TW200822172A - Pattern forming apparatus and pattern forming method - Google Patents

Abstract

In a pattern forming apparatus, while a light-curing patterning material (80) is ejected from each of a plurality of outlets (422) of a nozzle part (421), the nozzle part (421) and a light irradiation part (43) continuously move relatively to a substrate (9) with the nozzle part (421) preceding the light irradiation part (43) and a mask (46) is moved parallel to the substrate (9) at an interspace between the light irradiation part (43) and the substrate (9) by a mask moving part (45). Since a plurality of rectangle areas with various transmission factors are set in a two-dimensional array on the mask (46), an illumination distribution of irradiation light in an irradiation area on the substrate (9) changes irregularly with time. It is therefore possible to suppress "mura" (i. e., unevenness) of a rib pattern which is caused in the case that ribs whose widths are different due to nonuniformity of the plurality of outlets (422) and the like are formed on the substrate (9).

Description

200822172 IX. DESCRIPTION OF THE INVENTION: TECHNICAL FIELD OF THE INVENTION The present invention (4) is a technique for forming a money case on a substrate. [Prior Art] There are various methods for forming a rib on a board used in a flat display device such as a plasma display device, for example, in Japanese Laid-Open Patent Publication No. V:/-184303 A partition forming device 2 forms a nozzle portion on which a paste-like partition wall forming material is discharged onto a substrate, and a partition wall forming material on the substrate irradiates with ultraviolet light and relatively moves along the substrate main surface with respect to the substrate, thereby forming a partition wall. Further, it is disclosed in Japanese Laid-Open Patent Publication No. Hei. No. Hei. No. Hei. No. Hei. No. Hei. No. Hei. No. Hei. No. Hei. No. Hei. No. Hei. No. Hei. A plurality of identical patterns are successively drawn on the resist film, and at this time, the irradiation amount of ϋ in a plurality of identical patterns is randomly changed to eliminate the variation in the size in the period of the area. Further, the pattern is not formed by continuously ejecting a fluid material, but a method of manufacturing a color filter of a display device such as a liquid crystal is disclosed in Japanese Laid-Open Patent Publication No. Hei-279724, the entire disclosure of which is to The droplets of a plurality of droplet weights are ejected, thereby preventing unevenness of the three colors of R (red), G (green), and B (blue). When a nozzle portion having a plurality of discharge ports is relatively moved with respect to the substrate to form a plurality of partition patterns on the substrate, for example, due to machining of 312XP/invention specification (supplement)/96-12/96131624 200822172 The processing error of the generated discharge port, the change in the wettability caused by the uneven dispersion of the fine particle component in the flow patterning material, the difference in surface characteristics caused by the slight contamination near the discharge port, or the light from the light The illuminance distribution of the light of the illuminating portion (that is, the uneven distribution of the illuminance) is arbitrarily wide on the plurality of partition walls corresponding to the plurality of discharge ports. Actually, the width of each of the partition walls is substantially fixed in the scanning direction, and the width between the plurality of partition walls is uneven, resulting in unevenness in the partition pattern on the substrate (visible unevenness visually observed). SUMMARY OF THE INVENTION The present invention relates to a pattern forming device for forming a pattern on a substrate, which is intended to suppress a pattern formed on a substrate by using a nozzle portion. The pattern forming device of the present invention includes a nozzle portion, which is a self-complex One of the discharge outlets discharges a pattern-forming material having photocurability to the substrate; the light-irradiating portion irradiates the pattern-forming material discharged onto the substrate with irradiation light; and the moving mechanism 'discharges the pattern-forming material from the nozzle portion to the nozzle Mouth = the direction in which the emitter moves along the substrate, causing the nozzle portion to advance and _ relatively continuously moving ' thereby forming a linear number on the substrate that is equiangularly spaced in a direction perpendicular to the direction of movement The pattern formed by the element; and the illumination light changing portion are arranged in the entire irradiation region of the substrate and the pattern forming material during the self-injection of the pattern sewing material or in the irradiation region. In the plurality of partial regions in the direction of the direction, the illuminance, the illuminance distribution, or the irradiation range in the moving direction on the pattern material is 312 ΧΡ / Ming specification (s) / the 96-like 7200822172 12/9613 Shu varies irregularly. In the present invention, the nozzle portion can be used to suppress the pattern formed on the substrate, that is, the 17 second illumination light changing portion is a mechanism described below, and the 2 on the optical path between the portion and the substrate is placed in the foreground. The hood moves in a manner parallel to the substrate, whereby the transmittance of the reticle on the optical path is distributed to the milk, and the smear is changed. Therefore, the illuminance distribution of the ray is irregularly changed by using the reticle. . According to another preferred embodiment of the present invention, the illumination region from the optical plate is linear, and the traverse through the map is ##, and the pre-existing portion is the following mechanism, that is, the self-illumination light is changed. During the ejection of the pattern forming material from the whistling portion, 'the target region is irregularly moved slightly for the plurality of ejection openings in the moving direction' or the irradiation region is rotated parallel to the normal direction of the substrate: the axis is centered irregularly The ground is tiny. Thereby, the irradiation range of the irradiation light can be irregularly changed with respect to the discharge port in the moving direction. In one aspect of the invention, the irradiation light changing unit is configured to move the light irradiation unit irregularly in the normal direction of the substrate while discharging the pattern forming material from the nozzle unit. As described above, the light irradiation portion is moved in the normal direction of the substrate with respect to the nozzle portion, whereby the illuminance of the irradiation light is likely to be irregularly changed. In another aspect of the present invention, the illuminance of the illuminating light that is irregularly changed by the illuminating light changing portion is a width of the irradiation region and an average value of the illuminance of 2% or more and 1 〇% or less. 312XP/Invention Manual (Supplement)/96-12/96131624 8 200822172 ‘ The present invention also relates to a pattern forming method for forming a pattern on a cup of cloth ## R安里隹. The purpose and other objects, features, aspects and advantages of the present invention will be apparent from the accompanying drawings. Diagram of the embodiment. The pattern forming device " is a panel on which the assembly parts of the flat panel display are formed on the electrical display 裳:: 基, referred to as "substrate"). He is formed in the pattern forming device 1 as shown in Fig. 1 by means of the platform moving mechanism 2 and the platform moving mechanism to the yoke structure 2 Move in the direction shown. The frame 12 is fixed in the manner of a plate 9 to 2 〇 20, and the scanning head 4/, ,, is mounted in the frame: the platform moving mechanism 3 is mounted. The head moving mechanism 2 is configured to connect the ball screw 22: 21' to advance the nut 23 fixed to the platform 2 (on the ball screw 22). The guide 24 is fixed above the ball screw 22, and when the motor 21,: rotates, the platform 2 is slidably moved with the nut 23 - along the guide 24 in the Y direction I (ie, 'scanning head 4 to the substrate 9 Performing relative main scanning head The moving mechanism 3 has a ball screw 32 which is framed on a rotating shaft of the motor, and a nut 33 on the connecting rod 32, which is moved in the X direction in the bead screw. 