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TWI377270B
TWI377270B TW98100479A TW98100479A TWI377270B TW I377270 B TWI377270 B TW I377270B TW 98100479 A TW98100479 A TW 98100479A TW 98100479 A TW98100479 A TW 98100479A TW I377270 B TWI377270 B TW I377270B
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substrate
metal
gold
metal nanoparticle
nanoparticle film
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TW98100479A
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TW201026907A (en
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Univ Nat Chunghsing
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1377270 t、發明說明: 【發明所屬之技術領域】 本發明是有關於-種奈米粒子薄膜之製法,特別是指 一種密集度高的單層金屬奈米粒子薄膜之製法。 【先前技術】 * 近年來由於石夕等無機材料短缺,限制了許多科技應用 的發展’因此有機材料的發展活絡了起來,但有機材料:效 能仍遠遠不及無機材料’因此,無機材料與有機㈣的处人 應用變成目前最熱門的研究,另外,積極尋找其他可替纽 具(較佳應用效能的無機材料也是值得研究開發的方向。 無機材料中以金(Au)最為熱門,由於金的化性與物性释 ^且無生物毒性’因此’―直以來都是科學家感興趣的㈣ 題材。早年的研究多針對金在水溶液中的性f作探討。近年 來,因發現將金粒子舖丨麗在基板上製作成金奈辣子薄膜後 =特殊的光學性質,因此這類研究成果也如雨後春荀般大 子薄膜外,以其他種類金屬所 i出的'米粒子薄膜同樣能透過其奈米尺 的光學與物質性皙,芬拉山, 寸κ座生将殊 9形成固體薄膜的方式增加應用的 万便性。 /閱圖1以下為現有的—種金奈 該製法包含下列步帮: 卞㈣的1法 步轉ΗΠ是提供-料乾淨的基板; 理^驟1〇2是提供一四氣金酸水溶液,並經由特定的處 理㈣將該四氣金酸水溶液製成-金奈米粒子水溶液,通常 1377270 所用的處理程序為水相合成法或相轉移法,此二種方法的進 行方式分別如下所述: =水相合成法:進行方式是將已加熱至預定溫度的還 原片丨/合液加入已加熱至預定溫度的四氣金酸水溶液中形成— 混合液,並於定溫下持續攪拌一段時間後,再將該混合液置 於20 C〜3〇t的環境下冷卻,就能製得該金奈米粒子水溶液 。其中,還原劑溶液中的還原劑為一選自下列群組中的物質 :檸檬酸、丹寧酸、硼氫化鈉、四級銨鹽,及檸檬酸三鈉鹽 〇 (2)相轉移法:進行方式是將四氣金酸溶於水,並將四 級銨鹽與正十二烷基硫醇溶於甲苯溶液,將前述二種溶液混 合攪拌後,再加入硼氫化鈉使該四氯金酸溶液中的金離子 (III)被還原為金原子,進而堆積為金奈米粒子及形成該金奈 米粒子水溶液,此時,有機相中的硫醇會吸附在生成的金奈 米粒子表面,以穩定該等奈米粒子,避免其相互聚集並限制 其粒徑大小。 步驟103是將該基板浸入已製作好的金奈米粒子水溶 液中,並藉由該基板與金奈米粒子間的吸附力作用大小決定 改泡時間’最終可使該等金奈米粒子沉積在該基板上及形成 一金奈米粒子薄膜。 雖然現有的金奈米粒子薄膜的製法已具有可在該基板 上製造出金薄膜材料的特性’但實際仍存有下列缺失: 一、以現有製法製備金奈米粒子薄膜時,須先以水相 合成法或相轉移法配製出金奈米粒子水溶液後,再將基板浸 4 1377270 入已製備好的金屬奈米粒子溶液中,使該等金奈米粒子在該 基板沉積形成金奈綠子薄膜,其巾,配製該金奈米粗子^ 溶液的過程繁靖且耗時,使現有金屬奈綠子薄膜的製法具 有製造程序較多且較煩雜的缺點。 八 二、 由於一般金奈米粒子與基板間的作用力不強,而 無法在該基板上形成高密度的臺屬奈米粒子薄膜,當該基板 上的金屬奈米粒子密度不高時’也會使其催化特性較不二, 而降低應用效果,使現有金屬奈米粒子薄膜的製法相對具有 不易順利製出高密度金屬奈米粒子薄膜的缺點。 三、 由於奈米粒子容易產生自身聚集(aggregati〇n)的情 形,為避免發生這種情況,通常會在配製金屬奈米粒子溶液 時加入檸檬酸鈉或是硫醇類等分子為主的保護劑,以包覆奈 米粒子,使粒子呈分散而不易聚集的狀態,但具有此種功能 的保護劑其對粒子的作用力也較大,因此在沉積形成金屬奈 米粒子薄膜後,相對較不易自該等金屬奈米粒子表面去除這 些保護劑,而影響到該金屬奈米粒子薄膜的性能與應用性。 四、 以現有製法所製出的金屬奈米粒子薄膜易形成多 層型式,而多層的金屬奈米粒子薄膜容易形成聚集而雜亂 的排列狀態,同樣·會使該金屬奈米粒子薄膜的光電性能受 到影響,而降低其應用性。 【發明内容】 因此,本發明的目的’是在提供一種以製程相對較簡 單且成本便宜的電化學沉積法’直接在一基板上合成單層 且高密度的金屬奈米粒子薄膜的單層金屬奈米粒子薄膜之 5 製法。 於是’本發明單層金屬奈米粒子薄膜之製法,包含下 列步驟: ⑴提供一經矽烷偶聯類分子修飾的基板; (ii)配製一金屬電解液’該金屬電解液包含依預定比例 相混合的一金屬化合物組份及一界面活性劑组份,該金屬 化合物組份中具有多數個分別結合有預定金屬離子的金屬 化合物;及 (m)將經修飾的基板直接浸入該金屬電解液中,並以電 化學沉積方式使該金屬化合物組份中的該等金屬離子被還 原為金屬奈米粒子,及在該基板沉積形成一金屬奈米粒子 薄膜。 本發明的有益效果在於:配合電化學沉積方式,直接 將該基板浸入該金屬電解液中就能形成該金屬奈米粒子薄 膜,並能藉由該金屬電解液中的界面活性劑,直接在由該 等金屬離子..所還原形成的金屬奈米粒子表面形成一層分子 膜,以有效防止相互聚集的情形,配合以矽烷偶聯^分子 修飾的基板,使該等金屬奈米粒子與該等矽烷偶聯類分子 間形成穩定的共價鍵結’及減少金屬粒子與金屬粒子間鍵 結聚集而生長成較大粒徑的金屬粒子的情形,藉此,可製 出粒徑較小且密度較高的金屬奈米粒子薄膜,使本發明可 以較簡單及成本較低的電化學沉積法製出單層且高密度的 金屬奈米粒子薄膜,使所製出的金屬奈求粒子薄膜相:能 表現較佳的應用效能,而具有可商業化應用的價值。 【實施方式】 有關本發明之前述及其他技術内容、特點與功效,在 以下配合參考圖式之一個較佳實施例的詳細說明中,將可 清楚的呈現。 參閱圖2與圖3,本發明單層金屬奈米粒子薄膜之製法 的較佳實施例包含下列步驟: 步驟201是提供一經矽烷偶聯類分子修飾的基板31。 其中,該矽烷偶聯類分子的一端具有一選自下列群組 中的基團:硫醇基(-SH)及氨基(-NH3)。為了之後能在基板 沉積形成較高密度且粒徑小的金屬奈米粒子薄膜,較佳是 使用具有硫醇基的矽烷偶聯類分子,在該較佳實施例中, 是使用硫醇基丙基三曱氧基石夕烧((3- mercaptopropyl)trimethoxysilane,簡稱為 MPTMS)作為該石夕 烷偶 I如下: OCH3 /令'och3 〇ch3 (^Mercaptopropyl^rimedioxysilane (MPTMS) 該基板31是選用具有導電性質的基板,.在該實施例中 ,該基板具有一導電薄膜,該導電薄膜為一選自下列群組 中的材質所製成:氧化銦錫(tin-doped indium oxide,簡稱 為 ITO)、氧化鋅銦(indium-doped zinc oxide,簡稱為 IZO) 、氧化鋅铭(aluminum-doped zinc oxide,簡稱為 AZO),及 氧化辞嫁(gallium-doped zinc oxide,簡稱為 GZO)。 1377270 該基板31進行修舞前須先經清洗處理與去除氧化層處 理’使該基板路出4基端(·〇Η),如此可使基板順利地盘 石夕烧偶聯㈣切行切聚合的反應。 ” 步驟2〇2疋配製一金屬電解液30,該金屬電解液3〇包 含依預定比例相混合的-金屬化合物組份及-界面活性劑 組份’該金屬化合物纟續中具有多數個分別結合有預定金 屬離子的金屬化合物。 其中,該金屬化合物組份令的該等金屬離子為一選自 下列群組中的金屬所形成:金、銀、銅、釕(Ru)、飾㈣、 鐵及錄。在該較佳實施例中,該等金屬離子實質上為金離 子’及該金屬化合物組份中的該等金屬化合物是使用四氣 金酸(H(AuC14))。 步驟203是將經修飾的基板31直接浸入該金屬電解液 3〇中,並以電化學沉積方式使該金屬化合物組份中的該等 金屬離子被還原為金屬奈米粒子,及在該基板31沉積形成 一金屬奈米粒子薄膜。 較佳地,電化學沉積方式是採用以一工作電極Ο、一 輔助電極42及一參考電極43所形成的三電極系统4〇..,且 該工作電極41是與已修飾有石找偶聯類分子的基板3ι相 連接,該輔助電極42為白金絲,及該參考電極Μ為銀/氯 化銀(Ag/AgCl)。藉此,使該金屬電解液3〇中的金屬離子被 還原為金屬原子後’再與該基板31上的梦院偶聯類分子共 價鍵結,以在該基板31沉積形成該金屬奈米粒子薄膜。在 i貫細例_,疋使該金屬電解液3〇中的四氯金酸中的金離 8 1377270 子還原為金奈米粒子後,再與該 ^ ^ , 几1^如類分子共價鍵ί士 而在該基板31形成該金屬奈米粒子相。 , 較佳地,在步驟203中的界面活性劑可充當電解質, 並能利用其親水端的負電環境來達到吸引金屬離子果 。界面活性劑除了可以幫助導電外,還可以作為穩定劑以 防止金屬粒子聚集的現象,而兼 叫衆具有助導電劑和穩定劑的 其中,DBSA的化學式如下: Ο CH3(CH2)121377270 t, DESCRIPTION OF THE INVENTION: TECHNICAL FIELD The present invention relates to a method for producing a nanoparticle film, and more particularly to a method for producing a highly dense single-layer metal nanoparticle film. [Prior Art] * In recent years, due to the shortage of inorganic materials such as Shi Xi, the development of many scientific and technological applications has been limited. Therefore, the development of organic materials has become more active, but organic materials: performance is still far less than inorganic materials. Therefore, inorganic materials and organic materials (4) The application of the person becomes the most popular research at present. In addition, actively looking for other substitutes (the inorganic materials with better application efficiency are also worthy of research and development. Among the inorganic materials, gold (Au) is the most popular due to gold Chemical and physical release ^ and no biological toxicity 'so' is a scientist's interest (4) subject matter. Early research focused on the sexuality of gold in aqueous solution. In recent years, due to the discovery of gold particles After making the Chennai Spicy Film on the substrate = special optical properties, so the research results are like the film of the spring after the rain, the rice particle film produced by other kinds of metals can also pass through its nanometer The optical and material properties of the 芬, Fenla Mountain, 寸 座 将 将 9 9 形成 形成 形成 形成 形成 形成 形成 形成 形成 形成 形成 形成 形成 形成 形成 形成 形成 形成 形成 形成 形成 形成 形成Some - Chennai This method includes the following steps: 卞 (4) 1 step transfer is to provide a clean substrate; handle 1 〇 2 is to provide a four gas gold acid solution, and through a specific treatment (four) The four-gas gold acid aqueous solution is made into an aqueous solution of gold nanoparticles, and the treatment procedure usually used for 1377270 is an aqueous phase synthesis method or a phase transfer method, and the two methods are carried out as follows: = aqueous phase synthesis method: The method comprises the steps of: adding a reduced flake/liquid mixture heated to a predetermined temperature to a four-gas gold acid aqueous solution heated to a predetermined temperature to form a mixed liquid, and continuously stirring at a constant temperature for a period of time, and then the mixed liquid The gold nanoparticle aqueous solution can be prepared by cooling in an environment of 20 C to 3 Torr, wherein the reducing agent in the reducing agent solution is a substance selected from the group consisting of citric acid and tannic acid. , sodium borohydride, quaternary ammonium salt, and trisodium citrate bismuth (2) phase transfer method: the method is to dissolve four gas gold acid in water, and the quaternary ammonium salt and n-dodecyl mercaptan Dissolved in a toluene solution, after mixing and stirring the above two solutions, Further, sodium borohydride is added to reduce the gold ion (III) in the tetrachloroauric acid solution to a gold atom, and further to form a gold nanoparticle and form an aqueous solution of the gold nanoparticle. At this time, the mercaptan in the organic phase It will adsorb on the surface of the formed gold nanoparticles to stabilize the nanoparticles, avoiding their aggregation and limiting the particle size. Step 103 is to immerse the substrate in the prepared aqueous solution of gold nanoparticles and borrow The size of the adsorption force between the substrate and the gold nanoparticles determines the bubble change time. Finally, the gold nanoparticles can be deposited on the substrate and form a gold nanoparticle film. Although the existing gold nanoparticle film The preparation method has the characteristics of producing a gold thin film material on the substrate 'but there are actually the following defects: 1. When preparing the gold nanoparticle film by the existing method, it must be prepared by aqueous phase synthesis or phase transfer method. After extracting the aqueous solution of the gold nanoparticles, the substrate is immersed in the prepared metal nanoparticle solution, and the gold nanoparticles are deposited on the substrate to form a Chennai green film. The crude sub-system Jinnai Mi ^ solution process complicated and time-consuming Jing, green sub-Nai existing metal film production method has more and more complicated manufacturing processes disadvantages. 