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TWI310025B
TWI310025B TW95140266A TW95140266A TWI310025B TW I310025 B TWI310025 B TW I310025B TW 95140266 A TW95140266 A TW 95140266A TW 95140266 A TW95140266 A TW 95140266A TW I310025 B TWI310025 B TW I310025B
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Taiwan
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oxygen
liquid
gas
waste liquid
overflow
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TW95140266A
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Chinese (zh)
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TW200819397A (en
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Zhi-Zhong Chen
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Zhi-Zhong Chen
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1310025 九、發明說明: 【發明所屬之技術領域】 本發明主要係揭示一種廢液處理方法及裝置,特別是 指利用多次蒸發與多重反覆反應程序之廢液處理方法及裝 置者。 【先前技術】 _ 請參照我國專利公告編號第151744號之「氧化蒸發過 程及裝置」'專利案’為本發明人先前向韵局提出專利申請 之發明專利案’其係一種專為處理廢水或其他含有有機物 或可還原無機物物質水溶液之特殊過程及其裝置。主要係 第一個急驟蒸發罐1 〇能急驟蒸發反應器底部流7及再循環 /a 11 ’再循環流11係在頂部冷凝器6再加溫,之後接著 再循環至第一個急驟蒸發罐1〇,直至鹽濃度能使第二個急 驟蒸發罐13的最終急驟蒸發產生一飽和溶液15為止。 | 該習知結構於實用上必須等待第一個急驟蒸發罐1〇 進行水份蒸發,直至鹽濃度足夠之後,才能將廢水移至第 二個急驟蒸發罐13,如此形成操控上的困難,無法有效的 4握第一個急驟蒸發罐1 〇内廢水飽和的時間點。 再者,其再循環流11於第一個急驟蒸發罐10内僅僅 發生一次蒸發動作’故在濃縮的效果上較不明顯,其再循 環流11必需不斷的循環才能達到濃縮鹽份的效果,如此在 固液分離的能力即較差,亦較為費時,有改良之必要。 有鑑於上述習知結構之缺失,本發明人乃發明出一種 5 1310025 『廢液處理方法及其裝置』,其係可克服上述習知結構之 - 所有缺點。 【發明内容】 本發明『廢液處理方法及其裝置』所欲解決之技術問 題係在於,該習知結構於實用上必須等待第一個急驟蒸發 罐進行水m直至鹽濃度足狀後,才祕廢水移至 • 第二個急驟蒸發罐,如此形成操控上的困難,無法有效的 掌握第一個急驟蒸發罐内廢水飽和的時間點。再者,其再 循裱流於第一個急驟蒸發罐内僅僅發生一次蒸發動作,故 在〉辰縮的效果上較不明顯,其再循環流必需不斷的循環才 月匕達到濃縮鹽份的效果,如此在固液分離的能力即較差, 亦較為費時,故亟有待於改進。 本發明『廢液處理方法及其農置』,其包括有以下步 驟.將廢液送至進料調崎,並調配成驗性之混合液;將 • ⑮合液與氧氣送入氧氣飽和裝置内進行氧化反應並同時蒸 發水知,產生咼溫尚壓氣體及反應後之溢流;將部份溢流 Γ送至進料娜槽與聽混合形錢合液,繼溢流送入 =液交換㈣與高溫高壓氣體進行熱交換作業,使溢流二 4發形絲和溶液,並將水縫排結氣;絲和溶液 ,至冷雜晶㈣冷卻析出固體結晶而縣結晶液;將結 S日液送人陳分離H,將結驗分離為_鹽與母液,回 2固體鹽’並使錢回駐轉継槽與練混合形成混 6 1310025 其他目的、優點和本發明的新賴特性將從以下詳細的 描述與相關的附圖更加顯明。 【實施方式】 有關本發明所採用之技術、手段及其功效,兹舉一較 佳實施例並配合圖式詳述如後,此僅供說明之用,在專利 申請上並不受此種結構之限制。 參照圖一,本發明之裝置包括有一反應單元10與一回 收單元20 ;該反應單元1〇係用以執行廢液3〇中含有至少 一種有機質的氧化反應與蒸發水份的同步效應,並完成濃 縮廢液30中的鹽份及氧化反應產生的鹽份,而該回收單元 20則將反應後的廢液3〇予以析出固狀結晶,以回收鹽份。 其中: 該反應單元10包括有一進料調配槽11、一氧氣飽和 裝置12、一加熱反應器13與一氧氣循環裝置14。 該進料調配槽11係供接受廢液30,該廢液30為含有 多種成份的進料液體,或是含有至少一種有機質的進料液 體。該廢液30必需於進料調配槽11中調配成驗性的混合 液31,使酸鹼(PH)值保持在8至14之間,其可於化學 反應中產生碳酸鹽。 該氧氣飽和裝置12係連通於該進料調配槽11,接受 進料調配槽11送出的混合液31。該進料調配槽11可藉壓 力泵將混合液31輸送至氧氣飽和裝置12上方。而該氧氣 飽和裝置12下方則灌入氧氣4〇,混合液31往下流動,而 1310025 氧氣40向上流動,使混合液31與氧氣4〇相互逆流,並於 t氣餘和裝置12内保持有一定位的氣液分界面,在氣液分 - 界面處氣液分離。而氧氣飽和裝置12内產生的氧化反應與 : 中和反應將產生熱能,使混合液31蒸發產生水蒸氣,此水 蒸氣往上流動而與剩餘氧氣混合成為高溫高壓氣體以,而 自氧氣飽和裝置12頂部排出’此為廢水的第一次蒸發。 該氧氣飽和裝置12内保持有—定的操作溫度與壓 力,溫度的高低依處理廢液3〇之化學成份而有所不同,通 • 常保持在攝氏⑽至25G度之間。混合液31在氣氣飽和裝 置12内進行氧化反應之後即形成溢流32而自底部送至加 熱反應器13。1310025 IX. Description of the Invention: [Technical Field] The present invention mainly discloses a waste liquid processing method and apparatus, and more particularly to a waste liquid processing method and apparatus using a plurality of evaporation and multiple repeated reaction procedures. [Prior Art] _ Please refer to the "Oxidation Evaporation Process and Device" 'Patent Case' of the Patent No. 151744 of the present invention as the invention patent case filed by the inventor for the patent application to the rhyme bureau. Other special processes and devices containing aqueous solutions of organic or reducible inorganic materials. Mainly the first flash evaporation tank 1 急 can flash evaporation reactor bottom stream 7 and recycle / a 11 'recycle stream 11 is reheated in the top condenser 6 and then recycled to the first flash evaporation tank 1 〇 until the salt concentration causes the final flash evaporation of the second flash evaporation tank 13 to produce a saturated solution 15. The conventional structure must be practically waited for the first flash evaporation tank to evaporate water until the salt concentration is sufficient before the