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TWI358329B - Liquid material applying apparatus - Google Patents

Liquid material applying apparatus Download PDF

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Publication number
TWI358329B
TWI358329B TW097107798A TW97107798A TWI358329B TW I358329 B TWI358329 B TW I358329B TW 097107798 A TW097107798 A TW 097107798A TW 97107798 A TW97107798 A TW 97107798A TW I358329 B TWI358329 B TW I358329B
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TW
Taiwan
Prior art keywords
substrate
coating
organic
gas
liquid
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Application number
TW097107798A
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Chinese (zh)
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TW200918178A (en
Inventor
Abe Makoto
Suzuki Satoshi
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Dainippon Screen Mfg
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Publication of TW200918178A publication Critical patent/TW200918178A/en
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Publication of TWI358329B publication Critical patent/TWI358329B/en

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    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16Coating processes; Apparatus therefor
    • H10P72/0448

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  • Coating Apparatus (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Electroluminescent Light Sources (AREA)

Description

1358329 九、發明說明: 【發明所屬之技術領域】 本發明係關於在基板上塗佈流動性材料之塗佈裝置。 【先前技術】 以往,在半導體基板(以下僅稱為「基板」)上塗佈阻 劑(reS1St)液等之流動性材料的裝置,有如日本專利 ㈣3-174〇2號公報(專利文獻】)及特開應·了號 公報(專利文獻2)所揭示,藉使連續地吐出流動性材料 之喷嘴在基板上掃描,而對基板之主面全區域塗佈互相接 觸複數的平行線狀之流動性材料,如此的塗佈裝置已為人 所知。 此-塗佈裝置已被提案有為了提高流動性材料的膜厚 之均勻性的各種技術。例如,專利文獻丨揭示一種技術, 其使藉由阻劑塗佈裝置而塗佈有塗佈液的基板,在和阻劑 塗佈裝置係另外設置之溶劑環境氣裝置中使其曝露於塗 參佈液之溶劑環境氣中,而使溶劑附著於塗佈液表面並將塗 佈液表面的黏性使其降低,然後,在收容此基板之容器^ 形成氣流且藉該氣流而使塗佈液表面平坦化。又,專利文 獻1也揭示一種使收容塗佈有塗佈液之基板的容器内藉 -由對其加壓而抑制塗佈液揮發之技術。 _ 專利文獻2之塗佈成膜裝置,係在基板上方2mm以内的 位置設置可覆蓋基板之概略全部之乾燥防止板,而在被形 成於該乾燥防止板之直線狀的間隙,藉由可吐出絕緣膜用 的塗佈液之噴嘴對基板掃描,而在基板上一樣地塗佈塗佈 97107798 丄现329 ,在基板和乾燥防止板之間則可形成高濃度之溶 : 被塗佈在基板上之塗佈液的乾燥。又, 絲=之塗佈成膜裝置,係在乾燥防止板上設置渗入 成=構件,藉使自海缚構件蒸發之溶劑蒸氣從形 間’V 防止板之供給孔而供給至基板與乾燥防止板之 此而使基板與乾燥防止板之間的溶劑濃度更高。 動流動性材料之喷嘴掃描而在基板上塗佈流 r’之塗佈裝置’亦被湘於對平面顯示裝置用之基 '、佈包含像素形成材料之流動性材料。此—裝置,例 、D ’藉由重覆地以既定間距配列之複數個噴嘴來作掃描, =及在掃描方向朝向垂直方向之基板的步進(step)移 =則流動性㈣可呈肢(价ipe)狀地被塗佈在形成於 土板上的隔壁間之複數個溝部。 从在基板上’因為自流動性材料之各線⑴此)的溶劑成分 2屬而像素形成材料則定著在基板上而形成像素形成材 =的薄膜’而在溶劑蒸發為止之間,因為像素形成材料在 :動性材料之各線内充份地分散,因此其可使像素形成材 料之膜厚變成均勻。 但是,在藉複數個噴嘴塗佈流動性材料時,由於在基板 的步進移動方向之後側未被塗佈流動性材料,因此,在複 =個嘴嘴中於步進移動方向位於最後側之喷嘴所塗佈之 流動性材料的線周圍,比起藉由其他喷嘴所塗佈之流動性 材料的線周圍其環境氣中之溶劑成分濃度變低。 因此,藉最後侧的喷嘴所塗佈之流動性材料的線,比起 97107798 7 1358329 ίί Π:::::流動性材料的線則會提早乾燥,而在 體時則有發生塗佈不均勻,而在製品完 【發明IS裝置其顯示品質則有降低之虞。 本發明係可適用於在基板上塗 置,其目的為使自塗佈裝置之複 性材料的乾燥速度之均勻性提高者個土出口所吐出之流動 板=具備有:可保持基板之基板保持部;在上述基 出口副掃描方向以㈣隔所配狀複數個吐 二而朝向上述基板之上述主面上的塗佈區域吐 垂直:Γί出機構;使上述吐出機構在對上述副掃描方向 移in 面上平行之主掃描方向對上述基板相對 :述同:,對上述主掃描方向每次移動時則使上述基 :上述吐出機構在上述副掃描方向相對移動之移動機 •Ϊ初副掃描方向中自上述基板的相對移動方向 相對移動方向後側之上述基板的上述主面,以在 氣機構與上述基板之間所形成大略平行氣體流之 ^形成。P。根據本發明,在自複數個吐出口所吐出之流 均::料的周圍藉由提高環境氣中之溶劑成分的濃度之 乾燥速度lit自複數個吐出口所吐出之流動性材料的 之一較佳實施形態中,係對上述氣流形成部之上 述吐出機構,上述_描方向之相對位置純固定者。 97107798 8 1358329 本發明之其他較佳的實施形態中,係上述氣流形成部具 '有可送出上述氣體之送出口,更佳者,上述送出口對上述 吐出機構之上述複數個吐出口被配置在上述基板的上述 -相對移動方向前侧,而上述氣體自上述送出口以大略平行 地被送出至上述基板的上述主面上。 本發明之更另-個實施形態中,塗佈裝置為更具有可使 面向上述吐出機構之上述氣體予以加熱的氣體加熱部。 •上述目的及其他之目的、特徵、態樣及優點以下參照附 圖詳細對本發明說明將可更加明瞭。 【實施方式】 圖1顯示本發明之第1實施形態的塗佈裝置i之平面 圖系塗佈裝置1之前視圖。塗佈裝置1係在平面顯 二 之玻璃基板9 (以下簡稱為「基板9」)上塗佈包 3平面顯示裝置用之像素形成材料的流動性材料之震 置十。於f實施形態中,塗佈装置1係在動態矩陣(active 驅動方式之有機此(Eiectr〇 Lu_⑽顯 2二基板9上塗佈包含揮發性溶劑(在本實施形態 ’、了 、之有機溶劑之一的4— f酚甲醚(4 anisole))及在基板9 r ,^ ^ . Γ 上賦予有機EL材料之流動性材料 (以下稱為「有機虹液」)。 寸 塗佈裝置1如圖2所千,目士 部1卜如圖!及圖2所亍//右保持基板9之基板保持 基板9的主面平行之以以具有可使基板保持部11在 既疋方向(亦即圖1中之Y方向,以 97107798 9 (S ) 下稱為「副掃描 向(亦即z方向/ J)水平移動’同時’以向著垂直方 如圖2戶斤-:的軸為中心旋轉之基板移動機構12。 9加埶之Γ板二板保持部11在内部具有可自下側使基板 …、之基板加熱部之加埶哭 、人·· <、、、 ασ 111 塗佈裝置1又且古 略圖示)攝^: 對形成於基板9上之對準標記(省 基板保持:X=標記檢測部13 ;朝被保持於 (以下稱為「上面9: )Γ之:^ 線包圍表示)吐出有么f佈域91(在目1中以虛 塗佈頭液之吐出機構的塗佈頭14;使1358329 IX. Description of the Invention: TECHNICAL FIELD OF THE INVENTION The present invention relates to a coating apparatus for coating a fluid material on a substrate. [Prior Art] Conventionally, a device for applying a fluid material such as a resist (reS1St) liquid to a semiconductor substrate (hereinafter referred to simply as "substrate") is disclosed in Japanese Patent No. 3-174-2 (Patent Literature). In Japanese Patent Application Laid-Open (Patent Document 2), a nozzle that continuously discharges a fluid material is scanned on a substrate, and a plurality of parallel linear flows are applied to the entire main surface of the substrate. Sex materials, such coating devices are known. This coating apparatus has been proposed with various techniques for improving the uniformity of the film thickness of the fluid material. For example, the patent document discloses a technique of coating a substrate coated with a coating liquid by a resist coating device, and exposing it to a coating solvent in a solvent atmosphere device additionally provided with the resist coating device. The solvent of the cloth liquid is in the ambient gas, and the solvent is attached to the surface of the coating liquid and the viscosity of the surface of the coating liquid is lowered, and then the gas container is formed in the container for accommodating the substrate, and the coating liquid is formed by the gas flow. The surface is flattened. Further, Patent Document 1 discloses a technique for suppressing volatilization of a coating liquid by pressurizing a container in which a substrate coated with a coating liquid is accommodated. The coating film forming apparatus of Patent Document 2 is provided with a drying prevention plate that covers substantially all of the substrate at a position within 2 mm above the substrate, and is capable of being discharged in a linear gap formed in the drying prevention plate. The nozzle of the coating liquid for the insulating film scans the substrate, and the coating 97107798 is applied 329 on the substrate, and a high concentration of the solution can be formed between the substrate and the drying prevention plate: coated on the substrate The coating liquid is dried. Further, the coating film forming apparatus of the yarn is provided with a penetration-in member on the drying prevention plate, and the solvent vapor evaporated from the sea-binding member is supplied to the substrate from the supply hole of the inter-shaped 'V prevention plate, and the drying prevention is prevented. The plate thus has a higher solvent concentration between the substrate and the drying prevention plate. The coating device for scanning the nozzle of the fluid material to apply the flow r' on the substrate is also used as a base material for a flat display device, and the cloth contains a fluid material of a pixel forming material. The apparatus, the example, D' is scanned by a plurality of nozzles repeatedly arranged at a predetermined interval, = stepwise shifting of the substrate in the scanning direction toward the vertical direction = then fluidity (four) can be limbed (Price ipe) is applied to a plurality of grooves between the partition walls formed on the soil plate. The pixel forming material is formed on the substrate by the solvent component 2 of the line (1) of the self-flowing material, and the pixel forming material is fixed on the substrate to form a film of the pixel forming material = between the solvent evaporation, because the pixel forming material The film is sufficiently dispersed in each line of the movable material, so that the film thickness of the pixel forming material can be made uniform. However, when the fluid material is coated by a plurality of nozzles, since the fluid material is not coated on the side after the stepwise movement direction of the substrate, it is located at the last side in the stepwise moving direction in the complex nozzle. The concentration of the solvent component in the ambient gas around the line of the fluid material coated by the nozzle is lower than the line around the line of the fluid material coated by the other nozzle. Therefore, the line of the fluid material coated by the nozzle on the last side is dried earlier than the line of 97107798 7 1358329 ίί Π::::: fluid material, and uneven coating occurs in the body. However, when the product is finished, the display quality of the invention IS device is reduced. The present invention is applicable to a substrate which is coated on a substrate, and which is intended to improve the uniformity of the drying speed of the re-material of the self-coating device. The flow plate discharged from the soil outlet is provided with a substrate holding portion capable of holding the substrate. And a plurality of spouts are arranged in the sub-exit scanning direction in the direction of the sub-scanning direction, and are perpendicular to the coating area on the main surface of the substrate: a mechanism for moving the ejection mechanism in the sub-scanning direction The main scanning direction parallel to the surface is opposite to the substrate: the same: when moving in the main scanning direction, the base: the ejection mechanism is relatively moved in the sub-scanning direction in the sub-scanning direction The main surface of the substrate on the rear side from the relative movement direction of the substrate in the relative movement direction is formed by forming a substantially parallel gas flow between the gas mechanism and the substrate. P. According to the present invention, the flow discharged from the plurality of discharge ports is one of the fluid materials discharged from the plurality of discharge ports by increasing the drying speed of the concentration of the solvent component in the ambient gas. In a preferred embodiment, the discharge mechanism of the airflow forming portion is fixed to the relative position of the scanning direction. According to another preferred embodiment of the present invention, the airflow forming unit has a delivery port for sending the gas, and more preferably, the plurality of discharge ports of the delivery port are disposed at the plurality of discharge ports of the discharge mechanism. The gas is fed to the front surface of the substrate from the delivery port in a substantially parallel manner from the front side in the relative movement direction of the substrate. In still another embodiment of the present invention, the coating device further includes a gas heating unit that can heat the gas facing the discharge mechanism. The above and other objects, features, aspects and advantages of the present invention will become more apparent from the accompanying drawings. [Embodiment] FIG. 1 is a front view showing a plan view coating apparatus 1 of a coating device i according to a first embodiment of the present invention. The coating device 1 is applied to a glass substrate 9 (hereinafter simply referred to as "substrate 9") which is a flat surface, and is coated with a fluid material of a pixel forming material for a flat display device. In the embodiment of the present invention, the coating apparatus 1 is coated with a volatile solvent (in the organic solvent of the present embodiment) on the dynamic matrix (the active mode is organically applied to the Eiectr® Lu_(10) display 2 substrate 9). a 4-f-anisole (4 anisole) and a fluid material (hereinafter referred to as "organic rainbow") imparted to the organic EL material on the substrate 9 r , ^ ^ . 。. 2 thousand, the eyepiece portion 1 is as shown in Fig. 2 and the main surface of the substrate holding substrate 9 of the right holding substrate 9 is parallel to have the substrate holding portion 11 in the opposite direction (i. The Y direction in 1 is referred to as "sub-scanning direction (ie, z-direction / J) horizontally moving at the same time as 97107798 9 (S)] while rotating toward the vertical axis as shown in Fig. 2 The moving mechanism 12. The nine-twisted two-plate holding portion 11 has a substrate heating unit that can be used to lower the substrate from the lower side, and the user is immersed in the substrate heating device, and the α σ 111 coating device 1 is further And the icon is shown in the figure: the alignment mark formed on the substrate 9 (the substrate is held: X = the mark detecting portion 13; Hereinafter referred to as "above 9:) Γ of: ^ encircled line) f cloth discharge Mody domain 91 (in the head 1 in the coating head discharging mechanism of the liquid coating virtual head 14; make

