TWI394628B - The splitting device and segmentation method of brittle material substrate - Google Patents
The splitting device and segmentation method of brittle material substrate Download PDFInfo
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Description
本發明,係關於藉由雷射照射之局部加熱及加熱後一刻之冷卻、以及藉由第二次雷射照射之再加熱,來分割脆性材料基板之分割裝置及分割方法。The present invention relates to a dividing device and a dividing method for dividing a brittle material substrate by local heating by laser irradiation and cooling after heating, and reheating by a second laser irradiation.
此處之脆性材料基板,係指玻璃基板、燒結材料之陶瓷、單結晶矽、半導體晶圓、陶瓷基板等。The brittle material substrate herein refers to a glass substrate, a ceramic of a sintered material, a single crystal germanium, a semiconductor wafer, a ceramic substrate, or the like.
目前係被期望有一種能製得幾乎無碎屑產生之高品質分割面之玻璃基板等之脆性材料基板的分割方法。作為能實現此種分割之分割方法,已提出了一種藉由雷射照射、冷煤噴射、第二次雷射照射之步驟分割基板的方法(參照專利文獻1)。At present, it is desired to have a method of dividing a brittle material substrate such as a glass substrate capable of producing a high-quality split surface having almost no chipping. As a division method capable of realizing such division, a method of dividing a substrate by a step of laser irradiation, cold coal injection, and second laser irradiation has been proposed (see Patent Document 1).
亦即,沿欲分割之基板之表面上的假想線(分割預定線)進行第一次雷射光束之照射的局部加熱,且在加熱後一刻噴射冷煤進行冷卻,藉此於基板表面形成裂痕(劃線)。接著,沿已形成之裂痕(劃線),進行第二次雷射光束照射之再加熱,藉此使裂痕延伸至基板深部(其後,本說明書中當提及裂痕往基板之深度方向成長的情形時,係稱之為「延伸」)。此時裂痕延伸至基板背面,將基板完全裂斷。根據此文獻,係使用一台或複數台雷射裝置,在以一台雷射裝置進行加工時,係形成長圓形狀之雷射點,將第一次加熱與第二次加熱以相同形狀之雷射點反覆照射。當使用複數台雷射裝置時,亦能使各雷射裝置之鏡筒部的透鏡系統不 同,在第一次以一個長圓、第二次以多點進行照射。That is, local heating of the first laser beam is performed along an imaginary line (divided line) on the surface of the substrate to be divided, and cold coal is sprayed for cooling at a moment after heating, thereby forming a crack on the surface of the substrate. (dash). Then, along the formed crack (scribe line), re-heating of the second laser beam irradiation is performed, thereby causing the crack to extend to the deep portion of the substrate (hereinafter, in the present specification, when the crack is mentioned to grow in the depth direction of the substrate, In the case of circumstances, it is called "extension". At this time, the crack extends to the back surface of the substrate, and the substrate is completely broken. According to this document, one or a plurality of laser devices are used, and when processed by a laser device, an elongated circular laser spot is formed, and the first heating and the second heating are performed in the same shape. The spot is repeatedly irradiated. When a plurality of laser devices are used, the lens system of the barrel portion of each laser device can also be In the same time, the first time is irradiated with one long circle and the second time with multiple points.
又,係揭示有一種進行劃線之方法及裝置,其係沿劃線預定線一邊以橢圓形狀之第1雷射點進行加熱,一邊以圓形或長方形之冷卻點冷卻第1雷射點之接近區域,進一步以橢圓形狀之第2雷射點加熱第1雷射點之相反側中接近冷卻點的區域,藉此進行劃線(參照專利文獻2)。根據此文獻,係藉由光學系統加工來自第1雷射振盪器、第2雷射振盪器之雷射光束,來形成橢圓形狀之第1雷射點、第2雷射點。接著藉由第1雷射點之加熱與冷卻點之冷卻產生應力梯度,而於基板形成垂直裂痕。再者,藉由第2雷射點再度加熱接近冷卻點之區域,使垂直裂痕再往背面延伸(裂痕達到板底時即整體切割)。接著,基板被供應至分割製程,對裂痕左右施加彎曲力矩以分割基板。Further, a method and apparatus for performing scribing are disclosed in which an elliptical first laser spot is heated along a predetermined line of a scribe line, and the first laser spot is cooled by a circular or rectangular cooling point. In the approaching region, the region close to the cooling point on the opposite side of the first laser beam is heated by the second laser beam at the second laser spot to perform scribing (see Patent Document 2). According to this document, a laser beam from a first laser oscillator and a second laser oscillator is processed by an optical system to form an elliptical first laser spot and a second laser spot. A stress gradient is then generated by the heating of the first laser spot and the cooling point to form a vertical crack on the substrate. Furthermore, the region close to the cooling point is heated again by the second laser spot, and the vertical crack is further extended to the back surface (when the crack reaches the bottom of the plate, the whole is cut). Next, the substrate is supplied to the dividing process, and a bending moment is applied to the left and right of the crack to divide the substrate.
又,在依序配置第1雷射點、冷卻點、第2雷射點且藉由同時掃描基板上以切斷如玻璃基板之脆性材料基板的方法中,揭示了第1雷射點之點形狀係相對長軸(欲分割之線的方向)左右對稱且於長軸方向呈前後非對稱(前方之面積較後方之面積大),藉此使分割速度極大化(參照專利文獻3、圖8)。根據此文獻之揭示,切斷裝置具備產生第1雷射光束、第2雷射光束之兩台雷射光束照射裝置,形成為點形狀前後非對稱之第1雷射光束,可在使第1雷射光束照射裝置產生之第1雷射光束通過藉由凸透鏡及凹透鏡構成之透鏡組時,使其通過自透鏡組之焦點往一側偏置之處,藉此來產生。Further, in the method of sequentially arranging the first laser spot, the cooling point, and the second laser spot, and simultaneously scanning the substrate to cut the brittle material substrate such as a glass substrate, the point of the first laser spot is revealed. The shape is bilaterally symmetrical with respect to the long axis (the direction of the line to be divided) and is asymmetrical in the longitudinal direction (the area of the front is larger than the area in the rear), thereby maximizing the division speed (see Patent Documents 3 and 8). ). According to the disclosure of this document, the cutting device includes two laser beam irradiation devices that generate the first laser beam and the second laser beam, and is formed into a first laser beam that is asymmetric in shape before and after the dot shape, and can be made first. When the first laser beam generated by the laser beam irradiation device passes through the lens group composed of the convex lens and the concave lens, it is generated by being offset from the focus of the lens group to one side.
再者,在依序配置第1雷射點、冷卻點、第2雷射點且藉由同時掃描基板上以進行脆性材料基板之劃線的方法中,揭示了第2雷射點係設置成最大之熱能量強度區域偏向接近冷卻點的前端部,使大應力梯度產生於與冷卻點之間,藉此使沿劃線預定線形成之垂直裂痕往背面進一步深入延伸(參照專利文獻4)。根據此文獻,係裝載第1雷射點用與第2雷射點用之兩台雷射裝置以分別調整各雷射點之熱能量強度分布,各雷射點藉由透鏡系統以繞射格子透鏡加工成熱能量強度分布在一端側成為最大。Further, in the method of sequentially arranging the first laser spot, the cooling point, and the second laser spot, and simultaneously scanning the substrate to perform scribing of the brittle material substrate, it is revealed that the second laser point system is set to The largest thermal energy intensity region is biased toward the front end portion of the cooling point, and a large stress gradient is generated between the cooling point, whereby the vertical crack formed along the predetermined line of the scribe line is further extended to the back surface (refer to Patent Document 4). According to this document, two laser devices for the first laser spot and the second laser spot are loaded to respectively adjust the thermal energy intensity distribution of each laser spot, and each laser spot is diffracted by the lens system. The lens is processed so that the thermal energy intensity distribution becomes maximum on one end side.
[專利文獻1]日本特開2001-130921號公報[Patent Document 1] Japanese Patent Laid-Open Publication No. 2001-130921
[專利文獻2]WO2003/026861號公報[Patent Document 2] WO2003/026861
[專利文獻3]日本特開2003-117921號公報[Patent Document 3] Japanese Patent Laid-Open Publication No. 2003-117921
[專利文獻4]WO2003/013816號公報[Patent Document 4] WO2003/013816
根據此等專利文獻之記載,可藉由第一次之雷射加熱與加熱後一刻之冷卻於脆性材料基板形成裂痕(劃線),進而進行第二次之雷射加熱使已形成之裂痕深入延伸。According to the description of these patent documents, it is possible to form a crack (scribe line) on the brittle material substrate by the first laser heating and cooling immediately after heating, and then perform the second laser heating to make the formed crack deep. extend.
此外,當藉由第二次之雷射加熱使裂痕延伸至深部時,裂痕是會到達背面而完全分割基板、或裂痕不會到達背面而在基板內停止,係取決於基板之板厚、加熱條件、冷卻條件,特別是基板之板厚與加熱條件之影響較大。In addition, when the crack is extended to the deep portion by the second laser heating, the crack will reach the back surface and completely divide the substrate, or the crack will not reach the back surface and stop in the substrate, depending on the thickness of the substrate and heating. Conditions, cooling conditions, especially the thickness of the substrate and heating conditions have a greater impact.
一般而言,板厚較厚之基板(厚度1mm以上),雖可藉由調整加熱條件等而較容易地使裂痕延伸至背面以完全分割基板,但隨著基板之板厚的變薄,藉由第二次之雷射加 熱使裂痕往深度方向延伸以進行分割的控制則變得困難。其理由在於,欲使形成於基板表面之裂痕往基板深度方向延伸,必須將用以引起裂痕延伸之於深度方向變化之應力梯度形成於基板內,但當基板之板厚較薄時,即難以形成為了形成上述應力梯度所需之深度方向的溫度差。亦即,當基板之板厚較薄時,雷射照射產生之溫熱、冷煤噴射產生之冷熱則直接自表面側傳遞至背面側,而難以產生溫度差。特別是當基板板厚薄至0.7mm以下時,該傾向即更強。In general, a substrate having a thick plate thickness (thickness: 1 mm or more) can be easily extended to the back surface to completely divide the substrate by adjusting heating conditions or the like, but as the thickness of the substrate is thinned, By the second laser plus It is difficult to control the heat to cause the crack to extend in the depth direction to perform the division. The reason is that, in order to extend the crack formed on the surface of the substrate in the depth direction of the substrate, a stress gradient for causing the crack to extend in the depth direction must be formed in the substrate, but when the thickness of the substrate is thin, it is difficult. A temperature difference in the depth direction required to form the above stress gradient is formed. That is, when the thickness of the substrate is thin, the heat generated by the warm and cold coal jet generated by the laser irradiation is directly transmitted from the surface side to the back side, and it is difficult to generate a temperature difference. This tendency is particularly strong when the thickness of the substrate plate is as thin as 0.7 mm or less.
因此,隨著基板板厚之變薄,由於單進行第二次之雷射照射不一定可使基板分割,因此須如專利文獻2所記載,將沿裂痕(劃線)施加彎曲力矩之裂斷步驟追加至次一步驟,以確實地進行分割。Therefore, as the thickness of the substrate is thinned, since the second laser irradiation alone does not necessarily divide the substrate, it is necessary to apply a bending moment along the crack (scribe line) as described in Patent Document 2. The step is added to the next step to perform the division.
