 | Air Liquide | Device for exciting a gas by a surface wave plasma and gas treatment apparatus incorporating such a device |
| US7799119B2 (en) * | 2004-12-23 | 2010-09-21 | L'air Liquide, Societe Anonyme Pour L'etude Et L'exploitation Des Procedes Georges Claude | Microwave plasma exciters |
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| TW201306670A (en) | 2013-02-01 |
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