1323807 九、發明說明： 【發明所屬之技術領域】 .本發_於-種液晶顯示面板及其修補方法，尤其是關於一 ：- 種使不良率最小化並提高生產率的液晶顯示面板的修補系統。 【先前技術】 液晶顯示裝置（LCD)依照視頻信號控制液晶材料的光線穿 透率（Hghttransmittance)以顯示影像。液晶顯示裝置包含有以陣 φ列狀排列的液晶單元之液晶顯示面板和用於驅動液晶顯示面板的 驅動電路。 • 依照驅統晶材料的電射向’液晶顯示裝置可分為兩種類 型。扭轉向列（twistednematic，則模式使用的是垂直方向的電 場，面内切換（in_plan switch，奶）赋使用的是水平方向的電 場。 對於扭轉向列模式’其透過相對排列於上、下基板的共同電 _極和晝料極關垂直電場驅驗晶材料。扭轉向賴式的開口 、率大’視角小。對於面内切換模式，其透過平行排列於下基板的 晝素電極和共_極間的平行電場驅動液晶材料。面内切麵式 的視角大，開口率小。 「第1圖」所示為先前技術扭轉向列模式液晶顯示面板的剖 面圖。如「第1圖」所示，先前技術扭轉向列模式液晶顯示面板工 匕3有上陣列基板2、下陣列基板32和液晶材料52，此液晶材料 52係注入於由上陣列基板2和下陣列基㈣2之間形成的空間。上 1323807 陣列基板2 (或稱彩色滤光片陣列基板）包含有：黑矩陣4，彩色 濾光片6，共同電極18和上配向膜8，上述的元件係依序地形成 於上陣列基板2上。下陣列基板32包含有薄膜電晶體（咖版 transistor ’ TFT)(在下文中皆用TFT作說明）、畫素電極16和下 配向膜38，上述元件皆形成於下陣列基板32上。 若液晶顯示面板1以面内切換模式被驅動，共同電極便形 成於下陣列基板32上。利用外塗層形成在上陣列基板2的彩色濾 光片6上，因面内切換模式的液晶顯示面板其共同電極係位於下 基板，故此外塗層用以補償彩色濾光片6因無共同電極的階梯狀 高度差。 在上陣列基板2中，黑矩陣4形成於上陣列基板2上，對應 於下陣列基板32的閘極線（gate lines)和資料線（dataHnes)(圖 未示）區域及薄膜電晶體區域。黑矩陣4用於防止漏光並吸收外 界光’從而產生增加對比度（contrast)的效果。彩色濾光片6形 成在一個單元區域，且彩色濾光片6延伸至黑矩陣4，並且單元區 域由黑矩陣4所分隔。包含紅（R)、綠（G)、藍（B)色濾光片 的彩色遽光片6用於實現紅、綠、藍三種顏色。在共同電極丨8加 載共同電壓以控制液晶材料52的運動。間隔粒（pattem spacer) 13用於產生保持上陣列基板2和下陣列基板32間的單元間隔(cell gap) ° 在下陣列基板32中，薄膜電晶體包含有沿著閘極線形成於下 1323807 陣列基板32上的閘極9 ;與閘極9重疊的半導體層14、47，閘極 絕緣層44位於閘極9與半導體層14、47之間；與資料線(圖未示) 一同形成的源極40/汲極42，半導體層14、47位於資料線與源極 40/汲極42之間。薄膜電晶體透過資料線將晝素信號傳輸至晝素電 極16以與閘極線的掃描信號產生反應。晝素電極16透過接觸孔 與薄膜電日日體的汲極42相連。鈍化層（passivatj〇n fjim) 形成 於晝素電極16與汲極42間並由具有高透光率的透明導電材料製 成。上配向膜8和下配向膜38用於定位液晶材料52，其透過使用 如聚醯亞胺（polyimide)的配向材料並透過摩擦製程（mbbing process)實現。 由先前技術的液晶顯示面板1中，若於上陣列基板2和下陣 列基板32的每個薄膜可能皆有缺陷發生，可透過再加工或者雷射 完成修補。然而，若有微小粒子牢固地固定在上陣列基板2和下 陣列基板32的薄膜之間，透過再加工或者雷射則很難完成修補。 「第2圖」所示為由空氣中的微粒產生配向缺陷的剖面圖，「第 3圖」所示為在清晰的畫面上由微粒導致的亮點的照片。 「第2圖」所示為在液晶顯示面板1的製程中產生的微粒55。 在形成指定的薄膜的密封腔内或者將其移動至單獨的密封腔或第 三點以形成另一個薄膜時’微粒55可能被牢固地固定在薄膜間， 例如「第2圖」所示的共同電極18和上配向薄膜8之間，便是如 此的加工製程情況。在摩擦製程中鄰近微粒55的配向薄膜8沒有 8 1323807 被均勻地摩擦，從而產生了不均勻的配向區域A。而且，在形成 彩色濾光片的製程中，部份彩色濾光片亦會被這種缺陷導致分 離°因此’混入微粒的問題頻繁發生。 在液晶顯示面板1中不均勻的配向區域A將導致漏光，而且 這種漏光阻擋了液晶材料的光穿透率。因此，如「第3圖」所示， 在液晶顯示面板巾出現亮點。暗點是實現高灰階時出現的黑暗區 域，而亮點是實現低灰階時由漏光產生_亮區域。相對於暗點 人眼對亮點更敏感Μ此’在機面板品f方面，對亮點的判斷 鮮比暗岐縣。具有亮點·關和板會贿棄掉或者會 受到減少銷量的遭遇。因此，需要—種能夠使由亮點導致的面板 不良率充分地最小化的修補方法。 【發明内容】 …馨於上述問題，本發_主要目的在於提供—種使亮點變暗1323807 IX. Description of the invention: [Technical field of the invention] The present invention relates to a liquid crystal display panel and a repairing method thereof, and more particularly to a repair system for a liquid crystal display panel which minimizes a defect rate and improves productivity . [Prior Art] A liquid crystal display device (LCD) controls the light transmittance (Hghttransmittance) of a liquid crystal material in accordance with a video signal to display an image. The liquid crystal display device includes a liquid crystal display panel in which liquid crystal cells are arranged in a matrix of φ and a driving circuit for driving the liquid crystal display panel. • The liquid crystal display device can be classified into two types according to the electric radiation of the crystal material. Twisted nematic, the mode uses a vertical electric field, and in-plane switching (in_plan switch, milk) uses a horizontal electric field. For the twisted nematic mode, its transmission is relatively arranged on the upper and lower substrates. The common electric _ pole and the sputum are connected to the vertical electric field to drive the crystal material. The twisted-to-relational opening has a large rate of view angle. For the in-plane switching mode, the bismuth electrode and the common _ pole are parallel arranged on the lower substrate. The parallel electric field drives the liquid crystal material. The in-plane tangent plane has a large viewing angle and a small aperture ratio. "Figure 1" shows a cross-sectional view of the prior art twisted nematic mode liquid crystal display panel. As shown in "Fig. 1," The prior art twisted nematic mode liquid crystal