又,雖於專利文獻1亦有記載,但當基板之板厚較薄時,有時會因加熱條件、冷卻條件之不同而在藉由第一次之雷射加熱與加熱後一刻之冷卻突然分割。此種分割,並非基板因深度方向之應力梯度被分割,而係藉由雷射光束在掃描方向(基板之面方向)之應力梯度亦即被雷射光束照射之位置附近產生的壓縮應力、以及被噴射冷煤之位置附近產生的拉伸應力之在面方向的應力梯度,所引起之往基板面方向進行的分割(為了與裂痕於深度方向延伸之情形作區別,因面方向之應力梯度造成之分割並不稱為「延伸」而稱為「進行」)。將此情形稱為橫裂。橫裂之分割與上述於深度方向之應力梯度之分割(稱為縱裂)在分割之構成上不同,分割面之直進性或品質較縱裂之分割差,因此必須 調整加熱條件等以避免橫裂之分割產生。亦即,即使基板之板厚較薄時,在藉由第一次之雷射加熱與加熱後一刻之冷卻一旦形成裂痕(劃線)後,即必須透過第二次之雷射加熱使裂痕往深度方向延伸來進行分割(縱裂)。Further, although it is described in Patent Document 1, when the thickness of the substrate is thin, the cooling may be suddenly caused by the first laser heating and heating due to the difference in heating conditions and cooling conditions. segmentation. This division is not caused by the stress gradient of the substrate due to the depth direction, but by the stress gradient of the laser beam in the scanning direction (the direction of the substrate), that is, the compressive stress generated near the position irradiated by the laser beam, and The stress gradient in the plane direction of the tensile stress generated near the position where the cold coal is sprayed is caused by the division into the direction of the substrate surface (in order to distinguish from the case where the crack extends in the depth direction, the stress gradient due to the plane direction is caused The division is not called "extension" and is called "going". This situation is called a transverse split. The division of the transverse split and the above-mentioned division of the stress gradient in the depth direction (referred to as longitudinal crack) differ in the composition of the split, and the straightness or quality of the split plane is worse than the split of the longitudinal split, so it is necessary to The heating conditions and the like are adjusted to avoid the division of the transverse crack. That is, even if the thickness of the substrate is thin, once the crack is formed by the first moment of laser heating and heating, the crack must be transmitted through the second laser heating. The depth direction is extended to perform division (longitudinal crack).
此時,雖找出在第一次之雷射加熱不產生橫裂之加熱條件較容易,但一般而言,即使以在第一次之雷射加熱所使用之不會產生橫裂之加熱條件,反覆第二次之雷射加熱,仍難以產生裂痕往深度方向之延伸,須將第二次之雷射加熱設定成與第一次之加熱條件不同之加熱條件(不同之熱能量分布等)。又,經實驗證實,當將第二次雷射照射之雷射點以與第一次雷射照射之雷射點相同形狀、相同熱能量分布予以執行時,由於僅會產生與第一次相同之應力分布,因此裂痕幾乎不會延伸。At this time, although it is easy to find the heating condition in which the first laser heating does not cause a transverse crack, in general, even in the case of the first laser heating, the heating condition which does not cause the transverse crack is generated. In addition to the second laser heating, it is still difficult to cause the crack to extend in the depth direction, and the second laser heating must be set to a heating condition different from the first heating condition (different thermal energy distribution, etc.) . Moreover, it has been experimentally confirmed that when the laser spot of the second laser irradiation is performed in the same shape and the same thermal energy distribution as the laser spot of the first laser irradiation, since only the first time is generated The stress distribution, so the cracks hardly extend.
如上述,隨著基板板厚之變薄,經由第一次雷射加熱、冷卻、第二次雷射加熱之步驟一旦形成裂痕(劃線)後,有難以使已形成之裂痕延伸而完全分割基板(縱裂)的傾向,其結果,則難以分割成具有高品質之分割面的複數個基板。As described above, as the thickness of the substrate is thinned, once the crack (dash) is formed by the first laser heating, cooling, and the second laser heating step, it is difficult to extend the formed crack and completely divide. The tendency of the substrate (longitudinal crack) is difficult to divide into a plurality of substrates having a high-quality split surface.
因此,係被期望有一種分割裝置及分割方法,可在即使基板板厚較薄時仍能確實在形成裂痕(劃線)後使裂痕深入延伸以進行分割(縱裂)。Therefore, it is desirable to have a dividing device and a dividing method, and it is possible to surely extend the crack to form a split (longitudinal crack) after forming a crack (scribe line) even when the thickness of the substrate is thin.
如上述專利文獻4,使第1雷射點與第2雷射點中之雷射點的形狀變化,將第2雷射點以接近冷卻點側之前端成為最大能量強度分布的方式照射,藉此使裂痕深入延伸 的方法中,第二次之加熱條件係與第一次之加熱條件為不同之加熱條件,此方式即使基板板厚較薄時仍有效,而能加以適用。In the above-described Patent Document 4, the shape of the laser beam in the first laser beam and the second laser beam is changed, and the second laser beam is irradiated so that the front end near the cooling point side has a maximum energy intensity distribution. This makes the crack deeper In the method, the second heating condition is a heating condition different from the first heating condition, and this method is effective even when the substrate thickness is thin, and can be applied.
然而,上述文獻中,係裝載有兩台雷射裝置,因此裝置較為大型。又,當使用兩台雷射裝置時,由於第一次之雷射照射與第二次之雷射照射係以不同之光學系統將雷射照射於基板,因此須調整各雷射裝置所形成之雷射點間的光學位置。又,上述文獻中,各雷射裝置,由於係於雷射光束之光路上安裝特殊之繞射格子透鏡以形成非對稱之熱能量強度分布,因此在採用一個雷射裝置之情況下欲變更所照射之熱能量分布來加以利用係相當困難的。However, in the above document, two laser devices are mounted, so the device is relatively large. Moreover, when two laser devices are used, since the first laser irradiation and the second laser irradiation irradiate the laser to the substrate with different optical systems, it is necessary to adjust the formation of each laser device. Optical position between laser points. Further, in the above document, each laser device is mounted on a light path of a laser beam to form a special diffraction grating lens to form an asymmetric thermal energy intensity distribution, so that a laser device is used in a case where a laser device is used. It is quite difficult to utilize the thermal energy distribution of the illumination.
因此,本發明之目的在於,提供能確實地實現為了實現縱裂之基板分割所需之第一次雷射加熱、冷卻、第二次雷射加熱之步驟之分割處理的分割裝置及分割方法。Accordingly, it is an object of the present invention to provide a dividing device and a dividing method capable of reliably realizing a division process of a first laser heating, cooling, and a second laser heating step required for realizing a substrate division of a longitudinal crack.
又,本發明之目的在於,提供將用以進行雷射照射之光學系統予以改良、以能在短時間簡單地進行第一次雷射加熱與第二次雷射加熱之切換或調整的分割裝置及分割方法。Further, an object of the present invention is to provide a dividing device which is improved in an optical system for performing laser irradiation so as to be able to easily switch or adjust the first laser heating and the second laser heating in a short time. And the segmentation method.
為解決上述課題,本發明之脆性材料基板之分割裝置,其具備:雷射照射手段,係將點形狀彼此不同之第1雷射點與第2雷射點選擇性地照射於載台上之脆性材料基板;冷卻手段,係在照射第1雷射點時形成冷卻第1雷射點附近之冷卻點;移動手段,係使第1雷射點、第2雷射點、冷卻點相對該基板移動;以及分割控制部,係進行控制, 對該基板一邊照射第1雷射點一邊使第1雷射點移動,藉此以較該基板之軟化點低的溫度進行加熱,並藉由使冷卻點追隨第1雷射點移動而進行冷卻,以於基板表面形成裂痕,進一步地沿該裂痕一邊照射第2雷射點一邊使第2雷射點移動,藉此以較基板之軟化點低的溫度再度加熱該基板,藉此使該裂痕延伸至該基板背面以分割該基板,其特徵在於:該雷射照射手段,係藉由用以調整自一個雷射光源射出之雷射光束之光路的光路調整機構,形成該第1雷射點或該第2雷射點;在該雷射照射手段形成第1雷射點時,係以垂直射入該基板之垂直射入光束為中心相對第1雷射點移動方向具有對稱之熱能量分布的光束形狀進行照射;在該雷射照射手段形成第2雷射點時,係以傾斜射入該基板之傾斜射入光束為中心具有第2雷射點移動方向之前方側較後方側大之熱能量分布的光束形狀進行照射。In order to solve the above problems, the apparatus for dividing a brittle material substrate according to the present invention includes: a laser irradiation means for selectively irradiating a first laser spot and a second laser spot having different dot shapes on a stage. a brittle material substrate; a cooling means for forming a cooling point near the first laser spot when the first laser spot is irradiated; and a moving means for causing the first laser spot, the second laser spot, and the cooling point to face the substrate Moving; and dividing the control unit to control The substrate is moved while the first laser beam is irradiated with the first laser beam, thereby heating at a temperature lower than the softening point of the substrate, and cooling is performed by moving the cooling point following the first laser spot. Forming a crack on the surface of the substrate, further moving the second laser spot along the crack while moving the second laser spot, thereby heating the substrate at a temperature lower than the softening point of the substrate, thereby causing the crack Extending the back surface of the substrate to divide the substrate, wherein the laser irradiation means forms the first laser spot by an optical path adjusting mechanism for adjusting an optical path of a laser beam emitted from a laser light source Or the second laser spot; when the laser irradiation means forms the first laser spot, the heat energy distribution having a symmetry with respect to the moving direction of the first laser spot is centered on the vertical incident beam that is perpendicularly incident on the substrate. When the laser beam is irradiated by the laser beam, the laser beam is incident on the substrate, and the oblique direction of the second laser spot is larger than the rear side. Thermal energy distribution Irradiated beam shape.
此處,雷射照射手段所照射之雷射點,只要使用習知在對脆性材料基板進行雷射劃線時所使用之雷射光源來形成即可,只要根據脆性材料基板之種類自準分子雷射、YAG雷射、二氧化碳雷射、或一氧化碳雷射等予以選擇即可。例如玻璃基板可使用二氧化碳雷射。Here, the laser spot to be irradiated by the laser irradiation means may be formed by using a laser light source which is conventionally used for laser scribing a brittle material substrate, as long as the self-excimer is based on the type of the brittle material substrate. Laser, YAG laser, carbon dioxide laser, or carbon monoxide laser can be selected. For example, a glass substrate can use a carbon dioxide laser.
又,冷卻手段只要是能形成局部冷卻第1雷射點附近之冷卻點即可,冷卻點之形成方法如何均可。例如,亦可設置自噴射嘴對基板面噴吹冷煤的冷煤噴射機構來形成冷卻點。此時,冷煤能使用水(水蒸氣)、壓縮空氣、He氣體、N2 氣體、CO2 氣體等。Further, the cooling means may be a cooling point capable of locally cooling the vicinity of the first laser spot, and a method of forming the cooling point may be used. For example, a cold coal injection mechanism that sprays cold coal from the surface of the substrate from the spray nozzle may be provided to form a cooling point. At this time, cold coal can use water (steam), compressed air, He gas, N 2 gas, CO 2 gas, or the like.
又,移動手段,亦可固定第1雷射點、第2雷射點、冷卻點之位置,並移動裝載脆性材料基板之載台,相反地,亦能移動第1雷射點、第2雷射點、冷卻點之位置,並固定裝載脆性材料基板之載台。Further, the moving means can fix the positions of the first laser spot, the second laser spot, and the cooling point, and move the stage on which the brittle material substrate is mounted. Conversely, the first laser spot and the second mine can be moved. The position of the shot point, the cooling point, and the stage on which the substrate of the brittle material is loaded.