82. Because the interaction between the general gold nanoparticles and the substrate is not strong, it is impossible to form a high-density nano-particle film on the substrate. When the density of the metal nanoparticles on the substrate is not high, The catalytic properties are not the same, and the application effect is lowered, so that the conventional metal nanoparticle film has a disadvantage that it is difficult to smoothly produce a high-density metal nanoparticle film. Third, because the nanoparticles are prone to self-aggregation (aggregati〇n), in order to avoid this, it is usually added to the metal nanoparticle solution to add molecular protection such as sodium citrate or thiol. The agent covers the nano particles to make the particles dispersed and not easy to aggregate. However, the protective agent having such a function has a large force on the particles, so it is relatively difficult to form a metal nanoparticle film after deposition. The removal of these protective agents from the surface of the metal nanoparticles affects the properties and applicability of the metal nanoparticle film. 4. The metal nanoparticle film produced by the existing method is easy to form a multi-layer type, and the multilayer metal nanoparticle film is easy to form agglomerated and disorderly arrangement state, and the photoelectric property of the metal nanoparticle film is also affected. Influence, while reducing its applicability. SUMMARY OF THE INVENTION Accordingly, it is an object of the present invention to provide a single layer metal of a single layer and high density metal nanoparticle film directly on a substrate by electrochemical deposition method which is relatively simple and inexpensive to manufacture. 5 method of nanoparticle film. Thus, the method for preparing the single-layer metal nanoparticle film of the present invention comprises the following steps: (1) providing a substrate modified with a decane-coupled molecule; (ii) preparing a metal electrolyte comprising a predetermined ratio of phases a metal compound component having a plurality of metal compounds respectively bonded with a predetermined metal ion; and (m) directly immersing the modified substrate in the metal electrolyte, and a surfactant component The metal ions in the metal compound component are reduced to metal nanoparticles by electrochemical deposition, and a metal nanoparticle film is deposited on the substrate. The invention has the beneficial effects that the metal nanoparticle film can be formed by directly immersing the substrate in the metal electrolyte solution by electrochemical deposition, and can be directly used by the surfactant in the metal electrolyte solution. The metal ions: the surface of the metal nanoparticles formed by the reduction form a molecular film to effectively prevent mutual aggregation, and the substrate modified with the decane coupling molecule is used to make the metal nanoparticles and the decane The formation of a stable covalent bond between the coupled molecules and the reduction of the bonding between the metal particles and the metal particles to form a metal particle having a larger particle diameter, thereby making it possible to produce a smaller particle size and a higher density. The high metal nanoparticle film enables the invention to produce a single-layer and high-density metal nanoparticle film by a relatively simple and low-cost electrochemical deposition method, so that the prepared metal film phase can be expressed. Better application performance with value for commercial applications. The above and other technical contents, features, and advantages of the present invention will be apparent from the following detailed description of the preferred embodiments. Referring to Figures 2 and 3, a preferred embodiment of the process for producing a single-layered metal nanoparticle film of the present invention comprises the following steps: Step 201 is to provide a substrate 31 modified with a decane-coupled molecule. Wherein one end of the decane-coupled molecule has a group selected from the group consisting of a thiol group (-SH) and an amino group (-NH3). In order to deposit a metal nanoparticle film having a higher density and a smaller particle diameter on the substrate, it is preferred to use a decane coupling type molecule having a thiol group. In the preferred embodiment, a thiol group is used. As the astaxantane I, the following is the following: OCH3 / ing 'och3 〇ch3 (^Mercaptopropyl^rimedioxysilane (MPTMS) The substrate 31 is selected to have electrical conductivity. The substrate of the nature. In this embodiment, the substrate has a conductive film made of a material selected from the group consisting of tin-doped indium oxide (ITO). Indium-doped zinc oxide (abbreviated as IZO), aluminum-doped zinc oxide (abbreviated as AZO), and gallium-doped zinc oxide (GZO). 1377270 Before the dance, the cleaning process and the removal of the oxide layer must be performed to make the substrate pass the 4 base end (·〇Η), so that the substrate can be smoothly coupled with the tantalum (4) slitting polymerization reaction. ” Step 2 〇 2疋Preparing a metal electrolyte 30 containing a metal compound component and a surfactant component mixed in a predetermined ratio. The metal compound has a plurality of predetermined metal ions combined with each other. The metal compound is such that the metal ions are formed of a metal selected from the group consisting of gold, silver, copper, ruthenium (Ru), ruthenium (tetra), iron, and the like. In a preferred embodiment, the metal ions are substantially gold ions' and the metal compounds in the metal compound component are tetragas gold acid (H(AuC14)). Step 203 is to modify the substrate 31. The metal electrolyte is directly immersed in the metal ruthenium, and the metal ions in the metal compound component are reduced to metal nanoparticles by electrochemical deposition, and a metal nanoparticle film is deposited on the substrate 31. Preferably, the electrochemical deposition method uses a three-electrode system formed by a working electrode Ο, an auxiliary electrode 42 and a reference electrode 43, and the working electrode 41 is coupled with the modified stone. class The substrate 3 of the molecule is connected, the auxiliary electrode 42 is a platinum wire, and the reference electrode is silver/silver chloride (Ag/AgCl), whereby the metal ions in the metal electrolyte 3 are reduced to metal. After the atom, it is covalently bonded to the Dreaming Coupling molecule on the substrate 31 to deposit and form the metal nanoparticle film on the substrate 31. In the example, the metal electrolyte is 〇 After the gold in the tetrachloroauric acid is reduced from 8 1377270 to the gold nanoparticle, the metal nanoparticle phase is formed on the substrate 31 by covalent bonding with the ^^ . Preferably, the surfactant in step 203 acts as an electrolyte and can utilize the negatively charged environment of its hydrophilic end to achieve the attraction of the metal ion fruit. In addition to helping to conduct electricity, surfactants can also act as stabilizers to prevent metal particles from agglomerating. They are also known as co-conductors and stabilizers. The chemical formula of DBSA is as follows: Ο CH3(CH2)12

