1379991 六、發明說明： 【發明所屬之技術領域】 本發明是有關於一種發光裝置，特別是指一種用於高 溫物件之表面觀測的投光裝置。 【先前技術】 以1379991 VI. Description of the Invention: [Technical Field] The present invention relates to a light-emitting device, and more particularly to a light-emitting device for surface observation of a high-temperature object. [prior art]
隨著工業技術的進步’業界對於各式工件的品質要求 也越來越嚴苛，而在加工技術不斷進步的同時，能足夠精 確的掌握工件品質，才能有效減少廢品與廢料的產生 真正的提昇工業技術。 以軋延工件的表面品質來說，目前量測軋延工件表面 。口質的方式大致可以區分為兩大類，一種為接觸量測，另 一種則為非接觸量測，常見的接觸量測莫過於利用探針接 觸掃描軋延工件的表面後，進而得知該軋延工件的表面品 質是否滿足要求；而非接觸量測則是利用光學元件間接觀 測軋延工件的表面以獲知軋延工件的表面品質。 由於接觸量測的量測方式一來過於耗費時間（需以即 細微的探針接觸相對極巨大的 延工件的高溫產生磨耗，為了 現有廠商大多已改用如攝影 工件），一來探針也會因札 加快作業速度與降低成本； 機、相機、電荷耦合元件 (Charge-coupie(1 Device，CCD).··等光學元件間接觀測軋延工 件’以加快作業速度並降低成本。 但疋，軋延的工作溫度高，使得軋延工件的表面多呈 紅熱狀態’造成光學元件不易觀測軋延工件的表面情況. 再加上所有物質在高於絕對零度時皆會發出人類肉眼所不 可見的紅外光，更谷易於光學元件觀測軋延工件表面時產 生觀測誤差’因此，-般多採用$敏度較高的光學元件以 觀測軋延X件表面’克服軋延I件因表面紅熱狀態不易觀 測’及因高溫所散發紅外光影響觀測準確度的問題可是 ，靈敏度愈高的光學元件價格也愈#，無疑是變相增加了 廠商的設備成本，如何減少設備成本又能正確獲得軋延工 件的表面缺陷’已成為相關業者亟欲克服的問題。 【發明内容】 因此，本發明之目的，即在提供一種可將光線均句投 射於-高溢物件之表面上的用於高溫物件之表面觀測的投 光裝置。 於是，本發明用於高溫物件之表面觀測的投光裝置， 包含-發光單元’及一光學處理單元。該發光單元可產生 均勾投射於該高溫物件之表面的平行光，並沿該平行光的 投射方向定義有一光軸。 光學處理單元包括一位於該光軸上以接收該發光源 之平订光並產生聚焦之折射光的第一陣列透鏡及一位於 該光轴上以接收經該第一陣列透鏡聚焦之折射光並產生交 互重叠之二次折射光的第二陣列透鏡，其令，該第一陣列 透鏡與第：陣料鏡的透光面積與陣職距皆㈣，且該 第二陣列透鏡與第-陣列透鏡間形成有__第_間距，該第 一間距是等於陣列焦距除，其中，^大於】的實數。 本發明之功效是利用透光面積與陣列焦距皆相同的第 一陣列透鏡與第二陣列透鏡，同時配合料者的間距限制 」j於1倍的任一陣列焦距内，使該發光單元所投射出的 ·' >亍光’盈該第一、二陣列透鏡的折射後能均勻地投射於該 同/皿物件之表面’抵消物件表面因高溫所產生的顏色變化 與紅外線，提高觀測高溫物件之表面的準確度。 【實施方式】 有關本發明之前述及其他技術内容、特點與功效，在 x下配0參考圖式之三個較佳實施例的詳細說明中，將可 〉月楚的呈現。 在本發明被詳細描述之前，要注意的是，在以下的說 明内谷中，類似的元件是以相同的編號來表示。 >閱圖1，本發明用於高溫物件之表面觀測的投光裝置 1是可將光線均勻投射於-高溫物件1GG之表面上，該投光 裝置1之第一肖佳實施例包含一可產生均句投射於該高溫 物件100表面之平行光10的發光單元U，及一用以處理該 發光單元11所投射出之平行光1〇的光學處理單元12。 該發光單元U包括—反射罩ln，及—位於該反射罩 "1中的發光源112 ’其中’該反射| lu的斷面概呈拋物 線形’且形成有—開σ 113 ’而該發光源112所發出的光線 經該斷面概呈抛物線形之反射罩lu的導引形成平行光1〇 而自該開口 113射出，且該發光源112沿該平行光1〇投射 =向定義有-光軸L。於本較佳實施例中該發光源ιι2是一 问強度放電燈泡（High Intensity Discharge, HID)。 參閱圖1、2，言亥光學處理單元12包括一位於該光轴l 上以接收該發光單元n之平行光1()並產生㈣、之折射光 1379991 1〇的第一陣列透鏡121，及一位於該光轴L·上以接收經該 第一陣列透鏡121聚焦之折射光10，並產生交互重疊之二 次折射光ίο，，的第二陣列透鏡122，其中，該第―陣列透鏡 121的透光面積與陣列焦距，與第二陣列透鏡122的透光面 積與陣列焦距相同，且該第—、二陣列透鏡121、122皆具 有多數面積與排列方式相同的透鏡120，每一透鏡12〇皆呈 矩形且每一透鏡12〇的長度L|與寬度I?皆介於3公釐至9 公釐間，每一透鏡120的長度與寬度L2比則是介於i至 1.4間，由於該第一、二陣列透鏡121、n2之透鏡12〇的 大小與排列方式均相同，因此，冑2中僅以第—陣列透鏡 121作說明。 在此需要特別說明的是，平行光1〇經該第一陣列透鏡 121的所述透鏡12〇時會聚焦形成折射光1〇,，折射光w，經 該所述透鏡120的焦點後隨即發散，此時，折射光ι〇，的光 路徑改變如同倒影實像，亦即接近絲L之較高亮度的折 射光10’朝光轴L的外側投射，而遠綠L之較低亮度的折 射光10’朝光軸L的内側投射；所述折射光1()，在二倍陣列 焦距後開始互相重疊最後投射於高溫物件100的表面上， 但是’僅利用第-列透鏡121所述折射光1〇，在高溫物件 100所此產生的光重疊效果較差，因此，利用透光面積與陣 列焦距皆與第-陣列透鏡121相同的第：陣列透鏡122，縮 短折射光K)，的焦距’以提高二次折射光1〇，，於高溫物件 100上的重疊度，進而形成亮度均勻的亮區。由前述可知高 溫物件100上的亮區是由各透鏡12〇 @亮區重疊拼凑成， 1379991 因此透鏡120的尺寸過小或長寬比例過大，將造成折射光 10’與二次折射光10，’的外偏幅度不夠，導致光區亮度均勻 化不足。發明人經由多次的實驗得知，當每一透鏡的 長度Μ與寬度L2皆介於3公釐至9公釐間，且每一透鏡 120的長度L,與寬度l2比則是介於！至i 4間時二次折 射光1〇”於高溫物件1〇〇上的重疊效最好，亮區的亮度也最 為均勻。 於本較佳實施例中每一透鏡12〇的長度L & 5 〇公羞 ，而每-透鏡m的寬度L4 3·8公釐，每一透鏡12〇的 長度L,與寬度l2比則是i 3，且該第一、二陣列透鏡⑵ 、122的陣列焦距皆為58公爱，當然，每—透鏡⑶的長 度L,與寬度視實際需求作調整只要該第一陣列透鏡 ，、第一陣列透鏡122的透光面積與陣列焦距皆相同且 每一透鏡120的長度L,與寬度L2比則是介於i至i 4間即 、成4同力效並不應為本較佳實施例的揭露所囿限。 ^第一陣列透鏡i 22與第一陣列透鏡^間形成有一 第間距D,，該第—陣列透鏡121與該發光源⑴間則形 成有”於10公釐至110公釐之間的第二間距D2，而該第 陣列透鏡122與該高溫物件刚間則形成有一介於觸〇 a i至1300公髮之間的有效投射距離&，其中該第一間 距D,是等於陣列焦距除以n，其中，N為大於^的實數。 在此需要另外說明的是，由於該第—間距^等於陣列 了距除以N ’且N為大於1的實數，令該第二陣列透鏡122 疋位於1倍的陣列焦距内，使得折射光1G，是以聚光型式投 1379991 2第二陣列透鏡122上，造成第二陣列透鏡i22之所述 =⑽的亮區在高溫物件100上的重疊與整併效果佳； :第二陣列如22是位於1倍的陣列焦距外，使得折射 光是以發散型式投射於第二陣列透鏡122上造成第二 陣列透鏡122之所述透鏡12〇的亮區在高溫物件刚上的 重疊與整併效果差。