根據本發明,係由分割控制部控制雷射照射手段、冷卻手段、移動手段,對脆性材料基板一邊照射第1雷射點一邊使第1雷射點移動,藉此以較基板之軟化點低的溫度進行加熱,並藉由使冷卻點追隨第1雷射點移動而進行冷卻,以於基板表面形成裂痕(劃線)。進一步地沿已形成之裂痕(劃線)一邊照射第2雷射點一邊使第2雷射點移動,藉此以較基板之軟化點低的溫度再度加熱該基板。在上述控制中,雷射照射手段,係藉由用以調整自一個雷射光源射出之雷射光束之光路的光路調整機構,形成第1雷射點與第2雷射點。雷射照射手段,在形成第1雷射點時,係以垂直射入基板之垂直射入光束為中心具有對稱之熱能量分布的光束形狀進行照射。其結果,即形成以垂直射入光束為中心呈對稱之光束形狀的第1雷射點。具體而言,係形成如橢圓形狀、長圓形狀、或圓形狀等之第1雷射點。在雷射照射手段形成第2雷射點時,係以傾斜射入基板之傾斜射入光束為中心具有第2雷射點移動方向之前方側較後方側大之熱能量分布的光束形狀進行照射。其結果,即形成以傾斜射入光束為中心呈非對稱的雷射點。具體而言,係形成具有例如前方側較後方側大之熱能量分布之蛋形狀的雷射點。According to the invention, the division control unit controls the laser irradiation means, the cooling means, and the moving means to move the first laser spot while irradiating the first laser spot on the brittle material substrate, thereby lowering the softening point of the substrate. The temperature is heated, and the cooling point is cooled by following the movement of the first laser spot to form a crack (scribe line) on the surface of the substrate. Further, the second laser beam is moved while irradiating the second laser spot along the formed crack (scribe line), whereby the substrate is heated again at a temperature lower than the softening point of the substrate. In the above control, the laser irradiation means forms the first laser spot and the second laser spot by the optical path adjusting means for adjusting the optical path of the laser beam emitted from one of the laser light sources. The laser irradiation means irradiates a beam shape having a symmetrical thermal energy distribution centering on a vertical incident beam perpendicularly incident on the substrate when the first laser beam is formed. As a result, a first laser spot having a beam shape that is symmetrical with respect to the vertical incident beam is formed. Specifically, the first laser spot such as an elliptical shape, an oblong shape, or a circular shape is formed. When the second laser beam is formed by the laser beam irradiation means, the beam shape of the heat energy distribution having the larger side of the second laser beam moving direction and the rear side of the second laser beam moving direction is irradiated with the obliquely incident light beam obliquely incident on the substrate. . As a result, a laser spot that is asymmetric with respect to the oblique incident beam is formed. Specifically, a laser spot having an egg shape having a large heat energy distribution on the front side and the rear side is formed, for example.
如上述,雷射照射手段,係藉由光路調整機構切換雷射光束對基板之射入方向,形成以垂直射入光束為中心之第1雷射點,且形成以傾斜射入光束為中心之第2雷射點。As described above, the laser irradiation means switches the direction in which the laser beam is incident on the substrate by the optical path adjusting means to form a first laser spot centered on the vertically incident beam, and is formed to be centered on the oblique incident beam. 2nd laser point.
根據本發明,由於能以一個雷射光源形成形狀彼此不同之第1雷射點與第2雷射點,因此能減少雷射光源之使用台數,而無須進行使用兩個雷射光源時所需之雷射光束間的位置調整。According to the present invention, since the first laser spot and the second laser spot having different shapes from each other can be formed by one laser light source, the number of use of the laser light source can be reduced without using two laser light sources. Position adjustment between the required laser beams.
又,執行基板之分割(縱裂)所需之第一次雷射加熱、冷卻、第二次雷射加熱之步驟中的分割處理時,即使選擇第一次雷射加熱不易產生橫裂的加熱條件(第1雷射點),在第二次雷射加熱時,亦能簡單地切換成與第1雷射點不同之第2雷射點的加熱條件來進行照射,而能使裂痕延伸至背面。Further, when the first laser heating, cooling, and the second laser heating step in the step of performing the division (longitudinal) of the substrate are performed, even if the first laser heating is selected, it is difficult to generate the transverse crack heating. The condition (the first laser spot) can be easily switched to the heating condition of the second laser spot different from the first laser spot during the second laser heating, and the crack can be extended to back.
上述發明中,光路調整機構,亦可於雷射光束之光路上設有旋轉鏡,且具備用以調整雷射光束射入旋轉鏡之射入位置的調整機構。In the above invention, the optical path adjusting means may be provided with a rotating mirror on the optical path of the laser beam, and an adjustment mechanism for adjusting the incident position of the laser beam incident on the rotating mirror.
此處,旋轉鏡只要係可藉由將雷射光束照射於旋轉之反射面來將雷射光束在一定角度範圍內進行掃描的構造即可。具體而言,雖一般使用多邊形鏡,但除此之外,亦可使用橢圓鏡(除了圓形鏡以外)、或將反射面作成特殊曲面以使照射面之熱能量分布變化的旋轉鏡。Here, the rotating mirror may have a configuration in which the laser beam is scanned over a range of angles by irradiating the laser beam to the rotating reflecting surface. Specifically, although a polygonal mirror is generally used, in addition to this, an elliptical mirror (other than a circular mirror) or a rotating mirror in which a reflecting surface is formed into a special curved surface to change the thermal energy distribution of the irradiated surface may be used.
根據本發明,雷射照射手段,係將自雷射光源射出之雷射光束射入高速旋轉中之旋轉鏡(例如多邊形鏡),藉此掃描雷射光束,藉由被掃描之雷射光束之光束形成雷射 點。接著,由於能藉由調整機構移動雷射光束射入旋轉鏡反射面之射入位置,以改變自雷射光束之旋轉鏡射出的射出角度,因此能簡單地形成以垂直射入光束為中心之第1雷射點,或以傾斜射入光束為中心之第2雷射點。According to the present invention, the laser irradiation means injects a laser beam emitted from a laser source into a rotating mirror (for example, a polygonal mirror) in a high-speed rotation, thereby scanning the laser beam by the scanned laser beam. Beam forming laser point. Then, since the incident position of the laser beam incident on the reflecting surface of the rotating mirror can be changed by the adjusting mechanism to change the angle of the exit from the rotating mirror of the laser beam, the vertical incident beam can be simply formed. The first laser spot, or the second laser spot centered on the obliquely incident beam.
上述發明中,光路調整機構,亦可於雷射光束之光路上配置反射鏡,且具備用以調整雷射光束射入反射鏡之射入角的調整機構。In the above invention, the optical path adjusting means may be provided with a mirror on the optical path of the laser beam and an adjustment mechanism for adjusting the incident angle of the laser beam incident on the mirror.
根據本發明,雷射照射手段,係將從雷射光源射出之雷射光束在反射鏡之反射面反射後照射於基板。雷射光束,藉由射入反射鏡之射入角會改變,而能改變自反射鏡射出之射出角度,因此僅藉由調整機構改變雷射光束對反射鏡之射入角度,即能形成以垂直射入光束為中心之第1雷射點,或形成以傾斜射入光束為中心之第2雷射點。According to the invention, the laser beam is irradiated onto the substrate by reflecting the laser beam emitted from the laser light source on the reflecting surface of the mirror. The laser beam is changed by the incident angle of the incident mirror, and the angle of the exit from the mirror can be changed. Therefore, only by adjusting the mechanism to change the angle of incidence of the laser beam to the mirror, the laser beam can be formed. The first laser beam is centered on the beam, or the second laser beam is centered on the obliquely incident beam.
上述發明中,於光路調整機構,亦可進一步包含配置於雷射光束光路上、用以調整光束形狀之調整鏡或調整透鏡。In the above invention, the optical path adjusting mechanism may further include an adjustment mirror or an adjustment lens disposed on the optical beam path for adjusting the beam shape.
此處之調整鏡、調整透鏡,能使用雷射光束在此等光學元件反射或透射時雷射光束之光束徑或光束點會改變的元件。具體而言,能使用平凸透鏡、凹面鏡、柱面透鏡等。Here, the adjusting mirror and the adjusting lens can use a laser beam to change the beam path or the beam spot of the laser beam when the optical element reflects or transmits. Specifically, a plano-convex lens, a concave mirror, a cylindrical lens, or the like can be used.
根據本發明,藉由調整調整鏡或調整透鏡在光路上之位置或角度,而亦能調整所形成之第1雷射點、第2雷射點的形狀。上述發明中,第2雷射點,亦可藉由調整鏡或調整透鏡調整成至少較第1雷射點大。According to the present invention, the shape of the first laser spot and the second laser spot formed can be adjusted by adjusting the adjustment mirror or adjusting the position or angle of the lens on the optical path. In the above invention, the second laser spot may be adjusted to be at least larger than the first laser spot by the adjustment mirror or the adjustment lens.
根據本發明,在第二次雷射照射時,藉由以較第1雷 射點大之點形狀的第2雷射點再度進行加熱,即能一邊以較第一次雷射照射之加熱區域大的面積使基板翹曲一邊使裂痕延伸,而促進裂痕之延伸According to the present invention, in the second laser irradiation, by the first The second laser spot having a large spot shape is heated again, that is, the substrate can be warped while the substrate is warped with a larger area than the heating region of the first laser irradiation, thereby promoting the extension of the crack.
上述發明中,分割控制部,亦可係使在基板上移動第1雷射點及冷卻點以形成裂痕時之移動方向、與在基板上移動第2雷射點以使裂痕延伸時之移動方向為相反,藉由往返移動分割該基板。In the above invention, the division control unit may move the first laser spot and the cooling point on the substrate to form a crack, and move the second laser spot on the substrate to extend the crack. Instead, the substrate is divided by a reciprocating movement.
根據本發明,由於能在往路形成裂痕、在返路使裂痕延伸而分割,因此能以良好效率進行作業。According to the present invention, since cracks can be formed in the forward path and the cracks can be extended and extended in the return path, the work can be performed with good efficiency.
又,根據另一觀點之本發明之脆性材料基板之分割方法,係沿設定於脆性材料基板之分割預定線一邊照射第1雷射點一邊使第1雷射點移動,藉此以較基板之軟化點低的溫度加熱該基板,其次藉由追隨第1雷射點之冷卻點冷卻該基板以於基板表面形成裂痕,進一步地沿該裂痕一邊照射第2雷射點一邊使第2雷射點移動,藉此以較基板之軟化點低的溫度進行該基板之再加熱,藉此使該裂痕延伸至該基板背面以分割,其特徵在於:藉由光路調整機構調整自一個雷射光源射出之雷射光束之光路,來形成該第1雷射點或該第2雷射點;該第1雷射點,係以垂直射入該基板之垂直射入光束為中心具有相對第1雷射點之移動方向前後大致對稱之熱能量分布的形狀進行照射;該第2雷射點,係以傾斜射入該基板之傾斜射入光束為中心具有第2雷射點移動方向之前方側較後方側大之熱能量分布的形狀進行照射。Further, according to another aspect of the present invention, in the method of dividing a brittle material substrate, the first laser beam is moved while being irradiated with the first laser beam set on a predetermined dividing line of the brittle material substrate, thereby The substrate is heated at a low softening point, and then the substrate is cooled by a cooling point following the first laser spot to form a crack on the surface of the substrate, and the second laser spot is further irradiated along the crack while the second laser beam is irradiated along the crack. Moving, thereby reheating the substrate at a temperature lower than a softening point of the substrate, thereby extending the crack to the back surface of the substrate for segmentation, wherein the light path adjusting mechanism adjusts emission from a laser light source An optical path of the laser beam to form the first laser spot or the second laser spot; the first laser spot has a relative first laser spot centering on a vertical incident beam that is incident perpendicularly to the substrate Irradiation of the shape of the heat energy distribution that is substantially symmetrical before and after the moving direction; the second laser spot has a second laser spot moving direction and a rear side of the second laser beam centered on the oblique incident beam that is obliquely incident on the substrate Big Shape of the thermal energy distribution is irradiated.
根據本發明,由於能以一個雷射光源形成第1雷射點與第2雷射點,因此能減少雷射光源之使用台數,而無須進行使用兩個雷射光源時所需之雷射光束間的位置調整。According to the present invention, since the first laser spot and the second laser spot can be formed by one laser light source, the number of used laser light sources can be reduced without performing the laser required for using two laser light sources. Position adjustment between beams.
