JP2007038135A - Membrane manufacturing equipment - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a film manufacturing apparatus capable of improving the uniformity of the film thickness of a liquid material applied on a substrate and improving the use efficiency of the liquid material.
A film manufacturing apparatus (11) includes a stage (12) for mounting a substrate (19), a liquid material supply nozzle (13) for supplying a liquid material (20) as a film source onto the substrate (19), and a substrate (19). A gas blower 21 is blown onto the supplied liquid material 20 and a first air blowing mechanism 14 is provided for spreading the liquid material 20 on the substrate 19 by moving in the X direction. Since the first air blowing mechanism 14 moves in the X direction while blowing the gas 21, it becomes possible to apply a gas having a certain strength to the liquid material 20 so as to spread on the substrate 19, and the liquid having a uniform thickness on the substrate 19. Material 20 is applied.
[Selection] Figure 1

Description

  The present invention relates to a film manufacturing apparatus that forms a film by applying a liquid material that is a source of a film on a substrate.

  For example, as described in Patent Document 1, the above-described film manufacturing apparatus performs film formation using a spin coating method in which a liquid material that is a source of a film is stretched on a substrate using centrifugal force. Yes. The spin coating method is, for example, an SOG (Spin On Glass) method. The film manufacturing apparatus includes a stage (substrate mounting unit) on which a substrate can be placed and the substrate can be rotated. In a film manufacturing method using a film manufacturing apparatus, a substrate is first placed on a stage and rotated. Next, a liquid material is supplied near the center on the rotating substrate. The liquid material supplied onto the substrate spreads outward from the vicinity of the center of the substrate due to the centrifugal force generated by the rotation of the substrate. Thereby, a liquid material is apply | coated to the whole on a board | substrate.

JP-A-10-261579

However, since the centrifugal force is applied to the liquid material on the substrate, the liquid material is concentrated in the vicinity of the periphery of the substrate, thereby increasing the film thickness of the liquid material in the vicinity of the periphery of the substrate. There was a problem in that the uniformity of the film thickness was reduced.
In addition, most of the liquid material supplied onto the substrate falls from the substrate due to the rotating operation of the substrate, thereby causing a problem that the use efficiency of the liquid material is lowered.

  An object of this invention is to provide the film | membrane manufacturing apparatus which can improve the uniformity of the film thickness of the liquid material apply | coated on a board | substrate, and can improve the use efficiency of a liquid material.

  In order to achieve the above object, a film manufacturing apparatus according to the present invention includes a first blower mechanism having a first blower port for ejecting a first gas, and a first drive mechanism for moving the first blower mechanism. Prepare.

  According to this configuration, the first driving mechanism ejects the first gas from the first air blowing port of the first air blowing mechanism and moves the first air blowing mechanism, so that the first gas is moved to each moving place. Can be ejected. Thereby, the 1st gas of fixed intensity can be supplied to each place.

  In order to achieve the above object, a film manufacturing apparatus according to the present invention includes a substrate mounting part, a first air blowing mechanism having a first air outlet for ejecting a first gas to the substrate mounting part, and the substrate. A drive mechanism that relatively moves the mounting portion and the first air blowing mechanism.

  According to this configuration, the drive mechanism ejects the first gas from the first blower opening of the first blower mechanism to the substrate platform and relatively moves the substrate platform and the first blower mechanism. The first gas can be ejected to a location where the substrate mounting portion and the first air outlet in the substrate mounting portion intersect. Thereby, the 1st gas of fixed intensity can be supplied to each place of a substrate mounting part.

  In the film manufacturing apparatus according to the present invention, it is preferable that the driving mechanism moves the first air blowing mechanism relative to the substrate mounting portion in the X, Y, and Z directions.

  According to this configuration, since the first air blowing mechanism is moved relative to the substrate platform in the X, Y, and Z directions by the drive mechanism, the first gas is disposed at all locations in the region of the substrate platform. Can be erupted. In addition, the direction of movement while ejecting the first gas can be freely set with respect to the substrate platform.

  It is desirable that the film manufacturing apparatus according to the present invention further includes a second air blowing mechanism having a second air outlet that ejects the second gas.

  According to this structure, since 2nd gas is ejected from the 2nd ventilation port of a 2nd ventilation mechanism, each gas can be ejected with 1st gas which ejects from a 1st ventilation mechanism. For example, 1st gas and 2nd gas can be ejected with respect to a board | substrate mounting part.

  In the film manufacturing apparatus according to the present invention, it is desirable that a direction in which the first air outlet ejects the first gas is different from a direction in which the second air outlet ejects the second gas.

  According to this structure, since the direction which ejects 1st gas differs from the direction which ejects 2nd gas, each gas can be ejected from a different direction with respect to a board | substrate mounting part, for example.

  The film manufacturing apparatus according to the present invention preferably further includes a second drive mechanism that moves the second blower mechanism, and the second drive mechanism preferably operates independently of the first drive mechanism.

  According to this configuration, since the second drive mechanism and the first drive mechanism operate independently, the second blower mechanism and the first blower mechanism can be moved separately. Thereby, for example, the gas from different directions can be moved separately with respect to the substrate, or the respective gases can be moved alternately.

  In the film manufacturing apparatus according to the present invention, the first gas ejected from the first air blowing port moves a part of the liquid material disposed on the substrate, and the gas ejected from the second air blowing port. The second gas is preferably one that prevents at least another part of the liquid material disposed on the substrate from moving outside the peripheral edge of the substrate.

  According to this configuration, a part of the liquid material on the substrate is moved by the first gas, and another part of the liquid material is prevented from moving outside the peripheral edge of the substrate by the second gas. The liquid material can be prevented from spilling from above, and the liquid material can be spread with a certain strength. As a result, a necessary amount of liquid material can be secured on the substrate, and as a result, a liquid material having a uniform thickness can be applied on the substrate. In addition, it is possible to suppress a decrease in the usage efficiency of the liquid material.

  In the film manufacturing apparatus according to the present invention, it is preferable that the first air blowing mechanism further has a third air outlet for ejecting a third gas.

  According to this configuration, since the first air blowing mechanism has the first air blowing port and the third air blowing port, it is possible to eject two gases with only the first air blowing mechanism. Thereby, two gas can be ejected to the same place in a substrate mounting part, each gas can be ejected to a different place, or each gas can be ejected alternately.

  In the film manufacturing apparatus according to the present invention, it is preferable that an opening area of the first air outlet is larger than an opening area of the third air outlet.

  According to this structure, since the opening area of a 1st ventilation port is large compared with a 3rd ventilation port, it becomes possible to widen the ejection range of gas. Thereby, gas can be ejected to a wide range with a 1st ventilation port with respect to a board | substrate mounting part, or gas can be ejected to a narrow range with a 3rd ventilation port.

  In the membrane manufacturing apparatus according to the present invention, it is desirable that the air blowing control mechanism of the first air blowing port and the air blowing control mechanism of the third air blowing port are different.

  According to this configuration, since the air blowing control mechanisms of the first air blowing port and the third air blowing port are different, the air flow rate between the first gas ejected from the first air blowing port and the third gas ejected from the third air blowing port Each speed can be different.

  In the film manufacturing apparatus according to the present invention, it is desirable that the first gas and the third gas are different.

  According to this configuration, since the first gas and the third gas are different, for example, it can be made to correspond to the properties of the substrate and the liquid material and what is desired to be formed.

  The film manufacturing apparatus according to the present invention further includes a third air blowing mechanism for ejecting the second gas in order to prevent the other part on the substrate from moving to the outside of the peripheral edge of the substrate, It is desirable that the second air blowing mechanism and the third air blowing mechanism are arranged so as to surround the substrate.

  According to this configuration, since the second air blowing mechanism and the third air blowing mechanism are arranged so as to surround the substrate, the other liquid material that moves when a part of the liquid material is moved by the first gas. Part of the liquid material can be prevented from spilling from the substrate by the second gas from the second air blowing mechanism and the third air blowing mechanism. As a result, a liquid material having a uniform thickness can be applied on the substrate without reducing the required amount of liquid material. In addition, it is possible to suppress a decrease in the usage efficiency of the liquid material.

  In the film manufacturing apparatus according to the present invention, it is preferable that the second driving mechanism moves the second blowing mechanism and the third blowing mechanism in accordance with the movement of the first blowing mechanism.

  According to this configuration, since the second and third blower mechanisms are moved by the second drive mechanism in accordance with the movement of the first blower mechanism, the second drive mechanism moves to the liquid material in accordance with the movement of the liquid material that easily flows down from the substrate. 2 gas can be sprayed. Therefore, it is possible to suppress the liquid material from falling from the substrate, and thereby to maintain a necessary amount of the liquid material on the substrate. As a result, a liquid material having a predetermined thickness can be applied onto the substrate.

  The film manufacturing apparatus according to the present invention is capable of blowing a fourth gas from the back surface direction of the substrate to the end portion so as to prevent the liquid material from flowing from the end portion of the substrate to the back surface side. It is desirable that a four air blowing mechanism is further provided.

  According to this configuration, when the liquid material remaining on the substrate is removed from the substrate to the outside of the substrate by the fourth air blowing mechanism, the fourth air blowing mechanism is configured to prevent the liquid material from flowing from the end portion of the substrate to the back surface side. Since 4 gas is sprayed, it can suppress that a liquid material adheres to a back surface side.

