TWI371057B - Pattern forming apparatus and pattern forming method - Google Patents
Pattern forming apparatus and pattern forming methodInfo
- Publication number
- TWI371057B TWI371057B TW096131624A TW96131624A TWI371057B TW I371057 B TWI371057 B TW I371057B TW 096131624 A TW096131624 A TW 096131624A TW 96131624 A TW96131624 A TW 96131624A TW I371057 B TWI371057 B TW I371057B
- Authority
- TW
- Taiwan
- Prior art keywords
- pattern forming
- forming apparatus
- forming method
- pattern
- forming
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/1303—Apparatus specially adapted to the manufacture of LCDs
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
- G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
- G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
-
- H10P72/0448—
-
- H10P76/00—
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Nonlinear Science (AREA)
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- Optics & Photonics (AREA)
- Coating Apparatus (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
- Gas-Filled Discharge Tubes (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2006308598A JP4738319B2 (en) | 2006-11-15 | 2006-11-15 | Pattern forming device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TW200822172A TW200822172A (en) | 2008-05-16 |
| TWI371057B true TWI371057B (en) | 2012-08-21 |
Family
ID=39448836
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW096131624A TWI371057B (en) | 2006-11-15 | 2007-08-27 | Pattern forming apparatus and pattern forming method |
Country Status (4)
| Country | Link |
|---|---|
| JP (1) | JP4738319B2 (en) |
| KR (1) | KR100836415B1 (en) |
| CN (1) | CN101183632B (en) |
| TW (1) | TWI371057B (en) |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5819621B2 (en) * | 2011-03-25 | 2015-11-24 | 株式会社Screenホールディングス | Pattern forming method and pattern forming apparatus |
| JP5790098B2 (en) * | 2011-04-05 | 2015-10-07 | セイコーエプソン株式会社 | Liquid ejection apparatus and liquid ejection method |
| JP6452318B2 (en) * | 2014-05-20 | 2019-01-16 | 中外炉工業株式会社 | Substrate coating apparatus and substrate coating method |
| CN109870880A (en) * | 2019-04-09 | 2019-06-11 | 合肥京东方显示技术有限公司 | gluing equipment and gluing method |
| CN110687722B (en) * | 2019-10-29 | 2021-09-03 | 武汉华星光电技术有限公司 | Alignment liquid coating method and mask plate assembly |
| JPWO2023166577A1 (en) * | 2022-03-02 | 2023-09-07 |
Family Cites Families (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0698628B2 (en) * | 1989-09-01 | 1994-12-07 | 株式会社総合歯科医療研究所 | Method and apparatus for continuous curing of visible light polymerization resin |
| JPH05335223A (en) * | 1992-05-30 | 1993-12-17 | Sony Corp | Method for forming resist pattern |
| JP3113212B2 (en) * | 1996-05-09 | 2000-11-27 | 富士通株式会社 | Plasma display panel phosphor layer forming apparatus and phosphor coating method |
| JP3501598B2 (en) * | 1996-10-16 | 2004-03-02 | キヤノン株式会社 | Laser processing method, ink jet recording head, and ink jet recording head manufacturing apparatus |
| JP3366630B2 (en) * | 2000-10-04 | 2003-01-14 | 大日本スクリーン製造株式会社 | Method and apparatus for forming barrier ribs for flat display device |
| JP3425946B2 (en) * | 2001-09-13 | 2003-07-14 | 大日本スクリーン製造株式会社 | Method and apparatus for forming barrier ribs for flat display device |
| JP2003279724A (en) * | 2002-03-26 | 2003-10-02 | Seiko Epson Corp | Display device manufacturing method, display device manufacturing apparatus, display device, and device |
| JP4082499B2 (en) * | 2002-09-20 | 2008-04-30 | 大日本スクリーン製造株式会社 | Pattern forming apparatus and pattern forming method |
| JP4408241B2 (en) * | 2004-06-14 | 2010-02-03 | 大日本スクリーン製造株式会社 | Pattern forming apparatus and pattern forming method |
| JP4383268B2 (en) | 2004-06-29 | 2009-12-16 | アルプス電気株式会社 | Spray coating method and spray coating apparatus |
| JP2006138911A (en) * | 2004-11-10 | 2006-06-01 | Dainippon Screen Mfg Co Ltd | Pattern forming method and pattern forming apparatus |
| WO2006085741A1 (en) * | 2005-02-09 | 2006-08-17 | Stichting Dutch Polymer Institute | Process for preparing a polymeric relief structure |
-
2006
- 2006-11-15 JP JP2006308598A patent/JP4738319B2/en not_active Expired - Fee Related
-
2007
- 2007-08-27 TW TW096131624A patent/TWI371057B/en not_active IP Right Cessation
- 2007-09-07 KR KR1020070090761A patent/KR100836415B1/en not_active Expired - Fee Related
- 2007-11-12 CN CN2007101863094A patent/CN101183632B/en not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| TW200822172A (en) | 2008-05-16 |
| JP4738319B2 (en) | 2011-08-03 |
| CN101183632A (en) | 2008-05-21 |
| KR100836415B1 (en) | 2008-06-09 |
| CN101183632B (en) | 2010-06-02 |
| KR20080044152A (en) | 2008-05-20 |
| JP2008119647A (en) | 2008-05-29 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| MM4A | Annulment or lapse of patent due to non-payment of fees |