wastewater can be moved to the second flash evaporation tank 13, thus forming a control difficulty. The effective 4 grips the first flash evaporation tank 1 at the point in time when the wastewater is saturated. Moreover, the recycle stream 11 has only one evaporation operation in the first flash evaporation tank 10, so the effect of concentration is less obvious, and the recycle stream 11 must be continuously circulated to achieve the effect of concentrating the salt. The ability to separate solid and liquid in this way is poor, and it is time consuming and necessary for improvement. In view of the above-described deficiencies in the conventional structure, the inventors have invented a 5 1310025 "waste liquid processing method and apparatus thereof" which overcomes all of the above-mentioned disadvantages of the conventional structure. SUMMARY OF THE INVENTION The technical problem to be solved by the "waste liquid processing method and apparatus" thereof is that the conventional structure must be practically waited for the first rapid evaporation can to carry out water m until the salt concentration is sufficient. The secret wastewater moved to the second rapid evaporation canister, which made it difficult to control the time of the first wastewater in the evaporative tank. Moreover, it only circulates in the first flash evaporation tank, and only one evaporation operation occurs, so the effect of the shrinkage is less obvious, and the recycle flow must be continuously circulated before reaching the concentrated salt. The effect, such as the ability to separate solid and liquid, is relatively poor, and it is also time consuming, so it needs to be improved. The invention relates to a waste liquid treatment method and an agricultural plant thereof, which comprises the following steps: sending the waste liquid to the feed and adjusting the mixture, and preparing the mixed mixture; and feeding the 15 liquid and oxygen into the oxygen saturation device; The oxidation reaction is carried out and the water is evaporated at the same time to generate the 咼 warm gas and the overflow after the reaction; the partial overflow enthalpy is sent to the feed Na trough and the mixed mixture is mixed, and then the overflow is fed into the liquid. Exchange (4) heat exchange operation with high temperature and high pressure gas, make overflow of 4 hairline and solution, and sew the water to the air; wire and solution, to cold crystal (4) to cool out solid crystals and county crystallization liquid; S-day liquid is sent to Chen to separate H, and the test is separated into _salt and mother liquor, and 2 solid salt is returned, and the money is returned to the sump and mixed to form a mixture. 6 1310025 Other purposes, advantages and new characteristics of the present invention The detailed description below will be more apparent from the related drawings. [Embodiment] The technology, the means and the functions thereof used in the present invention are described in detail with reference to the drawings, which are for illustrative purposes only, and are not subject to such a structure in the patent application. The limit. Referring to Figure 1, the apparatus of the present invention comprises a reaction unit 10 and a recovery unit 20; the reaction unit 1 is used to perform the synchronization effect of the oxidation reaction and the evaporation of water containing at least one organic substance in the waste liquid 3, and is completed. The salt in the waste liquid 30 and the salt produced by the oxidation reaction are concentrated, and the recovery unit 20 separates the waste liquid after the reaction into a solid crystal to recover the salt. Wherein: the reaction unit 10 includes a feed mixing tank 11, an oxygen saturation unit 12, a heating reactor 13 and an oxygen circulation unit 14. The feed