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TWI322042B - Method and apparatus for producing film from polymer solution, and optical polymer film - Google Patents

Method and apparatus for producing film from polymer solution, and optical polymer film Download PDF

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TWI322042B
TWI322042B TW93121244A TW93121244A TWI322042B TW I322042 B TWI322042 B TW I322042B TW 93121244 A TW93121244 A TW 93121244A TW 93121244 A TW93121244 A TW 93121244A TW I322042 B TWI322042 B TW I322042B
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film
average
thickness
casting
polymer
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TW93121244A
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TW200603903A (en
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Tadahiro Tsujimoto
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Fujifilm Corp
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1322042 九、發明說明: 【發明所屬之技術領域】 本發明關於一種光學聚合物薄膜,及一種製造薄膜(而 且更特別是具光學性質之光學聚合物薄膜)之方法與裝置, 及一種製造光學聚合物薄膜(其作爲偏光過濾器保護膜,用 於光學功能膜及液晶顯示器)之方法與裝置。 【先前技術】 液晶顯示器(以下稱爲LC D )係由液晶管、偏光元件及 光學補償片(雙折射片)構成。在透光型LCD中,在液晶 管兩側提供兩個偏光元件,及將一或兩片光學補償片配置於 液晶管與偏光元件之間。在反射型LCD中,將反射片、液 晶管、光學補償片、與偏光元件按此次序重疊。 液晶管係由棒狀液晶分子、用於容納其之兩個基板、及 用於對棒狀分子施加電壓之電極層構成。有數種顯示模式型 式之液晶管,其視所使用液晶分子之定向狀況而使用。例如 ,作爲透光型,有TN (扭轉向列)、IPS (平面中切換)、 FLC (鐵電性液晶)、OCB (光學補償彎曲)、STN (超扭 轉向列)、VA (垂直排列)等,及作爲反射型,有TN (扭 轉向列)、HAN (混合排列向列)等。偏光元件通常具有兩 片透明保護膜附著於偏光膜之兩個表面之結構。 此外,光學補償片用於許多液晶顯示器中以減少顯示影 像之不規則變色,或將視角放大。在光學補償片中,優先使 用藉由拉伸或抽拉而得之雙折射膜。除了含雙折射膜之光學 補償片,近年來提議使用具光學各向異性之光學補償片,其 1322042 在透明基板上提供液晶分子(特別是盤型液晶分子)。 爲了提供光學各向異性而製造且固定液晶分子之定向 。在此情形,液晶分子具有可聚合基,而且爲了固定而實行 液晶分子之聚合。此液晶分子具有大雙折射,而且顯示數種 定向。利用這些特性可提供具有使用先行技藝薄膜無法.得到 之光學性質之光學補償片。 光學補償片之光學性質係依照液晶管之光學性質(具體 而言,上述之顯示模式)決定。因而在使用液晶分子(特別 是盤型液晶分子)時,製造之光學補償片可具有對應液晶管 之顯示模式之數種光學性質。在許多專利申請案中提議數種 顯示模式之光學補償片,其中使用盤型液晶分子。例如,曰 本專利公開公告第 6-214116號 '美國專利第 5583679、 5646703號、及德國專利申請案公告第391162 0Α1號教示用 於ΤΝ模式液晶管之光學補償片。日本專利公開公告第1 〇_ 54982號教示用於IPS模式或FLC模式液晶管之光學補償片 。此外,美國專利第 5 8 052 5 3號及國際專利申請案第 96/37804號教示用於OCB模式液晶管與HAN模式液晶管之 光學補償片,日本專利公開公告第9-26572專利教示用於 STN模式液晶管之光學補償片,及日本專利第2866372號教 示用於VA模式液晶管之光學補償片。 然而,雖然有許多種液晶分子之定向方式,唯以上之液 晶各向異性有時無法光學地補償液晶管。美國專利第 5 646703號設定液晶分子及光學補償片之透明基板均具有光 學各向異性。如此將此液晶管光學地補償。 1322042 爲了許多種光學用途而對以上之產品提供數種功能極 有進展。在此光學用途產品(如這些LCDs)之進展中,必 須使構成產品各層之薄膜具有以高準確性均勻地控制之厚 度’及光學性質之均勻性。例如,偏光過濾器保護膜之厚度 不均勻性(或厚度集結)造成在附著於偏光元件時發生翹曲 ,在附著後之捲曲形偏光過濾器等。此外,光學膜塗有表面 保護用硬塗層及防止反射用抗反射層。厚度不均勻性經常造 成不均勻塗層(或塗層集結)。特別地,在循環地發生不均 勻性(或集結)時,LCD顯示之影像品質變成極差。日本專 利公開公告第2002-234042與2002-1745號各教示一種溶液 鑄造法作爲製造薄膜之方法,其中進一步改良厚度均勻性。 然而,近來雖然逐漸需要較薄之厚度與較大量之重疊薄 膜及生產力改良,以較高準確性控制由聚合物製造之薄膜之 厚度爲必要的。因而生產力未充分地改良且製造之薄膜無法 具有均勻之厚度及均勻之光學性質。此外,在光學性質(特 別是雙折射之阻滯値Re、Rth )不均勻時,對產品之影響大 。例如,在LCD中有時發生變淡及反轉,而且在此光學補 償片用於LCD以將視角放大時,有時發生視角之變化及顏 色反轉。 【發明內容】 本發明之一個目的爲提供一種製造薄膜之方法,其中降 低光學膜之厚度與雙折射不均勻性,而且光學性質優良。 本發明之另一個具體實施例爲提供一種製造薄膜之裝 置,其中降低光學膜之厚度與雙折射不均勻性,而且光學性 1322042 質優良。 本發明之另一個目的爲提供一種具有適合光學用途之 光學性質之光學聚合物薄膜。 爲了達成此目的及其他目的,在本發明之形成薄膜之方 法中,在移動基板之前表面上鑄造至少一種自鑄模排放·之聚 合物溶液以形成薄膜。基板係使用沿基板之背表面配置之加 熱器加熱。自薄膜蒸發之溶劑係以接近地面對薄膜而配置之 冷凝裝置冷凝。 一種自本發明之聚合物溶液製造薄膜之裝置包括可移 動基板、用於在移動基板表面上鑄造聚合物溶液而形成薄膜 之鑄模、及面對基板之背表面而提供之加熱器。此裝置進一 步包括接近地面對薄膜而配置之冷凝裝置。此冷凝裝置將由 薄膜產生之溶劑蒸氣冷凝而回收。 在本發明中,光學聚合物薄膜包括滿足下式之特性: MD 1 ^0.1 OxTA 1 ; sp1max^ O.lOxTAl 其中 ΤΑ 1爲在聚合物薄膜上按第一方向排列之多個測量點測量 之第一厚度値之平均値,MD1爲多個第一厚度値之誤差平均 値,及SP1MAX爲頻率光譜SP1之最大値,其係藉第一厚度 値之快速傅立葉轉換而得。 依照由本發明之聚合物溶液製造薄膜之方法及裝置,大 幅降低厚度及雙折射之不均勻性,因此製造之光學聚合物薄 膜可具有優良之光學性質。其中使用此光學聚合物薄膜之偏 1322042 光過濾器、保護膜、光學功能膜'及液晶顯示器之光學性質 優良。 【實施方式】 [溶液鑄造法] 在以下之解釋中,上模液表示一種含溶液及其中溶解或 分散聚合物與數種添加劑之分散液體之聚合物溶液。此外, 在第1圖中,製備之上模液11爲一種在下述之上模液製法 中製備之上模液,及鑄造上模液12係藉由改變製備之上模 液11以具有適合鑄造之特性而得。 籲 薄膜製造設施係由上模液製備設備15、鑄造設備16、 乾燥設備17、及捲繞設備18構成。上模液製備設備15係由 其中供應製備之上模液11之槽21、泵22、第一與第二過濾 裝置23、24、加熱裝置27、及用於實行急驟蒸發之急驟蒸 / 發裝置28構成。 . 槽21具有恆溫器21a及溫度計(未示)以將製備之上 模液Π適當地加熱及冷卻。在本發明中,較佳爲將製備之 上模液11加熱一次然後冷卻,使得可增加溶解度。此外, * 在加熱及冷卻中,考量上模液種類,特別是上模液之溶劑組 成物,而設定溫度。特別地,在使用混合物溶劑作爲溶劑時 ,較佳爲以多段方式將製備之上模液11加熱及冷卻至預定 溫度。 製備之上模液11係藉泵22以預定流速進料至鑄造設備 16。第一及第二過濾裝置23' 24係配置於泵22與鑄模14 之間,以去除含於製備之上模液11中之殘留固體材料。此 1322042 外,在以第一過濾裝置2 3過濾後,藉提供於進料管線上之 加熱裝置27將製備之上模液11加熱,而且在急驟蒸發裝置 28中進行急驟蒸發。應注意,加熱裝置27可配置於第一過 濾裝置23上游。 急驟蒸發裝置28係用於將製備之上模液11之特性改變 成適合鑄造之鑄造上模液12。在急驟蒸發裝置28中,將高 壓之製備之上模液11沖入大氣壓力空氣中以實行急驟蒸發 。通常使用冷凝器(未示)將蒸發製備之上模液11而產生 之溶劑蒸氣冷凝及去除,而且自薄膜製造設施排放成爲回收 溶劑。 在急驟蒸發後,將製備之上模液11自急驟蒸發裝置28 送出,而且較佳爲在進料至鑄造設備16之前藉第二過濾裝 置24去除殘留固體材料。在本發明中應注意,用於去除製 備之上模液11之部份溶劑之裝置不限於上述之急驟蒸發裝 置28,例如,可使用已知之具轉動刮刀之薄膜蒸發器、多功 能蒸發器等。此外,在第二過濾裝置24與鑄造設備16之間 可提供線上靜態混合器(未示)。在此情形,可適當地改變 製備之上模液11之特性。 在本發明中應注意,使用濾紙作爲第一過濾裝置23之 過濾器,及使用燒結金屬過濾器作爲第二過濾裝置24。此外 ’本發明不依附以上之上模液製備設備15。 過濾後之製備之上模液1 1係進料至鑄造設備1 6作爲鑄 造上模液12。進料至鑄造設備16之鑄造上模液12係在循環 路徑上藉轉動裝置(未示)移動之作爲基板之帶31上鑄造 -10- 1322042 形成膠狀膜35(參見第2圖)。帶31係以至少第一及第二圓 筒32、33支撐,其轉動使帶31在循環路徑上連續地移動。 溶劑逐漸自帶31上之膠狀膜35蒸發,使得膠狀膜35具有 自撐性質。然後藉剝除輥37自帶31剝除膠狀膜35成爲薄 膜3 6。自由輥或驅動輥可作爲剝除輥3 7。在剝除輥3 7爲驅 動輥時,較佳爲調節薄膜3 6之牽引比、張力與鬆弛至少之 —而驅動剝除輥3 7。應注意,在以上之具體實施例中,剝除 輥37具有剝除及導引薄膜36之兩種功能。然而,在本發明 中可分別地提供用於剝除薄膜36之剝除輥及用於將薄膜36 · 導引至乾燥設備17之導引輥。 乾燥設備17係由張力裝置41及輥乾燥裝置42構成。 在張力裝置41中,以夾子(未示)等保持薄膜36之兩側區 域以對薄膜3 6施加張力而將薄膜3 6乾燥。然後在包括許多 ’ 輥之輥乾燥裝置42中將薄膜36進一步乾燥。在乾燥後,薄 膜36在提供於乾燥設備17下游之冷卻裝置(未示)中冷卻 ,如此薄膜3 6之溫度降至室溫。 較佳爲’以切割器4 6切割乾燥薄膜3 6之兩側區域,使 ® 得薄膜可具有產品之寬度。然後以捲繞裝置47捲繞薄膜36 。在本發明中可將輥48提供於以上之裝置與設備之間,而 且輥4 8之數量不受限制。應注意,本發明與乾燥設備1 7、 捲繞設備18之結構 '及乾燥與捲繞方法無關。薄膜可以數 種已知之乾燥方法與捲繞方法乾燥及捲繞。 參考第2圖,其解釋作爲由本發明之聚合物溶液製造聚 合物薄膜之方法之溶液鑄造法。鑄造設備16包括鑄模14' -11- 1322042 第一與第二支撐輥3 2、3 3、帶3 1、剝除輥3 7、加熱板5 1、 多個冷凝器52、多個液體接收器53、回收槽56、及進料管 線。然而,本發明不限於鑄造設備16。在此具體實施例中應 注意,製備三種鑄造上模液12,而且其鑄造係同時進行而形 成具有三層結構之膠狀膜35。因此,如第3圖所示,膠狀膜 35自帶31側循序具有第一層35a、第二層35b與第三層35c 。加熱板5 1及冷凝器52各連接溫度控制器5 1 a、52a。 加熱板51係接近帶3 1之背表面(其上不形成膠狀膜 3 5 )而配置,作爲將帶31加熱之加熱構件。此外,將多個 冷凝器5 2提供於加熱板5 1之相反側,以接近地面對帶3 1 上之膠狀膜35。 加熱板51之表面係由金屬形成,而且其溫度係以溫度 控制器5 1 a控制。加熱板5 1控制熱將帶31上之膠狀膜35 加熱而將溶劑蒸發。應注意,加熱板51表面之材料在此具 體實施例中不受限制,而且可爲,例如,陶瓷。加熱板之零 件可獨立地藉溫度控制器控制。溫度控制範圍預定爲最低室 溫及最高聚合物之耐熱溫度或所使用溶劑之最高沸點。在此 情形,加熱板51足夠有效。此外,加熱溫度係依照鑄造上 模液12之種類決定。此決定係考量溶劑之沸點、蒸發速度 、溶劑與固體材料之相容性、聚合物及鑄造上模液所含其他 固體材料之耐熱性與熱依附性而適當地完成。 加熱板51幾乎均勻地將面對之帶31加熱,而且對帶 31上之全部膠狀膜35幾乎均勻地供應熱能量。均勻加熱係 藉由控制膠狀膜35各部份處之溶劑之蒸發速度而完成。因 -12- 1322042 此,加熱板51之形狀不受限制,只要如上所述控制溫度。 因此,可如第2圖所示提供一個加熱板5 1,或者提供多個加 熱板且面對膠狀膜3 5之相同區域而排列,其溫度係個別地 控制。此外,加熱板5 1係幾乎平行幾乎直線移動之帶3 1而 配置。 此外較佳爲,以第一與第二支撐輥32、33支撐之帶31 之溫度爲可調整的。第一與第二支撐輥32、33較佳爲具有 用於將帶31加熱之溫度控制器(未示)。特佳爲,對第一支 撐輥32提供溫度控制器,其配置於鑄模中。在此情形,帶 31不僅在第一與第二支撐輥32、33之間,亦在第一與第二 支撐輥32、33上加熱。因此,可適當地控制膠狀膜35中之 溶劑之蒸發速度。 此外,恰在鑄造位置PS下游及恰在剝除輥37上游提供 冷凝器5 2。冷凝器5 2係以相鄰者之間有間隔而配置於接近 其上形成膠狀膜3 5之帶3 1前側。此外,相鄰冷凝器5 2間 之間隔下方有液體接收器53。在此具體實施例中,各冷凝器 52爲板形。冷凝器52之表面係由金屬製成,而且其溫度係 藉溫度控制器52a控制,以將自膠狀膜35產生之溶劑蒸氣 冷卻及冷凝。因而只要將溫度控制在最低所使用溶劑之沸點 至最高所使用溶劑之凝固點之範圍,則冷凝器5 2有效地將 溶劑蒸氣冷凝。在冷卻溫度低於溶劑之凝固點時,溶劑在冷 凝器52表面上凝固。在此情形,溶劑回收變爲困難,或者 需要使用溶解構件以回收。應注意,冷凝器52之材料較佳 爲具有高導熱性,而且在此具體實施例中不受限制。 -13- 1322042 冷凝器5 2之冷卻溫度係依照溶劑成本且考量溶劑之沸 . 點 '冷凝速度與凝固點而適當地決定。溶劑蒸氣冷凝且液化 之溶劑在由內側(膠狀膜3 5之側)至外側(與內側相反之 側)形成之傾斜表面上向下流動。然後藉液體接收器5 3接 收溶劑而回收。在本發明中,爲了易於回收,內側與外側間 之傾斜可具有液體因重力作用而向下流動之結構,而且傾斜 角度不受限制》各冷凝器52之內表面係平行帶31之寬度方 向’因此幾乎平行膠狀膜35。應注意,在膠狀膜35中,未 接觸帶31之表面稱爲鑄造表面。 籲 在接近鑄造表面處,帶31之移動造成意料外之氣體或 空氣流動。在本發明中較佳爲,鑄造表面與冷凝器52之間 之意料外空氣流動儘量小,而且具體而言爲至少0.01米/秒 至0.5米/秒。 ’ 因膠狀膜3 5之溫度經以加熱板5 1加熱之帶3 1而增加 ,鑄造表面與冷凝器52之間有溫度梯度Q。在Ts (°C )爲形 成於帶31上之溫度,@(°(:)爲冷凝器52之表面溫度,及d (毫米)爲鑄造表面與冷凝器52間之距離時,溫度梯度Q ® 定義如下:Q = (Ts-Tc)/d。溫度梯度Q較佳爲滿足範圍: 5<Q<100。在溫度梯度Q在此範圍時,膠狀膜35之厚度變 動減小,而得到厚度均勻性優良之薄膜。應注意,冷凝器5 2 之表面溫度Tc可爲至少膠狀膜35之內表面或面對表面之溫 度。 接近鑄造表面則溶劑蒸氣濃度較高且遠離則較低。由於 有氣體,在具溫度梯度之系統中發生熱擴散。因此,氣體中 -14- 1322042 分子量較高之分子移向低溫側,及氣體中分子量較低之分子 移向高溫側。特別地利用此現象分離混合物氣體。在使用有 機溶劑作爲溶劑時,鑄造表面與冷凝器間之溫度梯度空間中 有空氣分子(包括氮分子、氧分子、二氧化碳分子等)、蒸 發有機溶劑之分子。絕大部份用於製造光學用途薄膜之有機 溶劑分子具有大於空氣分子量之分子量。因此發生熱擴散使 得溶劑分子可移至冷凝器。如此防止接近鑄造表面之溶劑分 子飽和造成溶劑自膠狀膜35蒸發。 在溫度梯度Q爲至少1 〇 〇時,加熱板5 1之加熱溫度與 _ 冷凝器52之冷卻溫度間之差太大,而且在氣相中產生之冷 凝溶劑滴在鑄造表面形成露。此外,溫度梯度最大爲5,則 加熱溶劑之蒸發與冷卻溶劑之冷凝以較低之速度進行,其效 果不足。 此外,在加熱板51與冷凝器52間區域之不均勻溫度環 , 境中,熱能量係由此區域之移動分子運輸。因而在加熱板51 面對具大面對面積之帶31時,對帶31連續地且均勻地供應 熱能量而補償外部排放之熱能量。因而較佳爲,溫度梯度Q · 之變動最大爲溫度梯度Q之10%,及溫度梯度Q之控制係 藉由調整膠狀膜之溫度Ts (°C )與冷凝器52之表面溫度Tc ( °C )而進行。 變化値超過溫度梯度Q之1 〇%,則無法在帶3 1上使溶 劑均勻地自聚合物鑄造溶液蒸發。在此情形,所製造薄膜之 厚度及在厚度方向與表面方向(或表面中之任何方向)之機 械性質或光學性質(阻滯等)變動,其不佳。此外,溫度梯 -15- 1322042 度Q較佳爲最大8 %,而且特別是最大5 %。 較佳爲在面對鑄造表面之區域調整冷凝器52之表面溫 度T c,使得溫度變化値爲最大;[〇 °C。在變化値超過1 0 °C時 ,均勻之溶劑蒸氣冷凝變困難,因此使熱擴散不均勻。如此 使溶劑自膠狀膜35之蒸發速度不均勻。表面溫度Tc之變化 値較佳爲最大8 °C,而且特別是最大51。 在本發明中較佳爲,鑄造表面與冷凝器52間之距離d 之變化値最大爲距離d之平均値dA之1 0%。在此情形,可 保持上述之溫度及距離,結果,所得薄膜36之厚度變動變 小。爲了控制鑄造表面與冷凝器5 2間之距離,鑄造上模液 12之均勻性質或特性、均勻鑄造速度 '及冷凝器52之表面 光滑性爲必要的。 在溶液鑄造法中,帶31通常移動使得在帶31上鑄造之 鑄造上模液可成爲膠狀膜35自第一支撐輥32上方之鑄造位 置PS向上或水平地運輸。如此在鑄造後之起初狀態(其中 溶劑含量高)防止鑄造上模液自膠狀膜35滴下。 然而,在本發明中特佳爲,第一與第二支撐輥32、33 轉動而將鑄造上模液自第一支撐輥32上方之鑄造位置PS向 下運輸。因而鑄造位置PS係配置於支撐輥32通過帶31之 區域上方。應注意,鑄造上模液1 2形成自鑄模至帶之曲線 ,而且較佳爲曲線上在鑄造位置PS處之正切線與帶31在鑄 造位置PS處之正切線相同,或儘量相同。 在本發明中,如上所述提供加熱板5 1及冷凝器5 2,而 且決定鑄造位置PS與鑄造方向。因此,即使將恰在鑄造後 1322042 之鑄造上模液12如膠狀膜35向下運輸,仍可防止鑄造上模 液之滴下,而且以高產率回收恰在鑄造後產生之蒸發溶劑。 本發明不依附所得薄膜3 6之厚度。然而,恰在鑄造後 之膠狀膜35之厚度T較佳爲10微米至1000微米,因爲本 發明在此情形有效。厚度T特佳爲20微米至5 00微米,因 爲本發明之效果較大。應注意,恰在鑄造鑄造上模液後之膠 狀膜35表示自鑄造位置PS至第一個冷凝器52之膠狀膜35 部份。在此具體實施例中,膠狀膜35具有多層結構,及厚 度T爲在一個鑄造程序中同時形成之層之總厚度。 籲 帶31之移動速度較佳爲5米/分鐘至200米/分鐘。應 注意,移動速度及鑄造速度相同。在厚度T小於10微米時 ,單位面積中之聚合物溶液中溶劑量小,因此無法完全控制 蒸發速度。此外,在厚度T大於1000微米時,在膠狀膜35 ' 中將接近帶31之溶劑。然而,因熱能量難以穿透至鑄造表 ^ 面側,溶劑蒸發難以實行。此外,膠狀膜3 5之溶劑或溶劑 氣體有時殘留在薄膜36之內部。因而表面條件變差。此外 ,乾燥速度與厚度平方値成反比。因此,在厚度太大時,生 ® 產力變低,其不佳。 在膠狀膜35及薄膜36具有單層結構時,本發明亦有效 。然而’在其具有多層結構時本發明特別有效》鑄造方法可 爲共鑄及循序鑄造。 鑄造程序之解釋係參考第4圖進行,而且與第1·3圖相 同之裝置及構件具有相同之號碼,及省略其解釋。如第4圖 所不,鏡模14爲進料區型。 -17- 1322042 鑄模14係由模區61及進料區62構成,而且通常稱爲 塗架型。進料區62係配置於模區61之背部(或用於排放鑄 造上模液12之模唇61a之相反表面)。進料區62具有入口 62a· 6 2c ’及鑄造上模液κ包括用於形成各第—至第三層膠 狀膜35之鑄造上模液12a-12c。鑄造上模液12a-12c各經入 口 62a-62c供應◊在進料區62中,自入口 62 a-62c延伸之通 路結合成一個通路,使得三種鑄造上模液12a-l 2c可構成三 層結構,然後可供應至模區61中。模區61具有單一通路61b 。具三層結構之鑄造上模液12流入通路61b,而且自模唇 61a排放。此鑄造稱爲共鑄。 此外,在本發明中,各可對鑄造上模液12a-12c施加進 料壓力’以獨立地控制通過通路之進料。因此,調整各第一 至第三層35 a-35c之厚度。爲了控制各第一-第三層35 a-35c 之厚度’在三個通路結合之部份適當地決定作爲三種鑄造上 模液12a-12c之流動路徑之通路厚度,或者,適當地調整各 施加至鑄造上模液12a-12c之進料壓力。 如第5圖所示,鑄模71爲多歧管型,而且可如第4圖 之鑄模14同時形成三層。如第1-4圖之相同裝置與構件具 有相同之號碼,而且省略其解釋。經各流動路徑(未示)將 三種鑄造上模液12a-l 2c供應至鑄模71 »在鑄模71背面形 成入口 72a-7 2c以將鑄造上模液12 a-12c供應至鑄膜71中。 鑄造上模液12 a-12c暫時貯存於形成於通路75-77上之各袋 75a、76a、77a。然後在接近模唇71處將鑄造上模液12a-12c 結合而構成三層結構,及在此狀況同時排放。 -18- 1322042 在鑄模71中應注意,鑄造上模液12a-12C之入口 72a-72c之位置、通路75-77之形狀、袋75 a-77a之形狀 '及通 路在接近模唇7 1 a處結合之部份之結構不受限制,而且鑄模 71可爲用於實行共鑄之多歧管型之一般鑄模。在本發明中可 進一步使用可同時形成N層(N爲至少2之自然數)之多歧 管型鑄模。在此情形’流動路徑數爲N,而且實質結構與以 上之具體實施例相同》 此外’在本發明中’可組合第4圖中之進料區型與第5 圖中之多歧管型實行共鑄》在此情形,可使用圈(參見第2 φ 至4圖)或圓筒(參見第5圖)作爲基板。 在本發明中’如第6圖所示,可使用鑄造設備81鑄造 ,使得可實行循序鑄造而非共鑄。如第1 -4圖之相同裝置與 構件具有相同之號碼’而且省略其解釋。在鑄造設備81中 ' ’將三個鑄模82-84配置於帶31上方,在其上將鑄造上模 , 液12a-12c自鑄模82-84循序地鑄造,而形成具有三層結構 之膠狀膜3 5。 應注意,加熱板5 1與冷凝器5 2係以對鑄模8 4 (其在 籲 第2圖中提供於鑄模丨4之相同位置處)具有相同之位置關 係而配置。液體接收器與回收槽之位置相同,而且在此圖中 省略。 在將其設計爲進行循序鑄造時,使用之鑄模數不限於三 個’而且可等於或少於形成之層數。例如,將其設計爲實行 循序鑄造NC次(NC爲至少2之自然數)而形成N層,則 滿足下式:2$NCSN(N爲至少2之自然數)。在NC<N2 -19- 1322042 條件中,在鑄造程序中進行共鑄至少一次。 在以上之本發明方法中,所製造薄膜之厚度均勻性變大 ,而且可得優良之光學聚合物薄膜。光學性質經常視聚合物 薄膜之厚度變動而定,而且在薄膜之主成分爲芳族聚合物且 其他聚合物具有環形結構時,此趨勢特別明顯。可藉以上方 法與設備製造之本發明聚合物薄膜之厚度均勻性、雙折射、 透光性等優良。因而此聚合物薄膜適當地用於偏光過濾器及 液晶顯示器。以下詳細解釋聚合物薄膜。 在第7圖中,X-軸在薄膜36之長度方向延伸且Y-軸在 寬度方向或長度方向之垂直方向延伸。爲了調節厚度,在薄 膜36上XY平面中之選擇性兩點pa' pb間線段L1上之數 處測量薄膜36之値(以下稱爲厚度値)。線段li之長度較 大較佳。此外,由於薄膜中之表面條件變化及厚度變動通常 爲循環性’線段L 1之長度較佳爲至少對應一個循環變化或 變動。薄膜3 6之厚度測量係使用可測量微米級數之表計進 行。 具體而言,在第8圖中’在P 1與P 2間視情況地選擇自 P(1)至p(n)之η個位置(η爲選擇性及自然數),及在η個測 量位置 ρ(1)、ρ(2)、ρ(3)、……、ρ(η-2)、ρ(η-1)、ρ(η)處以 厚度計進行厚度測量。如此進行連續前進測量而獲得包括厚 度値 t( 1 )、t(2)、t(3) ' ……、Un-2)、t(n -1)、t(n),及測量 位置 P(l)、p(2)、p(3)、……、P(n-2)、p(n-l )、p(n)間變動 與變化等之厚度資料。然後計算第一厚度平均ΤΑ丨作爲這些 厚度値 t(l)、t(2)' t(3)、...... ' Un-2)、t(n-l)、t(n)之平均 -20- 1322042 値。此外’計算在測量位置p (1)、p( 2 )、P(3 )、...... ' p(n-2) ' p(n-1)、p(n)處之各厚度誤差,而得到厚度誤差之平均誤 差作爲第一平均誤差MD1。在本發明中,第一平均誤差MD1 較佳爲滿足條件 MD1 $ O.lxTAl,而且特別是 MD1 $ 0 · 0 8 X T A 1。在本發明中應注意,誤差表示樣品標準差。 此外’所得厚度資料之頻率光譜資料係以厚度計中之操 作藉FFT程式獲得。在頻率光譜資料中,波長係由厚度之連 續前進測量中之前進距離轉換,而且爲變數(或參數)。傅 立葉轉換係定義爲其中使用傅立葉分量進行時間與頻率間 轉換之轉換公式。傅立葉轉換係應用於DFT (離散傅立葉轉 換)’而且在FFT中,操作時間遠比DFT短。通常在厚度測 量中進行資料處理,轉換成對應波長之移動距離亦示爲對應 時間。數種具有此資料處理功能之厚度計在市場上銷售。應 注意,厚度測試計KG601A(Anritsu Corp·製造)在市場上 銷售且在本發明中作爲接觸型厚度計。 在本發明中,頻率光譜最大値較佳爲最大第一厚度平均 値ΤΑ 1之1 〇%。此外,在此情形,在進行頻率光譜資料之轉 換以得到空間頻率時,所得特定頻率之波長範圍較佳爲最大 2 0公分。1322042 IX. Description of the Invention: [Technical Field] The present invention relates to an optical polymer film, and a method and apparatus for manufacturing a film (and more particularly an optical polymer film having optical properties), and an optical polymerization process Method and apparatus for film (as a polarizing filter protective film for optical functional films and liquid crystal displays). [Prior Art] A liquid crystal display (hereinafter referred to as LC D) is composed of a liquid crystal tube, a polarizing element, and an optical compensation sheet (birefringent sheet). In the light-transmitting type LCD, two polarizing elements are provided on both sides of the liquid crystal tube, and one or two optical compensation sheets are disposed between the liquid crystal tube and the polarizing element. In the reflective LCD, the reflection sheet, the liquid crystal tube, the optical compensation sheet, and the polarizing element are overlapped in this order. The liquid crystal tube is composed of rod-shaped liquid crystal molecules, two substrates for accommodating the same, and an electrode layer for applying a voltage to the rod-shaped molecules. There are several types of display mode liquid crystal tubes which are used depending on the orientation of the liquid crystal molecules used. For example, as the light transmission type, there are TN (twisted nematic), IPS (switching in plane), FLC (ferroelectric liquid crystal), OCB (optical compensation bending), STN (super twisted nematic), VA (vertical alignment). Etc., and as a reflection type, there are TN (twisted nematic), HAN (mixed nematic), and the like. The polarizing element usually has a structure in which two transparent protective films are attached to both surfaces of the polarizing film. In addition, optical compensation sheets are used in many liquid crystal displays to reduce irregular discoloration of the displayed image or to magnify the viewing angle. In the optical compensation sheet, a birefringent film obtained by stretching or drawing is preferably used. In addition to an optical compensation sheet containing a birefringent film, it has been proposed in recent years to use an optical compensation sheet having optical anisotropy, which 1322042 provides liquid crystal molecules (especially disk type liquid crystal molecules) on a transparent substrate. The orientation of the liquid crystal molecules is fabricated and fixed in order to provide optical anisotropy. In this case, the liquid crystal molecules have a polymerizable group, and polymerization of liquid crystal molecules is carried out for fixation. This liquid crystal molecule has large birefringence and exhibits several orientations. With these characteristics, an optical compensation sheet having an optical property which cannot be obtained by using a prior art film can be provided. The optical properties of the optical compensation sheet are determined in accordance with the optical properties of the liquid crystal tube (specifically, the display mode described above). Therefore, when liquid crystal molecules (especially disk type liquid crystal molecules) are used, the optical compensation sheet manufactured can have several optical properties corresponding to the display mode of the liquid crystal cell. Several types of display mode optical compensation sheets are proposed in many patent applications in which disc type liquid crystal molecules are used. For example, U.S. Patent No. 5, 583, 679, No. 5, 646, 703, and German Patent Application Publication No. 391162 No. 1 teaches an optical compensation sheet for a ΤΝ mode liquid crystal cell. Japanese Patent Laid-Open Publication No. 1/54982 teaches an optical compensation sheet for an IPS mode or FLC mode liquid crystal tube. In addition, the optical compensation sheet for the OCB mode liquid crystal tube and the HAN mode liquid crystal tube is taught in the U.S. Patent No. 5,085,053, the entire disclosure of which is incorporated herein by reference. An optical compensation sheet for a STN mode liquid crystal tube, and an optical compensation sheet for a VA mode liquid crystal tube are taught by Japanese Patent No. 2863372. However, although there are many kinds of alignment modes of liquid crystal molecules, the above liquid crystal anisotropy sometimes fails to optically compensate the liquid crystal cell. U.S. Patent No. 5,646,703 sets optical crystal molecules and transparent substrates of optical compensation sheets to have optical anisotropy. This liquid crystal tube is thus optically compensated. 1322042 There are several advances in the performance of several of these products for many optical applications. In the progress of such optical use products (e.g., these LCDs), it is necessary to make the films constituting each layer of the product have a uniform thickness and uniformity of optical properties with high accuracy. For example, the thickness unevenness (or thickness build-up) of the polarizing filter protective film causes warpage when attached to the polarizing element, and a curl-shaped polarizing filter after adhesion. Further, the optical film is coated with a hard coat layer for surface protection and an antireflection layer for preventing reflection. Thickness non-uniformities often result in uneven coatings (or coating buildup). In particular, when unevenness (or build-up) occurs cyclically, the image quality of the LCD display becomes extremely poor. Japanese Patent Publication Nos. 2002-234042 and 2002-1745 each teach a solution casting method as a method of producing a film in which thickness uniformity is further improved. However, recently, although a thinner thickness and a larger amount of overlapping film and improvement in productivity have been gradually required, it is necessary to control the thickness of a film made of a polymer with high accuracy. Thus, the productivity is not sufficiently improved and the film produced cannot have a uniform thickness and uniform optical properties. In addition, when the optical properties (especially the retardation 値Re, Rth) of the birefringence are not uniform, the influence on the product is large. For example, lightening and inversion sometimes occur in an LCD, and when the optical compensation sheet is used in an LCD to enlarge a viewing angle, a change in viewing angle and a color inversion sometimes occur. SUMMARY OF THE INVENTION An object of the present invention is to provide a method for producing a film in which the thickness of the optical film and the birefringence unevenness are lowered, and the optical properties are excellent. Another embodiment of the present invention provides a device for producing a film in which the thickness of the optical film and the birefringence unevenness are lowered, and the optical property 1322042 is excellent. Another object of the present invention is to provide an optical polymer film having optical properties suitable for optical applications. In order to achieve this and other objects, in the method of forming a film of the present invention, at least one polymer solution discharged from the mold is cast on the surface before the substrate is moved to form a film. The substrate is heated using a heater disposed along the back surface of the substrate. The solvent evaporating from the film is condensed by a condensing device disposed close to the surface of the film. An apparatus for producing a film from the polymer solution of the present invention comprises a movable substrate, a mold for casting a polymer solution on the surface of the moving substrate to form a film, and a heater provided facing the back surface of the substrate. The apparatus further includes a condensing unit disposed adjacent to the film on the ground. This condensing device recovers by condensing the solvent vapor generated by the film. In the present invention, the optical polymer film includes characteristics satisfying the following formula: MD 1 ^ 0.1 OxTA 1 ; sp1max^ O.lOxTAl wherein ΤΑ 1 is the number of measurement points arranged in the first direction on the polymer film The average 値 of a thickness 値, MD1 is the error average 値 of the plurality of first thickness 値, and SP1MAX is the maximum 値 of the frequency spectrum SP1, which is obtained by the fast Fourier transform of the first thickness 値. According to the method and apparatus for producing a film from the polymer solution of the present invention, the thickness and the birefringence unevenness are greatly reduced, and thus the optical polymer film produced can have excellent optical properties. Among them, the optical polymer film of the 1322042 optical filter, the protective film, the optical functional film', and the liquid crystal display are excellent in optical properties. [Embodiment] [Solution Casting Method] In the following explanation, the upper molding liquid represents a polymer solution containing a solution and a dispersion liquid in which a polymer or a plurality of additives are dissolved or dispersed. Further, in Fig. 1, the upper molding liquid 11 is prepared by preparing the upper molding liquid in the above molding liquid molding method, and the casting upper molding liquid 12 is prepared by changing the upper molding liquid 11 to have suitable casting. The characteristics come. The film manufacturing facility is composed of an upper molding liquid preparation device 15, a casting device 16, a drying device 17, and a winding device 18. The upper molding liquid preparation apparatus 15 is provided with a tank 21 in which the upper molding liquid 11 is prepared, a pump 22, first and second filtration devices 23, 24, a heating device 27, and a flash evaporation/generation device for performing rapid evaporation. 28 composition. The tank 21 has a thermostat 21a and a thermometer (not shown) to appropriately heat and cool the upper mold liquid. In the present invention, it is preferred to heat the prepared upper molding liquid 11 once and then to cool so that the solubility can be increased. In addition, * In the heating and cooling, consider the type of the molding liquid, especially the solvent composition of the upper molding liquid, and set the temperature. Specifically, when the mixture solvent is used as the solvent, it is preferred to heat and cool the preparation molding liquid 11 to a predetermined temperature in a plurality of stages. The upper molding liquid 11 is prepared by the pump 22 to be fed to the casting apparatus 16 at a predetermined flow rate. The first and second filtering means 23' 24 are disposed between the pump 22 and the mold 14 to remove residual solid material contained in the molding liquid 11 prepared. In addition to this 1322042, after the filtration by the first filtration unit 23, the preparation of the upper molding liquid 11 is heated by the heating means 27 supplied to the feed line, and the rapid evaporation is carried out in the flash evaporation unit 28. It should be noted that the heating device 27 can be disposed upstream of the first filter device 23. The flash evaporation unit 28 is used to change the characteristics of the preparation of the molding liquid 11 into a casting molding liquid 12 suitable for casting. In the flash evaporation unit 28, the high pressure preparation upper molding liquid 11 is flushed into atmospheric pressure air to carry out flash evaporation. The solvent vapor generated by evaporating the upper molding liquid 11 is usually condensed and removed using a condenser (not shown), and is discharged from the film manufacturing facility into a recovery solvent. After the flash evaporation, the preparation of the overmold 11 is sent from the flash evaporation unit 28, and preferably the residual solid material is removed by the second filtration unit 24 before being fed to the casting apparatus 16. It should be noted in the present invention that the means for removing a part of the solvent for preparing the upper mold liquid 11 is not limited to the above-described flash evaporation apparatus 28, and for example, a thin film evaporator known to have a rotary blade, a multi-function evaporator, or the like can be used. . Additionally, an on-line static mixer (not shown) may be provided between the second filter unit 24 and the casting apparatus 16. In this case, the characteristics of the above-mentioned molding liquid 11 can be appropriately changed. It should be noted in the present invention that filter paper is used as the filter of the first filter unit 23, and a sintered metal filter is used as the second filter unit 24. Further, the present invention does not attach to the above molding liquid preparation apparatus 15. The filtered upper molding liquid 1 1 is fed to a casting apparatus 16 as a casting upper molding liquid 12. The casting upper molding liquid 12 fed to the casting apparatus 16 is cast on the belt path 31 which is moved by the rotating means (not shown) as a substrate -10- 1322042 to form a jelly film 35 (see Fig. 2). The belt 31 is supported by at least the first and second cylinders 32, 33, and its rotation causes the belt 31 to continuously move in the circulation path. The solvent gradually evaporates from the gel film 35 on the tape 31, so that the gel film 35 has self-supporting properties. Then, the gel film 35 is peeled off from the belt 31 by the stripping roller 37 to become a film 36. A free roller or a driving roller can be used as the peeling roller 37. When the stripping roller 37 is a driving roller, it is preferable to adjust the pulling ratio, tension and slack of the film 36 to at least drive the stripping roller 37. It should be noted that in the above specific embodiment, the stripping roller 37 has two functions of stripping and guiding the film 36. However, in the present invention, a peeling roller for peeling off the film 36 and a guide roller for guiding the film 36 to the drying device 17 may be separately provided. The drying device 17 is composed of a tension device 41 and a roller drying device 42. In the tension device 41, the both sides of the film 36 are held by a clip (not shown) or the like to apply tension to the film 36 to dry the film 36. The film 36 is then further dried in a roll drying unit 42 comprising a plurality of rolls. After drying, the film 36 is cooled in a cooling device (not shown) provided downstream of the drying device 17, so that the temperature of the film 36 is lowered to room temperature. Preferably, the sides of the dried film 36 are cut by the cutter 46 so that the film can have the width of the product. The film 36 is then wound by a winding device 47. In the present invention, the roller 48 can be provided between the above apparatus and the apparatus, and the number of the rollers 48 is not limited. It should be noted that the present invention is independent of the drying apparatus 17, the structure of the winding apparatus 18, and the drying and winding methods. The film can be dried and wound by several known drying methods and winding methods. Referring to Fig. 2, there is explained a solution casting method as a method of producing a polymer film from the polymer solution of the present invention. The casting apparatus 16 includes a mold 14'-11- 1322042 first and second support rolls 3 2, 3 3, a belt 3 1 , a stripping roll 37, a heating plate 5 1 , a plurality of condensers 52, and a plurality of liquid receivers 53. Recovery tank 56, and feed line. However, the invention is not limited to the casting apparatus 16. It should be noted in this embodiment that three casting mold liquids 12 are prepared, and the casting processes are simultaneously performed to form a gel film 35 having a three-layer structure. Therefore, as shown in Fig. 3, the gel film 35 has the first layer 35a, the second layer 35b, and the third layer 35c sequentially from the side of the belt 31. The heating plate 51 and the condenser 52 are each connected to a temperature controller 5 1 a, 52a. The heating plate 51 is disposed close to the back surface of the belt 31 (on which the gel film 35 is not formed) as a heating member for heating the belt 31. Further, a plurality of condensers 52 are provided on the opposite side of the heating plate 51 to approach the colloidal film 35 on the belt pair 3 1 . The surface of the heating plate 51 is formed of metal, and its temperature is controlled by a temperature controller 51a. The heating plate 51 controls the heat to heat the gel film 35 on the belt 31 to evaporate the solvent. It should be noted that the material of the surface of the heating plate 51 is not limited in this specific embodiment, and may be, for example, ceramic. Parts of the heating plate can be independently controlled by a temperature controller. The temperature control range is predetermined to be the lowest room temperature and the highest heat resistant temperature of the polymer or the highest boiling point of the solvent used. In this case, the heating plate 51 is sufficiently effective. Further, the heating temperature is determined in accordance with the type of the casting mold liquid 12. This determination is suitably made by considering the boiling point of the solvent, the evaporation rate, the compatibility of the solvent with the solid material, and the heat resistance and thermal dependence of the polymer and other solid materials contained in the casting mold solution. The heating plate 51 heats the facing belt 31 almost uniformly, and supplies the heat energy almost uniformly to the entire gel film 35 on the belt 31. The uniform heating is accomplished by controlling the evaporation rate of the solvent at each portion of the gel film 35. Since -12-1322042, the shape of the heating plate 51 is not limited as long as the temperature is controlled as described above. Therefore, a heating plate 51 can be provided as shown in Fig. 2 or a plurality of heating plates can be provided and arranged in the same area facing the colloidal film 35, and the temperature thereof is individually controlled. Further, the heating plate 51 is disposed in a strip 3 1 which is almost parallel to the almost linear movement. Further preferably, the temperature of the belt 31 supported by the first and second support rollers 32, 33 is adjustable. The first and second support rollers 32, 33 preferably have a temperature controller (not shown) for heating the belt 31. Particularly preferably, a temperature controller is provided for the first support roller 32, which is disposed in the mold. In this case, the belt 31 is heated not only between the first and second support rollers 32, 33 but also on the first and second support rollers 32, 33. Therefore, the evaporation rate of the solvent in the gel film 35 can be appropriately controlled. Further, the condenser 52 is provided just downstream of the casting position PS and just upstream of the stripping roller 37. The condenser 52 is disposed on the front side of the belt 3 1 close to the adjacent side to form the gel film 35 with a space therebetween. Further, a liquid receiver 53 is provided below the interval between adjacent condensers 52. In this embodiment, each condenser 52 is in the shape of a plate. The surface of the condenser 52 is made of metal, and its temperature is controlled by a temperature controller 52a to cool and condense the solvent vapor generated from the gel film 35. Thus, the condenser 52 effectively condenses the solvent vapor as long as the temperature is controlled to the range of the lowest boiling point of the solvent used to the highest freezing point of the solvent used. The solvent solidifies on the surface of the condenser 52 when the cooling temperature is lower than the freezing point of the solvent. In this case, solvent recovery becomes difficult, or a dissolving member is required to be recovered. It should be noted that the material of the condenser 52 is preferably of high thermal conductivity and is not limited in this embodiment. -13- 1322042 The cooling temperature of the condenser 52 is determined according to the solvent cost and the boiling point of the solvent. The point 'condensation speed and the freezing point are appropriately determined. The solvent vapor condenses and liquefies the solvent to flow downward on the inclined surface formed from the inner side (the side of the colloidal film 35) to the outer side (the side opposite to the inner side). It is then recovered by receiving the solvent from the liquid receiver 53. In the present invention, for ease of recovery, the inclination between the inner side and the outer side may have a structure in which the liquid flows downward by gravity, and the inclination angle is not limited. The inner surface of each condenser 52 is in the width direction of the parallel belt 31' Therefore, the colloidal film 35 is almost parallel. It should be noted that in the jelly film 35, the surface on which the tape 31 is not contacted is referred to as a cast surface. At the point of approaching the casting surface, the movement of the belt 31 causes an unexpected flow of gas or air. Preferably, in the present invention, the unexpected air flow between the casting surface and the condenser 52 is as small as possible, and specifically at least 0.01 m/sec to 0.5 m/sec. The temperature of the gel film 35 is increased by the belt 3 1 heated by the heating plate 51, and there is a temperature gradient Q between the casting surface and the condenser 52. When Ts (°C) is the temperature formed on the belt 31, @(°(:) is the surface temperature of the condenser 52, and d (mm) is the distance between the casting surface and the condenser 52, the temperature gradient Q ® The definition is as follows: Q = (Ts - Tc) / d. The temperature gradient Q preferably satisfies the range: 5 < Q < 100. When the temperature gradient Q is in this range, the thickness variation of the gel film 35 is reduced, and the thickness is obtained. A film having excellent uniformity. It should be noted that the surface temperature Tc of the condenser 5 2 may be at least the temperature of the inner surface or the facing surface of the gel film 35. The solvent vapor concentration is higher near the casting surface and is lower when it is farther away. There is a gas that undergoes thermal diffusion in a system with a temperature gradient. Therefore, molecules with higher molecular weight of-14-1322042 move toward the low temperature side, and molecules with lower molecular weight move toward the high temperature side. The mixture gas is separated. When an organic solvent is used as the solvent, air molecules (including nitrogen molecules, oxygen molecules, carbon dioxide molecules, etc.) and molecules for evaporating organic solvents are present in the temperature gradient space between the casting surface and the condenser. Manufacturing The organic solvent molecules of the optical use film have a molecular weight greater than the molecular weight of the air. Therefore, thermal diffusion occurs so that the solvent molecules can be moved to the condenser. This prevents the solvent molecules from approaching the casting surface from being saturated, causing the solvent to evaporate from the gel film 35. The temperature gradient Q is At least 1 Torr, the difference between the heating temperature of the heating plate 51 and the cooling temperature of the condenser 52 is too large, and the condensed solvent droplets generated in the gas phase form a dew on the casting surface. Further, the temperature gradient is at most 5 The evaporation of the heating solvent and the condensation of the cooling solvent are performed at a lower speed, and the effect is insufficient. Further, in the uneven temperature ring region between the heating plate 51 and the condenser 52, the thermal energy is in this region. The moving molecules are transported. Therefore, when the heating plate 51 faces the belt 31 having a large facing area, the belt 31 is continuously and uniformly supplied with thermal energy to compensate the externally discharged thermal energy. Therefore, it is preferable that the temperature gradient Q · The maximum variation is 10% of the temperature gradient Q, and the temperature gradient Q is controlled by adjusting the temperature Ts (°C) of the gel film and the surface temperature Tc (°C) of the condenser 52. The change 値 exceeds 1% 温度% of the temperature gradient Q, so that the solvent cannot be uniformly evaporated from the polymer casting solution on the belt 31. In this case, the thickness of the film produced and the direction of the thickness and the surface direction (or surface) The mechanical properties or optical properties (blocking, etc.) of any of the directions are not good. In addition, the temperature ladder -15-1322042 degrees Q is preferably at most 8%, and especially at most 5%. Adjusting the surface temperature T c of the condenser 52 in the area facing the casting surface, so that the temperature change 値 is maximum; [〇 ° C. When the variation 値 exceeds 10 ° C, uniform solvent vapor condensation becomes difficult, thus allowing heat diffusion Not uniform. Thus, the evaporation rate of the solvent from the gel film 35 is not uniform. The change in surface temperature Tc is preferably at most 8 ° C, and especially at a maximum of 51. In the present invention, it is preferred that the change d of the distance d between the casting surface and the condenser 52 is at most 10% of the average 値dA of the distance d. In this case, the above temperature and distance can be maintained, and as a result, the thickness variation of the obtained film 36 becomes small. In order to control the distance between the casting surface and the condenser 52, the uniform nature or characteristics of the casting mold liquid 12, the uniform casting speed 'and the surface smoothness of the condenser 52 are necessary. In the solution casting method, the belt 31 is normally moved so that the casting mold liquid cast on the belt 31 can be transported upward or horizontally from the casting position PS above the first support roller 32. Thus, the initial state after casting (in which the solvent content is high) prevents the casting mold liquid from dripping from the gel film 35. However, it is particularly preferred in the present invention that the first and second support rollers 32, 33 are rotated to transport the casting mold liquid downward from the casting position PS above the first support roller 32. Thus, the casting position PS is disposed above the area where the support roller 32 passes the belt 31. It should be noted that the casting upper molding liquid 12 forms a curve from the mold to the belt, and it is preferable that the tangent line at the casting position PS on the curve is the same as the tangent line of the belt 31 at the casting position PS, or as much as possible. In the present invention, the heating plate 51 and the condenser 52 are provided as described above, and the casting position PS and the casting direction are determined. Therefore, even if the casting mold liquid 12 such as the jelly film 35, which is just after casting 1322042, is transported downward, the dropping of the casting mold liquid can be prevented, and the evaporation solvent which is generated immediately after the casting can be recovered at a high yield. The present invention does not depend on the thickness of the resulting film 36. However, the thickness T of the gel film 35 just after casting is preferably from 10 μm to 1000 μm because the present invention is effective in this case. The thickness T is particularly preferably from 20 μm to 500 μm, because the effect of the present invention is large. It should be noted that the gel film 35 just after casting the casting mold liquid represents the portion from the casting position PS to the gel film 35 of the first condenser 52. In this embodiment, the gel film 35 has a multilayer structure, and the thickness T is the total thickness of the layers simultaneously formed in one casting process. The moving speed of the belt 31 is preferably from 5 m/min to 200 m/min. It should be noted that the moving speed and the casting speed are the same. When the thickness T is less than 10 μm, the amount of the solvent in the polymer solution per unit area is small, so that the evaporation rate cannot be completely controlled. Further, when the thickness T is larger than 1000 μm, the solvent of the belt 31 will be approached in the jelly film 35 '. However, solvent evaporation is difficult to carry out because it is difficult for heat energy to penetrate to the side of the casting surface. Further, the solvent or solvent gas of the gel film 35 sometimes remains inside the film 36. Therefore, the surface condition is deteriorated. In addition, the drying speed is inversely proportional to the squareness of the thickness. Therefore, when the thickness is too large, the productivity of Sheng ® becomes low, which is not good. The present invention is also effective when the gel film 35 and the film 36 have a single layer structure. However, the present invention is particularly effective in the case where it has a multilayer structure. The casting method can be co-casting and sequential casting. The explanation of the casting procedure is carried out with reference to Fig. 4, and the same devices and members as those of Fig. 1·3 have the same reference numerals and their explanations are omitted. As shown in Fig. 4, the mirror 14 is a feed zone type. -17- 1322042 The mold 14 is composed of a mold zone 61 and a feed zone 62, and is generally referred to as a coater type. The feed zone 62 is disposed on the back of the mold zone 61 (or for discharging the opposite surface of the die lip 61a from which the molding liquid 12 is cast). The feed zone 62 has inlets 62a· 6 2c ' and the casting upper molding liquid κ includes casting mold liquids 12a-12c for forming the respective first to third adhesive films 35. The casting upper molding liquids 12a-12c are each supplied through the inlets 62a-62c in the feed zone 62, and the passages extending from the inlets 62a-62c are combined into one passage, so that the three casting upper molding liquids 12a-l 2c can constitute three layers. The structure can then be supplied to the mold area 61. The mold region 61 has a single passage 61b. The casting upper molding liquid 12 having a three-layer structure flows into the passage 61b and is discharged from the lip 61a. This casting is called co-casting. Further, in the present invention, each of the casting mold liquids 12a-12c may be subjected to a feed pressure ' to independently control the feed through the passage. Therefore, the thickness of each of the first to third layers 35 a - 35c is adjusted. In order to control the thickness of each of the first to third layers 35a-35c', the thickness of the path as the flow path of the three casting upper molding liquids 12a-12c is appropriately determined in the portion where the three passages are combined, or the respective applications are appropriately adjusted. The feed pressure to the casting mold liquids 12a-12c. As shown in Fig. 5, the mold 71 is of a multi-manifold type, and three layers can be simultaneously formed as the mold 14 of Fig. 4. The same devices and members as those in Figs. 1-4 have the same reference numerals and their explanations are omitted. The three casting upper molding liquids 12a-2b are supplied to the casting mold 71 via respective flow paths (not shown). » The inlets 72a-7 2c are formed on the back surface of the casting mold 71 to supply the casting upper molding liquids 12a-12c into the casting film 71. The casting mold liquids 12a-12c are temporarily stored in the respective pockets 75a, 76a, 77a formed on the passages 75-77. The casting mold liquids 12a-12c are then joined to the mold lip 71 to form a three-layer structure, and are simultaneously discharged in this condition. -18- 1322042 It should be noted in the mold 71 that the positions of the inlets 72a-72c of the casting upper molding liquid 12a-12C, the shape of the passages 75-77, the shape of the pockets 75a-77a, and the passages are close to the lip 7 1 a The structure of the combined portion is not limited, and the mold 71 can be a general mold for performing a co-cast multi-manifold type. In the present invention, a multi-manifold type mold which can simultaneously form an N layer (N is a natural number of at least 2) can be further used. In this case, the number of flow paths is N, and the substantial structure is the same as the above specific embodiment. In addition, 'in the present invention' can be combined with the feed zone type in FIG. 4 and the multi-manifold type in FIG. Co-casting In this case, a ring (see the 2nd to 4th figure) or a cylinder (see Figure 5) can be used as the substrate. In the present invention, as shown in Fig. 6, casting can be performed using a casting apparatus 81 so that sequential casting can be performed instead of co-casting. The same devices and members have the same numbers as in Figs. 1-4 and the explanation thereof is omitted. In the casting apparatus 81, three molds 82-84 are disposed above the belt 31, on which the upper mold is cast, and the liquids 12a-12c are sequentially cast from the molds 82-84 to form a gel having a three-layer structure. Membrane 3 5. It should be noted that the heating plate 51 and the condenser 52 are configured to have the same positional relationship with respect to the mold 84 (which is provided at the same position of the mold 丨 4 in Fig. 2). The liquid receiver is located at the same location as the recovery tank and is omitted from this figure. When it is designed to perform sequential casting, the number of molds used is not limited to three ' and may be equal to or less than the number of layers formed. For example, if it is designed to perform sequential casting NC times (NC is at least 2 natural numbers) to form an N layer, the following formula is satisfied: 2$NCSN (N is a natural number of at least 2). In the NC<N2-19-1322042 condition, co-casting is carried out at least once in the casting process. In the above method of the present invention, the thickness uniformity of the produced film becomes large, and an excellent optical polymer film can be obtained. The optical properties are often determined by variations in the thickness of the polymer film, and this tendency is particularly pronounced when the main component of the film is an aromatic polymer and the other polymer has a ring structure. The polymer film of the present invention produced by the above method and equipment can be excellent in thickness uniformity, birefringence, light transmittance and the like. Therefore, this polymer film is suitably used for a polarizing filter and a liquid crystal display. The polymer film is explained in detail below. In Fig. 7, the X-axis extends in the longitudinal direction of the film 36 and the Y-axis extends in the vertical direction in the width direction or the length direction. In order to adjust the thickness, the film 36 (hereinafter referred to as the thickness 値) is measured at a number on the line segment L1 between the selective two points pa' pb in the XY plane on the film 36. The length of the line segment li is relatively large. Further, since the surface condition change and the thickness variation in the film are generally cyclic, the length of the line segment L 1 is preferably at least one cycle change or variation. The thickness measurement of the film 36 is carried out using a meter that can measure the micron number. Specifically, in FIG. 8 'optionally from n positions of P(1) to p(n) between P 1 and P 2 (η is a selectivity and a natural number), and at n measurements The thicknesses were measured in terms of thickness at positions ρ(1), ρ(2), ρ(3), ..., ρ(η-2), ρ(η-1), ρ(η). The continuous advance measurement is thus performed to obtain thicknesses 値t(1), t(2), t(3)', ..., Un-2), t(n-1), t(n), and measurement position P ( l) Thickness data such as variations and changes between p(2), p(3), ..., P(n-2), p(nl), and p(n). Then calculate the first thickness average ΤΑ丨 as the average of these thicknesses (t(l), t(2)' t(3), ... 'Un-2), t(nl), t(n) -20- 1322042 値. In addition, 'calculate the thicknesses at the measurement positions p (1), p( 2 ), P(3 ), ... ' p(n-2) ' p(n-1), p(n) The error is obtained, and the average error of the thickness error is obtained as the first average error MD1. In the present invention, the first average error MD1 preferably satisfies the condition MD1 $ O.lxTAl, and particularly MD1 $ 0 · 0 8 X T A 1 . It should be noted in the present invention that the error indicates the standard deviation of the sample. In addition, the frequency spectrum data of the obtained thickness data is obtained by the FFT program in the operation in the thickness gauge. In the frequency spectrum data, the wavelength is converted from the forward distance in the continuous advance measurement of the thickness, and is a variable (or parameter). The Fourier transform system is defined as a conversion formula in which the Fourier component is used for time-to-frequency conversion. The Fourier transform system is applied to DFT (Discrete Fourier Transform) and in the FFT, the operation time is much shorter than the DFT. Data processing is usually performed in the thickness measurement, and the moving distance converted to the corresponding wavelength is also shown as the corresponding time. Several thickness gauges with this data processing function are on the market. It should be noted that the thickness tester KG601A (manufactured by Anritsu Corp.) is commercially available and used as a contact type thickness gauge in the present invention. In the present invention, the maximum frequency spectrum 値 is preferably 1% 平均% of the maximum first thickness average 値ΤΑ 1 . Further, in this case, when the frequency spectrum data is converted to obtain a spatial frequency, the wavelength range of the obtained specific frequency is preferably at most 20 cm.