  In the film manufacturing apparatus according to the present invention, the first air blowing mechanism blows a fifth gas from the first air blowing port to the liquid material on the substrate to form a film from the liquid material. It is desirable to remove the dispersion medium and dry it.

  According to this configuration, since the film is formed by blowing the fifth gas from the first air blowing port to the liquid material by the first air blowing mechanism, the liquid material is formed on the substrate without newly providing an apparatus for drying. And a film can be formed from a liquid material. As a result, a uniform film can be formed on the substrate.

  In the film manufacturing apparatus according to the present invention, the first air blowing mechanism supplies a fifth gas from the first air outlet and the third air outlet to the liquid material on the substrate in order to form a film from the liquid material. It is desirable to spray and remove the solvent or dispersion medium and dry.

  According to this configuration, since the film is formed by blowing the fifth gas from the first air blowing port and the third air blowing port to the liquid material by the first air blowing mechanism, without newly providing a device for drying, The liquid material can be spread on the substrate and formed into a film from the liquid material. As a result, a uniform film can be formed on the substrate.

  In the film manufacturing apparatus according to the present invention, it is desirable that a hood is provided above the substrate in order to rectify the direction of the gas flowing on the substrate.

  According to this configuration, since the direction of the gas flowing on the substrate is rectified by the hood, it is possible to match the direction of the liquid material moving on the substrate with the direction of the gas flowing. Thereby, it can be made easy to move to the direction which wants to spread a liquid material more.

  The film manufacturing apparatus according to the present invention preferably includes a liquid material supply unit capable of supplying a necessary amount of the liquid material to form the film at an arbitrary location on the substrate.

  According to this configuration, since the required amount of liquid material is supplied to an arbitrary place on the substrate by the liquid material supply unit, when the liquid material is moved by blowing gas from the air blowing port, the liquid remaining on the substrate The amount of material can be reduced.

  In the film manufacturing apparatus according to the present invention, the liquid material supply unit preferably supplies a mist-like liquid material onto the substrate.

  According to this configuration, the liquid material deposited on the substrate by moving the mist-like liquid material is moved relative to the substrate and the air outlet while blowing the gas, so that the liquid material is pushed onto the substrate. As a result, it is possible to apply a uniform liquid material on the substrate.

  Hereinafter, embodiments of a film manufacturing apparatus according to the present invention will be described with reference to the drawings.

(First embodiment)
FIG. 1 is a schematic diagram showing the configuration of the film manufacturing apparatus. FIG. 1A is a schematic plan view of the membrane manufacturing apparatus as viewed from above without the hood. FIG.1 (b) is the model side view which looked at the membrane manufacturing apparatus from the side. Hereinafter, the configuration of the film manufacturing apparatus will be described with reference to FIG. The film manufacturing apparatus uses, for example, a spinless coating method in which a liquid material that is the source of a film is applied onto the substrate without rotating the substrate.

  As shown in FIG. 1, the film manufacturing apparatus 11 includes a stage 12 that is a substrate placement unit, a liquid material supply nozzle 13 that is a liquid material supply unit, a first blower mechanism 14, a second blower mechanism 15, The third blower mechanism 16, the fourth blower mechanism 17, and the hood 18 are included.

  The stage 12 is used, for example, for mounting the substrate 19. The stage 12 is in a fixed state, for example. As the substrate 19, for example, a rectangular shape is used as shown in FIG. Moreover, the board | substrate 19 is not limited to square shape, For example, a round shape may be sufficient.

The liquid material supply nozzle 13 is used for supplying the liquid material 20 onto the substrate 19. The liquid material 20 is, for example, a solution in which a material constituting the film is dissolved or a dispersion liquid in which the material constituting the film is dispersed. The material constituting the film may be anything such as a resin used for a resist, an insulating material such as polysilazane used for an insulating film, and a silicon compound used for a semiconductor film.
For example, the liquid material supply nozzle 13 is formed in a cylindrical shape on the tip side that is a side for supplying the liquid material 20 onto the substrate 19. The liquid material supply nozzle 13 has a liquid material supply drive mechanism (not shown).

The liquid material supply drive mechanism is used to move the liquid material supply nozzle 13 in the Y direction along the vicinity of one side of the stage 12 (for example, near the end A). By moving the liquid material supply nozzle 13 in the Y direction in the vicinity of the end A on the stage 12 by the liquid material supply driving mechanism, the band-shaped liquid material 20 is moved in the vicinity of the end A which is the first region on the substrate 19. Supply is performed (see FIG. 1B).
In addition to the movement in the Y direction described above, the liquid material supply nozzle 13 is provided so as to be able to move on the stage 12 in the X direction and the Z direction.
Further, the liquid material supply nozzle 13 can selectively supply the liquid material 20 to a part of the substrate 19 by a liquid material supply driving mechanism.

  The first air blowing mechanism 14 is used to blow a gas 21 that is a first gas to the liquid material 20 in order to spread the liquid material 20 supplied onto the substrate 19. The gas 21 is, for example, the atmosphere, an inert gas, and a solvent. Further, the first air blowing mechanism 14 is disposed above the stage 12. The gas 21 contains, for example, alcohol in order to prevent the sprayed liquid material 20 from drying. The 1st ventilation mechanism 14 has the 1st ventilation opening 22 (refer Fig.1 (a) and FIG. 3) which is a blowing outlet of the gas 21, for example, the length of the one side of the board | substrate 19 (edge part A in the board | substrate 19). ) And approximately the same length. Furthermore, the 1st ventilation mechanism 14 has the 1st drive mechanism and 1st angle adjustment mechanism which are drive mechanisms which are not shown in figure.

  The first drive mechanism is used to move the first air blowing mechanism 14 on the stage 12 in the X direction, which is the first direction, and in parallel with the upper surface 12a of the stage 12 (see FIG. 1B). It is done. For example, the first drive mechanism can move the first blower mechanism 14 in the X direction at a constant speed. By the first driving mechanism, the first air blowing mechanism 14 moves in the X direction while blowing out the gas 21, whereby the liquid material 20 on the substrate 19 can be spread from the end A side to the end D side. .

  Furthermore, the first drive mechanism can increase the moving speed of the first air blowing mechanism 14 from the vicinity of the end D of the substrate 19 to the outside of the substrate 19. Thereby, the gas 21 can be applied more strongly to the liquid material 20 remaining on the substrate 19 than when the liquid material 20 is spread, and the liquid material 20 can be blown off to the outside of the substrate 19 and removed.

  The first angle adjusting mechanism is used to change the direction of the first air blowing mechanism 14 having the first air outlet 22. By operating the first angle adjusting mechanism to adjust the angle of the first air blowing mechanism 14, the angle of the gas 21 blown from the first air blowing port 22 with respect to the liquid material 20 on the substrate 19 can be changed.

Moreover, the 1st ventilation mechanism 14 is used in order to spray the gas 21b (refer FIG. 5 process 14) which is the heated 5th gas on the liquid material 20. As shown in FIG. By applying the heated gas 21 b to the liquid material 20, the solvent or the dispersion medium is evaporated from the liquid material 20, thereby forming a film.
In addition to the air blowing from the first air blowing mechanism 14, for example, by applying heat to the substrate 19 by a heating mechanism (not shown) provided on the stage 12, the solvent or dispersion medium is removed from the liquid material 20 on the substrate 19. The film may be formed by evaporation.

  The second air blowing mechanism 15 is used to prevent the liquid material 20 on the substrate 19 from flowing down from the end B side of the substrate 19. The second blower mechanism 15 is disposed on the side of the stage 12 (on the end B side of the substrate 19). The second blower mechanism 15 has, for example, a slit-like second blower opening 23 (see FIG. 1A), and a gas 21 that is a second gas toward the liquid material 20 that is about to flow down from the substrate 19. Do a speech bubble. Thereby, it can reduce that the liquid material 20 falls from on the board | substrate 19. FIG. The gas 21 contains, for example, alcohol in order to prevent the liquid material 20 from drying, similarly to the gas 21 blown out from the first blower mechanism 14. Furthermore, the 2nd ventilation mechanism 15 has the 2nd drive mechanism and 2nd angle adjustment mechanism which are not shown in figure.

The second drive mechanism is used to move the second blower mechanism 15 in the X direction along the vicinity of the end surface (end B side) of the stage 12. For example, the second drive mechanism can move the second blower mechanism 15 in the X direction at a constant speed. Based on the operation of the second drive mechanism, the second blowing mechanism 15 moves in the X direction while blowing the gas 21, so that the liquid material 20 spills from the substrate 19 to the outside of the substrate 19, or on the substrate 19. It is possible to prevent a part of the liquid material 20 from flowing from the end B side to the back side of the substrate 19.
The second drive mechanism and the first drive mechanism can be operated following each other, and the first blower mechanism 14 and the second blower mechanism 15 move in the X direction at the same speed. Can do.

  The second angle adjustment mechanism is used to change the direction of the second blower mechanism 15 having the second blower opening 23. By operating the second angle adjusting mechanism to adjust the angle of the second blowing mechanism 15, the angle of the gas 21 blown from the second blowing port 23 with respect to the liquid material 20 on the substrate 19 can be changed.