display panel process 3 has an upper array substrate 2, a lower array substrate 32, and a liquid crystal material 52 which is implanted into a space formed between the upper array substrate 2 and the lower array substrate (4) 2. The upper 1323807 array substrate 2 (or the color filter array substrate) includes a black matrix 4, a color filter 6, a common electrode 18 and an upper alignment film 8, and the above components are sequentially formed. The upper array substrate 32 includes a thin film transistor (TFT) (hereinafter, all of which is illustrated by a TFT), a pixel electrode 16 and a lower alignment film 38, and the above elements are all formed on the lower array substrate. 32. If the liquid crystal display panel 1 is driven in the in-plane switching mode, the common electrode is formed on the lower array substrate 32. The overcoat layer is formed on the color filter 6 of the upper array substrate 2 by the in-plane switching mode. The liquid crystal display panel has a common electrode on the lower substrate, so that the coating is used to compensate the step height difference of the color filter 6 due to the absence of the common electrode. In the upper array substrate 2, the black matrix 4 is formed on the upper array substrate 2 Upper, corresponding to the gate lines and data lines (not shown) regions of the lower array substrate 32 and the thin film transistor regions. The black matrix 4 is used to prevent light leakage and absorb external light' to increase contrast Effect of (contrast). The color filter 6 is formed in one unit area, and the color filter 6 extends to the black matrix 4, and the unit area is separated by the black matrix 4. Contains red (R), green (G), The color calender sheet 6 of the blue (B) color filter is used to realize three colors of red, green, and blue. A common voltage is applied to the common electrode 8 to control the movement of the liquid crystal material 52. Pattem spacer 13 is used for Generating a cell gap between the upper array substrate 2 and the lower array substrate 32. In the lower array substrate 32, the thin film transistor includes a gate 9 formed on the lower substrate 1323807 array substrate 32 along the gate line; The semiconductor layers 14, 47 having the gate 9 overlapped, the gate insulating layer 44 is located between the gate 9 and the semiconductor layers 14, 47; the source 40/drain 42 formed together with the data line (not shown), the semiconductor layer 14, 47 is located between the data line and the source 40/drain 42. The thin film transistor transmits a halogen signal to the halogen electrode 16 through the data line to react with the scanning signal of the gate line. The halogen electrode 16 is connected to the drain 42 of the thin film electric solar cell through the contact hole. A passivation layer (passivatj〇n fjim) is formed between the halogen electrode 16 and the drain 42 and is made of a transparent conductive material having high light transmittance. The upper alignment film 8 and the lower alignment film 38 are used to position the liquid crystal material 52 by using an alignment material such as polyimide and passing through a mbbing process. In the liquid crystal display panel 1 of the prior art, if defects may occur in each of the upper array substrate 2 and the lower array substrate 32, repair may be performed by reworking or laser. However, if fine particles are firmly fixed between the films of the upper array substrate 2 and the lower array substrate 32, it is difficult to complete the repair by reworking or laser. Fig. 2 is a cross-sectional view showing alignment defects caused by particles in the air, and Fig. 3 is a photograph showing bright spots caused by particles on a clear screen. "Fig. 2" shows the particles 55 generated in the process of the liquid