With the advancement of industrial technology, the quality requirements of various types of workpieces are becoming more and more stringent in the industry. While the processing technology is continuously improving, the quality of the workpiece can be accurately grasped to effectively reduce the real increase of waste and waste. Industrial Technology. In terms of the surface quality of the rolled workpiece, the surface of the rolled workpiece is currently measured. The way of mouth quality can be roughly divided into two categories, one is contact measurement and the other is non-contact measurement. The common contact measurement is to use the probe contact to scan the surface of the workpiece and then know the rolling. Whether the surface quality of the workpiece is satisfactory or not; the non-contact measurement uses the optical component to indirectly observe the surface of the rolled workpiece to know the surface quality of the rolled workpiece. Because the measurement method of contact measurement is too time consuming (the need to use the fine probe to contact the relatively high temperature of the workpiece to produce wear, for the existing manufacturers have mostly changed to use photographic parts), the probe also In order to speed up the operation and reduce the cost, the machine, camera, and charge-coupled components (Charge-coupie (1 Device, CCD), etc.) can be used to speed up the operation and reduce the cost. The working temperature of the rolling is high, so that the surface of the rolled workpiece is red hot. This causes the optical component to be difficult to observe the surface condition of the rolled workpiece. In addition, all substances will be invisible to the human eye when they are above absolute zero. Infrared light, more valleys are easy to observe the error when observing the surface of the workpiece by optical components. Therefore, it is generally difficult to use the optical element with higher sensitivity to observe the surface of the rolled X piece. Observing 'and the problem of the accuracy of the observation caused by the infrared light emitted by the high temperature, the higher the sensitivity of the optical component is, the more it is, the undoubted increase in disguise The manufacturer's equipment cost, how to reduce the equipment cost and the correct obtaining of the surface defects of the rolled workpiece have become a problem that the relevant industry has been trying to overcome. [Invention] Therefore, the object of the present invention is to provide a light sentence. A light projecting device for observing the surface of a high temperature object projected on the surface of the high overflow object. Thus, the light projecting device for surface observation of a high temperature object of the present invention comprises a light emitting unit and an optical processing unit. The light emitting unit generates parallel light that is uniformly projected on the surface of the high temperature object, and defines an optical axis along a projection direction of the parallel light. The optical processing unit includes a flat optical light on the optical axis to receive the light source and Generating a first array lens of focused refracted light and a second array lens positioned on the optical axis to receive refracted light focused by the first array lens and producing alternating overlapping secondary refracted light, such that the first The light transmissive area and the array working distance of the array lens and the first array mirror are both (4), and a ____ spacing is formed between the second array lens and the first array lens. A spacing is