此外,如第7圖所示,亦以類似對線段L1之厚度測量 之方式,在點P3與P4間線段L2之選擇位置處測量厚度。 計算所得厚度値之第二平均値TA2。然後由此厚度値計算線 段L2之厚度誤差(厚度標準差),而且得到其平均誤差作爲 第二平均誤差MD2。第二平均誤差MD2較佳爲滿足MD2S -21 - 1322042 0·1χΤΑ2之條件’而且特別是MD2$0_08xTA2。 此外’如上所述由厚度資料得到頻率光譜資料。在本發 明中,頻率光譜最大値較佳爲最大第二平均値TA 2之10% ,而且特別是最大8%。此外,在此情形,在進行頻率光譜 資料之轉換而得到空間頻率時,空間頻率之波長範圍較佳爲 最大20公分。 在以下之解釋中,兩條線段之垂直位置關係表示兩條線 段之延伸在一個平面中垂直地交叉,即使是兩條線段實際上 不交叉。 依照在薄膜36之一個方向測量之厚度値,藉厚度資料 之FFT分析而得之厚度値平均誤差及頻率光譜強度爲上述 之範圍。如此得到具有適合光學用途之厚度之聚合物薄膜。 此外,在垂直兩個方向得到這些値,而且控制於以上之範圍 。因而聚合物薄膜之厚度性質優良。應注意,在薄膜36之 長度方向測量厚度時,較佳爲在寬度方向之中間部份得到厚 度値,及在薄膜36之寬度方向測量厚度時,此測量較佳爲 在按長度方向排列之數個位置進行。 附帶一提,在光通過其中有折射率差之材料時誘發雙折 射。在此材料中,入射光分成兩道光,其偏光爲彼此90度 且其通過材料之光速不同。速度不同造成相差。通常在通過 真空之光速爲c且穿透材料之光速爲v時,折射率n示於式 中:n = c/v。如上所述,雙折射爲一種材料中之兩個折射率 之差造成之現象。 其中光波傳播之兩個軸稱爲主軸。光波各在平行主軸之 1322042 平面中傳播。此主軸包括快軸與慢軸。沿快軸傳播之光波比 另一個沿慢軸傳播之光波較快地通過材料,即,前者波之穿 透速度比後者波快。偵測雙折射之大小且示爲沿慢與快軸通 過之波之間之相對比。雙折射之絕對値無法以對應3 6 〇 °相 對比之波長表示。因此,以波長將偵測之相對比標準化而轉 換成長度單位(奈米)。 雙折射計偵測所測量材料樣品之主軸,及測量相對比 △ nd。相對比And係定義爲下式,在樣品厚度爲d,在平行入 射角之平面中傳播之光波之折射率爲ne,及在垂直入射角之 _ 平面中傳播之光波之折射率爲no時:Δη(1 = ί1( ne-no)°因而相 對比或雙折射視材料厚度而定。在本發明中,因所製造聚合 物薄膜之厚度均勻,雙重折射優良。 在雙折射中有兩個相對比値,其已知爲薄膜3 6之平面 ' 中方向(或表面中選擇方向)之阻滯Re,及薄膜36之厚度 」 方向之阻滯Rth。在本發明中,在以平面方向排列之數處, 或在第7圖之XY平面中之選擇線段上,得到第一阻滯Re 。然後計算第一阻滯Re之平均誤差作爲第三平均誤差MD3 · 。在第一阻滯Re之平均値爲第一阻滯平均値RA1時,第三 平均誤差MD3滿足條件:MD3S O.lOxRAl。 此外,進行第一阻滯Re之頻率光譜資料之轉換而得空 間頻率資料。在此情形,較佳爲空間頻率之波長範圍爲最大 20公分,及第一阻滯Re之頻率光譜最大値最大爲第一阻滯 平均値RA 1之1 0°/〇。 此外’以如厚度資料分析之相同方式,在以上選擇線段 -23- 1322042 垂直方向之相同數處之測量中亦得到第二阻滯Re之頻率光 譜資料。在本發明中,計算在垂直方向測量之第二阻滯Re 之平均誤差作爲第四平均誤差MD4。在第二阻滯Re之平均 値爲阻滯平均値RA2時,第四平均誤差MD4滿足條件:MD4 S 0.10XRA2。此外,進行第二阻滯Re之頻率光譜資料之轉 換而得空間頻率。在此情形,較佳爲空間頻率之波長範圍爲 最大20公分,及第二阻滯Re之頻率光譜最大値最大爲第二 阻滯平均値RA2之10%。 如上所述,在此具體實施例中,將在選擇方向測量之阻 滞Re之平均誤差,及在阻滯Re之FFT分析中得到之頻率 光譜之強度調節至以上範圍。如此所製造聚合物薄膜可具有 適合光學用途之厚度性質。此外,在選擇方向之垂直方向測 量其他阻滞Re,及亦將由其他阻滞Re得到之頻率光譜資料 控制於以上範圍》如此所製造聚合物薄膜可具有更適合光學 用途之厚度性質。 此外,亦在厚度方向之數處得到第三阻滯Rth之頻率光 譜資料。在本發明中,計算阻滯Rth之平均誤差作爲第五平 均誤差。在阻滯Rth之平均値爲第三阻滯平均値RA3時,第 五平均誤差MD5滿足條件:MD5S 0.10xRA3。 此外,進行第三阻滯Rth之頻率光譜資料之轉換而得空 間頻率。在此情形,較佳爲空間頻率之波長範圍爲最大20 公分,及第三阻滞Rth之頻率光譜最大値最大爲第三阻滞平 均値RA3之10%。 至於厚度値,亦在按厚度方向之垂直方向排列之相同數 -24- 1322042 處得到第四阻滯Rth之頻率光譜資料。在本發明中,計算第 四阻滯Rth之平均誤差作爲第六平均誤差。在第四阻滯Rth 之平均値爲第四阻滯平均値RA4時,第六平均誤差MD6滿 足條件:MD6 ‘ 0· 1 0xRA4。此外,進行第四阻滯Rth之頻率 光譜資料之轉換而得空間頻率。在此情形,較佳爲空間頻率 之波長範圍爲最大20公分,及第四阻滯Rth之頻率光譜最 大値最大爲第四阻滯平均値RA4之10%。 如上所述’在薄膜36之一個選擇方向,阻滞Rth之平 均誤差,在阻滯Rth之FFT分析中得到之頻率光譜之強度差 在以上之範圍。如此所製造聚合物薄膜具有適合光學用途之 厚度性質。此外’在選擇方向之垂直方向得到之平均誤差及 分布在以上之範圍。如此所製造聚合物薄膜具有適合光學用 途之厚度變動。應注意,較佳爲在如測量薄膜厚度値之相同 位置測量平面方向之阻滯Re及厚度方向之阻滯Rth。應注 意’厚度値與阻滯Re、Rth之各平均値係依照一個平面之兩 個迴轉方向而得,即,一個選擇方向及其垂直方向。 在本發明中,在聚合物薄膜爲80微米厚時,可見光通 過聚合物薄膜之透光度較佳爲至少90%,而且特別是至少 93%。此外,在第7圖中XY平面上之兩個選擇位置處,即 ,按平面方向排列,厚度方向之透光度差較佳爲最大5%, 且特別是最大2%。如此所製造薄膜具有有效用於光學用途 之雙折射及透光度。在透光度小於90%時,顯示之影像變暗 且發生變色。因此,在此情形,聚合物薄膜不適合用於光學 用途及用於顯示器等。 -25- 1322042 此外,在相對濕度爲1 〇%時,聚合物薄膜之表面電阻較 · 佳爲在1χ1〇1()Ω至ΐχΐ〇13Ω之範圍,而且特別是1χ101βΩ至 1χ10ΜΩ之範圍。表面電阻在兩個選擇點之差較佳爲最大爲 兩點之表面電阻之平均値之20%,而且特別是最大1 〇%。此 外,聚合物薄膜之表面電阻大於1x1 013Ω時不佳。在此情形 ,在液晶顯示器等之中將聚合物薄膜堆疊於其他薄膜上時 ’絕緣値太周使得其他層之電荷無法流經薄膜。此外,因靜 電力吸附聚合物薄膜附近之灰塵而不佳。或者,聚合物薄膜 之表面電阻小於ΙχΙΟ^Ω不佳,因爲聚合物薄膜不具有絕緣 春 層之功能。爲了得到以上之光學性質及電性質,本發明之聚 合物薄膜係在以上之溶液鑄造法中製造。 只要聚合物或其預聚物溶於溶劑而製備用於製造薄膜 之上模液,則可應用本發明。至於聚合物或預聚物,例如, ' 有纖維素醯化物、聚碳酸酯(PC)、芳醯胺樹脂、聚乙烯醇、 : 變性聚乙烯醇、聚丙烯酸酯、聚甲基丙烯酸酯、聚對酞酸乙 二酯(PET)、聚對酞酸丁二酯(PBT)、氯化聚醚、聚縮醛、聚 醚醚酮(PEEK}、聚醚碾(PES)、聚醯亞胺(PI)、聚醯胺(PA) # 、聚醯胺醯亞胺(PAI)、聚環氧苯(PPO)、聚伸苯碾、聚碾、 聚烯丙化物、聚碳酸酯(PC)、聚乙烯(PE)、聚丙烯(pp)、聚 苯乙烯(PS)、聚氯乙烯(PVC)等。可使用其一或其多種之組合。 特別是在本發明中,較佳爲聚合物含至少一種如化學式 1-7所示之纖維素醯化物、聚碳酸酯(PC)、芳醯胺樹脂 '聚 碾、與聚苯乙烯。應注意,在化學式1-7中,nsm爲1〇 至1 000之自然數。 -26- 1322042 化學式1Further, as shown in Fig. 7, the thickness is also measured at a selected position of the line segment L2 between the points P3 and P4 in a manner similar to the thickness measurement of the line segment L1. A second average 値TA2 of the resulting thickness 値 is calculated. Then, the thickness error (thickness standard deviation) of the line segment L2 is calculated from the thickness 値, and the average error thereof is obtained as the second average error MD2. The second average error MD2 is preferably a condition that satisfies MD2S - 21 - 1322042 0 · 1 χΤΑ 2 and is particularly MD2 $0_08xTA2. Further, the frequency spectrum data was obtained from the thickness data as described above. In the present invention, the frequency spectrum maximum 値 is preferably 10% of the maximum second average 値TA 2 , and particularly at most 8%. Further, in this case, when the frequency spectrum data is converted to obtain a spatial frequency, the spatial frequency has a wavelength range of preferably 20 cm or more. In the following explanation, the vertical positional relationship of the two line segments indicates that the extension of the two line segments vertically intersects in one plane, even if the two line segments do not actually cross. The thickness 値 average error and frequency spectral intensity obtained by FFT analysis of the thickness data are in the above range in accordance with the thickness 测量 measured in one direction of the film 36. A polymer film having a thickness suitable for optical use is thus obtained. In addition, these flaws are obtained in both directions in the vertical direction, and are controlled in the above range. Therefore, the thickness of the polymer film is excellent. It should be noted that when the thickness is measured in the longitudinal direction of the film 36, it is preferable to obtain the thickness 値 in the middle portion in the width direction, and the thickness is measured in the width direction of the film 36. Positions are made. Incidentally, birefringence is induced when light passes through a material having a refractive index difference therein. In this material, the incident light is split into two light beams that are 90 degrees apart from each other and which differ in the speed of light passing through the material. The difference in speed causes a difference. Usually, when the speed of light passing through the vacuum is c and the speed of light passing through the material is v, the refractive index n is shown in the formula: n = c/v. As mentioned above, birefringence is a phenomenon caused by the difference in the two refractive indices of a material. The two axes in which light waves propagate are called the main axes. The light waves propagate in the plane of the 1322042 parallel spindle. This spindle includes a fast axis and a slow axis. The light wave propagating along the fast axis passes through the material faster than the other light wave propagating along the slow axis, that is, the penetration speed of the former wave is faster than the latter wave. The magnitude of the birefringence is detected and is shown as the relative ratio between the waves passing along the slow and fast axes. The absolute 双 of birefringence cannot be expressed in terms of the wavelength corresponding to the 3 6 〇 ° phase contrast. Therefore, the wavelength is used to normalize the relative ratio of detection to a unit of length (nano). The birefringence meter detects the major axis of the sample of the measured material and measures the relative ratio Δ nd. The relative ratio is defined as the following equation. When the sample thickness is d, the refractive index of the light wave propagating in the plane parallel to the incident angle is ne, and when the refractive index of the light wave propagating in the plane of the normal incident angle is no: Δη(1 = ί1(ne-no)° is thus relative or birefringent depending on the thickness of the material. In the present invention, since the thickness of the produced polymer film is uniform, the double refraction is excellent. There are two relatives in the birefringence. Specifically, it is known as the retardation Re of the plane 'the middle direction (or the selected direction in the surface) of the film 36, and the retardation Rth of the thickness of the film 36. In the present invention, it is arranged in the plane direction. At a number, or on the selected line segment in the XY plane of Fig. 7, the first block Re is obtained. Then the average error of the first block Re is calculated as the third mean error MD3. When the first block average 値RA1, the third average error MD3 satisfies the condition: MD3S O.lOxRAl. Furthermore, the frequency spectrum data of the first block Re is converted to obtain spatial frequency data. In this case, preferably The wavelength range for the spatial frequency is up to 20 cm And the frequency spectrum of the first block Re is the maximum 値 maximum of the first block average 値RA 1 of 1 0 ° / 〇. In addition, in the same way as the thickness data analysis, in the above selected line segment -23-1322042 vertical direction The frequency spectrum data of the second block Re is also obtained in the measurement of the same number. In the present invention, the average error of the second block Re measured in the vertical direction is calculated as the fourth mean error MD4. When the average value of Re is the block average 値RA2, the fourth average error MD4 satisfies the condition: MD4 S 0.10XRA2. In addition, the frequency spectrum data of the second block Re is converted to obtain a spatial frequency. In this case, preferably The wavelength range of the spatial frequency is at most 20 cm, and the frequency spectrum of the second block Re is at most 10% of the second block mean 値 RA2. As described above, in this embodiment, the direction is selected. The average error of the measured retardation Re and the intensity of the frequency spectrum obtained in the FFT analysis of the retarded Re are adjusted to the above range. The polymer film thus produced can have a thickness property suitable for optical use. The other retardation Re is measured in the vertical direction, and the frequency spectrum data obtained by the other retardation Re is also controlled in the above range. The polymer film thus produced can have a thickness property more suitable for optical use. Also, in the thickness direction The frequency spectrum data of the third block Rth is obtained in several places. In the present invention, the average error of the block Rth is calculated as the fifth average error. When the average value of the block Rth is the third block average 値RA3, the fifth The average error MD5 satisfies the condition: MD5S 0.10xRA3. In addition, the frequency spectrum of the third block Rth is converted to obtain a spatial frequency. In this case, it is preferable that the spatial frequency has a wavelength range of at most 20 cm, and the third resistance. The maximum frequency spectrum of the lag Rth is 10% of the third block average 値RA3. As for the thickness 値, the frequency spectrum data of the fourth retardation Rth is also obtained at the same number -24 - 1322042 arranged in the vertical direction of the thickness direction. In the present invention, the average error of the fourth retardation Rth is calculated as the sixth average error. When the average 値 of the fourth block Rth is the fourth block mean 値 RA4, the sixth mean error MD6 satisfies the condition: MD6 ‘0·1 0xRA4. In addition, the frequency spectrum of the fourth block Rth is converted to obtain a spatial frequency. In this case, it is preferable that the spatial frequency has a wavelength range of at most 20 cm, and the fourth block Rth has a frequency spectrum of at most 10% of the fourth block average 値 RA4. As described above, in the selected direction of the film 36, the average error of the Rth is retarded, and the intensity difference of the frequency spectrum obtained in the FFT analysis of the retarded Rth is in the above range. The polymer film thus produced has a thickness property suitable for optical use. In addition, the average error obtained in the vertical direction of the selection direction is distributed in the above range. The polymer film thus produced has a thickness variation suitable for optical use. It should be noted that it is preferable to measure the retardation Re in the plane direction and the retardation Rth in the thickness direction at the same position as the film thickness 値. It should be noted that the average 値 of the thickness 値 and the retardation Re and Rth are obtained according to two directions of rotation of one plane, that is, one selection direction and its vertical direction. In the present invention, when the polymer film is 80 μm thick, the transmittance of visible light through the polymer film is preferably at least 90%, and particularly at least 93%. Further, in the two selected positions on the XY plane in Fig. 7, that is, in the planar direction, the difference in transmittance in the thickness direction is preferably at most 5%, and particularly at most 2%. The film thus produced has birefringence and transparency which are effective for optical use. When the transmittance is less than 90%, the displayed image becomes dark and discoloration occurs. Therefore, in this case, the polymer film is not suitable for optical use and for use in displays and the like. Further, at a relative humidity of 1 〇%, the surface resistance of the polymer film is preferably in the range of 1 χ 1 〇 1 () Ω to ΐχΐ〇 13 Ω, and particularly in the range of 1 χ 101 β Ω to 1 χ 10 Μ Ω. The difference in surface resistance between the two selected points is preferably 20% of the average 値 of the surface resistance of the two points, and especially the maximum of 1%. In addition, the surface resistance of the polymer film is not preferable when it is larger than 1x1 013 Ω. In this case, when the polymer film is stacked on other films in a liquid crystal display or the like, the 'insulation 値 is too large to allow the charges of the other layers to flow through the film. In addition, it is not preferable to electrostatically adsorb dust near the polymer film. Alternatively, the surface resistance of the polymer film is less than ΙχΙΟ^Ω because the polymer film does not function as an insulating spring layer. In order to obtain the above optical properties and electrical properties, the polymer film of the present invention is produced in the above solution casting method. The present invention can be applied as long as the polymer or its prepolymer is dissolved in a solvent to prepare a molding liquid for use in the production of a film. As for the polymer or prepolymer, for example, 'with cellulose telluride, polycarbonate (PC), linalylamine resin, polyvinyl alcohol, : denatured polyvinyl alcohol, polyacrylate, polymethacrylate, poly For ethylene phthalate (PET), polybutylene terephthalate (PBT), chlorinated polyether, polyacetal, polyetheretherketone (PEEK), polyether mill (PES), polyimine ( PI), polyamine (PA) #, polyamidimide (PAI), polyepoxybenzene (PPO), polyphenylene sulfide, poly-rolling, polyallyl, polycarbonate (PC), poly Ethylene (PE), polypropylene (pp), polystyrene (PS), polyvinyl chloride (PVC), etc. One or a combination of them may be used. Particularly in the present invention, it is preferred that the polymer contains at least A cellulose halide, polycarbonate (PC), linaloamine resin, as shown in Chemical Formula 1-7, and a polystyrene. It should be noted that in Chemical Formula 1-7, nsm is 1 〇 to 1 The natural number of 000. -26- 1322042 Chemical Formula 1

