200819397 九、發明說明·· 【發明所屬之技術領域】 本發明主要係揚示一種廢液處理方法及裝置，特別是 •指利用多次蒸發與多重反覆反應程序之廢液處理方法及裝 置者。 【先前技術】 請參照我國專利公告編號第151744號之「氧化蒸發過 私及裝置」專利案，為本發明人先前向鈞局提出專利申請 之發明專利案，其係一種專為處理廢水或其他含有有機物 或可還原無機物物質水溶液之特殊過程及其裝置。主要係 第一個急驟蒸發罐1 〇能急驟蒸發反應器底部流7及再循環 流11，再循環流11係在頂部冷凝器6再加溫，之後接著 再循環至第一個急驟蒸發罐10，直至鹽濃度能使第二個急 驟蒸發罐13的最終急驟蒸發產生一飽和溶液15為止。 該習知結構於實用上必須等待第一個急驟蒸發罐1〇 進行水份蒸發，直至鹽濃度足夠之後，才能將廢水移至第 ,個急驟蒸發罐13，如此形成操控上的困難，無法有效的 掌握第-個急驟蒸發罐1〇内廢水飽和的時間點。 再者Y其再循環流11於第一個急驟蒸發罐1〇内僅僅 毛生-人4¾動作’故在濃縮的效果上較不明顯，其再循 11必而不斷的循環才能達到濃縮鹽份的效果，如此在 固液分離的能力即較差，亦較為㈣，有改良之必要。 有鑑於上述習知結構之缺失，本發明人乃發明出一種 200819397 200819397 廢 液處理方法及其裝置 所有缺點 ，其係可克服上述習知結構之 【發明内容】 題传廢賴财紐錄置』所欲顧之技術問 麟在於，該·結構 彳触門 嚤 =進仃=^發，直至歸度足夠魏， 至 ^-個心驟蒸發罐内廢水飽和的時間點。再者，其再 第一個急驟蒸發罐内僅僅發生一次蒸發動作了故 果讀不明顯，其再循環流必需不斷的猶環才 :浐為鹽:的效果，如此在固液分離的能力即較差， 丌車乂為費日守，故亟有待於改進。 ϋ『練處理方法及其裝置』，其包财以下步 :人、、：廢液進料調配槽’並調配成驗性之混合液；將 與氧耽，入氧氣飽和褒置内進行氧化反應並同時蒸 …分’產生高溫高壓氣體及反應後之溢流；將部份溢流 回运至進料雜_廢_合形祕合液，雜溢流送入 =交換器内與高溫高壓氣體進行熱交換作業，使溢流二' ^發形成飽和溶液，並將水蒸氣排至大氣；將餘和溶液 达至冷部結晶器内冷卻析出固體結晶而形成結晶液；將結 曰曰液送入固液分離器，將結晶液分離為固體鹽與母液，回 =固體1’並使母㈣送至賴継槽與絲混合形成混 合液。 6 200819397 其他目的、優點和本發__特性將從以下詳細的 4田述與相關的附圖更加顯明。 【實施方式】 ϊ 有關本發明所採用之技術、手段及其功效，兹舉一較 佳實施例並配合圖式詳述如後，此僅供說明之用，在專利 申請上並不受此種結構之限制。 參照圖一，本發明之裝置包括有一反應單元1〇與一回 收單元20 ;該反應單元1〇係用以執行廢液3〇中含有至少 一種有機質的氧化反應與蒸發水份的同步效應，並完成濃 縮廢液30中的鹽份及氧化反應產生的鹽份，而該回收單元 20則將反應後的廢液30予以析出固狀結晶，以回收鹽份。 * t ： 孤刀 該反應單元ίο包括有一進料調配槽η、一氧氣飽和 裝置12、一加熱反應器13與一氧氣循環裝置14。 該進料調配槽11係供接受廢液30，該廢液3〇為含有 多種成份的進料液體，或是含有至少一種有機質的進料液 體。该廢液30必需於進料調配槽η中調配成驗性的混人 液31，使酸鹼（ΡΗ)值保持在8至η之間，其可於化學 反應中產生碳酸鹽。 該氧氣飽和裝置12係連通於該進料調配槽η ,接受 進料調配槽11送出的混合液31。該進料調配槽u可藉壓 力泵將混合液31輸送至氧氣飽和裝置12上方。而該氧氣 飽和瓜置12下方則灌入氧氣4〇，混合液31往下流動，而 200819397 氧氣40向上流動’使混合液31與氧氣4〇相互逆流，並於 氧氣飽和裝置12内贿有“定_氣液分界面，在氣液分 界面處氣液分離。而氧氣飽和裝置12内產生的氧化反應與 中和反應將產生齡’使混合液31紐產生錢氣，此水 蒸氣往上流動而與剩餘氧氣混合成為高溫高壓氣體41，而 自氧氣飽和裝置12頂部排出，此為廢水的第—次蒸發。[Technical Field] The present invention mainly relates to a waste liquid treatment method and apparatus, and more particularly to a waste liquid treatment method and apparatus using a plurality of evaporation and multiple repetition reaction procedures. [Prior Art] Please refer to the "Oxidation Evaporation and Private Device" patent case of China Patent Publication No. 151744, which is an invention patent case filed by the inventor for patent application to the bureau, which is specially designed for treating wastewater or other A special process and apparatus for containing an aqueous solution of an organic or reducible inorganic substance. Mainly the first flash evaporation tank 1 〇 can flash the reactor bottom stream 7 and the recycle stream 11 , the recycle stream 11 is reheated in the top condenser 6 , and then recycled to the first flash evaporation tank 10 Until the salt concentration causes the final flash evaporation of the second flash evaporation tank 13 to produce a saturated solution 15. The conventional structure must be practically waited for the first rapid evaporation canister to evaporate water until the salt concentration is sufficient before the wastewater can be moved to the first rapid evaporation can 13, thus forming a control difficulty and being ineffective. The mastery of the first-time flash evaporation tank 1 time point of wastewater saturation. Furthermore, Y, the recycle stream 11 is only in the first flash evaporation tank 1〇, only the hair-man 