crystal display panel 1. The particles 55 may be firmly fixed between the films during the formation of the sealed cavity of the specified film or by moving it to a separate sealed cavity or third point to form another film, such as the common image shown in Figure 2. Between the electrode 18 and the upper alignment film 8, this is the processing process. The alignment film 8 adjacent to the particles 55 in the rubbing process is uniformly rubbed without 8 1323807, thereby producing an uneven alignment region A. Moreover, in the process of forming a color filter, a part of the color filter is also caused to be separated by such a defect. Therefore, the problem of "mixing in particles" frequently occurs. The uneven alignment area A in the liquid crystal display panel 1 will cause light leakage, and this light leakage blocks the light transmittance of the liquid crystal material. Therefore, as shown in "Fig. 3", a bright spot appears on the liquid crystal display panel. The dark spot is the dark area that appears when high gray level is achieved, and the bright spot is the bright area produced by light leakage when low gray level is achieved. Relative to the dark spot The human eye is more sensitive to the bright spots. In terms of the machine panel product f, the judgment of the bright spot is much better than that of the dark county. There are highlights, closures and boards that will be bribed or will suffer from reduced sales. Therefore, there is a need for a repair method capable of sufficiently minimizing panel defect rate caused by bright spots. [Summary of the Invention] ...in addition to the above problems, the main purpose of the present invention is to provide a kind of darkening of bright spots
以提高液晶顯示面板的合格率的液晶顯示面板及其修補方法。 因此’為達上述目的’本發明所揭露之—種液晶顯示面板， 有基板，位於基板上的孔，其與一亮點所在的區域對 應；及填充孔的不透明物質。 本發月所揭路之-種包含—基板的液晶顯示面板的修補方 法’包含有：探測與—亮輯應的區域；在基板上形成-孔，其 位於與免點對應的區及在孔魄林透明物質。 有關本發·特徵與實作，聽合圖式作最佳實施例詳細說 1323807 明如下。 【實施方式】 以下將依照附圖詳細描述本發明的實施例。 「第4A圖」和「第4B圖」所示為依照本發明實施例之液晶 顯示面板的剖面圖。「第4A圖」所示為下基板中形成的微孔，「第 4B圖」所示為上基板中形成的微孔。 如「第4A圖」和「第4B圖」所示，依照本發明實施例之液 晶顯示面板170包含有上陣列基板1〇2、下陣列基板132和液晶材 料152。上陣列基板（或稱彩色濾光陣列基板）1〇2包含黑矩陣 1〇4、彩色濾光片106、共同電極118、間隔粒113和上配向膜1〇8， 上述元件依序地形成於上陣列基板1〇2上。下陣列基板（或稱薄 膜電晶體基板）132包含薄膜電晶體（ωηίΠιηίι^η^ί〇Γ，下文中 稱TFT)、畫素電極ι16和下配向膜138，上述元件形成於下陣列 基板132上。液晶材料152被注入上陣列基板1〇2和下陣列基板 132間的内部空間。 在上陣列基板102中，黑矩陣丨〇4形成於下陣列基板132的 閉極線（gate lines )和資料線（data lines)(圖未示）區域及薄膜 電晶體區域中。彩色濾光片1〇6形成在上陣列基板1〇2的一個單 兀區域。黑矩陣104由混合有碳系顏料的聚醯亞胺（polyimide) 形成’用以防止漏光並吸收外界光，從而產生增域比度的效果。 彩色遽光片1G6延伸至黑矩陣1G4，單元區域由黑矩陣1〇4所分 1323807 隔。包含紅、綠、藍色濾光片的彩色濾光片106實現紅、綠、藍 三種色彩。在共同電極118上載入共同電壓以控制液晶顯示材料 152的運動。間隔粒（pattern spacer) 113用於保持上陣列基板和 下陣列基板間的間隔（cellg^>)。 在下陣列基板132中，薄膜電晶體包含有沿著閘極線形成的 閘極109 ;與閘極109重疊的半導體層114、147，閘極絕緣層144 位於閘極109與半導體層114、147之間；與資料線(圖未示)一同 形成的源極140/沒極142，半導體層114、147位於資料線與源極 140/沒極142之間。薄膜電晶體透過資料線將畫素信號傳輸至晝素 電極116以與閘極線的掃描信號產生反應。 晝素電極116透過畫素電極116與汲極142間的鈍化層15〇 與薄膜電晶體的汲極142連接。畫素電極116由具有高透光率的 透明導電材料製成。上配向膜1〇8和下配向膜138被用於定位液 晶材料152’其透過使用如聚醯亞胺的配向材料並透過摩擦製程實 現。若以面内切換模式驅動液晶顯示面板17〇，共同電極118便形 成於下陣列基板132上。利用外塗層形成在上陣列基板1〇2的彩 色濾光片106上，因面内切換模式的液晶顯示面板其共同電極係 位於下基板，故此外塗層用以補償了彩色濾光片1〇6因無共同電 極的階梯狀高度差。 在由於液晶顯示面板170中摻雜微粒155而導致液晶顯示面 板no產生缺陷的區域内可能產生亮點。液晶顯示面板17〇具有 11 1323807 一個形成於上陣列基板102或下陣列基板132上的微孔165，此微 孔165對應於亮點產生的區域。不透明物質260填充微孔165的 部分空間。透明物質270填充不透明物質填充微孔165之後的剩 餘部分。如「第4B圖」所示，微孔165形成於上陣列基板1〇2上， 並填充有不透明物質260和透明物質270。 「第5A圖」顯示了填充在微孔165裏的不透明物質260阻止 光從背光模組120照射到「第4A圖」的液晶顯示面板no上。背 光模組120位於在「第5A圖」中的下陣列基板132的背面。由於 光被阻擋’使液晶顯示面板17〇的配向缺陷區域也就是亮點產生 的區域有可能變暗。 在「第5A圖」中’不透明物質260只填充部分微孔165。在 「第5B圖」中，不透明物質完全填充微孔165。從背光模組120 照射到產生亮點的區域的光被阻擋。此外，從背光模組12〇照射 到微孔165鄰近的單元的光也被不透明物質26〇阻擋。因此，鄰 近微孔165的單元的開口率減小。因此，不透明物質26〇只填充 微孔165的某些部份比完全填滿的效果更佳。 在「第6A圖」、「第6B圖」、「第6C圖」、「第6D圖」和「第 6E圖」中顯示了一種修補「第4A圖」中的第一實施例的液晶顯 不面板的方法。在「第6入圖」至「第6E圖」中，微孔165形成 於下陣列基板132上。