方板9的上面90平行且在副婦描方向之垂直 乃同(亦即圖1中夕γ 土 I 水平蔣叙夕;以下稱為「主掃描方向」) 移動之塗佈頭移動機構15 (亦即“向)而被設在基板伴持移動方向 可接受來自塗佈頭14之右趟。 ”1的兩侧’同時, 流動性材料之有㈣液至 控::Γ而如圖1所示’且其具有可控制此等構造: 類1及圖2所示,塗佈頭14具有可連續吐出同 類的有機EL液之複數個(在本實施㈣為=一種 3個噴嘴Π大致直線狀地被 )噴嘴Π。 :向),同時,在y方向(亦即副掃描::(:即主掃描 从偏離。3個喷嘴17之吐出口 U己置成稍 方向,而鄰接之2個喷嘴17之間之二副掃描 係專於事先卿成於基板9的塗 距離, 飞yi上之主掃描方 97107798 I358329 向延伸的隔壁間之間距f& Γ _ 當在基板9的塗佈區域9〗上:佈:=的3倍。 嘴嘴17吐出有機EL液於隔壁間所形成之/個、聋,3個 怖。f藉塗佈裝置1塗佈有機EL液之2個溝部^而塗 包夹藉其他塗佈裝置等而塗佈直他 間,被 個溝部。 八種類之有機EL液的2 在塗佈裝置1,塗佈頭移動機構i 係,使塗佈頭14相對於基板9在主掃描^動機構12 同時使基板9相對於塗佈頭u :二目對移動, 移動機構。如後面所說明,在塗方向相對移動之 :有機EL液時,基板9和基板保持部1 一 ::㊁:”塗 向中自圖1中之(-”側朝向(+γ)侧移描方 之(+ ”側在副掃描方向中成 :Ρ ’圖 :向前側,而(-Υ)側在副掃描方向;;丄::對移動 移動方向後側。換言之,圖成為基板9之相對 之副掃描方向移動的下流側,( Υ)側係在基板9 上流側。 )側係基板9之移動的 汝圖1及圖2所示,塗佈穿晋 個喷嘴17之吐出口的(二係在塗佈頭Η之複數 板9的相對移動方 板移動機構所配置,同時=基板保持部11及基 送出氣體而形成自(+γ)側朝^(、有由朝向(-γ)側 即在副掃財向中從基板q 2向(~γ)側之氣體流(亦 相對移動方犧繼)之起朝向 97107798 軋流形成部1 9,由 娘姓^ 由於和基板移動機構12及塗佈頭移動 機構15 —起被固定 初 成部19對塗佈頭14: 基°上,因此,氣流形 本广、务 4之副掃描方向的相對位置係被固定 者。氣流形成部1 q, M μ + 4 在剡知描方向中被設成接近於塗佈 頭14的複數個喷嘴〗7 ^ β _ 角w ’而軋流形成部19與複數個噴嘴 Π之間之副掃描方向 π旳距離為數cm。又,氣流形成部! 9 破配設在基板9的上侧而接近於基板9的上面9〇。 圖一3顯二氣流形成部19附近之縱剖面圖。如圖2及圖 二丁氣仇形成部19具有可送出氣體至和塗佈頭Η的 :個喷嘴17相對向(~γ)側之送出口 191,而送出口 191 :、'、有纟掃描方向的全長比基板9之塗佈區域91 (參 照圖1)的主掃描方向之全長更長之細縫狀。 塗佈裝置1中’氣流形成部19被連接至省略圖示之壓 f機,而藉自壓縮機供給空氣(比通f空氣更低溼度之乾 空軋)至氣流形成部19,而對塗佈頭14之複數個噴嘴j?, 自(+Y)側(亦即基板9之相對移動方向前側)、所配置 之物19"月向基板9的上面9〇之(_γ)側平行地送 出空氣。藉此,在複數個喷嘴17之前端(亦即,吐出口) 和基板9之間在基板9的上面9〇形成平行之空氣流。氣 流形成部19,由於沿著基板9的塗佈區域91之主掃描方 向的全長設置送出口 19卜因此,上述空氣流沿著塗佈區 域91之主掃描方向的全長被形成。 藉氣流形成部1 9所形成之空氣流動速度(亦即流速), 在喷嘴17與基板9之間,使其秒速為〇. 15m以上、〇. 35mThe coating head moving mechanism 15 in which the upper surface 90 of the square plate 9 is parallel and the vertical direction of the accessory drawing direction is the same (that is, the γ γ soil I level in the Fig. 1; Jiang Xixi; hereinafter referred to as "main scanning direction") That is, "direction" is set in the substrate supporting movement direction from the right side of the coating head 14. "1 on both sides", at the same time, the fluid material has (four) liquid to control:: Γ and as shown in Figure 1. And the control head 14 has a plurality of organic EL liquids which can be continuously discharged in the same manner (in the present embodiment, (4) is a type of three nozzles, and is substantially linear. Ground cover) nozzle Π. :)), at the same time, in the y direction (that is, the sub-scan:: (ie, the main scan is deviated. The discharge port U of the three nozzles 17 is set to a slight direction, and the second pair between the adjacent two nozzles 17 The scanning system is dedicated to the coating distance of the substrate 9 in advance, and the main scanning side of the flying 117 is 97107798 I358329. The distance between the extending partitions is f& Γ _ when on the coating area 9 of the substrate 9: cloth:= 3 times. The mouth mouth 17 discharges the organic EL liquid formed between the partition walls, 聋, 3 。. The coating device 1 applies the two grooves of the organic EL liquid, and the other coating device is coated. The coating is applied to the main scanning unit 12 in the coating device 1, the coating head moving mechanism i, and the coating head 14 in the main scanning mechanism 12 with respect to the substrate 9. At the same time, the substrate 9 is moved relative to the coating head u: the second moving pair, moving mechanism. As will be described later, when the coating direction is relatively moved: the organic EL liquid, the substrate 9 and the substrate holding portion 1 are: The middle side of the (+) side is shifted from the (-" side toward the (+γ) side in Fig. 1 in the sub-scanning direction: Ρ 'Fig.: the front side, and the (-Υ) side Scanning direction; 丄:: the rear side of the moving direction of movement. In other words, the figure is the downstream side of the substrate 9 moving in the sub-scanning direction, and the (Υ) side is on the upstream side of the substrate 9.) The movement of the side substrate 9 1 and 2, the discharge port of the nozzle 17 is applied (the second is placed in the relative moving plate moving mechanism of the plurality of plates 9 of the coating head), and the substrate holding portion 11 and the base are simultaneously Gas is sent to form a gas flow from the (+γ) side to the (+γ) side, that is, from the side of the (-γ) side, that is, in the sub-sweeping direction from the substrate q 2 to the (~γ) side (also relative to the moving side) Starting from 97107798, the rolling flow forming portion 19 is fixed by the initial portion 19 to the coating head 14 by the substrate moving mechanism 12 and the coating head moving mechanism 15, and therefore, the air flow shape The relative position of the sub-scanning direction of the present invention is fixed. The airflow forming portion 1 q, M μ + 4 is set to be close to the plurality of nozzles of the coating head 14 in the smear direction 7 7 β _ angle w' and the distance between the rolling flow forming portion 19 and the plurality of nozzles π in the sub-scanning direction is several cm. 9 is broken and disposed on the upper side of the substrate 9 and is close to the upper surface 9 of the substrate 9. Fig. 1 is a longitudinal sectional view showing the vicinity of the airflow forming portion 19. Fig. 2 and Fig. 2 The nozzles 17 having the gas to be supplied to the coating head 相对 are opposite to the (~γ) side of the delivery port 191, and the delivery port 191:, 'the total length of the scanning direction is larger than the coating area 91 of the substrate 9 ( Referring to Fig. 1), the entire length of the main scanning direction is longer and longer. In the coating device 1, the 'airflow forming portion 19 is connected to a compressor (not shown), and the air is supplied from the compressor. Dry air rolling of lower humidity) to the airflow forming portion 19, and a plurality of nozzles j? to the coating head 14, from the (+Y) side (that is, the front side of the relative movement direction of the substrate 9), and the arranged object 19&quot The moon sends air in parallel to the (_γ) side of the upper surface 9 of the substrate 9. Thereby, a parallel air flow is formed between the front end of the plurality of nozzles 17 (i.e., the discharge port) and the substrate 9 on the upper surface 9 of the substrate 9. In the air flow forming portion 19, since the delivery port 19 is provided along the entire length of the main scanning direction of the application region 91 of the substrate 9, the air flow is formed along the entire length of the application region 91 in the main scanning direction. The air flow velocity (that is, the flow velocity) formed by the airflow forming portion 19 is between the nozzle 17 and the substrate 9, so that the second speed is 〇15 m or more, 〇. 35 m.