又,執行基板之分割(縱裂)所需之第一次雷射加熱、冷卻、第二次雷射加熱之步驟中的分割處理時,即使選擇第一次雷射加熱不易產生橫裂的加熱條件(第1雷射點),在第二次加熱時,亦能簡單地切換成與第1雷射點不同之第2雷射點的加熱條件來進行照射,藉由改變雷射點之形狀使裂痕確實地延伸至背面。Further, when the first laser heating, cooling, and the second laser heating step in the step of performing the division (longitudinal) of the substrate are performed, even if the first laser heating is selected, it is difficult to generate the transverse crack heating. The condition (first laser spot) can be easily switched to the heating condition of the second laser spot different from the first laser spot during the second heating, by changing the shape of the laser spot. The crack is surely extended to the back.
以下,根據圖式說明本發明之實施形態。圖1係本發明一實施形態之雷射分割裝置LC1的概略構成圖。圖2係顯示圖1之雷射分割裝置LC1之控制系統構成的方塊圖。Hereinafter, embodiments of the present invention will be described based on the drawings. Fig. 1 is a schematic configuration diagram of a laser splitting device LC1 according to an embodiment of the present invention. Fig. 2 is a block diagram showing the configuration of a control system of the laser splitting device LC1 of Fig. 1.
首先,根據圖1說明雷射分割裝置LC1之整體構成。First, the overall configuration of the laser splitting device LC1 will be described with reference to Fig. 1 .
設置滑動台2,其可沿水平架台1上平行配置之一對導軌3, 4往返移動於圖1之紙面前後方向(以下稱為Y方向)。於兩導軌3, 4之間沿前後方向配置導螺桿5,於該導螺桿5螺合有固定於前述滑動台2的支架6,藉由馬達(圖式以外)將導螺桿5正反轉,滑動台2即可沿導軌3, 4往返移動於Y方向。A slide table 2 is provided which is movable in the direction in which the guide rails 3, 4 are alternately arranged in the front and rear directions of the paper of FIG. 1 (hereinafter referred to as the Y direction). A lead screw 5 is disposed between the two guide rails 3, 4 in the front-rear direction, and the lead screw 6 fixed to the slide table 2 is screwed to the lead screw 5, and the lead screw 5 is reversed by a motor (other than the drawing). The slide table 2 can be moved back and forth along the guide rails 3, 4 in the Y direction.
於滑動台2上,配置有可沿導軌8往返移動於圖1左右方向(以下稱為X方向)的水平台座7。在固定於台座7之支架10,貫通螺合有藉由馬達9旋轉的導螺桿10a,藉 由使導螺桿10a正反轉,以使台座7沿導軌8往返移動於X方向。On the slide table 2, a water platform seat 7 that can reciprocate along the guide rail 8 in the left-right direction of FIG. 1 (hereinafter referred to as the X direction) is disposed. In the bracket 10 fixed to the pedestal 7, the lead screw 10a rotated by the motor 9 is screwed through, The lead screw 7a is rotated in the X direction along the guide rail 8 by reversing the lead screw 10a.
於台座7上設有可藉由旋轉機構11旋轉的旋轉台12,於此旋轉台12以水平狀態安裝有切斷對象之脆性材料基板的玻璃基板G。旋轉機構11係能使旋轉台12繞垂直之軸旋轉,能相對基準位置旋轉成任意旋轉角度。又,分割對象物之玻璃基板G,例如藉由吸引夾具固定於旋轉台12。The turret 7 is provided with a rotary table 12 rotatable by a rotation mechanism 11, and the rotary table 12 is mounted with a glass substrate G on which a brittle material substrate to be cut is attached in a horizontal state. The rotating mechanism 11 can rotate the rotary table 12 about a vertical axis and can rotate at an arbitrary rotation angle with respect to a reference position. Moreover, the glass substrate G of the object to be divided is fixed to the turntable 12 by, for example, a suction jig.
於旋轉台12上方,雷射振盪器13與光路調整機構14被保持於安裝支架15。光路調整機構14,係由用以調整自雷射振盪器13射出之雷射光之光路的光路調整元件群14a(平凸透鏡31、反射鏡32、多邊形鏡39)、移動光路調整元件群14a位置的馬達群14b(馬達34~36)、以及連結光路調整元件群14a與馬達群14b的臂群14c(臂37~39)。平凸透鏡31(彎月形透鏡)透過臂37連接於升降馬達34,可調整上下方向之位置。又,反射鏡32透過臂38連接於升降馬達35,可調整上下方向之位置。又,多邊形鏡33透過臂39連接於升降馬達36,可調整上下方向之位置。Above the turntable 12, the laser oscillator 13 and the optical path adjusting mechanism 14 are held by the mounting bracket 15. The optical path adjusting mechanism 14 is provided by the optical path adjusting element group 14a (the plano-convex lens 31, the mirror 32, the polygon mirror 39) for adjusting the optical path of the laser beam emitted from the laser oscillator 13, and the position of the moving optical path adjusting element group 14a. The motor group 14b (motors 34 to 36) and the arm group 14c (arms 37 to 39) that connect the optical path adjusting element group 14a and the motor group 14b. The plano-convex lens 31 (the meniscus lens) is connected to the elevation motor 34 through the arm 37, and the position in the vertical direction can be adjusted. Further, the mirror 32 is connected to the elevation motor 35 via the arm 38, and the position in the vertical direction can be adjusted. Further, the polygon mirror 33 is connected to the elevation motor 36 via the arm 39, and the position in the vertical direction can be adjusted.
自雷射振盪器13射出之雷射光束,藉由通過此等光路調整元件群14a而形成具有所欲截面形狀的光束,以雷射點形態照射於基板G上。本實施形態中,係射出縮成較細之雷射光束,並藉由多邊形鏡33掃描,而將橢圓形狀之雷射點LS(圖2)形成於玻璃基板G上。接著,藉由調整光路調整元件群14a,切換在第一次雷射照射時所使用之第1雷射點、在第二次雷射照射時所使用之第2雷射點。此外, 藉由光路調整元件群14a之各元件之光路調整,留待後述。The laser beam emitted from the laser oscillator 13 is formed by the optical path adjusting element group 14a to form a light beam having a desired cross-sectional shape, and is irradiated onto the substrate G in the form of a laser spot. In the present embodiment, a laser beam that has been reduced in size is injected, and is scanned by the polygon mirror 33 to form an elliptical laser spot LS (Fig. 2) on the glass substrate G. Next, by adjusting the optical path adjusting element group 14a, the first laser spot used in the first laser irradiation and the second laser spot used in the second laser irradiation are switched. In addition, The optical path adjustment of each element of the optical path adjusting element group 14a is left to be described later.
於安裝支架15設有與光路調整機構14接近之冷卻嘴16。自此冷卻嘴16向玻璃基板G噴射冷卻水、He氣體、碳酸氣體等冷卻媒體。冷卻媒體,係被吹至照射在玻璃基板G之橢圓形狀雷射點LS附近,而於玻璃基板G表面形成冷卻點CS(圖2)。The mounting bracket 15 is provided with a cooling nozzle 16 that is adjacent to the optical path adjusting mechanism 14. From this, the cooling nozzle 16 sprays a cooling medium such as cooling water, He gas, or carbonic acid gas onto the glass substrate G. The cooling medium is blown to the vicinity of the elliptical shape laser spot LS of the glass substrate G, and a cooling point CS is formed on the surface of the glass substrate G (FIG. 2).
於安裝支架15,進一步透過上下移動調節機構17安裝有刀輪18。此刀輪18係以燒結鑽石或超硬合金為材料,於外周面具備以頂點為刀尖的V字形稜線部,藉由上下移動調節機構17微調對玻璃基板G之壓接力。刀輪18,係專用在將初始龜裂TR(圖2)形成於玻璃基板G端緣時,一邊使台座7移動於X方向一邊暫時地下降。The cutter wheel 18 is further attached to the mounting bracket 15 via the vertical movement adjustment mechanism 17. The cutter wheel 18 is made of a sintered diamond or a cemented carbide, and has a V-shaped ridge portion having a vertex as a blade edge on the outer peripheral surface, and the pressure contact force to the glass substrate G is finely adjusted by the vertical movement adjustment mechanism 17. The cutter wheel 18 is designed to temporarily lower the pedestal 7 while moving the pedestal 7 in the X direction when the initial crack TR (FIG. 2) is formed on the edge of the glass substrate G.
其次,根據圖2說明控制系統。雷射分割裝置LC1具備控制部50,該控制部50係藉由儲存於記憶體之控制參數及程式(軟體)與CPU,來執行各種處理。此控制部50係控制:用以驅動馬達(馬達9等)(用以進行滑動台2、台座7、旋轉台12之定位或移動)之台驅動部51、用以進行雷射照射之雷射驅動部52(包含驅動雷射振盪器13之雷射光源驅動部52a、驅動光路調整元件群14a用之馬達群14b的光路調整機構驅動部52b)、驅動用以控制冷卻嘴16之冷煤噴射之開關閥(未圖示)的嘴驅動部53、藉由刀輪18於玻璃基板G形成初始龜裂的刀驅動部54、以及藉由攝影機20, 21拍出刻印於基板G之定位用標記之攝影機驅動部55等各驅動部。又,控制部50,係連接有由鍵盤、滑鼠 等構成的輸入部56、以及用以於顯示畫面上進行各種顯示的顯示部57,以於畫面顯示所需資訊,且能輸入必要指令或設定。Next, the control system will be described based on Fig. 2 . The laser division device LC1 includes a control unit 50 that executes various processes by controlling parameters and programs (software) stored in the memory and the CPU. The control unit 50 controls a table driving unit 51 for driving a motor (motor 9 or the like) for positioning or moving the slide table 2, the pedestal 7, and the rotary table 12, and a laser for performing laser irradiation. The drive unit 52 includes a laser light source drive unit 52a that drives the laser oscillator 13, an optical path adjustment unit drive unit 52b that drives the motor group 14b for the optical path adjustment element group 14a, and a cold coal injection that controls the cooling nozzle 16. The nozzle drive unit 53 of the on-off valve (not shown), the blade drive unit 54 that forms the initial crack on the glass substrate G by the cutter wheel 18, and the positioning mark that is printed on the substrate G by the cameras 20 and 21 Each of the drive units such as the camera drive unit 55. Moreover, the control unit 50 is connected by a keyboard and a mouse. The input unit 56 and the display unit 57 for performing various displays on the display screen display desired information on the screen, and can input necessary instructions or settings.
又,控制部50具備統合性地驅動台驅動部51、雷射驅動部52(雷射光源驅動部52a,光路調整機構驅動部52b)、嘴驅動部53、刀驅動部54以進行玻璃基板G之分割的分割控制部58,藉由此分割控制部58執行第一次雷射照射、冷卻、第二次雷射照射之步驟的分割。Further, the control unit 50 includes an integrated drive table drive unit 51, a laser drive unit 52 (a laser light source drive unit 52a, an optical path adjustment unit drive unit 52b), a nozzle drive unit 53, and a blade drive unit 54 for performing a glass substrate G. The divided division control unit 58 performs the division of the first laser irradiation, the cooling, and the second laser irradiation by the division control unit 58.
具體而言,分割控制部58首先控制刀驅動部54與台驅動部51,在使刀輪18下降的狀態下移動基板G,藉此進行形成初始龜裂TR的處理。其次,控制台驅動部51、雷射驅動部52、嘴驅動部53,在照射雷射光束(第1雷射點)且噴射冷煤的狀態下移動基板G。藉此進行第一次雷射照射及冷卻而於基板形成裂痕的處理。其次,控制台驅動部51、雷射驅動部52,在照射雷射光束(第2雷射點)的狀態下移動基板G。藉此進行第二次雷射照射而使裂痕延伸的處理。Specifically, the division control unit 58 first controls the blade driving unit 54 and the table driving unit 51 to move the substrate G while the cutter wheel 18 is lowered, thereby performing the process of forming the initial crack TR. Next, the console drive unit 51, the laser drive unit 52, and the nozzle drive unit 53 move the substrate G while irradiating the laser beam (first laser spot) and injecting cold coal. Thereby, the first laser irradiation and cooling are performed to form a crack on the substrate. Next, the console drive unit 51 and the laser drive unit 52 move the substrate G in a state where the laser beam (second laser spot) is irradiated. Thereby, the second laser irradiation is performed to extend the crack.
