TWI396759B - A method for producing a metal - based ceramic composite target containing noble metal - Google Patents
A method for producing a metal - based ceramic composite target containing noble metal Download PDFInfo
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- B—PERFORMING OPERATIONS; TRANSPORTING
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- B22F3/00—Manufacture of workpieces or articles from metallic powder characterised by the manner of compacting or sintering; Apparatus specially adapted therefor ; Presses and furnaces
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- C22C32/00—Non-ferrous alloys containing at least 5% by weight but less than 50% by weight of oxides, carbides, borides, nitrides, silicides or other metal compounds, e.g. oxynitrides, sulfides, whether added as such or formed in situ
- C22C32/001—Non-ferrous alloys containing at least 5% by weight but less than 50% by weight of oxides, carbides, borides, nitrides, silicides or other metal compounds, e.g. oxynitrides, sulfides, whether added as such or formed in situ with only oxides
- C22C32/0015—Non-ferrous alloys containing at least 5% by weight but less than 50% by weight of oxides, carbides, borides, nitrides, silicides or other metal compounds, e.g. oxynitrides, sulfides, whether added as such or formed in situ with only oxides with only single oxides as main non-metallic constituents
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Description
本發明係有關於一種靶材之製造方法,詳言之,係關於一種含貴金屬之金屬基陶瓷複合靶材之製造方法。The present invention relates to a method for producing a target, and more particularly to a method for producing a metal-based ceramic composite target containing a noble metal.
硬碟為現代用來儲存大量資料的主要裝置,而資料主要是存放在硬碟碟片上之磁性薄膜記錄層,該磁性薄膜記錄層主要成分是具有鉑(Pt)貴金屬之鈷(Co)基合金材料。習知該磁性薄膜記錄層係利用一濺鍍用之靶材,以濺鍍(Sputtering)製程方式披覆於硬碟碟片上。The hard disk is a modern main device for storing large amounts of data, and the data is mainly a magnetic film recording layer stored on a hard disk. The magnetic film recording layer is mainly composed of a cobalt (Pt) noble metal cobalt (Co) group. alloy. It is known that the magnetic film recording layer is coated on a hard disk by a sputtering process using a sputtering target.
在習知技術中,鈷鉻鉑-二氧化矽(CoCrPt-SiO2 )薄膜是目前高容量硬碟之磁記錄薄膜主要之材料。其中,由於內含SiO2 陶瓷,因此需採用粉末冶金製程來製備CoCrPt-SiO2 靶材,亦即,選用Co粉、Cr粉、Pt粉與SiO2 粉充分混合,或選用CoCrPt預合金粉與SiO2 粉充分混合之後,再利用熱壓製程或熱均壓製程將靶材成型及緻密化。In the prior art, a cobalt chromium-ruthenium dioxide (CoCrPt-SiO 2 ) film is the main material of a magnetic recording film of a high-capacity hard disk. Among them, since the SiO 2 ceramic is contained, the powder metallurgy process is required to prepare the CoCrPt-SiO 2 target, that is, the Co powder, the Cr powder, the Pt powder and the SiO 2 powder are mixed well, or the CoCrPt prealloy powder is selected. After the SiO 2 powder is thoroughly mixed, the target is shaped and densified by a hot press process or a hot press process.
習知之粉體混合方式分為乾式混粉及濕式混粉兩種,二者主要之差異在於是否選擇於溶液中進行混粉,但無論採用何種混粉方式,都無法克服金屬粉體與陶瓷粉體比重差異甚大而無法均勻混合的問題。The conventional powder mixing method is divided into dry mixed powder and wet mixed powder. The main difference between the two is whether or not the powder is mixed in the solution, but the metal powder cannot be overcome regardless of the mixed powder method. The problem that the ceramic powders have a large difference in specific gravity and cannot be uniformly mixed.