33 upper seat 40, thereby enabling the female head 4 to be connected to the guide rail 34 fixed to the frame 12 by the base 34 312XP / invention manual (supplement) / 96-12 / 96131624 g 200822172, and by the guide 34 The scanning head portion 4 has a discharge portion 42 that discharges a paste-like pattern forming material having fluidity toward the substrate 9, and a light irradiation portion 43 that cures the pattern forming material on the substrate 9, and the discharge portion 42 The light-irradiating portion 43 is attached to the lower portion of the elevating mechanism 41 at the time of the susceptor 4G. Pattern formation = & The light-initiating enthalpy which starts to harden (crosslinking reaction) by ultraviolet rays and the resin as a wide binder , further step-by-step includes a glass powder as a glass powder, and a pattern forming material The nozzle portion 42 is detachably attached to the lower surface of the discharge portion 42. The nozzle portion 421 has a plurality of discharge ports arranged in the X direction. The spray portion 421 is connected to the supply tube 441 via the supply tube 441. A container 442 in which a pattern is stored, and a gas supply portion 444 for supplying a high-pressure gas is connected to the container 442 via a regulator 443. The container may be replaced by a pattern forming material in the container 442 of the device 1. Residual amount: When I ==, it can be replaced by the operator with the pattern forming material: 442. When the partition pattern is formed below, the gas in the regulator 442 is higher than the atmosphere, so as to save : = The sample is pressurized. That is, the pressure ΓΤ μ 仏 "^ knife 442 , % is the gas differential pressure" of the difference between the container and the atmospheric pressure is given to the container, and the nozzle portion 421 is supplied thereto. After the 荦 荦 荦 自 自 421 421 421 421 421 421 421 421 421 421 421 421 421 421 421 421 421 421 421 421 421 421 421 421 421 421 421 421 421 421 For example, in case 3, the clothing is set to 1 command, and the supply tube 441, the crying 442, the adjuster 443, and the contempt, the person such as ^ 442 ^, and '6邛444 are constructed to supply the mouth portion 421 to the 312XP/#. ^_书(补件)/96-12/96131624 200822172 Material supply portion 44 of a pattern forming material (also referred to as a dispensing system). In addition, in the state where the pattern forming material is not ejected from the nozzle unit 421, the gas difference pressure is set to 〇 (that is, the gas pressure in the container 442 is set to atmospheric pressure, so the material supply unit 44 does not face the container 442. The pattern forming material supplied therein is pressurized.). The light irradiation unit 43 is connected to the light source unit via a plurality of fiber bundles 431 (shown by thick lines J in Fig. 1, hereinafter simply referred to as "optical fibers 431"). Light (source unit 432 includes a light source that emits ultraviolet light (for example, a xenon lamp), and light from the light source is guided to light irradiation unit 43 by optical fiber 431. Actually, in light irradiation unit 43, a plurality of optical fibers are opposite to light source unit 432 The end portions of the side are arranged in the X direction, and on the (-¥) side of the nozzle portion 421, the substantially linear region on the substrate 9 extending in the direction in which the plurality of discharge ports are arranged (i.e., the X direction) is irradiated with ultraviolet rays. In the following description, the light that is irradiated onto the substrate 9 from the light irradiation unit 43 is referred to as irradiation light. Fig. 2 is a plan view showing the vicinity of the front end of the nozzle unit 421 and the light irradiation unit 43. In the portion 421, the flow path 423 connected to each of the discharge ports 422 (in FIG. 2, only the number of the discharge ports 422 and the i flow paths 423 are marked) is directed in a direction parallel to the YZ plane and inclined with respect to the z direction ( For example, it is extended upward in a direction inclined by 45 degrees. This is the main surface of the (10) (four) facing the substrate 9. (As described below, the main surface of the image forming the partition pattern is hereinafter referred to as the "object surface") 91 and inclined to the discharge direction of the object surface ' 'self-discharge outlet 42 2. The pattern forming material 8 is discharged. Further, the opening surface 424 of the nozzle portion 421 (the surface including the plurality of discharge ports 422 at the tip end of the mouth portion 421) is similarly normal, and the normal is parallel to the plane and relative to the 312XP/invention specification. (Supplement) /96-12/96131624 π 200822172 It is inclined in the ζ direction. In Fig. 2 of the nozzle portion 421, a pair of 'gentlemen' and 胩 丄 丄 平行 平行 平行 平行 平行 平行 平行 平行 平行 平行 平行 平行 平行The facing surface 425 'in the pattern $ ready-to-wear! the middle lifting mechanism 41 moves the nozzle portion 42 ip upward as needed, thereby maintaining a gap between the partition pattern pair 425 and the target surface μ of the substrate 9 to be substantially small The width t is such that the nozzle portion 421 is often in a state close to the object surface 1 of the substrate 9. When viewed from the (gamma) side toward the (+γ) direction, the shape of each of the discharge ports 422 为 is rectangular, and the shape is strong. The width of the γ γ shape is, for example, 100 "". The distance between the directions of the discharge ports 422 is 300. Further, the arrangement direction of the plurality of discharges π 422 may be perpendicular to the movement of the substrate 9 and inclined to the object surface 91. The direction (X direction), and the 'lighting light of the light irradiation portion 43 The lower surface of the injection surface (the surface on the (-) side) is provided with two lower rollers 451 and 452 in the rubbing direction of the light-shielding portion 43. On the opposite side ((-Y) side) to the nozzle portion 421 The upper side rollers 451 and the lower side of the nozzle portion 421 side are provided with upper side lights 453 and 454, and the upper side rolls 453 and 454 are connected to the rotating shafts of the motors 457 and 458 via the endless belts 455 and 456. A film-shaped mask 46 is provided between the upper rollers 453 and 454 via the lower side 45, and the exit surface (the surface on the (-z) side) of the light irradiation portion 43 and the target surface 91 of the substrate 9 are provided. , separated by a portion of the reticle 46. Most of the mask 46 is curled on the outer circumference of the upper roller 454, and when the partition pattern is formed as described below, the upper side roller 453 for winding on the (one gamma) side is rotated by the motor 457 to curl the side. The mask 46 of the outer circumference of the upper roller 454 is sequentially sent out, and is moved parallel to the substrate 9 between the light irradiation 邛 43 and the target surface 91, and 312 ΧΡ / invention manual (supplement) / 96-12 /96131624 200822172 Winded on the upper side of the Lucky Kun 453. As described above, the reticle moving mechanism 45 is constructed by the lower side light 451 and 452, the upper side 453 and 454, the endless belts 455 and 456, and the motors 457 and .458, and the reticle moving mechanism μ is configured. The photomask 46 on the optical path between the light irradiation portion 43 and the substrate 9 moves in parallel with the substrate 9. Furthermore, the motor 458 is utilized when rewinding the mask μ. FIG. 3 is a partial view showing the photomask 46 disposed between the light irradiation unit 43 and the substrate 9. As shown by the two-dot chain line in FIG. 3, a plurality of rectangular regions 46 arranged in two dimensions are arranged on the mask 46, and a plurality of rectangular regions 461 are arranged, each of which is rectangular or 461 < The presentation is irregularly different. The width of the rectangular region 461 in the X direction is a multiple (or U) of the distance between the discharge ports 422, and the length in the γ direction is, for example, 0 b 3 meters (mm). Further, the irradiation light transmittance is changed in the range of approximately 87% to 93%. In Fig. 3, the