功能。因此’藉由界面活性劑在固液表面上的吸附作用, 使其能在被還原的金屬奈米粒子表面形成一層分子膜,阻 礙粒子間相互接觸,防止聚集。且該界面活性劑較佳是選 用陰離子㈣界面活性劑,以藉由其親水的優點,而能在 反應π成後’以水潤洗就能去除,以免殘留的界面活性劑 影響到該金屬奈米粒子薄膜的性能。此外,陰離子型界面 活性劑還具有可被生物分解的特性,最能符合現代環保的 需求。在該實施例中’是選用十二烷基苯磺酸 (dodecylbenzenesulfonic acid,簡稱為 DBSA)作為界面活性 劑 · -|-〇@Na€Features. Therefore, by the adsorption of the surfactant on the solid surface, it can form a molecular film on the surface of the reduced metal nanoparticles, preventing the particles from coming into contact with each other and preventing aggregation. Preferably, the surfactant is an anionic (tetra) surfactant, which can be removed by water rinsing after the reaction is π, so that the residual surfactant affects the metal naphthalene. The performance of the rice particle film. In addition, anionic surfactants have biodegradable properties that best meet the needs of modern environmental protection. In this embodiment, 'dodecylbenzenesulfonic acid (DBSA for short) is selected as the surfactant · -|-〇@Na€

