TWI382526B - Isolated scr esd device - Google Patents
Isolated scr esd device Download PDFInfo
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- TWI382526B TWI382526B TW98100204A TW98100204A TWI382526B TW I382526 B TWI382526 B TW I382526B TW 98100204 A TW98100204 A TW 98100204A TW 98100204 A TW98100204 A TW 98100204A TW I382526 B TWI382526 B TW I382526B
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- 230000003068 static effect Effects 0.000 claims description 3
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Description
本發明係有關一種隔離式矽控整流器(SCR,Silicon Controlled Rectifier)靜電防護元件(ESD,Electro-Static Discharge device),特別是指一種可避免負電壓對電路造成不良影響的靜電防護元件。The present invention relates to an isolated controllable rectifier (SCR) Electrostatic Discharge Device (ESD), and more particularly to an electrostatic protection component that can prevent a negative voltage from adversely affecting a circuit.
積體電路中經常需要使用到靜電防護元件,在電路對外接腳處接收到過高電壓時先行放電,以避免損害電路內部元件。靜電防護元件的其中一種作法是使用矽控整流器,如第1圖所示,在P型基體100上設置N型井區11與P型井區21,在N型井區11內設置高濃度P+摻雜區13與N+摻雜區15、在P型井區21內設置高濃度P+摻雜區23與N+摻雜區25,構成圖示的矽控整流器,其中由P+摻雜區13經N+摻雜區15、N型井區11至P型井區21構成PNP電晶體,而由N型井區11經P型井區21至N+摻雜區25構成NPN電晶體。對外的連接墊PAD電連接至P+摻雜區13和N+摻雜區15,對外的接地墊GND電連接至P+摻雜區23和N+摻雜區25,如此,當連接墊PAD接收到高電壓時,可啟動此矽控整流器,將電流導引至接地墊GND排除。It is often necessary to use an ESD protection component in an integrated circuit to discharge first when the circuit receives an excessive voltage at the external pin to avoid damaging the internal components of the circuit. One of the electrostatic protection elements is to use a tamper-controlled rectifier. As shown in Fig. 1, an N-type well region 11 and a P-type well region 21 are disposed on the P-type base 100, and a high-concentration P+ is disposed in the N-type well region 11. The doped region 13 and the N+ doped region 15 are provided with a high concentration P+ doped region 23 and an N+ doped region 25 in the P-type well region 21 to form a pseudo-controlled rectifier as illustrated, wherein the P+ doped region 13 is N+ The doped region 15, the N-type well region 11 to the P-type well region 21 constitute a PNP transistor, and the N-type well region 11 constitutes an NPN transistor through the P-type well region 21 to the N+ doped region 25. The external connection pad PAD is electrically connected to the P+ doping region 13 and the N+ doping region 15, and the external ground pad GND is electrically connected to the P+ doping region 23 and the N+ doping region 25, so that when the connection pad PAD receives the high voltage The pilot rectifier can be activated to direct current to the ground pad GND to eliminate.
上述先前技術的缺點是,當連接墊PAD接收到負電壓時,由N+摻雜區15、N型井區11至P型基體100的接面二極體將會順偏導通,造成自基板100抽取電流自連接墊 PAD流失的現象,不但耗損能量,且可能因此電流引發互鎖效應(latch-up),使電路內部元件無法正常工作。一般而言,靜電防護元件在設計上並未預期連接墊PAD會接觸到負電壓,但當電路係用以推動電源電路中之功率電晶體開關時,即可能因功率電晶體開關的切換震盪(switching ringing)而產生瞬間的負電壓。A disadvantage of the prior art described above is that when the connection pad PAD receives a negative voltage, the junction diodes of the N+ doping region 15, the N-type well region 11 to the P-type substrate 100 will be turned on, resulting from the substrate 100. Current extraction from the connection pad The loss of PAD not only consumes energy, but may cause latch-up of the current, which prevents the internal components of the circuit from working properly. In general, the ESD protection component is not designed to contact the negative voltage of the connection pad PAD, but when the circuit is used to push the power transistor switch in the power supply circuit, it may be oscillated due to the switching of the power transistor switch ( Switching ringing) produces an instantaneous negative voltage.