另外,在濕式混粉製程中,Co粉、Cr粉、Pt粉及SiO2 粉係於一混合球體內進行混粉,以形成混合漿體。因此,濕式混粉製程完成後,將該混合漿體自該混合球體內取出時,會有部分該混合漿體殘留黏滯於該混合球體內。其 中,由於該CoCrPt-SiO2 靶材中之Pt貴金屬的含量高達百分之三十重量百分比(30 wt%)以上,故濕式混粉製程將會造成大量之Pt貴金屬的浪費,因而增加靶材之製造成本。In addition, in the wet mixing process, Co powder, Cr powder, Pt powder and SiO 2 powder are mixed in a mixing sphere to form a mixed slurry. Therefore, after the wet mixing process is completed, when the mixed slurry is taken out from the mixing sphere, a part of the mixed slurry remains in the mixed sphere. Among them, since the content of Pt precious metal in the CoCrPt-SiO 2 target is as high as 30% by weight (30 wt%) or more, the wet mixing process will cause a large amount of waste of Pt precious metal, thereby increasing the target. Manufacturing cost of materials.
因此,有必要提供一創新且富有進步性之含貴金屬之金屬基陶瓷複合靶材之製造方法,以解決上述問題。Therefore, it is necessary to provide an innovative and progressive method for manufacturing a metal-based ceramic composite target containing precious metals to solve the above problems.
本發明提供一種含貴金屬之金屬基陶瓷複合靶材之製造方法,該製造方法包括:(a)提供磁性金屬粉體及陶瓷粉體,該等粉體之純度係大於99.9%;(b)將該陶瓷粉體及該磁性金屬粉體於一溶劑中進行濕式混粉,以形成漿體,其中該陶瓷粉體披覆於該磁性金屬粉體之表面;(c)乾燥該漿體,以形成陶金複合粉體;(d)將該陶金複合粉體與貴金屬粉體進行乾式混粉,該貴金屬粉體之純度係大於99.9%;及(e)成型及緻密化混合後之該陶金複合粉體及該貴金屬粉體,以形成該含貴金屬之金屬基陶瓷複合靶材。The present invention provides a method for producing a metal-based ceramic composite target containing a noble metal, the method comprising: (a) providing a magnetic metal powder and a ceramic powder, the purity of the powder being greater than 99.9%; (b) The ceramic powder and the magnetic metal powder are wet-mixed in a solvent to form a slurry, wherein the ceramic powder is coated on the surface of the magnetic metal powder; (c) drying the slurry to Forming a ceramic gold composite powder; (d) dry mixing the ceramic gold composite powder with the precious metal powder, the purity of the precious metal powder is greater than 99.9%; and (e) the ceramic after molding and densification mixing The gold composite powder and the noble metal powder form the metal-based ceramic composite target containing the noble metal.
本發明之製造方法係先利用濕式混粉製程,將該陶瓷粉體均勻地被覆於該磁性金屬粉體之表面,並經由乾燥製程後,取得該陶金複合粉體,再利用乾式混粉製程將該貴金屬粉體與該陶金粉體均勻混合,最後利用成型及緻密化製程將該陶金複合粉體製成緻密之靶材。本發明之製造方法可均勻地混合該磁性金屬粉體、該陶瓷粉體及該貴金屬粉體,並且可減少靶材製作過程中該貴金屬粉體的浪費,故可改善靶材之品質及降低靶材之製造成本。In the manufacturing method of the present invention, the ceramic powder is uniformly coated on the surface of the magnetic metal powder by a wet mixing process, and after the drying process, the ceramic gold composite powder is obtained, and then the dry mixed powder is used. The process uniformly mixes the precious metal powder with the ceramic gold powder, and finally forms the ceramic gold composite powder into a dense target by a molding and densification process. The manufacturing method of the present invention can uniformly mix the magnetic metal powder, the ceramic powder and the precious metal powder, and can reduce waste of the precious metal powder in the target manufacturing process, thereby improving the quality of the target and reducing the target. Manufacturing cost of materials.