因此，「第6A圖」至「第6E圖」中，為了 闡釋的方便，將整個結構旋轉18〇度，使下陣列基板132置於上A liquid crystal display panel and a repairing method thereof for improving the yield of a liquid crystal display panel. Therefore, the liquid crystal display panel disclosed in the present invention has a substrate, a hole on the substrate corresponding to a region where a bright spot is located, and an opaque substance filling the hole. The method for repairing a liquid crystal display panel including a substrate includes a region for detecting and brightening; forming a hole on the substrate, which is located in a region corresponding to the point-free and in the hole forest Transparent substance. Regarding the present invention, features and implementations, the best embodiment of the listening and diagram is described in detail in 1323807. [Embodiment] Hereinafter, embodiments of the present invention will be described in detail in accordance with the accompanying drawings. Fig. 4A and Fig. 4B are cross-sectional views showing a liquid crystal display panel in accordance with an embodiment of the present invention. "Fig. 4A" shows the micropores formed in the lower substrate, and Fig. 4B shows the micropores formed in the upper substrate. As shown in "Fig. 4A" and "Fig. 4B", the liquid crystal display panel 170 according to the embodiment of the present invention includes an upper array substrate 1, a lower array substrate 132, and a liquid crystal material 152. The upper array substrate (or color filter array substrate) 1〇2 includes a black matrix 1〇4, a color filter 106, a common electrode 118, spacer particles 113, and an upper alignment film 1〇8, and the above elements are sequentially formed on Upper array substrate 1〇2. The lower array substrate (or thin film transistor substrate) 132 includes a thin film transistor (hereinafter referred to as TFT), a pixel electrode ι16, and a lower alignment film 138, and the above-described elements are formed on the lower array substrate 132. . The liquid crystal material 152 is injected into the internal space between the upper array substrate 1〇2 and the lower array substrate 132. In the upper array substrate 102, black matrix turns 4 are formed in the gate lines and data lines (not shown) regions of the lower array substrate 132 and in the thin film transistor region. A color filter 1〇6 is formed in a single turn region of the upper array substrate 1〇2. The black matrix 104 is formed of polyimide mixed with a carbon-based pigment to prevent light leakage and absorb external light, thereby producing an effect of increasing the aspect ratio. The color calender 1G6 extends to the black matrix 1G4, and the cell area is divided by the black matrix 1〇4 by 1323807. The color filter 106 including red, green, and blue filters realizes three colors of red, green, and blue. A common voltage is applied to the common electrode 118 to control the movement of the liquid crystal display material 152. A spacer spacer 113 is used to maintain a space (cellg^>) between the upper array substrate and the lower array substrate. In the lower array substrate 132, the thin film transistor includes a gate 109 formed along the gate line; a semiconductor layer 114, 147 overlapping the gate 109, and a gate insulating layer 144 is located at the gate 109 and the semiconductor layers 114, 147 A source 140/nopole 142 is formed together with a data line (not shown), and the semiconductor layers 114 and 147 are located between the data line and the source 140/no. The thin film transistor transmits a pixel signal to the halogen electrode 116 through the data line to react with the scanning signal of the gate line. The halogen electrode 116 is connected to the drain 142 of the thin film transistor through the passivation layer 15A between the pixel electrode 116 and the drain 142. The pixel electrode 116 is made of a transparent conductive material having high light