interval between the parallel oblique lines marked on the rectangular region 461 is changed to indicate the difference in transmittance of the rectangular region 461. Actually, the average value (average transmittance) of the transmittance of the entire mask 46 is set to about 9 %, and the average value of the fluctuation range of the transmittance of the mask 46 is 6%. Thus, the reticle 46 becomes a dimming filter in which the transmittance of each position is randomly changed. Further, the photomask 46 can be produced by, for example, printing on a fluorine-based resin film (attaching a pigment). Further, a light-cutting filter is provided in the light-irradiating portion 43 ^ light source unit 432, and the mask a is not deformed by the heat generated by the irradiation of the light. As shown in Fig. 1, the motor 21 of the platform moving mechanism 2, the adjuster 443, the light source unit 432, the motor 31 of the scan head moving mechanism 3, the sweeping plug portion * 312XP / invention manual (supplement) / 96-12/96131624 13 The lifting mechanism 41 of 200822172 and the motors 457 and 458 (see FIG. 2) of the mask moving mechanism 45 are connected to the control unit 5, and these configurations are controlled by the control unit 5, whereby the partition pattern is formed on the substrate 9 by the pattern forming apparatus 1. . Next, an operation of forming a partition pattern on the pattern forming apparatus α substrate 9 will be described with reference to Fig. 4 . In the pattern forming apparatus 1 of FIG. 1, first, the substrate 9 is placed on the stage 20, and the nozzle unit 421 is disposed on the side of the substrate 9 by the stage moving mechanism 2 and the scanning head moving mechanism 3. Then, the irradiation of the irradiation light from the light irradiation unit 43 is started (step sii). At the same time, the movement of the mask 46 between the light irradiation unit 43 and the substrate 9 is started by the driving of the mask moving mechanism 45, and is as follows. The illuminance distribution of the irradiation region of the light emitted from the substrate 9 is irregularly changed (step s (2). Thereafter, the substrate 9 on the flat chamber 20 is moved in the (_γ) direction by the stage moving mechanism 2 below the discharge portion 42. Then, the nozzle portion 421 and the light irradiation portion 43 start moving in the direction of (10)) with respect to the substrate 9 (step S13). Further, the gas in the container 442 is differentially pressed (i.e., in the valley 442). The difference between the gas pressure and the atmospheric pressure is a specific value, and thus the discharge-like material from the nozzle portion 421 is continuously discharged (step S14). Actually, as shown in Fig. 2, the nozzle portion 421 is along the object. Relatively continuous with respect to the substrate 9 in the direction of the face 91 In the direction opposite to the direction in which the nozzle portion 42! is moved in the opposite direction (that is, in the direction of the direction), the discharge u 422 is continuously connected, and thus the outlets 422 # 冈安^ α茶形成材 ^ U is discharged from the pattern forming material 8 in order. At this time, the opening surface 424 of the nozzle portion 421 is inclined to be 312 ΧΡ / invention specification (supplement) / 96-12/96131624 ^ 200822172 normal line on the discharge side (( The _Y) side is placed on the object surface 91 of the substrate 9, whereby the position of the substrate 9 in the Υ direction is from the (-Ζ) side (+ Ζ; side stack = Γ: material) The method "discharges the pattern forming material from the discharge port 422;" ^ the pattern forming material adheres to the substrate 9 in a high aspect ratio. / / is disposed after the direction in which the nozzle portion 421 is relatively advanced with respect to the substrate 9 The light-irradiating portion 43 irradiates the material 8G on the substrate 9 from the position above the discharge port 422 through the mask (four). As described above, the photo-curing agent is added to the pattern-forming material to have photocurability. Therefore, it is possible to easily use the irradiation of the illuminating light from the light illuminating portion 43 to make the substrate 9 The pattern forming material 8 is hardened, whereby the fine linear partition wall extends in the relative movement direction (Υ direction) of the nozzle portion 421 and becomes an element of the partition pattern. Further, in the nozzle portion 421 Between the pattern forming material 8 and the target surface 91, the mask 46 continuously moves in the same direction ((-Υ) side) with respect to the light irradiation portion 43 at the same level as the substrate 9, thereby Each portion of the photomask 46 is fixed to the target surface w of the substrate 9 in the 'in this state', and the irradiation light from the light irradiation portion 43 is irradiated to the pattern forming material 8A immediately after being discharged onto the substrate 9. The transmittance of the mask "on the optical path between the light-irradiating portion 43 and the substrate 9" (that is, the transmittance distribution of the mask 46 corresponding to the pattern forming material 80 immediately after being ejected onto the substrate 9) The arrangement of the plurality of rectangular regions 461 on the mask 46 of Fig. 3 corresponds to each other, so that the substrate 9 is irregularly changed every time it moves 2, so that the illumination is applied to the substrate 312XP/invention specification (supplement)/96-12 /96131624 15 200822172 The illuminance of the area (the intensity of light per unit area) is changed. The -, and the fruit are discharged from the discharge port 422 and attached to the target surface 91. The illuminance of the irradiation light irradiated by the one partition wall changes in accordance with the position in the γ direction on the substrate g, and the pattern forming material 80 discharged from the plurality of discharge ports 422 at each position in the Y direction on the substrate 9 The illuminance of the illuminating light to be irradiated, (4) should be changed in the direction of the 乂 direction. Since the illuminating light from the light illuminating portion 43 is slightly diffused and directed toward the substrate 9, the transmittance distribution of the reticle 46 is not Correctly reflected on the substrate On the illuminance distribution of the illuminating light, the distance between the light illuminating part ^ and the f counter 9 is small and the diffusion angle of the illuminating light is also small, so the transmittance distribution of the light 46 is roughly reflected in the illuminance distribution of the illuminating light. When the 于 ' 'Uokaduan case forming device 1 * ' can also make the reticle 46 approach the object surface 91 within a range that does not interfere with the pattern forming material of the substrate, thereby making the transmittance distribution of the reticle 6 The light is irradiated on the substrate 9 with high precision. Further, the light r" between the light-irradiating portion 43 and the substrate 9 is relatively fixed to the target surface 91 of the substrate 9 to be made on the substrate 9. The illuminance of the illuminating light at each position changes in accordance with the pattern of the reticle 46, and the Ο^^ ηι nipple cover 46 does not have to be moved in a state of being fixed to the object surface 91 of the substrate 9. Photo: = 2 During the period in which the pattern forming material is discharged from the nozzle portion, the entire illuminating region ' on the pattern forming material that is ejected and the embossed area on the pattern forming material is changed so as to change the illuminating light on the pattern forming material. The emperor, 4 is not in the direction of the soil, the self-spit 312XP / hair Instruction manual (supplement) / 96·12/9613ΐ 624 16 200822172 The shape collapse condition (the sag condition) caused by the patterning material until the end of the hardening process will be generated by the gravity, and the reticle 46 will be transmitted. The rate of change is the whole = 6% of the above-mentioned rate, whereby the irregular soil also changes = 6% of the average value of the a-degree of the entire irradiation area during the average penetration into the partition wall, that is, the space of the irradiation area According to 6%, it is 6% of the average illuminance of the illumination area.