43⁄4 action, so the effect of concentration is less obvious, and it is followed by a continual cycle to reach the concentrated salt. The effect of this is that the ability to separate solid and liquid is worse, and it is more (4), and there is a need for improvement. In view of the above-mentioned lack of the conventional structure, the inventors have invented a shortcoming of the 200819397 200819397 waste liquid processing method and apparatus thereof, which can overcome the above-mentioned conventional structure [invention content] The technical question asked is that the structure 彳 彳 嚤 = = = = ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ Moreover, in the first sudden evaporation tank, only one evaporation operation occurs, so the fruit reading is not obvious, and the recirculation flow must be continuously circulated: the effect of sputum is salt, so the ability to separate solid and liquid is Poor, the squatting is a fee, so it needs to be improved. ϋ "Practice processing method and its device", the following steps of the package: human,,: waste liquid feed tank, and blended into an experimental mixture; will be oxidized with oxygen oxime, oxygen saturation At the same time steaming ... divided into 'high temperature and high pressure gas and the overflow after the reaction; part of the overflow back to the feed miscellaneous _ waste _ combined secret solution, mixed overflow into the exchanger and high temperature and high pressure gas Performing a heat exchange operation, causing the overflow to form a saturated solution and discharging the water vapor to the atmosphere; the remaining solution is brought to a cold mold to cool and precipitate a solid crystal to form a crystallization liquid; Into the solid-liquid separator, the crystallization liquid is separated into a solid salt and a mother liquid, back = solid 1' and the mother (four) is sent to the lyoside tank and the silk is mixed to form a mixed liquid. 6 200819397 Other purposes, advantages and features of the present invention will be more apparent from the following detailed description of the drawings and related drawings. [Embodiment] 技术 The technology, the means and the effects thereof used in the present invention are described in detail with reference to the drawings, which are for illustrative purposes only, and are not subject to such patent application. Structural limitations. Referring to Figure 1, the apparatus of the present invention comprises a reaction unit 1 and a recovery unit 20; the reaction unit 1 is used to perform a synchronous effect of oxidation reaction and evaporation of water containing at least one organic substance in the waste liquid 3, and The salt in the concentrated waste liquid 30 and the salt produced by the oxidation reaction are completed, and the recovery unit 20 precipitates the waste liquid 30 after the reaction to form a solid crystal to recover the salt. * t : Solitary knife The reaction unit ίο includes a feed mixing tank η, an oxygen saturation device 12, a heating reactor 13 and an oxygen circulation device 14. The feed mixing tank 11 is for receiving waste liquid 30 which is a feed liquid containing a plurality of