mix tank 11 is for receiving waste liquid 30, which is a feed liquid containing a plurality of components or a feed liquid containing at least one organic substance. The waste liquid 30 must be formulated into the in-progressive mixture 31 in the feed mix tank 11 to maintain an acid-base (pH) value between 8 and 14, which produces carbonates in the chemical reaction. The oxygen saturation device 12 is connected to the feed mixing tank 11 and receives the mixed liquid 31 sent from the feed mixing tank 11. The feed mixing tank 11 can deliver the mixed liquid 31 above the oxygen saturation device 12 by means of a pressure pump. The oxygen saturation device 12 is filled with oxygen 4 〇, the mixed liquid 31 flows downward, and the 1310025 oxygen 40 flows upward, so that the mixed liquid 31 and the oxygen gas 4 逆 flow back to each other, and remain in the gas remaining device 12 . The positioned gas-liquid interface is separated from the gas-liquid separation at the gas-liquid interface. The oxidation reaction generated in the oxygen saturation device 12 and: the neutralization reaction will generate thermal energy, and the mixed liquid 31 is evaporated to generate water vapor, and the water vapor flows upward to be mixed with the remaining oxygen to become a high temperature and high pressure gas, and the oxygen saturation device is used. 12 Top discharge 'This is the first evaporation of wastewater. The oxygen saturation device 12 maintains a constant operating temperature and pressure, and the temperature varies depending on the chemical composition of the waste liquid, and is maintained between (10) and 25 degrees Celsius. The mixed solution 31 is formed into an overflow 32 after the oxidation reaction in the gas-saturated device 12, and is sent from the bottom to the heating reactor 13.

該加熱反應器13係連通於氧氣飽和裝置12之底部, 係用以提供魏_和裝置12工作時為働反應溫度而 所需之熱能。該加熱反應器13裝設一外接熱源,用以補足 =反應溫度於-定值之所需熱能者。特狀在初啟動時 運作中即可不作功。該加熱反應器13係輔助提 供月“氧_和褒置12,使氧氣飽和裝置^ ==㈣溫_體41(水蒸氣與剩餘: ===氣體41自氣液分界面與混合液31分離之 置12頂賴。該高溫高舰體41送 邱,用循^裝置14係連通於氧氣飽和裝置12之頂 ㈣可將飽Γ置12頂部所排出的高溫高麗氣體 餘氣氣與新鮮的補充氧氣40送入該氧氣餘和 8 1310025 下方。該氧氣循環裝置14自氧氣飽和裝置12 抽取的水減量與剩餘氧氣流量係成正比,因此可 “溫高壓氣體41流量以穫得—定值的蒸氣抽取 二 广鱼該氧氣循環裝置14並可使高溫高壓氣體41中的水蒸 剩餘氧氣分離,形成冷凝水42與氧氣,此冷凝水犯 =循環裝置14底部排出,而分離後的氧氣則可再利用 ς泵回送至氧氣飽和裝置12之下方,以供氧氣飽和褒置 進仃氧化反應者。該氧氣循環裝置14可自外部引入新 消耗=氣^補足在氧氣餘和裝置12内由於氧化反應所 該前述加熱反應器13並接受氧氣飽和農置12内混八 =31經氧化反麟的溢流32,此歸32㈣加熱反應^ 部份回流至進料調配槽u,與顧3G混合成為混 而可再送回氧氣餘和裝置12内進行蒸發的動作, 2的對錢32進行反覆岐應作業1未回流至進料調 配槽11的剩餘溢流32則送往回收單元2〇。 該回收單元20包括有一氣液熱交換器2卜一冷卻結 日日器22與一固液分離器23 〇 該氣液熱交換H 21係連於該加缺應^ 13,接受 加熱反應器13排出的剩餘溢流32。該氣液 ,維持在低於氧氣餘和加2之操働:故溢ί 進入讀熱交換H 21相為急驟蒸發而溫度驟降,形 =溫之溢流32,此為廢水的第二次蒸發。該氧氣飽和裝 内的壓力要歸在比氣液熱交鋪21的壓力為高, 9 1310025 以獲得再次蒸發加熱反應器溢流32中的水份的效果。其中 該氣液熱交換器21之操作壓力可放低至大氣壓力者。 由於減壓後的溢流32溫度比氧氣飽和裝置12排出的 高溫高壓氣體41溫度為低,故位在高溫高壓氣體41路徑 上的氣液熱交換器21可發生間接之熱交換反應,使低溫之 溢流32可以再次進行蒸發,使部份的水蒸氣33自氣液熱 交換器21頂部排出而進入大氣中,此則為廢水的第三次蒸 發。此經蒸發後剩餘的溢流32因固體濃度增加而更驅達到 飽和狀態,形成飽和溶液34。此飽和溶液34隨後即送入 冷卻結晶器22。 該冷卻結晶器22係連通於氣液熱交換器21,用 以接受氣液熱交換器21所排出之飽和溶液34。該冷卻結 晶器22係將飽和溶液34冷卻並析出固體結晶,而形成結 晶液35排出給固液分離器23。 該固液分離器23係連通於冷卻結晶器22,用以接受 結晶液35。該固液分離器22係將結晶液35分離為固體鹽 50與母液36,該固體鹽50即為處理後的最終回收產物。 而母液36則再回送至進料調配槽11,與廢液30混合成為 混合液3ί,而可再送回氧氣飽和裝置12内進行再氧化與 蒸發的動作,有效的對母液36再次進行反覆的反應作業。 由於進料之廢液30概為含有多種成份的進料溶液,在 同一溫度下,各個成份的氧化速率皆不相同,難以期待所 有的成份都可在固定的反應過程流過一回的情況下,就可 以完全氧化而從廢液30中去除。故對於難於氧化的成份, 1310025 只有把氧化產物(礙酸鹽)分離後,反覆的送回反應單元 10 ’使其可再次的純氣40触,以期所有可以氧化的成 份被氧化而從廢液30中去除。 而本發明混合液31進人氧氣飽和裝置12即產生第一 重反應’而溢流32回送至進料調配槽^與廢液3〇混合形 成混合液31 ’即可送人氧氣飽和裝置12進行第二重反應, 又母㈣回送至進料_槽^與廢㈣混合形成混合液 31 ’之後即y送人氧氣飽和裝置n進行第三重反應,多重 的反覆進行氧化反射將可以氧化的成份從廢液3〇中去 除’達到良好的反應效果。 又本案具有二次洛發程序,可有效的將廢液3〇中的鹽 伤與水離’更谷易獲得趨於飽和的餘和溶液34。如氧 氣飽和,置12為第-次蒸發程序,而於氣液熱交換器21 ^生第―人與第二次的蒸發程序,可有效的使積蓄的鹽 伤/辰度心加’達到良好的飽和效果,亦更利於回收單元 的析出結晶效果。 就以上所述可以歸納出本發明具有以下之優點: 1·本發明『練纽方法及其裝置』,其中本發明之 廢液、溢流及母液皆可反魏回反應單元處理,為一多重 反覆反應的程序’如此可將所有可以氧化的成份從廢液中 去除,達到良好的反應效果。 一^本發明『廢液處理方法及其裝置』,其中本發明具 有三次蒸發料,可有效的將廢液巾的鹽份與水份分離, 更容易獲得趨於飽和的飽和溶液。 