  Similar to the second blower mechanism 15, the third blower mechanism 16 is used to prevent the liquid material 20 on the substrate 19 from flowing down from the end C side of the substrate 19. The third blower mechanism 16 is disposed on the side of the stage 12 (the end C side of the substrate 19). The third blower mechanism 16 has, for example, a slit-like fourth blower opening 24 (see FIG. 1A), and is secondly directed toward the liquid material 20 that is likely to flow down from the substrate 19 to the outside of the substrate 19. The gas 21 which is a gas is blown out. Thereby, it can reduce that the liquid material 20 falls from the board | substrate 19 to the outer side of the board | substrate 19. FIG. The gas 21 contains, for example, alcohol in order to suppress drying, similarly to the first and second blower mechanisms 14 and 15. Furthermore, the 3rd ventilation mechanism 16 has the 2nd drive mechanism and 3rd angle adjustment mechanism which are not shown in figure.

Similar to the second blower mechanism 15, the second drive mechanism is used to move the third blower mechanism 16 in the X direction along the vicinity of the end surface (end C side) of the stage 12. For example, the second drive mechanism can move the third blower mechanism 16 in the X direction at a constant speed. Based on the operation of the second drive mechanism, the third blower mechanism 16 moves in the X direction while blowing the gas 21, so that the liquid material 20 spills from the substrate 19 to the outside of the substrate 19 or on the substrate 19. It is possible to prevent a part of the liquid material 20 from flowing into the back surface side of the substrate 19 from the end C side.
Further, the second drive mechanism can be operated following the first drive mechanism. Accordingly, the third blower mechanism 16 can move in the X direction at the same speed as the first blower mechanism 14 and the second blower mechanism 15.

  The third angle adjustment mechanism is used to change the direction of the third blower mechanism 16 having the fourth blower opening 24, similarly to the second angle adjustment mechanism. By operating the third angle adjusting mechanism to adjust the angle of the third blower mechanism 16, the angle of the gas 21 blown from the fourth blower port 24 with respect to the liquid material 20 on the substrate 19 can be changed.

  Moreover, the 2nd ventilation mechanism 15 and the 3rd ventilation mechanism 16 are provided so that a mutual space | interval can be adjusted. Thereby, for example, depending on the size of the substrate 19 and the way the liquid material 20 flows on the substrate 19, the distance between the second air outlet 23 and the end B of the substrate 19, and the fourth air outlet 24 and the substrate 19. It is possible to adjust the distance from the end portion C at.

The fourth air blowing mechanism 17 is used to prevent the liquid material 20 on the substrate 19 from entering the back surface of the substrate 19 on the end D side. The 4th ventilation mechanism 17 has the 5th ventilation opening 25 (refer FIG.1 (b)) which is a blowing outlet of the gas 21. FIG. In the fourth blower mechanism 17, for example, the gas 21, which is the fourth gas blown out from the fifth blower opening 25, hits the vicinity of the end face of the substrate 19 below the left end face (end D side of the substrate 19) of the stage 12. Are arranged as follows. The 4th ventilation mechanism 17 is formed in the length substantially the same as the length of the end surface D of the board | substrate 19, for example.
The gas 21 contains, for example, alcohol for suppressing drying, similarly to the gas supplied to the first to third blowing mechanisms 14 to 16. In addition, since the gas 21 blown out from the 4th ventilation mechanism 17 is not related to the drying of the liquid material 20, unlike the gas 21 blown out from the 1st-3rd ventilation mechanisms 14-16, it contains alcohol, for example. It may be a non-gas.

  With the configuration as described above, by blowing the gas 21 from the fifth blower opening 25 of the fourth blower mechanism 17 toward the end surface D of the substrate 19, the excess liquid is spread over the substrate 19 by the first blower mechanism 14. When the material 20 is removed from the end surface D side, the liquid material 20 can be separated from the end surface D (blow off) and dropped without going around the back surface side of the substrate 19. Furthermore, the 4th ventilation mechanism 17 has a 4th angle adjustment mechanism which is not shown in figure.

  The fourth angle adjustment mechanism is used to change the direction of the fourth blower mechanism 17 having the fifth blower opening 25. By operating the fourth angle adjusting mechanism to adjust the angle of the fourth blower mechanism 17, the angle at which the gas 21 is blown to the liquid material 20 blown out of the substrate 19 from the end D side of the substrate 19 is changed. Can do.

  The hood 18 is used to stabilize the flow direction of the gas 21 when the liquid material 20 is spread on the substrate 19. The hood 18 is disposed above the stage 12 in parallel with the upper surface 12a of the stage 12, and can move horizontally in the X direction with respect to the upper surface 12a. The hood 18 has a third drive mechanism (not shown).

  The third drive mechanism is used to move the hood 18 horizontally in the X direction. For example, the third drive mechanism can move the hood 18 in the X direction at a constant speed. Further, the third drive mechanism can be operated following the first and second drive mechanisms, and the hood 18 and the first to third air blowing mechanisms 14 to 16 are moved in the X direction at the same speed. Can be moved.

The hood 18 is moved in the X direction together with the first to third blowing mechanisms 14 to 16 by the third driving mechanism, so that the gas 21 blown out from the first blowing mechanism 14 on the substrate 19 is scattered around. Without any problem, the rectification can be performed so as to flow parallel to the upper surface of the substrate 19 from the end A side to the end D side of the substrate 19. That is, the direction of the airflow can be made the same as the direction in which the liquid material 20 is to be spread.
Further, the presence of the hood 18 suppresses the gas 21 spread toward the end B and the end C in the substrate 19 from spreading due to the blowing of the gas 21 from the second blower mechanism 15 and the third blower mechanism 16. Thus, the gas 21 can be blown to the end D side.

  FIG. 2 is a schematic diagram illustrating a configuration of a gas blowing unit for sending gas to the first blowing mechanism. Hereinafter, the configuration of the gas blower will be described with reference to FIG.

  As shown in FIG. 2, the gas blower 31 sends a gas 21 to the first blower mechanism 14 in order to send a first pipe 32, a second pipe 33, a pump 34, a third pipe 35, and a container 36. And an open tube 37.

  The first pipe 32 and the second pipe 33 are used for sending the gas 21 from the pump 34 to the first blower mechanism 14. The first air blowing mechanism 14 is connected to the pump 34 via the first and second pipes 32 and 33.

  The pump 34 is connected to the second pipe 33 and is used for supplying the gas 21 to the first blower mechanism 14. The gases 21 a and 21 sent by the pump 34 are supplied to the first blower mechanism 14, whereby the gas 21 can be blown against the liquid material 20 on the substrate 19 and the liquid material 20 is spread on the substrate 19. Is possible. The pump 34 has a pressure adjustment mechanism and a blower switch which are a blower control mechanism (not shown).

  The pressure adjustment mechanism is used to control the pressure to send out the gas 21. By setting the pressure adjustment mechanism to a low pressure, the weak air 21 can be supplied to the first blower mechanism 14. On the other hand, by setting the pressure adjusting mechanism to a high pressure, the gas 21 having a stronger force can be supplied to the first blower mechanism 14 when the liquid material 20 is spread. The pressure adjustment mechanism is adjusted according to, for example, the type (viscosity) of the liquid material 20 and the shape of the substrate 19.

  The blower switch is used to send the gas 21 to the first blower mechanism 14 or stop sending the gas 21 to the first blower mechanism 14. For example, when the first air blowing mechanism 14 has a plurality of air blowing ports, the gas 21 can be selectively blown out and stopped from each air blowing port. By selectively blowing out the gas 21 from the plurality of air outlets, for example, it is possible to control a portion where the liquid material 20 is to be spread and a portion where the liquid material 20 is not desired to be spread.

  The third pipe 35 is used for connecting the first pipe 32 and the second pipe 33 and the container 36. One end of the third pipe 35 is connected between the first pipe 32 and the second pipe 33, and the other end is connected to the container 36.

  The container 36 is connected to the third pipe 35 and the inside of the container 36 is sealed. In the container 36, for example, alcohol 38 for preventing the liquid material 20 from being dried is stored. Moreover, it is not limited to alcohol, What is necessary is just what does not dry the liquid material 20, for example. The alcohol 38 is contained in the gas 21 a sent from the pump 34 via the third pipe 35. By including the alcohol 38 in the gas 21a, it is possible to prevent the liquid material 20 from drying even when the gas 21 is blown from the first blower mechanism 14 to the liquid material 20.

  For example, the container 36 is provided with a control mechanism capable of controlling the amount of alcohol 38 included in the gas 21a. Thus, for example, the amount of alcohol 38 included in the gas 21a can be adjusted according to the drying characteristics of the liquid material 20, and drying can be suppressed.

  The open pipe 37 is used to connect between the alcohol 38 stored in the container 36 and the atmosphere. Since one end side of the open pipe 37 is in the atmosphere and the other end side is in the alcohol 38 in the container 36, the inside of the container 36 is prevented from being completely sealed, and the third pipe 35 is used. The alcohol 38 can be sent into the first and second pipes 32 and 33. The method of supplying the alcohol 38 to the gas 21 a passing through the first pipe 32 uses, for example, the vacuum pressure generated when the gas 21 a is sent into the pipes 32 and 33 by the pump 34.