:Continued: the pattern forming material is discharged, and the pattern forming material is stopped after the base is pressed (directly after + γ = 1 Ϊ (step S15). After eight, the movement of the substrate 9 is stopped (step si 〇, and the light blocking cover 46 The movement and the light irradiation unit 43 emit the irradiation light (step S18). The figure shows a partial plan view of the partition 81 which is not formed on the substrate 9. The partition wall having the same number as the discharge port 422 is arranged on the substrate 9 The partition walls 81 are arranged in the X direction perpendicular to the relative moving direction of the nozzle portion 421 at an equal pitch (actually, the spitting distance, that is, t 300 /zm), and a plurality of partition walls 81 are formed on the substrate 9. The pattern 8. The majority of each of the partition walls 81 will have a maximum width or a minimum width in the χ direction between 2 and 3 questions in the γ direction (about 1 〇 of the distance between the outlets 422) according to the illuminance of the illumination light. (or the position where the width is 0 in the γ direction), the magnitude of the twist also changes irregularly. Further, at each position of the gamma direction on the substrate 9, the width of the partition 81 in the χ direction In other words, irregularities are present in a plurality of partitions 81 In Fig. 5, each of the plurality of partition walls 81 is irregularly different. In the pattern forming material used in the embodiment 312XP/invention specification (supplement)/96-12/96131624 17 200822172, the mask is made The transmittance variation of 46 is the average transmission rate, and thus the variation is in the range of (10) in the width direction of the X direction = (10) of the average width of the wall 81. In fact, the partition wall is also in the twist direction (Z direction). In addition, in FIG. 5, there are partition walls having different magnifications in the X direction and the Y direction. In the present embodiment, the nozzle portion 421 is scanned only once to complete the operation of the 9+ upper division. However, depending on the size of the substrate 9, a plurality of scans are performed by the mouthpiece portion 421, and the wall 8 of the entire substrate 9 is at this time. 'When the nozzle portion 42 is separated, Λ ^ Y ^ ^ ^ ^ 细,, Ό After k' is made to make the scanning head 仏 a certain distance, and the substrate 9 is also moved to the initial position, the above operation is repeated. The partition wall formed by the above steps forms the resin component in the material, and the low softening point is broken. = panel fabrication of assembled parts. ^ Wherever a flat display device

Lj 4: dies = 'formed in the pattern of Fig. 1", during the formation of the material from the nozzle portion 421 ^ photohardenable pattern, at the nozzle;

The light-irradiating portion 421 and the light-irradiating portion 43 are moved along the substrate 9 to advance in the W portion 421 and are moved relative to the substrate 9 so that the mask moving mechanism 45 moves the mask 46 in the light-irradiating portion, and the light is in the line Since the substrate 9 moves, the mask is used, and the unevenness of the pattern of the partition wall pattern on the substrate 9 is due to a plurality of spouts σ 'the above Opening area or flow 312ΧΡ/Μ Specification (supplement)/96·12/96131624 18 200822172 The unevenness of the state or the intensity of the light emitted from the light-irradiating portion 43 is again de-specialized, and the width of the mixture is different. Produced at the next door. When the pattern unevenness on the light IH substrate 9 is suppressed, the following P' may be used to make the end portions of the X-direction of the X-direction of the X-direction of the X-direction (for example, the X transmittance is randomly changed 'the same direction, the direction The transmittance of the target circumference is only a part of m of the dry circumference of all the discharge ports 422 = fixed. That is, in the pattern forming apparatus 1, the entire illumination (fourth) domain is emitted from the nozzles, and the illuminance distribution on the (four)_material is irregularly changed. It is the same in the following yoke shape). In the pattern forming apparatus 1 of Besei 1, the transmittance of the mask 46 is changed = the visibility of the plurality of positions of the wall in the γ direction is within ±3% of the average width of the partition, thereby not being set. In the case of the mask 46, the influence of the width unevenness in the average range generated in the plurality of partition walls can effectively reduce the unevenness of the partition pattern on the substrate 9. Usually, the width variation range generated in the number of partitions is not +1% to ±5% of the average width. At this time, if the transmittance of the mask 46 is changed to the average transmittance 2 % or more and 10% or less, in order to appropriately suppress the substrate, the fluctuation range of the illuminance in the pattern = material is the space of the irradiation region and the time average value is 2% or more and 10% or less. 9 The uneven pattern on the next door. Further, in the pattern forming apparatus i, the illuminance distribution of the irradiation light on the pattern forming material immediately after being discharged onto the substrate 9 is changed so as to make the distance between the discharge outlets in each of the partition walls (the 312XP/invention specification ( Included in the range of 1 to 100 times (more preferably 5 to 10 times) of the wall). (1st and 2nd) 3 in the same embodiment). Here, a description will be given of a manufacturing method other than printing of the mask 46 of Fig. 3. Fig. 6 is a graph showing the relationship between the transmittance of a resin film and the wavelength. The line labeled with symbol A1 in Fig. 6 indicates the transmittance of a PCTFE (polychloro-trifluoroethylene) film having a thickness of 25 // m, and the line labeled with symbol A2 indicates an ETFE having a thickness of 25/m. The transmittance of a film of tetrafluoroethylene-ethylene copolymer (tetrafluoroethylene-ethylene copolymer), the line marked with the symbol A3 indicates FEP (tetrafluoroethylene-hexafluoropropene1ene) having a thickness of 25/zm. Copolymer) The transmittance of the film, the line marked with the symbol A4, indicates the transmittance of a film of PFA (tetrafluoroethylene-perfluoroalky1 vinyl ether I copolymer) having a thickness of 25 // m. The line marked with the symbol A5 indicates the transmittance of a PE (polyethylene) film having a thickness of 25/zm, and the line marked with the symbol A6 indicates the transmittance of the glass having a thickness of 135 /zm, marked with a symbol. The line of A7 indicates the transmittance of a PVC (polyvinyl chloride) film having a thickness of 40/m. As shown in Fig. 6, gas films such as PCTFE, ETFE, FEP, and PFA have high transmittance in an ultraviolet wavelength band (for example, 250 to 400 nm), and embossing can be performed on a fluorine-based film to make the thickness partial. The ground changes, so that it is easy to produce a photomask having an irregular transmittance distribution. Of course, the root can be hardened by the 312XP/invention specification (supplement)/96-12/96131624 20 200822172, the transmittance of the light, the intensity of the light, and the purple, and the low permeability of the film. When used: according to the pattern forming material] first wavelength tribute, PET (polyethylene terephthalate " ylene terephthalate) and other films. Other examples of the pattern forming device 1 will be described. Fig. 7 is a reticle moving mechanism of the pattern forming device ,: = = near the lower portion of the light illuminating portion 43 when viewed from the opposite side of the nozzle portion 421 (i.e., viewed from the side). In the cover moving mechanism shirt, the lower side roller (5) is placed in the X direction, and the lower side roller (5) is placed, and the lower side of the lower side is disposed above the lower side, and the fifth belt 452 is connected via the endless belts 455 and 456. The motor looks like the upper side is light 453, 454. In the pattern forming apparatus, the portion of the mask 46a on the optical path of the illumination light from the light 3 is moved along the discharge direction of the nozzle portion 421 (i.e., the X direction) by the mask transfer mechanism 45a. . FIG. 8 is a partial view showing the