equal to the array focal length divided, wherein ^ is greater than the real number. The effect of the present invention is to use the first array lens and the second array lens with the same light transmission area and array focal length, while the spacing of the batcher is limited. In the focal length of any one of the arrays, the '' > light' projected by the light-emitting unit can be uniformly projected onto the surface of the same object by the refraction of the first and second array lenses. The color change of the surface of the object due to high temperature and infrared rays improve the accuracy of observing the surface of the high temperature object. [Embodiment] The above-mentioned and other technical contents, features and effects of the present invention are assigned to the reference pattern 3 under x. In the detailed description of the preferred embodiments, the present invention will be described in detail. > Referring to Figure 1, the light projecting device 1 for surface observation of a high temperature object is capable of uniformly projecting light onto the surface of the high temperature object 1GG. The first schematic embodiment of the light projecting device 1 includes a An illumination unit U for generating parallel light 10 projected on the surface of the high temperature object 100, and an optical processing unit 12 for processing the parallel light 1 投射 projected by the illumination unit 11 are generated. The light-emitting unit U includes a reflection cover ln, and a light-emitting source 112' located in the reflection cover "1, wherein the reflection|lu is substantially parabolic in shape and formed with -σ 113 ' and the illumination The light emitted by the source 112 is emitted from the opening 113 by the projection of the parabolic reflector 52, and the illumination source 112 is projected along the parallel light. Optical axis L. In the preferred embodiment, the illumination source ιι is a High Intensity Discharge (HID). Referring to Figures 1 and 2, the optical processing unit 12 includes a first array lens 121 on the optical axis 1 for receiving the parallel light 1() of the light-emitting unit n and generating (4), the refracted light 1379991 1〇, and a second array lens 122 on the optical axis L· for receiving the refracted light 10 focused by the first array lens 121 and generating mutually overlapping secondary refracted light, wherein the first array lens 121 The light transmissive area and the array focal length are the same as the arrayed focal length of the second array lens 122, and the first and second array lenses 121 and 122 each have a lens 120 having the same area and arrangement, and each lens 12 The 〇 are rectangular and the length L| and the width I? of each lens 12 皆 are between 3 mm and 9 mm, and the ratio of the length to the width L2 of each lens 120 is between i and 1.4, The size and arrangement of the lenses 12 of the first and second array lenses 121 and n2 are the same. Therefore, only the first array lens 121 will be described in the second embodiment. It should be particularly noted that when the parallel light 1 passes through the lens 12 of the first array lens 121, it will focus to form the refracted light 1 〇, and the refracted light w will be diverged after the focus of the lens 120. At this time, the light path of the refracted light is changed like a reflection real image, that is, the refracted light 10' of the higher brightness close to the filament L is projected toward the outside of the