TWI366861B - - Google Patents
Info
- Publication number
- TWI366861B TWI366861B TW097104310A TW97104310A TWI366861B TW I366861 B TWI366861 B TW I366861B TW 097104310 A TW097104310 A TW 097104310A TW 97104310 A TW97104310 A TW 97104310A TW I366861 B TWI366861 B TW I366861B
- Authority
- TW
- Taiwan
Links
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| TW97104310A TW200849325A (en) | 2007-02-13 | 2008-02-04 | Plasma processing method and plasma processing apparatus |
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| TW96105248 | 2007-02-13 | ||
| JP2008002709A JP5014166B2 (ja) | 2007-02-13 | 2008-01-10 | プラズマ処理方法およびプラズマ処理装置 |
| TW97104310A TW200849325A (en) | 2007-02-13 | 2008-02-04 | Plasma processing method and plasma processing apparatus |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TW200849325A TW200849325A (en) | 2008-12-16 |
| TWI366861B true TWI366861B (zh) | 2012-06-21 |
Family
ID=44824140
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW97104310A TW200849325A (en) | 2007-02-13 | 2008-02-04 | Plasma processing method and plasma processing apparatus |
Country Status (1)
| Country | Link |
|---|---|
| TW (1) | TW200849325A (zh) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWI608515B (zh) * | 2012-09-21 | 2017-12-11 | 東京威力科創股份有限公司 | Gas supply method and plasma processing apparatus |
| TWI893072B (zh) * | 2020-03-17 | 2025-08-11 | 日商東京威力科創股份有限公司 | 偵測方法及電漿處理裝置 |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5334787B2 (ja) | 2009-10-09 | 2013-11-06 | 株式会社日立ハイテクノロジーズ | プラズマ処理装置 |
| US9799491B2 (en) * | 2015-10-29 | 2017-10-24 | Applied Materials, Inc. | Low electron temperature etch chamber with independent control over plasma density, radical composition and ion energy for atomic precision etching |
| TWI763223B (zh) * | 2020-12-31 | 2022-05-01 | 華邦電子股份有限公司 | 蝕刻系統及其蝕刻方法 |
-
2008
- 2008-02-04 TW TW97104310A patent/TW200849325A/zh unknown
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWI608515B (zh) * | 2012-09-21 | 2017-12-11 | 東京威力科創股份有限公司 | Gas supply method and plasma processing apparatus |
| TWI893072B (zh) * | 2020-03-17 | 2025-08-11 | 日商東京威力科創股份有限公司 | 偵測方法及電漿處理裝置 |
Also Published As
| Publication number | Publication date |
|---|---|
| TW200849325A (en) | 2008-12-16 |
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