photomask 46a disposed between the light irradiation unit 43 and the substrate 9. The reticle 46a of FIG. 8 is formed only by a rectangular area 461 arranged in the Y direction in the reticle of FIG. 3 (but the aspect ratio is different in the reticle 46a of FIG. 8), and similarly, a plurality of rectangles The transmittance of the illuminating light in the area is irregularly different. In the pattern forming apparatus j having the reticle moving mechanism 45a of the 707, during the ejection of the pattern forming material from the nozzle portion 421, the nozzle is also moved in the moving direction of the nozzle portion 42| and the light illuminating portion 43 along the substrate 9. The portion 421 is advanced and relatively continuously moved relative to the substrate 9, and at the same time, a mask corresponding to the pattern forming material immediately after the spit 312XP/invention specification (supplement)/96-12/96131624 21 200822172 The penetration of the part t varies irregularly. As a result, the mask 46a can be used to easily change the illumination, the knives, and the knives irregularly, so that the unevenness of the partition pattern formed on the substrate 9 can be suppressed. Further, in the reticle moving mechanism 45 of Fig. 2, the upper roller 454 is disposed in a narrow space between the light illuminating portion 43 and the nozzle portion 421, and the upper side of the reticle moving mechanism 45a of Fig. 7 The sticks 453 and 454 are placed in a wider space on the outer side of the light-irradiating portion 43 in the X direction, and the pattern forming device of the mask moving mechanism 45 of FIG. 2 is assembled as compared with the pattern forming device 1 in the valley. However, in order to correspond to the pattern of the mask 46 to cause irregularities in the partition wall formed on the substrate 9, the rudder is a reticle moving mechanism of the stalk 2, and the light disposed between the light illuminating portion and the substrate 9 is made. The cover moves in the moving direction of the nozzle portion 421. Fig. 9 is a view showing the configuration of a light source unit 432a of the pattern forming apparatus of the second aspect of the present invention. The light source unit 432a of Fig. 9 has a light source 433 that emits ultraviolet light (but only the emitting portion of the light source 433 is shown in Fig. 9), between the light source 433 (the emitting portion) and the optical fiber 431 (actually a fiber bundle). A disk-shaped filter 434 and a lens 435 are disposed. The filter 4 is rotated by a motor 436 centering on a rotation axis J2 parallel to the optical axis between the light source 433 and the optical fiber 431, and is divided into a plurality of portions on the filter 434 (regularly or irregularly divided) In multiple parts, the ultraviolet transmittance is irregularly different. The other structure of the patterning device is the same as that of the figure, so the same reference numerals are used. Next, an operation of forming a partition pattern on the substrate 9 by the pattern 312XP/invention specification (supplement)/96-12/96131624 22 200822172 having the light source unit 432 of Fig. 9 will be described with reference to Fig. 4 . In the pattern forming apparatus, after the substrate 9 is placed on the stage 2, the shutters in the open source 433 emit ultraviolet rays from the light source 433, thereby starting the light irradiation from the light irradiation unit 43 (step S11). Further, the filter is made to be similar to the intensity of the light emitted from the light-irradiating portion 43 by the motor ( (step S12). Then, the nozzle portion 421 and the light irradiation portion 43 start to move relative to the substrate 9, and the pattern forming material (steps S13, su) is ejected from the nozzle portion = each discharge port 422, and one L is directed toward the substrate 9. The pattern forming material is ejected, and the pattern forming material that has been discharged onto the substrate 9 is irradiated with the irradiation light from the light irradiation unit 43. At this time, the illuminance of the irradiation light irradiated by the pattern forming material which is discharged from the plurality of discharge ports 422 and adhered to the target surface 91 is caused by the irregularity of the intensity of the irradiation light from the light irradiation unit 43 over time. It changes according to the position of the gamma direction on the substrate 9. As described above, during the ejection of the pattern forming material from the nozzle portion 421, the patterning material is formed on the entire irradiation region of the substrate 9 and the discharged pattern forming material. Light: The illuminance changes irregularly, so the visibility of each of the plurality of positions in the γ direction irregularly changes with the illuminance of the illuminating light. Further, the positions of all the partition walls formed on the substrate 9 having extremely small or extremely large γ directions are substantially the same. The vicinity of the end portion on the (+ Υ) side of the rear substrate 9 reaches the immediately below the nozzle portion 421, and the discharge of the pattern forming material is stopped (step S15). Thereafter, the movement of the substrate 9 is stopped (step S16), and the rotation of the filter is stopped and the irradiation light is emitted from the maser portion 43 (steps S17, S18). 312XP/^__(supplement)/96·12/96131624 23 200822172 As described above, in the pattern forming apparatus having the light source unit 432 of FIG. 9, during the ejection of the pattern forming material from the nozzle portion 421, the pair is immediately ejected to the substrate. The illuminance of the irradiation light irradiated by the entire pattern forming material after 9 is irregularly changed, whereby the width of each of the plurality of positions in the γ direction can be irregularly changed. Actually, the width change rates of all the partition walls on the substrate 9 at the respective positions in the direction in which the partition walls extend are substantially the same. However, in the above case, the unevenness of the partition wall pattern on the substrate 9 can be suppressed. Further, the illuminance of the illuminating light which is reflected by the entire pattern forming material which has just been ejected onto the substrate 9 may be irregularly changed, and may be realized by another method. Fig. 10 is a view showing another example of the scanning head of the pattern forming apparatus. In the scanning head portion 4a of FIG. 10, the movable portion 471 of the cylinder mechanism 47 is fixed to the light irradiation portion 43 under the elevating mechanism 41, whereby the light irradiation portion 43 can be parallel to the substrate 9. Move in the direction of the normal direction (z direction in the figure). That is, the light irradiation portion 43 is smoothly guided by the guide portion in the x direction. When a partition pattern is formed on the substrate 9 by the pattern forming apparatus having the scanning head 图 of FIG. 10, first, the substrate 9 is placed on the stage 2〇1, and then, the irradiation light is emitted from the light irradiation unit 43 (FIG. 4). In the step su) i, the cylinder mechanism 47 is started to be driven, whereby the light irradiation unit 43 starts to have a small distance in the normal direction of the substrate 9 (for example, a range of ±1 mm from the reference position=Z direction). Internally, the earth is moved irregularly (step S12). After that, the nozzle unit 421 and the light irradiation unit 43 start relative movement with respect to the color plate 9, and the discharge of the pattern forming material from the respective discharges 422 of the nozzle unit 421 (steps S13 and S14) is performed, and the substrate 9 is 312XP. /Inventive Manual (Supplement)/96-12/96131624 24 200822172: The soil forming material 'is irradiated with the light from the light-irradiating portion 43 to the material immediately after discharge. After the (10) movement::; the light irradiation portion 43 irregularly moves only a small distance in the normal direction of the substrate 9, and therefore, the sanding on the target surface 91: the solid discharge outlet 422 is discharged and attached, According to the illumination of the irradiation light irradiated by Y on the substrate 9, the smear formed on the substrate 9 changes upwards. The knot width varies irregularly. Then, in the vicinity of the end portion of the substrate 9 on the (+Υ) side, the nozzle portion 421 reaches the nozzle portion 421 and the pattern forming material is formed (step 5). Thereafter, the movement of the plate 9 is stopped (step S16), and the cylinder mechanism 〇 is also stopped and the irradiation light is emitted from the light irradiation unit 43 (steps S17 and S18). In the case where the pattern forming material is formed in the pattern forming device 43 / the nozzle portion 421 having the scanning head portion 4a of FIG. 1G, the light irradiation portion 43 is in the normal direction of the substrate 9 with respect to the mouthpiece portion 421. Since only a small distance moves irregularly, the illuminance of the illumination light irradiated to the entire pattern material immediately after being ejected onto the substrate 9 is likely to be irregularly changed. This allows the respective partition walls on the substrate 9 to be in the γ direction. The wide variation of the plurality of positions is irregularly changed. Thus, the unevenness of the partition pattern on the substrate 9 can be suppressed. Further, the mechanism for moving the light-irradiating portion 43 in the x-direction is also realized by a solenoid or an oscillator. . As shown in FIG. 11 , when the power source 437 capable of externally controlling the modulation is provided in the light source unit 432, the control unit 5 can be used to control the voltage of the light source 433 by the power source 437. Change, so 312 ΧΡ / invention manual (supplement) / 96-12/96131624 25 200822172 It is also possible to make the intensity from the light illuminating unit 43 irregularly change the intensity of the first shot. Fig. 12 is a view showing a configuration of a pattern forming apparatus according to a third embodiment of the present invention. Fig. 12 shows only the light-irradiating portion 43 and the vicinity of the end portion. In the scanning head 胄 4b of Fig. 12, a rotating mechanism for rotating the light-emitting portion 43 at a slight angle centering on the rotation axis J3 which is arranged in the arrangement direction (i.e., the X direction) of the discharge Z 422 is provided: When the partition pattern is formed on the pattern forming device 9 having the scanning head portion of Fig. 12, first, the step S(1) in the light irradiation portion (4) is reversed, and the driving mechanism is started to be driven. The portion 43 starts to rotate irregularly within a specific minute rotation angle target center around the rotation axis 3 (step S12). Then, the nozzle 421 and the light-irradiating portion 43 start to move relative to the substrate 9, and the discharge of the pattern forming material from the respective discharges D 422 of the nozzle portion 421 is started (steps S13 and S14). Thereby, the pattern forming material is discharged onto the substrate 9 in a state in which the plurality of discharge ports 422 are arranged in the X direction, and the linear irradiation 'field of the pattern forming material that has just been discharged to the base 9 is traversed. The illumination light from the light irradiation unit 43 is irradiated. At this time, the light-irradiating portion 43 is irregularly rotated about the rotation axis J3, thereby irradiating the irradiation light irradiated onto the substrate 9 in the γ-direction (the range indicated by the arrow indicated by the symbol R1 in FIG. 12) Correspondingly, the discharge port is made minute (for example, the position when the rotation angle is the 〇 degree is within the range of ±1 mm in the γ direction) and changes irregularly. Therefore, a plurality of portions of the partition walls formed on the substrate 9 in the γ direction are caused by the self-discharge pattern formation 312XP/invention specification (supplement)/96-12/96131624 26 200822172 material until the irradiation of the irradiation light The shape of the collapse will be uneven. :: "Same", because of the point of rotation of the point line of gravity, etc. (4) After the corner is cut, 'Use two, then when the end of the (+Y) side of the substrate 9 is directly below the sputum, stop the spit in the near/near When the nozzle portion 421 is reached, the material is formed (step S15).

The movement of the substrate 9 is stopped (step S16), , and the V drive and the self-lighting camera 4q # φ , 'also stop the rotation mechanism 47a = the shoulder 34 emits the illumination light (steps sn, (10). In the scanning center of Fig. 12, the image is ejected from the nozzle portion 421 (4) & the forming portion 43 is rotated with the rotation axis 3 as the center 7 = period ', and the light is irradiated as if relative to the substrate 9 is rotated. In the direction of the nozzle part _ help, the light is irradiated, and the light is emitted from the side of the discharge port, and the discharge is performed on the plate: also: small movement, the movement of the ray light of the entire pattern forming material after the day 1 (four) privately In the direction of the Zhao 7..., the shooting around the square produces irregular changes. As a result, the plurality of positions on the substrate 9 can be regularly changed, and the plurality of positions in the Υ direction can be regularly changed. Therefore, it is possible to suppress the pattern of the partition walls on the substrate 9 and to form all of the spacers on the substrate 9. The position of the side wall is extremely small or the position of the ¥ direction is substantially the same. Further, a method of moving the irradiation region of the irradiation light to the side of the discharge port 422, the soil, the Δ丨, and the J, for example, the light-emitting portion 43 may be provided with respect to the nozzle portion 421. ^ , t implementation. In the above-described first to third embodiments, the pattern is formed in the direction of the second embodiment, and the patterning material is discharged from the nozzle unit 421, and the irradiation light is on the substrate 9 and discharged. The substantially entire illumination area 312XP/invention specification (supplement)/96-12/96131624 27 200822172 on the pattern forming material causes irregularity in illumination distribution, illumination, or movement-direction illumination range on the pattern forming material. The ground pattern is changed, thereby suppressing the partition pattern '^ unevenness, but it is not necessary to change the illumination range of the irradiation light, the illuminance, or the irradiation range of the moving direction in the entire irradiation region. For example, in the pattern forming apparatus 1 of FIG. 1, the mask 46 of FIG. 13 can also be used to replace the mask 46 of FIG. 3, and a plurality of rectangular regions 1 which are aligned and aligned in the mask 4 A rectangle arranged in the Y direction (the line of the area 461 is taken as the rectangular area line 462, and only the transmittance of the rectangular area 461 included in a part of the rectangular area line 462a (hereinafter referred to as "specific rectangular area line 462") is not Regularly changing, and the transmittance of each rectangular region 461 in the remaining rectangular region row 462 is fixed. Further, in the photomask 46b of the figure, a plurality of specific rectangular region rows 462a are adjacent to each other. The pattern forming device having the photomask 46b During the discharge of the pattern forming material from the nozzle portion 421, the irradiation light is substantially aligned with the row of the specific rectangular region and arranged in the X direction in the irradiation region where the irradiation light is applied to the substrate 9 and the pattern I formed by the discharge. In the plurality of partial regions, the illuminance distribution of the illumination light on the pattern forming material is irregularly changed. Thereby, the position in the X direction is included in a plurality of portions of the partition walls in the γ direction in the range of the partial regions. The width of the X direction is irregularly changed, and in this case, the unevenness of the partition pattern formed on the substrate 9 can be suppressed. However, as described above, the illuminance distribution is irregularly changed over time in only a plurality of partial regions. In view of the fact that the unevenness of the partition pattern is appropriately suppressed, it is preferable that 30% or more (preferably 5% or more) of the total number of the partition walls formed on the substrate 9 312XP/invention specification (supplement)/ 96-12/96131624 28 200822172 The width of the