11 1310025 其中母液係為 本發明『廢液處理方法及其裝置 ,液分離器將m巾的㈣鹽分賴之絲 飽和裝置物再:欠的氧化反應錢發料,為一=正 可達快速處理廢液並獲得固體鹽的設計。 /、 由是觀之,本發明極具產業上利用價值;且又未見有 相同或類似之發明出現於國内外刊物或公開使用 合專利法規定之積減消極要件,理麟予翻專利。+ 惟上所述者’僅為本發明之較佳實施例而已,& 實施之範圍,故舉凡數值之變更或 午之置換’或依本發日科請專娜_作之 飾,皆應仍屬本發明專利涵蓋之範疇。 a 【圖式之簡要說明】 圖一:為本發明結構之流程示意圖。 附件··為我國專财告編號第151744號專。 11 進料調配槽 13 加熱反應器 21氣液熱交換器 23固液分離器 31混合液 33水蒸氣 【主要元件符號說明】 ι〇反應單元 12氧氣飽和裝置 14氧氣循環裝置 20回收單元 22冷卻結晶器 3〇廢液 Μ溢流 12 1310025 34 飽和容液 35 結晶液 36 母液 40 氧氣 41 高溫高壓氣體 42 冷凝水 50 固體鹽The heated reactor 13 is in communication with the bottom of the oxygen saturation unit 12 to provide the heat energy required for the temperature of the helium and the apparatus 12 to operate. The heating reactor 13 is provided with an external heat source for supplementing the heat required for the reaction temperature to a predetermined value. The special shape can be used during the initial start-up operation. The heating reactor 13 is provided to assist in providing the monthly "oxygen_ and helium 12" so that the oxygen saturation device ^ == (four) temperature_body 41 (water vapor and remaining: === gas 41 is separated from the mixed liquid 31 from the gas-liquid interface The high temperature and high hull 41 is sent to Qiu, and the 14th system is connected to the top of the oxygen saturation device 12 (4). The high temperature and high gas residual gas discharged from the top of the full set 12 can be supplemented with fresh supplement. Oxygen 40 is fed into the oxygen remainder and below 8 1310025. The water withdrawal from the oxygen saturation unit 12 is proportional to the residual oxygen flow rate, so that the "warm high pressure gas 41 flow rate can be obtained to obtain a constant value of vapor extraction. The Erguang fish oxygen circulation device 14 can separate the water-steamed residual oxygen in the high-temperature and high-pressure gas 41 to form condensed water 42 and oxygen, and the condensed water is discharged at the bottom of the circulation device 14, and the separated oxygen can be reused. The helium pump is returned to the lower portion of the oxygen saturation device 12 for oxygen saturation and is placed in the oxidation reactor. The oxygen circulation device 14 can introduce a new consumption from the outside = the gas is supplemented in the oxygen residue device 12 due to the oxidation reaction. The aforementioned heating The reactor 13 is subjected to oxygen saturation, and the mixture is filled with water and water, and the water is cooled. The 32 (four) heating reaction is partially returned to the feed mixing tank u, and mixed with the Gu 3G to be mixed and returned. The operation of evaporating in the oxygen remaining device 12, the reversing of the money 32 by the second operation, and the remaining overflow 32 not flowing back to the feed mixing tank 11 are sent to the recovery unit 2A. The recovery unit 20 includes a gas. The liquid heat exchanger 2, a cooling junction dater 22, and a solid-liquid separator 23, the gas-liquid heat exchange H 21 are connected to the filling chamber 13, and receive the remaining overflow 32 discharged from the heating reactor 13. The gas and liquid are maintained below the oxygen balance and the addition of 2: so the ί enters the read heat exchange H 21 phase for rapid evaporation and the temperature drops suddenly, the shape = the temperature overflow 32, which is the second time of the waste water Evaporation. The pressure in the oxygen-saturated pack is attributed to a higher pressure than the gas-liquid heat-crossing 21, 9 1310025 to obtain the effect of re-evaporating the water in the reactor overflow 32. The gas-liquid heat exchanger The operating pressure of 21 can be lowered to atmospheric pressure. Because the temperature of the overflow 32 after decompression is more saturated than oxygen The temperature of the high-temperature and high-pressure gas 41 discharged from the device 12 is