  In addition, the structure of the above-described gas blower 31 uses not only the air blow of the gas 21 to the first blower mechanism 14 but also the second to fourth blower mechanisms 15 to 17 using the same functions as described above. The gas 21 can be blown. Moreover, the gas blowing part 31 can also send the gas 21 of a different pressure to the 2nd-4th ventilation mechanism 15-17, respectively.

  FIG. 3 is a schematic diagram illustrating the structure of the first blower mechanism. Fig.3 (a) is the model side view which looked at the 1st ventilation mechanism from the side. FIG. 3B is a schematic plan view of the first air blowing mechanism as viewed from below. FIG.3 (c) is the model side view which looked at the 1st ventilation mechanism of Fig.3 (a) from the side. Hereinafter, the structure of the first air blowing mechanism will be described with reference to FIG.

  As shown in FIG. 3, the first blower mechanism 14 is used for blowing gases 21 and 21 b (see step 14 in FIG. 5) to the liquid material 20 on the substrate 19, and has a nozzle body 71. The nozzle body 71 has a first air outlet 22 through which the gas 21 passes. The first air outlet 22 has a round hole nozzle 72 and a slit nozzle 73.

  The round hole nozzle 72 is formed on one end side (rear side) of the first blower mechanism 14. For example, a first pipe 32 (see FIG. 2) is connected to the round hole nozzle 72, and the gas 21 sent from the pump 34 is supplied through the second pipe 33 and the first pipe 32 to the first blower. Sent to mechanism 14.

  The slit nozzle 73 is formed on the other end side (tip side) of the first blower mechanism 14 and is connected to the round hole nozzle 72 inside. When the gas 21 sent from the round hole nozzle 72 passes, the slit nozzle 73 can be blown out to the liquid material 20 as the gas 21 spread in a thin plate shape.

  The gas 21 is preferably blown out from the width X of the slit nozzle 73 in parallel to the width of the substrate 19 (in parallel from the end A side to the end D side of the substrate 19). By blowing in parallel, the amount of the liquid material 20 directed toward the ends B and C of the substrate 19 can be reduced, and the amount of the liquid material 20 flowing down from the ends B and C can be suppressed. Further, by increasing the shape accuracy of the opening 73 a of the slit nozzle 73, it is possible to suppress the unevenness of the air (air flow) of the gas 21 blown from the slit nozzle 73, and the thickness of the liquid material 20 spread on the substrate 19. Can be made uniform.

  FIG. 4 is a schematic diagram showing the structure of the first semiconductor device. FIG. 4A is a schematic plan view of the first semiconductor device as viewed from above. FIG. 4B is a schematic side view of the first semiconductor device viewed from the side. Hereinafter, the structure of the first semiconductor device will be described with reference to FIG.

As shown in FIG. 4, the first semiconductor device 41 includes a first substrate 42 and a first film 43.
The first substrate 42 has, for example, a substantially rectangular shape and has a flat upper surface. The first substrate 42 is, for example, a semiconductor substrate or a glass substrate.

  The first film 43 is formed on the entire surface of the first substrate 42. The first film 43 is formed by applying a liquid material 30 (see FIG. 5) that is the source of the first film 43 on the first substrate 42 and then evaporating the solvent or the dispersion medium from the liquid material 30.

  FIG. 5 is a schematic cross-sectional view showing the method of manufacturing the first semiconductor device in the order of steps. FIGS. 5A, 5C, 5E, and 5G are schematic plan views of the first semiconductor device as viewed from above. FIGS. 5B, 5D, 5F, and 5H are schematic side views of the first semiconductor device viewed from the side. Hereinafter, the manufacturing method of the first semiconductor device will be described with reference to FIG.

  As shown in FIGS. 5A and 5B, in step 11, the liquid material 30 is supplied to a part (first region) on the first substrate 42. First, the first substrate 42 is placed on the stage 12 of the film manufacturing apparatus 11 (see FIG. 1). Next, the liquid material supply drive mechanism moves the liquid material supply nozzle 13 in the Y direction on the first substrate 42 and discharges a necessary amount of the liquid material 30 onto the first substrate 42. As described above, the liquid material 30 is supplied along the vicinity of the end A on the first substrate 42.

  As shown in FIGS. 5C and 5D, in step 12, the liquid material 30 starts to be spread. First, the gas 21 which is the 1st gas containing the alcohol 38 sent from the pump 34 (refer FIG. 2) is blown out by the 1st ventilation mechanism 14. FIG. Next, the first air blowing mechanism 14 is moved in the X direction by the first driving mechanism. The movement of the first blower mechanism 14 in the X direction is performed at a constant speed, for example. The first air blowing mechanism 14 moves in the X direction while blowing out the gas 21 from the first air blowing port 22 (see FIG. 3), so that a part of the liquid material 30 in the vicinity of the end A (first liquid material) The first substrate 42 is spread near the center (second region).

Furthermore, the hood 18 (see FIG. 1) provided above the stage 12 moves following the movement of the first blower mechanism 14 in the X direction, whereby the gas 21 blown from the first blower mechanism 14. The air flow direction can be rectified so as to flow from the end A side to the end D side.
Further, when the liquid material 30 is spread, the liquid material 30 that is about to flow down from the end portions B and C of the first substrate 42 is blown by the gas 21 from the second and third blower mechanisms 15 and 16. It is possible to stay on the first substrate 42.

  As shown in FIGS. 5E and 5F, in step 13, the liquid material 30 is spread over the entire first substrate 42, and the excess liquid material 30 a is transferred from the first substrate 42 to the outside of the first substrate 42. To remove. First, following the step 12, the first air blowing mechanism 14 is moved in the X direction to expand a part of the liquid material 30 (second liquid material) to the vicinity of the end portion D (third region) of the first substrate 42. After the first air blowing mechanism 14 reaches the vicinity of the end portion D, the moving speed of the first air blowing mechanism 14 is increased by the first driving mechanism until the first air blowing mechanism 14 is detached from the first substrate 42. As a result, the strength of the gas 21 sprayed onto the liquid material 30 can be made stronger than when the liquid material 20 is spread out, and the liquid material 30a remaining on the first substrate 42 is removed from the end of the first substrate 42. From D, the outside of the first substrate 42 can be vigorously blown away.

  Further, the gas material 21 (fourth gas) is blown out from the lower side of the end portion D side of the first substrate 42 toward the end portion D by the fourth air blowing mechanism 17 (see FIG. 1), so that the liquid material 30 is discharged. It is possible to suppress wraparound from the end D side to the back surface side. As described above, the liquid material 30 can be spread over the entire surface of the first substrate 42, and the liquid material 30a remaining on the first substrate 42 can be removed from the first substrate 42 to the outside of the first substrate 42. it can.

As shown in FIGS. 5G and 5H, in step 14, the liquid material 30 spread on the first substrate 42 is dried to form the first film 43. The gas blower 31 (see FIG. 2) is further provided with a heating mechanism (not shown) for heating the gas 21. Further, the supply of the alcohol 38 to the gas 21 is stopped in the gas blower 31.
First, the 1st ventilation mechanism 14 is moved to the edge part A side. Next, the gas 21 b (fifth gas) heated by the heating mechanism is moved in the X direction while being sprayed from the first air blowing port 22 toward the liquid material 30 on the first substrate 42. Thereby, the solvent or the dispersion medium evaporates from the liquid material 30. As described above, the liquid material 30 is dried, and the first film 43 is formed on the first substrate 42.

  The electro-optical device to which the film manufacturing method according to the present invention can be applied is a panel including an electro-optical element such as a liquid crystal element or an organic EL element. For example, the liquid crystal device, the organic EL apparatus, or the electrophoresis There are display devices, plasma display devices, SED (Surface Conduction Electron-emitter Display), FED (Field Emission Display) and the like.

  FIG. 6 is a schematic perspective view schematically showing the configuration of an electronic apparatus to which the electro-optical device according to the invention can be applied. FIG. 6A is a schematic perspective view showing a configuration of a liquid crystal television which is an embodiment of the electronic apparatus. FIG. 6B is a schematic perspective view illustrating a configuration of a wall-mounted television that is an embodiment of the electronic apparatus. Hereinafter, the configuration of the electronic apparatus will be described with reference to FIG.

  As illustrated in FIG. 6A, the liquid crystal television 101 includes a display unit 102, a frame unit 103, a leg unit 104, and a remote controller 105. The display unit 102 is mounted with an electro-optical device manufactured using the above-described film manufacturing method. The frame part 103 is used for guiding the display part 102. The leg portion 104 is used to fix the display portion 102 and the frame portion 103 at a certain height. The remote controller 105 is used, for example, to turn on / off the power of the liquid crystal television 101 or change the channel.

  As illustrated in FIG. 6B, the wall-mounted television 111 includes a display unit 112, a frame unit 113, and a winding unit 114. The display unit 112 is mounted with an electro-optic element manufactured using the above-described film manufacturing method. The frame part 113 is used to guide the display part 112. The winding unit 114 is used to roll up and store the display unit 112 integrated with the frame unit 113.

