DE60321241D1 - Belichtungsverfahren sowie Projektions-Belichtungssystem zur Ausführung des Verfahrens - Google Patents
Belichtungsverfahren sowie Projektions-Belichtungssystem zur Ausführung des VerfahrensInfo
- Publication number
- DE60321241D1 DE60321241D1 DE60321241T DE60321241T DE60321241D1 DE 60321241 D1 DE60321241 D1 DE 60321241D1 DE 60321241 T DE60321241 T DE 60321241T DE 60321241 T DE60321241 T DE 60321241T DE 60321241 D1 DE60321241 D1 DE 60321241D1
- Authority
- DE
- Germany
- Prior art keywords
- polarization state
- exposure
- output
- carrying
- projection
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
- G03F7/70566—Polarisation control
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
- G03F7/2008—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image characterised by the reflectors, diffusers, light or heat filtering means or anti-reflective means used
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B17/00—Systems with reflecting surfaces, with or without refracting elements
- G02B17/08—Catadioptric systems
- G02B17/0892—Catadioptric systems specially adapted for the UV
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/70091—Illumination settings, i.e. intensity distribution in the pupil plane or angular distribution in the field plane; On-axis or off-axis settings, e.g. annular, dipole or quadrupole settings; Partial coherence control, i.e. sigma or numerical aperture [NA]
- G03F7/70108—Off-axis setting using a light-guiding element, e.g. diffractive optical elements [DOEs] or light guides
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70225—Optical aspects of catadioptric systems, i.e. comprising reflective and refractive elements
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70308—Optical correction elements, filters or phase plates for manipulating imaging light, e.g. intensity, wavelength, polarisation, phase or image shift
-
- H10P76/2041—
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Electron Beam Exposure (AREA)
- Prostheses (AREA)
- Polarising Elements (AREA)
- Formation Of Various Coating Films On Cathode Ray Tubes And Lamps (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE10346203 | 2003-09-26 | ||
| PCT/EP2003/011977 WO2005031467A2 (en) | 2003-09-26 | 2003-10-29 | Microlithographic projection exposure |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| DE60321241D1 true DE60321241D1 (de) | 2008-07-03 |
Family
ID=34384356
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE60321241T Expired - Lifetime DE60321241D1 (de) | 2003-09-26 | 2003-10-29 | Belichtungsverfahren sowie Projektions-Belichtungssystem zur Ausführung des Verfahrens |
Country Status (8)
| Country | Link |
|---|---|
| EP (1) | EP1668420B1 (de) |
| JP (1) | JP4588635B2 (de) |
| KR (3) | KR101119796B1 (de) |
| AT (1) | ATE396428T1 (de) |
| AU (1) | AU2003304487A1 (de) |
| DE (1) | DE60321241D1 (de) |
| TW (3) | TWI454854B (de) |
| WO (1) | WO2005031467A2 (de) |
Families Citing this family (70)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR20150036786A (ko) | 2003-04-09 | 2015-04-07 | 가부시키가이샤 니콘 | 노광 방법 및 장치, 그리고 디바이스 제조 방법 |
| DE60321241D1 (de) * | 2003-09-26 | 2008-07-03 | Zeiss Carl Smt Ag | Belichtungsverfahren sowie Projektions-Belichtungssystem zur Ausführung des Verfahrens |
| TWI628698B (zh) | 2003-10-28 | 2018-07-01 | 尼康股份有限公司 | 照明光學裝置、曝光裝置、曝光方法以及元件製造方法 |
| TW201809801A (zh) * | 2003-11-20 | 2018-03-16 | 日商尼康股份有限公司 | 光學照明裝置、曝光裝置、曝光方法、以及元件製造方法 |