圖1顯示本發明含貴金屬之金屬基陶瓷複合靶材之製造方法之流程圖;圖2顯示本發明含貴金屬之金屬基陶瓷複合靶材之局部放大示意圖。其中,該含貴金屬之金屬基陶瓷複合靶材之製造方法,係可應用於磁記錄產業、光電產業或半導體產業之薄膜濺鍍製程。配合參考圖1及圖2,首先,參考步驟S11,提供磁性金屬粉體11及陶瓷粉體12,該等粉體11、12之純度較佳係大於99.9%。在本實施例中,該磁性金屬粉體11及該陶瓷粉體12之純度係大於99.95%。其中,該磁性金屬粉體11可為鈷或鈷鉻合金。1 is a flow chart showing a method for producing a metal-based ceramic composite target containing noble metal according to the present invention; and FIG. 2 is a partially enlarged schematic view showing a metal-based ceramic composite target containing a noble metal according to the present invention. The method for manufacturing the metal-based ceramic composite target containing the noble metal can be applied to a film sputtering process in the magnetic recording industry, the photoelectric industry or the semiconductor industry. Referring to FIG. 1 and FIG. 2, first, referring to step S11, magnetic metal powder 11 and ceramic powder 12 are provided, and the purity of the powders 11, 12 is preferably greater than 99.9%. In the present embodiment, the purity of the magnetic metal powder 11 and the ceramic powder 12 is greater than 99.95%. The magnetic metal powder 11 may be cobalt or a cobalt chromium alloy.
在本實施例中,該陶瓷粉體12係選用二氧化矽(SiO2 )或二氧化鈦(TiO2 )。其中,該陶瓷粉體12之粒徑較佳為0.07至1.0微米(μm)。In the present embodiment, the ceramic powder 12 is made of cerium oxide (SiO 2 ) or titanium oxide (TiO 2 ). The ceramic powder 12 preferably has a particle diameter of 0.07 to 1.0 μm.
參考步驟S12,將該陶瓷粉體12及該磁性金屬粉體11於一溶劑(例如:水或酒精)中進行濕式混粉,以形成漿體,其中該陶瓷粉體12披覆於該磁性金屬粉體11之表面。在步驟S12中,該磁性金屬粉體11之表面及該陶瓷粉體12之表面帶有不同電性之電荷,使該陶瓷粉體12披覆於該磁性金屬粉體11之該表面,以提升混合之均勻度。較佳地,該濕式混粉之混合時間為6至24小時。Referring to step S12, the ceramic powder 12 and the magnetic metal powder 11 are wet-mixed in a solvent (for example, water or alcohol) to form a slurry, wherein the ceramic powder 12 is coated on the magnetic body. The surface of the metal powder 11. In step S12, the surface of the magnetic metal powder 11 and the surface of the ceramic powder 12 have different electrical charges, so that the ceramic powder 12 is coated on the surface of the magnetic metal powder 11 to enhance The uniformity of mixing. Preferably, the mixing time of the wet mixed powder is from 6 to 24 hours.
要注意的是,根據不同之混合材質及混合條件,在步驟S12中,可另包括一調整pH值步驟,加入一酸或鹼溶液以調整該漿體之pH值,以使該磁性金屬粉體11之表面及該陶瓷粉體12之表面帶有不同電性之電荷。It is to be noted that, according to different mixed materials and mixing conditions, in step S12, a pH adjustment step may be further included, and an acid or alkali solution is added to adjust the pH of the slurry to make the magnetic metal powder. The surface of 11 and the surface of the ceramic powder 12 have different electrical charges.
參考步驟S13,乾燥該漿體,以形成陶金複合粉體。在 本實施例中,係以真空乾燥方法乾燥該漿體,其中,真空乾燥之溫度係為80℃至160℃,真空乾燥時間係為2至6小時,真空乾燥之真空度小於760托(torr)。Referring to step S13, the slurry is dried to form a ceramic gold composite powder. in In this embodiment, the slurry is dried by a vacuum drying method, wherein the vacuum drying temperature is 80 ° C to 160 ° C, the vacuum drying time is 2 to 6 hours, and the vacuum drying vacuum is less than 760 torr (torr). .