97107798 12 <S 1358329 乂下為佳(秒速以〇. 2m以上、〇. 3m以下則更佳),在本 貫施形態中秒速為〇.21m。又,藉氣流形成部i 之空氣流,只要在基板9的上面90大略平行即可,但對 上面9 0稍微傾斜亦可。 _其次說明藉塗佈裝置1塗佈有機EL液之情形。圖4顯 =有:EL液之塗佈流程。當藉塗佈裝置i塗佈有機此液 τ,首先,使基板9被載置保持於基板保持部u,依照 =準標記檢測部13之輸出而基板移動機構_驅動並 土板9移動及旋轉’而位於圖j中以實線所示之塗 (步驟S11)。換言之,塗佈頭14位於對基板9之 二:描方向中相對移動之開始端。又,塗佈頭U在主掃 ^向中,事先位於圖!及圖2中以實線所示之待機位置 ’、即圖1中之(-X )側的受液部j 6上方)。 接著,藉控制部2氣流形成部19被控制並自送出口 i9i 出空氣’而在基板9上之上面9()形成平行之空氣 二(:驟⑽。其:欠’藉控制部2控制塗佈頭 吐出有機_ (步驟叫又,塗佈頭 (亦即自圖在主掃描方向之移動 “ 中之(-χ)側朝向(+ Ό側移動)開始。 與自2置1在對塗佈頭14之主掃描方向相對移動時’ 朝向基板9連續吐出有機_,則有機此 驟被塗佈在基板9的塗佈區域91之3條溝部 )。又,圖1甲塗佈區域91的(+Χ)側及(_χ) 侧之非塗佈區域由於藉省略圖示之遮罩(mask)J皮覆) 97107798 13 1358329 蓋’,因此,其不會被塗佈有機EL液。 當塗伟頭14移動至圖!及圖2中以 機位置(亦即,⑷)側之受液部16上方=所= 動機構12則被驅動,而基 & ’基板# Y)太a r + _ 土极9和基板保持部11 一起在(屮 ° '、即,副掃描方向)僅移動等於PI)劈η sp μ 9 倍之距離(步驟叫此時,塗佈頭14從=距。 朝受液部16連續地吐出有機EL液。 置!係利用速乾性之有機紅液的溶劑,又,由 於基板9係藉基板保持之加 此,藉喷嘴π被塗佈在塗佈區域91而=熱在: 塗佈後馬上在步驟S15中 機&液,在被 間迅速地乾焊基板9的副掃描方向移動之 (亦即,溶劑自有機 EL材料以半乾燥狀態殘 而有機 薄膜。 土板9上形成有機EL·材料之 在副掃描方向中當基板9 > 可確埤美妬〇 s # 1 町移勁、,s 了捋,错控制部2其 „9及基板保持部U是否移 鏈線所表示之塗佈終了位 中乂一”沾 5泠被欲7 / 、少鄉M 6 )。又,當来移動 至塗佈終了位置時,則返回步驟si 動 個喷嘴Π 一面吐出有機EL液一== 移動至(-X)方向(亦即, 反9之(+X)側 塗佈區域91之溝部被塗:田。上,而在基板9的 了位置(步驟實施確認是否移動至塗佈終97107798 12 <S 1358329 It is better to squat (second speed is more than 2m, 〇. 3m or less is better), and in the basic mode, the second speed is 21.21m. Further, the air flow by the air flow forming portion i may be substantially parallel to the upper surface 90 of the substrate 9, but may be slightly inclined to the upper surface 90. Next, the case where the organic EL liquid is applied by the coating device 1 will be described. Figure 4 shows = there is: coating process of EL liquid. When the organic liquid τ is applied by the coating device i, first, the substrate 9 is placed and held by the substrate holding portion u, and the substrate moving mechanism _ drives the soil plate 9 to move and rotate in accordance with the output of the = mark detecting portion 13. 'The coating is shown by the solid line in Fig. j (step S11). In other words, the coating head 14 is located at the beginning of the relative movement of the second substrate: the drawing direction. Moreover, the coating head U is in the main sweep direction, and is located in advance! And the standby position shown by the solid line in Fig. 2, that is, above the liquid receiving portion j 6 on the (-X) side in Fig. 1). Next, the airflow forming portion 19 of the control unit 2 is controlled to output air from the outlet i9i, and the air 9 is formed on the upper surface 9() of the substrate 9 (step (10). The cloth head spits out the organic _ (the step is called again, and the coating head (that is, the movement from the figure in the main scanning direction) starts in the (-χ) side direction (+ Ό side movement). When the main scanning direction of the head 14 is relatively moved, the organic layer is continuously ejected toward the substrate 9, and the organic layer is applied to the three groove portions of the coating region 91 of the substrate 9.) +Χ) The non-coated area on the side and (_χ) side is covered by a mask (mask) that is omitted (97107798 13 1358329), so it will not be coated with organic EL liquid. The head 14 moves to the figure! and in Fig. 2, above the liquid receiving portion 16 on the machine position (i.e., (4)) side = the moving mechanism 12 is driven, and the base & 'substrate #Y) is too ar + _ soil The pole 9 and the substrate holding portion 11 together move only the distance equal to PI) 劈η sp μ 9 times (屮° ', ie, the sub-scanning direction) (the step is called at this time, the coating head 14 is from the distance The organic EL liquid is continuously discharged to the liquid receiving portion 16. The solvent of the quick-drying organic red liquid is used, and the substrate 9 is applied to the coating region 91 by the nozzle π. = heat: Immediately after the application, the machine & liquid is moved in the sub-scanning direction of the dry-welded substrate 9 in the step S15 (i.e., the solvent remains in the semi-dry state from the organic EL material and the organic film is left. The organic EL material is formed on the earth plate 9 in the sub-scanning direction. When the substrate 9 > can be confirmed, the 妒〇 1 s # 1 町 moves, s 捋, the wrong control unit 2 „9 and the substrate holding portion U Whether the end of the coating indicated by the shift chain is in the middle of the coating, and the movement is to the end of the coating, then return to the step si to move a nozzle. When the organic EL liquid is discharged, the pressure is shifted to the (-X) direction (that is, the groove portion of the (+X) side coating region 91 of the reverse 9 is coated: the field is placed on the substrate 9 (the step is confirmed). Whether to move to the end of coating