II 〇 .步驟204是在該基板31上形成該金屬奈米粒子薄膜後 ’再以去離子水清洗沉積後的基板31,並用氮氣吹乾。 值得說明的是’當在該實施例中所配製的金屬電解液 3〇為含有金離子的電解液時,則會在該基板31形成金奈米 粒子薄膜,在步驟201中使用MPTMS修飾該基板31主要 9 1377270 是藉由其SH基端能夠和金奈米粒子形成穩定的Au-S共價 鍵,由於Au-S鍵的鍵結能(binding energy)相當地強,且比II. Step 204: After the metal nanoparticle film is formed on the substrate 31, the deposited substrate 31 is washed with deionized water and dried with nitrogen. It is to be noted that when the metal electrolyte 3〇 prepared in this embodiment is an electrolyte containing gold ions, a gold nanoparticle film is formed on the substrate 31, and the substrate is modified in step 201 using MPTMS. 31 main 9 1377270 is capable of forming a stable Au-S covalent bond with the gold nanoparticles by its SH base end, because the binding energy of the Au-S bond is quite strong and the ratio

Au-Au鍵的鍵結能更強,使得Au較傾向於與SH鍵結,而 形成許多金粒子核,而非Au與Au鍵結聚集生長成較大粒 徑的金粒子。因此,能夠利用MPTMS與金奈米粒子間的強 力鍵結能減少Au與Au鍵結聚集成較大粒徑的金粒子,進 而使得以MPTMS修飾而得的基板31配合金屬電解液30進 行電化學沉積時,可在該基板3 1沉積出高密度且粒子較小 的金奈米粒子薄膜。 <具體例> .為方便後續電化學沉積的進行,在此是選用具有導電 性質的基板*目前市面上常用的導電基板有透明導電材料 (transparent conductive'oxide,簡稱為 TCO)薄膜的玻璃基板 ,例如ITO、IZ〇、AZO、GZO,以及各種金屬片如金片 (Au)、白金片(Pt)等。以下是在ITO基板上沉積形成一層金 奈米粒子薄膜的具體例。The bond of Au-Au bond is stronger, so that Au tends to bond with SH, and many gold particle nuclei are formed, instead of Au and Au bond aggregates grow into gold particles with larger particle diameter. Therefore, the strong bond between the MPTMS and the gold nanoparticles can be used to reduce the Au and Au bond aggregation to integrate the larger particle size of the gold particles, and the substrate 31 modified with the MPTMS can be electrochemically coupled with the metal electrolyte 30. At the time of deposition, a film of gold nanoparticles having a high density and a small particle size can be deposited on the substrate 31. <Specific Example>. In order to facilitate the subsequent electrochemical deposition, a substrate having a conductive property is selected. * A conductive substrate having a transparent conductive'oxide (TCO) film which is commonly used on the market at present. Substrates such as ITO, IZ, AZO, GZO, and various metal sheets such as gold (Au), platinum (Pt), and the like. The following is a specific example of depositing a film of a layer of gold nanoparticles on an ITO substrate.

(1) .基板的清洗 先將基板裁成1x4 cm的大小。再依序放入不同溶劑 中清洗,其·順序為丙酮—肥皂水—去離子水,在各溶劑中 分別利用超音波振盪清洗20分鐘。 (2) .有機分子MPTMS的修飾(modified)(1) Cleaning of the substrate The substrate is first cut to a size of 1 x 4 cm. Then, the cells were washed in different solvents in the order of acetone-soap-deionized water, and ultrasonically shaken for 20 minutes in each solvent. (2). Modification of organic molecule MPTMS (modified)

將清洗好的基板放入過飽和的氫氧化鈉(NaOH)溶液 中浸泡30分鐘,用去離子水仔細徹底的清洗並用氮氣(N2) 吹乾。此步驟是為了去除基板上的氧化層,使基板露出OH 10 1377270 端,如此可使基板與MPTMS這類的矽烷偶聯類分子順利進 行水解聚合(sol-gel)的反應,形成Si-0-Si的穩定共價鍵, 使MPTMS牢固地結合在基板表面。此外,也可用電漿 (Plasma)法或是利用食人魚溶液浸泡的方式來去除基板上的 氧化層。The cleaned substrate was immersed in a supersaturated sodium hydroxide (NaOH) solution for 30 minutes, carefully rinsed thoroughly with deionized water and blown dry with nitrogen (N2). This step is to remove the oxide layer on the substrate and expose the substrate to the end of OH 10 1377270. This allows the substrate to react with the sol-coupled molecules such as MPTMS to form a sol-gel reaction to form Si-0-. The stable covalent bond of Si allows the MPTMS to be firmly bonded to the surface of the substrate. Alternatively, the oxide layer on the substrate can be removed by plasma or by immersion in a piranha solution.

上述的食人魚溶液(piranha clean)為H2S〇4與H2〇2 的混合液,主要是藉由h2so4的強氧化性來破壞有機物中 的碳氫鍵結,硫酸可以造成有機物脫水而碳化,而雙氧水 可將碳化產物氧化成一氧化碳或二氧化碳氣體。 接著,將該基板放入1 mM的MPTMS的乙醇溶液 (99·5%)中,在室溫下浸泡一小時。 浸泡後的基板再用乙醇溶液(99.5%)清洗,並放入80°C 的烘箱中烘乾2小時。 (3) .金電解液的配製The above piranha clean is a mixture of H2S〇4 and H2〇2, mainly by the strong oxidizing property of h2so4 to destroy the hydrocarbon bond in the organic matter, and the sulfuric acid can cause the organic matter to be dehydrated and carbonized, and the hydrogen peroxide The carbonized product can be oxidized to carbon monoxide or carbon dioxide gas. Next, the substrate was placed in a 1 mM solution of MPTMS in ethanol (99.5%), and immersed at room temperature for one hour. The soaked substrate was washed with an ethanol solution (99.5%) and placed in an oven at 80 ° C for 2 hours. (3). Preparation of gold electrolyte