optical axis L, and the refracted light of the lower luminance of the far green L 10' is projected toward the inner side of the optical axis L; the refracted light 1() starts to overlap each other after the double array focal length and finally projects on the surface of the high temperature object 100, but 'the refracted light is only utilized by the first column lens 121 In other words, the light overlapping effect generated by the high temperature object 100 is poor. Therefore, the focal length of the refracted light K) is shortened by using the same array lens 122 whose light transmission area and array focal length are the same as those of the first array lens 121. Increasing the degree of overlap of the secondary refracted light 1 〇 on the high temperature object 100, thereby forming a bright region with uniform brightness. It can be seen from the foregoing that the bright areas on the high temperature object 100 are assembled by overlapping the lenses 12 亮 @ bright areas, 1379991. Therefore, the size of the lens 120 is too small or the ratio of the length to the width is too large, which will cause the refracted light 10' and the secondary refracted light 10, ' The external bias is not enough, resulting in insufficient brightness uniformity in the light zone. The inventors have learned through many experiments that when the length Μ and the width L2 of each lens are between 3 mm and 9 mm, and the length L of each lens 120 is proportional to the width l2, it is between! The overlap of the secondary refracted light 1 〇 on the high temperature object 1 最好 is best, and the brightness of the bright area is also the most uniform. In the preferred embodiment, the length L & 5 〇公羞, and each lens m has a width L4 3·8 mm, a length L of each lens 12〇, a ratio i2 to the width l2, and an array of the first and second array lenses (2), 122 The focal length is 58 gongs. Of course, the length L of each lens (3) and the width are adjusted according to actual needs. As long as the first array lens, the light transmission area of the first array lens 122 and the array focal length are the same and each lens The length L of 120 and the width L2 are between i and i4, that is, the same effect is not limited to the disclosure of the preferred embodiment. ^ First array lens i 22 and first A first spacing D is formed between the array lenses, and a second spacing D2 between 10 mm and 110 mm is formed between the first array lens 121 and the illumination source (1), and the first array lens 122 is The high temperature object immediately forms an effective projection distance & between the touchpad ai and 1300 angstroms, wherein the first pitch D is The focal length of the array divided by n, where, N is a real number greater than ^. It should be additionally noted that, since the first spacing ^ is equal to the real distance divided by N ' and N is greater than 1, the second array lens 122 is located within 1 times of the array focal length, so that the refracted light 1G The 1379991 2 second array lens 122 is cast on the concentrating pattern, so that the bright area of the =(10) of the second array lens i22 is superimposed and integrated on the high temperature object 100; the second array is 22 It is located outside the focal length of the array, so that the refracted light is projected onto the second array lens 122 in a divergent pattern, so that the bright region of the lens 12 of the second array lens 122 is poorly overlapped and consolidated on the high temperature object. .
