TWI387171B - Electrode pattern and wire bonding method - Google Patents
Electrode pattern and wire bonding method Download PDFInfo
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- TWI387171B TWI387171B TW097107465A TW97107465A TWI387171B TW I387171 B TWI387171 B TW I387171B TW 097107465 A TW097107465 A TW 097107465A TW 97107465 A TW97107465 A TW 97107465A TW I387171 B TWI387171 B TW I387171B
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Description
本發明,係有關於一種用於在半導體裝置或基板等之電極上實施線焊接之電極圖案及線焊接方法。The present invention relates to an electrode pattern and a wire bonding method for performing wire bonding on an electrode of a semiconductor device or a substrate.
在實施連結電極與金屬線之線焊接時,必須將焊接位置教導給焊接裝置。通常,在以金珠等來實施線焊接時,係使金珠設計成充分收納在被線焊接之電極內。在半導體裝置製造時之線焊接工序中,用於掌握線焊接裝置必須連結之處所的技術係有記載於日本特開2001-326241號公報中之物件。When welding the wire connecting the electrode to the wire, the welding position must be taught to the welding device. In general, when wire bonding is performed with gold beads or the like, the gold beads are designed to be sufficiently housed in the electrode to be wire-bonded. In the wire bonding process at the time of manufacturing a semiconductor device, the technique for grasping the point where the wire bonding device is required to be connected is described in Japanese Laid-Open Patent Publication No. 2001-326241.
當在雷射二極體實施線焊接時,線焊接用之電極圖案係做成細長形狀。記錄型雷射二極體,係隨著記錄時之倍速提高,雷射二極體被要求之輸出愈來愈大,另外,也被極度要求降低成本。為了對應這些要求,為了提高輸出而使雷射二極體縱向長度增長,為了降低成本而使雷射二極體橫向長度縮小,使自單一晶圓內取出之晶片數增加。因此,在例如350mW級之記錄型高輸出雷射二極體的情形下,縱向長度係超過2000μm,橫向長度在150μm以下,而成非常細長之形狀。When wire bonding is performed on the laser diode, the electrode pattern for wire bonding is formed into an elongated shape. The recording type laser diode is increased in speed as the recording speed increases, and the output of the laser diode is required to be larger and larger, and the cost is also extremely required. In order to cope with these requirements, in order to increase the output, the longitudinal length of the laser diode is increased, and the lateral length of the laser diode is reduced in order to reduce the cost, so that the number of wafers taken out from a single wafer is increased. Therefore, in the case of, for example, a recording type high output laser diode of the order of 350 mW, the longitudinal length is more than 2000 μm and the lateral length is 150 μm or less, resulting in a very elongated shape.
記錄型高輸出雷射二極體之組裝形態,係在孔眼上以AuSn軟焊等來接著副腳管與雷射二極體。而且,雖然線焊接雷射二極體電極與導線或孔眼,但是,為了在電極上之 既定位置形成金珠,而認知電極端部之特徵性圖案,接著在雷射縱向上偏移既定量之處所將金珠加以線焊接。當在孔眼上接著副腳管與雷射二極體時,可知因為組裝裝置精度之影響,孔眼中心線與雷射二極體中心線係最大傾斜2度左右。The assembly form of the recording type high output laser diode is followed by AuSn soldering or the like on the eyelet to follow the auxiliary leg tube and the laser diode. Moreover, although the wire is soldered to the diode electrode with a wire or eyelet, but for the electrode The gold beads are formed at a predetermined position, and the characteristic pattern of the end of the electrode is clamped, and then the gold beads are wire-bonded in the longitudinal direction of the laser. When the auxiliary leg tube and the laser diode are attached to the hole, it can be seen that the center line of the hole and the center line of the laser diode are inclined by about 2 degrees at the maximum due to the influence of the accuracy of the assembly device.