CH20 \ H 〇H2 CH2OH6' / " OH 化學式2CH20 \ H 〇H2 CH2OH6' / " OH Chemical Formula 2

化學式3Chemical formula 3

-NH-NH

^-NHOC-^-NHOC-

-27- 1322042 化學式4-27- 1322042 Chemical Formula 4

—一NH- one NH

化學式5Chemical formula 5

-28- 1322042 化學式7-28- 1322042 Chemical Formula 7

此外,聚合物中之纖維素醯化物含量爲至少5 0重量% 。在纖維素醯化物中,在一個重複單位中,第六位置之醯基 取代程度爲X且其他位置之醯基取代程度爲Y時,較佳爲 滿足以下條件:X>〇.85及 2.70<Χ + Υ<2·99,而且特別是 Χ>0.90 及 2·80<Χ + Υ<2·99。 在膠狀膜之運輸方向爲水平或自鑄造位置PS向上時, 本發明亦有效。此具體實施例描述爲第9及1〇圖之鑄造設 備91。在這些圖中,如第2圖之相同裝置與構件具有相同之 號碼,而且省略其解釋。在鑄造設備91中,對第2圖之鑄 造設備16提供加熱板92與冷凝器93。應注意,在這些圖中 未描述液體接收器53與回收槽56,及連接之進料路徑。加 熱板92與冷凝器93之溫度各藉溫度控制器92a、93a控制 〇 第一及第二支撐輥32、33係與第2圖之轉動方向相反 地轉動。藉第一支撐輥32上方之鑄模14在帶31上鑄造之 鑄造上模液1 4形成膠狀膜,其自鑄造位置P S幾乎水平地運 輸。加熱板92係提供於第一與第二支撐輥32、33間之帶3 1 上部(以下稱爲上帶)下方,及冷凝器93係提供於上帶上 之膠狀膜35上方。因而移動帶31上之膠狀膜35之溶劑蒸 發且被冷凝器93冷凝。 -29- 1322042 在第10圖中,各冷凝器93之形狀異於冷凝器52。 各冷凝器93之寬度方向,下表面之中間部份爲水平,而 邊緣部份具有小傾斜而使厚度較大。冷凝溶劑在各冷凝器 之傾斜邊緣部份上流動而到達側端,然後落入液體接收器 中。然後在回收槽中回收冷凝溶劑。應注意,膠狀膜35 冷凝器93間之距離d較佳爲〇. 1毫米至1 5毫米之範圍, 別是2毫米至10毫米之範圍。 將膠狀膜35進一步運輸至第二支撐輥33上,其具有 熱裝置(未示)。然後將第一與第二支撐輥32、33間之移 帶31下部(以下稱爲下帶)上之膠狀膜35運輸至剝除輥 ,其自帶3〗剝除膠狀膜35成爲薄膜36。在下帶上及在第 支撐輥32上運輸膠狀膜35時,藉加熱板52與冷凝器52 溶劑蒸發及冷凝。如此在此具體實施例中,無關膠狀膜 之運輸方向,自鑄造位置將溶劑均勻地蒸發及冷凝,而且 高產率回收溶劑。 此外,在使用圓筒作爲基板時本發明亦有效。在第 圖中,鑄造設備101具有圓筒1〇2作爲基板。在這些圖中 如第2圖之相同裝置與構件具有相同之號碼且省略其解釋 自鑄模14排放之鑄造上模液12在圓筒102上形成膠狀膜 。鑄造位置PS比圓筒1 〇2頂部稍低,而且首先將膠狀膜 自鑄造位置P S向下運輸。亦在此情形,較佳爲決定鑄造 置PS,使得在鑄造位置PS處之圓筒102正切線可幾乎與 自鑄模之鑄造上模液形成之曲線之正切線相符而幾乎相 -30- 1322042 將圓筒l'〇 2連接溫度控制器以將圓筒102表面加熱而 溶劑蒸發。因此,圓筒1〇2亦具有如第2圖之加熱板之相 效果。在膠狀膜35之外側配置多個冷凝器105’而且冷凝 溶劑在冷凝器]〇5斜面上流動,及落入液體接收器53中 然後藉回收槽56回收冷凝之溶劑成爲回收溶劑。藉剝除 37剝除轉動圓筒102上之膠狀膜35成爲薄膜36’及運輸 乾燥設備17(參見第1圖)以用於次一進度。如此防止鑄 上模液自膠狀膜滴下,將膠狀膜35均勻地乾燥,及以高 率回收溶劑。應注意,在圓筒之轉動方向爲此具體實施例 相反方向時,首先將膠狀膜35自鑄造位置向上運輸。亦 此情形,將膠狀膜35均勻地乾燥且薄膜之厚度均勻性變 。應注意,冷凝器1 05之溫度係藉溫度控制器1 05a控制 此外,本發明亦應用於乾燥設備17中之張力裝置41 以將其中之薄膜36乾燥。如第12圖所示,各夾式張力機1 具有主體111a及夾構件111b。在張力裝置41中,薄膜 之側部係以夾式張力機1 1 1夾住,即,夾在主體1 1 1 a與 構件111b之間,而且藉由移動夾式張力機ill而將薄膜 運輸及抽拉。張力裝置41進一步包括用於將薄膜36中之 劑蒸發之加熱板1 1 2,及用於將溶劑蒸氣冷凝之冷凝器i 。如此薄膜具有適合光學用途之均勻厚度,而且亦在乾燥 備17中完成溶劑回收。因此,本發明對張力裝置41之應 爲有效的。 此外,加熱構件不限於加熱板1 1 2。如第1 3圖所示 使用微波導引件122作爲將薄膜36加熱之加熱構件。微 -31- 1322042 導引件1 2 2將微波照射至薄膜3 6,使得含於薄膜3 6中之溶 劑分子之能量變高,如此將溶劑蒸發。溶劑蒸氣係藉冷凝器 1 2 3冷凝。 在應用於取代第12圖中之具夾式張力機111之張力裝 置41之數種其他張力裝置時,本發明亦有效。如第13圖所 示,張力裝置121包括針式張力機125。各針式張力機125 具有數根用於將薄膜36固定於針式張力機125之針125a。 應注意,微波導引件不僅用於張力裝置,亦可用於鑄造裝置 ,只要產生之能量之功率足夠。 鲁 在以上方法中得到之薄膜可作爲偏光過濾器保護膜。作 爲偏光過濾器之偏光膜之主要內容物之聚合物特佳爲聚乙 烯醇型聚合物。至於聚乙烯醇型聚合物,不僅有聚乙稀醇, 亦有烷基變性聚乙烯醇。此外,聚乙烯醇型聚合物通常藉由 ' 將聚乙酸乙烯酯皂化而製造,其中將乙酸乙烯酯聚合。然而 ,聚乙烯醇型聚合物可在聚乙烯醇型聚合物與少量不飽和 羧酸、其衍生物(例如,鹽 '酯、醯胺、腈等)、燦烴、乙 烯醚 '不飽和磺酸之鹽之聚合中製造。烷基變性聚乙稀醇在 鲁 其分子端具有烷基’及皂化程度爲至少80%,而且聚合程度 爲至少2 0 0。 聚乙烯醇型聚合物以外之其他聚合物可用於本發明偏 光膜’例如’聚碳酸酯型聚合物' 纖維素型聚合物等。 在聚乙嫌醇型聚合物作爲偏光膜12之主要內容物時, 偏光膜可藉氣相吸附法或液相吸附法染色。在此具體實施例 中’偏光膜係藉液相吸附法染色。然而,本發明不依附這些 -32- 1322042 方法。 在此具體實施例之液相吸附法染色中使用碘。然而,本 發明不限於此。將聚乙烯醇薄膜浸於碘/碘化鉀(KI)水溶液中 至少30秒及最多50〇〇秒。較佳爲,溶液中之碘濃度爲〇1 克/公升至20克/公升,及碘化鉀爲1克/公升至ι〇〇克/公升 。應注意’較佳爲用於浸漬聚乙烯醇之溶液溫度爲5。(:至50 。0。 在液相吸附法中,除了以上之浸漬聚乙烯醇薄膜之方法 ’可將碘或其他染料之溶液以已知方式塗覆或噴灑在聚乙 鲁 烯醇薄膜上。聚乙烯醇可在拉伸前後著色6然而,在染色後 ’聚乙烯醇薄膜適當地膨脹,而且其薄膜在染色後張開。因 而較佳爲在拉伸前將聚乙烯醇薄膜染色。 除了碘可使用二色染料(包括顏料)。二色染料有偶 氮染料、二苯乙烯染料、吡唑晴染料、三苯基甲烷染料、睦 . 啉染料、噚哄染料、三哄染料、蒽醌染料等染料材料。較佳 爲,此染料材料可溶於水中。較佳爲,二色染料具有親水性 取代基,如磺酸基、胺基、羥基等。 鲁 至於二色染料,有 Cl Direct Yellow 12、CI Direct 〇range 39、Cl Direct Orange 72、Cl Direct Red 39、ci Direct Red 79 、Cl Direct Red 81 ' Cl Direct Red 83、q i Direct Red 89、Further, the cellulose halide content in the polymer is at least 50% by weight. In the cellulose oxime, in a repeating unit, when the thiol substitution degree of the sixth position is X and the thiol substitution degree of the other position is Y, it is preferable to satisfy the following conditions: X > 〇.85 and 2.70<;Χ + Υ<2·99, and especially Χ>0.90 and 2·80<Χ + Υ<2·99. The present invention is also effective when the direction of transport of the gel film is horizontal or from the casting position PS upward. This embodiment is described as casting apparatus 91 of Figures 9 and 1 . In these figures, the same devices and members as those in Fig. 2 have the same reference numerals, and the explanation thereof is omitted. In the casting apparatus 91, a heating plate 92 and a condenser 93 are provided to the casting apparatus 16 of Fig. 2. It should be noted that the liquid receiver 53 and the recovery tank 56, and the feed path of the connection are not described in these figures. The temperatures of the heating plate 92 and the condenser 93 are controlled by the temperature controllers 92a, 93a. The first and second support rollers 32, 33 are rotated opposite to the direction of rotation of the second figure. The casting mold liquid 14 cast on the belt 31 by the mold 14 above the first support roller 32 forms a gel-like film which is transported almost horizontally from the casting position P S . The heating plate 92 is provided below the upper portion of the belt 3 1 between the first and second support rollers 32, 33 (hereinafter referred to as the upper belt), and the condenser 93 is provided above the gel film 35 on the upper belt. Thus, the solvent of the gel film 35 on the moving belt 31 is evaporated and condensed by the condenser 93. -29- 1322042 In Fig. 10, each condenser 93 is shaped differently from the condenser 52. In the width direction of each condenser 93, the middle portion of the lower surface is horizontal, and the edge portion has a small inclination to make the thickness large. The condensed solvent flows on the inclined edge portions of the respective condensers to reach the side ends, and then falls into the liquid receiver. The condensed solvent is then recovered in the recovery tank. It should be noted that the distance d between the condenser film 35 and the condenser 93 is preferably in the range of from 1 mm to 15 mm, and not in the range of from 2 mm to 10 mm. The gel film 35 is further transported to the second support roller 33, which has a heat device (not shown). Then, the gel film 35 on the lower portion of the transfer belt 31 between the first and second support rollers 32, 33 (hereinafter referred to as the lower belt) is transported to the stripping roller, which strips the gel film 35 into a film. 36. When the gel film 35 is transported on the lower belt and on the first support roller 32, the solvent is evaporated and condensed by the heating plate 52 and the condenser 52. Thus, in this embodiment, regardless of the direction of transport of the gel-like film, the solvent is uniformly evaporated and condensed from the casting position, and the solvent is recovered in a high yield. Further, the present invention is also effective when a cylinder is used as the substrate. In the figure, the casting apparatus 101 has a cylinder 1〇2 as a substrate. In the drawings, the same devices and members have the same reference numerals as in Fig. 2, and the explanation thereof is omitted. The casting mold liquid 12 discharged from the mold 14 forms a gel film on the cylinder 102. The casting position PS is slightly lower than the top of the cylinder 1 〇 2, and the gel film is first transported downward from the casting position P S . Also in this case, it is preferred to determine the casting PS so that the tangent to the cylinder 102 at the casting position PS can almost coincide with the tangent of the curve formed by the casting mold from the mold, and almost -30-1322042 The cylinder l'〇2 is connected to a temperature controller to heat the surface of the cylinder 102 and evaporate the solvent. Therefore, the cylinder 1〇2 also has the effect of the heating plate as shown in Fig. 2. A plurality of condensers 105' are disposed on the outer side of the gel film 35, and the condensed solvent flows on the slope of the condenser 〇5, and falls into the liquid receiver 53, and the condensed solvent is recovered by the recovery tank 56 to be a recovery solvent. By stripping 37, the gel film 35 on the rotating cylinder 102 is peeled off into a film 36' and a transport drying device 17 (see Fig. 1) for the next progress. Thus, the mold liquid is prevented from dripping from the gel film, the gel film 35 is uniformly dried, and the solvent is recovered at a high rate. It should be noted that when the direction of rotation of the cylinder is in the opposite direction of this embodiment, the gel film 35 is first transported upward from the casting position. Also in this case, the gel film 35 is uniformly dried and the thickness uniformity of the film is changed. It should be noted that the temperature of the condenser 105 is controlled by the temperature controller 105a. Furthermore, the invention is also applied to the tensioning device 41 in the drying apparatus 17 to dry the film 36 therein. As shown in Fig. 12, each of the clip type tension machines 1 has a main body 111a and a clip member 111b. In the tension device 41, the side portions of the film are sandwiched by the clip tensioner 1 1 1 , that is, sandwiched between the main body 1 1 1 a and the member 111b, and the film is transported by moving the clamp tension machine ill. And pulling. The tensioning device 41 further includes a heating plate 1 12 for evaporating the agent in the film 36, and a condenser i for condensing the solvent vapor. Such a film has a uniform thickness suitable for optical use, and solvent recovery is also accomplished in the drying unit 17. Therefore, the present invention should be effective for the tension device 41. Further, the heating member is not limited to the heating plate 1 12 . The microwave guide 122 is used as the heating member for heating the film 36 as shown in Fig. 13. Micro-31- 1322042 The guide member 1 2 2 irradiates the microwave to the film 36, so that the energy of the solvent molecules contained in the film 36 becomes high, thus evaporating the solvent. The solvent vapor is condensed by the condenser 1 2 3 . The present invention is also effective when applied to a plurality of other tension devices that replace the tension device 41 of the clip type tension machine 111 in Fig. 12. As shown in Fig. 13, the tension device 121 includes a needle tensioner 125. Each of the needle tensioners 125 has a plurality of needles 125a for fixing the film 36 to the needle tensioner 125. It should be noted that the microwave guide member is used not only for the tension device but also for the casting device as long as the power of the generated energy is sufficient. The film obtained in the above method can be used as a polarizing filter protective film. The polymer which is the main content of the polarizing film of the polarizing filter is particularly preferably a polyvinyl alcohol type polymer. As for the polyvinyl alcohol type polymer, there are not only a polyethylene glycol but also an alkyl modified polyvinyl alcohol. Further, a polyvinyl alcohol type polymer is usually produced by saponifying polyvinyl acetate in which vinyl acetate is polymerized. However, the polyvinyl alcohol type polymer may be in a polyvinyl alcohol type polymer with a small amount of an unsaturated carboxylic acid, a derivative thereof (for example, a salt 'ester, a guanamine, a nitrile, etc.), a cannon, a vinyl ether 'unsaturated sulfonic acid. Manufactured in the polymerization of salt. The alkyl-denatured polyvinyl alcohol has an alkyl group at the molecular end and a degree of saponification of at least 80%, and a degree of polymerization of at least 200. Other polymers than the polyvinyl alcohol type polymer can be used in the polarizing film of the present invention, for example, a 'polycarbonate type polymer', a cellulose type polymer or the like. When the polyethyl alcohol model is used as the main content of the polarizing film 12, the polarizing film can be dyed by a vapor phase adsorption method or a liquid phase adsorption method. In this embodiment, the polarizing film is dyed by liquid phase adsorption. However, the present invention does not rely on these -32-1322042 methods. Iodine is used in the liquid phase adsorption staining of this embodiment. However, the invention is not limited thereto. The polyvinyl alcohol film is immersed in an aqueous solution of iodine/potassium iodide (KI) for at least 30 seconds and at most 50 seconds. Preferably, the iodine concentration in the solution is from 1 g/L to 20 g/L, and the potassium iodide is from 1 g/L to Ig/L. It should be noted that the temperature of the solution for impregnating the polyvinyl alcohol is preferably 5. (: to 50. 0. In the liquid phase adsorption method, in addition to the above method of impregnating a polyvinyl alcohol film, a solution of iodine or other dye may be applied or sprayed on the polyethylene film in a known manner. The polyvinyl alcohol can be colored before and after stretching. However, after the dyeing, the polyvinyl alcohol film is appropriately expanded, and the film is opened after dyeing. Therefore, it is preferred to dye the polyvinyl alcohol film before stretching. Dichroic dyes (including pigments) can be used. Dichromatic dyes are azo dyes, stilbene dyes, pyrazol dyes, triphenylmethane dyes, porphyrin dyes, anthraquinone dyes, triterpenoid dyes, anthraquinone dyes. Preferably, the dye material is soluble in water. Preferably, the dichroic dye has a hydrophilic substituent such as a sulfonic acid group, an amine group, a hydroxyl group, etc. Lu is a dichromatic dye having Cl Direct Yellow 12. CI Direct 〇range 39, Cl Direct Orange 72, Cl Direct Red 39, ci Direct Red 79, Cl Direct Red 81 'Cl Direct Red 83, qi Direct Red 89,