  The electronic device is a product using the electro-optical device as described above. In addition, for example, a liquid crystal display, a mobile phone, electronic paper, a viewfinder type / monitor direct-view type video tape recorder, a car navigation device, A pager, an electronic notebook, a calculator, a word processor, a workstation, a video phone, a POS terminal, a digital still camera, and the like can be given.

As described above in detail, according to the film manufacturing apparatus of the present embodiment, the following effects can be obtained.
(1) According to the film manufacturing apparatus of this embodiment, from the liquid material supply nozzle 13 to the liquid material 30 placed on the first substrate 42, from the vicinity of the end A to the vicinity of the end D on the first substrate 42. By moving the first air blowing mechanism 14 in the X direction, the gas 21 having a certain strength is blown from the first air blowing port 22, so that the liquid material 30 can be spread with a certain strength. As a result, the liquid material 30 having a uniform thickness can be applied on the first substrate 42. After that, the first air blowing mechanism 14 blows the gas 21b onto the liquid material 30 to dry it, whereby the first film 43 having a uniform film thickness can be formed on the first substrate 42. In addition, the necessary amount of the liquid material 30 supplied from the liquid material supply nozzle 13 onto the first substrate 42 is spread over the first substrate 42 by blowing the gas 21 by the first blower mechanism 14. It can apply | coat, without reducing the use efficiency of 30.

  (2) According to the film manufacturing apparatus of the present embodiment, when the liquid material 30 is spread on the first substrate 42 by the first blower mechanism 14, the liquid material 30 is likely to fall from the ends B and C side of the first substrate 42. Even if there is the liquid material 30, the second air blowing mechanism 15 and the third air blowing mechanism 16 blow the gas 21 from the outside of the first substrate 42 toward the inside of the first substrate 42. It is possible to prevent the liquid material 30 from flowing from the substrate 42 to the outside of the first substrate 42. Thereby, the liquid material 30 can be efficiently spread over the entire first substrate 42 without reducing the liquid material 30 necessary for spreading over the entire first substrate 42.

  (3) According to the film manufacturing apparatus of the present embodiment, the moving speed of the first blower mechanism 14 is increased from the vicinity of the end D of the first substrate 42 to the outside of the first substrate 42, so that the liquid material 30 It is possible to increase the strength of the gas 21 to be blown onto the first substrate 42, and the liquid material 30 a remaining on the first substrate 42 can be blown off from the end D to the outside of the first substrate 42.

  (4) According to the film manufacturing apparatus of the present embodiment, the fourth blower mechanism 17 is disposed below the end D side of the first substrate 42, and from below the first substrate 42 toward the end D. By blowing off the gas 21, when the liquid material 30a remaining on the first substrate 42 is blown off to remove it from the first substrate 42, the liquid material 30 does not flow from the end D side to the back side. can do.

(5) According to the film manufacturing apparatus of the present embodiment, the hood 18 provided above the stage 12 moves following the movement of the first blower mechanism 14 in the X direction, whereby the first blower mechanism. The flow direction of the gas 21 blown from 14 can be rectified from the end A side to the end D side. This makes it possible to match the direction in which the gas 21 flows and the direction in which the liquid material 30 is spread, so that the liquid material 30 with a uniform film thickness can be applied onto the first substrate 42.
(Second Embodiment)

  FIG. 7 is a schematic diagram showing the structure of the second semiconductor device. FIG. 7A is a schematic plan view of the second semiconductor device as viewed from above. FIG. 7B is a schematic side view of the second semiconductor device viewed from the side. The second semiconductor device of the second embodiment is different from that of the first embodiment in that the lyophilic region and the liquid repellent region are formed on the second substrate. Hereinafter, the structure of the second semiconductor device will be described with reference to FIG.

  As shown in FIG. 7, the second semiconductor device 51 includes a second substrate 52, a lyophilic region 54, a lyophobic region 55, and a second film 56 that is a film formed in the lyophilic region 54. . Here, as an example, the first pattern film 53 is formed on the second substrate 52, and the first pattern film 53 functions as the liquid repellent region 55. However, the present invention is not limited to this, and the first pattern film 53 The pattern film 53 may not be formed.

  Similar to the first substrate 42, the second substrate 52 is formed in, for example, a substantially rectangular shape. The second substrate 52 is, for example, a semiconductor substrate or a glass substrate.

  The first pattern film 53 is formed on the second substrate 52 in, for example, an uneven stripe pattern. In the first pattern film 53, the concave portion of the first pattern film 53 is a lyophilic region 54, and the convex portion is a lyophobic region 55. Here, the lyophilic region 54 means a region having relatively high wettability with respect to the liquid material 40 (the contact angle is relatively small), and the liquid repellent region 55 has relative wettability with respect to the liquid material 40. Means a small area (with a relatively large contact angle). In other words, the lyophilic area 54 is more lyophilic than the liquid material 40 when compared to the lyophobic area 55.

  Further, when the first pattern film 53 itself is less wettable with respect to the liquid material 40 than the second substrate 52, the concave portion becomes the lyophilic region 54 and the convex portion becomes the liquid repellent region 55. In FIG. 7, the second film 56 formed in the concave portion of the first pattern film 53 by applying the liquid material 40 under this condition is illustrated. At this time, the first pattern film 53 functions as a liquid repellent film for the liquid material 40.

  As a method for forming the first pattern film 53, for example, there is a method of improving liquid repellency by forming a photoresist on the second substrate 52 by patterning and performing fluorination treatment. Further, as a chemical method, a SAM (Self Assembled Monolayer) film, which is a monomolecular film, is formed on the second substrate 52, chemically bonded, and then patterned by exposure to obtain a liquid repellent property. There is a method of leaving the SAM film only in the region 55. Since the thickness of the SAM film is at the molecular level, it is not as thick as the convex portion of the first pattern film 53 as shown in FIG. 7, but the region to be formed corresponds to the region of the convex portion. When this SAM film has less wettability with respect to the liquid material 40 than the second substrate 52, the convex portion formed by this SAM film functions as the liquid repellent region 55.

On the other hand, when the first pattern film 53 itself has higher wettability with respect to the liquid material 40 than the second substrate 52, the convex portion becomes the lyophilic region 54 and the concave portion becomes the liquid repellent region 55. At this time, the second film 56 is formed on the convex portion of the first pattern film 53 although not shown. That is, the first pattern film 53 functions as a lyophilic film for the liquid material 40.
The first pattern film 53 may be formed by patterning so that a material having higher wettability with respect to the liquid material 40 than the second substrate 52 becomes a convex portion. If the SAM film is used, the SAM film may be such that the contact angle with the liquid material 40 is smaller than the contact angle between the second substrate 52 and the liquid material 40.

  FIG. 8 is a schematic cross-sectional view showing the method of manufacturing the second semiconductor device in the order of steps. FIGS. 8A, 8C, 8E, and 8G are schematic plan views of the second semiconductor device as viewed from above. 8B, 8D, 8F, and 8H are schematic side views of the second semiconductor device as viewed from the side. In addition, the lyophilic region and the liquid repellent region are formed on the second substrate by the lyophilic region forming step and the liquid repellent region forming step. Hereinafter, a method for manufacturing the second semiconductor device will be described with reference to FIG.

  As shown in FIGS. 8A and 8B, in step 21, the liquid material 40 is supplied to a part (near the end A) on the first pattern film 53 formed on the second substrate 52. First, the second substrate 52 on which the first pattern film 53 is formed is placed on the stage 12 of the film manufacturing apparatus 11. Next, the liquid material supply drive mechanism moves the liquid material supply nozzle 13 in the Y direction on the second substrate 52 and discharges a necessary amount of the liquid material 40 onto the second substrate 52. As described above, the liquid material 40 is supplied along the vicinity of the end A in the first pattern film 53.

  Since the lyophilic area 54 and the liquid repellent area 55 are formed in the second semiconductor device 51, the liquid material 40 on the liquid repellent area 55 is easy to move. 40 moves onto the lyophilic area 54. However, as shown in FIGS. 8A and 8B, a part of the liquid material 40 a of the liquid material 40 is placed over the liquid-repellent region 55 from the lyophilic region 54 or only on the liquid-repellent region 55. There is a liquid material 40b mounted in a ball shape.

  As shown in FIGS. 8C and 8D, in step 22, the liquid material 40 starts to be spread. First, the gas 21 containing the alcohol 38 sent from the pump 34 is blown out by the first blower mechanism 14. Next, the first air blowing mechanism 14 is moved in the X direction by the first driving mechanism. The movement of the first blower mechanism 14 in the X direction is performed at a constant speed, for example. When the first air blowing mechanism 14 moves in the X direction while blowing the gas 21 from the first air blowing port 22, the liquid material 40 b placed on the liquid repellent region 55 starts to move. Thereby, for example, the liquid material 40 b placed on the liquid repellent area 55 is absorbed by the liquid material 40 on the lyophilic area 54.

  Further, for example, a part of the liquid material 40 moved from the liquid repellent region 55 to the end B and end C side of the second substrate 52 is blown by the gas 21 from the second and third blowing mechanisms 15 and 16. As a result, the liquid is returned to the inside of the second substrate 52 and moves onto the lyophilic region 54, and is absorbed by the liquid material 40 on the lyophilic region 54.

