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TWI371805B - Electronic packages with fine particle wetting and non-wetting zones - Google Patents

Electronic packages with fine particle wetting and non-wetting zones

Info

Publication number
TWI371805B
TWI371805B TW096134453A TW96134453A TWI371805B TW I371805 B TWI371805 B TW I371805B TW 096134453 A TW096134453 A TW 096134453A TW 96134453 A TW96134453 A TW 96134453A TW I371805 B TWI371805 B TW I371805B
Authority
TW
Taiwan
Prior art keywords
wetting
fine particle
zones
electronic packages
packages
Prior art date
Application number
TW096134453A
Other languages
English (en)
Other versions
TW200822246A (en
Inventor
Nirupama Chakrapani
Vijay Wakharkar
Chris Matayabas
Original Assignee
Intel Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Intel Corp filed Critical Intel Corp
Publication of TW200822246A publication Critical patent/TW200822246A/zh
Application granted granted Critical
Publication of TWI371805B publication Critical patent/TWI371805B/zh

Links

Classifications

    • H10W74/012—
    • H10W74/117—
    • H10W74/15—
    • H10W72/01308—
    • H10W72/07311—
    • H10W72/07353—
    • H10W72/334—
    • H10W72/536—
    • H10W72/856—
    • H10W72/884—
    • H10W72/931—
    • H10W74/00—
    • H10W90/722—
    • H10W90/732—
    • H10W90/734—
    • H10W90/754—
TW096134453A 2006-09-14 2007-09-14 Electronic packages with fine particle wetting and non-wetting zones TWI371805B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US11/521,147 US20080067502A1 (en) 2006-09-14 2006-09-14 Electronic packages with fine particle wetting and non-wetting zones

Publications (2)

Publication Number Publication Date
TW200822246A TW200822246A (en) 2008-05-16
TWI371805B true TWI371805B (en) 2012-09-01

Family

ID=39187637

Family Applications (1)

Application Number Title Priority Date Filing Date
TW096134453A TWI371805B (en) 2006-09-14 2007-09-14 Electronic packages with fine particle wetting and non-wetting zones

Country Status (4)

Country Link
US (3) US20080067502A1 (zh)
CN (1) CN101145530B (zh)
DE (1) DE102007043832B4 (zh)
TW (1) TWI371805B (zh)

Families Citing this family (26)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20080026505A1 (en) * 2006-07-28 2008-01-31 Nirupama Chakrapani Electronic packages with roughened wetting and non-wetting zones
US20080142996A1 (en) * 2006-12-19 2008-06-19 Gopalakrishnan Subramanian Controlling flow of underfill using polymer coating and resulting devices
US7875503B2 (en) * 2006-12-28 2011-01-25 Intel Corporation Reducing underfill keep out zone on substrate used in electronic device processing
TWI403006B (zh) * 2009-01-15 2013-07-21 億光電子工業股份有限公司 發光二極體元件封裝結構及其製造方法
US9163883B2 (en) * 2009-03-06 2015-10-20 Kevlin Thermal Technologies, Inc. Flexible thermal ground plane and manufacturing the same
US20100294742A1 (en) * 2009-05-22 2010-11-25 Enrico Magni Modifications to Surface Topography of Proximity Head
KR101038762B1 (ko) 2009-11-16 2011-06-03 엠케이전자 주식회사 대기압 플라즈마를 이용한 솔더볼의 플라즈마 표면처리 방법
US8803001B2 (en) * 2011-06-21 2014-08-12 Toyota Motor Engineering & Manufacturing North America, Inc. Bonding area design for transient liquid phase bonding process
US9044822B2 (en) 2012-04-17 2015-06-02 Toyota Motor Engineering & Manufacturing North America, Inc. Transient liquid phase bonding process for double sided power modules
US10058951B2 (en) 2012-04-17 2018-08-28 Toyota Motor Engineering & Manufacturing North America, Inc. Alloy formation control of transient liquid phase bonding
US8970034B2 (en) 2012-05-09 2015-03-03 Micron Technology, Inc. Semiconductor assemblies and structures
US8920919B2 (en) 2012-09-24 2014-12-30 Intel Corporation Thermal interface material composition including polymeric matrix and carbon filler
US12523431B2 (en) 2014-09-15 2026-01-13 Kelvin Thermal Technologies, Inc. Polymer-based microfabricated thermal ground plane
US11988453B2 (en) 2014-09-17 2024-05-21 Kelvin Thermal Technologies, Inc. Thermal management planes
US11598594B2 (en) 2014-09-17 2023-03-07 The Regents Of The University Of Colorado Micropillar-enabled thermal ground plane
US12385697B2 (en) 2014-09-17 2025-08-12 Kelvin Thermal Technologies, Inc. Micropillar-enabled thermal ground plane
US20180320984A1 (en) 2017-05-08 2018-11-08 Kelvin Thermal Technologies, Inc. Thermal management planes
DE102014018277A1 (de) * 2014-12-12 2016-06-16 Tesat-Spacecom Gmbh & Co. Kg Verfahren zum Hestellen einer Hochspannungsisolierung von elektrischen Komponenten
US10325783B2 (en) 2015-06-09 2019-06-18 Infineon Technologies Ag Semiconductor device including structure to control underfill material flow
US9330946B1 (en) 2015-11-20 2016-05-03 International Business Machines Corporation Method and structure of die stacking using pre-applied underfill
US12104856B2 (en) 2016-10-19 2024-10-01 Kelvin Thermal Technologies, Inc. Method and device for optimization of vapor transport in a thermal ground plane using void space in mobile systems
US10217649B2 (en) * 2017-06-09 2019-02-26 Advanced Semiconductor Engineering, Inc. Semiconductor device package having an underfill barrier
DE212019000445U1 (de) 2018-12-11 2021-08-17 Kelvin Thermal Technologies Dampfkammer
US12464679B2 (en) 2020-06-19 2025-11-04 Kelvin Thermal Technologies, Inc. Folding thermal ground plane
CN113088876B (zh) * 2021-04-07 2022-11-22 京东方科技集团股份有限公司 掩膜版及其制备方法和蒸镀装置
US20230009495A1 (en) * 2021-07-09 2023-01-12 Innolux Corporation Electronic device and manufacturing method thereof