Cl Direct Violet 48 ' Cl Direct Blue 67 > ci Direct Blue 90 、CI Direct Green 59、CI Acid Red 37 等。 此外,有其他之染料敘述於日本專利公開公告第i_ 1 6 1202 ' 1 -1 72906 ' 1 - 1 72907 ' 1 - 1 836〇2> 1 -248 1 05 ' 1 -265205 -33- 1322042 、7-26 1 024號等。這些二色染料係以自由酸、鹼金屬鹽 '銨 鹽、與胺鹽而使用。 在混合多種二色染料時,則偏光鏡(或偏光膜)可具有 數種色相或色調。較佳爲,偏光過濾器(或偏光元件)具有 使得兩個偏光過德器(或偏光元件)在以正交尼科耳位置固 定時可顯示黑色之化合物。 在將其設計爲在著色後將聚乙稀醇型薄膜張開時,使用 用於將聚乙烯醇交聯之化合物(或交聯劑)。具體而言,將 聚乙烯醇型薄膜浸於交聯劑溶液中,或者將交聯劑塗覆或噴 鲁 灑在聚乙烯醇型薄膜上。如此將聚乙烯醇型薄膜硬化而具有 適當之定向。應注意,聚乙烯醇型薄膜之交聯劑敘述於美國 重頒專利申請案第232897號,或可爲其他已知者。特佳爲 砸酸爲主材料。 爲了使所得薄膜黏附於偏光膜,有一種塗佈黏著劑之方 .· 法,或一種表面化學處理而對偏光膜與所得薄膜之至少一個 表面供應黏著性質之方法。在使用纖維素醯化物作爲保護膜 中之聚合物時,例如,特佳之表面處理方法爲酸處理、鹼處 * 理' 電暈放電處理、輝光放電處理、暴露於UV射線。 在此具體實施例中,在表面處理後以黏著劑將薄膜黏附 於偏光膜。表面處理爲鹼皂化。具體而言,將纖維素醯化物 形成之薄膜浸於鹼溶液,然後在酸溶液中中和,然後以水淸 洗,及乾燥。至於鹼溶液,例如,使用氫氧化鈉與氫氧化鉀 ,及其濃度較佳爲0.1N至3.0N。或者,鹼溶液之溫度較佳 爲室溫至9 0 °C。 -34- 1322042 薄膜係以黏著劑黏附於偏光膜,而且此黏著劑可爲已知 的。特佳爲硼化合物或聚乙烯醇之溶液,其含具有乙醯乙醯 基、磺酸基 '羧基'環氧烷基等之變性聚乙烯醇。較佳爲, 黏者劑在乾後具有0.01至10微米,而且特佳爲005至5 微米之厚度。 此外’所得薄膜用於光學補償膜,其中將薄膜塗以抗反 射層’及用於光學功能膜(如抗反射膜),其中在所得薄膜 上形成防眩層。這些產品可作爲液晶顯示器之零件。 爲了增加本發明之效果’進行上述具體實施例以外之以 _ 下具體實施例。應注意’本發明不依附以下之具體實施例。 [製備之上模液之製備] 製備製備之上模液之方法通常爲在室溫溶解聚合物。爲 了改良溶解均勻性,對本發明適當地應用冷溶法及熱溶法。 在冷溶法中’在-10 °C至4〇°C之接近室溫將聚合物(纖 : 維素醯化物等)、添加劑(顆粒等)逐漸攪拌加入。材料加 入可同時或循序進行。應注意,可製備各材料之溶液或分散 液,然後混合溶液或分散液。分散液係以使用攪拌槽之方法 鲁 製備,例如,使用連續噴射混合器(產品名稱:流動噴射混 合器,Funken Powtechs,Inc.製造)等之連續混合法。然而 ,在上模液之分散液足以用於本發明之溶液鑄造法時,製備 分散液之方法不限於此。例如,在乾冰/甲醇浴(-7 5°C )或二 乙二醇溶液(-30°C至-20°C )中進行冷卻。如此將聚合物溶 液中之溶劑與固體材料之混合物固化。然後將混合物加熱而 具有約〇°C至200 °C之溫度,以得到其中材料在溶劑中顯示 -35- 1322042 流動性之溶液。爲了使溫度更高,可將混合物在室溫靜置或 在溫浴中加熱。 在熱溶法中,在-10 °c至4(TC之接近室溫將聚合物(纖 維素醯化物等)、添加劑(顆粒等)逐漸攪拌加入溶劑中。 材料加入可同時或循序進行。然後將溶劑在約〇.2MPa至 30MPa之增壓下加熱而具有約7〇t:至240°C之溫度。較佳加 熱溫度爲80°C至220°C。然後將加熱溶液或分散液冷卻而具 有低於所使用溶劑成分之最低沸點之溫度。通常將溶液或分 散液冷卻至-10 °C至50 °C,以將壓力降低至大氣壓力。較佳 爲,使用冷卻水作爲冷卻介質,其係藉冷卻裝置冷卻》應注 意,如果需要則可加入添加劑。 較佳爲對在以上方法中得到之製備之上模液進行過濾 ,使得可去除不溶解顆粒或膠狀材料。至於用於過濾之過濾 介質,有濾紙、濾布、金屬網、金屬纖維、不織布等。此外 ,在上模液對抗殘留外來顆粒或不溶顆粒之基準嚴格時,串 列地配置多個過濾裝置,而且其循序地或個別地離線,使得 可藉多次過濾而改良上模液之均勻性。 此外,在其中將顆粒加入製備之上模液之系統中,較佳 爲對含顆粒之上模液進行過濾。某些顆粒膠合而影響顆粒本 身或對製備之上模液之相容性。因此,膠合顆粒具有較大直 徑,其通常較佳爲去除。此顆粒有加入作爲消光劑之氧化矽 (si〇2)顆粒。 [溶劑] 用於本發明之溶劑爲鹵化烴 '酯、酮、醚、醇等。然而 -36- 1322042 ’其不限於此。可使用單類溶劑(i 〇 〇重量% )作爲上模液 之溶劑’或者可按預定之混合比例混合數種溶劑。 至於可使用溶劑,有鹵化烴(例如,二氯甲烷、氯仿等 )'醋(乙酸甲酯 '甲酸甲酯、乙酸乙酯、乙酸戊酯 '乙酸 丁醋等)、酮(例如’丙酮、甲乙酮' 環戊酮 '環己酮等)、 醚(例如’二喂院、二氧雜烷 '四氫呋喃 '二乙醚、甲基第 二丁基醚等)' 醇(例如,甲醇、乙醇 '異丙醇、正丙醇、 正丁醇、環己醇、環戊醇等)' 芳族烴(例如,苯、甲苯' 二甲苯、己烷等)等。 使用乙酸甲醋作爲單一溶劑或作爲混合物溶劑之主要 內容物在本發明中爲有效的。在使用混合物溶劑時,可易於 調整上模液之特性(如凝膠強度與剪切黏度等)。至於混合 乙酸甲酯之次內容物之溶劑,不僅有酮類,亦有醇類(甲醇 、正丁醇等)。此外,混合物溶劑可藉由混合乙酸甲酯與至 少兩種溶劑而製備。應注意,混合物溶劑之主要內容物表示 具有混合物溶劑之最大含量比例之溶劑,及次內容物表示不 具有混合物溶劑之最大含量比例之溶劑。此外,次內容物不 限於一種溶劑。 在使用纖維素三乙酸酯(TAC)作爲聚合物及使用乙酸甲 酯作爲溶劑之主要內容物而製備上模液時,就TAC之溶解 度而言,較佳爲混合物溶劑中之乙酸甲酯含量百分比爲50 重量%至93重量%,酮類爲2重量%至20重量% (例如,丙 酮、甲乙酮、環戊酮 '環己酮等,而且可使用其一或可使用 多種),及醇類爲5重量%至30重量% (例如,甲醇、乙醇 -37- 1322042 、異丙醇、正丙醇、正丁醇、環己醇、環戊醇等,而且可使 用其一或可使用多種)。此外,可將酮類與醇類混合至少93 重量%之甲酸乙酯而得混合物溶劑。 '在將其設計爲使用纖維素三乙酸酯(TAC)作爲聚合物時 ,可使用二氯甲烷作爲單一溶劑或混合物溶劑之主要內容 物。因TAC易溶解二氯甲烷,使聚合物溶液之製備容易。 此外,在使用二氯甲烷作爲混合物溶劑之主要內容物時,女卩 同使用乙酸甲酯,可調整聚合物溶液之特性。較佳爲,混合 物溶劑中之二氯甲烷含量比例爲50重量%至95重量%,酮 類爲〇重量%至20重量% (例如.,丙酮、甲乙酮、環戊酮、 環己酮等,而且可使用其一或可使用多種),及醇類爲5重 量%至30重量% (例如,甲醇、乙醇、異丙醇、正丙醇、正 丁醇、環己醇、環戊醇等,而且可使用其一或可使用多種) 。此外,可將酮類與醇類混合至少95重量%之二氯甲烷而得 混合物溶劑。 [添加劑] 用於本發明之添加劑並未特別地限制。至於添加劑,有 塑性劑、UV安定劑 '消光劑 '模具潤滑劑、氟化物型表面 活性劑、脫模劑、退化抑制劑、阻滯調整劑 '膠化劑等。添 加劑可在製備上模溶液之任何步驟混合聚合物,或者,可恰 在完成鑄造前加入鑄造上模液。例如,添加劑可在聚合物膨 脹時加入,或者可在薄膜製造程序中,在基板上將鑄造溶液 自鑄模鑄造時或恰好之前,藉靜態混合器加入鑄造上模液且 混合。 -38- 1322042 [塑性劑] · 至於用於本發明之塑性劑,有磷酸酯型(例如,磷酸三 苯酯(TPP)、磷酸三甲苯酯、磷酸甲苯基二苯酯 '磷酸辛基 二苯酯、磷酸聯苯基二苯酯(BDP)、磷酸三辛酯、磷酸三丁 酯等)、酞酸酯型(例如,酞酸二乙酯、酞酸二甲氧基甲酯 '酞酸二甲酯、酞酸二辛酯等)、羥乙酸酯型(例如,三乙 酸甘油酯、三丁酸甘油酯、羥乙酸丁基酞基丁酯、羥乙酸乙 基酞基乙酯、羥乙酸甲基酞基乙酯、羥乙酸丁基酞基丁酯等 )、及其他塑化劑。 籲 可使用僅一種塑性劑,或可混合多種塑性劑。塑性劑較 佳爲含上模溶液中之聚合物之1-20重量%。此外,亦可使用 曰本專利公開公告第11-80381' 11-124445、 11-248940號所 述之其他塑性劑。 _ [U V吸收劑] : 在本發明中,較佳爲溶液中含一或多種UV吸收劑。就 液晶化合物退化之保護而言,U V吸收劑較佳爲優於吸收波 長等於或小於37〇奈米之UV射線。此外,就液晶之顯示力 * 而言,UV吸收劑較佳爲不吸收波長等於或超過400奈米之 可見光射線。 至於UV吸收劑,例如,有氧基二苯基酮型化合物、苯 幷三唑型化合物、柳酸酯型化合物、二苯基酮型化合物、氰 基丙烯酸酯型化合物、鎳錯合鹽型化合物。特佳爲苯并三唑 型化合物與二苯基酮型化合物。特佳爲二苯基酮型化合物, 因爲其不意料外地發生纖維素酯之變色。此外爲日本專利公 -39- 1322042 開公告第H08-296 1 9號揭示之苯并三唑型化合物之UV吸收 劑,及日本專利公開公告第H08-239509號揭示之UV吸收 劑。此外,可加入其他已知之UV吸收劑。UV吸收劑之含 量較佳爲含聚合物之0.1 -1 0重量%。 至於較佳UV吸收劑,有2,6-二第三丁基對甲酚、異戊 四醇-肆[3-( 3,5-二第三丁基-4-羥基苯基)丙酸酯]' 三乙二 醇-貳[3-(3-第三丁基-5-甲基-4-羥基苯基)丙酸酯]、1,6_ 己二醇-貳[3- (3,5-二第三丁基-4-羥基苯基)丙酸酯]、2,4· 貳(正辛硫基)-6-(4-羥基-3,5-二第三丁基苯胺基)-H5-三畊、2,2-硫-二伸乙基貳[3- (3,5-二第三丁基-4-羥基苯基 )丙酸酯]、2- (2,-羥基- 3’,5’-二第三丁基苯基)-5-氯苯并 三唑、2- (2’_羥基-3,,5’-二第三丁基戊基苯基)-5-氯苯并 三唑、十八碳基-3-( 3,5-二第三丁基_4_羥基苯基)丙酸酯' ^^,1'>1’-伸己基戴(3,5-二第三丁基-4-經基117<11'〇〇)〇1611醯胺) 、1,3,5-三甲基-2,4,6-参(3,5-二第三丁基-4-羥基二苯乙二 酮)苯、参^^-二第三丁基-扣羥基二苯乙二酮)。…“!^^^ 等。特佳爲2,6-二第三丁基對甲酚、異戊四醇-肆[3-(3,5-二第三丁基-4·羥基苯基)丙酸酯]' 三乙二醇-貳[3-(3-第三 丁基_5·甲基-4-羥基苯基)丙酸酯]。此外,可混合及使用肼 化合物(如N,N’-貳[3 - (3,5-二第三丁基-4-羥基苯基)丙醯 基]肼等)及磷酸酯處理安定劑(如参(2,4-二第三丁基苯基 )磷酸酯等)之金屬去活化劑。 [消光劑] 上模溶液較佳爲含消光劑(顆粒粉末)以改良薄膜之高 -40- 1322042 濕度下黏附耐久性質及滑動性質。消光劑在表面上之平均凸 形高度較佳爲0.005U0微米,特別是0.01-5微米。凸形數 量較佳爲大。然而,在其大於所需時,凸形造成霧狀。此外 ,顆粒之主要直徑較佳爲1奈米至500奈米。然而,本發明 不限於此敘述》消光劑可爲無機及有機化合物。至於無機化 合物’有無機顆粒,如硫酸鋇、錳膠體、二氧化鈦、硫酸鋸 、氧化矽型(二氧化矽等)、氧化鋁、氧化鋅' 氧化錫、碳 酸釣 '硫酸鋇、滑石、高嶺土、硫酸耗。此外,有二氧化砂 (例如’在濕處理中或藉由將矽酸膠化而得到之合成矽石) 及由鈦礦渣與硫酸製造之二氧化鈦(金紅石型 '銳鈦礦型) 〇 無機消光劑亦可藉由硏磨直徑超過20微米之無機化合 物而得。在此情形’在硏磨後,例如,藉振動過濾、風力分 類進行無機化合物之分類。 至於有機化合物’有經硏磨及分類之有機聚合物化合物 ’例如’聚四氟乙烯、纖維素乙酸酯、聚苯乙烯、聚甲基丙 烯酸甲酯、聚甲基丙烯酸丙酯、聚丙烯酸甲酯、聚碳酸乙二 酯 '醯基苯乙烯型樹脂、聚矽氧型樹脂、聚碳酸酯型樹脂、 苯并胍胺型樹脂、三聚氰胺型樹脂、聚烯烴型粉末、聚酯型 樹脂、聚醯胺型樹脂、聚醯亞胺型樹脂、聚氟乙烯型樹脂、 與澱粉。有其他在懸浮液聚合中合成之聚合物 '在噴灑乾燥 法或分散法中得到之球形聚合物、及無機化合物。然而,在 上模溶液中顆粒粉末之量太大時,薄膜之彈性變低。因而上 模溶液較佳爲含聚合物之0.01-5重量。/〇之顆粒粉末。 -41 - 1322042 [模具潤滑劑] 模具潤滑劑經常加入上模液以使模塑更容易。在模具潤 滑劑中’有具高沸點之蠟、高碳脂肪酸與其鹽形式、酯、聚 矽氧油、聚乙烯醇、低分子量聚乙烯、蔬菜蛋白之衍生物等 。然而,本發明不限於此。較佳爲調整模具潤滑劑之加入量 ,使得模具潤滑劑對上模液中聚合物之重量百分比可爲 0.001重量%至1重量%之範圍,因爲模具潤滑劑對薄膜之亮 麗性及光滑性有影響。 [氟表面活性劑] 籲 在上模液中,亦可加入氟表面活性劑。氟表面活性劑具 有氟烴鏈之疏水性基,因此在有機溶劑或抗靜電劑中作爲塗 覆劑而降低表面張力。至於氟表面活性劑,例如,有 C8F17CH2CH20-(CH2CH20)1()-0S03Na ' C8F17S02N(C3H7)(CH2CH20)16-H、 C8F17S02N(C3H7)CH2C00K ' C7F15COONH4 ' C8F17S02N(C3H7)(CH2CH20)4- : (CH2)4-S03Na、C8F17S02N(C3H7)(CH2)rN+(CH3)3-r、 C8F17S02N(C3H7)CH2CH2CH2N+(CH3)2-CH2CO〇-、 C8F17CH2CH20(CH2CH20)16-H、C8F17CH2CH20(CH2)3-N+(CH3)3.I· ' H(CF2)8- ® CH2CH20C0CH2CH(S03)C00CH2CH2CH2CH2-(CF2)8-H ' h(cf2)6ch2ch2o(ch2ch2o)16-h、h(cf2)8ch2ch2o(ch2)3-n+(ch3)3.i·、 h(cf2)8ch2ch2ococh2ch(so3)cooch2ch2ch2ch2c8f丨7、c9fI7-c6h4-so2n(c3h7)(ch2ch2o)16-h、c9f17-c6h4-cso2n(c3h7)-(ch2)3-n+(ch3)3 Γ。 氟表面活性劑在上模溶液中之量較佳爲聚合物之0.00重 量%。 [脫模劑] -42- 1322042 脫模劑可加入上模液以降低剝除力。至於脫模劑,表面 活性劑特佳。脫模劑有磷酸型、羧酸型'非離子型'陽離子 型等。然而’脫模劑不限於此。這些脫模劑敘述於日本專利 公開公告第61-243837號《此外,日本專利公開公告第57-5 00 8 3 3號教示以聚乙氧基磷酸酯作爲脫模劑。在日本專利公 開公告第6 1 -69845號中,剝除係藉由加入纖維素酯單/二磷 酸烷酯(其中未酯化羥基具有自由酸形式)而順利地完成。 此外,在日本專利公開公告第1 -299847號中,剝除力係藉 由加入無機顆粒及具未酯化羥基與環氧丙烷鏈之磷酸酯化 合物而降低。這些材料可作爲脫模劑。脫模劑之量爲聚合物 之0.0 0 1 -1重量%。 [退化抑制劑] 此外,退化抑制劑(抗氧化劑、過氧化物分解劑、自由 基抑制劑、金屬去活化劑、酸補獲劑、胺等)及UV安定劑 可加入上模液。此退化抑制劑及UV安定劑揭示於日本專利 公開公告第 60-235852、 3-199201、 5-1907073、 5-194789、 5-271471' 6-107854' 6-118233' 6-148430' 7-11056' 7-11055 、7-11056 > 8-29619、 8-239509、及 2000-204173 號。特佳 之退化抑制劑爲丁基化羥基甲苯(B HT)。此外,較佳爲製備 含聚合物之〇 . 〇 1重量%至5重量%之退化抑制劑之聚合物溶 液。 (阻滯調整劑) 在本發明中,降低阻滯之不均勻性。此外,可將阻滯調 整劑加入上模液以控制光學各向異性。阻滯調整劑增加所製 -43- 1322042 造薄膜之阻滯平均値。較佳爲使用具有至少兩個芳族基之芳 族化合物作爲阻滞調整劑。此外,可同時使用至少兩種芳族 化合物。在芳族化合物之芳族基中,不僅有芳族烴基,亦有 具有芳族烴特性之雜環基。應注意,較佳爲製備含聚合物之 0.01重量%至10重量%之阻滯調整劑之聚合物溶液。 芳族烴基特佳爲6員環(苯環)。具有芳族烴基特性之 雜環基較佳爲5員環、6員環或7員環,而且特佳爲5員環 或6員環。通常具有芳族烴特性之雜環基中之雙鍵係以最大 數量(或最多數量)形成。至於用於本發明之雜原子,氮原 子、氧原子與硫原子較佳,而且氮原子特佳。至於具有芳族 烴特性之雜環基,有呋喃環、噻吩環、吡咯環 ' 噚唑環、_ 唑環、異噻唑環、咪唑環、吡唑環、呋咕環'三唑環、哌喃 環、tftD定環、塔哄環、1^密陡環、啦讲環_、與1,3,5-三哄環等 。具體而言,經基氧基二苯基酮、2,4-;氧基二苯基 酮等可作爲阻滯調整劑。 較佳芳族環爲苯環 '呋喃環、噻吩環、吡格環、曙哗環 、唾哩環、味π坐環、二哩環、啦陡環、嚼陡環、啦哄環、粗 1,3,5-三畊環等。苯環與1,3,5-三畊環特佳。芳族化合物較 佳爲至少具有1,3,5-三畊環。 —種芳族化合物中之芳族環數量較佳爲2-20個,特別 是2-12個,而且特別是2-8個。兩種芳族環之組合係以如 下之組合關係之一完成:(a)形成縮合環,(b)形成直立地組 合兩個基之單鍵’(c)經鍵聯基組合。(在組合兩個芳族基時 ’無法形成其螺旋鍵聯。)各組合關係中之具體基示於以下 -44- 1322042 至於(a)中之縮合環,有茚環、萘環、奠環、荛環、菲 環、蒽環、芘環、吲哚環、異吲哚環、苯并呋喃環 '苯并噻 吩環、吲哚啉環 '苯并噚唑環、苯并噻唑環、苯并咪唑環、 苯并三唑環 '嘌呤環' 茚唑環 '克烷烯環、喹啉環、異喹啉 環、喹哄環 '喹唑啉環、辛啉環、喹噚啉環、酞哄環 '喋啶 環' 咔唑環'DY啶環、啡啶環、二苯并哌喃環、啡阱環、啡 噻哄環、氧硫雜蒽環、啡噚哄環、與噻茚環。較佳爲萘環、 莫環、吲哚環、苯并曙唑環、苯并咪唑環、與唼琳環。 較佳爲在(b)中形成單鍵以組合兩個芳族基之各碳原子 。爲了組合兩個芳族環,可形成二或更多個單鍵,使得在兩 個芳族環之間可形成非芳族雜環上之脂族環。 較佳爲將(c)中之鍵聯基組合二或更多個芳族環之各碳 原子。此鍵聯基爲伸烷基、伸烯基、伸炔基、_ C 〇 _、- 〇 _、 -NH-、-S-、及其組合。鍵聯基組合之實例示爲以下之(cd) 至(c-15)。應注意,各鍵聯基中右及左側之位置可反轉。 (c-1): -C0-0- (c-2): -CO-NH- (c-3): -伸烷基-0- (c-4): -NH-CO-NH- (c - 5 ): -NH-C0-0- (c-6): -0-C0-0- (c-7): -〇-伸烷基-0- (c-δ): -CO-伸烯基· -45- 1322042 (c-9): -CO-伸烯基-NH- (c-10): -CO-伸烯基-O- (C-1 1):-伸烷基-C O - O -伸烷基-〇 - c O -伸烷基-(c-12): -〇-伸院基- CO-O -伸烷基- O- CO-伸院基- 〇- (c-13): -O-CO-伸烷基-CO-O- (c-14): -NH-CO-伸烯基- (c-15): -O-CO-伸烯基- 芳族環及鍵聯基可具有取代基。至於取代基,有鹵素原 子(F、Cl、Br、I) '羥基 '羧基、氰基、胺基、硝基、硫 基、胺甲醯基、胺磺醯基、脲基、烷基、烯基、炔基、脂族 醯基、脂族醯氧基、烷氧基、烷氧基羰基、烷氧基羰基胺基 '烷硫基 '烷基磺醯基、脂族醯胺基 '脂族磺醯胺基、經脂 族取代胺基、經脂族取代胺甲醯基、經脂族取代胺磺醯基、 經脂族取代脲基 '及非芳族鍵聯環》 一種烷基中之碳原子數量較佳爲1至8個。鏈烷基,特 別是直鏈烷基,優於環形烷基。此外,烷基可具有取代基( 例如,羥基、羧基 '烷氧基、經烷基取代胺基)。至於烷基 (包括經取代烷基),有甲基、乙基、正丁基、正己基、2-羥基乙基、4-羧基丁基、2·甲氧基乙基、與2-二乙胺基乙基 。烯基中之碳原子數量較佳爲2至8個。鏈烯基,特別是直 鏈烯基,優於環形烯基。烯基可具有取代基。至於烯基,有 乙烯基、烯丙基與1-己烯基。炔基中之碳原子數量較佳爲2 至8個。鏈炔基,特別是直鏈炔基,優於環形炔基。炔基可 具有取代基。至於炔基,有乙炔基、1-丁炔基與1-己炔基。 -46- 1322042 脂族醯基中之碳原子數量較佳爲1至10個。至於脂族 醯基,有乙醯基、丙醯基與丁醯基。脂族醯氧基中之碳原子 數量較佳爲1至10個。至於脂族醯氧基,有乙醯氧基。烷 氧基中之碳原子數量較佳爲1至8個。烷氧基可具有取代基 (例如,烷氧基)。至於烷氧基(包括經取代烷氧基),有甲 氧基、乙氧基'丁氧基'與甲氧基乙氧基。烷氧基羰基中之 碳原子數量較佳爲2至10個.。至於烷氧基羰基,有甲氧基 羰基與乙氧基羰基。烷氧基羰基胺基中之碳原子數量較佳爲 2至10個。至於烷氧基羰基胺基,有甲氧基羰基胺基與乙氧 基羰基胺基。 烷硫基中之碳原子數量較佳爲1至12個。至於烷硫基 ,有甲硫基、乙硫基與辛硫基。烷基磺醯基中之碳原子數量 較佳爲1至8個。至於烷基磺醯基,有甲擴醯基與乙擴·醯基 。脂族醯胺基中之碳原子數量較佳爲1至10個。至於脂族 醯胺基,有乙醯胺。脂族磺醯胺基中之碳原子數量較佳爲1 至8個。至於脂族磺醯胺基,有甲磺醯胺、丁磺醯胺與正辛 磺醯胺。經脂族取代胺基中之碳原子數量較佳爲1至1 0個 。至於經脂族取代胺基,有二甲胺基、二乙胺基與2-羧基乙 胺基。經脂族取代胺甲醯基中之碳原子數量較佳爲2至10 個。至於經脂族取代胺甲醯基,有甲基胺甲醯基與二乙基胺 甲醯基。經脂族取代胺磺醯基中之碳原子數量較佳爲1至8 個。至於經脂族取代胺磺醯基,有甲基胺磺醯基與二乙基胺 磺醯基。經脂族取代脲基中之碳原子數量較佳爲2至10個 。至於經脂族取代脲基,有甲脲基。至於非芳族雜環基,有 -47- 1322042 哌旋基與嗎啉基。阻滯調整劑之分子量較佳爲300至800。 具體而言’阻滯調整劑揭示於日本專利公開公告第2000_ U1914、200-27 5434號 '及國際專利申請案WOOO/653 84號 〇 (上模液中固體材料濃度之測量方法) 爲了測量上模液中之固體材料濃度,自薄膜生產線取得 預定體積之上模液作爲樣品,及測量此樣品。然後將樣品在 1 20°c加熱2小時,及測量殘留材料之重量。然後得到殘留 材料對樣品之重量比例。在本發明中應注意,固體材料爲作 爲薄膜原料之添加劑與聚合物之混合物。各薄膜之純材料在 室溫並非始終爲固體材料。此外,本發明與固體材料濃度之 測量方法無關。 [實驗] 本發明之實驗係如下進行。然而,本發明不受此實驗限 制。 由以下之成分製備三種上模液A、B、C。應注意,用 於上模液A、B之纖維素三乙酸酯原料爲木漿,及上模液c 爲棉毛。此外,UV吸收劑I、II、III各爲2- ( 2’-羥基- 5,-甲基苯基)苯并三唑' 2,2’-二羥基-4-甲氧基二苯基酮、與 2- (2’-羥基-3,,5’-二第三丁基戊基苯基)-5-氯苯并三唑。 這些UV吸收劑I、II、III亦具有阻滯調整劑之效果。 (上模液A之製備) 製備上模液A之內容如下。首先,將二氯甲烷、甲醇 、乙醇、與正丁醇之混合溶劑冷卻至0°C,及將固體材料攪 -48- 1322042Cl Direct Violet 48 'Cl Direct Blue 67 > ci Direct Blue 90, CI Direct Green 59, CI Acid Red 37, etc. In addition, there are other dyes described in Japanese Patent Publication No. i_1 6 1202 ' 1 -1 72906 ' 1 - 1 72907 ' 1 - 1 836 〇 2 > 1 - 248 1 05 ' 1 - 265205 - 33 - 1322042 , 7 -26 1 024 and so on. These dichroic dyes are used as free acid, alkali metal salt 'ammonium salt, and amine salt. When a plurality of dichroic dyes are mixed, the polarizer (or polarizing film) may have several hue or hue. Preferably, the polarizing filter (or polarizing element) has a compound that causes the two polarizing passes (or polarizing elements) to display black at a crossed Nicol position. When it is designed to open the polyvinyl alcohol type film after coloring, a compound (or a crosslinking agent) for crosslinking polyvinyl alcohol is used. Specifically, the polyvinyl alcohol type film is immersed in the crosslinking agent solution, or the crosslinking agent is coated or sprayed onto the polyvinyl alcohol type film. The polyvinyl alcohol type film is thus hardened to have an appropriate orientation. It should be noted that the crosslinking agent of the polyvinyl alcohol type film is described in U.S. Patent Application Serial No. 232,897, or may be other known. It is especially good for citric acid. In order to adhere the obtained film to the polarizing film, there is a method of applying an adhesive, or a surface chemical treatment to supply an adhesive property to at least one surface of the polarizing film and the obtained film. When a cellulose halide is used as the polymer in the protective film, for example, a particularly preferred surface treatment method is an acid treatment, an alkali treatment, a corona discharge treatment, a glow discharge treatment, and exposure to UV rays. In this embodiment, the film is adhered to the polarizing film with an adhesive after the surface treatment. The surface treatment is alkali saponification. Specifically, the film formed of the cellulose halide is immersed in an alkali solution, then neutralized in an acid solution, then rinsed with water, and dried. As the alkali solution, for example, sodium hydroxide and potassium hydroxide are used, and the concentration thereof is preferably from 0.1 N to 3.0 N. Alternatively, the temperature of the alkali solution is preferably from room temperature to 90 °C. -34- 1322042 The film is adhered to the polarizing film with an adhesive, and the adhesive can be known. More preferably, it is a solution of a boron compound or a polyvinyl alcohol containing a denatured polyvinyl alcohol having an ethyl acetonitrile group, a sulfonic acid group 'carboxyl' epoxyalkyl group or the like. Preferably, the adhesive has a thickness of from 0.01 to 10 microns, and particularly preferably from 005 to 5 microns, after drying. Further, the resulting film is used for an optical compensation film in which the film is coated with an antireflection layer and for an optical functional film such as an antireflection film, wherein an antiglare layer is formed on the resulting film. These products can be used as parts of liquid crystal displays. In order to increase the effect of the present invention, the following specific embodiments are carried out. It should be noted that the present invention is not to be construed as the following specific embodiments. [Preparation of Preparation Molding Solution] A method of preparing the above molding liquid is usually to dissolve the polymer at room temperature. In order to improve the uniformity of dissolution, the cold solution method and the hot solution method are suitably applied to the present invention. In a cold solution method, a polymer (fiber: vitamin, etc.), an additive (particles, etc.) are gradually stirred and added at a temperature close to -10 ° C to 4 ° C. Material addition can be done simultaneously or sequentially. It should be noted that a solution or dispersion of each material may be prepared, and then the solution or dispersion may be mixed. The dispersion is prepared by a method using a stirring tank, for example, a continuous mixing method using a continuous jet mixer (product name: flow jet mixer, manufactured by Funken Powtechs, Inc.) or the like. However, when the dispersion of the upper molding liquid is sufficient for the solution casting method of the present invention, the method of preparing the dispersion is not limited thereto. For example, cooling is carried out in a dry ice/methanol bath (-7 5 ° C) or a diethylene glycol solution (-30 ° C to -20 ° C). The mixture of the solvent and the solid material in the polymer solution is thus cured. The mixture is then heated to have a temperature of about 〇 ° C to 200 ° C to obtain a solution in which the material exhibits -35 - 1322042 fluidity in a solvent. In order to make the temperature higher, the mixture can be allowed to stand at room temperature or heated in a warm bath. In the hot-melt method, the polymer (cellulose hydrazine, etc.), additives (particles, etc.) are gradually stirred into the solvent at -10 ° C to 4 (TC near room temperature. The material addition can be carried out simultaneously or sequentially. Then The solvent is heated under a pressurization of about 22 MPa to 30 MPa to have a temperature of about 7 〇t: to 240 ° C. The preferred heating temperature is from 80 ° C to 220 ° C. The heated solution or dispersion is then cooled. Having a temperature lower than the lowest boiling point of the solvent component used. The solution or dispersion is usually cooled to -10 ° C to 50 ° C to reduce the pressure to atmospheric pressure. Preferably, cooling water is used as the cooling medium. Cooling by means of a cooling device. It should be noted that additives may be added if necessary. It is preferred to filter the above-prepared molding liquid obtained in the above method so that the insoluble particles or the gel-like material can be removed. The filter medium includes filter paper, filter cloth, metal mesh, metal fiber, non-woven fabric, etc. In addition, when the upper molding liquid is strict against the residual foreign particles or insoluble particles, a plurality of filtering devices are arranged in series, and The grounding or the individual is off-line, so that the uniformity of the upper molding liquid can be improved by multiple filtrations. Further, in the system in which the particles are added to the molding liquid, it is preferred to filter the molding liquid containing the particles. Some of the particles are glued to affect the particle itself or to the compatibility of the molding solution. Therefore, the cemented particles have a larger diameter, which is usually preferably removed. This particle has cerium oxide added as a matting agent (si〇2). [Solvent] The solvent used in the present invention is a halogenated hydrocarbon 'ester, ketone, ether, alcohol, etc. However, -36-1322042' is not limited thereto. A single solvent (i 〇〇 weight %) can be used as the upper The solvent of the molding liquid' may be mixed with several solvents in a predetermined mixing ratio. As the solvent to be used, there may be a halogenated hydrocarbon (for example, dichloromethane, chloroform, etc.) 'vinegar (methyl acetate' methyl formate, ethyl acetate, Amyl acetate 'butyl acetate, etc.), ketone (eg 'acetone, methyl ethyl ketone' cyclopentanone' cyclohexanone, etc.), ether (eg 'di-hospital, dioxaline' tetrahydrofuran' diethyl ether, methyl second Butyl ether, etc.) 'alcohol (eg, methanol) Ethanol 'isopropyl alcohol, n-propanol, n-butanol, cyclohexanol, cyclopentanol, etc.) 'aromatic hydrocarbons (for example, benzene, toluene' xylene, hexane, etc.), etc. Using methyl acetate as a single solvent Or the main content of the solvent of the mixture is effective in the present invention. When the solvent of the mixture is used, the characteristics of the upper molding liquid (such as gel strength and shear viscosity, etc.) can be easily adjusted. The solvent of the substance is not only a ketone but also an alcohol (methanol, n-butanol, etc.) Further, the solvent of the mixture can be prepared by mixing methyl acetate with at least two solvents. It should be noted that the main content of the solvent of the mixture A solvent having a maximum content ratio of a mixture solvent, and a secondary content means a solvent having no maximum content ratio of the solvent of the mixture. Further, the secondary content is not limited to one solvent. When preparing the upper molding liquid using cellulose triacetate (TAC) as a polymer and using methyl acetate as a main content of the solvent, in terms of solubility of TAC, it is preferred that the methyl acetate content in the mixture solvent The percentage is from 50% by weight to 93% by weight, and the ketone is from 2% by weight to 20% by weight (for example, acetone, methyl ethyl ketone, cyclopentanone 'cyclohexanone, etc., and one or a plurality of them may be used), and an alcohol It is 5 wt% to 30 wt% (for example, methanol, ethanol-37-1322042, isopropanol, n-propanol, n-butanol, cyclohexanol, cyclopentanol, etc., and one of them may be used or a plurality of kinds may be used) . Further, at least 93% by weight of ethyl formate may be mixed with a ketone and an alcohol to obtain a mixture solvent. 'When it is designed to use cellulose triacetate (TAC) as a polymer, dichloromethane can be used as the main content of a single solvent or a mixture solvent. The preparation of the polymer solution is easy because TAC is easily soluble in dichloromethane. Further, when methylene chloride is used as the main content of the solvent of the mixture, the methyl ketone is used together with the methyl acetate to adjust the characteristics of the polymer solution. Preferably, the ratio of the methylene chloride content in the solvent of the mixture is from 50% by weight to 95% by weight, and the ketone is from 8% by weight to 20% by weight (for example, acetone, methyl ethyl ketone, cyclopentanone, cyclohexanone, etc. One of them may be used or a plurality of) may be used, and the alcohol may be 5% by weight to 30% by weight (for example, methanol, ethanol, isopropanol, n-propanol, n-butanol, cyclohexanol, cyclopentanol, etc.) One of them can be used or a plurality of can be used. Further, a ketone may be mixed with at least 95% by weight of methylene chloride to obtain a mixture solvent. [Additive] The additive used in the present invention is not particularly limited. As for the additive, there are a plasticizer, a UV stabilizer, a "matting agent" mold lubricant, a fluoride type surfactant, a mold release agent, a degradation inhibitor, a retardation modifier, a gelling agent, and the like. The additive may be used to mix the polymer at any step of preparing the upper mold solution, or the casting mold liquid may be added just before the completion of casting. For example, the additive may be added during expansion of the polymer, or may be added to the casting mold liquid by a static mixer and mixed during or just prior to casting the casting solution from the mold on the substrate. -38- 1322042 [Plastic agent] · As for the plasticizer used in the present invention, there is a phosphate type (for example, triphenyl phosphate (TPP), tricresyl phosphate, tolyldiphenyl phosphate phthalate diphenyl phosphate Ester, biphenyldiphenyl phosphate (BDP), trioctyl phosphate, tributyl phosphate, etc.), phthalate type (for example, diethyl phthalate, dimethoxymethyl phthalate phthalate) Methyl ester, dioctyl phthalate, etc., glycolic acid ester type (for example, triacetin, tributyrin, butyl butyl hydroxyacetate, ethyl decyl ethyl hydroxyacetate, glycolic acid Methyl decyl ethyl ester, butyl butyl hydroxy butyl acetate, etc., and other plasticizers. It is desirable to use only one type of plastic agent, or to mix a variety of plastic agents. The plasticizer is preferably from 1 to 20% by weight of the polymer in the upper mold solution. Further, other plastic agents described in Japanese Laid-Open Patent Publication No. 11-80381 '11-124445, No. 11-248940 may be used. _ [U V absorbent]: In the present invention, it is preferred that the solution contains one or more UV absorbers. In terms of protection against degradation of the liquid crystal compound, the U V absorbent is preferably superior to UV rays having an absorption wavelength of 37 Å or less. Further, in terms of the display force of the liquid crystal*, the UV absorber preferably does not absorb visible light having a wavelength of 400 nm or more. As the UV absorber, for example, an oxydiphenyl ketone type compound, a benzotriazole type compound, a salicylate type compound, a diphenyl ketone type compound, a cyanoacrylate type compound, a nickel complex salt type compound . Particularly preferred are benzotriazole type compounds and diphenyl ketone type compounds. It is particularly preferred to be a diphenylketone type compound because it is unexpectedly caused to cause discoloration of the cellulose ester. Further, it is a UV absorber of a benzotriazole type compound disclosed in Japanese Laid-Open Patent Publication No. H08-296119, and a UV absorber disclosed in Japanese Laid-Open Patent Publication No. H08-239509. In addition, other known UV absorbers may be added. The UV absorber is preferably contained in an amount of from 0.1 to 10% by weight based on the polymer. As a preferred UV absorber, there are 2,6-di-t-butyl-p-cresol, pentaerythritol-indole [3-(3,5-di-t-butyl-4-hydroxyphenyl)propionate. ]' Triethylene glycol-贰[3-(3-tert-butyl-5-methyl-4-hydroxyphenyl)propionate], 1,6-hexanediol-贰[3- (3,5 -di-t-butyl-4-hydroxyphenyl)propionate], 2,4·贰(n-octylthio)-6-(4-hydroxy-3,5-di-t-butylanilino)- H5-three tillage, 2,2-sulfan-diethylethyl[3-(3,5-di-t-butyl-4-hydroxyphenyl)propionate], 2-(2,-hydroxy-3) ',5'-di-t-butylphenyl)-5-chlorobenzotriazole, 2-(2'-hydroxy-3,5'-di-t-butylpentylphenyl)-5-chloro Benzotriazole, octadecyl-3-(3,5-di-t-butyl-4-yl-hydroxyphenyl)propionate '^^,1'>1'-extended hexyl wear (3,5 -di-tert-butyl-4-yl group 117 <11'〇〇)〇1611 decylamine), 1,3,5-trimethyl-2,4,6-para (3,5-di 3rd Benzyl-4-hydroxydiphenylethylenedione) benzene, ginseng-di-tert-butyl-dehydroxy hydroxydiphenylethylenedione). ..."!^^^, etc. Particularly preferred is 2,6-di-t-butyl-p-cresol, pentaerythritol-indole [3-(3,5-di-t-butyl-4-hydroxyphenyl) Propionate]' triethylene glycol-indole [3-(3-t-butyl-5-methyl-4-hydroxyphenyl)propionate]. In addition, hydrazine compounds (such as N, N'-贰[3 - (3,5-di-t-butyl-4-hydroxyphenyl)propanyl]anthracene) and phosphate ester stabilizers (such as ginseng (2,4-di-t-butyl) Metal deactivator of phenyl) phosphate, etc. [Matting agent] The upper mold solution preferably contains a matting agent (particulate powder) to improve the adhesion durability and sliding properties of the film at a high -40 to 1322042 humidity. The average convex height on the surface is preferably 0.005 U0 μm, particularly 0.01-5 μm. The number of convex shapes is preferably large. However, when it is larger than necessary, the convex shape causes haze. In addition, the main particles The diameter is preferably from 1 nm to 500 nm. However, the invention is not limited to the description. The matting agent may be an inorganic or organic compound. As for the inorganic compound, there are inorganic particles such as barium sulfate, manganese colloid, titanium dioxide, sulfuric acid saw, Yttrium oxide Type (cerium oxide, etc.), alumina, zinc oxide 'tin oxide, carbonic acid fishing 'barium sulfate, talc, kaolin, sulfuric acid. In addition, there are silica sand (for example 'in wet processing or by phthalic acid glue Synthetic vermiculite obtained by the invention and titanium dioxide (rutile type 'anatase type) 〇 inorganic matting agent made of titanium slag and sulfuric acid can also be obtained by honing an inorganic compound having a diameter of more than 20 μm. 'After honing, for example, classification of inorganic compounds by vibration filtration and wind classification. As for organic compounds, there are organic polymer compounds that have been honed and classified, such as 'polytetrafluoroethylene, cellulose acetate, poly Styrene, polymethyl methacrylate, polypropyl methacrylate, polymethyl acrylate, polyethylene carbonate 'nonyl styrene type resin, polyfluorene type resin, polycarbonate type resin, benzopyrene Amine type resin, melamine type resin, polyolefin type powder, polyester type resin, polyamid type resin, polyimine type resin, polyvinyl fluoride type resin, and starch. Others are mixed in suspension polymerization The polymer is a spherical polymer obtained by a spray drying method or a dispersion method, and an inorganic compound. However, when the amount of the particulate powder in the upper mold solution is too large, the elasticity of the film becomes low. It is a granule powder of 0.01 to 5% by weight of the polymer. -41 - 1322042 [Mold lubricant] The mold lubricant is often added to the upper molding liquid to make molding easier. It has a high boiling point in the mold lubricant. a wax, a high-carbon fatty acid and a salt thereof, an ester, a polyoxygenated oil, a polyvinyl alcohol, a low molecular weight polyethylene, a vegetable protein derivative, etc. However, the present invention is not limited thereto. It is preferred to adjust the addition of a mold lubricant. The amount of the mold lubricant to the polymer in the upper molding liquid may range from 0.001% by weight to 1% by weight because the mold lubricant has an influence on the brightness and smoothness of the film. [Fluorosurfactant] In the upper molding solution, a fluorosurfactant may also be added. The fluorosurfactant has a hydrophobic group of a fluorocarbon chain, and thus acts as a coating agent in an organic solvent or an antistatic agent to lower the surface tension. As the fluorosurfactant, for example, there are C8F17CH2CH20-(CH2CH20)1()-0S03Na 'C8F17S02N(C3H7)(CH2CH20)16-H, C8F17S02N(C3H7)CH2C00K 'C7F15COONH4 'C8F17S02N(C3H7)(CH2CH20)4- : ( CH2)4-S03Na, C8F17S02N(C3H7)(CH2)rN+(CH3)3-r, C8F17S02N(C3H7)CH2CH2CH2N+(CH3)2-CH2CO〇-, C8F17CH2CH20(CH2CH20)16-H, C8F17CH2CH20(CH2)3-N+ (CH3)3.I· 'H(CF2)8- ® CH2CH20C0CH2CH(S03)C00CH2CH2CH2CH2-(CF2)8-H 'h(cf2)6ch2ch2o(ch2ch2o)16-h,h(cf2)8ch2ch2o(ch2)3- n+(ch3)3.i·, h(cf2)8ch2ch2ococh2ch(so3)cooch2ch2ch2ch2c8f丨7,c9fI7-c6h4-so2n(c3h7)(ch2ch2o)16-h,c9f17-c6h4-cso2n(c3h7)-(ch2)3- n+(ch3)3 Γ. The amount of the fluorosurfactant in the upper mold solution is preferably 0.00% by weight of the polymer. [Release agent] -42- 1322042 The release agent can be added to the upper molding solution to reduce the stripping force. As for the release agent, the surfactant is particularly excellent. The release agent is a phosphoric acid type or a carboxylic acid type 'nonionic type' cationic type. However, the release agent is not limited to this. These release agents are described in Japanese Patent Laid-Open Publication No. 61-243837. In addition, Japanese Patent Laid-Open Publication No. 57-5 00 83 3 teaches polyethoxylated phosphate as a release agent. In the Japanese Patent Publication No. 61-69845, the stripping is smoothly carried out by adding a cellulose ester mono/diphosphate alkyl ester in which the unesterified hydroxyl group has a free acid form. Further, in Japanese Patent Laid-Open Publication No. Hei No. 1-299847, the peeling force is lowered by the addition of inorganic particles and a phosphate compound having an unesterified hydroxyl group and a propylene oxide chain. These materials can be used as release agents. The amount of the releasing agent is 0.01 to 1% by weight of the polymer. [Degradation inhibitor] Further, a degradation inhibitor (an antioxidant, a peroxide decomposing agent, a radical-based inhibitor, a metal deactivator, an acid-reducing agent, an amine, etc.) and a UV stabilizer can be added to the upper molding solution. This degradation inhibitor and UV stabilizer are disclosed in Japanese Patent Laid-Open Publication Nos. 60-235852, 3-199201, 5-1907073, 5-194789, 5-271471' 6-107854' 6-118233' 6-148430' 7-11056 ' 7-11055, 7-11056 > 8-29619, 8-239509, and 2000-204173. A particularly preferred degradation inhibitor is butylated hydroxytoluene (B HT). Further, it is preferred to prepare a polymer solution of a degradation inhibitor containing 1% by weight to 5% by weight of the polymer. (Blocking Adjusting Agent) In the present invention, the unevenness of the retardation is lowered. Further, a retardation adjusting agent may be added to the upper molding liquid to control optical anisotropy. The retarder adjuster increases the average enthalpy of the film produced by the -43-1322042 film. It is preferred to use an aromatic compound having at least two aromatic groups as a retardation modifier. In addition, at least two aromatic compounds can be used simultaneously. Among the aromatic groups of the aromatic compound, there are not only an aromatic hydrocarbon group but also a heterocyclic group having an aromatic hydrocarbon property. It should be noted that it is preferred to prepare a polymer solution containing 0.01% by weight to 10% by weight of the retarder of the polymer. The aromatic hydrocarbon group is preferably a 6-membered ring (benzene ring). The heterocyclic group having an aromatic hydrocarbon group property is preferably a 5-membered ring, a 6-membered ring or a 7-membered ring, and particularly preferably a 5-membered ring or a 6-membered ring. The double bond in the heterocyclic group usually having an aromatic hydrocarbon property is formed in the maximum amount (or the maximum amount). As the hetero atom used in the present invention, a nitrogen atom, an oxygen atom and a sulfur atom are preferred, and a nitrogen atom is particularly preferred. As the heterocyclic group having an aromatic hydrocarbon property, there are a furan ring, a thiophene ring, a pyrrole ring 'carbazole ring, an azole ring, an isothiazole ring, an imidazole ring, a pyrazole ring, a furazan ring, a triazole ring, and a pyran. Ring, tftD ring, tower ring, 1^ dense ring, Talk ring _, and 1,3,5-three ring and so on. Specifically, a oxydiphenyl ketone or a 2,4- oxydiphenyl ketone or the like can be used as a retardation adjuster. Preferred aromatic rings are benzene ring 'furan ring, thiophene ring, pyridyl ring, anthracene ring, salivary ring, taste π ring, two ring, steep ring, chew steep ring, 哄 ring, thick 1 , 3, 5 - three tillage rings, etc. The benzene ring is especially good with 1,3,5-three tillage rings. Preferably, the aromatic compound has at least 1,3,5-three tillage rings. The number of aromatic rings in the aromatic compound is preferably from 2 to 20, particularly from 2 to 12, and particularly from 2 to 8. The combination of the two aromatic rings is accomplished in one of the following combinations: (a) forming a condensed ring, and (b) forming a single bond '(c) which is uprightly combined with two groups. (When two aromatic groups are combined, 'the spiral bond cannot be formed.) The specific group in each combination relationship is shown in the following -44- 1322042. As for the condensed ring in (a), there are an anthracene ring, a naphthalene ring, and a ring. , anthracene ring, phenanthrene ring, anthracene ring, anthracene ring, anthracene ring, isoindole ring, benzofuran ring 'benzothiophene ring, porphyrin ring 'benzoxazole ring, benzothiazole ring, benzo Imidazole ring, benzotriazole ring 'anthracene ring' carbazole ring 'kalkenyl ring, quinoline ring, isoquinoline ring, quinacrid ring 'quinazoline ring, octyl ring, quinoxaline ring, anthracene ring' Acridine ring 'carbazole ring 'DY pyridine ring, pyridine ring, dibenzopyran ring, morphine ring, morphine ring, oxazepine ring, morphe ring, and thioindole ring. Preferred are a naphthalene ring, a molybdenum ring, an anthracene ring, a benzoxazole ring, a benzimidazole ring, and a fluorene ring. It is preferred to form a single bond in (b) to combine the carbon atoms of the two aromatic groups. In order to combine two aromatic rings, two or more single bonds may be formed such that an aliphatic ring on the non-aromatic heterocyclic ring may be formed between the two aromatic rings. Preferably, the bonding group in (c) is combined with each of the carbon atoms of two or more aromatic rings. The linkage is alkyl, alkenyl, alkynyl, _C 〇 _, - 〇 _, -NH-, -S-, and combinations thereof. Examples of the combination of the bond groups are shown as follows (cd) to (c-15). It should be noted that the positions of the right and left sides of each bonding group can be reversed. (c-1): -C0-0- (c-2): -CO-NH- (c-3): -alkyl-O-(c-4): -NH-CO-NH- (c - 5 ): -NH-C0-0- (c-6): -0-C0-0- (c-7): -〇-alkyl--0-(c-δ): -CO-exene -45- 1322042 (c-9): -CO-alkenyl-NH-(c-10): -CO-alkenyl-O-(C-1 1):-alkyl-CO- O-Alkyl-anthracene-c O-Alkyl-(c-12): -〇-Extension-based-CO-O-Alkyl-O-CO-Extension-Based----c-13 ): -O-CO-alkylene-CO-O- (c-14): -NH-CO-alkenyl-(c-15): -O-CO-alkenyl-aromatic ring and bond The linking group may have a substituent. As the substituent, there are a halogen atom (F, Cl, Br, I) 'hydroxy' carboxyl group, a cyano group, an amine group, a nitro group, a thio group, an amine carbaryl group, an amine sulfonyl group, a ureido group, an alkyl group, an alkene group. Alkyl, alkynyl, aliphatic fluorenyl, aliphatic methoxy, alkoxy, alkoxycarbonyl, alkoxycarbonylamino 'alkylthio'alkylsulfonyl, aliphatic guanylamino a sulfonamide group, an aliphatic substituted amine group, an aliphatic substituted amine carbenyl group, an aliphatic substituted amine sulfonyl group, an aliphatic substituted ureido group, and a non-aromatic bond ring. The number of carbon atoms is preferably from 1 to 8. Alkyl groups, especially linear alkyl groups, are preferred over cyclic alkyl groups. Further, the alkyl group may have a substituent (for example, a hydroxyl group, a carboxyl 'alkoxy group, an alkyl-substituted amine group). As for alkyl (including substituted alkyl), there are methyl, ethyl, n-butyl, n-hexyl, 2-hydroxyethyl, 4-carboxybutyl, 2-methoxyethyl, and 2-diethyl Aminoethyl. The number of carbon atoms in the alkenyl group is preferably from 2 to 8. Alkenyl groups, especially linear alkenyl groups, are preferred over cyclic alkenyl groups. The alkenyl group may have a substituent. As the alkenyl group, there are a vinyl group, an allyl group and a 1-hexenyl group. The number of carbon atoms in the alkynyl group is preferably from 2 to 8. An alkynyl group, especially a linear alkynyl group, is preferred over a cyclic alkynyl group. The alkynyl group may have a substituent. As the alkynyl group, there are an ethynyl group, a 1-butynyl group and a 1-hexynyl group. -46- 1322042 The number of carbon atoms in the aliphatic sulfhydryl group is preferably from 1 to 10. As for the aliphatic thiol group, there are an ethyl group, a propyl group and a butyl group. The number of carbon atoms in the aliphatic methoxy group is preferably from 1 to 10. As for the aliphatic methoxy group, there is an ethoxy group. The number of carbon atoms in the alkoxy group is preferably from 1 to 8. The alkoxy group may have a substituent (e.g., an alkoxy group). As for the alkoxy group (including the substituted alkoxy group), there are a methoxy group, an ethoxy 'butoxy group' and a methoxyethoxy group. The number of carbon atoms in the alkoxycarbonyl group is preferably from 2 to 10. As the alkoxycarbonyl group, there are a methoxycarbonyl group and an ethoxycarbonyl group. The number of carbon atoms in the alkoxycarbonylamino group is preferably from 2 to 10. As the alkoxycarbonylamino group, there are a methoxycarbonylamino group and an ethoxycarbonylamino group. The number of carbon atoms in the alkylthio group is preferably from 1 to 12. As for the alkylthio group, there are a methylthio group, an ethylthio group and an octylthio group. The number of carbon atoms in the alkylsulfonyl group is preferably from 1 to 8. As for the alkylsulfonyl group, there are a fluorenyl group and a fluorene group. The number of carbon atoms in the aliphatic guanamine group is preferably from 1 to 10. As for the aliphatic guanamine group, there is acetaminophen. The number of carbon atoms in the aliphatic sulfonamide group is preferably from 1 to 8. As the aliphatic sulfonamide group, there are methotrexate, butazone and n-octylsulfonamide. The number of carbon atoms in the aliphatic substituted amine group is preferably from 1 to 10 carbon atoms. As the aliphatic substituted amino group, there are a dimethylamino group, a diethylamino group and a 2-carboxyethylamino group. The number of carbon atoms in the aliphatic substituted amine indenyl group is preferably from 2 to 10. As for the aliphatic substituted amine carbenyl group, there are methylamine methyl sulfonyl group and diethylamine methyl fluorenyl group. The number of carbon atoms in the aliphatic substituted amine sulfonyl group is preferably from 1 to 8. As the aliphatic substituted sulfonyl group, there are methylamine sulfonyl group and diethylamine sulfonyl group. The number of carbon atoms in the aliphatic substituted urea group is preferably from 2 to 10. As for the aliphatic substituted urea group, there is a methylurea group. As the non-aromatic heterocyclic group, there are -47- 1322042 piperidyl group and morpholinyl group. The molecular weight of the retardation modifier is preferably from 300 to 800. Specifically, the retardation adjusting agent is disclosed in Japanese Patent Laid-Open Publication No. 2000_U1914, No. 200-27 5434, and International Patent Application No. WOOO/653 No. 84 (Measurement Method of Solid Material Concentration in Upper Mould Liquid) for Measurement The concentration of the solid material in the molding liquid is obtained by taking a predetermined volume of the molding liquid from the film production line as a sample, and measuring the sample. The sample was then heated at 1200 °C for 2 hours and the weight of the residual material was measured. The weight ratio of residual material to sample is then obtained. It should be noted in the present invention that the solid material is a mixture of an additive and a polymer as a raw material of the film. The pure material of each film is not always a solid material at room temperature. Furthermore, the present invention is independent of the method of measuring the concentration of solid materials. [Experiment] The experiment of the present invention was carried out as follows. However, the invention is not limited by this experiment. Three kinds of upper molding liquids A, B, and C were prepared from the following components. It should be noted that the cellulose triacetate raw material for the upper molding liquids A and B is wood pulp, and the upper molding liquid c is cotton wool. Further, each of the UV absorbers I, II, and III is 2-( 2'-hydroxy-5,-methylphenyl)benzotriazole ' 2,2'-dihydroxy-4-methoxydiphenyl ketone And 2-(2'-hydroxy-3,5'-di-t-butylpentylphenyl)-5-chlorobenzotriazole. These UV absorbers I, II, and III also have the effect of retarding the modifier. (Preparation of the upper molding liquid A) The contents of the upper molding liquid A were prepared as follows. First, the mixed solvent of dichloromethane, methanol, ethanol, and n-butanol is cooled to 0 ° C, and the solid material is stirred -48- 1322042