於本較佳實施例中N等於3 _7，而第一間距仏等於 公羞、第二間距D2等於85公羞，而該有效投射距離 等於1093公釐’當然，該第一、二間距a、a及有效投 射距離D3可視實際需求作調整，只要該第-間距Dl是等於 陣列焦距除以N’其中’N為大於！的實數，亦即該第一間 距〇1是小於丨倍的任—陣聽㈣，即可達成相同的功效 ，並不應為本較佳實施例的揭露所囿限。In the preferred embodiment, N is equal to 3 _7, and the first spacing 仏 is equal to the male shame, the second spacing D2 is equal to 85 hum, and the effective projection distance is equal to 1093 metrics. Of course, the first and second spacings a, a and the effective projection distance D3 can be adjusted according to actual needs, as long as the first interval D1 is equal to the array focal length divided by N' where 'N is greater than! The real number, that is, the first distance 〇1 is less than 丨 times, the same effect can be achieved, and should not be limited by the disclosure of the preferred embodiment.
—參閱圖1及附件丨’本發明利用透光面積與陣列焦距相 同的第一、二陣列透鏡121、122，並令該第一 '二陣列透 鏡121、122 _第一間距Di是小於i倍的任一陣列焦距内 ，使該發光單it 11所投射出的平行光1G經該第一、二陣 列透鏡121、122的折射後相互交疊成為二次折射光1〇，，， 進而如附件1所示地均勻地投射於該高溫物件之表面 ，形成一呈矩形的亮區有效抵消高溫物件100之表面因高 溫所產生的顏色變化與紅外線，亦避免光線過份集中而形 成明顯的明暗區分，以提高觀測高溫物件100之表面的準 確度。在此需要特別說明的是，為凸顯亮區的型態，發明 人疋利用綠色透光片加遮罩再擷取而得到附件丨，因此，附 1379991 件1中的亮區是呈現綠色。- Referring to FIG. 1 and the accompanying FIG. 2, the first and second array lenses 121 and 122 having the same light-transmitting area as the array focal length are used, and the first 'two-array lens 121, 122_the first pitch Di is less than i times. In any of the array focal lengths, the parallel light 1G projected by the light-emitting unit 11 is mutually refracted by the first and second array lenses 121 and 122 to become secondary refraction light 1〇, and further, as an attachment. Uniformly projected on the surface of the high-temperature object as shown in FIG. 1 to form a rectangular bright region, which effectively offsets the color change and infrared rays generated by the high temperature of the surface of the high-temperature object 100, and also avoids excessive concentration of light to form an obvious light-dark distinction. To improve the accuracy of observing the surface of the high temperature object 100. It should be particularly noted here that in order to highlight the type of the bright area, the inventors used the green light-transmissive sheet and the mask to obtain the attachment 丨. Therefore, the bright area in the 1379991 item 1 is green.
參閱圖3與附件1 ’發明人更進—步針對附件1中呈綠 色的亮區進行色階分析，獲得如圖3巾χ所指之綠色YReferring to Figure 3 and Annex 1 'the inventor is more advanced—steps the color gradation analysis for the bright areas in green in Annex 1, and obtains the green Y as indicated in Figure 3
所指之紅色，及ζ所指之藍色的色階變化，其中，圖3中 Υ所指之紅色及Ζ所指之藍色的變化緩和，唯X所指之綠 色的色階中間處較為飽和，推估原因，為發明人是利用綠 色透光片遮罩以凸顯附件丨之亮區，所以圖3中X所指之 綠色的色階中心處較γ所指之紅色，及ζ所指之藍色的色 Ρ皆更為飽和，亦即附件i中亮區之所以呈現綠色的主因。The red color and the blue color gradation change indicated by ζ, wherein the red and Ζ indicated by the Υ in Figure 3 are moderately changed, except that the green color gradation indicated by X is more Saturating, estimating the reason, for the inventor to use the green transparent sheet mask to highlight the bright area of the attachment, so the green color gradation center indicated by X in Figure 3 is more red than the γ, and The blue color is more saturated, which is the main reason why the bright area in the attachment i is green.