【專利文獻1】日本特開2001-326241號公報[Patent Document 1] Japanese Patent Laid-Open Publication No. 2001-326241
當不往雷射二極體中心及孔眼中心傾斜時,金珠能焊接到電極中心。但是,當有傾斜時,會有金珠會被擠出電極外之問題。當電極縱向長度很長,短邊方向長度(電極寬)很短時,往短邊方向之偏移會很大,金珠之擠出量也會變多。當在極接近電極端部附近形成金珠時,雖然由傾斜誤差所致之金珠擠出量能變少,但是在此情形下,在離開金珠附近之處所,能供給到雷射二極體之電流密度會改變,而有雷射二極體之動作變困難之問題。因此,金珠必須形成於雷射二極體中心附近。當在如記錄型高輸出雷射二極體之細長電極圖案處形成金珠時,其影響會更顯著。When not tilted toward the center of the laser diode and the center of the hole, the gold beads can be welded to the center of the electrode. However, when there is a tilt, there is a problem that the gold beads will be squeezed out of the electrode. When the longitudinal length of the electrode is long and the length in the short side direction (electrode width) is short, the shift to the short side direction is large, and the amount of gold beads is also increased. When gold beads are formed in the vicinity of the end of the electrode, although the amount of gold beads extruded by the tilt error can be reduced, in this case, the laser diode can be supplied to the vicinity of the gold bead. The current density of the body changes, and the action of the laser diode becomes difficult. Therefore, gold beads must be formed near the center of the laser diode. When a gold bead is formed at an elongated electrode pattern such as a recording type high output laser diode, the effect is more remarkable.
本發明,係為了消除上述問題而研發出之物件,提供一種能精度良好地實施線焊接之電極圖案及線焊接方法。The present invention is an object developed in order to eliminate the above problems, and provides an electrode pattern and a wire bonding method capable of performing wire bonding with high precision.
本發明之電極圖案係用於線焊接且具有短邊及長邊,其特徵在於:具有表示用於決定線焊接位置之基準位置的 線焊接基準圖案及線焊接認知圖案,在接著到前述電極圖案之打線用金屬部位處,通過與前述短邊平行之方向最大寬度之位置且與前述短邊平行之線與前述基準位置之距離L、以及通過前述線焊接認知圖案之前述長邊方向之中心且平行前述短邊之線與通過前述金屬部位之與前述短邊平行之最大寬度位置且平行前述短邊之線之距離Lb,係L≧14.3×(W-3d/4) Lb≦14.3×(W-3b/4) 其中,d係接著到前述電極圖案之打線用金屬部位之平行前述短邊寬度之最大值;W係平行電極圖案短邊之寬度。The electrode pattern of the present invention is used for wire bonding and has a short side and a long side, and is characterized by having a reference position for determining a wire bonding position. a wire bonding reference pattern and a wire bonding cognitive pattern, wherein a distance L between a line parallel to the short side and a line parallel to the short side and the reference position is formed at a metal portion of the wire pattern of the electrode pattern And a distance Lb between the line of the longitudinal direction of the cognitive pattern and the line of the short side passing through the wire and the maximum width position parallel to the short side of the metal portion and parallel to the line of the short side, L ≧14.3×(W-3d/4) Lb≦14.3×(W-3b/4) Wherein d is the maximum value of the short side width parallel to the metal portion of the electrode pattern of the electrode pattern; and W is the width of the short side of the parallel electrode pattern.
本發明,係藉由具有上述構成,能獲得可在細長電極圖案之任意位置上,形成線焊接用焊線之電極圖案。According to the present invention, it is possible to obtain an electrode pattern capable of forming a wire bonding wire for welding at an arbitrary position of the elongated electrode pattern.