low, so that the gas-liquid heat exchanger 21 located in the path of the high-temperature and high-pressure gas 41 can undergo an indirect heat exchange reaction, so that the low-temperature overflow 32 can be evaporated again to make a part The water vapor 33 is discharged from the top of the gas-liquid heat exchanger 21 into the atmosphere, which is the third evaporation of the wastewater. The overflow 32 remaining after evaporation is driven to saturation due to an increase in solid concentration, forming saturation. The solution 34 is then sent to the cooling crystallizer 22. The cooling crystallizer 22 is connected to the gas-liquid heat exchanger 21 for receiving the saturated solution 34 discharged from the gas-liquid heat exchanger 21. The cooling crystallizer 22 cools the saturated solution 34 and precipitates solid crystals, and forms a crystallizing liquid 35 to be discharged to the solid-liquid separator 23. The solid-liquid separator 23 is connected to the cooling crystallizer 22 for receiving the crystallizing liquid 35. The solid-liquid separator 22 separates the crystallizing liquid 35 into a solid salt 50 and a mother liquid 36, which is the final recovered product after the treatment. The mother liquid 36 is returned to the feed mixing tank 11 and mixed with the waste liquid 30 to form a mixed liquid 3, which can be sent back to the oxygen saturation device 12 for reoxidation and evaporation, thereby effectively reacting the mother liquid 36 again. operation. Since the waste liquid 30 of the feed is a feed solution containing a plurality of components, the oxidation rate of each component is different at the same temperature, and it is difficult to expect all the components to flow through a fixed reaction process. It can be completely oxidized and removed from the waste liquid 30. Therefore, for the component that is difficult to oxidize, 1310025 only after separating the oxidation product (acid salt), and then returning it to the reaction unit 10' to make it again pure gas 40, so that all oxidizable components are oxidized from the waste liquid. Removed in 30. When the mixed liquid 31 of the present invention enters the oxygen saturation device 12, the first heavy reaction is generated, and the overflow 32 is sent back to the feed mixing tank, and the waste liquid 3 is mixed to form a mixed liquid 31', which can be sent to the oxygen saturation device 12. The second heavy reaction, and the mother (four) is sent back to the feed_slot^ and the waste (four) to form a mixed liquid 31', and then the y is sent to the oxygen saturation device n for the third heavy reaction, and multiple oxidative reflections are performed to oxidize the components. Remove from the waste 3 ' 'to achieve a good reaction. In addition, the present invention has a secondary firing procedure, which can effectively remove the salt damage and water from the waste liquid, and obtain a solution 34 which tends to be saturated. If the oxygen is saturated, set 12 to the first-evaporation procedure, and in the gas-liquid heat exchanger 21, the first-person and second-evaporation procedures can effectively increase the accumulated salt injury/end of the heart. The saturation effect is also more conducive to the precipitation crystallization effect of the recovery unit. As described above, the present invention can be summarized as follows: 1. The invention relates to a "new method and device thereof", wherein the waste liquid, the overflow and the mother liquid of the invention can be treated by the anti-Wei Hui reaction unit, which is more than one. The procedure for repeating the reaction 'so that all oxidizable components can be removed from the waste liquid to achieve a good reaction. The invention relates to a "waste liquid processing method and apparatus" thereof, wherein the invention has three evaporating materials, which can effectively separate the salt of the waste liquid towel from the water, and more easily obtain a saturated solution which tends to be saturated. 