塗佈裝置1中,基板保持部u A; Q p】〗及基板9在位於塗佈終 97107798 1358329 了位置為止’塗佈頭14在主掃描方向之移動以及基板9 在(+Y)側的步進移動則重覆(亦即,塗佈頭14對基板 9在主掃描方向中每次相對移動時,基板9對塗佈頭14 =掃描方向相對地移動),藉此,在基板9之塗佈區域 ’有機EL液則以等於隔壁間距3倍之間距配列之條 而被塗佈(步驟S14〜S16)。在塗佈裝置 於 :=向在基板9上有機EL液之塗佈的進行方向(亦 塗佈碩14對基板9的相對移動 19 ^ ^ ^ . T秒勃万向),係和藉基板移 動機構12之基板9的移動方向呈相反的方向。 ::基板9移動至塗佈終了位置時,3個嗔嘴17則 分止吐出有機EL液(步驟S17),又,: 停止送出空氣(步驟S18)’而塗佈裝置二二。"9也 機EL液的塗佈則終了。塗佈 :、土板9之有 9則被搬送至其他的塗佈裝等 、”佈終了後其基板 已塗佈有機EL液以外機=㈣㈣佈裝置1 實際上係對複數個基板9連續地塗佈、塗佈裝置1 況下,在步驟Si8中從氣流形成部 =°在此情 送出,而在對複數個基板9塗佈有㈣二氣: 自氣流形成部19連續地送出空氣。 〜了為止,係 如以上所說明,塗佈裝置丨, 方向移動,從3個喷嘴17吐出㈢,、佈頭14在主掃描 塗佈在基板9之塗佈區域91 機乩液,條紋狀地被 中央喷嘴η所被㈣之有機° b,:藉3個噴嘴π中之 卜Y)側的嘴嘴17平行塗怖Μ液線’係藉( + Y)側及 佈之有機乩液線所包夾,而藉 97107798 1358329 二V::嘴17塗佈之有機既液線,則係藉中㈣ ^7千仃塗佈之錢_線及已 =In the coating apparatus 1, the substrate holding portion u A; Q p ] and the substrate 9 are moved in the main scanning direction and the substrate 9 is on the (+Y) side at the position of the coating end 97107798 1358329. The step movement is repeated (that is, when the coating head 14 moves relative to the substrate 9 in the main scanning direction, the substrate 9 is relatively moved to the coating head 14 = scanning direction), whereby the substrate 9 is coated. The cloth region 'organic EL liquid is applied at a distance equal to three times the distance between the partition walls (steps S14 to S16). In the coating device, the direction of the coating of the organic EL liquid on the substrate 9 is also applied (the relative movement of the substrate 14 is also applied to 19 ^ ^ ^ . T seconds), and the substrate is moved. The direction of movement of the substrate 9 of the mechanism 12 is in the opposite direction. When the substrate 9 is moved to the coating end position, the three nozzles 17 are separated from the organic EL liquid (step S17), and the air is stopped (step S18)', and the coating device 22 is applied. "9 The coating of the EL liquid is finished. Coating: 9 of the soil boards 9 are transported to other coatings, etc., and the substrate is coated with an organic EL liquid after the end of the cloth = (4) (4) The cloth device 1 is actually continuously connected to the plurality of substrates 9 In the case of the coating and coating apparatus 1, in the step Si8, the airflow forming portion = ° is sent out, and the plurality of substrates 9 are coated with (four) two gases: the air is continuously supplied from the airflow forming portion 19. As described above, the coating device 丨 moves in the direction, and is ejected from the three nozzles 17 (3), and the cloth head 14 is applied to the coating region 91 of the substrate 9 in the main scanning, and is striped in the center. The nozzle η is (4) organic ° b,: by the nozzles 17 of the three nozzles π, the mouth of the mouth 17 is parallel coated with the sputum liquid line 'to borrow (+ Y) side and the organic sputum line of the cloth While borrowing 97107798 1358329 two V:: the organic liquid line coated by the mouth 17 is borrowed from the middle (four) ^ 7 thousand 仃 coated money _ line and has =

=線群所包夾。因此,在中央及( + y)H 17所塗佈之有機EL液線周圍 、紫 的溶劑成分濃度則變高。 、…中之有機EL液 面;,!:裝置1在氣流形成部19所形成之基板9的上= line group folder. Therefore, the concentration of the solvent component of purple around the center and the organic EL liquid line coated with ( + y) H 17 becomes high. , organic EL liquid in ...;,! : The device 1 is on the substrate 9 formed by the air flow forming portion 19