為了使金奈米粒子沉積在基板上時能分散性良好,因 此利用界面活性劑來做為保護劑。在此是選用陰離子型界 面活性劑DB S A來進行實驗。 先稱取 0.0042 g(1.2Xl(T6 mol)的 DBSA 加入 10ml 18M Ω超純水中。另外再取2xl0_4 Μ的HAuC14溶液0.2 ml加 入已配好的DBSA溶液中,利用超音波震盪使均勻混合。 (4) .金粒子薄膜的沉積 如圖3所示,以三電極系統進行電化學沉積,工作電 極是已修飾MPTMS的ITO基板,輔助電極為白金絲,參考 電極為Ag/AgCl。 11 1377270 將已清洗好的基板浸入已製作好的金奈米粒子溶液中 ,改泡時間端看基板和金奈米粒子間的吸附作用力大小來 決疋’基板和金奈米粒子之間的吸附作用力可藉由基板的 修如前面所提到利用矽烷偶聯基的分子進行修飾矽 烷偶聯基另一段可為SH或是Nh3等分子,可改變基板和金 奈米粒子之間的作用力大小。 根據文獻的記載’由於HAuCU · 3H20無論施加正或負 的電壓皆可形成金奈米粒子,只是形成的粒子晶體結楱不. 同(如十二面體或是二十面體),為了防止施加過大的電壓造 成水的解離(水的解離電位約在±〇 8eV),因此,在該具體例 中疋對含有金離子的電解液加_〇以乂的電位來進行電化學 沉積。 >儿積後立即使用去離子水仔細的清洗沉積後的基板, 並用氮氣(N2)吹乾。 參閱圖4,為由前述方法所製得的金屬奈米粒子薄膜經 月匕里散佈光5善儀(Energy dispersive spectrometer)檢驗所取得 的EDS圖,由該圖形的顯示結果與數據可知,利用本發明φ 的製法,當將經MPTMS修飾的基板浸入含有金離子的金電 : 解液中時,配合電化學沉積系統在該基板上沉積形成的金 . 屬奈米粒子薄膜中的金屬為金。 如圖5(b)所示,則為以MPTMS修飾的基板進行金的電 化學沉積後所取得的SEM圖,顯示沉積在該等金奈米粒子 是以小粒徑且高密度的狀態沉積於該基板上。 <分別以不同矽烷偶聯類分子修飾的基板及未經修飾的 12 1377270 基板進行金奈米粒子沉積所製得的金屬奈米粒子薄膜>In order to deposit the gold nanoparticles on the substrate, the dispersibility is good, so that the surfactant is used as a protective agent. Here, an anionic surfactant DB S A was used for the experiment. Weigh 0.0042 g (1.2Xl (T6 mol) of DBSA into 10ml of 18M Ω ultrapure water. In addition, add 0.2ml of 2xl0_4 HAHAuC14 solution to the prepared DBSA solution and mix it evenly by ultrasonic vibration. (4) The deposition of gold particle film is shown in Figure 3. Electrochemical deposition is performed by a three-electrode system. The working electrode is an ITO substrate with modified MPTMS, the auxiliary electrode is white gold wire, and the reference electrode is Ag/AgCl. 11 1377270 The cleaned substrate is immersed in the prepared gold nanoparticle solution, and the adsorption force between the substrate and the gold nanoparticle is determined by changing the bubble end time to determine the adsorption force between the substrate and the gold nanoparticle. The modification of the substrate can be carried out by using the molecule of the decane coupling group as mentioned above. The other portion of the decane coupling group can be a molecule such as SH or Nh3, and the force between the substrate and the gold nanoparticle can be changed. According to the literature, 'Because HAuCU · 3H20 can form gold nanoparticles regardless of the application of positive or negative voltage, only the crystal crystals formed are not the same. (such as dodecahedron or icosahedron), in order to prevent Applied The voltage causes dissociation of water (the dissociation potential of water is about ± e 8 eV). Therefore, in this specific example, 疋 is applied to the electrolyte containing gold ions by electrochemical deposition at a potential of 乂. Immediately afterwards, the deposited substrate was carefully washed with deionized water and dried with nitrogen (N2). Referring to Fig. 4, the metal nanoparticle film prepared by the above method was dispersed in the moonlight (Energy). The dispersive spectrometer is used to examine the obtained EDS map. From the display results and data of the graph, it is known that the MPTMS-modified substrate is immersed in a gold-containing gold-containing solution by using the φ method of the present invention. The metal deposited in the gold nanoparticle film deposited by the deposition system on the substrate is gold. As shown in Fig. 5(b), the SEM image obtained by electrochemical deposition of gold on the substrate modified by MPTMS is shown. It is shown that the gold nanoparticles deposited on the substrate are deposited on the substrate in a small particle size and high density. <Substrate modified with different decane coupling molecules and unmodified 12 1377270 substrate for Chennai Deposition of particles of the obtained thin metal nanoparticles >

準備五片經修飾特定分子修飾或未經修飾的ITO基板 ,分為A基板、B基板、C基板、D基板、E基板,再分別 以這五片基板進行如具體例的金奈米粒子沉積,以在該等 基板上沉積形成金奈米粒子薄膜,並用掃描式電子顯微鏡 觀察所形成的薄膜形態,其中A基板〜D基板為分別以四種 不同矽烷偶聯類分子修飾的基板,E基板為未經修飾的ITO 基板 , 且 A 基 板為 經 APTES((3-aminopropyl)triethoxysilane)修飾的基板,B 基板為經Prepare five modified or unmodified ITO substrates, which are divided into A substrate, B substrate, C substrate, D substrate, E substrate, and then perform gold nanoparticle deposition as a specific example with these five substrates, respectively. Forming a gold nanoparticle film on the substrates, and observing the formed film morphology by a scanning electron microscope, wherein the A substrate to the D substrate are substrates modified with four different decane coupling molecules, respectively, and the E substrate An unmodified ITO substrate, and the A substrate is a substrate modified by APTES ((aminopropyl) triethoxysilane), and the B substrate is a

C MPTMS((3-mercaptopropyl)trimethoxysilane)修飾的基板 饰的 基板 基板為經 GPTS((3-glycidoxyproplytrimethoxysilane))修 基板,及D基板為經(Trimethoxysilyl)benzene修飾的 ,這四種矽烷偶聯類分子的化學結構式如下:The substrate substrate of the C MPTMS ((3-mercaptopropyl) trimethoxysilane) modified substrate is modified by GPTS ((3-glycidoxyproplymethoxy silane)), and the D substrate is modified by (Trimethoxysilyl) benzene, these four decane-coupled molecules The chemical structure is as follows:

H3cH3c

3-GlycIdoxypropyltriiiieilK〇xysihnc (GPTS)3-GlycIdoxypropyltriiiieilK〇xysihnc (GPTS)

(APTES)(APTES)