第1圖係表示本發明實施形態打線用電極圖案之示意圖。又,第2圖係使用本發明實施形態打線用電極圖案之半導體元件示意圖。以下,使用第1圖及第2圖來說明。在本發明之實施形態中,係舉在細長的雷射二極體晶片上實施線焊接之半導體元件為例。在雷射二極體晶片處,形成有用於線焊接之電極圖案103。在前述電極圖案103上之實施線焊接領域111內形成直徑d之金珠109而實施線 焊接。此時,當第2圖所示孔眼201中心與雷射二極體205中心沒有傾斜及偏移時(θ=0),使金珠中心成為在通過平行電極圖案103短邊方向之中心的長邊方向線上地,形成金珠109而實施線焊接。在電極圖案103形成有成為線焊接認知圖案107之特徵性圖案。在本實施形態中,於電極圖案103縱向一邊形成矩形切口,而當作線焊接認知圖案107。使各尺寸如下決定。Fig. 1 is a schematic view showing an electrode pattern for wire bonding according to an embodiment of the present invention. Further, Fig. 2 is a schematic view showing a semiconductor element using an electrode pattern for wire bonding according to an embodiment of the present invention. Hereinafter, description will be made using Figs. 1 and 2 . In the embodiment of the present invention, a semiconductor element in which wire bonding is performed on an elongated laser diode wafer is exemplified. At the laser diode wafer, an electrode pattern 103 for wire bonding is formed. A gold bead 109 having a diameter d is formed in the wire bonding field 111 on the electrode pattern 103 to implement a line. welding. At this time, when the center of the eyelet 201 shown in FIG. 2 and the center of the laser diode 205 are not inclined and shifted (θ = 0), the center of the gold bead is made long in the center of the short side direction of the parallel electrode pattern 103. On the side direction line, gold beads 109 are formed and wire bonding is performed. A characteristic pattern that becomes the wire bonding cognitive pattern 107 is formed in the electrode pattern 103. In the present embodiment, a rectangular slit is formed on the longitudinal direction of the electrode pattern 103, and the line-welded cognitive pattern 107 is used. Let each size be determined as follows.
L:電極圖案緣部(電極端部105)與形成於線焊接領域111之金珠109中心之最短距離L: the shortest distance between the electrode pattern edge portion (electrode end portion 105) and the center of the gold bead 109 formed in the wire bonding field 111
Lb:平行通過線焊接認知圖案107長邊方向中心之短邊方向上的線與形成於線焊接領域111之金珠109中心之最短距離Lb: the shortest distance between the line in the short side direction of the center in the longitudinal direction of the line pattern of the cognitive pattern 107 in parallel and the center of the gold ball 109 formed in the wire bonding field 111
d:金珠109之直徑d: diameter of gold beads 109
W:平行於電極圖案103短邊之方向上的寬度W: width in the direction parallel to the short side of the electrode pattern 103
孔眼201中心與雷射二極體205中心之傾斜偏移量θ,係較諸組立裝置精度最大為2度。當於線焊接領域111形成金珠109時,將自線焊接領域111被擠出之量當作x,x係以下式表示。The tilt offset θ between the center of the aperture 201 and the center of the laser diode 205 is at most 2 degrees higher than the accuracy of the assembly devices. When the gold bead 109 is formed in the wire bonding field 111, the amount extruded from the wire bonding field 111 is regarded as x, and x is expressed by the following formula.
x=d/2-W/2+Ltan θx=d/2-W/2+Ltan θ
在此,當使擠出量x容許至d/8時,tan2度=0.0349,所以L及Lb分別成為下式。Here, when the extrusion amount x is allowed to be d/8, tan2 degrees = 0.0349, so L and Lb become the following formulas, respectively.
L=14.3×(W-3d/4)L=14.3×(W-3d/4)
Lb=14.3×(W-3d/4)Lb=14.3×(W-3d/4)
在本實施形態中,係將電極端部105當作成為特定線 焊接位置之基準的線焊接基準圖案。前述線焊接基準圖案與線焊接領域111內之直徑d金珠109中心之距離L,係在L≧14.3×(W-3d/4)之位置處實施線焊接。此時,平行於通過形成在電極圖案103上之線焊接認知圖案107縱向中之中心的短邊方向上之線與金珠109中心之距離Lb,係定位在Lb≦14.3×(W-3d/4)(μm)之位置。當舉記錄型高輸出雷射二極體為例時,將雷射二極體縱向長度當作2000μm,寬度當作120μm,電極寬度當作80μm,在金珠直徑係80±10μm時,L係成為286μm左右,在無線焊接認知圖案時,僅在細長電極端部形成金珠,被注入之電流密度在電極上端部及下端部會改變,雷射二極體之動作會不穩定。藉由使本發明之線焊接認知圖案形成於期望位置,能簡單地消除被注入電流密度不均勻之問題。In the present embodiment, the electrode end portion 105 is regarded as a specific line. A wire bonding reference pattern for the reference of the welding position. The distance L between the wire bonding reference pattern and the center of the diameter d gold bead 109 in the wire bonding field 111 is wire bonding at a position of L ≧ 14.3 × (W - 3d / 4). At this time, the distance Lb parallel to the center of the gold bead 109 parallel to the center in the longitudinal direction of the line in the longitudinal direction of the wire bonding cognitive pattern 107 formed on the electrode pattern 103 is positioned at Lb ≦ 14.3 × (W-3d / 4) The position of (μm). When the recording type high output laser diode is taken as an example, the longitudinal length of the laser diode is regarded as 2000 μm, the width is regarded as 120 μm, the electrode width is regarded as 80 μm, and when the gold bead diameter is 80±10 μm, the L system is used. When the cognitive pattern is wirelessly soldered, the gold bead is formed only at the end of the elongated electrode, and the current density to be injected changes at the upper end portion and the lower end portion of the electrode, and the operation of the laser diode is unstable. By forming the wire bonding cognitive pattern of the present invention at a desired position, the problem of unevenness of the injected current density can be easily eliminated.