有鑑於此,本發明即針對上述先前技術之不足,提出一種可避免負電壓對電路造成不良影響的隔離式矽控整流器靜電防護元件。In view of the above, the present invention is directed to the above-mentioned deficiencies of the prior art, and proposes an isolated step-controlled rectifier electrostatic protection element that can avoid adverse effects of negative voltage on the circuit.
本發明目的之一在提供一種隔離式矽控整流器靜電防護元件。One of the objects of the present invention is to provide an isolated step-by-step rectifier electrostatic protection component.
為達上述之目的,就其中一個觀點言,本發明提供了一種隔離式矽控整流器靜電防護元件,包含:一個基體;位於該基體內之具有第一傳導型態的第一井區,此井區為浮接;位於該第一井區內之具有第二傳導型態的第一高濃度摻雜區;與第一井區鄰接、具有第二傳導型態的第二井區;位於該第二井區內之具有第二傳導型態的第二高濃度摻雜區;以及位於該第二井區內之具有第一傳導型態的第三高濃度摻雜區,其中該第一高濃度摻雜區係供與一連接墊電連接,且該第一井區內並不設置與該連接墊連接之具有第一傳導型態的高濃度摻雜區。In order to achieve the above object, in one aspect, the present invention provides an isolated step-by-step rectifier electrostatic protection component comprising: a substrate; a first well region having a first conductivity type in the substrate, the well The region is floating; a first high concentration doped region having a second conductivity type in the first well region; a second well region adjacent to the first well region and having a second conductivity type; a second high concentration doped region having a second conductivity type in the second well region; and a third high concentration doped region having a first conductivity type in the second well region, wherein the first high concentration region The doped region is electrically connected to a connection pad, and the first well region is not provided with a high concentration doped region having a first conductivity type connected to the connection pad.
上述隔離式矽控整流器靜電防護元件中,可在第一井 區和第二井區的交界處設置另一高濃度摻雜區,此高濃度摻雜區可為第一或第二傳導型態。或是,可在第一井區內,距離第一井區和第二井區交界處一段預設距離處設置第一傳導型態之另一高濃度摻雜區,或在第二井區內,距離第一井區和第二井區交界處一段預設距離處設置第二傳導型態之另一高濃度摻雜區。The above-mentioned isolated 矽-controlled rectifier electrostatic protection component can be in the first well Another high concentration doped region is disposed at the junction of the region and the second well region, and the high concentration doped region may be the first or second conductivity type. Alternatively, another high concentration doped region of the first conductivity type may be disposed at a predetermined distance from the junction of the first well region and the second well region in the first well region, or in the second well region And another high concentration doping region of the second conductivity type is disposed at a predetermined distance from the junction of the first well region and the second well region.
底下藉由具體實施例詳加說明,當更容易瞭解本發明之目的、技術內容、特點及其所達成之功效。The purpose, technical content, features and effects achieved by the present invention will be more readily understood by the detailed description of the embodiments.
本說明書之圖示均屬示意,其維度並未完全按照比例繪示。The illustrations of the present specification are schematic and their dimensions are not drawn to scale.
請參考第2圖,其中顯示本發明的第一個實施例。如圖所示,本實施例中,N型井區11為浮接(floating),且N型井區11內僅設置了高濃度P+摻雜區13而無N+摻雜區15。連接墊PAD僅連接到P+摻雜區13。當連接墊PAD接收到高電壓時,可藉由圖示的放電路徑200將其導引排除。與先前技術不同的是,當連接墊PAD接收到負電壓時,由於P+摻雜區13和N型井區11構成PN接面,使該負電壓並不致對電路造成影響,且該負電壓並無其他路徑可引發基體產生電流,因此可以解決先前技術的問題。Referring to Figure 2, there is shown a first embodiment of the present invention. As shown in the figure, in the present embodiment, the N-type well region 11 is floating, and only the high-concentration P+ doping region 13 and the N+-doped region 15 are disposed in the N-type well region 11. The connection pad PAD is only connected to the P+ doping region 13. When the connection pad PAD receives a high voltage, its guidance can be eliminated by the illustrated discharge path 200. Different from the prior art, when the connection pad PAD receives a negative voltage, since the P+ doping region 13 and the N-type well region 11 constitute a PN junction, the negative voltage does not affect the circuit, and the negative voltage is No other path can cause the substrate to generate current, thus solving the problems of the prior art.