partition wall is irregularly changed in the γ direction. In the irradiation region, a plurality of illuminances are regularly arranged in the χ direction (for example, 3 or more) In the partial area, the reticle 46c shown in Fig. 14 can be used instead of the reticle 46b of Fig. 13, and in the reticle 46c of Fig. 14, a specific rectangular area 462a is provided separately from each other. At the time of discharging the pattern forming material from the nozzle portion 421, the irradiation light is substantially aligned with the specific rectangular region row 462a in the illuminating region on the substrate 9 and the discharged pattern forming material, and is arranged at X. Multiple points in the direction In the branch or the middle, the illuminance of the illumination light on the pattern forming material is irregularly changed, whereby the unevenness of the partition pattern formed on the substrate 9 can be suppressed. Furthermore, the mask 4 in FIGS. 13 and 14 is swept, In 46c, it is preferable that the transmittances of the respective positions in the γ direction of the plurality of specific rectangular region rows 462a are irregularly different from each other, even when the transmittances of the respective positions in the plurality of specific rectangular region rows 462a are the same. As long as the transmittance of the plurality of positions in the Y direction changes irregularly, the unevenness of the partition pattern on the substrate 9 can be suppressed. Further, as shown in FIG. 15, the light irradiation portion 43 can be provided in plural irradiation. A collection of blocks 430, and a cylinder mechanism 4 7 ' of each of the illumination blocks (represented by symbol 430a in Fig. 15) is provided to fix the other illumination blocks 430 to the nozzles. In the portion 4 21, the irradiation block 4 3 0 a is irregularly moved in the Z direction when the partition pattern is formed, whereby the irradiation region irradiated by the irradiation light from the light irradiation portion 43 is respectively in the irradiation region Block 430a is substantially opposite to the plurality of parts The area (in this case, the area of the plurality of partial areas accounts for about 50% of the irradiated area), so that the 312XP/invention specification (supplement)/96-12/96131624 29 200822172 Fig. Also indicate its:: Figure. In Fig. 16, the scan head of the mouth is formed as follows;; rr43 (=== then rotates in the direction of γ), and only in a slight angle, the figure is irregular: =: Β: light: A diagram of the rotation of the shot portion 43. The dotted rectangle of the 射 di di di 表示 表示 表示 表示 表示 表示 表示 表示 表示 虚线 虚线 虚线 虚线 虚线 虚线 虚线 虚线 虚线 虚线 虚线 虚线 虚线 虚线 虚线 虚线 虚线 虚线 虚线 虚线And the angle B1 = the irradiation area of the illumination light from the light irradiation unit 43 is linear. The k-shaped teeth are formed from a plurality of pattern forming materials which are immediately after the σ 422 is discharged to the substrate (in FIG. 17, the two-point chain) The line indicates the pattern forming material 80 on the board 9, as shown by the solid line and the two-point riding in FIG. 17, and the Y-direction of the irradiation area β1 and the discharge port 422 due to the rotation of the light-irradiating portion 43 The distance from the portion of the rotating shaft that is away from the rotating shaft in the direction of the turn becomes larger as the distance from the rotating shaft J4 becomes larger, and the portion near the rotating shaft J4 hardly changes. When the pattern forming material is ejected from the nozzle portion 421 as described above, the rotating mechanism 47b irregularly illuminates the irradiation region Β1 of the irradiation light around the rotation axis J4. Tiny rotation, whereby the irradiation light is on the substrate 9 and the irradiated region B1 on the discharged pattern forming material, away from the rotating shaft in the x direction "312XP / invention manual (supplement) / 96-12/96131624 200822172 The irradiation range in the Y direction on the material in the partial region corresponding to each of the discharge ports 422 is irregularly projected = the unevenness of the partition pattern formed on the substrate 9 in the pattern & fine in the form of the can be formed in the afternoon (4) In the forming apparatus, during the process of discharging the pattern forming material from the mouth (four) 421 along the substrate 912, the light army of FIG. 2, the moving mechanism 45, and the reticle moving mechanism of FIG. 7 are first used by the military. The power supply 437, the diagram 3, the movement mechanism 4a, and the rotation mechanism 4 of FIG. 1 and n^, (7) the knife is actuated as the illumination light changing unit. Therefore, the illumination light is on the substrate 9 and the discharge is perpendicular to the movement direction. In the direction of the complex domain, arranged in ^^ 禝In the sub-area, the illuminance distribution of the illumination light on the material is reported as 案η 形 形 形 形 形 形 形 形 形 形 形 形 形 形 形 形 形 形 形 形 形 形 形 形 形 形 形 形 形 形 形 形Shoot the target. According to the pattern of the pattern forming device, the illuminance of the illuminating light may be distributed irregularly, or the illuminance and the illuminating range may be irregularly limited. Although the form has been described, the present invention is not limited to the above-described shape, and various modifications can be made. Port 1 8 series table does not have a grid pattern. Fortunately, 8A stands 逋A—4 Tea 8a. ^ Figure 19 is a longitudinal section of the pattern of the 18th arrow. At 8a, first, a pattern composed of two is formed on the substrate 9, and thereafter, the nozzle portion 2:=: has a different pitch, and the wire 9 is made 90 degrees more toward the -1 丨Between 312 Χ ___ (supplement) / 96 · 12 / 96131624 31 200822172 = case element (four) constitutes the 曙, 9 on the P ° 8 8 ^ interval between (4), so as not to be involved with the substrate). Further, the pattern 8a is fired by ?: into a partition wall for a plasma display device. In formation

#, is also the same as the above-mentioned i-th to 3rd Al^ 〇1D. L brother 3 shell fine, so that the pattern of the spit is sub-wall ==: the grid on the correction board 9 is used to form a pattern other than the photo-curing outer line The light of the wavelength band may also be a material of the phosgene. The light emitted from the violet illuminating unit 43 includes the wavelength band. Also: 0 =: from the light ... low softening point glass powder, but calcined according to the formation of the map == intersection. After the solid case is formed, the pattern forming material is applied to the pattern forming device, and the stage 2 is moved on the scanning head, but it is also possible that: == the upper phase moves relative to the substrate 9. In the direction 421 and the light-irradiating portion 43, the nozzle portion may be moved in the γ-ray/p pattern to be formed. In the pattern forming operation of FIG. 4, the illuminance and illuminance of the illuminating light in the starting region are sequentially: the emission, the illuminating change, the movement of the substrate 9, and the image of FIG. And the irregularity of the radiation consumption is stopped in the reverse order, and then the discharge of the material is stopped, and then, that is, the self-spraying; the operation of the wide '=4 is substantially the following operation of the W 421 discharge pattern forming material In the case of the 312XP/invention specification (supplement)/96·12/96(3) like %200822172, the light-irradiating portion 43 irradiates the pattern forming material on the substrate 9 with light, and the nozzle portion 421 and the light-irradiating portion are irradiated. 43 is relatively moved with respect to the substrate, and further, the illuminance, illuminance distribution, or irradiation range of the irradiation light of the irradiation region is irregularly changed. ,also

Moreover, the pattern forming device can be used in a field emission display device (FkM