參考步驟S14,將該陶金複合粉體與貴金屬粉體13進行乾式混粉,該貴金屬粉體13之純度係大於99.9%。在本實施例中,該貴金屬粉體13係選用鉑(Pt),且其純度係大於99.95%,並且,該乾式混粉之混合時間較佳為4至8小時。Referring to step S14, the pottery gold composite powder and the precious metal powder 13 are dry-mixed, and the purity of the precious metal powder 13 is greater than 99.9%. In the present embodiment, the noble metal powder 13 is made of platinum (Pt), and its purity is more than 99.95%, and the mixing time of the dry mixed powder is preferably 4 to 8 hours.
參考步驟S15,成型及緻密化混合後之該陶金複合粉體及該貴金屬粉體13,以形成本發明含貴金屬之金屬基陶瓷複合靶材1。在本實施例中,係以熱壓(hot pressing)製程或熱均壓(hot isostatic pressing)製程進行該成型及緻密化步驟,其中,成型及緻密化之溫度係為800℃至1200℃,成型及緻密化之時間係為1至4小時。Referring to step S15, the ceramic gold composite powder and the precious metal powder 13 after molding and densification are mixed to form the metal-based ceramic composite target 1 containing the noble metal of the present invention. In this embodiment, the forming and densification steps are performed by a hot pressing process or a hot isostatic pressing process, wherein the molding and densification temperature is 800 ° C to 1200 ° C, and molding is performed. And the densification time is 1 to 4 hours.
較佳地,該陶瓷粉體12之重量百分比係為5%至12%,該貴金屬粉體13之重量百分比係為20%至50%,其餘之重量百分比係為該磁性金屬粉體11含量。在本實施例中,該磁性金屬粉體11係為鈷鉻合金,其中該陶瓷粉體12之重量百分比為5%至12%,該貴金屬粉體13之重量百分比為20%至50%,該鈷鉻合金之鉻之重量百分比係為4%至16%,其餘之重量百分比為該鈷鉻合金之鈷之重量百分比。Preferably, the weight percentage of the ceramic powder 12 is 5% to 12%, and the weight percentage of the precious metal powder 13 is 20% to 50%, and the remaining weight percentage is the content of the magnetic metal powder 11. In this embodiment, the magnetic metal powder 11 is a cobalt chromium alloy, wherein the ceramic powder 12 is 5% to 12% by weight, and the precious metal powder 13 is 20% to 50% by weight. The weight percentage of chromium in the cobalt-chromium alloy is 4% to 16%, and the remaining weight percentage is the weight percentage of cobalt of the cobalt-chromium alloy.
茲以下列實例予以詳細說明本發明,唯並不意謂本發明僅侷限於此等實例所揭示之內容。The invention is illustrated by the following examples, which are not intended to be limited to the scope of the invention.
本實例係以鈷鉻鉑-二氧化矽(CoCrPt-SiO2 )合金濺鍍靶 材的製作為例。首先,提供純度高達99.95%以上且具有磁性之鈷(Co)粉,以及提供純度亦高達99.95%以上之鉻(Cr)粉、鉑(Pt)粉、二氧化矽(SiO2 )粉(粒徑0.25 μm)。其中,鈷的含量為百分之四十六重量百分比(46 wt%),鉻的含量為5 wt%的,鉑的含量為42 wt%,二氧化矽的含量為7 wt%。接著,將Co粉、Cr粉及SiO2 粉體放入pH值為7之去離水中進行濕式混粉18小時。接著,將CoCr-SiO2 漿體放入一真空烘箱中,在真空度為76 torr中進行真空乾燥步驟,其中,乾燥溫度係為120℃,乾燥時間為4小時,即可將SiO2 粉體均勻地被覆在Co粉及Cr粉的表面上。最後,取乾燥後之CoCr-SiO2 粉體,與Pt粉體以不加溶劑之乾式混粉方式充分混合4小時之後,將混合均勻的粉體放入一石墨模具中,以熱壓方式,在1100℃、持溫1.5小時之條件下,將混合粉體壓成靶材形狀並將靶材緻密化之後,即製得高純度、組織細緻、成分均勻之CoCrPt-SiO2 靶材。This example is exemplified by the production of a cobalt-chromium-platinum-niobium oxide (CoCrPt-SiO 2 ) alloy sputtering target. First, a cobalt (Co) powder having a purity of up to 99.95% or more and a chromium (Cr) powder, a platinum (Pt) powder, and a cerium oxide (SiO 2 ) powder having a purity of 99.95% or more are provided. 