| CN101726863B (zh) | 2004-01-16 | 2012-08-29 | 卡尔蔡司Smt有限责任公司 | 偏振调制光学元件 |
| US20070019179A1 (en) | 2004-01-16 | 2007-01-25 | Damian Fiolka | Polarization-modulating optical element |
| TWI395068B (zh) | 2004-01-27 | 2013-05-01 | 尼康股份有限公司 | 光學系統、曝光裝置以及曝光方法 |
| TWI366219B (en) | 2004-02-06 | 2012-06-11 | Nikon Corp | Polarization changing device, optical illumination apparatus, light-exposure apparatus and light-exposure method |
| US9396212B2 (en) | 2004-04-07 | 2016-07-19 | Visible World, Inc. | System and method for enhanced video selection |
| US9087126B2 (en) | 2004-04-07 | 2015-07-21 | Visible World, Inc. | System and method for enhanced video selection using an on-screen remote |
| EP1621930A3 (de) * | 2004-07-29 | 2011-07-06 | Carl Zeiss SMT GmbH | Beleuchtungssystem für eine mikrolithographische Projektionsbelichtungsanlage |
| TWI453796B (zh) * | 2005-01-21 | 2014-09-21 | 尼康股份有限公司 | 偏光變更單元以及元件製造方法 |
| US7375799B2 (en) | 2005-02-25 | 2008-05-20 | Asml Netherlands B.V. | Lithographic apparatus |
| JP2008533728A (ja) | 2005-03-15 | 2008-08-21 | カール・ツァイス・エスエムティー・アーゲー | 投影露光方法及びそのための投影露光システム |
| JP4691594B2 (ja) * | 2005-06-13 | 2011-06-01 | エーエスエムエル ネザーランズ ビー.ブイ. | パッシブレチクルツール、リソグラフィ装置およびリソグラフィツール内のデバイスをパターニングする方法 |
| DE102005031084A1 (de) * | 2005-06-28 | 2007-01-04 | Carl Zeiss Smt Ag | Mikrolithografisches Belichtungsverfahren sowie Projektionsbelichtungsanlage zur Durchführung des Verfahrens |
| JP4701030B2 (ja) * | 2005-07-22 | 2011-06-15 | キヤノン株式会社 | 露光装置、露光パラメータを設定する設定方法、露光方法、デバイス製造方法及びプログラム |
| EP1932061A1 (de) | 2005-10-04 | 2008-06-18 | Carl Zeiss SMT AG | Vorrichtung und verfahren zur beeinflussung der polarisationsverteilung in einem optischen system, insbesondere in einer mikrolithographischen projektionsbelichtungsanlage |
| EP1953805A4 (de) * | 2005-11-10 | 2010-03-31 | Nikon Corp | Optisches beleuchtungssystem, belichtungssystem und belichtungsverfahren |
| JP2007189079A (ja) * | 2006-01-13 | 2007-07-26 | Canon Inc | 照明光学系、当該照明光学系を有する露光装置及びデバイス製造方法 |
| US7525642B2 (en) | 2006-02-23 | 2009-04-28 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| JP5299937B2 (ja) * | 2006-05-18 | 2013-09-25 | カール・ツァイス・エスエムティー・ゲーエムベーハー | 光近接効果を補正する方法 |
| KR101235492B1 (ko) | 2006-07-03 | 2013-02-20 | 칼 짜이스 에스엠테 게엠베하 | 리소그래피 투사 대물렌즈 교정/수리 방법 |
| EP2097789B1 (de) | 2006-12-01 | 2012-08-01 | Carl Zeiss SMT GmbH | Optisches system mit austauschbarer manipulierbarer korrekturanordnung zur verminderung von bildfehlern |
| DE102007027985A1 (de) | 2006-12-21 | 2008-06-26 | Carl Zeiss Smt Ag | Optisches System, insbesondere Beleuchtungseinrichtung oder Projektionsobjektiv einer mikrolithographischen Projektionsbelichtungsanlage |
| JP5329520B2 (ja) * | 2007-03-27 | 2013-10-30 | カール・ツァイス・エスエムティー・ゲーエムベーハー | 低角度で入射する補正光を用いる補正光学素子 |
| JP5461387B2 (ja) | 2007-04-03 | 2014-04-02 | カール・ツァイス・エスエムティー・ゲーエムベーハー | 特にマイクロリソグラフィ投影露光装置の照明デバイス又は投影対物器械である光学システム |
| DE102008040218A1 (de) | 2007-07-11 | 2009-01-15 | Carl Zeiss Smt Ag | Drehbares optisches Element |
| US7817250B2 (en) | 2007-07-18 | 2010-10-19 | Carl Zeiss Smt Ag | Microlithographic projection exposure apparatus |
| DE102007055567A1 (de) | 2007-11-20 | 2009-05-28 | Carl Zeiss Smt Ag | Optisches System |
| DE102008003289A1 (de) | 2008-01-05 | 2009-07-09 | Carl Zeiss Smt Ag | Beleuchtungseinrichtung einer mikrolithographischen Projektionsbelichtungsanlage |