In the substrate used for the Emission Display, the patterning of the spacer pattern or the like may be performed by using a glass substrate or a circuit (a substrate, a ceramic substrate, a semiconductor substrate, or the like) used in addition to the display device. In the above, a pattern composed of a plurality of pattern elements arranged at equal intervals in a line shape may be formed on various substrates, and the pattern may be uneven. The present invention has been described in detail above, but the The description is only for the purpose of illustration and not limitation. It is to be understood that various modifications and various embodiments may be made without departing from the scope of the invention. Fig. 2 is an enlarged view showing the vicinity of the front end of the nozzle portion and the light irradiation portion. Fig. 3 is a partial view showing the photomask. Fig. 4 is a view showing the formation of the partition wall pattern on the substrate. Fig. 5 is a plan view showing a partition wall formed on a substrate. Fig. 6 is a view showing a relationship between a transmittance of a resin film and a wavelength. Fig. 7 is a view showing light. Fig. 8 is a view showing another example of a reticle. Fig. 9 is a view showing a configuration of a light source unit according to a second embodiment. 312XP___件购细搬4 200822172 Fig. 10 shows a scanning head Fig. 11 is a view showing another example of a light source unit. Fig. 11 is a view showing a configuration of a scanning head according to a third embodiment. Fig. 14 is a view showing another example of a mask. Figure 5 is a view showing another example of the light-irradiating portion. Figure 16 is a view showing still another example of the scanning head. Figure 17 is a view for explaining the turning operation of the light-irradiating portion. Fig. 18 is a view showing a portion of a lattice pattern. Fig. 19 is a sectional view of a lattice pattern. [Description of main component symbols] 1 pattern forming device 2 platform moving mechanism 3 scanning head moving mechanism 4 ^ 4a ^ 4b scanning head Part 5 Control part 8 Pattern 9 Substrate 11 Base 12 Frame 20 Platform 21, 31, 457, 458 Motor 22, 32 Ball screw 23, 33 Nut 312XP / Invention manual (supplement) / 96-12/96131624 34 200822172 24 , 34 guides 40 Base 41 Lifting mechanism 42 Dispensing portion 43 Light illuminating portion 44 Material supply portion 45, 45a Mask moving mechanism 46, 46a λ 46b, 46c Photomask 47 Cylinder mechanism 47a, 47b Rotating mechanism 48 Guide portion 80 Pattern forming materials 81, 81a 81b partition 91 target surface 421 nozzle portion 422 discharge port 423 flow path 424 opening surface 425 opposite surface 430, 430a irradiation block 431 optical fiber 432, 432a light source unit 433 light source 434 filter 312XP / invention manual (supplement) / 96 -12/96131624 35 200822172

/ 435 Lens 436 Motor 437 Power supply 441 Supply pipe 442 Container 443 Regulator 444 Gas supply part 45 452 Lower side roll 453, 454 Upper side Xun Kun 455, 456 Annular band 461 Rectangular area 462 Rectangular area line 462a Specific rectangular area line 471 Movable parts A1 to A7, R1 Symbol B1 Irradiation area J1 Optical axis J2 Rotation axis J3, J4 Rotation axis 312XP / Invention manual (supplement) / 96-12/96131624 36

Claims (1)

200822172 X. Patent application scope: L A pattern forming device for forming a pattern on a substrate; 1 and a drawing::: material: r--for a pattern forming material which is discharged onto the substrate by a beam of two; During the discharge of the pattern forming material from the nozzle portion, the nozzle portion is advanced in the direction in which the am, the portion, and the light irradiation portion move along the substrate, and the substrate is continuously moved. a pattern formed by a plurality of linear pattern elements arranged at equal intervals in a direction perpendicular to the movement σ; and a 7-light changing unit for discharging the pattern forming material from the nozzle portion, Forming the light on the substrate and the pattern forming material in a large amount of the entire irradiation region, or arranging the plurality of partial regions in the direction of the moving direction in the irradiation region to make the pattern forming material The illuminance, the illuminance distribution, or the irradiation range in the above-described private movement direction of the above-described irradiation light changes irregularly. In the pattern forming apparatus of the first aspect of the invention, the illumination light changing unit is a mechanism for disposing the light irradiation unit during the discharge of the pattern forming material from the mouth portion. The transmittance distribution of the mask on the optical path between the substrates is irregularly changed. 3. The pattern forming apparatus of claim 2, wherein the photomask is moved parallel to the substrate, thereby causing the light 312ΧΡ/invention specification (supplement)/96-12/96131624 37 200822172 The transmittance distribution of the photomask described above changes. The pattern forming apparatus according to the first aspect of the invention, wherein the irradiation light of the :-the light irradiation unit is in a line shape, and traverses the pattern forming material, ...the injection =::: change unit The mechanism is such that, in the nozzle portion, the irradiation region is irregularly moved slightly in the moving direction from the center of the movement or the plurality of discharge ports with respect to the "period", or the center is not moved. It is seen that the rotation axis of the normal direction of the substrate is irregularly minutely rotated. 5. The pattern forming apparatus according to claim 1, wherein the illumination light changing unit is a mechanism that causes the light irradiation unit to be in a normal direction of the substrate during the formation of the material from the above-mentioned method. Move irregularly. , "6", as claimed in the first paragraph of the application, in which the pattern forming device of the 1st to 5th items of the Gudi is irregularly changed by the above-mentioned shame light changing unit: upper: illuminance The fluctuation range is 2% or more and 10% or less of the average of the space of the irradiation area and the time range. 1..., 7-pattern forming method for forming a pattern on a substrate; the method comprising the steps of: a) forming a material from a plurality of spouts of the mouth portion toward the substrate pattern; and first hardening the second) The patterning material on the substrate is irradiated with the irradiation light of the emitting portion; in particular, 〇 is parallel to the step a) above, in the nozzle portion and the light irradiation portion 312XP/invention specification (supplement)/96-12/96131624 38 200822172 moving in the direction in which the substrate moves, the nozzle portion is advanced and continuously moved relative to the substrate, whereby the substrate is formed at equal intervals in a direction perpendicular to the moving direction And a pattern formed by the plurality of pattern elements in a line shape; and d) in parallel with the step a), the arrangement of the irradiation light in the substantially entire illumination area of the substrate and the pattern forming material is set to be perpendicular to In the plurality of parts (4) of the moving direction, the illuminance, the illuminance distribution, or the irradiation range of the above-mentioned moving light on the pattern forming material is irregular . 8. The pattern forming method of claim 7, wherein the transmittance distribution of the mask disposed on the optical path between the upper light irradiation portion and the substrate is irregularly changed in the step d) . 9. The pattern forming method according to claim 8, wherein the mask is moved parallel to the substrate, thereby changing a transmittance distribution of the mask on the optical path. The pattern forming method according to claim 7, wherein the irradiation region of the irradiation light from the light irradiation portion on the substrate is linear and traverses the pattern forming material; in the step d) In the moving direction, the irradiation region moves irregularly with respect to a plurality of irregularities, or the irradiation region is irregularly minutely rotated about a rotation axis parallel to a normal direction of the substrate. 11: The method for forming a pattern according to the seventh aspect of the invention, wherein the 312XP/invention specification (supplement)/96-12/96131624 39 200822172 in the above step d), the light irradiation portion is in the normal direction of the substrate Move irregularly. The method for forming a pattern according to any one of claims 7 to 3, wherein, in the step d), the fluctuation range of the illuminance of the illumination light that changes irregularly is the space of the illumination area The average value of the time illuminance is 2% or more and 10% or less. 40 312XP/Invention Manual (supplement)/96-12/96131624