components or a feed liquid containing at least one organic substance. The waste liquid 30 must be formulated into an in-process mixed liquid 31 in the feed mixing tank η to maintain an acid-base (ΡΗ) value between 8 and η, which can produce carbonate in a chemical reaction. The oxygen saturation device 12 is connected to the feed mixing tank η and receives the mixed liquid 31 sent from the feed mixing tank 11. The feed mixing tank u can deliver the mixed liquid 31 above the oxygen saturation device 12 by means of a pressure pump. The oxygen-saturated melon 12 is filled with oxygen 4 〇, the mixture 31 flows downward, and the 200819397 oxygen 40 flows upwards, so that the mixture 31 and the oxygen 〇 are mutually countercurrent, and the oxygen saturation device 12 is bribed. The gas-liquid interface is fixed at the gas-liquid interface, and the oxidation reaction and the neutralization reaction generated in the oxygen saturation device 12 will produce the age of 'the mixture 31 to generate money, and the water vapor flows upward. It is mixed with the remaining oxygen to become the high temperature and high pressure gas 41, and is discharged from the top of the oxygen saturation device 12, which is the first evaporation of the wastewater.
該氧氣飽和裝置12内保持有—定的操作溫度與壓 力’溫度的高低依處理廢液3〇之化學成份而有所不同，通 常保持在攝氏_至25〇度之間。混合液31在氧氣餘和裝 置12内如了氧化反應之後即形成溢流32而 熱反應器13 〇 - 王加 該加熱反應㈣係連通魏氣飽和裝置12.之 =以f該祕絲裝置12.工作料簡反應溫度 所為之熱能。該加熱反應器13裝設一外接 =反應錢於4值之所需減者。制是刀^ 作功，而在運作中即可不作功。談加埶反 $ _給氧氣崎12’使氧氣餘和忑12 =: H因熱/發出馬溫高壓氣體41 (水蒸氣輿剩餘氧氣) 41自氣液分界面與混合液31分· ;ί氧I:置一^ 該氧氣循環裝置14係連通於氧氣裝 ’=受氧氣飽和裝置 可將剩餘氧氣與新鮮的補充氧氣仙送入該氧氣= 200819397 * 裝置12之下方。該氧氣循環裝置14自氧氣飽和裝置12 巧抽取的水蒸氣量與_氧氣流量係成正比，因此可控 ； 制高溫高壓氣體41流量以穫得-錄的蒸氣抽取量。 〃錄氣循環裝置14並可使高溫高壓氣體41中的水蒸 ^剩餘氧氣分離，形成冷凝水42魏氣，此冷凝水42 自氧氣循％裝置14底部排出，分離後的氧賴可再利用 循環泵回送至氧氣飽和裝置12之下方，以供氧氣飽和裝置 • I、2進行氧化反應者。該氧氣循環裝置14可自外部引入新 鮮氧氣40，以補足在氧氣飽和裝置η，纟於氧化反應所 ’肖耗的氧氣量。 該前述加熱反應器13並接受氧氣飽和裝置12内混合 液31經氧化反應後的溢流32，此溢流32經過加熱反應器 13後一部份回流至進料調配槽丨丨，與廢液3〇混合成為混 合液31，而可再送回氧氣飽和裝置12内進行蒸發的動作， 有效的對溢流32進行反覆的反應作業。而未回流至進料調 # 配槽U的剩餘溢流32則送往回收單元20。 遠回收单元20包括有一氣液熱交換器21，一冷卻結 晶器22與一固液分離器23。 該氣液熱交換器21係連通於該加熱反應器13，接受 加熱反應器13排出的剩餘溢流32。該氣液熱交換器21之 操作壓力維持在低於氧氣飽和裝置12之操作壓力，故溢流 32進入氣液熱交換器21會因為急驟蒸發而溫度驟降，形 成低溫之溢流32 ’此為廢水的第二次蒸發。該氧氣餘和裝 广置12内的壓力要保持在比氣液熱交換器21的壓力為高， 200819397 以獲得再次蒸發加熱反應器溢流32中的水份的效果。其中 該氣液熱交換器21之操作壓力可放低至大氣壓力者。 由於減壓後的溢流32溫度比氧氣飽和裝置12排出的 咼溫面壓氣體41溫度為低，故位在高溫高壓氣體a路徑 上的氣液熱交換器可發生間接之熱交換反應，使低溫之 溢流32可以再次進行蒸發，使部份的水蒸氣33自氣液熱 交換器21 了員部排出而進入大氣中，此則為廢水的第三次蒸 發。此經蒸發後剩餘的溢流32因固體濃度增加而更驅達到 飽和狀態，形成飽和溶液34。此飽和溶液34隨後即送入 冷卻結晶器22 〇 該冷卻結晶器22係連通於氣液熱交換器21，用 以接文氣液熱父換器21所排出之飽和溶液。該冷卻結 晶裔22係將飽和溶液34冷卻並析出固體結晶，而形成結 晶液35排出給固液分離器23。 该固液分離器23係連通於冷卻結晶器22，用以接受 結晶液35。該固液分離器22係將結晶液35分離為固體鹽 50與母液36，該固體鹽50即為處理後的最終回收產物。 而母液36則再回送至進料調配槽u，與廢⑨3〇混合成為 碑合液31，而可再送回氧氣飽和襄置12内進行再氧化與 蒸發的動作，有效的對母液36再錢行反㈣反應作業。 -由於進料之廢液3〇概為含有多種成份的進料溶液，在 同皿度下，各個成份的氧化速率皆不相同，難以期待所 有的成份都可在固定的反應過程流過—回的情況下，就可 以完全氧絲從舰3〇巾絲。故對_於減的成份， 200819397 /、有把氧化產物（碳酸鹽）分離後， 10，使其可再次的與氧氣40接蝕，〇 份被氧化而從廢液30中去除。 ，反覆的送回反應單元 以期所有可以氧化的成The oxygen saturation device 12 maintains a constant operating temperature and pressure. The temperature is different depending on the chemical composition of the treated waste liquid, and is usually maintained between _ and 25 degrees Celsius. The mixed solution 31 forms an overflow 32 after the oxidation reaction in the oxygen residual device 12, and the thermal reactor 13 is heated. The heating reaction (4) is connected to the Wei gas saturation device 12. The f is the f The working material is simply the reaction temperature of the heat. The heating reactor 13 is equipped with an external connection = the required reduction of the reaction value of 4 values. The system is a knife, and it can be used in operation. Talk about 埶 埶 $ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ Oxygen I: The oxygen circulation device 14 is connected to the oxygen device. The residual oxygen and the fresh oxygen supplement are fed to the oxygen = 200819397 * below the device 12. The amount of water vapor extracted by the oxygen circulation device 14 from the oxygen saturation device 12 is proportional to the _ oxygen flow rate, and thus controllable; the high temperature and high pressure gas 41 flow rate is obtained to obtain the recorded vapor extraction amount. The gas recording and circulation device 14 can separate the water in the high-temperature and high-pressure gas 41 to separate the remaining oxygen to form condensed water 42 Wei gas. The condensed water 42 is discharged from the bottom of the oxygen-passing device 14, and the separated oxygen can be reused. The circulation pump is returned to the lower side of the oxygen saturation device 12 for the oxygen saturation device • I, 2 to perform the oxidation reaction. The oxygen circulation device 14 can introduce fresh oxygen 40 from the outside to make up the amount of oxygen consumed in the oxygen saturation device η in the oxidation reaction. The foregoing heating reactor 13 receives the overflow 32 after the oxidation reaction of the mixed liquid 31 in the oxygen saturation device 12, and the overflow 32 passes through the heated reactor 13 and is partially returned to the feed mixing tank, and the waste liquid. 3〇 is mixed into the mixed liquid 31, and can be sent back to the oxygen saturation device 12 for evaporation, thereby effectively performing the reaction operation of the overflow 32. The remaining overflow 32, which is not returned to the feed tank U, is sent to the recovery unit 20. The remote recovery unit 20 includes a gas-liquid heat exchanger 21, a cooling crystallizer 22 and a solid-liquid separator 23. The gas-liquid heat exchanger 21 is connected to the heating reactor 13 and receives the remaining overflow 32 discharged from the heating reactor 13. The operating pressure of the gas-liquid heat exchanger 21 is maintained below the operating pressure of the oxygen saturation device 12, so that the overflow 32 enters the gas-liquid heat exchanger 21, and the temperature drops suddenly due to rapid evaporation, forming a low-temperature overflow 32' It is the second evaporation of wastewater. The oxygen remaining and the pressure in the plenum 12 are maintained at a higher pressure than the gas-liquid heat exchanger 21, and 200819397 is used to obtain the effect of re-evaporating the water in the reactor overflow 32. Wherein the operating pressure of the gas-liquid heat exchanger 21 can be lowered to atmospheric pressure. Since the temperature of the overflow 32 