其次,說明光路調整機構14(光路調整元件群14a,馬達群14b,臂群14c)之光路調整的動作。Next, an operation of adjusting the optical path of the optical path adjusting mechanism 14 (the optical path adjusting element group 14a, the motor group 14b, and the arm group 14c) will be described.
圖3係說明光路調整機構14之動作的圖,具體而言,係說明藉由反射鏡32之上下移動使照射於基板G之雷射點變化,以使光束照射區域之熱能量分布變化之動作的圖。3 is a view for explaining the operation of the optical path adjusting mechanism 14, and specifically, the action of changing the thermal energy distribution of the light beam irradiation region by changing the laser spot irradiated on the substrate G by the upper and lower movement of the mirror 32. Figure.
自雷射光源13射出之雷射光束LB0之行進方向朝向 垂直下方,雷射光束LB0係射入平凸透鏡31。通過平凸透鏡31之雷射光束LB1進一步地往垂直方向行進,射入反射鏡32。此時,係將反射鏡32之安裝角度調整成會以45度之射入角度射入反射鏡32的反射面且以45度之反射角度射出,在反射鏡32反射之雷射光束LB2往水平方向行進。The direction of travel of the laser beam LB0 emitted from the laser source 13 is oriented Vertically below, the laser beam LB0 is incident on the plano-convex lens 31. The laser beam LB1 passing through the plano-convex lens 31 further travels in the vertical direction and is incident on the mirror 32. At this time, the mounting angle of the mirror 32 is adjusted so as to be incident on the reflecting surface of the mirror 32 at an incident angle of 45 degrees and emitted at a reflection angle of 45 degrees, and the laser beam LB2 reflected by the mirror 32 is horizontal. Directions.
往水平方向行進之雷射光束LB2係射入多邊形鏡33。此時,藉由多邊形鏡33之高度位置與反射鏡32之高度位置的關係,使雷射光束LB2射入多邊形鏡33之射入位置變化,其結果能調整多邊形鏡33射入反射面之射入角度及自多邊形鏡33之射出角度。亦即,在固定了多邊形鏡33之高度位置的狀態下,驅動馬達35(圖1)使臂38升降以調整反射鏡32相對多邊形鏡33之高度,藉此調整射入多邊形鏡33之雷射光束LB2的射入位置,而調整自多邊形鏡33朝向基板G射出之雷射光束(光束)LB3的角度。The laser beam LB2 traveling in the horizontal direction is incident on the polygon mirror 33. At this time, by the relationship between the height position of the polygon mirror 33 and the height position of the mirror 32, the incident position of the laser beam LB2 incident on the polygon mirror 33 is changed, and as a result, the polygon mirror 33 can be adjusted to be incident on the reflecting surface. The angle of entry and the angle of incidence from the polygon mirror 33. That is, in a state where the height position of the polygon mirror 33 is fixed, the drive motor 35 (Fig. 1) raises and lowers the arm 38 to adjust the height of the mirror 32 with respect to the polygon mirror 33, thereby adjusting the laser incident on the polygon mirror 33. The incident position of the light beam LB2 is adjusted to the angle of the laser beam (beam) LB3 emitted from the polygon mirror 33 toward the substrate G.
具體而言,在形成第1雷射點時,係使自反射鏡32朝向多邊形鏡33之雷射光束LB2以45度射入多邊形鏡33之一個反射面的中央位置(圖中一點鏈線所示),且自反射面以45度之反射角度射出。其結果,即往垂直下方行進,形成向玻璃基板G垂直射入之雷射光束LB3a。Specifically, when the first laser beam is formed, the laser beam LB2 directed from the mirror 32 toward the polygon mirror 33 is incident at a central position of one of the reflection surfaces of the polygon mirror 33 at 45 degrees (a little chain line in the figure) Shown), and the reflection surface is emitted at a reflection angle of 45 degrees. As a result, the laser beam LB3a incident perpendicularly to the glass substrate G is formed as it travels vertically downward.
藉由使多邊形鏡33之反射面高速旋轉,自多邊形鏡33射出之雷射光束LB3以雷射光束LB3a為中心進行掃描,如圖4所示形成熱能量分布E於光束之掃描方向前後大致對稱的第1雷射點LS1。By rotating the reflecting surface of the polygon mirror 33 at a high speed, the laser beam LB3 emitted from the polygon mirror 33 is scanned centering on the laser beam LB3a, and as shown in FIG. 4, the heat energy distribution E is formed substantially symmetrically before and after the scanning direction of the beam. The first laser point LS1.
在形成第2雷射點時,係使自反射鏡32朝向多邊形鏡33之雷射光束LB2以較形成第1雷射點時更深之射入角(例如60度)射入多邊形鏡33之一個反射面的中央位置(圖中虛線所示),且自多邊形鏡33之反射面以較深反射角度射出。其結果,即形成向基板G沿傾斜方向行進之雷射光束LB3b。When the second laser beam is formed, the laser beam LB2 directed from the mirror 32 toward the polygon mirror 33 is incident on one of the polygon mirrors 33 at a deeper incident angle (for example, 60 degrees) than when the first laser beam is formed. The center position of the reflecting surface (shown by a broken line in the figure), and the reflecting surface of the polygon mirror 33 is emitted at a deep reflection angle. As a result, the laser beam LB3b traveling in the oblique direction toward the substrate G is formed.
藉由使多邊形鏡33之反射面高速旋轉,自多邊形鏡33射出之雷射光束LB3以雷射光束LB3b為中心進行掃描,如圖4所示形成熱能量分布E於掃描方向前後非對稱的第2雷射點LS2。By rotating the reflecting surface of the polygon mirror 33 at a high speed, the laser beam LB3 emitted from the polygon mirror 33 is scanned centering on the laser beam LB3b, and as shown in FIG. 4, the thermal energy distribution E is asymmetrical before and after the scanning direction. 2 laser point LS2.
圖5係綜合性地說明光路調整機構14之調整動作的圖。圖3雖已說明用以調整雷射點之熱能量分布的實施例,不過如圖5(a)之箭頭所示,由於能分別獨立地升降平凸透鏡31、反射鏡32、多邊形鏡33,因此藉由使此等之位置關係變化,即除了熱能量分布以外亦可調整雷射點形狀(長度或寬度)。此處就主要之調整彙整說明。FIG. 5 is a view for explaining the adjustment operation of the optical path adjusting mechanism 14 in a comprehensive manner. 3 shows an embodiment for adjusting the thermal energy distribution of the laser spot, but as shown by the arrow in FIG. 5(a), since the plano-convex lens 31, the mirror 32, and the polygon mirror 33 can be lifted and lowered independently, The shape (length or width) of the laser spot can be adjusted by changing the positional relationship, that is, in addition to the thermal energy distribution. Here is the main adjustment of the reconciliation instructions.
圖5(b)係使雷射點成為非對稱之熱能量分布時的調整。如先前已說明(圖3),可藉由固定多邊形鏡33並使反射鏡32下降(往實線箭頭方向移動)來形成非對稱的熱能量分布。另一方面,藉由固定反射鏡32並使多邊形鏡33上升(往虛線箭頭方向移動),亦可形成相同之非對稱的熱能量分布。Fig. 5(b) is an adjustment when the laser spot is made to have an asymmetric thermal energy distribution. As previously explained (Fig. 3), an asymmetrical thermal energy distribution can be formed by fixing the polygonal mirror 33 and lowering the mirror 32 (moving in the direction of the solid arrow). On the other hand, by fixing the mirror 32 and raising the polygon mirror 33 (moving in the direction of the dotted arrow), the same asymmetric heat energy distribution can be formed.
圖5(c)係使雷射點之熱能量分布成為與圖5(b)呈相反方向之非對稱時的調整。藉由固定多邊形鏡33並使反射 鏡32上升(往實線箭頭方向移動)或藉由固定反射鏡32並使多邊形鏡33下降(往虛線箭頭方向移動),即可形成非對稱的熱能量分布。Fig. 5(c) is an adjustment when the thermal energy distribution of the laser spot is asymmetrical in the opposite direction to Fig. 5(b). By fixing the polygon mirror 33 and making the reflection The mirror 32 is raised (moving in the direction of the solid arrow) or by fixing the mirror 32 and lowering the polygon mirror 33 (moving in the direction of the dotted arrow) to form an asymmetric thermal energy distribution.
圖5(d)係使雷射點之光束形狀縮小時的調整。藉由同時使反射鏡32與多邊形鏡33同時下降使基板G上之雷射點縮小,即能使雷射點之光束長度縮小。此外,雖省略圖示,但由於可藉由同時使反射鏡32與多邊形鏡33同時上升使雷射點擴大,因此能使雷射點之光束長度擴大。Fig. 5(d) is an adjustment when the beam shape of the laser spot is reduced. By simultaneously lowering the mirror 32 and the polygon mirror 33 to reduce the laser spot on the substrate G, the beam length of the laser spot can be reduced. Further, although not shown in the drawings, since the laser beam 32 can be simultaneously enlarged by the simultaneous increase of the mirror 32 and the polygon mirror 33, the beam length of the laser beam can be enlarged.
利用此調整,即能以較第一次雷射照射之加熱區域大之徑進行第二次雷射照射。此時由於能以較大徑使基板翹曲,因此能促進裂痕之延伸。With this adjustment, a second laser irradiation can be performed with a larger diameter than the heating area of the first laser irradiation. At this time, since the substrate can be warped with a large diameter, the extension of the crack can be promoted.
圖5(e)係使雷射點之光束形狀擴大時的調整。藉由使平凸透鏡31下降使雷射點擴大,即能使光束長度擴大。此外,雖省略圖示,但由於可藉由使平凸透鏡31上升使雷射點縮小,因此能以與圖5(d)不同之方法使光束長度縮小。Fig. 5(e) is an adjustment when the beam shape of the laser spot is enlarged. By lowering the plano-convex lens 31 to enlarge the laser spot, the beam length can be enlarged. Further, although not shown in the drawings, since the projection point can be reduced by raising the plano-convex lens 31, the beam length can be reduced by a method different from that of FIG. 5(d).
如上述,藉由使光路調整機構14之各元件個別地升降或複數地升降,即能調整雷射點之形狀或熱能量分布。As described above, the shape of the laser spot or the heat energy distribution can be adjusted by individually raising or lowering the respective elements of the optical path adjusting mechanism 14 up and down.
此外,本實施形態中,雖係藉由多邊形鏡33掃描雷射光束來形成雷射點,但亦可取代多邊形鏡而使用橢圓鏡、或其他旋轉鏡進行掃描,藉此亦能形成形狀彼此不同之第1雷射點、第2雷射點。Further, in the present embodiment, the laser beam is scanned by the polygon mirror 33 to form a laser beam. However, instead of the polygon mirror, an elliptical mirror or another rotating mirror may be used for scanning, whereby the shapes may be different from each other. The first laser point and the second laser point.
又,藉由分割控制部58控制雷射控制部52之光路調整機構驅動部52b,將反射鏡32之位置調整成在執行第一 次雷射照射時會形成第1雷射點LS1,且將反射鏡32之位置調整成在執行第二次雷射照射時會形成第2雷射點LS2。Further, the division control unit 58 controls the optical path adjustment mechanism drive unit 52b of the laser control unit 52 to adjust the position of the mirror 32 to perform the first operation. The first laser spot LS1 is formed during the sub-laser irradiation, and the position of the mirror 32 is adjusted so that the second laser spot LS2 is formed when the second laser irradiation is performed.