0.25 μm). Among them, the content of cobalt was 46% by weight (46 wt%), the content of chromium was 5 wt%, the content of platinum was 42 wt%, and the content of cerium oxide was 7 wt%. Next, the Co powder, the Cr powder, and the SiO 2 powder were placed in a water having a pH of 7 and subjected to wet mixing for 18 hours. Next, the CoCr-SiO 2 slurry is placed in a vacuum oven, and a vacuum drying step is performed in a vacuum degree of 76 torr, wherein the drying temperature is 120 ° C, and the drying time is 4 hours, and the SiO 2 powder can be obtained. It is evenly coated on the surface of the Co powder and the Cr powder. Finally, the dried CoCr-SiO 2 powder is mixed with the Pt powder in a dry mixed manner without solvent, and then the uniformly mixed powder is placed in a graphite mold by hot pressing. The CoCrPt-SiO 2 target having high purity, fine structure and uniform composition was prepared by pressing the mixed powder into a target shape and densifying the target at 1100 ° C for 1.5 hours.
本實例係以鈷鉻鉑-二氧化鈦(CoCrPt-TiO2 )合金濺鍍靶材的製作為例。首先,提供純度高達99.95%以上具有磁性之鈷(Co)粉,以及提供純度亦高達99.95%以上之鉻(Cr)粉、鉑(Pt)粉、以及二氧化鈦(TiO2 )粉(粒徑0.07 μm)。其中,鈷的含量為48 wt%,鉻的含量為13 wt%,鉑的含量為31 wt%,二氧化鈦的含量為8 wt%。接著,將Co粉、Cr粉與TiO2 粉體放入去離水中,且以氨水調整溶液之pH值為8之後,進行濕式混粉12小時。接著,將CoCr-TiO2 漿體放 入一真空烘箱中,在真空度為76 torr中進行真空乾燥步驟,其中,乾燥溫度係為160℃,乾燥時間為2小時,即可將TiO2 粉體均勻地被覆在Co粉及Cr粉的表面上。最後,取乾燥後的CoCr-TiO2 粉體,與Pt粉體以不加溶劑之乾式混粉方式充分混合6小時之後,將混合均勻的粉體以不鏽鋼封罐(canning)之後,以熱均壓方式在800℃、持溫4小時的條件下,將粉體壓成靶材形狀並將靶材緻密化之後,即可製得高純度、組織細緻、成分均勻之CoCrPt-TiO2 靶材。This example is exemplified by the production of a cobalt-chromium-platinum-titanium dioxide (CoCrPt-TiO 2 ) alloy sputtering target. First, it provides magnetic cobalt (Co) powder with a purity of up to 99.95% or more, and chromium (Cr) powder, platinum (Pt) powder, and titanium dioxide (TiO 2 ) powder with a purity of up to 99.95% or more (particle size 0.07 μm). ). Among them, the content of cobalt was 48 wt%, the content of chromium was 13 wt%, the content of platinum was 31 wt%, and the content of titanium dioxide was 8 wt%. Next, the Co powder, the Cr powder, and the TiO 2 powder were placed in deionized water, and the pH of the solution was adjusted to 8 with aqueous ammonia, followed by wet mixing for 12 hours. Next, the CoCr-TiO 2 slurry is placed in a vacuum oven, and a vacuum drying step is performed in a vacuum degree of 76 torr, wherein the drying temperature is 160 ° C and the drying time is 2 hours, and the TiO 2 powder can be obtained. It is evenly coated on the surface of the Co powder and the Cr powder. Finally, the dried CoCr-TiO 2 powder was taken and thoroughly mixed with the Pt powder in a dry mixed manner without solvent, and then the uniformly mixed powder was canned with stainless steel, followed by heat. Under the condition of 800 ° C and holding temperature for 4 hours, the powder is pressed into the shape of the target and the target is densified, then the CoCrPt-TiO 2 target with high purity, fine structure and uniform composition can be obtained.