| DE102009023166A1 (de) | 2008-07-18 | 2010-01-21 | Carl Zeiss Smt Ag | Verzögerungsplatteneinheit, Anwendung der Verzögerungsplatteneinheit und Verfahren zu deren Herstellung |
| DE102009055184B4 (de) * | 2009-12-22 | 2011-11-10 | Carl Zeiss Smt Gmbh | Optisches System, insbesondere einer mikrolithographischen Projektionsbelichtungsanlage |
| DE102011003035A1 (de) | 2010-02-08 | 2011-08-11 | Carl Zeiss SMT GmbH, 73447 | Polarisationsbeeinflussende optische Anordnung, sowie optisches System einer mikrolithographischen Projektionsbelichtungsanlage |
| DE102010029339A1 (de) | 2010-05-27 | 2011-12-01 | Carl Zeiss Smt Gmbh | Optisches System für eine mikrolithographische Projektionsbelichtungsanlage sowie mikrolithographisches Belichtungsverfahren |
| DE102010029905A1 (de) | 2010-06-10 | 2011-12-15 | Carl Zeiss Smt Gmbh | Optisches System einer mikrolithographischen Projektionsbelichtungsanlage |
| EP2622411B1 (de) | 2010-09-28 | 2015-11-04 | Carl Zeiss SMT GmbH | Optisches system eines mikrolithografischen projektionsbelichtungsgeräts und verfahren zur minimierung von bildpositionierungsfehlern |
| DE102011076434A1 (de) | 2011-05-25 | 2012-11-29 | Carl Zeiss Smt Gmbh | Beleuchtungseinrichtung für eine mikrolithographische Projektionsbelichtungsanlage sowie mikrolithographisches Belichtungsverfahren |
| DE102011079548A1 (de) | 2011-07-21 | 2012-07-19 | Carl Zeiss Smt Gmbh | Mikrolithographische Projektionsbelichtungsanlage sowie mikrolithographisches Belichtungsverfahren |
| DE102011079777A1 (de) | 2011-07-26 | 2013-01-31 | Carl Zeiss Smt Gmbh | Mikrolithographisches Belichtungsverfahren |
| DE102011085334A1 (de) | 2011-10-27 | 2013-05-02 | Carl Zeiss Smt Gmbh | Optisches System in einer Beleuchtungseinrichtung einer mikrolithographischen Projektionsbelichtungsanlage |
| DE102012200371A1 (de) * | 2012-01-12 | 2013-07-18 | Carl Zeiss Smt Gmbh | Optisches System für eine mikrolithographische Projektionsbelichtungsanlage sowie mikrolithographisches Belichtungsverfahren |
| DE102012200368A1 (de) * | 2012-01-12 | 2013-07-18 | Carl Zeiss Smt Gmbh | Polarisationsbeeinflussende optische Anordnung, insbesondere in einer mikrolithographischen Projektionsbelichtungsanlage |
| DE102012200370A1 (de) | 2012-01-12 | 2013-08-01 | Carl Zeiss Smt Gmbh | Verfahren zum Herstellen eines polarisationsbeeinflussenden optischen Elements, sowie polarisationsbeeinflussendes optisches Element |
| DE102012203944A1 (de) | 2012-03-14 | 2013-10-02 | Carl Zeiss Smt Gmbh | Verfahren zur Justage eines optischen Systems einer mikrolithographischen Projektionsbelichtungsanlage |
| CN104220931B (zh) | 2012-03-29 | 2016-10-12 | 卡尔蔡司Smt有限责任公司 | 补偿微光刻投射曝光系统的通道缺陷的设备及方法 |
| DE102012205045A1 (de) | 2012-03-29 | 2013-10-02 | Carl Zeiss Smt Gmbh | Optisches System einer mikrolithographischen Projektionsbelichtungsanlage |
| DE102012206154A1 (de) | 2012-04-16 | 2013-06-06 | Carl Zeiss Smt Gmbh | Optisches System für eine mikrolithographische Projektionsbelichtungsanlage sowie mikrolithographisches Belichtungsverfahren |
| DE102012206159A1 (de) | 2012-04-16 | 2013-06-20 | Carl Zeiss Smt Gmbh | Polarisationsbeeinflussende optische Anordnung |
| DE102012206148A1 (de) | 2012-04-16 | 2013-10-17 | Carl Zeiss Smt Gmbh | Optisches System einer mikrolithographischen Projektionsbelichtungsanlage, sowie Verfahren zur Justage eines optischen Systems |
| DE102012206287A1 (de) * | 2012-04-17 | 2013-10-17 | Carl Zeiss Smt Gmbh | Optisches System, insbesondere einer mikrolithographischen Projektionsbelichtungsanlage |