  Further, for example, the liquid material 40a placed over the lyophilic area 54 and the liquid repellent area 55 is easy to move, so that the liquid material on the liquid repellent area 55 is extended. Torn. The torn liquid material 40 a then moves onto the lyophilic region 54 and is absorbed by the liquid material 40. As described above, by moving in the X direction while blowing the gas 21 from the first blower mechanism 14, the liquid material 40a on the liquid repellent region 55 moves, and the liquid material 40 on the lyophilic region 54 is second. The substrate 52 is expanded to the vicinity of the center. Thereby, the liquid material 40 is spread only in the lyophilic region 54.

As shown in FIGS. 8E and 8F, in step 23, the liquid material 40 is spread over the entire second substrate 52, and the excess liquid material 40 c is transferred from the second substrate 52 to the outside of the second substrate 52. To remove. First, following step 22, the first blower mechanism 14 is moved in the X direction to approach the vicinity of the end D of the second substrate 52. After the first air blowing mechanism 14 reaches the vicinity of the end portion D, the moving speed of the first air blowing mechanism 14 is increased by the first driving mechanism until the first air blowing mechanism 14 is detached from the second substrate 52. As a result, the strength of the gas 21 sprayed onto the liquid material 40 can be made stronger than when the liquid material 40 is spread, and the liquid material 40 is moved from the end D of the second substrate 52 to the outside of the second substrate 52. It can be blown away with momentum.
For example, even if the liquid material 40b remains on the liquid repellent region 55, the contact angle is large and easy to move, so that the remaining liquid material 40c is blown off from the second substrate 52 to the outside of the second substrate 52. be able to.

  Further, the fourth air blowing mechanism 17 (see FIG. 1) blows out the gas 21 from the lower side of the end D side of the second substrate 52 toward the end D, so that the liquid material 40 is discharged from the end D side. It can suppress going around to the back side. Thus, the liquid material 40 can be spread over the entire surface of the second substrate 52, and the liquid material 40c remaining on the second substrate 52 can be removed from the second substrate 52 to the outside of the second substrate 52. it can.

As shown in FIGS. 8G and 8H, in step 24, the liquid material 40 spread on the second substrate 52 is dried to form the second film 56. As in the first embodiment, the gas blower 31 is further provided with a heating mechanism (not shown) for heating the gas 21. Further, the supply of the alcohol 38 to the gas 21 is stopped in the gas blower 31.
First, the 1st ventilation mechanism 14 is moved to the edge part A side. Next, the gas 21b heated by the heating mechanism is moved in the X direction while being blown from the first blower port 22 of the first blower mechanism 14 toward the liquid material 40 on the second substrate 52. Thereby, the solvent or the dispersion medium evaporates from the liquid material 40. As described above, the liquid material 40 is dried, and the second film 56 is formed on the second substrate 52.

As described above in detail, according to the film manufacturing apparatus of this embodiment, the following effects can be obtained in addition to the effects (1) to (5) of the first embodiment.
(6) According to the film manufacturing apparatus of the present embodiment, the lyophilic region 54 and the lyophobic region are formed on the second substrate 52 (first pattern film 53) in order to form the second film 56 in the lyophilic region 54. By providing 55, the first air blowing mechanism 14 can easily spread the liquid material 40 that is the source of the second film 56 only on the lyophilic region 54. Thereby, it is not necessary to selectively apply the liquid material 40 only to the region where the second film 56 is to be formed, and the liquid material 40 can be supplied and applied on the second substrate 52 relatively easily. In addition, by applying the gas 21 to the liquid material 40 by the first air blowing mechanism 14, the second film 56 is formed only on the lyophilic region 54 using the characteristics of the lyophilic region 54 and the lyophobic region 55. be able to.
(Third embodiment)

  FIG. 9 is a schematic diagram showing the structure of the third semiconductor device. FIG. 9A is a schematic plan view of the third semiconductor device as viewed from above. FIG. 9B is a schematic side view of the third semiconductor device viewed from the side. In the third semiconductor device of the third embodiment, a liquid material is applied in a concave region formed in a part on a third substrate, and a lyophilic region and a liquid repellent region are partially formed. The portion is different from the first and second embodiments. Hereinafter, the structure of the third semiconductor device will be described with reference to FIG.

  As shown in FIG. 9, the third semiconductor device 61 includes a third substrate 62, a second pattern film 63, a lyophilic region 64, a lyophobic region 65, and a third film 66.

  Similar to the first and second substrates 42 and 52, the third substrate 62 is formed, for example, in a substantially rectangular shape. The third substrate 62 is, for example, a semiconductor substrate or a glass substrate.

  The second pattern film 63 is formed on the third substrate 62 and includes a lyophilic region 64 that is a region surrounded by a concave shape and a lyophobic region 65 that is a region other than the lyophilic region 64.

  The lyophilic region 64 has a shape in which a wide first region 67 formed in a substantially rectangular shape and a long and narrow second region 68 are connected. By forming the lyophilic region 64, the liquid material 50 (see FIG. 10) can be easily stored in the second pattern film 63 surrounded by the concave shape.

  The liquid repellent area 65 is an area other than the lyophilic area 64 including the first area 67 and the second area 68. By forming the liquid repellent region 65, the formation of the third film 66 on the liquid repellent region 65 is avoided.

  The third film 66 is formed in the lyophilic region 64 (in the recess) of the second pattern film 63. The third film 66 is formed by evaporating the solvent or dispersion medium from the liquid material 50 after applying the liquid material 50 that is the source of the third film 66 in the lyophilic region 64.

  FIG. 10 is a schematic plan view showing the manufacturing method of the third semiconductor device in the order of steps by enlarging the portion of the lyophilic region. In addition, the lyophilic region and the liquid repellent region are formed on the third substrate by the lyophilic region forming step and the liquid repellent region forming step. Hereinafter, a method for manufacturing the third semiconductor device will be described with reference to FIG.

  As shown in FIG. 10, in step 31, the liquid material 50 is supplied into the lyophilic region 64 in the second pattern film 63 formed on the third substrate 62 (see FIG. 9). First, the third substrate 62 on which the second pattern film 63 is formed is placed on the stage 12 of the film manufacturing apparatus 11. Next, the liquid material supply drive mechanism moves the liquid material supply nozzle 13 onto the first region 67 in the lyophilic region 64. Next, the liquid material supply nozzle 13 supplies a required amount of the liquid material 50 into the first area 67 which is a large area.

  In step 32, the liquid material 50 supplied into the first region 67 spreads out. Specifically, in step 31, the liquid material 50 is spread over the entire first region 67 by supplying the liquid material 50 to the first region 67 in which the lyophilic region 64 is formed. Although the lyophilic region 64 is formed in the second region 68 connected to the first region 67, the second material 68 is an elongated region as compared with the first region 67. For example, the liquid material 50 only enters partway. As described above, the liquid material 50 is spread from the entire first region 67 to a part of the second region 68.

  In step 33, the liquid material 50 is spread throughout the lyophilic region 64. First, the first air blowing mechanism 14 blows out the gas 21 containing alcohol sent from the pump 34. Next, the first blower mechanism 14 is moved in the X direction by the operation of the first drive mechanism. The movement of the first blower mechanism 14 in the X direction is performed at a constant speed, for example. When the first air blowing mechanism 14 moves in the X direction while blowing the gas 21 from the first air blowing port 22, the liquid material 50 in the first region 67 is pushed and moves to the second region 68 side.

  Further, by moving the first air blowing mechanism 14 in the X direction, the liquid material 50 moves to the second region 68 having an elongated shape, and the liquid material 50 that has spread only in a part of the second region 68 is second. The entire area 68 extends. As described above, the liquid material 50 is spread over the entire lyophilic region 64 having an elongated region by the characteristics of the lyophilic region 64 and the blowing of the gas 21.

In step 34, the liquid material 50 spread in the lyophilic region 64 on the third substrate 62 is dried to form a third film 66. As in the first and second embodiments, the gas blower 31 is further provided with a heating mechanism (not shown) for heating the gas 21. Further, the supply of the alcohol 38 to the gas 21 is stopped in the gas blower 31.
First, the 1st ventilation mechanism 14 is moved to the edge part A side. Next, the gas 21b heated by the heating mechanism is moved in the X direction while being sprayed from the first air blowing port 22 of the first air blowing mechanism 14 toward the liquid material 50 on the third substrate 62. Thereby, the solvent or the dispersion medium evaporates from the liquid material 50. As described above, the liquid material 50 is dried, and the third film 66 is formed in the lyophilic region 64.

As described above in detail, according to the film manufacturing apparatus of this embodiment, the following effects can be obtained in addition to the effects (1) to (5) of the first embodiment.
(7) According to the film manufacturing apparatus of the present embodiment, when the liquid material 50 is applied to the concave region (lyophilic region 64) in which the first region 67 that is substantially rectangular and the second region 68 that is an elongated region are connected. Even so, by blowing the gas 21 from the first air blowing mechanism 14 to the liquid material 50, the liquid material 50 can be expanded to an elongated region (second region 68) where the liquid material 50 is relatively difficult to spread.

  In addition, 1st-3rd embodiment is not limited above, It can also implement with the following forms.