本發明之製造方法係先利用濕式混粉製程,將該陶瓷粉體均勻地被覆於該磁性金屬粉體之表面,並經由乾燥製程後,取得該陶金複合粉體,再利用乾式混粉製程將該貴金屬粉體與該陶金粉體均勻混合,最後利用成型及緻密化製程將該陶金複合粉體製成緻密之靶材。本發明之製造方法可均勻地混合該磁性金屬粉體、該陶瓷粉體及該貴金屬粉體,並且可減少靶材製作過程中該貴金屬粉體的浪費,故可改善靶材之品質及降低靶材之製造成本。In the manufacturing method of the present invention, the ceramic powder is uniformly coated on the surface of the magnetic metal powder by a wet mixing process, and after the drying process, the ceramic gold composite powder is obtained, and then the dry mixed powder is used. The process uniformly mixes the precious metal powder with the ceramic gold powder, and finally forms the ceramic gold composite powder into a dense target by a molding and densification process. The manufacturing method of the present invention can uniformly mix the magnetic metal powder, the ceramic powder and the precious metal powder, and can reduce waste of the precious metal powder in the target manufacturing process, thereby improving the quality of the target and reducing the target. Manufacturing cost of materials.
上述實施例僅為說明本發明之原理及其功效,並非限制本發明。因此習於此技術之人士對上述實施例進行修改及變化仍不脫本發明之精神。本發明之權利範圍應如後述之申請專利範圍所列。The above embodiments are merely illustrative of the principles and effects of the invention and are not intended to limit the invention. Therefore, those skilled in the art can make modifications and changes to the above embodiments without departing from the spirit of the invention. The scope of the invention should be as set forth in the appended claims.
1‧‧‧本發明含貴金屬之金屬基陶瓷複合靶材1‧‧‧Metal-based ceramic composite target containing noble metal of the present invention
11‧‧‧磁性金屬粉體11‧‧‧Magnetic metal powder
12‧‧‧陶瓷粉體12‧‧‧Ceramic powder
13‧‧‧貴金屬粉體13‧‧‧ precious metal powder
圖1顯示本發明含貴金屬之金屬基陶瓷複合靶材之製造方法之流程圖;及圖2顯示本發明含貴金屬之金屬基陶瓷複合靶材之局部 放大示意圖。1 is a flow chart showing a method of manufacturing a metal-based ceramic composite target containing noble metal according to the present invention; and FIG. 2 is a view showing a part of a metal-based ceramic composite target containing noble metal of the present invention. Zoom in on the schematic.
Claims (20)
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| TW097122747A TWI396759B (en) | 2008-06-18 | 2008-06-18 | A method for producing a metal - based ceramic composite target containing noble metal |
| US12/238,477 US20090317280A1 (en) | 2008-06-18 | 2008-09-26 | Method for manufacturing metal-based ceramic composite target containing noble metal |
| SG200808346-1A SG158001A1 (en) | 2008-06-18 | 2008-11-11 | Method for manufacturing metal-based ceramic composite target containing noble metal |
| JP2008312839A JP4913116B2 (en) | 2008-06-18 | 2008-12-09 | Method for producing metal-based ceramic composite target containing noble metal |
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| JP5240228B2 (en) * | 2010-04-09 | 2013-07-17 | Tdk株式会社 | Sputtering target and method for manufacturing perpendicular magnetic recording medium |
| TWI573882B (en) * | 2016-08-10 | 2017-03-11 | 中國鋼鐵股份有限公司 | Copper gallium alloy sputtering target and method of producing the same and application thereof |
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| EP1511802B1 (en) * | 2002-06-05 | 2010-09-08 | Showa Denko K.K. | Powder comprising silica-coated zinc oxide, organic polymer composition containing the powder and shaped article thereof |
| US6759005B2 (en) * | 2002-07-23 | 2004-07-06 | Heraeus, Inc. | Fabrication of B/C/N/O/Si doped sputtering targets |
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