拌加入混合物溶劑以將固體材料均勻地分散。然後以管線( 包括靜態混合器)將分散液壓力增至20公斤/平方公分,同 時將分散液加熱至兩個預設溫度。如此將固體材料溶解而得 上模液。預設溫度爲首先7 0 °C然後3 8 °C。此外,將上模液 循序地冷卻至兩個預設溫度,然後使用絕對孔徑爲10微米 之濾紙進行過濾。冷卻之預設溫度爲首先7 然後3 8 t。 將過濾溶液加熱以進行急驟蒸發。如此將部份溶劑蒸發,及 使固體內容物之濃度爲23%。然後使用絕對孔徑爲5微米之 燒結金屬過濾器進行過濾而得到上模液A。 1 8 · 9 0重量% 1 .0 0重量% 0.6 0重量% 〇 . 5 0重量% 〇 · 1 0重量% 0.2 0重量% 0 · 3 0 重量 °/〇 〇 . 0 5重量% 〇 . 〇 2重量% 〇 _ 3 0重量% ό 0.9 0重量%The mixture solvent is added to mix to uniformly disperse the solid material. The dispersion pressure was then increased to 20 kg/cm 2 in a line (including a static mixer) while the dispersion was heated to two preset temperatures. The solid material is dissolved in this way to obtain a molding liquid. The preset temperature is first 70 °C and then 3 8 °C. Further, the upper molding liquid was sequentially cooled to two preset temperatures, and then filtered using a filter paper having an absolute pore size of 10 μm. The preset temperature for cooling is first 7 then 3 8 t. The filtered solution was heated to effect flash evaporation. The solvent was evaporated in this way and the concentration of the solid content was 23%. Then, it was filtered using a sintered metal filter having an absolute pore diameter of 5 μm to obtain an upper molding liquid A. 1 8 · 90 0% by weight 1 .0 0% by weight 0.6 0% by weight 〇. 5 0% by weight 〇·1 0% by weight 0.2 0% by weight 0 · 3 0 Weight °/〇〇. 0 5重量% 〇. 〇 2% by weight 〇 _ 3 0% by weight ό 0.9 0% by weight