在本實施形態中,雖然線焊接基準圖案使用電極端部105,但是,在電極端部之外,也可以將電極內之特徵性圖案當作線焊接基準圖案。例如,在電極圖案103四角落之一處,形成有用於確認晶片前後等之缺口,也可以將前述缺口當作線焊接基準圖案。在本實施形態中,前述缺口雖然係矩形之組合形狀,但是也可以係圓形或三角形等其他形狀。又,在本實施形態中,雖然係形成金珠而實施線焊接,但是,在楔形焊接接時,也可以不形成金珠地超音波壓接焊線尖端而連接。In the present embodiment, the electrode end portion 105 is used for the wire bonding reference pattern. However, the characteristic pattern in the electrode may be used as the wire bonding reference pattern in addition to the electrode end portion. For example, at one of the four corners of the electrode pattern 103, a notch for confirming the front and rear of the wafer or the like is formed, and the notch may be used as the wire bonding reference pattern. In the present embodiment, the notch is a combination of rectangular shapes, but may be other shapes such as a circle or a triangle. Further, in the present embodiment, although the gold beads are formed and the wire bonding is performed, in the case of the wedge welding, the ultrasonic welding wire tip may be connected without forming the gold beads.
在第3圖及第4圖中,係表示本發明實施形態2線焊接用電極圖案之示意圖。在實施形態1中,如第1圖所示,雖然使線焊接認知用圖案107做成矩形缺口圖案,但是,在本實施形態中,係使線焊接認知用圖案成為第3圖所示之圓形認知圖案形狀,或者,第4圖所示之三角形狀。在圓形之線焊接認知用圖案307中,當使前述線焊接認知用圖案307變小時,或者,當使用加工精度較低之蝕刻法時,即使產生塌角,形狀還是圓形,能防止認知錯誤。又,當為三角形之線焊接認知用圖案407時,與相同大小之四角形相比較下,因為能加長直線部長度,所以能減少由蝕刻塌角等所致之圖案崩裂的影響。In the third and fourth drawings, a schematic view of an electrode pattern for wire bonding according to the second embodiment of the present invention is shown. In the first embodiment, as shown in Fig. 1, the wire bonding recognition pattern 107 is formed into a rectangular notch pattern. However, in the present embodiment, the wire bonding recognition pattern is a circle shown in Fig. 3. The shape of the cognitive pattern, or the triangular shape shown in Fig. 4. In the circular line welding cognitive pattern 307, when the wire bonding cognitive pattern 307 is made small, or when an etching method with a low processing precision is used, even if a sag angle is generated, the shape is circular, and the cognition can be prevented. error. Further, when the cognitive pattern 407 is welded to the line of the triangle, the length of the straight portion can be lengthened as compared with the square of the same size, so that the influence of the pattern crack due to the etching collapse angle or the like can be reduced.
線焊接認知用圖案307,407,係藉由形成於電極圖案303,403縱向一邊之側部,能以提開法很容易地形成。又,當使用蝕刻等方法時,如第5圖所示,也可以使線焊接認知圖案507形成在電極圖案503內部。The wire bonding cognitive patterns 307, 407 are formed on the side portions of the longitudinal sides of the electrode patterns 303, 403, and can be easily formed by the lift-off method. Further, when a method such as etching is used, as shown in FIG. 5, the wire bonding cognitive pattern 507 may be formed inside the electrode pattern 503.