  (Modification 1) As shown in FIG. 3, instead of the slit nozzle 73 having an opening formed in a slit shape, the shape of a nozzle as shown in FIGS. 11A to 11D may be used. FIG. 11 is a schematic plan view of the first blower mechanism as viewed from the tip side, which is the side from which gas is blown. The first to sixth nozzles 81b, 82b, 83b, 83c, 84b, 84c shown in FIG. 11 are connected to the round hole nozzle 72 shown in FIG. 3 and blow out the gas 21 sent from the pump 34. Is possible.

In the first blower mechanism 81 shown in FIG. 11A, a plurality of first nozzles 81b, which are nozzles having a round hole shape, are formed in a row in the longitudinal direction of the nozzle body 81a.
In the first blower mechanism 82 shown in FIG. 11B, a plurality of second nozzles 82b, which are nozzles having a round hole shape, are formed in two rows in the longitudinal direction of the nozzle body 82a.
In the first blower mechanism 83 shown in FIG. 11C, a slit-like third nozzle 83b is formed at the center of the nozzle body 83a, and a plurality of nozzles are provided on both sides of the third nozzle 83b (up and down of the third nozzle 83b). A fourth nozzle 83c having a round hole shape is formed.
In the first blower mechanism 84 shown in FIG. 11 (d), a slit-like fifth nozzle 84b is formed at the center of the nozzle body 84a, and both sides of the fifth nozzle 84b (left and right of the fifth nozzle 84b) are respectively provided. A plurality of round hole-like sixth nozzles 84c are formed.

Note that the first to sixth nozzles 81b, 82b, 83b, 83c, 84b, and 84c shown in FIGS. 11A to 11D are, for example, the strength of the gas from one hole and the ON / OFF of the air blowing. Etc. can be controlled.
The first air blowing mechanisms 81 to 84 as shown in FIGS. 11A to 11D spread the liquid material 20 more in accordance with, for example, the shape of the substrate or the shape of the pattern film formed on the substrate. Easy nozzles can be selected and used. Thereby, while being able to apply | coat a liquid material on a board | substrate, without being restrict | limited to the shape of a board | substrate, the film | membrane with uniform thickness can be formed by spreading the liquid material 20 uniformly.

(Modification 2) As described in the first embodiment, the gas 21 is blown from the first blower port 22 of the first blower mechanism 14 to the liquid material 30 supplied onto the first substrate 42, so that it is substantially rectangular. Instead of being spread over the entire first substrate 42, for example, the first blower mechanism 14 is further provided with a plurality of third blowers in addition to the first blower openings 22. A gas third gas having a component different from that of the gas 21 may be sprayed on the liquid material 30 from the third air blowing port and spread on the first substrate 42.
In addition, the liquid material 30 may be spread on the first substrate 42 by mixing the respective gases from the first blower port 22 and the third blower port, or by selectively using them depending on the region to be coated. Moreover, you may make it form similarly about 2nd and 3rd embodiment.
The first air outlet 22 and the third air outlet may have different shapes of the gas outlets. For example, the first air outlet 22 has a slit shape, and the third air outlet has a round hole shape. Moreover, the opening area of the 1st ventilation opening 22 may be formed larger compared with the opening area of the 3rd ventilation opening.

(Modification 3) As described above, instead of the first air blowing mechanism 14, the second air blowing mechanism 15, and the third air blowing mechanism 16 of the membrane manufacturing apparatus 11 being configured independently, as shown in FIG. In addition, the liquid material 20 may be spread by the fifth air blowing mechanism 91 in which the air blowing mechanism is integrated. According to the fifth blower mechanism 91 configured as described above, the fifth blower mechanism 91 can be moved in the X direction by a single drive mechanism, and is integrated, so that the substrate 19 is mounted on the substrate 19. It becomes easy to apply the gas 21 to the liquid material 20 that is likely to fall outside the 19 without leaking. Thereby, it is possible to make it difficult to drop the liquid material 20 from the substrate 19 to the outside of the substrate 19.
Further, the fifth blower mechanism 91 and the hood 18 shown in FIG. 12 may be integrally formed.

  (Modification 4) As described above, by fixing the substrate 19 together with the stage 12 and moving the first air blowing mechanism 14 in the X direction, instead of spreading the liquid material 20 on the substrate 19, For example, the stage 12 is provided with a transport mechanism that can move in the X direction with respect to the first blower mechanism 14, and the substrate 19 is moved by the transport mechanism while the first blower mechanism 14 is fixed. The liquid material 20 may be spread out by moving in the X direction.

(Variation 5) As described above, the substrate 19 is fixed together with the stage 12, and the first air blowing mechanism 14 is moved in the X direction, so that the liquid material 20 is spread over the substrate 19, For example, the stage 12 may be provided with a rotation mechanism capable of rotating the stage 12, and the substrate 19 may be rotated together with the stage 12. According to this, while rotating the board | substrate 19 with a rotation mechanism and blowing the gas 21 on the liquid material 20 with the 1st ventilation mechanism 14, the 1st ventilation mechanism 14 is moved toward the outer peripheral direction from the center vicinity of the board | substrate 19. FIG. Thus, the liquid material 20 may be spread over the entire substrate 19.
Further, after the liquid material 20 is placed near the center on the substrate 19, the liquid material 20 is spread over substantially the entire surface of the substrate 19. After that, the rotation of the substrate 19 may be stopped, and the first air blowing mechanism 14 may be configured to push and spread the liquid material 20 from the vicinity of the center of the substrate 19 toward the outer periphery while blowing the gas 21.

  (Modification 6) As described above, instead of supplying the bulk liquid material 20 onto the substrate 19 by the liquid material supply nozzle 13, for example, the liquid material supply nozzle 13 includes a mist liquid material 20. The mist-like liquid material 20 may be deposited on the entire substrate 19 by the liquid material supply nozzle 13. According to this, after the mist-like liquid material 20 is deposited on the substrate 19, the first blower mechanism 14 moves the liquid material 20 in the X direction while blowing the gas 21 to the liquid on the substrate 19. The material 20 can be spread out. As a result, the liquid material 20 having a uniform film thickness can be applied on the substrate 19.

  (Modification 7) As described above, instead of the shape of the opening from which the liquid material 20 of the liquid material supply nozzle 13 is discharged being cylindrical, for example, the length of one side (end A) of the substrate 19 It may be formed in a slit shape having an opening. According to this, a required amount of the liquid material 20 can be supplied onto the substrate 19 at a time without moving the liquid material supply nozzle 13 in the Y direction by the liquid material supply drive mechanism.

(Modification 8) As described above, instead of the gas 21 being blown from the outside of the substrate 19 toward the inside of the substrate 19 by the second blowing mechanism 15 and the third blowing mechanism 16, instead of from above the substrate 19. The gas 21 may be sprayed so that the liquid material 20 does not fall outside the substrate 19. For example, the gas 21 may be sprayed obliquely from the obliquely lower end of the substrate 19 toward the upper end of the substrate 19.
Further, for example, the second air blowing mechanism 15 is disposed below the end B of the substrate 19, and is directed from the second air blowing port 23 of the second air blowing mechanism 15 toward the upper end B of the substrate 19. The gas 21 may be blown vertically.
On the other hand, the third blower mechanism 16 is similarly disposed below the end C of the substrate 19 and is directed from the fourth blower opening 24 of the third blower mechanism 16 toward the end C of the substrate 19 located above. The gas 21 may be blown.

  (Modification 9) As described above, in the gas blower 31, the method of supplying the alcohol 38 to the gas 21 a uses the vacuum pressure generated when the gas 21 a is sent into the first and second pipes 32 and 33. Instead of this, for example, the alcohol 38 may be bubbled and the alcohol 38 evaporated thereby may be supplied to the gas 21.

  (Modification 10) As described above, in order to remove the liquid material 20 remaining on the substrate 19 to the outside of the substrate 19, the moving speed in the X direction of the first blower mechanism 14 is increased by the first drive mechanism, As a result, the strength of the gas 21 sprayed onto the liquid material 20 is made stronger than when the liquid material 20 is spread, and the liquid material 20 remaining on the outside of the substrate 19 is blown off from the substrate 19. Instead of increasing the moving speed of the first blower mechanism 14 in the X direction, for example, the strength of the gas 21 sent from the pump 34 is increased in the vicinity of the end portion D of the substrate 19, whereby the liquid material The strength of the gas 21 blown to 20 may be made stronger than when the liquid material 20 is spread, and the remaining liquid material 20 may be blown off to the outside of the substrate 19.

  (Modification 11) As described above, the shape of the air outlet (second air outlet 23, fourth air outlet 24) of the gas 21 provided in the second and third air blowing mechanisms 15 and 16 is slit. For example, the gas 21 outlet may be formed in a plurality of round holes. For example, the plurality of round hole-shaped outlets can independently blow out the gas 21. The liquid material 20 that is about to fall from the substrate 19 is blown by a plurality of air outlets according to the flow state of the liquid material 20 while changing the angle and strength of blowing the gas 21 for each hole. It is desirable to make it.

  (Modification 12) As described above, the second drive mechanism and the first drive mechanism may be operated independently instead of being operated following each other.