纖維素三乙酸酯 (乙醯化程度6 0.7 %,聚合程度3 1 5,在 第六位置之乙醯基取代程度〇·94,平均 粒徑0.5毫米) 磷酸三苯酯(TPP) 磷酸聯苯基二苯酯(BDP) 酞酸二乙酯 UV吸收劑I UV吸收劑II UV吸收劑III 二氧化矽顆粒 (粒徑15奈米,莫式硬度約7) 部份酯形式之檸檬酸乙醋 三苄胺 二氯甲烷 -49- 1322042 甲醇 1 5.6 0重量% 乙醇 1 . 2 0重量% 正丁醇 0.4 0重量% (上模液B之製備) 製備上模液B之內容如下。首先,將二氯甲烷、甲醇 、乙醇 '正丁醇、與丙酮之混合溶劑冷卻至_ 2 Ot,及以連 續捏合器將固體材料與作爲過濾助劑之矽藻土攪拌加入混 合物溶劑。應注意’矽藻土顆粒具有60微米之平均直徑, 及砂藻土對固體材料與矽藻土總和之含量爲0 2%。然後將 '混合物ffi拌分散’及藉具有冷卻外套之螺絲擠壓機冷卻至_ 9〇°C ’而變成膠狀材料。將膠狀材料加熱至兩個預設溫度, 首先7〇°C然後135°C。然後使用預塗Tefi〇n (商標名)之不 織布進行混合物之過濾,以去除直徑60微米之矽藻土顆粒 。應注意,在不織布中,絕對孔徑爲2〇微米。然後使用絕 對孔徑爲2.5微米之燒結金屬過瀘器進行溶液之過濾。將過 濾溶液冷卻至兩個預設溫度,首先701然後3(rc,而得到 上模液應注意,含量如下之纖維素乙酸酯丙酸酯(作爲 聚合物)係得自木漿。 纖維素三乙酸酯 18.90重量% (總乙醯化程度2.83,聚合程度270,在 第六位置之乙醯基取代程度0.86,平均 粒徑〇 · 5毫米) 纖維素三丙酸酯 5.90重量% (總醯化程度2.89,總乙醯化程度2.59 1322042 ,聚合程度270,在第六位置之乙醯基取 代程度〇 . 94,平均粒徑0 · 5毫米) 二異戊四醇六乙酸酯 1.00重量% 磷酸三苯酯(TPP) 1.00重量% 磷酸聯苯基二苯酯(BDP) 0.1 0重量% 酞酸二乙酯 0.10重量% UV吸收劑I 0.1 0重量% UV吸收劑II 0.2 0重量% UV吸收劑III 0.3 0重量% 二氧化矽顆粒 0.0 5重量% (粒徑1 5奈米,莫式硬度約7 ) 部份酯形式之檸檬酸乙酯 0.0 2重量% 三午胺 0.3 0重量% 乙酸甲酯 6 2.1 0重量% 甲醇 4.0 0重量% 乙醇 5.0 0重量% 正丁醇 3.0 0重量% 丙酮 5.0 0重量% (上模液C之製備) 製備上模液C之內容如下。應注意,上模液C係以如 上模液A之相同方法製備。 纖維素三乙酸酯 19.00重量% (總醯化程度2.5,聚合程度25 0,在第 六位置之乙醯基取代程度0.86,平均粒 -51 - 1322042 徑〇 · 5毫米) 二氧化矽顆粒 0 · 0 5重量% (粒徑1 5奈米’莫式硬度約7 ) 部份酯形式之檸檬酸乙酯 0-02 重量 三苄胺 0 · 3 0重量% 二氯甲烷 6 0.9 0重量% 甲醇 1 5 · 6 0重量% 乙醇 1.20重量% 正丁醇 0-40重量% (上模液D之製備) 使用靜態混合器將上模液A線上稀釋,使得固體材料^ 之濃度變爲1 9 · 5 %。如此得到上模液D。用於稀釋之溶劑之 含量與上模液A之混合物溶劑相同。 (上模液E之製備) . 使用靜態混合器將上模液B線上稀釋,使得固體材料 之濃度變爲1 9 · 5 %。如此得到上模液E。用於稀釋之溶劑之 含量與上模液B之混合物溶劑相同。 _ [實例1 ] (薄膜製造方法) 鑄造係以第4圖之塗架模進行,其具有實行共鑄以形成 三層之進料區。基板爲第11圖描述之圓筒〗〇2,而且在圓筒 1〇2之表面上鍍硬鉻。進行鏡面拋光使得中心線平均粗度爲 0.〇3微米。應注意,在圓筒1〇2中,表面溫度保持在51, 直徑爲1800毫米’及寬度爲1〇〇〇毫米。 -52- 1322042 其係設計爲薄膜36可具有各由上模液C'上模液A與 上模液C形成之第一至第三層35a-35c,使得在乾燥後,第 —與第三層35a、35c之厚度爲1_5微米,及第二層〗5b爲 57微米。將上模液A與上模液C進料至進料區62,及在圓 筒102上鑄造成寬1580毫米。因而將圓筒102對鑄模14唇 部之相對速度調整至3 0米/分鐘。此外,提供板使得因移動 圓筒102而發生之空氣流動不自鑄造表面邊緣散逸。 將溶劑自膠狀膜35蒸發,及藉冷凝器105將溶劑蒸氣 冷凝,其係配置於距膠狀膜35爲5.0毫米處且冷卻至-25 °C 之溫度。藉液體接收器53接收冷凝之溶劑。因而溫度梯度 Q爲35及其在寬度方向之差爲5%,而且冷凝器95之溫度 Tc在寬度方向之差爲5 °C。膠狀膜35與冷凝器105間之捲 速爲最大0.5米/秒。 鑄造設備1 〇 1係提供於少量氮氣流經之氣密殼中。如此 在內大氣中將氧濃度保持在最多6體積%,及將露點保持在 最局-3 5 °C。 以6 0牛頓之剝除力自圓筒1 〇 2剝除含2 5 0重量%之溶 劑之膠狀膜35成爲薄膜36。然後將各針式張力機125釘在 薄膜3 6之側緣部份。然後將薄膜3 6加熱以在兩個步驟中乾 燥,即’首先80°C然後l2〇°C。然後將薄膜36運輸至輥乾 燥裝置42中,其中施加110牛頓之張力進行熱乾燥及冷卻 。在輥乾燥裝置42中之熱乾燥係以兩個步驟進行,即,首 先120°C,然後135°C。冷卻係在25°C進行。以捲繞裝置47 捲繞冷卻之薄膜3 6。 -53- 1322042 [實例2] (薄膜製造方法) 鑄造係以第2圖之鑄造設備進行。帶3 1爲不銹鋼製。 進行鏡面拋光使得中心線平均粗度爲0.03微米。應注意, 使用輻射加熱器將加熱板25之表面溫度保持在25。(:。帶31 爲10米長及8 00毫米寬。 其係設計爲薄膜36可具有各由上模液C、上模液B與 上模液C形成之第一至第三層3 5 a_35c,使得在乾燥後,第 —與第三層35a、35c之厚度爲1.5微米,及第二層3 5b爲 3?微米。將上模液B與上模液C進料至進料區62,及在帶 31上鑄造成寬650毫米。因而將帶31對鑄模14唇部之相對 速度調整至6米/分鐘。此外,提供遮蔽意料外流動之板, 使得因移動帶31而發生之空氣流動不自鑄造表面側緣散逸 〇 將溶劑自膠狀膜35蒸發,及藉冷凝器52將溶劑蒸氣冷 凝,其係配置於距膠狀膜35爲5.0毫米處且冷卻至-5 °C之溫 度。藉液體接收器53接收冷凝之溶劑。因而溫度梯度Q爲 30及其在寬度方向之差爲5%。冷凝器52之溫度Tc在寬度 方向之差爲5 °C。膠狀膜35與冷凝器52間之捲速爲最大0.5 米/秒。 鑄造設備1 6係提供於少量氮氣流經之氣密殻中。如此 在內大氣中將氧濃度保持在最多6體積%,及將露點保持在 最高-15°C。以40牛頓之剝除力自圓筒102剝除含150重量 %之溶劑之膠狀膜35成爲薄膜36。其他條件與實例1相同 -54- 1322042Cellulose triacetate (degree of acetylation 6 0.7%, degree of polymerization 315, degree of substitution of thiol group at the sixth position 〇·94, average particle size 0.5 mm) Triphenyl phosphate (TPP) Phosphate Phenyldiphenyl ester (BDP) Diethyl citrate UV absorber I UV absorber II UV absorber III cerium oxide particles (particle size 15 nm, Mo type hardness about 7) Partial ester form of citric acid B Triacetamide chloroformate-49- 1322042 Methanol 1 5.6 0 wt% Ethanol 1.20 wt% n-butanol 0.40 wt% (Preparation of the upper molding liquid B) The contents of the upper molding liquid B were prepared as follows. First, a mixed solvent of dichloromethane, methanol, ethanol 'n-butanol, and acetone was cooled to _ 2 Ot, and a solid material and a diatomaceous earth as a filter aid were stirred into a mixed solvent in a continuous kneader. It should be noted that the diatomaceous earth particles have an average diameter of 60 μm, and the content of the diatomaceous earth to the sum of the solid material and the diatomaceous earth is 0.2%. Then, the mixture ffi was dispersed and dispersed by a screw extruder having a cooling jacket to _ 9 〇 ° C ' to become a gel-like material. The gelatinous material is heated to two preset temperatures, first 7 ° C and then 135 ° C. The mixture was then filtered using a pre-coated Tefi〇n (trade name) non-woven fabric to remove diatomaceous earth particles having a diameter of 60 μm. It should be noted that in the nonwoven fabric, the absolute pore diameter is 2 Å. The solution was then filtered using a sintered metal crucible having an absolute pore size of 2.5 microns. The filtered solution is cooled to two preset temperatures, first 701 and then 3 (rc, and the upper molding liquid is obtained. Note that the cellulose acetate propionate (as a polymer) having the following content is obtained from wood pulp. Triacetate 18.90% by weight (total degree of acetylation 2.83, degree of polymerization 270, degree of substitution of thiol group at the sixth position of 0.86, average particle size 〇·5 mm) Cellulose tripropionate 5.90% by weight (total The degree of deuteration is 2.89, the degree of total acetylation is 2.59 1322042, the degree of polymerization is 270, the degree of substitution of acetyl group in the sixth position is 〇. 94, the average particle diameter is 0 · 5 mm) diisopentaerythritol hexaacetate 1.00 weight % Triphenyl phosphate (TPP) 1.00% by weight Biphenyldiphenyl phosphate (BDP) 0.10% by weight Diethyl citrate 0.10% by weight UV absorber I 0.1 0% by weight UV absorber II 0.2 0% by weight UV Absorbent III 0.30% by weight of cerium oxide particles 0.05% by weight (particle size 15 nm, Mohs hardness of about 7) Partial ester form of citric acid 0.0 2% by weight Noon amine 0.30% by weight Acetic acid Methyl ester 6 2.1 0% by weight methanol 4.0 0% by weight ethanol 5.0 0 weight N-butanol 3.00% by weight Acetone 5.00% by weight (Preparation of the upper molding liquid C) The contents of the upper molding liquid C were prepared as follows. It should be noted that the upper molding liquid C was prepared in the same manner as the above molding liquid A. Acetate 19.00% by weight (total degree of deuteration 2.5, degree of polymerization 25 0, degree of substitution of thiol group in the sixth position 0.86, average particle -51 - 1322042 diameter 〇 5 mm) cerium oxide particles 0 · 0 5 % by weight (particle size 15 nm 'Mo type hardness about 7) Partial ester form of citric acid 0-02 Weight Tribenzylamine 0 · 30% by weight Dichloromethane 6 0.9 0% by weight Methanol 1 5 · 60% by weight Ethanol 1.20% by weight n-butanol 0-40% by weight (Preparation of the upper molding liquid D) The upper molding liquid A was diluted with a static mixer so that the concentration of the solid material was changed to 19.5%. Thus, the upper molding liquid D is obtained. The solvent used for the dilution is the same as the solvent mixture of the upper molding liquid A. (Preparation of the upper molding liquid E). The upper molding liquid B is diluted on the line using a static mixer to make the concentration of the solid material. It becomes 1 9 · 5 %. The upper molding liquid E is obtained in this way. The amount is the same as the solvent mixture of the upper molding liquid B. _ [Example 1] (Film manufacturing method) The casting is carried out by the coating mold of Fig. 4, which has a feeding zone in which co-casting is performed to form three layers. The cylinder described in Fig. 11 is 〇2, and hard chromium is plated on the surface of the cylinder 1〇2. The mirror finish was polished so that the centerline average roughness was 0. 〇 3 μm. It should be noted that in the cylinder 1〇2, the surface temperature was maintained at 51, the diameter was 1800 mm', and the width was 1 mm. -52- 1322042 is designed such that the film 36 can have first to third layers 35a-35c each formed by the molding liquid A of the upper molding liquid C' and the upper molding liquid C, so that after drying, first and third The layers 35a, 35c have a thickness of 1 - 5 microns and the second layer 5b has a thickness of 57 microns. The upper molding liquid A and the upper molding liquid C were fed to the feed zone 62, and cast on the cylinder 102 to have a width of 1,580 mm. Thus, the relative speed of the cylinder 102 to the lip of the mold 14 was adjusted to 30 m/min. In addition, the plates are provided such that air flow that occurs as a result of moving the cylinder 102 does not escape from the edges of the casting surface. The solvent was evaporated from the gel-like film 35, and the solvent vapor was condensed by a condenser 105, which was placed at a temperature of 5.0 mm from the gel film 35 and cooled to -25 °C. The condensed solvent is received by the liquid receiver 53. Therefore, the temperature gradient Q is 35 and the difference in the width direction is 5%, and the temperature Tc of the condenser 95 is 5 °C in the width direction. The winding speed between the jelly film 35 and the condenser 105 is at most 0.5 m/sec. The casting equipment 1 〇 1 series is supplied in a gastight shell through which a small amount of nitrogen flows. Thus maintain the oxygen concentration at up to 6% by volume in the atmosphere and keep the dew point at the most -3 °C. The gel film 35 containing 250% by weight of the solvent was peeled off from the cylinder 1 〇 2 to a film 36 at a peeling force of 60 Newtons. Each of the pin tensioners 125 is then nailed to the side edge portion of the film 36. The film 36 was then heated to dry in two steps, i.e., first 80 ° C and then 12 ° C. The film 36 is then transported to a roll drying unit 42 where a tension of 110 Newtons is applied for thermal drying and cooling. The thermal drying in the roll drying unit 42 is carried out in two steps, i.e., 120 ° C first, then 135 ° C. The cooling system was carried out at 25 °C. The cooled film 36 is wound by a winding device 47. -53- 1322042 [Example 2] (Film manufacturing method) The casting was carried out by the casting apparatus of Fig. 2. Belt 3 1 is made of stainless steel. The mirror finish was polished such that the centerline average roughness was 0.03 microns. It should be noted that the surface temperature of the heating plate 25 was maintained at 25 using a radiant heater. (: The belt 31 is 10 meters long and 800 mm wide. It is designed such that the film 36 may have first to third layers 35a-35c each formed by the upper molding liquid C, the upper molding liquid B and the upper molding liquid C, After drying, the first and third layers 35a, 35c have a thickness of 1.5 μm, and the second layer 35b is 3 μm. The upper molding liquid B and the upper molding liquid C are fed to the feed zone 62, and The belt 31 is cast to a width of 650 mm. Thus, the relative speed of the belt 31 to the lip of the mold 14 is adjusted to 6 m/min. Further, a plate for shielding the unexpected flow is provided so that the air flow due to the moving belt 31 does not flow. The solvent is evaporated from the gel film 35 from the side edge of the casting surface, and the solvent vapor is condensed by the condenser 52, which is disposed at a temperature of 5.0 mm from the gel film 35 and cooled to a temperature of -5 ° C. The liquid receiver 53 receives the condensed solvent. Thus, the temperature gradient Q is 30 and its difference in the width direction is 5%. The temperature Tc of the condenser 52 is 5 ° C in the width direction. The gel film 35 and the condenser 52 The speed of the roll is up to 0.5 m/s. The casting equipment 1 is supplied in a gas-tight shell through which a small amount of nitrogen flows. The oxygen concentration was maintained at a maximum of 6% by volume, and the dew point was maintained at a maximum of -15 ° C. The gel film 35 containing 150% by weight of the solvent was stripped from the cylinder 102 by a stripping force of 40 Newtons to form a film 36. Other conditions Same as example 1 - 54 - 1322042