transmittance. The upper alignment film 1 〇 8 and the lower alignment film 138 are used to position the liquid crystal material 152' by using an alignment material such as polyimide and through a rubbing process. When the liquid crystal display panel 17 is driven in the in-plane switching mode, the common electrode 118 is formed on the lower array substrate 132. The overcoat layer is formed on the color filter 106 of the upper array substrate 1〇2, and the common electrode of the liquid crystal display panel of the in-plane switching mode is located on the lower substrate, so that the coating layer is used to compensate the color filter 1 〇6 because there is no stepped height difference of the common electrode. Bright spots may be generated in a region where the liquid crystal display panel no is defective due to the doping of the fine particles 155 in the liquid crystal display panel 170. The liquid crystal display panel 17 has 11 1323807 a micro hole 165 formed on the upper array substrate 102 or the lower array substrate 132, and the micro hole 165 corresponds to a region where the bright spot is generated. The opaque substance 260 fills a portion of the space of the micropores 165. The transparent substance 270 fills the remaining portion after the opaque substance fills the micropores 165. As shown in "Fig. 4B", the micro holes 165 are formed on the upper array substrate 1A2 and filled with the opaque substance 260 and the transparent substance 270. "5A" shows that the opaque substance 260 filled in the micro holes 165 prevents light from being irradiated from the backlight module 120 to the liquid crystal display panel no of "Fig. 4A". The backlight module 120 is located on the back surface of the lower array substrate 132 in "Fig. 5A". Since the light is blocked, the area where the alignment defect area of the liquid crystal display panel 17 is, that is, the bright spot, may be darkened. In the "Fig. 5A", the opaque substance 260 is filled only with a part of the micropores 165. In "Fig. 5B", the opaque substance completely fills the micropores 165. Light that is irradiated from the backlight module 120 to the area where the bright spots are generated is blocked. Further, light that is irradiated from the unit adjacent to the micro holes 165 from the backlight module 12 is also blocked by the opaque substance 26A. Therefore, the aperture ratio of the cells adjacent to the micro holes 165 is reduced. Therefore, it is better for the opaque substance 26 to fill only some portions of the micropores 165 than to completely fill them. In "Picture 6A", "6B", "6C", "6D" and "6E", a liquid crystal display of the first embodiment in "Phase 4A" is shown. The method of the panel. In the "6th drawing" to the "6Eth drawing", the micro holes 165 are formed on the lower array substrate 132. Therefore, in "6A" to "6E", for the convenience of explanation, the entire structure is rotated by 18 degrees to place the lower array substrate 132 thereon.
12 1323807 陣列基板102上方。在另一個實施例中，微孔165形成於上陣列 基板102上，或根據需要分別形成於上陣列基板1〇2和下陣列基 板132上。 在「第6A圖」中’由於在共同電極和上配向膜間摻 雜有微粒155，所以液晶顯示面板no中產生亮點。因此，微孔 165形成於下陣列基板132上的與亮點產生位置對應的區域。 在本貫施例中’微孔165是用微鑽形成。此微孔165之尺寸 依照液晶顯示面板170的尺寸和微粒155導致的漏光程度，微孔 165尺寸範圍從20//m至500/zm。依照微粒155的形狀微鑽可使 用能夠形成圓形微孔和直線形微孔的末端。微銑（micr〇mining) 也可單獨或與微鑽一同作為形成微孔165的設備。微銑可以形成 精確的、具有多種形狀的微孔165。 在另一實施例中，可透過雷射形成微孔165。在「第6B圖」 中’雷射161用來形成微孔165。雷射161包括波長為266nm的 鈦.