又,分割控制部58在執行第一次雷射照射、冷卻、第二次雷射照射之步驟的分割動作時,雖係控制台驅動部51使基板G移動,但亦能藉由使第一次雷射照射時之移動方向、第二次雷射照射時之移動方向為相反以藉由往返動作結束分割,而減少移動之損耗時間。Further, when the division control unit 58 performs the division operation of the first laser irradiation, the cooling, and the second laser irradiation, the console driving unit 51 moves the substrate G, but can also make the first The moving direction of the secondary laser irradiation and the moving direction of the second laser irradiation are opposite to end the division by the reciprocating action, thereby reducing the loss time of the movement.
圖6係本發明另一實施形態之雷射分割裝置LC2之光路調整機構的概略構成圖,圖6(a)係形成第1雷射點時的狀態、圖6(b)係形成第2雷射點時的狀態。雷射分割裝置LC2,並不使用旋轉鏡(多邊形鏡等),而藉由組合有光學透鏡或光學鏡之光學系統來形成第1雷射點、第2雷射點。Fig. 6 is a schematic configuration diagram of an optical path adjusting mechanism of the laser splitting device LC2 according to another embodiment of the present invention, wherein Fig. 6(a) shows a state in which a first laser spot is formed, and Fig. 6(b) shows a second mine. The state when shooting. The laser division device LC2 forms a first laser spot and a second laser spot by using an optical system in which an optical lens or an optical mirror is combined without using a rotating mirror (a polygonal mirror or the like).
此外,本實施形態之雷射分割裝置LC2與實施形態1所說明之雷射分割裝置LC1,除了光路調整機構14(14a~14c)以外的構成基本上均相同,因此省略光路調整機構以外部分的說明。Further, since the laser splitting device LC2 of the present embodiment and the laser splitting device LC1 described in the first embodiment are basically the same except for the optical path adjusting mechanisms 14 (14a to 14c), the portions other than the optical path adjusting mechanism are omitted. Description.
光路調整機構61,係由固定側之第1反射鏡62、可動側之第2反射鏡63、平凸透鏡64、柱面透鏡65構成。此等光學元件群中之第2反射鏡63、平凸透鏡64、柱面透鏡65,係作為可動光學體66而保持成一體,且於馬達(未圖示)連接成能以第2反射鏡63之反射面附近為支點P傾斜移動。The optical path adjusting mechanism 61 is composed of a first mirror 62 on the fixed side, a second mirror 63 on the movable side, a plano-convex lens 64, and a cylindrical lens 65. Among the optical element groups, the second mirror 63, the plano-convex lens 64, and the cylindrical lens 65 are integrally held as the movable optical body 66, and are connected to the motor (not shown) so that the second mirror 63 can be connected. The fulcrum P moves obliquely near the reflecting surface.
雷射振盪器13,係調整由小徑光束構成之雷射光束LB0使其往垂直下方射出,雷射光束LB0係射入第1反射鏡62。第1反射鏡62,其安裝角度被調整成雷射光束LB0會以45度之射入角度射入反射面且以45度之反射角度射出,自第1反射鏡62射出之雷射光束LB1係往水平方向行進。The laser oscillator 13 adjusts the laser beam LB0 composed of a small-diameter beam to be emitted vertically downward, and the laser beam LB0 is incident on the first mirror 62. The first mirror 62 is adjusted in such a manner that the laser beam LB0 is incident on the reflecting surface at an incident angle of 45 degrees and is emitted at a reflection angle of 45 degrees, and the laser beam LB1 emitted from the first mirror 62 is attached. Travel in the horizontal direction.
往水平方向行進之雷射光束LB1係射入第2反射鏡63。此時,隨著雷射光束LB1射入第2反射鏡63之反射面之入射角度的不同,自第2反射鏡63之反射面的射出角度隨之變化。The laser beam LB1 traveling in the horizontal direction is incident on the second mirror 63. At this time, as the incident angle of the laser beam LB1 entering the reflecting surface of the second reflecting mirror 63 is different, the angle of incidence from the reflecting surface of the second reflecting mirror 63 changes.
在形成第1雷射點時,係調整成使雷射光束LB1以45度之射入角度射入第2反射鏡63之反射面,且相對反射面以45度之反射角度射出。如圖6(a)所示,雷射光束LB2即往垂直下方行進。雷射光束LB2,係藉由平凸透鏡64被縮小光束徑,且藉由柱面透鏡65沿一軸方向擴大,形成截面為橢圓形狀的光束。接著,雷射光束LB2之光束中通過平凸透鏡64、柱面透鏡65之透鏡光軸的雷射光束(中心光束)係直進,而形成垂直射入玻璃基板G之雷射光束LB3a。又,雷射光束LB2中之其他雷射光束(中心光束以外),成為繞雷射光束LB3a擴大之橢圓形狀的雷射光束LB3,而將橢圓形狀之第1雷射點LS1形成於基板G上。此時,第1雷射點LS1具有於長軸方向為對稱之熱能量分布。When the first laser beam is formed, the laser beam LB1 is incident on the reflection surface of the second mirror 63 at an incident angle of 45 degrees, and is emitted at a reflection angle of 45 degrees with respect to the reflection surface. As shown in Fig. 6(a), the laser beam LB2 travels vertically downward. The laser beam LB2 is reduced in beam diameter by the plano-convex lens 64, and is enlarged in the axial direction by the cylindrical lens 65 to form a light beam having an elliptical cross section. Next, the laser beam of the laser beam LB2 is straightly passed through the plano-convex lens 64 and the laser beam (center beam) of the lens optical axis of the cylindrical lens 65 to form a laser beam LB3a which is incident perpendicularly on the glass substrate G. Further, the other laser beam (other than the center beam) in the laser beam LB2 becomes an elliptical laser beam LB3 which is enlarged around the laser beam LB3a, and the elliptical first laser spot LS1 is formed on the substrate G. . At this time, the first laser spot LS1 has a heat energy distribution that is symmetrical in the long axis direction.
又,在形成第2雷射點時,係藉由調整成使雷射光束LB1以較45度深之射入角度(例如60度)射入第2反射鏡63 之反射面,以較在形成第1雷射點時深之反射角度相對反射面射出,而如圖6(b)所示,形成相對基板G以傾斜方向行進的雷射光束LB2。Further, when the second laser beam is formed, the laser beam LB1 is incident on the second mirror 63 by an incident angle (for example, 60 degrees) at a depth of 45 degrees. The reflecting surface is emitted toward the reflecting surface at a deeper reflection angle than when the first laser beam is formed, and as shown in FIG. 6(b), a laser beam LB2 that travels in the oblique direction with respect to the substrate G is formed.
雷射光束LB2,係藉由平凸透鏡64被縮小光束徑,且藉由柱面透鏡65沿一軸方向擴大,形成截面為橢圓形狀的光束。接著,雷射光束LB2之光束中通過平凸透鏡64、柱面透鏡65之透鏡光軸的雷射光束(中心光束)係直進,而形成傾斜射入玻璃基板G之雷射光束LB3b。又,雷射光束LB2中之其他雷射光束(中心光束以外),成為繞雷射光束LB3b擴大之橢圓形狀的雷射光束LB3,此光束傾斜射入基板G的結果,即形成熱能量分布為橢圓形狀之於長軸方向為非對稱的第2雷射點LS2。The laser beam LB2 is reduced in beam diameter by the plano-convex lens 64, and is enlarged in the axial direction by the cylindrical lens 65 to form a light beam having an elliptical cross section. Next, the laser beam of the laser beam LB2 is straightly passed through the plano-convex lens 64 and the laser beam (center beam) of the lens optical axis of the cylindrical lens 65, thereby forming a laser beam LB3b obliquely incident on the glass substrate G. Further, the other laser beam (other than the center beam) in the laser beam LB2 becomes an elliptical laser beam LB3 which is enlarged around the laser beam LB3b, and the beam is obliquely incident on the substrate G, thereby forming a thermal energy distribution. The elliptical shape is the second laser point LS2 which is asymmetric in the long axis direction.
接著,藉由分割控制部58,在執行第一次雷射照射時調整可動光學體66之位置以形成第1雷射點LS1,在執行第二次雷射照射時調整可動光學體66之位置以形成第2雷射點LS2。Next, the division control unit 58 adjusts the position of the movable optical body 66 to form the first laser spot LS1 when the first laser irradiation is performed, and adjusts the position of the movable optical body 66 when the second laser irradiation is performed. To form the second laser spot LS2.
圖7係本發明另一實施形態之雷射分割裝置LC3之光路調整機構的概略構成圖,圖7(a)係形成第1雷射點時的狀態、圖7(b)係形成第2雷射點時的狀態。雷射分割裝置LC3,係藉由使用複數個光學鏡之光學系統形成第1雷射點、第2雷射點。Fig. 7 is a schematic configuration diagram of an optical path adjusting mechanism of the laser beam splitting device LC3 according to another embodiment of the present invention, wherein Fig. 7(a) shows a state in which a first laser spot is formed, and Fig. 7(b) shows a second mine. The state when shooting. The laser division device LC3 forms a first laser spot and a second laser spot by using an optical system of a plurality of optical mirrors.
此外,本實施形態之雷射分割裝置LC3與實施形態1所說明之雷射分割裝置LC1中光路調整機構14(14a~14c) 以外的構成部分,基本上均係相同構成,因此省略光路調整機構以外部分的說明。Further, the laser splitting device LC3 of the present embodiment and the optical path adjusting mechanism 14 (14a to 14c) of the laser splitting device LC1 described in the first embodiment The components other than the components are basically the same, and therefore the description of the portions other than the optical path adjusting mechanism will be omitted.
光路調整機構71,係由第1反射鏡72、凹面鏡73、柱面鏡74、第2反射鏡75之光學元件群構成。其中,最終段之第2反射鏡75係於馬達(未圖示)連接成能以反射面附近為支點P傾斜移動。The optical path adjusting mechanism 71 is composed of an optical element group of the first reflecting mirror 72, the concave mirror 73, the cylindrical mirror 74, and the second reflecting mirror 75. The second mirror 75 of the final stage is connected to a motor (not shown) so as to be tiltably movable with the vicinity of the reflecting surface as a fulcrum P.
雷射振盪器13,係調整由小徑光束構成之雷射光束LB0使其往垂直下方射出,雷射光束LB0係射入第1反射鏡72。第1反射鏡72,其安裝角度被調整成雷射光束LB0會以45度之射入角度射入反射面且以45度之反射角度射出,射出第1反射鏡72之雷射光束LB1係往水平方向行進。The laser oscillator 13 adjusts the laser beam LB0 composed of a small-diameter beam to be emitted vertically downward, and the laser beam LB0 is incident on the first mirror 72. The mounting angle of the first reflecting mirror 72 is adjusted so that the laser beam LB0 is incident on the reflecting surface at an incident angle of 45 degrees and is emitted at a reflection angle of 45 degrees, and the laser beam LB1 exiting the first reflecting mirror 72 is directed to Travel in the horizontal direction.
往水平方向行進之雷射光束LB1係射入凹面鏡73,在此處反射之雷射光束LB2,係一邊被縮小光束徑一邊射入柱面鏡74。在柱面鏡74反射之雷射光束LB3,係沿一軸方向擴大成為截面為橢圓形狀的光束LB3,並射入第2反射鏡75之反射面。第2反射鏡75,係藉由調整反射面之角度而使射出角度變化。The laser beam LB1 traveling in the horizontal direction is incident on the concave mirror 73, and the laser beam LB2 reflected there is incident on the cylindrical mirror 74 while being reduced in the beam diameter. The laser beam LB3 reflected by the cylindrical mirror 74 is expanded into a beam LB3 having an elliptical cross section in one axial direction, and is incident on the reflection surface of the second mirror 75. The second mirror 75 changes the angle of incidence by adjusting the angle of the reflecting surface.