[實例3 J (薄膜製造方法) 第一與第三層35a、35c係由上模液形成,其係由無UV 吸收劑與塑性劑之上模液C之內容物製備。進行上模液鑄造 使得第一與第三層35a、35c在乾燥後爲0.5微米及1.5微米 厚。第二層35b係由上模液A形成,而在乾燥後爲28微米 厚。其他條件與實例1相同。 [實例4] · (薄膜製造方法) 第一層35a係由上模液形成,其係由無UV吸收劑與塑 性劑之上模液C之內容物製備。進行上模液鑄造使得第一層 35a在乾燥後爲1.5微米厚。第二層35b係由上模液A形成 ,而在乾燥後爲57微米厚。第三層35c係由上模液E形成 ·· ,而在乾燥後爲0.2微米厚。進行共鑄而形成第一至第三層 3 5a-3 5c »其他條件與實例1相同。 [實例5] · (薄膜製造方法) 第一與第三層35a、35c係由上模液形成,其係由無UV 吸收劑與塑性劑之上模液D之內容物製備》進行上模液鑄造 使得第一與第三層35 a、35c在乾燥後爲1.0微米及2微米厚 。第二層3 5b係由上模液B形成,而在乾燥後爲77微米厚 。進行共鑄而形成第一至第三層35a-35c。其他條件與實例1 相同。 -55- 1322042 [比較1] (薄膜製造方法) 在鑄造設備91中,不使用冷凝器95,及將乾燥空氣吹 向鑄造表面以乾燥。乾燥空氣之吹風速度及溫度爲1 5米/秒 及40 °C。將乾燥空氣循環地使用,及在冷卻裝置(未示)中 將排放氣體中之溶劑蒸氣在最高-30 °C之溫度冷凝以回收溶 劑。其他條件與實例1相同。 [比較2] (薄膜製造方法) 在鑄造設備16中,不使用冷凝器52,及將乾燥空氣吹 向鑄造表面以乾燥。乾燥空氣之吹風速度及溫度爲10米/秒 及80 °C »將乾燥空氣循環地使用,及在冷卻裝置(未示)中 將排放氣體中之溶劑蒸氣在最高-5 °C之溫度冷凝以回收溶 劑。其他條件與實例1相同。 [比較3 ] (薄膜製造方法) 藉冷凝器95將溶劑蒸氣冷凝,其係配置於距膠狀膜35 爲20毫米處且冷卻至_5°(:之溫度。膠狀膜35之鑄造表面與 冷凝器9 5間之差之距離百分比爲.1 1 %。溫度梯度Q爲3, 及冷凝器95之溫度Tc在寬度方向之差爲12 °C ^ [比較4 ] (薄膜製造方法) 第一與第三層35a、35c係由上模液形成,其係由無UV 吸收劑與塑性劑之上模液C之內容物製備。進行上模液鑄造 -56- 1322042 使得第一與第三層35a、35c在乾燥後爲0.5微米及1.5微米 厚。第二層3 5b係由上模液A形成,而在乾燥後爲28微米 厚。此外,在鑄造設備91中,不使用冷凝器95,及將乾燥 空氣吹向鑄造表面以乾燥。乾燥空氣之吹風速度及溫度爲15 米/秒及4〇°C。將乾燥空氣循環地使用,及在冷卻裝置(未 示)中將排放氣體中之溶劑蒸氣在最高-3 0 °C之溫度冷凝以 回收溶劑。其他條件與實例1相同。 [薄膜厚度之測量及判斷] 在實例1 -5及比較1 -4中,測量薄膜之厚度,及由測量 結果得到頻率光譜。厚度測量係首先以位於薄膜側緣間中部 區域之長度方向之連續前進測量,其次以寬度方向之連續前 進測量進行。 薄膜外觀之判斷係以肉眼進行,及其結果描述於表1。 在表1中,”A”表示薄膜外觀良好,及”N”表示觀察到不均勻 性。在表1中,R1與R2値係由在第一具體實施例得到之厚 度値計算。R1値爲厚度値之平均誤差MD1對厚度値之厚度 平均値ΤΑ 1之比例。此外,實行第一測量之厚度値之FFT 分析而得此實驗之頻率光譜。在表1中,R2値爲頻率光譜 最大値SPl^對厚度平均値TA1之比例。此外,R3與R4 値係由在第二具體實施例得到之厚度値計算。R3値爲厚度 値之平均誤差MD1對厚度平均値TA1之比例。此外,實行 第二測量之厚度値之FFT分析而得此實驗之頻率光譜。在表 1中,R4値爲頻率光譜最大値對厚度平均値TA1之比例。 -57- 1322042 [表1] R1 (%) R2 (%) R3 (%) R4 (%) FA PSA _ 實例1 6.2 1.3 8.5 3.6 A A 實例2 7.4 3.2 9.2 5.3 A A 實例3 8.2 3.9 9.5 4.6 A A 實例4 6.3 2.3 8.2 3.6 A A 實例5 4.1 2.8 6.7 2.9 A A 比較1 8.9 4.5 13.5 7.2 N N 比較2 9.7 5.3 14.5 8.6 N N 比較3 17.8 10.8 19.5 10.2 N N 比較4 18.6 11.0 18.3 10.0 N N — FA :薄膜外觀 PSA:偏光過濾器外觀 [阻滯値之測量] 在下述測量雙折射之方法中得到在實例1 -5及比較! _4 中製造之各薄膜之阻滯値。阻滯値Re及Rth係在實行厚度 測量之各處測量。測量結果示於表2&3。 在按長度方向排列之處測量阻滯値Re。在表2中,R5 値爲阻滯値Re之平均誤差MD3對厚度値之阻滯平均値RA1 之比例。R6値爲阻滯値Re之頻率光譜最大値SP2MAX對阻 滞平均値之比例。此外,在按長度方向排列之處測量阻滯値 Re。在表2中,R7値爲阻滞値Re之平均誤差對阻滯平均値 之比例。R8値爲阻滯値Re之頻率光譜最大値對阻滯平均値 之比例。 . 此外,在長度方向測量阻滯値Rth。在表3中,R9値爲 阻滯値Rth之平均誤差MD5對厚度値之阻滯平均値RA3之 比例。R1 0値爲阻滯値Rth之頻率光譜最大値對阻滯平均値 之比例。此外,在寬度方向之連續進行測量中測量阻滯値 Rth。在表3中,R 1 1値爲阻滯値Rth之平均誤差對阻滯平均 -58- 1322042 値之比例。R1 2値爲阻滯値Rth之頻率光譜最大値對阻滯平 均値之比例。 (阻滯値Re之測量) 阻滯値Re係藉由以63 2.8奈米之光照射,由在薄膜表 面垂直方向測量之所測量阻滯値之外差値計算。因而此測量 係以自動雙折射計(Oji Scientific Instrument製造之 K0BRA21DII)進行。頻率光譜係藉由實行阻滞値Re之FFT 分析而得。 (阻滯値Rth之測量) 鲁 將63 2.8奈米之光垂直照射薄膜而得阻滯値Re,然後 將薄膜表面對照射薄膜逐漸傾斜因而得到阻.滯値Re »阻滯 値Rth係由所測量阻滯値Re之外差値計算。因而此測量係 以自動雙折射計(Jusco Corporation製造之 Ellipsometer Ml 50 )進行。頻率光譜係藉由實行阻滯値Rth之FFT分析 ·· 而得。 [表2] R5 (%) R6 (%) R7 (%) R8 (%) 實例1 7.2 4.2 8.8 4.6 實例2 7.5 3.5 9.3 5.7 實例3 8.5 4.2 9.8 6.5 實例4 6.5 2.7 8.6 4.2 實例5 4.5 2.2 7.2 3.2 比較1 10.2 6.0 10.2 6.2 比較2 11.5 6.6 11.2 7.6 比較3 13.9 10.5 16.3 10.9 比較4 14.0 11.5 16.2 10.5 -59- 1322042 [表3] R9 (%) R10(%) R11 (%) R12 (%) 實例1 6.1 2.6 8.6 3.2 實例2 7.3 3.3 9.5 4.0 實例3 8.4 4.5 9.4 6.0 實例4 6.4 2.9 7.9 3.0 實例5 4.2 2.5 6.5 2.7 比較1 10.8 6.8 10.5 7.2 比較2 11.8 7.2 12.2 8.3 比較3 13.2 10.6 15.9 13.8 比較4 14.0 11.1 15.5 12.6 [偏光過濾器之製造] 使碘吸附至定向聚乙烯醇薄膜而製造偏光膜。然後以聚 | 乙烯醇型黏著劑將各實例1-5及比較1-4製造之薄膜黏附於 偏光膜兩側,使得薄膜之慢軸及偏光膜之穿透軸平行。將此 偏光過濾器樣品在80°C及90%RH濕度之大氣中固定500小 時。樣品外觀之判定係以肉眼進行,及其結果示於表1。應 注意,”A”表示未觀察到正交尼科耳位置之顏色強度變化, 及”N”表示明顯地觀察到顏色強度之變化。 [偏光程度之估計] 以光譜光度計測量可見光區域之偏光之平行透明度Υρ φ 及直接透明度Yc。然後基於平行透明度Υρ及直接透明度Yc ,由下式計算偏光程度: P = [(Yp-Yc)/(Yp + Yc)],/2xlOO (%) 在其中使用各實例1-4製造之薄膜之偏光過濾器中,偏光程 度超過99.6%。偏光過濾器具有足夠之耐久性。然而,在其 中使用各比較1-3製造之薄膜之偏光過濾器中,偏光程度超 過 9 9.4 % - 9 9 · 6 %。 [光學補償膜之製造] -60- 1322042 使碘吸附至拉製聚乙烯醇薄膜而製造偏光膜。然後以聚 乙烯醇型黏著劑將實例1製造之薄膜黏附於偏光膜表面,使 得薄膜之慢軸及偏光膜之穿透軸平行。此外,製造另一片在 實例1得到之薄膜’然後以聚乙烯醇型黏著劑將皂化薄膜黏 附於偏光膜之另一側。此外,將光學補償片(Fuji Photo Film Co. Ltd製造之WV膜)黏附於前者薄膜(或未皂化薄膜), 使得此薄膜及光學補償片之慢軸平行。如此得到光學補償膜 。此外,使用各實例2-4及比較1-3製造之薄膜製造光學補 償膜。 φ 將一對得自各實例1-4及比較1-3之薄膜之光學補償膜 用於TFT (薄膜電晶體)型液晶顯示器。在使用實例1-4之 薄膜時,視角及對比適當。而在使用比較1-3之薄膜時,對 比降低。 [製造抗反射膜] : 在以下之程序中,使用實例1及比較1之薄膜製造具防 眩層之抗反射膜。 (防眩層用塗料溶液F之製備) * 爲了製備防眩層用塗料溶液F,使用混合物(DPHA’ NIPPON KAYAKU CO.,LTD製造),其中混合二異戊四醇五 丙烯酸酯與二異戊四醇六丙烯酸酯。將125克之混合物與 125克之貳(4 -偏丙烯醯基噻吩基)硫化物(MPSMA’ SUMITOMO SEIKA CHEMICALS CO.,LTD 製造)溶於 439 克之混合溶劑(其含50重量%之甲乙酮與50重量%之環己 酮)。如此得到第一溶液。此外,製備第二溶液。在第二溶 -61 - 1322042 液中,將5.0克之自由基聚合用光引發劑(IRGACURE 907 ’ Chiba Gaigy Japan Limited 製造)與 3.0 克之感光劑( KAYACURE DTEX,NIPPON KAYAKU CO.,LTD 製造)溶於 49克之甲乙酮。將第二溶液加入第一溶液而得添加溶液。塗 覆此添加溶液然後以紫外線硬化而得塗層,其具有1.60之 反射率。 此外,將1 〇克之平均粒徑爲2微米之交聯聚苯乙烯顆 粒(產品名稱:SX-200H' Soken Chemical & Engineering Co., Ltd製造)加入添加溶液,而且以高速攪拌器將此混合物攪 拌1小時以分散交聯聚苯乙烯顆粒。其攪拌速度爲5000 rpm 。然後以孔徑各爲30微米之聚丙烯過濾器進行分散溶液之 過濾。然後得到防眩層用塗料溶液F。 (防眩層用塗料溶液G之製備) 以空氣攪拌器攪拌104.1克之含環己酮與61.3克之甲 乙酮之混合物溶劑。然後將217.0克之含氧化锆之硬塗料用 塗料溶液(DeSolite KZ-78 86A,JSR Corporation 製造)加 入混合物溶劑而得添加溶液。鑄造此添加溶液然後以紫外線 硬化而得塗層,其具有1 .6 1之折射率。此外,將5克之平 均粒徑爲2微米之交聯聚苯乙烯顆粒(產品名稱:SX-200H ,Soken Chemical & Engineering Co.,Ltd 製造)力口入添加溶 液,而且以高速攪拌器將此混合物攪拌1小時以分散交聯聚 苯乙烯顆粒。其攪拌速度爲5000 rpm。然後以孔徑各爲30 微米之聚丙烯過濾器進行分散溶液之過濾。然後得到防眩層 用塗料溶液G。 -62- 1322042 (防眩層用塗料溶液Η之製備) 爲了製備防眩層用塗料溶液H,將甲乙酮與環己酮以54 重量%與46重量%之比例混合作爲溶劑。此外,使用混合物 (DPHA,NIPPON KAYAKU CO.,LTD 製造),其中混合二異 戊四醇五丙烯酸酯與二異戊四醇六丙烯酸酯。對52克之溶 劑供應91克之混合物、199克之含氧化鍩之硬塗料溶液( DeSolite KZ-7115,JSR Corporation 製造)、及 19 克之含氧 化鉻分散液之硬塗料溶液 (DeSolite KZ-7161,JSR Corporation製造)。如此將混合物溶解而得混合溶液。然後 在混合溶液中溶解10克之自由基聚合組成物用光引發劑( IRGACURE 907,Chiba Gaigy Japan Limited 製造)而得添 加溶液。塗覆此添加溶液然後以紫外線硬化而得塗層,其具 有1.6 1之折射率。 此外,將20克之平均粒徑爲2微米之交聯聚苯乙烯顆 粒(產品名稱:SX-200H,Soken Chemical & Engineering Co·, Ltd製造)加入80克之混合物溶劑,其中混合54重量%之 甲乙酮與46重量%之環己酮。以5000 rpm之高速攪拌器將 此混合物攪拌1小時以分散交聯聚苯乙烯顆粒,及加入添加 溶液而得分散溶液。然後以孔徑各爲30微米之聚丙烯過濾 器進行分散溶液之過濾。然後得到防眩層用塗料溶液Η。 (硬塗層用塗料溶液I之製備) 爲了製備硬塗層用塗料溶液I,將62克之甲乙酮與88 克之環己酮混合作爲溶劑。然後將25 0克之UV射線可硬化 硬塗料組成物(DeSolite ΚΖ- 76 8 9, 72 重量 %,JSR Corporation -63- 1322042 製造)溶於此溶劑。塗覆此添加溶液然後以紫外線硬化而得[Example 3 J (film manufacturing method) The first and third layers 35a, 35c were formed of an upper molding liquid, which was prepared from the contents of the molding liquid C without the UV absorber and the plastic agent. The upper molding liquid was cast so that the first and third layers 35a, 35c were 0.5 μm and 1.5 μm thick after drying. The second layer 35b is formed of the upper molding liquid A and is 28 μm thick after drying. Other conditions are the same as in Example 1. [Example 4] (Film manufacturing method) The first layer 35a was formed of an upper molding liquid, which was prepared from the contents of the molding liquid C without the UV absorber and the plasticizer. The upper molding liquid was cast so that the first layer 35a was 1.5 μm thick after drying. The second layer 35b is formed of the upper molding liquid A and is 57 μm thick after drying. The third layer 35c is formed of the upper molding liquid E and is 0.2 μm thick after drying. Co-casting to form first to third layers 3 5a-3 5c » Other conditions are the same as in Example 1. [Example 5] (Film manufacturing method) The first and third layers 35a, 35c are formed of an upper molding liquid, which is prepared from a content of a mold liquid D without a UV absorber and a plasticizer. The casting is such that the first and third layers 35a, 35c are 1.0 micron and 2 microns thick after drying. The second layer 3 5b was formed from the upper molding liquid B and was 77 μm thick after drying. Co-casting is performed to form first to third layers 35a-35c. The other conditions are the same as in Example 1. -55- 1322042 [Comparative 1] (Film manufacturing method) In the casting apparatus 91, the condenser 95 is not used, and dry air is blown to the casting surface to be dried. Dry air has a blowing speed and temperature of 15 m/s and 40 °C. The dry air is used cyclically, and the solvent vapor in the exhaust gas is condensed at a temperature of up to -30 ° C in a cooling device (not shown) to recover the solvent. Other conditions are the same as in Example 1. [Comparative 2] (Film manufacturing method) In the casting apparatus 16, the condenser 52 was not used, and dry air was blown to the casting surface to be dried. Dry air blowing speed and temperature of 10 m / s and 80 ° C » The dry air is used cyclically, and the solvent vapor in the exhaust gas is condensed at a temperature of up to -5 ° C in a cooling device (not shown) Recover solvent. Other conditions are the same as in Example 1. [Comparative 3] (Film manufacturing method) The solvent vapor was condensed by a condenser 95, which was disposed at a distance of 20 mm from the gel film 35 and cooled to _5 (temperature: the casting surface of the gel film 35 and The percentage of the difference between the condensers 95 is .11%. The temperature gradient Q is 3, and the temperature Tc of the condenser 95 is 12 °C in the width direction. [Comparative 4] (Film manufacturing method) First And the third layer 35a, 35c is formed by the upper molding liquid, which is prepared from the content of the mold liquid C without the UV absorber and the plastic agent. The upper mold liquid casting - 56-1322042 makes the first and third layers 35a, 35c are 0.5 micrometers and 1.5 micrometers thick after drying. The second layer 3bb is formed by the upper molding liquid A and is 28 micrometers thick after drying. Further, in the casting apparatus 91, the condenser 95 is not used. Dry air is blown onto the casting surface to dry. The air blowing speed and temperature of the dry air are 15 m/s and 4 ° C. The dry air is used cyclically, and the exhaust gas is used in a cooling device (not shown). The solvent vapor is condensed at a temperature of up to -3 ° C to recover the solvent. Other conditions are the same as in Example 1. Measurement and Judgment of Thickness] In Example 1-5 and Comparative 1-4, the thickness of the film was measured, and the frequency spectrum was obtained from the measurement results. The thickness measurement was first measured by continuous advancement in the longitudinal direction of the middle portion between the side edges of the film. Next, the measurement was carried out continuously in the width direction. The judgment of the appearance of the film was carried out with the naked eye, and the results thereof are shown in Table 1. In Table 1, "A" indicates that the film was good in appearance, and "N" indicates that unevenness was observed. In Table 1, R1 and R2 are calculated from the thickness 値 obtained in the first embodiment. R1値 is the ratio of the average error MD1 of the thickness 对 to the thickness average 値ΤΑ 1 of the thickness 。. The frequency spectrum of this experiment is obtained by FFT analysis of a measured thickness 。. In Table 1, R2値 is the ratio of the maximum frequency spectrum 値SPl^ to the thickness average 値TA1. In addition, R3 and R4 are based on the second specific The thickness 値 obtained in the example is calculated. R3 値 is the ratio of the average error MD1 of the thickness 对 to the thickness average 値TA1. In addition, the FFT analysis of the thickness 値 of the second measurement is performed to obtain the frequency spectrum of the experiment. In 1 , R4値 is the ratio of the maximum frequency spectrum to the thickness average 値TA1. -57- 1322042 [Table 1] R1 (%) R2 (%) R3 (%) R4 (%) FA PSA _ Example 1 6.2 1.3 8.5 3.6 AA Example 2 7.4 3.2 9.2 5.3 AA Example 3 8.2 3.9 9.5 4.6 AA Example 4 6.3 2.3 8.2 3.6 AA Example 5 4.1 2.8 6.7 2.9 AA Comparison 1 8.9 4.5 13.5 7.2 NN Comparison 2 9.7 5.3 14.5 8.6 NN Comparison 3 17.8 10.8 19.5 10.2 NN comparison 4 18.6 11.0 18.3 10.0 NN — FA : Film appearance PSA: Polarized filter appearance [Measurement of retardation ]] In the following method of measuring birefringence, we get in Example 1-5 and compare! The retardation of each film made in _4. Blocking 値Re and Rth are measured throughout the thickness measurement. The measurement results are shown in Tables 2 & The retardation 値Re is measured at the position where they are arranged in the length direction. In Table 2, R5 値 is the ratio of the average error MD3 of the block 値Re to the block mean 値RA1 of the thickness 値. R6値 is the ratio of the frequency spectrum of the block 値Re to the maximum 阻SP2MAX versus the mean 値. In addition, the retardation 値 Re is measured at the positions arranged in the length direction. In Table 2, R7値 is the ratio of the average error of the block 値Re to the block mean 値. R8値 is the ratio of the maximum frequency spectrum of the block 値Re to the block average 値. In addition, the retardation 値Rth is measured in the length direction. In Table 3, R9値 is the ratio of the average error MD5 of the block 値Rth to the block mean 値RA3 of the thickness 値. R1 0値 is the ratio of the maximum frequency spectrum of the block 値Rth to the block average 値. Further, the retardation 値 Rth is measured in continuous measurement in the width direction. In Table 3, R 1 1値 is the ratio of the average error of the block 値Rth to the block average of -58 to 1322042 。. R1 2値 is the ratio of the maximum frequency spectrum of the block 値Rth to the average 値 block. (Measurement of Block 値Re) The block 値Re is calculated by the difference of the measured block 测量 measured by the light in the direction perpendicular to the surface of the film by irradiation with 63 2.8 nm. Therefore, this measurement was carried out by an automatic birefringence meter (K0BRA21DII manufactured by Oji Scientific Instrument). The frequency spectrum is obtained by performing FFT analysis of the block 値Re. (Measurement of block 値Rth) Lu will illuminate the film by illuminating the film with 2.8 nm light, and then block the 照射Re, and then gradually tilt the surface of the film to the illuminating film to obtain resistance. The 値Re » block 値Rth system The measurement of the block 値Re is calculated. Therefore, this measurement was carried out by an automatic birefringence meter (Ellipsometer Ml 50 manufactured by Jusco Corporation). The frequency spectrum is obtained by performing FFT analysis of the block 値Rth. [Table 2] R5 (%) R6 (%) R7 (%) R8 (%) Example 1 7.2 4.2 8.8 4.6 Example 2 7.5 3.5 9.3 5.7 Example 3 8.5 4.2 9.8 6.5 Example 4 6.5 2.7 8.6 4.2 Example 5 4.5 2.2 7.2 3.2 Comparison 1 10.2 6.0 10.2 6.2 Comparison 2 11.5 6.6 11.2 7.6 Comparison 3 13.9 10.5 16.3 10.9 Comparison 4 14.0 11.5 16.2 10.5 -59- 1322042 [Table 3] R9 (%) R10 (%) R11 (%) R12 (%) Example 1 6.1 2.6 3.2 Instance 2 7.3 3.3 9.5 4.0 Example 3 8.4 4.5 9.4 6.0 Example 4 6.4 2.9 7.9 3.0 Example 5 4.2 2.5 6.5 2.7 Comparison 1 10.8 6.8 10.5 7.2 Comparison 2 11.8 7.2 12.2 8.3 Comparison 3 13.2 10.6 15.9 13.8 Comparison 4 14.0 11.1 15.5 12.6 [Manufacture of polarizing filter] A polarizing film was produced by adsorbing iodine to a oriented polyvinyl alcohol film. Then, the films of Examples 1-5 and Comparative 1-4 were adhered to both sides of the polarizing film by a polyvinyl alcohol type adhesive so that the slow axis of the film and the transmission axis of the polarizing film were parallel. The polarizing filter sample was fixed in an atmosphere of 80 ° C and 90% RH humidity for 500 hours. The appearance of the sample was judged by the naked eye, and the results thereof are shown in Table 1. It should be noted that "A" indicates that no change in color intensity of the crossed Nicols position was observed, and "N" indicates that a change in color intensity was clearly observed. [Evaluation of the degree of polarization] The parallel transparency Υρ φ and the direct transparency Yc of the polarization in the visible light region are measured by a spectrophotometer. Then, based on the parallel transparency Υρ and the direct transparency Yc, the degree of polarization is calculated from the following formula: P = [(Yp-Yc) / (Yp + Yc)], /2x100 (%) In which the film of each of Examples 1-4 is used In the polarizing filter, the degree of polarization is over 99.6%. The polarizing filter has sufficient durability. However, in the polarizing filter in which the films of Comparative 1-3 were used, the degree of polarization was over 9 9.4 % - 9 9 · 6 %. [Production of Optical Compensation Film] -60 - 1322042 A polarizing film was produced by adsorbing iodine to a drawn polyvinyl alcohol film. Then, the film produced in Example 1 was adhered to the surface of the polarizing film with a polyvinyl alcohol type adhesive so that the slow axis of the film and the transmission axis of the polarizing film were parallel. Further, another film obtained in Example 1 was produced, and then the saponified film was adhered to the other side of the polarizing film with a polyvinyl alcohol type adhesive. Further, an optical compensation sheet (WV film manufactured by Fuji Photo Film Co. Ltd.) was adhered to the former film (or unsaponified film) so that the slow axis of the film and the optical compensation sheet were parallel. The optical compensation film was thus obtained. Further, an optical compensation film was produced using the films produced in each of Examples 2-4 and Comparative 1-3. φ A pair of optical compensation films obtained from the films of Examples 1-4 and 1-3 were used for a TFT (Thin Film Transistor) type liquid crystal display. When using the films of Examples 1-4, the viewing angle and contrast were appropriate. When using a film of Comparative 1-3, the contrast is lowered. [Production of antireflection film]: In the following procedure, an antireflection film having an antiglare layer was produced using the films of Example 1 and Comparative Example 1. (Preparation of coating solution F for anti-glare layer) * To prepare a coating solution F for an anti-glare layer, a mixture (manufactured by DPHA' NIPPON KAYAKU CO., LTD.) in which diisopentaerythritol pentaacrylate and diisoprene are mixed is used. Tetraol hexaacrylate. 125 g of the mixture and 125 g of ruthenium (4-propenylmercaptothiophene) sulfide (manufactured by MPSMA' SUMITOMO SEIKA CHEMICALS CO., LTD.) were dissolved in 439 g of a mixed solvent containing 50% by weight of methyl ethyl ketone and 50% by weight. Cyclohexanone). The first solution was thus obtained. Further, a second solution was prepared. In a second solution of -61 - 1322042, 5.0 g of a photoinitiator for radical polymerization (IRGACURE 907 'Chiba Gaigy Japan Limited) and 3.0 g of a sensitizer (manufactured by KAYACURE DTEX, NIPPON KAYAKU CO., LTD.) were dissolved. 49 grams of methyl ethyl ketone. The second solution is added to the first solution to obtain an addition solution. This addition solution was applied and then cured by ultraviolet light to have a coating having a reflectance of 1.60. Further, 1 gram of crosslinked polystyrene particles (product name: SX-200H' Soken Chemical & Engineering Co., Ltd.) having an average particle diameter of 2 μm was added to the addition solution, and this mixture was stirred at a high speed mixer. The mixture was stirred for 1 hour to disperse the crosslinked polystyrene particles. The stirring speed is 5000 rpm. The dispersion solution was then filtered through a polypropylene filter having a pore size of 30 μm each. Then, a coating solution F for an antiglare layer was obtained. (Preparation of coating solution G for anti-glare layer) A mixture of 104.1 g of a mixture solvent containing cyclohexanone and 61.3 g of methyl ethyl ketone was stirred with an air stirrer. Then, 217.0 g of a zirconia-containing hard coating coating solution (DeSolite KZ-78 86A, manufactured by JSR Corporation) was added to the mixture solvent to obtain an addition solution. The addition solution was cast and then cured by ultraviolet light to obtain a coating having a refractive index of 1.6. Further, 5 g of crosslinked polystyrene particles (product name: SX-200H, manufactured by Soken Chemical & Engineering Co., Ltd.) having an average particle diameter of 2 μm were added to the addition solution, and this was taken up by a high-speed stirrer. The mixture was stirred for 1 hour to disperse the crosslinked polystyrene particles. The stirring speed is 5000 rpm. The dispersion solution was then filtered through a polypropylene filter having a pore size of 30 μm each. Then, a coating solution G for an antiglare layer was obtained. -62- 1322042 (Preparation of coating solution for antiglare layer) To prepare a coating solution H for an antiglare layer, methyl ethyl ketone and cyclohexanone were mixed at a ratio of 54% by weight to 46% by weight as a solvent. Further, a mixture (DPHA, manufactured by NIPPON KAYAKU CO., LTD) was used in which diisopentaerythritol pentaacrylate and diisopentaerythritol hexaacrylate were mixed. A mixture of 91 g of a solvent of 52 g of a solvent, 199 g of a hard coating solution containing cerium oxide (DeSolite KZ-7115, manufactured by JSR Corporation), and 19 g of a hard coating solution containing a chromium oxide dispersion (DeSolite KZ-7161, manufactured by JSR Corporation) ). The mixture was dissolved in this way to obtain a mixed solution. Then, 10 g of the radical polymerizable composition was dissolved in the mixed solution with a photoinitiator (IRGACURE 907, manufactured by Chiba Gaigy Japan Limited) to obtain a solution. This addition solution was applied and then cured by ultraviolet light to obtain a coating having a refractive index of 1.61. Further, 20 g of crosslinked polystyrene particles (product name: SX-200H, manufactured by Soken Chemical & Engineering Co., Ltd.) having an average particle diameter of 2 μm were added to 80 g of a mixture solvent in which 54% by weight of methyl ethyl ketone was mixed. With 46% by weight of cyclohexanone. This mixture was stirred for 1 hour at a high speed stirrer of 5000 rpm to disperse the crosslinked polystyrene particles, and an addition solution was added to obtain a dispersion solution. The dispersion solution was then filtered through a polypropylene filter having a pore size of 30 μm each. Then, a coating solution for an anti-glare layer was obtained. (Preparation of coating solution I for hard coat layer) In order to prepare a coating solution I for a hard coat layer, 62 g of methyl ethyl ketone was mixed with 88 g of cyclohexanone as a solvent. Then, 25 0 g of a UV radiation hardenable hard coating composition (DeSolite® 76 8 9, 72% by weight, manufactured by JSR Corporation - 63-1322042) was dissolved in the solvent. Coating this addition solution and then hardening it with ultraviolet light

I 塗層,其具有1.53之折射率。此外,以孔徑各爲30微米之 聚丙烯過濾器將溶液過濾。然後得到硬塗層用塗料溶液I。 (低反射率層用塗料溶液J之製備) 將8克之MEK-ST (平均粒徑爲10奈米-20奈米,甲乙 酮之Si02溶膠分散液,其固體含量程度爲30重量%,Nissan Chemical Industries Co.,Ltd.製造)及100克之甲乙酮加入 20093克之含氟化物之加熱交聯聚合物(TN-049,JSR Corporation製造),其具有1.42之折射率。將此混合物攪拌 及以孔徑爲1微米之聚丙烯過濾器將溶液過濾。如此得到低 折射率層用塗料溶液J。 使用棒塗器將各實例1-5及比較1-4之薄膜之表面塗以 塗料溶液I,然後在120 °C乾燥。然後以160瓦/公分之氣冷 型金屬齒化物燈(Eyegraphics Co·, Ltd.製造)將UV光施加 至薄膜上之塗層。照明度爲400毫瓦/平方公分,及照明密 度爲300毫焦/平方公分。如此將上模液之塗層硬化而在薄 膜上形成厚度2.5微米之硬塗層。此外,以棒塗器將塗料溶 液F塗佈於薄膜上之硬塗層上。以如形成硬塗層之相同條件 將塗料溶液F乾燥及硬化。如此形成1.5微米之防眩層A。 此外,將防眩層A塗以低折射率層用塗料溶液j,然後將塗 料溶液J在80°C乾燥》然後在120°C進行薄膜之交聯10分 鐘而形成低折射率層,其厚度爲0.096微米》 使用塗料溶液G取代塗料溶液?塗覆薄膜。其他條件 與形成抗反射膜相同。在此情形,形成防眩層B。此外,使 -64- 1322042 用塗料溶液Η取代塗料溶液F塗覆薄膜。其他條件與形成抗 反射膜相同。在此情形,形成防眩層C。 (抗反射膜之估計) 以下之實驗係用於具防眩層A、B、C之各抗反射膜之 估計。檢驗結果示於表2。 (1) 光譜反射度及顏色變淡 光譜光度計V-550 (JASCO Corporation製造)具有接 頭A RV-474以在5°入射角處依照380至780奈米波長入射 光測量在-5°離開角處之光譜反射度。然後計算波長爲450 奈米至65 0奈米之反射之平均光譜反射度以評估抗反射性質 〇 由觀察資料得到反射光譜。然後由反射光譜計算CIE 1 976 L*a*b*空間之L*數、a*數與b*數,其代表對於藉CIE 標準光源D65以5°入射角所產生光之規則反射之顏色變淡 。顏色變淡係基於L*數、a*數與b*數而計算。 (2) 整體反射度 光譜光度計V-550 (JASCO Corporation製造)具有接 頭ILV- 471以在5°入射角處依照380至780奈米波長間之 入射光測量整體反射度。然後計算波長爲450奈米至650奈 米間之反射之平均整體反射度以評估抗反射性質。 (3) 霧値 使用霧計 1001 DP 型(Nippon Denshoku Industries Co., Ltd.製造)測量抗反射膜之霧値。 (4) 鉛筆硬度 -65- 1322042 如JIS Κ 5400所述進行鉛筆硬度之評估,及使用其資 料作爲抗刮性之基準。將抗反射膜固定於2 5 °C之溫度及 60%RH之濕度之大氣中2小時,以3H測試鉛筆刮抗反射膜 表面而按Π S S 6 0 0 6測定。因而將1公斤之力施加於測試鉛 筆。在n=5 ( η爲刮性能之測試次數)之評估中表面上不留 下刮痕時,鉛筆硬度之評估爲”Α”。在η = 5之評估中表面上 留下一或兩條刮痕時,評估爲”Β”。在η = 5之評估中表面上 留下超過三條刮痕時,評估爲”Ν”。 (5) 接觸角 # 在將抗反射膜固定於25°C及60%RH之濕度之大氣中2 小時後,測量抗反射膜上之水接觸角,而且使用其資料作爲 抗污之基準,特別是抗指紋污染性。 (6) 動磨擦係數 在將抗反射膜固定於25°C之溫度及60%RH之濕度之大 : 氣中2小時後,以測量動磨擦係數之機械HEIDON-14測量 動磨擦係數,其中使用直徑5毫米之不銹鋼球。將速度設爲 60公分/分鐘,及對抗反射膜施加l.OOxlO3毫牛頓之力。 * (7) 防眩性質 對2 7種得到之抗反射膜進行防眩性質之一次及二次刺 激。無百葉片之螢光燈(8 0 0 0 cd/平方米)對各抗反射膜發 射光且光反射。觀察反射形成之螢光燈影像。如此完成一次 估計。在未觀察到照明燈之輪廓時,防眩性質之估計爲”E” (優良)。在稍微辨識到輪廓時,估計爲”G”(良好)。在不 明確但可辨識輪廓時,估計爲”P”(通過)。在輪廓爲幾乎淸 -66- 1322042 楚時,估計爲”R”(剔除)。此外,防眩性質之等級係以肉眼 不均勻性觀察而估計。因此進行二次估計。 [表4]I coating with a refractive index of 1.53. Further, the solution was filtered with a polypropylene filter having a pore size of 30 μm each. Then, a coating solution I for a hard coat layer was obtained. (Preparation of coating solution J for low reflectivity layer) 8 g of MEK-ST (average particle diameter of 10 nm to 20 nm, SiO 2 sol dispersion of methyl ethyl ketone, solid content of 30% by weight, Nissan Chemical Industries Co., Ltd., and 100 g of methyl ethyl ketone were added to 20093 g of a fluoride-containing heated crosslinked polymer (TN-049, manufactured by JSR Corporation) having a refractive index of 1.42. The mixture was stirred and the solution was filtered through a polypropylene filter having a pore size of 1 μm. Thus, a coating solution J for a low refractive index layer was obtained. The surfaces of the films of Examples 1-5 and Comparative 1-4 were coated with a coating solution I using a bar coater, followed by drying at 120 °C. UV light was then applied to the coating on the film at a 160 watt/cm air-cooled metal toothed lamp (manufactured by Eyegraphics Co., Ltd.). The illumination is 400 mW/cm 2 and the illumination density is 300 mJ/cm 2 . The coating of the upper molding liquid was thus hardened to form a hard coat layer having a thickness of 2.5 μm on the film. Further, the coating solution F was applied to the hard coat layer on the film by a bar coater. The coating solution F is dried and hardened under the same conditions as the formation of the hard coat layer. The 1.5 micron antiglare layer A was thus formed. Further, the anti-glare layer A was coated with the coating solution j for the low refractive index layer, and then the coating solution J was dried at 80 ° C. Then, the film was crosslinked at 120 ° C for 10 minutes to form a low refractive index layer, and the thickness thereof was formed. Is the coating solution G replaced with a coating solution of 0.096 μm? Coating the film. Other conditions are the same as those for forming an antireflection film. In this case, the anti-glare layer B is formed. Further, -64 - 1322042 was used to coat the coating solution F with a coating solution 。. Other conditions are the same as those for forming an anti-reflection film. In this case, the anti-glare layer C is formed. (Evaluation of Antireflection Film) The following experiment was conducted for the estimation of each antireflection film having antiglare layers A, B, and C. The test results are shown in Table 2. (1) Spectral reflectance and color lightening Spectrophotometer V-550 (manufactured by JASCO Corporation) has a joint A RV-474 to measure at a 5° incident angle at an incident angle of 380 to 780 nm. The spectral reflectance at the location. The average spectral reflectance of the reflections from 450 nm to 65 nm is then calculated to evaluate the antireflective properties. 反射 The reflectance spectra are obtained from the observations. Then, the L* number, the a* number and the b* number of the CIE 1 976 L*a*b* space are calculated from the reflection spectrum, which represents the color change of the regular reflection of the light generated by the CIE standard light source D65 at an incident angle of 5°. light. The color fade is calculated based on the L* number, the a* number, and the b* number. (2) Overall reflectance The spectrophotometer V-550 (manufactured by JASCO Corporation) has a connector ILV-471 to measure the overall reflectance at an incident angle of 5° in accordance with incident light between wavelengths of 380 to 780 nm. The average overall reflectance of the reflection between wavelengths from 450 nm to 650 nm is then calculated to evaluate the anti-reflective properties. (3) Haze The haze of the antireflection film was measured using a fog meter 1001 DP type (manufactured by Nippon Denshoku Industries Co., Ltd.). (4) Pencil hardness -65- 1322042 The pencil hardness was evaluated as described in JIS Κ 5400, and its data was used as a basis for scratch resistance. The antireflection film was fixed in an atmosphere at a temperature of 25 ° C and a humidity of 60% RH for 2 hours, and the surface of the antireflection film was scratched with a 3H test pencil and measured by Π S S 6 0 0 6 . Therefore, a force of 1 kg is applied to the test lead pen. The pencil hardness was evaluated as "Α" when no scratches were left on the surface in the evaluation of n = 5 (η is the number of tests for the scratching performance). When one or two scratches were left on the surface in the evaluation of η = 5, it was evaluated as "Β". When more than three scratches were left on the surface in the evaluation of η = 5, it was evaluated as "Ν". (5) Contact angle # After the anti-reflection film was fixed in an atmosphere of humidity of 25 ° C and 60% RH for 2 hours, the water contact angle on the anti-reflection film was measured, and the data was used as a reference for stain resistance, particularly It is resistant to fingerprint contamination. (6) Dynamic friction coefficient: The anti-reflection film is fixed at a temperature of 25 ° C and a humidity of 60% RH: After 2 hours in the gas, the dynamic friction coefficient is measured by a mechanical HEIDON-14 measuring the dynamic friction coefficient, wherein Stainless steel ball with a diameter of 5 mm. The speed was set to 60 cm/min, and a force of 1.00 x 10 3 Newtons was applied to the antireflection film. * (7) Anti-glare properties One-time and two-time stimulation of anti-glare properties of 27 kinds of anti-reflective films obtained. The louver-free fluorescent lamp (800 cd/m2) emits light to each anti-reflection film and reflects light. Observe the image of the fluorescent lamp formed by the reflection. This completes an estimate. The anti-glare property is estimated to be "E" (excellent) when no contour of the illuminator is observed. When the outline is slightly recognized, it is estimated to be "G" (good). When the contour is not clear but identifiable, it is estimated to be "P" (pass). When the contour is almost 淸 -66- 1322042, it is estimated to be "R" (cull). In addition, the grade of anti-glare properties is estimated by observation of macroscopic inhomogeneity. Therefore, a second estimate is made. [Table 4]