11 1310025 wherein the mother liquor is the waste liquid treatment method and the device thereof, and the liquid separator is used to saturate the device with the salt of the (four) salt of the m towel, and then: the oxidation reaction of the owed oxidation, for to fast processing Waste liquid and obtain the design of solid salt. /, From the point of view, the present invention is extremely industrially useful; and there is no such thing as the same or similar inventions appearing in domestic and foreign journals or publicly using the negative elements of the patent law, Li Lin has turned over patents. + The above description is only for the preferred embodiment of the present invention, and the scope of the implementation, so the change of the value or the replacement of the afternoon or the decoration of the Japanese It is still within the scope of the patent of the present invention. a [Brief description of the drawings] Figure 1: Schematic diagram of the structure of the present invention. Attachment·· is the special financial number No. 151744 of China. 11 Feeding tank 13 Heating reactor 21 Gas-liquid heat exchanger 23 Solid-liquid separator 31 Mixing liquid 33 Water vapor [Main component symbol description] 〇 〇 Reaction unit 12 Oxygen saturation device 14 Oxygen circulation device 20 Recovery unit 22 Cooling crystallization 3 〇 Μ Μ overflow 12 1310025 34 Saturated liquid 35 crystallization liquid 36 mother liquid 40 oxygen 41 high temperature high pressure gas 42 condensate 50 solid salt

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Claims (1)

1310025 十、申請專利範圍: 1. 一種廢液處理裝置,其包括有一反應單元與一回收 - 單元,其特徵在於: 該反應單元包括有: 一進料調配槽,該進料調配槽係接受廢液,並調配成 驗性的混合液; 一氧氣飽和裝置,係連通於該進料調配槽,接受進料 調配槽送出的混合液,並進行氧化反應與蒸發程序,產生 ® 高溫高壓氣體與溢流; 一加熱反應器,係連通於氧氣飽和裝置之底部,係用 以提供氧氣飽和裝置於工作時所需之補助熱量; 一氧氣循環裝置,係連通於氧氣飽和裝置之頂部,用 以接受氧氣飽和裝置頂部所排出的高溫高壓氣體,並將氧 氣送回該氧氣飽和裝置; 該回收單元,連接於該反應單元,接受經氧化及蒸發 而濃縮的反應單元溢流,該回收單元包括有: * 一氣液熱交換器,接受流經加熱反應器的溢流,並急 驟蒸發產生二次蒸發動作,且該氣液熱交換器係位於高溫 高壓氣體的路徑上,以對減壓後的溢流進行熱交換動作, 並發生三次蒸發程序,產生飽和溶液; 一冷卻結晶器,該冷卻結晶器係連通於上述氣液熱交 換器,用以接受飽和溶液,並將飽和溶液冷卻以析出固體 結晶,而形成結晶液排出給固液分離器; 一固液分離器,該固液分離器係連通於冷卻結晶器, 14 1310025 用以接受結晶液,係將結晶液分離為固體鹽與母液、該分 離的固體鹽即為處理後的最終回收產物,母液回送至該反 應單元反覆進行氧化與蒸發反應者。 2. 如請求項1所述之廢液處理裝置,其中該氧氣飽和 裝置上方係接受進料調配槽輸出之混合液,而該氧氣飽和 裝置下方則供灌入氧氣循環裝置輸出之氧氣。 3. 如請求項1所述之廢液處理裝置,其中該氧氣飽和 裝置内的壓力保持在比氣液熱交換器的壓力為高。 4. 如請求項1所述之廢液處理裝置,其中該氧氣循環 裝置係將高溫高壓氣體中的水蒸氣與氧氣分離,形成冷凝 水與氧氣,此冷凝水自氧氣循環裝置底部排出,而分離後 的氧氣則再利用循環泵回送至氧氣飽和裝置之下方。 5. 如請求項1所述之廢液處理裝置,其中該氧氣循環 裝置自外部引入新鮮的氧氣,以補足在氧氣飽和裝置内消 耗之氧氣量者。 6. 如請求項1所述之廢液處理裝置,其中該加熱反應 器裝設有一外接熱源,用以補足保持反應溫度於一定值之 所需熱能者。 7. —種廢液處理方法,其包括有以下步驟: 將廢液送至進料調配槽,並調配成鹼性之混合液; 利用氧氣循環裝置供給氧氣; 將混合液與氧氣送入氧氣飽和裝置内進行氧化與中和 反應並同時蒸發水份,產生高溫高壓氣體及反應後之液態 溢流; 15 1310025 將反應後之液態溢流直通到加熱反應器,調整液流溫 度後將部份反應後之溢流回送至進料調配槽與廢液混合形 成混合液,剩餘溢流即送入氣液交換器内,剩餘溢流急驟 蒸發形成低溫溢流; 將由氧氣飽和裝置頂部排出的高溫高壓氣體導入氣液 熱交換器,低溫溢流與高溫高壓氣體進行間接熱交換作 業,使溢流多次蒸發而形成飽和溶液,並將水蒸氣排至大 氣; 將前述已進行熱交換作業之氣體送入氧氣循環裝置, 水蒸氣冷卻成冷凝水而與不凝結的剩餘氧氣分離,冷凝水 自氧氣循環裝置排出,而分離後的剩餘氧氣送回氧氣飽和 裝置循環使用; 將飽和溶液送至冷卻結晶器内冷卻析出固體結晶而形 成結晶液, 將結晶液送入固液分離器,將結晶液分離為固體鹽與 母液,回收固體鹽,並使母液回送至進料調配槽與廢液混 合形成混合液。 8. 如請求項7所述之廢液處理方法,其中該進料調配 槽係將混合液調配成酸鹼(PH)值保持在8至14之間。 9. 如請求項7所述之廢液處理方法,其中該氧氣飽和 裝置之操作溫度保持在攝氏100至250度之間。 10. 如請求項7所述之廢液處理方法,其中該氧氣飽和 裝置内進行氧化反應,其氧化劑係採用氧氣,其在反應所 耗的氧氣量將由氧氣循澴裝置自外部引入新鮮氧氣。 16 1310025 11. 如請求項7所述之廢液處理方法,其中該氧氣飽和 裝置内水份的蒸發量,係由氧氣飽和裝置頂部所排出的氣 體流量來調節控制。 12. 如請求項7所述之廢液處理方法,其中一部份加熱 反應斋溢流回送至進料調配槽與廢液混合形成混合液之過 程’係為一種以高溫溢流直接混合低溫廢液的加熱方式。 13. 如請求項7所述之廢液處理方法,其在固液分離器 使與固體鹽分離的母液回送至進料調配槽輿廢液混合而形 成混合液’而再送回氧氣飽和裝置内與新鮮的氧氣再度接 觸,進行反覆的氧化反應作業。 14. 如請求項,7所述之廢液處理方法,其中一部份加熱 反應器溢流導入氣液熱交換器之操作促成一部份水急驟蒸 發而形成低溫之溢流’低溫溢流即與高溫高壓氣體產生間 接之熱交換’再次進行水份的蒸發,水蒸氣自氣液熱交換 器頂邛排出而進入大氣中,而剩餘的溢流形成飽和溶液。 15. 如請求項14所述之廢液處理方法,其中該氣液熱 父換器之操作壓力可玫低至氣壓力者。 