二平行的(+Υ)側朝向(-Y)方向之空氣流, 猎由(+Υ)側及中央之喷嘴17所塗佈之有機 圍之環境氣朝向(-Υ )方6撼私 、·周 切17抓Γ 由此,在藉㈠)側之 Μ Π所塗佈之有機EL液線周圍,其環境氣中之有機 乩液的溶劑成分濃度也變高,而在们個喷嘴17所塗佈 ^ 3條有機線周圍,料提高環境氣 濃度之均勻性。 w风刀 此處,如以未設有氣流形成部之塗佈裝置作為比較例 日^在比較例之塗佈裝置中在藉(+γ)側(亦即,在副 掃描方向中基板之相對移動方向前側)之喷嘴及中央喷嘴 所塗佈之有機EL液線周圍,和上述同樣地,環境氣中之 有機EL液的溶劑成分濃度也變高。但是,在藉(_γ)側 (亦即,在副掃描方向中基板之相對移動方向後側)的噴 觜所塗佈之有機EL液線之(-γ)側,則其他的有機EL液 線未被塗佈,因此,僅在(+γ)側被配置以藉中央喷嘴 平行塗佈之有機EL液線。 因此,在藉(-Υ )侧的喷嘴塗佈之有機EL液線周圍, 和藉由(+ Y)側及申央的喷嘴所塗佈之有機乩液線周圍 < 97107798 16 1358329 相比,有機EL液之溶劑成分濃度變成較低,而(_γ)侧 之有機EL液線之乾燥速度,比(+γ)侧之2條有機el 液線變成較大。又,在(—Y)側之有機乩液線周圍,在 該線之(-Y)側的環境氣中其有機EL液的溶劑成分濃度, 變成比線之(+Y)側的濃度更低,而線(_γ)側的部位 則比(+ Υ )側的部位變成更早即乾燥。 圖5Α表示藉比較例之塗佈裝置自3個喷嘴所塗佈之有 機EL液使冷劑洛發,而在基板9a上之塗佈區域91 &上形 成的有機EL材料之3條薄膜93a的剖面圖。圖5八,為了 圖不方便,已省略被形成於基板9a之塗佈區域91&的隔 土之圖π ’又’ 4膜93a之高度被描晝為比實際的高度更 大(圖5B中也同樣)。 如上述,比較例之塗佈裝置,由於㈠)側的有機虹 液、·泉的(Y一)侧部位比(+ γ )側的部位更早乾燥,因此, 如圖5A所示,在(_γ)侧之薄膜咖中,㈠)側之部位 的膜厚比(十…則部位之膜厚更大。又,此-厚度且有 偏^之有機EL材料的薄臈93a,在塗佈區域…周期地 3條)-形成而使其產生塗佈不均勻,則在製品 < 、’面顯不裝置中則有顯示品質降低之虞。 :反地,本實施形態之塗佈褒置卜 個噴嘴17所塗佛q I错3 洛條有機乩液線周圍,其可提高環境 劑成分的濃度之均句性。又,在藉3個噴嘴17 側及〔-η側的噴嘴17所塗佈之有機EL液線之(+Y) 側中其可使環境氣中之有機EL液的溶劑成分 97107798 17 1358329 之湲度的差異變小。 由此,其可提高自3個喷嘴17的吐出口所吐 乩液的乾燥速度之均勻性, 有機 即’在副掃描方向中基板9之相對移 17之吐出口所,土出的有機此液之乾燥速度在副掃描:: 大致上均等。結果,如圖5β所示,其可使 。 乩材料的3條薄膜93之剖面形成大致同—形狀,且= 板9上的塗佈區域91中可防止塗佈不均勾之發生。在基 動:料有像素形成材料之流 製品完成後i备有平面題-辟#發生塗佈不均勾時,則 上述,在本實施形態之塗佈裝置〗,之虞= 勻之癸哇,U· 口八J防止塗佈不均 1入 ,'、佈裝置1特別適用於平面顯示裝置用 包含像素形成材料的流動性材料之塗佈。 裝置用 域=佈A置方h藉由在基板9的上面90沿著塗佈區 佈頭U:之有向^ 此 有機EL液線全長中,自有機EL液之涂 掃ί 之間,其空氣流可被維持。因此,沿著在主 Γ二塗:之之右該有機㈣ 9上的塗佈巴=7液的乾燥速度之均句性,且在基板 在中可更確實地防止㈣^ 如過小時,則環境3由於從乳流形成部19之空氣的流速 地擴埒,中之溶劑成分在(-γ)側則不能充份 '、月 。流速過大時則溶劑成分會擴散至廣泛範圍而 < s 97107798 18 Ϊ358329 低其濃度’因此,在副 的喷嘴17之位置(亦即 之塗佈碩14 之空氣的送出量被決定如 使自氣流形成部19 里做成疋而如此使空翕 & 因應於氣流形成部和塗佈頭上= 更自氣流形成部之空氣的送出量。相對地,由變 對位置,因此二定在副掃描方向之相 出量。結果,其;氣流形成部19之空氣的送 如产十 、了使塗佈裝置1之裝置構造簡單化。 在^形成部19如藉自送出口 191送出空氣而 9而ϋΓ Γ形成平行之空氣流’則其和藉空氣之抽吸ΐ 望之ί:或ϋ成ίί流相比’則可容易地形成具有所希 、斤„ °,机之空氣流。結果,其可使塗佈裝置1之摄 :簡單化。又’、、如藉自配置於塗佈頭14之複數個喷嘴17The air flow of the two parallel (+Υ) sides toward the (-Y) direction, the ambient gas of the organic enclosure coated by the (+Υ) side and the central nozzle 17 is oriented toward (-Υ). By the way, the concentration of the solvent component of the organic sputum in the ambient gas is also increased around the organic EL liquid line coated by the 一(1)) side, and is applied to the nozzles 17 Cloth ^ 3 organic lines around, to improve the uniformity of ambient gas concentration. w wind blade here, for example, a coating device not provided with a gas flow forming portion as a comparative example day in the coating device of the comparative example on the borrowing (+γ) side (that is, the relative of the substrate in the sub-scanning direction) In the same manner as described above, the concentration of the solvent component of the organic EL liquid in the ambient gas is also increased around the nozzle of the front side of the moving direction and the organic EL liquid line applied by the center nozzle. However, on the (-γ) side of the (_γ) side (that is, the back side of the relative movement direction of the substrate in the sub-scanning direction), the other organic EL liquid lines are on the (-γ) side of the organic EL liquid line coated by the sneezing. It is not coated, and therefore, the organic EL liquid line which is disposed in parallel on the (+γ) side by the central nozzle is applied. Therefore, the area around the organic EL liquid line coated by the nozzle on the (-Υ) side is compared with the organic sputum line coated by the nozzle on the (+ Y) side and the center of the center, < 97107798 16 1358329 The concentration of the solvent component of the organic EL liquid becomes low, and the drying speed of the organic EL liquid line on the (_γ) side becomes larger than the two organic el liquid lines on the (+γ) side. Further, around the organic sputum line on the (-Y) side, the concentration of the solvent component of the organic EL liquid in the ambient gas on the (-Y) side of the line becomes lower than the concentration on the (+Y) side of the line. The portion on the side of the line (_γ) becomes dry earlier than the portion on the (+ Υ) side. Fig. 5A shows three films 93a of an organic EL material formed on the coated regions 91 & on the substrate 9a by the organic EL liquid applied from the three nozzles by the coating apparatus of the comparative example. Sectional view. 5, in order to make the drawing inconvenient, the height of the π '又' 4 film 93a of the coating region 91 & formed in the substrate 9a has been omitted to be larger than the actual height (Fig. 5B The same). As described above, in the coating apparatus of the comparative example, since the (I) side portion of the (I) side of the organic rainbow and the spring is dried earlier than the (+ γ) side, as shown in FIG. 5A, In the film coffee on the side of _γ), the film thickness ratio of the portion on the side of (a) is larger (the film thickness of the portion is larger. Further, the thickness 且 93a of the organic EL material having a thickness and a partial thickness is in the coating region. In the case of the product, the film is unevenly formed, and the display quality is lowered in the product < On the contrary, the coating of the nozzle of the present embodiment is applied to the periphery of the organic sputum line of the sputum, which can improve the uniformity of the concentration of the environmental agent component. Further, in the (+Y) side of the organic EL liquid line coated by the nozzles 17 on the side of the three nozzles 17 and the nozzles on the -η side, the solvent component 97107798 17 1358329 of the organic EL liquid in the ambient gas can be made. The difference in degrees becomes smaller. Thereby, the uniformity of the drying speed of the spitting liquid from the discharge ports of the three nozzles 17 can be improved, and the organic liquid is discharged from the discharge port of the substrate 9 in the sub-scanning direction. The drying speed is in the sub-scanning:: roughly equal. As a result, as shown in Fig. 5β, it can be made. The cross section of the three films 93 of the bismuth material is formed into a substantially the same shape, and the occurrence of uneven coating can be prevented in the coating region 91 on the plate 9. In the base motion: after the flow of the material having the pixel forming material is completed, i has a plane problem--# when the coating unevenness occurs, the above, in the coating device of the embodiment, the 虞 = uniform 癸 wow U.S. s. J prevents application unevenness, and the cloth device 1 is particularly suitable for application of a fluid material containing a pixel forming material to a flat display device. The device field = cloth A is placed on the upper surface 90 of the substrate 9 along the coating area U: the total length of the organic EL liquid line, from the coating of the organic EL liquid, the air The flow can be maintained. Therefore, along the uniformity of the drying speed of the coating bar = 7 liquid on the organic (four) 9 on the right side of the main coating, and the substrate can be more reliably prevented in the middle of the substrate, if it is too small, then The environment 3 is expanded by the flow rate of the air from the milk flow forming portion 19, and the solvent component in the (-γ) side is not sufficient for the month. When the flow rate is too large, the solvent component will diffuse to a wide range and <s 97107798 18 Ϊ358329 is low in its concentration. Therefore, at the position of the sub-nozzle 17 (that is, the amount of air sent by the coating 14 is determined as the self-flow. In the forming portion 19, the air is formed in the airflow forming portion and the coating head, and the air is sent from the airflow forming portion. In contrast, the position is changed, so the second scanning direction is set. As a result, the air is sent to the airflow forming unit 19, and the structure of the apparatus of the coating apparatus 1 is simplified. The air forming unit 19 sends air by the outlet 191. The Γ forms a parallel air flow', and it can be easily formed by the suction of the air: or it can be formed into a flow with the air, and the air flow of the machine can be easily formed. The photographing device 1 is simplified. Further, as a plurality of nozzles 17 disposed on the coating head 14

