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TWI369721B - Method of fabricating patterned substrate - Google Patents

Method of fabricating patterned substrate

Info

Publication number
TWI369721B
TWI369721B TW097136091A TW97136091A TWI369721B TW I369721 B TWI369721 B TW I369721B TW 097136091 A TW097136091 A TW 097136091A TW 97136091 A TW97136091 A TW 97136091A TW I369721 B TWI369721 B TW I369721B
Authority
TW
Taiwan
Prior art keywords
patterned substrate
fabricating patterned
fabricating
substrate
patterned
Prior art date
Application number
TW097136091A
Other languages
English (en)
Other versions
TW201013747A (en
Inventor
Jer Liang Yeh
Yu Sheng Lin
Rong Zong Wang
wen jun Huang
Wen Ching Hsu
Suz Hua Ho
Original Assignee
Sino American Silicon Prod Inc
Jer Liang Yeh
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sino American Silicon Prod Inc, Jer Liang Yeh filed Critical Sino American Silicon Prod Inc
Priority to TW097136091A priority Critical patent/TWI369721B/zh
Publication of TW201013747A publication Critical patent/TW201013747A/zh
Application granted granted Critical
Publication of TWI369721B publication Critical patent/TWI369721B/zh

Links

TW097136091A 2008-09-19 2008-09-19 Method of fabricating patterned substrate TWI369721B (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
TW097136091A TWI369721B (en) 2008-09-19 2008-09-19 Method of fabricating patterned substrate

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
TW097136091A TWI369721B (en) 2008-09-19 2008-09-19 Method of fabricating patterned substrate

Publications (2)

Publication Number Publication Date
TW201013747A TW201013747A (en) 2010-04-01
TWI369721B true TWI369721B (en) 2012-08-01

Family

ID=44829465

Family Applications (1)

Application Number Title Priority Date Filing Date
TW097136091A TWI369721B (en) 2008-09-19 2008-09-19 Method of fabricating patterned substrate

Country Status (1)

Country Link
TW (1) TWI369721B (zh)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US11448955B2 (en) 2018-09-27 2022-09-20 Taiwan Semiconductor Manufacturing Co., Ltd. Mask for lithography process and method for manufacturing the same

Also Published As

Publication number Publication date
TW201013747A (en) 2010-04-01

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Legal Events

Date Code Title Description
MM4A Annulment or lapse of patent due to non-payment of fees