171310025 X. Patent application scope: 1. A waste liquid processing device comprising a reaction unit and a recovery unit, wherein: the reaction unit comprises: a feed mixing tank, the feed mixing tank accepting waste Liquid, and formulated into an experimental mixture; an oxygen saturation device is connected to the feed mixing tank, accepts the mixed solution sent from the feed mixing tank, and performs an oxidation reaction and an evaporation process to generate ® high temperature and high pressure gas and overflow a heated reactor connected to the bottom of the oxygen saturation device for providing the auxiliary heat required for the operation of the oxygen saturation device; an oxygen circulation device connected to the top of the oxygen saturation device for receiving oxygen The high temperature and high pressure gas discharged from the top of the saturation device and returning the oxygen to the oxygen saturation device; the recovery unit is connected to the reaction unit and receives an overflow of the reaction unit concentrated by oxidation and evaporation, and the recovery unit includes: a gas-liquid heat exchanger that receives an overflow flowing through the heated reactor and rapidly evaporates to produce a secondary evaporation action, The gas-liquid heat exchanger is located on the path of the high-temperature and high-pressure gas to perform a heat exchange operation on the decompressed overflow, and a three-evaporation process occurs to generate a saturated solution; a cooling crystallizer, the cooling crystallizer is connected to The gas-liquid heat exchanger is configured to receive a saturated solution, and cool the saturated solution to precipitate solid crystals, and form a crystallization liquid to be discharged to the solid-liquid separator; a solid-liquid separator connected to the cooling crystallization , 13 1310025 for receiving the crystallization liquid, the crystallization liquid is separated into a solid salt and a mother liquid, the separated solid salt is the final recovered product after the treatment, and the mother liquid is returned to the reaction unit to carry out the oxidation and evaporation reaction. 2. The waste liquid processing apparatus according to claim 1, wherein the oxygen saturation device receives a mixture of the output of the feed preparation tank, and the oxygen saturation device is filled with oxygen supplied from the oxygen circulation device. 3. The waste liquid processing apparatus of claim 1, wherein the pressure in the oxygen saturation device is maintained at a higher pressure than the pressure of the gas liquid heat exchanger. 4. The waste liquid processing apparatus according to claim 1, wherein the oxygen circulation device separates water vapor in the high-temperature and high-pressure gas from oxygen to form condensed water and oxygen, and the condensed water is discharged from the bottom of the oxygen circulation device, and is separated. The post-oxygen is then returned to the oxygen saturation unit using a circulation pump. 5. The waste liquid treatment device of claim 1, wherein the oxygen circulation device introduces fresh oxygen from the outside to make up the amount of oxygen consumed in the oxygen saturation device. 6. The waste liquid processing apparatus according to claim 1, wherein the heating reactor is provided with an external heat source for supplementing the heat energy required to maintain the reaction temperature at a certain value. 