after the decompression is lower than the temperature of the helium surface pressure gas 41 discharged from the oxygen saturation device 12, the gas-liquid heat exchanger located on the path of the high-temperature high-pressure gas a may undergo an indirect heat exchange reaction. The low temperature overflow 32 can be evaporated again, and part of the water vapor 33 is discharged from the gas-liquid heat exchanger 21 to the atmosphere, which is the third evaporation of the wastewater. This overflow 32 remaining after evaporation is more driven to saturation due to an increase in solid concentration, forming a saturated solution 34. This saturated solution 34 is then fed to the cooling crystallizer 22. The cooling crystallizer 22 is in communication with the gas-liquid heat exchanger 21 for receiving a saturated solution discharged from the gas-liquid heat master. The cooled crystallization 22 system cools the saturated solution 34 and precipitates solid crystals, and the crystallization liquid 35 is formed and discharged to the solid-liquid separator 23. The solid-liquid separator 23 is connected to the cooling crystallizer 22 for receiving the crystallizing liquid 35. The solid-liquid separator 22 separates the crystallizing liquid 35 into a solid salt 50 and a mother liquid 36, which is the final recovered product after the treatment. The mother liquor 36 is then sent back to the feed mixing tank u, mixed with the waste 93 成为 to become the tablet liquid 31, and can be sent back to the oxygen saturation 12 12 for reoxidation and evaporation, effectively re-doping the mother liquor 36 Anti- (four) reaction operations. - Since the waste liquid of the feed is a feed solution containing various components, the oxidation rate of each component is different under the same dish degree, and it is difficult to expect all the components to flow through the fixed reaction process - back In the case, it is possible to completely oxidize the silk from the ship 3 crepe. Therefore, for the component to be reduced, 200819397 /, after the oxidation product (carbonate) is separated, 10, it can be etched again with the oxygen 40, and the mash is oxidized and removed from the waste liquid 30. , returning the reaction unit repeatedly, in the hope that all oxidizable
除，達到良好的反應效果。 μ又本案具有二次蒸發程序，可有效的將廢液30中的鹽 j 一尺伤刀_，更谷易獲得趨於飽和的飽和溶液34。如氧 氣，和裝置12為第-次蒸發程序，而於氣液熱交換器21 2生第二次與第三次的蒸發料，可有效的使積蓄的鹽 知z辰度增加，達到良好的飽和效果，亦更利於回收單元20 的析出結晶效果。 而本發明混合液31 *入氧氣飽和裝 重反應，而溢流32回送至進料調配槽u 就以上所述可以歸納出本發明具有以下之優點·· 1·本發明『廢液處理方法及其裝置』，其中本發明之 廢液、溢流及母液皆可反覆送回反應單元處理，為一多重, 反覆反應的程序，如此可將所有可以氧化的成份從廢液中 去除’達到良好的反應效果。 2·本發明『廢液處理方法及其裝置』，其中本發明具 有三次蒸發程序，可有效的將廢液中的鹽份與水份分離， 更各易獲得趨於飽和的飽和溶液。 11 200819397 3·本發明『廢液處理方法及其裝置』，其中母液係為 ‘ 固液分離器將結晶液中的固體鹽分離後之產物，再回送至 . 氧氣飽和裝置進行再次的氧化反應與蒸發程序，為一真正 - 可達快速處理廢液並獲得固體鹽的設計。 由是觀之，本發明極具產業上利用價值；且又未見有 相闾或類似之發明出現於國内外刊物或公開使用，實已符 合專利法規定之積極及消極要件，理應准予發明專利。 φ 惟上所述者，僅為本發明之較佳實施例而已，當不能 以之限定本發明實施之範圍，故舉凡數值之變更或等效元 件之:置換，或依本發明申請專利範圍所作之均等變化與修 飾，皆應仍屬本發明專利涵蓋之範疇。 【圖式之簡要說明】 圖一：為本發明結構之流程示意圖。 附件：為我國專利公告編號第151744號專利案。 【主要元件符號說明】 11 進料調配槽 13 加熱反應器 21氣液熱交換器 23固液分離器 31混合液 33水蒸氣 10反應單元 12氧氣飽和裝置 14氧氣循環裝置 2〇 回收單元 22冷卻結晶器 30廢液 32溢流 12 200819397 34 飽和溶液 35 結晶液 36 母液 40 氧氣 41 高溫高壓氣體 42 冷凝水 50 固體鹽In addition, achieve a good reaction.