而+Υ)側之送出口 191平行地送出空氣至基板9的上 面90’則其可更容易地形成上述空氣流,且可使 置1之構造簡單化。 I 尸在氣流形成# 19,其藉利用空氣當作在基板9上形成 氣流之氣體,而由於其在基板保持部u或塗佈裝置f的 周圍不須要設置氣密構造,因此,其可使塗佈裝置1之構 造更簡單化。又,其亦可利用已設置塗佈裝置丨之工廠等 原有的設備而容易地供給氣體至氣流形成部19。 在塗佈裝置1,其藉使基板9加熱之加熱器in而將塗 97107798 19 13^8329 板9的塗佈區域91之有機EL液的乾燥速度增大, 使自3個喷嘴17的吐出口所吐出之有機EL液的 1=、又之差異變成更小。結果,其可更提高自3個噴嘴 66^出之有機EL液的乾燥速度之均勻性,且在基板9 、塗佈區域91中其可更確實地防止塗佈不均勻之發 生。 λ 說明本發明之第2實施形態的塗佈裝置。圖6表示 λ她形態之塗佈裝置的氣流形成部19附近的縱剖面 二:圖6所示,帛2實施形態之塗佈裝置,係在氣流形 ❹的内部設有可使朝向塗佈頭14的空氣加熱之氣體 加…Ρ 192。在本實施形態中,氣體加熱部192係使用在 方向延伸之棒狀的加熱器。而其他的構造則和圖i至圖 戶:不之塗佈裝置!相同’在以下的說明中被附加以相同 的符號。 在第2實施形態之塗佈裝置中,其和帛ι實施形態同 樣’糟形成在氣流形成部19之基板9的上面9〇自平行(+ y)側朝(-Y)方向之空氣流’在以3個喷嘴17所塗佈之 3條有機EL液線周圍,其可提高環境氣 度的均句性。結果,其可提高自塗佈頭14之3個成喷刀嘴广? 的吐出口所吐出之有機EL液的乾燥速度之均勻性,且在 基板9上之塗佈區域91(參照圖υ其可防止 之發生。 在第2實施形態之塗佈裝置中,特別是藉氣體加熱部 192所被加熱之空氣因在基板9的上面9〇形成平行之氣 97107798 20 ( 1358329 流,因此其可使被塗佈在基板9的塗佈區域91之有機el 液的乾燥速度增大。藉此,則可使自3個喷嘴i7的吐出 口所吐出之有機EL液的乾燥速度之差異變成更小,結 果,可更提咼自3個噴嘴π所吐出之有機乩液的乾燥 度之均勻性。 ’ 以上雖對本發明之實施形態加以說明,但本發明並不受 限於上述實施形態,而其可作各種各樣之變更。 又 •在第2實施㈣之塗佈裝置中,其氣體加熱部192並無 被設在氣流形成部19内部的必要,其也可設在氣流形成 9之(-γ)側,且在塗佈頭14之噴嘴η的(+ γ)側 和氣流形成部19獨立地設置亦可。在此情況下,自氣流 形成邛19被达出之空氣因通過氣體加熱部丨92附近而被 加熱,通過被加熱之空氣其在基板9的上面9〇則 行之氣流。 上述實施形態之塗料置中,在副掃描方向中之塗 14的噴嘴17位置,空氣的流速並不受限於上述之範圍, 其可因應於有機EL液的溶劑之種類或蒸發速度等而 適當之速度。 、 氣流形成部19之送出口 19卜並無沿著塗佈區域9ι主 掃描方向的全長延伸而成細縫⑴⑴狀之必要,例如,如 在氣流形成部19上設置沿著塗佈區域91之主掃描方向全 長而排列之複數個送出口,如此亦可。又,氣流形成部 的达出口 19卜並不須-定設成沿著塗佈區域91之主 掃描方向全長’而例如使主掃描方向之寬度和塗佈頭Μ 97107798 21 相等之僅有的1個送出口的氣流形成部,-可 =動地被設在複數個噴嘴17之(+Υ)側的主掃描;: 上,而糟在塗佈有機此液 向 W同步地在主掃財向移^ ///空氣—面和塗佈頭 間形忐Λ 動且在塗佈頭14與基板9之 在 1 =板9的上面90之平行的空氣流,如此亦可。 部19之送出口 191平行二:f不一定須自氣流形成 运出空氣至基板9的上面9〇, 其例如可自配置於塗佈頭 19朝向下方(亦即,(—z)二⑴)侧的氣流形成部 9的主面9G或其他之構 而❹基板 基板9之主面Μ形成平行氣流,如此亦可。 氣塗m流形成部19所送出之氣體並不限於空 :二為氮氣(N2)等惰性氣體。又,如含有微 面90形成平行之老、、ώ :的…皮送出而在基板9的上 于订之氣"IL,如此亦可。 、、::在塗佈裝置中,也可取代自 =體的氣流形成部19,而在 : 置藉抽吸周圍之環境氣 ^ 又 成部,如此亦可。又,士 = 1形成氣流之氣流形 出氣俨^ ό , 如自塗佈頭14之(+ γ)側一面送 出乱體一面自(一Υ)侧抽 而設置U形成部,如此^體而在基板9上形成氣流, 上述實施形態之塗佈穿詈, 12使基板9及基板保持部u,可取代藉基板移動機構 副掃描方命 、’、、 之移動,而藉塗佈頭14在 ° ’以使在副掃描方向中對基板9的塗佈頭 97107798 22 < S ) 1358329 2相對移動’如此亦可。又,如取代 之塗佈頭14的移動,而m也0 "項移動機構15 掃梅方向移動,:在:二基= 基板保持部η在主 iB 部描方向中塗佈頭14 f+萁此η 相對移動,如此亦可。 對基板9之 塗佈裝置也可自塗佈頭14 與紅色⑴、綠色(G)、藍色(ΒΠ:將各別含有 至茂/ 的有機财㈣時吐出並塗佈 9上。在此情況下,在塗佈頭14,於鄰接之2 又,在4 =j掃:方向之距離和隔壁間距係相等者。 定於3個,而在塗佈頭14 之喷/ 17並不限 17亦可。又,…1: 或4個以上的喷嘴 設有隔U 7所吐出之有機此液如在未 又有^壁之塗佈區域91上塗佈成條紋狀亦可。 未 但是,連續被吐出在基板9上之 機乩液中之有機EL 幾EL液線’由於有 因此,由於乾燥時間之==向:比較容易移動, 穴圖?斤示膜厚容易發生差異。上述實施形態之塗佈 勾\生,^ ,由於可提高有機虹液之乾燥時間的均 此’其雖然特別適用於連續吐出有機α液在基 性材料在2置’但其也適用於如嘴墨式斷續地吐出流動 /·生材科在基板上塗佈之裝置。 上述貫施形態之塗備梦晋,1破;a丄 動性材料塗佈在基板=置二含有電洞輸送材料之流 材抖」係形成有機EL顯示裝置之電洞輸送層的材料,「電 97107798 23 (S ) 1358329 洞輸送層」不僅指對藉有機£[材 送電洞的狹義之電洞輸送層的含意,也包含對有電機 =層輸 入的電洞注入層。 7罨洞實施注 塗:展置也可被利用於自2片基板製造複 顯不裝置(亦即’拼板,㈣灿卿⑴。又,有機= 佈裝置不僅可被利用於包含有機EL顯示裝置用之有機π 材料或電洞輸送材料之流動性材料的塗佈,例如,On the other hand, the air supply port 191 on the side of the + Υ) sends air to the upper surface 90' of the substrate 9 in parallel, so that the air flow can be formed more easily, and the structure of the first can be simplified. I corpse is formed in the airflow #19 by using air as a gas for forming a gas flow on the substrate 9, and since it is not required to provide a gas-tight structure around the substrate holding portion u or the coating device f, The construction of the coating device 1 is simpler. Further, it is also possible to easily supply the gas to the air flow forming portion 19 by using an original device such as a factory in which the coating device is installed. In the coating device 1, the drying rate of the organic EL liquid in the coating region 91 of the 97107798 19 13 8 8 plate 9 is increased by the heater in which the substrate 9 is heated, so that the discharge ports from the three nozzles 17 are increased. The difference of 1 = in the organic EL liquid spit out becomes smaller. As a result, the uniformity of the drying speed of the organic EL liquid from the three nozzles can be further improved, and in the substrate 9 and the coating region 91, the unevenness of coating can be more surely prevented. λ A coating apparatus according to a second embodiment of the present invention will be described. Fig. 6 shows a longitudinal section 2 in the vicinity of the airflow forming portion 19 of the coating device of the λ-form: as shown in Fig. 6, the coating device of the embodiment of the 帛2 is provided inside the airflow shape so as to be oriented toward the coating head. 14 air heated gas plus ... Ρ 192. In the present embodiment, the gas heating unit 192 uses a rod-shaped heater extending in the direction. Other constructions are shown in Figure i to Figure: No coating device! The same 'is attached to the same symbols in the following description. In the coating apparatus of the second embodiment, the air flow in the (-Y) direction from the parallel (+ y) side to the upper surface 9 of the substrate 9 of the air flow forming portion 19 is formed in the same manner as the 实施ι embodiment. Around the three organic EL liquid lines coated by the three nozzles 17, it is possible to improve the uniformity of the environmental gas. As a result, it is possible to improve the uniformity of the drying speed of the organic EL liquid discharged from the three discharge nozzles of the coating head 14 and the coating area 91 on the substrate 9 (refer to the figure). In the coating apparatus of the second embodiment, in particular, the air heated by the gas heating unit 192 forms a parallel gas 97107798 20 (1358329 flow) on the upper surface 9 of the substrate 9, so that it can be The drying rate of the organic EL liquid applied to the application region 91 of the substrate 9 is increased, whereby the difference in the drying speed of the organic EL liquid discharged from the discharge ports of the three nozzles i7 can be made smaller. As a result, the uniformity of the dryness of the organic sputum discharged from the three nozzles π can be further improved. The embodiment of the present invention has been described above, but the present invention is not limited to the above embodiment, and Further, in the coating device of the second embodiment (4), the gas heating portion 192 is not required to be provided inside the airflow forming portion 19, and may be provided in the airflow forming portion 9 (-γ). ) side, and on the (+ γ) side of the nozzle η of the coating head 14 and gas The flow forming portion 19 may be provided independently. In this case, the air which is formed by the air flow forming enthalpy 19 is heated by passing near the gas heating portion 丨92, and is heated by the air on the upper surface of the substrate 9 In the coating of the above embodiment, in the position of the nozzle 17 of the coating 14 in the sub-scanning direction, the flow velocity of the air is not limited to the above range, which may be dependent on the type or evaporation of the solvent of the organic EL liquid. The speed of the airflow forming portion 19 is not required to extend along the entire length of the application scanning region 9 to form a slit (1) (1), for example, as shown in the airflow forming portion 19. A plurality of delivery ports arranged along the entire length of the main scanning direction of the coating region 91 may be used. Further, the outlet 19 of the airflow forming portion does not need to be set to be along the main scanning direction of the coating region 91. For example, the airflow forming portion of the only one of the outlets, which has the width of the main scanning direction and the coating head Μ 97107798 21, can be movably provided on the (+Υ) side of the plurality of nozzles 17 Main scan;: on, The coating of the organic liquid is synchronously moved between the main sweeping direction and/or the air-surface and the coating head, and is on the top of the coating head 14 and the substrate 9 at 1 = plate 9. The parallel air flow of 90 is also possible. The delivery port 191 of the portion 19 is parallel two: f does not necessarily have to form the air from the air flow to the upper surface 9 of the substrate 9, which can be self-disposed to the coating head 19, for example. (i.e., the main surface 9G of the airflow forming portion 9 on the side of the (-z) two (1)) or the other surface of the base substrate 9 of the substrate substrate 9 is formed into a parallel flow, so that the gas flow m flow forming portion 19 The gas to be sent is not limited to empty: the second is an inert gas such as nitrogen (N2). Further, if the micro-face 90 is formed to form a parallel old, the 皮: the skin is sent out and the substrate 9 is placed on the air "IL This is also possible. In the coating device, the airflow forming portion 19 of the body may be replaced by the airflow forming portion 19 of the body. In addition, the airflow of the airflow is formed by the airflow of the airflow, and the U-shaped portion is provided from the side of the (+ γ) side of the coating head 14 and is disposed from the side of the (one side), so that the body is formed. The airflow is formed on the substrate 9, and the coating and the squeezing of the above-described embodiment 12 allows the substrate 9 and the substrate holding portion u to be moved by the substrate moving mechanism, and the coating head 14 is moved by the substrate. 'It is also possible to relatively move the coating head 97107798 22 < S ) 1358329 2 of the substrate 9 in the sub-scanning direction. Further, if the movement of the coating head 14 is replaced, and m is also moved in the sweeping direction of the item moving mechanism 15, the substrate 14 f + 萁 is applied in the direction in which the substrate holding portion η is drawn in the main iB portion. This η moves relatively, so too. The coating device for the substrate 9 can also be discharged and coated 9 from the coating head 14 and the red (1), green (G), and blue (ΒΠ: organic acids (4). Next, in the coating head 14, in the adjacent 2, the distance in the direction of 4 = j sweep is equal to the distance between the partition walls. It is set at three, and the spray on the coating head 14 is not limited to 17 Further,...1: or 4 or more nozzles are provided with an organic liquid which is discharged from the partition U7, and may be applied in a stripe shape on the coating area 91 which is not yet walled. Since the organic EL EL liquid line 'in the machine sputum discharged on the substrate 9 is present, the drying time is relatively easy to move, and the film thickness of the hole pattern is likely to be different. Cloth hook \ raw, ^, because it can improve the drying time of organic rainbow liquid. This is especially suitable for continuous discharge of organic alpha liquid in the basic material in the 2 set 'but it is also suitable for intermittent ink The device that sprays the flow/·the material on the substrate. The above-mentioned application form is coated with Mengjin, 1 broken; a turbulent material is coated on The plate=set two material containing the hole transport material is formed by the material of the hole transport layer of the organic EL display device. The electric 97107798 23 (S) 1358329 hole transport layer not only refers to the organic material. The meaning of the narrow hole transport layer also includes the hole injection layer for the motor = layer input. 7 hole injection coating: the display can also be used to make the display device from the two substrates (ie 'Plate, (4) Can Qing (1). Further, the organic cloth device can be used not only for coating of a fluid material including an organic π material or a hole transporting material for an organic EL display device, for example,

