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TWI372940B - Photomask and photo alignment process using the same - Google Patents

Photomask and photo alignment process using the same

Info

Publication number
TWI372940B
TWI372940B TW097130393A TW97130393A TWI372940B TW I372940 B TWI372940 B TW I372940B TW 097130393 A TW097130393 A TW 097130393A TW 97130393 A TW97130393 A TW 97130393A TW I372940 B TWI372940 B TW I372940B
Authority
TW
Taiwan
Prior art keywords
photomask
same
alignment process
photo alignment
photo
Prior art date
Application number
TW097130393A
Other languages
Chinese (zh)
Other versions
TW201007351A (en
Inventor
Feng Sheng Lin
Hang Lian Lee
Jenn Kuan Kao
Heng Hsien Li
Original Assignee
Chimei Innolux Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Chimei Innolux Corp filed Critical Chimei Innolux Corp
Priority to TW097130393A priority Critical patent/TWI372940B/en
Publication of TW201007351A publication Critical patent/TW201007351A/en
Application granted granted Critical
Publication of TWI372940B publication Critical patent/TWI372940B/en

Links

TW097130393A 2008-08-08 2008-08-08 Photomask and photo alignment process using the same TWI372940B (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
TW097130393A TWI372940B (en) 2008-08-08 2008-08-08 Photomask and photo alignment process using the same

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
TW097130393A TWI372940B (en) 2008-08-08 2008-08-08 Photomask and photo alignment process using the same

Publications (2)

Publication Number Publication Date
TW201007351A TW201007351A (en) 2010-02-16
TWI372940B true TWI372940B (en) 2012-09-21

Family

ID=44827028

Family Applications (1)

Application Number Title Priority Date Filing Date
TW097130393A TWI372940B (en) 2008-08-08 2008-08-08 Photomask and photo alignment process using the same

Country Status (1)

Country Link
TW (1) TWI372940B (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN105892157A (en) * 2016-06-07 2016-08-24 深圳市华星光电技术有限公司 Method for conducting optical alignment on liquid crystal display panel and photomask

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI413815B (en) * 2010-11-09 2013-11-01 Sumika Technology Co A pattern difference film with a registration mark
CN105892156B (en) * 2016-06-07 2019-05-03 深圳市华星光电技术有限公司 The method that transparent substrate is exposed

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN105892157A (en) * 2016-06-07 2016-08-24 深圳市华星光电技术有限公司 Method for conducting optical alignment on liquid crystal display panel and photomask

Also Published As

Publication number Publication date
TW201007351A (en) 2010-02-16

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Legal Events

Date Code Title Description
MM4A Annulment or lapse of patent due to non-payment of fees