第3圖顯示本發明的另一個實施例。本實施例中,在N型井區11和P型井區21的交界處另設置了高濃度的N+摻雜區17。N+摻雜區17的設置目的是調整靜電防護元件的 觸發電壓。詳言之,由N型井區11和P型井區21所構成的接面,其崩潰導通所需的電壓較高,例如約在40V左右;若提供N+摻雜區17,則可透過N+摻雜區17和P型井區21的接面有效降低崩潰電壓至例如12-15V左右,使矽控整流器在較低的電壓即開始導通,啟動靜電防護功能。Figure 3 shows another embodiment of the present invention. In the present embodiment, a high concentration N+ doping region 17 is additionally disposed at the junction of the N-type well region 11 and the P-type well region 21. The N+ doping region 17 is set to adjust the electrostatic protection component Trigger voltage. In detail, the junction formed by the N-type well region 11 and the P-type well region 21 has a higher voltage required for collapse conduction, for example, about 40 V; if the N+ doped region 17 is provided, it can pass N+ The junction of the doped region 17 and the P-type well region 21 effectively reduces the breakdown voltage to, for example, about 12-15 V, so that the voltage-controlled rectifier starts to conduct at a lower voltage, and the electrostatic protection function is activated.
第4圖顯示與第3圖相似的實施例,本實施例中係在N型井區11和P型井區21的交界處設置高濃度的P+摻雜區27。P+摻雜區27的設置目的同樣是為了調整靜電防護元件的觸發電壓。由N型井區11和P+摻雜區27所構成的接面,同樣可降低崩潰電壓,以提早啟動靜電防護功能。Fig. 4 shows an embodiment similar to Fig. 3, in which a high concentration P+ doping region 27 is provided at the junction of the N-type well region 11 and the P-type well region 21. The purpose of the P+ doping region 27 is also to adjust the trigger voltage of the ESD protection component. The junction formed by the N-type well region 11 and the P+ doped region 27 can also reduce the breakdown voltage to activate the ESD protection function early.
第5圖顯示本發明的另一個實施例。本實施例中,N+摻雜區17並非設置在N型井區11和P型井區21的交界處,而是與其相距一段預設距離d。根據距離d的長度,可將靜電防護元件的觸發電壓適當調整至介於第2圖與第3圖之間的範圍。Fig. 5 shows another embodiment of the present invention. In the present embodiment, the N+ doping region 17 is not disposed at the boundary of the N-type well region 11 and the P-type well region 21, but is spaced apart from the P-type well region 21 by a predetermined distance d. According to the length of the distance d, the trigger voltage of the static electricity protection element can be appropriately adjusted to a range between the second figure and the third figure.
第6圖顯示本發明的另一個實施例。本實施例中,P+摻雜區27並非設置在N型井區11和P型井區21的交界處,而是與其相距一段預設距離d’。根據距離d’的長度,可將靜電防護元件的觸發電壓適當調整至介於第2圖與第4圖之間的範圍Figure 6 shows another embodiment of the present invention. In the present embodiment, the P+ doping region 27 is not disposed at the junction of the N-type well region 11 and the P-type well region 21, but is spaced apart from the P-type well region 21 by a predetermined distance d'. According to the length of the distance d', the trigger voltage of the static electricity protection element can be appropriately adjusted to the range between the second figure and the fourth figure.
以上已針對較佳實施例來說明本發明,唯以上所述者,僅係為使熟悉本技術者易於了解本發明的內容而已,並非用來限定本發明之權利範圍。在本發明之相同精神下,熟悉本技術者可以思及各種等效變化,均應包含在本 發明的範圍之內。The present invention has been described with reference to the preferred embodiments thereof, and the present invention is not intended to limit the scope of the present invention. In the same spirit of the present invention, those skilled in the art can think of various equivalent changes, and should be included in this Within the scope of the invention.
