[go: up one dir, main page]

TWI368113B - Optical system, in particular of a microlithographic projection exposure apparatus - Google Patents

Optical system, in particular of a microlithographic projection exposure apparatus

Info

Publication number
TWI368113B
TWI368113B TW099144900A TW99144900A TWI368113B TW I368113 B TWI368113 B TW I368113B TW 099144900 A TW099144900 A TW 099144900A TW 99144900 A TW99144900 A TW 99144900A TW I368113 B TWI368113 B TW I368113B
Authority
TW
Taiwan
Prior art keywords
optical system
exposure apparatus
projection exposure
microlithographic projection
microlithographic
Prior art date
Application number
TW099144900A
Other languages
English (en)
Other versions
TW201135373A (en
Inventor
Ingo Sanger
Damian Fiolka
Original Assignee
Zeiss Carl Smt Gmbh
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Zeiss Carl Smt Gmbh filed Critical Zeiss Carl Smt Gmbh
Publication of TW201135373A publication Critical patent/TW201135373A/zh
Application granted granted Critical
Publication of TWI368113B publication Critical patent/TWI368113B/zh

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • G03F7/2004—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image characterised by the use of a particular light source, e.g. fluorescent lamps or deep UV light
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/30—Polarising elements
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/28—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for polarising
    • G02B27/281—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for polarising used for attenuating light intensity, e.g. comprising rotatable polarising elements
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/28—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for polarising
    • G02B27/283—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for polarising used for beam splitting or combining
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • G03F7/2004—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image characterised by the use of a particular light source, e.g. fluorescent lamps or deep UV light
    • G03F7/2006—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image characterised by the use of a particular light source, e.g. fluorescent lamps or deep UV light using coherent light; using polarised light
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
    • G03F7/70566—Polarisation control
    • H10P76/2041—
    • H10P76/2042—

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Polarising Elements (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Optical Elements Other Than Lenses (AREA)
TW099144900A 2009-12-22 2010-12-21 Optical system, in particular of a microlithographic projection exposure apparatus TWI368113B (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE102009055184A DE102009055184B4 (de) 2009-12-22 2009-12-22 Optisches System, insbesondere einer mikrolithographischen Projektionsbelichtungsanlage
US29792310P 2010-01-25 2010-01-25

Publications (2)

Publication Number Publication Date
TW201135373A TW201135373A (en) 2011-10-16
TWI368113B true TWI368113B (en) 2012-07-11

Family

ID=44150609

Family Applications (1)

Application Number Title Priority Date Filing Date
TW099144900A TWI368113B (en) 2009-12-22 2010-12-21 Optical system, in particular of a microlithographic projection exposure apparatus

Country Status (5)

Country Link
US (1) US8098366B2 (zh)
JP (1) JP4879348B2 (zh)
KR (1) KR101074995B1 (zh)
DE (1) DE102009055184B4 (zh)
TW (1) TWI368113B (zh)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103869626A (zh) * 2012-12-11 2014-06-18 上海微电子装备有限公司 超高数值孔径光刻成像偏振补偿装置及方法

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL2005738A (en) * 2009-12-15 2011-06-16 Asml Holding Nv Improved polarization designs for lithographic apparatus.
DE102012206150B9 (de) 2012-04-16 2014-06-12 Carl Zeiss Smt Gmbh Optisches System, insbesondere einer mikrolithographischen Projektionsbelichtungsanlage
DE102012206151A1 (de) 2012-04-16 2013-05-02 Carl Zeiss Smt Gmbh Optisches System, insbesondere einer mikrolithographischen Projektionsbelichtungsanlage
DE102012206287A1 (de) 2012-04-17 2013-10-17 Carl Zeiss Smt Gmbh Optisches System, insbesondere einer mikrolithographischen Projektionsbelichtungsanlage
DE102012223230A1 (de) 2012-12-14 2014-02-13 Carl Zeiss Smt Gmbh Optisches System, insbesondere einer mikrolithographischen Projektionsbelichtungsanlage
DE102013207502A1 (de) 2013-04-25 2014-05-15 Carl Zeiss Smt Gmbh Optisches System, insbesondere für eine Wafer- oder Maskeninspektionsanlage
CN104656265A (zh) * 2013-11-25 2015-05-27 曲阜师范大学 偏振面旋转式光强空间分布调节器
DE102017115262B9 (de) * 2017-07-07 2021-05-27 Carl Zeiss Smt Gmbh Verfahren zur Charakterisierung einer Maske für die Mikrolithographie
WO2020065933A1 (ja) * 2018-09-28 2020-04-02 シャープ株式会社 円偏光板、円偏光板の製造方法、表示装置および表示装置の製造方法