在形成第1雷射點時,係將第2反射鏡75之角度調整成,自柱面鏡74射出之雷射光束LB3之光束中為中心之中心光束LB3a,會如圖7(a)所示,成為朝向垂直下方之雷射光束LB4a行進。雷射光束LB3中除了中心光束LB3a以外之光束,會成為繞雷射光束LB3a擴大的雷射光束LB3在第2反射鏡75反射,而將橢圓形狀之第1雷射點LS1形成於基板G上。此時,第1雷射點LS1具有於長軸方向 為對稱之熱能量分布。When the first laser spot is formed, the angle of the second mirror 75 is adjusted so that the center beam LB3a centered on the beam of the laser beam LB3 emitted from the cylindrical mirror 74 is as shown in Fig. 7(a). It is shown that the laser beam LB4a is directed vertically downward. The laser beam other than the center beam LB3a of the laser beam LB3 is reflected by the second mirror 75 as the laser beam LB3 enlarged around the laser beam LB3a, and the first laser spot LS1 of the elliptical shape is formed on the substrate G. . At this time, the first laser point LS1 has a long axis direction Is the symmetrical thermal energy distribution.
又,在形成第2雷射點時,自柱面鏡74射出之雷射光束LB3之光束中為中心之中心光束LB3b,係將雷射光束LB3b對第2反射鏡75之反射面的射入角度,調整成較在形成第1雷射點時更淺。藉此,自第2反射鏡75之反射面以較淺反射角度射出,而如圖7(b)所示,形成相對基板G以傾斜方向行進的雷射光束LB4b。雷射光束LB3中除了中心光束LB3b以外之光束,會成為繞雷射光束LB3b擴大的雷射光束LB3在第2反射鏡75反射,此光束成為繞雷射光束LB4b擴大的雷射光束LB4而傾斜射入基板G的結果,即形成熱能量分布為橢圓形狀之於長軸方向為非對稱的第2雷射點LS2。Further, when the second laser beam is formed, the central beam LB3b is the center of the beam of the laser beam LB3 emitted from the cylindrical mirror 74, and the laser beam LB3b is incident on the reflection surface of the second mirror 75. The angle is adjusted to be shallower than when the first laser spot is formed. Thereby, the reflecting surface of the second reflecting mirror 75 is emitted at a shallow reflection angle, and as shown in FIG. 7(b), the laser beam LB4b that travels in the oblique direction with respect to the substrate G is formed. The beam other than the center beam LB3b of the laser beam LB3 becomes a laser beam LB3 which is enlarged around the laser beam LB3b and is reflected by the second mirror 75, and this beam is tilted by the laser beam LB4 which is enlarged around the laser beam LB4b. As a result of the incident on the substrate G, the second laser spot LS2 whose thermal energy distribution is an elliptical shape and whose axis in the long axis direction is asymmetrical is formed.
接著,藉由分割控制部58,在執行第一次雷射照射時調整第2反射鏡75之角度以形成第1雷射點LS1,在執行第二次雷射照射時調整第2反射鏡75之角度以形成第2雷射點LS2。Next, the division control unit 58 adjusts the angle of the second mirror 75 to form the first laser point LS1 when the first laser irradiation is performed, and adjusts the second mirror 75 when the second laser irradiation is performed. The angle is formed to form the second laser spot LS2.
圖8係本發明另一實施形態之雷射分割裝置LC4之光路調整機構的概略構成圖,圖8(a)係形成第1雷射點時的狀態、圖8(b)係形成第2雷射點時的狀態。雷射分割裝置LC4,僅係將實施形態3所說明之分割裝置LC3之光路調整機構71(圖7)中之柱面鏡74與第2反射鏡75的配置作替換,其他構造均相同。Fig. 8 is a schematic configuration diagram of an optical path adjusting mechanism of the laser beam splitting device LC4 according to another embodiment of the present invention, wherein Fig. 8(a) shows a state in which a first laser spot is formed, and Fig. 8(b) shows a second mine. The state when shooting. The laser division device LC4 replaces the arrangement of the cylindrical mirror 74 and the second mirror 75 in the optical path adjustment mechanism 71 (FIG. 7) of the division device LC3 described in the third embodiment, and the other configurations are the same.
亦即,光路調整機構81,係由第1反射鏡82、凹面鏡 83、第2反射鏡84、柱面鏡85之光學元件群構成。其中,第2反射鏡84係於馬達(未圖示)連接成能以反射面附近為支點P傾斜移動。That is, the optical path adjusting mechanism 81 is composed of the first reflecting mirror 82 and the concave mirror. 83. The optical element group of the second mirror 84 and the cylindrical mirror 85 is configured. The second mirror 84 is connected to a motor (not shown) so as to be tiltably movable with the vicinity of the reflecting surface as a fulcrum P.
雷射振盪器13,係調整由小徑光束構成之雷射光束LB0使其往垂直下方射出,雷射光束LB0係射入第1反射鏡82。第1反射鏡82,其安裝角度被調整成雷射光束LB0會以45度之射入角度射入且以45度之反射角度射出,射出之雷射光束LB1係往水平方向行進。The laser oscillator 13 adjusts the laser beam LB0 composed of a small-diameter beam to be emitted vertically downward, and the laser beam LB0 is incident on the first mirror 82. The first mirror 82 is adjusted in such a manner that the laser beam LB0 is incident at an incident angle of 45 degrees and is emitted at a reflection angle of 45 degrees, and the emitted laser beam LB1 travels in the horizontal direction.
往水平方向行進之雷射光束LB1係射入凹面鏡83,在凹面鏡83反射之雷射光束LB2,係一邊被縮小光束徑一邊射入第2反射鏡84。第2反射鏡84,能藉由調整反射面之角度而使射出角度變化。The laser beam LB1 traveling in the horizontal direction is incident on the concave mirror 83, and the laser beam LB2 reflected by the concave mirror 83 is incident on the second mirror 84 while being reduced in the beam diameter. The second mirror 84 can change the angle of incidence by adjusting the angle of the reflecting surface.
在形成第1雷射點時,係將第2反射鏡84之角度調整成,自第2反射鏡84射出之雷射光束LB3之光束中為中心之中心光束LB3a,會如圖8(a)所示,反射至柱面鏡85之反射面,且自此反射面射出之中心光束LB4a朝向垂直下方行進。雷射光束LB3中除了中心光束LB3a以外之光束,會成為繞雷射光束LB3a擴大的雷射光束LB3在柱面鏡85反射,而形成於一軸方向擴大且截面為橢圓形狀的雷射光束LB4,於基板G上形成橢圓形狀之第1雷射點LS1。此時,第1雷射點LS1具有於長軸方向為對稱之熱能量分布。When the first laser beam is formed, the angle of the second mirror 84 is adjusted so that the center beam LB3a centered on the beam of the laser beam LB3 emitted from the second mirror 84 is as shown in Fig. 8(a). As shown, the reflection surface of the cylindrical mirror 85 is reflected, and the center beam LB4a emitted from the reflection surface travels vertically downward. The laser beam other than the center beam LB3a of the laser beam LB3 becomes a laser beam LB3 which is enlarged by the laser beam LB3a and is reflected by the cylindrical mirror 85, and is formed in a laser beam LB4 whose axial direction is enlarged and whose cross section is elliptical. An elliptical first laser spot LS1 is formed on the substrate G. At this time, the first laser spot LS1 has a heat energy distribution that is symmetrical in the long axis direction.
又,在形成第2雷射點時,係將第2反射鏡84之角度調整成,自第2反射鏡84射出之雷射光束LB3之光束中 之中心光束LB3b,會如圖8(b)所示,反射至柱面鏡85之反射面,且自反射面射出之中心光束LB4b會對基板G朝向傾斜方向行進。雷射光束LB3中除了中心光束LB3b以外之光束,會成為繞雷射光束LB3b擴大的雷射光束LB3在柱面鏡85反射,而形成於一軸方向擴大且截面為橢圓形狀的雷射光束LB4。此光束傾斜射入基板G的結果,即形成熱能量分布於長軸方向為非對稱的第2雷射點LS2。Further, when the second laser beam is formed, the angle of the second reflecting mirror 84 is adjusted to be in the light beam of the laser beam LB3 emitted from the second reflecting mirror 84. The center beam LB3b is reflected to the reflection surface of the cylindrical mirror 85 as shown in Fig. 8(b), and the center beam LB4b emitted from the reflection surface travels toward the substrate G in the oblique direction. The light beam other than the center beam LB3b of the laser beam LB3 is reflected by the cylindrical mirror 85 as a laser beam LB3 which is enlarged around the laser beam LB3b, and is formed in a laser beam LB4 which is enlarged in one axial direction and has an elliptical cross section. As a result of the oblique incidence of the light beam on the substrate G, the second laser spot LS2 whose thermal energy distribution is asymmetric in the long axis direction is formed.
接著,藉由分割控制部58,在執行第一次雷射照射時調整第2反射鏡84之角度以形成第1雷射點LS1,在執行第二次雷射照射時調整第2反射鏡84之角度以形成第2雷射點LS2。Next, the division control unit 58 adjusts the angle of the second mirror 84 to form the first laser point LS1 when the first laser irradiation is performed, and adjusts the second mirror 84 when the second laser irradiation is performed. The angle is formed to form the second laser spot LS2.
圖9係本發明另一實施形態之雷射分割裝置LC5之光路調整機構的概略構成圖,圖9(a)係形成第1雷射點時的狀態、圖9(b)係形成第2雷射點時的狀態。在實施形態4所說明之雷射分割裝置LC4與雷射分割裝置LC5,僅在光路調整機構81(圖8)中之柱面鏡85能升降這點與第2反射鏡84係固定成不能移動這點上不同,其他構造則相同。Fig. 9 is a schematic configuration diagram of an optical path adjusting mechanism of the laser splitting device LC5 according to another embodiment of the present invention, wherein Fig. 9(a) shows a state in which a first laser spot is formed, and Fig. 9(b) shows a second mine. The state when shooting. In the laser splitting device LC4 and the laser splitting device LC5 described in the fourth embodiment, the cylindrical mirror 85 can be moved up and down only in the optical path adjusting mechanism 81 (Fig. 8), and the second mirror 84 can be fixed so as not to move. This is different, and the other constructs are the same.
亦即,光路調整機構91,係由第1反射鏡92、凹面鏡93、第2反射鏡94、柱面鏡95之光學元件群構成。其中,柱面鏡95能藉由臂(未圖示)及馬達(未圖示)上下移動。In other words, the optical path adjusting mechanism 91 is composed of an optical element group of the first reflecting mirror 92, the concave mirror 93, the second reflecting mirror 94, and the cylindrical mirror 95. Among them, the cylindrical mirror 95 can be moved up and down by an arm (not shown) and a motor (not shown).
雷射振盪器13,係調整由小徑光束構成之雷射光束LB0使其往垂直下方射出,雷射光束LB0係射入第1反射鏡92。第1反射鏡92,其安裝角度被調整成雷射光束LB0會以45 度之射入角度射入且以45度之反射角度射出,射出之雷射光束LB1係往水平方向行進。The laser oscillator 13 adjusts the laser beam LB0 composed of a small-diameter beam to be emitted vertically downward, and the laser beam LB0 is incident on the first mirror 92. The first mirror 92 has a mounting angle adjusted so that the laser beam LB0 will be 45 The incident angle is incident and is emitted at a reflection angle of 45 degrees, and the emitted laser beam LB1 travels in the horizontal direction.