OCH IOCH I

SI-OCH3 OCH3 HS OCH3 t ^ \^、och3 0ch3SI-OCH3 OCH3 HS OCH3 t ^ \^, och3 0ch3

(InmefliozysyyQbeiizaic 13 1377270 根據上述的化學結構式,可看出且A、B、C、D基板 上的矽烷偶聯類分子的一端的基團分別為氨基(-NH2)、硫醇 基(-SH)、環氧基("V)、苯基(Ό)。 其中,A基板、B基板、C基板、D基板上沉積的金奈米粒 子薄膜的SEM圖分別如圖5的(a)、(b)、(c)、(d)所示,E 基板上沉積的金奈米粒子薄膜的SEM圖則如圖6所示,由 圖式結果可看出未經修飾的E基板,與經矽烷偶聯類分子 修飾的A基板〜D基板相較,其沉積後得到的不是分散的金 粒子而是相互接合(coalescence)的金膜,顯示經有機分子修 飾過的A基板〜D基板確實會影響金奈米粒子的沉積型態, 因此,經矽烷偶聯類分子修飾的基板可使沉積在其上的金 奈米粒子得分散狀態分佈。再分別比較圖5的(a)、(b)、(c) 、(d),發現以SH為尾端的矽烷偶聯類分子MPTMS修飾後(InmefliozysyyQbeiizaic 13 1377270 According to the above chemical structural formula, it can be seen that the groups at one end of the decane-coupled molecules on the A, B, C, and D substrates are amino (-NH2) and thiol (-SH), respectively. , epoxy group (" V), phenyl (Ό). The SEM images of the gold nanoparticle film deposited on the A substrate, the B substrate, the C substrate, and the D substrate are respectively shown in Fig. 5 (a), ( b), (c), (d), the SEM image of the gold nanoparticle film deposited on the E substrate is shown in Figure 6. The unmodified E substrate and the decane can be seen from the results of the graph. The A-substrate to the D-substrate modified by the coupling-like molecule is a gold film which is not dispersed gold particles but is coalescence after being deposited, and it is shown that the A-substrate to the D-substrate modified by the organic molecule does affect The deposition pattern of the gold nanoparticles, therefore, the substrate modified by the decane-coupled molecule can distribute the gold nanoparticles deposited thereon in a dispersed state, and then compare (a) and (b) of FIG. 5, respectively. (c), (d), after the modification of the decane-coupled molecule MPTMS with SH as the tail end

的B基板相對可沉積形成高密度且粒徑小的金奈米粒子, 顯示具有不同基端的矽烷偶聯類分子也會因為其基端與金 屬離子間的作用力強度不同而影響到金奈米粒子的沉積型 態,此結果主要是基於MPTMS的SH基端能夠和金奈米粒 子形成穩定的Au-S共價鍵,由於Au-S鍵的鍵結能(binding energy)相當地強,約有 120kJ/mol,比 Au-Au 鍵的 50kJ/mol 的鍵結能更強,使得Au較傾向於與SH鍵結,而形成許多 14 1377270 金粒子核,而非Au與Au鍵結聚集生長成較大粒徑的金粒 子,因此,以MPTMS修飾的B基板相對於其他種類的矽烷 偶聯類分子修飾的基板,可沉積出密度較高且粒徑較小的 單層金奈米粒子薄膜。The B substrate can be deposited to form a high-density and small-diameter gold nanoparticle, and the decane-coupled molecules having different base ends are also affected by the strength of the interaction between the base end and the metal ion. The deposition pattern of the particles is mainly based on the fact that the SH-based end of MPTMS can form a stable Au-S covalent bond with the gold nanoparticles, and the binding energy of the Au-S bond is quite strong. There is 120kJ/mol, which is stronger than the bond of 50kJ/mol of Au-Au bond, which makes Au more prone to bond with SH, and forms many 14 1377270 gold particle nuclei, instead of Au and Au bond aggregates grow into The larger particle size of the gold particles, therefore, the B-substrate modified with the MPTMS can deposit a single-layered gold nanoparticle film having a higher density and a smaller particle size than the substrate modified with other kinds of decane-coupled molecules.

參閲圖7,顯示沉積於固體基板上的金粒子間的平均粒 徑會隨著沉積時間的增加而增加,因此,能藉由調整該金 奈米粒子的沉積時間,可控制該等金奈米粒子的粒徑大小 進而Bb夠依應用需求,在該基板上沉積出具有預定平均 粒徑的金奈米粒子薄膜。 股金帚米粒子未沉積在基板時的 值得一提的是Referring to FIG. 7, it is shown that the average particle size between the gold particles deposited on the solid substrate increases as the deposition time increases. Therefore, the Chennai can be controlled by adjusting the deposition time of the gold nanoparticles. The particle size of the rice particles and thus Bb are sufficient for the application to deposit a gold nanoparticle film having a predetermined average particle diameter on the substrate. When the gold nanoparticles are not deposited on the substrate, it is worth mentioning that

Vis吸收波長位置是在52〇nm,當將經修飾的基板 浸入含有金離子的金電解液中,以在該基板沉積金奈米粒 子’且沉積電位設定為_〇7V,沉積時間分別為5〇秒、_ 秒、150 秒、200 秒、25〇 秒、3〇〇 秒、35〇 秒、·秒、The Vis absorption wavelength position is at 52 〇 nm, when the modified substrate is immersed in a gold electrolyte containing gold ions to deposit gold nanoparticles on the substrate and the deposition potential is set to _〇7V, and the deposition time is 5, respectively. Leap seconds, _ seconds, 150 seconds, 200 seconds, 25 seconds, 3 seconds, 35 seconds, seconds