紀銘石權石雷射(Neodymium: Yttrium Aluminum Garnet12 1323807 Above the array substrate 102. In another embodiment, the microvias 165 are formed on the upper array substrate 102 or are formed on the upper array substrate 1〇2 and the lower array substrate 132, respectively, as needed. In "Fig. 6A", since the fine particles 155 are doped between the common electrode and the upper alignment film, bright spots are generated in the liquid crystal display panel no. Therefore, the micro holes 165 are formed on the lower array substrate 132 in a region corresponding to the bright spot generation position. In the present embodiment, the micropores 165 are formed using microdrills. The size of the micro holes 165 is in accordance with the size of the liquid crystal display panel 170 and the degree of light leakage caused by the particles 155, and the size of the micro holes 165 ranges from 20/m to 500/zm. Micro-drilling in accordance with the shape of the particles 155 can be used to form the ends of the circular micropores and the linear micropores. Micro-milling can also be used as a device for forming micro-holes 165, either alone or in combination with micro-drilling. Micro-milling can form precise, multi-shaped micropores 165. In another embodiment, the microholes 165 can be formed by laser. In "Fig. 6B", the laser 161 is used to form the micro holes 165. Laser 161 includes titanium with a wavelength of 266 nm. Neodymium: Yttrium Aluminum Garnet
Laser)。也可以使用其它具有波長在邮間的雷射。 在「第6C圖」中，可將彩色顏料410如黑色或灰色顏料用喷 墨方式（inkjet)注入形成於下陣列基板132上的微孔165中。微 孔165内填充有彩色顏料410«»彩色顏料410可包含有彩色濾光片 106使用的材料’或者與彩色濾光片1〇6色彩一致的材料。如「第 6C圖」所示，彩色顏料410的注入填充了微孔165的某些部分。 1323807 在「第6D圖」中’透明顏料420在彩色顏料410被注入微孔 165後再注入微孔165。透明顏料420填充所示的微孔165的其餘 部分如「第6E圖」所示。 如上所述’當液晶顯示面板170出現亮點後，可用微鑽16〇、 微銑或者雷射器在下陣列基板132上形成微孔165。微孔165位於 在液晶顯示面板170上與亮點相應的區域。彩色顏料41〇填充到 已形成的微孔165中使免點變暗，以使從背光模組12〇 (「第5A 圖」到「第5B圖」）發出的光不能通過液晶顯示面板17〇。因此， 可以降低壳點的產生率，並使不良率降低到最小。所以可以提高 液晶顯示面板170的成品率。 「第7A圖」、「第7B圖」、「第7C圖」和「第7D圖」所示為 第二實施例修補「第4A圖」中液晶顯示面板17〇的方法。在「第 7A圖」至「第7D圖」中，為了方便描述，將整個結構旋轉18〇 度，使下陣列基板132位於在上陣列基板1〇2上方位置。「第7A 圖」中，微孔165中注入的為如黑色或灰色的彩色顏料“ο。 在「第7B圖」中，彩色顏料410完全充滿了微孔165並略微 地覆蓋了下陣列基板132的表面。在「第7C圖」中，可使用蝕刻 劑（etchant)移除微孔165上部的彩色顏料41〇。因此彩色顏料 410只在如「第7D圖」所示的微孔165的底部有殘存。將部分彩 色顏料410從微孔165中移除之後，如前述的「第6c圖」與「第 6D圖」所示，使用透明顏料42〇填充微孔165的其餘部分。 1323δϋ/ …18Α圖」、「第8Β圖」、「第8c圖」和「第犯圖」所示為 第二貫施例之修補「第4八圖」中液晶顯示面板請的方法。在「第 8A圖」至「第8D圖」中，為了方便描述，將整個結構旋轉⑽ 度，使下陣列基板132位於上陣列基板1〇2上方。在「第8a圖」 中’彩色電極顏料51〇沉積在下陣列基板132上的微孔⑹中。 如第8A圖」所不，彩色電極顏料510也沉積下陣列基板132 的表面上。採用沉積的方法，彩色電極顏料51G包含有黑色的電 極材料如鉻（ehrome，〇·)或翻（mQlybdenum，Mq)。 在「第8B圖」中，可使用姓刻劑移除下陣列基板132上的彩 色電極顏料510。在「第8C圖」中所示為侧的結果，微孔⑹ 中仍有部分殘留有彩色電極顏料51〇。由於在下陣列純I%上形 成的微孔165沒有完全紐τ_基板132，侧趣法接觸到填 充於微孔165巾的全部彩色電_料跡所崎觀165中底部 的彩色電極顏料510，如「第8C圖」所示，不輕易地被移除彩色 電極顏料。另-方面，沉積在下陣列基板132表面上的彩色電極 顏料510很容易用鞋刻劑移除。在侧後，如「第8d圖」所示， 利用透明顏料520填充微孔165的剩餘部分。 在本貫施例中，可使用如真空沉積法的沉積方法沉積彩色電 極顏料510。真空沉積法也可用於之前描義具有與彩色滤光片 106使用的材料’或者與彩色濾光片ι〇6色彩一致的彩色顏料。另 外，除真空沉積法之外，亦可用喷射製程（sprayingpr〇cess)和濺 15 鍍製程（sputtering)等來達成。 一 ’j述的第第—和第二實施例的方法’可用於多種液晶顯 丁面板如電控雙折射液晶面板（eiectrical c〇ntr〇lled birefrlngenCe’ECB)’ 垂直配向模式(vertical alignment，VA)、面内 切換模式和扭轉向列模式的液晶面板。 如上所述’當液晶顯示面板上產生亮點時，可分別在下基板、 上基板或_在兩基板上賴鑽、微贼雷卿舰孔。微孔位 於液晶顯示面板上與亮點對應的區域。填充在微孔裏的彩色顏料 或者彩色電_料使亮點變暗喊從背光漁發出的光不能通過 液晶面板。因此可降低亮關產生率，並使不良率最小。因 此，可液晶顯示面板修補’並使其市場_得到聯。因此提高 了液晶顯示面板的合格率。 雖然本發明以前述之較佳實施例揭露如上，然其並非用以限 疋本發明，任何熟習相像技藝者，在不脫離本發明之精神和範圍 内，#可作些許之更動與潤飾，因此本發明之專利保護範圍須視 本說明書所附之申請專利範圍所界定者為準。 【圖式簡單說明】 「第1圖」為先前技術i扭轉向列模式的液晶顯示面板的剖面 圖。 「第2圖」為由空氣中的微粒導致的配向疵點的剖面圖。 「第3圖」為「第2圖」中的亮點瑕疵的照片。 丄J厶JO\J / 「第 4A 圖·ίτ»「 」 第4Β圖」為本發明第一實施例之液晶顯示 面板的剖面圖。 「第 5Α 圖 I Γ 固」和第5B圖」為光由背光模組照射入微孔的剖 面圖。 第6A圖」、「第6B圖」、「第6C圖」、「第6D圖」和「第 6E圖」為本發明第一實施例之修補「第 4A.圖」中的液晶顯示面 板的方法的剖面圖。 「第7A圖」、「第7B圖」、「第7C圖」和「第7D圖」為本 發明第二實施例之修補「第4A圖」中的液晶顯示面板的方法的剖 面圖。 「第8A圖」、「第8B圖」、「第8C圖」和「第8D圖」為本 發明第三實施例之修補「第4A圖」中的液晶顯示面板的方法·的剖 面圖。 【主要元件符號說明】 卜170 液晶顯示面板 2、102 上陣列基板 4、104 黑矩陣 6、106 彩色濾光片 8、108 上配向膜 9、109 閘極 13 、 113 間隔粒 17 1323807Laser). Other lasers with wavelengths in the post can also be used. In "Fig. 6C", a color pigment 410 such as a black or gray pigment may be injected into the micropores 165 formed on the lower array substrate 132 by inkjet. The micropores 165 are filled with a color pigment 410 «» color pigment 410 which may comprise a material used by the color filter 106 or a material conforming to the color of the color filter 1〇6. As shown in "Fig. 6C", the injection of the color pigment 410 fills some portions of the micropores 165. 