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6074895A (en) * 1997-09-23 2000-06-13 International Business Machines Corporation Method of forming a flip chip assembly
US7547579B1 (en) * 2000-04-06 2009-06-16 Micron Technology, Inc. Underfill process
US6869831B2 (en) * 2001-09-14 2005-03-22 Texas Instruments Incorporated Adhesion by plasma conditioning of semiconductor chip surfaces
CN1179613C (zh) * 2001-09-20 2004-12-08 联华电子股份有限公司 一种改善有机低介电常数层附着力的表面处理方法
US6794225B2 (en) * 2002-12-20 2004-09-21 Intel Corporation Surface treatment for microelectronic device substrate
US7112617B2 (en) * 2003-04-22 2006-09-26 International Business Machines Corporation Patterned substrate with hydrophilic/hydrophobic contrast, and method of use
WO2004107355A1 (en) * 2003-06-01 2004-12-09 Koninklijke Philips Electronics N.V. Anti-scattering x-ray collimator for ct scanners
US20050121310A1 (en) * 2003-12-03 2005-06-09 Intel Corporation Method and substrate to control flow of underfill
CN100383213C (zh) * 2004-04-02 2008-04-23 清华大学 一种热界面材料及其制造方法
DE102004048201B4 (de) * 2004-09-30 2009-05-20 Infineon Technologies Ag Halbleiterbauteil mit Haftvermittlerschicht, sowie Verfahren zu deren Herstellung
US7204298B2 (en) * 2004-11-24 2007-04-17 Lucent Technologies Inc. Techniques for microchannel cooling
US7317257B2 (en) * 2005-12-14 2008-01-08 Intel Corporation Inhibiting underfill flow using nanoparticles
US20080026505A1 (en) * 2006-07-28 2008-01-31 Nirupama Chakrapani Electronic packages with roughened wetting and non-wetting zones

Also Published As

Publication number Publication date
US8018073B2 (en) 2011-09-13
DE102007043832A1 (de) 2008-05-08
CN101145530B (zh) 2011-06-29
CN101145530A (zh) 2008-03-19
US20080067502A1 (en) 2008-03-20
DE102007043832B4 (de) 2010-09-16
US20110163445A1 (en) 2011-07-07
US20100190302A1 (en) 2010-07-29
US7927925B2 (en) 2011-04-19
TW200822246A (en) 2008-05-16

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Legal Events

Date Code Title Description
MM4A Annulment or lapse of patent due to non-payment of fees