  (Modification 13) As described above, the first drive mechanism is not limited to moving the first blower mechanism 14 in the X direction, and may be moved in the Y direction and the Z direction, for example. By providing it so as to be movable in the Y direction, for example, it is possible to absorb vibration when the first drive mechanism operates. Moreover, by providing it so that a movement to a Z direction is possible, the distance of the 1st ventilation port 22 and the board | substrate 19 can be adjusted, for example. In addition, when the liquid material 20 is supplied by moving the first air blowing mechanism 14 in the Z direction, interference between the liquid material supply nozzle 13 and the first air blowing mechanism 14 can be prevented.

The schematic diagram which shows the structure of the film | membrane manufacturing apparatus in one Embodiment. (A) is the schematic top view which looked at the membrane manufacturing apparatus from upper direction except the hood. (B) is the model side view which looked at the membrane manufacturing apparatus from the side. The schematic diagram which shows the structure of the gas ventilation part for sending gas to a 1st ventilation mechanism. The schematic diagram which shows the structure of a 1st ventilation mechanism. (A) is the model side view which looked at the 1st ventilation mechanism from the side. (B) is the schematic top view which looked at the 1st ventilation mechanism from the lower side. (C) is the model side view which looked at the 1st ventilation mechanism of (a) from the side. The schematic diagram which shows the structure of a 1st semiconductor device. (A) is the schematic top view which looked at the 1st semiconductor device from the upper part. (B) is the model side view which looked at the 1st semiconductor device from the side. FIG. 4 is a schematic cross-sectional view showing a method for manufacturing the first semiconductor device in the order of steps. (A), (c), (e), (g) is the schematic top view which looked at the 1st semiconductor device from the upper direction. (B), (d), (f), (h) is the model side view which looked at the 1st semiconductor device from the side. FIG. 3 is a schematic perspective view schematically showing a configuration of an electronic apparatus to which the electro-optical device can be applied. (A) is a schematic perspective view which shows the structure of the liquid crystal television which is one Embodiment of an electronic device. (B) is a schematic perspective view which shows the structure of the wall-mounted television which is one Embodiment of an electronic device. The schematic diagram which shows the structure of a 2nd semiconductor device. (A) is the schematic top view which looked at the 2nd semiconductor device from the upper direction. (B) is the model side view which looked at the 2nd semiconductor device from the side. FIG. 10 is a schematic cross-sectional view illustrating a method for manufacturing the second semiconductor device in the order of steps. (A), (c), (e), (g) is the schematic top view which looked at the 2nd semiconductor device from the upper direction. (B), (d), (f), (h) is the model side view which looked at the 2nd semiconductor device from the side. The schematic diagram which shows the structure of a 3rd semiconductor device. (A) is the schematic top view which looked at the 3rd semiconductor device from the upper part. (B) is the model side view which looked at the 3rd semiconductor device from the side. The schematic plan view which expands the part of a lyophilic area | region and shows the manufacturing method of a 3rd semiconductor device in order of a process. The schematic plan view which shows the modification of a 1st ventilation mechanism. (A), (b), (c), (d) is the schematic top view which looked at the 1st ventilation mechanism from the front end side. The schematic plan view which shows the modification of a film manufacturing apparatus.

Explanation of symbols

DESCRIPTION OF SYMBOLS 11 ... Film manufacturing apparatus, 12 ... Stage (substrate mounting part), 12a ... Upper surface, 13 ... Liquid material supply nozzle, 14 ... 1st ventilation mechanism, 15 ... 2nd ventilation mechanism, 16 ... 3rd ventilation mechanism, 17 ... 4th blower mechanism, 18 ... Hood, 19 ... Substrate, 20 ... Liquid material, 21, 21a, 21b ... Gas, 22 ... First blower port, 23 ... Second blower port, 24 ... Fourth blower port, 25 ... First 5 vents, 30, 30a ... liquid material, 31 ... gas blower, 32 ... first pipe, 33 ... second pipe, 34 ... pump, 35 ... third pipe, 36 ... container, 37 ... open pipe, 38 ... Alcohol, 40, 40a, 40b, 40c ... Liquid material, 41 ... First semiconductor device, 42 ... First substrate, 43 ... First film, 50 ... Liquid material, 51 ... Second semiconductor device, 52 ... Second substrate, 53: first pattern film, 54: lyophilic region, 55: liquid repellent region, 56: first Membrane, 61 ... third semiconductor device, 62 ... third substrate, 63 ... second pattern film, 64 ... lyophilic region, 65 ... liquid repellent region, 66 ... third film, 67 ... first region, 68 ... second Area 71 ... Nozzle body 72 ... Round hole nozzle 73 ... Slit nozzle 73a ... Opening part 81, 82, 83, 84 ... First air blowing mechanism 81a, 82a, 83a, 84a ... Nozzle body 81b ... No. 1 nozzle, 82b ... 2nd nozzle, 83b ... 3rd nozzle, 83c ... 4th nozzle, 84b ... 5th nozzle, 84c ... 6th nozzle, 91 ... 5th ventilation mechanism, 101 ... Liquid crystal television, 102 ... Display part, DESCRIPTION OF SYMBOLS 103 ... Frame part, 104 ... Leg part, 105 ... Remote control, 111 ... Wall-mounted television, 112 ... Display part, 113 ... Frame part, 114 ... Winding part.

Claims (19)

A first air blowing mechanism having a first air outlet for ejecting the first gas;
A first drive mechanism for moving the first blower mechanism;
A film manufacturing apparatus comprising: A substrate mounting unit;
A first blower mechanism having a first blower port for ejecting a first gas to the substrate placement unit;
A drive mechanism for relatively moving the substrate mounting portion and the first air blowing mechanism;
A film manufacturing apparatus comprising: The film manufacturing apparatus according to claim 2,
The film manufacturing apparatus, wherein the driving mechanism moves the first air blowing mechanism relative to the substrate mounting portion in the X, Y, and Z directions. It is a film | membrane manufacturing apparatus as described in any one of Claims 1-3,
The membrane manufacturing apparatus further comprising a second air blowing mechanism having a second air outlet for ejecting the second gas. The film manufacturing apparatus according to claim 4,
The film manufacturing apparatus according to claim 1, wherein a direction in which the first air blowing port ejects the first gas is different from a direction in which the second air blowing port ejects the second gas. The film manufacturing apparatus according to claim 4 or 5,
A second drive mechanism for moving the second blower mechanism;
The film manufacturing apparatus, wherein the second drive mechanism operates independently of the first drive mechanism. It is a film | membrane manufacturing apparatus as described in any one of Claims 4-6,
The first gas ejected from the first blower port moves a part of the liquid material arranged on the substrate,
The second gas ejected from the second air blowing port prevents at least another part of the liquid material disposed on the substrate from moving outside the peripheral edge of the substrate. Film manufacturing equipment. The film manufacturing apparatus according to any one of claims 1 to 7,
The first air blowing mechanism further includes a third air blowing port for ejecting a third gas. The film manufacturing apparatus according to claim 8,
The membrane manufacturing apparatus according to claim 1, wherein an opening area of the first air outlet is larger than an opening area of the third air outlet. The film manufacturing apparatus according to claim 8 or 9,
The film manufacturing apparatus according to claim 1, wherein the air blowing control mechanism of the first air blowing port is different from the air blowing control mechanism of the third air blowing port. It is a film | membrane manufacturing apparatus as described in any one of Claims 8-10,
The film manufacturing apparatus, wherein the first gas and the third gas are different. The film manufacturing apparatus according to claim 7,
In order to prevent the other part on the substrate from moving to the outside of the peripheral edge of the substrate, it further includes a third air blowing mechanism for ejecting the second gas,
The film manufacturing apparatus, wherein the second air blowing mechanism and the third air blowing mechanism are arranged so as to surround the substrate. The film manufacturing apparatus according to claim 8,
The second driving mechanism moves the second blowing mechanism and the third blowing mechanism in accordance with the movement of the first blowing mechanism, and moves the second blowing mechanism and the third blowing mechanism. It is a film | membrane manufacturing apparatus as described in any one of Claims 7-13,
In order to prevent the liquid material from flowing from the end portion of the substrate toward the back surface side, a fourth air blowing mechanism capable of blowing a fourth gas from the back surface direction of the substrate toward the end portion is further provided. A film manufacturing apparatus characterized by that. It is a film | membrane manufacturing apparatus as described in any one of Claims 7-14,
The first air blowing mechanism blows a fifth gas from the first air blowing port to the liquid material on the substrate to form a film from the liquid material, and removes the solvent or the dispersion medium to dry. A film manufacturing apparatus characterized by the above. It is a film | membrane manufacturing apparatus as described in any one of Claims 7-14,
In order to form a film from the liquid material, the first air blowing mechanism blows a fifth gas from the first air blowing port and the third air blowing port to the liquid material on the substrate, so that a solvent or a dispersion medium is formed. An apparatus for producing a film, which is removed and dried. The film manufacturing apparatus according to any one of claims 1 to 16,
A film manufacturing apparatus, wherein a hood is provided above the substrate to rectify the direction of the gas flowing on the substrate. The film manufacturing apparatus according to any one of claims 15 to 17,
An apparatus for manufacturing a film, comprising: a liquid material supply unit capable of supplying a necessary amount of the liquid material to form the film at an arbitrary place on the substrate. The film manufacturing apparatus according to claim 18,
The liquid material supply unit supplies a mist-like liquid material onto the substrate.

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