被利用於對液晶顯示裝置或電漿顯示裝置等:可 裝置用的基板塗佈包含著色材料或營光材料等其他= 之像素形成材料的流動性材料。 ' 如上所述,塗佈裝置由於在基板9上的塗佈區域9 防止塗佈不均勻之發生’因此’雖然其特別被適用於對梦 品完成時顯示品質降低而容易感受到此因塗佈不均勻戶: 引起之平面顯示裝置用的包含像素形成材料(在上述實於 形態中係有機EU頁示裝置用之有機EL材料)的流動^ 料之塗佈,但上述塗佈裝置如被利用於對平面顯示褒置用 之基板或半導體基板等各種基板上塗佈㈣種類的流動 性材料,如此亦可。 上述雖然已詳細地描述本發明,但上述之說明僅係例示 性者其並不用來限定本發明。因此U殘離本發明之 範圍其可作各種變形或態樣。 【圖式簡單說明】 圖1表示第1實施形態之塗佈裝置的平面圖 圖2係塗佈裝置之前視圖。 97107798 24 1358329 圖 表示氣流形成部附近之縱剖面圖 在基板上形成之有It is used for applying a liquid material including a coloring material, a camping material, or the like to a substrate for a liquid crystal display device, a plasma display device, or the like. As described above, the coating device prevents the occurrence of coating unevenness due to the coating region 9 on the substrate 9. Therefore, although it is particularly suitable for the display quality degradation when the dream product is completed, the coating is easily felt. Non-uniform household: application of a flow material including a pixel forming material (an organic EL material for an organic EU page device in the above-described embodiment) for use in a flat display device, but the above coating device is utilized It is also possible to apply a (four) type of fluid material to various substrates such as a substrate for display of a flat display or a semiconductor substrate. The invention has been described in detail above, but is not intended to limit the invention. Therefore, various modifications or aspects can be made without departing from the scope of the invention. BRIEF DESCRIPTION OF THE DRAWINGS Fig. 1 is a plan view showing a coating apparatus according to a first embodiment. Fig. 2 is a front view of a coating apparatus. 97107798 24 1358329 Figure Longitudinal section showing the vicinity of the airflow forming section