11‧‧‧N型井區11‧‧‧N type well area
13‧‧‧P+摻雜區13‧‧‧P+ doped area
15‧‧‧N+摻雜區15‧‧‧N+ doped area
17‧‧‧N+摻雜區17‧‧‧N+ doped area
21‧‧‧P型井區21‧‧‧P type well area
23‧‧‧P+摻雜區23‧‧‧P+ doped area
25‧‧‧N+摻雜區25‧‧‧N+ doped area
27‧‧‧P+摻雜區27‧‧‧P+ doped area
100‧‧‧基體100‧‧‧ base
200‧‧‧放電路徑200‧‧‧discharge path
GND‧‧‧接地墊GND‧‧‧Grounding pad
PAD‧‧‧連接墊PAD‧‧‧ connection pad
第1圖為先前技術之矽控整流器靜電防護元件的剖面圖。Figure 1 is a cross-sectional view of a prior art controlled rectifier electrostatic protection element.
第2圖至第6圖示出本發明的數個實施例的剖面示意圖。2 to 6 show schematic cross-sectional views of several embodiments of the present invention.
11‧‧‧N型井區11‧‧‧N type well area
13‧‧‧P+摻雜區13‧‧‧P+ doped area
21‧‧‧P型井區21‧‧‧P type well area
23‧‧‧P+摻雜區23‧‧‧P+ doped area
25‧‧‧N+摻雜區25‧‧‧N+ doped area
200‧‧‧放電路徑200‧‧‧discharge path
GND‧‧‧接地墊GND‧‧‧Grounding pad
PAD‧‧‧連接墊PAD‧‧‧ connection pad
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Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| TW98100204A TWI382526B (en) | 2009-01-06 | 2009-01-06 | Isolated scr esd device |
| US13/345,694 US8710544B2 (en) | 2009-01-06 | 2012-01-07 | Isolated SCR ESD device |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| TW98100204A TWI382526B (en) | 2009-01-06 | 2009-01-06 | Isolated scr esd device |
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| TW201027707A TW201027707A (en) | 2010-07-16 |
| TWI382526B true TWI382526B (en) | 2013-01-11 |
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| TW98100204A TWI382526B (en) | 2009-01-06 | 2009-01-06 | Isolated scr esd device |
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Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20040115884A1 (en) * | 2002-08-02 | 2004-06-17 | Ting-Shing Wang | [dynamic random access memory cell and fabrication thereof] |
| US20040207021A1 (en) * | 2003-04-16 | 2004-10-21 | Russ Cornelius Christian | Low voltage silicon controlled rectifier (SCR) for electrostatic discharge (ESD) protection of silicon-on-insulator technologies |
| US20050145947A1 (en) * | 2000-11-06 | 2005-07-07 | Russ Cornelius C. | Silicon controlled rectifier electrostatic discharge protection device for power supply lines with powerdown mode of operation |
| US20050156202A1 (en) * | 2004-01-17 | 2005-07-21 | Hwa-Sung Rhee | At least penta-sided-channel type of FinFET transistor |
-
2009
- 2009-01-06 TW TW98100204A patent/TWI382526B/en not_active IP Right Cessation
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20050145947A1 (en) * | 2000-11-06 | 2005-07-07 | Russ Cornelius C. | Silicon controlled rectifier electrostatic discharge protection device for power supply lines with powerdown mode of operation |
| US20040115884A1 (en) * | 2002-08-02 | 2004-06-17 | Ting-Shing Wang | [dynamic random access memory cell and fabrication thereof] |
| US20040207021A1 (en) * | 2003-04-16 | 2004-10-21 | Russ Cornelius Christian | Low voltage silicon controlled rectifier (SCR) for electrostatic discharge (ESD) protection of silicon-on-insulator technologies |
| US20050156202A1 (en) * | 2004-01-17 | 2005-07-21 | Hwa-Sung Rhee | At least penta-sided-channel type of FinFET transistor |
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