| KR102231730B1 (ko) * | 2012-06-26 | 2021-03-24 | 케이엘에이 코포레이션 | 각도 분해형 반사율 측정에서의 스캐닝 및 광학 계측으로부터 회절의 알고리즘적 제거 |
| DE102012212864A1 (de) | 2012-07-23 | 2013-08-22 | Carl Zeiss Smt Gmbh | Optisches System, insbesondere einer mikrolithographischen Projektionsbelichtungsanlage |
| DE102012214052A1 (de) | 2012-08-08 | 2014-02-13 | Carl Zeiss Smt Gmbh | Mikrolithographisches Belichtungsverfahren, sowie mikrolithographische Projektionsbelichtungsanlage |
| DE102012214198A1 (de) | 2012-08-09 | 2013-05-29 | Carl Zeiss Smt Gmbh | Beleuchtungseinrichtung einer mikrolithographischen Projektionsbelichtungsanlage |
| DE102012217769A1 (de) | 2012-09-28 | 2014-04-03 | Carl Zeiss Smt Gmbh | Optisches System für eine mikrolithographische Projektionsbelichtungsanlage sowie mikrolithographisches Belichtungsverfahren |
| DE102012223217B9 (de) | 2012-12-14 | 2014-07-10 | Carl Zeiss Smt Gmbh | Optisches System einer mikrolithographischen Projektionsbelichtungsanlage |
| DE102013200137A1 (de) | 2013-01-08 | 2013-11-14 | Carl Zeiss Smt Gmbh | Verfahren zum Betreiben einer mikrolithographischen Projektionsbelichtungsanlage |
| US8922753B2 (en) | 2013-03-14 | 2014-12-30 | Carl Zeiss Smt Gmbh | Optical system for a microlithographic projection exposure apparatus |
| DE102013204453B4 (de) | 2013-03-14 | 2019-11-21 | Carl Zeiss Smt Gmbh | Optisches System für eine mikrolithographische Projektionsbelichtungsanlage, mikrolithographische Projektionsbelichtungsanlage und Verfahren zur mikrolithographischen Herstellung mikrostrukturierter Bauelemente |
| DE102013221365A1 (de) * | 2013-10-22 | 2014-11-20 | Carl Zeiss Smt Gmbh | Optisches System für eine mikrolithographische Projektionsbelichtungs-anlage sowie mikrolithographisches Belichtungsverfahren |
| US10948638B2 (en) | 2014-03-04 | 2021-03-16 | Stryker European Operations Limited | Spatial and spectral filtering apertures and optical imaging systems including the same |
| WO2015131278A1 (en) | 2014-03-04 | 2015-09-11 | Novadaq Technologies Inc. | Relay lens system for broadband imaging |
| BR112018003903A2 (pt) * | 2015-08-31 | 2018-09-25 | Novadaq Tech Ulc | sistema, método para filtrar luz polarizada e kit para usar com um sistema que tem lente birrefringente |
| DE102015223982A1 (de) | 2015-12-02 | 2017-06-08 | Carl Zeiss Smt Gmbh | Optisches System einer mikrolithographischen Projektionsbelichtungsanlage oder einer Waferinspektionsanlage |
| JP7162430B2 (ja) * | 2018-02-27 | 2022-10-28 | 株式会社オーク製作所 | 投影露光装置 |
| JP7145620B2 (ja) * | 2018-02-27 | 2022-10-03 | 株式会社オーク製作所 | 投影露光装置 |
| WO2020009764A1 (en) * | 2018-07-03 | 2020-01-09 | Applied Materials, Inc. | Pupil viewing with image projection systems |
| KR102598586B1 (ko) * | 2018-07-17 | 2023-11-06 | 칼 짜이스 에스엠에스 엘티디 | 포토리소그라픽 마스크의 기판에 도입되는 하나 이상의 픽셀의 효과를 결정하기 위한 방법 및 장치 |
| FI20235940A1 (en) * | 2023-08-24 | 2025-02-25 | Dispelix Oy | DISPLAY STRUCTURE |
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| JP3287014B2 (ja) * | 1992-07-03 | 2002-05-27 | 株式会社ニコン | 投影露光装置、及びその露光装置により製造されたデバイス |
| JP2698521B2 (ja) * | 1992-12-14 | 1998-01-19 | キヤノン株式会社 | 反射屈折型光学系及び該光学系を備える投影露光装置 |
| JPH088177A (ja) * | 1994-04-22 | 1996-01-12 | Canon Inc | 投影露光装置及びそれを用いたデバイスの製造方法 |
| DE19637563A1 (de) * | 1996-09-14 | 1998-03-19 | Zeiss Carl Fa | Doppelbrechende Planplattenanordnung und DUV-Viertelwellenplatte |