圖4表示有機EL液之塗佈流程。 圖5A表示藉比較例之塗佈裝置而 EL材料的薄膜之剖面圖。 圖5B表示藉本實施形態之塗佈裝置而在基板上 有機EL材料的薄膜之剖面圖。Fig. 4 shows a coating flow of an organic EL liquid. Fig. 5A is a cross-sectional view showing a film of an EL material by a coating apparatus of a comparative example. Fig. 5B is a cross-sectional view showing a film of an organic EL material on a substrate by the coating apparatus of the embodiment.

圖6表不第2實施形態之塗佈裝置的氣流形成 縱剖面圖。 又冲附近之 【主要元件符號說明】 1 塗佈裝置 2 控制部 9 ^ 9a 基板 11 基板保持部 12 基板移動機構 13 對準標記檢測部 14 塗佈頭 15 塗佈頭移動機構 16 受液部 17 喷嘴 18 流動性材料供給部 19 氣流形成部 90 主面(上面) 91、 91a 塗佈區域 93、 93a 薄膜 111 加熱器 97107798 25 1358329 191 送出口 192 氣體加熱部Fig. 6 is a longitudinal sectional view showing the flow of the coating apparatus of the second embodiment. [Main component symbol description] 1 Coating device 2 Control unit 9 ^ 9a Substrate 11 Substrate holding portion 12 Substrate moving mechanism 13 Alignment mark detecting portion 14 Coating head 15 Coating head moving mechanism 16 Liquid receiving portion 17 Nozzle 18 Flowable material supply portion 19 Air flow forming portion 90 Main surface (upper surface) 91, 91a Coating region 93, 93a Film 111 Heater 97107798 25 1358329 191 Feed port 192 Gas heating portion

97107798 2697107798 26

Claims (1)

AUG 1 2 2011 - f 1 換本 十、申請專利範g • 1 甘—種塗佈Μ’在基板上塗佈流動性材料; 其具備有: 基板保持部,用以保持基板; 吐出機構’在上述基板 所配列之複數侗,山 ^丁之田J知描方向以等間隔 -怖…ΓΓ 朝向上述基板之上述主面上的塗 佈S域吐出流動性材料; I 移動機構,使上述吐出機槿 •上述主面平行之主在上述副掃播方向垂直且在 動H ^ ~&quot;方向相對於上述基板相對地移 出機構=上、次向上述主婦福方向移動時相對於上述吐 〃 ί 34基板在上制掃財向相對地移動;及 :::成部’其被形成於:在上述副掃描方向中 移動方向前側面對相對移動方向後側 基扳的上述主面,佶去畝正 上述基板之間形成;仃的氣體流在上述吐出機構與 上述氣流形成部具有送出上述氣體之送出口, 口 口係相對於上述吐出機構之上述複數個吐出 體自达相對移動方向前側,上述氣 =上述送出口大略平行地被送出至上述基板的上述主 面上。 2.如申請專利範圍第1項之塗佈裝置,其中, 利用上述氣流形成部,上沭 上边虱體流在上述塗佈區域之上 达主知描方向的全長形成。 3·如申請專利範圍第1項之塗佈裝置,其中, 97107798 27 1358329 ΙΑ 1 ' -—-— _^日修(更)正替換頁 構,上述副掃描方 相對於上述氣流形成部之上述吐出機 向之相對位置被固定。 4. 如申請專利範圍第丨項之塗佈裝置,其中, 上述氣體為空氣。 5. 如申請專利範圍第丨項之塗佈裝置,其中, 上述基板保持部具有使上述基板加熱之基板加熱部。 .如申請專利範圍第1項之塗佈裝置,其中, 上述流動性材料包含平面顯示裝置用之像素形成材料。 中更圍第1至6項中任一項之塗佈裝置,其 體加熱Γ 述吐出機構㈣之使上述氣體加熱的氣 97107798 28AUG 1 2 2011 - f 1 change ten, apply for patent g • 1 甘 种 Μ Μ 'coating a fluid material on the substrate; it is provided with: a substrate holding portion for holding the substrate; The plurality of 侗 配 侗 侗 侗 侗 山 山 山 山 山 山 山 山 山 山 山 山 山 山 山 山 山 山 知 知 知 知 知 知 知 知 知 知 知 知 知 知 知 知 知 知 知 知 知 知 知 知 知 知 知槿 The main parallel face of the main surface is perpendicular to the sub-sweeping direction and moves relative to the substrate relative to the substrate. The substrate is relatively moved in the upper sweeping direction; and::: the forming portion is formed in: in the sub-scanning direction, the front side of the moving direction is opposite to the rear side of the relative moving direction, and the main surface is Forming between the substrates; the gas flow of the crucible has a delivery port for sending the gas to the discharge mechanism and the air flow forming portion, and the mouth is relatively moved relative to the plurality of discharge bodies of the discharge mechanism On the front side of the direction, the gas = the delivery port is sent out substantially parallel to the main surface of the substrate. 2. The coating apparatus according to claim 1, wherein the upper airflow forming portion is formed on the upper side of the upper coating area in the main drawing direction by the air flow forming portion. 3. The coating device of claim 1, wherein: 97107798 27 1358329 ΙΑ 1 ' - - - - _ ^ daily repair (more) is replacing the page structure, the above-mentioned sub-scanning side is opposite to the above-mentioned airflow forming portion The relative position of the spout machine is fixed. 4. The coating device of claim </RTI> wherein the gas is air. 5. The coating apparatus according to claim 2, wherein the substrate holding portion has a substrate heating portion that heats the substrate. The coating device according to claim 1, wherein the fluid material comprises a pixel forming material for a flat display device. The coating device according to any one of items 1 to 6, wherein the body heats the gas which is heated by the gas from the discharge mechanism (4).
TW097107798A 2007-04-06 2008-03-06 Liquid material applying apparatus TWI358329B (en)

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JP5342282B2 (en) * 2009-03-17 2013-11-13 大日本スクリーン製造株式会社 Coating device
JP2010221182A (en) * 2009-03-25 2010-10-07 Toppan Printing Co Ltd Ink supply apparatus
US20130004656A1 (en) * 2011-07-01 2013-01-03 Kateeva, Inc. Apparatus and method to separate carrier liquid vapor from ink
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JP2001300383A (en) * 2000-04-28 2001-10-30 Optrex Corp Coater for ultraviolet setting resin
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