1323807 In "Fig. 6D", the transparent pigment 420 is injected into the micropores 165 after the color pigment 410 is injected into the micropores 165. The transparent pigment 420 fills the remaining portion of the micropores 165 shown as shown in Fig. 6E. As described above, when the liquid crystal display panel 170 appears bright, the micro holes 165 can be formed on the lower array substrate 132 by micro-drilling, micro-milling or laser. The micro holes 165 are located on the liquid crystal display panel 170 in a region corresponding to a bright spot. The color pigment 41 is filled in the formed micropores 165 to darken the dots so that light emitted from the backlight module 12 ("5A" to "5B") cannot pass through the liquid crystal display panel 17 . Therefore, the generation rate of the shell point can be lowered and the defect rate can be minimized. Therefore, the yield of the liquid crystal display panel 170 can be improved. "7A", "7B", "7C" and "7D" are diagrams showing a method of repairing the liquid crystal display panel 17A in "4A" in the second embodiment. In the "Fig. 7A" to "Fig. 7D", for the convenience of description, the entire structure is rotated by 18 degrees so that the lower array substrate 132 is positioned above the upper array substrate 1?. In the "Picture 7A", the micropores 165 are filled with a color pigment such as black or gray. "In the "Fig. 7B", the color pigment 410 completely fills the micropores 165 and slightly covers the lower array substrate 132. s surface. In "Fig. 7C", the color pigment 41 上部 on the upper portion of the micropores 165 can be removed using an etchant. Therefore, the color pigment 410 remains only at the bottom of the micropores 165 as shown in "Fig. 7D". After the part of the color pigment 410 is removed from the micropores 165, the remaining portion of the micropores 165 is filled with a transparent pigment 42 as shown in the above "Fig. 6c" and "Fig. 6D". 1323 δ ϋ / ... 18 Α 」 , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , In the "Fig. 8A" to "8D", for the convenience of description, the entire structure is rotated by 10 degrees so that the lower array substrate 132 is positioned above the upper array substrate 1?. In "Fig. 8a", the color electrode pigment 51 is deposited in the micropores (6) on the lower array substrate 132. As shown in Fig. 8A, the color electrode pigment 510 is also deposited on the surface of the lower array substrate 132. By the deposition method, the color electrode pigment 51G contains a black electrode material such as chrome (erome) or mQlybdenum (Mq). In "Fig. 8B", the color electrode pigment 510 on the lower array substrate 132 can be removed using the surname engraving. As a result of the side shown in "Fig. 8C", a part of the micropores (6) still has a color electrode pigment 51 残留 remaining. Since the micropores 165 formed on the lower array pure I% do not have the complete 纽_substrate 132, the side is contacted with the color electrode pigment 510 filled in the bottom of all the color electric ray traces 165 of the micropores 165, As shown in "Fig. 8C", the color electrode pigment is not easily removed. On the other hand, the color electrode pigment 510 deposited on the surface of the lower array substrate 132 is easily removed with a shoe polish. After the side, as shown in "Fig. 8d", the remaining portion of the micropores 165 is filled with the transparent pigment 520. In the present embodiment, the color electrode pigment 510 can be deposited using a deposition method such as a vacuum deposition method. The vacuum deposition method can also be used to previously describe a color pigment having a color similar