心500私時,則沉積後的基板顏色會從透明無色變成 粉紅色至藍色。參_ 8 ’分別取前述不同沉積時間的基板 進行吸收圖譜的量測,顯示當沉積時間從 長至500秒時,+太水& 7 * 不只4子的表面電襞帶(surface plasma 匕叫會從559⑽紅位移至_nm左右,再利用吸 4波長對/儿積時間作圖,可得到如圖9的關係曲線。會產 生這種結果主要是因為與散布於水溶液中的金奈米粒子時 相比’在㈣基板上的金奈米粒子間的距離會縮短很多, 且隨著沉積時間的增長,金奈米粒子的粒徑變大,導致粒 15 1377270 子間距變近,因此粒子間的電子雲距離也更近,造成近場 (Near-field)能量急遽增加,而更容易產生電子的集體振盪現 象,因此,造成UV-Vis吸收波長的紅位移。藉此,還能利 用不同沉積時間所形成不同粒徑的金奈米粒子的光學特性 ’進一步開發其應用潛力》 歸納上述,本發明單層金屬奈米粒子薄膜之製法,可 獲致下述的功效及優點,故能達到本發明的目的: 一、配合電化學沉積方式,並利用界面活性劑A 就能夠防止金屬電解液令還原的金屬奈米粒子聚集,再透 過經矽偶聯類分子修飾的基板,使該等金屬奈米粒子穩定 地結合至該基板並形成單層、密度較高與粒徑相對較小的 薄膜沉積形態,使本發明藉由使用適當的界面活性劑與經 特定修飾的基板就能以製程相對較簡單,成本便宜的電化 學沉積方式,在該基板上直接合成單層金屬奈米粒子薄膜 ’而具有可供商業應用的價值。 一、除了能藉由本發明的製法在該基板形成單層金屬 奈米粒子薄膜外,還能夠利用沉積時間的長短控制沉積在 該基板上的該等金屬奈米粒子的粒徑,以進一步利用不同 粒徑所造成的特性,供特定需求使用,例如,當金屬奈米 粒子的粒徑大小不同時,會使其uv_vis吸收波長發生^匕 ,使本發明具有可進一步開發其應用範圍的潛力。 三、當沉積於該基板上的金屬奈米粒子薄膜為金時, 能夠利用金㈣無生物毒性的特性進—步結合特定的生物分 子鍵結為生物分子模板’而具有可應用於生物科技產品的 16 1377270 潛力。 惟以上所述者,僅為本發明之較佳實施例*已,當不 能以此限定本發明實施之範圍,#大凡依本發明申請:利 範圍及發明說明内容所作之簡單的等效變化與修飾皆仍 屬本發明專利涵蓋之範圍内。 【圖式簡單說明】 〗、圖1是一流程圖,說明現有的一種金奈米粒子薄膜的 製法; 圖2是一流程圖,說明本發明單層金奈米粒子 製法一較佳實施例; 、 圖3是一示意圖,說明該較佳實施例進行電化學沉積 時所使用的三電極系統的配置情形; 圖4是以該較佳實施例所製得的一單層金奈米粒子薄 膜的能量散佈光譜(EDS)圖; 圖5是-掃描式電子顯微鏡照像圖,說明分別在經不 同石夕烧偶聯類分子修部的基板上沉積形成金奈米 的形態; 腺 圖6是一掃描式電子顯微鏡照像圖,說明在未經修飾 的基板上沉積形成金奈米粒子薄膜的形態,· 圖7是-曲線關係圖,說明不同沉積時 奈米粒子薄膜的平均粒徑; 风们金 太…圖 '是-曲線關係圖’說明不同沉積時間所形成的金 不米粒子薄棋的UV-Vis吸收圖譜;及 圖9是一曲線關係圖,說明不同沉積時間所形成的金 17 1377270 奈米粒子薄膜與其UV-Vis吸收波長位置的對應關係。 18 1377270 【主要元件符號說明】 30……· -----金屬電解液 41 •…工作電極 31···.. …·基板 42 .....輔助電極 40·.... …·三電極系統 43…" 參考适極When the heart is 500 private, the color of the deposited substrate changes from transparent colorless to pink to blue.参 _ 8 ' Take the above-mentioned different deposition time of the substrate for the absorption spectrum measurement, showing that when the deposition time is from 500 to 200 seconds, + too water & 7 * not only 4 surface electric 襞 belt (surface plasma 匕It will shift from 559(10) red to about _nm, and then use the absorption 4 wavelength pair/child time to plot the relationship curve as shown in Fig. 9. This result is mainly due to the gold nanoparticles dispersed in the aqueous solution. The distance between the gold nanoparticles on the (four) substrate is much shorter, and as the deposition time increases, the particle size of the gold nanoparticles becomes larger, causing the particle 15 1377270 sub-space to become closer, so the interparticle The distance of the electron cloud is also closer, causing the near-field energy to increase sharply, and it is more likely to generate a collective oscillation of electrons, thus causing the red shift of the UV-Vis absorption wavelength. Thereby, different depositions can be utilized. The optical properties of different sizes of gold nanoparticles formed by time 'further development of its application potential>> In summary, the method for preparing the single-layer metal nanoparticle film of the present invention can achieve the following effects and advantages, so Achieving the object of the present invention: 1. Combining the electrochemical deposition method and using the surfactant A can prevent the metal electrolyte from accumulating the reduced metal nanoparticles, and then passing through the substrate modified by the ruthenium-coupled molecule, so that the same The metal nanoparticle is stably bonded to the substrate and forms a single layer, a higher density and a relatively small particle deposition morphology, so that the present invention can be processed by using a suitable surfactant and a specifically modified substrate. A relatively simple, inexpensive electrochemical deposition method for directly synthesizing a single-layer metal nanoparticle film on the substrate has the commercial value. In addition to forming a single layer on the substrate by the process of the present invention. In addition to the metal nanoparticle film, the particle size of the metal nanoparticles deposited on the substrate can be controlled by the length of deposition time to further utilize the characteristics caused by different particle sizes for specific needs, for example, when When the particle size of the metal nanoparticles is different, the uv_vis absorption wavelength is generated, so that the present invention can be further developed. The potential of the application range. 3. When the metal nanoparticle film deposited on the substrate is gold, it can be applied by using the non-biotoxic property of gold (4) to bind a specific biomolecule to a biomolecular template. The potential of the biotech product is 16 1377270. However, the above is only the preferred embodiment of the present invention, and the scope of the present invention cannot be limited thereto. The simple equivalent changes and modifications made by the content are still within the scope of the patent of the present invention. [Simplified illustration of the drawing] Fig. 1 is a flow chart showing the preparation method of a conventional gold nanoparticle film; Is a flow chart illustrating a preferred embodiment of the method for preparing a single layer of gold nanoparticles according to the present invention; and FIG. 3 is a schematic view showing the configuration of a three-electrode system used in electrochemical deposition of the preferred embodiment; 4 is an energy dispersive spectroscopy (EDS) image of a single layer of gold nanoparticle film prepared in the preferred embodiment; FIG. 5 is a scanning electron microscope photo, illustrating The morphology of the formation of gold nanoparticles is deposited on the substrate of the different molecular ceramics. The gland image 6 is a scanning electron microscope image showing the deposition of gold nanoparticles on the unmodified substrate. The shape of the film, · Figure 7 is a - curve relationship diagram, showing the average particle size of the nanoparticle film at different depositions; the wind is gold too... The graph 'yes-curve relationship diagram' illustrates the thin gold particles formed by different deposition times The UV-Vis absorption spectrum of Chess; and Figure 9 is a graph of the relationship between the gold 17 1377270 nanoparticle film formed by different deposition times and its UV-Vis absorption wavelength position. 18 1377270 [Description of main component symbols] 30......· -----metal electrolyte 41 •...working electrode 31···.....substrate 42 ..... auxiliary electrode 40·.... Three-electrode system 43..." reference

1919

Claims (1)