本實施形態,係有關於認知線焊接認知圖案而實施線焊接之方法。In the present embodiment, there is a method of performing wire bonding on a cognitive wire bonding cognitive pattern.
參照第1圖及第2圖,藉由認知孔眼201外形,能知道線焊接認知圖案107之概略位置。接著,認知形成於電極圖案103上之線焊接認知圖案107。此時,當有必要時,則改變照相機倍率而認知線焊接認知圖案107。最後,以焊線211,213實施線焊接,實施對導線207及CND之連接。當使用此方法時,孔眼201上之雷射二極體205,係當因 為設定疏失,預對心之不良等或定位治具不良等而自既定位置偏移時,能即時發現。亦即,在認知孔眼外形後,在預想位置處沒有線焊接認知圖案,所以,裝置會在此處停止。其能使在雷射二極體接著工序中之位置偏移不良品產生壓抑到最小限度,所以,能抑制由持續製作不良品所致之損失。Referring to Figs. 1 and 2, the outline position of the wire bonding cognitive pattern 107 can be known by recognizing the outer shape of the eyelet 201. Next, the wire bonding cognitive pattern 107 formed on the electrode pattern 103 is recognized. At this time, when necessary, the camera magnification is changed to recognize the wire bonding cognitive pattern 107. Finally, wire bonding is performed by the bonding wires 211, 213, and the connection of the wires 207 and CND is performed. When using this method, the laser diode 205 on the aperture 201 is a cause In order to set the loss, the pre-pairing of the heart, or the positioning of the fixture, etc., and the positional offset, it can be found immediately. That is, after recognizing the shape of the aperture, there is no line-welding cognitive pattern at the intended position, so the device will stop here. This makes it possible to suppress the positional deviation defective product in the laser diode subsequent step to a minimum, and therefore, it is possible to suppress the loss caused by the continuous production of the defective product.
本實施形態,係有關於認知線焊接認知圖案而實施線焊接之其他方法。In this embodiment, another method of performing wire bonding on the cognitive wire bonding cognitive pattern is used.
與實施形態3相同地,藉由認知孔眼外形,能知道線焊接認知圖案之概略位置。接著,認知成為線焊接基準之線焊接基準圖案。在本實施形態中,係將電極端部105當作線焊接基準圖案。接著,認知形成於電極圖案103上之線焊接認知圖案107。此時,當有必要時,則改變照相機倍率而認知線焊接認知圖案107。最後實施線焊接。當使用此方法時,因為認知晶片之位置,所以,能比實施形態3更正確地認知線焊接認知圖案107之位置。又,也可以將形成於電極圖案103四個角落之一的缺口當作線焊接基準圖案,而使用於位置確認。在本實施形態中,前述缺口雖然係矩形之組合形狀,但是也可以係圓形或三角形等其他形狀。As in the third embodiment, the outline position of the wire bonding cognitive pattern can be known by recognizing the outer shape of the eyelet. Next, it is recognized that the wire bonding reference pattern is the wire bonding reference. In the present embodiment, the electrode end portion 105 is regarded as a wire bonding reference pattern. Next, the wire bonding cognitive pattern 107 formed on the electrode pattern 103 is recognized. At this time, when necessary, the camera magnification is changed to recognize the wire bonding cognitive pattern 107. Finally, wire welding is carried out. When this method is used, since the position of the wafer is recognized, the position of the wire bonding cognitive pattern 107 can be more accurately recognized than in the third embodiment. Further, the notch formed in one of the four corners of the electrode pattern 103 may be used as a wire bonding reference pattern for position confirmation. In the present embodiment, the notch is a combination of rectangular shapes, but may be other shapes such as a circle or a triangle.
本實施形態,係有關於認知線焊接認知圖案而實施線焊接之其他方法。In this embodiment, another method of performing wire bonding on the cognitive wire bonding cognitive pattern is used.