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3534363B2 (ja) 1995-07-31 2004-06-07 パイオニア株式会社 結晶レンズ及びこれを用いた光ピックアップ光学系
DE60321241D1 (de) 2003-09-26 2008-07-03 Zeiss Carl Smt Ag Belichtungsverfahren sowie Projektions-Belichtungssystem zur Ausführung des Verfahrens
CN101726863B (zh) 2004-01-16 2012-08-29 卡尔蔡司Smt有限责任公司 偏振调制光学元件
EP1621930A3 (en) 2004-07-29 2011-07-06 Carl Zeiss SMT GmbH Illumination system for a microlithographic projection exposure apparatus
JP2007258575A (ja) 2006-03-24 2007-10-04 Canon Inc 照明装置、当該照明装置を有する露光装置及びデバイス製造方法

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103869626A (zh) * 2012-12-11 2014-06-18 上海微电子装备有限公司 超高数值孔径光刻成像偏振补偿装置及方法

Also Published As

Publication number Publication date
JP4879348B2 (ja) 2012-02-22
KR101074995B1 (ko) 2011-10-18
KR20110073331A (ko) 2011-06-29
DE102009055184A1 (de) 2011-06-30
DE102009055184B4 (de) 2011-11-10
US20110149261A1 (en) 2011-06-23
US8098366B2 (en) 2012-01-17
TW201135373A (en) 2011-10-16
JP2011135087A (ja) 2011-07-07

Similar Documents

Publication Publication Date Title
TWI368113B (en) Optical system, in particular of a microlithographic projection exposure apparatus
SG153023A1 (en) Method of measuring focus of a lithographic projection apparatus
HRP20180692T1 (hr) Ureðaj za dekodiranje slike korištenjem velikih transformacijskih jedinica
IL226055A0 (en) Metrology method and apparatus, lithographic system and device manufacturing method
IL220694A0 (en) System and method for adjusting a projected image
IL217288A0 (en) Metrology method and apparatus, lithographic system, and lithographic procssing cell
EP2422240A4 (en) ELECTRO-PHOTOGRAPHIC LENS-SENSITIVE ELEMENT, PROCESS CARTRIDGE AND ELECTRO-PHOTOGRAPHIC DEVICE
ZA201505000B (en) Apparatus for decoding an image
TWI372311B (en) Method of manufactureing a pellicle for lithography
TWI560525B (en) Projection exposure tool for microlithography and method for microlithographic exposure
IL215874A0 (en) Inspection method for lithography
IL209000A0 (en) Inspection apparatus for lithography
EP2453287A4 (en) RETICLE UNIT AND OPTICAL DEVICE
EP2506061A4 (en) Image-forming optical system, exposure apparatus, and device producing method
PL3489374T3 (pl) Zwierciadła do litografii euv
EP2498129A4 (en) Focus test mask, focus measuring method, exposure apparatus, and exposure method
TWI560531B (en) Lithography apparatus
IL217388A0 (en) Inspection method for lithography
TWI350386B (en) Optical projection system
EP1983370A4 (en) FILM FOR HIGH DIGITAL OPENING EXPOSURE DEVICE
GB2470199B (en) Mask for breathing apparatus
GB0800677D0 (en) Illumination system of a microlithographic projection exposure apparatus
GB0902104D0 (en) A projection exposure tool for microlithography
TWI367404B (en) Exposure method
GB0911465D0 (en) Projection system