往水平方向行進之雷射光束LB1係射入凹面鏡93,在凹面鏡93反射之雷射光束LB2,係一邊被縮小光束徑一邊射入第2反射鏡94。在第2反射鏡94反射之雷射光束LB3係射入柱面鏡95。藉由使柱面鏡95之位置上下移動使反射角度變化,以調整射出角度。The laser beam LB1 traveling in the horizontal direction is incident on the concave mirror 93, and the laser beam LB2 reflected by the concave mirror 93 is incident on the second mirror 94 while being reduced in the beam diameter. The laser beam LB3 reflected by the second mirror 94 is incident on the cylindrical mirror 95. The angle of incidence is adjusted by moving the position of the cylindrical mirror 95 up and down to adjust the angle of incidence.
在形成第1雷射點時,係柱面鏡95之位置調整成,自第2反射鏡94射出之雷射光束LB3之光束中為中心之中心光束LB3a,會如圖9(a)所示,反射至柱面鏡95之反射面,且自反射面射出之中心光束LB4a朝向垂直下方行進。雷射光束LB3中除了中心光束LB3a以外之光束,會成為繞雷射光束LB3a擴大的雷射光束LB3在柱面鏡95反射,而形成於一軸方向擴大且截面為橢圓形狀的雷射光束LB4,於基板G上形成橢圓形狀之第1雷射點LS1。此時,第1雷射點LS1具有於長軸方向為對稱之熱能量分布。When the first laser spot is formed, the position of the cylindrical mirror 95 is adjusted so that the center beam LB3a centered on the beam of the laser beam LB3 emitted from the second mirror 94 is as shown in Fig. 9(a). It is reflected to the reflecting surface of the cylindrical mirror 95, and the central light beam LB4a emitted from the reflecting surface travels vertically downward. The laser beam other than the center beam LB3a of the laser beam LB3 becomes a laser beam LB3 which is enlarged by the laser beam LB3a and is reflected by the cylindrical mirror 95, and is formed in a laser beam LB4 which is enlarged in the axial direction and has an elliptical cross section. An elliptical first laser spot LS1 is formed on the substrate G. At this time, the first laser spot LS1 has a heat energy distribution that is symmetrical in the long axis direction.
又,在形成第2雷射點時,係將柱面鏡95之位置調整成,自第2反射鏡94射出之雷射光束LB3之光束中之中心光束LB3b,會如圖9(b)所示,反射至柱面鏡95之反射面,且自反射面射出之中心光束LB4b會對基板G朝向傾斜方向行進。雷射光束LB3中除了中心光束LB3b以外之光束,會成為繞雷射光束LB3b擴大的雷射光束LB3在柱面鏡95反射,而形成於一軸方向擴大且截面為橢圓形狀的雷射光束LB4。此光束傾斜射入基板G的結果,即形成 熱能量分布於長軸方向為非對稱的第2雷射點LS2。Further, when the second laser beam is formed, the position of the cylindrical mirror 95 is adjusted so that the center beam LB3b of the beam of the laser beam LB3 emitted from the second mirror 94 is as shown in Fig. 9(b). The center beam LB4b reflected to the reflecting surface of the cylindrical mirror 95 and emitted from the reflecting surface travels toward the substrate G in an oblique direction. The laser beam other than the center beam LB3b of the laser beam LB3 is reflected by the cylindrical mirror 95 as a laser beam LB3 which is enlarged around the laser beam LB3b, and is formed in a laser beam LB4 which is enlarged in one axial direction and has an elliptical cross section. The result that the beam is obliquely incident on the substrate G is formed The thermal energy is distributed at the second laser spot LS2 which is asymmetric in the long axis direction.
接著,藉由分割控制部58,在執行第一次雷射照射時調整柱面鏡95之位置以形成第1雷射點LS1,在執行第二次雷射照射時調整柱面鏡95之位置以形成第2雷射點LS2。Next, by the division control unit 58, the position of the cylindrical mirror 95 is adjusted to form the first laser spot LS1 when the first laser irradiation is performed, and the position of the cylindrical mirror 95 is adjusted when the second laser irradiation is performed. To form the second laser spot LS2.
以上,雖說明了使用光學透鏡或光學鏡之數個實施形態,但並不限於此處所說明之實施態樣,即使多少改變光學透鏡或光學鏡之組合或配置,仍能實現與上述實施形態相同之光路調整。Although several embodiments using an optical lens or an optical mirror have been described above, the present invention is not limited to the embodiment described above, and even if the combination or arrangement of the optical lens or the optical mirror is changed a little, the same as the above embodiment can be realized. The light path is adjusted.
本發明,能利用於藉由雷射照射進行局部加熱及加熱後一刻之冷卻、以及藉由第二次雷射照射之再加熱以分割脆性材料基板的分割裝置。The present invention can be utilized for a division device for dividing a brittle material substrate by localizing heating by laser irradiation and cooling after heating, and reheating by second laser irradiation.
2‧‧‧滑動台2‧‧‧Slide table
7‧‧‧台座7‧‧‧ pedestal
12‧‧‧旋轉台12‧‧‧Rotating table
13‧‧‧雷射振盪器13‧‧‧Laser oscillator
14‧‧‧光路調整機構14‧‧‧Light path adjustment mechanism
14a‧‧‧光路調整元件群14a‧‧‧Light path adjustment component group
14b‧‧‧馬達群14b‧‧‧Motor Group
14c‧‧‧臂群14c‧‧‧arm group
16‧‧‧冷卻嘴16‧‧‧cooling nozzle
18‧‧‧刀輪18‧‧‧Cutter wheel
31‧‧‧平凸透鏡31‧‧‧ Plano-convex lens
32‧‧‧反射鏡32‧‧‧Mirror
33‧‧‧多邊形鏡33‧‧‧Polygon mirror
34~38‧‧‧馬達34~38‧‧‧Motor
37~39‧‧‧臂37~39‧‧‧arm
50‧‧‧控制部50‧‧‧Control Department
52‧‧‧雷射驅動部52‧‧‧ Laser Drive Department
52a‧‧‧雷射光源驅動部52a‧‧‧Laser light source drive unit
52b‧‧‧光路調整機構驅動部52b‧‧‧Light path adjustment mechanism drive department
58‧‧‧分割控制部58‧‧‧ Division Control Department
61, 71, 81, 91‧‧‧光路調整機構61, 71, 81, 91‧‧‧Light path adjustment mechanism
62, 72, 82, 92‧‧‧第1反射鏡62, 72, 82, 92‧‧‧1st mirror
63, 75, 84‧‧‧第2反射鏡63, 75, 84‧‧‧2nd mirror
64‧‧‧平凸透鏡64‧‧‧ Plano-convex lens
65, 74, 85, 95‧‧‧柱面透鏡65, 74, 85, 95‧‧‧ cylindrical lens
66‧‧‧可動光學體66‧‧‧ movable optical body
73, 83, 93‧‧‧凹面鏡73, 83, 93‧‧‧ concave mirror
LB0~LB4‧‧‧雷射光束LB0~LB4‧‧‧Laser beam
LB3a, LB3b, LB4a, LB4b‧‧‧中心光束LB3a, LB3b, LB4a, LB4b‧‧‧ center beam
LS1‧‧‧第1雷射點LS1‧‧‧1st laser point
LS2‧‧‧第2雷射點LS2‧‧‧2nd laser point
圖1係顯示本發明一實施形態之雷射分割裝置的概略構成圖。Fig. 1 is a schematic block diagram showing a laser beam splitting apparatus according to an embodiment of the present invention.
圖2係顯示圖1之雷射分割裝置中之控制系統構成的圖。Fig. 2 is a view showing the configuration of a control system in the laser division device of Fig. 1.
圖3係說明圖1之光路調整機構動作的圖。Fig. 3 is a view for explaining the operation of the optical path adjusting mechanism of Fig. 1.
圖4係顯示第1雷射點與第2雷射點之熱能量分布例的圖。Fig. 4 is a view showing an example of the distribution of thermal energy between the first laser spot and the second laser spot.
圖5係綜合性地說明光路調整機構之調整動作的圖。Fig. 5 is a view for explaining the adjustment operation of the optical path adjusting mechanism in a comprehensive manner.
圖6係顯示本發明另一實施形態之雷射分割裝置LC2之光路調整機構的概略構成圖。Fig. 6 is a schematic block diagram showing an optical path adjusting mechanism of the laser splitting device LC2 according to another embodiment of the present invention.
圖7係顯示本發明另一實施形態之雷射分割裝置LC3 之光路調整機構的概略構成圖。Figure 7 is a view showing a laser splitting device LC3 according to another embodiment of the present invention. A schematic diagram of the optical path adjustment mechanism.
圖8係顯示本發明另一實施形態之雷射分割裝置LC4之光路調整機構的概略構成圖。Fig. 8 is a schematic block diagram showing an optical path adjusting mechanism of the laser splitting device LC4 according to another embodiment of the present invention.
圖9係顯示本發明另一實施形態之雷射分割裝置LC5之光路調整機構的概略構成圖。Fig. 9 is a schematic block diagram showing an optical path adjusting mechanism of the laser splitting device LC5 according to another embodiment of the present invention.
1‧‧‧水平架台1‧‧‧ horizontal stand
2‧‧‧滑動台2‧‧‧Slide table
3, 4, 8‧‧‧導軌3, 4, 8‧‧‧ rails
5, 10a‧‧‧導螺桿5, 10a‧‧‧ lead screw
6, 10‧‧‧支架6, 10‧‧‧ bracket
7‧‧‧台座7‧‧‧ pedestal
9‧‧‧馬達9‧‧‧Motor
11‧‧‧旋轉機構11‧‧‧Rotating mechanism
12‧‧‧旋轉台12‧‧‧Rotating table
13‧‧‧雷射振盪器13‧‧‧Laser oscillator
14‧‧‧光路調整機構14‧‧‧Light path adjustment mechanism
14a‧‧‧光路調整元件群14a‧‧‧Light path adjustment component group
14b‧‧‧馬達群14b‧‧‧Motor Group
14c‧‧‧臂群14c‧‧‧arm group
15‧‧‧安裝支架15‧‧‧Installation bracket
16‧‧‧冷卻嘴16‧‧‧cooling nozzle
17‧‧‧上下移動調節機構17‧‧‧Up and down movement adjustment mechanism
18‧‧‧刀輪18‧‧‧Cutter wheel
31‧‧‧平凸透鏡31‧‧‧ Plano-convex lens
32‧‧‧反射鏡32‧‧‧Mirror
33‧‧‧多邊形鏡33‧‧‧Polygon mirror
34~38‧‧‧馬達34~38‧‧‧Motor
37~39‧‧‧臂37~39‧‧‧arm
LC1‧‧‧雷射分割裝置LC1‧‧‧Laser splitter
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| JP2007099587A (en) * | 2005-10-07 | 2007-04-19 | Kyoto Seisakusho Co Ltd | Method of cutting brittle material |
-
2007
- 2007-09-11 JP JP2007235832A patent/JP5060880B2/en not_active Expired - Fee Related
-
2008
- 2008-07-07 TW TW097125515A patent/TWI394628B/en not_active IP Right Cessation
- 2008-07-22 KR KR1020080070920A patent/KR101211427B1/en not_active Expired - Fee Related
- 2008-09-10 CN CN2008102151778A patent/CN101386467B/en not_active Expired - Fee Related
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH03285786A (en) * | 1990-03-30 | 1991-12-16 | Toshiba Corp | Laser beam machine |
| TW583046B (en) * | 2001-08-10 | 2004-04-11 | Mitsuboshi Diamond Ind Co Ltd | Method and device for scribing brittle material substrate |
Also Published As
| Publication number | Publication date |
|---|---|
| JP5060880B2 (en) | 2012-10-31 |
| JP2009066613A (en) | 2009-04-02 |
| KR20090027139A (en) | 2009-03-16 |
| KR101211427B1 (en) | 2012-12-12 |
| CN101386467A (en) | 2009-03-18 |
| TW200911435A (en) | 2009-03-16 |
| CN101386467B (en) | 2012-10-10 |
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