首先參照第1圖,藉由認知孔眼外形,能知道線焊接認知圖案107之概略位置。接著,認知形成於電極圖案103上之線焊接認知圖案107。此時,當有必要時,則改變照相機倍率而認知線焊接認知圖案107。接著,認知在預想位置之電極端部105圖案,最後實施線焊接。當使用此方法時,在如實施形態3能檢知於接著工序中之位置偏移之外,也能立即檢知接著不同機種之雷射二極體晶片時的不良。雷射二極體晶片,係藉由能輸出之光功率,雷射二極體縱向長度會不同,所以,當係不同機種之晶片時,會無法認知電極端部之圖案而裝置會停止,所以,能抑制由持續製作不同機種晶片搭載不良所致之損失。又,也可以將形成於電極圖案103四個角落之一的缺口使用於電極端部之確認。在本實施形態中,前述缺口雖然係矩形之組合形狀,但是也可以係圓形或三角形等其他形狀。Referring first to Fig. 1, the outline position of the wire bonding cognitive pattern 107 can be known by recognizing the shape of the eyelet. Next, the wire bonding cognitive pattern 107 formed on the electrode pattern 103 is recognized. At this time, when necessary, the camera magnification is changed to recognize the wire bonding cognitive pattern 107. Next, the pattern of the electrode end portion 105 at the intended position is recognized, and the wire bonding is finally performed. When this method is used, in the third embodiment, it is possible to detect the positional shift in the subsequent step, and it is possible to immediately detect the defect in the case of the laser diode of the different types. The laser diode chip has different longitudinal lengths of the laser diodes due to the output optical power. Therefore, when the wafers of different types are used, the pattern of the electrode ends cannot be recognized and the device stops. It is possible to suppress the loss caused by the poor carrying of the wafers of different models. Further, a notch formed in one of the four corners of the electrode pattern 103 may be used for confirmation of the electrode end. In the present embodiment, the notch is a combination of rectangular shapes, but may be other shapes such as a circle or a triangle.
而且,本發明雖然係有關於具有短邊及長邊之電極圖案,但是,相對於孔眼中心線之雷射二極體中心線的傾斜偏移所致的影響,係電極圖案短邊方向之寬度W愈小則愈大。當W較大時,相對於偏移之邊緣係較大,但是當W小於100μm時,此邊緣幾乎變沒有。因此,本發明在W小於100μm時特別有效果。Further, although the present invention relates to an electrode pattern having a short side and a long side, the width of the short side direction of the electrode pattern is affected by the inclination shift of the center line of the laser diode with respect to the center line of the aperture. The smaller W is, the bigger it is. When W is large, the edge with respect to the offset is large, but when W is less than 100 μm, this edge hardly becomes. Therefore, the present invention is particularly effective when W is less than 100 μm.
而且,本發明,雖然係針對記錄型高輸出雷射二極體做過說明,但是,也可以適用於此外之紅色雷射二極體或藍紫色雷射二極體、通訊用雷射二極體、LED、其他半導體裝置,或者,封裝或基板上等的配線圖案等的實施線焊接 之電極圖案。Further, although the present invention has been described with respect to a recording type high output laser diode, it can also be applied to other red laser diodes or blue-violet laser diodes, and communication laser diodes. Wire bonding of body, LED, other semiconductor devices, or wiring patterns on packages or substrates, etc. The electrode pattern.
103‧‧‧電極圖案103‧‧‧electrode pattern
105‧‧‧電極端部105‧‧‧electrode end
107‧‧‧線焊接認知圖案107‧‧‧Wire welding cognitive pattern
109‧‧‧金珠109‧‧‧Gold beads
303‧‧‧電極圖案303‧‧‧electrode pattern
307‧‧‧線焊接認知圖案307‧‧‧Wire welding cognitive pattern
403‧‧‧電極圖案403‧‧‧electrode pattern
407‧‧‧線焊接認知圖案407‧‧‧Wire welding cognitive pattern
503‧‧‧電極圖案503‧‧‧electrode pattern
507‧‧‧線焊接認知圖案507‧‧‧Wire welding cognitive pattern
第1圖係表示本發明實施形態電極圖案之示意圖。Fig. 1 is a schematic view showing an electrode pattern of an embodiment of the present invention.