參閱圖4本發明用於面溫物件之表面觀測的投光裝置 1之第二較佳實施例，大致上是與該第—較佳實施例相同， 包含一可產生均勻投射於該高溫物件100表面之平行光 的發光單元11 ’及一用以處理該發光單元u所投射出之 行光w的光學處理單元12，其中，不相同之處在於：該光 學處理單元12更包括—位於該光軸L上且可接收經該第二 陣列透鏡122聚焦之二次折射光1G’’的凹透鏡123。於本較 佳實施例中該凹透鏡123的焦距是25〇公釐，並與該 陣列透鏡122間隔30公釐. 、 在發光源112與該高溫物件1〇〇間的距離與該第一較 佳實施例相同的情況下’利用該凹透鏡123可將經該第二 陣列透鏡122聚焦之二次折射光1G，，加以放大，有效增加發 光單元11均勻地投射於該高溫物件1〇〇之表面上的面積， 增加所能觀測高溫物件100之表面的面積，進而提高掌握 高溫物件100之表面品質的能力。 >閱圖5，本發明用於南溫物件之表面觀測的投光裝置 1之第三較佳實施例，大致上是與該第一較佳實施例相同， 匕3 "T產生均勻投射於該南溫物件表面之平行光1〇的發 光單元11，及一用以處理該發光單元u所投射出之平行光 1_〇的光學處理單it 12’其中，不相同之處在於：該發光單 凡11的反射罩111斷面是概呈橢圓形，並更包括一介於該 第—陣列透鏡121與該發光源112間的平行光化元件114, 斷面概呈橢圓形的反射罩ln能對發光源112所發出的光 產生聚焦效果，聚焦的光經由該平行光化元件114的平行 光化作用可產生平行光i 〇，以達成如該第—較佳實施例相 同之效果。於本較佳實施例中，該平行光化元件114是一 焦點與該反射罩111之焦點重疊的凸透鏡。 ”’示上所述，本發明用於兩溫物件之表面觀測的投光裝 置1利用透光面積與陣列焦距相同的第一、二陣列透鏡121 、122，配合該第一間距Di進而將該第二陣列透鏡122設置 於陣列焦距内，使該發光單元U所投射出的平行光1〇經該 第一、二陣列透鏡121、122的折射後能相互交疊成二次折 射光10’’ ’進而均勻地投射於該高溫物件1〇〇之表面，抵消 高溫物件100之表面因高溫所產生的顏色變化與紅外線， 提高觀測高溫物件100之表面的準確度。故確實能達成本 發明之目的。 惟以上所述者，僅為本發明之較佳實施例而已，當不 能以此限定本發明實施之範圍，即大凡依本發明申請專利 範圍及發明說明内容所作之簡單的等效變化與修飾皆仍 1379991 屬本發明專利涵蓋之範圍内。 【圖式簡單說明】 圖1是一示意圖，說明本發明用於高溫物件之表面觀 測的投光裝置之第一較佳實施例的態樣； 圖2是一正視圖，說明該第一較佳實施例第一陣列透 鏡的規格， 圖3是一分析圖，輔助說明附件丨中亮區的色階變化 情形； 圖4是一示意圖，說明本發明用於高溫物件之表面 測的投光裝置之第二較佳實施例的態樣；及 圖5是一不意圖，說明本發明用於高溫物件之表 測的投光裝置之第三較佳實施例的態樣。 1379991 【主要元件符號說明】 1…… ……投光裝置 l2•…· •…寬度 10·.··· •…平行光 12 …·光學處理單元 10,… •…折射光 120… …·透鏡 10，， …·二次折射光 121… …·第一陣列透鏡 100… 南物件 122… •…第二陣列透鏡 11…… •…發光單元 123… •…凹透鏡 111··· •…反射罩 D,…· …·第一間距 112·· •…發光源 d2…… …第二間距 113··· .…開口 d3… 有政又射距離 114 ··· …·平行光化元件 X....... •…綠色的色階 T ...... •…止击山 V....... 众认众 ilfcb L· 无罕由 1 ?工巴的巴1¾ L,…· …·長度 Z....... …·藍色的色階Referring to FIG. 4, a second preferred embodiment of the light projecting device 1 for surface observation of a surface temperature article of the present invention is substantially the same as the first preferred embodiment, and includes a uniform projection onto the high temperature object 100. The light-emitting unit 11 ′ of the parallel light of the surface and the optical processing unit 12 for processing the traveling light w projected by the light-emitting unit u, wherein the difference is that the optical processing unit 12 further includes the light A concave lens 123 on the axis L and receiving the secondary refracted light 1G'' focused by the second array lens 122. In the preferred embodiment, the focal length of the concave lens 123 is 25 mm, and is spaced apart from the array lens 122 by 30 mm. The distance between the illumination source 112 and the high temperature object 1 is the first preferred. In the same case, the secondary refracted light 1G focused by the second array lens 122 can be enlarged by the concave lens 123, thereby effectively increasing the light-emitting unit 11 uniformly projected on the surface of the high-temperature object 1〇〇. The area increases the area of the surface of the high temperature object 100 that can be observed, thereby improving the ability to grasp the surface quality of the high temperature object 100. > Referring to Figure 5, a third preferred embodiment of the light projecting device 1 for surface observation of a south temperature object of the present invention is substantially the same as the first preferred embodiment, and 匕3 "T produces uniform projection The light-emitting unit 11 of the parallel light of the surface of the south temperature object and the optical processing unit 1 12' for processing the parallel