1377270 第98100479-號專利申諳案補充、修正资無劊線之說明書替換—頁 普正召期⑽ 七、申請專利範圍·· 1. 一種單層金屬奈米粒子薄膜之製法,包含下列步驟: (i)提供一經矽烷偶聯類分子修飾的基板; (η)配製一金屬電解液,該金屬電解液包含依預定比 例相混合的一金屬化合物組份及一界面活性劑組份該 金屬化合物組份中具有多數個分別結合有預定金屬離子 的金屬化合物,該界面活性劑組份是選用十二烷基苯磺 酸;及 _ (iii)將經修飾的基板浸入該金屬電解液中,並以電 0 化學沉積方式使該金屬化合物組份中的該等金屬離子被 還原為金屬奈米粒子,藉此在該基板沉積形成一金屬奈 米粒子薄膜。 ' 2. 依據中請專利範圍第卜項所述的單層金屬奈米粒子㈣ 之製法,其中,在步驟⑴中,該矽烷偶聯類分子的一端 具有一選自下列群組令的基團:硫醇基及氨基。 3. 依據中請專利範圍第2項所述的單層金屬奈米粒子薄棋 之製法’其中,在步驟⑴中,該石夕烧偶聯類分子的 具有硫醇基。 4. 依據申明專利範圍第3項所述的單層金屬奈米粒子薄犋 之裝法’其中’在步驟⑴中該碎烧偶聯類分子為 . 基丙基三甲氧基矽烷。 5·依據申请專利範圍第3項所述的單層金屬奈米粒子薄犋 之製法其中,在步驟⑴中,該基板是分別經清洗處理 與去除氧化層處理後,使該基板露出氫氧基端以利於 20 丄^说㈣號專利申,案捕奋 8月 . 4充'修正後無劃線之說明書替換頁修正曰期:101年 與石夕燒偶聯類分子進行水解聚合反應。 6.依據申請專利範 之製法,复中7 述的單層金屬奈米粒子薄膜 質的基板。 Μ⑴巾,絲板是選W有導電性 7.依據巾請專利範圍第6項所述 之製法,甘; 工喝不木粒子缚膜 一八.’在步驟⑴中,該基板具有—導電薄膜,1377270 No. 98100479 - Patent application for supplementation, amendment of the specification of the replacement of the 刽 刽 — — 页 页 页 ( ( ( ( ( ( ( ( ( ( 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 (i) providing a substrate modified with a decane coupling molecule; (η) preparing a metal electrolyte comprising a metal compound component mixed in a predetermined ratio and a surfactant component of the metal compound group a plurality of metal compounds respectively combined with a predetermined metal ion, the surfactant component is selected from dodecylbenzenesulfonic acid; and (iii) the modified substrate is immersed in the metal electrolyte, and The electroless 0 chemical deposition method causes the metal ions in the metal compound component to be reduced to metal nanoparticles, whereby a metal nanoparticle film is deposited on the substrate. 2. The method for preparing a single-layered metal nanoparticle (4) according to the above-mentioned patent scope, wherein in the step (1), one end of the decane-coupled molecule has a group selected from the group consisting of : thiol group and amino group. 3. The method for producing a single-layered metal nanoparticle thinner according to the second aspect of the patent application, wherein in the step (1), the ceramsite-coupled molecule has a thiol group. 4. The method of preparing a single-layered metal nanoparticle thin layer according to the third aspect of the invention, wherein the fragmented coupling molecule in the step (1) is a propyltrimethoxydecane. 5. The method according to claim 3, wherein in the step (1), the substrate is subjected to a cleaning treatment and an oxide removal layer, respectively, to expose the substrate to a hydroxyl group. End to benefit 20 丄 ^ said (four) patent application, the case arrested August. 4 charge 'corrected after the instructions without a line replacement page correction period: 101 years and Shi Xi burning coupled molecules for hydrolysis polymerization. 6. According to the patent application method of the patent application, the single-layer metal nanoparticle thin film substrate described in the seventh paragraph. Μ(1) towel, silk plate is selected to have conductivity. 7. According to the method described in the sixth paragraph of the patent scope, the method of cooking is not a wood particle binding film. In the step (1), the substrate has a conductive film. , :導電㈣為-選自下列群組中的材質所製成:氧化銦 錫、氧化鋅銦、氧化鋅鋁,及氧化鋅鎵。 8.依據中請專利範圍第7項所述的單層金屬奈米粒子薄膜 之製法,其中,在步驟(Η)中,該金屬電解液中的該等金 屬離子為—選自下列群組中的金屬所形成:金、銀 '銅 ' # '鈽 '鐵及鎳。 9.依據申請專利範圍第8項所述的單層金屬奈米粒子薄膜 之製法,其中,在步驟(Π)中,該等金屬離子實質上為金 離子。 10. 依據申請專利範圍第9項所述的單層金屬奈米粒子薄膜 之製法,其中,在步驟(ii)中,該金屬化合物組份中的該 等金屬化合物實質上為四氣金酸。 11. 依據申請專利範圍第10項所述的單層金屬奈米粒子薄膜 之製法,其中,在步驟(iii)中的金屬奈米粒子薄膜是四 氯金酸中的金離子被還原為金奈米粒子後再與該矽烷偶 聯類分子共價鍵結而形成。 12.依據申請專利範圍第U項所述的單層金屬奈米粒子薄膜 之製法,其中’在步驟(iii)中’是以一工作電極、一輔 21 1377270 第981Ό0479號專-利申請案補充 修錢無视線之說明書替換* 助電極及一參考電極所形成的 積,且該工作電極是與已修飾 相連接’該輔助電極為白金絲 銀。 二電極系統進行電化學沉 有石夕垸偶聯類分子的基板 ’及該參考電極為銀/氯化 13. 依據申請專利範圍第12項所述的單層金屬奈米粒子薄膜 之製法,還包含一在步驟(iii)之後的步驟(iv),步驟(iv) 是在該基板上形成該金屬奈米粒子薄膜後,再以去離子 水清洗沉積後的基板,並用氮氣吹乾。 14. 依據申請專利範圍第9項所述的單層金屬奈米粒子薄膜 之製法’其中’在步驟(iii)中’能夠藉由控制沉積時間 ’進而改變該金屬奈米粒子之UV-Vis吸收圖譜的吸收波 長位置。 15.依據申請專利範圍第14項所述的單層金屬奈来粒子薄膜 之製法,其中,在步驟(iii)中,不同沉積時間所形成的 金屬奈米粒子之UV-Vis吸收圖譜的吸收波長位置是介於 520nm〜60〇ηιπ 0: Conductive (4) is made of materials selected from the group consisting of indium tin oxide, zinc indium oxide, zinc aluminum oxide, and zinc gallium oxide. 8. The method for preparing a single-layer metal nanoparticle film according to claim 7, wherein in the step (Η), the metal ions in the metal electrolyte are selected from the group consisting of Formed by the metal: gold, silver 'copper' # '钸' iron and nickel. 9. The method of producing a single-layered metal nanoparticle film according to claim 8, wherein in the step (Π), the metal ions are substantially gold ions. 10. The process for producing a single-layered metal nanoparticle film according to claim 9, wherein in the step (ii), the metal compound in the metal compound component is substantially tetragas gold acid. 11. The method for producing a single-layer metal nanoparticle film according to claim 10, wherein the metal nanoparticle film in the step (iii) is a gold ion in tetrachloroauric acid is reduced to Chennai The rice particles are then formed by covalent bonding with the decane-coupled molecule. 12. The method for preparing a single-layer metal nanoparticle film according to the scope of claim U, wherein 'in step (iii) is supplemented by a working electrode, a supplement 21 1377270 No. 981Ό0479 The instruction to repair the money without line of sight replaces the product formed by the auxiliary electrode and a reference electrode, and the working electrode is connected to the modified phase. The auxiliary electrode is white gold and silver. a two-electrode system for electrochemically depositing a substrate of a ceramsite-coupled molecule and the reference electrode is silver/chlorinated. 13. According to the method for preparing a single-layer metal nanoparticle film according to claim 12 of the patent application, A step (iv) after the step (iii) is carried out. After the metal nanoparticle film is formed on the substrate, the deposited substrate is washed with deionized water and dried with nitrogen. 14. The method for preparing a single-layer metal nanoparticle film according to claim 9 of the patent application, wherein 'in step (iii) 'can control the deposition time' to change the UV-Vis absorption of the metal nanoparticle The absorption wavelength position of the map. 15. The method for preparing a single-layer metal nanoparticle film according to claim 14, wherein in step (iii), the absorption wavelength of the UV-Vis absorption spectrum of the metal nanoparticle formed at different deposition times The position is between 520nm~60〇ηιπ 0 22twenty two
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