第2(a)、(b)圖係使用本發明實施形態電極圖案之半導體元件示意圖。2(a) and 2(b) are schematic views showing a semiconductor element using an electrode pattern according to an embodiment of the present invention.
第3圖係表示本發明實施形態電極圖案之示意圖。Fig. 3 is a schematic view showing an electrode pattern of an embodiment of the present invention.
第4圖係表示本發明實施形態電極圖案之示意圖。Fig. 4 is a schematic view showing an electrode pattern of an embodiment of the present invention.
第5(a)~(c)圖係表示本發明實施形態電極圖案之示意圖。5(a) to 5(c) are schematic views showing an electrode pattern according to an embodiment of the present invention.
101‧‧‧半導體基板101‧‧‧Semiconductor substrate
103‧‧‧電極圖案103‧‧‧electrode pattern
105‧‧‧電極端部105‧‧‧electrode end
107‧‧‧線焊接認知圖案107‧‧‧Wire welding cognitive pattern
109‧‧‧金珠109‧‧‧Gold beads
111‧‧‧線焊接領域111‧‧‧Wire welding field
Claims (8)
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| JP2007070684 | 2007-03-19 | ||
| JP2008008066A JP5176557B2 (en) | 2007-03-19 | 2008-01-17 | Electrode pattern and wire bonding method |
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| JP6901902B2 (en) * | 2017-04-27 | 2021-07-14 | ルネサスエレクトロニクス株式会社 | Semiconductor devices and their manufacturing methods |
| KR102706879B1 (en) * | 2021-12-24 | 2024-09-13 | 주식회사 유라코퍼레이션 | Printed Circuit Board |
| CN121097496A (en) * | 2025-11-10 | 2025-12-09 | 长春理工大学 | A method for improving the modulation rate of semiconductor lasers |
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| JP2001326241A (en) * | 2000-05-16 | 2001-11-22 | Oki Electric Ind Co Ltd | Bonding pad and semiconductor chip |
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| US20050151251A1 (en) * | 2003-12-19 | 2005-07-14 | Tdk Corporation | Mounting substrate and electronic component using the same |
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| JPS62291126A (en) | 1986-06-11 | 1987-12-17 | Fuji Xerox Co Ltd | Pattern recognition mark |
| JPS63133638A (en) * | 1986-11-26 | 1988-06-06 | Toshiba Corp | Wire bonding |
| JP2621420B2 (en) * | 1988-09-28 | 1997-06-18 | 日本電気株式会社 | Bonding pads for semiconductor devices |
| JP2992427B2 (en) * | 1993-07-16 | 1999-12-20 | 株式会社カイジョー | Wire bonding apparatus and method |
| JP2982794B1 (en) | 1998-06-17 | 1999-11-29 | 日本電気株式会社 | Semiconductor device |
| JP2001024303A (en) | 1999-07-09 | 2001-01-26 | Nippon Avionics Co Ltd | Recognition mark |
| US7042098B2 (en) | 2003-07-07 | 2006-05-09 | Freescale Semiconductor,Inc | Bonding pad for a packaged integrated circuit |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6144102A (en) * | 1997-05-16 | 2000-11-07 | Texas Instruments Incorporated | Semiconductor device package |
| JP2001326241A (en) * | 2000-05-16 | 2001-11-22 | Oki Electric Ind Co Ltd | Bonding pad and semiconductor chip |
| TW581715B (en) * | 2001-07-06 | 2004-04-01 | Erico Int Corp | Welding apparatus and method |
| TWI228785B (en) * | 2002-05-28 | 2005-03-01 | Hitachi Chemical Co Ltd | Substrate, wiring board, substrate for semiconductor package, semiconductor device, semiconductor package and its manufacturing method |
| US20050151251A1 (en) * | 2003-12-19 | 2005-07-14 | Tdk Corporation | Mounting substrate and electronic component using the same |
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| JP2008263165A (en) | 2008-10-30 |
| KR100941106B1 (en) | 2010-02-10 |
| JP5176557B2 (en) | 2013-04-03 |
| TW200843265A (en) | 2008-11-01 |
| KR20080085687A (en) | 2008-09-24 |
| CN101272034A (en) | 2008-09-24 |
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