light 1_〇 projected by the light-emitting unit u are different in that: The reflector 111 of the illuminating unit 11 has a substantially elliptical cross section, and further includes a parallel illuminating element 114 interposed between the first array lens 121 and the illuminating source 112, and an elliptical reflecting cover ln A focusing effect can be produced on the light emitted by the illumination source 112, and the focused light can generate parallel light i 经由 via the parallel actinization of the parallel actinic element 114 to achieve the same effect as the first preferred embodiment. In the preferred embodiment, the parallel actinic element 114 is a convex lens having a focal point that overlaps the focus of the reflector 111. As shown, the light projecting device 1 for surface observation of a two-temperature object of the present invention utilizes first and second array lenses 121 and 122 having the same light-transmitting area as the array focal length, and the first pitch Di is used to The second array lens 122 is disposed in the focal length of the array, so that the parallel light 1 projected by the light-emitting unit U can be overlapped with the first and second array lenses 121 and 122 to form a secondary refracted light 10'' Further, it is uniformly projected on the surface of the high-temperature object 1 to offset the color change and infrared rays generated by the high temperature of the surface of the high-temperature object 100, thereby improving the accuracy of observing the surface of the high-temperature object 100. Therefore, the object of the present invention can be achieved. The above is only the preferred embodiment of the present invention, and the scope of the invention is not limited thereto, that is, the simple equivalent changes and modifications made by the scope of the invention and the description of the invention. Still 1371999 is within the scope of the present invention. [Schematic Description] FIG. 1 is a schematic view showing the light projecting device of the present invention for surface observation of a high temperature object. 2 is a front view showing the specifications of the first array lens of the first preferred embodiment, and FIG. 3 is an analysis diagram for explaining the gradation change of the bright area in the attachment 丨4 is a schematic view showing a second preferred embodiment of the light projecting device for surface measurement of a high temperature object of the present invention; and FIG. 5 is a schematic view showing the measurement of the high temperature object of the present invention. Aspect of the third preferred embodiment of the light projecting device 1379991 [Explanation of main component symbols] 1...... ......light-emitting device l2•...·•...width 10·····•...parallel light 12 ...· Optical processing unit 10, ........ refracted light 120... lens 10, ... secondary refraction light 121... first array lens 100... south object 122... • second array lens 11... Unit 123... •...Concave lens 111···•...reflector D,...···first pitch 112··•...light source d2...the second pitch 113····.open d3... Distance 114 ··· ...·parallel actinic element X....... •...green Order T ...... •...stop mountain V....... acknowledgment ilfcb L· no rare 1? work bus bar 13⁄4 L,...·... length Z..... .. ...·blue level
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