to that used for the color filter 106 or a color filter ι. Further, in addition to the vacuum deposition method, it is also possible to use a spraying process (spraying) and a sputtering process. The 'first and second method' can be applied to a variety of liquid crystal display panels such as electronically controlled birefringent liquid crystal panels (eiectrical c〇ntr〇lled birefrlngenCe'ECB)' vertical alignment mode (vertical alignment, VA ), in-plane switching mode and twisted nematic mode LCD panel. As described above, when a bright spot is generated on the liquid crystal display panel, the hole may be drilled on the lower substrate, the upper substrate, or the two substrates, respectively. The micro holes are located on the liquid crystal display panel corresponding to the bright spots. The color pigments filled in the micropores or the color electricity make the bright spots darker and the light emitted from the backlight cannot pass through the liquid crystal panel. Therefore, the brightness generation rate can be reduced and the defect rate can be minimized. Therefore, the liquid crystal display panel can be repaired and the market can be linked. Therefore, the yield of the liquid crystal display panel is improved. Although the present invention has been described above in terms of the preferred embodiments thereof, it is not intended to limit the scope of the present invention, and it is possible to make some modifications and refinements without departing from the spirit and scope of the present invention. The patent protection scope of the present invention is defined by the scope of the patent application attached to the specification. BRIEF DESCRIPTION OF THE DRAWINGS "FIG. 1" is a cross-sectional view of a liquid crystal display panel of the prior art i twisted nematic mode. "Fig. 2" is a cross-sectional view of the alignment defect caused by particles in the air. "Picture 3" is a photo of the highlight in "Picture 2".丄J厶JO\J / "4A Fig. ίτ» "" Fig. 4 is a cross-sectional view of the liquid crystal display panel of the first embodiment of the present invention. "Fig. 5 I 固" and Fig. 5B" are cross-sectional views of light being irradiated into the micropores by the backlight module. 6A, 6B, 6C, 6D, and 6E are methods for repairing a liquid crystal display panel in "4A. Figure" according to the first embodiment of the present invention Sectional view. "7A", "7B", "7C" and "7D" are cross-sectional views showing a method of repairing the liquid crystal display panel in "FIG. 4A" according to the second embodiment of the present invention. "8A", "8B", "8C" and "8D" are cross-sectional views showing a method of repairing the liquid crystal display panel in "Ath 4A" according to the third embodiment of the present invention. [Main component symbol description] 卜 170 liquid crystal display panel 2, 102 upper array substrate 4, 104 black matrix 6, 106 color filter 8, 108 upper alignment film 9, 109 gate 13 , 113 spacer particles 17 1323807
14 >47 Ί14 Ί47 半導體層 16、116 晝素電極 18 、 118 共同電極 32、132 下陣列基板 38 ' 138 下配向膜 40、140 源極 42、142 汲極 44、144 絕緣層 50、150 鈍化層 52 ' 152 液晶材料 55 ' 155 微粒 120 背光模組 160 微鑽 161 雷射 165 微孔 260 不透明物質 270 透明物質 410 彩色顏料 420'520 透明顏料 510 彩色電極顏料 R 紅色遽光片 18 1323807 G 綠色遽光片 B 藍色應光片 A 配向區域 1914 >47 Ί14 Ί47 semiconductor layer 16,116 germanium electrode 18, 118 common electrode 32, 132 lower array substrate 38' 138 lower alignment film 40, 140 source 42, 142 drain 44, 144 insulating layer 50, 150 passivation Layer 52 ' 152 Liquid Crystal Material 55 ' 155 Particle 120 Backlight Module 160 Micro Drill 161 Laser 165 Micro Hole 260 Opaque Material 270 Transparent Material 410 Color Pigment 420'520 Transparent Pigment 510 Color Electrode Pigment R Red Matte Sheet 18 1323807 G Green Twilight sheet B blue light sheet A alignment area 19