又 This case has a secondary evaporation procedure, which can effectively remove the salt in the waste liquid 30 by a knife, and it is easy to obtain a saturated solution 34 which tends to be saturated. For example, oxygen, and the device 12 is the first-time evaporation process, and the second and third evaporation materials are generated in the gas-liquid heat exchanger 21 2, which can effectively increase the accumulated salt and increase the z-degree. The saturation effect is also more advantageous for the precipitation crystallization effect of the recovery unit 20. The mixed liquid 31* of the present invention is subjected to an oxygen saturation loading reaction, and the overflow 32 is sent back to the feed mixing tank. The above-mentioned advantages can be summarized as described above. The device, wherein the waste liquid, overflow and mother liquor of the present invention can be returned to the reaction unit for treatment, which is a multiple, repeated reaction procedure, so that all oxidizable components can be removed from the waste liquid. The reaction effect. 2. The "waste liquid treatment method and apparatus" thereof, wherein the present invention has a three-evaporation procedure, which can effectively separate the salt in the waste liquid from the water, and more easily obtain a saturated solution which tends to be saturated. 11 200819397 3. The invention relates to a waste liquid treatment method and a device thereof, wherein the mother liquid is a product of a solid-liquid separator separating a solid salt in a crystallization liquid, and then sent back to the oxygen saturation device for reoxidation reaction and The evaporation process, for a real - can be designed to quickly process waste liquid and obtain solid salt. From the point of view, the present invention is extremely industrially useful; and there is no such thing as a contrary or similar invention appearing in domestic or foreign publications or public use, which has already met the positive and negative requirements of the Patent Law, and should be granted invention patents. . The φ is only the preferred embodiment of the present invention, and the scope of the present invention is not limited thereto, so that the numerical value is changed or the equivalent element is replaced, or according to the scope of the patent application of the present invention. Equal variations and modifications are still within the scope of the invention patent. BRIEF DESCRIPTION OF THE DRAWINGS FIG. 1 is a schematic flow chart of the structure of the present invention. Attachment: It is the patent case No. 151744 of China Patent Publication No. 151744. [Main component symbol description] 11 Feeding tank 13 Heating reactor 21 Gas-liquid heat exchanger 23 Solid-liquid separator 31 Mixing liquid 33 Water vapor 10 Reaction unit 12 Oxygen saturation device 14 Oxygen circulation device 2 〇 Recovery unit 22 Cooling crystallization 30 waste liquid 32 overflow 12 200819397 34 saturated solution 35 crystallization liquid 36 mother liquid 40 oxygen 41 high temperature high pressure gas 42 condensed water 50 solid salt
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