| JP4065923B2 (ja) * | 1998-09-29 | 2008-03-26 | 株式会社ニコン | 照明装置及び該照明装置を備えた投影露光装置、該照明装置による投影露光方法、及び該投影露光装置の調整方法 |
| JP2001185476A (ja) * | 1999-12-27 | 2001-07-06 | Mitsubishi Electric Corp | 投影露光装置 |
| US6373614B1 (en) * | 2000-08-31 | 2002-04-16 | Cambridge Research Instrumentation Inc. | High performance polarization controller and polarization sensor |
| JP2002198281A (ja) * | 2000-12-25 | 2002-07-12 | Canon Inc | 照明装置及びそれを用いた露光装置 |
| US20020149757A1 (en) * | 2001-02-28 | 2002-10-17 | Optical Switch Corporation | Polarization vector alignment for interference lithography patterning |
| DE10124803A1 (de) * | 2001-05-22 | 2002-11-28 | Zeiss Carl | Polarisator und Mikrolithographie-Projektionsanlage mit Polarisator |
| TW561254B (en) * | 2001-09-26 | 2003-11-11 | Nikon Corp | Aberration measuring device, aberration measuring method, regulation method for optical system, and exposure system provided with optical system regulated by the regulation method |
| TW200507055A (en) * | 2003-05-21 | 2005-02-16 | Nikon Corp | Polarized cancellation element, illumination device, exposure device, and exposure method |
| WO2005003862A1 (de) * | 2003-07-05 | 2005-01-13 | Carl Zeiss Smt Ag | Vorrichtung zur polarisationsspezifischen untersuchung eines optischen systems |
| DE60321241D1 (de) * | 2003-09-26 | 2008-07-03 | Zeiss Carl Smt Ag | Belichtungsverfahren sowie Projektions-Belichtungssystem zur Ausführung des Verfahrens |
-
2003
- 2003-10-29 DE DE60321241T patent/DE60321241D1/de not_active Expired - Lifetime
- 2003-10-29 EP EP03808273A patent/EP1668420B1/de not_active Expired - Lifetime
- 2003-10-29 JP JP2005509141A patent/JP4588635B2/ja not_active Expired - Fee Related
- 2003-10-29 AT AT03808273T patent/ATE396428T1/de not_active IP Right Cessation
- 2003-10-29 KR KR1020117009614A patent/KR101119796B1/ko not_active Expired - Fee Related
- 2003-10-29 KR KR1020067005867A patent/KR101119723B1/ko not_active Expired - Fee Related
- 2003-10-29 KR KR1020117009616A patent/KR101119779B1/ko not_active Expired - Fee Related
- 2003-10-29 AU AU2003304487A patent/AU2003304487A1/en not_active Abandoned
- 2003-10-29 WO PCT/EP2003/011977 patent/WO2005031467A2/en not_active Ceased
-
2004
- 2004-09-02 TW TW100142276A patent/TWI454854B/zh not_active IP Right Cessation
- 2004-09-02 TW TW100142279A patent/TWI470372B/zh not_active IP Right Cessation
- 2004-09-02 TW TW093126580A patent/TWI359334B/zh not_active IP Right Cessation
Also Published As
| Publication number | Publication date |
|---|---|
| JP4588635B2 (ja) | 2010-12-01 |
| TWI359334B (en) | 2012-03-01 |
| WO2005031467A2 (en) | 2005-04-07 |
| EP1668420B1 (de) | 2008-05-21 |
| AU2003304487A1 (en) | 2005-04-14 |
| KR20110053283A (ko) | 2011-05-19 |
| KR101119723B1 (ko) | 2012-03-23 |
| TWI454854B (zh) | 2014-10-01 |
| KR20110053284A (ko) | 2011-05-19 |
| AU2003304487A8 (en) | 2005-04-14 |
| KR101119796B1 (ko) | 2012-03-23 |
| EP1668420A2 (de) | 2006-06-14 |
| ATE396428T1 (de) | 2008-06-15 |
| TW201222170A (en) | 2012-06-01 |
| JP2007515768A (ja) | 2007-06-14 |
| KR20060097714A (ko) | 2006-09-14 |
| TW200527144A (en) | 2005-08-16 |
| KR101119779B1 (ko) | 2012-03-23 |
| TW201216015A (en) | 2012-04-16 |
| TWI470372B (zh) | 2015-01-21 |
| WO2005031467A3 (en) | 2005-05-19 |
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| 8364 | No opposition during term of opposition | ||
| 8327 | Change in the person/name/address of the patent owner |
Owner name: CARL ZEISS SMT GMBH, 73447 OBERKOCHEN, DE |