SA SR (%) IR (%) 顏色變淡 L^/a^/b H (%) PH (3H) CA DF 1AP/ 2AP 實例1 A 1.1 2.0 10/1.9/1.3 8 A 103° 0.08 E/G B 1.1 2.0 9/2.0/-4.0 8 A 103° 0.08 E/G C 1.1 2.0 9/1.7/0.2 12 A 103° 0.07 E/G 實例2 A 1.1 2.0 10/1.8/1.3 8 A 103° 0.08 E/G B 1.1 2.0 9/2.0/-4.0 8 A 103° 0.08 E/G C 1.1 2.0 9/1.9/0.2 12 A 102° 0.07 E/G 實例3 A 1.1 2.0 10/1.8/1.2 8 A 103° 0.08 E/G B 1.1 2.0 9/2.0/-4.0 9 A 102° 0.08 E/G C 1.1 2.0 9/1.7/0.3 11 A 103° 0.07 E/G 實例4 A 1.1 2.0 10/1.7/1.3 8 A 103° 0.08 E/G B 1.1 2.0 9/2.0/-4.0 9 A 102° 0.08 E/G C 1.1 2.0 9/1.7/0.3 12 A 102° 0.07 E/G 實例5 A 1.1 2.0 10/1.8/1.3 9 A 102° 0.08 E/G B 1.1 2.0 9/2.0/-3.9 8 A 102° 0.08 E/G C 1.1 2,0 9/1.6/0.2 12 A 102° 0.07 E/G 比較1 A 1.1 2.0 10/1.9/1.3 8 A 103° 0.08 E/R B 1.1 2.0 9/2.0/-0,4 8 A 103° 0.08 E/R C 1.1 2.0 9/1.7/0.2 11 A 103° 0.08 E/R 比較2 A 1.1 2.0 10/1.8/1.3 8 A 103° 0.08 E/R B 1.1 2.0 9/2.0/-4.0 9 A 102° 0.07 E/R C 1.1 2.0 9/1.8/0.2 12 A 102° 0.08 E/R 比較3 A 1.1 2.0 10/1.7/1.2 8 A 103° 0.08 E/R B 1.1 2.0 9/2.0/-4.0 9 A 103° 0.08 E/R C 1.1 2.0 9/1.7/0.2 12 A 102° 0.07 E/R 比較4 A 1.1 2.0 10/1.7/1.3 8 A 103° 0.08 E/R B 1.1 2.0 9/2.1/-4.0 8 A 103° 0.08 E/R C 1.1 2.0 9/1.8/0.2 12 A 102° 0.08 E/R S A : 防 眩 層 之 溶液種類 SR : 光 譜 反 射 度 IR : 整 體 反 射 度 H : 霧 値 PH : 鉛 筆 硬 度 C A : 接 觸 角 DF : 動 擦 係 數 67- 1322042 1 API —次估計之防眩性質 2AP :二次估計之防眩性質 表4教示實例I-5及比較1-4製造之薄膜之防眩性質優 良。此外,顏色變淡低,及鉛筆硬度 '接觸角或抗指紋污染 性、與動磨擦係數優良。實例1 - 5之抗反射膜之防眩性質優 良。然而,在比較1-4製造之抗反射膜中觀察到集結(包括 厚度不均勻性)及不均勻塗層。 在本發明中,各種變化及修改爲可行的,而且應了解其 係在本發明內。 籲 【圖式簡單說明】 在閱讀以上之詳細說明結合附圖後,熟悉此技藝者易於 了解以上之本發明目的及優點。 第1圖爲一種薄膜製造方法之略示圖,其中應用溶液鑄 造法作爲由本發明之聚合物溶液製造薄膜之方法; : 第2圖爲本發明之鑄造設備之第一具體實施例之略示 圖; 第3圖爲沿第2圖之III-III線之切面圖; 鲁 第4圖爲本發明之鑄模之切面圖; 第5圖爲本發明之鑄模之另一個具體實施例之略示圖 9 第6圖爲鑄造設備之第二具體實施例之平面圖; 第7圖爲描述膜厚之測量位置及雙折射之測量位置之 平面圖; 第8圖爲描述膜厚之測量位置及雙折射之測量位置之 -68- 1322042 切面圖; 第9圖爲本發明之鑄造設備之第三具體實施例之部份 平面圖; 第10圖爲沿第9圖之IX-IX線之切面圖; 第11圖爲本發明之鑄造設備之第三具體實施例之部份 平面圖; 第12圖爲張力裝置之第一具體實施例之平面及部份切 面圖; 第13圖爲張力裝置之第二具體實施例之平面及部份切 _ 面圖。 【主要元件符號說明】 11…製備之上模液 12…鑄造上模液 12a-12c".禱造上模液 14…鑄模 1 5…上模液製備設備 16…鑄造設備 · 1 7…乾燥設備 1 8…捲繞設備 2 1…槽 2 1a·.·恆溫器 2 2…栗 23…第一過濾裝置 24…第二過濾裝置 27…加熱裝置 69- 1322042 28…急驟蒸發裝置 3卜··帶 3 2…第一支撐幸昆 33…第二支撐輥 35…膠狀膜 3 5 a…第一層 35b…第二層 35c···第三層 36…薄膜 37…剝除輥 41…張力裝置 42…輥乾燥裝置 4 6…切割器 4 7…捲繞裝置 4 8…聿昆 51,92,11 2…加熱板 51a, 52a,92a-93a, 105a …溫度控制器 5 2, 9 3, 1 0 5, 1 1 3,123 …冷凝器 5 3, 94···液體接收器 5 6…回收槽 6 1…模區 6 1 a…模唇 61b, 75-77…通路 6 2…進料區 6 2 a - 6 2 c , 72a-72c···入口 -70- 1322042 7 1,82-84…鑄模 75a-77a···袋 91, 101…鑄造設備 1 02…圓筒 1 1 1…夾式張力機 1 1 la…主體 1 1 lb…夾構件 121…張力裝置 122…微波導引件 1 2 5…針式張力機 12 5a···針SA SR (%) IR (%) Color fades L^/a^/b H (%) PH (3H) CA DF 1AP/ 2AP Example 1 A 1.1 2.0 10/1.9/1.3 8 A 103° 0.08 E/GB 1.1 2.0 9/2.0/-4.0 8 A 103° 0.08 E/GC 1.1 2.0 9/1.7/0.2 12 A 103° 0.07 E/G Example 2 A 1.1 2.0 10/1.8/1.3 8 A 103° 0.08 E/GB 1.1 2.0 9/2.0/-4.0 8 A 103° 0.08 E/GC 1.1 2.0 9/1.9/0.2 12 A 102° 0.07 E/G Example 3 A 1.1 2.0 10/1.8/1.2 8 A 103° 0.08 E/GB 1.1 2.0 9/2.0/-4.0 9 A 102° 0.08 E/GC 1.1 2.0 9/1.7/0.3 11 A 103° 0.07 E/G Example 4 A 1.1 2.0 10/1.7/1.3 8 A 103° 0.08 E/GB 1.1 2.0 9 /2.0/-4.0 9 A 102° 0.08 E/GC 1.1 2.0 9/1.7/0.3 12 A 102° 0.07 E/G Example 5 A 1.1 2.0 10/1.8/1.3 9 A 102° 0.08 E/GB 1.1 2.0 9/ 2.0/-3.9 8 A 102° 0.08 E/GC 1.1 2,0 9/1.6/0.2 12 A 102° 0.07 E/G Comparison 1 A 1.1 2.0 10/1.9/1.3 8 A 103° 0.08 E/RB 1.1 2.0 9 /2.0/-0,4 8 A 103° 0.08 E/RC 1.1 2.0 9/1.7/0.2 11 A 103° 0.08 E/R Comparison 2 A 1.1 2.0 10/1.8/1.3 8 A 103° 0.08 E/RB 1.1 2.0 9/2.0/-4.0 9 A 102° 0.07 E/RC 1.1 2.0 9/1.8/0.2 12 A 102° 0.08 E/R Comparison 3 A 1.1 2 .0 10/1.7/1.2 8 A 103° 0.08 E/RB 1.1 2.0 9/2.0/-4.0 9 A 103° 0.08 E/RC 1.1 2.0 9/1.7/0.2 12 A 102° 0.07 E/R Comparison 4 A 1.1 2.0 10/1.7/1.3 8 A 103° 0.08 E/RB 1.1 2.0 9/2.1/-4.0 8 A 103° 0.08 E/RC 1.1 2.0 9/1.8/0.2 12 A 102° 0.08 E/RSA : Anti-glare layer Solution type SR : Spectral reflectance IR : Overall reflectance H : Haze PH : Pencil hardness CA : Contact angle DF : Dynamic rub coefficient 67 - 1322042 1 API - Sub-estimated anti-glare property 2AP : Anti-glare property of secondary estimation Table 4 teaches that the films produced in Examples I-5 and 1-4 are excellent in anti-glare properties. In addition, the color becomes lighter and the pencil hardness is 'contact angle or anti-fingerprint contamination, and the dynamic friction coefficient is excellent. The antireflection properties of the antireflection films of Examples 1 - 5 were excellent. However, aggregation (including thickness unevenness) and uneven coating were observed in the anti-reflection film manufactured in Comparative 1-4. Various changes and modifications are possible in the present invention, and it should be understood that they are within the scope of the invention. BRIEF DESCRIPTION OF THE DRAWINGS The above objects and advantages of the present invention will be readily understood by those skilled in the art from this disclosure. 1 is a schematic view showing a method of manufacturing a film in which a solution casting method is employed as a method of producing a film from the polymer solution of the present invention; FIG. 2 is a schematic view showing a first embodiment of the casting apparatus of the present invention; Figure 3 is a cross-sectional view taken along line III-III of Figure 2; Figure 4 is a cross-sectional view of the mold of the present invention; Figure 5 is a schematic view of another embodiment of the mold of the present invention. Figure 6 is a plan view showing a second embodiment of the casting apparatus; Figure 7 is a plan view showing the measurement position of the film thickness and the measurement position of the birefringence; and Figure 8 is a view showing the measurement position of the film thickness and the measurement position of the birefringence -68- 1322042 cutaway view; Fig. 9 is a partial plan view of a third embodiment of the casting apparatus of the present invention; Fig. 10 is a cross-sectional view taken along line IX-IX of Fig. 9; Partial plan view of a third embodiment of the inventive casting apparatus; Fig. 12 is a plan view and a partial cutaway view of the first embodiment of the tensioning device; Fig. 13 is a plan view of the second embodiment of the tensioning device Partial cut _ face map. [Main component symbol description] 11...Preparation of the upper molding liquid 12... casting upper molding liquid 12a-12c". Praying upper molding liquid 14...molding mold 1 5...Upper molding liquid preparation equipment 16...Casting equipment·1 7...Drying equipment 1 8...winding device 2 1...slot 2 1a·.·thermostat 2 2...chest 23...first filter device 24...second filter device 27...heating device 69- 1322042 28...flash evaporation device 3·· 3 2...first support Yukun 33...second support roller 35...colloidal film 3 5 a...first layer 35b...second layer 35c···third layer 36...film 37...stripping roller 41...tension device 42...roll drying device 4 6...cutter 4 7...winding device 4 8...聿, 51, 92, 11 2...heating plates 51a, 52a, 92a-93a, 105a ...temperature controller 5 2, 9 3, 1 0 5, 1 1 3,123 ...condenser 5 3, 94···liquid receiver 5 6...recovery tank 6 1...module 6 1 a...mould lip 61b, 75-77...passage 6 2...feeding zone 6 2 a - 6 2 c , 72a-72c···Inlet-70- 1322042 7 1,82-84... Mold 75a-77a··· Bag 91, 101...Foundry equipment 1 02...Cylinder 1 1 1...clip Tension machine 1 1 la... body 1 1 lb... clip member 121... sheet Force device 122...microwave guide 1 2 5...needle tension machine 12 5a···needle

-71 --71 -

Claims (1)

1322042 沒年I 曰修(吏)王替换頁 第93 121244號「從聚合物溶液製造薄膜之方法及裝置,及光 學聚合物薄膜」專利案 (2009年12月17日修正) 十、申請專利範圍: 1· 一種在移動基板之前表面上鑄造由至少一種自鑄模排放 之聚合物溶液所形成的薄膜之方法,該方法包括以下步驟 使用沿該基板之背表面配置之加熱器加熱該基板;及 以面對該基板上之該薄膜緊密地配置之冷凝裝置將自該 薄膜蒸發之溶劑冷凝以回收。 2·如申請專利範圍第1項之方法,其中接近該薄膜表面之捲 速爲0.0 1米/秒至0.5米/秒。 3.如申請專利範圍第2項之方法,其中該基板在該流動聚合 物溶液接觸該基板之鑄造位置處向下移動。 4-如申請專利範圍第1項之方法,其中Tw (°C )爲該冷凝裝 置面對於該薄膜之表面溫度,Ts (°C)爲該薄膜之溫度,及 d (毫米)爲該冷凝裝置至該薄膜之距離,溫度梯度Q滿 足以下式(1)及(2): Q = (Ts-Tw)/d......(1) 5<Q<1 00......(2)。 5. 如申請專利範圍第4項之方法,其中該溫度梯度Q之變動 範圍最大爲該溫度梯度Q之10%。 6. 如申請專利範圍第5項之方法,其中該冷凝裝置之該面對 表面上之溫度之變動範圍爲最大10°C。 1322042 — I r··^* I I ·__··1 f 付年P月%修(tg膂換页 7·如申請專利範圍第6項之方法,其中該距離d在該基板之 寬度方向之變動範圍最大爲該距離d平均値之10%。 8. 如申請專利範圍第1項之方法,其中進行該多種聚合物溶 液之共鑄。 9. 如申請專利範圍第1項之方法,其中進行該多種聚合物溶 液之循序鑄造。 10. 如申請專利範圍第1項之方法,其中恰在該基板上形成 該薄膜後,該薄膜之厚度爲10微米至1000微米,及該基 板對該鑄模之相對速度爲5米/分鐘至200米/分鐘。 · 11·.如申請專利範圍第10項之方法,其中含於該聚合物溶液 中之該聚合物爲纖維素醯化物、聚碳酸酯、芳醯胺樹脂 、聚 、與聚苯乙烯至少之一。 12. 如申請專利範圍第11項之方法,其中聚合物溶液含聚合 物成分之至少50重量%之纖維素醯化物,X爲在纖維素 : 醯化物中重複單位之第六位置處之醯基取代比例,及γ 爲在其他位置之該醯基取代比例,在該聚合物溶液中滿 足以下條件: I Χ>0·85 及 2.70<(X + Y)<2.99 » 13. 如申請專利範圍第1項之方法,其中該薄膜爲光學膜。 14. 如申請專利範圍第13項之方法,其中該光學膜係用於偏 光過濾器。 15. 如申請專利範圍第13項之方法,其中該光學膜係作爲偏 光過濾器保護膜。 16. 如申請專利範圍第13項之方法,其中該光學膜係用於光 -2- 1322042 ———_____ 哫年1 ^日修(史)土费換頁 1 ----- 學功能膜。 17. 如申請專利範圍第13項之方法,其中該光學膜係用於顯 示裝置。 18. —種用於自聚合物溶液製造薄膜之裝置,其包括: 可移動基板; 用於在該移動基板之前表面上鑄造聚合物溶液以形成薄 膜之鑄模; 面對該基板之背表面而提供之加熱器’該加熱器經該基板 將該薄膜加熱: 配置以接近地面對該薄膜之冷凝裝置,該冷凝裝置將自該 薄膜蒸發之溶劑冷凝以回收。 19. 如申請專利範圍第18項之裝置,其中Tw (°C)爲該冷凝 裝置面對於該薄膜之表面溫度,Ts (°C)爲該薄膜之溫度 ,及d (毫米)爲該冷凝裝置至該薄膜之距離,溫度梯度 Q滿足以下式(1)及(2): Q = (Ts-Tw)/d ……(1) 5<Q<1 00......(2)。 20. 如申請專利範圍第19項之裝置,其中該溫度梯度Q之變 動範圍最大爲該溫度梯度Q之10%。 21. 如申請專利範圍第20項之裝置,其中該冷凝裝置之該面 對表面上之溫度之變動範圍爲最大10 °C。 2 2.如申請專利範圍第21項之裝置,其中該冷凝裝置至該薄 膜之該距離d在該基板之寬度方向之變動範圍最大爲該 距離d平均値之10%。 Ι333Θ43-~·___ λ?年月修( —........... 23 ·如申請專利範圍第22項之裝置,其中該基板爲帶。 2 4.如申請專利範圍第22項之裝置,其中該基板爲圓筒。 25. —種光學聚合物薄膜,其包括滿足下式之特性: MD1 ^ O.lOxTAl ; SPImax^ O.lOxTAl 其中 TA1:在該聚合物薄膜上按第一方向排列之多個測量點 測量之第一厚度値之平均値 MD1:該多個第一厚度値之誤差平均値, · SP1MAX:頻率光譜SP1之最大値,其係藉該第一厚度値 之快速傅立葉轉換而得。 26. 如申請專利範圍第25項之光學聚合物薄膜,其中在對應 : 轉換成空間頻率域之波長之範圍,該頻率光譜SP1之該 最大値SP1MAX最大爲該第一厚度値之平均値TA1之10% : 〇 27. 如申請專利範圍第25或26項之光學聚合物薄膜,其包 括滿足下式之特性: ® MD2 ^ 0.1 0xTA2 · 其中 TA2:垂直兩個選擇方向而測量之第二厚度値之平均値 MD2:該第二厚度値之誤差平均値, 其中頻率光譜SP2係藉該第二厚度値之快速傅立葉轉換 而得,及在對應轉換成空間頻率域之波長之範圍,該頻 邡年M/yi修(U减聂 率光譜SP2之最大値SP2MAX最大爲該第一厚度値之該平 均値T A 2之1 0 %。 2 8.如申請專利範圍第27項之光學聚合物薄膜,其包括滿足 下式之特性: MD3 ^ 0. 1 OxRA 1 > SP3max^ O.lOxRAl 其中 MD3:在平面方向之第一阻滯値Re之平均誤差,該第一 阻滯値Re係在一個選擇方向測量, Φ RA 1 :在該平面方向之該第一阻滯値Re之平均値, SP3MAX:頻率光譜SP3之最大値,其係藉該第一阻滯値 Re之快速傅立葉轉換而得。 . 2 9.如申請專利範圍第28項之光學聚合物薄膜,其中在對應 轉換成空間頻率域之波長之範圍,該頻率光譜SP3之該 : 最大値SP3MAX最大爲該第一厚度値之該平均値RA1之 10%。 30.如申請專利範圍第28項之光學聚合物薄膜,其包括滿足 ® 下式之特性: ’ MD4 S 0· 1 0xRA2, 其中 MD4:垂直兩個選擇方向而測量之第二阻滯値Re之誤差 平均値, RA2 :垂直兩個選擇方向而測量之該第二阻滯値Re之平 均値, I3220421322042 No. I 曰修(吏)王Replacement page No. 93 121244 "Method and apparatus for manufacturing film from polymer solution, and optical polymer film" Patent (Revised on December 17, 2009) X. Patent application scope A method of casting a film formed of at least one polymer solution discharged from a mold before moving a substrate, the method comprising the steps of heating the substrate using a heater disposed along a back surface of the substrate; A condensing device that is closely disposed on the substrate facing the film condenses the solvent evaporated from the film for recovery. 2. The method of claim 1, wherein the film speed near the surface of the film is from 0.01 m/sec to 0.5 m/sec. 3. The method of claim 2, wherein the substrate moves downward at a casting location where the flowing polymer solution contacts the substrate. 4- The method of claim 1, wherein Tw (°C) is the surface temperature of the condensing device facing the film, Ts (°C) is the temperature of the film, and d (mm) is the condensing device The distance to the film, the temperature gradient Q satisfies the following formulas (1) and (2): Q = (Ts-Tw) / d (1) 5 < Q < 1 00 ... (2). 5. The method of claim 4, wherein the temperature gradient Q has a variation range of at most 10% of the temperature gradient Q. 6. The method of claim 5, wherein the temperature of the facing surface of the condensing device ranges from a maximum of 10 °C. 1322042 — I r··^* II ·__··1 f The annual P month % repair (tg 膂 page 7), as in the method of claim 6, wherein the distance d varies in the width direction of the substrate The maximum range is 10% of the average d of the distance d. 8. The method of claim 1, wherein the co-casting of the plurality of polymer solutions is carried out. 9. The method of claim 1, wherein the method The method of claim 1, wherein the film is formed on the substrate, the film has a thickness of from 10 micrometers to 1000 micrometers, and the substrate is opposite to the mold. The speed is from 5 m/min to 200 m/min. The method of claim 10, wherein the polymer contained in the polymer solution is cellulose oxime, polycarbonate, and lanthanum. The method of claim 11, wherein the polymer solution contains at least 50% by weight of the cellulose component of the polymer component, and X is in the cellulose: The sixth place in the repeat unit of the telluride Wherein the thiol substitution ratio, and γ is the thiol substitution ratio at other positions, the following conditions are satisfied in the polymer solution: I Χ>0·85 and 2.70<(X + Y)<2.99 » 13 The method of claim 1, wherein the film is an optical film. 14. The method of claim 13, wherein the optical film is used in a polarizing filter. The method of the present invention, wherein the optical film is used as a polarizing filter protective film. 16. The method of claim 13, wherein the optical film is used for light -2- 1322042 — _____ The history of the invention is as follows: 1. The method of claim 13, wherein the optical film is used for a display device. 18. A method for producing a film from a polymer solution. a device comprising: a movable substrate; a mold for casting a polymer solution on a surface of the substrate before the moving substrate to form a film; a heater provided facing the back surface of the substrate; the heater passes the film through the substrate Heating: configured to be close to ground Facing the condensing device of the film, the condensing device condenses the solvent evaporated from the film to recover. 19. The device of claim 18, wherein Tw (°C) is the surface of the condensing device facing the film Temperature, Ts (°C) is the temperature of the film, and d (mm) is the distance from the condensing device to the film. The temperature gradient Q satisfies the following formulas (1) and (2): Q = (Ts-Tw)/ d ......(1) 5<Q<1 00...(2). 20. The device of claim 19, wherein the temperature gradient Q has a range of variation of at most 10% of the temperature gradient Q. 21. The device of claim 20, wherein the temperature of the surface of the condensing device varies by a maximum of 10 °C. 2. The device of claim 21, wherein the distance d from the condensing device to the film varies in the width direction of the substrate by a maximum of 10% of the average d of the distance d. Ι333Θ43-~·___ λ? Year of the month repair (-........... 23 · The device of claim 22, wherein the substrate is a belt. 2 4. If the scope of patent application is 22 The device wherein the substrate is a cylinder. 25. An optical polymer film comprising a property satisfying the following formula: MD1 ^ O.lOxTAl ; SPImax^ O.lOxTAl wherein TA1: on the polymer film The average thickness 値MD1 of the first thickness 测量 measured by the plurality of measurement points arranged in one direction: the error average 値 of the plurality of first thickness 値, · SP1MAX: the maximum 値 of the frequency spectrum SP1, which is the first thickness 26. The optical polymer film of claim 25, wherein the maximum 値 SP1MAX of the frequency spectrum SP1 is at least the first thickness in a range corresponding to: a wavelength converted into a spatial frequency domain 10% of the average 値TA1: 〇27. The optical polymer film of claim 25 or 26, which includes the characteristics of the following formula: ® MD2 ^ 0.1 0xTA2 · where TA2: perpendicular to the two selected directions The average thickness 测量MD2 of the measured second thickness :: The error of the second thickness 値 is 値, wherein the frequency spectrum SP2 is obtained by the fast Fourier transform of the second thickness ,, and in the range corresponding to the wavelength converted into the spatial frequency domain, the frequency M M/yi repair ( The maximum 値 SP2MAX of the U-density spectrum SP2 is at most 10% of the average 値TA 2 of the first thickness 2. 2 8. The optical polymer film of claim 27, which includes the following formula Characteristics: MD3 ^ 0. 1 OxRA 1 > SP3max^ O.lOxRAl where MD3: the average error of the first block 値Re in the plane direction, the first block 値Re is measured in a selected direction, Φ RA 1 : The average 値 of the first block 値Re in the plane direction, SP3MAX: the maximum 频率 of the frequency spectrum SP3, which is obtained by the fast Fourier transform of the first block 値Re. 2 9. Apply for a patent The optical polymer film of item 28, wherein the frequency spectrum SP3 is in a range corresponding to a wavelength converted into a spatial frequency domain: the maximum 値 SP3MAX is at most 10% of the average 値 RA1 of the first thickness 。 30. , such as the optical polymer of claim 28 The film, which includes the characteristics of the following formula: 'MD4 S 0· 1 0xRA2, where MD4: the error average 値 of the second block 値Re measured perpendicular to the two selected directions, RA2: measured in two vertical directions The average value of the second block 値Re, I322042 其中頻率光譜SP4係藉垂直兩個選擇方向而測量之該第 二阻滯値Re之快速傅立葉轉換而得,及在對應轉換成空 間頻率域之波長之範圍,該頻率光譜 SP2之最大値 SP4MAX最大爲垂直兩個選擇方向而測量之該第二阻滯値 之該平均値RA2之10%。 31.如申請專利範圍第30項之光學聚合物薄膜,其包括滿足 下式之特性: MD5 ^ 0.1 0xRA3 > SP5max = 0.10xRA3 其中 MD 5:厚面方向之第三阻滯値Rth之平均誤差,該第三 阻滯値Rth係在一個選擇方向測量, RA3:該第三阻滯値Rth之平均値, SP5MAX:頻率光譜SP3之最大値,其係藉該第三阻滯値 Rth之快速傅立葉轉換而得。 32·如申請專利範圍第31項之光學聚合物薄膜,其中在對應 轉換成空間頻率域之波長之範圍,該頻率光譜SP5之該 最大値SP 5 MAX最大爲厚度方向之該第三阻滞値Rth之該 平均値RA3之10%。 33.如申請專利範圍第31項之光學聚合物薄膜,其包括滿足 下式之特性z MD6 ^ 0.1 0xRA4, 其中 MD6:垂直兩個選擇方向而測量之該第三阻滯値Rth之 1322042_______ 部年/邛,換頁 1 ' ,,吻被》 你-- 誤差平均値, RA4 :該第四阻滯値Rth之平均値 其中頻率光譜SP6係藉該第四阻滞値Rth之快速傅立葉 轉換而得,及在對應轉換成空間頻率域之波長之範圍,該 頻率光譜SP6之最大値SP6MAX最大爲該第四阻滯値Rth 之該平均値RA4之10%。 3 4.如申請專利範圍第33項之光學聚合物薄膜,其中在相對 濕度爲10%之表面電阻1χ1〇1()Ω至1χ1013Ω之範圍,而 且該表面電阻在選擇兩處間之差最大爲該兩處之該表面 電阻之平均値之20%。 1322042 代却-1月玥曰修(嵬)垂簪換買 十一、圖式1——二 丽I狨The frequency spectrum SP4 is obtained by fast Fourier transform of the second block 値Re measured by two vertical selection directions, and the maximum 値SP4MAX of the frequency spectrum SP2 is the range corresponding to the wavelength converted into the spatial frequency domain. 10% of the average 値RA2 of the second block 测量 measured for two vertical selection directions. 31. The optical polymer film of claim 30, which comprises the property of: MD5^0.1 0xRA3 > SP5max = 0.10xRA3 wherein MD 5: the average error of the third block 値Rth in the direction of the thick face The third block 値Rth is measured in a selected direction, RA3: the average of the third block 値Rth, SP5MAX: the maximum 频率 of the frequency spectrum SP3, which is the fast Fourier of the third block 値Rth Converted. 32. The optical polymer film of claim 31, wherein the maximum 値SP 5 MAX of the frequency spectrum SP5 is the third block of the thickness direction in a range corresponding to a wavelength converted into a spatial frequency domain. The average of Rth is 10% of RA3. 33. The optical polymer film according to claim 31, which comprises the characteristic z MD6 ^ 0.1 0xRA4 satisfying the following formula, wherein MD6: the third block 値Rth measured by two vertical selection directions is 1322042_______ /邛, 换 1 ' , , kiss 》 You -- error average 値, RA4 : the fourth block 値 Rth average 値 where the frequency spectrum SP6 is obtained by the fast Fourier transform of the fourth block 値 Rth, And in the range corresponding to the wavelength converted into the spatial frequency domain, the maximum 値SP6MAX of the frequency spectrum SP6 is at most 10% of the average 値RA4 of the fourth block 値Rth. 3. The optical polymer film according to claim 33, wherein the surface resistance is 10 χ 1 〇 1 (1 Ω to 1 χ 1013 Ω) at a relative humidity of 10%, and the difference between the surface resistance and the selected two is at most The average of the surface resistances of the two places is 20%. 1322042 Generation but in January - 玥曰 repair (嵬) coveted for sale XI, Figure 1 - two Li I狨 1322042 ____ • 年(月4日修(更)正替換頁1322042 ____ • Year (Month 4th repair (more) is replacing page 1322042 第3圖1322042 Figure 3 35b35b 1322042 v IJ /' ' ' Γ _ - - Ί*·-·ΐΓΤ--π r .-.-n J.r-L --iw-i*-- -h年!月修皮)··..替1322042 v IJ /' ' ' Γ _ - - Ί*·-·ΐΓΤ--π r .-.-n J.r-L --iw-i*-- -h years! Month repair leather)··.. 82 31 51 1322042 Air f82 31 51 1322042 Air f 1322042 代年丨月4曰修(ί. +Ί換I1322042 代年丨月4曰修(ί. +Ί换I 1322042 ' ??年丨月吶日修ν史vniw 第10圖 93a1322042 '??年丨月呐日修ν史vniw第10图 93a 91 1322042 年丨戶射:if 第11圖 105a 1091 1322042 Seto Shot: if Figure 11 105a 10 溫度控制器 56 12 105a PS ) 101 1322042 ,rf年(月#修 第12圖Temperature controller 56 12 105a PS ) 101 1322042 , rf year (month #修第12图 4141 第13圖Figure 13 -10--10-
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Publication number Priority date Publication date Assignee Title
TWI600517B (en) * 2011-08-23 2017-10-01 富士軟片股份有限公司 Device and method for controlling position of belt edge in solution casting apparatus
TWI757914B (en) * 2020-10-14 2022-03-11 台灣積體電路製造股份有限公司 Liquid supplying system and liquid supplying method

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TWI464055B (en) * 2011-11-07 2014-12-11 Creating Nano Technologies Inc Method for manufacturing film

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI600517B (en) * 2011-08-23 2017-10-01 富士軟片股份有限公司 Device and method for controlling position of belt edge in solution casting apparatus
TWI757914B (en) * 2020-10-14 2022-03-11 台灣積體電路製造股份有限公司 Liquid supplying system and liquid supplying method

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