7. A waste liquid treatment method comprising the steps of: feeding waste liquid to a feed mixing tank and formulating it into an alkaline mixture; supplying oxygen by using an oxygen circulation device; and feeding the mixture and oxygen to oxygen saturation Oxidation and neutralization reaction in the device and simultaneous evaporation of water to produce high temperature and high pressure gas and liquid overflow after reaction; 15 1310025 The liquid overflow after the reaction is directly passed to the heating reactor, and the reaction temperature is adjusted to partially react The overflow is sent back to the feed mixing tank to mix with the waste liquid to form a mixed liquid, and the remaining overflow is sent into the gas-liquid exchanger, and the remaining overflow is rapidly evaporated to form a low-temperature overflow; the high-temperature and high-pressure gas discharged from the top of the oxygen saturation device Introducing a gas-liquid heat exchanger, indirect heat exchange operation between low-temperature overflow and high-temperature high-pressure gas, causing the overflow to evaporate a plurality of times to form a saturated solution, and discharging the water vapor to the atmosphere; feeding the gas that has been subjected to the heat exchange operation The oxygen circulation device, the water vapor is cooled into condensed water and separated from the non-condensed residual oxygen, and the condensed water is discharged from the oxygen circulation device. The remaining oxygen is returned to the oxygen saturation device for recycling; the saturated solution is sent to the cooling crystallizer to cool the solid crystal to form a crystal liquid, and the crystal liquid is sent to the solid-liquid separator to separate the crystal liquid into a solid salt and a mother liquid. The solid salt is recovered and the mother liquor is returned to the feed mixing tank to mix with the waste liquid to form a mixed liquid. 8. The waste liquid processing method according to claim 7, wherein the feed blending tank mixes the mixed liquid to an acid-base (pH) value of between 8 and 14. 9. The waste liquid processing method of claim 7, wherein the operating temperature of the oxygen saturation device is maintained between 100 and 250 degrees Celsius. 10. The waste liquid treatment method according to claim 7, wherein the oxygen saturation device performs an oxidation reaction, and the oxidant uses oxygen gas, and the amount of oxygen consumed in the reaction is introduced into the fresh oxygen from the outside by the oxygen circulation device. The waste liquid processing method according to claim 7, wherein the evaporation amount of water in the oxygen saturation device is adjusted and controlled by the gas flow rate discharged from the top of the oxygen saturation device. 12. The waste liquid processing method according to claim 7, wherein a part of the heating reaction is sent back to the feed mixing tank to mix with the waste liquid to form a mixed liquid, which is a direct mixing of the low temperature waste with a high temperature overflow. The way the liquid is heated. 13. The waste liquid processing method according to claim 7, wherein in the solid-liquid separator, the mother liquid separated from the solid salt is returned to the feed preparation tank and the waste liquid is mixed to form a mixed liquid, and is returned to the oxygen saturation device. Fresh oxygen is brought into contact again for repeated oxidation reactions. 14. The waste liquid processing method according to claim 7, wherein a portion of the heated reactor overflow is introduced into the gas-liquid heat exchanger to cause a portion of the water to evaporate rapidly to form a low-temperature overflow. Indirect heat exchange with high temperature and high pressure gas 're-evaporation of water, which is discharged from the top of the gas-liquid heat exchanger into the atmosphere, and the remaining overflow forms a saturated solution. 15. The waste liquid processing method of claim 14, wherein the operating pressure of the gas-liquid heat master replacer can be lowered to a gas pressure. 17
TW95140266A 2006-10-31 2006-10-31 Wastewater treatment method and apparatus thereof TW200819397A (en)

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